WO2008049392A3 - Aufgedampfte beschichtung und thermisch belastbares bauteil mit einer solchen beschichtung, sowie verfahren und vorrichtung zur herstellung einer solchen beschichtung - Google Patents
Aufgedampfte beschichtung und thermisch belastbares bauteil mit einer solchen beschichtung, sowie verfahren und vorrichtung zur herstellung einer solchen beschichtung Download PDFInfo
- Publication number
- WO2008049392A3 WO2008049392A3 PCT/DE2007/001859 DE2007001859W WO2008049392A3 WO 2008049392 A3 WO2008049392 A3 WO 2008049392A3 DE 2007001859 W DE2007001859 W DE 2007001859W WO 2008049392 A3 WO2008049392 A3 WO 2008049392A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coating
- vapour
- deposited
- producing
- component
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/137—Spraying in vacuum or in an inert atmosphere
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Coating By Spraying Or Casting (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Die Erfindung betrifft eine aufgedampfte Beschichtung für ein thermisch belastbares Bauteil, welche gezielt eingebrachte Porenbildner umfasst. Dies unterscheidet sie von üblichen aufgedampften Beschichtungen, die aufgrund der Beschichtungsart keine Poren aufweisen, oder auch von aufgespritzten Beschichtungen, welche keine oder lediglich willkürlich entstehende unregelmäßig geformte Poren aufweisen. Die Erfindung betrifft außerdem ein Verfahren und eine Vorrichtung zur Herstellung einer solchen Beschichtung.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP07817694A EP2087143A2 (de) | 2006-10-27 | 2007-10-17 | Aufgedampfte beschichtung und thermisch belastbares bauteil mit einer solchen beschichtung, sowie verfahren und vorrichtung zur herstellung einer solchen beschichtung |
US12/422,555 US20090258214A1 (en) | 2006-10-27 | 2009-04-13 | Vapor-deposited coating and thermally stressable component having such a coating, and also a process and apparatus for producing such a coating |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE200610050789 DE102006050789A1 (de) | 2006-10-27 | 2006-10-27 | Aufgedampfte Beschichtung und thermisch belastbares Bauteil mit einer solchen Beschichtung, sowie Verfahren und Vorrichtung zur Herstellung einer solchen Beschichtung |
DE102006050789.4 | 2006-10-27 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/422,555 Continuation US20090258214A1 (en) | 2006-10-27 | 2009-04-13 | Vapor-deposited coating and thermally stressable component having such a coating, and also a process and apparatus for producing such a coating |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2008049392A2 WO2008049392A2 (de) | 2008-05-02 |
WO2008049392A3 true WO2008049392A3 (de) | 2009-10-15 |
Family
ID=38894010
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/DE2007/001859 WO2008049392A2 (de) | 2006-10-27 | 2007-10-17 | Aufgedampfte beschichtung und thermisch belastbares bauteil mit einer solchen beschichtung, sowie verfahren und vorrichtung zur herstellung einer solchen beschichtung |
Country Status (4)
Country | Link |
---|---|
US (1) | US20090258214A1 (de) |
EP (1) | EP2087143A2 (de) |
DE (1) | DE102006050789A1 (de) |
WO (1) | WO2008049392A2 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10145000B2 (en) | 2016-05-27 | 2018-12-04 | General Electric Company | Thermally dissipative article and method of forming a thermally dissipative article |
JP6908973B2 (ja) * | 2016-06-08 | 2021-07-28 | 三菱重工業株式会社 | 遮熱コーティング、タービン部材、ガスタービン、ならびに遮熱コーティングの製造方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030198742A1 (en) * | 2002-04-17 | 2003-10-23 | Vrtis Raymond Nicholas | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants |
WO2004038783A2 (en) * | 2002-10-21 | 2004-05-06 | Massachusetts Institute Of Technology | Pecvd of organosilicate thin films |
US20040096593A1 (en) * | 2002-11-14 | 2004-05-20 | Lukas Aaron Scott | Non-thermal process for forming porous low dielectric constant films |
DE102004033054A1 (de) * | 2004-07-08 | 2005-10-20 | Daimler Chrysler Ag | Vorrichtung und Verfahren zum Plasmaspritzen |
EP1726681A1 (de) * | 2005-05-23 | 2006-11-29 | United Technologies Corporation | Schichtsystem für siliziumhaltige Substrats |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
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US5196471A (en) * | 1990-11-19 | 1993-03-23 | Sulzer Plasma Technik, Inc. | Thermal spray powders for abradable coatings, abradable coatings containing solid lubricants and methods of fabricating abradable coatings |
JPH1088368A (ja) * | 1996-09-19 | 1998-04-07 | Toshiba Corp | 遮熱コーティング部材およびその作製方法 |
US6733907B2 (en) * | 1998-03-27 | 2004-05-11 | Siemens Westinghouse Power Corporation | Hybrid ceramic material composed of insulating and structural ceramic layers |
FR2779448B1 (fr) * | 1998-06-04 | 2000-12-15 | Snecma | Revetement ceramique a faible conductivite thermique et de type barriere thermique, procede de depot d'un tel revetement ceramique, et piece metallique protegee par ce revetement ceramique |
US6537021B2 (en) * | 2001-06-06 | 2003-03-25 | Chromalloy Gas Turbine Corporation | Abradeable seal system |
US6881452B2 (en) * | 2001-07-06 | 2005-04-19 | General Electric Company | Method for improving the TBC life of a single phase platinum aluminide bond coat by preoxidation heat treatment |
US6921586B2 (en) * | 2002-02-05 | 2005-07-26 | General Electric Company | Ni-Base superalloy having a coating system containing a diffusion barrier layer |
US6887530B2 (en) * | 2002-06-07 | 2005-05-03 | Sulzer Metco (Canada) Inc. | Thermal spray compositions for abradable seals |
DE10225532C1 (de) * | 2002-06-10 | 2003-12-04 | Mtu Aero Engines Gmbh | Schichtsystem für die Rotor-/Statordichtung einer Strömungsmaschine |
DE10337094A1 (de) * | 2003-08-12 | 2005-03-03 | Mtu Aero Engines Gmbh | Einlaufbelag für Gasturbinen sowie Verfahren zur Herstellung desselben |
DE10343761A1 (de) * | 2003-09-22 | 2005-04-14 | Mtu Aero Engines Gmbh | Verschleißschutzschicht, Bauteil mit einer derartigen Verschleißschutzschicht sowie Herstellverfahren |
US7150921B2 (en) * | 2004-05-18 | 2006-12-19 | General Electric Company | Bi-layer HVOF coating with controlled porosity for use in thermal barrier coatings |
US7549840B2 (en) * | 2005-06-17 | 2009-06-23 | General Electric Company | Through thickness reinforcement of SiC/SiC CMC's through in-situ matrix plugs manufactured using fugitive fibers |
CA2585992C (en) * | 2006-06-08 | 2014-06-17 | Sulzer Metco (Us) Inc. | Dysprosia stabilized zirconia abradable |
US8021742B2 (en) * | 2006-12-15 | 2011-09-20 | Siemens Energy, Inc. | Impact resistant thermal barrier coating system |
-
2006
- 2006-10-27 DE DE200610050789 patent/DE102006050789A1/de not_active Withdrawn
-
2007
- 2007-10-17 WO PCT/DE2007/001859 patent/WO2008049392A2/de active Application Filing
- 2007-10-17 EP EP07817694A patent/EP2087143A2/de not_active Withdrawn
-
2009
- 2009-04-13 US US12/422,555 patent/US20090258214A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030198742A1 (en) * | 2002-04-17 | 2003-10-23 | Vrtis Raymond Nicholas | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants |
WO2004038783A2 (en) * | 2002-10-21 | 2004-05-06 | Massachusetts Institute Of Technology | Pecvd of organosilicate thin films |
US20040096593A1 (en) * | 2002-11-14 | 2004-05-20 | Lukas Aaron Scott | Non-thermal process for forming porous low dielectric constant films |
DE102004033054A1 (de) * | 2004-07-08 | 2005-10-20 | Daimler Chrysler Ag | Vorrichtung und Verfahren zum Plasmaspritzen |
EP1726681A1 (de) * | 2005-05-23 | 2006-11-29 | United Technologies Corporation | Schichtsystem für siliziumhaltige Substrats |
Also Published As
Publication number | Publication date |
---|---|
US20090258214A1 (en) | 2009-10-15 |
EP2087143A2 (de) | 2009-08-12 |
DE102006050789A1 (de) | 2008-04-30 |
WO2008049392A2 (de) | 2008-05-02 |
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