WO2008099471A1 - ｐＨを調整した次亜塩素酸水の製造方法 - Google Patents

ｐＨを調整した次亜塩素酸水の製造方法 Download PDF

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Publication number
WO2008099471A1
WO2008099471A1 PCT/JP2007/052590 JP2007052590W WO2008099471A1 WO 2008099471 A1 WO2008099471 A1 WO 2008099471A1 JP 2007052590 W JP2007052590 W JP 2007052590W WO 2008099471 A1 WO2008099471 A1 WO 2008099471A1
Authority
WO
WIPO (PCT)
Prior art keywords
electrolytic water
hypochlorous acid
adjustment
mixing
chlorine concentration
Prior art date
Application number
PCT/JP2007/052590
Other languages
English (en)
French (fr)
Inventor
Yusho Arai
Original Assignee
Sano, Youichi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sano, Youichi filed Critical Sano, Youichi
Priority to PCT/JP2007/052590 priority Critical patent/WO2008099471A1/ja
Publication of WO2008099471A1 publication Critical patent/WO2008099471A1/ja

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/467—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction
    • C02F1/4672—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electrooxydation
    • C02F1/4674—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electrooxydation with halogen or compound of halogens, e.g. chlorine, bromine
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/46—Apparatus for electrochemical processes
    • C02F2201/461—Electrolysis apparatus
    • C02F2201/46105—Details relating to the electrolytic devices
    • C02F2201/46115—Electrolytic cell with membranes or diaphragms
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00—Controlling or monitoring parameters in water treatment
    • C02F2209/06—Controlling or monitoring parameters in water treatment pH

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)

Abstract

次亜塩素酸水を大量生産するために、電解質水溶液を収納した中間室の両側にそれぞれ隔膜を介して電極板を配設した陽極室と陰極室とからなる電解水生成装置を用いて、塩化ナトリウムを含まない酸性電解水及びアルカリ性電解水の生成工程と、生成した酸性電解水に淡水を添加混合して有効塩素濃度が得られるようにする反応工程と、該反応工程で得られた有効塩素濃度を有する酸性電解水に前記生成工程で生成されたアルカリ水電解水を所要量添加混合するｐＨ調整工程とからなる製造方法としている。
PCT/JP2007/052590 2007-02-14 2007-02-14 ｐＨを調整した次亜塩素酸水の製造方法 WO2008099471A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/052590 WO2008099471A1 (ja) 2007-02-14 2007-02-14 ｐＨを調整した次亜塩素酸水の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/052590 WO2008099471A1 (ja) 2007-02-14 2007-02-14 ｐＨを調整した次亜塩素酸水の製造方法

Publications (1)

Publication Number Publication Date
WO2008099471A1 true WO2008099471A1 (ja) 2008-08-21

Family

ID=39689730

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/052590 WO2008099471A1 (ja) 2007-02-14 2007-02-14 ｐＨを調整した次亜塩素酸水の製造方法

Country Status (1)

Country Link
WO (1) WO2008099471A1 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009178710A (ja) * 2007-12-31 2009-08-13 Masaaki Arai 精密機器洗浄装置、空気清浄装置、製氷装置、内視鏡用洗浄装置、洗髪装置、水耕栽培装置および洗車装置
US8871278B2 (en) 2011-03-18 2014-10-28 Puricore, Inc. Stabilized hypohalous acid solutions
US9381214B2 (en) 2011-03-18 2016-07-05 Puricore, Inc. Methods for treating skin irritation
US11452778B2 (en) 2011-03-18 2022-09-27 Urgo Us, Inc. Stabilized hypohalous acid solutions
CN115667156A (zh) * 2021-04-22 2023-01-31 皇冠商会有限公司 次氯酸水制备用剂及其独立包装物和次氯酸水的制造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000202451A (ja) * 1999-01-11 2000-07-25 Chemicoat & Co Ltd 殺菌水の供給方法
JP2003199547A (ja) * 2002-01-08 2003-07-15 Komine Kikai Kk 食品洗浄装置及び食品洗浄方法
JP2003199548A (ja) * 2002-01-08 2003-07-15 Komine Kikai Kk 食品洗浄装置及び食品洗浄方法
JP2005058848A (ja) * 2003-08-08 2005-03-10 Spring:Kk 洗浄・消毒・創傷治癒に用いられる水の製造方法、その製造装置、及び洗浄・消毒・創傷治癒に用いられる水

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000202451A (ja) * 1999-01-11 2000-07-25 Chemicoat & Co Ltd 殺菌水の供給方法
JP2003199547A (ja) * 2002-01-08 2003-07-15 Komine Kikai Kk 食品洗浄装置及び食品洗浄方法
JP2003199548A (ja) * 2002-01-08 2003-07-15 Komine Kikai Kk 食品洗浄装置及び食品洗浄方法
JP2005058848A (ja) * 2003-08-08 2005-03-10 Spring:Kk 洗浄・消毒・創傷治癒に用いられる水の製造方法、その製造装置、及び洗浄・消毒・創傷治癒に用いられる水

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009178710A (ja) * 2007-12-31 2009-08-13 Masaaki Arai 精密機器洗浄装置、空気清浄装置、製氷装置、内視鏡用洗浄装置、洗髪装置、水耕栽培装置および洗車装置
JP4713625B2 (ja) * 2007-12-31 2011-06-29 優章 荒井 精密部品洗浄装置
US8871278B2 (en) 2011-03-18 2014-10-28 Puricore, Inc. Stabilized hypohalous acid solutions
US9381214B2 (en) 2011-03-18 2016-07-05 Puricore, Inc. Methods for treating skin irritation
US9392787B2 (en) 2011-03-18 2016-07-19 Puricore, Inc. Stabilized hypohalous acid solutions
US9414584B2 (en) 2011-03-18 2016-08-16 Puricore, Inc. Stabilized hypohalous acid solutions
US9925217B2 (en) 2011-03-18 2018-03-27 Realm Therapeutics, Inc. Methods for treating inflammation associated with allergic reaction
US10034942B2 (en) 2011-03-18 2018-07-31 Realm Therapeutics, Inc. Stabilized hypohalous acid solutions
US10576152B2 (en) 2011-03-18 2020-03-03 Urgo Us, Inc. Stabilized hypohalous acid solutions
US10702549B2 (en) 2011-03-18 2020-07-07 Urgo Us, Inc. Methods for treating skin irritation
US11452778B2 (en) 2011-03-18 2022-09-27 Urgo Us, Inc. Stabilized hypohalous acid solutions
CN115667156A (zh) * 2021-04-22 2023-01-31 皇冠商会有限公司 次氯酸水制备用剂及其独立包装物和次氯酸水的制造方法
CN115667156B (zh) * 2021-04-22 2024-02-06 皇冠商会有限公司 次氯酸水制备用剂及其独立包装物和次氯酸水的制造方法

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