WO2008035709A1 - Solvent-type removable adhesive composition and removable adhesive product - Google Patents

Solvent-type removable adhesive composition and removable adhesive product Download PDF

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Publication number
WO2008035709A1
WO2008035709A1 PCT/JP2007/068181 JP2007068181W WO2008035709A1 WO 2008035709 A1 WO2008035709 A1 WO 2008035709A1 JP 2007068181 W JP2007068181 W JP 2007068181W WO 2008035709 A1 WO2008035709 A1 WO 2008035709A1
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Prior art keywords
polymer
pressure
low
sensitive adhesive
parts
Prior art date
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PCT/JP2007/068181
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French (fr)
Japanese (ja)
Inventor
Masahiko Saito
Shigeru Oka
Original Assignee
Nippon Shokubai Co., Ltd.
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Filing date
Publication date
Priority claimed from JP2006256312A external-priority patent/JP5006608B2/en
Application filed by Nippon Shokubai Co., Ltd. filed Critical Nippon Shokubai Co., Ltd.
Priority to CN2007800331816A priority Critical patent/CN101511961B/en
Publication of WO2008035709A1 publication Critical patent/WO2008035709A1/en

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J9/00Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J131/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an acyloxy radical of a saturated carboxylic acid, of carbonic acid, or of a haloformic acid; Adhesives based on derivatives of such polymers
    • C09J131/02Homopolymers or copolymers of esters of monocarboxylic acids
    • C09J131/04Homopolymers or copolymers of vinyl acetate
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • C09J133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09J133/10Homopolymers or copolymers of methacrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2431/00Presence of polyvinyl acetate
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2433/00Presence of (meth)acrylic polymer

Definitions

  • the present invention relates to a re-peeling adhesive product that is re-peeled after being attached to an adherend and then peeled again, and exhibits excellent peelability even at high-speed peeling, and the adhesive product is produced.
  • the present invention relates to a solvent-type pressure-sensitive adhesive composition. More specifically, the present invention relates to a re-peeling adhesive product for protecting the surface of optical members such as optical polarizing plates (TAC), retardation plates, EM 1 (electromagnetic wave) shield films, antiglare films, antireflection films, etc. Is.
  • optical members such as optical polarizing plates (TAC), retardation plates, EM 1 (electromagnetic wave) shield films, antiglare films, antireflection films, etc. Is.
  • optical films having various functions such as optical polarizing plates (TAC), retardation plates, EMI (electromagnetic wave) shield films, antiglare films, antireflection films, etc. Etc. are laminated and used. These optical films have a protective film affixed to the surface in order to prevent damage to the surface during the display manufacturing process and performance inspection stage. Stripped and removed in the panel assembly process.
  • TAC optical polarizing plates
  • EMI electrostatic wave
  • Japanese Patent Application Laid-Open No. 2005-146151 discloses a high Tg (meth) atari which has no adhesiveness at room temperature. By blending a low molecular weight polymer with a low Tg (meth) acrylic polymer with sufficient adhesive strength, there is no lifting or peeling (having a certain level of adhesiveness), and high-speed peelability is good. Further, a pressure sensitive adhesive for a protective film is disclosed.
  • the adhesive product for the protective film as described above is designed to have a considerably lower adhesive strength (slight adhesion) than a general adhesive product on the premise that it is peeled off.
  • Tg of the high ⁇ g polymer is too high, it is inherently at a low level of adhesive strength, so that the adhesiveness at low temperatures is almost lost or the crosslinking progresses over time and sticks to the adherend. It sometimes caused the inconvenience of not sticking.
  • the pressure-sensitive adhesive for the purpose of being applied to the surface protective film of an optical film, the pressure-sensitive adhesive is excellent in high-speed peelability and has low haze and hardly causes troubles such as adherend contamination.
  • a solvent-type re-peeling pressure-sensitive adhesive composition capable of forming a layer was found, and an object was to provide a re-peeling pressure-sensitive adhesive product having good characteristics.
  • the solvent-based re-peeling pressure-sensitive adhesive composition of the present invention has a high Tg polymer (A) having a glass transition temperature (Tg) of o ° c or higher and a Tg lower than this high Tg polymer, A solvent-type re-peeling pressure-sensitive adhesive composition containing a low-Tg polymer (B) exhibiting pressure adhesion and a solvent, wherein a high-Tg polymer (A) and a low Tg are used in the pressure-sensitive adhesive layer obtained from the pressure-sensitive adhesive composition.
  • the pressure-sensitive adhesive product for re-peeling of the present invention is characterized in that a pressure-sensitive adhesive layer obtained from the solvent-based re-peeling pressure-sensitive adhesive composition is formed on at least one side of a support substrate. ing.
  • FIG. 1 is an SEM photograph (sea-island structure) of a coating film of an adhesive polymer solution obtained in Synthesis Example 1.
  • the solvent-based re-peeling pressure-sensitive adhesive composition according to the present invention becomes a pressure-sensitive adhesive product by drying (removing the solvent), and has a 180 ° adhesive strength in low-speed peeling against an acrylic plate measured under the conditions described later. Refers to the case of 10N / 25mm or less.
  • the “polymer” in the present invention includes not only homopolymers but also copolymers and copolymers of three or more.
  • the “monomer” of the present invention is an addition polymerization type monomer.
  • the first essential component in the solvent-based re-peeling pressure-sensitive adhesive composition of the present invention is a high Tg polymer (A) having a glass transition temperature (Tg) of 0 ° C or higher.
  • Tg glass transition temperature
  • the Tg of the polymer can be determined by DSC (Differential Scanning Calorimetry), DTA (Differential Thermal Analysis), and TMA (Thermomechanical Measurement).
  • DSC Denential Scanning Calorimetry
  • DTA Denential Thermal Analysis
  • TMA Thermomechanical Measurement
  • the Tg of homopolymers is described in various literatures (for example, polymer handbooks)
  • the Tg of copolymers is calculated from the following formula using Tg (K) of various homopolymers and mass fraction (W) of monomers. Finding what you want.
  • Tg Tg (K) of homopolymer of each monomer
  • the Tg of the main homopolymer is 105.85 ° C for polyacrylic acid, 9.85 ° C for polymethyl acrylate, 24.15 ° C for polyethyl acrylate, and poly n butyl acrylate. -54.15 ° C, Poly-2-Hethinoreta Talelate (70.00 ° C, Poly-2Hydroxyethylaretalate) 85 ° C, poly 4-hydroxybutyl attalate is 3 ⁇ 00 ° C, polymethylmetatalylate is 104 ° 85 ° C: Polyacetate, Ninole, 30. 00 ° C :, Polybenzenore 6. 00 ° C: 125 ° C for Polynitronitroré and 100 ° C for Polystyrene.
  • the high Tg polymer (A) used in the present invention is not particularly limited as long as Tg is 0 ° C or higher, and may be a homopolymer or a polymer obtained by copolymerizing two or more monomers.
  • Tg is preferably 10 ° C or higher, more preferably 20 ° C or higher, and further preferably 30 ° C or higher.
  • the adhesive strength may be insufficient, so less than 80 ° C is preferred 75 ° C or less
  • the preferred temperature is 70 ° C or less.
  • the high Tg polymer (A) of the present invention is an essential component for improving the high-speed peelability.
  • the preferred composition is different.
  • the high Tg polymer when haze is emphasized is (A-1)
  • the high Tg polymer when emphasis is placed on adherend contamination control is (A-2).
  • the high Tg polymer (A-1) has units derived from butyl acetate! /.
  • the high Tg polymer (A-1) is preferably obtained from a raw material monomer having 70% by mass or more of butyl acetate.
  • the amount of butyl acetate is more preferably 90% by mass or more. Most preferred in terms of haze
  • the high Tg polymer (A-1) is poly (butyl acetate) (bule acetate homopolymer). If polyacetic acid bule is used as a high Tg polymer (A-1), the haze of the resulting adhesive layer can be reduced to 2% or less, and surface protection of optical films that require high transparency is required. It is suitable as a film.
  • the homopolymer has a high Tg.
  • (Meth) acrylic acid, methyl (meth) acrylate, ethyl (meth) acrylate, acrylate, styrene Etc. are preferably used in combination with butyl acetate.
  • Monomers that can be used as raw material monomers for the low Tg polymer (B) described below can also be used if the type and amount are selected so that the Tg of the high Tg polymer (A-1) is 0 ° C or higher. .
  • the high Tg polymer (A-2) having a relatively low molecular weight that causes adherend contamination is increased in molecular weight, thereby suppressing adherend contamination.
  • the functional group include a hydroxyl group, a carboxyl group, an amino group, an amide group, and an epoxy group.
  • a functional group-containing monomer may be used as a raw material monomer for the high Tg polymer (A-2).
  • Examples of functional group-containing monomers include 2-hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, 4-h
  • Hydroxyl group-containing (meth) acrylates such as mono (meth) acrylate of polyester diol that can also be used with taric acid and propylene glycol; unsaturated carboxylic acids such as (meth) acrylic acid, cinnamate and crotonic acid; Unsaturated dicarboxylic acids such as maleic acid, fumaric acid, itaconic acid and citraconic acid; carboxy group-containing monomers such as monoesters of these unsaturated dicarboxylic acids; amino groups, amide groups, epoxy groups, etc. And meta) atarylates.
  • hydroxyl group-containing (meth) acrylates having a hydroxyl group as a functional group are preferred.
  • the monomers in this group have better cross-linking reactivity and conformability, so if you want to reduce the amount of cross-linking agent or if suitability for adherends is important, 2-hydroxyethyl (meth) atari
  • the hydroxyl group is bonded to an alkyl group having a larger number of carbon atoms than the rate (propyl group or higher)! /
  • (meth) acrylate eg, 4-hydroxy pentanol (meth) acrylate
  • These functional group-containing monomer in the raw material monomer 100 mass 0/0 of the high Tg polymer (A- 2), 0.; is preferably set to 1-10% by mass!. If the amount of the functional group-containing monomer is less than 0.1% by mass, the amount of the functional group in the high Tg polymer (A-2) is decreased, and the effect of suppressing adherend contamination is not sufficiently exhibited. Absent. On the other hand, if it exceeds 10% by mass, the adhesive strength of the adhesive and the wettability to the adherend tend to decrease, which is not preferable.
  • the amount of the functional group-containing monomer is more preferably 0.3 to 8% by mass, and further preferably 0.5 to 6% by mass.
  • the copolymerization partner of the functional group-containing monomer any known radical polymerizable monomer can be used as long as the Tg of the high Tg polymer (A-2) is 0 ° C or higher.
  • the high-Tg polymer (A-1) the use of butyl acetate reduces the haze of the adhesive layer and is suitable as a surface protective film for optical films. Therefore, the high Tg polymer (A-2) is preferably obtained from a raw material monomer that necessarily contains butyl acetate and the functional group-containing monomer.
  • acetic acid vinyl Honoré or 70 to 99.9 mass 0/0 Ca
  • Methyl acrylate may be used as a copolymerization partner for the functional group-containing monomer. Adhesiveness and familiarity are improved. Methyl acrylate is preferably 70-99.9% by weight, more preferably 80-99.9% by weight, and more preferably 90-99.9% by weight.
  • Refractive index control monomer is a monomer used to bring the refractive index of a low Tg polymer close to that of a high Tg polymer.
  • high-Tg polymer (A-2) is synthesized from methyl acrylate and hydroxyl group-containing monomarker, it is added to 2-ethyl hexyl acrylate, butyl acrylate and 2-hydroxyethyl acrylate.
  • the refractive index of the high Tg polymer (A-2) and that of the low Tg polymer (B) can be brought close to each other.
  • the haze can be reduced to 3% or less.
  • high Tg polymer (A-2) For the synthesis of high Tg polymer (A-2), other monomers that can be used in addition to butyl acetate, methyl acrylate, and the above functional group-containing monomers include (meth) acrylic acid having a high homopolymer Tg, Methyl methacrylate, ethyl (meth) acrylate, acrylonitrile, styrene and the like are preferable.
  • a monomer that can be used as a raw material monomer for the low Tg polymer described below can also be used if the type and amount are selected so that the Tg of the high Tg polymer (A-2) is 0 ° C or higher.
  • a preferred embodiment of the high Tg polymer (A-2) is a polymer synthesized from butyl acetate and 2-hydroxyethyl acrylate and / or 4-hydroxybutyl acrylate. The ability to reduce haze to 3% or less while suppressing adherend contamination. Further, as described above, if a monomer for controlling the refractive index is used during the synthesis of the low Tg polymer (B), it is synthesized from methyl acrylate and 2-hydroxyethyl acrylate and / or 4-hydroxy butyl acrylate. High Tg polymer (A-2) can also be preferably used because haze can be reduced to 3% or less while suppressing adherend contamination.
  • polyacrylic acid is 1 ⁇ 5270, polymethyl phthalate 1, 4720, polyurethane tantalate 1, 4685, poly ⁇ -f, chinoleate talate m 4660, polymethylolene methacrylate 1 4900, poly-2-hydroxyhexylene chloride m. 4650, poly-2-hydroxyethylenol talelate (1/4480, poly-2-hydroxyethyl methacrylate) (MA 1.5119, poly 4-hydroxyph, chinolea talylate (MA 1.4520, poly oxalate, Nino acrylate 1. 4665, polybenzeno acrylate 1.5 or 5132.
  • the homopolymer has a high Tg, such as (meth) acrylic acid, methyl methacrylate, ethyl (meth) acrylate, acrylonitrile, styrene, etc. What is necessary is just to comprise a high Tg polymer (A) so that the said Tg range may be satisfied.
  • the molecular weight of the high Tg polymer (A) (hereinafter, simply referred to as high Tg polymer (A) means both high Tg polymer (A-1) and high Tg polymer (A-2)).
  • Mass average molecular weight ( Mw) is preferably from 2000 to about 100,000. More preferably, it is about 40,000 to 90,000.
  • the second essential component contained in the solvent-based re-peeling pressure-sensitive adhesive composition of the present invention is a low Tg polymer (B) exhibiting pressure-sensitive adhesiveness.
  • This low Tg polymer (B) is required to be lower than the Tg (0 ° C or higher) of the above high Tg polymer (A), and Tg force S0 ° Preferably it is less than C. More preferably, it is 1-20 ° C or less, and further preferably 135 ° C or less. However, if the Tg of the low Tg polymer (B) is lower than -80 ° C, the cohesive force tends to decrease, and the adhesive residue tends to occur.
  • the alkyl (meth) acrylate is necessary for ensuring adhesive strength, and the functional group-containing monomer is a monomer for introducing a functional group for reacting with a crosslinking agent described later into the low Tg polymer (B).
  • the functional group-containing monomer any of the monomers exemplified for the high Tg polymer (A-2) can be used.
  • the hydroxyl group-containing monomer (meth) Atallate is preferred.
  • the use amount thereof is preferably from 0.;! To 10% by mass in 100% by mass of the raw material monomer as in the case of the high Tg polymer (A-2).
  • the amount of the functional group-containing monomer is less than 0.1% by mass, the amount of the functional group in the low Tg polymer (B) is decreased, the speed of the crosslinking reaction is decreased, or the high-speed adhesive force is too high. If it exceeds 20% by mass, the adhesive strength of the pressure-sensitive adhesive and the wettability to the adherend tend to decrease, such being undesirable.
  • the use amount of the functional group-containing monomer is more preferably 0.3 to 8% by mass, and further preferably 0.5 to 6% by mass.
  • the alkyl (meth) acrylate which is the main constituent of the low Tg polymer (B) preferably has an alkyl group having a carbon number power of ⁇ 12 from the viewpoint of adhesive properties.
  • This carbon number is preferably 4 to 10; more preferably 4 to 8. If the carbon number is less than 4 (3 or less), or exceeds 12 (13 or more), the adhesive strength may decrease.
  • Atari rate is preferably employed in the range of 50-99. 9 mass 0/0. More preferably «60-99. 7 mass 0/0, even more preferably 70 to 99 ⁇ 5 weight 0/0.
  • Anolequinolate (meth) If the amount of attalylate used is within the above range, the resulting adhesive exhibits sufficient adhesive strength and tackiness, but if it is less than 50% by mass, the adhesive strength and adhesion are reduced. The wettability to the body may be insufficient, and if it exceeds 99.9% by mass, the amount of the functional group-containing monomer that becomes a cross-linking point is too small, and the high-speed adhesive force may become too large.
  • the other monomer is a monomer that can be copolymerized with the alkyl (meth) acrylate and the functional group-containing monomer, and other monomers.
  • the most preferred low Tg polymer (B)! / Embodiments, if the high Tg polymer (A) contains acetic acid Byuruyu knit as the main component (70 mass 0/0 or more), 2- Echiru Hexyl Relay And a polymer obtained from a raw material monomer mixture containing butyl acrylate, 2-hydroxyethyl acrylate and / or 4-hydroxy butyl acrylate.
  • This polymer has good adhesive properties and is close to the refractive index of high Tg polymer (A), the main component of which is a butyl acetate unit, so it can reduce the haze of the resulting adhesive layer.
  • 2-ethyl hexyl acrylate, butinorea acrylate and hydroxy acetyl acrylate is 100% by mass
  • 2-ethyl hexyl acrylate is 20 to 80% by mass
  • butyl acrylate is 20%.
  • the total content of ⁇ 80 mass%, hydroxyethyl acrylate and 4-hydroxybutyl acrylate is preferably 0.5 to 6 mass%.
  • other monomers can be used in combination as described above.
  • the high Tg polymer is a high Tg polymer (A-1)
  • Monomers other than ethyl acrylate and 4-hydroxybutyl acrylate are preferably 10% by mass or less.
  • the most preferred embodiment of the low Tg polymer (B) is 2-ethyl hexyl acrylate and butyrate. This is a copolymer of noreatalylate, 2-hydroxyethyl acrylate and / or 4-hydroxybutyl acrylate and benzyl acrylate.
  • the haze of the pressure-sensitive adhesive layer can be reduced to 3% or less by using benzyl acrylate in combination.
  • the sum of these monomers is 100 mass%, 2 Echiru hexyl Atari rate from 20 to 80 weight 0/0, butyl Atari rate from 20 to 80 weight 0/0, hydroxy E chill Atari rate and 4 over hydroxybutyl Atari rate from 0.5 to 6 weight in total 0/0, benzyl Atari Les chromatography DOO is preferably 5 to 20 wt%.
  • the low Tg polymer (B) preferably has an Mw of 200,000 or more from the viewpoint of improving the adhesive properties.
  • Mw molecular weight of only the low Tg polymer (B) cannot be measured, but a mixture of the high Tg polymer (A) and the low Tg polymer (B) (Draft product).
  • the total Mw is preferably 100,000 to 700,000.
  • a more preferable Mw range is 150,000 to 650,000, and a more preferable Mw range is 200,000 to 600,000.
  • the high Tg polymer (A) and the low Tg polymer (B) are incompatible because of different Tg and different compositions.
  • the high Tg polymer (A) and the low Tg polymer (B) do not form a sea-island structure. I have to.
  • the sea-island structure is in a microphase-separated state, and the larger amount is the sea (continuous phase).
  • the amount of the low Tg polymer (B) is increased to disperse the low Tg polymer (B) as sea (continuous phase) and the high Tg polymer (A) as islands.
  • the content of the high Tg polymer (A) is required to be 1% by mass or more, and if it is less than this, the above effect will be insufficient. More preferably, it is 3% by mass or more, and further preferably 4% by mass or more. However, if the amount is too large, adhesive strength and wettability to the adherend may be insufficient.
  • the pressure-sensitive adhesive layer obtained by applying and drying the pressure-sensitive adhesive composition was measured using an optical microscope, a transmission electron microscope, a scanning electron microscope, a phase difference, and the like.
  • an optical microscope a transmission electron microscope
  • a scanning electron microscope a phase difference
  • the preferred form of the sea-island structure is such that the island-like portions are almost spherical and dispersed in the continuous phase (sea), and the average diameter of each island-like substance is about 0.;! To 10 m.
  • the presence or absence of such a sea-island structure can also be observed using an optical microscope, a phase contrast microscope, and a polarizing microscope.
  • Tg is 2 Check if they are observed.
  • the tan ⁇ of the dynamic viscoelasticity is obtained by, for example, using a rheometer (manufactured by TI-A Instruments Co., Ltd .; “ARES”) and by using the shear mode, paraplate method (8 mm ⁇ ), the angular vibration frequency 6. / s, measuring temperature range 50 ⁇ ;
  • a high-Tg polymer (A) and a low-Tg polymer (B) having an approximate refractive index are used, and a sea-island structure in which both are phase-separated microscopically has a haze of 3% or less. Adhesive products with excellent transparency can be obtained.
  • the haze can be measured, for example, with a turbidimeter.
  • the haze of this invention employ
  • support base material such as a polyethylene terephthalate
  • the method for producing the solvent-type re-peeling pressure-sensitive adhesive composition of the present invention will be described.
  • the blending method is a method in which a high Tg polymer (A) and a low Tg polymer (B) are polymerized separately, and then both are mixed (blended).
  • the polymerization method is not particularly limited, but solution polymerization is simple.
  • the high Tg polymer (A) and the low Tg polymer (B) are polymerized with the same or compatible solvent, they can be blended in solution, eliminating the need for a solvent removal step during blending. Convenient. When blending, it is preferable to stir at high speed with a disperser or the like to form a sea-island structure.
  • the pressure-sensitive adhesive composition of the present invention is prepared by a blending method, when the total amount of non-volatile components of the high Tg polymer (A) and the low T g polymer (B) is 100% by mass, the high Tg polymer (A) The amount is preferably 4 to 20% by mass. In this method, when the high Tg polymer (A) is dispersed in the low Tg polymer, the amount of the high Tg polymer (A) can be reduced because a clear sea-island structure is adopted.
  • the second method is a two-stage polymerization method.
  • this two-stage polymerization method all the monomers for the high Tg polymer (A) (hereinafter referred to as “monomer (A)”) are polymerized by solution polymerization, and then the high Tg polymer (A) solution
  • the monomer for low Tg polymer (B) (hereinafter referred to as “monomer (B)”) is polymerized in the presence.
  • the pressure-sensitive adhesive composition obtained by this two-stage polymerization method is more stable than the pressure-sensitive adhesive composition obtained by the blend method (high Tg polymer (A) and low Tg polymer (B) are difficult to separate). Is excellent.
  • the monomer (B) is polymerized, a part of the polymer is formed such that the low Tg polymer (B) is grafted to the high Tg polymer (A), which has an affinity for both the sea and the islands. It is thought to stabilize the island by exerting its surfactant action.
  • the island diameter is about 0.3 to 10 ⁇ .
  • the two-stage polymerization method it is preferable to start adding the monomer (B) to the reaction vessel after the polymerization rate of the monomer (A) reaches about 70 to 95% by mass. This method causes separation during storage of the composition.
  • the polymerization rate (mass%) is determined by the monomer in the reaction vessel It is the ratio of the mass converted to non-volatile content, and can be easily obtained by measuring the non-volatile content.
  • the low Tg monomer (B) is preferably added dropwise to the reactor together with the polymerization initiator. Increase the molecular weight with the force S.
  • the separately polymerized high Tg polymer (A) may be added after the two-stage polymerization of the high Tg polymer (A) and the low Tg polymer (B) is completed.
  • the composition of the post-added high Tg polymer (A) is preferably the same as the initially polymerized high Tg polymer (A) from the viewpoint of dispersion stability, but the molecular weight may be different. Furthermore, the effect of reducing the adhesive strength of high-speed peeling appears
  • the third method is a combination of the two-stage polymerization method and the post-addition of the high Tg polymer (A).
  • the high Tg polymer (A) to be charged by the two-stage polymerization and the high Tg for post-addition are used.
  • polymer (A) is polymerized together.
  • a part of the obtained high Tg polymer (A) is charged into a reaction vessel for synthesizing the low Tg polymer (B), and then the monomer (B) is polymerized.
  • This is a two-stage polymerization in a broad sense.
  • a graft product in which the low Tg polymer (B) is grafted to the high Tg polymer (A) is formed.
  • This method has the advantage that the high Tg polymer (A) to be charged in the reaction vessel in advance when polymerizing the low Tg polymer (B) and the high Tg polymer (B) to be added later can be polymerized simultaneously.
  • the amount of the high Tg polymer (A) charged during the polymerization of the low Tg polymer (B) is 100% by mass of the total amount of the high Tg polymer (A) and the monomer (B); ! ⁇ 10% by mass is preferable. Storage stability is improved.
  • the high Tg polymer (A) (including the graft content) out of the total non-volatile content of 100% by mass of the high Tg polymer (A) and the low Tg polymer (B) It is preferable to add the high Tg polymer (A) afterwards so that the amount of the polymer becomes 4 to 35% by mass.
  • the post-addition may be performed immediately after the polymerization of the low Tg polymer (B), but may be any time as long as it is actually mixed with a crosslinking agent and applied. The same applies when post-added by the second-stage polymerization method of the second method described above.
  • the solvent used in the solution polymerization include aromatic hydrocarbons such as toluene and xylene; aliphatic esters such as ethyl acetate and butyl acetate; Examples include alicyclic hydrocarbons such as cyclohexane; aliphatic hydrocarbons such as hexane and pentane, etc., but are not particularly limited as long as the polymerization reaction is not inhibited. Absent. These solvents may be used alone or in combination of two or more. What is necessary is just to determine the usage-amount of a solvent suitably.
  • the solvent-type re-peeling adhesive composition of the present invention contains a solvent as an essential component, but it is preferable to use the same solvent as the polymerization solvent. This is because the power obtained by the completion of the polymerization is directly used as a raw material for the solvent-type re-peeling pressure-sensitive adhesive composition.
  • Reaction conditions such as a polymerization reaction temperature and a reaction time are not particularly limited as long as they are appropriately set according to, for example, the composition and amount of the monomer.
  • the reaction pressure is not particularly limited, and any of normal pressure (atmospheric pressure), reduced pressure and increased pressure may be used.
  • the polymerization reaction is desirably performed in an atmosphere of an inert gas such as nitrogen gas.
  • the polymerization catalyst (polymerization initiator) is not limited, but examples thereof include methyl ethyl ketone peroxide, benzoyl peroxide, dicumyl peroxide, t-butyl hydroperoxide, cumene hydride peroxide, t-butyl.
  • Organics such as peroxyctoate, t-butylperoxybenzoate, lauroyl peroxide, trade name "Nyper B MT-K40J (manufactured by NOF Corporation; m mixture of toluoyl peroxide and benzoyl peroxide)"
  • Known compounds such as peroxides, azobisisobutyronitrile, azo compounds such as “ABN-E” [Nippon Hydrazine Kogyo; 2, 2'-azobis (2-methylbutyronitrile)], etc. Things can be used.
  • known molecular weight regulators represented by mercaptans such as dodecyl mercabtan may be used! /.
  • the pressure-sensitive adhesive composition obtained by the blend method as the first method and the pressure-sensitive adhesive composition obtained by using the second-stage polymerization method as the second or third method are subjected to the following separation degree check.
  • a high-Tg polymer (A), a low-Tg polymer (B), and a solvent are prepared to prepare a solution having a nonvolatile content of 30% by mass, poured into, for example, a test tube and sealed, and then sealed at 25 ° C. What is necessary is just to check the separation state when left for a period of time.
  • the high-Tg polymer (A) and the low-Tg polymer (B) have a sea-island structure that is easy to phase-separate obtained by the blending method, they will separate after standing for 24 hours. If the obtained sea-island structure is difficult to separate, it will not separate at all in 24 hours! /.
  • the solution prepared by the above method may be cloudy as long as the cloudy state is uniform throughout the solution. After standing for 24 hours under the above conditions, two or more phases with transparent parts appearing at the top and bottom of the liquid column or with different turbidity If it is divided, it is determined that it is “separated”.
  • the mass ratio of the high Tg polymer (A) and the low Tg polymer (B) in the solution is within the above-mentioned preferred range.
  • the solvent that can be used for the separation degree check is not particularly limited as long as it is a solvent used at the time of coating, but is not limited to aromatic hydrocarbons such as toluene and xylene; aliphatic esters such as ethyl acetate and butyl acetate. And alicyclic hydrocarbons such as cyclohexane; aliphatic hydrocarbons such as hexane and pentane, and the like. These may be used alone or in admixture of two or more.
  • the pressure-sensitive adhesive composition of the present invention preferably contains a crosslinking agent.
  • a crosslinking agent a compound having two or more functional groups capable of reacting with a functional group of the high Tg polymer (A) and / or the low Tg polymer (B) is used.
  • the isocyanate compound has a preferred carboxyl group as a crosslinking agent
  • the isocyanate A compound, an epoxy compound, etc. are preferable.
  • the combination of a hydroxyl group and an isocyanate compound is most preferred.
  • Examples of the isocyanate compound include tolylene diisocyanate (TDI), 4,4'-diphenylmethane diisocyanate (MDI), hexamethylene diisocyanate, xylylene, hydrogenated diphenolate.
  • TDI tolylene diisocyanate
  • MDI 4,4'-diphenylmethane diisocyanate
  • hexamethylene diisocyanate xylylene
  • hydrogenated diphenolate hydrogenated diphenolate.
  • Diisocyanate compounds such as methane diisocyanate, hydrogenated tolylene diisocyanate, hydrogenated xylylene diisocyanate, and isophorone diisocyanate; Bullet polyisocyanate compounds: “Desmodur (registered trademark) IL”, “Desmodur (registered trademark) HL” (both manufactured by Bayer AG), “Coronate (registered trademark) EH” (Nippon Polyurethane Industry) Polyisocyanate compound having an isocyanurate ring known as “Sumidur (registered trademark) L” Adduct polyisocyanate compounds such as “Sumitomo Bayer Urethane Co., Ltd.”; Adduct polyisocyanate compounds such as “Coronate (registered trademark) L” (manufactured by Nippon Polyurethane); “Deyuranate (registered trademark) D201” ( It is possible to list polyisocyanate compounds such as Asahi Kasei Corporation.
  • Examples of the epoxy compound include ethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, 1,6-hexane diglycidyl ether, bisphenol A type epoxy resin, N, N, ⁇ ', N'— Examples thereof include tetraglycidyl 1-m-xylenediamine, 1,3-bis (N, N-diglycidylaminomethinole) cyclohexane, N, N-diglycidyl dilin, N, N-diglycidyl toluidine and the like.
  • cross-linking agents should be added so that the total amount of functional groups of the high Tg polymer (A) and the low Tg polymer (B) is 1 equivalent; Is preferred. If the amount of the cross-linking agent is too small, the resulting adhesive may have insufficient cohesive force to cause adhesive residue, but if it is too large, the adhesive force may be insufficient or the wettability to a rough surface may be reduced.
  • the amount of the crosslinking agent is more preferably 0.2 to 4 equivalents, still more preferably 0.3 to 2 equivalents.
  • the non-volatile content of the solvent-based re-peeling pressure-sensitive adhesive composition of the present invention is not particularly limited, but for example, it is preferably 10 to 80% by mass, more preferably 20 to 60% by mass, Preferably it is 25-45 mass%. If the non-volatile content is less than 10% by mass, drying after application takes a long time, which may reduce productivity. On the other hand, if it exceeds 80% by mass, the viscosity of the whole composition becomes high, handling properties and coating properties are lacking, and there is a possibility that the practicality becomes poor.
  • the solvent for the pressure-sensitive adhesive composition any of the above-mentioned polymerization solvents can be used, and as described above, the same solvent as the polymerization solvent is preferred!
  • the compatibilizer is not particularly limited.
  • a block copolymer (graf) copolymer of (meth) acrylate and butyl acetate, a graft copolymer, or the like, or a compatibilizer by an ionic interaction (a compound or polymer having a specific functional group). Etc.) can be used.
  • the addition amount of the compatibilizer is preferably about 0 to 20 parts by mass per 100 parts by mass of the resin component (total amount of the polymer (A) and the polymer (B)) in the solvent-type re-peeling pressure-sensitive adhesive composition. .
  • the pressure-sensitive adhesive composition of the present invention is used for production of a re-peeling pressure-sensitive adhesive product.
  • Base material or An adhesive product adhesive tape or sheet in which an adhesive layer is formed on one side of the substrate by applying the adhesive composition on the release paper and forming a dry coating film on both sides of the substrate It is possible to obtain a pressure-sensitive adhesive product having a pressure-sensitive adhesive layer formed thereon, or a pressure-sensitive adhesive product having only a pressure-sensitive adhesive layer having no base material.
  • a method of applying a pressure sensitive adhesive composition on a release paper to form a pressure sensitive adhesive layer and then transferring it to a paper base material can be employed.
  • it is desirable to heat and dry under conditions where the solvent scatters for example, 50 to; 60 to 120 ° C for 60 to 180 seconds).
  • the base material examples include conventionally known papers such as fine paper, kraft paper, crepe paper, and dalasin paper; plastics such as polyethylene, polypropylene, polyester, polystyrene, polyethylene terephthalate, polychlorinated bure, and cellophane; Textile products such as cloth and non-woven fabric; laminates of these can be used.
  • the substrate is preferably a transparent film such as polyethylene terephthalate!
  • the method of applying the pressure-sensitive adhesive composition to the substrate is not particularly limited, and a known method such as a roll coating method, a spray coating method, or a dating method can be employed. In this case, any of a method of directly applying the pressure-sensitive adhesive composition to the base material, a method of applying the pressure-sensitive adhesive composition to a release paper, and then transferring the coated material onto the base material can be employed. After applying the pressure-sensitive adhesive composition, the pressure-sensitive adhesive layer is formed on the substrate by drying.
  • a release paper may be stuck! /.
  • the surface of the adhesive can be suitably protected and stored.
  • the release paper is peeled off from the surface of the adhesive when the adhesive product is used.
  • a pressure-sensitive adhesive surface is formed on one side of a substrate such as a sheet or tape
  • a known release agent is applied to the back surface of the substrate to form a release agent layer. If the adhesive layer is placed inside and the adhesive sheet (tape) is wound in a roll shape, the adhesive layer comes into contact with the release material layer on the back surface of the substrate. Protection 'Saved.
  • the adhesive product for re-peeling obtained from the pressure-sensitive adhesive composition of the present invention has a 180 ° adhesive strength of 0.05—0.3 N / 25 mm, 30 m / min at a low speed of 0.3 m / min. In high-speed peeling, it is preferably 0.2 to 3 N / 25 mm. If the low-speed peel adhesive strength is in the above range, the optical part This is because if it is sufficient as a surface protective sheet for the material and the high-speed peel adhesive strength is in the above range, it can be peeled smoothly without causing inconveniences such as zipping.
  • a more preferable low-speed peeled rice occupying force is 0.06—0.2 N / 25 mm, and more preferably 0.0 07—0.15 N / 25 mm.
  • the more preferable high-speed peel adhesive strength is 0.3 to 2 N / 25 mm, and more preferably 0.5 to 1.5 N / 25 mm. If the value obtained by dividing the high-speed peel adhesive force by the low-speed peel adhesive force is 15.0 or less, an increase in the adhesive force during high-speed peel can be suppressed.
  • the 180 ° adhesive force was measured at 23 ° C using an adhesive product in which an adhesive layer having a thickness of 20 m was formed on a polyethylene terephthalate film substrate having a thickness of 38 m. The case value is adopted.
  • the part “/ 25 mm” means the width of the pressure-sensitive adhesive sheet that is pressure-bonded to the adherend.
  • the re-peeling pressure-sensitive adhesive product obtained from the pressure-sensitive adhesive composition using the high Tg polymer (A-2) has a low speed of 0.3 m / min when subjected to a 180 ° peel test on an acrylic plate. Adherent contamination does not occur even with peeling! /, (See Examples).
  • VAC butyl acetate
  • a polymer solution of a low Tg polymer was obtained in the same manner as in Synthesis Example 4 except that the monomer yarn was changed to 150 parts BA, 2EHA335 parts, and HEA15 parts.
  • a low Tg polymer solution was obtained in the same manner as in Synthesis Example 4 except that the monomer yarns were changed to 150 parts BA, 2EHA335 parts and HEA15 parts.
  • a low Tg polymer solution was obtained in the same manner as in Synthesis Example 4 except that the monomer yarns were changed to BA335 parts, 2EHA150 parts, and HEA15 parts.
  • a MMA-based high Tg polymer solution was obtained in the same manner as in Synthesis Example 8, except that 250 parts of MMA and 1.0 part of “thiocalcol 20” were used.
  • the 100% non-volatile content of the same low Tg polymer solution as in Synthesis Example 8 is mixed together so that the non-volatile content of this MMA high Tg polymer solution is 20 parts.
  • I got 9. As a result of observing the pressure-sensitive adhesive layer obtained from this pressure-sensitive adhesive polymer solution No. 9 using an optical microscope, it was confirmed that it had a sea-island structure.
  • Table 1 shows the synthesis method for each of the pressure-sensitive adhesive polymer solutions;! To 9, and Table 2 shows the characteristics.
  • the characteristic evaluation method is as follows.
  • GPC measurement apparatus Liquid Chromatography Model 510 (manufactured by Waters) was used under the following conditions.
  • THF Tetrahydrofuran
  • the pressure-sensitive adhesive polymer solution was taken, and the nonvolatile content was adjusted to 34% with ethyl acetate.
  • a polyethylene terephthalate (PET) film (manufactured by Toray Industries, Inc .; thickness 3 8 111) was used as a supporting substrate, and the pressure-sensitive adhesive composition was applied so that the thickness after drying was 20 m.
  • An adhesive film was prepared by drying at 0 ° C. for 2 minutes. After sticking and protecting the adhesive surface with a PET film that had been subjected to a release treatment, it was cured in an atmosphere of 40 ° C for 3 days. The cured adhesive film was conditioned for 24 hours in an atmosphere of 23 ° C. and 65% relative humidity, and then cut to an appropriate length with a width of 25 mm to prepare a test tape. The release film was peeled off during the test.
  • PET polyethylene terephthalate
  • a 3 mm thick acrylic plate (standard test plate made by Nippon Test Panel Co., Ltd.) was used as the adherend, and the above test tape was placed on the acrylic plate in an atmosphere of 23 ° C and 65% relative humidity. 1 reciprocate and crimp. After standing for 25 minutes after crimping, the peel rate is 0.3 m / min for low speed peel and 30 m / min for high speed peel, and 180 ° peel adhesive strength in accordance with JIS K 6854 under an atmosphere of 23 ° C. It was measured. Table 2 also shows the low-speed peel adhesive strength, the high-speed peel adhesive strength, and the value obtained by dividing the high-speed peel adhesive strength by the low-speed peel adhesive strength (shown as “high speed / low speed”).
  • the haze (%) of the test tape was measured according to JIS K 7105.
  • the pressure-sensitive adhesive compositions of Examples 2 to 3 in which two-stage polymerization was carried out were excellent in storage stability without causing separation.
  • high Tg polymer (A-1) and low Tg polymer (B) are blended in a well-balanced manner. 0 or less. Since Comparative Example 1 consisted of only the low Tg polymer (B), the high-speed peel adhesive strength was too large. Even in Comparative Example 2 in which the high Tg polymer (A) and the low Tg polymer (B) were polymerized in a lump, the high-speed peel adhesive strength was high, and zippering occurred.
  • Example 5 and Reference Example 2 since a MMA-based polymer having a refractive index different from that of 2EHA or BA was used as the high Tg polymer (A), it was not very good for haze! However, in Reference Example 2, it was found that the Tg of the high Tg polymer (A) was too high, so that the peel force at low speed was too small and the adhesive strength might be insufficient.
  • An adhesive polymer solution No. 10 was obtained by adding 20 parts of the high Tg polymer ethyl acetate solution in a nonvolatile content to 100 parts of the nonvolatile content in the obtained graft polymer solution.
  • the pressure-sensitive adhesive layer obtained from this adhesive polymer solution No. 10 was observed using SEM, and as a result, it was confirmed that it had a sea-island structure (Fig. 1).
  • the upper side is polyethylene terephthalate (PET) of the base film, and the lower side is an adhesive layer.
  • a high Tg polymer was synthesized in the same manner as in Synthesis Example 10 except that the monomer composition for the high Tg polymer was changed as shown in Table 3.
  • the ratio of graft polymer to high Tg polymer was 100: 20 in non-volatile content.
  • a coating film was formed on a slide and observed with an optical microscope. As a result, it was confirmed that the structure was a sea-island structure.
  • Synthesis Example 12 and Synthesis Example 13 are examples in which the mixing ratio of the high Tg polymer obtained in Synthesis Example 11 and the graft polymer was changed. As a result of forming a coating film on the preparation using the pressure-sensitive adhesive polymer solutions No. 12 and 13 obtained in each example and observing with an optical microscope, it was confirmed that the structure was a sea-island structure.
  • a high Tg polymer solution and a graft polymer solution were obtained in the same manner as in Synthesis Example 11 except that the amount of DM used to synthesize the graft polymer was reduced to 0.15 part.
  • the ratio of graft polymer to high Tg polymer was 100: 20 in non-volatile content.
  • a high Tg polymer solution and a graft polymer solution were obtained in the same manner as in Synthesis Example 11, except that the amount of the high Tg polymer charged was reduced to 6 parts.
  • the ratio of graft polymer to high-Tg polymer was 100: 20 in terms of nonvolatile content, and both solutions were mixed to obtain adhesive polymer solution No. 15.
  • the structure was a sea-island structure.
  • a high Tg polymer solution was prepared in the same manner as in Synthesis Example 11. Next, a monomer for low Tg polymer was separately polymerized. In a flask equipped with a thermometer, stirrer, inert gas inlet tube, reflux condenser and dropping funnel, 36 parts BA, 2EHA 82.2 parts, HEA 1.8 parts, and ethyl acetate as low Tg polymer monomers 144 parts were charged and mixed well. While the nitrogen gas was circulated under stirring, the internal temperature of the flask was raised to 82 ° C., and 0.15 part of the above-mentioned “Nyper (registered trademark) BMT-K40” was put into the flask to initiate the polymerization.
  • “Nyper (registered trademark) BMT-K40” was put into the flask to initiate the polymerization.
  • the low Tg polymer solution and the high Tg polymer solution were mixed so that the non-volatile content ratio was 100: 20 to obtain an adhesive polymer solution No. 16.
  • the structure was a sea-island structure.
  • a high Tg polymer was synthesized in the same manner as in Synthesis Example 10 except that the monomer composition for the high Tg polymer was changed as shown in Table 3.
  • the monomer for low Tg polymer was polymerized in the presence of high Tg polymer to synthesize the graft polymer.
  • 3 parts as monomers for low Tg polymer 2.7 parts of HEA and 120 parts of ethyl acetate were charged and mixed well. While the nitrogen gas was circulated under stirring, the internal temperature of the flask was raised to 82 ° C., and 0 ⁇ 12 parts of “NIPPER ⁇ — ⁇ 40” were put into the flask to initiate the polymerization.
  • the test tape is reciprocated once with a 2kg rubber roller in an atmosphere of 23 ° C and relative humidity of 65%. And crimp. After crimping, it was left in an oven at 70 ° C. for 72 hours, and then temperature-controlled for 24 hours in an atmosphere at 23 ° C. and 65% relative humidity. The test tape was peeled off at a peeling speed of 0.3 m / min, and the surface state of the acrylic plate after peeling was visually observed. V, no contamination (no glue residue) was rated as 0, and there was a slight amount of glue residue and contamination! /, And X was rated as X.
  • a test piece having a size of 4 cm ⁇ 4 cm is cut out from the test tape.
  • Use the rough surface of a commercially available LCD protective film (antiglare) (manufactured by BUFFALO; BOF-H141 S) as the adherend, and place the antiglare film horizontally on a flat surface so that the rough surface is on top.
  • BA 60 kg, 2EHA 134 kg, HEA 6 kg, and 240 ⁇ m of lutinole acetate as a solvent were added to a flask equipped with a thermometer, a stirrer, an inert gas introduction tube, a reflux condenser, and a dropping funnel. While flowing nitrogen gas under stirring, the internal temperature of the flask was raised to 87 ° C, and 0.25 parts of “Nyper BMT-K40” diluted with 2.3 parts of ethyl acetate as a polymerization initiator was added to the flask. To initiate polymerization.
  • High Tg polymer was synthesized in the same manner as in Synthesis Example 18.
  • the initial monomer composition was changed to BA 60 parts, 2EHA 114 parts, HEA 9 parts, benzyl acrylate (BZA) 20 parts, and the dropped monomer composition was changed to BA 90 parts, 2EHA 171 parts, HE A 9 parts, BZA 30 parts.
  • a low Tg polymer was synthesized in the same manner as in Synthesis Example 18. The non-volatile content of the obtained low Tg polymer solution was 45.5%. The Tg was 58 ° C and the Mw was 64.70,000.
  • the high Tg polymer and the low Tg polymer have a sea-island structure. Adhesive with the advantages of both polymer and low Tg polymer
  • the adhesive products obtained using the above-mentioned adhesive composition are the surfaces of optical members such as optical polarizing plates (TAC), retardation plates, EMI (electromagnetic wave) shield films, antiglare films, antireflection films and the like. It can be used as an adhesive product for re-peeling to protect the film. It can also be used as a protective film for the surface of other plastics and metal plates.
  • optical members such as optical polarizing plates (TAC), retardation plates, EMI (electromagnetic wave) shield films, antiglare films, antireflection films and the like. It can be used as an adhesive product for re-peeling to protect the film. It can also be used as a protective film for the surface of other plastics and metal plates.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Adhesive Tapes (AREA)

Abstract

Disclosed is a solvent-type removable adhesive composition which comprises a high-Tg polymer (A) having a glass transition temperature (Tg) of 0˚C or higher, a low-Tg polymer (B) having a Tg lower than that of the high-Tg polymer and also having a pressure-sensitive adhesion property, and a solvent. In an adhesive layer produced by using the adhesive composition, the high-Tg polymer (A) and the low-Tg polymer (B) are not dissolved in each other and form a sea-island structure, wherein the high-Tg polymer (A) forms an island phase and the low-Tg polymer (B) forms a sea phase. The composition enables to form an adhesive layer having an excellent high-speed peeling property when used as a surface protection film for an optical film.

Description

明 細 書  Specification
溶剤型再剥離用粘着剤組成物および再剥離用粘着製品  Solvent-type re-peeling pressure-sensitive adhesive composition and re-peeling pressure-sensitive adhesive product
技術分野  Technical field
[0001] 本発明は、被着体に貼着した後、再度剥離される再剥離用であって、高速剥離で も優れた剥離性を示す再剥離用粘着製品と、この粘着製品を製造するための溶剤 型の粘着剤組成物に関する。より詳細には、光学用偏光板 (TAC)、位相差板、 EM 1 (電磁波)シールドフィルム、防眩フィルム、反射防止フィルム等といった光学用部材 の表面を保護するための再剥離用粘着製品に関するものである。  [0001] The present invention relates to a re-peeling adhesive product that is re-peeled after being attached to an adherend and then peeled again, and exhibits excellent peelability even at high-speed peeling, and the adhesive product is produced. The present invention relates to a solvent-type pressure-sensitive adhesive composition. More specifically, the present invention relates to a re-peeling adhesive product for protecting the surface of optical members such as optical polarizing plates (TAC), retardation plates, EM 1 (electromagnetic wave) shield films, antiglare films, antireflection films, etc. Is.
背景技術  Background art
[0002] 液晶ディスプレイやプラズマディスプレイ等には、種々の機能を有する光学用フィル ム、例えば、光学用偏光板 (TAC)、位相差板、 EMI (電磁波)シールドフィルム、防 眩フィルム、反射防止フィルム等が積層されて用いられている。これらの光学用フィル ムは、ディスプレイの製造工程中や性能検査段階での表面の損傷を防止するために 、その表面に保護フィルムが貼着されており、最終的に機能複合フィルム製造時や 液晶パネル組み立て工程で剥離除去される。  [0002] For liquid crystal displays and plasma displays, optical films having various functions, such as optical polarizing plates (TAC), retardation plates, EMI (electromagnetic wave) shield films, antiglare films, antireflection films, etc. Etc. are laminated and used. These optical films have a protective film affixed to the surface in order to prevent damage to the surface during the display manufacturing process and performance inspection stage. Stripped and removed in the panel assembly process.
[0003] 表面保護フィルムとしては、性能検査を妨害しなレ、透明性、気泡等の嚙み込みを 許さない貼り付け性が必要であると共に、被着体への貼付後の粘着力増加や被着体 への糊残りがないこと等が必要である。さらに、最近では、ディスプレイの大型化に伴 つて保護フィルムも大面積化してきたため、剥離工程が機械化され、その結果、機械 による高速剥離が可能であることも重要な要求特性となってきた。  [0003] As a surface protective film, it is necessary not only to prevent performance inspection, but also to have an adhesive property that does not allow stagnation of bubbles and the like, and to increase adhesion after being applied to an adherend. It is necessary that there is no adhesive residue on the adherend. Furthermore, recently, as the size of the display has increased, the protective film has also increased in area, so that the peeling process has been mechanized, and as a result, it has become an important required characteristic that high-speed peeling by a machine is possible.
[0004] しかし、剥離速度が高速になればなるほど、剥離力(粘着力)は増大する傾向にあ るため、剥離機械に大きな負荷をかけることとなる。また、剥離時に、滑らかに剥離す る部分となかなか剥離しない部分とが生じてバリバリという音を立てながら剥離する現 象 (ジッビング剥離)が起こって、光学用フィルム表面が損傷したり、破断してしまうこ とがあった。  [0004] However, as the peeling speed increases, the peeling force (adhesive force) tends to increase, which places a heavy load on the peeling machine. In addition, when peeling off, a part that peels off smoothly and a part that does not peel off easily occur, and the phenomenon of peeling while making a buzzing sound (zibbing peeling) occurs, and the optical film surface is damaged or broken. I had a problem.
[0005] このため、保護フィルムの高速剥離性を改善する試みが多数行われて!/、る。例えば 、特開 2005— 146151号公報には、常温では粘着性を有しない高 Tgの (メタ)アタリ ル系ポリマーと、十分な粘着力を有する低 Tgの(メタ)アクリル系ポリマーとをブレンド することで、浮きや剥がれがなく(それなりの粘着性を有し)、かつ、高速剥離性が良 好な、保護フィルム用の感圧接着剤が開示されている。 [0005] For this reason, many attempts have been made to improve the high-speed peelability of the protective film! For example, Japanese Patent Application Laid-Open No. 2005-146151 discloses a high Tg (meth) atari which has no adhesiveness at room temperature. By blending a low molecular weight polymer with a low Tg (meth) acrylic polymer with sufficient adhesive strength, there is no lifting or peeling (having a certain level of adhesiveness), and high-speed peelability is good. Further, a pressure sensitive adhesive for a protective film is disclosed.
[0006] 上記のような保護フィルム用の粘着製品は、剥離されることが前提のため、一般の 粘着製品に比べてかなり低い粘着力(微粘着)に設計されている。し力もながら、高 τ gポリマーの Tgが高すぎると、元々、低レベルの粘着力であるために、低温時の粘着 性がほとんどなくなったり、経時的に架橋が進行して被着体に貼り付かなくなるという 不都合を起こすことがあった。  [0006] The adhesive product for the protective film as described above is designed to have a considerably lower adhesive strength (slight adhesion) than a general adhesive product on the premise that it is peeled off. However, if the Tg of the high τg polymer is too high, it is inherently at a low level of adhesive strength, so that the adhesiveness at low temperatures is almost lost or the crosslinking progresses over time and sticks to the adherend. It sometimes caused the inconvenience of not sticking.
[0007] また、一般的に異種のポリマーは、数少な!/、例外を除レ、てブレンドしても非相溶で あり、同じ (メタ)アクリル系ポリマーといえども相分離を起こしてしまう。このように相溶 性が劣った粘着剤は、塗膜にしたときにヘイズが大きくなり、光学用途の保護フィル ムとしては不適なものとなる場合がある。さらに、保護フィルムを製造するために、塗 ェに適した粘度まで溶剤で粘着剤組成物を希釈すると、一層分離しやすくなつて、 1 日程度の放置で粘着剤組成物が相分離してしまい、再度、撹拌混合を行う必要があ つたり、使用できなくなるという問題があった。  [0007] In general, different types of polymers are incompatible even with a few! /, Except for exceptions, and even the same (meth) acrylic polymer causes phase separation. Such a poorly compatible pressure-sensitive adhesive has a large haze when formed into a coating film, and may be unsuitable as a protective film for optical applications. Furthermore, when the pressure-sensitive adhesive composition is diluted with a solvent to a viscosity suitable for coating to produce a protective film, it becomes easier to separate, and the pressure-sensitive adhesive composition phase-separates on standing for about 1 day. There was a problem that it was necessary to carry out stirring and mixing again, or it could not be used.
[0008] また、粘着製品を過酷な条件で被着体から剥離すると、被着体に粘着剤の一部が 残存してしまう被着体汚染が起こることがあり、再剥離性の向上が求められていた。さ らに、被着体に対するなじみ性 (濡れ性)の点でも改善の余地があった。  [0008] Further, if the pressure-sensitive adhesive product is peeled off from the adherend under severe conditions, adherend contamination may occur in which part of the pressure-sensitive adhesive remains on the adherend, and improvement in removability is required. It was done. In addition, there was room for improvement in terms of conformability (wettability) to the adherend.
[0009] そこで、本発明では、光学用フィルムの表面保護フィルムに適用することを目的とし て、高速剥離性に優れ、ヘイズが小さぐさらには被着体汚染等のトラブルを起こしに くい粘着剤層を形成し得る溶剤型再剥離用粘着剤組成物を見出し、良好な特性の 再剥離用粘着製品を提供することを課題として掲げた。  [0009] Therefore, in the present invention, for the purpose of being applied to the surface protective film of an optical film, the pressure-sensitive adhesive is excellent in high-speed peelability and has low haze and hardly causes troubles such as adherend contamination. A solvent-type re-peeling pressure-sensitive adhesive composition capable of forming a layer was found, and an object was to provide a re-peeling pressure-sensitive adhesive product having good characteristics.
発明の開示  Disclosure of the invention
[0010] 本発明の溶剤型再剥離用粘着剤組成物は、ガラス転移温度 (Tg)が o°c以上の高 Tgポリマー(A)と、この高 Tgポリマーよりも低い Tgを有し、感圧接着性を示す低 Tg ポリマー(B)および溶剤を含む溶剤型再剥離用粘着剤組成物であって、上記粘着 剤組成物から得られる粘着剤層において、高 Tgポリマー (A)と低 Tgポリマー(B)と が相溶することなぐ高 Tgポリマー (A)が島、低 Tgポリマー(B)が海である海島構造 を形成して!/、るところに特徴を有して!/、る。 [0010] The solvent-based re-peeling pressure-sensitive adhesive composition of the present invention has a high Tg polymer (A) having a glass transition temperature (Tg) of o ° c or higher and a Tg lower than this high Tg polymer, A solvent-type re-peeling pressure-sensitive adhesive composition containing a low-Tg polymer (B) exhibiting pressure adhesion and a solvent, wherein a high-Tg polymer (A) and a low Tg are used in the pressure-sensitive adhesive layer obtained from the pressure-sensitive adhesive composition. Sea-island structure where high Tg polymer (A) is an island and low Tg polymer (B) is the sea without polymer (B) being compatible with each other It has a special feature!
[0011] また、本発明の再剥離用粘着製品は、上記溶剤型再剥離用粘着剤組成物から得 られた粘着剤層が支持基材の少なくとも片面に形成されているところに特徴を有して いる。 [0011] The pressure-sensitive adhesive product for re-peeling of the present invention is characterized in that a pressure-sensitive adhesive layer obtained from the solvent-based re-peeling pressure-sensitive adhesive composition is formed on at least one side of a support substrate. ing.
図面の簡単な説明  Brief Description of Drawings
[0012] [図 1]合成例 1で得られた粘着剤ポリマー溶液の塗膜の SEM写真 (海島構造)である 発明を実施するための最良の形態  FIG. 1 is an SEM photograph (sea-island structure) of a coating film of an adhesive polymer solution obtained in Synthesis Example 1. BEST MODE FOR CARRYING OUT THE INVENTION
[0013] まず、本発明にかかる溶剤型再剥離用粘着剤組成物について説明するが、本発 明の範囲はこれらの説明に拘束されることはなぐ以下の例示以外についても、本発 明の趣旨を損なわない範囲で適宜変更実施し得る。本発明の溶剤型再剥離用粘着 剤組成物は、乾燥させる (溶剤を除去する)ことによって粘着製品となるものであって 、後述する条件によって測定されるアクリル板に対する低速剥離における 180°粘着 力が 10N/25mm以下の場合を指すものとする。また、本発明における「ポリマー」 には、ホモポリマーはもとより、コポリマーや三元以上の共重合体も含まれるものとす る。本発明の「モノマー」は、いずれも付加重合型モノマーである。  [0013] First, the solvent-based re-peeling pressure-sensitive adhesive composition according to the present invention will be described. However, the scope of the present invention is not limited to these descriptions, and the present invention is not limited to the following examples. Changes can be made as appropriate without departing from the spirit of the invention. The solvent-type re-peeling pressure-sensitive adhesive composition of the present invention becomes a pressure-sensitive adhesive product by drying (removing the solvent), and has a 180 ° adhesive strength in low-speed peeling against an acrylic plate measured under the conditions described later. Refers to the case of 10N / 25mm or less. The “polymer” in the present invention includes not only homopolymers but also copolymers and copolymers of three or more. The “monomer” of the present invention is an addition polymerization type monomer.
[0014] まず、本発明の溶剤型再剥離用粘着剤組成物における第 1の必須成分は、ガラス 転移温度 (Tg)が 0°C以上の高 Tgポリマー(A)である。この高 Tgポリマー(A)の存在 によって高速剥離力の増大を抑制する。  [0014] First, the first essential component in the solvent-based re-peeling pressure-sensitive adhesive composition of the present invention is a high Tg polymer (A) having a glass transition temperature (Tg) of 0 ° C or higher. The presence of this high Tg polymer (A) suppresses the increase in the high speed peel force.
[0015] ここで、ポリマーの Tgは、 DSC (示差走査熱量測定装置)、 DTA (示差熱分析装置 )、 TMA (熱機械測定装置)によって求めること力 Sできる。また、ホモポリマーの Tgは 各種文献 (例えばポリマーハンドブック等)に記載されているので、コポリマーの Tgは 、各種ホモポリマーの Tg (K)と、モノマーの質量分率(W )とから下記式によって求 めることあでさる。  Here, the Tg of the polymer can be determined by DSC (Differential Scanning Calorimetry), DTA (Differential Thermal Analysis), and TMA (Thermomechanical Measurement). In addition, since the Tg of homopolymers is described in various literatures (for example, polymer handbooks), the Tg of copolymers is calculated from the following formula using Tg (K) of various homopolymers and mass fraction (W) of monomers. Finding what you want.
[0016] [数 1] に , w2 [0016] In [Equation 1], w 2
Tg Tgl Tg2
Figure imgf000005_0001
[0017] ここで W ;各単量体の質量分率
Tg T gl Tg 2
Figure imgf000005_0001
[0017] where W is the mass fraction of each monomer.
Tg ;各単量体のホモポリマーの Tg (K)  Tg: Tg (K) of homopolymer of each monomer
主要ホモポリマーの Tgを示せば、ポリアクリル酸は 105. 85°C、ポリメチルアタリレ ートは 9. 85°C、ポリェチルアタリレートは 24. 15°C、ポリ n ブチルアタリレートは - 54. 15°C、ポリ 2 ェチノレへキシノレアタリレート (ま 70. 00°C、ポリ 2 ヒドロキシ ェチノレアタリレート ίま 15. 00°C、ポリ 2 ヒドロキシェチノレメタタリレート (ま 84. 85°C 、ポリ 4ーヒドロキシブチルアタリレートは 32· 00°C、ポリメチルメタタリレートは 104 . 85°C:、ポリ酢酸ピ、二ノレ ίま 30. 00°C:、ポリベンジノレ タリレート ίま 6. 00°C:、ポリ タリ ロニトリノレは 125°C、ポリスチレンは 100°Cである。  The Tg of the main homopolymer is 105.85 ° C for polyacrylic acid, 9.85 ° C for polymethyl acrylate, 24.15 ° C for polyethyl acrylate, and poly n butyl acrylate. -54.15 ° C, Poly-2-Hethinoreta Talelate (70.00 ° C, Poly-2Hydroxyethylaretalate) 85 ° C, poly 4-hydroxybutyl attalate is 3 · 00 ° C, polymethylmetatalylate is 104 ° 85 ° C: Polyacetate, Ninole, 30. 00 ° C :, Polybenzenore 6. 00 ° C: 125 ° C for Polynitronitroré and 100 ° C for Polystyrene.
[0018] 本発明で用いられる高 Tgポリマー (A)は、 Tgが 0°C以上であれば特に限定されず 、ホモポリマーでも、 2種以上のモノマーを共重合したポリマーでも構わない。高速剥 離性をより一層改善するには、 Tgは 10°C以上が好ましぐ 20°C以上がより好ましぐ 30°C以上がさらに好ましい。ただし、高 Tgポリマー (A)の Tgが高すぎると、再剥離用 の微粘着タイプとはいえ、粘着力不足に陥ることがあるので、 80°C未満が好ましぐ 7 5°C以下が好ましぐ 70°C以下がさらに好ましい。  [0018] The high Tg polymer (A) used in the present invention is not particularly limited as long as Tg is 0 ° C or higher, and may be a homopolymer or a polymer obtained by copolymerizing two or more monomers. In order to further improve the high-speed peelability, Tg is preferably 10 ° C or higher, more preferably 20 ° C or higher, and further preferably 30 ° C or higher. However, if the Tg of the high Tg polymer (A) is too high, although it may be a slightly adhesive type for re-peeling, the adhesive strength may be insufficient, so less than 80 ° C is preferred 75 ° C or less The preferred temperature is 70 ° C or less.
[0019] 本発明の高 Tgポリマー (A)は、高速剥離性を改善するための必須成分であるが、 第 2の課題としてヘイズを重視する場合と、被着体汚染の抑制を重視する場合とでは 、好適な組成が異なる。そこで、ヘイズを重視する場合の高 Tgポリマーを (A—1)とし 、被着体汚染の抑制を重視する場合の高 Tgポリマーを (A— 2)として、それぞれに ついて説明する。  [0019] The high Tg polymer (A) of the present invention is an essential component for improving the high-speed peelability. However, as a second problem, a case where importance is attached to haze and a case where importance is placed on suppression of adherend contamination. And the preferred composition is different. Thus, the high Tg polymer when haze is emphasized is (A-1), and the high Tg polymer when emphasis is placed on adherend contamination control is (A-2).
[0020] ( 1 )ヘイズを重視する場合の高 Tgポリマー (A— 1 )  [0020] (1) High-Tg polymer when haze is important (A—1)
本発明の粘着剤組成物から得られる粘着剤層のヘイズを小さくするには、高 Tgポリ マー(A— 1)が酢酸ビュル由来のユニットを有して!/、ること力 S好まし!/、。酢酸ビュル系 ポリマーの屈折率と、低 Tgポリマー(B)の主体となる(メタ)アタリレート系ポリマー(特 に、 2—ェチルへキシルアタリレートやブチルアタリレートを含むポリマー)との屈折率 が近似しているため、ヘイズが小さくなるからである。従って、高 Tgポリマー(A—1) は、酢酸ビュルを 70質量%以上有して!/、る原料モノマーから得られたものであること が好ましい。酢酸ビュルは 90質量%以上がより好ましい。ヘイズの点で最も好ましい 高 Tgポリマー(A— 1)はポリ酢酸ビュル(酢酸ビュルホモポリマー)である。高 Tgポリ マー (A— 1 )としてポリ酢酸ビュルを用レ、れば、得られる粘着剤層のヘイズを 2%以 下にすることもでき、高い透明度が要求される光学用フィルムの表面保護用フィルム として好適となる。 In order to reduce the haze of the pressure-sensitive adhesive layer obtained from the pressure-sensitive adhesive composition of the present invention, the high Tg polymer (A-1) has units derived from butyl acetate! /. The refractive index of the butyl acetate polymer and the refractive index of the (meth) acrylate polymer (particularly a polymer containing 2-ethylhexyl acrylate or butyl acrylate), which is the main component of the low Tg polymer (B). This is because the haze is reduced because of the approximation. Therefore, the high Tg polymer (A-1) is preferably obtained from a raw material monomer having 70% by mass or more of butyl acetate. The amount of butyl acetate is more preferably 90% by mass or more. Most preferred in terms of haze The high Tg polymer (A-1) is poly (butyl acetate) (bule acetate homopolymer). If polyacetic acid bule is used as a high Tg polymer (A-1), the haze of the resulting adhesive layer can be reduced to 2% or less, and surface protection of optical films that require high transparency is required. It is suitable as a film.
[0021] 酢酸ビュルホモポリマーでない場合の高 Tgポリマー(A— 1)では、ホモポリマーの Tgが高い (メタ)アクリル酸、メチル (メタ)アタリレート、ェチル (メタ)アタリレート、アタリ ロニトリル、スチレン等を、酢酸ビュルと組み合わせて使用することが好ましい。また、 後述する低 Tgポリマー(B)の原料モノマーとして使用できるモノマーも、高 Tgポリマ 一 (A— 1)の Tgが 0°C以上になるように種類と量を選択すれば使用可能である。  [0021] In the case of a high Tg polymer (A-1) that is not a butyl acetate homopolymer, the homopolymer has a high Tg. (Meth) acrylic acid, methyl (meth) acrylate, ethyl (meth) acrylate, acrylate, styrene Etc. are preferably used in combination with butyl acetate. Monomers that can be used as raw material monomers for the low Tg polymer (B) described below can also be used if the type and amount are selected so that the Tg of the high Tg polymer (A-1) is 0 ° C or higher. .
[0022] (2)被着体汚染の抑制を重視する場合の高 Tgポリマー (A— 2)  [0022] (2) High Tg polymer when importance is placed on the suppression of adherend contamination (A-2)
被着体汚染を抑制するためには、高 Tgポリマー (A— 2)に、後に配合される架橋 剤との反応性を有する官能基を導入しておくことが好ましい。高 Tgポリマー (A— 2) を架橋することで、被着体汚染の原因となる比較的低分子量の高 Tgポリマー (A— 2 )を高分子量化し、被着体汚染を抑制するのである。官能基としては、ヒドロキシル基 、カルボキシル基、アミノ基、アミド基、エポキシ基等が挙げられる。  In order to suppress adherend contamination, it is preferable to introduce a functional group having reactivity with a crosslinking agent to be added later into the high Tg polymer (A-2). By crosslinking the high Tg polymer (A-2), the high Tg polymer (A-2) having a relatively low molecular weight that causes adherend contamination is increased in molecular weight, thereby suppressing adherend contamination. Examples of the functional group include a hydroxyl group, a carboxyl group, an amino group, an amide group, and an epoxy group.
[0023] 上記官能基を高 Tgポリマー (A— 2)に導入するには、高 Tgポリマー (A— 2)の原 料モノマーとして官能基含有モノマーを用いればよい。官能基含有モノマーとしては 、 2—ヒドロキシェチル(メタ)アタリレート、ヒドロキシプロピル(メタ)アタリレート、 4ーヒ  In order to introduce the functional group into the high Tg polymer (A-2), a functional group-containing monomer may be used as a raw material monomer for the high Tg polymer (A-2). Examples of functional group-containing monomers include 2-hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, 4-h
タル酸とプロピレングリコールと力も得られるポリエステルジオールのモノ(メタ)アタリ レート等のヒドロキシル基含有 (メタ)アタリレート類;(メタ)アクリル酸、ケィ皮酸および クロトン酸等の不飽和モノカルボン酸;マレイン酸、フマル酸、ィタコン酸およびシトラ コン酸等の不飽和ジカルボン酸;これら不飽和ジカルボン酸のモノエステル等のカル ボキシル基含有モノマー;アミノ基、アミド基、エポキシ基等のいずれかを有する(メタ )アタリレート類等が挙げられる。 Hydroxyl group-containing (meth) acrylates such as mono (meth) acrylate of polyester diol that can also be used with taric acid and propylene glycol; unsaturated carboxylic acids such as (meth) acrylic acid, cinnamate and crotonic acid; Unsaturated dicarboxylic acids such as maleic acid, fumaric acid, itaconic acid and citraconic acid; carboxy group-containing monomers such as monoesters of these unsaturated dicarboxylic acids; amino groups, amide groups, epoxy groups, etc. And meta) atarylates.
[0024] 上記の中でも、官能基としてヒドロキシル基を有するヒドロキシル基含有 (メタ)アタリ レート類が好ましい。特に、ヒドロキシル基が(メタ)アタリロイル基から離間したところ にあるモノマーの方が、架橋反応性やなじみ性がよくなるので、架橋剤量を少なくし たい場合や被着体に対するなじみ性が重要視される場合は、 2-ヒドロキシェチル (メ タ)アタリレートよりも、炭素数の大きなアルキル基(プロピル基以上)にヒドロキシル基 が結合して!/、る(メタ)アタリレート (例えば、 4-ヒドロキシプチノレ (メタ)アタリレート等) を用いることが好ましい。 Of the above, hydroxyl group-containing (meth) acrylates having a hydroxyl group as a functional group are preferred. In particular, when the hydroxyl group is separated from the (meth) attalyloyl group The monomers in this group have better cross-linking reactivity and conformability, so if you want to reduce the amount of cross-linking agent or if suitability for adherends is important, 2-hydroxyethyl (meth) atari The hydroxyl group is bonded to an alkyl group having a larger number of carbon atoms than the rate (propyl group or higher)! /, And (meth) acrylate (eg, 4-hydroxy pentanol (meth) acrylate) is used. preferable.
[0025] これらの官能基含有モノマーは、高 Tgポリマー(A— 2)の原料モノマー 100質量0 /0 中、 0. ;!〜 10質量%とすることが好ましい。官能基含有モノマーの使用量が 0. 1質 量%未満では、高 Tgポリマー (A— 2)中の官能基量が少なくなつて、被着体汚染を 抑制する効果が充分に発現しないため好ましくない。また、 10質量%を超えると、粘 着剤の粘着力や被着体への濡れ性が低下傾向となるため好ましくない。官能基含有 モノマーの使用量は、 0. 3〜8質量%がより好ましぐ 0. 5〜6質量%がさらに好まし い。 [0025] These functional group-containing monomer, in the raw material monomer 100 mass 0/0 of the high Tg polymer (A- 2), 0.; is preferably set to 1-10% by mass!. If the amount of the functional group-containing monomer is less than 0.1% by mass, the amount of the functional group in the high Tg polymer (A-2) is decreased, and the effect of suppressing adherend contamination is not sufficiently exhibited. Absent. On the other hand, if it exceeds 10% by mass, the adhesive strength of the adhesive and the wettability to the adherend tend to decrease, which is not preferable. The amount of the functional group-containing monomer is more preferably 0.3 to 8% by mass, and further preferably 0.5 to 6% by mass.
[0026] なお、上記官能基含有モノマーの共重合相手としては、高 Tgポリマー (A— 2)の T gが 0°C以上になるのであれば、公知のラジカル重合性モノマーがいずれも使用可能 であるが、高 Tgポリマー (A— 1)のところで説明したとおり、酢酸ビュルを用いると粘 着剤層のヘイズが小さくなつて、光学用フィルムの表面保護用フィルムとして好適で ある。従って、高 Tgポリマー (A— 2)は、酢酸ビュルと上記官能基含有モノマーを必 須的に含む原料モノマーから得られたものであることが好ましい。このとき、酢酸ビニ ノレ (ま 70〜99. 9質量0 /0カ好ましく、 80〜99. 9質量0 /0カより好ましく、 90〜99. 9質 量%がさらに好ましい。 [0026] As the copolymerization partner of the functional group-containing monomer, any known radical polymerizable monomer can be used as long as the Tg of the high Tg polymer (A-2) is 0 ° C or higher. However, as described in the high-Tg polymer (A-1), the use of butyl acetate reduces the haze of the adhesive layer and is suitable as a surface protective film for optical films. Therefore, the high Tg polymer (A-2) is preferably obtained from a raw material monomer that necessarily contains butyl acetate and the functional group-containing monomer. In this case, acetic acid vinyl Honoré (or 70 to 99.9 mass 0/0 Ca Preferably, 80 to 99. More preferably 9 mass 0/0 Ca, more preferably 90 to 99.9 mass%.
[0027] 上記官能基含有モノマーの共重合相手として、酢酸ビュルではなぐメチルアタリレ ートを用いてもよい。粘着性やなじみ性が良好となる。メチルアタリレートは、 70〜99 . 9質量%が好ましぐ 80-99. 9質量%がより好ましぐ 90-99. 9質量%がさらに 好ましい。  [0027] Methyl acrylate may be used as a copolymerization partner for the functional group-containing monomer. Adhesiveness and familiarity are improved. Methyl acrylate is preferably 70-99.9% by weight, more preferably 80-99.9% by weight, and more preferably 90-99.9% by weight.
[0028] メチルアタリレート系の高 Tgポリマー(A— 2)を用いるときは、後述する低 Tgポリマ 一 (B)の原料モノマーとして屈折率制御用のモノマーを用いることが好まし!/、。得ら れる粘着剤層のヘイズを小さくすることができる。屈折率制御用のモノマーとは、低 T gポリマーの屈折率を高 Tgポリマーの屈折率に近づけるために用いられるモノマー であり、例えば、高 Tgポリマー(A— 2)をメチルアタリレートとヒドロキシル基含有モノ マーカ、ら合成した場合、 2—ェチルへキシルアタリレート、ブチルアタリレートおよび 2 ーヒドロキシェチルアタリレートに加え、ベンジルアタリレートを低 Tgポリマー(B)の原 料モノマーとして選択することで、高 Tgポリマー(A— 2)と低 Tgポリマー(B)の屈折 率を近接させることができ、粘着剤層のヘイズを 3%以下に低減させることができる。 [0028] When a methyl acrylate high Tg polymer (A-2) is used, it is preferable to use a monomer for controlling the refractive index as a raw material monomer for the low Tg polymer (B) described later! The haze of the obtained pressure-sensitive adhesive layer can be reduced. Refractive index control monomer is a monomer used to bring the refractive index of a low Tg polymer close to that of a high Tg polymer. For example, when high-Tg polymer (A-2) is synthesized from methyl acrylate and hydroxyl group-containing monomarker, it is added to 2-ethyl hexyl acrylate, butyl acrylate and 2-hydroxyethyl acrylate. By selecting benzyl acrylate as the raw monomer of the low Tg polymer (B), the refractive index of the high Tg polymer (A-2) and that of the low Tg polymer (B) can be brought close to each other. The haze can be reduced to 3% or less.
[0029] 高 Tgポリマー(A— 2)合成のために、酢酸ビュル、メチルアタリレート、上記官能基 含有モノマー以外に使用できる他のモノマーとしては、ホモポリマーの Tgが高い(メタ )アクリル酸、メチルメタタリレート、ェチル (メタ)アタリレート、アクリロニトリル、スチレン 等が好ましい。また、後述する低 Tgポリマーの原料モノマーとして使用できるモノマ 一も、高 Tgポリマー (A— 2)の Tgが 0°C以上になるように種類と量を選択すれば使用 可能である。なお、高 Tgポリマー(A— 2)の好ましい実施態様は、酢酸ビュルと、 2— ヒドロキシェチルアタリレートおよび/または 4—ヒドロキシブチルアタリレートから合成 されたポリマーである。被着体汚染を抑制しつつ、ヘイズを 3%以下にすることができ る力、らである。また、前記したように、低 Tgポリマー(B)の合成時に屈折率制御用モノ マーを用いれば、メチルアタリレートと 2—ヒドロキシェチルアタリレートおよび/また は 4—ヒドロキシブチルアタリレートから合成された高 Tgポリマー (A— 2)も被着体汚 染を抑制しつつ、ヘイズを 3%以下にすることができるため、好ましく利用できる。  [0029] For the synthesis of high Tg polymer (A-2), other monomers that can be used in addition to butyl acetate, methyl acrylate, and the above functional group-containing monomers include (meth) acrylic acid having a high homopolymer Tg, Methyl methacrylate, ethyl (meth) acrylate, acrylonitrile, styrene and the like are preferable. A monomer that can be used as a raw material monomer for the low Tg polymer described below can also be used if the type and amount are selected so that the Tg of the high Tg polymer (A-2) is 0 ° C or higher. A preferred embodiment of the high Tg polymer (A-2) is a polymer synthesized from butyl acetate and 2-hydroxyethyl acrylate and / or 4-hydroxybutyl acrylate. The ability to reduce haze to 3% or less while suppressing adherend contamination. Further, as described above, if a monomer for controlling the refractive index is used during the synthesis of the low Tg polymer (B), it is synthesized from methyl acrylate and 2-hydroxyethyl acrylate and / or 4-hydroxy butyl acrylate. High Tg polymer (A-2) can also be preferably used because haze can be reduced to 3% or less while suppressing adherend contamination.
[0030] 代表的なホモポリマーの屈折率を示せば、ポリアクリル酸は 1 · 5270、ポリメチルァ タリレート ίま 1. 4720、ポリュチノレ タリレート ίま 1. 4685、ポリ η—フ、、チノレアタリレート m. 4660、ポリメチノレメタクリレー卜 ίま 1. 4900、ポリ 2—ュチノレへキシノレ クリレー卜 m. 4650、ポリ 2—ヒドロキシェチノレアタリレート (ま 1 · 4480、ポリ 2—ヒドロキシェチ ノレメタタリレート (ま 1. 5119、ポリ 4ーヒドロキシフ、、チノレアタリレート (ま 1. 4520、ポリ醉 酸ヒ、、二ノレ ίま 1. 4665、ポリベンジノレ クリレート ίま 1. 5132である。  [0030] If the refractive index of a typical homopolymer is shown, polyacrylic acid is 1 · 5270, polymethyl phthalate 1, 4720, polyurethane tantalate 1, 4685, poly η-f, chinoleate talate m 4660, polymethylolene methacrylate 1 4900, poly-2-hydroxyhexylene chloride m. 4650, poly-2-hydroxyethylenol talelate (1/4480, poly-2-hydroxyethyl methacrylate) (MA 1.5119, poly 4-hydroxyph, chinolea talylate (MA 1.4520, poly oxalate, Nino acrylate 1. 4665, polybenzeno acrylate 1.5 or 5132.
[0031] なお、ヘイズや被着体汚染を重視しない場合は、ホモポリマーの Tgが高い (メタ)ァ クリル酸、メチルメタタリレート、ェチル(メタ)アタリレート、アクリロニトリル、スチレン等 を中心に、前記 Tg範囲を満足するように高 Tgポリマー (A)を構成すればよい。  [0031] If the haze and adherend contamination are not important, the homopolymer has a high Tg, such as (meth) acrylic acid, methyl methacrylate, ethyl (meth) acrylate, acrylonitrile, styrene, etc. What is necessary is just to comprise a high Tg polymer (A) so that the said Tg range may be satisfied.
[0032] 高 Tgポリマー(A) (以下、単に高 Tgポリマー(A)というときは、高 Tgポリマー(A— 1 )および高 Tgポリマー (A— 2)の両方を意味する。)の分子量は、質量平均分子量( Mw)で 2000〜; 10万程度が好ましい。より好ましくは、 4万〜 9万程度である。 [0032] The molecular weight of the high Tg polymer (A) (hereinafter, simply referred to as high Tg polymer (A) means both high Tg polymer (A-1) and high Tg polymer (A-2)). , Mass average molecular weight ( Mw) is preferably from 2000 to about 100,000. More preferably, it is about 40,000 to 90,000.
[0033] 本発明の溶剤型再剥離用粘着剤組成物に含まれる第 2の必須成分は、感圧接着 性を示す低 Tgポリマー(B)である。この低 Tgポリマー(B)は、上記高 Tgポリマー(A) の Tg (0°C以上)よりも低いことが要件であり、「感圧接着性を示す」と言うためには Tg 力 S0°C未満であることが好ましい。より好ましくは一 20°C以下、さらに好ましくは一 35 °C以下である。ただし、低 Tgポリマー(B)の Tgが— 80°Cより低くなると、凝集力が低 下して、糊残りが起こりやすくなる傾向にあるため好ましくない。 [0033] The second essential component contained in the solvent-based re-peeling pressure-sensitive adhesive composition of the present invention is a low Tg polymer (B) exhibiting pressure-sensitive adhesiveness. This low Tg polymer (B) is required to be lower than the Tg (0 ° C or higher) of the above high Tg polymer (A), and Tg force S0 ° Preferably it is less than C. More preferably, it is 1-20 ° C or less, and further preferably 135 ° C or less. However, if the Tg of the low Tg polymer (B) is lower than -80 ° C, the cohesive force tends to decrease, and the adhesive residue tends to occur.
[0034] この低 Tgポリマー(B)を得るには、アルキル (メタ)アタリレートと、高 Tgポリマー(A [0034] To obtain this low Tg polymer (B), an alkyl (meth) acrylate and a high Tg polymer (A
2)のところで説明した官能基含有モノマーを組み合わせて用いることが好ましい。 上記アルキル (メタ)アタリレートは粘着力の確保に必要であり、官能基含有モノマー は、後述する架橋剤と反応させるための官能基を低 Tgポリマー(B)に導入するため のモノマーである。官能基含有モノマーとしては、高 Tgポリマー(A— 2)のところで例 示したモノマーがいずれも使用可能であり、高 Tgポリマー(A— 2)のときと同様に、ヒ ドロキシル基含有 (メタ)アタリレートが好適である。また、その使用量も高 Tgポリマー( A— 2)のときとと同様に、原料モノマー 100質量%中、 0. ;!〜 10質量%が好ましい。 官能基含有モノマーの使用量が 0. 1質量%未満では、低 Tgポリマー(B)中の官能 基量が少なくなつて、架橋反応の速度が遅くなつたり、高速粘着力が大きくなり過ぎる 1 10質量%を超えて使用すると、粘着剤の粘着力や被着体への濡れ性が低下傾 向となるため好ましくない。官能基含有モノマーの使用量は、 0. 3〜8質量%がより 好ましぐ 0. 5〜6質量%がさらに好ましい。  It is preferable to use a combination of the functional group-containing monomers described in 2). The alkyl (meth) acrylate is necessary for ensuring adhesive strength, and the functional group-containing monomer is a monomer for introducing a functional group for reacting with a crosslinking agent described later into the low Tg polymer (B). As the functional group-containing monomer, any of the monomers exemplified for the high Tg polymer (A-2) can be used. As in the case of the high Tg polymer (A-2), the hydroxyl group-containing monomer (meth) Atallate is preferred. Further, the use amount thereof is preferably from 0.;! To 10% by mass in 100% by mass of the raw material monomer as in the case of the high Tg polymer (A-2). When the amount of the functional group-containing monomer is less than 0.1% by mass, the amount of the functional group in the low Tg polymer (B) is decreased, the speed of the crosslinking reaction is decreased, or the high-speed adhesive force is too high. If it exceeds 20% by mass, the adhesive strength of the pressure-sensitive adhesive and the wettability to the adherend tend to decrease, such being undesirable. The use amount of the functional group-containing monomer is more preferably 0.3 to 8% by mass, and further preferably 0.5 to 6% by mass.
[0035] 上記低 Tgポリマー(B)の主たる構成成分であるアルキル (メタ)アタリレートは、粘着 特性の観点から、アルキル基の炭素数力 〜; 12であることが好ましい。この炭素数は 、好ましくは 4〜; 10、より好ましくは 4〜8である。上記炭素数が 4未満(3以下)である 力、、または、 12を超える(13以上)と、粘着力が低下するおそれがある。具体的には、 n ブチル(メタ)アタリレート、イソブチル(メタ)アタリレート、 sec ブチル(メタ)アタリ レート、 tert ブチル (メタ)アタリレート、アミノレ (メタ)アタリレート、イソアミノレ (メタ)ァク リレート、へキシル(メタ)アタリレート、シクロへキシル(メタ)アタリレート、ヘプチル(メ ルへキシル (メタ)アタリレート、ノニル (メタ)アタリレート、イソノニル (メタ)アタリレート、 デシル (メタ)アタリレート、ドデシル (メタ)アタリレート等が挙げられ、なかでもブチル アタリレート、 2—ェチルへキシルアタリレート、ォクチルアタリレートおよびイソォクチ ルアタリレートがより好ましい。これらは、 1種のみ用いてもよいし 2種以上を併用して もよぐ、限定はされない。 [0035] The alkyl (meth) acrylate which is the main constituent of the low Tg polymer (B) preferably has an alkyl group having a carbon number power of ~ 12 from the viewpoint of adhesive properties. This carbon number is preferably 4 to 10; more preferably 4 to 8. If the carbon number is less than 4 (3 or less), or exceeds 12 (13 or more), the adhesive strength may decrease. Specifically, n butyl (meth) acrylate, isobutyl (meth) acrylate, sec butyl (meth) acrylate, tert butyl (meth) acrylate, amino acrylate (meth) acrylate, isoamino acrylate (meth) acrylate , Hexyl (meth) acrylate, cyclohexyl (meth) acrylate, heptyl (me Examples include ruhexyl (meth) acrylate, nonyl (meth) acrylate, isononyl (meth) acrylate, decyl (meth) acrylate, dodecyl (meth) acrylate, butyl acrylate, 2-ethyl Hexyl acrylate, octyl acrylate and isooctyl acrylate are more preferred. These may be used alone or in combination of two or more, and are not limited.
[0036] 低 Tgポリマー(B)の原料モノマー 100質量%中、上記の炭素数 4〜 12のアルキル  [0036] In 100% by mass of the raw material monomer of the low Tg polymer (B), the above alkyl having 4 to 12 carbon atoms
(メタ)アタリレートは、 50-99. 9質量0 /0の範囲で用いることが好ましい。より好ましく «60—99. 7質量0 /0、さらにより好ましくは 70〜99· 5質量0 /0である。ァノレキノレ(メタ) アタリレートの使用量が上記範囲内であれば、得られる粘着剤は、充分な粘着力およ びタックを示すものとなるが、 50質量%より少ないと、粘着力や被着体への濡れ性が 不足するおそれがあり、 99. 9質量%を超えると架橋点となる官能基含有モノマーの 量が少な過ぎて、高速粘着力が大きくなり過ぎるおそれがある。 (Meth) Atari rate is preferably employed in the range of 50-99. 9 mass 0/0. More preferably «60-99. 7 mass 0/0, even more preferably 70 to 99 · 5 weight 0/0. Anolequinolate (meth) If the amount of attalylate used is within the above range, the resulting adhesive exhibits sufficient adhesive strength and tackiness, but if it is less than 50% by mass, the adhesive strength and adhesion are reduced. The wettability to the body may be insufficient, and if it exceeds 99.9% by mass, the amount of the functional group-containing monomer that becomes a cross-linking point is too small, and the high-speed adhesive force may become too large.
[0037] 低 Tgポリマー(Β)の合成に当たっては、その他のモノマーを共重合させても良い。  [0037] In the synthesis of the low Tg polymer (Β), other monomers may be copolymerized.
その他のモノマーとは、上記アルキル (メタ)アタリレートおよび官能基含有モノマーと 共重合することができ、かつこれら以外のモノマーである。例えば、上記アルキル (メ 香環含有 (メタ)アタリレート;エチレンおよびブタジエン等の脂肪族不飽和炭化水素 類ならびに塩化ビュル等の脂肪族不飽和炭化水素類のハロゲン置換体;スチレンお よび α—メチルスチレン等の芳香族不飽和炭化水素類;酢酸ビュル等のビュルエス テル類;ビュルエーテル類;ァリルアルコールと各種有機酸とのエステル類;ァリルァ ルコールと各種アルコールとのエーテル類;アクリロニトリル等の不飽和シアン化化合 物;等が挙げられる。これらは、 1種のみ用いてもよいし 2種以上を併用してもよぐ限 定はされない。上記その他のモノマーは、原料モノマー 100質量0 /0中、 0〜49. 9質 量%が好ましい。 49. 9質量%を超えると、結果的に、アルキル (メタ)アタリレートか 官能基含有モノマーの量が少なくなるため、所望の粘着特性が得られない。より好ま しい上限は 40質量%、さらに好ましい上限は 30質量%である。 The other monomer is a monomer that can be copolymerized with the alkyl (meth) acrylate and the functional group-containing monomer, and other monomers. For example, the above-described alkyl (methacyclic ring-containing (meth) acrylates; halogen-substituted aliphatic unsaturated hydrocarbons such as ethylene and butadiene, and aliphatic unsaturated hydrocarbons such as butyl chloride; styrene and α-methyl Aromatic unsaturated hydrocarbons such as styrene; Bull esters such as butyl acetate; Bull ethers; Esters of allylic alcohol and various organic acids; Ethers of allylic alcohol and various alcohols; Unsaturated such as acrylonitrile cyanide compound;.. etc. these may be used alone in combination of two or more not Yogu limit Jowa the other monomers, raw monomer 100 mass 0/0 in 0 to 49.9% by mass is preferable 49. When the content exceeds 9% by mass, the result is that the amount of alkyl (meth) acrylate or functional group-containing monomer is small. Because, the desired adhesive properties can not be obtained. More preferred correct upper limit is 40 mass%, still more preferred upper limit is 30 mass%.
[0038] 低 Tgポリマー(B)の最も好まし!/、実施態様は、高 Tgポリマー(A)が酢酸ビュルュ ニットを主成分(70質量0 /0以上)として含む場合には、 2—ェチルへキシルアタリレー トと、ブチルアタリレートと、 2—ヒドロキシェチルアタリレートおよび/または 4ーヒドロ キシブチルアタリレートを含む原料モノマー混合物から得られたポリマーである。この ポリマーは、粘着特性が良好である上に、主成分が酢酸ビュルユニットである高 Tgポ リマー (A)の屈折率と近似しているため、得られる粘着剤層のヘイズを小さくすること 力 Sできる力、らである。 2—ェチルへキシルアタリレートと、ブチノレアタリレートと、ヒドロキ シェチルアタリレートの合計を 100質量%としたときに、 2—ェチルへキシルアタリレ ートは 20〜80質量%、ブチルアタリレートは 20〜80質量%、ヒドロキシェチルアタリ レートおよび 4ーヒドロキシブチルアタリレートは合計で 0. 5〜6質量%が好ましい。も ちろん、これら以外のモノマーも上述した通り併用可能であるが、高 Tgポリマーが高 Tgポリマー(A— 1)である場合には、 2—ェチルへキシルアタリレートと、ブチルアタリ レートと、ヒドロキシェチルアタリレートおよび 4ーヒドロキシブチルアタリレート以外の モノマーは、 10質量%以下とすることが好ましい。 [0038] The most preferred low Tg polymer (B)! /, Embodiments, if the high Tg polymer (A) contains acetic acid Byuruyu knit as the main component (70 mass 0/0 or more), 2- Echiru Hexyl Relay And a polymer obtained from a raw material monomer mixture containing butyl acrylate, 2-hydroxyethyl acrylate and / or 4-hydroxy butyl acrylate. This polymer has good adhesive properties and is close to the refractive index of high Tg polymer (A), the main component of which is a butyl acetate unit, so it can reduce the haze of the resulting adhesive layer. The power that can be S. When the total of 2-ethyl hexyl acrylate, butinorea acrylate and hydroxy acetyl acrylate is 100% by mass, 2-ethyl hexyl acrylate is 20 to 80% by mass, and butyl acrylate is 20%. The total content of ˜80 mass%, hydroxyethyl acrylate and 4-hydroxybutyl acrylate is preferably 0.5 to 6 mass%. Of course, other monomers can be used in combination as described above. However, when the high Tg polymer is a high Tg polymer (A-1), 2-ethylhexyl acrylate, butyl acrylate and hydroxy Monomers other than ethyl acrylate and 4-hydroxybutyl acrylate are preferably 10% by mass or less.
[0039] 一方、高 Tgポリマー(A)力 例えば、メチルアタリレートユニットを主成分とする場合 には、低 Tgポリマー(B)の最も好ましい実施態様は、 2—ェチルへキシルアタリレート と、ブチノレアタリレートと、 2—ヒドロキシェチルアタリレートおよび/または 4ーヒドロキ シブチルアタリレートと、ベンジルアタリレートの共重合体である。前記したように、ベ ンジルアタリレートの併用によって、粘着剤層のヘイズを 3%以下にすることができる。 これらのモノマーの合計を 100質量%としたときに、 2—ェチルへキシルアタリレート は 20〜80質量0 /0、ブチルアタリレートは 20〜80質量0 /0、ヒドロキシェチルアタリレー トおよび 4ーヒドロキシブチルアタリレートは合計で 0. 5〜6質量0 /0、ベンジルアタリレ ートは 5〜20質量%が好ましい。 [0039] On the other hand, when a high Tg polymer (A) force is, for example, a methyl acrylate unit as a main component, the most preferred embodiment of the low Tg polymer (B) is 2-ethyl hexyl acrylate and butyrate. This is a copolymer of noreatalylate, 2-hydroxyethyl acrylate and / or 4-hydroxybutyl acrylate and benzyl acrylate. As described above, the haze of the pressure-sensitive adhesive layer can be reduced to 3% or less by using benzyl acrylate in combination. The sum of these monomers is 100 mass%, 2 Echiru hexyl Atari rate from 20 to 80 weight 0/0, butyl Atari rate from 20 to 80 weight 0/0, hydroxy E chill Atari rate and 4 over hydroxybutyl Atari rate from 0.5 to 6 weight in total 0/0, benzyl Atari Les chromatography DOO is preferably 5 to 20 wt%.
[0040] 上記低 Tgポリマー(B)は、粘着特性を良好にする点から、 Mwが 20万以上である ことが好ましい。なお、後述する二段重合法を採用した場合、低 Tgポリマー(B)のみ の分子量は測定できなレ、が、高 Tgポリマー (A)と低 Tgポリマー(B)との混合物(ダラ フト物も含まれる)全体での Mwは、 10万〜 70万が好ましい。より好ましい Mwの範囲 は 15万〜 65万であり、さらに好ましい Mwの範囲は 20万〜 60万である。  [0040] The low Tg polymer (B) preferably has an Mw of 200,000 or more from the viewpoint of improving the adhesive properties. When the two-stage polymerization method described later is adopted, the molecular weight of only the low Tg polymer (B) cannot be measured, but a mixture of the high Tg polymer (A) and the low Tg polymer (B) (Draft product). The total Mw is preferably 100,000 to 700,000. A more preferable Mw range is 150,000 to 650,000, and a more preferable Mw range is 200,000 to 600,000.
[0041] 高 Tgポリマー(A)と低 Tgポリマー(B)は、 Tgが異なり組成も異なるため、相溶しな い。本発明では、高 Tgポリマー (A)と低 Tgポリマー(B)は海島構造を形成していな ければならない。海島構造はミクロな相分離状態であって、量の多い方が海 (連続相 )となる。本発明では、低 Tgポリマー(B)の量を多くして、低 Tgポリマー(B)を海 (連 続相)とし、高 Tgポリマー (A)を島として分散させている。島状に分散している高 Tg ポリマー (A)の作用によって、高速剥離の際の粘着力の増大ゃジッビング現象を抑 制すること力 Sできる。この効果を発揮させるには、高 Tgポリマー (A)は 1質量%以上 は必要であり、これより少ないと上記効果が不充分となる。より好ましくは、 3質量%以 上、さらに好ましくは 4質量%以上である。ただし、多すぎると、粘着力や被着体への 濡れ性が不足することがある。 [0041] The high Tg polymer (A) and the low Tg polymer (B) are incompatible because of different Tg and different compositions. In the present invention, the high Tg polymer (A) and the low Tg polymer (B) do not form a sea-island structure. I have to. The sea-island structure is in a microphase-separated state, and the larger amount is the sea (continuous phase). In the present invention, the amount of the low Tg polymer (B) is increased to disperse the low Tg polymer (B) as sea (continuous phase) and the high Tg polymer (A) as islands. Due to the action of the high Tg polymer (A) dispersed in islands, an increase in the adhesive force during high-speed peeling can suppress the jbbing phenomenon. In order to exert this effect, the content of the high Tg polymer (A) is required to be 1% by mass or more, and if it is less than this, the above effect will be insufficient. More preferably, it is 3% by mass or more, and further preferably 4% by mass or more. However, if the amount is too large, adhesive strength and wettability to the adherend may be insufficient.
[0042] 海島構造が発現しているか否かについては、粘着剤組成物を塗工 ·乾燥して得ら れた粘着剤層を、光学顕微鏡、透過型電子顕微鏡、走査型電子顕微鏡、位相差顕 微鏡、偏光顕微鏡、走査型トンネル顕微鏡、顕微ラマン等で観察することにより、海 島構造の有無を判断することができる。好ましい海島構造の形態は、島状部分がほ ぼ球状で連続相(海)の中に分散しており、個々の島状物の平均直径が 0.;!〜 10 m程度のものである。光学顕微鏡、位相差顕微鏡および偏光顕微鏡を用いても、こ のような海島構造の有無が観察可能である。  [0042] As to whether or not the sea-island structure is expressed, the pressure-sensitive adhesive layer obtained by applying and drying the pressure-sensitive adhesive composition was measured using an optical microscope, a transmission electron microscope, a scanning electron microscope, a phase difference, and the like. By observing with a microscope, polarizing microscope, scanning tunneling microscope, microscope Raman, etc., it is possible to determine the presence or absence of a sea-island structure. The preferred form of the sea-island structure is such that the island-like portions are almost spherical and dispersed in the continuous phase (sea), and the average diameter of each island-like substance is about 0.;! To 10 m. The presence or absence of such a sea-island structure can also be observed using an optical microscope, a phase contrast microscope, and a polarizing microscope.
[0043] また、 2種類のポリマーが含まれている粘着剤組成物から得られた粘着剤層である ことを確認するには、例えば、動的粘弾性の tan δの測定で、 Tgが 2つ観察されるか どうかをチェックすればよい。動的粘弾性の tan δは、例えば、レオメーター(ティ一- エイ.インスツルメント社製;「ARES」)を用い、ずりモード、パラプレート法(8mm φ ) によって、角振動周波数 6. 28rad/s、測定温度範囲 50〜; 150°Cで測定するとよ い。  [0043] In order to confirm that the pressure-sensitive adhesive layer is obtained from a pressure-sensitive adhesive composition containing two types of polymers, for example, by measuring the dynamic viscoelasticity tan δ, Tg is 2 Check if they are observed. The tan δ of the dynamic viscoelasticity is obtained by, for example, using a rheometer (manufactured by TI-A Instruments Co., Ltd .; “ARES”) and by using the shear mode, paraplate method (8 mm φ), the angular vibration frequency 6. / s, measuring temperature range 50 ~;
[0044] 本発明では、屈折率の近似した高 Tgポリマー (A)と低 Tgポリマー(B)を用い、両 者をミクロに相分離させた海島構造とすることにより、ヘイズが 3%以下の透明性に優 れた粘着製品を得ることができる。ヘイズは小さいほど好ましぐ高 Tgポリマー (A—1 )を用いる力、、低 Tgポリマー(B)の合成時に屈折率制御用モノマーを用いれば、ヘイ ズを 2. 5%以下に低減できる。ヘイズは、例えば、濁度計等で測定可能である。なお 、本発明のヘイズは、例えばポリエチレンテレフタレート等の透明フィルム(支持基材 )に粘着剤層を設けた粘着製品の状態での測定値を採用する。 [0045] 次に、本発明の溶剤型再剥離用粘着剤組成物の製造方法につ!/、て説明する。好 適な製造方法は、 3種類ある。まず、ブレンド法は、高 Tgポリマー (A)と、低 Tgポリマ 一(B)とを別々に重合し、その後、両者を混合 (ブレンド)する方法である。重合方法 は特に限定されなレ、が、溶液重合が簡便である。高 Tgポリマー (A)と低 Tgポリマー( B)とを、同一もしくは相溶し得る溶媒で重合すれば、溶液状態のままブレンドすること ができ、ブレンド時に脱溶剤工程が不要となるため、さらに簡便である。なお、プレン ドする際には、海島構造を形成するために、ディスパ一等で高速撹拌することが好ま しい。本発明の粘着剤組成物をブレンド法で作成する場合、高 Tgポリマー (A)と低 T gポリマー(B)との不揮発分の合計量を 100質量%とするとき、高 Tgポリマー(A)の 量を 4〜20質量%とすることが好ましい。この方法では、高 Tgポリマー(A)が低 Tgポ リマーに分散したとき、はっきりとした海島構造を採るため、高 Tgポリマー (A)の量を 少なくすることが可能である。 [0044] In the present invention, a high-Tg polymer (A) and a low-Tg polymer (B) having an approximate refractive index are used, and a sea-island structure in which both are phase-separated microscopically has a haze of 3% or less. Adhesive products with excellent transparency can be obtained. The smaller the haze, the better the power to use a high Tg polymer (A-1), and the use of a refractive index control monomer when synthesizing a low Tg polymer (B) can reduce the haze to 2.5% or less. The haze can be measured, for example, with a turbidimeter. In addition, the haze of this invention employ | adopts the measured value in the state of the adhesive product which provided the adhesive layer in transparent films (support base material), such as a polyethylene terephthalate, for example. Next, the method for producing the solvent-type re-peeling pressure-sensitive adhesive composition of the present invention will be described. There are three types of suitable manufacturing methods. First, the blending method is a method in which a high Tg polymer (A) and a low Tg polymer (B) are polymerized separately, and then both are mixed (blended). The polymerization method is not particularly limited, but solution polymerization is simple. If the high Tg polymer (A) and the low Tg polymer (B) are polymerized with the same or compatible solvent, they can be blended in solution, eliminating the need for a solvent removal step during blending. Convenient. When blending, it is preferable to stir at high speed with a disperser or the like to form a sea-island structure. When the pressure-sensitive adhesive composition of the present invention is prepared by a blending method, when the total amount of non-volatile components of the high Tg polymer (A) and the low T g polymer (B) is 100% by mass, the high Tg polymer (A) The amount is preferably 4 to 20% by mass. In this method, when the high Tg polymer (A) is dispersed in the low Tg polymer, the amount of the high Tg polymer (A) can be reduced because a clear sea-island structure is adopted.
[0046] 2番目の方法は、二段重合法である。この二段重合法は、まず、高 Tgポリマー (A) のためのモノマー(以下、「モノマー(A)」という。)の全てを溶液重合で重合した後、 この高 Tgポリマー(A)溶液の存在下で、低 Tgポリマー(B)用のモノマー(以下、「モ ノマー(B)」とレ、う。 )の重合を行う方法である。この二段重合法で得られる粘着剤組 成物は、ブレンド法で得られる粘着剤組成物に比べ、保存安定性(高 Tgポリマー (A )と低 Tgポリマー(B)とが分離しにくい)に優れている。これは、モノマー(B)の重合 時に、高 Tgポリマー(A)に低 Tgポリマー(B)がグラフトしたようなポリマーが一部生 成し、これが、海と島の両方に対して親和性を有する界面活性剤的作用を発揮して、 島を安定化させるためではないかと考えられる。なお、二段重合法で形成した粘着 剤組成物からなる粘着剤層では、島の直径は 0. 3〜; 10 πι程度となる。粘着剤組 成物を二段重合法で作成する場合、高 Tgポリマー (A)と低 Tgポリマー(B)の不揮発 分の合計量を 100質量%とするとき、高 Tgポリマー (A)の量 (グラフト分も含む)は 4 〜35質量%とすることが好ましい。  [0046] The second method is a two-stage polymerization method. In this two-stage polymerization method, all the monomers for the high Tg polymer (A) (hereinafter referred to as “monomer (A)”) are polymerized by solution polymerization, and then the high Tg polymer (A) solution In this method, the monomer for low Tg polymer (B) (hereinafter referred to as “monomer (B)”) is polymerized in the presence. The pressure-sensitive adhesive composition obtained by this two-stage polymerization method is more stable than the pressure-sensitive adhesive composition obtained by the blend method (high Tg polymer (A) and low Tg polymer (B) are difficult to separate). Is excellent. This is because when the monomer (B) is polymerized, a part of the polymer is formed such that the low Tg polymer (B) is grafted to the high Tg polymer (A), which has an affinity for both the sea and the islands. It is thought to stabilize the island by exerting its surfactant action. In the pressure-sensitive adhesive layer formed of the pressure-sensitive adhesive composition formed by the two-stage polymerization method, the island diameter is about 0.3 to 10 πι. When the pressure-sensitive adhesive composition is prepared by the two-stage polymerization method, the amount of high Tg polymer (A) when the total amount of non-volatile content of high Tg polymer (A) and low Tg polymer (B) is 100% by mass. The content (including the graft content) is preferably 4 to 35% by mass.
[0047] 二段重合法では、モノマー(A)の重合率が 70〜95質量%程度になつてから、モノ マー(B)を反応容器へ添加し始めることが好ましい。この方法だと、組成物の保存中 に分離を起こしに《なる。重合率 (質量%)は、反応容器内のモノマーがポリマー( 不揮発分)に転化した質量の割合であり、不揮発分測定で簡単に求められる。低 Tg モノマー(B)は、重合開始剤と共に反応器へ滴下することが好ましい。分子量を大き くすること力 Sでさる。 [0047] In the two-stage polymerization method, it is preferable to start adding the monomer (B) to the reaction vessel after the polymerization rate of the monomer (A) reaches about 70 to 95% by mass. This method causes separation during storage of the composition. The polymerization rate (mass%) is determined by the monomer in the reaction vessel It is the ratio of the mass converted to non-volatile content, and can be easily obtained by measuring the non-volatile content. The low Tg monomer (B) is preferably added dropwise to the reactor together with the polymerization initiator. Increase the molecular weight with the force S.
[0048] 別途重合した高 Tgポリマー (A)を、高 Tgポリマー (A)と低 Tgポリマー(B)の二段 重合が終わった後に加えてもよい。後添加される高 Tgポリマー(A)の組成は、分散 安定性の点からは最初に重合した高 Tgポリマー (A)と同じであることが好ましいが、 分子量は異なっていてもよぐこれにより、一層、高速剥離の粘着力低減効果が現れ  [0048] The separately polymerized high Tg polymer (A) may be added after the two-stage polymerization of the high Tg polymer (A) and the low Tg polymer (B) is completed. The composition of the post-added high Tg polymer (A) is preferably the same as the initially polymerized high Tg polymer (A) from the viewpoint of dispersion stability, but the molecular weight may be different. Furthermore, the effect of reducing the adhesive strength of high-speed peeling appears
[0049] 3番目の方法は、二段重合法と、高 Tgポリマー (A)の後添加を組み合わせた方法 であり、二段重合で仕込むための高 Tgポリマー (A)と後添加用高 Tgポリマー (A)を 一緒に重合してしまう方法である。そして、得られた高 Tgポリマー (A)の一部を、低 T gポリマー(B)合成用の反応容器へ仕込んだ後に、モノマー(B)の重合を行う。広義 の二段重合である。この場合も、高 Tgポリマー (A)に低 Tgポリマー(B)がグラフトし たグラフト物が形成されていると考えられる。この方法では、低 Tgポリマー(B)を重合 する際に予め反応容器に仕込むための高 Tgポリマー (A)と、後添加する高 Tgポリマ 一(B)を同時に重合できるというメリットがある。 [0049] The third method is a combination of the two-stage polymerization method and the post-addition of the high Tg polymer (A). The high Tg polymer (A) to be charged by the two-stage polymerization and the high Tg for post-addition are used. In this method, polymer (A) is polymerized together. A part of the obtained high Tg polymer (A) is charged into a reaction vessel for synthesizing the low Tg polymer (B), and then the monomer (B) is polymerized. This is a two-stage polymerization in a broad sense. Also in this case, it is considered that a graft product in which the low Tg polymer (B) is grafted to the high Tg polymer (A) is formed. This method has the advantage that the high Tg polymer (A) to be charged in the reaction vessel in advance when polymerizing the low Tg polymer (B) and the high Tg polymer (B) to be added later can be polymerized simultaneously.
[0050] この方法では、低 Tgポリマー(B)の重合の際の高 Tgポリマー(A)の仕込み量は、 高 Tgポリマー(A)とモノマー(B)の合計量 100質量%に対し、;!〜 10質量%とするこ とが好ましい。保存安定性が良好となる。そして、モノマー(B)の重合が終了した後、 高 Tgポリマー(A)と低 Tgポリマー(B)の不揮発分の合計量 100質量%のうち、高 Tg ポリマー (A) (グラフト分も含む)が 4〜35質量%となるように、高 Tgポリマー (A)を後 添加することが好ましい。後添加の時期は、低 Tgポリマー(B)の重合の後すぐでもよ いが、実際に架橋剤を配合して塗工するまでなら、いつでも構わない。前記した 2番 目の方法の二段重合法で後添加する場合においても同様である。  [0050] In this method, the amount of the high Tg polymer (A) charged during the polymerization of the low Tg polymer (B) is 100% by mass of the total amount of the high Tg polymer (A) and the monomer (B); ! ~ 10% by mass is preferable. Storage stability is improved. After the polymerization of the monomer (B) is completed, the high Tg polymer (A) (including the graft content) out of the total non-volatile content of 100% by mass of the high Tg polymer (A) and the low Tg polymer (B) It is preferable to add the high Tg polymer (A) afterwards so that the amount of the polymer becomes 4 to 35% by mass. The post-addition may be performed immediately after the polymerization of the low Tg polymer (B), but may be any time as long as it is actually mixed with a crosslinking agent and applied. The same applies when post-added by the second-stage polymerization method of the second method described above.
[0051] 上記製法のいずれにおいても、溶液重合で用いられる溶媒としては、具体的には、 例えば、トルエン、キシレン等の芳香族炭化水素類;酢酸ェチル、酢酸ブチル等の脂 肪族エステル類;シクロへキサン等の脂環族炭化水素類;へキサン、ペンタン等の脂 肪族炭化水素類等が挙げられるが、上記重合反応を阻害しなければ、特に限定され ない。これらの溶媒は、 1種類のみを用いてもよぐ 2種類以上を適宜混合して用いる こともできる。溶媒の使用量は、適宜決定すればよい。本発明の溶剤型再剥離用粘 着剤組成物は、溶剤を必須成分とするが、重合溶媒と同じ溶剤を用いることが好まし い。重合終了によって得られたものをそのまま溶剤型再剥離用粘着剤組成物原料と して使用すること力でさるカゝらである。 [0051] In any of the above production methods, specific examples of the solvent used in the solution polymerization include aromatic hydrocarbons such as toluene and xylene; aliphatic esters such as ethyl acetate and butyl acetate; Examples include alicyclic hydrocarbons such as cyclohexane; aliphatic hydrocarbons such as hexane and pentane, etc., but are not particularly limited as long as the polymerization reaction is not inhibited. Absent. These solvents may be used alone or in combination of two or more. What is necessary is just to determine the usage-amount of a solvent suitably. The solvent-type re-peeling adhesive composition of the present invention contains a solvent as an essential component, but it is preferable to use the same solvent as the polymerization solvent. This is because the power obtained by the completion of the polymerization is directly used as a raw material for the solvent-type re-peeling pressure-sensitive adhesive composition.
[0052] 重合反応温度や反応時間等の反応条件は、例えば、モノマーの組成や量等に応 じて、適宜設定すればよぐ特に限定されない。また、反応圧力も特に限定されるもの ではなぐ常圧(大気圧)、減圧、加圧のいずれであってもよい。なお、重合反応は、 窒素ガス等の不活性ガスの雰囲気下で行うことが望ましい。 [0052] Reaction conditions such as a polymerization reaction temperature and a reaction time are not particularly limited as long as they are appropriately set according to, for example, the composition and amount of the monomer. Further, the reaction pressure is not particularly limited, and any of normal pressure (atmospheric pressure), reduced pressure and increased pressure may be used. The polymerization reaction is desirably performed in an atmosphere of an inert gas such as nitrogen gas.
[0053] 重合触媒 (重合開始剤)としては、限定はされないが、例えば、メチルェチルケトン パーオキサイド、ベンゾィルパーオキサイド、ジクミルパーオキサイド、 t ブチルハイ ドロパーオキサイド、クメンハイド口パーオキサイド、 t ブチルパーォキシォクトエート 、 t ブチルパーォキシベンゾエート、ラウロイルパーオキサイド、商品名「ナイパー B MT-K40J (日本油脂社製; m トルオイルパーオキサイドとベンゾィルパーォキサ イドの混合物)等の有機過酸化物や、ァゾビスイソブチロニトリル、商品名「ABN— E 」 [日本ヒドラジン工業; 2, 2'ーァゾビス(2—メチルブチロニトリル)]等のァゾ系化合 物等の公知のものを利用することができる。また、例えば、ドデシルメルカブタン等の メルカブタン類に代表される公知の分子量調節剤を用いてもよ!/、。  [0053] The polymerization catalyst (polymerization initiator) is not limited, but examples thereof include methyl ethyl ketone peroxide, benzoyl peroxide, dicumyl peroxide, t-butyl hydroperoxide, cumene hydride peroxide, t-butyl. Organics such as peroxyctoate, t-butylperoxybenzoate, lauroyl peroxide, trade name "Nyper B MT-K40J (manufactured by NOF Corporation; m mixture of toluoyl peroxide and benzoyl peroxide)" Known compounds such as peroxides, azobisisobutyronitrile, azo compounds such as “ABN-E” [Nippon Hydrazine Kogyo; 2, 2'-azobis (2-methylbutyronitrile)], etc. Things can be used. Also, for example, known molecular weight regulators represented by mercaptans such as dodecyl mercabtan may be used! /.
[0054] なお、 1番目の方法であるブレンド法による粘着剤組成物と、 2番目や 3番目の方法 である二段重合法を用いて得られた粘着剤組成物は、以下の分離度チェックを行う と明確に区別できる。すなわち、高 Tgポリマー (A)と低 Tgポリマー(B)と溶剤とから、 不揮発分 30質量%の溶液を調製し、これを例えば試験管等に注ぎ入れ、密封した 後、 25°Cで 24時間放置したときの分離状態をチェックすればよいのである。高 Tgポ リマー (A)と低 Tgポリマー(B)とがブレンド法で得られた相分離し易い海島構造であ る場合は、 24時間放置後には分離してしまうが、二段重合法で得られた相分離しに くい海島構造であれば、 24時間では全く分離しな!/、。上記方法で調製した溶液は、 濁り状態が溶液全体で均一であれば、濁っていても良い。上記条件で 24時間放置し た後、液柱の上部や下部に透明な部分が発生していたり、濁りの程度の異なる 2相 に別れている場合には、「分離した」と判断する。なお、溶液中の高 Tgポリマー (A)と 低 Tgポリマー(B)の質量比は、前記した好適範囲内とする。 [0054] It should be noted that the pressure-sensitive adhesive composition obtained by the blend method as the first method and the pressure-sensitive adhesive composition obtained by using the second-stage polymerization method as the second or third method are subjected to the following separation degree check. Can be clearly distinguished. That is, a high-Tg polymer (A), a low-Tg polymer (B), and a solvent are prepared to prepare a solution having a nonvolatile content of 30% by mass, poured into, for example, a test tube and sealed, and then sealed at 25 ° C. What is necessary is just to check the separation state when left for a period of time. If the high-Tg polymer (A) and the low-Tg polymer (B) have a sea-island structure that is easy to phase-separate obtained by the blending method, they will separate after standing for 24 hours. If the obtained sea-island structure is difficult to separate, it will not separate at all in 24 hours! /. The solution prepared by the above method may be cloudy as long as the cloudy state is uniform throughout the solution. After standing for 24 hours under the above conditions, two or more phases with transparent parts appearing at the top and bottom of the liquid column or with different turbidity If it is divided, it is determined that it is “separated”. The mass ratio of the high Tg polymer (A) and the low Tg polymer (B) in the solution is within the above-mentioned preferred range.
[0055] この分離度チェックに用い得る溶剤は、塗工時に用いる溶剤であれば良ぐ特に限 定されないが、トルエン、キシレン等の芳香族炭化水素類;酢酸ェチル、酢酸ブチル 等の脂肪族エステル類;シクロへキサン等の脂環族炭化水素類;へキサン、ペンタン 等の脂肪族炭化水素類等が挙げられ、単独で、または 2種以上を混合して用いれば よい。 [0055] The solvent that can be used for the separation degree check is not particularly limited as long as it is a solvent used at the time of coating, but is not limited to aromatic hydrocarbons such as toluene and xylene; aliphatic esters such as ethyl acetate and butyl acetate. And alicyclic hydrocarbons such as cyclohexane; aliphatic hydrocarbons such as hexane and pentane, and the like. These may be used alone or in admixture of two or more.
[0056] 本発明の粘着剤組成物には、架橋剤を配合することが好ましい。架橋剤としては、 高 Tgポリマー (A)および/または低 Tgポリマー(B)の有する官能基と反応し得る官 能基を 1分子中に 2個以上有する化合物を用いる。  [0056] The pressure-sensitive adhesive composition of the present invention preferably contains a crosslinking agent. As the crosslinking agent, a compound having two or more functional groups capable of reacting with a functional group of the high Tg polymer (A) and / or the low Tg polymer (B) is used.
[0057] 例えば、高 Tgポリマー(A)および/または低 Tgポリマー(B)がヒドロキシル基を有 しているなら、架橋剤としてはイソシァネート化合物が好ましぐカルボキシル基を有 しているなら、イソシァネート化合物やエポキシ化合物等が好ましい。反応性の点で は、ヒドロキシル基とイソシァネート化合物の組合せが最も好ましレ、。  [0057] For example, if the high Tg polymer (A) and / or the low Tg polymer (B) has a hydroxyl group, and the isocyanate compound has a preferred carboxyl group as a crosslinking agent, the isocyanate A compound, an epoxy compound, etc. are preferable. In terms of reactivity, the combination of a hydroxyl group and an isocyanate compound is most preferred.
[0058] イソシァネート化合物としては、例えば、トリレンジイソシァネート (TDI)、 4, 4'—ジ フエニルメタンジイソシァネート(MDI)、へキサメチレンジイソシァネート、キシリレン 水素化ジフエ二ノレメタンジイソシァネート、水素化トリレンジイソシァネート、水素化キ シリレンジイソシァネート、イソホロンジイソシァネート等のジイソシァネート化合物;「ス ミジュール (登録商標) NJ (住友バイエルウレタン社製)等のビュレットポリイソシァネ ート化合物;「デスモジュール (登録商標) IL」、 「デスモジュール (登録商標) HL」(い ずれもバイエル A. G.社製)、「コロネート (登録商標) EH」(日本ポリウレタン工業社 製)等として知られるイソシァヌレート環を有するポリイソシァネート化合物;「スミジュ ール (登録商標) L」(住友バイエルウレタン社製)等のァダクトポリイソシァネート化合 物;「コロネート(登録商標) L」(日本ポリウレタン社製)等のァダクトポリイソシァネート 化合物;「デユラネート (登録商標) D201」(旭化成社製)等のポリイソシァネート化合 物等を挙げること力 Sできる。これらは、単独で使用し得るほか、 2種以上を併用するこ ともできる。また、これらの化合物のイソシァネート基を活性水素を有するマスク剤と 反応させて不活性化したいわゆるブロックイソシァネートも使用可能である。 [0058] Examples of the isocyanate compound include tolylene diisocyanate (TDI), 4,4'-diphenylmethane diisocyanate (MDI), hexamethylene diisocyanate, xylylene, hydrogenated diphenolate. Diisocyanate compounds such as methane diisocyanate, hydrogenated tolylene diisocyanate, hydrogenated xylylene diisocyanate, and isophorone diisocyanate; Bullet polyisocyanate compounds: “Desmodur (registered trademark) IL”, “Desmodur (registered trademark) HL” (both manufactured by Bayer AG), “Coronate (registered trademark) EH” (Nippon Polyurethane Industry) Polyisocyanate compound having an isocyanurate ring known as “Sumidur (registered trademark) L” Adduct polyisocyanate compounds such as “Sumitomo Bayer Urethane Co., Ltd.”; Adduct polyisocyanate compounds such as “Coronate (registered trademark) L” (manufactured by Nippon Polyurethane); “Deyuranate (registered trademark) D201” ( It is possible to list polyisocyanate compounds such as Asahi Kasei Corporation. These can be used alone or in combination of two or more. In addition, the isocyanate group of these compounds and a masking agent having active hydrogen It is also possible to use so-called block isocyanate which has been inactivated by reaction.
[0059] エポキシ化合物としては、エチレングリコールジグリシジルエーテル、ポリエチレング リコールジグリシジルエーテル、 1 , 6—へキサンジ才ールジグリシジルエーテル、ビス フエノール A型エポキシ樹脂、 N, N, Ν' , N'—テトラグリシジル一 m—キシレンジァ ミン、 1 , 3—ビス(N, N—ジグリシジルアミノメチノレ)シクロへキサン、 N, N—ジグリシ ジルァ二リン、 N, N—ジグリシジルトルイジン等が挙げられる。  [0059] Examples of the epoxy compound include ethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, 1,6-hexane diglycidyl ether, bisphenol A type epoxy resin, N, N, Ν ', N'— Examples thereof include tetraglycidyl 1-m-xylenediamine, 1,3-bis (N, N-diglycidylaminomethinole) cyclohexane, N, N-diglycidyl dilin, N, N-diglycidyl toluidine and the like.
[0060] これらの架橋剤は、高 Tgポリマー(A)および低 Tgポリマー(B)が有する官能基の 合計を 1当量としたときに、 0. ;!〜 5当量となるように添加することが好ましい。架橋剤 量が少なすぎると、得られる粘着剤の凝集力が不足して糊残りを起こすことがあるが 、多すぎると粘着力が不足したり、粗面に対する濡れ性が低下する。より好ましい架 橋剤量は 0. 2〜4当量であり、さらに好ましくは 0. 3〜2当量である。  [0060] These cross-linking agents should be added so that the total amount of functional groups of the high Tg polymer (A) and the low Tg polymer (B) is 1 equivalent; Is preferred. If the amount of the cross-linking agent is too small, the resulting adhesive may have insufficient cohesive force to cause adhesive residue, but if it is too large, the adhesive force may be insufficient or the wettability to a rough surface may be reduced. The amount of the crosslinking agent is more preferably 0.2 to 4 equivalents, still more preferably 0.3 to 2 equivalents.
[0061] 本発明の溶剤型再剥離用粘着剤組成物の不揮発分は、特に限定はされないが、 例えば、 10〜80質量%であることが好ましぐより好ましくは 20〜60質量%、さらに 好ましくは 25〜45質量%である。上記不揮発分が 10質量%未満であると、塗布した 後等の乾燥が長時間となり、生産性が低下するおそれがある。また、 80質量%を超 えると、組成物全体の粘度が高くなり、ハンドリング性および塗布性に欠け、実用性 に乏しくなるおそれがある。粘着剤組成物の溶剤は、前記した重合溶媒がいずれも 使用可能であり、前記したように重合溶媒と同じ溶剤が好まし!/、。  [0061] The non-volatile content of the solvent-based re-peeling pressure-sensitive adhesive composition of the present invention is not particularly limited, but for example, it is preferably 10 to 80% by mass, more preferably 20 to 60% by mass, Preferably it is 25-45 mass%. If the non-volatile content is less than 10% by mass, drying after application takes a long time, which may reduce productivity. On the other hand, if it exceeds 80% by mass, the viscosity of the whole composition becomes high, handling properties and coating properties are lacking, and there is a possibility that the practicality becomes poor. As the solvent for the pressure-sensitive adhesive composition, any of the above-mentioned polymerization solvents can be used, and as described above, the same solvent as the polymerization solvent is preferred!
[0062] 本発明の粘着剤組成物には、公知の架橋促進剤、粘着付与剤、改質剤、顔料、着 色剤、充填剤、老化防止剤、紫外線吸収剤、紫外線安定剤等の添加剤を、本発明 の目的を阻害しなレ、範囲で加えてもょレ、。  [0062] To the pressure-sensitive adhesive composition of the present invention, known crosslinking accelerators, tackifiers, modifiers, pigments, colorants, fillers, anti-aging agents, ultraviolet absorbers, ultraviolet stabilizers and the like are added. Add agents to the extent that they do not interfere with the purpose of the present invention.
[0063] また、海島構造を破壊しな!/、程度であれば相溶化剤を添加してもよ!/、。相溶化剤と しては特に限定されないが、例えば (メタ)アタリレートと酢酸ビュルのブロックコポリマ 一やグラフトコポリマー等や、イオン的相互作用による相溶化剤(特定の官能基を有 する化合物やポリマー等)等を用いることができる。相溶化剤の添加量は、溶剤型再 剥離用粘着剤組成物中の樹脂成分 (ポリマー (A)とポリマー(B)との合計量) 100質 量部当たり、 0〜20質量部程度が好ましい。  [0063] Also, do not destroy the sea-island structure! /, So long as the compatibilizer may be added! The compatibilizer is not particularly limited. For example, a block copolymer (graf) copolymer of (meth) acrylate and butyl acetate, a graft copolymer, or the like, or a compatibilizer by an ionic interaction (a compound or polymer having a specific functional group). Etc.) can be used. The addition amount of the compatibilizer is preferably about 0 to 20 parts by mass per 100 parts by mass of the resin component (total amount of the polymer (A) and the polymer (B)) in the solvent-type re-peeling pressure-sensitive adhesive composition. .
[0064] 本発明の粘着剤組成物は、再剥離用粘着製品の製造に用いられる。基材あるいは 離型紙の上に粘着剤組成物を塗布し、その乾燥塗膜を形成することによって、基材 の片面に粘着剤層が形成されている粘着製品(粘着テープまたはシート)、基材の両 面に粘着剤層が形成されている粘着製品、基材を有しない粘着剤層のみの粘着製 品を得ること力 Sできる。紙基材の粘着製品を製造する場合は、離型紙の上に粘着剤 組成物を塗布し、粘着剤層を形成した後、紙基材に転写する方法も、採用できる。粘 着剤層の形成にあたっては、溶剤が飛散する条件(例えば 50〜; 120°Cで 60〜; 180 秒程度)での加熱乾燥を行うことが望ましレ、。 [0064] The pressure-sensitive adhesive composition of the present invention is used for production of a re-peeling pressure-sensitive adhesive product. Base material or An adhesive product (adhesive tape or sheet) in which an adhesive layer is formed on one side of the substrate by applying the adhesive composition on the release paper and forming a dry coating film on both sides of the substrate It is possible to obtain a pressure-sensitive adhesive product having a pressure-sensitive adhesive layer formed thereon, or a pressure-sensitive adhesive product having only a pressure-sensitive adhesive layer having no base material. In the case of producing a paper base adhesive product, a method of applying a pressure sensitive adhesive composition on a release paper to form a pressure sensitive adhesive layer and then transferring it to a paper base material can be employed. In forming the adhesive layer, it is desirable to heat and dry under conditions where the solvent scatters (for example, 50 to; 60 to 120 ° C for 60 to 180 seconds).
[0065] 基材としては、上質紙、クラフト紙、クレープ紙、ダラシン紙等の従来公知の紙類;ポ リエチレン、ポリプロピレン、ポリエステノレ、ポリスチレン、ポリエチレンテレフタレート、 ポリ塩化ビュル、セロファン等のプラスチック;織布、不織布等の繊維製品;これらの 積層体等が利用できる。光学用フィルムの表面保護に用いる場合には、基材は、ポリ エチレンテレフタレート等の透明フィルムが好まし!/、。  [0065] Examples of the base material include conventionally known papers such as fine paper, kraft paper, crepe paper, and dalasin paper; plastics such as polyethylene, polypropylene, polyester, polystyrene, polyethylene terephthalate, polychlorinated bure, and cellophane; Textile products such as cloth and non-woven fabric; laminates of these can be used. When used for surface protection of optical films, the substrate is preferably a transparent film such as polyethylene terephthalate!
[0066] 粘着剤組成物を基材に塗布する方法は、特に限定されるものではなぐロールコー ティング法、スプレーコーティング法、デイツビング法等の公知の方法を採用すること ができる。この場合、粘着剤組成物を基材に直接塗布する方法、離型紙等に粘着剤 組成物を塗布した後、この塗布物を基材上に転写する方法等いずれも採用可能で ある。粘着剤組成物を塗布した後、乾燥させることにより、基材上に粘着剤層が形成 される。  [0066] The method of applying the pressure-sensitive adhesive composition to the substrate is not particularly limited, and a known method such as a roll coating method, a spray coating method, or a dating method can be employed. In this case, any of a method of directly applying the pressure-sensitive adhesive composition to the base material, a method of applying the pressure-sensitive adhesive composition to a release paper, and then transferring the coated material onto the base material can be employed. After applying the pressure-sensitive adhesive composition, the pressure-sensitive adhesive layer is formed on the substrate by drying.
[0067] 基材上に形成された粘着剤の表面には、例えば、離型紙を貼着してもよ!/、。粘着 剤表面を好適に保護 ·保存することができる。剥離紙は、粘着製品を使用する際に、 粘着剤表面から引き剥がされる。なお、シート状やテープ状等の基材の片面に粘着 剤面が形成されて!/、る場合は、この基材の背面に公知の離型剤を塗布して離型剤 層を形成しておけば、粘着剤層を内側にして、粘着シート(テープ)をロール状に巻く ことにより、粘着剤層は、基材背面の離型材層と当接することとなるので、粘着剤表 面が保護 '保存される。  [0067] On the surface of the pressure-sensitive adhesive formed on the substrate, for example, a release paper may be stuck! /. The surface of the adhesive can be suitably protected and stored. The release paper is peeled off from the surface of the adhesive when the adhesive product is used. In addition, when a pressure-sensitive adhesive surface is formed on one side of a substrate such as a sheet or tape, a known release agent is applied to the back surface of the substrate to form a release agent layer. If the adhesive layer is placed inside and the adhesive sheet (tape) is wound in a roll shape, the adhesive layer comes into contact with the release material layer on the back surface of the substrate. Protection 'Saved.
[0068] 本発明の粘着剤組成物から得られる再剥離用粘着製品は、 180°粘着力が、 0. 3 m/分の低速剥離では 0. 05—0. 3N/25mm、 30m/分の高速剥離では 0. 2〜 3N/25mmであることが好ましい。低速剥離粘着力が上記範囲であれば、光学部 材の表面保護シートとして充分であり、高速剥離粘着力が上記範囲であれば、ジッピ ング等の不都合を起こすことなぐ滑らかに剥離が可能だからである。より好ましい低 速剥離米占着力は 0. 06—0. 2N/25mmであり、さらに好ましくは 0. 07—0. 15N/ 25mmである。また、より好ましい高速剥離粘着力は、 0. 3〜2N/25mmであり、さ らに好ましくは 0. 5〜; 1. 5N/25mmである。そして、高速剥離粘着力を低速剥離 粘着力で除した値が 15. 0以下であると、高速剥離の際の粘着力の増大が抑制でき たということ力 Sできる。上記 180°粘着力は、厚み 20 mの粘着剤層が厚み 38 mの ポリエチレンテレフタレートフィルム基材上に形成された粘着製品を用いて、 23°Cで 、アクリル板に対する 180°粘着力を測定した場合の値を採用する。なお、上記単位「 N/25mm」において、「/25mm」の部分は、被着体に圧着させた粘着シートの幅 を意味する。 [0068] The adhesive product for re-peeling obtained from the pressure-sensitive adhesive composition of the present invention has a 180 ° adhesive strength of 0.05—0.3 N / 25 mm, 30 m / min at a low speed of 0.3 m / min. In high-speed peeling, it is preferably 0.2 to 3 N / 25 mm. If the low-speed peel adhesive strength is in the above range, the optical part This is because if it is sufficient as a surface protective sheet for the material and the high-speed peel adhesive strength is in the above range, it can be peeled smoothly without causing inconveniences such as zipping. A more preferable low-speed peeled rice occupying force is 0.06—0.2 N / 25 mm, and more preferably 0.0 07—0.15 N / 25 mm. Further, the more preferable high-speed peel adhesive strength is 0.3 to 2 N / 25 mm, and more preferably 0.5 to 1.5 N / 25 mm. If the value obtained by dividing the high-speed peel adhesive force by the low-speed peel adhesive force is 15.0 or less, an increase in the adhesive force during high-speed peel can be suppressed. The 180 ° adhesive force was measured at 23 ° C using an adhesive product in which an adhesive layer having a thickness of 20 m was formed on a polyethylene terephthalate film substrate having a thickness of 38 m. The case value is adopted. In the unit “N / 25 mm”, the part “/ 25 mm” means the width of the pressure-sensitive adhesive sheet that is pressure-bonded to the adherend.
[0069] また、高 Tgポリマー (A— 2)を用いた粘着剤組成物から得られる再剥離用粘着製 品は、アクリル板に対する 180°剥離試験を行ったとき、 0. 3m/分の低速剥離であ つても被着体汚染は起こらな!/、 (実施例参照)。  [0069] In addition, the re-peeling pressure-sensitive adhesive product obtained from the pressure-sensitive adhesive composition using the high Tg polymer (A-2) has a low speed of 0.3 m / min when subjected to a 180 ° peel test on an acrylic plate. Adherent contamination does not occur even with peeling! /, (See Examples).
実施例  Example
[0070] 以下実施例によって本発明を詳細に説明するが、本発明の範囲はこれら実施例の みに限定されるものではない。なお以下特にことわりのない場合、「%」は「質量%」を
Figure imgf000020_0001
[0070] The present invention will be described in detail below with reference to examples, but the scope of the present invention is not limited to these examples. Note that “%” means “mass%” unless otherwise specified.
Figure imgf000020_0001
[0071] 合成例 1 (二段重合)  [0071] Synthesis Example 1 (two-stage polymerization)
高 Tgポリマー用モノマーとして酢酸ビュル (VAC) 70部を、溶媒として酢酸ェチル 210部を用い、よく混合し、温度計、撹拌機、不活性ガス導入管、還流冷却器および 滴下ロートを備えたフラスコに添加した。窒素ガスを流通させながら、フラスコの内温 を 75°Cまで上昇させ、重合開始剤である「ナイパー(登録商標) BMT— K40」(日本 油脂社製; m—トルオイルパーオキサイドとベンゾィルパーオキサイドの混合物) 0· 0 9部をフラスコに投入して、重合を開始させた。  A flask equipped with a thermometer, stirrer, inert gas inlet tube, reflux condenser and dropping funnel using 70 parts of butyl acetate (VAC) as the monomer for the high Tg polymer and 210 parts of ethyl acetate as the solvent. Added to. While circulating nitrogen gas, raise the internal temperature of the flask to 75 ° C, and use the polymerization initiator “NIPER (registered trademark) BMT-K40” (manufactured by NOF Corporation; m-toluoyl peroxide and benzoyl peroxide). Mixture of oxides) 0 · 9 parts were put into a flask to initiate polymerization.
[0072] 反応開始から 1. 5時間経過した後、ブースター(後添加開始剤)として、「ABN— E 」(日本ヒドラジン工業社製; 2, 2,ーァゾビス(2—メチルブチロニトリル)) 0· 25部添 加した後、さらに 76°Cで 1. 5時間熟成し、ポリ酢酸ビュル溶液を得た。この時点での 酢酸ビュルの重合率は、 73%であった。 [0072] After 1.5 hours from the start of the reaction, "ABN-E" (manufactured by Nippon Hydrazine Kogyo Co., Ltd .; 2, 2, -azobis (2-methylbutyronitrile)) was used as a booster (post-addition initiator). · After 25 parts were added, the mixture was further aged at 76 ° C for 1.5 hours to obtain a polyacetic acid bull solution. At this point The polymerization rate of butyl acetate was 73%.
[0073] 続いて同じフラスコに、低 Tgポリマー用モノマーとして、 n ブチルアタリレート(BA ) 120部、 2 ェチルへキシルアタリレート(2EHA) 268部および 2 ヒドロキシェチ ノレアタリレート(HEA) 12部と、前記「ナイパー BMT— K40J 0. 5部と、酢酸ェチル 1 05部をよく混合してモノマー溶液を調製し、滴下ロートから 1時間かけて均等に滴下 した。滴下終了後、 1. 5時間経過後に、ブースタ一として前記「ABN— E」0. 2部を 酢酸ェチル 200部と共に添加し、さらに 78°Cで 2. 5時間熟成し、粘着剤ポリマー溶 液 No. 1を得た。この粘着剤ポリマー溶液 No. 1から得られた粘着剤層を、光学顕微 鏡を用いて観察した結果、海島構造であることが確認できた。  [0073] Subsequently, in the same flask, as a monomer for a low Tg polymer, 120 parts of n-butyl acrylate (BA), 268 parts of 2-ethylhexyl acrylate (2EHA) and 12 parts of 2-hydroxyethyl oleate (HEA), A monomer solution was prepared by thoroughly mixing 0.5 parts of the above-mentioned Nyper BMT-K40J and 105 parts of ethyl acetate, and was added dropwise evenly over 1 hour from the dropping funnel. Then, 0.2 part of the above-mentioned “ABN-E” was added as a booster together with 200 parts of ethyl acetate, and further aged at 78 ° C. for 2.5 hours to obtain an adhesive polymer solution No. 1. As a result of observing the pressure-sensitive adhesive layer obtained from this pressure-sensitive adhesive polymer solution No. 1 using an optical microscope, it was confirmed that it had a sea-island structure.
[0074] 合成例 2 (二段重合)  [0074] Synthesis Example 2 (two-stage polymerization)
高 Tgポリマー用モノマーとして VAC100部を、溶媒として酢酸ェチル 185部を用 い、よく混合し、温度計、撹拌機、不活性ガス導入管、還流冷却器および滴下ロート を備えたフラスコに添加した。窒素ガスを流通させながら、フラスコの内温を 75°Cまで 上昇させ、前記「ABN— E」0. 05部をフラスコに投入して、重合を開始させた。  Using 100 parts of VAC as the monomer for the high Tg polymer and 185 parts of ethyl acetate as the solvent, they were mixed well and added to a flask equipped with a thermometer, stirrer, inert gas inlet tube, reflux condenser and dropping funnel. While circulating nitrogen gas, the internal temperature of the flask was raised to 75 ° C., and 0.05 part of the “ABN-E” was charged into the flask to initiate polymerization.
[0075] 後は、合成例 1と全く同様にして二段重合を行い、粘着剤ポリマー溶液 No. 2を得 た。この粘着剤ポリマー溶液 No. 2から得られた粘着剤層を光学顕微鏡を用いて観 察した結果、海島構造であることを確認した。  Thereafter, two-stage polymerization was performed in exactly the same manner as in Synthesis Example 1 to obtain a pressure-sensitive adhesive polymer solution No. 2. As a result of observing the pressure-sensitive adhesive layer obtained from this pressure-sensitive adhesive polymer solution No. 2 using an optical microscope, it was confirmed that it had a sea-island structure.
[0076] 合成例 3 (二段重合 +別重合の後添加)  [0076] Synthesis Example 3 (two-stage polymerization + addition after separate polymerization)
VAC250部と、分子量調整剤として「チォカルコール (登録商標) 20」(花王社製 ;n ドデシルメルカブタン) 1. 25部を秤量し、よく混合して、モノマー混合物を調製 した。このモノマー混合物の 50%と酢酸ェチル 375部とを、温度計、撹拌機、不活性 ガス導入管、還流冷却器および滴下ロートを備えたフラスコに添加した。残りのモノマ 一混合物と前記「ナイパー BMT— K40」0. 16部からなる滴下用モノマー混合物を 滴下ロートに入れ、よく混合した。窒素ガスを流通させながら、フラスコの内温を 73°C まで上昇させ、前記「ナイパー BMT— Κ40」0· 32部をフラスコに投入して、重合を 開始させた。重合開始剤の投入後、 10分経過してから、滴下用モノマー混合物の滴 下を開始した。滴下用モノマー混合物は 1時間かけて均等に滴下した。滴下終了後 、酢酸ェチル 38部をフラスコに添加した。また、滴下終了後 1時間後に、ブースター として前記「ABN— E」を 0. 125部添加した後、さらに 76°Cで 1. 5時間熟成し、ポリ 酢酸ビュル溶液を得た。この時点での酢酸ビュルの重合率は、 82%であった。 250 parts of VAC and 1.25 parts of “Tiocalcol (registered trademark) 20” (manufactured by Kao Corporation; n-dodecyl mercaptan) as a molecular weight regulator were weighed and mixed well to prepare a monomer mixture. 50% of this monomer mixture and 375 parts of ethyl acetate were added to a flask equipped with a thermometer, stirrer, inert gas inlet tube, reflux condenser and dropping funnel. The remaining monomer mixture and the dropping monomer mixture consisting of 0.16 part of “Nyper BMT-K40” were put into a dropping funnel and mixed well. While circulating nitrogen gas, the internal temperature of the flask was raised to 73 ° C., and 0 · 32 parts of “Nyper BMT-Κ40” was charged into the flask to initiate polymerization. After 10 minutes had passed since the polymerization initiator was added, the dropping of the monomer mixture for dropping was started. The monomer mixture for dropping was dropped evenly over 1 hour. After completion of the dropwise addition, 38 parts of ethyl acetate was added to the flask. Also, 1 hour after the end of dripping, booster As a result, 0.125 part of the above-mentioned “ABN-E” was added, and then further aged at 76 ° C. for 1.5 hours to obtain a polyacetate butyl solution. At this time, the polymerization rate of butyl acetate was 82%.
[0077] 合成例 1で製造したポリマー溶液 No. 1の不揮発分 100部に対し、上記ポリ酢酸ビ ニル溶液の不揮発分が 10部となるように両者を混合し、よく撹拌して、粘着剤ポリマ 一溶液 No. 3を得た。この粘着剤ポリマー溶液 No. 3から得られた粘着剤層を光学 顕微鏡を用いて観察した結果、海島構造であることを確認した。  [0077] With respect to 100 parts of the non-volatile content of the polymer solution No. 1 produced in Synthesis Example 1, both are mixed so that the non-volatile content of the polyvinyl acetate solution is 10 parts, and the mixture is stirred well, and the pressure-sensitive adhesive Polymer solution No. 3 was obtained. As a result of observing the pressure-sensitive adhesive layer obtained from this pressure-sensitive adhesive polymer solution No. 3 using an optical microscope, it was confirmed that it had a sea-island structure.
[0078] 合成例 4 (低 Tgポリマーのみの一段重合;比較例用)  [0078] Synthesis Example 4 (one-stage polymerization of low Tg polymer only; for comparative example)
BA485部および HEA15部を秤量し、よく混合してモノマー混合物を調製した。こ のモノマー混合物の 40%と酢酸ェチル 240部とを、温度計、撹拌機、不活性ガス導 入管、還流冷却器および滴下ロートを備えたフラスコに添加した。残りのモノマー混 合物 60%と前記「ナイパー BMT— K40」0. 3部からなる滴下用モノマー混合物を滴 下ロートに入れ、よく混合した。窒素ガスを流通させながら、フラスコの内温を 84°Cま で上昇させ、前記「ナイパー BMT— Κ40」0· 4部をフラスコに投入して、重合を開始 させた。重合開始剤の投入後、 10分経過してから、滴下用モノマー混合物の滴下を 開始した。滴下用モノマー混合物は 1時間かけて均等に滴下した。滴下終了後、トル ェン 42部をフラスコに添加した。また、滴下終了後 1. 5時間後に、酢酸ェチル 165 部とブースタ一として前記「ナイパー ΒΜΤ— Κ40」を 0. 25部添加した後、さらに 85 °Cで 2. 5時間熟成し、トルエン 360部を添加して粘着剤ポリマー溶液 No. 4を得た。  485 parts of BA and 15 parts of HEA were weighed and mixed well to prepare a monomer mixture. 40% of this monomer mixture and 240 parts of ethyl acetate were added to a flask equipped with a thermometer, stirrer, inert gas inlet tube, reflux condenser and dropping funnel. The monomer mixture for dropping composed of 60% of the remaining monomer mixture and 0.3 part of the above-mentioned “Nyper BMT-K40” was put into a dropping funnel and mixed well. While circulating nitrogen gas, the internal temperature of the flask was raised to 84 ° C., and 0.4 part of the above-mentioned “Nyper BMT-Κ40” was charged into the flask to initiate polymerization. After 10 minutes had elapsed since the polymerization initiator was charged, the dropping of the monomer mixture for dripping was started. The monomer mixture for dropping was dropped evenly over 1 hour. After completion of dropping, 42 parts of toluene was added to the flask. Also, 1.5 hours after the completion of the dropwise addition, 165 parts of ethyl acetate and 0.25 part of the above-mentioned “Nyper ΒΜΤ—Κ40” were added as a booster, and further aged for 2.5 hours at 85 ° C., and 360 parts of toluene. Was added to obtain an adhesive polymer solution No. 4.
[0079] 合成例 5 (—括重合;比較例用)  [0079] Synthesis Example 5 (—polymerization; for comparative example)
BA120部、 2EHA268部および HEA12部、 VAC100部を秤量し、よく混合して モノマー混合物を調製した。このモノマー混合物の 40%と酢酸ェチル 240部とを、温 度計、撹拌機、不活性ガス導入管、還流冷却器および滴下ロートを備えたフラスコに 添加した。残りのモノマー混合物 60%と前記「ナイパー ΒΜΤ— Κ40」0· 75部からな る滴下用モノマー混合物を滴下ロートに入れ、よく混合した。窒素ガスを流通させな がら、フラスコの内温を 82°Cまで上昇させ、前記「ナイパー ΒΜΤ— Κ40」0· 5部をフ ラスコに投入して、重合を開始させた。重合開始剤の投入後、 10分経過してから、滴 下用モノマー混合物の滴下を開始した。滴下用モノマー混合物は 1時間かけて均等 に滴下した。滴下終了後、酢酸ェチル 305部をフラスコに添加した。また、滴下終了 後 1 · 5時間後に、酢酸ェチル 220部とブースタ一として前記「ΑΒΝ— Ε」を 0· 2部添 カロした後、さらに 77°Cで 2. 5時間熟成し、粘着剤ポリマー溶液 No. 5を得た。 120 parts of BA, 2268 parts of 2EHA, 12 parts of HEA, and 100 parts of VAC were weighed and mixed well to prepare a monomer mixture. 40% of this monomer mixture and 240 parts of ethyl acetate were added to a flask equipped with a thermometer, stirrer, inert gas inlet tube, reflux condenser and dropping funnel. The remaining monomer mixture 60% and the above-mentioned monomer mixture for dripping consisting of 0 · 75 parts of “NyperΒΜΤ40” were put into a dropping funnel and mixed well. While circulating nitrogen gas, the internal temperature of the flask was raised to 82 ° C., and 0.5 part of the above-mentioned “Nyper ΒΜΤ—Κ40” was put into the flask to initiate polymerization. After 10 minutes had passed since the polymerization initiator was added, the dropping of the monomer mixture for dripping was started. The monomer mixture for dropping was dropped evenly over 1 hour. After completion of the dropwise addition, 305 parts of ethyl acetate was added to the flask. The end of dripping After 1.5 hours, 220 parts of ethyl acetate and 0.2 part of “Ε- と し て” were added as a booster and then aged at 77 ° C for 2.5 hours. Got.
[0080] 合成例 6 (ブレンド)  [0080] Synthesis Example 6 (Blend)
モノマー糸且成を、 BA150部、 2EHA335部、 HEA15部とした以外は、合成例 4と 同様にして、低 Tgポリマーのポリマー溶液を得た。  A polymer solution of a low Tg polymer was obtained in the same manner as in Synthesis Example 4 except that the monomer yarn was changed to 150 parts BA, 2EHA335 parts, and HEA15 parts.
[0081] 上記低 Tgポリマーのポリマー溶液の不揮発分 100部に対し、合成例 3で合成した ポリ酢酸ビュル溶液の不揮発分が 10部となるように両者を混合し、よく撹拌して、粘 着剤ポリマー溶液 No. 6を得た。この粘着剤ポリマー溶液 No. 6から得られた粘着剤 層を光学顕微鏡を用いて観察した結果、海島構造であることを確認した。  [0081] With respect to 100 parts of the non-volatile content of the polymer solution of the above-mentioned low Tg polymer, both were mixed so that the non-volatile content of the polyacetic acid butyl solution synthesized in Synthesis Example 3 would be 10 parts, and the mixture was well stirred and adhered. Agent polymer solution No. 6 was obtained. As a result of observing the pressure-sensitive adhesive layer obtained from the pressure-sensitive adhesive polymer solution No. 6 using an optical microscope, it was confirmed that it had a sea-island structure.
[0082] 合成例 7 (ブレンド)  [0082] Synthesis Example 7 (Blend)
モノマー糸且成を、 BA150部、 2EHA335部、 HEA15部とした以外は、合成例 4と 同様にして、低 Tgポリマー溶液を得た。  A low Tg polymer solution was obtained in the same manner as in Synthesis Example 4 except that the monomer yarns were changed to 150 parts BA, 2EHA335 parts and HEA15 parts.
[0083] 上記低 Tgポリマー溶液の不揮発分 100部に対し、合成例 3で合成したポリ酢酸ビ ニル溶液の不揮発分が 3部となるように両者を混合し、よく撹拌して、粘着剤ポリマー 溶液 No. 7を得た。この粘着剤ポリマー溶液 No. 7から得られた粘着剤層を光学顕 微鏡を用いて観察した結果、海島構造であることを確認した。  [0083] With respect to 100 parts of the non-volatile content of the above low Tg polymer solution, the both are mixed so that the non-volatile content of the polyvinyl acetate solution synthesized in Synthesis Example 3 is 3 parts, and the mixture is stirred well, and the pressure-sensitive adhesive polymer Solution No. 7 was obtained. As a result of observing the pressure-sensitive adhesive layer obtained from this pressure-sensitive adhesive polymer solution No. 7 using an optical microscope, it was confirmed that it had a sea-island structure.
[0084] 合成例 8 (ブレンド)  [0084] Synthesis Example 8 (Blend)
モノマー糸且成を、 BA335部、 2EHA150部、 HEA15部とした以外は、合成例 4と 同様にして、低 Tgポリマー溶液を得た。  A low Tg polymer solution was obtained in the same manner as in Synthesis Example 4 except that the monomer yarns were changed to BA335 parts, 2EHA150 parts, and HEA15 parts.
[0085] 別途、高 Tgポリマー用モノマーとして、メチルメタタリレート(MMA) 190部、 BA15 部および HEA12. 5部を用い、これらと前記「チォカルコール(登録商標) 20」 32 . 5部を秤量して、よく混合し、モノマー混合物を調製した。このモノマー混合物の 50 %と酢酸ェチル 188部とを、温度計、撹拌機、不活性ガス導入管、還流冷却器およ び滴下ロートを備えたフラスコに添加した。残りのモノマー混合物 50%と前記「ナイパ 一 BMT— K40」0. 125部からなる滴下用モノマー混合物を滴下ロートに入れ、よく 混合した。窒素ガスを流通させながら、フラスコの内温を 82°Cまで上昇させ、前記「ナ ィパー BMT— Κ40」0· 25部をフラスコに投入して、重合を開始させた。重合開始剤 の投入後、 10分経過してから、滴下用モノマー混合物の滴下を開始した。滴下用モ ノマー混合物は 1時間かけて均等に滴下した。滴下終了後、酢酸ェチル 58部をフラ スコに添加した。また、滴下終了後 1 · 5時間後に、ブースタ一として前記「ナイパー B MT— K40Jを 0. 125部添カロした後、さらに 85°Cで 2. 5時間熟成し、 MMA系高 Tg ポリマー溶液を得た。 [0085] Separately, 190 parts methyl methacrylate (MMA), 1 part BA15 and 12.5 parts HEA were used as monomers for the high Tg polymer, and 32.5 parts of the above-mentioned "Tiocalcol (registered trademark) 20" were weighed. And mixed well to prepare a monomer mixture. 50% of this monomer mixture and 188 parts of ethyl acetate were added to a flask equipped with a thermometer, stirrer, inert gas inlet tube, reflux condenser and dropping funnel. The monomer mixture for dripping consisting of the remaining monomer mixture 50% and 0.125 part of “Nypa I BMT-K40” was put in the dropping funnel and mixed well. While circulating nitrogen gas, the internal temperature of the flask was raised to 82 ° C., and 0-25 parts of “Nyper BMT-MT40” was charged into the flask to initiate polymerization. After 10 minutes had passed since the polymerization initiator was added, the dropping of the monomer mixture for dropping was started. Dropping module The nomer mixture was added dropwise evenly over 1 hour. After completion of the dropwise addition, 58 parts of ethyl acetate was added to the flask. Also, 1.5 hours after the completion of the dropping, add 0.125 parts of the above-mentioned Nyper B MT-K40J as a booster, and then ripen at 85 ° C for 2.5 hours to add the MMA high Tg polymer solution. Obtained.
[0086] 最初に合成した低 Tgポリマー溶液の不揮発分 100部に対し、上記高 Tgポリマー 溶液の不揮発分が 15部となるように両者を混合し、よく撹拌して、粘着剤ポリマー溶 液 No. 8を得た。この粘着剤ポリマー溶液 No. 8から得られた粘着剤層を光学顕微 鏡を用いて観察した結果、海島構造であることを確認した。  [0086] With respect to 100 parts of the non-volatile content of the initially synthesized low Tg polymer solution, both were mixed so that the non-volatile content of the above-mentioned high Tg polymer solution was 15 parts, stirred well, and pressure-sensitive adhesive polymer solution No. I got 8. As a result of observing the pressure-sensitive adhesive layer obtained from this pressure-sensitive adhesive polymer solution No. 8 using an optical microscope, it was confirmed that it had a sea-island structure.
[0087] 合成例 9 (ブレンド)  [0087] Synthesis Example 9 (Blend)
MMA250部と前記「チォカルコール 20」 1. 0部のみを用いた以外は合成例 8と同 様にして MMA系高 Tgポリマー溶液を得た。合成例 8と同じ低 Tgポリマー溶液の不 揮発分 100部に対し、この MMA系高 Tgポリマー溶液の不揮発分が 20部となるよう に両者を混合し、よく撹拌して、粘着剤ポリマー溶液 No. 9を得た。この粘着剤ポリマ 一溶液 No. 9から得られた粘着剤層を光学顕微鏡を用いて観察した結果、海島構 造であることを確認、した。  A MMA-based high Tg polymer solution was obtained in the same manner as in Synthesis Example 8, except that 250 parts of MMA and 1.0 part of “thiocalcol 20” were used. The 100% non-volatile content of the same low Tg polymer solution as in Synthesis Example 8 is mixed together so that the non-volatile content of this MMA high Tg polymer solution is 20 parts. I got 9. As a result of observing the pressure-sensitive adhesive layer obtained from this pressure-sensitive adhesive polymer solution No. 9 using an optical microscope, it was confirmed that it had a sea-island structure.
[0088] 実験例 1  [0088] Experimental Example 1
各粘着剤ポリマー溶液 No. ;!〜 9について合成方法をまとめて表 1に、各特性を表 2に示した。なお、特性評価方法は以下の通りである。  Table 1 shows the synthesis method for each of the pressure-sensitive adhesive polymer solutions;! To 9, and Table 2 shows the characteristics. The characteristic evaluation method is as follows.
[0089] [Tg] [0089] [Tg]
前記計算式で計算した Tgである。  Tg calculated by the above formula.
[0090] [質量平均分子量 (Mw) ] [0090] [Mass average molecular weight (Mw)]
GPC測定装置: Liquid Chromatography Model 510 (Waters社製)を用いて、下記 条件で行った。  GPC measurement apparatus: Liquid Chromatography Model 510 (manufactured by Waters) was used under the following conditions.
検出器: M410示差屈折計  Detector: M410 differential refractometer
カラム: Ultra Styragel Linear (7. 8mm X 30cm ; ' Styragel'は登録商標) Column: Ultra Styragel Linear (7.8 mm x 30cm; 'Styragel' is a registered trademark)
Ultra Styragel ΙΟθΑ (7. 8mm X 30cm) Ultra Styragel ΙΟθΑ (7.8 mm x 30cm)
Ultra Styragel 500 A (7. 8mm X 30cm)  Ultra Styragel 500 A (7.8 mm x 30cm)
溶媒:テトラヒドロフラン (THFと略記) 試料濃度は 0. 2%、注入量は 200マイクロリットル/回で、ポリスチレン標準試料換 算値を Mwとした。 Solvent: Tetrahydrofuran (abbreviated as THF) The sample concentration was 0.2%, the injection volume was 200 microliters / time, and the polystyrene standard sample conversion value was Mw.
[0091] なお、二段重合の場合は、二段目のモノマーをフラスコに添加する前に、高 Tgポリ マー (A)をサンプリングし、 Mwを測定した。また、二段重合終了後にポリマー混合物 全体の Mwを測定した。  [0091] In the case of two-stage polymerization, the high Tg polymer (A) was sampled and Mw was measured before the second-stage monomer was added to the flask. In addition, Mw of the whole polymer mixture was measured after the completion of the two-stage polymerization.
[0092] [tan δ ]  [0092] [tan δ]
レオメーター(ティ一'エイ'インスツルメント社製;「ARES」)を用い、ずりモード、ノ ラプレート法(8mm φ )によって、角振動周波数 6. 28rad/s、測定温度範囲 50 〜; 150°Cで測定した。  Using a rheometer (manufactured by Ti-A Instruments Inc .; “ARES”), by shear mode, normal plate method (8 mm φ), angular vibration frequency 6.28 rad / s, measurement temperature range 50 to 150 Measured at ° C.
[0093] [分離の有無]  [0093] [Presence or absence of separation]
ポリマー溶液 No.;!〜 9について、それぞれ不揮発分が 30質量%となるように酢酸 ェチルで濃度調整を行い、ビーカーに 50g採取する。手で充分に撹拌した後、 12m πι φの試験管に液柱の高さが 100mmになるまで注ぎ入れ、溶剤が揮発しないように 試験管の開口部をシールする。試験管立てに立てて、 25°Cの雰囲気下に 24時間静 置して、分離の状態を目視で観察する。濁りの程度が溶液全体において均一で、分 離の境界が認められないものを「分離なし」とした。透明な部分が液柱の上部や下部 に発生している場合や、濁りの程度の異なる 2相が形成されている場合 (例えば、液 柱上部 90mmでは濁りが強ぐ下部 10mmでは、上部より、やや濁りの少ない状態の 場合など)は、「分離あり」と判断した。  For polymer solution No .;! To 9, adjust the concentration with ethyl acetate so that the non-volatile content is 30% by mass, and collect 50 g in a beaker. After thoroughly stirring by hand, pour into a 12m πι φ test tube until the height of the liquid column reaches 100mm, and seal the test tube opening to prevent the solvent from evaporating. Stand in a test tube stand, leave it in an atmosphere of 25 ° C for 24 hours, and visually observe the state of separation. The case where the degree of turbidity was uniform throughout the solution and no separation boundary was observed was defined as “no separation”. When transparent parts are formed at the top and bottom of the liquid column, or when two phases with different turbidity levels are formed (for example, at the upper 90 mm of the liquid column, the turbidity is strong, and at the lower 10 mm, In the case of a slightly less turbid state), it was judged as “separated”.
[0094] [粘着特性]  [0094] [Adhesive properties]
粘着剤ポリマー溶液を取り、酢酸ェチルで不揮発分を 34%に調製した。ポリマー 1 00部当たり、架橋促進剤としてジブチルチンジラウレート 250ppm (質量基準)と、架 橋剤として「デユラネート(登録商標) D— 201」(へキサメチレンジイソシァネート系; 2 官能;旭化成社製)が 10部に相当する量を加えてよく撹拌し、粘着剤組成物を得た。  The pressure-sensitive adhesive polymer solution was taken, and the nonvolatile content was adjusted to 34% with ethyl acetate. Dibutyltin dilaurate 250 ppm (mass basis) as a crosslinking accelerator per 100 parts of polymer, and “deyuranate (registered trademark) D-201” (hexamethylene diisocyanate series; bifunctional; bifunctional; manufactured by Asahi Kasei Co., Ltd.) ) Was added in an amount corresponding to 10 parts, and stirred well to obtain an adhesive composition.
[0095] 支持基材としてポリエチレンテレフタレート(PET)フィルム(東レ株式会社製;厚さ 3 8 111)を用い、粘着剤組成物を乾燥後の厚さが 20 mとなるように塗布した後、 10 0°Cで 2分間乾燥させることにより、粘着フィルムを作成した。粘着剤表面に離型処理 を施した PETフィルムを貼着して保護した後、 40°Cの雰囲気下で 3日間養生した。 養生後の粘着フィルムは、 23°C、相対湿度 65%の雰囲気で 24時間調湿した後、 25 mm幅で適当な長さに切断して、試験テープを作製した。なお、離型フィルムは試験 を実施する際に引き剥がした。 [0095] A polyethylene terephthalate (PET) film (manufactured by Toray Industries, Inc .; thickness 3 8 111) was used as a supporting substrate, and the pressure-sensitive adhesive composition was applied so that the thickness after drying was 20 m. An adhesive film was prepared by drying at 0 ° C. for 2 minutes. After sticking and protecting the adhesive surface with a PET film that had been subjected to a release treatment, it was cured in an atmosphere of 40 ° C for 3 days. The cured adhesive film was conditioned for 24 hours in an atmosphere of 23 ° C. and 65% relative humidity, and then cut to an appropriate length with a width of 25 mm to prepare a test tape. The release film was peeled off during the test.
[0096] 厚さ 3mmのアクリル板(日本テストパネル株式会社製の標準試験板)を被着体とし 、 23°C、相対湿度 65%の雰囲気下でアクリル板に上記試験テープを 2kgのゴムロー ラで 1往復させて圧着する。圧着後 25分放置した後、剥離速度を、低速剥離では 0. 3m/min、高速剥離では 30m/minとし、 23°Cの雰囲気下で、 JIS K 6854に準 じて 180°剥離粘着力を測定した。表 2には、低速剥離粘着力、高速剥離粘着力、お よび、高速剥離粘着力を低速剥離粘着力で除した値(「高速/低速」として示した)を 併記した。 [0096] A 3 mm thick acrylic plate (standard test plate made by Nippon Test Panel Co., Ltd.) was used as the adherend, and the above test tape was placed on the acrylic plate in an atmosphere of 23 ° C and 65% relative humidity. 1 reciprocate and crimp. After standing for 25 minutes after crimping, the peel rate is 0.3 m / min for low speed peel and 30 m / min for high speed peel, and 180 ° peel adhesive strength in accordance with JIS K 6854 under an atmosphere of 23 ° C. It was measured. Table 2 also shows the low-speed peel adhesive strength, the high-speed peel adhesive strength, and the value obtained by dividing the high-speed peel adhesive strength by the low-speed peel adhesive strength (shown as “high speed / low speed”).
[0097] [ヘイズ(%) ] [0097] [Haze (%)]
濁度計(日本電子工業社製;「NDH— 2000」)を用い、 JIS K 7105に準じて、上 記試験テープのヘイズ (%)を測定した。  Using a turbidimeter (manufactured by JEOL Ltd .; “NDH-2000”), the haze (%) of the test tape was measured according to JIS K 7105.
[0098] なお、表 1においては、各モノマーと分子量調整剤を次のように略記した。 [0098] In Table 1, each monomer and molecular weight modifier are abbreviated as follows.
VAC :酢酸ビュル  VAC: Bull acetate
BA : n—ブチルアタリレート  BA: n-Butyl acrylate
2EHA: 2—ェチルへキシルアタリレート  2EHA: 2-Ethylhexyl acrylate
HEA : 2—ヒドロキシェチルアタリレート  HEA: 2-hydroxyethyl acrylate
MMA :メチルメタタリレート  MMA: Methyl metatalylate
DM :ドデシルメルカブタン (分子量調整剤)  DM: Dodecyl mercabtan (molecular weight regulator)
[0099] [表 1] [0099] [Table 1]
〔星0 [Star 0
Figure imgf000027_0001
Figure imgf000027_0001
Figure imgf000028_0001
Figure imgf000028_0001
表 2から明らかな通り、二段重合を行った実施例;!〜 3の粘着剤組成物は、分離を 起こさず保存安定性に優れている。また、高 Tgポリマー(A— 1)と低 Tgポリマー(B) とをバランスよく配合しているため、高速剥離粘着力が小さぐ高速/低速の値も 15 . 0以下であった。比較例 1は低 Tgポリマー(B)のみからなるため、高速剥離粘着力 が大きすぎた。高 Tgポリマー (A)と低 Tgポリマー(B)を一括で重合させた比較例 2で も、高速剥離粘着力が大きぐジッビング剥離を起こしていた。 As is apparent from Table 2, the pressure-sensitive adhesive compositions of Examples 2 to 3 in which two-stage polymerization was carried out were excellent in storage stability without causing separation. In addition, high Tg polymer (A-1) and low Tg polymer (B) are blended in a well-balanced manner. 0 or less. Since Comparative Example 1 consisted of only the low Tg polymer (B), the high-speed peel adhesive strength was too large. Even in Comparative Example 2 in which the high Tg polymer (A) and the low Tg polymer (B) were polymerized in a lump, the high-speed peel adhesive strength was high, and zippering occurred.
[0102] 高 Tgポリマー(A— 1)と低 Tgポリマー(B)とをブレンドした実施例 4と参考例 1との 比較から、高 Tgポリマー (A— 1)が少なすぎると粘着特性は劣化していくことがわか つた。 [0102] From the comparison between Example 4 blended with high Tg polymer (A-1) and low Tg polymer (B) and Reference Example 1, the adhesive properties deteriorated when the amount of high Tg polymer (A-1) is too small. I was able to find out.
[0103] また、実施例 5と参考例 2は、屈折率が 2EHAや BAのポリマーとは異なる MMA系 のポリマーを高 Tgポリマー(A)として用いたため、ヘイズにつ!/ヽてはあまりよくな!/、が 、参考例 2では、高 Tgポリマー (A)の Tgが高すぎるため低速での剥離力が小さすぎ 、粘着力が不足するおそれがあることがわかった。  [0103] Further, in Example 5 and Reference Example 2, since a MMA-based polymer having a refractive index different from that of 2EHA or BA was used as the high Tg polymer (A), it was not very good for haze! However, in Reference Example 2, it was found that the Tg of the high Tg polymer (A) was too high, so that the peel force at low speed was too small and the adhesive strength might be insufficient.
[0104] 合成例 10 (二段重合 +後添加)  [0104] Synthesis Example 10 (two-stage polymerization + post-addition)
VAC112. 8部と、溶媒として酢酸ェチル 263部を、温度計、撹拌機、不活性ガス 導入管、還流冷却器および滴下ロートを備えたフラスコに添加した。撹拌下、窒素ガ スを流通させながら、フラスコの内温を 75°Cまで上昇させ、重合開始剤として酢酸ェ チル 1. 1部で希釈した「ラウロックス」(化薬ァクゾ社製;ラウロイルパーオキサイド) 0. 12部をフラスコに投入して、重合を開始させた。  10.8 parts of VAC and 263 parts of ethyl acetate as solvent were added to a flask equipped with a thermometer, stirrer, inert gas inlet tube, reflux condenser and dropping funnel. While stirring, nitrogen gas was circulated, the temperature inside the flask was raised to 75 ° C, and “Laurox” diluted with 1.1 parts of ethyl acetate as a polymerization initiator (manufactured by Kayaku Akuzo; Lauroyl peroxide) 0.12 parts were charged into the flask to initiate the polymerization.
[0105] 反応開始から 30分経過した後、 VAC24部と、 HEA4. 2部と、「ラウロックス」 0. 14 部と、酢酸ェチル 52部からなる混合物を 1時間に亘つてフラスコに滴下した。滴下終 了後、酢酸ェチル 14部で滴下ロートを洗浄し、フラスコに添加した。その後直ちに、 ブースタ一として、酢酸ェチル 6. 3部で希釈した「ラウロックス」 0. 7部を添加した後、 さらに 76°Cで 2時間熟成し、 VACと HEAとから合成された不揮発分 30%の高 Tgポ リマーの酢酸ェチル溶液を得た。この高 Tgポリマーの Tgは 28°C、 Mwは 6. 9万であ つた。  [0105] After 30 minutes from the start of the reaction, a mixture consisting of 24 parts of VAC, 4.2 parts of HEA, 0.14 parts of "Laurox" and 52 parts of ethyl acetate was dropped into the flask over 1 hour. After completion of the dropping, the dropping funnel was washed with 14 parts of ethyl acetate and added to the flask. Immediately after that, 0.7 parts of “Laurox” diluted with 6.3 parts of ethyl acetate was added as a booster, and then further aged at 76 ° C for 2 hours. The non-volatile content synthesized from VAC and HEA was 30%. A high Tg polymer in ethyl acetate was obtained. This high Tg polymer had a Tg of 28 ° C and an Mw of 69,000.
[0106] 次に、高 Tgポリマーの存在下で、低 Tgポリマー用モノマーの重合を行い、グラフト ポリマーを合成した。温度計、撹拌機、不活性ガス導入管、還流冷却器および滴下 ロートを備えたフラスコに、上記高 Tgポリマーを 15部(不揮発分)と、低 Tgポリマー用 モノマーとして、 BA27部、 2EHA60. 3部、 ΗΕΑ2· 7部と、酢酸ェチル 120部を仕 込み、よく混合した。撹拌下、窒素ガスを流通させながら、フラスコの内温を 82°Cまで 上昇させ、重合開始剤である前記「ナイパー BMT— K40」0. 12部をフラスコに投入 し、重合を開始させた。 [0106] Next, in the presence of a high Tg polymer, a monomer for a low Tg polymer was polymerized to synthesize a graft polymer. In a flask equipped with a thermometer, stirrer, inert gas inlet tube, reflux condenser and dropping funnel, 15 parts of the above high Tg polymer (non-volatile content), and 27 parts of BA, 2EHA60.3 as the monomer for the low Tg polymer , 2 · 7 parts, and 120 parts of ethyl acetate were mixed well. Keep the temperature of the flask up to 82 ° C while flowing nitrogen gas under stirring. Then, 0.12 part of the above-mentioned “Nyper BMT-K40”, which is a polymerization initiator, was added to the flask to initiate polymerization.
[0107] 反応開始から 15分経過した後、 ΒΑ63部、 2EHA140. 7部、 ΗΕΑ6. 3部と、「ナ ィパー ΒΜΤ— Κ40」0· 26部と、酢酸ェチル 152· 4部との混合物を 1時間に亘つて フラスコ内に滴下した。滴下終了後、 1. 5時間経過後から 2. 5時間経過後にかけて 、ブースタ一として「ΑΒΝ— Ε」1 · 1部と酢酸ェチル 54. 9部を 3度に分割して添加し た。その後、さらに 78°Cで 1. 5時間熟成した。  [0107] After 15 minutes from the start of the reaction, add a mixture of ΒΑ63 parts, 2EHA140.7 parts, ΗΕΑ6.3 parts, “Nyper ΒΜΤ—Κ40” 0.26 parts, and ethyl acetate 152.4 parts. It was dropped into the flask over time. After the completion of dropping, 1.5 hours to 2.5 hours later, 1 part of “ΑΒΝ-Ε” and 54.9 parts of ethyl acetate were added in three portions as a booster. Thereafter, the mixture was further aged at 78 ° C for 1.5 hours.
[0108] 得られたグラフトポリマー溶液の不揮発分 100部に対し、前記高 Tgポリマーの酢酸 ェチル溶液を不揮発分で 20部加え、粘着剤ポリマー溶液 No. 10を得たた。この粘 着剤ポリマー溶液 No. 10から得られた粘着剤層について、 SEMを用いて観察した 結果、海島構造であることが確認できた(図 1)。なお、図 1中、上側が基材フィルムの ポリエチレンテレフタレート(PET)であり、下側が粘着剤層である。  [0108] An adhesive polymer solution No. 10 was obtained by adding 20 parts of the high Tg polymer ethyl acetate solution in a nonvolatile content to 100 parts of the nonvolatile content in the obtained graft polymer solution. The pressure-sensitive adhesive layer obtained from this adhesive polymer solution No. 10 was observed using SEM, and as a result, it was confirmed that it had a sea-island structure (Fig. 1). In FIG. 1, the upper side is polyethylene terephthalate (PET) of the base film, and the lower side is an adhesive layer.
[0109] 合成例 11 (二段重合 +後添加)  [0109] Synthesis Example 11 (two-stage polymerization + post-addition)
高 Tgポリマー用モノマー組成を表 3に示したように変更した以外は合成例 10と同 様にして、高 Tgポリマーを合成した。  A high Tg polymer was synthesized in the same manner as in Synthesis Example 10 except that the monomer composition for the high Tg polymer was changed as shown in Table 3.
[0110] 次に、高 Tgポリマーの存在下で、低 Tgポリマー用モノマーの重合を行い、グラフト ポリマーを合成した。温度計、撹拌機、不活性ガス導入管、還流冷却器および滴下 ロートを備えたフラスコに、上記高 Tgポリマーを 15部(不揮発分)、低 Tgポリマー用 モノマーとして、 BA27部、 2EHA61. 3部、 4—ヒドロキシブチルアタリレート(4HBA ;ホモポリマーの Tg = 241K) l . 7部と、連鎖移動剤としてドデシルメルカプタン(DM ) 0. 09部と、酢酸ェチル 105部を仕込み、よく混合した。撹拌下、窒素ガスを流通さ せながら、フラスコの内温を 82°Cまで上昇させ、前記「ナイパー BMT— Κ40」0· 12 部をフラスコに投入し、重合を開始させた。  [0110] Next, a monomer for low Tg polymer was polymerized in the presence of high Tg polymer to synthesize a graft polymer. In a flask equipped with a thermometer, stirrer, inert gas inlet tube, reflux condenser and dropping funnel, 15 parts of the above-mentioned high Tg polymer (non-volatile content), and 27 parts of BA, 2EHA61. 4-hydroxybutyl acrylate (4HBA; homopolymer Tg = 241K) 1.7 parts, 0.09 part dodecyl mercaptan (DM) as a chain transfer agent and 105 parts ethyl acetate were charged and mixed well. While stirring, while supplying nitrogen gas, the internal temperature of the flask was raised to 82 ° C., and 0 · 12 parts of the above-mentioned “Nyper BMT-Κ40” were put into the flask to initiate polymerization.
[0111] 反応開始から 15分経過した後、 ΒΑ63部、 2EHA143. 1部、 4ΗΒΑ3. 9部と、 D Μ0. 21部、「ナイパー ΒΜΤ— Κ40」0· 26部、酢酸ェチル 62· 4部の混合物を 1時 間に亘つてフラスコ内に滴下した。滴下終了後、酢酸ェチル 30部で滴下ロートを洗 浄し、フラスコ内に添加した。滴下終了後 1. 5時間経過後から 2. 5時間経過後にか けて、ブースタ一として「ΑΒΝ— Ε」1 · 1部と酢酸ェチル 9. 9部を 3度に分割して添 加した。その後、さらに 78°Cで 1. 5時間熟成し、グラフトポリマー溶液を得た。グラフト ポリマーと高 Tgポリマーの比率は、不揮発分で 100 : 20とした。得られた粘着剤ポリ マー溶液 No. 11を用いてプレパラート上に塗膜を作り、光学顕微鏡を用いて観察し た結果、海島構造であることが確認できた。 [0111] 15 minutes after the start of the reaction, ΒΑ63 parts, 2EHA143. 1 part, 4 ΗΒΑ3.9 parts, D Μ0.21 parts, “Nyper ΒΜΤ—Κ40” 0 · 26 parts, ethyl acetate 62.4 parts The mixture was dropped into the flask over 1 hour. After completion of the dropping, the dropping funnel was washed with 30 parts of ethyl acetate and added to the flask. After the completion of dripping 1. After 5 hours and 2.5 hours, add 1 part of “ΑΒΝ-Ε” and 9.9 parts of ethyl acetate as a booster in 3 portions. Added. Thereafter, the mixture was further aged at 78 ° C. for 1.5 hours to obtain a graft polymer solution. The ratio of graft polymer to high Tg polymer was 100: 20 in non-volatile content. Using the resulting pressure-sensitive adhesive polymer solution No. 11, a coating film was formed on a slide and observed with an optical microscope. As a result, it was confirmed that the structure was a sea-island structure.
[0112] 合成例 12、 13 (二段重合 +後添加)  [0112] Synthesis Examples 12 and 13 (two-stage polymerization + post-addition)
合成例 12と合成例 13は、合成例 11で得られた高 Tgポリマーとグラフトポリマーの 混合比率を変えた例である。各例で得られた粘着剤ポリマー溶液 No. 12, 13により プレパラート上に塗膜を作り、光学顕微鏡を用いて観察した結果、海島構造であるこ とが確認できた。  Synthesis Example 12 and Synthesis Example 13 are examples in which the mixing ratio of the high Tg polymer obtained in Synthesis Example 11 and the graft polymer was changed. As a result of forming a coating film on the preparation using the pressure-sensitive adhesive polymer solutions No. 12 and 13 obtained in each example and observing with an optical microscope, it was confirmed that the structure was a sea-island structure.
[0113] 合成例 14 (二段重合 +後添加)  [0113] Synthesis Example 14 (two-stage polymerization + post-addition)
グラフトポリマーを合成する際の DMの使用量を 0. 15部に減らした以外は合成例 1 1と同様にして、高 Tgポリマー溶液と、グラフトポリマー溶液を得た。グラフトポリマーと 高 Tgポリマーとの比率は、不揮発分で 100 : 20とした。得られた粘着剤ポリマー溶液 No. 14によりプレパラート上に塗膜を作り、光学顕微鏡を用いて観察した結果、海 島構造であることが確認できた。  A high Tg polymer solution and a graft polymer solution were obtained in the same manner as in Synthesis Example 11 except that the amount of DM used to synthesize the graft polymer was reduced to 0.15 part. The ratio of graft polymer to high Tg polymer was 100: 20 in non-volatile content. As a result of forming a coating film on the preparation using the obtained pressure-sensitive adhesive polymer solution No. 14 and observing it with an optical microscope, it was confirmed that the structure was a sea-island structure.
[0114] 合成例 15 (二段重合 +後添加)  [0114] Synthesis Example 15 (two-stage polymerization + post-addition)
グラフトポリマーを合成する際に、高 Tgポリマーの仕込み量を 6部に減らした以外 は合成例 11と同様にして、高 Tgポリマー溶液と、グラフトポリマー溶液を得た。グラフ トポリマーと高 Tgポリマーとの比率は、不揮発分で 100 : 20とし、両溶液を混合して 粘着剤ポリマー溶液 No. 15を得た。プレパラート上に塗膜を作り、光学顕微鏡を用 V、て観察した結果、海島構造であることが確認できた。  In synthesizing the graft polymer, a high Tg polymer solution and a graft polymer solution were obtained in the same manner as in Synthesis Example 11, except that the amount of the high Tg polymer charged was reduced to 6 parts. The ratio of graft polymer to high-Tg polymer was 100: 20 in terms of nonvolatile content, and both solutions were mixed to obtain adhesive polymer solution No. 15. As a result of forming a coating film on the slide and observing it with an optical microscope, it was confirmed that the structure was a sea-island structure.
[0115] 合成例 16(ブレンド)  [0115] Synthesis Example 16 (blend)
合成例 11と同様にして高 Tgポリマー溶液を調製した。次に、別途、低 Tgポリマー 用モノマーの重合を行った。温度計、撹拌機、不活性ガス導入管、還流冷却器およ び滴下ロートを備えたフラスコに、低 Tgポリマー用モノマーとして、 BA36部、 2EHA 82. 2部、 HEA1. 8部と、酢酸ェチル 144部を仕込み、よく混合した。撹拌下、窒素 ガスを流通させながら、フラスコの内温を 82°Cまで上昇させ、前記「ナイパー(登録商 標) BMT— K40」0. 15部をフラスコに投入し、重合を開始させた。 [0116] 反応開始から 15分経過した後、 BA54部、 2EHA123. 3部、 HEA2. 7部と、「ナ ィパー ΒΜΤ— Κ40」0· 23部、酢酸ェチル 92部の混合物を 1時間に亘つてフラスコ 内に滴下した。滴下終了後、酢酸ェチル 60部で滴下ロートを洗浄し、フラスコ内に添 加した。滴下終了後 1. 5時間経過後から 2. 5時間経過後にかけて、ブースタ一とし て「ΑΒΝ— Ε」1 · 1部と酢酸ェチル 69. 9部を 3度に分割して添加した。その後、さら に 78°Cで 1. 5時間熟成し、低 Tgポリマー溶液を得た。低 Tgポリマー溶液と高 Tgポリ マー溶液とを、不揮発分の比率が 100: 20となるように混合して粘着剤ポリマー溶液 No. 16とした。プレパラート上に塗膜を作り、光学顕微鏡を用いて観察した結果、海 島構造であることが確認できた。 A high Tg polymer solution was prepared in the same manner as in Synthesis Example 11. Next, a monomer for low Tg polymer was separately polymerized. In a flask equipped with a thermometer, stirrer, inert gas inlet tube, reflux condenser and dropping funnel, 36 parts BA, 2EHA 82.2 parts, HEA 1.8 parts, and ethyl acetate as low Tg polymer monomers 144 parts were charged and mixed well. While the nitrogen gas was circulated under stirring, the internal temperature of the flask was raised to 82 ° C., and 0.15 part of the above-mentioned “Nyper (registered trademark) BMT-K40” was put into the flask to initiate the polymerization. [0116] After 15 minutes from the start of the reaction, a mixture of 54 parts of BA, 2 parts of 2EHA123.3, 7 parts of HEA, 0.23 parts of Nyper ΒΜΤ—ΒΜΤ40, and 92 parts of ethyl acetate for 1 hour The solution was dropped into the flask. After completion of the dropping, the dropping funnel was washed with 60 parts of ethyl acetate and added to the flask. After the completion of dripping, 1.5 hours and 2.5 hours later, 1 part of “ΑΒΝ-Ε” and 69.9 parts of ethyl acetate were added in three portions as a booster. Thereafter, it was further aged at 78 ° C. for 1.5 hours to obtain a low Tg polymer solution. The low Tg polymer solution and the high Tg polymer solution were mixed so that the non-volatile content ratio was 100: 20 to obtain an adhesive polymer solution No. 16. As a result of forming a coating film on the slide and observing it with an optical microscope, it was confirmed that the structure was a sea-island structure.
[0117] 合成例 17 (二段重合 +後添加)  [0117] Synthesis Example 17 (two-stage polymerization + post-addition)
高 Tgポリマー用モノマー組成を表 3に示したように変更した以外は合成例 10と同 様にして、高 Tgポリマーを合成した。次に、高 Tgポリマーの存在下で、低 Tgポリマー 用モノマーの重合を行い、グラフトポリマーを合成した。温度計、撹拌機、不活性ガス 導入管、還流冷却器および滴下ロートを備えたフラスコに、上記高 Tgポリマーを 15 部(不揮発分)、低 Tgポリマー用モノマーとして、 BA27部、 2EHA60. 3部、 HEA2 . 7部と、酢酸ェチル 120部を仕込み、よく混合した。撹拌下、窒素ガスを流通させな がら、フラスコの内温を 82°Cまで上昇させ、「ナイパー ΒΜΤ— Κ40」0· 12部をフラス コに投入し、重合を開始させた。  A high Tg polymer was synthesized in the same manner as in Synthesis Example 10 except that the monomer composition for the high Tg polymer was changed as shown in Table 3. Next, the monomer for low Tg polymer was polymerized in the presence of high Tg polymer to synthesize the graft polymer. In a flask equipped with a thermometer, stirrer, inert gas inlet tube, reflux condenser and dropping funnel, 15 parts of the above-mentioned high Tg polymer (non-volatile content), and 27 parts of BA, 2EHA60. 3 parts as monomers for low Tg polymer 2.7 parts of HEA and 120 parts of ethyl acetate were charged and mixed well. While the nitrogen gas was circulated under stirring, the internal temperature of the flask was raised to 82 ° C., and 0 · 12 parts of “NIPPER ΒΜΤ—Κ40” were put into the flask to initiate the polymerization.
[0118] 反応開始から 15分経過した後、 ΒΑ63部、 2EHA140. 7部、 ΗΕΑ6. 3部と、「ナ ィパー ΒΜΤ— Κ40」0· 26部、酢酸ェチル 152· 4部の混合物を 1時間に亘つてフラ スコ内に滴下した。滴下終了後、酢酸ェチル 120部で滴下ロートを洗浄し、フラスコ 内に添加した。滴下終了後 1. 5時間経過後から 2. 5時間経過後にかけて、ブースタ 一として「ΑΒΝ— Ε」1 · 1部と酢酸ェチル 9. 9部を 3度に分割して添加した。その後、 さらに 78°Cで 1. 5時間熟成し、グラフトポリマー溶液を得た。グラフトポリマーと高 Tg ポリマーの比率は、不揮発分で 100 : 20とした。得られた粘着剤ポリマー溶液 No. 1 7を用いてプレパラート上に塗膜を作り、光学顕微鏡を用いて観察した結果、海島構 造であることが確認できた。  [0118] After 15 minutes from the start of the reaction, a mixture of ΒΑ63 parts, 2EHA140. The solution was dropped into the flask. After completion of dropping, the dropping funnel was washed with 120 parts of ethyl acetate and added to the flask. 1. After 5 hours and 2.5 hours had elapsed, 1 · 1 part of “ΑΒΝ-ΑΒΝ” and 9.9 parts of ethyl acetate were added in three portions as a booster. Thereafter, the mixture was further aged at 78 ° C. for 1.5 hours to obtain a graft polymer solution. The ratio of graft polymer to high Tg polymer was 100: 20 in non-volatile content. As a result of forming a coating film on the preparation using the obtained pressure-sensitive adhesive polymer solution No. 17 and observing it with an optical microscope, it was confirmed that the structure was a sea-island structure.
[0119] 実験例 2 粘着剤ポリマー溶液 No. 10〜; 17と、合成例 1で得た粘着剤ポリマー溶液 No. 1に ついて、前記した方法で、 Tg、 Mw、低速剥離粘着力、高速剥離粘着力、高速剥離 粘着力を低速剥離粘着力で除した値(「高速/低速」)、ヘイズを測定し、表 3に示し た。また、被着体汚染となじみ性についても下記の通り評価し、結果を表 3に示した。 [0119] Experimental Example 2 For the pressure-sensitive adhesive polymer solution No. 10 to 17; and pressure-sensitive adhesive polymer solution No. 1 obtained in Synthesis Example 1, Tg, Mw, low-speed peel adhesive strength, high-speed peel adhesive strength, and high-speed peel adhesive The value obtained by dividing the force by the low-speed peel adhesion (“high speed / low speed”) and haze were measured and are shown in Table 3. In addition, adherend contamination and conformability were evaluated as shown below, and the results are shown in Table 3.
[0120] [被着体汚染] [0120] [Adherent contamination]
厚さ 3mmのアクリル板(日本テストパネル株式会社製の標準試験板)を被着体とし 、 23°C、相対湿度 65%の雰囲気下でアクリル板に上記試験テープを 2kgのゴムロー ラで 1往復させて圧着する。圧着後、 70°Cのオーブン中に 72時間放置した後、 23°C 、相対湿度 65%の雰囲気下で 24時間調温した。剥離速度 0. 3m/minで試験テー プを剥離し、剥離後のアクリル板の表面状態を目視で観察した。全く汚染されていな V、もの (糊残りなし)を〇、わずかに糊残りがあり汚染されて!/、たものを Xとして評価し た。  Using a 3mm thick acrylic plate (standard test plate manufactured by Nippon Test Panel Co., Ltd.) as an adherend, the test tape is reciprocated once with a 2kg rubber roller in an atmosphere of 23 ° C and relative humidity of 65%. And crimp. After crimping, it was left in an oven at 70 ° C. for 72 hours, and then temperature-controlled for 24 hours in an atmosphere at 23 ° C. and 65% relative humidity. The test tape was peeled off at a peeling speed of 0.3 m / min, and the surface state of the acrylic plate after peeling was visually observed. V, no contamination (no glue residue) was rated as 0, and there was a slight amount of glue residue and contamination! /, And X was rated as X.
[0121] [なじみ性]  [0121] [Familiarity]
上記試験テープから、 4cm X 4cmのサイズの試験片を切り出す。市販の液晶保護 フィルム(アンチグレア)(BUFFALO社製; BOF-H141 S)の粗面を被着体として 用い、粗面が上に来るようにアンチグレアフィルムを平らな面の上に水平に置く。 23 °C、 65%の相対湿度の雰囲気下で、試験片をアンチグレアフィルムの上に静かに置 く。試験片がフィルムに濡れ始めてから、試験片全体がフィルムに完全になじむまで の時間を測定する。 120秒未満を◎、 120秒〜 180秒未満を〇、 180秒以上か、完 全に濡れる状態とならな!/、場合を Xとして評価した。  A test piece having a size of 4 cm × 4 cm is cut out from the test tape. Use the rough surface of a commercially available LCD protective film (antiglare) (manufactured by BUFFALO; BOF-H141 S) as the adherend, and place the antiglare film horizontally on a flat surface so that the rough surface is on top. Place the specimen gently on the antiglare film in an atmosphere of 23 ° C and 65% relative humidity. Measure the time from when the specimen starts to get wet to the film until the entire specimen is fully integrated with the film. The case was evaluated as X for less than 120 seconds, ◎ for 120 seconds to less than 180 seconds, or for more than 180 seconds, or to be completely wet! /.
[0122] [表 3] [0122] [Table 3]
Figure imgf000034_0001
Figure imgf000034_0001
表 3から明らかな通り、高 Tgポリマー(A)と低 Tgポリマー(B)のレ、ずれにもヒドロキ シル基を導入した実施例 10〜: 18の粘着剤組成物は、被着体汚染が全くなぐ再剥 離用粘着剤として有用であることが明らかとなった。また、 HEAより 4HBAを用いると 、なじみ性が非常に良好になることがわ力、つた。一方、実施例 17と実施例 1は、高 Tg ポリマー (A)にヒドロキシル基を導入しておらず、架橋反応が起こらなかったため、若 干の被着体汚染が認められた。なお、いずれの例も、高 Tgポリマー (A)と低 Tgポリ マー(B)とがバランスよく配合されて、かつ、海島構造を採っているため、高速剥離粘 着力が小さぐ高速/低速の直も 15. 0以下であった。 As is apparent from Table 3, the adhesive compositions of Examples 10 to 18 in which hydroxyl groups were introduced into the gaps between the high Tg polymer (A) and the low Tg polymer (B) were not contaminated with the adherend. It became clear that it was useful as an adhesive for re-peeling at all. In addition, using 4HBA rather than HEA has shown that the compatibility is very good. On the other hand, Example 17 and Example 1 are high Tg Since no hydroxyl group was introduced into the polymer (A) and no cross-linking reaction occurred, some contamination of the adherend was observed. In both examples, high Tg polymer (A) and low Tg polymer (B) are blended in a well-balanced manner and have a sea-island structure. Directly it was below 15.0.
[0124] 合成例 18 (ブレンド) [0124] Synthesis Example 18 (Blend)
[高 Tgポリマー]  [High Tg polymer]
メチノレアタリレート(MA) 155咅と、 HEA4. 8咅と、 DMO. 64咅と、溶媒として酢酸 ェチル 298. 3部を、温度計、撹拌機、不活性ガス導入管、還流冷却器および滴下口 ートを備えたフラスコに添加した。撹拌下、窒素ガスを流通させながら、フラスコの内 温を 78°Cまで上昇させ、重合開始剤として、酢酸ェチル 3. 6部で希釈した前記「ナ ィパー ΒΜΤ— Κ40」0· 4部をフラスコに投入して、重合を開始させた。  Methinorea tallylate (MA) 155 咅, HEA 4.8 咅, DMO. 64 咅, 298.3 parts of ethyl acetate as solvent, thermometer, stirrer, inert gas inlet tube, reflux condenser and dripping Added to a flask equipped with a neck. While stirring the nitrogen gas, raise the internal temperature of the flask to 78 ° C, and use 0.4 parts of “Nyper ΒΜΤ—Κ40” diluted with 3.6 parts of ethyl acetate as a polymerization initiator. To initiate polymerization.
[0125] 反応開始から 15分経過した後、 ΜΑ233部と、 ΗΕΑ7. 2部と、 DMO. 96部と、前 記「ナイパー ΒΜΤ— Κ40」0. 3部と、酢酸ェチル 279部からなる混合物を 1時間に 亘つてフラスコに滴下した。滴下終了後、酢酸ェチル 20部で滴下ロートを洗浄し、フ ラスコに添加した。滴下が終了してから 1. 5時間後から 2. 5時間後にかけて、ブース ターとして、前記「ΑΒΝ— Ε」0. 8部と酢酸ェチル 7. 2部の混合物を三度に分割して 添加した。その後、さらに 78°Cで 1. 5時間熟成した。得られた高 Tgポリマー溶液の 不揮発分は 38. 6%であった。この高 Tgポリマーの Tgは 8. 4°C、 Mwは 6. 9万であ つた。 [0125] After 15 minutes from the start of the reaction, a mixture consisting of を 233 parts, ΗΕΑ7.2 parts, DMO.96 parts, the above-mentioned “Nyper ΒΜΤ—Κ40” 0.3 parts, and 279 parts of ethyl acetate It was added dropwise to the flask over 1 hour. After completion of the dropping, the dropping funnel was washed with 20 parts of ethyl acetate and added to the flask. 1.5 hours to 2.5 hours after the completion of dropping, add 0.8 parts of the above-mentioned “ΑΒΝ-Ε” and 7.2 parts of ethyl acetate as a booster in three portions. did. Thereafter, the mixture was further aged at 78 ° C for 1.5 hours. The non-volatile content of the obtained high Tg polymer solution was 38.6%. This high Tg polymer had Tg of 8.4 ° C and Mw of 69,000.
[0126] [低 Tgポリマー]  [0126] [Low Tg polymer]
BA60咅と、 2EHA134咅と、 HEA6咅と、溶媒として酢酸ュチノレ 240咅を、温度 計、撹拌機、不活性ガス導入管、還流冷却器および滴下ロートを備えたフラスコに添 加した。撹拌下、窒素ガスを流通させながら、フラスコの内温を 87°Cまで上昇させ、 重合開始剤として、酢酸ェチル 2. 3部で希釈した前記「ナイパー BMT— K40」0. 2 5部をフラスコに投入して、重合を開始させた。  BA 60 kg, 2EHA 134 kg, HEA 6 kg, and 240 μm of lutinole acetate as a solvent were added to a flask equipped with a thermometer, a stirrer, an inert gas introduction tube, a reflux condenser, and a dropping funnel. While flowing nitrogen gas under stirring, the internal temperature of the flask was raised to 87 ° C, and 0.25 parts of “Nyper BMT-K40” diluted with 2.3 parts of ethyl acetate as a polymerization initiator was added to the flask. To initiate polymerization.
[0127] 反応開始から 15分経過した後、 ΒΑ90部と、 2EHA201部と、 ΗΕΑ9部と、前記「 ナイパー BMT— K40J 0. 38部と、酢酸ェチノレ 153. 4部からなる混合物を 1時間に 亘つてフラスコに滴下した。滴下終了後、酢酸ェチル 100部で滴下ロートを洗浄し、 フラスコに添加した。滴下が終了してから 1 · 5時間後から 2. 5時間後にかけて、ブー スターとして、前記「ΑΒΝ— E」l . 75部と酢酸ェチル 22部の混合物を三度に分割し て添加した。また、ブースター添加中に適時酢酸ェチル 100部を添加した。その後、 さらに 78°Cで 1. 5時間熟成した。得られた低 Tgポリマー溶液の不揮発分は 45. 5% であった。また、 Tgは 64°C、 Mwは 58. 1万であった。 [0127] After 15 minutes from the start of the reaction, a mixture consisting of 90 parts, 2EHA201 parts, 9 parts, the above-mentioned "Niper BMT-K40J 0.38 parts, and ethynole acetate 153.4 parts over 1 hour. After dropping, the dropping funnel was washed with 100 parts of ethyl acetate, Added to the flask. From 1.5 hours to 2.5 hours after the completion of dropping, the mixture of 75 parts of “ΑΒΝ-E” and 22 parts of ethyl acetate was added in three portions as a booster. In addition, 100 parts of ethyl acetate was added at an appropriate time during the addition of the booster. Thereafter, it was further aged at 78 ° C for 1.5 hours. The non-volatile content of the obtained low Tg polymer solution was 45.5%. The Tg was 64 ° C and the Mw was 58.10,000.
[0128] 低 Tgポリマー溶液の不揮発分 100部に対し、高 Tgポリマー溶液の不揮発分が 20 部となるように両者を混合し、よく撹拌して、粘着剤ポリマー溶液 No. 18を得た。この 粘着剤ポリマー溶液 No. 18から得られた粘着剤層を光学顕微鏡を用いて観察した 結果、海島構造であることを確認した。  Both were mixed so that the non-volatile content of the high Tg polymer solution was 20 parts with respect to 100 parts of the non-volatile content of the low Tg polymer solution, and stirred well to obtain adhesive polymer solution No. 18. As a result of observing the pressure-sensitive adhesive layer obtained from this pressure-sensitive adhesive polymer solution No. 18 using an optical microscope, it was confirmed that it had a sea-island structure.
[0129] 合成例 19 (ブレンド)  [0129] Synthesis Example 19 (Blend)
[高 Tgポリマー]  [High Tg polymer]
合成例 18と同様にして、高 Tgポリマーを合成した。  High Tg polymer was synthesized in the same manner as in Synthesis Example 18.
[0130] [低 Tgポリマー]  [0130] [Low Tg polymer]
初期仕込みのモノマー組成を、 BA60部、 2EHA114部、 HEA9部、ベンジルァク リレート(BZA) 20部に変更し、滴下モノマー組成を、 BA90部、 2EHA171部、 HE A9部、 BZA30部に変更した以外は、合成例 18と同様にして、低 Tgポリマーを合成 した。得られた低 Tgポリマー溶液の不揮発分は 45. 5%であった。また、 Tgは 58 °C、 Mwは 64· 7万であった。  The initial monomer composition was changed to BA 60 parts, 2EHA 114 parts, HEA 9 parts, benzyl acrylate (BZA) 20 parts, and the dropped monomer composition was changed to BA 90 parts, 2EHA 171 parts, HE A 9 parts, BZA 30 parts. A low Tg polymer was synthesized in the same manner as in Synthesis Example 18. The non-volatile content of the obtained low Tg polymer solution was 45.5%. The Tg was 58 ° C and the Mw was 64.70,000.
[0131] 低 Tgポリマー溶液の不揮発分 100部に対し、高 Tgポリマー溶液の不揮発分が 20 部となるように両者を混合し、よく撹拌して、粘着剤ポリマー溶液 No. 19を得た。この 粘着剤ポリマー溶液 No. 19から得られた粘着剤層を光学顕微鏡を用いて観察した 結果、海島構造であることを確認した。  [0131] With respect to 100 parts of the non-volatile content of the low Tg polymer solution, both were mixed so that the non-volatile content of the high Tg polymer solution was 20 parts, and stirred well to obtain adhesive polymer solution No. 19. As a result of observing the pressure-sensitive adhesive layer obtained from this pressure-sensitive adhesive polymer solution No. 19 using an optical microscope, it was confirmed that it had a sea-island structure.
[0132] 実験例 3  [0132] Experiment 3
粘着剤ポリマー溶液 No. 18と 19について、前記した方法で、 Tg、 Mw、低速剥離 粘着力、高速剥離粘着力、高速剥離粘着力を低速剥離粘着力で除した値(「高速/ 低速」)、ヘイズ、被着体汚染、なじみ性を測定し、表 4に示した。  For adhesive polymer solutions Nos. 18 and 19, Tg, Mw, low-speed peel adhesive strength, high-speed peel adhesive strength, and high-speed peel adhesive strength divided by low-speed peel adhesive strength as described above (“high speed / low speed”) Table 4 shows the measured haze, adherend contamination, and conformability.
[0133] [表 4]
Figure imgf000037_0001
[0133] [Table 4]
Figure imgf000037_0001
—は左欄と同じであることを意味する。  — Means the same as the left column.
[0134] 表 4力ら明ら力なとおり、酢酸ビュルに変えてメチルアタリレートを用いて高 Tgポリマ 一を合成した場合であっても、被着体汚染が見られず、粘着特性も良好であった。実 施例 18ではヘイズが 5. 7%と、 目標としている 3%よりも大きくなつた。これは、高 Tg ポリマーの屈折率 1. 4728と、低 Tgポリマーの屈折率 1. 4664とに差があつたため であると考えられる。実施例 19では、ホモポリマーが高屈折率であるべンジルアタリレ 一トを低 Tgポリマーの共重合成分に加えたため、低 Tgボリマーの屈折率が 1. 4712 まで上がり、ヘイズも 2. 1と大幅に低下した。 [0134] As clearly shown in Table 4, even when a high Tg polymer was synthesized using methyl acrylate in place of butyl acetate, adherend contamination was not observed and adhesive properties were also good. Met. In Example 18, the haze was 5.7%, which was higher than the target of 3%. This is thought to be due to the difference between the refractive index of high Tg polymer 1.4728 and the refractive index of low Tg polymer 1.4664. In Example 19, benzyl acrylate, which has a high refractive index of the homopolymer, was added to the copolymer component of the low Tg polymer, so that the refractive index of the low Tg polymer increased to 1.4712 and the haze was greatly increased to 2.1. Declined.
産業上の利用可能性  Industrial applicability
[0135] 本発明では、高 Tgボリマーと低 Tgポリマーとが海島構造を採っているため、高 Tg ポリマーの長所と低 Tgポリマーの長所を併せ持つ粘着剤とすることができ、その結果[0135] In the present invention, the high Tg polymer and the low Tg polymer have a sea-island structure. Adhesive with the advantages of both polymer and low Tg polymer
、高速剥離性を改善することができた。また、ヘイズの小さい粘着製品を得ることにも 成功した。 High-speed peelability could be improved. We have also succeeded in obtaining an adhesive product with low haze.
従って、上記粘着剤組成物を用いて得られる粘着製品は、光学用偏光板 (TAC)、 位相差板、 EMI (電磁波)シールドフィルム、防眩フィルム、反射防止フィルム等とい つた光学用部材の表面を保護するための再剥離用粘着製品として利用可能である。 また、その他のプラスチックや金属板の表面の保護フィルムとしても利用可能である。  Therefore, the adhesive products obtained using the above-mentioned adhesive composition are the surfaces of optical members such as optical polarizing plates (TAC), retardation plates, EMI (electromagnetic wave) shield films, antiglare films, antireflection films and the like. It can be used as an adhesive product for re-peeling to protect the film. It can also be used as a protective film for the surface of other plastics and metal plates.

Claims

請求の範囲 The scope of the claims
[1] ガラス転移温度 (Tg)が 0°C以上の高 Tgポリマー (A)と、この高 Tgポリマーよりも低 [1] High Tg polymer (A) with glass transition temperature (Tg) above 0 ° C and lower than this high Tg polymer
V、Tgを有し、感圧接着性を示す低 Tgポリマー(B)および溶剤を含む溶剤型再剥離 用粘着剤組成物であって、 A solvent-type re-peeling pressure-sensitive adhesive composition comprising a low Tg polymer (B) having V and Tg and exhibiting pressure-sensitive adhesion, and a solvent,
上記粘着剤組成物から得られる粘着剤層にお!/、て、高 Tgポリマー (A)と低 Tgポリ マー(B)とが相溶することなぐ高 Tgポリマー (A)が島、低 Tgポリマー(B)が海である 海島構造を形成していることを特徴とする溶剤型再剥離用粘着剤組成物。  In the pressure-sensitive adhesive layer obtained from the above pressure-sensitive adhesive composition, the high Tg polymer (A) and the low Tg polymer (A) are compatible with the high Tg polymer (A) and the low Tg polymer (B). A solvent-type re-peeling pressure-sensitive adhesive composition, wherein the polymer (B) forms a sea-island structure in which the sea is formed.
[2] 上記高 Tgポリマー(A)の Tgが 0°C以上 80°C未満、低 Tgポリマー(B)の Tgが 0°C 未満である請求項 1に記載の溶剤型再剥離用粘着剤組成物。 [2] The solvent-based re-peeling adhesive according to claim 1, wherein the high Tg polymer (A) has a Tg of 0 ° C or higher and lower than 80 ° C, and the low Tg polymer (B) has a Tg of lower than 0 ° C. Composition.
[3] 上記高 Tgポリマーが、酢酸ビュルまたはメチルアタリレートを 70質量%以上含む原 料モノマーから合成されたものである請求項 1または 2に記載の溶剤型再剥離用粘 着剤組成物。 [3] The solvent-based re-peeling adhesive composition according to claim 1 or 2, wherein the high Tg polymer is synthesized from a raw material monomer containing 70% by mass or more of butyl acetate or methyl acrylate.
[4] 上記粘着剤組成物は架橋剤が配合されて使用されるものであって、上記高 Tgポリ マー (A)および上記低 Tgポリマー(B)は!/、ずれも上記架橋剤と反応し得る官能基を 含有して!/、る請求項 1〜3の!/、ずれかに記載の溶剤型再剥離用粘着剤組成物。  [4] The pressure-sensitive adhesive composition is used by blending a cross-linking agent, and the high Tg polymer (A) and the low Tg polymer (B) are! /, Both of which react with the cross-linking agent. 4. The solvent-type re-peeling pressure-sensitive adhesive composition according to claim 1, which contains a functional group capable of!
[5] 上記高 Tgポリマー (A)と低 Tgポリマー(B)は、それぞれ、ヒドロキシル基含有 (メタ) アタリレートを原料モノマー 100質量0 /0中 0. ;!〜 10質量0 /0含む原料モノマー力、ら合 成されたものである請求項 1〜4のいずれかに記載の溶剤型再剥離用粘着剤組成物[5] The high Tg polymer (A) and the low Tg polymer (B), respectively, hydroxyl group-containing (meth) Atari rates starting monomer in 100 parts by mass 0/0 0.1;! ~ 10 weight 0/0 containing material The pressure-sensitive adhesive composition for solvent-based re-peeling according to any one of claims 1 to 4, which is synthesized from monomer power.
Yes
[6] 高 Tgポリマー (A)と上記低 Tgポリマー(B)との合計量を 100質量%としたときに、 高 Tgポリマー(A)が 4〜35質量%、低 Tgポリマー(B)が 65〜96質量%である請求 項 1〜5のいずれかに記載の溶剤型再剥離用粘着剤組成物。  [6] When the total amount of the high Tg polymer (A) and the low Tg polymer (B) is 100% by mass, the high Tg polymer (A) is 4 to 35% by mass and the low Tg polymer (B) is The solvent-based re-peeling pressure-sensitive adhesive composition according to any one of claims 1 to 5, wherein the pressure-sensitive adhesive composition is 65 to 96% by mass.
[7] 請求項;!〜 6の!/、ずれかに記載の溶剤型再剥離用粘着剤組成物から得られた粘 着剤層が支持基材の少なくとも片面に形成されていることを特徴とする再剥離用粘 着製品。 [7] The adhesive layer obtained from the solvent-type re-peeling pressure-sensitive adhesive composition according to any one of claims 6 to 6 of claim 6 is formed on at least one side of a supporting substrate. Re-peeling adhesive product.
[8] ヘイズが 3%以下である請求項 7に記載の再剥離用粘着製品。  [8] The adhesive product for re-peeling according to claim 7, wherein the haze is 3% or less.
[9] 厚み 20 a mの粘着剤層が厚み 38 μ mのポリエチレンテレフタレートフィルム基材 上に形成された粘着製品を用いてアクリル板に対する 180°粘着力を測定した場合 に、 0. 3m/分の低速剥離では 0· 05—0. 3N/25mm、 30m/分の高速剥離で は 0. 2〜3N/25mmであり、かつ高速剥離における粘着力を低速剥離における粘 着力で除した値が 15. 0以下である請求項 7または 8に記載の再剥離用粘着製品。 [9] When measuring 180 ° adhesive strength to an acrylic plate using an adhesive product with a 20 um thick adhesive layer formed on a 38 μm thick polyethylene terephthalate film substrate Furthermore, 0.35 / min for low-speed peeling is 0.55 / 0.3 mm, and 30 m / min for high-speed peeling is 0.2 to 3 N / 25 mm. The pressure-sensitive adhesive product for re-peeling according to claim 7 or 8, wherein a value divided by adhesion is 15.0 or less.
PCT/JP2007/068181 2006-09-21 2007-09-19 Solvent-type removable adhesive composition and removable adhesive product WO2008035709A1 (en)

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JP2006256312A JP5006608B2 (en) 2006-09-21 2006-09-21 Solvent-type re-peeling pressure-sensitive adhesive composition and re-peeling pressure-sensitive adhesive product
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Citations (4)

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JP2001011396A (en) * 1999-06-28 2001-01-16 Toagosei Co Ltd Application of sheet
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JP2005146151A (en) * 2003-11-17 2005-06-09 Soken Chem & Eng Co Ltd Pressure-sensitive adhesive for protection sheet
JP2006124691A (en) * 2004-09-30 2006-05-18 Nippon Shokubai Co Ltd Emulsion type pressure-sensitive adhesive composition

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JP2001011396A (en) * 1999-06-28 2001-01-16 Toagosei Co Ltd Application of sheet
JP2003277709A (en) * 2002-03-26 2003-10-02 Nippon Shokubai Co Ltd Adhesive composition and adhesive product
JP2005146151A (en) * 2003-11-17 2005-06-09 Soken Chem & Eng Co Ltd Pressure-sensitive adhesive for protection sheet
JP2006124691A (en) * 2004-09-30 2006-05-18 Nippon Shokubai Co Ltd Emulsion type pressure-sensitive adhesive composition

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