WO2008102929A1

WO2008102929A1 - Continuous lithography apparatus and method using ultraviolet nanoimprinting

Info

Publication number: WO2008102929A1
Application number: PCT/KR2007/001942
Authority: WO
Inventors: Shinill Kang; Suho Ahn
Original assignee: Industry-Academic Cooperation Foundation, Yonsei University
Priority date: 2007-02-22
Filing date: 2007-04-20
Publication date: 2008-08-28
Also published as: KR100804734B1

Abstract

A continuous lithography apparatus performs a lithography process while performing a continuous transport. The apparatus can include an ultraviolet nanoimprinting part for performing an ultraviolet nanoimprinting on a photosensitive layer, formed on a conductive layer, using a patterned roll stamper, to form a pattern on the photosensitive layer; a first removing part for removing a residual layer of the photosensitive layer; a second removing part for removing an exposed portion of the conductive layer; and a third removing part for removing a remaining portion of the photosensitive layer, wherein the ultraviolet nanoimprinting part and the first to third removing parts are arranged along a route of the continuous transport. The apparatus can include an ultraviolet nanoimprinting part for performing an ultraviolet nanoimprinting on a photosensitive layer, formed on a conductive layer, using a patterned roll stamper, to form a pattern on the photosensitive layer; a first removing part for removing a residual layer of the photosensitive layer; a metal layer forming part for forming a metal layer on an exposed portion of the conductive layer; a third removing part for removing a remaining portion of the photosensitive layer; and a fourth removing part for removing an exposed portion of the conductive layer, wherein the ultraviolet nanoimprinting part, the first removing part, the metal layer forming part, the third removing part and the fourth removing part are arranged along a route of the continuous transport. A continuous lithography method performs a lithography process while performing a continuous transport.

Description

CONTINUOUS LITHOGRAPHY APPARATUS AND METHOD USING ULTRAVIOLET NANOIMPRINTING

Technical Field

[1] The present invention relates to a continuous lithography apparatus and method using ultraviolet nanoimprinting, particularly, by which highly densified and integrated patterns can be mass-fabricated at a low cost. Background Art

[2] Recently, in order to cope with high integration and high-speed signal transmission of semiconductor chips, demand for Chip On Board (COB) technology is gradually increasing, which replaces Chip-Sized Package (CSP) and wire bonding technologies. The COB technology allows semiconductor chips to be directly embedded on a Printed Circuit Board (PCB).

[3] In order to cope with the light-weight and compactness of communication devices and to realize Flexible Printed Circuit Board (FPCB) technology for a Liquid Crystal Display (LCD) driver and Chip On Film (COF) technology necessary to directly mount chips on an FPCB, the development of lithography technology, which is necessary for the fabrication of highly integrated and reliable PCBs to cope with the high integration of semiconductors, is required.

[4] In addition, in the lithography technology, it is required to mass-produce PCBs at a low cost.

[5] Conventional fabrication methods of a high integrated PCB or FPCB generally use standard semiconductor fabrication technology.

[6] FIGS. 1 to 8 are cross-sectional views illustrating a conventional method of manufacturing a Printed Circuit Board (PCB) using a dry film.

[7] First, as shown in FIG. 1, an insulating substrate 111 on which a conductive layer

112 is formed is prepared. For example, the insulating substrate 111 is made of an insulating resin, and the conductive layer 112 is made of a copper film.

[8] Then, as shown in FIG. 2, a dry film 120 consisting of a photoresist film 121 and a

Mylar film 122 is stacked on the conductive layer 112.

[9] Subsequently, as shown in FIG. 3, an art work film 130 with a printed pattern comes into close contact with the Mylar film 122, followed by ultraviolet irradiation.

[10] In this case, blank parts 131 of the art work film 130, which are not printed, allow the passage of ultraviolet rays, thereby forming cured parts 121a in the photoresist film 121. Black parts of the art work film 130, which are printed, do not allow the passage of ultraviolet rays, thereby forming uncured parts 121b in the photoresist film 121. [11] Next, as shown in FIG. 4, the art work film 130 is separated from the Mylar film

122.

[12] Then, as shown in FIG. 5, the Mylar film 122 is peeled off.

[13] Subsequently, as shown in FIG. 6, a development is performed to remove the uncured parts 121b of the photoresist film 121 using a developing agent. Here, only the cured parts 121a of the photoresist film 121 remain, thereby forming an etching resist pattern. [14] Next, as shown in FIG. 7, the resultant object is immersed into an etching solution, in which the cured parts 121a of the photoresist film act as an etching resist. Here, parts of the conductive layer 112 on which the etching resist does not exist, are removed. [15] Then, as shown in FIG. 8, the cured parts 121a of the photoresist film are peeled off from the conductive layer 112, to form a predetermined circuit pattern. [16] According to the conventional method of fabricating a circuit pattern of a PCB using a dry film, ultraviolet rays are irradiated after the art work film 130 comes into close contact with the Mylar film 122. The photoresist film 121 has poor resolution because the art work film 130 and the Mylar film 122 scatter the ultraviolet rays.

Therefore, this method is hardly applicable to a circuit pattern of a PCB which has to be highly dense and integrated. [17] Also, because in the conventional method using a dry film, there is a limit in reducing the thickness of the photoresist film 121, it is difficult to form circuit patterns which are more and more getting minute. [18] Furthermore, the conventional method using a dry film is disadvantageous in terms of productivity and cost since it requires many separate processes.

Disclosure of Invention

Technical Problem

[19] The present invention has been made to solve the foregoing problems with the conventional art and therefore an object of the present invention is to provide a lithography apparatus and method which can form highly densified and integrated patterns, in particular, highly densified and integrated circuit patterns. [20] Another object of the present invention is to provide a continuous lithography apparatus and method which can combine a continuous forming process with a lithography process that has been conventionally carried out in a batch process, thereby enabling mass production at a low cost. [21] The development of the continuous process technology of circuit boards can play a key role in the development of a number of electronic devices that are widely used in everyday life. Technical Solution

[22] According to an aspect of the present invention for realizing the above objects, there is provided a continuous lithography apparatus performing a lithography process while performing a continuous transport, comprising: an ultraviolet nanoimprinting part for performing an ultraviolet nanoimprinting on a photosensitive layer, formed on a conductive layer, using a patterned roll stamper, to form a pattern on the photosensitive layer; a first removing part for removing a residual layer of the photosensitive layer; a second removing part for removing an exposed portion of the conductive layer; and a third removing part for removing a remaining portion of the photosensitive layer, wherein the ultraviolet nanoimprinting part and the first to third removing parts are arranged along a route of the continuous transport.

[23] According to another aspect of the present invention for realizing the above objects, there is provided a continuous lithography apparatus performing a lithography process while performing a continuous transport, comprising: an ultraviolet nanoimprinting part for performing an ultraviolet nanoimprinting on a photosensitive layer, formed on a conductive layer, using a patterned roll stamper, to form a pattern on the photosensitive layer; a first removing part for removing a residual layer of the photosensitive layer; a metal layer forming part for forming a metal layer on an exposed portion of the conductive layer; a third removing part for removing a remaining portion of the photosensitive layer; and a fourth removing part for removing an exposed portion of the conductive layer, wherein the ultraviolet nanoimprinting part, the first removing part, the metal layer forming part, the third removing part and the fourth removing part are arranged along a route of the continuous transport.

[24] According to a further aspect of the present invention for realizing the above objects, there is provided a continuous lithography method performing a lithography process while performing a continuous transport, comprising: a step of performing an ultraviolet nanoimprinting on a photosensitive layer, formed on a conductive layer, using a patterned roll stamper, to form a pattern on the photosensitive layer; a step of removing a residual layer of the photosensitive layer; a step of removing an exposed portion of the conductive layer; and a step of removing a remaining portion of the photosensitive layer, wherein the steps are performed on a route of the continuous transport.

[25] According to a yet another aspect of the present invention for realizing the above objects, there is provided a continuous lithography method performing a lithography process while performing a continuous transport, comprising: a step of performing an ultraviolet nanoimprinting on a photosensitive layer, formed on a conductive layer, using a patterned roll stamper, to form a pattern on the photosensitive layer; a step of removing a residual layer of the photosensitive layer; a step of forming a metal layer on an exposed portion of the conductive layer; a step of removing a remaining portion of the photosensitive layer; and a step of removing an exposed portion of the conductive layer, wherein the steps are performed on a route of the continuous transport.

Advantageous Effects

[26] According to the present invention as set forth above, the continuous lithography apparatus and method using ultraviolet nanoimprinting can form finer patterns than conventional methods using a dry film, thereby producing highly densified and integrated circuit patterns. [27] Also, since the entire process can be carried out in a roll-to-roll fashion, it can be carried out with single equipment, thereby lowering fabrication cost and reducing process time. [28] Furthermore, since the entire process is carried out at room temperature, it is possible to save energy and time consumed in heating or cooling as well as to use various substrate materials. [29] Moreover, since the area where the photosensitive layer contact the patterned roll stamper and then is ultraviolet-cured is small compared to planar nanoimprinting process, conventional drawbacks such as poor uniformity and problems in separating the photosensitive layer from the patterned roll stamper do not take place and thus large- sized products can be manufactured.

Brief Description of the Drawings

[30] FIGS. 1 to 8 are cross-sectional views illustrating a conventional method of manufacturing a PCB; [31] FIG. 9 is a schematic view illustrating the layout of a continuous lithography apparatus according to a first embodiment of the present invention; [32] FIG. 10 is a detailed view illustrating parts of the continuous lithography apparatus shown in FIG. 9, which include an ultraviolet nanoimprinting part; [33] FIG. 11 is a flowchart illustrating a lithography process carried out by the continuous lithography apparatus shown in FIG. 9; [34] FIGS. 12 to 17 are cross-sectional views illustrating steps of the lithography process shown in FIG. 11 ; [35] FIG. 18 is a flowchart illustrating a lithography process according to a second embodiment of the present invention; [36] FIGS. 19 to 25 are cross-sectional views illustrating steps of the lithography process shown in FIG. 18; [37] FIG. 26 is a detailed view illustrating parts of a continuous lithography apparatus according to a third embodiment of the present invention, which include an ultraviolet nanoimprinting part;

[38] FIG. 27 is a detailed view illustrating parts of a continuous lithography apparatus according to a fourth embodiment of the present invention, which include an ultraviolet nanoimprinting part; and

[39] FIG. 28 is a detailed view illustrating parts of a continuous lithography apparatus according to a fifth embodiment of the present invention, which include an ultraviolet nanoimprinting part. Best Mode for Carrying Out the Invention

[40] Hereinafter the present invention will be described more fully with reference to the accompanying drawings, in which exemplary embodiments thereof are shown.

[41] FIG. 9 is a schematic view illustrating the layout of a continuous lithography apparatus according to a first embodiment of the present invention, and FIG. 10 is a detailed view illustrating parts of the continuous lithography apparatus shown in FIG. 9, which include an ultraviolet nanoimprinting part.

[42] As shown in the drawings, the lithography apparatus of FIG. 9 performs a lithography process while performs a continuous transport. The lithography apparatus includes an ultraviolet nanoimprinting part, a first removing part and a second removing part along a continuous transport route.

[43] The lithography apparatus also includes a release roll 401, a plurality of guide rolls

451, a photosensitive layer forming part, a heater 410 and a winding roll 402. Although not shown, a tension adjusting part can also be included.

[44] The ultraviolet nanoimprinting part includes a patterned roll stamper 321, a pressure regulating unit and an ultraviolet irradiating unit 350. The pressure regulating unit includes pressure rolls 331a. Each of the removing parts includes an etching unit 421, 431, 441, a washing unit 422, 432, 442 and a drying unit 423, 433, 443. The photosensitive layer forming part includes a dispensing unit 310 and coating rolls 341.

[45] The continuous lithography apparatus using ultraviolet roll nanoimprinting according to the present invention can carry out a lithography process with single equipment while carrying out a continuous transport in a roll-to-roll fashion such that at least one of steps can be carried out continuously. The release roll 401 unwinds an insulating substrate 211 on which a conductive layer 212 is formed, so that the insulating substrate can be transported downstream.

[46] The insulating substrate 211 of the present invention can be a flexible film type substrate made of, for example, polyimide, polyethylene terephthalate (PET), etc. or a rigid substrate made of, for example, glass, silicon, epoxy, etc. The flexible substrate is suitable for the insulating substrate as shown in FIGS. 9, 10, 27 and 28, and the rigid substrate is suitable for the insulating substrate as shown in FIG. 26.

[47] The photosensitive layer forming part is provided upstream of the ultraviolet nanoimprinting part. The photosensitive layer forming part applies a liquid photosensitive material (photopolymer) onto the conductive layer 212, thereby forming a photosensitive layer 221.

[48] The photosensitive layer forming part can form the photosensitive layer 221 on the conductive layer 212 by various methods such as roll coating, curtain coating and spray coating. In the curtain coating, a photosensitive material flows down in the shape of a curtain through a narrow slit, while the conductive layer 212 is transported under the curtain.

[49] FIGS. 9 and 10 show an exemplary embodiment of the photosensitive layer forming part, which is equipped with the dispensing unit 310 and the coating rolls 341.

[50] The dispensing unit 310 includes a resin container, which contains photosensitive resin therein, and a nozzle 311. The nozzle 311 ejects photosensitive material such as photosensitive resin onto the conductive layer 212. The coating rolls 341 contact and roll the applied photosensitive material, so that the photosensitive material is evenly coated on the conductive layer 212.

[51] The heater 410 heats the photosensitive resin before the applied photosensitive resin is cured by ultraviolet irradiation. Coating the liquid photosensitive material thinly on the entire surface of the conductive layer 212 enables a residual layer 221b which is inevitable in the nanoimprinting process to be thin. For this reason, the liquid photosensitive resin is heated sufficiently to reduce the viscosity thereof.

[52] Referring to the embodiment as shown in FIG. 9, the heater 410, for example, an infrared ray heater or a convection heater, is arranged upstream of the coating rolls 341 to heat the photosensitive material. However the present invention is not limited to this embodiment. For example, a heater may be placed inside a resin container of the dispensing unit 310 to heat the photosensitive material to a predetermined viscosity before the photosensitive material is dispensed on the conductive layer 212. A heater may be installed inside the coating rolls 341. An infrared or convection heater may be placed between the coating rolls 341 and the roll stamper 321. A heater may be installed inside the patterned roll stamper 321 to raise the temperature of the photosensitive resin.

[53] In other words, in the ultraviolet nanoimprinting process, the roll stamper 321 on which a predetermined pattern is engraved applies a predetermined amount of pressure to liquid resin such that the liquid resin fills into cavities on the roll stamper 321, and then ultraviolet rays are irradiated to the liquid resin filled in the cavities to photo-cure the liquid resin.

[54] During the photo-curing process, however, limited flowability of the resin leaves a thin layer on embossed portions of the roll stamper 321, thereby forming a residual layer 221b. The residual layer 221 has to be as thin as possible because a thicker residual layer worsens the uniformity of the pattern and more obstructs following process.

[55] In order that the residual layer 221b is thinly formed, the pressure applied by the patterned roll stamper 321 has to be sufficiently high or the viscosity of the liquid resin has to be low. However, if the pressure applied by the patterned roll stamper 321 is too high, the stamper 321 may be damaged, by which the more durable and expensive stamper 321 is required, or the insulating substrate 211 or the conductive layer 212 may be easily damaged and deformed. Therefore, it is preferable that the temperature of the liquid resin is raised but the pressure applied thereto is kept as low as possible. This can easily lower viscosity of the residual layer 221b to a low value near zero (0) only with a small amount of the pressure.

[56] The ultraviolet nanoimprinting part performs the ultraviolet nanoimprinting to the photosensitive layer 221, which is formed on the conductive layer 212, using the patterned roll stamper 321, thereby forming a pattern on the photosensitive layer 221.

[57] The ultraviolet nanoimprinting part includes the patterned roll stamper 321, the pressure regulating unit and the ultraviolet irradiating unit 350.

[58] The patterned roll stamper 321 has a predetermined pattern on its outer circumferential surface. The pattern is typically a circuit pattern and the lithography apparatus is devised to lithograph a circuit pattern of a PCB according to a preferred embodiment, which may not limit the scope of the present invention.

[59] The pressure regulating unit regulates pressure that the patterned roll stamper 321 applies to the photosensitive layer 221. The pressure regulating unit includes the pressure rolls 331a, and can include a ball-spring plunger (not shown). The ball spring plunger pushes the pressure rolls 331a toward the roll stamper 321 to adjust the gap between the patterned roll stamper 321 and the photosensitive layer 221, thereby regulating the pressure that the pattern roller 321 applies to the photosensitive layer 221.

[60] The ultraviolet irradiating unit 350 irradiates ultraviolet rays to the photosensitive layer 221, whereby the pattern is transferred to the photosensitive layer 221.

[61] The ultraviolet irradiating unit 350 includes a light source 352 and a reflecting shade 353. Preferably, the ultraviolet irradiating unit 350 includes a cold mirror and a hot mirror. The ultraviolet irradiating unit 350 can also include a condensing lens or a slit.

[62] A metal halide lamp, a mercury lamp, an ultraviolet fluorescent lamp, an ultraviolet

Light Emitting Diode (LED) lamp and the like can be used as the light source 352 of the ultraviolet irradiating unit 350. [63] The reflecting shade 353 directs ultraviolet rays to a specific portion of the photosensitive layer 221, thereby preventing the ultraviolet rays from being scattered and lost. The reflecting shade 353 can have various shapes such as a sphere, an ellipse, a parabola, a curve and an aspheric shape.

[64] The cold mirror transmits infrared rays but reflects ultraviolet rays. The cold mirror can be used as the reflecting shade 353 to reflect the ultraviolet rays toward the photosensitive layer 221. The hot mirror reflects infrared rays but transmit ultraviolet rays. The hot mirror can be arranged between the light source 352 and the photosensitive layer 221 to improve the efficiency of ultraviolet irradiation.

[65] The removing part removes the residual layer from the photosensitive layer. The residual layer contacted the embossed portions of the patterned roll stamper 321 to have the shape of a thin film. The first removing part can remove the residual layer 221b by, for example, Reactive Ion Etching (RIE), immersion in etchant, or etchant spraying.

[66] In this embodiment shown in FIG. 9, the first removing part includes an etching unit 421 for spraying etchant to etch the residual layer 221b, a washing unit 422 for washing off the etchant and a drying unit 423 for performing a drying after the washing.

[67] The second removing part removes exposed portions of the conductive layer 212 which are exposed after the removal of the residual layer 221b. The second removing part can remove the exposed portions of the conductive layer 212 which are not covered with the photosensitive layer, by various methods such as RIE, immersion in etchant, or etchant spraying.

[68] In this embodiment shown in FIG. 9, the second removing part includes an etching unit 431 for spraying etchant to etch the exposed portions of the conductive layer 212, a washing unit 432 for washing off the etchant and a drying unit 433 for performing a drying after the washing.

[69] The third removing part removes the remaining portions 221a of the photosensitive layer which covers the pattern of the conductive layer 212. The third removing part can remove the remaining portions 221a of the photosensitive layer 221 by, for example, ashing, immersion in etchant or etchant spraying.

[70] In this embodiment shown in FIG. 9, the third removing part includes an etching unit 441 for spraying etchant to remove the remaining portions 221a of the photosensitive layer which acted as an etching resist, a washing unit 442 for washing off the etchant and a drying unit 443 for performing a drying after the washing.

[71] As described above, the removing parts can use the immersion in etchant, which is preferable in a continuous process. For example, an etching bath can be provided on the transport route so that the transported object can be immersed in the etching bath while being continuously transported. As a result, the process speed can be improved.

[72] When the insulating substrate 211 on which the conductive layer 212 is formed is received from the upstream after the completion of the lithography process, the winding roll 402 winds the insulating substrate 211. The winding roll 402 helps the lithography apparatus as shown in FIG. 9 carry out the continuous process.

[73] As an alternative, a cutter (not shown) can be provided in place of the winding roll

402. When the insulating substrate 211 on which the conductive layer 212 is formed is received from the upstream, the cutter cuts the insulating substrate 211 to a predetermined length.

[74] The guide rolls 451, a plurality of which can be provided, serve to guide the transport of the insulating substrate 211 on which the conductive layer 212 is formed.

[75] In addition, the lithography apparatus shown in FIG. 9 can also have the tension adjusting part (not shown) to adjust the transport speed and the tension on the insulating substrate 211 on which the conductive layer 212 is formed. The tension adjusting part can include, for example, an idle roll.

[76] FIG. 11 is a flowchart illustrating a lithography process carried out by the continuous lithography apparatus shown in FIG. 9, and FIGS. 12 to 17 are cross- sectional views illustrating steps of the lithography process shown in FIG. 11.

[77] (1) SI lO in FIG. 11 and FIG. 12

[78] First, an insulating substrate 211 on which a conductive layer 212 is formed is prepared. Referring to FIG. 9, the release roll 401 releases the insulating substrate 211. As an alternative, the release roll 401 can release an insulating substrate 211 on which a conductive layer is not formed, and a conductive layer forming part can be provided between the release roll and the photosensitive layer forming part to coat a conductive material on the insulating substrate, thereby forming the conductive layer 212.

[79] The insulating substrate 211 is preferably made of a material that does not react with etchant in an etching step S 150 of removing exposed portions of the conductive layer 212 and an etching step S 160 of removing the remaining portions of a photosensitive layer 221.

[80] (2) S120 in FIG. 11 and FIG. 13

[81] Next, a liquid photosensitive resin is applied to the conductive layer 212 and the coating rolls 341 coat the liquid photosensitive resin thereon, thereby forming the photosensitive layer 221.

[82] (3) S130 in FIG. 11 and FIG. 14

[83] While the roll stamper 321 on which the pattern is engraved is rotating in contact with the photosensitive layer 221, the pattern (typically a circuit pattern) is mechanically transferred to the liquid photosensitive resin and then the liquid photosensitive resin is cured by ultraviolet rays which are irradiated by the ultraviolet ir- radiating unit 350. Thereafter, the photosensitive layer 221, which adheres to the photosensitive layer 212, is released from the patterned roll stamper 321.

[84] In order to improve the adhesiveness between the photosensitive layer 221 and the conductive layer 212, the conductive layer 212 is preferably pretreated.

[85] (4) S140 in FIG. 11 and FIG. 15

[86] Next, a residual layer 221b at predetermined portions of the photosensitive layer

221 which does not cover the pattern, is removed.

[87] As described above, the removal of the residual layer 221 of the photosensitive layer 221 is carried out, preferably, by RIE, immersion in an etchant which can etch the photosensitive resin, or spraying the etchant to the photosensitive layer 221.

[88] Here, the removal of the residual layer 221 has to be precisely time-controlled. The excessive removal can remove the photosensitive resin layer covering a circuit pattern. After the residual layer 212b is removed, the washing and drying steps are carried out.

[89] (5) S 150 in FIG. 11 and FIG. 16

[90] When the residual layer 221b is removed, portions of the conductive layer 212 which will become the circuit pattern are covered with the cured photosensitive resin and the other portions of the conductive layer 212 are exposed.

[91] The exposed portions of the conductive layer 212 are etched and removed, except for the portions of the conductive layer 212 which will become the circuit pattern.

[92] The step of removing the conductive layer 212 is carried out, preferably, by RIE, immersion in an etchant which can etch only the conductive resin layer 212 without reacting with the photosensitive resin and the insulating substrate 211, or spraying the etchant to the conductive layer 212. After the exposed portions of the conductive layer 212 are removed, washing and drying steps are carried out.

[93] (6) S160 in FIG. 11 and FIG. 17

[94] The remaining portions 221a of the photosensitive layer 221 existing on the pattern of the conductive layer 212 which acted as an etching resist, is removed.

[95] Here, the step of removing the photosensitive resin is carried out, preferably, by immersion in a solution which can remove only the photosensitive layer 221 without reacting with the conductive layer 212 and the insulating substrate 211, or spraying the solution to the remaining portions 221a of the photosensitive layer 221.

[96] FIG. 18 is a flowchart illustrating a lithography process according to a second embodiment of the present invention, and FIGS. 19 to 25 are cross-sectional views illustrating steps of the lithography process shown in FIG. 18.

[97] The conductive layer 212 of the present invention can be made of various conductive materials. Of course, the conductive layer can be made of a transparent conductive material such as Indium Tin Oxide (ITO) in order to ensure transparency for ultraviolet rays. [98] In this case, a metal layer 213 can be formed on a conductive layer 212 in order to increase the thickness of a conductive material layer or form a higher conductive material layer on the conductive layer 212.

[99] A lithography apparatus of this embodiment includes a metal layer forming part, a third removing part and a fourth removing part in place of the second removing part and the third removing part of the lithography apparatus as shown in FIG. 9 to 17.

[100] More specifically, an ultraviolet nanoimprinting part of the lithography apparatus of this embodiment performs ultraviolet nanoimprinting to a photosensitive layer 221, which is formed on the conductive layer 212, using the patterned roll stamper 321, thereby transferring a pattern on the photosensitive layer 221. In this case, however, the patterned roll stamper has an embossed pattern.

[101] The first removing part removes the residual layer 212b of the photosensitive layer.

[102] The metal layer forming part forms the metal layer 213 on the exposed portions of the conductive layer 212 by electroless plating or electroplating.

[103] The third removing part removes the remaining portions of the photosensitive layer

221.

[104] The fourth removing part removes the exposed portions of the conductive layer 212.

[105] FIG. 26 is a detailed view illustrating parts of a continuous lithography apparatus according to a third embodiment of the present invention, which include an ultraviolet nanoimprinting part.

[106] As described hereinbefore, the insulating substrate 211 of the present invention includes a flexible substrate as well as a rigid substrate. In the case of the latter, however, the photosensitive layer 221 contacts the patterned roll stamper 321 only at a small area.

[107] Therefore, it is necessary to make ultraviolet rays be irradiated only to the small area. For this purpose, the ultraviolet irradiating unit 350 may include a slit 354, which directs the ultraviolet rays only toward the photosensitive layer 221 having a pattern transferred thereto. This ensures that the photosensitive layer 221 can be cured only at the small area. As an alternative, a condensing cylinder lens can be provided in place of or together with the slits 354.

[108] Pressure is applied to the photosensitive layer 221 by the patterned roll stamper 321 and the two pressure rolls 331b. The slits 354 are placed between the pressure rolls 331b so that ultraviolet rays are irradiated only to a predetermined portion of the photosensitive layer 221, which is contacting the patterned roll stamper 321.

[109] Referring to FIG. 26, ultraviolet rays are irradiated only to the portion of the photosensitive layer 221, which is contacting the patterned roll stamper 321. As an alternative, ultraviolet rays can be irradiated to the downstream of the portion of the photosensitive layer 221 which is contacting the patterned roll stamper 321. However, ul- traviolet rays may not be irradiated to the upstream of the contacting portion because the liquid photosensitive layer 221 can be cured by the ultraviolet rays before it closely contacts the stamper 321.

[110] Preferably, the ultraviolet irradiating unit 350 includes the light source 352, the reflecting shade 353 having a shape such as a sphere, an ellipse, a parabola, a curve and an aspheric shape, a cold mirror, a hot mirror and the like, so that the maximum amount of ultraviolet rays can be transmitted through the slits 354.

[I l l] FIG. 27 is a detailed view illustrating parts of a continuous lithography apparatus according to a fourth embodiment of the present invention, which include an ultraviolet nanoimprinting part; and FIG. 28 is a detailed view illustrating parts of a continuous lithography apparatus according to a fifth embodiment of the present invention, which include an ultraviolet nanoimprinting part.

[112] In the foregoing embodiments as shown in FIGS. 9, 10 and 26, ultraviolet rays are irradiated to the photosensitive layer 221 through the insulating substrate 211 and the conductive layer 212. However, in the case where the insulating substrate 211 and/or the conductive layer 212 are made of a material that rarely transmits ultraviolet rays, the ultraviolet irradiating unit should be designed to irradiate ultraviolet rays to the photosensitive layer 221 from the side where the patterned roll stamper is located.

[113] For this purpose, it is preferable that an ultraviolet- transparent patterned roll stamper is used so that ultraviolet rays can be irradiated to the photosensitive layer 221 through the patterned roll stamper 322, 323.

[114] The patterned roll stamper can be designed as shown in FIG. 27 or FIG. 28. That is, as shown in FIG. 27, the light source 352 of the ultraviolet irradiating unit 350 can be placed out of the transparent patterned roll stamper 322, in which ultraviolet rays are irradiated to the photosensitive layer 221 through the patterned roll stamper 322. As shown in FIG. 28, the light source 352 can be placed inside the hollow, transparent patterned roll stamper 323, in which ultraviolet rays are irradiated to the photosensitive layer 221 through the wall of the patterned roll stamper 323.

[115] Here, the patterned roll stamper 322, 323 can be made of an ultraviolet- transparent material such as a glass and an ultraviolet-transparent resin. The circuit pattern of the patterned roll stamper can be formed by mechanical processing or laser processing of the roll or by winding a patterned film on the transparent roll.

Claims

[1] A continuous lithography apparatus performing a lithography process while performing a continuous transport, comprising: an ultraviolet nanoimprinting part for performing an ultraviolet nanoimprinting on a photosensitive layer, formed on a conductive layer, using a patterned roll stamper, to form a pattern on the photosensitive layer; a first removing part for removing a residual layer of the photosensitive layer; a second removing part for removing an exposed portion of the conductive layer; and a third removing part for removing a remaining portion of the photosensitive layer, wherein the ultraviolet nanoimprinting part and the first to third removing parts are arranged along a route of the continuous transport.

[2] A continuous lithography apparatus performing a lithography process while performing a continuous transport, comprising: an ultraviolet nanoimprinting part for performing an ultraviolet nanoimprinting on a photosensitive layer, formed on a conductive layer, using a patterned roll stamper, to form a pattern on the photosensitive layer; a first removing part for removing a residual layer of the photosensitive layer; a metal layer forming part for forming a metal layer on an exposed portion of the conductive layer; a third removing part for removing a remaining portion of the photosensitive layer; and a fourth removing part for removing an exposed portion of the conductive layer, wherein the ultraviolet nanoimprinting part, the first removing part, the metal layer forming part, the third removing part and the fourth removing part are arranged along a route of the continuous transport.

[3] The continuous lithography apparatus according to claim 1 or 2, wherein the conductive layer is formed on an insulating substrate.

[4] The continuous lithography apparatus according to claim 1 or 2, wherein the apparatus performs the lithography process while performing the continuous transport in a roll-to-roll fashion.

[5] The continuous lithography apparatus according to claim 1 or 2, wherein the conductive layer is formed on a flexible insulating substrate, and wherein the apparatus further comprises a release roll upstream of the ultraviolet nanoimprinting part, the release roll unwinding the insulating substrate on which the conductive layer is formed to be transported downstream.

[6] The continuous lithography apparatus according to claim 1 or 2, wherein the conductive layer is formed on a flexible insulating substrate, and wherein the apparatus further comprises a winding roll for winding the insulating substrate on which the conductive layer having gone through the lithography process is formed.

[7] The continuous lithography apparatus according to claim 1 or 2, wherein the conductive layer is formed on an insulating substrate, and wherein the apparatus further comprises a cutter for cutting the insulating substrate on which the conductive layer having gone through the lithography process is formed to a predetermined length.

[8] The continuous lithography apparatus according to claim 1 or 2, further comprising a photosensitive layer forming part upstream of the ultraviolet nanoimprinting part, the photosensitive layer forming part forming the photosensitive layer by applying a photosensitive material onto the conductive layer.

[9] The continuous lithography apparatus according to claim 8, wherein the photosensitive layer forming part forms the photosensitive layer by roll-coating, curtain-coating, or spray-coating the photosensitive material.

[10] The continuous lithography apparatus according to claim 8, wherein the photosensitive layer forming part includes a coating roll rolling the photosensitive material to uniformly coat the photosensitive material onto the conductive layer.

[11] The continuous lithography apparatus according to claim 8, further comprising a heater for heating the photosensitive material before the ultraviolet nanoimprinting part ultraviolet-cures the photosensitive material.

[12] The continuous lithography apparatus according to claim 11, wherein the heater is placed inside the patterned roll stamper.

[13] The continuous lithography apparatus according to claim 1 or 2, wherein the ultraviolet nanoimprinting part includes a pressure regulating unit for regulating pressure which the patterned roll stamper applies to the photosensitive layer.

[14] The continuous lithography apparatus according to claim 1 or 2, wherein the pattern is a circuit pattern.

[15] The continuous lithography apparatus according to claim 1 or 2, wherein the ultraviolet nanoimprinting part includes an ultraviolet irradiating unit for irradiating ultraviolet rays to the photosensitive layer on which the pattern has been formed to cure the photosensitive layer.

[16] The continuous lithography apparatus according to claim 15, wherein the ultraviolet irradiating unit comprises at least one of a cold mirror, a hot mirror, and a reflecting shade in a spherical shape, an elliptical shape, a parabolic shape, a curved shape, or an aspheric shape which directs ultraviolet rays to the photo- sensitive layer on which the pattern has been formed.

[17] The continuous lithography apparatus according to claim 15, wherein the conductive layer is formed on a rigid insulating substrate, and wherein the ultraviolet irradiating unit includes at least one of a condensing lens and a slit which direct ultraviolet rays to the photosensitive layer on which the pattern has been formed.

[18] The continuous lithography apparatus according to claim 15, wherein the conductive layer is formed on the insulating substrate, wherein at least one of the insulating substrate and the conductive layer is ultraviolet-opaque, wherein the patterned roll stamper is ultraviolet-transparent, and wherein the ultraviolet irradiating unit has a light source which irradiates ultraviolet rays to the photosensitive layer from a side where the patterned roll stamper is located.

[19] The continuous lithography apparatus according to claim 15, wherein the ultraviolet irradiating unit includes a light source inside the pattered roll stamper.

[20] The continuous lithography apparatus according to claim 1 or 2, wherein the removing parts perform the removing by any one of reactive ion etching, immersion in etchant, and etchant spraying.

[21] The continuous lithography apparatus according to claim 20, wherein at least one of the removing parts includes an etching bath for immersion on the route of the continuous transport.

[22] The continuous lithography apparatus according to claim 20, wherein the removing parts perform etchant- washing and drying after the removing.

[23] A continuous lithography method performing a lithography process while performing a continuous transport, comprising: a step of performing an ultraviolet nanoimprinting on a photosensitive layer, formed on a conductive layer, using a patterned roll stamper, to form a pattern on the photosensitive layer; a step of removing a residual layer of the photosensitive layer; a step of removing an exposed portion of the conductive layer; and a step of removing a remaining portion of the photosensitive layer, wherein the steps are performed on a route of the continuous transport.

[24] A continuous lithography method performing a lithography process while performing a continuous transport, comprising: a step of performing an ultraviolet nanoimprinting on a photosensitive layer, formed on a conductive layer, using a patterned roll stamper, to form a pattern on the photosensitive layer; a step of removing a residual layer of the photosensitive layer; a step of forming a metal layer on an exposed portion of the conductive layer; a step of removing a remaining portion of the photosensitive layer; and a step of removing an exposed portion of the conductive layer, wherein the steps are performed on a route of the continuous transport.