WO2008122313A1 - Module d'élément optique comportant une correction d'erreur d'imagerie et de position - Google Patents

Module d'élément optique comportant une correction d'erreur d'imagerie et de position Download PDF

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Publication number
WO2008122313A1
WO2008122313A1 PCT/EP2007/053382 EP2007053382W WO2008122313A1 WO 2008122313 A1 WO2008122313 A1 WO 2008122313A1 EP 2007053382 W EP2007053382 W EP 2007053382W WO 2008122313 A1 WO2008122313 A1 WO 2008122313A1
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WO
WIPO (PCT)
Prior art keywords
optical element
holding
optical
holding structure
holding elements
Prior art date
Application number
PCT/EP2007/053382
Other languages
English (en)
Inventor
Bernhard Gellrich
Jens Kugler
Guido Limbach
Original Assignee
Carl Zeiss Smt Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Smt Ag filed Critical Carl Zeiss Smt Ag
Priority to PCT/EP2007/053382 priority Critical patent/WO2008122313A1/fr
Priority to TW097112150A priority patent/TW200901280A/zh
Priority to PCT/EP2008/054154 priority patent/WO2008122626A2/fr
Publication of WO2008122313A1 publication Critical patent/WO2008122313A1/fr

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

Definitions

  • the invention relates to optical element modules used in exposure processes, in particular to optical element modules used in microlithography systems. It further relates to optical imaging arrangements which may be used in such microlithography systems. It further relates to a method of supporting an optical element. It also relates to an optical imaging method for transferring an image of a pattern onto a substrate.
  • the invention may be used in the context of photolithography processes for fabricating microelectronic devices, in particular semiconductor devices, or in the context of fabricating devices, such as masks or reticles, used during such photolithography processes.
  • the optical systems used in the context of fabricating microelectronic devices comprise a plurality of optical element modules comprising optical elements, such as lenses, mirrors, gratings etc., in the light path of the optical system.
  • Those optical elements usually cooperate in an exposure process to illuminate a pattern formed on a mask, reticle or the like and to transfer an image of this pattern onto a substrate such as a wafer.
  • the optical elements are usually combined in one or more functionally distinct optical element groups that may be held within distinct optical element units.
  • optical element units are often built from a stack of optical element modules holding one or more - typically rotationally symmetric - optical elements.
  • These optical element modules usually comprise an external generally ring shaped support structure supporting one or more optical element holders each, in turn, holding one or more optical elements.
  • imaging error correction approaches are known, for example, from US 2003/0234918 A1 (Watson), US 6,842,277 B2 (Watson), US 6,884,994 B2 (Melzer et al.), US 2004/0144915 A1 (Wagner et al.), the entire disclosure of all of which is hereby incorporated herein by reference.
  • US 2004/0144915 A1 proposes to deform a mirror in order to correct wavefront aberrations and to displace a separate lens unit in order to compensate for further imaging errors
  • US 6,842,277 B2 proposes to, both, deform and displace one single optical element using a plurality of active support elements kinematically acting in parallel onto the optical element. While most of the active support elements only serve to deform the optical element, there are provided three so-called servos actively positioning the optical element.
  • an optical element module comprising an optical element and a support structure supporting the optical element, the support structure comprising a first holding structure, an intermediate structure and a second holding structure.
  • the first holding structure contacts the optical element and is adapted to adjustably introduce defined deformations into the optical element.
  • the intermediate structure supports the first holding structure while the second holding structure supports the intermediate structure and is adapted to adjust the position of the intermediate structure.
  • an optical imaging arrangement comprising a mask unit adapted to receive a pattern, a substrate unit adapted to receive a substrate and an optical projection unit adapted to transfer an image of the pattern onto the substrate.
  • the optical projection unit comprises at least one optical element and a support structure supporting the at least one optical element.
  • the support structure comprises a first holding structure, an intermediate structure and a second holding structure.
  • the first holding structure contacts the optical element and is adapted to adjustably introduce defined deformations into the optical element.
  • the intermediate structure supports the first holding structure while the second holding structure supports the intermediate structure and is adapted to adjust the position of the intermediate structure.
  • an optical imaging arrangement comprising a mask unit adapted to receive a pattern, a substrate unit adapted to receive a substrate and an optical projection unit adapted to transfer an image of the pattern onto the substrate.
  • the optical projection unit comprises at least one optical element and a support structure supporting the at least one optical element.
  • the support structure comprises a first holding structure and a second holding structure.
  • the first holding structure contacts the optical element and is adapted to adjustably introduce defined deformations into the optical element.
  • the second holding structure is adapted to adjust the position of the optical element.
  • the first holding structure and the second holding structure are arranged kinematically in series, the second holding structure supporting the first holding structure.
  • a method of supporting an optical element comprising providing an optical element and a support structure supporting the optical element, the support structure comprising a first holding structure contacting the optical element, an intermediate structure and a second holding structure; introducing defined deformations into the optical element via the first holding structure; supporting the first holding structure via the intermediate structure and adjusting the position of the intermediate structure via the second holding structure.
  • an optical imaging method comprising providing a pattern, a substrate and an optical projection unit adapted to transfer an image of the pattern onto the substrate, the optical projection unit comprising at least one optical element, the optical projection unit comprising at least one optical element and a support structure supporting the at least one optical element; the support structure comprising a first holding structure contacting the optical element, an intermediate structure supporting the first holding structure and a second holding structure, capturing an imaging error value representative of an imaging error of the optical projection unit, as a function of the imaging error value at least partially compensating the imaging error by at least one of introducing defined deformations into the optical element via the first holding structure and adjusting the position of the intermediate structure via the second holding structure and, finally, transferring the image of the pattern onto the substrate using the optical projection unit.
  • a method of supporting an optical element comprising providing an optical element and a support structure supporting the optical element, the support structure comprising a first holding structure and a second holding structure, introducing defined deformations into the optical element via the first holding structure, and, kinematically independently from the introducing the defined deformations into the optical element via the first holding structure, adjusting the position of the optical element via the second holding structure.
  • an optical imaging method comprising providing a pattern, a substrate and an optical projection unit adapted to transfer an image of the pattern onto the substrate, the optical projection unit comprising at least one optical element, the optical projection unit comprising at least one optical element and a support structure supporting the at least one optical element; the support structure comprising a first holding structure and a second holding structure, capturing an imaging error value representative of an imaging error of the optical projection unit, as a function of the imaging error value at least partially compensating the imaging error by at least one of introducing defined deformations into the optical element via the first holding structure, and, kinematically independently from the introducing the defined deformations into the optical element via the first holding structure, adjusting the position of the optical element via the second holding structure, and, finally, transferring the image of the pattern onto the substrate using the optical projection unit.
  • Figure 1 is a schematic representation of a preferred embodiment of an optical imaging arrangement according to the invention which comprises an optical element module according to the invention and with which preferred embodiments of methods according to the invention may be executed;
  • Figure 2 is a schematic sectional representation of an optical element module of the optical imaging arrangement of Figure 1 (section along line M-Il of Figure 3);
  • Figure 3 is a schematic top view of the optical element module of Figure 2;
  • Figure 4 is a block diagram of a preferred embodiment of an optical imaging method according to the invention comprising a method of supporting an optical element which may be executed with the optical imaging arrangement of Figure 1 ;
  • Figure 5 is a schematic sectional representation of a further preferred embodiment of an optical element module according to the invention that may be used in the optical imaging arrangement of Figure 1 ;
  • Figure 6 is a schematic sectional representation of a further preferred embodiment of an optical element module according to the invention that may be used in the optical imaging arrangement of Figure 1.
  • FIG 1 is a schematic and not-to-scale representation of the optical imaging arrangement in the form of an optical exposure apparatus 101.
  • the optical exposure apparatus 101 comprises an illumination unit 102 and an optical projection unit 103 adapted to transfer, in an exposure process, an image of a pattern formed on a mask 104.1 of a mask unit 104 onto a substrate 105.1 of a substrate unit 105.
  • the illumination unit 102 illuminates the mask 104.1.
  • the optical projection unit 103 receives the light coming from the mask 104.1 and projects the image of the pattern formed on the mask 104.1 onto the substrate 105.1 , e.g. a wafer or the like.
  • the optical projection unit 103 comprises a refractive optical element system including a plurality of refractive elements, such as lenses or the like.
  • the optical element system is held by a stack of optical element modules including an optical element module 106 according to the invention with an optical element in the form of a lens 107.
  • Figure 2 and 3 show a schematic and not-to-scale sectional view and top view, respectively, of the optical element module 106.
  • the lens 107 has a substantially rotationally symmetric lens body 107.1 with a spherical surface 107.2 that defines an axis 107.3 of rotational symmetry herein referred to as the optical axis 107.3 of the lens 107.
  • the lens body 107.1 defines a radial direction R and a plane of main extension that are both substantially perpendicular to the optical axis 107.3.
  • the lens 107 is supported by a support structure 108 which in turn is connected to the other optical element modules of the optical projection unit 103.
  • the support structure 108 comprises a first holding structure 109 contacting the lens 107, an intermediate structure in the form of a first support ring 1 10 supporting the first holding structure 109 and a second holding structure 1 1 1 in turn supporting the intermediate structure 1 10.
  • the first holding structure 109 and the second holding structure 1 1 1 are arranged kinematically in series such that, for example, an alteration in the height (i.e. the dimension along the optical axis 107.3) of the first holding structure 109 does not influence the height of the second holding structure 11 1 and vice versa.
  • the first holding structure 109 comprises a plurality of first holding elements 109.1 as well as a plurality of second holding elements 109.2 (only one of each being shown in Figure 2 and 3, respectively, for reasons of clarity).
  • the first holding elements 109.1 and the second holding elements 109.2 contact a surface 107.4 (in the embodiment shown, the lower surface 107.4) of the lens 107.
  • Both, the first holding elements 109.1 and the second holding elements 109.2 are evenly distributed at the outer circumference of the lens 107.
  • a limitation to the outer circumference may not be necessary and an even distribution over the entire surface of the optical element (e.g. over the entire rear surface of the mirror) may be chosen.
  • Each of the first holding elements 109.1 exerts a first support force F1 on the lens 107 counteracting the gravitational force G acting on the lens 107, which, in the embodiment shown, acts in parallel to the optical axis 107.3.
  • each of the second holding elements 109.2 exerts a second support force F2 on the lens 107 counteracting the gravitational force G acting on the lens 107.
  • first and second support forces F1 and F2 act substantially in parallel to the gravitational force G.
  • first and second support forces F1 and F2 may have any other suitable orientation in space as long as they have a force component counteracting the gravitational force G in order to support the respective optical element.
  • each second holding element 109.2 comprises a passive resilient 109.4 element, such as a spring etc., exerting said second support force F2 on the lens 107.
  • the passive second support force F2 may be adjusted by providing suitable adjustment means, such as adjustment screws or the like, allowing the adjustment of the pretension of the resilient element.
  • the first and second support forces F1 and F2 as well as the gravitational force G act on the lens 107 at different locations such that, as a function of the material properties of the lens 107, a certain deformation of the lens 107 (i.e. a certain deviation from the nominal geometry of the lens 107) arises.
  • a certain deformation of the lens 107 i.e. a certain deviation from the nominal geometry of the lens 107 arises.
  • certain imaging errors, such as wavefront aberrations etc., of the optical projection unit 103 may be at least partly compensated or corrected as will be explained in further detail below.
  • each first holding element 109.1 comprises deformation adjusting device in the form of an active first actuator 109.3 supported on the first support ring 1 10.
  • the first actuator 109.3 adjustably generates the respective first support force F1 exerted by the respective first holding element 107.1 on the lens 107.
  • the first actuator 109.3 may be of any suitable design and may be working, for example, according to an electric, an electromechanical, a pneumatic or a hydraulic working principle or any combination thereof.
  • the first actuator 109.3 may be a piezo-actuator, a voice coil motor etc.
  • the deformation of the lens 107 depends, among others, on the number and distribution of the first holding elements 109.1 as well as the number and distribution of the second holding elements 109.2. Any total number of first and second holding elements 109.1 , 109.2 greater than three may be chosen depending on the type of deformation desired. Preferably, at least three first holding elements 109.1 as well as at least three second holding elements 109.2 are provided in order to achieve proper and sufficiently even support to the lens 107.
  • the number second holding elements 109.2 is equal to or greater than the number of the first holding elements 109.2.
  • every n-th holding element may be a first holding element 109.1.
  • the number of first holding elements 109.2 is a function of the desired type of deformation of the lens 107 and, thus, a function of the type of imaging error to be corrected.
  • the number of first holding elements 109.2 corresponds to the maximum order of lens deformation desired.
  • the first support structure may comprise exclusively active holding elements adjustably generating support forces in order to provide the desired deformation of the optical element.
  • an imaging error capturing device 112 is provided.
  • This imaging error capturing device 1 12 captures one or more imaging errors of the optical element system of the optical projection unit 103.
  • an imaging error capturing device may use a part of the light of the illumination device 102 projected via all or part of the optical element system of the optical projection unit 103.
  • light from a separate light source may be used.
  • such a separate light source may operate at a wavelength which is identical to or different from the wavelength of the exposure light provided by the illumination device 102.
  • Such imaging error capturing devices are well known in the art such that no further details will be given here in this respect.
  • the imaging error capturing device 1 12 is connected to a control device 1 13 and provides an imaging error signal representative of the respective imaging error captured to the control device.
  • the control device 1 13, among others, is connected to the first actuators 107.3 of the first holding elements 107.1.
  • the control device 1 13, as a function of the respective imaging error signal, controls the respective first support force F1 of the respective first actuator 107.3 in order to provide a deformation of the lens 107 at least partially compensating the respective imaging error.
  • any alteration in the first support force F1 of the respective first holding element 109.1 causes an alteration of the second support force F2 of the respective second holding element 109.2 to reinstate the force equilibrium with the gravitational force G acting on the lens 107.
  • the second holding elements 109.2 comprise simple passive spring elements 109.4 (changing their length as a function of the force applied) this also leads to an alteration in the position of the lens 107.
  • the second support structure 11 1 is adapted to adjust the position of the first support ring 110 and, consequently, the position of the first support structure 109 as well as the position of the lens 107 held by the first support structure 109.
  • the second support structure 11 1 comprises a plurality of third holding elements 1 1 1.1 supported on an interface structure in the form of a second support ring 1 1 1.2.
  • the third holding elements 1 1 1.1 support the first support ring 1 10.
  • the second support ring 1 1 1.2 forms an interface of the second support structure 1 1 1 to and outer module housing 106.1 of the lens module 106.
  • Each third holding element 1 1 1.1 comprises a second actuator 1 11.3 adapted to adjust the length of the respective third holding element 1 11.1.
  • the second actuator 1 11.3 may be of any suitable design and may be working, for example, according to an electric, an electromechanical, a pneumatic or a hydraulic working principle or any combination thereof.
  • the second actuator 1 11.3 may be a piezo-actuator, a voice coil motor etc.
  • three holding element pairs 1 1 1.4 are provided, each comprising two third holding elements 1 11.1 arranged in the manner of a bipod.
  • the second support structure 11 1 supports the first support ring 1 10 in a statically determinate way in the manner of a hexapod.
  • the bipods 1 1 1.4 that are illustrated in a highly simplified manner in Figure 2 and 3 - may be used for generating a motion of the first support ring 1 10, thereby actively positioning the first support ring 1 10 and with it the first support structure 109 and the lens 107 in up to six degrees of freedom (DOF).
  • DOF degrees of freedom
  • any other suitable second support structures may be provided to support the first support structure and the lens.
  • position adjustment may be provided only in less than six degrees of freedom (DOF). For example, depending on the imaging error correction or compensation to be achieved, it may be sufficient that translational position adjustment parallel to the plane of main extension of the optical element (i.e. 2 DOF) and/or along the optical axis of the optical element (i.e. 3 DOF or 1 DOF) is provided.
  • DOF degrees of freedom
  • any other suitable angle of rotation may be chosen between the holding element pairs.
  • a position capturing device 114 In order to control the position adjustment operation of the second support structure 1 11 there is provided a position capturing device 114 capturing a position value representative of a relative position of the lens 107 with respect to a given reference.
  • the reference may be any suitable real component or virtual component (e.g. an optical plane etc.) of the exposure apparatus 101.
  • the position capturing device 1 14 provides a position signal representative of the position value to the control device 113.
  • the control device 1 13 in turn controls the second actuators 1 1 1.3 as a function of the position signal in order to properly position the lens 107 via the first support ring 1 10 and the first support structure at 109.
  • the position capturing device may be of any suitable design providing the desired position signal.
  • the first actuators 109.3 and the second actuators 11 1.3 may form part of the position capturing device 114, each providing a signal representative of the actual length of the respective first and third holding element and, thus, providing an information on the position of the lens 107 in relation to the interface structure 1 1 1.2.
  • the position of the lens 107 may be controlled via the control device 1 13 and the second actuators 1 1 1.3 as a function of an imaging error signal provided by the imaging error capturing device 1 12.
  • a position signal as described above may be used in addition to this imaging error signal.
  • the kinematically serial arrangement of the first support structure 109 and the second support structure 1 1 1 has the advantage that an alteration in the position of the lens 107 may be obtained via the second support structure 1 1 1 without influencing the deformation of the lens 107 provided via the first support structure 109. For example, it is possible to compensate thermal expansion related motion of the lens 107 without influencing the deformation of the lens provided by the first support structure 109.
  • the deformation control of the lens 107 and a position control of the lens 107 may be provided independently but contemporaneously, thereby allowing rapid reaction to altered boundary conditions within the exposure apparatus, e.g. during an exposure process, as well as providing a defined desired deformation and/or position alteration of the lens 107.
  • a hanging arrangement may be chosen for the first support structure and/or the second support structure. If a hanging arrangement is chosen for one of the first and second support structure, a very compact design may be achieved as can be seen from dashed contour 115 in Figure 2 indicating a hanging arrangement of the second support structure. Furthermore, it will be appreciated that, with other embodiments of the invention, more than one optical element may be held as described above in the respective optical element module. A very compact arrangement may be achieved if a mutually penetrating arrangement of the second support structures is chosen as it is disclosed in the International Patent Application Serial No. PCT/EP2005/005600 published as
  • optical exposure apparatus 101 of Figure 1 a preferred embodiment of an optical imaging method according to the invention comprising a method of supporting an optical element according to the invention may be executed as it will be described in the following with reference to Figure 1 to 4.
  • a step 1 16.1 the components of the optical exposure apparatus 101 including the mask 104.1 with a pattern, the substrate 105.1 , the optical projection unit 103 adapted to transfer an image of the pattern of the mask 104.1 onto the substrate 105.1 and comprising the optical element unit 106 as well as the illumination unit 102 adapted to illuminate the pattern of the mask 104.1 are provided.
  • a step 116.2 the components of the optical exposure apparatus 101 are put into a spatial relation to provide the configuration as it has been described in the context of Figures 1 to 3.
  • a step 1 16.3 the lens 107 is actively deformed and/or positioned via the first support structure 109 and the second support structure 1 11 as it has been described above.
  • a step 1 16.4 the illumination system 102 is then used to illuminate the pattern of the mask 104.1 , such that the optical projection unit 103 transfers an image of the pattern of the mask 104.1 onto the substrate 105.1 as it has been described above.
  • step 1 16.5 it is determined if the processes to be stopped. If this is not the case, e.g. if a further exposure step is to be performed, the method jumps back to step 1 16.3. This may be the case, for example, in a step and scan exposure process, where step 1 16.3 may be executed between subsequent scan processes. Otherwise the process stops in a step 1 16.6.
  • Figure 5 shows a schematic and not-to-scale sectional view of a further preferred optical element module 206 according to the invention holding a lens 207.
  • the optical element module 206 may replace the optical element module 106 in the exposure apparatus 101 of Figure 1.
  • the lens 207 of the optical element module 206 has a substantially rotationally symmetric lens body 207.1 with a spherical surface 207.2 that defines an axis 207.3 of rotational symmetry herein referred to as the optical axis 207.3 of the lens 207.
  • the lens body 207.1 defines a radial direction R and a plane of main extension that are both substantially perpendicular to the optical axis 207.3.
  • the lens 207 is supported by a support structure 208 which in turn is connected to the other optical element modules of the optical projection unit 103.
  • the support structure 208 comprises a first holding structure 209 contacting the lens 207, an intermediate structure in the form of a first support ring 210 supporting the first holding structure 209 and a second holding structure 21 1 in turn supporting the intermediate structure 210.
  • the first holding structure 209 and the second holding structure 21 1 are arranged kinematically in series such that, for example, an alteration in the height (i.e. the dimension along the optical axis 207.3) of the first holding structure 209 does not influence the height of the second holding structure 21 1 and vice versa.
  • the first holding structure 209 comprises a plurality of first holding elements 209.1 as well as a plurality of second holding elements 209.2 (only one of each being shown in Figure 2 and 3, respectively, for reasons of clarity).
  • Each of the first holding elements 209.1 has a contact element 209.5 rigidly contacting the lens 207, e.g. rigidly clamping the lens 207, at its outer circumference and a bipod 209.6 supporting the contact element 209.5.
  • Each of the second holding elements 209.2 contacts the lower surface 207.4 of the lens 207.
  • Both, the first holding elements 209.1 and the second holding elements 209.2 are evenly distributed at the outer circumference of the lens 207.
  • a limitation to the outer circumference may not be necessary and an even distribution over the entire surface of the optical element (e.g. over the entire back surface of the mirror) may be chosen.
  • Each of the first holding elements 209.1 exerts a first support force F1 on the lens 207 counteracting the gravitational force G acting on the lens 207, which, in the embodiment shown, acts in parallel to the optical axis 207.3.
  • each of the second holding elements 209.2 exerts a second support force F2 on the lens 207 counteracting the gravitational force G acting on the lens 207.
  • each second holding element 209.2 comprises a passive resilient 209.4 element, such as a spring etc., exerting said second support force F2 on the lens 207.
  • the passive second support force F2 may be adjusted by providing suitable adjustment means, such as adjustment screws or the like, allowing the adjustment of the pretension of the resilient element.
  • the first and second support forces F1 and F2 as well as the gravitational force G act on the lens 207 at different locations such that, as a function of the material properties of the lens 207, a certain deformation of the lens 207 (i.e. a certain deviation from the nominal geometry of the lens 207) arises.
  • certain imaging errors, such as wavefront aberrations etc., of the optical projection unit 203 may be at least partly compensated or corrected as will be explained in further detail below.
  • each first holding element 209.1 comprises deformation adjusting device in the form of two active first actuators 209.3 supported on the first support ring 210.
  • Each first actuator 209.3 is connected to a first end of a first lever 209.7 the second end of which is rigidly connected to the contact element 209.5.
  • One of the first levers 209.7 primarily extends substantially parallel to the radial direction R of the lens 207 while the other one of the first levers 209.7 primarily extends tangentially to the circumference of the lens 207.
  • the respective first actuator 209.3 via the associated first lever 209.7 adjustably generates the respective first support force F1 as well as a moment exerted via the respective contact element 209.5 on the lens 207.
  • the first actuator 209.3 may be of any suitable design and may be working, for example, according to an electric, an electromechanical, a pneumatic or a hydraulic working principle or any combination thereof.
  • the first actuator 209.3 may be a piezo-actuator, a voice coil motor etc.
  • the length and the elasticity of the respective first lever 209.7 is selected such that the first lever 209.7 provides a defined transmission of excursions between its first end and its second end via elastic deformation.
  • very fine adjustments of the contact element 209.5 may be obtained from via the first actuators 209.3.
  • the deformation of the lens 207 depends, among others, on the number and distribution of the first holding elements 209.1 as well as the number and distribution of the second holding elements 209.2. Any total number of first and second holding elements 209.1 , 209.2 greater than three may be chosen depending on the type of deformation desired. Preferably, at least three first holding elements 209.1 as well as at least three second holding elements 209.2 are provided in order to achieve proper and sufficiently even support to the lens 207.
  • the number second holding elements 209.2 is equal to or greater than the number of the first holding elements 209.2.
  • every n-th holding element may be a first holding element 209.1.
  • the number of first holding elements 209.2 is a function of the desired type of deformation of the lens 207 and, thus, a function of the type of imaging error to be corrected.
  • the number of first holding elements 209.2 corresponds to the maximum order of lens deformation desired.
  • the first support structure may comprise exclusively active holding elements adjustably generating support forces in order to provide the desired deformation of the optical element.
  • the imaging error capturing device 1 12 is used to capture one or more imaging errors of the optical element system of the optical projection unit 103 as it has been described above in the context of the first embodiment.
  • the imaging error capturing device 1 12 again provides an imaging error signal representative of the respective imaging error captured to the control device 1 13.
  • the control device 1 13, among others, is now connected to the first actuators 207.3 of the first holding elements 207.1.
  • the control device 1 13, as a function of the respective imaging error signal, controls the respective first support force F1 and the moment exerted on the lens 207 by the respective first actuator 207.3 in order to provide a deformation of the lens 207 at least partially compensating the respective imaging error.
  • the second support structure 21 1 is adapted to adjust the position of the first support ring 210 and, consequently, the position of the first support structure 209 as well as the position of the lens 207 held by the first support structure 209.
  • the second support structure 21 1 comprises a plurality of third holding elements
  • the third holding elements 21 1.1 support the first support ring 210.
  • Each third holding element 21 1.1 comprises a connecting element 21 1.5 connecting the first support ring 210 and a second support ring 211.2, two second actuators 21 1.3 supported on the second support ring 21 1.2 and two second levers 211.6 connecting the respective second actuator 211.3 and the connecting element 21 1.5.
  • Each second actuator 21 1.3 is connected to a first end of one of the second levers 21 1.6 the second end of which is rigidly connected to a central block 211.7 of the connecting element 211.5.
  • One of the second levers 21 1.6 primarily extends substantially parallel to the radial direction R of the lens 207 while the other one of the second levers 21 1.6 primarily extends tangentially to the circumference of the lens 207.
  • the respective second actuator 21 1.3 adjusts the orientation and location of the central block 21 1.7. Since the central block 21 1.7 is hinged to leaf spring elements 21 1.8 of the connecting element 21 1.5 the motion of the central block 21 1.7 causes a motion of the first support ring 210 and, thus, a position adjustment of the lens 207 in the manner as it has been disclosed in International Patent Application Serial No. PCT/EP2006/004337 mentioned initially.
  • the second actuator 21 1.3 may be of any suitable design and may be working, for example, according to an electric, an electromechanical, a pneumatic or a hydraulic working principle or any combination thereof.
  • the second actuator 211.3 may be a piezo-actuator, a voice coil motor etc.
  • the length and the elasticity of the respective second lever 21 1.6 is selected such that the second lever 21 1.6 provides a defined transmission of excursions between its first end and its second end via elastic deformation.
  • very fine adjustments of the connecting element 21 1.5 and, consequently, of the lens 207 may be obtained via the second actuators 21 1.3.
  • the second support structure 21 1 comprises three third holding elements 211.1 supporting the first support ring 210 in a statically determinate way. It will be appreciated that the third holding elements 211.1 may be used for generating a motion of the first support ring 210, thereby actively positioning the first support ring 210 and with it the first support structure 209 and the lens 207 in up to six degrees of freedom (DOF).
  • DOF degrees of freedom
  • any other suitable second support structures may be provided to support the first support structure and the lens.
  • position adjustment may be provided only in less than six degrees of freedom (DOF). For example, depending on the imaging error correction or compensation to be achieved, it may be sufficient that translational position adjustment parallel to the plane of main extension of the optical element (i.e. 2 DOF) and/or along the optical axis of the optical element (i.e. 3 DOF or 1 DOF) is provided.
  • DOF degrees of freedom
  • any other suitable angle of rotation may be chosen between the third holding elements.
  • a position capturing device 114 In order to control the position adjustment operation of the second support structure 211 there is provided a position capturing device 114 capturing a position value representative of a relative position of the lens 207 with respect to a given reference.
  • the reference may be any suitable real component or virtual component (e.g. an optical plane etc.) of the exposure apparatus 101.
  • the position capturing device 1 14 provides a position signal representative of the position value to the control device 113.
  • the control device 213 in turn controls the second actuators 21 1.3 as a function of the position signal in order to properly position the lens 207 via the first support ring 210 and the first support structure at 209.
  • the position capturing device 114 may be of any suitable design providing the desired position signal.
  • the first actuators 209.3 and the second actuators 21 1.3 may form part of the position capturing device de 1 14, each providing a signal representative of the actual length of the respective first and third holding element and, thus, providing an information on the position of the lens 207 in relation to the interface structure 21 1.2.
  • the position of the lens 207 may be controlled via the control device 1 13 and the second actuators 21 1.3 as a function of an imaging error signal provided by the imaging error capturing device 1 12.
  • a position signal as described above may be used in addition to this imaging error signal.
  • the kinematically serial arrangement of the first support structure 209 and the second support structure 21 1 has the advantage that an alteration in the position of the lens 207 may be obtained via the second support structure 21 1 without influencing the deformation of the lens 207 provided via the first support structure 209. For example, it is possible to compensate thermal expansion related motion of the lens 207 without influencing the deformation of the lens provided by the first support structure 209.
  • the deformation control of the lens 207 and a position control of the lens 207 may be provided independently but contemporaneously, thereby allowing rapid reaction to altered boundary conditions within the exposure apparatus, e.g. during an exposure process, as well as providing a defined desired deformation and/or position alteration of the lens 207.
  • a hanging arrangement may be chosen for the first support structure and/or the second support structure. If a hanging arrangement is chosen for one of the first and second support structure, a very compact design may be achieved as it has already been explained in the context of the first embodiment.
  • more than one optical element may be held as described above in the respective optical element module.
  • a very compact arrangement may be achieved if a mutually penetrating arrangement of the second support structures is chosen as it is disclosed in the International Patent Application Serial No. PCT/EP2005/005600 published as WO 2005/1 16773 A1 (Kugler et al.), the entire contents of which is incorporated herein by reference.
  • Figure 6 shows a schematic and not-to-scale sectional view of a further preferred optical element module 306 according to the invention holding a lens 307.
  • the optical element module 306 may replace the optical element module 106 in the exposure apparatus 101 of Figure 1.
  • the lens 307 of the optical element module 306 has a substantially rotationally symmetric lens body 307.1 with a spherical surface 307.2 that defines an axis 307.3 of rotational symmetry herein referred to as the optical axis 307.3 of the lens 307.
  • the lens body 307.1 defines a radial direction R and a plane of main extension that are both substantially perpendicular to the optical axis 307.3.
  • the lens 307 is supported by a support structure 308 which in turn is connected to the other optical element modules of the optical projection unit 103.
  • the support structure 308 comprises a first holding structure 309 contacting the lens 307, an intermediate structure in the form of a first support ring 310 supporting the first holding structure 309 and a second holding structure 31 1 in turn supporting the intermediate structure 310.
  • the first holding structure 309 and the second holding structure 31 1 are arranged kinematically in series such that, for example, an alteration in the dimensions of the first holding structure 309 does not influence the dimensions of the second holding structure 31 1 and vice versa.
  • the first holding structure 309 comprises a plurality of first holding elements 309.1 as well as a plurality of second holding elements 309.2 (only one of each being shown in Figure 2 and 3, respectively, for reasons of clarity).
  • the first holding elements 309.1 and the second holding elements 309.2 contact the lower surface 307.4 of the lens 307.
  • Both, the first holding elements 309.1 and the second holding elements 309.2 are evenly distributed at the outer circumference of the lens 307.
  • a limitation to the outer circumference may not be necessary and an even distribution over the entire surface of the optical element (e.g. over the entire back surface of the mirror) may be chosen.
  • Each of the first holding elements 309.1 exerts a first support force F1 on the lens 307 counteracting the gravitational force G acting on the lens 307, which, in the embodiment shown, acts in parallel to the optical axis 307.3.
  • each of the second holding elements 309.2 exerts a second support force F2 on the lens 307 counteracting the gravitational force G acting on the lens 307.
  • each second holding element 309.2 comprises a passive resilient 309.4 element in the form of a leaf spring exerting said second support force F2 on the lens 307. It will be appreciated that the passive second support force F2 may be adjusted by providing suitable adjustment means, such as adjustment screws or the like, allowing the adjustment of the pretension of the resilient element.
  • the first and second support forces F1 and F2 as well as the gravitational force G act on the lens 307 at different locations such that, as a function of the material properties of the lens 307, a certain deformation of the lens 307 (i.e. a certain deviation from the nominal geometry of the lens 307) arises.
  • a certain deformation of the lens 307 i.e. a certain deviation from the nominal geometry of the lens 307 arises.
  • certain imaging errors, such as wavefront aberrations etc., of the optical projection unit 303 may be at least partly compensated or corrected as will be explained in further detail below.
  • each first holding element 309.1 comprises deformation adjusting device in the form of an active first actuator 309.3 supported on the first support ring 310 and acting via a first lever 309.5 on a leaf spring 309.6 supporting the lens 307.
  • the first actuator 309.3 adjusts the respective first support force F1 exerted by the respective first holding element 307.1 on the lens 307.
  • the first actuator 309.3 may be of any suitable design and may be working, for example, according to an electric, an electromechanical, a pneumatic or a hydraulic working principle or any combination thereof.
  • the first actuator 309.3 may be a piezo-actuator, a voice coil motor etc.
  • the deformation of the lens 307 that may be obtained depends, among others, on the number and distribution of the first holding elements 309.1 as well as the number and distribution of the second holding elements 309.2. Any total number of first and second holding elements 309.1 , 309.2 greater than three may be chosen depending on the type of deformation desired.
  • at least three first holding elements 309.1 as well as at least three second holding elements 309.2 are provided in order to achieve proper and sufficiently even support to the lens 307.
  • a large number of second holding elements 309.2 is provided in order to achieve as even nominal support as possible to the lens 307.
  • the number second holding elements 309.2 is equal to or greater than the number of the first holding elements 309.2.
  • every n-th holding element may be a first holding element 309.1.
  • the number of first holding elements 309.2 is a function of the desired type of deformation of the lens 307 and, thus, a function of the type of imaging error to be corrected.
  • the number of first holding elements 309.2 corresponds to the maximum order of lens deformation desired.
  • the first support structure may comprise exclusively active holding elements adjustably generating support forces in order to provide the desired deformation of the optical element.
  • the imaging error capturing device 1 12 is used to capture one or more imaging errors of the optical element system of the optical projection unit 103 as it has been described above in the context of the first embodiment.
  • the imaging error capturing device 1 12 again provides an imaging error signal representative of the respective imaging error captured to the control device 1 13.
  • the control device 1 13, among others, is now connected to the first actuators 307.3 of the first holding elements 307.1.
  • the control device 1 13, as a function of the respective imaging error signal, controls the respective first support force F1 exerted on the lens 307 by the respective first holding element 309.1 in order to provide a deformation of the lens 307 at least partially compensating the respective imaging error.
  • any alteration in the first support force F1 of the respective first holding element 309.1 causes an alteration of the second support force F2 of the respective second holding element 309.2 to reinstate the force equilibrium with the gravitational force G acting on the lens 307. Since the second holding elements 309.2 comprise simple passive spring elements 309.4 (changing their shape as a function of the force applied) this also leads to an alteration in the position of the lens 307.
  • the second support structure 31 1 is adapted to adjust the position of the first support ring 310 and, consequently, the position of the first support structure 309 as well as the position of the lens 307 held by the first support structure 309.
  • the second support structure 31 1 comprises a plurality of third holding elements 31 1.1 connected to an interface structure in the form of a second support ring 31 1.2.
  • the third holding elements 31 1.1 hold the first support ring 310.
  • the second support ring 31 1.2 forms an interface of the second support structure 31 1 to and outer module housing 306.1 of the lens module 306.
  • Each third holding element 31 1.1 comprises a connecting element 311.5 cardanically hinged to the first support ring 310 and to the second support ring 31 1.2, a second actuator 31 1.3 supported on the second support ring 31 1.2 and a second lever 31 1.6 connecting the second actuator 31 1.3 and the connecting element 31 1.5.
  • the second actuator 31 1.3 is connected to a first end of the second lever 31 1.6 the second end of which is rigidly connected to the connecting element 31 1.5.
  • the second lever 31 1.6 is angled and has a one main extension parallel to the radial direction R of the lens 307.
  • the respective second actuator 31 1.3 adjusts the orientation and location of the connecting element 31 1.5. Since the connecting element 31 1.5 is hinged to the first support ring 310 and the second support ring 31 1.2 the motion of the connecting element of 31 1.5 causes a motion of the first support ring 310 and, thus, a position adjustment of the lens 307 in the manner as it has been disclosed in International Patent Application Serial No. PCT/EP2006/004337 mentioned initially.
  • the second actuator 31 1.3 may be of any suitable design and may be working, for example, according to an electric, an electromechanical, a pneumatic or a hydraulic working principle or any combination thereof.
  • the second actuator 311.3 may be a piezo-actuator, a voice coil motor etc.
  • the length and the elasticity of the respective second lever 31 1.6 is selected such that the second lever 31 1.6 provides a defined transmission of excursions between its first end and its second end via elastic deformation.
  • very fine adjustments of the connecting element 31 1.5 and, consequently, of the lens 307 may be obtained via the second actuators 31 1.3.
  • the second support structure 31 1 comprises three third holding elements 311.1 supporting the first support ring 310 in a statically determinate way. It will be appreciated that the third holding elements 311.1 may be used for generating a motion of the first support ring 310, thereby actively positioning the first support ring 310 and with it the first support structure 309 and the lens 307 in up to six degrees of freedom (DOF).
  • DOF degrees of freedom
  • any other suitable second support structures may be provided to support the first support structure and the lens.
  • position adjustment may be provided only in less than six degrees of freedom (DOF).
  • DOF degrees of freedom
  • the three third holding elements 311.1 are evenly distributed at the outer circumference of the first support ring 310, i.e.
  • a position capturing device 114 In order to control the position adjustment operation of the second support structure 311 there is provided a position capturing device 114 capturing a position value representative of a relative position of the lens 307 with respect to a given reference.
  • the reference may be any suitable real component or virtual component (e.g. an optical plane etc.) of the exposure apparatus 101.
  • the position capturing device 1 14 provides a position signal representative of the position value to the control device 113.
  • the control device 313 in turn controls the second actuators 31 1.3 as a function of the position signal in order to properly position the lens 307 via the first support ring 310 and the first support structure at 309.
  • the position capturing device 114 may be of any suitable design providing the desired position signal.
  • the first actuators 309.3 and the second actuators 31 1.3 may form part of the position capturing device de 1 14, each providing a signal representative of the actual length of the respective first and third holding element and, thus, providing an information on the position of the lens 307 in relation to the interface structure 31 1.2.
  • the position of the lens 307 may be controlled via the control device 1 13 and the second actuators 31 1.3 as a function of an imaging error signal provided by the imaging error capturing device 1 12.
  • a position signal as described above may be used in addition to this imaging error signal.
  • the kinematically serial arrangement of the first support structure 309 and the second support structure 31 1 has the advantage that an alteration in the position of the lens 307 may be obtained via the second support structure 31 1 without influencing the deformation of the lens 307 provided via the first support structure 309.
  • the deformation control of the lens 307 and a position control of the lens 307 may be provided independently but contemporaneously, thereby allowing rapid reaction to altered boundary conditions within the exposure apparatus, e.g. during an exposure process, as well as providing a defined desired deformation and/or position alteration of the lens 307.
  • the invention has been described solely in the context of embodiments where the optical axis of the optical element to be supported is substantially parallel to the direction of the gravitational force acting on the optical element.
  • any other orientation of the optical axis defined for the optical element with respect to the gravitational force may be given.
  • the invention has been described solely in the context of purely refractive systems, in particular, comprising spherical lenses.
  • the invention may be used in the context of exclusively reflective or diffractive optical systems as well as optical systems comprising any combination of reflecting elements, refractive and/or diffractive elements.
  • any type and design of optical element may be used.
  • optical elements with spherical, aspherical or planar optical surfaces may be used.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lens Barrels (AREA)

Abstract

L'invention concerne un module (106) d'élément optique qui comprend un élément optique (107) et une structure support (108) maintenant l'élément optique, la structure support comprenant une première structure de retenue (109), une structure intermédiaire (110) et une seconde structure de retenue (111). La première structure de retenue (109) touche l'élément optique (107) et permet d'introduire de manière réglable des déformations définies dans l'élément optique. La structure intermédiaire (110) maintient la première structure de retenue (109), et la seconde structure de retenue (111) maintient la structure intermédiaire (110) et permet de régler la position de celle-ci. Le module d'élément optique s'utilise dans des systèmes microlithographiques pour compenser des aberrations. Les structures de retenue sont placées en série d'un point de vue cinématique.
PCT/EP2007/053382 2007-04-05 2007-04-05 Module d'élément optique comportant une correction d'erreur d'imagerie et de position WO2008122313A1 (fr)

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Application Number Priority Date Filing Date Title
PCT/EP2007/053382 WO2008122313A1 (fr) 2007-04-05 2007-04-05 Module d'élément optique comportant une correction d'erreur d'imagerie et de position
TW097112150A TW200901280A (en) 2007-04-05 2008-04-03 Optical element module with imaging error and position correction
PCT/EP2008/054154 WO2008122626A2 (fr) 2007-04-05 2008-04-07 Module d'élément optique à correction de position et d'erreur d'imagerie

Applications Claiming Priority (1)

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DE102009054549A1 (de) 2008-12-11 2010-06-17 Carl Zeiss Smt Ag Gravitationskompensation für optische Elemente in Projektionsbelichtungsanlagen
DE102013225694A1 (de) * 2013-12-12 2014-12-24 Carl Zeiss Smt Gmbh Optisches modul
CN107436539A (zh) * 2016-05-25 2017-12-05 佳能株式会社 曝光装置以及物品的制造方法
WO2020108892A1 (fr) * 2018-11-29 2020-06-04 Carl Zeiss Smt Gmbh Module pour un appareil d'exposition par projection pour la lithographie à semi-conducteur avec un espaceur semi-actif, et procédé d'utilisation de l'espaceur semi-actif
WO2021234247A1 (fr) * 2020-05-20 2021-11-25 Airbus Defence And Space Sas Fixation d'un miroir sur un support
WO2022079015A1 (fr) * 2020-10-14 2022-04-21 Carl Zeiss Smt Gmbh Support pour élément optique

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CN103376662B (zh) * 2012-04-22 2015-05-13 上海微电子装备有限公司 一种非对称像差补偿装置
CN104459986B (zh) * 2013-09-13 2017-02-15 上海微电子装备有限公司 一种微动变形像差校正装置
DE102018210996A1 (de) * 2018-07-04 2020-01-09 Carl Zeiss Smt Gmbh Abstützung einer optischen einheit

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DE102009054549A1 (de) 2008-12-11 2010-06-17 Carl Zeiss Smt Ag Gravitationskompensation für optische Elemente in Projektionsbelichtungsanlagen
US8854603B2 (en) 2008-12-11 2014-10-07 Carl Zeiss Smt Gmbh Gravitation compensation for optical elements in projection exposure apparatuses
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DE102013225694A1 (de) * 2013-12-12 2014-12-24 Carl Zeiss Smt Gmbh Optisches modul
CN107436539A (zh) * 2016-05-25 2017-12-05 佳能株式会社 曝光装置以及物品的制造方法
CN107436539B (zh) * 2016-05-25 2023-09-22 佳能株式会社 曝光装置以及物品的制造方法
CN113167983A (zh) * 2018-11-29 2021-07-23 卡尔蔡司Smt有限责任公司 用于半导体光刻的具有半主动间隔件的投射曝光设备的模块以及使用该半主动间隔件的方法
TWI738112B (zh) * 2018-11-29 2021-09-01 德商卡爾蔡司Ｓｍｔ有限公司 用於半導體微影的具有半主動間隔件的投影曝光設備的模組以及使用該半主動間隔件的方法
WO2020108892A1 (fr) * 2018-11-29 2020-06-04 Carl Zeiss Smt Gmbh Module pour un appareil d'exposition par projection pour la lithographie à semi-conducteur avec un espaceur semi-actif, et procédé d'utilisation de l'espaceur semi-actif
CN113167983B (zh) * 2018-11-29 2023-12-26 卡尔蔡司Smt有限责任公司 用于半导体光刻的具有半主动间隔件的投射曝光设备的模块以及使用该半主动间隔件的方法
WO2021234247A1 (fr) * 2020-05-20 2021-11-25 Airbus Defence And Space Sas Fixation d'un miroir sur un support
FR3110713A1 (fr) * 2020-05-20 2021-11-26 Airbus Defence And Space Sas Fixation d’un miroir sur un support
AU2021277548B2 (en) * 2020-05-20 2022-12-15 Airbus Defence And Space Sas Fastening of a mirror to a support
US11822147B2 (en) 2020-05-20 2023-11-21 Airbus Defence And Space Sas Fastening of a mirror to a support
WO2022079015A1 (fr) * 2020-10-14 2022-04-21 Carl Zeiss Smt Gmbh Support pour élément optique

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WO2008122626A2 (fr) 2008-10-16
TW200901280A (en) 2009-01-01

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