WO2008120625A1 - 高繰返しパルス電源及びこの高繰返しパルス電源を備えた露光装置 - Google Patents
高繰返しパルス電源及びこの高繰返しパルス電源を備えた露光装置 Download PDFInfo
- Publication number
- WO2008120625A1 WO2008120625A1 PCT/JP2008/055670 JP2008055670W WO2008120625A1 WO 2008120625 A1 WO2008120625 A1 WO 2008120625A1 JP 2008055670 W JP2008055670 W JP 2008055670W WO 2008120625 A1 WO2008120625 A1 WO 2008120625A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- power supply
- pulse power
- pulse
- high repetition
- initial stage
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/53—Generators characterised by the type of circuit or by the means used for producing pulses by the use of an energy-accumulating element discharged through the load by a switching device controlled by an external signal and not incorporating positive feedback
- H03K3/57—Generators characterised by the type of circuit or by the means used for producing pulses by the use of an energy-accumulating element discharged through the load by a switching device controlled by an external signal and not incorporating positive feedback the switching device being a semiconductor device
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lasers (AREA)
- Generation Of Surge Voltage And Current (AREA)
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/594,097 US20100134776A1 (en) | 2007-03-30 | 2008-03-26 | High repetition pulse power source and exposure device with high repetition power source |
JP2009507477A JPWO2008120625A1 (ja) | 2007-03-30 | 2008-03-26 | 高繰返しパルス電源及びこの高繰返しパルス電源を備えた露光装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007095653 | 2007-03-30 | ||
JP2007-095653 | 2007-03-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008120625A1 true WO2008120625A1 (ja) | 2008-10-09 |
Family
ID=39808207
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/055670 WO2008120625A1 (ja) | 2007-03-30 | 2008-03-26 | 高繰返しパルス電源及びこの高繰返しパルス電源を備えた露光装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20100134776A1 (ja) |
JP (1) | JPWO2008120625A1 (ja) |
WO (1) | WO2008120625A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109980983A (zh) * | 2017-12-27 | 2019-07-05 | 核工业西南物理研究院 | 一种改良型脉冲高压电源的电源模块 |
CN109980958A (zh) * | 2017-12-27 | 2019-07-05 | 核工业西南物理研究院 | 用于高压长脉冲psm电源的子模块 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1197987A (ja) * | 1997-09-25 | 1999-04-09 | Meidensha Corp | パルス電源のスイッチング素子制御回路 |
JPH11145794A (ja) * | 1997-11-10 | 1999-05-28 | Meidensha Corp | パルス電源 |
JP2001320116A (ja) * | 2000-05-09 | 2001-11-16 | Sumitomo Heavy Ind Ltd | パルス放電回路 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5434456A (en) * | 1993-02-09 | 1995-07-18 | The Regents Of The University Of California | Lumped transmission line avalanche pulser |
US5914974A (en) * | 1997-02-21 | 1999-06-22 | Cymer, Inc. | Method and apparatus for eliminating reflected energy due to stage mismatch in nonlinear magnetic compression modules |
US6862307B2 (en) * | 2000-05-15 | 2005-03-01 | Lambda Physik Ag | Electrical excitation circuit for a pulsed gas laser |
-
2008
- 2008-03-26 WO PCT/JP2008/055670 patent/WO2008120625A1/ja active Application Filing
- 2008-03-26 JP JP2009507477A patent/JPWO2008120625A1/ja active Pending
- 2008-03-26 US US12/594,097 patent/US20100134776A1/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1197987A (ja) * | 1997-09-25 | 1999-04-09 | Meidensha Corp | パルス電源のスイッチング素子制御回路 |
JPH11145794A (ja) * | 1997-11-10 | 1999-05-28 | Meidensha Corp | パルス電源 |
JP2001320116A (ja) * | 2000-05-09 | 2001-11-16 | Sumitomo Heavy Ind Ltd | パルス放電回路 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109980983A (zh) * | 2017-12-27 | 2019-07-05 | 核工业西南物理研究院 | 一种改良型脉冲高压电源的电源模块 |
CN109980958A (zh) * | 2017-12-27 | 2019-07-05 | 核工业西南物理研究院 | 用于高压长脉冲psm电源的子模块 |
Also Published As
Publication number | Publication date |
---|---|
US20100134776A1 (en) | 2010-06-03 |
JPWO2008120625A1 (ja) | 2010-07-15 |
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