WO2008120430A1 - Sheet plasma apparatus and sheet-like plasma adjusting method - Google Patents

Sheet plasma apparatus and sheet-like plasma adjusting method Download PDF

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Publication number
WO2008120430A1
WO2008120430A1 PCT/JP2008/000140 JP2008000140W WO2008120430A1 WO 2008120430 A1 WO2008120430 A1 WO 2008120430A1 JP 2008000140 W JP2008000140 W JP 2008000140W WO 2008120430 A1 WO2008120430 A1 WO 2008120430A1
Authority
WO
WIPO (PCT)
Prior art keywords
plasma
sheet
pair
deforming
permanent magnets
Prior art date
Application number
PCT/JP2008/000140
Other languages
French (fr)
Japanese (ja)
Inventor
Motoi Okada
Kenji Yamakawa
Takeshi Furutsuka
Yoshiro Murashita
Original Assignee
Shinmaywa Industries, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinmaywa Industries, Ltd. filed Critical Shinmaywa Industries, Ltd.
Priority to JP2008528694A priority Critical patent/JP5261179B2/en
Publication of WO2008120430A1 publication Critical patent/WO2008120430A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/15—External mechanical adjustment of electron or ion optical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/54—Plasma accelerators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

A sheet plasma apparatus is provided with a plasma gun (10); an anode (51); a sheet plasma deforming tank (20) for deforming columnar plasma (22) into sheet-like plasma (27); a pair of permanent magnets (24A, 24B) arranged on the outer side of the sheet plasma deforming tank (20); a moving mechanism (70) for relatively moving the pair of permanent magnets to the center axis (22A) of the cylindrical plasma; a film forming tank (30); and a pair of sensors (S1, S2), which are arranged at positions sandwiching the center axis of the columnar plasma in the width direction of the sheet-like plasma, for detecting a physical quantity relating to plasma density; and a control apparatus (90). The control apparatus (90) moves the pair of permanent magnets (24A, 24B) by the moving mechanism (70) and adjusts the balance of the plasma density in the width direction of the sheet-like plasma, based on the physical quantity detected by the pair of sensors (S1, S2).
PCT/JP2008/000140 2007-03-28 2008-02-05 Sheet plasma apparatus and sheet-like plasma adjusting method WO2008120430A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008528694A JP5261179B2 (en) 2007-03-28 2008-02-05 Sheet plasma apparatus and sheet plasma adjustment method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-084850 2007-03-28
JP2007084850 2007-03-28

Publications (1)

Publication Number Publication Date
WO2008120430A1 true WO2008120430A1 (en) 2008-10-09

Family

ID=39808018

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/000140 WO2008120430A1 (en) 2007-03-28 2008-02-05 Sheet plasma apparatus and sheet-like plasma adjusting method

Country Status (3)

Country Link
JP (1) JP5261179B2 (en)
TW (1) TW200847856A (en)
WO (1) WO2008120430A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015086471A (en) * 2013-10-28 2015-05-07 ベイパー テクノロジーズ、インコーポレイテッド Low pressure arc plasma immersion coat vapor deposition and ion processing
US10056237B2 (en) 2012-09-14 2018-08-21 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5927499A (en) * 1982-04-12 1984-02-13 浦本　上進 Method of producing simple and highly efficient sheet plasma
JPH02101160A (en) * 1988-10-06 1990-04-12 Asahi Glass Co Ltd Ion plating method
JPH0565641A (en) * 1991-09-05 1993-03-19 Chugai Ro Co Ltd Vacuum evaporation device
JPH0665466U (en) * 1993-03-02 1994-09-16 中外炉工業株式会社 Ion plating device
JP2005179767A (en) * 2003-12-22 2005-07-07 Joshin Uramoto Sputtering-ion plating device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3350965B2 (en) * 1992-08-19 2002-11-25 日本ゼオン株式会社 Thermoplastic resin composition

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5927499A (en) * 1982-04-12 1984-02-13 浦本　上進 Method of producing simple and highly efficient sheet plasma
JPH02101160A (en) * 1988-10-06 1990-04-12 Asahi Glass Co Ltd Ion plating method
JPH0565641A (en) * 1991-09-05 1993-03-19 Chugai Ro Co Ltd Vacuum evaporation device
JPH0665466U (en) * 1993-03-02 1994-09-16 中外炉工業株式会社 Ion plating device
JP2005179767A (en) * 2003-12-22 2005-07-07 Joshin Uramoto Sputtering-ion plating device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
URAMOTO J.: "Daimenseki Ion Plating no Tameno Konoritsu Sheet Plasma", JOURNAL OF THE VACUUM SOCIETY OF JAPAN, vol. 25, no. 11, November 1982 (1982-11-01), pages 719 - 726 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10056237B2 (en) 2012-09-14 2018-08-21 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
JP2015086471A (en) * 2013-10-28 2015-05-07 ベイパー テクノロジーズ、インコーポレイテッド Low pressure arc plasma immersion coat vapor deposition and ion processing

Also Published As

Publication number Publication date
JPWO2008120430A1 (en) 2010-07-15
TW200847856A (en) 2008-12-01
JP5261179B2 (en) 2013-08-14

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