WO2008033779A3 - Polarization imaging - Google Patents

Polarization imaging Download PDF

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Publication number
WO2008033779A3
WO2008033779A3 PCT/US2007/078063 US2007078063W WO2008033779A3 WO 2008033779 A3 WO2008033779 A3 WO 2008033779A3 US 2007078063 W US2007078063 W US 2007078063W WO 2008033779 A3 WO2008033779 A3 WO 2008033779A3
Authority
WO
WIPO (PCT)
Prior art keywords
defects
polarization imaging
polarization
defocus
pits
Prior art date
Application number
PCT/US2007/078063
Other languages
French (fr)
Other versions
WO2008033779A2 (en
Inventor
Gang Sun
Original Assignee
Rudolph Technologies Inc
Gang Sun
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rudolph Technologies Inc, Gang Sun filed Critical Rudolph Technologies Inc
Priority to JP2009528415A priority Critical patent/JP2010503862A/en
Publication of WO2008033779A2 publication Critical patent/WO2008033779A2/en
Publication of WO2008033779A3 publication Critical patent/WO2008033779A3/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/93—Detection standards; Calibrating baseline adjustment, drift correction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method

Abstract

A system and method for inspection of a substrate for various defects is herein disclosed. Polarizing filters (12) are used to improve the contrast of polarization dependent defects such as defocus and exposure defects, while retaining the same sensitivity to polarization independent defects, such as pits, voids, cracks, chips and particles.
PCT/US2007/078063 2006-09-12 2007-09-10 Polarization imaging WO2008033779A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009528415A JP2010503862A (en) 2006-09-12 2007-09-10 Polarization imaging

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US84429706P 2006-09-12 2006-09-12
US60/844,297 2006-09-12

Publications (2)

Publication Number Publication Date
WO2008033779A2 WO2008033779A2 (en) 2008-03-20
WO2008033779A3 true WO2008033779A3 (en) 2008-12-04

Family

ID=39184486

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/078063 WO2008033779A2 (en) 2006-09-12 2007-09-10 Polarization imaging

Country Status (4)

Country Link
JP (1) JP2010503862A (en)
KR (1) KR20090060435A (en)
TW (1) TW200839916A (en)
WO (1) WO2008033779A2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102422149B (en) * 2009-05-29 2014-03-19 洛塞夫科技股份有限公司 Polycrystalline wafer inspection method
KR101955466B1 (en) * 2010-10-26 2019-03-12 삼성디스플레이 주식회사 Device and method for inspecting sealing state
US9885671B2 (en) 2014-06-09 2018-02-06 Kla-Tencor Corporation Miniaturized imaging apparatus for wafer edge
US9645097B2 (en) 2014-06-20 2017-05-09 Kla-Tencor Corporation In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning
CN107884414B (en) * 2017-11-03 2019-12-27 电子科技大学 System and method for detecting surface defects of mirror surface object by eliminating influence of dust
CN109387489B (en) * 2018-11-21 2023-10-10 塔里木大学 Method and device for measuring optical parameters of red date tissue by polarized scattering
CN112748126A (en) * 2019-10-31 2021-05-04 芯恩（青岛）集成电路有限公司 Wafer detection system and detection method

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2947212A (en) * 1956-04-30 1960-08-02 American Brass Co Method of detecting surface conditions of sheet metal
US3904293A (en) * 1973-12-06 1975-09-09 Sherman Gee Optical method for surface texture measurement
US4469442A (en) * 1982-01-11 1984-09-04 Japan Crown Cork Co., Ltd. Detecting irregularities in a coating on a substrate
US4806776A (en) * 1980-03-10 1989-02-21 Kley Victor B Electrical illumination and detecting apparatus
US5648850A (en) * 1994-09-27 1997-07-15 Basler Gmbh Method and device for quality control of objects with polarized light

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4901090B2 (en) * 2004-10-06 2012-03-21 株式会社ニコン Defect inspection method and defect detection apparatus
JP2008507702A (en) * 2004-07-23 2008-03-13 ネクステック ソリューションズ， インコーポレイテッド Large substrate flat panel inspection system

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2947212A (en) * 1956-04-30 1960-08-02 American Brass Co Method of detecting surface conditions of sheet metal
US3904293A (en) * 1973-12-06 1975-09-09 Sherman Gee Optical method for surface texture measurement
US4806776A (en) * 1980-03-10 1989-02-21 Kley Victor B Electrical illumination and detecting apparatus
US4469442A (en) * 1982-01-11 1984-09-04 Japan Crown Cork Co., Ltd. Detecting irregularities in a coating on a substrate
US5648850A (en) * 1994-09-27 1997-07-15 Basler Gmbh Method and device for quality control of objects with polarized light

Also Published As

Publication number Publication date
TW200839916A (en) 2008-10-01
JP2010503862A (en) 2010-02-04
WO2008033779A2 (en) 2008-03-20
KR20090060435A (en) 2009-06-12

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