WO2009005065A1 - 投影光学系 - Google Patents

投影光学系 Download PDF

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Publication number
WO2009005065A1
WO2009005065A1 PCT/JP2008/061920 JP2008061920W WO2009005065A1 WO 2009005065 A1 WO2009005065 A1 WO 2009005065A1 JP 2008061920 W JP2008061920 W JP 2008061920W WO 2009005065 A1 WO2009005065 A1 WO 2009005065A1
Authority
WO
WIPO (PCT)
Prior art keywords
optical element
optical system
projection optical
projection
simplifying
Prior art date
Application number
PCT/JP2008/061920
Other languages
English (en)
French (fr)
Inventor
Yutaka Suenaga
Original Assignee
Mejiro Precision, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mejiro Precision, Inc. filed Critical Mejiro Precision, Inc.
Publication of WO2009005065A1 publication Critical patent/WO2009005065A1/ja

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

　良好な結像性能を維持しながら、構成を簡素にして、容易に製造することができるまた、各光学素子を適切に選択することで、色収差を良好に補正することもできる投影光学系を提供するため、光学的に平行平板形状の第１の光学素子と、平凸形状の第２の光学素子と凹面鏡とを有するとともに、第１の光学素子の屈折率を、第２の光学素子の屈折率よりも大きくする。
PCT/JP2008/061920 2007-07-02 2008-07-01 投影光学系 WO2009005065A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-174352 2007-07-02
JP2007174352A JP5094240B2 (ja) 2007-07-02 2007-07-02 投影光学系

Publications (1)

Publication Number Publication Date
WO2009005065A1 true WO2009005065A1 (ja) 2009-01-08

Family

ID=40226110

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/061920 WO2009005065A1 (ja) 2007-07-02 2008-07-01 投影光学系

Country Status (3)

Country Link
JP (1) JP5094240B2 (ja)
TW (1) TW200912556A (ja)
WO (1) WO2009005065A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022517144A (ja) * 2019-03-27 2022-03-04 ズース マイクロテック フォトニック システムズ インコーポレイテッド 投影システムにおける光学歪み低減

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4103989A (en) * 1977-02-07 1978-08-01 Seymour Rosin Unit-power concentric optical systems

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH112761A (ja) * 1997-04-15 1999-01-06 Nikon Corp 投影光学系およびそれを備えた露光装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4103989A (en) * 1977-02-07 1978-08-01 Seymour Rosin Unit-power concentric optical systems

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022517144A (ja) * 2019-03-27 2022-03-04 ズース マイクロテック フォトニック システムズ インコーポレイテッド 投影システムにおける光学歪み低減
JP7101317B2 (ja) 2019-03-27 2022-07-14 ズース マイクロテック フォトニック システムズ インコーポレイテッド 投影システムにおける光学歪み低減

Also Published As

Publication number Publication date
JP2009014847A (ja) 2009-01-22
TW200912556A (en) 2009-03-16
JP5094240B2 (ja) 2012-12-12

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