WO2008108184A1 - Method for manufacturing functional film forming base - Google Patents

Method for manufacturing functional film forming base Download PDF

Info

Publication number
WO2008108184A1
WO2008108184A1 PCT/JP2008/053016 JP2008053016W WO2008108184A1 WO 2008108184 A1 WO2008108184 A1 WO 2008108184A1 JP 2008053016 W JP2008053016 W JP 2008053016W WO 2008108184 A1 WO2008108184 A1 WO 2008108184A1
Authority
WO
WIPO (PCT)
Prior art keywords
functional film
film forming
forming base
spin
manufacturing functional
Prior art date
Application number
PCT/JP2008/053016
Other languages
French (fr)
Japanese (ja)
Inventor
Haruki Kuramashi
Masahiro Hirukawa
Yoshinori Akamatsu
Original Assignee
Central Glass Company, Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Company, Limited filed Critical Central Glass Company, Limited
Publication of WO2008108184A1 publication Critical patent/WO2008108184A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/32—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with synthetic or natural resins
    • C03C17/322—Polyurethanes or polyisocyanates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3405—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of organic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2203/00—Other substrates
    • B05D2203/30—Other inorganic substrates, e.g. ceramics, silicon
    • B05D2203/35—Glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/75—Hydrophilic and oleophilic coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/76—Hydrophobic and oleophobic coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/116—Deposition methods from solutions or suspensions by spin-coating, centrifugation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Coating Apparatus (AREA)

Abstract

Provided is a method for manufacturing a functional film forming base having a spin film formation step. The spin film formation step includes: a step of arranging a weir on the base end portion; a step of supplying a coating liquid used to form a functional film on a base which is in a still state or rotating at a rotation speed lower than 10 rpm; and a step for spreading the coating liquid by the centrifugal force of the spin rotation.
PCT/JP2008/053016 2007-03-06 2008-02-22 Method for manufacturing functional film forming base WO2008108184A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-055254 2007-03-06
JP2007055254A JP2008212859A (en) 2007-03-06 2007-03-06 Method for manufacturing functional film forming substrate

Publications (1)

Publication Number Publication Date
WO2008108184A1 true WO2008108184A1 (en) 2008-09-12

Family

ID=39738080

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/053016 WO2008108184A1 (en) 2007-03-06 2008-02-22 Method for manufacturing functional film forming base

Country Status (2)

Country Link
JP (1) JP2008212859A (en)
WO (1) WO2008108184A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5602741B2 (en) * 2009-08-05 2014-10-08 三井化学株式会社 Polymerizable composition for optical material, optical material and method for producing optical material

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0341716A (en) * 1989-07-07 1991-02-22 Fujitsu Ltd Manufacture of semiconductor device
JPH05253528A (en) * 1992-03-16 1993-10-05 Asahi Optical Co Ltd Method and apparatus for applying liquid to square substrate by spin coater
JPH06334303A (en) * 1993-05-21 1994-12-02 Advantest Corp Method for forming photoresist layer in manufacture of thin film hybrid integrated circuit
JPH1147675A (en) * 1997-07-30 1999-02-23 Tokyo Electron Ltd Coating applicator and method therefor
JP2001015726A (en) * 1999-06-30 2001-01-19 Toshiba Corp X-ray planar detector
JP2003059823A (en) * 2001-06-07 2003-02-28 Tokyo Electron Ltd Film formation method and film-forming apparatus
JP2004114170A (en) * 2002-09-24 2004-04-15 Ricoh Co Ltd Method for manufacturing fine particle arranging product
JP2007167814A (en) * 2005-12-26 2007-07-05 Central Glass Co Ltd Manufacturing method of glass substrate having functional coating film

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0341716A (en) * 1989-07-07 1991-02-22 Fujitsu Ltd Manufacture of semiconductor device
JPH05253528A (en) * 1992-03-16 1993-10-05 Asahi Optical Co Ltd Method and apparatus for applying liquid to square substrate by spin coater
JPH06334303A (en) * 1993-05-21 1994-12-02 Advantest Corp Method for forming photoresist layer in manufacture of thin film hybrid integrated circuit
JPH1147675A (en) * 1997-07-30 1999-02-23 Tokyo Electron Ltd Coating applicator and method therefor
JP2001015726A (en) * 1999-06-30 2001-01-19 Toshiba Corp X-ray planar detector
JP2003059823A (en) * 2001-06-07 2003-02-28 Tokyo Electron Ltd Film formation method and film-forming apparatus
JP2004114170A (en) * 2002-09-24 2004-04-15 Ricoh Co Ltd Method for manufacturing fine particle arranging product
JP2007167814A (en) * 2005-12-26 2007-07-05 Central Glass Co Ltd Manufacturing method of glass substrate having functional coating film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5602741B2 (en) * 2009-08-05 2014-10-08 三井化学株式会社 Polymerizable composition for optical material, optical material and method for producing optical material

Also Published As

Publication number Publication date
JP2008212859A (en) 2008-09-18

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