WO2008139934A1 - Multilayer board and method for manufacturing the same - Google Patents

Multilayer board and method for manufacturing the same Download PDF

Info

Publication number
WO2008139934A1
WO2008139934A1 PCT/JP2008/058267 JP2008058267W WO2008139934A1 WO 2008139934 A1 WO2008139934 A1 WO 2008139934A1 JP 2008058267 W JP2008058267 W JP 2008058267W WO 2008139934 A1 WO2008139934 A1 WO 2008139934A1
Authority
WO
WIPO (PCT)
Prior art keywords
board
electrode
embedding
multilayer board
ito transparent
Prior art date
Application number
PCT/JP2008/058267
Other languages
French (fr)
Japanese (ja)
Inventor
Ryoji Mishima
Tsutomu Morimoto
Osamu Inaki
Gensuke Koizumi
Nobuhito Miura
Original Assignee
International Test And Engineering Services Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Test And Engineering Services Co., Ltd. filed Critical International Test And Engineering Services Co., Ltd.
Publication of WO2008139934A1 publication Critical patent/WO2008139934A1/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/26—Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode
    • H05B33/28—Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode of translucent electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/02—Details
    • H05B33/06—Electrode terminals
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/81—Anodes
    • H10K50/814—Anodes combined with auxiliary electrodes, e.g. ITO layer combined with metal lines
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/621—Providing a shape to conductive layers, e.g. patterning or selective deposition

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Liquid Crystal (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

Provided is a multilayer board wherein a low resistance embedding electrode is formed without using etching process. The multilayer board has a function of reducing wiring resistance of an ITO transparent electrode by bringing the low resistance embedding electrode into contact with the ITO transparent electrode, and increasing light passing through the multilayer board. A method for manufacturing such multilayer board is also provided. The multilayer board is provided with a first board, a second board, the embedding electrode and the ITO transparent electrode. The embedding electrode is formed of a conductive material, the second board is laminated on the first board, the embedding electrode is embedded to expose the surface from the second board, the ITO transparent electrode is laminated on the second board whereupon the embedding electrode is embedded, and the embedding electrode and the ITO transparent electrode are electrically brought into contact with each other.
PCT/JP2008/058267 2007-05-03 2008-04-30 Multilayer board and method for manufacturing the same WO2008139934A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007121987A JP5577012B2 (en) 2007-05-03 2007-05-03 Multilayer substrate and manufacturing method thereof
JP2007-121987 2007-05-03

Publications (1)

Publication Number Publication Date
WO2008139934A1 true WO2008139934A1 (en) 2008-11-20

Family

ID=40002147

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/058267 WO2008139934A1 (en) 2007-05-03 2008-04-30 Multilayer board and method for manufacturing the same

Country Status (2)

Country Link
JP (1) JP5577012B2 (en)
WO (1) WO2008139934A1 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7855233B2 (en) 2009-01-23 2010-12-21 Teva Pharmaceutical Industries, Ltd. Citrate salt of Rasagiline
EP2282360A1 (en) * 2009-08-06 2011-02-09 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Opto-electric device and method for manufacturing the same
EP2506330A1 (en) * 2011-04-01 2012-10-03 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Apparatus and method for providing an embedded structure and for providing an electro-optical device including the same
WO2016009132A1 (en) * 2014-07-17 2016-01-21 Saint-Gobain Glass France Electrically conductive oled carrier, oled incorporating it, and its manufacture
WO2016038311A1 (en) * 2014-09-11 2016-03-17 Saint-Gobain Glass France Electroconductive support for electrochromic device, electrochromic device incorporating same, and production thereof
RU2645793C2 (en) * 2013-03-08 2018-02-28 Сэн-Гобэн Гласс Франс Electroconductive support for an oled, oled incorporating and manufacturing

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5306341B2 (en) * 2007-07-04 2013-10-02 コーニンクレッカ フィリップス エヌ ヴェ Method for forming a patterned layer on a substrate
JP2010272466A (en) * 2009-05-25 2010-12-02 Fujifilm Corp Transparent conductor and its manufacturing method
KR101094300B1 (en) * 2009-10-12 2011-12-19 삼성모바일디스플레이주식회사 Organic light emitting diode lighting apparatus and method for manufacturing the same
KR20120112004A (en) * 2011-03-31 2012-10-11 모저 베어 인디아 엘티디 Method for patterning a lacquer layer to hold electrical gridlines
JP5899583B2 (en) * 2011-08-11 2016-04-06 株式会社ブイ・テクノロジー Vacuum deposition method, vacuum deposition apparatus, organic EL display device manufacturing method, and organic EL display apparatus
WO2013153700A1 (en) * 2012-04-12 2013-10-17 Ｎｅｃライティング株式会社 Organic el illumination panel substrate, organic el illumination panel and organic el illumination device
KR101335913B1 (en) 2012-06-14 2013-12-02 한국기계연구원 Organic light emitting diodes including metal wiring buried substrates, and the preparation method thereof
WO2014137192A2 (en) * 2013-03-07 2014-09-12 주식회사 엘지화학 Transparent substrate including fine metal line and method for manufacturing same
US9831487B2 (en) * 2013-05-16 2017-11-28 Inktec Co., Ltd. Method for manufacturing transparent electrode film
JP6313429B2 (en) * 2013-05-16 2018-04-18 インクテック カンパニー， リミテッドＩｎｋｔｅｃ Ｃｏ．， Ｌｔｄ． Manufacturing method of hybrid transparent electrode

Citations (9)

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JPH0266870A (en) * 1988-08-31 1990-03-06 Matsushita Electric Ind Co Ltd Thin film el element and manufacture thereof
JPH1140368A (en) * 1997-07-17 1999-02-12 Nec Corp Organic el element
JP2000252081A (en) * 1999-02-26 2000-09-14 Hokuriku Electric Ind Co Ltd Organic el element
JP2000260573A (en) * 1999-03-11 2000-09-22 Hokuriku Electric Ind Co Ltd Organic el element
JP2003045643A (en) * 2001-07-30 2003-02-14 Nec Corp Luminescent element and display device
JP2003108029A (en) * 2001-09-28 2003-04-11 Sanyo Electric Co Ltd Display device and its manufacturing method
JP2004152699A (en) * 2002-10-31 2004-05-27 Matsushita Electric Works Ltd Light emitting device and lighting device
JP2004356255A (en) * 2003-05-28 2004-12-16 Cluster Technology Co Ltd Manufacturing method for high-density wiring board
JP2006005109A (en) * 2004-06-17 2006-01-05 Semiconductor Energy Lab Co Ltd Manufacturing method of semiconductor device

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007109422A (en) * 2005-10-11 2007-04-26 Konica Minolta Holdings Inc Organic electroluminescent element

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0266870A (en) * 1988-08-31 1990-03-06 Matsushita Electric Ind Co Ltd Thin film el element and manufacture thereof
JPH1140368A (en) * 1997-07-17 1999-02-12 Nec Corp Organic el element
JP2000252081A (en) * 1999-02-26 2000-09-14 Hokuriku Electric Ind Co Ltd Organic el element
JP2000260573A (en) * 1999-03-11 2000-09-22 Hokuriku Electric Ind Co Ltd Organic el element
JP2003045643A (en) * 2001-07-30 2003-02-14 Nec Corp Luminescent element and display device
JP2003108029A (en) * 2001-09-28 2003-04-11 Sanyo Electric Co Ltd Display device and its manufacturing method
JP2004152699A (en) * 2002-10-31 2004-05-27 Matsushita Electric Works Ltd Light emitting device and lighting device
JP2004356255A (en) * 2003-05-28 2004-12-16 Cluster Technology Co Ltd Manufacturing method for high-density wiring board
JP2006005109A (en) * 2004-06-17 2006-01-05 Semiconductor Energy Lab Co Ltd Manufacturing method of semiconductor device

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7855233B2 (en) 2009-01-23 2010-12-21 Teva Pharmaceutical Industries, Ltd. Citrate salt of Rasagiline
EP2282360A1 (en) * 2009-08-06 2011-02-09 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Opto-electric device and method for manufacturing the same
WO2011016724A1 (en) * 2009-08-06 2011-02-10 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Opto-electric device and method for manufacturing the same
US9333531B2 (en) 2009-08-06 2016-05-10 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Opto-electric device and method for manufacturing the same
US9554473B2 (en) 2011-04-01 2017-01-24 Nederlandse Organisatie Voor Toegepastnatuurwetenschappelijk Onderzoek Tno Apparatus and method for providing an embedded structure and for providing an electro-optical device including the same
EP2506330A1 (en) * 2011-04-01 2012-10-03 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Apparatus and method for providing an embedded structure and for providing an electro-optical device including the same
WO2012134286A1 (en) * 2011-04-01 2012-10-04 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Apparatus and method for providing an embedded structure and for providing an electro-optical device including the same
US10181566B2 (en) 2013-03-08 2019-01-15 Saint-Gobain Glass France Electrically conductive OLED carrier, OLED incorporating said carrier, and its manufacture
RU2645793C9 (en) * 2013-03-08 2018-05-04 Сэн-Гобэн Гласс Франс Electroconductive support for an oled, oled incorporating and manufacturing
RU2645793C2 (en) * 2013-03-08 2018-02-28 Сэн-Гобэн Гласс Франс Electroconductive support for an oled, oled incorporating and manufacturing
US9786849B2 (en) 2014-07-17 2017-10-10 Saint-Gobain Glass France Electrically conductive OLED carrier, OLED incorporating said carrier, and its manufacture
CN106537625A (en) * 2014-07-17 2017-03-22 法国圣戈班玻璃厂 Conductive support for an OLED, OLED comprising said support and its manufacture
FR3023979A1 (en) * 2014-07-17 2016-01-22 Saint Gobain ELECTROCONDUCTIVE SUPPORT FOR OLED, OLED INCORPORATING THE SAME, AND MANUFACTURING THE SAME.
WO2016009132A1 (en) * 2014-07-17 2016-01-21 Saint-Gobain Glass France Electrically conductive oled carrier, oled incorporating it, and its manufacture
CN106537625B (en) * 2014-07-17 2019-08-13 法国圣戈班玻璃厂 Conductive support for an OLED, OLED comprising said support and its manufacture
FR3025944A1 (en) * 2014-09-11 2016-03-18 Saint Gobain ELECTROCONDUCTIVE SUPPORT FOR ELECTROCHROMIC DEVICE, ELECTROCHROMIC DEVICE INCORPORATING IT, AND MANUFACTURE THEREOF.
WO2016038311A1 (en) * 2014-09-11 2016-03-17 Saint-Gobain Glass France Electroconductive support for electrochromic device, electrochromic device incorporating same, and production thereof
US10209600B2 (en) 2014-09-11 2019-02-19 Saint-Gobain Glass France Electrically conducting support for an electrochromic device, electrochromic device incorporating it, and its manufacture

Also Published As

Publication number Publication date
JP5577012B2 (en) 2014-08-20
JP2008277202A (en) 2008-11-13

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