WO2008152649A3 - Method and system for evaluating local distortions - Google Patents

Method and system for evaluating local distortions Download PDF

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Publication number
WO2008152649A3
WO2008152649A3 PCT/IL2008/000817 IL2008000817W WO2008152649A3 WO 2008152649 A3 WO2008152649 A3 WO 2008152649A3 IL 2008000817 W IL2008000817 W IL 2008000817W WO 2008152649 A3 WO2008152649 A3 WO 2008152649A3
Authority
WO
WIPO (PCT)
Prior art keywords
local distortions
image information
lower layer
evaluating local
drilled
Prior art date
Application number
PCT/IL2008/000817
Other languages
French (fr)
Other versions
WO2008152649A2 (en
Inventor
Rafi Amit
Original Assignee
Camtek Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Camtek Ltd. filed Critical Camtek Ltd.
Publication of WO2008152649A2 publication Critical patent/WO2008152649A2/en
Publication of WO2008152649A3 publication Critical patent/WO2008152649A3/en

Links

Classifications

    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K31/00—Medicinal preparations containing organic active ingredients
    • A61K31/33—Heterocyclic compounds
    • A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
    • A61K31/41—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having five-membered rings with two or more ring hetero atoms, at least one of which being nitrogen, e.g. tetrazole
    • A61K31/4192—1,2,3-Triazoles
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K31/00—Medicinal preparations containing organic active ingredients
    • A61K31/33—Heterocyclic compounds
    • A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
    • A61K31/435—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with one nitrogen as the only ring hetero atom
    • A61K31/4353—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with one nitrogen as the only ring hetero atom ortho- or peri-condensed with heterocyclic ring systems
    • A61K31/4365—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with one nitrogen as the only ring hetero atom ortho- or peri-condensed with heterocyclic ring systems the heterocyclic ring system having sulfur as a ring hetero atom, e.g. ticlopidine
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95638—Inspecting patterns on the surface of objects for PCB's

Abstract

A method for evaluating local distortions of a lower layer of a printed circuit board, the method includes: receiving image information representative of lower layer portions that are viewed through drilled holes in an upper layer; wherein the holes are drilled by a drilling system that is more accurate than a mechanical element that introduces a mechanical movement during an optical acquisition of optical image information; and determining local distortions of the lower layer in response to the image information.
PCT/IL2008/000817 2007-06-15 2008-06-15 Method and system for evaluating local distortions WO2008152649A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US94410507P 2007-06-15 2007-06-15
US60/944,105 2007-06-15

Publications (2)

Publication Number Publication Date
WO2008152649A2 WO2008152649A2 (en) 2008-12-18
WO2008152649A3 true WO2008152649A3 (en) 2010-02-25

Family

ID=40130292

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IL2008/000817 WO2008152649A2 (en) 2007-06-15 2008-06-15 Method and system for evaluating local distortions

Country Status (2)

Country Link
TW (1) TW200912804A (en)
WO (1) WO2008152649A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9885671B2 (en) 2014-06-09 2018-02-06 Kla-Tencor Corporation Miniaturized imaging apparatus for wafer edge
US9645097B2 (en) 2014-06-20 2017-05-09 Kla-Tencor Corporation In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6567713B2 (en) * 1999-02-02 2003-05-20 Creo Il. Ltd Method and apparatus for registration control during processing of a workpiece, particularly during producing images on substrates in preparing printed circuit boards
US6701197B2 (en) * 2000-11-08 2004-03-02 Orbotech Ltd. System and method for side to side registration in a printed circuit imager

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6567713B2 (en) * 1999-02-02 2003-05-20 Creo Il. Ltd Method and apparatus for registration control during processing of a workpiece, particularly during producing images on substrates in preparing printed circuit boards
US6701197B2 (en) * 2000-11-08 2004-03-02 Orbotech Ltd. System and method for side to side registration in a printed circuit imager

Also Published As

Publication number Publication date
WO2008152649A2 (en) 2008-12-18
TW200912804A (en) 2009-03-16

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