WO2008069930A2 - Flexible substrates having a thin-film barrier - Google Patents
Flexible substrates having a thin-film barrier Download PDFInfo
- Publication number
- WO2008069930A2 WO2008069930A2 PCT/US2007/024435 US2007024435W WO2008069930A2 WO 2008069930 A2 WO2008069930 A2 WO 2008069930A2 US 2007024435 W US2007024435 W US 2007024435W WO 2008069930 A2 WO2008069930 A2 WO 2008069930A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- barrier layer
- flexible substrate
- gpa
- modulus
- substrate
- Prior art date
Links
- 230000004888 barrier function Effects 0.000 title claims abstract description 222
- 239000000758 substrate Substances 0.000 title claims abstract description 144
- 239000010409 thin film Substances 0.000 title claims description 15
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- GCFDVEHYSAUQGL-UHFFFAOYSA-J fluoro-dioxido-oxo-$l^{5}-phosphane;tin(4+) Chemical compound [Sn+4].[O-]P([O-])(F)=O.[O-]P([O-])(F)=O GCFDVEHYSAUQGL-UHFFFAOYSA-J 0.000 claims description 11
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- KAMGYJQEWVDJBD-UHFFFAOYSA-N bismuth zinc borate Chemical compound B([O-])([O-])[O-].[Zn+2].[Bi+3] KAMGYJQEWVDJBD-UHFFFAOYSA-N 0.000 claims description 3
- 238000010549 co-Evaporation Methods 0.000 claims description 3
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- GEZAUFNYMZVOFV-UHFFFAOYSA-J 2-[(2-oxo-1,3,2$l^{5},4$l^{2}-dioxaphosphastannetan-2-yl)oxy]-1,3,2$l^{5},4$l^{2}-dioxaphosphastannetane 2-oxide Chemical compound [Sn+2].[Sn+2].[O-]P([O-])(=O)OP([O-])([O-])=O GEZAUFNYMZVOFV-UHFFFAOYSA-J 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
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- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 description 2
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- 229910052681 coesite Inorganic materials 0.000 description 2
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- FPHIOHCCQGUGKU-UHFFFAOYSA-L difluorolead Chemical compound F[Pb]F FPHIOHCCQGUGKU-UHFFFAOYSA-L 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/122—Silica-free oxide glass compositions containing oxides of As, Sb, Bi, Mo, W, V, Te as glass formers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/14—Silica-free oxide glass compositions containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/23—Silica-free oxide glass compositions containing halogen and at least one oxide, e.g. oxide of boron
- C03C3/247—Silica-free oxide glass compositions containing halogen and at least one oxide, e.g. oxide of boron containing fluorine and phosphorus
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/873—Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/311—Flexible OLED
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/851—Division of substrate
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/23—Sheet including cover or casing
- Y10T428/239—Complete cover or casing
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24777—Edge feature
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Optics & Photonics (AREA)
- Electroluminescent Light Sources (AREA)
- Laminated Bodies (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009539287A JP2010511975A (en) | 2006-11-30 | 2007-11-26 | Flexible substrate with thin film barrier |
EP07870912A EP2087538A2 (en) | 2006-11-30 | 2007-11-26 | Flexible substrates having a thin-film barrier |
KR1020157005225A KR101603877B1 (en) | 2006-11-30 | 2007-11-26 | Flexible substrates having a thin-film barrier |
CN2007800436517A CN101542771B (en) | 2006-11-30 | 2007-11-26 | Flexible substrates having a thin-film barrier |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US87200806P | 2006-11-30 | 2006-11-30 | |
US60/872,008 | 2006-11-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2008069930A2 true WO2008069930A2 (en) | 2008-06-12 |
WO2008069930A3 WO2008069930A3 (en) | 2009-03-05 |
Family
ID=39327234
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2007/024435 WO2008069930A2 (en) | 2006-11-30 | 2007-11-26 | Flexible substrates having a thin-film barrier |
Country Status (7)
Country | Link |
---|---|
US (2) | US8115326B2 (en) |
EP (1) | EP2087538A2 (en) |
JP (1) | JP2010511975A (en) |
KR (2) | KR101589313B1 (en) |
CN (1) | CN101542771B (en) |
TW (1) | TWI389367B (en) |
WO (1) | WO2008069930A2 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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WO2012003416A1 (en) | 2010-07-02 | 2012-01-05 | 3M Innovative Properties Company | Barrier assembly |
US9878101B2 (en) | 2010-11-12 | 2018-01-30 | Sio2 Medical Products, Inc. | Cyclic olefin polymer vessels and vessel coating methods |
US9005748B1 (en) * | 2011-03-04 | 2015-04-14 | Insulating Coatings Of America, Inc. | Coating containing borosilicate flake glass |
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US9272095B2 (en) | 2011-04-01 | 2016-03-01 | Sio2 Medical Products, Inc. | Vessels, contact surfaces, and coating and inspection apparatus and methods |
US10061356B2 (en) * | 2011-06-30 | 2018-08-28 | Samsung Display Co., Ltd. | Flexible display panel and display apparatus including the flexible display panel |
US10347782B2 (en) | 2011-08-04 | 2019-07-09 | Corning Incorporated | Photovoltaic module package |
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US11116695B2 (en) | 2011-11-11 | 2021-09-14 | Sio2 Medical Products, Inc. | Blood sample collection tube |
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US10017849B2 (en) * | 2012-11-29 | 2018-07-10 | Corning Incorporated | High rate deposition systems and processes for forming hermetic barrier layers |
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3991234A (en) * | 1974-09-30 | 1976-11-09 | American Optical Corporation | Process for coating a lens of synthetic polymer with a durable abrasion resistant vitreous composition |
US5681666A (en) * | 1995-01-23 | 1997-10-28 | Duracell Inc. | Light transparent multilayer moisture barrier for electrochemical celltester and cell employing same |
EP1640154A1 (en) * | 2001-09-11 | 2006-03-29 | Dupont Teijin Films U.S. Limited Partnership | Heat-stabilised Poly(Ethylene Naphthalate) film for flexible electronic and opt-electronic devices |
EP1892775A2 (en) * | 2006-08-24 | 2008-02-27 | Corning Inc. | Tin phosphate barrier film, method and apparatus |
Family Cites Families (127)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3622439A (en) | 1968-05-23 | 1971-11-23 | Tee Pak Inc | Oxygen impermeable film laminate |
US3932693A (en) | 1970-10-19 | 1976-01-13 | Continental Can Company, Inc. | Laminated packaging film having low vapor and gas permeability |
US3795976A (en) * | 1972-10-16 | 1974-03-12 | Hitachi Ltd | Method of producing semiconductor device |
US3828960A (en) | 1972-11-10 | 1974-08-13 | Dow Chemical Co | Heat insulating container having plastic walls retaining vacuum |
US4077588A (en) | 1975-09-15 | 1978-03-07 | Hurst Gerald L | Permanently buoyant balloon |
US4314031A (en) | 1980-06-17 | 1982-02-02 | Corning Glass Works | Tin-phosphorus oxyfluoride glasses |
US4374391A (en) | 1980-09-24 | 1983-02-15 | Bell Telephone Laboratories, Incorporated | Device fabrication procedure |
US4702963A (en) | 1981-04-03 | 1987-10-27 | Optical Coating Laboratory, Inc. | Flexible polymer film with vapor impermeable coating |
DE3201482A1 (en) | 1982-01-20 | 1983-09-08 | Bayer Ag, 5090 Leverkusen | MULTI-LAYER AREA |
US4379070A (en) * | 1982-04-26 | 1983-04-05 | Corning Glass Works | Tin-phosphorus oxyfluoride glass containing aromatic organic compound |
DE3334845A1 (en) | 1983-09-27 | 1985-04-11 | Dow Chemical Handels- und Vertriebsgesellschaft mbH, 2610 Stade | COATING COMPOSITION AND THEIR USE FOR PRODUCING OXYGEN-SEALED COATINGS ON PLASTIC OBJECTS |
JPS60161146A (en) | 1984-01-31 | 1985-08-22 | 株式会社クラレ | Flexible gas stopping laminated packaging material having excellent resistance to fatigue from flexing |
FI73923C (en) | 1985-11-27 | 1991-01-01 | Wihuri Oy | Polyamide-containing multilayer film |
JP2632673B2 (en) | 1986-09-14 | 1997-07-23 | 東洋紡績 株式会社 | Electrode substrate for liquid crystal display panel |
US4908272A (en) | 1987-04-27 | 1990-03-13 | Mitsubishi Gas Chemical Company, Inc. | Gas-barrier multilayered structure |
AU616736B2 (en) | 1988-03-03 | 1991-11-07 | Asahi Glass Company Limited | Amorphous oxide film and article having such film thereon |
US4859513A (en) | 1988-05-09 | 1989-08-22 | International Paper Company | Oxygen impermeable leak free container |
DE68912929T2 (en) | 1989-04-26 | 1994-05-19 | Fujimori Kogyo Co | Liquid crystal display panel with optical phase shifter substrate. |
CA2027031A1 (en) | 1989-10-18 | 1991-04-19 | Loren A. Haluska | Hermetic substrate coatings in an inert gas atmosphere |
US5792550A (en) | 1989-10-24 | 1998-08-11 | Flex Products, Inc. | Barrier film having high colorless transparency and method |
US5183684A (en) | 1989-11-20 | 1993-02-02 | Dow Corning Corporation | Single and multilayer coatings containing aluminum nitride |
US5084356A (en) | 1990-04-20 | 1992-01-28 | E. I. Du Pont De Nemours And Company | Film coated with glass barrier layer with metal dopant |
US6524698B1 (en) | 1990-09-27 | 2003-02-25 | Helmuth Schmoock | Fluid impermeable foil |
US5089446A (en) | 1990-10-09 | 1992-02-18 | Corning Incorporated | Sealing materials and glasses |
US5110668A (en) | 1990-12-21 | 1992-05-05 | General Electric Company | Flexible laminate having copolyetherester adhesive |
SE468635B (en) | 1991-01-09 | 1993-02-22 | Tetra Alfa Holdings | PACKAGING MATERIAL FOR USE OF THE MATERIAL FOR PREPARATION OF CONTAINERS WITH GOOD OXYGEN PROPERTY CHARACTERISTICS |
SE502397C2 (en) | 1991-05-03 | 1995-10-16 | Tetra Laval Holdings & Finance | Packaging laminates with good sealing and barrier properties as well as packaging containers made by the packaging laminate |
DE4123127C2 (en) | 1991-07-12 | 1996-06-20 | Hoechst Ag | Multi-layer composite film with improved gas barrier effect |
JP3158667B2 (en) | 1991-08-01 | 2001-04-23 | セイコーエプソン株式会社 | Method of manufacturing liquid crystal display element and method of reproducing liquid crystal display element |
US5211995A (en) | 1991-09-30 | 1993-05-18 | Manfred R. Kuehnle | Method of protecting an organic surface by deposition of an inorganic refractory coating thereon |
EP0617665B1 (en) | 1991-12-18 | 1999-03-31 | Minnesota Mining And Manufacturing Company | Multilayered barrier structures |
US5306533A (en) | 1992-04-27 | 1994-04-26 | Combibloc, Inc. | Oxygen barrier container |
CA2106258C (en) | 1992-09-18 | 2003-11-04 | Gautam P. Shah | Moisture barrier film |
US5462779A (en) | 1992-10-02 | 1995-10-31 | Consorzio Ce.Te.V. Centro Tecnologie Del Vuoto | Thin film multilayer structure as permeation barrier on plastic film |
US5641559A (en) | 1992-10-23 | 1997-06-24 | Toyo Seikan Kaisha, Ltd. | Gas-tight laminated plastic film containing polymer of organosilicic compound |
US5567488A (en) | 1993-09-16 | 1996-10-22 | The Dow Chemical Company | Multilayer barrier film for transdermal drug delivery system and ostomy applications |
DE69430927T2 (en) | 1993-09-30 | 2003-02-06 | Toppan Printing Co Ltd | Gas impermeable composite material |
US6403176B1 (en) | 1993-12-08 | 2002-06-11 | Andre Patouraux | Packaging laminate for bags |
EP0701897B1 (en) | 1994-09-16 | 2001-04-18 | Cryovac, Inc. | Thermoplastic multilayer film for use in packaging water |
CA2160079A1 (en) | 1994-10-07 | 1996-04-08 | Frank Harry Bria | Lighter than air balloons |
DE4438359C2 (en) | 1994-10-27 | 2001-10-04 | Schott Glas | Plastic container with a barrier coating |
EP0744285B1 (en) | 1995-05-24 | 1999-12-15 | Cryovac, Inc. | Multilayer oxygen barrier packaging film |
DE69630892T2 (en) | 1995-12-20 | 2004-04-15 | Tetra Laval Holdings & Finance S.A. | METHOD FOR PRODUCING A MULTILAYER PACKAGING MATERIAL |
TW434301B (en) | 1996-01-30 | 2001-05-16 | Becton Dickinson Co | Non-ideal barrier coating composition comprising organic and inorganic materials |
TW352365B (en) | 1996-03-25 | 1999-02-11 | Teijin Ltd | Liquid crystal display element with a transparent electrode substrate and the transparent substrate |
FR2759755B1 (en) | 1997-02-17 | 1999-04-02 | Atochem Elf Sa | GAS WATERPROOF ELASTIC MEMBRANE AND HYDROPNEUMATIC ACCUMULATOR EQUIPPED WITH THIS MEMBRANE |
US6074717A (en) | 1997-07-29 | 2000-06-13 | Dayco Products, Inc. | Flexible hose having an aluminum barrier layer to prevent ingestion of oxygen |
JP3906325B2 (en) | 1997-10-09 | 2007-04-18 | テトラ ラバル ホールデイングス アンド ファイナンス エス エイ | Packaging laminate with gas and fragrance barrier properties |
US6465101B1 (en) | 1998-04-28 | 2002-10-15 | General Electric Company | Multilayer plastic articles |
CN1319729C (en) | 1998-07-24 | 2007-06-06 | 日本聚烯烃株式会社 | Gas barrier laminate, process for producing the same, and paper container made using the laminate |
EP1109947A4 (en) * | 1998-07-27 | 2004-09-22 | Bekaert Sa Nv | Hardcoats for flat panel display substrates |
US6146225A (en) | 1998-07-30 | 2000-11-14 | Agilent Technologies, Inc. | Transparent, flexible permeability barrier for organic electroluminescent devices |
CA2337085A1 (en) | 1998-08-03 | 2000-02-17 | Uniax Corporation | Encapsulation of polymer-based solid state devices with inorganic materials |
JP2000109726A (en) | 1998-09-30 | 2000-04-18 | Dow Corning Toray Silicone Co Ltd | Composition for gas barrier and resin molded article |
US6271150B1 (en) | 1998-11-30 | 2001-08-07 | North Carolina State University | Methods of raising reflow temperature of glass alloys by thermal treatment in steam, and microelectronic structures formed thereby |
US6268695B1 (en) | 1998-12-16 | 2001-07-31 | Battelle Memorial Institute | Environmental barrier material for organic light emitting device and method of making |
DE19920002A1 (en) | 1999-05-03 | 2000-11-09 | Sms Demag Ag | Top seal for shaft furnaces, especially blast furnaces with an inlet hopper |
EP1060875A3 (en) | 1999-06-15 | 2001-12-12 | Alcan Technology & Management AG | Sterilizable laminated sheet |
EP1112674B1 (en) * | 1999-07-09 | 2009-09-09 | Institute of Materials Research & Engineering | Laminates for encapsulating oled devices |
US6083313A (en) | 1999-07-27 | 2000-07-04 | Advanced Refractory Technologies, Inc. | Hardcoats for flat panel display substrates |
AU1075901A (en) * | 1999-10-12 | 2001-04-23 | Corning Incorporated | Tellurite glasses and optical components |
US6623861B2 (en) | 2001-04-16 | 2003-09-23 | Battelle Memorial Institute | Multilayer plastic substrates |
US6413645B1 (en) | 2000-04-20 | 2002-07-02 | Battelle Memorial Institute | Ultrabarrier substrates |
US6530477B1 (en) | 1999-11-10 | 2003-03-11 | Joseph G. Martorano | Flexible packaging for maintaining the efficacy of chemicals |
US6244441B1 (en) | 1999-11-10 | 2001-06-12 | Cryovac, Inc. | Heat sealable barrier film for fluid fillable packaging cushions and cushions made therefrom |
US6426311B1 (en) * | 2000-02-01 | 2002-07-30 | Kabushiki Kaisha Ohara | Glass-ceramics |
US20010038894A1 (en) | 2000-03-14 | 2001-11-08 | Minoru Komada | Gas barrier film |
US6492026B1 (en) | 2000-04-20 | 2002-12-10 | Battelle Memorial Institute | Smoothing and barrier layers on high Tg substrates |
DE10039366A1 (en) * | 2000-08-11 | 2002-02-21 | Mitsubishi Polyester Film Gmbh | At least three-layer transparent polyester film, process for its production and its use |
DE10047043A1 (en) | 2000-09-22 | 2002-04-11 | Wolff Walsrode Ag | Foil laminates as high barrier foils and their use in vacuum insulation panels |
JP2002122846A (en) * | 2000-10-13 | 2002-04-26 | Matsushita Electric Ind Co Ltd | Substrate, method of manufacturing the same, liquid crystal display device and method of manufacturing the same |
JP2002187231A (en) * | 2000-10-13 | 2002-07-02 | Dainippon Printing Co Ltd | Film having barrier properties and its manufacturing method |
JP4848583B2 (en) * | 2000-11-21 | 2011-12-28 | 大日本印刷株式会社 | Method for producing film having hard coat layer |
AU2002239377A1 (en) | 2000-11-29 | 2002-06-11 | American Aerogel Corporation | Insulated barriers and methods for producing same |
US6630980B2 (en) * | 2001-04-17 | 2003-10-07 | General Electric Company | Transparent flexible barrier for liquid crystal display devices and method of making the same |
US6864435B2 (en) * | 2001-04-25 | 2005-03-08 | Alien Technology Corporation | Electrical contacts for flexible displays |
WO2002091064A2 (en) * | 2001-05-04 | 2002-11-14 | General Atomics | O2 and h2o barrier material |
TW570876B (en) * | 2001-05-11 | 2004-01-11 | Toyo Seikan Kaisha Ltd | Silicon oxide film |
JP3678361B2 (en) | 2001-06-08 | 2005-08-03 | 大日本印刷株式会社 | Gas barrier film |
DE10130666A1 (en) | 2001-06-28 | 2003-01-23 | Applied Films Gmbh & Co Kg | Softcoat |
CA2352567A1 (en) * | 2001-07-06 | 2003-01-06 | Mohamed Latreche | Translucent material displaying ultra-low transport of gases and vapors, and method for its production |
FI117622B (en) * | 2001-07-13 | 2006-12-29 | Stora Enso Oyj | Polymer-coated heat sealable packaging material, its manufacturing method and its use in sealed packaging |
KR100413450B1 (en) * | 2001-07-20 | 2003-12-31 | 엘지전자 주식회사 | protecting film structure for display device |
WO2003016589A1 (en) * | 2001-08-20 | 2003-02-27 | Nova-Plasma Inc. | Coatings with low permeation of gases and vapors |
US6734370B2 (en) * | 2001-09-07 | 2004-05-11 | Irvine Sensors Corporation | Multilayer modules with flexible substrates |
US20030108664A1 (en) * | 2001-10-05 | 2003-06-12 | Kodas Toivo T. | Methods and compositions for the formation of recessed electrical features on a substrate |
KR20040044551A (en) * | 2001-10-12 | 2004-05-28 | 코닌클리케 필립스 일렉트로닉스 엔.브이. | A barrier and a method of manufacture thereof |
US6888305B2 (en) * | 2001-11-06 | 2005-05-03 | Universal Display Corporation | Encapsulation structure that acts as a multilayer mirror |
US6597111B2 (en) * | 2001-11-27 | 2003-07-22 | Universal Display Corporation | Protected organic optoelectronic devices |
SG114514A1 (en) * | 2001-11-28 | 2005-09-28 | Univ Singapore | Organic light emitting diode (oled) |
JP3963712B2 (en) * | 2001-11-30 | 2007-08-22 | 住友化学株式会社 | Organic EL element structure |
US6683454B2 (en) * | 2002-03-28 | 2004-01-27 | Ge Medical Systems Global Technology Company, Llc | Shifting of artifacts by reordering of k-space |
US6891330B2 (en) | 2002-03-29 | 2005-05-10 | General Electric Company | Mechanically flexible organic electroluminescent device with directional light emission |
US20030183915A1 (en) | 2002-04-02 | 2003-10-02 | Motorola, Inc. | Encapsulated organic semiconductor device and method |
GB0208506D0 (en) | 2002-04-12 | 2002-05-22 | Dupont Teijin Films Us Ltd | Film coating |
US7268486B2 (en) * | 2002-04-15 | 2007-09-11 | Schott Ag | Hermetic encapsulation of organic, electro-optical elements |
US20030203210A1 (en) | 2002-04-30 | 2003-10-30 | Vitex Systems, Inc. | Barrier coatings and methods of making same |
US6743524B2 (en) * | 2002-05-23 | 2004-06-01 | General Electric Company | Barrier layer for an article and method of making said barrier layer by expanding thermal plasma |
US20040033379A1 (en) | 2002-06-12 | 2004-02-19 | Avery Dennison Corporation | Low permeability materials and coatings |
US20040229051A1 (en) | 2003-05-15 | 2004-11-18 | General Electric Company | Multilayer coating package on flexible substrates for electro-optical devices |
US7015640B2 (en) * | 2002-09-11 | 2006-03-21 | General Electric Company | Diffusion barrier coatings having graded compositions and devices incorporating the same |
ITMI20022159A1 (en) | 2002-10-11 | 2004-04-12 | Tecno Coating Engineering S R L | MULTILAYER HEAT-SHRINKABLE FILM WITH OXYGEN AND WATER VAPOR BARRIER, IMPROVED MECHANICAL RESISTANCE AND GOOD OPTICAL CHARACTERISTICS AND REDUCED CURLING EFFECT. |
US7143609B2 (en) * | 2002-10-29 | 2006-12-05 | Corning Incorporated | Low-temperature fabrication of glass optical components |
DK1420041T3 (en) | 2002-11-18 | 2010-08-09 | Icopal As | Flexible film material |
JP2004231730A (en) | 2003-01-29 | 2004-08-19 | Mitsubishi Gas Chem Co Inc | Gas barrier coated film |
JP2004288228A (en) * | 2003-01-31 | 2004-10-14 | Hoya Corp | Substrate for information recording medium, information recording medium, and its manufacturing method |
WO2004079781A2 (en) | 2003-03-04 | 2004-09-16 | Dow Corning Corporation | Organic light-emitting diode |
EP1466997B1 (en) | 2003-03-10 | 2012-02-22 | OSRAM Opto Semiconductors GmbH | Method for forming and arrangement of barrier layers on a polymeric substrate |
US6888172B2 (en) * | 2003-04-11 | 2005-05-03 | Eastman Kodak Company | Apparatus and method for encapsulating an OLED formed on a flexible substrate |
US20050116245A1 (en) * | 2003-04-16 | 2005-06-02 | Aitken Bruce G. | Hermetically sealed glass package and method of fabrication |
US6998776B2 (en) * | 2003-04-16 | 2006-02-14 | Corning Incorporated | Glass package that is hermetically sealed with a frit and method of fabrication |
CN1791989A (en) | 2003-05-16 | 2006-06-21 | 纳幕尔杜邦公司 | Barrier films for plastic substrates fabricated by atomic layer deposition |
US7535017B2 (en) * | 2003-05-30 | 2009-05-19 | Osram Opto Semiconductors Gmbh | Flexible multilayer packaging material and electronic devices with the packaging material |
JP4465989B2 (en) * | 2003-06-18 | 2010-05-26 | 旭硝子株式会社 | Light emitting diode element |
KR101207073B1 (en) * | 2003-07-22 | 2012-11-30 | 이 아이 듀폰 디 네모아 앤드 캄파니 | Process for removing an organic layer during fabrication of an organic electronic device and the organic electronic device formed by the process |
WO2005025853A1 (en) | 2003-09-05 | 2005-03-24 | Helicon Research, L.L.C. | Nanophase multilayer barrier and process |
JP2005123012A (en) * | 2003-10-16 | 2005-05-12 | Pioneer Electronic Corp | Organic electroluminescent display panel, and method of manufacturing the same |
US7199518B2 (en) * | 2003-10-21 | 2007-04-03 | Corning Incorporated | OLED structures with barrier layer and strain relief |
US7342356B2 (en) * | 2004-09-23 | 2008-03-11 | 3M Innovative Properties Company | Organic electroluminescent device having protective structure with boron oxide layer and inorganic barrier layer |
JP2006116737A (en) * | 2004-10-19 | 2006-05-11 | Dainippon Printing Co Ltd | Gas barrier laminated film |
US20060132030A1 (en) * | 2004-12-22 | 2006-06-22 | Zhanjun Gao | Display element stress free at the critical layer |
JP2006222071A (en) * | 2005-01-17 | 2006-08-24 | Seiko Epson Corp | Light emitting device, manufacturing method thereof, and electronic equipment |
JP4679272B2 (en) * | 2005-07-04 | 2011-04-27 | セントラル硝子株式会社 | Input / output integrated display device and protective glass plate |
US7722929B2 (en) * | 2005-08-18 | 2010-05-25 | Corning Incorporated | Sealing technique for decreasing the time it takes to hermetically seal a device and the resulting hermetically sealed device |
US7829147B2 (en) * | 2005-08-18 | 2010-11-09 | Corning Incorporated | Hermetically sealing a device without a heat treating step and the resulting hermetically sealed device |
CN101247950B (en) | 2005-08-25 | 2013-01-23 | 旭硝子株式会社 | Base with film and glass for film formation |
JP2007103594A (en) * | 2005-10-03 | 2007-04-19 | Shoei Chem Ind Co | Resistor composition and thick film resistor |
-
2007
- 2007-10-30 US US11/980,264 patent/US8115326B2/en not_active Expired - Fee Related
- 2007-11-26 CN CN2007800436517A patent/CN101542771B/en active Active
- 2007-11-26 JP JP2009539287A patent/JP2010511975A/en active Pending
- 2007-11-26 KR KR1020097013629A patent/KR101589313B1/en active IP Right Grant
- 2007-11-26 WO PCT/US2007/024435 patent/WO2008069930A2/en active Application Filing
- 2007-11-26 EP EP07870912A patent/EP2087538A2/en not_active Ceased
- 2007-11-26 KR KR1020157005225A patent/KR101603877B1/en active IP Right Grant
- 2007-11-28 TW TW096145305A patent/TWI389367B/en not_active IP Right Cessation
-
2011
- 2011-11-02 US US13/287,537 patent/US8435605B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3991234A (en) * | 1974-09-30 | 1976-11-09 | American Optical Corporation | Process for coating a lens of synthetic polymer with a durable abrasion resistant vitreous composition |
US5681666A (en) * | 1995-01-23 | 1997-10-28 | Duracell Inc. | Light transparent multilayer moisture barrier for electrochemical celltester and cell employing same |
EP1640154A1 (en) * | 2001-09-11 | 2006-03-29 | Dupont Teijin Films U.S. Limited Partnership | Heat-stabilised Poly(Ethylene Naphthalate) film for flexible electronic and opt-electronic devices |
EP1892775A2 (en) * | 2006-08-24 | 2008-02-27 | Corning Inc. | Tin phosphate barrier film, method and apparatus |
Cited By (12)
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US9799914B2 (en) | 2009-01-29 | 2017-10-24 | Corning Incorporated | Barrier layer for thin film battery |
DE102009056756A1 (en) | 2009-12-04 | 2011-06-09 | Schott Ag | Material for battery electrodes, battery electrodes containing the same and batteries with these electrodes and method for its production |
EP2561562A2 (en) * | 2010-04-20 | 2013-02-27 | Corning Incorporated | Multi-laminate hermetic barriers and related structures and methods of hermetic sealing |
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DE102014221245A1 (en) | 2014-10-20 | 2016-04-21 | Tesa Se | Thin glass foil composite web with stiffening strips |
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Also Published As
Publication number | Publication date |
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CN101542771B (en) | 2011-04-13 |
KR20150030779A (en) | 2015-03-20 |
KR101603877B1 (en) | 2016-03-15 |
EP2087538A2 (en) | 2009-08-12 |
KR101589313B1 (en) | 2016-01-28 |
TW200841500A (en) | 2008-10-16 |
TWI389367B (en) | 2013-03-11 |
US8115326B2 (en) | 2012-02-14 |
KR20090096483A (en) | 2009-09-10 |
US20120045567A1 (en) | 2012-02-23 |
US8435605B2 (en) | 2013-05-07 |
JP2010511975A (en) | 2010-04-15 |
WO2008069930A3 (en) | 2009-03-05 |
CN101542771A (en) | 2009-09-23 |
US20090121333A1 (en) | 2009-05-14 |
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