WO2008119514A1 - Procédé et dispositif de revêtement d'objets notamment de forme arrondie au moyen d'un procédé pvd et/ou cvd ou pacvd dans une installation à vide - Google Patents

Procédé et dispositif de revêtement d'objets notamment de forme arrondie au moyen d'un procédé pvd et/ou cvd ou pacvd dans une installation à vide Download PDF

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Publication number
WO2008119514A1
WO2008119514A1 PCT/EP2008/002493 EP2008002493W WO2008119514A1 WO 2008119514 A1 WO2008119514 A1 WO 2008119514A1 EP 2008002493 W EP2008002493 W EP 2008002493W WO 2008119514 A1 WO2008119514 A1 WO 2008119514A1
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WO
WIPO (PCT)
Prior art keywords
vacuum
objects
lock
channel
reservoir
Prior art date
Application number
PCT/EP2008/002493
Other languages
German (de)
English (en)
Inventor
Marc Horstink
Don Derckx
Thomas Krug
Roel Tietema
Original Assignee
Hauzer Techno Coating Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hauzer Techno Coating Bv filed Critical Hauzer Techno Coating Bv
Publication of WO2008119514A1 publication Critical patent/WO2008119514A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/223—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating specially adapted for coating particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Definitions

  • the present invention relates to a method for coating discrete objects, in particular rounded objects, such as balls or cylinders made of plastic, metal, glass or other materials, or cutting inserts for tools, by means of a PVD and / or CVD or PaCVD method a vacuum system.
  • PVD, CVD and PaCVD processes performed in vacuum equipment to produce coatings on plastic or metal articles are well known in the art.
  • European Patent 1116801 describes the mounting of PVD coatings on plastic articles, including those made of epoxy resin.
  • the PVD process includes not only the deposition of coatings by means of a magnetron sputtering process, but also coatings produced by means of arc evaporators, the use of separate arcing and magnetron sputtering cathodes being described in an annex in European Patent 403552 Bl.
  • European patent 459137 discloses a vacuum coating system in which a cathode is used both for the application of coatings by means of the magnetron sputtering method and for the application of coatings by means of arc evaporators. that can.
  • the system is also often used in the arc mode for a previous cleaning step and for the pretreatment of the object to be coated by means of ion etching.
  • ABS Arc Bond Sputter
  • the one cathode can be used both as Sputterkathode and as Are-cathode. It is also possible to use the ABS process with intermediate layers, as described, for example, in European Patent 603,486.
  • the magnetron cathode is in the so-called HIPIMS mode, i. operated with high-energy energy pulses. It is also possible to use the magnetron cathode in the HIPIMS mode for the coating of objects.
  • PVD coating processes under the action of plasma which is described, for example, in European Patent 0521045.
  • DLC layers are often made by a PaCVD method, ie, a plasma assisted CVD method, and this method is also well known in the art.
  • a PaCVD method ie, a plasma assisted CVD method
  • these method is also well known in the art.
  • the objects to be coated they are often arranged on a turntable and moved by means of this turntable several times through the vapor flow from the respective cathode or the respective cathodes. It is also known to rotate the objects not only about the axis of rotation of the turntable, but also about its own axis.
  • carrier devices can be arranged on the turntable, on each of which several objects are mounted, which are rotated during the coating process with the carrier device about the longitudinal axis of the carrier device and about the axis of rotation of the turntable.
  • Object of the present invention is to discrete objects, especially rounded objects, such as balls or cylinders, which may consist of plastic, metal, glass or other insulating materials such as ceramic, or cutting inserts for tools to coat evenly, wherein moreover the method should be economical and relatively quickly feasible and the system used should be inexpensive to implement.
  • the invention provides a method for coating discrete objects, in particular rounded discrete objects, such as balls or cylinders made of plastic, metal, glass or other materials, or cutting inserts, by means of a PVD and / or CVD or PaCVD method in a vacuum plant ge provided, with the special feature that the objects with the coating material in vapor form, if necessary, be brought into contact reactive and vibrational energy for rotation and possibly also levitated to achieve a uniform coating.
  • a device for coating discrete objects, in particular rounded objects, such as, for example, balls or cylinders made of plastic, metal, glass or other materials, or cutting inserts, by means of a PVD and / or CVD or PaCVD method.
  • a vacuum system with associated vacuum pump, at least one feed device for feeding an inert or reactive gas or a mixed gas into the vacuum chamber, and a plasma source for carrying out a plasma-assisted CVD method in the vacuum chamber and / or at least one cathode for carrying out a magnetron sputtering process, possibly a HIPIMS process and / or an arc evaporation process in the vacuum chamber, with the particular feature that the objects which are possibly reactive with the coating material in vapor form to bring into contact during the coating in a pot igen container or in an upwardly open channel in the vacuum chamber are and that a vibration generator, which brings the objects by vibration energy for rotation and possibly also for levitation, the container or the channel is assigned to coat the objects evenly.
  • the objects in particular spheres, can be brought at least for rotation and preferably also for simultaneous levitation, whereby the surface areas of the individual counterparts assume different orientations and therefore can be coated from different directions, whereby a uniform coating can be achieved.
  • a pot-like container such as an open frying pan or cake pan
  • vibratory energy so that the objects are made to rotate and, if necessary, float.
  • the batch size being determined by the amount of items that will fit in the pot-like container, such that when the required energy is added, the items will not cross the side edge of the container Container can jump or get lost.
  • the regulation of the introduced vibration can be adjusted by means of the energy and the frequency of the vibration.
  • the use of one or more ultrasonic generators for vibration generation has the frequency range between 20 KHz and 40 KHz proved favorable. However, quite different or subsequent frequency ranges can be applied according to the invention. In any case, in the case of an ultrasound generator, or an ultrasonic movement, frequencies in the range between 10 and 100 kHz can be considered, but without specifying a concrete restriction to this frequency range.
  • the ultrasonic generators are usually piezo elements which operate at an oscillation frequency and are normally operated at the frequency of the first or second harmonic.
  • the amplitude and movement of the substrates, ie the objects, can be controlled by the choice of the frequency (first or second harmonic) and the power.
  • the amplitudes of the movement of the container or channel, which can be resiliently supported, can be selected in the range from nm to cm.
  • the objects are placed in a groove, which is caused to vibrate by an energy input.
  • the articles can be fed to the gutter at one end and removed from the other end. de the gutter removed or delivered.
  • the process can be carried out either partially continuously or in a continuous process.
  • a partially continuous process is produced when the objects are fed from a storage container via a first vacuum sluice into one end of the upwardly open channel, by means of the introduced energy for levitation and optionally for progressive movement along the channel to the other end of the channel be and be removed there via a delivery device in the form of a second vacuum lock from the vacuum chamber.
  • This is a semi-continuous process, when the treatment is stopped to remove a treated batch of items from the gutter and deliver a new batch of items into the gutter without having to break the vacuum in the vacuum chamber.
  • the method can also be carried out as a continuous process, for example, when at least two first vacuum locks and at least two second vacuum locks are provided for the first reservoir and the dispenser, which are alternately opened and closed, whereby a continuous feed and a continuous Removal of the objects can be achieved with continuous coating thereof.
  • the device according to the invention is for coating in particular rounded discrete articles, such as plastic, metal, glass or other spheres 11, from a vacuum system 10 having a vacuum chamber 12 and an associated vacuum pump 14 which can be driven to produce the desired negative pressure in the vacuum chamber 12.
  • the reference numeral 16 indicates a valve that can be operated to disconnect the vacuum pump 14 from the vacuum chamber when needed.
  • the vacuum pump 14 may be formed, for example, as a turbo pump or a diffusion pump, wherein a diffusion pump may offer advantages.
  • a feed device 18 is provided, which allows an inert or reactive gas or a mixed gas consisting of an inert and a reactive gas feed into the vacuum chamber.
  • a plurality of such feed devices 18 may be provided to feed respective gases into the vacuum chamber.
  • a cathode 20 which is designed here as a magnetron cathode, provided in the upper wall region of the vacuum chamber 12 and serves by means of the associated magnetic system and control system (not shown) and by means of suitable electrical connections (e- b réelle not shown) of generating a metal vapor in the region of a channel 23, which, as will be explained below, contains the objects to be coated.
  • the details of the design of the corresponding, the magnetron containing the magnetron are not described here in detail, since they are well known and, for example, emerge from some of the above-mentioned writings.
  • a cathode 20 which is suitable for carrying out a magnetron sputtering process, which can also optionally be used to carry out a HIPIMS process
  • a cathode can be provided which is suitable for carrying out an arc evaporation process.
  • This possibility which is not shown in detail here, is well known to itself, for example, from the above-mentioned documents.
  • a PaCVD process by generating in the vacuum chamber a carbon-containing gas atmosphere, for example by feeding acetylene through the feed device 18 and by having a suitable plasma in the vacuum chamber in the region of the channel 23 is generated.
  • a DLC coating of the objects to be treated in the vacuum chamber can be achieved.
  • the generation of such layers by the PaCVD method is well known per se.
  • the system can be designed as a PVD and CVD system, i. so that both processes can be carried out in one plant, or can be realized only as a PVD plant or only as a CVD plant.
  • the reference numeral 22 indicates a reservoir containing a supply of the objects to be treated, here balls.
  • a first vacuum lock 24 with two valves 26, 28, the upper valve 26 being located between the outlet of the storage container and the inlet of the vacuum lock 24. is ordered and the lower valve 28 is positioned at the outlet of the vacuum lock, wherein the lock chamber 30 of the vacuum lock 24 between the two valves 26, 28 is formed.
  • the reservoir 22 is exposed to the ambient atmosphere and can be filled even with the objects to be treated, here balls, by means of a conveyor belt 32 or in any other way.
  • the lock chamber 30 can be filled with balls from the reservoir 22. Subsequently, the first valve 26 is closed and the second valve 28 is opened, whereby the balls that have accumulated in the lock chamber 30 are filled into a second reservoir 46 are the.
  • the second reservoir 34 in this embodiment has its own vacuum pump 35 which communicates via an associated valve 36 with the interior of the second reservoir 34 and via a line 37 also generates a corresponding vacuum in the lock chamber 38 of a second vacuum lock 40.
  • a mechanical agitator 42 Within the funnel-shaped second reservoir 34 is a mechanical agitator 42, which is constantly rotated by an electric motor 44 to continuously move the respective articles and thereby the withdrawal of located in the second reservoir 34 gases that adhere partially to the objects to enable.
  • the balls By opening the second valve 44 of the second lock device 40, the balls can then be filled into a third reservoir 46, which communicates via a pipeline 48 with the vacuum chamber 12, so that the same vacuum prevails in the third reservoir 46 as in FIG
  • the lower funnel-shaped output end 50 of the third reservoir 46 in turn is a valve 52 which can be opened to the supply of objects, in particular balls, in the groove 23 shown here, via a suitable piece of pipe 54 in to feed the left end 56 of the channel 23.
  • the valve 52 is closed again and the system can be put into operation, ie the channel 23 is caused to vibrate by means of the ultrasonic oscillators housed in the housing 58, so that the Balls collide and receive impulses, be brought by them to the rotation and the simultaneous hovering.
  • the channel 23 is open at the top, with the magnetron cathode 20 shown here being disposed opposite the open surface of the channel and the rotating and floating balls therefore being coated in the vapor flux of the magnetron cathode 20, due to the rotational movement of the articles and the floating state be coated on all surfaces.
  • the geometry of the channel 23 may be designed to be skewed, i. is inclined, whereby the objects or substrates (in this example, the ball 11) are transported by the introduced vibrations along the channel 23.
  • a special geometry or training may be provided, for example.
  • grooves or dams or webs transversely to the transport direction, i. are transverse to the longitudinal direction of the gutter.
  • the gas supply of argon or of reactive gas could also take place in the channel, whereby an additional turbulence or a more uniform turbulence is realized in the case of objects or substrates with low mass.
  • the introduction of the required energy will preferably be generated by ultrasonic vibrators attached to the channel 23.
  • the key advantage of using ultrasound as a source of vibration is the avoidance of moving parts in a vacuum. As a result, wear by fine particles, such as substrate material, at least largely avoided.
  • Orbital sander with a superimposed oscillating motion in the vertical direction.
  • the balls may also be caused to move along the channel 23, which would be useful in a continuous line plant, but not necessary in a batch or semi-continuous process.
  • the balls may be caused to move to the other end of the channel 23 by a slight inclination of the channel, where they fall into a recess 60 provided with an exit opening 62.
  • the individual balls such as 11 fall through this outlet opening 62 in the outlet funnel 64 and are removed from there via a third lock device 66 from the vacuum chamber.
  • This third lock device or vacuum lock 66 which is associated with the output device 68 of the vacuum chamber 12, has a first valve 70 and a second valve 72, wherein the first valve 70 above the lock chamber 74 of the lock device 66 and the second valve 72 below this lock chamber 74 are arranged.
  • the lock raum 74 itself is connected via the line 76 to the vacuum chamber 12.
  • the corresponding lock chamber 74 can be filled with the corresponding objects or balls 11. Subsequently, the first valve 70 is closed and the second valve 72 is opened, so that the balls fall into a fourth reservoir 78.
  • This fourth reservoir 78 is also under vacuum, either by means of a connection 80 to the vacuum pump 35, which is responsible for generating a vacuum in the second reservoir 34 or by a connection to the vacuum chamber 12.
  • a fourth lock device 82 also here with a first valve 84 and a second valve 86 and also here so that the lock chamber 88 of this fourth lock device 82 is also connected to the same vacuum system as the interior of the fourth reservoir 78th
  • the lock chamber 88 can again be filled with balls.
  • these balls can then be released, for example, be passed on to another conveyor belt 90, which leads to a reservoir, not shown, or so that they fall directly into such another reservoir ,
  • the purpose of the fourth reservoir 78 is to ensure, in combination with the third lock device 66, that the vacuum in the lock chamber 88 is at least substantially the same as in the vacuum chamber 12 itself and that there are no marked fluctuations in the pressure Vacuum occur in the vacuum chamber 12 when balls are removed from this. Under certain circumstances, if such fluctuations could otherwise be controlled or controlled, it would be possible to omit the fourth reservoir 78 with lock device 82.
  • Reference numerals 92 indicate pump-down valves, which may optionally be opened and closed by means of suitable control, for example to perform maintenance or other functions, such as, for example, purging with an inert gas. Further, after the venting of the discharge container 68 in this by means of the pumping valve associated therewith 92, a negative pressure generated in order to avoid pressure surges in the vacuum chamber 12. A similar situation applies to the container 34. After filling the container 22 with objects, the container 34 is provided with a preliminary negative pressure via the pumping valve 92 assigned to it, and subsequently the operating vacuum, ie a high vacuum in the container, is transmitted via the turbo-pump 35 34 or generated in the lock chamber 38.
  • the double vacuum valves 42, 44 between the containers 34 and 36 are designed so that the upper valve 42 should function like a gate. When it is opened, the balls can fall through it. If it is closed, it blocks the way.
  • the lower valve 44 serves as a high vacuum valve.
  • the circulation lines 37 and 48 serve to avoid virtual leaks.
  • the diameter of the vacuum-tight valve 44 is made larger than that of the upper valve 42.
  • the gate valve can be built as a gatevalve or ball valve.
  • the control of the lock between the container 34 and the container 46 may be as follows:
  • valve 44 an industrial high-vacuum valve can be used, possibly with sealing gas, because the diameter of this valve is dimensioned so that the objects or substrates can not touch or pollute the vacuum sealing surface. As a result, a reliable lock can be constructed.
  • the device 10 shown for example, glass beads 11 can be coated. Furthermore, it is possible to install a cooling tube in the vacuum chamber, for example arranged along the channel, in order to dissipate thermal energy during the coating. This too leads to increased productivity. It should be noted that the invention is by no means limited to the use of ultrasonic vibrators to produce the required vibration, but other vibration methods may be used to rotate the balls in a rotating and / or floating manner in the vapor flow of a cathode.
  • the vibration could finally be achieved by a mechanical drive, which gives the channel a movement that leads to the floating and turning of the balls, for example by the fact that the two ends of the channel are mounted on eccentric shafts, which are driven out of phase, for example can, wherein the eccentric height of the amplitude of the movement of the groove and the rotational speed of the eccentric waves determines the vibration frequency or movement frequency of the groove.
  • the gutter may also be easily permanently tilted so that the articles tend to move from the entry end to the exit end, the inclination to be chosen so as to provide, in combination with the pronounced vibration, the required average dwell time Gutter, ie the treatment time of the balls, can be kept constant, at a level that is appropriate for the thickness of the coating.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

La présente invention concerne un procédé et un dispositif de revêtement d'objets notamment de forme arrondie, par exemple de billes en plastique, métal, verre ou autres matières, au moyen d'un procédé PVD et/ou CVD ou PaCVD dans une installation à vide. L'invention se caractérise en ce que les objets sont mis en contact éventuellement réactif avec la matière de revêtement sous forme de vapeur, et mis en rotation et éventuellement et sustentation par apport d'énergie vibratoire pour obtenir un revêtement homogène.
PCT/EP2008/002493 2007-03-29 2008-03-28 Procédé et dispositif de revêtement d'objets notamment de forme arrondie au moyen d'un procédé pvd et/ou cvd ou pacvd dans une installation à vide WO2008119514A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP07006584 2007-03-29
EP07006584.2 2007-03-29
EP08000025.0 2008-01-02
EP08000025 2008-01-02

Publications (1)

Publication Number Publication Date
WO2008119514A1 true WO2008119514A1 (fr) 2008-10-09

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Application Number Title Priority Date Filing Date
PCT/EP2008/002493 WO2008119514A1 (fr) 2007-03-29 2008-03-28 Procédé et dispositif de revêtement d'objets notamment de forme arrondie au moyen d'un procédé pvd et/ou cvd ou pacvd dans une installation à vide

Country Status (1)

Country Link
WO (1) WO2008119514A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2625308A4 (fr) * 2010-10-07 2016-10-19 Rokstar Technologies Llc Systèmes de réacteur à combustible fluidisé mécaniquement et procédés convenant à la production de silicium
DE102020120107A1 (de) 2020-07-30 2022-02-03 Karlsruher Institut für Technologie (Körperschaft des öffentlichen Rechts) Elektrisch isolierender, korrosionsbeständiger Stoffverbund und Verfahren zu dessen Herstellung

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2374331A (en) * 1942-02-04 1945-04-24 Crown Cork & Seal Co Process of aluminum coating
US3192064A (en) * 1961-11-22 1965-06-29 Nat Res Corp Coating
US3755133A (en) * 1971-06-03 1973-08-28 Northern Electric Co Device for exposing small rollable bodies to sputtering
JPS5641375A (en) * 1979-09-13 1981-04-18 Matsushita Electric Ind Co Ltd Sputtering apparatus
JPH10298746A (ja) * 1997-04-25 1998-11-10 Ricoh Co Ltd 導電性薄膜被覆装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2374331A (en) * 1942-02-04 1945-04-24 Crown Cork & Seal Co Process of aluminum coating
US3192064A (en) * 1961-11-22 1965-06-29 Nat Res Corp Coating
US3755133A (en) * 1971-06-03 1973-08-28 Northern Electric Co Device for exposing small rollable bodies to sputtering
JPS5641375A (en) * 1979-09-13 1981-04-18 Matsushita Electric Ind Co Ltd Sputtering apparatus
JPH10298746A (ja) * 1997-04-25 1998-11-10 Ricoh Co Ltd 導電性薄膜被覆装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2625308A4 (fr) * 2010-10-07 2016-10-19 Rokstar Technologies Llc Systèmes de réacteur à combustible fluidisé mécaniquement et procédés convenant à la production de silicium
DE102020120107A1 (de) 2020-07-30 2022-02-03 Karlsruher Institut für Technologie (Körperschaft des öffentlichen Rechts) Elektrisch isolierender, korrosionsbeständiger Stoffverbund und Verfahren zu dessen Herstellung

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