WO2008128855A3 - Method for depositing a metal-containing substance on a substrate - Google Patents

Method for depositing a metal-containing substance on a substrate Download PDF

Info

Publication number
WO2008128855A3
WO2008128855A3 PCT/EP2008/053809 EP2008053809W WO2008128855A3 WO 2008128855 A3 WO2008128855 A3 WO 2008128855A3 EP 2008053809 W EP2008053809 W EP 2008053809W WO 2008128855 A3 WO2008128855 A3 WO 2008128855A3
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
metal
depositing
containing substance
nitratometallate
Prior art date
Application number
PCT/EP2008/053809
Other languages
German (de)
French (fr)
Other versions
WO2008128855A2 (en
Inventor
Thomas Wich
Tim Luttermann
Frauke Gerlach
Hanno Schnars
Katharina Al-Shamery
Mathias Wickleder
Mandus Necke
Oliver Buechner
Original Assignee
Carl Von Ossietzky Uni Oldenbu
Thomas Wich
Tim Luttermann
Frauke Gerlach
Hanno Schnars
Katharina Al-Shamery
Mathias Wickleder
Mandus Necke
Oliver Buechner
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Von Ossietzky Uni Oldenbu, Thomas Wich, Tim Luttermann, Frauke Gerlach, Hanno Schnars, Katharina Al-Shamery, Mathias Wickleder, Mandus Necke, Oliver Buechner filed Critical Carl Von Ossietzky Uni Oldenbu
Publication of WO2008128855A2 publication Critical patent/WO2008128855A2/en
Publication of WO2008128855A3 publication Critical patent/WO2008128855A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G1/00—Methods of preparing compounds of metals not covered by subclasses C01B, C01C, C01D, or C01F, in general
    • C01G1/08—Nitrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
    • C23C18/143—Radiation by light, e.g. photolysis or pyrolysis
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
    • C23C18/145—Radiation by charged particles, e.g. electron beams or ion irradiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

The invention relates to a method for depositing a metal-containing substance (4) on a substrate (1), said method comprising the following steps: a) a coating material (2) comprising a nitratometallate is applied to the substrate (1); and b) pre-determined regions of the applied coating material (2) are subjected to a charged particle beam (3) or electromagnetic radiation such that the nitratometallate in the pre-determined regions decomposes into a metal (4) or a metal oxide which is deposited on the substrate (1).
PCT/EP2008/053809 2007-04-20 2008-03-31 Method for depositing a metal-containing substance on a substrate WO2008128855A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007018845A DE102007018845B4 (en) 2007-04-20 2007-04-20 Process for depositing a metal-containing substance on a substrate and coating material therefor
DE102007018845.7 2007-04-20

Publications (2)

Publication Number Publication Date
WO2008128855A2 WO2008128855A2 (en) 2008-10-30
WO2008128855A3 true WO2008128855A3 (en) 2009-05-07

Family

ID=39767087

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2008/053809 WO2008128855A2 (en) 2007-04-20 2008-03-31 Method for depositing a metal-containing substance on a substrate

Country Status (2)

Country Link
DE (1) DE102007018845B4 (en)
WO (1) WO2008128855A2 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3989801A (en) * 1973-07-10 1976-11-02 The City University Metal nitrito compounds
US5534312A (en) * 1994-11-14 1996-07-09 Simon Fraser University Method for directly depositing metal containing patterned films
US6348239B1 (en) * 2000-04-28 2002-02-19 Simon Fraser University Method for depositing metal and metal oxide films and patterned films

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB965859A (en) * 1962-07-05 1964-08-06 Johnson Matthey Co Ltd Improvements in and relating to the deposition of palladium
JPS5249936A (en) * 1975-10-21 1977-04-21 Nippon Mining Co Nonnelectrolytic plating agent for metals of platinum group
DE3822766A1 (en) 1987-07-02 1989-01-12 Morche Dirk Walter Method for producing printed circuit boards, device for producing printed circuit boards, and a printed circuit board
NL8802047A (en) 1988-08-18 1990-03-16 Philips Nv METHOD FOR APPLYING SELECTIVELY TO A SUBSTRATE LIQUID PHASE METAL USING A LASER.
JPH03290306A (en) 1990-04-03 1991-12-20 Toyobo Co Ltd Formation of transparent conductive metal oxide coating film
KR100294581B1 (en) 1994-12-09 2001-09-17 후지무라 마사지카, 아키모토 유미 Metal oxide thin film pattern forming composition and its manufacturing method, metal oxide thin film pattern forming method, electronic component and optical part manufacturing method, and thin film forming method
KR20010101743A (en) 1999-11-30 2001-11-14 마에다 시게루 Method and apparatus for forming thin film of metal
US20060001064A1 (en) * 2000-04-28 2006-01-05 Hill Ross H Methods for the lithographic deposition of ferroelectric materials
US6417062B1 (en) 2000-05-01 2002-07-09 General Electric Company Method of forming ruthenium oxide films
US7294211B2 (en) * 2002-01-04 2007-11-13 University Of Dayton Non-toxic corrosion-protection conversion coats based on cobalt
KR100765684B1 (en) 2002-07-03 2007-10-11 삼성전자주식회사 Organometallic Precursors for Forming Metal Alloy Pattern and Method for Forming Metal Alloy Pattern Using The Same
JP2005311274A (en) 2004-03-26 2005-11-04 Toyo Ink Mfg Co Ltd Method for manufacturing electronic device
FR2891822B1 (en) * 2005-10-11 2008-02-15 Snpe Materiaux Energetiques Sa OXYGEN-RICH BI-METALLIC COMPLEXES, PREPARATION THEREOF AND PYROTECHNIC COMPOSITIONS COMPRISING THE SAME

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3989801A (en) * 1973-07-10 1976-11-02 The City University Metal nitrito compounds
US5534312A (en) * 1994-11-14 1996-07-09 Simon Fraser University Method for directly depositing metal containing patterned films
US6348239B1 (en) * 2000-04-28 2002-02-19 Simon Fraser University Method for depositing metal and metal oxide films and patterned films

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
C. CLIFFORD ADDISON: "Dinitrogen tetroxide, nitric acid, and their mixtures as media for inorganic reactions", CHEMICAL REVIEWS, vol. 80, no. 1, 1980, pages 21 - 39, XP002516587 *
GRIGORII A. TIKHOMIROV ET AL.: "Anhydrous Nitrates and Nitrosonium Nitratometallates of Manganese and Cobalt, M(NO3)2, NO[Mn(NO3)3], and (NO)2[Co(NO3)4]: Snythesis and Crystal Structure", Z. ANORG. ALLG. CHEM., vol. 628, 2002, Wenheim, pages 269 - 273, XP002516586 *

Also Published As

Publication number Publication date
DE102007018845B4 (en) 2009-11-12
DE102007018845A1 (en) 2008-10-23
WO2008128855A2 (en) 2008-10-30

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