WO2008094286A2 - Procédé et système de fabrication d'une nanostructure - Google Patents

Procédé et système de fabrication d'une nanostructure Download PDF

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Publication number
WO2008094286A2
WO2008094286A2 PCT/US2007/072322 US2007072322W WO2008094286A2 WO 2008094286 A2 WO2008094286 A2 WO 2008094286A2 US 2007072322 W US2007072322 W US 2007072322W WO 2008094286 A2 WO2008094286 A2 WO 2008094286A2
Authority
WO
WIPO (PCT)
Prior art keywords
open
substrate
opening
feature
forming
Prior art date
Application number
PCT/US2007/072322
Other languages
English (en)
Other versions
WO2008094286A3 (fr
Inventor
Jacques Faguet
Original Assignee
Tokyo Electron Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/468,526 external-priority patent/US7771790B2/en
Priority claimed from US11/468,566 external-priority patent/US7569491B2/en
Application filed by Tokyo Electron Limited filed Critical Tokyo Electron Limited
Publication of WO2008094286A2 publication Critical patent/WO2008094286A2/fr
Publication of WO2008094286A3 publication Critical patent/WO2008094286A3/fr

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00055—Grooves
    • B81C1/00071—Channels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
    • B01L2200/12—Specific details about manufacturing devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
    • B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
    • B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip

Abstract

L'invention concerne un procédé et un système pour fabriquer des structures nanométriques, telles que des canaux (c'est-à-dire, des nano-canaux) ou des trous d'interconnexion (c'est-à-dire, des nano-trous d'interconnexion). Une nanostructure ouverte est formée dans un substrat. Ensuite, un film de matériau conforme peut être déposé dans et sur la nanostructure en utilisant un premier état de processus de dépôts facultatif ; puis la nanostructure ouverte est fermée pour former une structure nanométrique fermée en utilisant un second état de processus de dépôt comprenant une ou plusieurs étapes de processus.
PCT/US2007/072322 2006-08-30 2007-06-28 Procédé et système de fabrication d'une nanostructure WO2008094286A2 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US11/468,566 2006-08-30
US11/468,526 2006-08-30
US11/468,526 US7771790B2 (en) 2006-08-30 2006-08-30 Method and system for fabricating a nano-structure
US11/468,566 US7569491B2 (en) 2006-08-30 2006-08-30 Method for enlarging a nano-structure

Publications (2)

Publication Number Publication Date
WO2008094286A2 true WO2008094286A2 (fr) 2008-08-07
WO2008094286A3 WO2008094286A3 (fr) 2008-12-31

Family

ID=39674663

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/072322 WO2008094286A2 (fr) 2006-08-30 2007-06-28 Procédé et système de fabrication d'une nanostructure

Country Status (1)

Country Link
WO (1) WO2008094286A2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102390804A (zh) * 2011-10-26 2012-03-28 合肥工业大学 动态纳米刮印结合等离子体聚合制作纳米通道的方法及系统

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003010289A2 (fr) * 2001-07-25 2003-02-06 The Trustees Of Princeton University Reseaux de nanocanaux, leurs preparation et utilisation dans l'analyse macromoleculaire a rendement eleve
US20050211545A1 (en) * 2004-03-26 2005-09-29 Cerio Frank M Jr Ionized physical vapor deposition (iPVD) process
US6987059B1 (en) * 2003-08-14 2006-01-17 Lsi Logic Corporation Method and structure for creating ultra low resistance damascene copper wiring

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003010289A2 (fr) * 2001-07-25 2003-02-06 The Trustees Of Princeton University Reseaux de nanocanaux, leurs preparation et utilisation dans l'analyse macromoleculaire a rendement eleve
US6987059B1 (en) * 2003-08-14 2006-01-17 Lsi Logic Corporation Method and structure for creating ultra low resistance damascene copper wiring
US20050211545A1 (en) * 2004-03-26 2005-09-29 Cerio Frank M Jr Ionized physical vapor deposition (iPVD) process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102390804A (zh) * 2011-10-26 2012-03-28 合肥工业大学 动态纳米刮印结合等离子体聚合制作纳米通道的方法及系统

Also Published As

Publication number Publication date
WO2008094286A3 (fr) 2008-12-31

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