WO2008081894A1 - コアシェル型ハイパーブランチポリマーの合成方法 - Google Patents

コアシェル型ハイパーブランチポリマーの合成方法 Download PDF

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Publication number
WO2008081894A1
WO2008081894A1 PCT/JP2007/075185 JP2007075185W WO2008081894A1 WO 2008081894 A1 WO2008081894 A1 WO 2008081894A1 JP 2007075185 W JP2007075185 W JP 2007075185W WO 2008081894 A1 WO2008081894 A1 WO 2008081894A1
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WO
WIPO (PCT)
Prior art keywords
core
shell
hyperbranched polymer
type hyperbranched
radical polymerization
Prior art date
Application number
PCT/JP2007/075185
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English (en)
French (fr)
Inventor
Akinori Uno
Shinichiro Kabashima
Masahiro Sato
Mineko Horibe
Original Assignee
Lion Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lion Corporation filed Critical Lion Corporation
Priority to JP2008552163A priority Critical patent/JPWO2008081894A1/ja
Publication of WO2008081894A1 publication Critical patent/WO2008081894A1/ja

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C08F257/02—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00 on to polymers of styrene or alkyl-substituted styrenes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/03—Use of a di- or tri-thiocarbonylthio compound, e.g. di- or tri-thioester, di- or tri-thiocarbamate, or a xanthate as chain transfer agent, e.g . Reversible Addition Fragmentation chain Transfer [RAFT] or Macromolecular Design via Interchange of Xanthates [MADIX]

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Graft Or Block Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

　光リソグラフィーを中心としたナノファブリケションのためのポリマー素材として利用可能なコアシェル型ハイパーブランチポリマーを合成することを目的として、モノマーのリビングラジカル重合を経てコアシェル型ハイパーブランチポリマーを合成する際に、紫外線によりラジカルとなる官能基を有する開始剤モノマー用いてリビングラジカル重合をおこない、リビングラジカル重合によって合成された重合体をコア部とし、当該コア部の末端に酸分解性基および酸基を含むシェル部を形成することで、コアシェル型ハイパーブランチポリマーを合成するようにした。
PCT/JP2007/075185 2006-12-28 2007-12-27 コアシェル型ハイパーブランチポリマーの合成方法 WO2008081894A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008552163A JPWO2008081894A1 (ja) 2006-12-28 2007-12-27 コアシェル型ハイパーブランチポリマーの合成方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006355875 2006-12-28
JP2006-355875 2006-12-28

Publications (1)

Publication Number Publication Date
WO2008081894A1 true WO2008081894A1 (ja) 2008-07-10

Family

ID=39588576

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/075185 WO2008081894A1 (ja) 2006-12-28 2007-12-27 コアシェル型ハイパーブランチポリマーの合成方法

Country Status (2)

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JP (1) JPWO2008081894A1 (ja)
WO (1) WO2008081894A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009242787A (ja) * 2008-03-11 2009-10-22 Kyushu Univ ビタミンｂ１２修飾コアシェル型ハイパーブランチポリマーおよび脱ハロゲン化触媒
JP6028093B2 (ja) * 2013-05-07 2016-11-16 株式会社豊田自動織機 ポリマーとその製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001324813A (ja) * 2000-03-07 2001-11-22 Shin Etsu Chem Co Ltd 化学増幅ポジ型レジスト材料
WO2005061566A1 (ja) * 2003-12-22 2005-07-07 Lion Corporation ハイパーブランチポリマー及びその製造方法、並びに該ハイパーブランチポリマーを含有するレジスト組成物

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001324813A (ja) * 2000-03-07 2001-11-22 Shin Etsu Chem Co Ltd 化学増幅ポジ型レジスト材料
WO2005061566A1 (ja) * 2003-12-22 2005-07-07 Lion Corporation ハイパーブランチポリマー及びその製造方法、並びに該ハイパーブランチポリマーを含有するレジスト組成物

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009242787A (ja) * 2008-03-11 2009-10-22 Kyushu Univ ビタミンｂ１２修飾コアシェル型ハイパーブランチポリマーおよび脱ハロゲン化触媒
JP6028093B2 (ja) * 2013-05-07 2016-11-16 株式会社豊田自動織機 ポリマーとその製造方法

Also Published As

Publication number Publication date
JPWO2008081894A1 (ja) 2010-04-30

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