WO2008084822A1 - 液体デバイス、液体デバイス製造装置および方法、並びに画像表示装置 - Google Patents
液体デバイス、液体デバイス製造装置および方法、並びに画像表示装置 Download PDFInfo
- Publication number
- WO2008084822A1 WO2008084822A1 PCT/JP2008/050165 JP2008050165W WO2008084822A1 WO 2008084822 A1 WO2008084822 A1 WO 2008084822A1 JP 2008050165 W JP2008050165 W JP 2008050165W WO 2008084822 A1 WO2008084822 A1 WO 2008084822A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- liquid device
- liquid
- film
- insulating
- image display
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/004—Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/12—Fluid-filled or evacuated lenses
- G02B3/14—Fluid-filled or evacuated lenses of variable focal length
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
- Formation Of Insulating Films (AREA)
Abstract
本発明は、高静電容量化を実現するとともに、絶縁破壊を抑制することができるようにする液体デバイス、液体デバイス製造装置および方法、並びに画像表示装置に関する。下部電極42と撥水膜44との間に、撥水膜44よりも絶縁性が高く、かつ、誘電率の高い絶縁膜43を新たに形成することにより、絶縁強度を補い、絶縁破壊を抑制する。絶縁膜43の素材は、より高絶縁性かつ高誘電率を有するものが望ましく、例えば、高分子系材料ならびに無機系材料が挙げられる。例えば、SOGはシリカ系の無機コーティング材であり、スピンコート法などでその溶液を被覆、成膜させ、比較的低温で焼成することによりガラス化させるものである。本発明は、液体デバイスに適用することができる。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP08703036A EP2103982A4 (en) | 2007-01-10 | 2008-01-10 | LIQUID DEVICE, DEVICE AND METHOD FOR MANUFACTURING THE LIQUID DEVICE, AND IMAGE DISPLAY DEVICE |
US12/522,675 US8040583B2 (en) | 2007-01-10 | 2008-01-10 | Liquid device, liquid device manufacturing apparatus and method, and image display device |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007002552A JP2008170631A (ja) | 2007-01-10 | 2007-01-10 | 液体デバイス、液体デバイス製造装置および方法 |
JP2007002553A JP2008170632A (ja) | 2007-01-10 | 2007-01-10 | 液体デバイス、液体デバイス製造装置および方法 |
JP2007-002553 | 2007-10-01 | ||
JP2007-002552 | 2007-10-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008084822A1 true WO2008084822A1 (ja) | 2008-07-17 |
Family
ID=39608710
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/050165 WO2008084822A1 (ja) | 2007-01-10 | 2008-01-10 | 液体デバイス、液体デバイス製造装置および方法、並びに画像表示装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8040583B2 (ja) |
EP (1) | EP2103982A4 (ja) |
WO (1) | WO2008084822A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101915989A (zh) * | 2010-07-28 | 2010-12-15 | 东南大学 | 一种电场力控制的液体透镜 |
US11217610B2 (en) | 2019-03-29 | 2022-01-04 | Sharp Kabushiki Kaisha | Method of manufacturing active matrix substrate |
US11264235B2 (en) | 2017-08-03 | 2022-03-01 | Sharp Kabushiki Kaisha | Active matrix substrate, microfluidic device provided with same, method for producing said active matrix substrate, and method for producing said microfluidic device |
US11577245B2 (en) | 2018-09-06 | 2023-02-14 | Sharp Kabushiki Kaisha | Electrowetting device |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI396893B (zh) * | 2009-10-22 | 2013-05-21 | Univ Nat Chiao Tung | 光電裝置 |
US20120293484A1 (en) * | 2010-01-28 | 2012-11-22 | Sharp Kabushiki Kaisha | Display element and electric device equipped with same |
US8693081B2 (en) | 2010-09-30 | 2014-04-08 | University Of Cincinnati | Electrofluidic imaging film, devices, and displays, and methods of making and using the same |
JP2012242495A (ja) | 2011-05-17 | 2012-12-10 | Japan Display East Co Ltd | 表示装置 |
JP2013037219A (ja) * | 2011-08-09 | 2013-02-21 | Sony Corp | 光学素子、光学素子アレイ、表示装置および電子機器 |
CA2854023A1 (en) | 2011-11-07 | 2013-05-16 | Illumina, Inc. | Integrated sequencing apparatuses and methods of use |
KR20130072502A (ko) * | 2011-12-22 | 2013-07-02 | 삼성디스플레이 주식회사 | 시차 배리어 패널 및 이를 포함하는 표시 장치 |
US8982444B2 (en) * | 2012-02-09 | 2015-03-17 | Amazon Technologies, Inc. | Electrowetting display device and manufacturing method thereof |
KR101949527B1 (ko) * | 2012-03-14 | 2019-02-18 | 리쿠아비스타 비.브이. | 전기 습윤 표시 장치 및 그 제조 방법 |
KR101925344B1 (ko) * | 2012-05-10 | 2018-12-05 | 리쿠아비스타 비.브이. | 전기 습윤 표시장치 |
KR101967472B1 (ko) | 2012-06-08 | 2019-04-09 | 리쿠아비스타 비.브이. | 전기습윤 표시 장치 및 이의 제조 방법 |
CN102937744B (zh) * | 2012-10-29 | 2014-12-03 | 京东方科技集团股份有限公司 | 一种狭缝光栅及制备方法、显示装置 |
EP2921901A4 (en) * | 2012-11-14 | 2016-04-27 | Nanobrick Co Ltd | FRAUD AND FAKE PREVENTION DEVICE |
TWI467228B (zh) * | 2012-11-30 | 2015-01-01 | Nat Univ Chung Hsing | An electric wetting element and its making method |
WO2015025659A1 (ja) * | 2013-08-20 | 2015-02-26 | 積水化学工業株式会社 | エレクトロウェッティング素子及びエレクトロウェッティングディスプレイ |
US9494790B1 (en) * | 2014-09-29 | 2016-11-15 | Amazon Technologies, Inc. | Electrowetting element and fluid |
CN108472620B (zh) | 2016-01-18 | 2020-06-09 | 夏普株式会社 | 电极基板以及其制造方法、电子设备 |
KR20180032908A (ko) * | 2016-09-23 | 2018-04-02 | 한국과학기술원 | 전기 습윤 방식의 액체 렌즈 어레이 및 그 제조 방법과, 이를 이용한 디스플레이 장치 |
EP3529643A1 (en) * | 2016-10-18 | 2019-08-28 | Corning Incorporated | Variable focus lens with integral optical filter and image capture device comprising the same |
WO2019165269A1 (en) * | 2018-02-23 | 2019-08-29 | Corning Incorporated | Method of separating a liquid lens from an array of liquid lenses |
WO2020203313A1 (ja) * | 2019-03-29 | 2020-10-08 | 株式会社ジャパンディスプレイ | 表示装置およびレンズアレイ |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004252444A (ja) * | 2003-01-31 | 2004-09-09 | Fuji Photo Film Co Ltd | 表示装置 |
JP2005233954A (ja) * | 2004-02-16 | 2005-09-02 | Commiss Energ Atom | 2つ以上の固体基板間で液滴の移動を制御するデバイス |
JP2006259040A (ja) | 2005-03-16 | 2006-09-28 | Sony Corp | 表示装置、表示制御方法、並びにプログラム |
JP2006285031A (ja) * | 2005-04-01 | 2006-10-19 | Sony Corp | 可変焦点レンズとこれを用いた光学装置、可変焦点レンズの製造方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008203282A (ja) * | 2005-06-03 | 2008-09-04 | Sharp Corp | 画像表示装置 |
US7697187B2 (en) * | 2006-09-29 | 2010-04-13 | Sony Corporation | Electrowetting device and varifocal lens, optical pickup device, optical recording/reproduction device, droplet operation device, optical element, zoom lens, imaging device, light modulating device, and display device using the same |
-
2008
- 2008-01-10 EP EP08703036A patent/EP2103982A4/en not_active Withdrawn
- 2008-01-10 WO PCT/JP2008/050165 patent/WO2008084822A1/ja active Application Filing
- 2008-01-10 US US12/522,675 patent/US8040583B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004252444A (ja) * | 2003-01-31 | 2004-09-09 | Fuji Photo Film Co Ltd | 表示装置 |
JP2005233954A (ja) * | 2004-02-16 | 2005-09-02 | Commiss Energ Atom | 2つ以上の固体基板間で液滴の移動を制御するデバイス |
JP2006259040A (ja) | 2005-03-16 | 2006-09-28 | Sony Corp | 表示装置、表示制御方法、並びにプログラム |
JP2006285031A (ja) * | 2005-04-01 | 2006-10-19 | Sony Corp | 可変焦点レンズとこれを用いた光学装置、可変焦点レンズの製造方法 |
Non-Patent Citations (4)
Title |
---|
GINDELE F. ET AL.: "Optical systems based on electro-wetting", MEMS, MOEMS, AND MICRO MACHINING, 29 April 2004 (2004-04-29) |
KANG H. ET AL.: "EWOD (electro-wetting-on-dielectric) actuated optical micro-mirror", PROCEEDINGS OF THE IEEE INTERNATIONAL CONFERENCE ON MICRO-ELECTRONIC MECHANICAL SYSTEMS (MEMS)'' - 19TH IEEE INTERNATIONAL CONFERENCE ON MICRO-ELECTRO MECHANICAL SYSTEMS, 2006 |
MOON, HYEJIN ET AL.: "Journal of Applied Physics", vol. 92, 1 October 2002, AMERICAN INSTITUTE OF PHYSICS, article "Low voltage electro-wetting on-dielectric" |
See also references of EP2103982A4 * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101915989A (zh) * | 2010-07-28 | 2010-12-15 | 东南大学 | 一种电场力控制的液体透镜 |
US11264235B2 (en) | 2017-08-03 | 2022-03-01 | Sharp Kabushiki Kaisha | Active matrix substrate, microfluidic device provided with same, method for producing said active matrix substrate, and method for producing said microfluidic device |
US11577245B2 (en) | 2018-09-06 | 2023-02-14 | Sharp Kabushiki Kaisha | Electrowetting device |
US11217610B2 (en) | 2019-03-29 | 2022-01-04 | Sharp Kabushiki Kaisha | Method of manufacturing active matrix substrate |
Also Published As
Publication number | Publication date |
---|---|
EP2103982A1 (en) | 2009-09-23 |
EP2103982A4 (en) | 2012-04-11 |
US20100053717A1 (en) | 2010-03-04 |
US8040583B2 (en) | 2011-10-18 |
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