WO2008026465A1 - Photosensitive lithographic printing plate material - Google Patents

Photosensitive lithographic printing plate material Download PDF

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Publication number
WO2008026465A1
WO2008026465A1 PCT/JP2007/066103 JP2007066103W WO2008026465A1 WO 2008026465 A1 WO2008026465 A1 WO 2008026465A1 JP 2007066103 W JP2007066103 W JP 2007066103W WO 2008026465 A1 WO2008026465 A1 WO 2008026465A1
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Prior art keywords
acid
printing plate
lithographic printing
plate material
group
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PCT/JP2007/066103
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French (fr)
Japanese (ja)
Inventor
Kunio Tani
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Konica Minolta Medical & Graphic, Inc.
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Publication of WO2008026465A1 publication Critical patent/WO2008026465A1/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Definitions

  • the present invention relates to a photosensitive lithographic printing plate used in a so-called computer “to-plate” (hereinafter referred to as “CTP” ⁇ ”) system.
  • CTP computer “to-plate”
  • the present invention relates to a photosensitive lithographic printing plate material suitable for exposure with a 450 nm laser beam. Background art
  • a printing plate material having a negative photosensitive layer having an image recording layer containing a polymerizable compound on an aluminum support is provided. It is known to use.
  • a photosensitive lithographic printing plate for CTP that records digital data with a laser contains, for example, titanocene, a polymerization initiator described in JP-A-9-80750 and JP-A-10-101719, and a specific dye.
  • Those having a photopolymerizable photosensitive layer are known!
  • these photosensitive lithographic printing plates use a relatively long wavelength visible light source as a light source, it is necessary to carry out plate making work for making a printing plate under a safe light of a dark red light. There was a demand for being able to handle under a brighter yellow light than the bad (lighting room)
  • the present invention has been made in view of the above problems, and a problem to be solved is a lithographic printing plate material used in a plate making method in which a post-exposure heat treatment is carried out for plate making, and has high sensitivity and resistance
  • An object of the present invention is to provide a lithographic printing plate material with little fluctuation of halftone dot reproducibility over time from exposure to heat treatment while maintaining a printing press.
  • a photosensitive lithographic printing plate material having a photosensitive layer containing a polymerizable ethylenically unsaturated bond-containing compound, a polymerization initiator, a spectral sensitizer, and a polymer binder on a support.
  • the photosensitive lithographic printing plate material is characterized in that the photosensitive layer contains a monofunctional monomer having a dipole moment of 2.3 to 6.0 D as a polymerizable ethylenically unsaturated bond-containing compound. .
  • a lithographic printing plate material with little fluctuation in halftone dot reproducibility over time from exposure to heat treatment while maintaining high sensitivity and printing durability.
  • the photosensitive lithographic printing plate material of the present invention comprises a photosensitive layer containing a polymerizable ethylenically unsaturated bond-containing compound, a polymerization initiator, a spectral sensitizer, and a polymer binder on a support.
  • the photosensitive layer contains a monofunctional monomer having a dipole moment of 2.3 to 6.0 D as a polymerizable ethylenically unsaturated bond-containing compound.
  • the polymerizable ethylenically unsaturated bond-containing compound is a compound that can be polymerized by a reaction with a product resulting from a reaction of a polymerization initiator by image exposure, and is preferably a monomer (monomer). That is, dimers, trimers, etc., and oligomers can also be used.
  • a reaction with a radical species generated from the polymerization initiator according to the present invention is possible.
  • a trigger a wide range of compounds that can initiate the polymerization reaction can be used.
  • the photosensitive layer of the photosensitive lithographic printing plate material of the present invention contains a monofunctional monomer having a dipole moment of 2.3 to 6.
  • OD as a polymerizable ethylenically unsaturated bond-containing compound. It is necessary to do.
  • dipole moment is an electric dipole defined in various books and literatures represented by a dictionary of physics and chemistry (published by Iwanami Shoten, for example, page 751 of the 3rd edition supplement published in 1987).
  • the whole monofunctional monomer molecule is represented by a vector sum of each bond moment. Note that the dipole moment according to the present invention is the whole molecule. It is the sum of the absolute values of the field vector quantities.
  • the monofunctional monomer according to the present invention exerts the effects of the present invention by being in the above-mentioned dipole moment range because the radical activity is high and the reactivity is high in the above-mentioned range.
  • Examples of the monofunctional monomer according to the present invention include acrylamide derivatives, acrylonitrile derivatives, (meth) acrylic acid derivatives, and the like, and acrylamide derivatives are particularly preferable.
  • examples include til acrylamide, 2-hydroxyacrylamide, and dimethylaminopropyl acrylamide.
  • N-alkylacrylamides such as N-methylacrylamide, N-isopropyl attalinoleamide, N-tert-butylacrylamide and the like are particularly preferable.
  • the addition amount is preferably from 0.3 to 20 parts by mass of the solid content of the photosensitive layer, more preferably from 0.3 to 15 parts by mass.
  • the photosensitive layer according to the present invention is generally used for general radical polymerizable monomers and ultraviolet curable resins.
  • Polyfunctional monomers having a plurality of addition-polymerizable ethylenic double bonds in the molecule or polyfunctional oligomers can be used.
  • the compound is not limited, but in the present invention, it is also preferable to contain a polymerizable ethylenically unsaturated bond-containing compound having a photooxidizable group in the molecule as the polymerizable ethylenically unsaturated bond-containing compound. Good.
  • Examples of the photooxidizable group include a thio group, a thioether group, a ureido group, an amino group, and an ethanol group.
  • Specific examples of these groups include triethanolamine group, triphenylamine group, thiolide group, imidazolyl group, oxazolyl group, thiazolyl group, acetylethylacetonyl residue, N-phenyldaricin residue and ascorbic acid residue.
  • the ability to raise S Particularly preferred among these are secondary or tertiary amino groups.
  • a preferred embodiment of the present invention is a polymerizable ethylenically unsaturated bond-containing compound having an amide bond and a secondary or tertiary amino group in the molecule as the polymerizable ethylenically unsaturated bond-containing compound. It is to contain.
  • polyfunctional acrylate compounds having an amide bond and a tertiary amino group in the molecule are preferred.
  • the polymerizable ethylenically unsaturated bond-containing compound preferably used in the present invention has an amide bond, it is a tough and highly adhesive cured film due to the action of the dispersion force and intermolecular force of the amide bond. Can be formed.
  • the photo-oxidation action of the group can improve the crosslinking density at the time of curing, and a dense and strong cured film can be formed. .
  • Examples of the photooxidizable group having such an action include a thio group, a thioether group, a ureido group, an amino group, and an enol group.
  • Specific examples of these groups include triethanolamine group, triphenylamine group, thiolide group, imidazolyl group, oxazolyl group, thiazolyl group, acetylethylacetonyl residue, N-phenylglycine residue and Ascorbic acid residues can be mentioned. Of these, particularly preferred are secondary or tertiary amino groups.
  • a polymerizable ethylenically unsaturated bond-containing compound having an amide bond and a secondary or tertiary amino group in the molecule as a preferred embodiment will be described in detail.
  • the polymerizable ethylenically unsaturated bond-containing compound having an amide bond and a secondary or tertiary amino group in the molecule according to the present invention has a solubility in pure water at 25 ° C of 1% by mass. More power to dissolve S preferred. More preferably, it is 3 mass% or more, More preferably, it is 5 mass% or more, Most preferably, it is 10 mass% or more.
  • the compound having such characteristics includes (a) a polyhydric alcohol containing a secondary or tertiary amino group in the molecule, (b) a polyvalent isocyanate compound, and (c) a hydroxyl group in the molecule. It can be obtained as a reaction product of a compound containing an ethylenic double bond capable of addition polymerization.
  • the polyhydric alcohols containing secondary or tertiary amino groups in the molecule include triethanolamine, N-methylethanolamine, N-ethyljetanolamine, Nn-butyljetanolamine. , N-tert.-Butyljetanolamine, N, N Di (hydroxyethynole) aniline, N, N,, ', ⁇ , One-tetrahydroxy-2-hydroxypropylethylenediamine, ⁇ Toryljetanolamine, ⁇ , ⁇ , ⁇ ', ⁇ , 1-tetraethyl 2-hydroxyethylenethylenediamine, ⁇ , ⁇ -bis (2-hydroxypropinole) aniline, allyljetanolamine, 3 (dimethylamino) 1, 2 propanediol, 3 jetylamino 1, 2 Propanediol, ⁇ , ⁇ Di ( ⁇ -propyl) amino-2, 3 Propanediol, ⁇ , N Di (iso
  • Diisocyanate compounds include butane 1,4-diisocyanate, hexane 1,6-diisocyanate, 2 methinorepentane 1,5 diisocyanate, octane 1,8-diisocyanate, 1,3-diisocyanate methyl Norecyclohexanone, 2, 2, 4-trimethylenohexane 1,6-diisocyanate, isophorone diisocyanate, 1,2-phenolic diisocyanate, 1,3-phenylene diisocyanate, 1, 4-phenylene diisocyanate, tolylene 2,4 diisocyanate, tolylene 2,5 diisocyanate, tolylene-2,6-diisocyanate, 1,3-di (isocyanatomethyl) benzene, 1,3-bis (1 isocyanatototo 1-methylethyl ) Benzene and the like.
  • triisocyanates such as 4, ⁇ ', ⁇ "triphenylmethane triisocyanate, toluene 2,4,6-triisocyanate, 4,4'-dimethyldiphenylmethane 2 , 2 ', 5, 5' —tetraisocyanates such as tetraisocyanate, etc.
  • adducts of cyanate and polyol include trimethylolpropane adduct of hexamethylene diisocyanate, trimethylolpropane adduct of 2,4 tolylene diisocyanate, and trimethylolpropane of xylylene diisocyanate.
  • Isocyanate prepolymers such as adducts and hexanetriol adducts of tolylene diisocyanate can be used.
  • the polyvalent isocyanate compound is not limited to the above compounds, and several kinds of compounds may be used in combination as required.
  • the compound preferably used in the present invention is preferably dissolved in a solubility of 1% by mass or more in pure water at 25 ° C. More preferably, it is 3% by mass or more, further preferably 5% by mass or more, and particularly preferably 10% by mass or more. By using a compound having such characteristics, the object of the present application can be achieved.
  • amino group-free polyhydric alcohol examples include ethylene glycol, 1,2- or 1,3-propylene glycol, butylene glycol, diethylene glycolanol, triethylene glycolanol, tetraethylene glycolanol, diethylene glycol.
  • Propylene glycol examples include ethylene glycol, 1,2- or 1,3-propylene glycol, butylene glycol, diethylene glycolanol, triethylene glycolanol, tetraethylene glycolanol, diethylene glycol.
  • 1,3-- or 1,4-butanediol 1,5-pentanediol, 1,6-hexanediol, neopentyl glycol, 2-methylpentanediol, hydrogenated bisphenol mononole A, polyethylene glycolol, polypropylene glycol , Polybutylene glycol, polytetramethylene glycol, poly force prolatatone, trimethylol ethane, trimethylol pronone, polytrimethylone lepronone, pentaerythrinol, polypentaerystinole, sorbitole, mannitol, Polyhydric alcohols such as glycerin and polyglycerin such polyhydric alcohol and maleic anhydride, maleic acid, fumaric acid, itaconic anhydride, itaconic acid, adipic acid, phthalic acid, phthalic anhydride, terephthalic acid, isophthalic acid, etc.
  • examples of the polyhydric alcohol compound include 1,3 propanediol, 1,7 heptanediol, 1,8 octanediol, 2,3 dihydroxybutane, 1,2 dihydroxybutane, 1,3 dihydroxybutane, 2,2 dimethyl-1,3 propanediol, 2,4 pentanediol, 2,5-hexanediol, 3-methyl-1,5-pentanediol, 1,4-cyclohexanedimethanol, dihydroxycyclohexane, 1, 2, 6-trihydroxy hexane, phenylene ethylene glycol, 1, 1, 1 trimethylol propane, hexane triol, pentaerythritol, glycerin and other aliphatic polyhydric alcohols, 1, 4-di (2 hydroxy ethoxy) ) Aromatic polyhydric alcohols such as benzene and 1,3 bis (2 hydroxyethoxy) benzene and alkylene
  • Another particularly preferred embodiment in the present invention is to keep the mol ratio of the third component, a compound containing an ethylenic double bond capable of addition polymerization with a hydroxyl group in the molecule, low.
  • the content is preferably controlled to less than 40%, more preferably less than 30%, and particularly preferably less than 25%.
  • polymerizable ethylenically unsaturated bond-containing compounds can be used in combination with the present invention.
  • These polymerizable ethylenically unsaturated bond-containing compounds are not particularly limited, and examples thereof include 2-ethyl hexyl acrylate, 2-hydroxypropyl acrylate, glycerol phenoxy cetyl acrylate, tetrahydrofurfuryl chloride.
  • Shetyl Atarilate, Tetrahi Monofunctional acrylates such as drofurfuroxyhexanolid tallylate, ⁇ -force of 1,3-dioxane alcohol, atalylate of prolatatone adduct, 1,3-dioxolan acrylate
  • Polyfunctional acrylic acid esters such as methylolpropane tritalylate, or these acrylates may be metatalylated, itaconate, crotonate, Examples thereof include metataric acid, itaconic acid, crotonic acid, maleic acid ester and the like in place of maleate.
  • prepolymers may be used alone or in combination of two or more, and may be used in combination with the above-mentioned monomers and / or oligomers! /.
  • Examples of the prepolymer include adipic acid, trimellitic acid, maleic acid, phthalic acid, terephthalic acid, hymic acid, malonic acid, succinic acid, dartaric acid, itaconic acid, pyromellitic acid, fumaric acid, and glutaric acid.
  • Pimelic acid, sebacic acid, dodecanoic acid, tetrahydrophthalic acid, and other polybasic acids ethylene glycol, propylene alcohol, diethylene glycol, propylene oxide, 1,4 butanediole, triethyleneglycolanol, tetraethyleneglycolanol, polyethyleneglycol (Meth) acrylic acid is introduced into a polyester obtained by the combination of polyhydric alcohols such as glycerin, trimethylololepropane, pentaerythritol, sonorebitol, 1,6 hexanediol, 1,2,6 hexanetriol, etc.
  • polyhydric alcohols such as glycerin, trimethylololepropane, pentaerythritol, sonorebitol, 1,6 hexanediol, 1,2,6 hexanetriol, etc.
  • Polyester atalylates for example, bisphenolanol ⁇ -epoxychlorohydrin '(meth) acrylic acid, phenol nopolak' epichrohydrin.
  • (Meth) acrylic acid such as (meth) acrylic acid to epoxy resin Introduced epoxy acrylates; for example, ethylene glycol 'adipic acid' tolylene diisocyanate ⁇ 2-hydroxyethyl acrylate, polyethylene glycol metatalylate.
  • the polymerizable ethylenically unsaturated bond-containing compound according to the present invention includes phosphazene monomer, triethylene glycol, isocyanuric acid EO (ethylene oxide) -modified diatalylate, isocyanuric acid EO-modified tritalylate, dimethylol trimethylate.
  • Cyclodeca Diatalylate, trimethylolpropane acrylic acid benzoate, alkylene diol type acrylic acid modified monomers such as urethane modified acrylate, and addition polymerizable oligomers and prepolymers having structural units formed from such monomers Can be mentioned.
  • JP-A 58-212994, 61-6649, 62-46688, 62-48589, 62-173295, 62-187092 The compounds described in JP-A-63-367189, JP-A-1-244891, etc., and the compounds described in “Chemical Products of 11290”, Chemical Industry Daily, p. 286 to p.294.
  • the compounds described in “UV'EB Curing Handbook (Raw Materials)”, Kobunshi Kankokai, p. 1;! -65 can also be used in the present invention.
  • the content of the polymerizable ethylenically unsaturated bond-containing compound according to the present invention in the photosensitive layer is preferably in the range of 1.0 to 80.0 mass% with respect to the solid content of the photosensitive layer.
  • Guyori preferred properly is in the range of 3. 0-70. 0 wt 0/0.
  • the photosensitive layer is required to contain a polymerization initiator.
  • the polymerization initiator is a compound capable of initiating polymerization of a polymerizable ethylenically unsaturated bond-containing compound upon image exposure.
  • Alkyl triaryl phosphate compounds are preferably used. Of these, biimidazole compounds and iron arene complexes are preferably used.
  • the biimidazole compound is a derivative of biimidazole, and examples thereof include compounds described in JP-A-2003-295426.
  • a hexaarylbiimidazole (a dimer of triarylimidazole) compound can be preferably used as the biimidazole compound.
  • Biimidazonole 2, 2 '— Diol o Torinore 1, 5, 5, A', 5 '— Tetraphenylenobiimidazole, 2, 2' — Bis (2 ethoxyphenyl) 4, 5, A ', 5'-tetraphenylbiimidazole and 2,2'-bis (2,6 difluorophenyl) 4, 5, A ', 5'-tetraphenylbiimidazole.
  • These compounds are available as commercial products. it can.
  • the content of the biimidazole compound is preferably 0.05% by mass to 20.0% by mass with respect to the solid content of the photosensitive layer. 1.0% by mass to 10.0% by mass is particularly preferable. preferable.
  • the ratio of the content of the dye represented by the general formula (1) and the biimidazole compound is preferably 0.0;! -20, and particularly preferably 0.1- 10 is preferred.
  • polymerization initiator in addition to the biimidazole compound, another polymerization initiator may be used in combination.
  • Examples of these polymerization initiators include titanocene compounds, monoalkyltriaryl phosphate compounds, iron arene complex compounds, polyhalogen compounds, and the like.
  • titanocene compound examples include compounds described in JP-A-63-41483 and JP-A-2-291. More preferable specific examples include bis (cyclopentagenyl) Ti dimonochloride. Bis (cyclopentadienyl) Ti bis monophenyl, bis (cyclopentaenyl) ti Ti bis 1, 3, 4, 5, 6 pentafluorophenyl, bis (cyclopentaenyl) ti Ti bis 1, 3, 5, 6 Tetrafluorophenyl, bis (cyclopenta Genyl) 1 Ti bis 1, 2, 4, 6 trifluorophenyl, bis (cyclopentaenyl) — Ti bis 1, 2, 6 difluorophenyl, bis (cyclopentadienyl) 1 Ti bis 1, 2, 4-difluorophenyl Bis (methylcyclopentagenyl) Ti-bis 2,3,4,5,6 pentafluorophenyl, bis (methylcyclopentadenyl) one Ti bis-1,2,5,5,6-
  • Examples of the monoalkyl triaryl porate compound include JP-A-62-150242 and JP-A-62.
  • the compounds described in No. 143044 and the like include tetral n butylammonium ⁇ butyl-trinaphthalene 1-rubolate, tetra ⁇ butylammonium ⁇ butyl-triphenyl rubrate, tetra ⁇ Butinoleammonium ⁇ butyltolylate (4-tert-butylphenyl) -borate, tetra-n-butylammonium ⁇ -hexylate (3-chloro-4-methylphenyl) -borate, tetra- ⁇ butylammonium ⁇ -hexoxyrootry (3-fluorophenyl) ) -Borate and the like.
  • Examples of the iron arene complex include compounds described in JP-A-59-219307. More preferred specific examples include ⁇ benzene mono (7) -cyclopentagenenyl) iron hexafluorophosphate 7] -cumene mono (7) -cyclopentageninole) iron hexafluorophosphate, 7] -fluorene mono (7) -cyclopentageninole) iron hexafluorophosphate, J] naphthalene mono (7)- Cyclopentagenino) iron hexanoleophosphate phosphate, ⁇ ] -xylene mono ( ⁇ -cyclopentageninole) iron hexanoleophosphate, ⁇ benzene mono (7) -cyclopentagenenyl) iron tetrafluorobo Rate and the like.
  • polyhalogen compound a compound having a trihalogenmethyl group, a dihalogenmethyl group or a dihalogenmethylene group is preferably used, and particularly represented by the following general formula (1). And rosogen compounds and compounds in which the above group is substituted on the oxadiazole ring are preferably used.
  • halogen compounds represented by the following general formula (2) are particularly preferably used.
  • R 1 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an acyl group, an alkenylsulfonyl group, an arylsulfonyl group, an iminosulfonyl group, or a cyan group.
  • R 2 represents a monovalent substituent.
  • R 1 and R 2 may combine to form a ring.
  • Y represents a halogen atom.
  • R 3 represents a monovalent substituent.
  • X represents O NR 4.
  • R 4 represents a hydrogen atom or an alkyl group. Even if R 3 and R 4 combine to form a ring, there is no force.
  • Y represents a halogen atom. Of these, those having a polyhalogenacetylamide group are particularly preferred.
  • any polymerization initiator can be used in combination.
  • carbonyl compounds, organic sulfur compounds, persulfides, redox compounds, azo and diazo compounds, halogens as described in Chapter 5 of “Light Sensitive Systems” by J. Kosar. Examples thereof include compounds and photoreducible dyes. More specific compounds are disclosed in British Patent 1,459,563.
  • a polymerization initiator that can be used in combination, the following can be used.
  • Benzoin derivatives such as benzoin methyl ether, benzoin i-propyl ether, ⁇ , ⁇ -dimethoxy-a-phenylacetophenone; benzophenone, 2,4 dichlorobenzophenone, o methyl benzoylbenzoate, 4, ⁇ ' Benzophenone derivatives such as bis (dimethylamino) benzophenone; 2-thiaxanthone derivatives such as 2-clothiaxanthone, 2-i-propylthixanthone; 2-clothalanthraquinones, 2-methylanthraquinones Anthraquinone derivatives such as N-methyl attaridone, N-butyl attaridone etc.
  • Ataridon derivatives such as ⁇ , a-diethoxyacetophenone, benzyl, fluorenone, xanthone, ura ninolei compound, and Japanese special day Triazine derivatives described in 59-1281, 61-9621 and JP-A-60-60104; organic peroxides described in JP-A-59-1504 and 61-243807; , 44-6413, 44-6413, 47-1604 and US Patent 3,567,453; US Patents 2,848,328, 2,852,379 And organic azide compounds described in JP 2,940,853; o-quinonediazides described in JP-B-36-22062b, 37-13109, 38-18015 and 45-9610; Special Japanese Day Call 55-39162, Japanese Patent Laid-Open No.
  • transition metal complexes containing a transition metal such as ruthenium described in JP-A-2-182701; 2,4,5-triarylimidazole dimer described in JP-A-3-209477; carbon tetrafluoride, JP Organic halogen compounds described in Sho 59-107344, etc.
  • the content (total amount) of the polymerization initiator is preferably 0.05% by mass to 20.0% by mass with respect to the solid content of the photosensitive layer. 1.0% by mass to 10.0% by mass Is particularly preferred.
  • the photosensitive layer according to the present invention preferably contains at least a spectral sensitizer having an absorption maximum wavelength of 350 to 450 nm as a spectral sensitizer! /.
  • Enylmethane, triphenylamine, coumarin derivatives, quinacridone, indigo, styryl, pyrylium compounds examples include lomethene compounds, pyrazolotriazole compounds, benzothiazole compounds, barbituric acid derivatives, thiobarbituric acid derivatives, and ketoalcohol borate complexes.
  • Examples of the above-mentioned coumarin derivatives include the coumarin derivatives B-1 to B-22 in JP-A-8-129258, the D-1 force of JP2003-21901, and the coumarins of D-32.
  • Inductives one force of JP 2002-363206 Koyuki, et al. 21 Coumadin derivatives, one force of JP 2002-363 207 Koyuki, et al. 40 coumarin derivatives, one force of JP 2002-363208 Koyuki, et al. 34 coumarin derivatives, 1 to 56 coumarin derivatives of JP-A-2002-363209 and the like can be mentioned, and these can be preferably used.
  • Other preferable dyes that can be used include, for example, JP-A 2000-98605, JP-A 2000-147763, JP-A 2000-206690, JP-A 2000-258910, and JP-A 2000-309724. And spectral sensitizers described in JP-A No. 2001-042524, JP-A No. 2002-202598, JP-A No. 2000-22 1790, and the like.
  • the polymer binder according to the present invention can carry the components contained in the photosensitive layer on a support.
  • the polymer binder include acrylic polymers, polybutylpropylene resins, polyurethane resins, Polyamide resin, polyester resin, epoxy resin, phenol resin, polycarbonate resin, polybutyl butyral resin, polybulal formal resin, shellac, and other natural resins can be used. Also, using two or more of these in combination does not help.
  • the copolymer composition of the polymer binder is preferably a copolymer of (a) a carboxylene group-containing monomer, (b) a methacrylic acid alkyl ester, or an acrylic acid alkyl ester.
  • a monomer having an aminosulfonyl group for example, m- (or p-) aminosulfonylphenyl metatalylate, m- (or p-) aminosulfuryl phenyl acrylate, N- (p- aminosulfuryl) Phenyl) methacrylamide, N- (p-aminosulfurphenyl) atalinoleamide and the like.
  • Acrylamide or methacrylamides such as acrylamide, methacrylamide, N-ethyl acrylamide, N-hexyl acrylamide, N cyclohexyl acrylamide, N-phenyl acrylamide, N- (4-nitrophenyl) acrylamide, N-ethyl N-phenyl acrylamide, N- (4-hydroxyphenyl) acrylamide, N- (4-hydroxyphenyl) methacrylolamide and the like.
  • Butyl ethers for example, ethyl butyl ether, 2 chloroethyl vinyl ethereole, propinorevininoreethenore, butinorevininoreethenore, otachinolevininoreethenore
  • Styrenes such as styrene, methylstyrene, chloromethylstyrene and the like.
  • the polymer binder is preferably a bull polymer having a carboxyl group and a polymerizable double bond in the side chain.
  • a bull polymer having a carboxyl group and a polymerizable double bond in the side chain For example, an unsaturated bond-containing bulle copolymer obtained by addition-reacting a compound having a (meth) atalyloyl group and an epoxy group in a molecule to a carboxyl group present in the bulle copolymer molecule.
  • Polymers are also preferred as high molecular binders.
  • Specific examples of compounds containing both an unsaturated bond and an epoxy group in the molecule include glycidyl acrylate, glycidyl methacrylate, and epoxy group-containing unsaturated compounds described in JP-A-11-271969. Compounds and the like. There is also an unsaturated bond-containing bulle copolymer obtained by addition-reacting a compound having a (meth) attalyloyl group and an isocyanate group in the molecule to the hydroxyl group present in the bulle polymer. Preferred as a polymer binder.
  • Compounds having both an unsaturated bond and an isocyanate group in the molecule include burisocyanate, (meth) acrylic isocyanate, 2— (meth) atariloy noroxechinoreisocyanate, m—or p —Isopropeninole ⁇ , ⁇ ′ — Dimethinole benzyl isocyanate is preferred (meth) acrylic isocyanate, 2- (meth) atariloy noroxetyl isocyanate, and the like.
  • the bull polymer having a carboxyl group and a polymerizable double bond in the side chain is preferably 50 to 100% by mass, more preferably 100% by mass in the total high molecular binder. .
  • the range of 5 to 70% by mass is more preferred.
  • the use in the range of 20 to 50% by mass is particularly preferred from the viewpoint of sensitivity.
  • the photosensitive layer according to the present invention in addition to the above-described components, in order to prevent unnecessary polymerization of an ethylenic double bond monomer that can be polymerized during the production or storage of the photosensitive lithographic printing plate material, It is desirable to add a polymerization inhibitor!
  • Suitable polymerization inhibitors include hydroquinone, ⁇ methoxyphenol, di-tert-butylene. p Crezo monore, pyrogalonore, t-butinore force Teconole, benzoquinone, 4, 4'-thiobis (3 methyl-6-t butylphenol), 2, 2'-methylenebis (4-methyl-6-t butylphenol), N nitrosophenyl hydroxyl Amine primary cerium salt, 2-t-butynole 6- (3-t-butyl-2-hydroxy-5-methylbenzyl) -4-methylphenyl acrylate.
  • the addition amount of the polymerization inhibitor is preferably about 0.01% to about 5% with respect to the total solid content of the photosensitive layer. If necessary, higher fatty acid derivatives such as behenic acid and behenic acid amide may be added to prevent polymerization inhibition by oxygen, or it may be unevenly distributed on the surface of the photosensitive layer during the drying process after coating. Also good. The amount of the higher fatty acid derivative added is preferably from about 0.5% to about 10% of the total composition.
  • a colorant can also be used, and as the colorant, conventionally known ones including commercially available ones can be suitably used. For example, those described in the revised new edition “Handbook of Pigments”, edited by the Japan Pigment Technology Association (Seibundo Shinkosha), Color Index Handbook, etc.
  • pigments include black pigments, yellow pigments, red pigments, brown pigments, purple pigments, blue pigments, green pigments, fluorescent pigments, and metal powder pigments.
  • specific examples include inorganic pigments (titanium dioxide, carbon black, graphite, zinc oxide, Prussian blue, sulfidizing power domum, iron oxide, and lead, zinc, normic and calcium chromates) and organic pigments ( And azo dyes, thioindigo, anthraquinone, anthanthrone, and triphendioxazine pigments, vat dye pigments, phthalocyanine pigments and derivatives thereof, and quinatalidone pigments.
  • the reflection / absorption of the pigment using an integrating sphere is 0.05 or less.
  • the addition amount of the pigment is preferably from 0.2 to 10% by mass, more preferably from 0.2 to 5% by mass based on the solid content of the composition.
  • a violet pigment or a blue pigment include, for example, cobalt blue, cenoleol bunolei, alkali blue rake, fonatone blue 6g, victoria blue Metal, phthalocyanine blue, phthalocyanine blue first sky blue, indanthrene bunoley, indico, dioxane violet, isoviolanthrone violet, indanthrone blue, indanthrone BC it can. Of these, phthalocyanine blue and dioxane violet are more preferable.
  • the photosensitive layer can contain a surfactant as a coating property improving agent as long as the performance of the present invention is not impaired.
  • a surfactant as a coating property improving agent as long as the performance of the present invention is not impaired.
  • fluorine-based surfactants are preferred.
  • additives such as plasticizers such as dioctyl phthalate, dimethyl phthalate, and tricresyl phosphate may be added. These addition amounts are preferably 10% or less of the total solid content.
  • the solvent used in preparing the photosensitive layer coating solution of the photosensitive layer according to the present invention includes, for example, alcohol: polyhydric alcohol derivatives such as sec-butanol, isobutanol, n-hexanol.
  • the photosensitive layer according to the present invention is constituted by coating on a support using the photosensitive layer.
  • photosensitive layer according to the present invention as the amount per on the support, 0. lg / m 2 ⁇ ; 10g / m 2 is preferred lay especially 0. 5g / m 2 ⁇ 5g / m 2 is preferred.
  • a protective layer can be provided on the upper side of the photosensitive layer according to the present invention, if necessary.
  • the protective layer preferably has high solubility in a developer solution (generally an alkaline aqueous solution) to be described later.
  • a developer solution generally an alkaline aqueous solution
  • polybutyl alcohol and polybutylpyrrolidone are mentioned. S can.
  • Polybulol alcohol has the effect of suppressing the permeation of oxygen
  • polybulurpyrrolidone has the effect of ensuring adhesion with the adjacent photosensitive layer.
  • polysaccharides polyethylene glycol, Gelatin, glue, casein, hydroxyethinoresenololose, strong noreoxymethinoresenololose, methylcellulose, hydroxyethyl starch, gum arabic, sucrose octacetate, ammonium alginate, sodium alginate, polybulamine, polyethyleneoxide
  • water-soluble polymers such as polystyrene sulfonic acid, polyacrylic acid, and water-soluble polyamide in combination.
  • the peel force between the photosensitive layer and the protective layer is preferably 3 ⁇ 45 mN / mm or more, more preferably 50 mN / mm or more. Is more than 75mN / mm.
  • Preferred examples of the protective layer composition include those described in Japanese Patent Application No. 8-161645 (Japanese Patent Laid-Open No. 10-010742).
  • the peeling force in the present invention is such that an adhesive tape having a predetermined width having a sufficiently large adhesive force is applied on the protective layer, and then peeled off with the protective layer at an angle of 90 degrees with respect to the plane of the photosensitive lithographic printing plate material. It can be obtained by measuring the force when doing.
  • the above protective layer composition is dissolved in a suitable solvent, applied onto the photosensitive layer and dried to form a protective layer.
  • the main component of the coating solvent is particularly preferably water or an alcohol such as methanol, ethanol or i-propanol.
  • the thickness is preferably 0 ⁇ ;! ⁇ 5 ⁇ 0 m, particularly preferably 0 ⁇ 5 ⁇
  • the support according to the present invention is a plate or film capable of carrying a photosensitive layer, and preferably has a hydrophilic surface on the side where the photosensitive layer is provided.
  • a metal plate such as aluminum, stainless steel, chromium or nickel, or a plastic film such as polyester film, polyethylene film or polypropylene film laminated or vapor-deposited with the above-mentioned metal thin film or the like.
  • a plastic film such as polyester film, polyethylene film or polypropylene film laminated or vapor-deposited with the above-mentioned metal thin film or the like.
  • a force S that can be used such as a polyester film, a chlorinated chloride film, a nylon film having a surface subjected to a hydrophilization treatment, and an aluminum support are preferably used.
  • an aluminum support pure aluminum or an aluminum alloy is used.
  • Various aluminum alloys can be used as the support, for example, silicon, copper, mangan, magnesium, chromium, zinc, lead, bismuth, nickel, titanium, sodium, iron, and other metals and aluminum. An alloy is used.
  • the aluminum support having a roughened surface is used for water retention.
  • a degreasing treatment in order to remove the rolling oil on the surface prior to roughening (graining treatment).
  • a degreasing treatment using a solvent such as tritalene or thinner an emulsion degreasing treatment using an emulsion such as kesilon or triethanol, or the like is used.
  • An alkaline aqueous solution such as caustic soda can also be used for the degreasing treatment.
  • an alkaline aqueous solution such as caustic soda is used for the degreasing treatment, dirt and oxide film that cannot be removed only by the above degreasing treatment can be removed.
  • the substrate is immersed in an acid such as phosphoric acid, nitric acid, sulfuric acid, chromic acid, or a mixed acid thereof. It is preferable to apply a desmut treatment.
  • the roughening method include a mechanical method and a method of etching by electrolysis.
  • the mechanical surface roughening method used is not particularly limited, but a brush polishing method and a Houng polishing method are preferable.
  • the electrochemical surface roughening method is not particularly limited, but a method of electrochemical surface roughening in an acidic electrolyte is preferable.
  • the surface is roughened by the electrochemical surface roughening method, it is preferably immersed in an aqueous solution of acid or alkali in order to remove aluminum scraps on the surface.
  • the acid include sulfuric acid, persulfuric acid, hydrofluoric acid, phosphoric acid, nitric acid, hydrochloric acid, and the like.
  • the base include sodium hydroxide, potassium hydroxide, and the like. Among these, it is preferable to use an alkaline aqueous solution.
  • the dissolution amount of aluminum in the plate surface 0. 5 ⁇ 5g / m 2 is preferred.
  • neutralization treatment is performed by immersion in an acid such as phosphoric acid, nitric acid, sulfuric acid, chromic acid or a mixed acid thereof.
  • the mechanical surface roughening method and the electrochemical surface roughening method may each be used alone for surface roughening, or the mechanical surface roughening method followed by the electrochemical surface roughening method. To roughen the surface May be.
  • an anodizing treatment can be performed.
  • the anodizing treatment method that can be used in the present invention, a known method without particular limitation can be used. By performing the anodizing treatment, an oxide film is formed on the support.
  • the anodized support may be sealed as necessary. These sealing treatments can be performed using known methods such as hot water treatment, boiling water treatment, steam treatment, sodium silicate treatment, dichromate aqueous solution treatment, nitrite treatment, and ammonium acetate treatment.
  • water-soluble resins such as polybuluphosphonic acid, polymers and copolymers having sulfonic acid groups in the side chain, polyacrylic acid, water-soluble metal salts (for example, Zinc borate) or a primer coated with a yellow dye, an amine salt or the like is also suitable.
  • the above photosensitive layer coating solution can be coated on a support by a conventionally known method and dried to prepare a photosensitive lithographic printing plate material.
  • Examples of the coating method of the coating liquid include air doctor coater method, blade coater method, wire bar method, knife coater method, dip coater method, reverse roll coater method, gravure coater method, cast coating method, curtain coater method and extrusion method. Examples include the coater method.
  • propylene glycol monomethinoreethenole cyclohexanone, methinoreethinoleketone, propyleneglycololemonomethyl ether acetate, etc.
  • propylene glycol monomethyl ether is preferred in the present invention.
  • the drying temperature of the photosensitive layer is preferably from 60 to 160 ° C, more preferably from 80 to 140 ° C, and particularly preferably from 90 to 120 ° C.
  • the light source for recording an image on the photosensitive lithographic printing plate material of the present invention has an emission wavelength of 370.
  • the use of ⁇ 440 nm laser light is preferred.
  • a light source for exposing the photosensitive lithographic printing plate of the present invention for example, a He-Cd laser (
  • Laser scanning methods include cylindrical outer surface scanning, cylindrical inner surface scanning, and planar scanning.
  • the cylindrical outer surface scanning one exposure of the laser is performed while rotating the drum around which the recording material is wound, the rotation of the drum is the main scanning, and the movement of the laser beam is the sub scanning.
  • cylindrical inner surface scanning a recording material is fixed to the inner surface of the drum, a laser beam is irradiated from the inside, and part or all of the optical system is rotated to perform main scanning in the circumferential direction. Alternatively, the whole is linearly moved parallel to the drum axis to perform sub-scanning in the axial direction.
  • Cylindrical outer surface scanning and circular cylinder inner surface scanning are suitable for high-density recording that facilitates increasing the accuracy of the optical system.
  • image exposure is performed with a plate surface energy (energy on the plate material) of 10 mj / cm 2 or more, and the upper limit is 500 mj / cm 2 . More preferably, it is 10 to 300 mj / cm 2 .
  • a laser power meter PDGDO-3W manufactured by OphirOptronics can be used.
  • the exposed portion of the photosensitive layer subjected to image exposure is cured. This is preferably developed with an alkaline developer to remove the unexposed areas and form an image.
  • a conventionally known alkaline aqueous solution can be used.
  • an alkaline developer using an inorganic alkali agent such as lithium can be used.
  • the alkaline developer can also be prepared from a developer concentrate such as granules and tablets.
  • the developer concentrate may be once evaporated into a developer and evaporated to dryness, but preferably the material is added by adding a small amount of water without adding water when mixing a plurality of materials.
  • a method of concentrating the mixture to obtain a concentrated state is preferable.
  • the developer concentrates are disclosed in JP-A-51-61837, JP-A-2-109042, JP-A-2-109043, JP-A-3-39735, JP-A-5-142786, JP-A-6-266062, — Granules and tablets can be obtained by a well-known method described in No. 13341 or the like.
  • the developer concentrate can also be divided into multiple parts with different material types and ratios! /.
  • An automatic image processor is preferably provided with a mechanism for automatically supplying a required amount of developer replenisher to the developing bath, and preferably a mechanism for discharging a developer exceeding a certain amount is preferably provided.
  • a mechanism for automatically replenishing a required amount of water to the developing bath is provided, and preferably a mechanism for detecting plate passing is provided.
  • the processing area of the plate is based on detection of plate passing.
  • a mechanism for controlling the replenishment amount and / or replenishment timing of the replenisher solution and / or water to be replenished preferably based on the detection of the printing plate and / or the estimation of the processing area is provided.
  • a mechanism for controlling the temperature of the developer is added, preferably a mechanism for detecting the pH and / or conductivity of the developer is provided, preferably the pH and / or of the developer. Or, a mechanism for controlling the amount and / or timing of the replenisher and / or water to be replenished based on the conductivity is provided! Further, it preferably has a function of once diluting and stirring the developer concentrate with water. If there is a washing step after the development step, use the washing water after use as dilution water for the concentrate of the development concentrate.
  • the automatic processor may have a pretreatment section for immersing the plate in the pretreatment liquid before the development step.
  • the pretreatment section is preferably provided with a mechanism for spraying the pretreatment liquid onto the plate surface, and preferably provided with a mechanism for controlling the temperature of the pretreatment liquid to an arbitrary temperature of 25 to 55 ° C.
  • a mechanism for rubbing the plate surface with a roller-like brush is provided. Water or the like is used as the pretreatment liquid.
  • the lithographic printing plate material developed with an alkaline developer is subjected to post-treatment with washing water, a rinsing solution containing a surfactant, a fischer or a protective gum solution mainly composed of gum arabic or starch derivatives. Is done.
  • These treatments can be used in various combinations, for example, development ⁇ washing ⁇ treatment of rinsing liquid containing surfactant and development ⁇ water washing ⁇ finisher with one liquid is preferable because the rinse liquid has less fatigue of the Fischer liquid. .
  • countercurrent multistage treatment using a rinse liquid or a finish liquid is also preferred.
  • These post-processing are generally performed using an automatic developing machine including a developing unit and a post-processing unit.
  • the post-treatment liquid a method of spraying from a spray nozzle or a method of immersing and conveying in a treatment tank filled with the treatment liquid is used.
  • a method is also known in which a certain amount of a small amount of washing water is supplied to the plate surface after development, and the waste solution is reused as dilution water for the developing solution stock solution.
  • each processing solution can be processed while being replenished with each replenisher according to the processing amount, operating time, and the like.
  • a so-called disposable treatment method in which treatment is performed with a substantially unused post-treatment liquid is also applicable.
  • Desmutted roughened aluminum plate was anodized in 15% sulfuric acid solution at 25 ° C, current density 10A / dm 2 , voltage 15V for 1 minute, and 1%
  • the support 1 was prepared by subjecting it to hydrophilic treatment with polyvinyl phosphonic acid at 75 ° C.
  • Photosensitive layer coating solution 1 having the following composition was coated on the above support 1 with a wire bar so as to be 1.7 g / m 2 when dried, dried at 80 ° C for 2 minutes, and then the following oxygen Apply the barrier layer coating solution 1 to 1.5 g / m 2 when dried with a wire bar and dry at 75 ° C for 1.5 minutes for lithographic printing plate
  • Iron arene complex Irgacure 261 (Ciba Specialty Chemicals)
  • Triazine compound (TAZ-107: Midori Chemical Co., Ltd.) 1. 5 parts
  • Phthalocyanine pigment (MHI454, made by Gokoku Color Co., Ltd.) 5/4 parts
  • a 100% solid image is output while changing the exposure energy of the laser.
  • the density of each energy of the developed image is measured with a densitometer [D196: manufactured by GRE TAG].
  • the amount of energy at which the saturated solid density X 0.9 was obtained was converted.
  • the developer temperature was changed in steps of 2 ° C, development processing was performed, and the developability of the non-image area was evaluated.
  • Printing conditions A lithographic printing plate produced by exposing an image of 175 lines with an appropriate exposure amount, heat-treating at 105 ° C, and developing at each temperature, using a printing machine (DAIYA1F-1 manufactured by Mitsubishi Heavy Industries, Ltd.) Printed using coated paper, printing ink (Dainippon Ink Chemical Co., Ltd., soybean oil ink “Naturalis 100") and dampening water (Tokyo ink H liquid SG-51 concentration 1.5%) Imprint 10 The non-image area and shadow after 00 sheets were visually evaluated and compared with a printed material having a development temperature of 28 ° C. as a reference, and judged as good or bad.
  • DAIYA1F-1 manufactured by Mitsubishi Heavy Industries, Ltd.
  • Coated paper (Recycled pulp content 20%, manufactured by Hokuetsu Paper Co., Ltd.)
  • Blanket SR100 (manufactured by SRI Hybrid)
  • each printing plate was exposed with 50% output at the appropriate exposure amount, preheated and developed after 1 hour, and processed immediately after exposure.
  • the halftone dot reproducibility was compared.
  • Halftone dot reproducibility was measured with CC DOT (X—Rite).
  • the lithographic printing plate material according to the present invention has a sensitivity, printing durability, developability, and latent image stability (the time-lapse network from exposure to heat treatment). (Variable resistance of point reproducibility)! /, Excellent! /, Power of S component.

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)

Abstract

A lithographic printing plate material that is suitable for exposure with laser beams of 350 to 450 nm emission wavelength and used in a printing plate production process through exposure, heat treatment and plate making, and that while maintaining high sensitivity and plate life, is less in the change of halftone dot reproduction over time from exposure to heat treatment. Accordingly, there is provided a photosensitive lithographic printing plate material including a photosensitive layer containing a polymerizable ethylenic unsaturated bond-containing compound, a polymerization initiator, a spectral sensitizer and a polymer binder, characterized in that the photosensitive layer contains a monofunctional monomer of 2.3 to 6.0 D dipole moment as the polymerizable ethylenic unsaturated bond-containing compound.

Description

明 細 書  Specification
感光性平版印刷版材料  Photosensitive lithographic printing plate material
技術分野  Technical field
[0001] 本発明は、いわゆるコンピューター 'トウ'プレート(computer— to— plate :以下に おいて、「CTP」<^いう。)システムに用いられる感光性平版印刷版に関し、特に、波 長 350〜450nmのレーザー光での露光に適した感光性平版印刷版材料に関する。 背景技術  [0001] The present invention relates to a photosensitive lithographic printing plate used in a so-called computer “to-plate” (hereinafter referred to as “CTP” <^ ”) system. The present invention relates to a photosensitive lithographic printing plate material suitable for exposure with a 450 nm laser beam. Background art
[0002] 近年、画像情報をコンピューターを用いて電子的に処理、蓄積、出力する、デジタ ル化技術が広く普及し、オフセット印刷用の印刷版の作製技術においては、デジタ ル化された画像情報に従って、指向性の高いレーザー光を走査し、直接感光性平 版印刷版に記録するいわゆる CTPシステムが開発され、実用化が進展している。  [0002] In recent years, digital technology for processing, storing, and outputting image information electronically using a computer has become widespread, and digital image information has been used in the preparation of printing plates for offset printing. Therefore, a so-called CTP system that scans highly directional laser light and records directly on a photosensitive lithographic printing plate has been developed and is in practical use.
[0003] これらのうち、比較的高い耐刷カを要求される印刷の分野においては、重合可能な 化合物を含む画像記録層を有するネガ型の感光層をアルミニウム支持体上に有する 印刷版材料を用いることが知られている。  Of these, in the field of printing that requires a relatively high printing durability, a printing plate material having a negative photosensitive layer having an image recording layer containing a polymerizable compound on an aluminum support is provided. It is known to use.
[0004] レーザーでデジタルデータを記録する CTP用感光性平版印刷版として、例えば、 特開平 9 80750号、特開平 10— 101719号に記載の重合開始剤であるチタノセ ンと特定の色素を含有する光重合系感光層を有するもの等が知られて!/、る。しかし、 これらの感光性平版印刷版は、光源として比較的長波長の可視光源を使用するため 印刷版作製のための製版作業を、暗い赤灯のセーフライト下で行う必要があり、作業 性が悪ぐより明るい黄色灯下で取り扱いが可能であること(明室化)の要求があった [0004] A photosensitive lithographic printing plate for CTP that records digital data with a laser contains, for example, titanocene, a polymerization initiator described in JP-A-9-80750 and JP-A-10-101719, and a specific dye. Those having a photopolymerizable photosensitive layer are known! However, since these photosensitive lithographic printing plates use a relatively long wavelength visible light source as a light source, it is necessary to carry out plate making work for making a printing plate under a safe light of a dark red light. There was a demand for being able to handle under a brighter yellow light than the bad (lighting room)
Yes
[0005] そして、高出力かつ小型の波長 390〜430nmの青紫色レーザーが容易に入手で きるようになり、このレーザー波長に適した感光性平版印刷版を開発することにより明 室化がはかられてきている。  [0005] And, a high-power and small-sized blue-violet laser with a wavelength of 390 to 430 nm can be easily obtained, and the development of a photosensitive lithographic printing plate suitable for this laser wavelength will make it possible to increase the light room. It has been.
[0006] 他方、重合可能な化合物を含む画像記録層を有するネガ型の感光層を有する印 刷版材料の製版方法としては、感度、耐刷力などを改善するため、画像露光後、加 熱処理を施し、その後現像処理する方法が知られている(特許文献 1及び 2参照。)。 [0007] しかしながら、露光後加熱処理を施して製版処理する方法にお!/、ては、高!/、耐刷 力を得る点では、好ましい製版方法ではある力 従来の平版印刷版材料では、感度 、耐刷力がまだ不十分な場合がある、露光した後、加熱処理を行うまでの経時での 網点再現性の変動が大きいなどの問題があった。 On the other hand, as a plate making method of a printing plate material having a negative photosensitive layer having an image recording layer containing a polymerizable compound, in order to improve sensitivity, printing durability, etc., heat treatment is performed after image exposure. Is known, and then development processing is known (see Patent Documents 1 and 2). [0007] However, in the method of performing the plate-making process by performing post-exposure heat treatment! /, It is high! /, A force that is a preferred plate-making method in terms of obtaining printing durability, in conventional lithographic printing plate materials, There were problems such as sensitivity and printing durability being still insufficient, and large fluctuations in halftone dot reproducibility over time from exposure to heat treatment.
特許文献 1:特開 2001 _ 175006号公報  Patent Document 1: Japanese Patent Laid-Open No. 2001_175006
特許文献 2:特表 2002— 537419号公報  Patent Document 2: Japanese Translation of Special Publication 2002-537419
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problems to be solved by the invention
[0008] 本発明は、上記問題に鑑みてなされたものであり、その解決課題は、露光後加熱 処理を施して製版処理する製版方法に用いられる平版印刷版材料であって、高い 感度、耐刷カを維持しつつ、露光した後、加熱処理を行うまでの経時での網点再現 性の変動が少ない平版印刷版材料を提供することである。 [0008] The present invention has been made in view of the above problems, and a problem to be solved is a lithographic printing plate material used in a plate making method in which a post-exposure heat treatment is carried out for plate making, and has high sensitivity and resistance An object of the present invention is to provide a lithographic printing plate material with little fluctuation of halftone dot reproducibility over time from exposure to heat treatment while maintaining a printing press.
課題を解決するための手段  Means for solving the problem
[0009] 本発明に係る上記課題は下記の手段によって解決される。 [0009] The above-mentioned problem according to the present invention is solved by the following means.
[0010] 1.支持体上に、重合可能なエチレン性不飽和結合含有化合物、重合開始剤、分 光増感剤、及び高分子結合剤を含有する感光層を有する感光性平版印刷版材料に おいて、該感光層が、重合可能なエチレン性不飽和結合含有化合物として、双極子 モーメントが 2· 3〜6· 0Dである単官能モノマーを含有することを特徴とする感光性 平版印刷版材料。  1. A photosensitive lithographic printing plate material having a photosensitive layer containing a polymerizable ethylenically unsaturated bond-containing compound, a polymerization initiator, a spectral sensitizer, and a polymer binder on a support. The photosensitive lithographic printing plate material is characterized in that the photosensitive layer contains a monofunctional monomer having a dipole moment of 2.3 to 6.0 D as a polymerizable ethylenically unsaturated bond-containing compound. .
[0011] 2.前記単官能モノマーがアクリルアミド誘導体であることを特徴とする前記 1に記載 の感光性平版印刷版材料。  [0011] 2. The photosensitive lithographic printing plate material as described in 1 above, wherein the monofunctional monomer is an acrylamide derivative.
[0012] 3.前記アクリルアミド誘導体が Ν—アルキルアクリルアミドであることを特徴とする前 記 2に記載の感光性平版印刷版材料。 [0012] 3. The photosensitive lithographic printing plate material as described in 2 above, wherein the acrylamide derivative is ア ル キ ル -alkylacrylamide.
[0013] 4.前記感光層が、重合可能なエチレン性不飽和結合含有化合物として、 1分子中 にアミド結合と 3級アミノ基を有する多官能アタリレートを含有することを特徴とする前 記 1〜3のいずれか一項に記載の感光性平版印刷版材料。 [0013] 4. The photosensitive layer described above, wherein the photosensitive layer contains, as a polymerizable ethylenically unsaturated bond-containing compound, a polyfunctional acrylate having an amide bond and a tertiary amino group in one molecule. The photosensitive lithographic printing plate material according to any one of -3.
発明の効果 [0014] 本発明の上記手段により、発光波長が 350〜450nmの範囲にあるレーザー光で の露光に適し、かつ露光後加熱処理を施して製版処理する製版方法に用いられる 平版印刷版材料であって、高い感度、耐刷カを維持しつつ、露光した後、加熱処理 を行うまでの経時での網点再現性の変動が少ない平版印刷版材料を提供することが できる。 The invention's effect [0014] A lithographic printing plate material suitable for exposure with a laser beam having an emission wavelength in the range of 350 to 450 nm by the above means of the present invention and used in a plate making method in which post-exposure heat treatment is performed. Thus, it is possible to provide a lithographic printing plate material with little fluctuation in halftone dot reproducibility over time from exposure to heat treatment while maintaining high sensitivity and printing durability.
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
[0015] 本発明の感光性平版印刷版材料は、支持体上に、重合可能なエチレン性不飽和 結合含有化合物、重合開始剤、分光増感剤、及び高分子結合剤を含有する感光層 を設けて成る感光性平版印刷版材料において、該感光層が、重合可能なエチレン 性不飽和結合含有化合物として、双極子モーメントが 2. 3〜6. 0Dである単官能モノ マーを含有することを特徴とする。これにより、高感度、高耐刷であり、露光後の安定 性に優れる感光性平版印刷版材料を提供することができる。  The photosensitive lithographic printing plate material of the present invention comprises a photosensitive layer containing a polymerizable ethylenically unsaturated bond-containing compound, a polymerization initiator, a spectral sensitizer, and a polymer binder on a support. In the photosensitive lithographic printing plate material provided, the photosensitive layer contains a monofunctional monomer having a dipole moment of 2.3 to 6.0 D as a polymerizable ethylenically unsaturated bond-containing compound. Features. Thereby, it is possible to provide a photosensitive lithographic printing plate material having high sensitivity and high printing durability and excellent stability after exposure.
[0016] 以下、本発明と構成要素等について詳細な説明をする。  [0016] Hereinafter, the present invention, components, and the like will be described in detail.
[0017] (重合可能なエチレン性不飽和結合含有化合物)  [0017] (Polymerizable ethylenically unsaturated bond-containing compound)
重合可能なエチレン性不飽和結合含有化合物とは、画像露光による重合開始剤 の反応による生成物との反応を契機として重合し得る化合物であり、モノマー(単量 体)が好ましい。すなわち、ダイマー、トリマーなど、また、オリゴマーも用いることがで き、本発明に係る重合可能なエチレン性不飽和結合含有化合物としては、本発明に 係る重合開始剤から生成するラジカル種等との反応を契機として重合反応が開始し 得る広範囲の化合物が使用できる。  The polymerizable ethylenically unsaturated bond-containing compound is a compound that can be polymerized by a reaction with a product resulting from a reaction of a polymerization initiator by image exposure, and is preferably a monomer (monomer). That is, dimers, trimers, etc., and oligomers can also be used. As the polymerizable ethylenically unsaturated bond-containing compound according to the present invention, a reaction with a radical species generated from the polymerization initiator according to the present invention is possible. As a trigger, a wide range of compounds that can initiate the polymerization reaction can be used.
[0018] 但し、本発明の感光性平版印刷版材料の感光層は、重合可能なエチレン性不飽 和結合含有化合物として、双極子モーメントが 2. 3〜6. ODである単官能モノマーを 含有することを要する。  [0018] However, the photosensitive layer of the photosensitive lithographic printing plate material of the present invention contains a monofunctional monomer having a dipole moment of 2.3 to 6. OD as a polymerizable ethylenically unsaturated bond-containing compound. It is necessary to do.
[0019] ここで、「単官能」とは、重合可能なエチレン性不飽和結合が一つであることをいう。  Here, “monofunctional” means that there is one polymerizable ethylenically unsaturated bond.
また、「双極子モーメント」とは、理化学辞典 (岩波書店発行、例えば、 1987年発行の 第 3版増補版の第 751頁)に代表される種々の書物や文献で定義されている電気双 極子モーメントを指し、本発明では、単官能モノマー分子全体として各々の結合モー メントのベクトル和で表される。なお、本発明に係る双極子モーメントとは、この分子全 体のベクトル量の絶対値の和である。 In addition, “dipole moment” is an electric dipole defined in various books and literatures represented by a dictionary of physics and chemistry (published by Iwanami Shoten, for example, page 751 of the 3rd edition supplement published in 1987). In the present invention, the whole monofunctional monomer molecule is represented by a vector sum of each bond moment. Note that the dipole moment according to the present invention is the whole molecule. It is the sum of the absolute values of the field vector quantities.
[0020] 双極子モーメントの求め方は、例えば市販の計算ソフトを利用して算出することが できる。本発明では富士通 Win MOPAC 3. 0を用いて算出した。本発明で使用 される重合可能なエチレン性不飽和結合含有化合物としては双極子モーメントが範 囲として 2. 3〜6. ODである単官能モノマーが好ましぐ 2. 5〜5. 5Dが更に好まし い。すなわち、本発明に係る単官能モノマーは、後述の例示の化合物などを挙げる ことができる力 これらを上記ソフトで計算し算出すると、双極子モーメントは上記範 囲となり、従って、当該範囲における単官能モノマーが本発明の目的を達成し発明 効果を奏する上で有用なものということができる。なお、上記計算における設定条件 による結果の誤差については、小数点第 2位以下を切り捨てることを考慮して、上記 の範囲であれば、本発明に係る単官能モノマーとして有用である。  [0020] The method of obtaining the dipole moment can be calculated using, for example, commercially available calculation software. In the present invention, calculation was performed using Fujitsu Win MOPAC 3.0. The polymerizable ethylenically unsaturated bond-containing compound used in the present invention is preferably a monofunctional monomer having a dipole moment in the range of 2.3 to 6. OD 2.5 to 5.5D is more preferable. I like it. That is, the monofunctional monomer according to the present invention can include the following exemplified compounds and the like. When these are calculated and calculated with the above software, the dipole moment falls within the above range, and therefore, the monofunctional monomer within the range. However, it can be said that it is useful in achieving the object of the present invention and producing the effects of the invention. Regarding the error of the result due to the setting condition in the above calculation, it is useful as the monofunctional monomer according to the present invention if it is within the above range in consideration of rounding off the second decimal place.
[0021] 本発明に係る単官能モノマーが上記の双極子モーメントの範囲にあることにより本 発明の効果を奏することは、上記範囲内がラジカルの活性が高ぐ反応性が高くなる ためと推定される。  [0021] It is presumed that the monofunctional monomer according to the present invention exerts the effects of the present invention by being in the above-mentioned dipole moment range because the radical activity is high and the reactivity is high in the above-mentioned range. The
〈単官能モノマー〉  <Monofunctional monomer>
本発明に係る単官能モノマーとしては、アクリルアミド誘導体、アクリロニトリル誘導 体、(メタ)アクリル酸誘導体などが挙げられ、なかでもアクリルアミド誘導体が好ましい 。例えば、アクリルアミド、メタクリノレアミド、 N—メチルアクリルアミド、ジメチルアクリル アミド、アタリロイルモルホリン、 N—イソプロピルアクリルアミド、 N— tert—ブチルァク リルアミド、 N—フエニルアクリルアミド、ダイアセトンアクリルアミド、アタリロイルビペリ ジン、ジェチルアクリルアミド、 2—ヒドロキシアクリルアミド、ジメチルァミノプロピルァク リルアミドなどが挙げられる。これらのうち、特に N—メチルアクリルアミド、 N—イソプロ ピルアタリノレアミド、 N— tert—ブチルアクリルアミド等の N—アルキルアクリルアミドで あることが好ましい。  Examples of the monofunctional monomer according to the present invention include acrylamide derivatives, acrylonitrile derivatives, (meth) acrylic acid derivatives, and the like, and acrylamide derivatives are particularly preferable. For example, acrylamide, methacrylolamide, N-methylacrylamide, dimethylacrylamide, alitaroylmorpholine, N-isopropylacrylamide, N-tert-butylacrylamide, N-phenylacrylamide, diacetone acrylamide, atalyloylbiperidine, gel Examples include til acrylamide, 2-hydroxyacrylamide, and dimethylaminopropyl acrylamide. Of these, N-alkylacrylamides such as N-methylacrylamide, N-isopropyl attalinoleamide, N-tert-butylacrylamide and the like are particularly preferable.
[0022] 添加量としては、感光層の固形分の 0. ;!〜 20質量部が好ましぐ 0. 3〜; 15質量部 が更に好ましい。  [0022] The addition amount is preferably from 0.3 to 20 parts by mass of the solid content of the photosensitive layer, more preferably from 0.3 to 15 parts by mass.
[0023] 本発明に係る感光層は、上記の重合可能なエチレン性不飽和結合合含有化合物 の他に、一般的なラジカル重合性のモノマー類、紫外線硬化樹脂に一般的に用いら れる分子内に付加重合可能なエチレン性二重結合を複数有する多官能モノマー類 や、多官能オリゴマー類を用いることができる。当該化合物に限定は無いが、本発明 においては、重合可能なエチレン性不飽和結合含有化合物として、分子中に光酸化 性基を有する重合可能なエチレン性不飽和結合含有化合物を含有することも好まし い。 [0023] In addition to the polymerizable ethylenically unsaturated bond-containing compound, the photosensitive layer according to the present invention is generally used for general radical polymerizable monomers and ultraviolet curable resins. Polyfunctional monomers having a plurality of addition-polymerizable ethylenic double bonds in the molecule or polyfunctional oligomers can be used. The compound is not limited, but in the present invention, it is also preferable to contain a polymerizable ethylenically unsaturated bond-containing compound having a photooxidizable group in the molecule as the polymerizable ethylenically unsaturated bond-containing compound. Good.
[0024] 光酸化性基としては、チォ基、チォエーテル基、ウレイド基、アミノ基、およびエノー ル基等を挙げることが出来る。それらの基の具体例としては、トリエタノールアミン基、 トリフエニルァミン基、チォウレイド基、イミダゾリル基、ォキサゾリル基、チアゾリル基、 ァセチルァセトニル残基、 N—フエニルダリシン残基およびァスコルビン酸残基を挙 げること力 Sできる。これらの中で特に好ましいものは、 2級又は 3級ァミノ基である。  [0024] Examples of the photooxidizable group include a thio group, a thioether group, a ureido group, an amino group, and an ethanol group. Specific examples of these groups include triethanolamine group, triphenylamine group, thiolide group, imidazolyl group, oxazolyl group, thiazolyl group, acetylethylacetonyl residue, N-phenyldaricin residue and ascorbic acid residue. The ability to raise S Particularly preferred among these are secondary or tertiary amino groups.
[0025] 本発明の好ましい一態様は、重合可能なエチレン性不飽和結合含有化合物として 、分子中にアミド結合と 2級または 3級ァミノ基とを有する重合可能なエチレン性不飽 和結合含有化合物を含有することである。特に、分子中にアミド結合と 3級ァミノ基と を有する多官能アタリレート化合物が好ましレ、。  A preferred embodiment of the present invention is a polymerizable ethylenically unsaturated bond-containing compound having an amide bond and a secondary or tertiary amino group in the molecule as the polymerizable ethylenically unsaturated bond-containing compound. It is to contain. In particular, polyfunctional acrylate compounds having an amide bond and a tertiary amino group in the molecule are preferred.
[0026] 本発明で好ましく用いられる重合可能なエチレン性不飽和結合含有化合物は、ァ ミド結合を有するため、アミド結合の分散力、分子間力の作用により、強靭で、接着力 の高い硬化膜を形成できる。また同時に 2級又は 3級アミノ基を有することにより、そ の基の光酸化作用により、硬化時の架橋密度向上させる事が可能となり、緻密で強 靭な硬化膜を形成させることが可能である。  [0026] Since the polymerizable ethylenically unsaturated bond-containing compound preferably used in the present invention has an amide bond, it is a tough and highly adhesive cured film due to the action of the dispersion force and intermolecular force of the amide bond. Can be formed. At the same time, by having a secondary or tertiary amino group, the photo-oxidation action of the group can improve the crosslinking density at the time of curing, and a dense and strong cured film can be formed. .
[0027] この様な作用を有する光酸化性基としては、チォ基、チォエーテル基、ウレイド基、 アミノ基、およびエノール基等を挙げることが出来る。それらの基の具体例としては、ト リエタノールアミン基、トリフエニルァミン基、チォウレイド基、イミダゾリル基、ォキサゾ リル基、チアゾリル基、ァセチルァセトニル残基、 N—フエニルグリシン残基およびァ スコルビン酸残基を挙げる事ができる。これらの中で特に好ましいものは、 2級又は 3 級ァミノ基である。  Examples of the photooxidizable group having such an action include a thio group, a thioether group, a ureido group, an amino group, and an enol group. Specific examples of these groups include triethanolamine group, triphenylamine group, thiolide group, imidazolyl group, oxazolyl group, thiazolyl group, acetylethylacetonyl residue, N-phenylglycine residue and Ascorbic acid residues can be mentioned. Of these, particularly preferred are secondary or tertiary amino groups.
[0028] 光酸化性基を含む化合物の具体例は、欧州特許出願公開第 287, 818号、同第 3 53, 389号および同第 364, 735号各明細書に記載されている。そこに記載されて いる化合物のなかで好ましいものは、第 3アミノ基又はウレイド基を有し、且つウレタン 基を有する化合物を挙げることができる。 [0028] Specific examples of the compound containing a photooxidizable group are described in European Patent Application Publication Nos. 287, 818, 353, 389 and 364, 735. Preferred among the compounds described therein are tertiary amino groups or ureido groups and urethanes. The compound which has group can be mentioned.
[0029] また、少なくとも 1つの光酸化性基と少なくとも 1つのウレタン基を有する化合物とし ては、特開昭 63— 260909号公報、特許 2669849号公報、特開平 6— 35189号公 報、特開 2001— 125255に記載のものも挙げることができる。 [0029] As compounds having at least one photooxidizable group and at least one urethane group, JP-A 63-260909, JP 2669849, JP-A 6-35189, JP The thing of 2001-125255 can also be mentioned.
[0030] 上記の好ましい態様である分子中にアミド結合と 2級または 3級ァミノ基とを有する 重合可能なエチレン性不飽和結合含有化合物について詳述する。 [0030] A polymerizable ethylenically unsaturated bond-containing compound having an amide bond and a secondary or tertiary amino group in the molecule as a preferred embodiment will be described in detail.
[0031] 本発明に係る分子中にアミド結合と 2級または 3級ァミノ基とを有する重合可能なェ チレン性不飽和結合含有化合物は、 25°Cの純水に対する溶解性が、 1質量%以上 溶解すること力 S好ましい。より好ましくは 3質量%以上であり、更に好ましくは 5質量% 以上であり、特に好ましくは 10質量%以上である。 [0031] The polymerizable ethylenically unsaturated bond-containing compound having an amide bond and a secondary or tertiary amino group in the molecule according to the present invention has a solubility in pure water at 25 ° C of 1% by mass. More power to dissolve S preferred. More preferably, it is 3 mass% or more, More preferably, it is 5 mass% or more, Most preferably, it is 10 mass% or more.
[0032] この様な特性を有する化合物は、(a)分子内に 2級又は 3級アミノ基を含有する多 価アルコール、 (b)多価イソシァネート化合物、および(c)分子内にヒドロキシル基と 付加重合可能なエチレン性二重結合を含有する化合物の反応生成物として得ること が可能である。 [0032] The compound having such characteristics includes (a) a polyhydric alcohol containing a secondary or tertiary amino group in the molecule, (b) a polyvalent isocyanate compound, and (c) a hydroxyl group in the molecule. It can be obtained as a reaction product of a compound containing an ethylenic double bond capable of addition polymerization.
[0033] より好ましくは、更に(d)グリコール類等のアミノ基非含有の多価アルコール類ュニ ットを導入すること、二重結合を有する化合物の mol比を 40%未満に抑えること、より 好ましくは 30%未満、特に好ましくは 25%未満に抑えることが好ましい。  [0033] More preferably, further (d) introducing an amino group-free polyhydric alcohol unit such as glycols, suppressing the mol ratio of the compound having a double bond to less than 40%, More preferably it is less than 30%, particularly preferably less than 25%.
[0034] 分子中にアミド結合と 2級または 3級ァミノ基とを有する重合可能なエチレン性不飽 和結合含有化合物の構成要素を詳述する  [0034] Details of components of a polymerizable ethylenically unsaturated bond-containing compound having an amide bond and a secondary or tertiary amino group in the molecule
〔 (a) 2級または 3級ァミノ基含有多価アルコール〕  [(A) Polyhydric alcohol containing secondary or tertiary amino groups]
ここで言う、分子内に 2級又は 3級アミノ基を含有する多価アルコールとしては、トリ エタノールァミン、 N メチルジェタノールァミン、 N ェチルジェタノールァミン、 N n ブチルジェタノールァミン、 N-tert. ーブチルジェタノールァミン、 N, N ジ (ヒドロキシェチノレ)ァニリン、 N, N, Ν' , Ν,一テトラ一 2—ヒドロキシプロピルェチレ ンジァミン、 ρ トリルジェタノ一ルァミン、 Ν, Ν, Ν' , Ν,一テトラ一 2—ヒドロキシェチ ノレエチレンジァミン、 Ν, Ν—ビス(2—ヒドロキシプロピノレ)ァニリン、ァリルジェタノ一 ルァミン、 3 (ジメチルァミノ) 1 , 2 プロパンジオール、 3 ジェチルアミノー 1 , 2 プロパンジオール、 Ν, Ν ジ(η—プロピル)アミノー 2, 3 プロパンジオール、 Ν , N ジ(iso プロピノレ)アミノー 2, 3 プロパンジオール、 3—(N メチルー N べ ンジルァミノ) 1 , 2—プロパンジオール等が挙げられる力 これに限定されない。 The polyhydric alcohols containing secondary or tertiary amino groups in the molecule include triethanolamine, N-methylethanolamine, N-ethyljetanolamine, Nn-butyljetanolamine. , N-tert.-Butyljetanolamine, N, N Di (hydroxyethynole) aniline, N, N,, ', 一, One-tetrahydroxy-2-hydroxypropylethylenediamine, ρ Toryljetanolamine, Ν , Ν, Ν ', Ν, 1-tetraethyl 2-hydroxyethylenethylenediamine, Ν, Ν-bis (2-hydroxypropinole) aniline, allyljetanolamine, 3 (dimethylamino) 1, 2 propanediol, 3 jetylamino 1, 2 Propanediol, Ν, Ν Di (η-propyl) amino-2, 3 Propanediol, Ν , N Di (isopropinole) amino-2,3 propanediol, 3- (N-methyl-Nbenzylamino) 1,2-propanediol, and the like.
[0035] 〔(b)多価イソシァネート化合物〕  [(B) Polyvalent isocyanate compound]
本発明で使用できる多価イソシァネート化合物とは、分子内に 2個以上のイソシァ ネート基を有する有機化合物を意味する。従って、多価イソシァネートのポリオール 付加物、ビウレット体、イソシァヌレート体等の多量体であってもよい。  The polyvalent isocyanate compound that can be used in the present invention means an organic compound having two or more isocyanate groups in the molecule. Therefore, it may be a multimer such as a polyol adduct of polyvalent isocyanate, a biuret or an isocyanurate.
[0036] ジイソシァネート化合物としては、ブタン 1 , 4ージイソシァネート、へキサン 1 , 6 ージイソシァネート、 2 メチノレペンタン 1 , 5 ジイソシァネート、オクタン 1 , 8— ジイソシァネート、 1 , 3—ジイソシアナ一トメチノレーシクロへキサノン、 2, 2, 4—トリメ チノレへキサン 1 , 6—ジイソシァネート、イソホロンジイソシァネート、 1 , 2—フエユレ ンジイソシァネート、 1 , 3—フエ二レンジイソシァネート、 1 , 4 フエ二レンジイソシァ ネート、トリレン 2, 4 ジイソシァネート、トリレン 2, 5 ジイソシァネート、トリレン —2, 6—ジイソシァネート、 1 , 3—ジ(イソシアナ一トメチル)ベンゼン、 1 , 3—ビス(1 イソシアナ一トー 1ーメチルェチル)ベンゼン等が挙げられる。  [0036] Diisocyanate compounds include butane 1,4-diisocyanate, hexane 1,6-diisocyanate, 2 methinorepentane 1,5 diisocyanate, octane 1,8-diisocyanate, 1,3-diisocyanate methyl Norecyclohexanone, 2, 2, 4-trimethylenohexane 1,6-diisocyanate, isophorone diisocyanate, 1,2-phenolic diisocyanate, 1,3-phenylene diisocyanate, 1, 4-phenylene diisocyanate, tolylene 2,4 diisocyanate, tolylene 2,5 diisocyanate, tolylene-2,6-diisocyanate, 1,3-di (isocyanatomethyl) benzene, 1,3-bis (1 isocyanatototo 1-methylethyl ) Benzene and the like.
[0037] 更に、例えば、ノルボルネンジイソシァネート、 m—フエ二レンジイソシァネート、 p— フエ二レンジイソシァネート、 2, 6 トリレンジイソシァネート、 2, 4 トリレンジイソシァ ネート、ナフタレン 1 , 4ージイソシァネート、 4, A' ージフエ二ノレメタンジイソシァネ ート、ポリメリックジフエ二ルメタンジイソシァネート、ジシクロへキシルメタン 4、 A' ージイソシァネート、 5—イソシァネート 1 (イソシァネートメチル) 1 , 3, 3—トリ メチルシクロへキサン、 3, 3' —ジメチルジフエニルメタン一 4, A' —ジイソシァネー ト、キシリレン 1 , 4ージイソシァネート、 4, A' ージフエニルプロパンジイソシァネー ジイソシァネート、ブチレン 1 , 2—ジイソシァネート、シクロへキシレン 1 , 2—ジィ ソシァネート、シクロへキシレン 1 , 4ージイソシァネート等のジイソシァネート類をあ げること力 Sでさる。  [0037] Further, for example, norbornene diisocyanate, m-phenylene diisocyanate, p-phenylene diisocyanate, 2, 6 tolylene diisocyanate, 2, 4 tolylene diisocyanate, naphthalene 1, 4-diisocyanate, 4, A'-diphenylmethane diisocyanate, polymeric diphenylmethane diisocyanate, dicyclohexylmethane 4, A'-diisocyanate, 5— Isocyanate 1 (Isocyanate methyl) 1, 3, 3-trimethylcyclohexane, 3, 3 '—Dimethyldiphenylmethane 4, A' — Diisocyanate, xylylene 1,4-diisocyanate, 4, A '-Diphenylpropane diisocyanate diisocyanate, butylene 1,2-diisocyanate, cyclohexylene 1,2-diisocyanate, cyclohexylene 1,4- Jiisoshianeto such leave in the Oh gel that force S such as Isoshianeto.
[0038] また更に、 4, Α' , Α" トリフエニルメタントリイソシァネート、トルエン 2, 4, 6— トリイソシァネート等のトリイソシァネート類、 4, 4' ージメチルジフエニルメタン 2 , 2 ' , 5, 5' —テトライソシァネート等のテトライソシァネート類、などがある。多価イソシ ァネートとポリオールとの付加物としては、例えばへキサメチレンジイソシァネートのト リメチロールプロパン付加物、 2, 4 トリレンジイソシァネートのトリメチロールプロパン 付加物、キシリレンジイソシァネートのトリメチロールプロパン付加物、トリレンジイソシ ァネートのへキサントリオール付加物等のイソシァネートプレポリマーを用いることが できる。多価イソシァネート化合物は、上記化合物に限定されるものではなぐまた、 必要に応じて数種類の化合物を併用してもよい。 [0038] Still further, triisocyanates such as 4, Α ', Α "triphenylmethane triisocyanate, toluene 2,4,6-triisocyanate, 4,4'-dimethyldiphenylmethane 2 , 2 ', 5, 5' —tetraisocyanates such as tetraisocyanate, etc. Examples of adducts of cyanate and polyol include trimethylolpropane adduct of hexamethylene diisocyanate, trimethylolpropane adduct of 2,4 tolylene diisocyanate, and trimethylolpropane of xylylene diisocyanate. Isocyanate prepolymers such as adducts and hexanetriol adducts of tolylene diisocyanate can be used. The polyvalent isocyanate compound is not limited to the above compounds, and several kinds of compounds may be used in combination as required.
[0039] 〔 (c)分子内にヒドロキシル基と付加重合可能なエチレン性二重結合を含有する化 合物〕 [(C) Compound containing ethylenic double bond capable of addition polymerization with hydroxyl group in the molecule]
分子内にヒドロキシル基と付加重合可能なエチレン性二重結合を含有する化合物 としては、特に限定されないが、好ましくは、 2—ヒドロキシェチルメタタリレート、 2—ヒ ン一 1 , 3 ジメタタリレート、 2 ヒドロキシプロピレン一 1—メタタリレート一 3—アタリレ ート等が挙げられる。  The compound containing an ethylenic double bond capable of addition polymerization with a hydroxyl group in the molecule is not particularly limited, but preferably 2-hydroxyethyl methacrylate, 2-hin-1,3-dimethacrylate. 2 Hydroxypropylene 1-metatalylate 1-attalylate and the like.
[0040] これらの反応は、通常のジオール化合物、ジイソシァネート化合物、ヒドロキシル基 含有アタリレート化合物の反応で、ウレタンアタリレートを合成する方法と同様に行うこ とが出来る。  [0040] These reactions can be carried out in the same manner as a method for synthesizing urethane acrylate by reaction of a normal diol compound, diisocyanate compound, and hydroxyl group-containing acrylate compound.
[0041] また、これらの分子内に三級アミノ基を含有する多価アルコール、ジイソシァネート 化合物、および分子内にヒドロキシル基と付加重合可能なエチレン性二重結合を含 有する化合物の反応生成物において具体例を以下に示す。  [0041] Further, in the reaction products of polyhydric alcohols containing a tertiary amino group in the molecule, diisocyanate compounds, and compounds containing an ethylenic double bond capable of addition polymerization with a hydroxyl group in the molecule. An example is shown below.
[0042] M—1 :トリエタノールァミン(1モル)、へキサン 1 , 6 ジイソシァネート(3モル)、 [0042] M-1: triethanolamine (1 mol), hexane 1,6 diisocyanate (3 mol),
2 ヒドロキシェチルメタタリレート(3モル)の反応生成物  2 Hydroxyethyl methacrylate (3 mol) reaction product
M— 2 :トリエタノールァミン(1モル)、イソホロンジイソシァネート(3モル)、 2—ヒドロ キシェチルアタリレート(3モル)の反応生成物  M—2: Reaction product of triethanolamine (1 mol), isophorone diisocyanate (3 mol), 2-hydroxychetyl acrylate (3 mol)
M— 3 : N— n ブチルジェタノールァミン(lモル)、 1 , 3—ビス(1 イソシアナート 1ーメチルェチノレ)ベンゼン(2モル)、 2—ヒドロキシプロピレン 1 メタタリレート 3 アタリレート(2モル)の反応生成物  M—3: N—n Reaction of butyljetanolamine (l mol), 1,3-bis (1 isocyanate 1-methylethinole) benzene (2 mol), 2-hydroxypropylene 1 metatalylate 3 acrylate (2 mol) Product
M— 4 : N n ブチルジェタノールァミン(lモル)、 1 , 3—ジ(イソシアナ一トメチル )ベンゼン(2モル)、 2—ヒドロキシプロピレン一 1—メタタリレート一 3—アタリレート(2 モル)の反応生成物 M—4: N n Butyljetanolamine (1 mol), 1,3-di (isocyanatomethyl) benzene (2 mol), 2-hydroxypropylene 1-metatalylate 1 3-allylate (2 Mol) reaction product
M— 5 : N メチルジェタノールァミン(1モル)、トリレン 2, 4—ジイソシァネート(2 モル)、 2 ヒドロキシプロピレン 1 , 3 ジメタタリレート(2モル)の反応生成物 これらの各素材の組合せで得られる反応生成物の中で、本発明において好ましく 用いられる化合物は、 25°Cの純水に対する溶解性力 1質量%以上溶解することが 好ましい。より好ましくは 3質量%以上であり、更に好ましくは 5質量%以上であり、特 に好ましくは 10質量%以上であり、この様な特性を有する化合物を用いる事で本願 の目的を達成できる。  Reaction product of M-5: N-methyljetanolamine (1 mol), tolylene 2,4-diisocyanate (2 mol), 2 hydroxypropylene 1,3 dimetatalylate (2 mol) Among the obtained reaction products, the compound preferably used in the present invention is preferably dissolved in a solubility of 1% by mass or more in pure water at 25 ° C. More preferably, it is 3% by mass or more, further preferably 5% by mass or more, and particularly preferably 10% by mass or more. By using a compound having such characteristics, the object of the present application can be achieved.
[0043] 本発明ではこれら従来公知の化合物の中で特定の特性を有する化合物を好ましく 用いる事ができるが、更により好ましくは、上記の 3成分に加えて、第 4の成分としてグ リコール類等のアミノ基非含有の多価アルコール類ユニットを導入すること力 S、特に好 ましい態様の一つである。アミノ基非含有の多価アルコール類の具体例を以下に挙 げる。  [0043] In the present invention, among these conventionally known compounds, compounds having specific characteristics can be preferably used. Even more preferably, in addition to the above three components, glycols and the like are used as the fourth component. One of the particularly preferred embodiments is the ability to introduce a non-amino group-containing polyhydric alcohol unit. Specific examples of polyhydric alcohols containing no amino group are listed below.
[0044] 〔(d)アミノ基非含有の多価アルコール〕  [0044] [(d) Polyhydric alcohol containing no amino group]
本発明で用いることができるアミノ基非含有の多価アルコールとしては、エチレング リコール、 1 , 2—または 1 , 3—プロピレングリコール、ブチレングリコール、ジエチレン グリコーノレ、トリエチレングリコーノレ、テトラエチレングリコーノレ、ジプロピレングリコーノレ Examples of the amino group-free polyhydric alcohol that can be used in the present invention include ethylene glycol, 1,2- or 1,3-propylene glycol, butylene glycol, diethylene glycolanol, triethylene glycolanol, tetraethylene glycolanol, diethylene glycol. Propylene glycol
、 1 , 3—または 1 , 4 ブタンジオール、 1 , 5—ペンタンジオール、 1 , 6—へキサンジ オール、ネオペンチルグリコール、 2—メチルペンタンジオール、水素添加ビスフエノ 一ノレ A、ポリエチレングリコーノレ、ポリプロピレングリコール、ポリブチレングリコーノレ、 ポリテトラメチレングリコール、ポリ力プロラタトン、トリメチロールェタン、トリメチロール プロノ ン、ポリトリメチローノレプロノ ン、ペンタエリスト一ノレ、ポリペンタエリスト一ノレ、ソ ルビトーノレ、マンニトール、グリセリン、ポリグリセリン等の多価アルコールゃ該多価ァ ノレコールと無水マレイン酸、マレイン酸、フマール酸、無水ィタコン酸、ィタコン酸、ァ ジピン酸、フタル酸、無水フタル酸、テレフタル酸、イソフタル酸等の多塩基酸との反 応物であるポリエステルポリオール、力プロラタトン変性ポリオール、ポリオレフイン系 ポリオール、ポリカーボネート系ポリオール、ポリブタジエン系ポリオール等が挙げら れ、これらを上記のヒドロキシ脂肪酸エステルと併用することができる。 [0045] 更に、多価アルコール化合物としては、例えば 1, 3 プロパンジオール、 1, 7 へ プタンジオール、 1, 8 オクタンジオール、 2, 3 ジヒドロキシブタン、 1, 2 ジヒドロ キシブタン、 1, 3 ジヒドロキシブタン、 2, 2 ジメチルー 1, 3 プロパンジオール、 2, 4 ペンタンジオール、 2, 5—へキサンジォーノレ、 3—メチルー 1, 5—ペンタンジ ォーノレ、 1, 4ーシクロへキサンジメタノーノレ、ジヒドロキシシクロへキサン、 1, 2, 6 ト リヒドロキシへキサン、フエニノレエチレングリコーノレ、 1, 1, 1 トリメチローノレプロパン 、へキサントリオール、ペンタエリスリトール、グリセリン等の脂肪族多価アルコール、 1 , 4ージ(2 ヒドロキシエトキシ)ベンゼン、 1, 3 ビス(2 ヒドロキシエトキシ)ベンゼ ン等の芳香族多価アルコールとアルキレンオキサイドとの縮合生成物、 p キシリレン グリコール、 m キシリレングリコール、 α , a' ージヒドロキシ p ジイソプロピルべ ンゼン、 4, A' ージヒドロキシジフエニルメタン、 2—(p, p ージヒドロキシジフエニル メチノレ)ベンジルアルコール、 4, 4' ージヒドロキシジフエニルスルホン、 4, 4' ージ ヒドロキシジフエニルスルフイド、 4, A' イソプロピリデンジフエノールのエチレンォ キサイド付加物、 4, 4' イソプロピリデンジフエノールのプロピレンオキサイド付加 物等が挙げられる。 1,3-- or 1,4-butanediol, 1,5-pentanediol, 1,6-hexanediol, neopentyl glycol, 2-methylpentanediol, hydrogenated bisphenol mononole A, polyethylene glycolol, polypropylene glycol , Polybutylene glycol, polytetramethylene glycol, poly force prolatatone, trimethylol ethane, trimethylol pronone, polytrimethylone lepronone, pentaerythrinol, polypentaerystinole, sorbitole, mannitol, Polyhydric alcohols such as glycerin and polyglycerin such polyhydric alcohol and maleic anhydride, maleic acid, fumaric acid, itaconic anhydride, itaconic acid, adipic acid, phthalic acid, phthalic anhydride, terephthalic acid, isophthalic acid, etc. Reaction with polybasic acids Polyester polyols and, the force Purorataton modified polyols, polyolefin polyols, polycarbonate polyols, polybutadiene polyols, etc. can be mentioned, et al is, they can be used in combination with hydroxy fatty acid esters above. [0045] Further, examples of the polyhydric alcohol compound include 1,3 propanediol, 1,7 heptanediol, 1,8 octanediol, 2,3 dihydroxybutane, 1,2 dihydroxybutane, 1,3 dihydroxybutane, 2,2 dimethyl-1,3 propanediol, 2,4 pentanediol, 2,5-hexanediol, 3-methyl-1,5-pentanediol, 1,4-cyclohexanedimethanol, dihydroxycyclohexane, 1, 2, 6-trihydroxy hexane, phenylene ethylene glycol, 1, 1, 1 trimethylol propane, hexane triol, pentaerythritol, glycerin and other aliphatic polyhydric alcohols, 1, 4-di (2 hydroxy ethoxy) ) Aromatic polyhydric alcohols such as benzene and 1,3 bis (2 hydroxyethoxy) benzene and alkylene oxa P-xylylene glycol, m-xylylene glycol, α, a'-dihydroxy p-diisopropylbenzene, 4, A'-dihydroxydiphenylmethane, 2- (p, p-dihydroxydiphenyl methinole) benzyl alcohol 4,4'-dihydroxydiphenyl sulfone, 4,4'-dihydroxydiphenylsulfide, 4, A 'isopropylidenediphenol ethylene oxide adduct, 4,4' isopropylidenediphenol adducted with propylene oxide Thing etc. are mentioned.
[0046] これら第 4成分を加えた化合物としては、  [0046] As a compound to which these fourth components are added,
M-6:トリエタノールァミン(1モル)、へキサン 1 , 6—ジイソシァネート(3モル)、 2 ヒドロキシェチルメタタリレート(3モル)、ジエチレングリコール(3モル)の反応生 成物  M-6: Reaction product of triethanolamine (1 mol), hexane 1,6-diisocyanate (3 mol), 2 hydroxyethyl methacrylate (3 mol), diethylene glycol (3 mol)
M-7:トリエタノールァミン(1モノレ)、イソホロンジイソシァネート(3モル)、 2 ヒドロ キシェチルアタリレート(3モル)、エチレングリコール(3モル)の反応生成物  M-7: Reaction product of triethanolamine (1 monole), isophorone diisocyanate (3 mol), 2 hydroxychetyl acrylate (3 mol), ethylene glycol (3 mol)
M— 8:N— n ブチルジェタノールァミン(lモル)、 1, 3—ビス(1 イソシアナート 1ーメチルェチノレ)ベンゼン(2モル)、 2—ヒドロキシプロピレン 1 メタタリレート 3 アタリレート(2モル)、ジエチレングリコール(2モル)の反応生成物  M—8: N—n Butyljetanolamine (l mol), 1,3-bis (1 isocyanate 1-methylethinole) benzene (2 mol), 2-hydroxypropylene 1 metatalylate 3 Atarylate (2 mol), diethylene glycol (2 mol) of reaction product
M 9:N— n ブチルジェタノールァミン(lモル)、 1, 3—ジ(イソシアナ一トメチル )ベンゼン(2モル)、 2 ヒドロキシプロピレン一 1—メタタリレート一 3—アタリレート(2 モル)、エチレングリコール(2モル)の反応生成物  M 9: N—n Butyljetanolamine (l mol), 1,3-di (isocyanatomethyl) benzene (2 mol), 2 Hydroxypropylene 1-Metatalylate 1-Atalylate (2 mol), Ethylene Reaction product of glycol (2 mol)
M—10:N メチルジェタノールァミン(1モル)、トリレン 2, 4 ジイソシァネート( 2モノレ)、 2 ヒドロキシプロピレン 1 , 3 ジメタタリレート(2モノレ)、ジエチレングリコ ール(2モル)の反応生成物を挙げることができる。 M-10: N Methyljetanolamine (1 mol), Tolylene 2, 4 Diisocyanate ( And 2-hydroxypropylene 1,3 dimetatalylate (2 monole) and diethylene glycol (2 mol).
[0047] 本発明において特に好ましいもう一つの態様は、第 3成分である分子内にヒドロキ シル基と付加重合可能なエチレン性二重結合を含有する化合物の mol比を低く抑え ることである。具体的には、好ましくは 40%未満に抑えること、より好ましくは 30%未 満、特に好ましくは 25%未満に抑えることが好ましい態様である。 [0047] Another particularly preferred embodiment in the present invention is to keep the mol ratio of the third component, a compound containing an ethylenic double bond capable of addition polymerization with a hydroxyl group in the molecule, low. Specifically, it is a preferred embodiment that the content is preferably controlled to less than 40%, more preferably less than 30%, and particularly preferably less than 25%.
[0048] これら第 3成分比率を抑えた化合物としては、 [0048] As compounds having a reduced ratio of the third component,
M— 11 : N— n ブチルジェタノールァミン(2モル)、 1 , 3—ビス(1 イソシアナ一 トー 1ーメチルェチノレ)ベンゼン(3モル)、 2—ヒドロキシプロピレン 1 メタタリレート 3 アタリレート(2モル)の反応生成物  M-11: N-n Butyljetanolamine (2 mol), 1,3-bis (1 isocyanato to 1-methylethinole) benzene (3 mol), 2-hydroxypropylene 1 metatalylate 3 acrylate (2 mol) Reaction product
M- 12 : N-n-ブチルジェタノ ルァミン(3モル)、へキサメチレンジイソシァネー ト(4モノレ)、 2 ヒドロキシプロピレン 1ーメタクリレートー 3 アタリレート(2モノレ)の 反応生成物  M-12: Reaction product of N-n-butyljetanolamine (3 moles), hexamethylene diisocyanate (4 monoles), 2 hydroxypropylene 1-methacrylate-3 acrylate (2 monoles)
M— 13 : N メチノレジエタノーノレアミン(2モノレ)、トリレン 2, 4 ジイソシァネート( 3モル)、 2 ヒドロキシプロピレン 1 , 3 ジメタタリレート(2モル)の反応生成物を挙 げること力 Sでさる。  M—13: N Ability to list reaction products of methinoresinethanolanol (2 monole), tolylene 2,4 diisocyanate (3 mol), 2 hydroxypropylene 1,3 dimetatalylate (2 mol) S I'll do it.
[0049] 本発明においては、感光層が、上記の重合可能なエチレン性不飽和結合含有化 合物のうち、特に 1分子中にアミド結合と 3級アミノ基を有する多官能アタリレートを含 有することが好ましい。ここで、「多官能」とは、重合可能なエチレン性不飽和結合を 複数有することをいう。この場合、「1分子中にアミド結合と 3級アミノ基を有する多官 能アタリレート」は、感光層の固形分の 5〜80質量部が好ましぐ 15〜60質量部が更 に好ましい。  [0049] In the present invention, the photosensitive layer contains, among the polymerizable ethylenically unsaturated bond-containing compounds, in particular, a polyfunctional acrylate having an amide bond and a tertiary amino group in one molecule. It is preferable. Here, “polyfunctional” means having a plurality of polymerizable ethylenically unsaturated bonds. In this case, the “multifunctional attalylate having an amide bond and a tertiary amino group in one molecule” preferably has a solid content of 5 to 80 parts by weight, more preferably 15 to 60 parts by weight.
[0050] また、本発明にお!/、ては、上記の重合可能なエチレン性不飽和結合含有化合物の 他に、種々の重合可能なエチレン性不飽和結合含有化合物を併用することができる 。これらの重合可能なエチレン性不飽和結合含有化合物に特に限定は無いが、例え ば、 2—ェチルへキシルアタリレート、 2—ヒドロキシプロピルアタリレート、グリセロール フエノキシェチルアタリレート、テトラヒドロフルフリルォキシェチルアタリレート、テトラヒ ドロフルフリルォキシへキサノリドアタリレート、 1 , 3—ジォキサンアルコールの ε —力 プロラタトン付加物のアタリレート、 1 , 3—ジォキソランアタリレート等の単官能アクリル 酸エステル類、或いはこれらのアタリレートをメタタリレート、イタコネート、クロトネート、 マレエートに代えたメタクリル酸、ィタコン酸、クロトン酸、マレイン酸エステル、例えば 、エチレングリコールジアタリレート、トリエチレンダルコールジアタリレート、ペンタエリ スリトールジアタリレート、ハイド口キノンジアタリレート、レゾルシンジアタリレート、へキ サンジオールジアタリレート、ネオペンチルグリコールジアタリレート、トリプロピレング リコーノレジアタリレート、ヒドロキシビバリン酸ネオペンチルグリコールのジアタリレート、 ネオペンチルグリコールアジペートのジアタリレート、ヒドロキシビバリン酸ネオペンチ ノレグリコールの ε 一力プロラタトン付加物のジアタリレート、 2—(2—ヒドロキシ 1 , 1 ージメチノレエチノレ) 5—ヒドロキシメチノレー 5—ェチノレー 1 , 3—ジ才キサンジアタリ レート、トリシクロデカンジメチローノレアタリレート、トリシクロデカンジメチローノレアタリレ ートの ε 一力プロラタトン付加物、 1 , 6—へキサンジオールのジグリシジルエーテノレ のジアタリレート等の 2官能アクリル酸エステル類、或いはこれらのアタリレートをメタク リレート、イタコネート、クロトネート、マレエートに代えたメタクリル酸、ィタコン酸、クロ トン酸、マレイン酸エステル、例えばトリメチロールプロパントリアタリレート、ジトリメチロ ールプロパンテトラアタリレート、トリメチロールェタントリアタリレート、ペンタエリスリト ールトリアタリレート、ペンタエリスリトールテトラアタリレート、ジペンタエリスリトールテト ラアタリレート、ジペンタエリスリトールペンタアタリレート、ジペンタエリスリトールへキ サアタリレート、ジペンタエリスリトールへキサアタリレートの ε —力プロラタトン付加物 、ピロガロールトリアタリレート、プロピオン酸.ジペンタエリスリトールトリアタリレート、プ ロピオン酸.ジペンタエリスリトールテトラアタリレート、ヒドロキシビバリルアルデヒド変 性ジメチロールプロパントリアタリレート等の多官能アクリル酸エステル酸、或いはこれ らのアタリレートをメタタリレート、イタコネート、クロトネート、マレエートに代えたメタタリ ル酸、ィタコン酸、クロトン酸、マレイン酸エステル等を挙げることができる。 [0050] In addition to the above polymerizable ethylenically unsaturated bond-containing compounds, various polymerizable ethylenically unsaturated bond-containing compounds can be used in combination with the present invention. These polymerizable ethylenically unsaturated bond-containing compounds are not particularly limited, and examples thereof include 2-ethyl hexyl acrylate, 2-hydroxypropyl acrylate, glycerol phenoxy cetyl acrylate, tetrahydrofurfuryl chloride. Shetyl Atarilate, Tetrahi Monofunctional acrylates such as drofurfuroxyhexanolid tallylate, ε-force of 1,3-dioxane alcohol, atalylate of prolatatone adduct, 1,3-dioxolan acrylate Alternatively, methacrylic acid, itaconic acid, crotonic acid, maleic acid esters in which these talates are replaced with metatalates, itaconates, crotonates, and maleates, such as ethylene glycol diatalate, triethylene alcohol diatalate, pentaerythritol diataliate. Hydrate Quinone Ditalylate, Resorcin Ditalylate, Hexanediol Ditalylate, Neopentyl Glycol Ditalylate, Tripropylene Glycono-Resialyl Tallate, Hydropentaline Neopentyl Glycol Diatari Over DOO, neopentyl glycol adipate Jiatarireto, hydroxy Viva Jiatarireto phosphate neopentyl Honoré ε Ichiriki Purorataton adduct of glycol, 2- (2-hydroxy 1, 1 over dimethylcarbamoyl Honoré ethyl Honoré) 5-hydroxymethyl Roh Leh 5- Echinore 1,3-di-xantia ditalitrate, tricyclodecane dimethylone rare taleate, ε-strength prolatatone adduct of tricyclodecane dimethyl oleorelate, 1,6-hexanediol diglycidyl etherate ditalitrate Bifunctional acrylates such as methacrylic acid, itaconic acid, crotonic acid, maleic acid ester such as trimethylolpropane tritalylate, diacrylate. Limethylol propane tetraatalylate, trimethylolethane tritalylate, pentaerythritol triatolylate, pentaerythritol tetraatalylate, dipentaerythritol tetraatalylate, dipentaerythritol pentaatalylate, dipentaerythritol hexyl Satalylate, dipentaerythritol hexaatalylate ε — force prolatatatone adduct, pyrogallol triatalylate, propionic acid. Dipentaerythritol triatalylate, propionic acid. Dipentaerythritol tetraatalylate, hydroxybivalyl aldehyde Polyfunctional acrylic acid esters such as methylolpropane tritalylate, or these acrylates may be metatalylated, itaconate, crotonate, Examples thereof include metataric acid, itaconic acid, crotonic acid, maleic acid ester and the like in place of maleate.
[0051] 重合可能なエチレン性不飽和結合含有化合物として、プレボリマーも上記同様に 使用すること力でさる。 [0051] As a polymerizable ethylenically unsaturated bond-containing compound, prepolymers can be used in the same manner as described above.
[0052] プレボリマーとしては、後述する様な化合物等を挙げることができ、また、適当な分 子量のオリゴマーにアクリル酸、又はメタクリル酸を導入し、光重合性を付与したプレ ポリマーも好適に使用できる。 [0052] Examples of the prepolymer include compounds as described later, A prepolymer obtained by introducing acrylic acid or methacrylic acid into a small amount of oligomer and imparting photopolymerizability can also be suitably used.
[0053] これらプレポリマーは、 1種又は 2種以上を併用してもよいし、上述の単量体及び/ 又はオリゴマーと混合して用いてもよ!/、。  [0053] These prepolymers may be used alone or in combination of two or more, and may be used in combination with the above-mentioned monomers and / or oligomers! /.
[0054] プレポリマーとしては、例えばアジピン酸、トリメリット酸、マレイン酸、フタル酸、テレ フタル酸、ハイミック酸、マロン酸、こはく酸、ダルタール酸、ィタコン酸、ピロメリット酸 、フマル酸、グルタール酸、ピメリン酸、セバシン酸、ドデカン酸、テトラヒドロフタル酸 等の多塩基酸と、エチレングリコール、プロピレンダルコール、ジエチレングリコール、 プロピレンオキサイド、 1 , 4 ブタンジォーノレ、トリエチレングリコーノレ、テトラエチレン グリコーノレ、ポリエチレングリコ一ノレ、グリセリン、トリメチローノレプロパン、ペンタエリス リトーノレ、ソノレビトーノレ、 1 , 6 へキサンジオール、 1 , 2, 6 へキサントリオール等の 多価のアルコールの結合で得られるポリエステルに(メタ)アクリル酸を導入したポリエ ステルアタリレート類;例えば、ビスフエノーノレ Α·ェピクロルヒドリン'(メタ)アクリル酸、 フエノールノポラック 'ェピクロルヒドリン.(メタ)アクリル酸のようにエポキシ樹脂に(メタ )アクリル酸を導入したエポキシアタリレート類;例えば、エチレングリコール 'アジピン 酸'トリレンジイソシァネート · 2—ヒドロキシェチルアタリレート、ポリエチレングリコール メタタリレート.キシレンジイソシァネート、 1 , 2—ポリブタジエングリコール 'トリレンジィ ソシァネート · 2—ヒドロキシェチルアタリレート、トリメチロールプロパン 'プロピレングリ コール.トリレンジイソシァネート.2—ヒドロキシェチルアタリレートのように、ウレタン樹 脂に (メタ)アクリル酸を導入したウレタンアタリレート;例えば、ポリシロキサンアタリレ ート、ポリシロキサン 'ジイソシァネート · 2—ヒドロキシェチルアタリレート等のシリコー ン樹脂アタリレート類;その他、油変性アルキッド樹脂に (メタ)アタリロイル基を導入し たアルキッド変性アタリレート類、スピラン樹脂アタリレート類;等のプレボリマーが 挙げられる。  [0054] Examples of the prepolymer include adipic acid, trimellitic acid, maleic acid, phthalic acid, terephthalic acid, hymic acid, malonic acid, succinic acid, dartaric acid, itaconic acid, pyromellitic acid, fumaric acid, and glutaric acid. , Pimelic acid, sebacic acid, dodecanoic acid, tetrahydrophthalic acid, and other polybasic acids, ethylene glycol, propylene alcohol, diethylene glycol, propylene oxide, 1,4 butanediole, triethyleneglycolanol, tetraethyleneglycolanol, polyethyleneglycol (Meth) acrylic acid is introduced into a polyester obtained by the combination of polyhydric alcohols such as glycerin, trimethylololepropane, pentaerythritol, sonorebitol, 1,6 hexanediol, 1,2,6 hexanetriol, etc. Polyester atalylates; for example, bisphenolanol ェ -epoxychlorohydrin '(meth) acrylic acid, phenol nopolak' epichrohydrin. (Meth) acrylic acid such as (meth) acrylic acid to epoxy resin Introduced epoxy acrylates; for example, ethylene glycol 'adipic acid' tolylene diisocyanate · 2-hydroxyethyl acrylate, polyethylene glycol metatalylate. Xylene diisocyanate, 1, 2-polybutadiene glycol 'tolylene diisocyanate · 2 —Hydroxyethyl acrylate, trimethylol propane 'propylene glycol. Tolylene diisocyanate. 2—Urethane acrylate with (meth) acrylic acid introduced into urethane resin, such as hydroxyethyl acrylate; policy Siloxane resin acrylates such as loxane acrylate, polysiloxane diisocyanate, 2-hydroxyethyl acrylate, etc .; alkyd modified acrylates in which (meth) attalyloyl groups are introduced into oil-modified alkyd resins, spirane resin acrylates Prepolymers such as rates;
[0055] また、本発明に係る重合可能なエチレン性不飽和結合含有化合物として、ホスファ ゼンモノマー ·トリエチレングリコール ·イソシァヌール酸 EO (エチレンォキシド)変性 ジアタリレート、イソシァヌール酸 EO変性トリアタリレート、ジメチロールトリシクロデカ ンジアタリレート、トリメチロールプロパンアクリル酸安息香酸エステル、アルキレンダリ コールタイプアクリル酸変性.ウレタン変性アタリレート等の単量体及び該単量体から 形成される構成単位を有する付加重合性のオリゴマー及びプレボリマーを挙げること ができる。 [0055] Further, the polymerizable ethylenically unsaturated bond-containing compound according to the present invention includes phosphazene monomer, triethylene glycol, isocyanuric acid EO (ethylene oxide) -modified diatalylate, isocyanuric acid EO-modified tritalylate, dimethylol trimethylate. Cyclodeca Diatalylate, trimethylolpropane acrylic acid benzoate, alkylene diol type acrylic acid modified monomers such as urethane modified acrylate, and addition polymerizable oligomers and prepolymers having structural units formed from such monomers Can be mentioned.
[0056] この他に特開昭 58— 212994号公報、同 61— 6649号公報、同 62— 46688号公 報、同 62— 48589号公報、同 62— 173295号公報、同 62— 187092号公報、同 6 3— 67189号公報、特開平 1— 244891号公報等に記載の化合物などを挙げること ができ、更に「11290の化学商品」化学工業日報社 p. 286〜p. 294に記載の化合 物、「UV'EB硬化ハンドブック(原料編)」高分子刊行会 p. 1;!〜 65に記載の化合物 なども本発明におレヽては用いることができる。  [0056] In addition, JP-A 58-212994, 61-6649, 62-46688, 62-48589, 62-173295, 62-187092 The compounds described in JP-A-63-367189, JP-A-1-244891, etc., and the compounds described in “Chemical Products of 11290”, Chemical Industry Daily, p. 286 to p.294. The compounds described in “UV'EB Curing Handbook (Raw Materials)”, Kobunshi Kankokai, p. 1;! -65 can also be used in the present invention.
[0057] 本発明に係る重合可能なエチレン性不飽和結合含有化合物の感光層中の含有量 としては、感光層の固形分に対して、 1. 0〜80. 0質量%の範囲が好ましぐより好ま しくは 3. 0—70. 0質量0 /0の範囲である。 [0057] The content of the polymerizable ethylenically unsaturated bond-containing compound according to the present invention in the photosensitive layer is preferably in the range of 1.0 to 80.0 mass% with respect to the solid content of the photosensitive layer. Guyori preferred properly is in the range of 3. 0-70. 0 wt 0/0.
[0058] (光重合開始剤)  [0058] (Photopolymerization initiator)
本発明の感光性平版印刷版材料においては、感光層が、重合開始剤を含有する ことを要する。当該重合開始剤は、画像露光により、重合可能なエチレン性不飽和結 合含有化合物の重合を開始し得る化合物であり、例えばビイミダゾール化合物、鉄ァ レーン錯体化合物、チタノセン化合物、ポリハロゲン化合物、モノアルキルトリアリー ルポレート化合物などが好ましく用いられる。これらの中でも特に、ビイミダゾール化 合物、鉄アレーン錯体が好ましく用いられる。  In the photosensitive lithographic printing plate material of the present invention, the photosensitive layer is required to contain a polymerization initiator. The polymerization initiator is a compound capable of initiating polymerization of a polymerizable ethylenically unsaturated bond-containing compound upon image exposure. For example, a biimidazole compound, an iron arene complex compound, a titanocene compound, a polyhalogen compound, a monohalogen compound, or the like. Alkyl triaryl phosphate compounds are preferably used. Of these, biimidazole compounds and iron arene complexes are preferably used.
[0059] ビイミダゾール化合物は、ビイミダゾールの誘導体であり、例えば特開 2003— 295 426号公報に記載される化合物等が挙げられる。  [0059] The biimidazole compound is a derivative of biimidazole, and examples thereof include compounds described in JP-A-2003-295426.
[0060] 本発明においては、ビイミダゾール化合物として、へキサァリールビイミダゾール(Η ΑΒΙ、トリアリール イミダゾールのニ量体)化合物を好ましく用いることができる。  [0060] In the present invention, a hexaarylbiimidazole (a dimer of triarylimidazole) compound can be preferably used as the biimidazole compound.
[0061] ΗΑΒΙ類の製造工程は独国特許 (DE1 , 470, 154)に記載されておりそして光重 合可能な組成物中でのそれらの使用は欧州特許 (ΕΡ24, 629)、欧州特許 (EP10 7, 792)、米国特許(US4, 410, 621)、欧州特許(EP215, 453)および独国特許 (DE3, 211 , 312) ίこ記述されてレヽる。 [0062] 好ましいビイミダゾール化合物は例えば、 2, 4, 5, 2' , 4' , 5' —へキサフエ二 ノレビイミダゾール、 2, 2' —ビス(2 クロ口フエ二ル)一 4, 5, A' , 5' —テトラフエ 二ルビイミダゾール、 2, 2' —ビス(2 ブロモフエ二ル)一 4, 5, A' , 5' —テトラフ ェニルビイミダゾール、 2, 2' —ビス(2, 4 ジクロロフエ二ル)一 4, 5, A' , 5' —テ トラフエニノレビイミダゾーノレ、 2, 2' —ビス(2 クロ口フエ二ノレ)一 4, 5, 4' , 5' — テトラキス(3 メトキシフエ二ノレ)ビイミダゾール、 2, 2' ビス(2 クロ口フエニル) 4, 5, 4' , 5' —テトラキス(3, 4, 5 トリメトキシフエ二ノレ)一ビイミダゾーノレ、 2, 5, 2' , 5' —テトラキス(2 クロ口フエ二ル)一 4, 4' —ビス(3, 4 ジメトキシフエ二ル )ビイミダゾール、 2, 2' —ビス(2, 6 ジクロロフエ二ル)一 4, 5, A' , 5' —テトラフ ェニルビイミダゾール、 2, 2' —ビス(2 ニトロフエ二ル)一 4, 5, 4' , 5' —テトラフ ェ: ^ノレ [0061] Processes for the production of moss are described in German patents (DE1, 470, 154) and their use in photopolymerizable compositions is described in European patents (ΕΡ24,629), European patents ( EP10 7, 792), US patent (US4, 410, 621), European patent (EP215, 453) and German patent (DE3, 211, 312) are described. [0062] Preferable biimidazole compounds include, for example, 2, 4, 5, 2 ', 4', 5'-hexaphen-2-noreviimidazole, 2,2'-bis (2 black mouth phenyl) 1, 4, 5 , A ', 5' — Tetraphenyl dibiimidazole, 2, 2 '— Bis (2 bromophenyl) 1, 4, 5, A', 5 '— Tetraphenyl biimidazole, 2, 2' — Bis (2, 4 Dichlorophenol) 1, 4, 5, A ', 5' — Tetraf Eneno Levi imidazonole, 2, 2 '— Bis (2 black mouth Fuenore) 1, 4, 5, 4', 5 '— Tetrakis (3 methoxyphenyl) biimidazole, 2, 2 'bis (2 chlorophenyl) 4, 5, 4', 5 '—tetrakis (3, 4, 5 trimethoxyphenyl) monobiimidazole, 2, 5, 2 ', 5' — Tetrakis (2 black mouth phenyl) 1, 4 '— Bis (3,4 dimethoxyphenyl) biimidazole, 2, 2' — Bis (2, 6 dichlorophenyl) 1 4 , 5, A ', 5' — Troughphenylbiimidazole, 2, 2 '— Bis (2nitrophenyl) 1, 4, 5, 4', 5 '— Tetrafe: ^
ビイミダゾーノレ、 2, 2' —ジ一 o トリノレ一 4, 5, A' , 5' —テトラフエニノレビイミダゾ ール、 2, 2' —ビス(2 エトキシフエ二ル)一 4, 5, A' , 5' —テトラフエ二ルビイミ ダゾールおよび 2, 2' —ビス(2, 6 ジフルオロフェニル) 4, 5, A' , 5' —テトラ フエ二ルビイミダゾールであり、これらの化合物は市販品として入手することができる。  Biimidazonole, 2, 2 '— Diol o Torinore 1, 5, 5, A', 5 '— Tetraphenylenobiimidazole, 2, 2' — Bis (2 ethoxyphenyl) 4, 5, A ', 5'-tetraphenylbiimidazole and 2,2'-bis (2,6 difluorophenyl) 4, 5, A ', 5'-tetraphenylbiimidazole. These compounds are available as commercial products. it can.
[0063] 上記ビイミダゾール化合物の含有量は、感光層の固形分に対して 0. 05質量%〜2 0. 0質量%が好ましぐ 1. 0質量%〜; 10. 0質量%が特に好ましい。また前記の一 般式(1)で表される色素とビイミダゾール化合物との含有量の比(色素/ビイミダゾー ル(質量比))は、 0. 0;!〜 20が好ましく特に 0. 1〜; 10が好ましい。  [0063] The content of the biimidazole compound is preferably 0.05% by mass to 20.0% by mass with respect to the solid content of the photosensitive layer. 1.0% by mass to 10.0% by mass is particularly preferable. preferable. The ratio of the content of the dye represented by the general formula (1) and the biimidazole compound (dye / biimidazole (mass ratio)) is preferably 0.0;! -20, and particularly preferably 0.1- 10 is preferred.
[0064] 重合開始剤としては、ビイミダゾール化合物以外に、他の重合開始剤を併用しても よい。  [0064] As the polymerization initiator, in addition to the biimidazole compound, another polymerization initiator may be used in combination.
[0065] これらの重合開始剤としては、例えばチタノセン化合物、モノアルキルトリアリールポ レート化合物、鉄アレーン錯体化合物、ポリハロゲン化合物などが挙げられる。  [0065] Examples of these polymerization initiators include titanocene compounds, monoalkyltriaryl phosphate compounds, iron arene complex compounds, polyhalogen compounds, and the like.
[0066] チタノセン化合物としては、特開昭 63— 41483、特開平 2— 291に記載される化合 物等が挙げられる力 更に好ましい具体例としては、ビス(シクロペンタジェニル) T i ジ一クロライド、ビス(シクロペンタジェニル) Ti ビス一フエニル、ビス(シクロぺ ンタジェニル)一 Ti ビス一 2, 3, 4, 5, 6 ペンタフルオロフェニル、ビス(シクロぺ ンタジェニル)一 Ti ビス一 2, 3, 5, 6 テトラフルオロフェニル、ビス(シクロペンタ ジェニル)一 Ti ビス一 2, 4, 6 トリフルオロフェニル、ビス(シクロペンタジェニル) — Ti ビス一 2, 6 ジフルオロフェニル、ビス(シクロペンタジェ二ル)一 Ti ビス一 2, 4ージフルオロフェニル、ビス(メチルシクロペンタジェニル) Ti—ビス 2, 3, 4 , 5, 6 ペンタフルオロフェニル、ビス(メチルシクロペンタジェ二ル)一 Ti ビス一 2 , 3, 5, 6—テトラフルオロフェニル、ビス(メチルシクロペンタジェ二ル)一 Ti ビス一 2, 6 ジフルオロフェニノレ(IRUGACURE727L:チバ ·スペシャルティ ·ケミカルズ 社製)、ビス(シクロペンタジェニル)一ビス(2, 6 ジフルォロ一 3— (ピリ 1—ィル) フエニル)チタニウム(IRUGACURE784:チノ 'スペシャルティ ·ケミカルズ社製)、 ビス(シクロペンタジェ二ノレ) ビス(2, 4, 6 トリフノレオロー 3 (ピリー 1ーィノレ)フエ 二ノレ)チタニウムビス(シクロペンタジェニル) ビス(2, 4, 6 トリフルオロー 3—(2 - 5—ジメチルピリ 1—ィル)フエニル)チタニウム等が挙げられる。 [0066] Examples of the titanocene compound include compounds described in JP-A-63-41483 and JP-A-2-291. More preferable specific examples include bis (cyclopentagenyl) Ti dimonochloride. Bis (cyclopentadienyl) Ti bis monophenyl, bis (cyclopentaenyl) ti Ti bis 1, 3, 4, 5, 6 pentafluorophenyl, bis (cyclopentaenyl) ti Ti bis 1, 3, 5, 6 Tetrafluorophenyl, bis (cyclopenta Genyl) 1 Ti bis 1, 2, 4, 6 trifluorophenyl, bis (cyclopentaenyl) — Ti bis 1, 2, 6 difluorophenyl, bis (cyclopentadienyl) 1 Ti bis 1, 2, 4-difluorophenyl Bis (methylcyclopentagenyl) Ti-bis 2,3,4,5,6 pentafluorophenyl, bis (methylcyclopentadenyl) one Ti bis-1,2,5,5,6-tetrafluorophenyl, Bis (methylcyclopentadienyl) 1 Ti Bis 1 2, 6 Difluorophenol (IRUGACURE727L: Ciba Specialty Chemicals), Bis (cyclopentagenyl) 1 Bis (2, 6 Difluoro 1- 3 1—yl) phenyl) titanium (IRUGACURE784: Tino 'Specialty Chemicals), bis (cyclopentageninore) bis (2, 4, 6 trifnorero 3 (Pilly 1- Inole) Fe Ninore) Titanium bis (cyclopentagenyl) bis (2, 4, 6 trifluoro-3- (2-5-dimethylpyridyl) phenyl) titanium and the like.
[0067] モノアルキルトリアリールポレート化合物としては、特開昭 62— 150242、特開昭 62  [0067] Examples of the monoalkyl triaryl porate compound include JP-A-62-150242 and JP-A-62.
143044に記載される化合物等挙げられるが、更に好ましい具体例としては、テト ラー n ブチルアンモニゥム ·η ブチルートリナフタレン 1ーィルーボレート、テトラ η ブチルアンモニゥム ·η ブチルートリフエ二ルーボレート、テトラー η ブチノレ アンモニゥム ·η ブチルートリー(4— tert ブチルフエニル)ーボレート、テトラー n ーブチルアンモニゥム ·η へキシルートリー(3—クロロー 4 メチルフエニル)ーボレ ート、テトラー η ブチルアンモニゥム ·η へキシルートリー(3—フルオロフェニル) ーボレート等が挙げられる。  The compounds described in No. 143044 and the like, but more preferred specific examples include tetral n butylammonium η butyl-trinaphthalene 1-rubolate, tetra η butylammonium η butyl-triphenyl rubrate, tetra η Butinoleammonium η butyltolylate (4-tert-butylphenyl) -borate, tetra-n-butylammonium η-hexylate (3-chloro-4-methylphenyl) -borate, tetra-η butylammonium η-hexoxyrootry (3-fluorophenyl) ) -Borate and the like.
[0068] 鉄アレーン錯体としては、特開昭 59— 219307に記載される化合物等挙げられる ヽ更に好ましい具体例としては、 η ベンゼン一( 7]ーシクロペンタジェニル)鉄へ キサフルォロホスフェート、 7]—クメン一( 7]—シクロペンタジェ二ノレ)鉄へキサフルォ 口ホスフェート、 7]—フルオレン一(7]—シクロペンタジェ二ノレ)鉄へキサフルォロホス フェート、 J] ナフタレン一(7]—シクロペンタジェ二ノレ)鉄へキサフノレオ口ホスフエ一 ト、 Τ]ーキシレン一(ηーシクロペンタジェ二ノレ)鉄へキサフノレオ口ホスフェート、 η ベンゼン一( 7]ーシクロペンタジェニル)鉄テトラフルォロボレート等が挙げられる。  [0068] Examples of the iron arene complex include compounds described in JP-A-59-219307. More preferred specific examples include η benzene mono (7) -cyclopentagenenyl) iron hexafluorophosphate 7] -cumene mono (7) -cyclopentageninole) iron hexafluorophosphate, 7] -fluorene mono (7) -cyclopentageninole) iron hexafluorophosphate, J] naphthalene mono (7)- Cyclopentagenino) iron hexanoleophosphate phosphate, Τ] -xylene mono (η-cyclopentageninole) iron hexanoleophosphate, η benzene mono (7) -cyclopentagenenyl) iron tetrafluorobo Rate and the like.
[0069] ポリハロゲン化合物としては、トリハロゲンメチル基、ジハロゲンメチル基又はジハロ ゲンメチレン基を有する化合物が好ましく用いられ、特に下記一般式(1)で表される ノ、ロゲン化合物及び上記基がォキサジァゾール環に置換した化合物が好ましく用い られる。 [0069] As the polyhalogen compound, a compound having a trihalogenmethyl group, a dihalogenmethyl group or a dihalogenmethylene group is preferably used, and particularly represented by the following general formula (1). And rosogen compounds and compounds in which the above group is substituted on the oxadiazole ring are preferably used.
[0070] この中でもさらに、下記一般式(2)で表されるハロゲン化合物が特に好ましく用いら れる。  [0070] Of these, halogen compounds represented by the following general formula (2) are particularly preferably used.
[0071] 一般式(1 ) R1— CY—(C =〇)一 R2 [0071] General formula (1) R 1 — CY— (C = ○) one R 2
式中、 R1は、水素原子、ハロゲン原子、アルキル基、ァリール基、ァシル基、アルキ ノレスルホニル基、ァリールスルホニル基、イミノスルホニル基またはシァノ基を表す。 In the formula, R 1 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an acyl group, an alkenylsulfonyl group, an arylsulfonyl group, an iminosulfonyl group, or a cyan group.
R2は一価の置換基を表す。 R1と R2が結合して環を形成してもかまわない。 Yはハロゲ ン原子を表す。 R 2 represents a monovalent substituent. R 1 and R 2 may combine to form a ring. Y represents a halogen atom.
[0072] 一般式(2) CY—(C =〇)一 X— R3 [0072] General Formula (2) CY— (C = 〇) One X— R 3
式中、 R3は、一価の置換基を表す。 Xは、 O NR4 を表す。 R4は、水素原 子、アルキル基を表す。 R3と R4が結合して環を形成しても力、まわない。 Yはハロゲン 原子を表す。これらの中でも特にポリハロゲンァセチルアミド基を有するものが好まし く用いられる。 In the formula, R 3 represents a monovalent substituent. X represents O NR 4. R 4 represents a hydrogen atom or an alkyl group. Even if R 3 and R 4 combine to form a ring, there is no force. Y represents a halogen atom. Of these, those having a polyhalogenacetylamide group are particularly preferred.
[0073] 又、ポリハロゲンメチル基がォキサジァゾール環に置換した化合物も好ましく用いら れる。さらに、特開平 5— 34904号公報、同 8— 240909号公報に記載のォキサジァ ゾール化合物も好ましく用いられる。  [0073] A compound in which a polyhalogenmethyl group is substituted on the oxadiazole ring is also preferably used. Further, oxaziazole compounds described in JP-A-5-34904 and 8-240909 are also preferably used.
[0074] その他に任意の重合開始剤の併用が可能である。例えば J.コーサ一 (J. Kosar) 著「ライト ·センシティブ ·システムズ」第 5章に記載されるようなカルボニル化合物、有 機硫黄化合物、過硫化物、レドックス系化合物、ァゾ並びにジァゾ化合物、ハロゲン 化合物、光還元性色素などが挙げられる。更に具体的な化合物は英国特許 1 , 459 , 563号に開示されている。  [0074] In addition, any polymerization initiator can be used in combination. For example, carbonyl compounds, organic sulfur compounds, persulfides, redox compounds, azo and diazo compounds, halogens, as described in Chapter 5 of “Light Sensitive Systems” by J. Kosar. Examples thereof include compounds and photoreducible dyes. More specific compounds are disclosed in British Patent 1,459,563.
[0075] 即ち、併用が可能な重合開始剤としては、次のようなものを使用することができる。  That is, as a polymerization initiator that can be used in combination, the following can be used.
[0076] ベンゾインメチルエーテル、ベンゾイン一 i—プロピルエーテル、 α , α—ジメトキシ - a—フエニルァセトフエノン等のベンゾイン誘導体;ベンゾフエノン、 2, 4 ジクロロ ベンゾフエノン、 o ベンゾィル安息香酸メチル、 4, Α' ビス(ジメチルァミノ)ベンゾ フエノン等のベンゾフエノン誘導体; 2—クロ口チォキサントン、 2— i—プロピルチォキ サントン等のチォキサントン誘導体; 2—クロ口アントラキノン、 2—メチルアントラキノン 等のアントラキノン誘導体; N—メチルアタリドン、 N—ブチルアタリドン等のアタリドン 誘導体; α , a—ジエトキシァセトフエノン、ベンジル、フルォレノン、キサントン、ゥラ ニノレイ匕合物の他、特公日召 59— 1281号、同 61— 9621号ならびに特開日召 60— 601 04号記載のトリァジン誘導体;特開昭 59— 1504号、同 61— 243807号記載の有機 過酸化物;特公昭 43— 23684号、同 44— 6413号、同 44— 6413号、同 47— 160 4号ならびに米国特許 3, 567, 453号記載のジァゾニゥム化合物;米国特許 2, 848 , 328号、同 2, 852, 379号ならびに同 2 , 940, 853号記載の有機アジドィ匕合物; 特公日召 36— 22062b号、同 37— 13109号、同 38— 18015号ならびに同 45— 961 0号記載の o—キノンジアジド類;特公日召 55— 39162号、特開日召 59— 14023号なら びに「マクロモレキュルス(Macromolecules)」10巻, 1307頁(1977年)記載の各 種ォニゥム化合物;特開昭 59— 142205号記載のァゾ化合物;特開平 1― 54440号 、ヨーロッパ特許 109, 851号、同 126 , 712号ならびに「ジャーナル'ォブ 'イメージ ング.サイエンス (J. Imag. Sci. )」30巻, 174頁(1986年)記載の金属アレン錯体; 特願平 4— 56831号(特開平 5— 213861号)及び同 4— 89535号(特開平 5— 255 347号)記載の(ォキソ)スルホニゥム有機硼素錯体;「コーディネーション.ケミストリー •レビュー(Coordination Chemistry Review)」84巻, 85〜277頁(1988年)な らびに特開平 2— 182701号記載のルテニウム等の遷移金属を含有する遷移金属 錯体;特開平 3— 209477号記載の 2, 4 , 5—トリアリールイミダゾールニ量体;四臭 化炭素、特開昭 59— 107344号記載の有機ハロゲン化合物、等。 [0076] Benzoin derivatives such as benzoin methyl ether, benzoin i-propyl ether, α, α-dimethoxy-a-phenylacetophenone; benzophenone, 2,4 dichlorobenzophenone, o methyl benzoylbenzoate, 4, Α ' Benzophenone derivatives such as bis (dimethylamino) benzophenone; 2-thiaxanthone derivatives such as 2-clothiaxanthone, 2-i-propylthixanthone; 2-clothalanthraquinones, 2-methylanthraquinones Anthraquinone derivatives such as N-methyl attaridone, N-butyl attaridone etc. Ataridon derivatives such as α, a-diethoxyacetophenone, benzyl, fluorenone, xanthone, ura ninolei compound, and Japanese special day Triazine derivatives described in 59-1281, 61-9621 and JP-A-60-60104; organic peroxides described in JP-A-59-1504 and 61-243807; , 44-6413, 44-6413, 47-1604 and US Patent 3,567,453; US Patents 2,848,328, 2,852,379 And organic azide compounds described in JP 2,940,853; o-quinonediazides described in JP-B-36-22062b, 37-13109, 38-18015 and 45-9610; Special Japanese Day Call 55-39162, Japanese Patent Laid-Open No. 59-14023 and “Macro Molecules (M acromolecules), Vol. 10, p. 1307 (1977); various onium compounds; JP-A-59-142205, azo-compounds; JP-A-1-54440, European Patents 109,851, 126,712 No. and "Journal 'Ob' Imaging Science (J. Imag. Sci.)", Volume 30, page 174 (1986); Japanese Patent Application No. 4-56831 (Japanese Patent Laid-Open No. 5-213861) ) And 4-89535 (Japanese Patent Laid-Open No. 5-255 347); “Oxosulfonium organoboron complex”; “Coordination Chemistry Review”, 84, 85-277 (1988). And transition metal complexes containing a transition metal such as ruthenium described in JP-A-2-182701; 2,4,5-triarylimidazole dimer described in JP-A-3-209477; carbon tetrafluoride, JP Organic halogen compounds described in Sho 59-107344, etc.
[0077] 重合開始剤の含有量 (総量)は、感光層の固形分に対して 0. 05質量%〜20. 0質 量%が好ましぐ 1. 0質量%〜; 10. 0質量%が特に好ましい。  [0077] The content (total amount) of the polymerization initiator is preferably 0.05% by mass to 20.0% by mass with respect to the solid content of the photosensitive layer. 1.0% by mass to 10.0% by mass Is particularly preferred.
[0078] (分光増感剤)  [0078] (Spectral sensitizer)
本発明に係る感光層は、分光増感剤として、少なくとも吸収極大波長が 350〜450 nmにある分光増感剤を含有することが好まし!/、。  The photosensitive layer according to the present invention preferably contains at least a spectral sensitizer having an absorption maximum wavelength of 350 to 450 nm as a spectral sensitizer! /.
[0079] 当該分光増感剤としては、例えばシァニン、メロシアニン、ポルフィリン、スピロ化合 物、フエ口セン、フルオレン、フルギド、イミダゾーノレ、ペリレン、フエナジン、フエノチア ジン、アタリジン、アタリドン、ァゾ化合物、ジフエニルメタン、トリフエニルメタン、トリフ ェニルァミン、クマリン誘導体、キナクリドン、インジゴ、スチリル、ピリリウム化合物、ピ ロメテン化合物、ピラゾロトリアゾール化合物、ベンゾチアゾール化合部、バルビツー ル酸誘導体、チォバルビツール酸誘導体、ケトアルコールボレート錯体、等が挙げら れる。 [0079] The spectral sensitizer includes, for example, cyanine, merocyanine, porphyrin, spiro compound, Hue mouth sen, fluorene, fulgide, imidazonole, perylene, phenazine, phenothiazine, atalidine, attaridone, azo compound, diphenylmethane, triflic acid. Enylmethane, triphenylamine, coumarin derivatives, quinacridone, indigo, styryl, pyrylium compounds, Examples include lomethene compounds, pyrazolotriazole compounds, benzothiazole compounds, barbituric acid derivatives, thiobarbituric acid derivatives, and ketoalcohol borate complexes.
[0080] 上記のクマリン誘導体としては、例えば、特開平 8— 129258号公報の B—1から B —22のクマリン誘導体、特開 2003— 21901号公報の D—1力、ら D— 32のクマリン誘 導体、特開 2002— 363206号公幸の 1力、ら 21のクマジン誘導体、特開 2002— 363 207号公幸の 1力、ら 40のクマリン誘導体、特開 2002— 363208号公幸の 1力、ら 34の クマリン誘導体、特開 2002— 363209号公報の 1から 56のクマリン誘導体等が挙げ られ、好ましく使用可能である。  [0080] Examples of the above-mentioned coumarin derivatives include the coumarin derivatives B-1 to B-22 in JP-A-8-129258, the D-1 force of JP2003-21901, and the coumarins of D-32. Inductives, one force of JP 2002-363206 Koyuki, et al. 21 Coumadin derivatives, one force of JP 2002-363 207 Koyuki, et al. 40 coumarin derivatives, one force of JP 2002-363208 Koyuki, et al. 34 coumarin derivatives, 1 to 56 coumarin derivatives of JP-A-2002-363209 and the like can be mentioned, and these can be preferably used.
[0081] また、他の好ましく使用できる色素としては、例えば特開 2000— 98605号、特開 2 000— 147763号、特開 2000— 206690号、特開 2000— 258910号、特開 2000 — 309724号、特開 2001— 042524号、特開 2002— 202598号、特開 2000— 22 1790号に記載の分光増感剤等が挙げられる。  [0081] Other preferable dyes that can be used include, for example, JP-A 2000-98605, JP-A 2000-147763, JP-A 2000-206690, JP-A 2000-258910, and JP-A 2000-309724. And spectral sensitizers described in JP-A No. 2001-042524, JP-A No. 2002-202598, JP-A No. 2000-22 1790, and the like.
[0082] (高分子結合材)  [0082] (Polymer binder)
本発明に係る高分子結合材は、感光層に含まれる成分を支持体上に担持し得るも のであり、高分子結合材としては、アクリル系重合体、ポリビュルプチラール樹脂、ポ リウレタン樹脂、ポリアミド樹脂、ポリエステル樹脂、エポキシ樹脂、フエノール樹脂、 ポリカーボネート樹脂、ポリビュルブチラール樹脂、ポリビュルホルマール樹脂、シェ ラック、その他の天然樹脂等が使用出来る。また、これらを 2種以上併用しても力、まわ ない。  The polymer binder according to the present invention can carry the components contained in the photosensitive layer on a support. Examples of the polymer binder include acrylic polymers, polybutylpropylene resins, polyurethane resins, Polyamide resin, polyester resin, epoxy resin, phenol resin, polycarbonate resin, polybutyl butyral resin, polybulal formal resin, shellac, and other natural resins can be used. Also, using two or more of these in combination does not help.
[0083] 好ましくはアクリル系のモノマーの共重合によって得られるビュル系共重合が好まし い。さらに、高分子結合材の共重合組成として、(a)カルボキシノレ基含有モノマー、 ( b)メタクリル酸アルキルエステル、またはアクリル酸アルキルエステルの共重合体で あることが好ましい。  [0083] Preferably, a bull copolymer obtained by copolymerization of an acrylic monomer is preferred. Furthermore, the copolymer composition of the polymer binder is preferably a copolymer of (a) a carboxylene group-containing monomer, (b) a methacrylic acid alkyl ester, or an acrylic acid alkyl ester.
[0084] カルボキシル基含有モノマーの具体例としては、 α , /3 —不飽和カルボン酸類、例 えばアクリル酸、メタクリル酸、マレイン酸、無水マレイン酸、ィタコン酸、無水ィタコン 酸等が挙げられる。その他、フタル酸と 2—ヒドロキシメタタリレートのハーフエステル 等のカルボン酸も好ましい。 [0085] メタクリル酸アルキルエステル、アクリル酸アルキルエステルの具体例としては、メタ クリル酸メチル、メタクリル酸ェチル、メタクリル酸プロピル、メタクリル酸ブチル、メタク リル酸ァミル、メタクリル酸へキシル、メタクリル酸へプチル、メタクリル酸オタチル、メタ クリル酸ノエル、メタクリル酸デシル、メタクリル酸ゥンデシル、メタクリル酸ドデシル、ァ クリル酸メチル、アクリル酸ェチル、アクリル酸プロピル、アクリル酸ブチル、アクリル酸 ァミル、アクリル酸へキシル、アクリル酸へプチル、アクリル酸ォクチル、アクリル酸ノニ ノレ、アクリル酸デシル、アクリル酸ゥンデシル、アクリル酸ドデシル等の無置換アルキ ルエステルの他、メタクリル酸シクロへキシル、アクリル酸シクロへキシル等の環状ァ ノレキルエステルや、メタクリル酸ベンジル、メタクリル酸ー2—クロロェチル、 N, N—ジ メチルアミノエチルメタタリレート、グリシジルメタタリレート、アクリル酸ベンジル、アタリ ノレ酸ー2—クロロェチル、 N, N—ジメチルアミノエチルアタリレート、グリシジルアタリ レート等の置換アルキルエステルも挙げられる。 [0084] Specific examples of the carboxyl group-containing monomer include α, / 3-unsaturated carboxylic acids such as acrylic acid, methacrylic acid, maleic acid, maleic anhydride, itaconic acid, and itaconic anhydride. In addition, carboxylic acids such as half esters of phthalic acid and 2-hydroxymetatalylate are also preferred. [0085] Specific examples of the alkyl methacrylate and the alkyl acrylate include methyl methacrylate, ethyl acetate, propyl methacrylate, butyl methacrylate, amyl methacrylate, hexyl methacrylate, heptyl methacrylate, To octyl methacrylate, Noel methacrylate, decyl methacrylate, undecyl methacrylate, dodecyl methacrylate, methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, amyl acrylate, hexyl acrylate, acrylic acid In addition to unsubstituted alkyl esters such as butyl, octyl acrylate, nonanol acrylate, decyl acrylate, undecyl acrylate, dodecyl acrylate, and the like, cyclic alcohols such as cyclohexyl methacrylate and cyclohexyl acrylate Ester, benzyl methacrylate, methacrylate-2-chloroethyl, N, N-dimethylaminoethyl methacrylate, glycidyl methacrylate, benzyl acrylate, acrylate--2-chloroethyl, N, N-dimethylaminoethyl Examples thereof also include substituted alkyl esters such as acrylate and glycidyl acrylate.
[0086] さらに、高分子結合材は、共重合モノマーとして、下記(1)〜(; 14)に記載のモノマ 一等を用いる事が出来る。  [0086] Further, in the polymer binder, the monomers described in the following (1) to (; 14) can be used as a copolymerization monomer.
[0087] 1)芳香族水酸基を有するモノマー、例えば o—(又は p—, m—)ヒドロキシスチレン 、 o— (又は p— , m—)ヒドロキシフエニルアタリレート等。  [0087] 1) Monomers having an aromatic hydroxyl group, such as o- (or p-, m-) hydroxystyrene, o- (or p-, m-) hydroxyphenyl acrylate.
[0088] 2)脂肪族水酸基を有するモノマー、例えば 2—ヒドロキシェチルアタリレート、 2—ヒ ドロキシェチルメタタリレート、 N—メチロールアクリルアミド、 N—メチロールメタクリノレ アミド、 4ーヒドロキシブチルメタタリレート、 5—ヒドロキシペンチルアタリレート、 5—ヒド ロキシペンチルメタタリレート、 6—ヒドロキシへキシルアタリレート、 6—ヒドロキシへキ シルメタタリレート、 N- (2—ヒドロキシェチル)アクリルアミド、 N- (2—ヒドロキシェチ ル)メタクリルアミド、ヒドロキシェチルビュルエーテル等。  [0088] 2) Monomers having an aliphatic hydroxyl group, such as 2-hydroxyethyl talylate, 2-hydroxychetyl methacrylate, N-methylol acrylamide, N-methylol methacrylate, 4-hydroxybutyl methacrylate , 5-hydroxypentyl acrylate, 5-hydroxypentyl methacrylate, 6-hydroxyhexyl acrylate, 6-hydroxy hexyl methacrylate, N- (2-hydroxyethyl) acrylamide, N- (2 —Hydroxyethyl) methacrylamide, hydroxyethyl butyl ether and the like.
[0089] 3)アミノスルホニル基を有するモノマー、例えば m— (又は p—)アミノスルホニルフ ェニルメタタリレート、 m- (又は p—)アミノスルホユルフェニルアタリレート、 N— (p— アミノスルホユルフェニル)メタクリルアミド、 N— (p—アミノスルホユルフェニル)アタリ ノレアミド等。  [0089] 3) A monomer having an aminosulfonyl group, for example, m- (or p-) aminosulfonylphenyl metatalylate, m- (or p-) aminosulfuryl phenyl acrylate, N- (p- aminosulfuryl) Phenyl) methacrylamide, N- (p-aminosulfurphenyl) atalinoleamide and the like.
[0090] 4)スルホンアミド基を有するモノマー、例えば N— (p—トルエンスルホニル)アクリル アミド、 N— (p—トルエンスルホニル)メタクリルアミド等。 [0091] 5)アクリルアミド又はメタクリルアミド類、例えばアクリルアミド、メタクリルアミド、 N— ェチルアクリルアミド、 N へキシルアクリルアミド、 N シクロへキシルアクリルアミド、 N フエニルアクリルアミド、 N— (4—ニトロフエ二ノレ)アクリルアミド、 N ェチル N —フエニルアクリルアミド、 N— (4—ヒドロキシフエ二ノレ)アクリルアミド、 N— (4—ヒドロ キシフエ二ノレ)メタクリノレアミド等。 [0090] 4) Monomers having a sulfonamide group, such as N- (p-toluenesulfonyl) acrylamide, N- (p-toluenesulfonyl) methacrylamide and the like. [0091] 5) Acrylamide or methacrylamides, such as acrylamide, methacrylamide, N-ethyl acrylamide, N-hexyl acrylamide, N cyclohexyl acrylamide, N-phenyl acrylamide, N- (4-nitrophenyl) acrylamide, N-ethyl N-phenyl acrylamide, N- (4-hydroxyphenyl) acrylamide, N- (4-hydroxyphenyl) methacrylolamide and the like.
[0092] 6)弗化アルキル基を含有するモノマー、例えばトリフルォロェチルアタリレート、トリ ロピノレメタタリレート、オタタフノレォロペンチノレアタリレート、オタタフノレォロペンチノレメタ タリレート、ヘプタデカフルォロデシルメタタリレート、 N ブチルー N— (2—アタリ口  [0092] 6) Monomers containing fluorinated alkyl groups, such as trifluoroethyl allylate, tri-lopinole methacrylate, otata foleno pentenorea taleate, otaf foleno pentenore methacrylate, hepta Decafluorodecyl metatalylate, N Butyl N— (2—Atari mouth
[0093] 7)ビュルエーテル類、例えば、ェチルビュルエーテル、 2 クロロェチルビニルェ ーテノレ、プロピノレビニノレエーテノレ、ブチノレビニノレエーテノレ、オタチノレビニノレエーテノレ[0093] 7) Butyl ethers, for example, ethyl butyl ether, 2 chloroethyl vinyl ethereole, propinorevininoreethenore, butinorevininoreethenore, otachinolevininoreethenore
、フエ二ルビニルエーテル等。 , Vinyl vinyl ether, etc.
[0094] 8)ビュルエステル類、例えばビュルアセテート、ビュルクロ口アセテート、ビュルブ チレート、安息香酸ビュル等。 [0094] 8) Bull esters, for example, bull acetate, bull black mouth acetate, bull butyrate, bull benzoate and the like.
[0095] 9)スチレン類、例えばスチレン、メチルスチレン、クロロメチルスチレン等。 [0095] 9) Styrenes such as styrene, methylstyrene, chloromethylstyrene and the like.
[0096] 10)ビニルケトン類、例えばメチルビ二ルケトン、ェチルビ二ルケトン、プロピルビニ ノレケトン、フエ二ルビ二ルケトン等。 [0096] 10) Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinylol ketone, and phenyl vinyl ketone.
[0097] 11)ォレフィン類、例えばエチレン、プロピレン、 iーブチレン、ブタジエン、イソプレ ン等。 [0097] 11) Olefins, such as ethylene, propylene, i-butylene, butadiene, and isoprene.
[0098] 12) N ビュルピロリドン、 N ビュルカルバゾール、 4—ビュルピリジン等。  [0098] 12) N-Bulpyrrolidone, N-Bulcarbazole, 4-Burpyridine and the like.
[0099] 13)シァノ基を有するモノマー、例えばアクリロニトリル、メタタリロニトリル、 2 ペン テン二トリル、 2 メチルー 3 ブテン二トリル、 2 シァノエチルアタリレート、 o (又 は m—, p )シァノスチレン等。 [0099] 13) Monomers having a cyano group, such as acrylonitrile, methatalonitrile, 2-pentenenitryl, 2-methyl-3-butenenitryl, 2-cyanoethyl acrylate, o (or m-, p) cyanostyrene, etc. .
[0100] 14)アミノ基を有するモノマー、例えば N, N ジェチルアミノエチルメタタリレート、 N, N ジメチルアミノエチルアタリレート、 N, N ジメチルアミノエチルメタタリレート 、ポリブタジエンウレタンアタリレート、 N, N ジメチルァミノプロピルアクリルアミド、 N , N ジメチルアクリルアミド、アタリロイルモルホリン、 N— i プロピルアクリルアミド、 N, N ジェチルアクリルアミド等。 [0100] 14) Monomers having an amino group, for example, N, N dimethylaminoethyl methacrylate, N, N dimethylaminoethyl acrylate, N, N dimethylaminoethyl methacrylate, polybutadiene urethane acrylate, N, N Dimethylaminopropyl acrylamide, N, N dimethyl acrylamide, Ataliroyl morpholine, N—i propyl acrylamide, N, N Jetylacrylamide, etc.
[0101] さらにこれらのモノマーと共重合し得る他のモノマーを共重合してもよい。 [0101] Furthermore, other monomers that can be copolymerized with these monomers may be copolymerized.
[0102] さらに、高分子結合材は、側鎖にカルボキシル基および重合性二重結合を有する ビュル系重合体であることが好ましい。例えば、上記ビュル系共重合体の分子内に 存在するカルボキシル基に、分子内に (メタ)アタリロイル基とエポキシ基を有する化 合物を付加反応させる事によって得られる、不飽和結合含有ビュル系共重合体も高 分子結合材として好ましい。 [0102] Furthermore, the polymer binder is preferably a bull polymer having a carboxyl group and a polymerizable double bond in the side chain. For example, an unsaturated bond-containing bulle copolymer obtained by addition-reacting a compound having a (meth) atalyloyl group and an epoxy group in a molecule to a carboxyl group present in the bulle copolymer molecule. Polymers are also preferred as high molecular binders.
[0103] 分子内に不飽和結合とエポキシ基を共に含有する化合物としては、具体的にはグ リシジルアタリレート、グリシジルメタタリレート、特開平 11— 271969号に記載のある エポキシ基含有不飽和化合物等が挙げられる。また、上記ビュル系重合体の分子内 に存在する水酸基に、分子内に (メタ)アタリロイル基とイソシァネート基を有する化合 物を付加反応させる事によって得られる、不飽和結合含有ビュル系共重合体も高分 子結合材として好ましい。分子内に不飽和結合とイソシァネート基を共に有する化合 物としては、ビュルイソシァネート、(メタ)アクリルイソシァネート、 2— (メタ)アタリロイ ノレォキシェチノレイソシァネート、 m—または p—イソプロぺニノレー α , α ' —ジメチノレ ベンジルイソシァネートが好ましぐ(メタ)アクリルイソシァネート、 2— (メタ)アタリロイ ノレォキシェチルイソシァネート等が挙げられる。 [0103] Specific examples of compounds containing both an unsaturated bond and an epoxy group in the molecule include glycidyl acrylate, glycidyl methacrylate, and epoxy group-containing unsaturated compounds described in JP-A-11-271969. Compounds and the like. There is also an unsaturated bond-containing bulle copolymer obtained by addition-reacting a compound having a (meth) attalyloyl group and an isocyanate group in the molecule to the hydroxyl group present in the bulle polymer. Preferred as a polymer binder. Compounds having both an unsaturated bond and an isocyanate group in the molecule include burisocyanate, (meth) acrylic isocyanate, 2— (meth) atariloy noroxechinoreisocyanate, m—or p —Isopropeninole α, α ′ — Dimethinole benzyl isocyanate is preferred (meth) acrylic isocyanate, 2- (meth) atariloy noroxetyl isocyanate, and the like.
[0104] 側鎖にカルボキシル基および重合性二重結合を有するビュル系重合体は、全高 分子結合剤において、 50〜; 100質量%であることが好ましぐ 100質量%であること がより好ましい。  [0104] The bull polymer having a carboxyl group and a polymerizable double bond in the side chain is preferably 50 to 100% by mass, more preferably 100% by mass in the total high molecular binder. .
[0105] 感光層中における高分子結合材の含有量は、 10〜90質量%の範囲が好ましぐ 1 [0105] The content of the polymer binder in the photosensitive layer is preferably in the range of 10 to 90% by mass 1
5〜70質量%の範囲が更に好ましぐ 20〜50質量%の範囲で使用することが感度 の面から特に好ましい。 The range of 5 to 70% by mass is more preferred. The use in the range of 20 to 50% by mass is particularly preferred from the viewpoint of sensitivity.
[0106] (各種添加剤) [0106] (Various additives)
本発明に係る感光層には、上記した成分の他に、感光性平版印刷版材料の製造 中あるいは保存中において重合可能なエチレン性二重結合単量体の不要な重合を 阻止するために、重合防止剤を添加することが望まし!/、。  In the photosensitive layer according to the present invention, in addition to the above-described components, in order to prevent unnecessary polymerization of an ethylenic double bond monomer that can be polymerized during the production or storage of the photosensitive lithographic printing plate material, It is desirable to add a polymerization inhibitor!
[0107] 適当な重合防止剤としてはハイドロキノン、 ρ メトキシフエノール、ジ tーブチノレ p クレゾ一ノレ、ピロガローノレ、 tーブチノレ力テコーノレ、ベンゾキノン、 4, 4' ーチォ ビス(3 メチルー 6— t ブチルフエノール)、 2, 2' ーメチレンビス(4ーメチルー 6 —t ブチルフエノール)、 N ニトロソフエニルヒドロキシルァミン第一セリウム塩、 2 —tーブチノレー 6—(3— t ブチルー 2 ヒドロキシー5 メチルベンジル)ー4ーメチ ルフエニルアタリレート等が挙げられる。 [0107] Suitable polymerization inhibitors include hydroquinone, ρ methoxyphenol, di-tert-butylene. p Crezo monore, pyrogalonore, t-butinore force Teconole, benzoquinone, 4, 4'-thiobis (3 methyl-6-t butylphenol), 2, 2'-methylenebis (4-methyl-6-t butylphenol), N nitrosophenyl hydroxyl Amine primary cerium salt, 2-t-butynole 6- (3-t-butyl-2-hydroxy-5-methylbenzyl) -4-methylphenyl acrylate.
[0108] 重合防止剤の添加量は、感光層の全固形分の質量に対して、約 0. 01 %〜約 5% が好ましい。また必要に応じて、酸素による重合阻害を防止するためにべヘン酸や ベヘン酸アミドのような高級脂肪酸誘導体等を添加したり、塗布後の乾燥の過程で 感光性層の表面に偏在させてもよい。高級脂肪酸誘導体の添加量は、全組成物の 約 0. 5%〜約 10%が好ましい。  [0108] The addition amount of the polymerization inhibitor is preferably about 0.01% to about 5% with respect to the total solid content of the photosensitive layer. If necessary, higher fatty acid derivatives such as behenic acid and behenic acid amide may be added to prevent polymerization inhibition by oxygen, or it may be unevenly distributed on the surface of the photosensitive layer during the drying process after coating. Also good. The amount of the higher fatty acid derivative added is preferably from about 0.5% to about 10% of the total composition.
[0109] また、着色剤も使用することができ、着色剤としては、市販のものを含め従来公知の ものが好適に使用できる。例えば、改訂新版「顔料便覧」, 日本顔料技術協会編 (誠 文堂新光社)、カラーインデックス便覧等に述べられているものが挙げられる。  [0109] In addition, a colorant can also be used, and as the colorant, conventionally known ones including commercially available ones can be suitably used. For example, those described in the revised new edition “Handbook of Pigments”, edited by the Japan Pigment Technology Association (Seibundo Shinkosha), Color Index Handbook, etc.
[0110] 顔料の種類としては、黒色顔料、黄色顔料、赤色顔料、褐色顔料、紫色顔料、青色 顔料、緑色顔料、蛍光顔料、金属粉顔料等が挙げられる。具体的には、無機顔料( 二酸化チタン、カーボンブラック、グラフアイト、酸化亜鉛、プルシアンブルー、硫化力 ドミゥム、酸化鉄、ならびに鉛、亜鉛、ノ リウム及びカルシウムのクロム酸塩等)及び有 機顔料(ァゾ系、チォインジゴ系、アントラキノン系、アントアンスロン系、トリフェンジォ キサジン系の顔料、バット染料顔料、フタロシアニン顔料及びその誘導体、キナタリド ン顔料等)が挙げられる。  [0110] Examples of pigments include black pigments, yellow pigments, red pigments, brown pigments, purple pigments, blue pigments, green pigments, fluorescent pigments, and metal powder pigments. Specific examples include inorganic pigments (titanium dioxide, carbon black, graphite, zinc oxide, Prussian blue, sulfidizing power domum, iron oxide, and lead, zinc, normic and calcium chromates) and organic pigments ( And azo dyes, thioindigo, anthraquinone, anthanthrone, and triphendioxazine pigments, vat dye pigments, phthalocyanine pigments and derivatives thereof, and quinatalidone pigments.
[0111] これらの中でも、使用する露光レーザーに対応した分光増感色素の吸収波長域に 実質的に吸収を持たない顔料を選択して使用することが好ましぐこの場合、使用す るレーザー波長での積分球を用いた顔料の反射吸収が 0. 05以下であることが好ま しい。又、顔料の添加量としては、上記組成物の固形分に対し 0. ;!〜 10質量%が好 ましく、より好ましくは 0. 2〜5質量%である。  [0111] Among these, it is preferable to select and use a pigment that has substantially no absorption in the absorption wavelength region of the spectral sensitizing dye corresponding to the exposure laser to be used. It is preferable that the reflection / absorption of the pigment using an integrating sphere is 0.05 or less. Further, the addition amount of the pigment is preferably from 0.2 to 10% by mass, more preferably from 0.2 to 5% by mass based on the solid content of the composition.
[0112] 上記の感光波長領域での顔料吸収及び現像後の可視画性の観点から、紫色顔料 、青色顔料を用いるのが好ましい。このようなものとしては、例えばコバルトブルー、セ ノレリアンブノレ一、アルカリブルーレーキ、フォナトーンブルー 6G、ビクトリアブルーレ ーキ、無金属フタロシアニンブルー、フタロシアニンブルーファーストスカイブルー、 インダンスレンブノレー、インジコ、ジォキサンバイオレット、イソビォランスロンノ ィォレ ット、インダンスロンブルー、インダンスロン BC等を挙げることができる。これらの中で 、より好ましくはフタロシアニンブルー、ジォキサンバイオレットである。 [0112] From the viewpoints of pigment absorption in the above-mentioned photosensitive wavelength region and visible image properties after development, it is preferable to use a violet pigment or a blue pigment. These include, for example, cobalt blue, cenoleol bunolei, alkali blue rake, fonatone blue 6g, victoria blue Metal, phthalocyanine blue, phthalocyanine blue first sky blue, indanthrene bunoley, indico, dioxane violet, isoviolanthrone violet, indanthrone blue, indanthrone BC it can. Of these, phthalocyanine blue and dioxane violet are more preferable.
[0113] また、感光層は、本発明の性能を損わない範囲で、界面活性剤を塗布性改良剤と して含有することが出来る。その中でも好ましいのはフッ素系界面活性剤である。  [0113] Further, the photosensitive layer can contain a surfactant as a coating property improving agent as long as the performance of the present invention is not impaired. Of these, fluorine-based surfactants are preferred.
[0114] また、硬化皮膜の物性を改良するために、無機充填剤ゃジォクチルフタレート、ジメ チルフタレート、トリクレジルホスフェート等の可塑剤等の添加剤を加えてもよい。これ らの添加量は全固形分の 10%以下が好ましい。  [0114] In order to improve the physical properties of the cured film, additives such as plasticizers such as dioctyl phthalate, dimethyl phthalate, and tricresyl phosphate may be added. These addition amounts are preferably 10% or less of the total solid content.
[0115] また、本発明に係る感光層の感光層塗布液を調製する際に使用する溶剤としては 、例えば、アルコール:多価アルコールの誘導体類では、 sec—ブタノール、イソブタ ノーノレ、 n—へキサノーノレ、ペンジノレアノレコーノレ、ジエチレングリコーノレ、トリエチレン グリコール、テトラエチレンダリコール、 1 , 5—ペンタンジオール、又エーテル類:プロ ピレングリコーノレモノブチノレエーテノレ、ジプロピレングリコーノレモノメチノレエーテノレ、ト リプロピレングリコールモノメチルエーテル、又ケトン類、アルデヒド類:ジアセトンアル コール、シクロへキサノン、メチルシクロへキサノン、又エステル類:乳酸ェチル、乳酸 プチル、シユウ酸ジェチル、安息香酸メチル等が好ましく挙げられる。  [0115] The solvent used in preparing the photosensitive layer coating solution of the photosensitive layer according to the present invention includes, for example, alcohol: polyhydric alcohol derivatives such as sec-butanol, isobutanol, n-hexanol. , Penzinoreanolo Conole, Diethylene Glycol Nole, Triethylene Glycol, Tetraethylene Daricol, 1,5-Pentanediol, Ethers Preferred examples include tenole, tripropylene glycol monomethyl ether, ketones, aldehydes: diacetone alcohol, cyclohexanone, methylcyclohexanone, and esters: ethyl lactate, lactyl butyl, jetyl oxalate, and methyl benzoate.
[0116] 以上感光層塗布液について説明したが、本発明に係わる感光層は、これを用いて 支持体上に塗設することにより構成される。  Although the photosensitive layer coating solution has been described above, the photosensitive layer according to the present invention is constituted by coating on a support using the photosensitive layer.
[0117] 本発明に係る感光層は支持体上の付き量としては、 0. lg/m2〜; 10g/m2が好ま しく特に 0. 5g/m2〜5g/m2が好ましい。 [0117] photosensitive layer according to the present invention as the amount per on the support, 0. lg / m 2 ~; 10g / m 2 is preferred lay especially 0. 5g / m 2 ~5g / m 2 is preferred.
[0118] (保護層(酸素遮断層))  [0118] (Protective layer (oxygen barrier layer))
本発明に係る感光層の上側には、必要に応じ保護層を設けることが出来る。  A protective layer can be provided on the upper side of the photosensitive layer according to the present invention, if necessary.
[0119] この保護層(酸素遮断層)は、後述の現像液(一般にはアルカリ水溶液)への溶解 性が高いことが好ましぐ具体的には、ポリビュルアルコール及びポリビュルピロリドン を挙げること力 Sできる。ポリビュルアルコールは酸素の透過を抑制する効果を有し、ま た、ポリビュルピロリドンは隣接する感光層との接着性を確保する効果を有する。  [0119] The protective layer (oxygen barrier layer) preferably has high solubility in a developer solution (generally an alkaline aqueous solution) to be described later. Specifically, polybutyl alcohol and polybutylpyrrolidone are mentioned. S can. Polybulol alcohol has the effect of suppressing the permeation of oxygen, and polybulurpyrrolidone has the effect of ensuring adhesion with the adjacent photosensitive layer.
[0120] 上記 2種のポリマーの他に、必要に応じ、ポリサッカライド、ポリエチレングリコール、 ゼラチン、膠、カゼイン、ヒドロキシェチノレセノレロース、力ノレボキシメチノレセノレロース、 メチルセルロース、ヒドロキシェチル澱粉、アラビアゴム、サクローズォクタアセテート、 アルギン酸アンモニゥム、アルギン酸ナトリウム、ポリビュルァミン、ポリエチレンォキシ ド、ポリスチレンスルホン酸、ポリアクリル酸、水溶性ポリアミド等の水溶性ポリマーを 併用することあでさる。 [0120] In addition to the above two polymers, polysaccharides, polyethylene glycol, Gelatin, glue, casein, hydroxyethinoresenololose, strong noreoxymethinoresenololose, methylcellulose, hydroxyethyl starch, gum arabic, sucrose octacetate, ammonium alginate, sodium alginate, polybulamine, polyethyleneoxide It is also possible to use water-soluble polymers such as polystyrene sulfonic acid, polyacrylic acid, and water-soluble polyamide in combination.
[0121] 本発明の感光性平版印刷版に保護層を設ける場合、感光層と保護層間の剥離力 力 ¾5mN/mm以上であることが好ましぐより好ましくは 50mN/mm以上、更に好 ましくは 75mN/mm以上である。好ましい保護層の組成としては特願平 8— 16164 5号 (特開平 10— 010742号)に記載されるものが挙げられる。  [0121] When a protective layer is provided on the photosensitive lithographic printing plate of the present invention, the peel force between the photosensitive layer and the protective layer is preferably ¾5 mN / mm or more, more preferably 50 mN / mm or more. Is more than 75mN / mm. Preferred examples of the protective layer composition include those described in Japanese Patent Application No. 8-161645 (Japanese Patent Laid-Open No. 10-010742).
[0122] 本発明における剥離力は、保護層上に十分大きい粘着力を有する所定幅の粘着 テープを貼り、それを感光性平版印刷版材料の平面に対して 90度の角度で保護層 と共に剥離する時の力を測定することにより求めることができる。  [0122] The peeling force in the present invention is such that an adhesive tape having a predetermined width having a sufficiently large adhesive force is applied on the protective layer, and then peeled off with the protective layer at an angle of 90 degrees with respect to the plane of the photosensitive lithographic printing plate material. It can be obtained by measuring the force when doing.
[0123] 保護層には、更に必要に応じて界面活性剤、マット剤等を含有することができる。  [0123] The protective layer may further contain a surfactant, a matting agent and the like as required.
上記保護層組成物を適当な溶剤に溶解し感光層上に塗布 '乾燥して保護層を形成 する。塗布溶剤の主成分は水、あるいはメタノール、エタノール、 i—プロパノール等 のアルコール類であることが特に好ましい。  The above protective layer composition is dissolved in a suitable solvent, applied onto the photosensitive layer and dried to form a protective layer. The main component of the coating solvent is particularly preferably water or an alcohol such as methanol, ethanol or i-propanol.
[0124] 保護層を設ける場合その厚みは 0· ;!〜 5· 0 mが好ましぐ特に好ましくは 0· 5〜 [0124] When the protective layer is provided, the thickness is preferably 0 ·;! ~ 5 · 0 m, particularly preferably 0 · 5 ~
3. 0 μ mであ 。 3. 0 μm.
[0125] (支持体) [0125] (Support)
本発明に係る支持体は感光層を担持可能な板状体またはフィルム体であり、感光 層が設けられる側に親水性表面を有するのが好ましい。  The support according to the present invention is a plate or film capable of carrying a photosensitive layer, and preferably has a hydrophilic surface on the side where the photosensitive layer is provided.
[0126] 本発明に係る支持体として、例えばアルミニウム、ステンレス、クロム、ニッケル等の 金属板、また、ポリエステルフィルム、ポリエチレンフィルム、ポリプロピレンフィルム等 のプラスチックフィルムに前述の金属薄膜をラミネートまたは蒸着したもの等が挙げら れる。 [0126] As the support according to the present invention, for example, a metal plate such as aluminum, stainless steel, chromium or nickel, or a plastic film such as polyester film, polyethylene film or polypropylene film laminated or vapor-deposited with the above-mentioned metal thin film or the like. Can be mentioned.
[0127] また、ポリエステルフィルム、塩化ビュルフィルム、ナイロンフィルム等の表面に親水 化処理を施したもの等が使用できる力 S、アルミニウム支持体が好ましく使用される。  [0127] In addition, a force S that can be used such as a polyester film, a chlorinated chloride film, a nylon film having a surface subjected to a hydrophilization treatment, and an aluminum support are preferably used.
[0128] アルミニウム支持体の場合、純アルミニウムまたはアルミニウム合金が用いられる。 [0129] 支持体のアルミニウム合金としては、種々のものが使用でき、例えば、珪素、銅、マ ンガン、マグネシウム、クロム、亜鉛、鉛、ビスマス、ニッケル、チタン、ナトリウム、鉄等 の金属とアルミニウムの合金が用いられる。又アルミニウム支持体は、保水性付与の ため、表面を粗面化したものが用いられる。 [0128] In the case of an aluminum support, pure aluminum or an aluminum alloy is used. [0129] Various aluminum alloys can be used as the support, for example, silicon, copper, mangan, magnesium, chromium, zinc, lead, bismuth, nickel, titanium, sodium, iron, and other metals and aluminum. An alloy is used. In addition, the aluminum support having a roughened surface is used for water retention.
[0130] アルミニウム支持体を用いる場合、粗面化(砂目立て処理)するに先立って表面の 圧延油を除去するために脱脂処理を施すことが好ましい。脱脂処理としては、トリタレ ン、シンナー等の溶剤を用いる脱脂処理、ケシロン、トリエタノール等のェマルジヨン を用いたェマルジヨン脱脂処理等が用いられる。又、脱脂処理には、苛性ソーダ等の アルカリの水溶液を用いることもできる。脱脂処理に苛性ソーダ等のアルカリ水溶液 を用いた場合、上記脱脂処理のみでは除去できない汚れや酸化皮膜も除去すること ができる。脱脂処理に苛性ソーダ等のアルカリ水溶液を用いた場合、支持体の表面 にはスマットが生成するので、この場合には、燐酸、硝酸、硫酸、クロム酸等の酸、或 いはそれらの混酸に浸漬しデスマット処理を施すことが好ましレ、。粗面化の方法とし ては、例えば、機械的方法、電解によりエッチングする方法が挙げられる。  [0130] When an aluminum support is used, it is preferable to perform a degreasing treatment in order to remove the rolling oil on the surface prior to roughening (graining treatment). As the degreasing treatment, a degreasing treatment using a solvent such as tritalene or thinner, an emulsion degreasing treatment using an emulsion such as kesilon or triethanol, or the like is used. An alkaline aqueous solution such as caustic soda can also be used for the degreasing treatment. When an alkaline aqueous solution such as caustic soda is used for the degreasing treatment, dirt and oxide film that cannot be removed only by the above degreasing treatment can be removed. When an alkaline aqueous solution such as caustic soda is used for the degreasing treatment, smut is generated on the surface of the support. In this case, the substrate is immersed in an acid such as phosphoric acid, nitric acid, sulfuric acid, chromic acid, or a mixed acid thereof. It is preferable to apply a desmut treatment. Examples of the roughening method include a mechanical method and a method of etching by electrolysis.
[0131] 用いられる機械的粗面化法は特に限定されるものではないが、ブラシ研磨法、ホー ユング研磨法が好ましい。  [0131] The mechanical surface roughening method used is not particularly limited, but a brush polishing method and a Houng polishing method are preferable.
[0132] 電気化学的粗面化法も特に限定されるものではないが、酸性電解液中で電気化学 的に粗面化を行う方法が好ましい。  [0132] The electrochemical surface roughening method is not particularly limited, but a method of electrochemical surface roughening in an acidic electrolyte is preferable.
[0133] 上記の電気化学的粗面化法で粗面化した後、表面のアルミニウム屑等を取り除くた め、酸又はアルカリの水溶液に浸漬することが好ましい。酸としては、例えば、硫酸、 過硫酸、弗酸、燐酸、硝酸、塩酸等が用いられ、塩基としては、例えば、水酸化ナトリ ゥム、水酸化カリウム等が用いられる。これらの中でもアルカリの水溶液を用いるのが 好ましい。  [0133] After the surface is roughened by the electrochemical surface roughening method, it is preferably immersed in an aqueous solution of acid or alkali in order to remove aluminum scraps on the surface. Examples of the acid include sulfuric acid, persulfuric acid, hydrofluoric acid, phosphoric acid, nitric acid, hydrochloric acid, and the like. Examples of the base include sodium hydroxide, potassium hydroxide, and the like. Among these, it is preferable to use an alkaline aqueous solution.
[0134] 表面のアルミニウムの溶解量としては、 0. 5〜5g/m2が好ましい。又、アルカリの 水溶液で浸漬処理を行った後、燐酸、硝酸、硫酸、クロム酸等の酸或いはそれらの 混酸に浸漬し中和処理を施すことが好ましい。 [0134] The dissolution amount of aluminum in the plate surface, 0. 5~5g / m 2 is preferred. In addition, it is preferable that after the immersion treatment with an alkaline aqueous solution, neutralization treatment is performed by immersion in an acid such as phosphoric acid, nitric acid, sulfuric acid, chromic acid or a mixed acid thereof.
[0135] 機械的粗面化処理法、電気化学的粗面化法はそれぞれ単独で用いて粗面化して もよいし、又、機械的粗面化処理法に次いで電気化学的粗面化法を行って粗面化し てもよい。 [0135] The mechanical surface roughening method and the electrochemical surface roughening method may each be used alone for surface roughening, or the mechanical surface roughening method followed by the electrochemical surface roughening method. To roughen the surface May be.
[0136] 粗面化処理の次には、陽極酸化処理を行うことができる。本発明において用いるこ とができる陽極酸化処理の方法には特に制限はなぐ公知の方法を用いることができ る。陽極酸化処理を行うことにより、支持体上には酸化皮膜が形成される。  [0136] Following the roughening treatment, an anodizing treatment can be performed. As the anodizing treatment method that can be used in the present invention, a known method without particular limitation can be used. By performing the anodizing treatment, an oxide film is formed on the support.
[0137] 陽極酸化処理された支持体は、必要に応じ封孔処理を施してもよい。これら封孔処 理は、熱水処理、沸騰水処理、水蒸気処理、珪酸ソーダ処理、重クロム酸塩水溶液 処理、亜硝酸塩処理、酢酸アンモニゥム処理等公知の方法を用いて行うことができる [0137] The anodized support may be sealed as necessary. These sealing treatments can be performed using known methods such as hot water treatment, boiling water treatment, steam treatment, sodium silicate treatment, dichromate aqueous solution treatment, nitrite treatment, and ammonium acetate treatment.
Yes
[0138] 更に、これらの処理を行った後に、水溶性の樹脂、例えばポリビュルホスホン酸、ス ルホン酸基を側鎖に有する重合体および共重合体、ポリアクリル酸、水溶性金属塩( 例えばホウ酸亜鉛)もしくは、黄色染料、アミン塩等を下塗りしたものも好適である。更 に、特開平 5— 304358号公報に開示されているようなラジカルによって付加反応を 起し得る官能基を共有結合させたゾルーゲル処理基板も好適に用いられる。  [0138] Further, after these treatments, water-soluble resins such as polybuluphosphonic acid, polymers and copolymers having sulfonic acid groups in the side chain, polyacrylic acid, water-soluble metal salts (for example, Zinc borate) or a primer coated with a yellow dye, an amine salt or the like is also suitable. Furthermore, a sol-gel treated substrate in which a functional group capable of causing an addition reaction by a radical as disclosed in JP-A-5-304358 is covalently used.
[0139] (塗布)  [0139] (Application)
上記の感光層塗布液を従来公知の方法で支持体上に塗布し、乾燥し、感光性平 版印刷版材料を作製することが出来る。  The above photosensitive layer coating solution can be coated on a support by a conventionally known method and dried to prepare a photosensitive lithographic printing plate material.
[0140] 塗布液の塗布方法としては、例えばエアドクタコータ法、ブレードコータ法、ワイヤ バー法、ナイフコータ法、ディップコータ法、リバースロールコータ法、グラビヤコータ 法、キャストコーティング法、カーテンコータ法及び押し出しコータ法等を挙げることが 出来る。 [0140] Examples of the coating method of the coating liquid include air doctor coater method, blade coater method, wire bar method, knife coater method, dip coater method, reverse roll coater method, gravure coater method, cast coating method, curtain coater method and extrusion method. Examples include the coater method.
[0141] なお、感光層の塗布液を調製する際に用いる溶剤としては、プロピレングリコール モノメチノレエーテノレ、シクロへキサノン、メチノレエチノレケトン、プロピレングリコーノレモノ メチルエーテルアセテート等を用いることができ、特にプロピレングリコールモノメチル エーテルが本発明にお!/、て好ましレ、。  [0141] As the solvent used in preparing the coating solution for the photosensitive layer, propylene glycol monomethinoreethenole, cyclohexanone, methinoreethinoleketone, propyleneglycololemonomethyl ether acetate, etc. may be used. In particular, propylene glycol monomethyl ether is preferred in the present invention!
[0142] 感光層の乾燥温度は 60〜; 160°Cの範囲が好ましぐより好ましくは 80〜; 140°C、特 に好ましくは、 90〜120°Cの範囲で乾燥することが好ましい。 [0142] The drying temperature of the photosensitive layer is preferably from 60 to 160 ° C, more preferably from 80 to 140 ° C, and particularly preferably from 90 to 120 ° C.
[0143] (画像露光) [0143] (Image exposure)
本発明の感光性平版印刷版材料に画像記録する光源としては、発光波長が 370 〜440nmのレーザー光の使用が好ましい。 The light source for recording an image on the photosensitive lithographic printing plate material of the present invention has an emission wavelength of 370. The use of ~ 440 nm laser light is preferred.
[0144] 本発明の感光性平版印刷版を露光する光源としては、例えば、 He— Cdレーザー( [0144] As a light source for exposing the photosensitive lithographic printing plate of the present invention, for example, a He-Cd laser (
441nm)、固体レーザーとして Cr : LiSAFと SHG結晶の組合わせ(430nm)、半導 体レーザー系として、 KNbO、リング共振器(430nm)、 AlGaInN (350nm〜450n m)、 AlGalnN半導体レーザー(巿販 InGaN系半導体レーザー 400〜410nm)等 を挙げること力 Sでさる。  441nm), Cr: LiSAF and SHG crystal combination as solid laser (430nm), Semiconductor laser system as KNbO, ring resonator (430nm), AlGaInN (350nm ~ 450nm), AlGalnN semiconductor laser (Semiconductor laser 400-410nm) etc.
[0145] レーザー露光の場合には、光をビーム状に絞り画像データに応じた走査露光が可 能なので、マスク材料を使用せず、直接書込みを行うのに適している。  [0145] In the case of laser exposure, light can be narrowed down in the form of a beam, and scanning exposure according to image data is possible, so it is suitable for direct writing without using a mask material.
[0146] 又、レーザーを光源として用いる場合には、露光面積を微小サイズに絞ることが容 易であり、高解像度の画像形成が可能となる。  [0146] When a laser is used as a light source, it is easy to reduce the exposure area to a very small size, and high-resolution image formation is possible.
[0147] レーザーの走査方法としては、円筒外面走査、円筒内面走査、平面走査などがあ る。円筒外面走査では、記録材料を外面に巻き付けたドラムを回転させながらレーザ 一露光を行い、ドラムの回転を主走査としレーザー光の移動を副走査とする。円筒内 面走査では、ドラムの内面に記録材料を固定し、レーザービームを内側から照射し、 光学系の一部又は全部を回転させることにより円周方向に主走査を行い、光学系の 一部又は全部をドラムの軸に平行に直線移動させることにより軸方向に副走査を行う 。平面走査では、ポリゴンミラーやガルバノミラーと f Θレンズ等を組み合わせてレー ザ一光の主走査を行い、記録媒体の移動により副走査を行う。円筒外面走査及び円 筒内面走査の方が光学系の精度を高め易ぐ高密度記録には適している。  [0147] Laser scanning methods include cylindrical outer surface scanning, cylindrical inner surface scanning, and planar scanning. In the cylindrical outer surface scanning, one exposure of the laser is performed while rotating the drum around which the recording material is wound, the rotation of the drum is the main scanning, and the movement of the laser beam is the sub scanning. In cylindrical inner surface scanning, a recording material is fixed to the inner surface of the drum, a laser beam is irradiated from the inside, and part or all of the optical system is rotated to perform main scanning in the circumferential direction. Alternatively, the whole is linearly moved parallel to the drum axis to perform sub-scanning in the axial direction. In plane scanning, the main scanning of laser light is performed by combining a polygon mirror, galvanometer mirror, and fΘ lens, and sub-scanning is performed by moving the recording medium. Cylindrical outer surface scanning and circular cylinder inner surface scanning are suitable for high-density recording that facilitates increasing the accuracy of the optical system.
[0148] 尚、本発明においては、 10mj/cm2以上の版面エネルギー(版材上でのエネルギ 一)で画像露光されることが好ましぐその上限は 500mj/cm2である。より好ましくは 10〜300mj/cm2である。このエネルギー測定には例えば OphirOptronics社製 のレーザーパワーメーター PDGDO— 3Wを用いることができる。 [0148] In the present invention, it is preferable that image exposure is performed with a plate surface energy (energy on the plate material) of 10 mj / cm 2 or more, and the upper limit is 500 mj / cm 2 . More preferably, it is 10 to 300 mj / cm 2 . For this energy measurement, for example, a laser power meter PDGDO-3W manufactured by OphirOptronics can be used.
[0149] (現像液)  [0149] (Developer)
画像露光した感光層は露光部が硬化する。これをアルカリ性現像液で現像処理す ることにより、未露光部を除去して画像形成することが好ましい。  The exposed portion of the photosensitive layer subjected to image exposure is cured. This is preferably developed with an alkaline developer to remove the unexposed areas and form an image.
[0150] この様な現像液としては、従来より知られているアルカリ水溶液が使用できる。例え ばケィ酸ナトリウム、同カリウム、同アンモニゥム;第二燐酸ナトリウム、同カリウム、同ァ ンモニゥム;重炭酸ナトリウム、同カリウム、同アンモユウム;炭酸ナトリウム、同カリウム 、同アンモニゥム;炭酸水素ナトリウム、同カリウム、同アンモニゥム;ホウ酸ナトリウム、 同カリウム、同アンモユウム;水酸化ナトリウム、同カリウム、同アンモュゥム及び同リチ ゥム等の無機アルカリ剤を使用するアルカリ現像液が挙げられる。 [0150] As such a developer, a conventionally known alkaline aqueous solution can be used. For example, sodium silicate, potassium, ammonium; dibasic sodium phosphate, potassium, Sodium bicarbonate, potassium, ammonium, sodium carbonate, potassium, ammonium, sodium bicarbonate, potassium, ammonium, sodium borate, potassium, ammonium, sodium hydroxide, potassium, ammonium And an alkaline developer using an inorganic alkali agent such as lithium.
[0151] また、モノメチルァミン、ジメチルァミン、トリメチルァミン、モノェチルァミン、ジェチ ルァミン、トリエチルァミン、モノ一 i プロピルァミン、ジ一 i プロピルァミン、トリ一 i— プロピルァミン、ブチルァミン、モノエタノールァミン、ジエタノールァミン、トリエタノー ノレアミン、モノー i—プロパノールァミン、ジ i—プロパノールァミン、エチレンィミン、 エチレンジァミン、ピリジン等の有機アルカリ剤も用いることができる。  [0151] In addition, monomethylamine, dimethylamine, trimethylamine, monoethylamine, jetylamine, triethylamine, mono-1-propylamine, di-1-propylamine, tri-1-propylamine, butylamine, monoethanolamine, diethanolamine Organic alkali agents such as triethanolamine, mono-i-propanolamine, di-i-propanolamine, ethyleneimine, ethylenediamine and pyridine can also be used.
[0152] これらのアルカリ剤は、単独又は 2種以上組合せて用いられる。また、この現像液に は、必要に応じてァニオン性界面活性剤、両性活性剤やアルコール等の有機溶媒 を加えることができる。  [0152] These alkaline agents may be used alone or in combination of two or more. Further, an organic solvent such as an anionic surfactant, an amphoteric surfactant or alcohol can be added to the developer as necessary.
[0153] アルカリ性現像液は、顆粒状、錠剤等の現像液濃縮物から調製することもできる。  [0153] The alkaline developer can also be prepared from a developer concentrate such as granules and tablets.
[0154] 現像液濃縮物は、一旦、現像液にして力 蒸発乾固させてもよいが、好ましくは複 数の素材を混ぜ合わせる際に水を加えず、又は少量の水を加える方法で素材を混 ぜ合わせることで濃縮状態とする方法が好ましい。又、この現像液濃縮物は、特開昭 51— 61837号、特開平 2— 109042号、同 2— 109043号、同 3— 39735号、同 5 — 142786号、同 6— 266062号、同 7— 13341号等に記載される従来よく知られた 方法にて、顆粒状、錠剤とすることができる。又、現像液の濃縮物は、素材種や素材 配合比等の異なる複数のパートに分けてもよ!/、。  [0154] The developer concentrate may be once evaporated into a developer and evaporated to dryness, but preferably the material is added by adding a small amount of water without adding water when mixing a plurality of materials. A method of concentrating the mixture to obtain a concentrated state is preferable. The developer concentrates are disclosed in JP-A-51-61837, JP-A-2-109042, JP-A-2-109043, JP-A-3-39735, JP-A-5-142786, JP-A-6-266062, — Granules and tablets can be obtained by a well-known method described in No. 13341 or the like. The developer concentrate can also be divided into multiple parts with different material types and ratios! /.
[0155] アルカリ性現像液及びその補充液には、更に必要に応じて防腐剤、着色剤、増粘 剤、消泡剤及び硬水軟化剤などを含有させることもできる。  [0155] The alkaline developer and its replenisher may further contain a preservative, a colorant, a thickener, an antifoaming agent, a hard water softening agent, and the like, if necessary.
[0156] (自動現像機)  [0156] (Automatic processor)
感光性平版印刷版材料の現像には自動現像機を用いるのが有利である。 自動現 像機として好ましくは現像浴に自動的に現像補充液を必要量補充する機構が付与さ れており、好ましくは一定量を超える現像液は、排出する機構が付与されており、好 ましくは現像浴に自動的に水を必要量補充する機構が付与されており、好ましくは、 通版を検知する機構が付与されており、好ましくは通版の検知を基に版の処理面積 を推定する機構が付与されており、好ましくは通版の検知及び/又は処理面積の推 定を基に補充しょうとする補充液及び/又は水の補充量及び/又は補充タイミング を制御する機構が付与されており、好ましくは現像液の温度を制御する機構が付与 されており、好ましくは現像液の pH及び/又は電導度を検知する機構が付与されて おり、好ましくは現像液の pH及び/又は電導度を基に補充しょうとする補充液及び /又は水の補充量及び/又は補充タイミングを制御する機構が付与されて!/、る。又 、現像液濃縮物を一旦、水で希釈 ·撹拌する機能を有することが好ましい。現像工程 後に水洗工程がある場合、使用後の水洗水を現像濃縮物の濃縮液の希釈水として 用いること力 Sでさる。 It is advantageous to use an automatic processor for developing the photosensitive lithographic printing plate material. An automatic image processor is preferably provided with a mechanism for automatically supplying a required amount of developer replenisher to the developing bath, and preferably a mechanism for discharging a developer exceeding a certain amount is preferably provided. In addition, a mechanism for automatically replenishing a required amount of water to the developing bath is provided, and preferably a mechanism for detecting plate passing is provided. Preferably, the processing area of the plate is based on detection of plate passing. A mechanism for controlling the replenishment amount and / or replenishment timing of the replenisher solution and / or water to be replenished preferably based on the detection of the printing plate and / or the estimation of the processing area is provided. Preferably, a mechanism for controlling the temperature of the developer is added, preferably a mechanism for detecting the pH and / or conductivity of the developer is provided, preferably the pH and / or of the developer. Or, a mechanism for controlling the amount and / or timing of the replenisher and / or water to be replenished based on the conductivity is provided! Further, it preferably has a function of once diluting and stirring the developer concentrate with water. If there is a washing step after the development step, use the washing water after use as dilution water for the concentrate of the development concentrate.
[0157] 自動現像機は、現像工程の前に前処理液に版を浸漬させる前処理部を有してもよ い。この前処理部は、好ましくは版面に前処理液をスプレーする機構が付与されてお り、好ましくは前処理液の温度を 25〜55°Cの任意の温度に制御する機構が付与さ れており、好ましくは版面をローラー状のブラシにより擦る機構が付与されている。こ の前処理液としては、水などが用いられる。  [0157] The automatic processor may have a pretreatment section for immersing the plate in the pretreatment liquid before the development step. The pretreatment section is preferably provided with a mechanism for spraying the pretreatment liquid onto the plate surface, and preferably provided with a mechanism for controlling the temperature of the pretreatment liquid to an arbitrary temperature of 25 to 55 ° C. Preferably, a mechanism for rubbing the plate surface with a roller-like brush is provided. Water or the like is used as the pretreatment liquid.
[0158] (後処理)  [0158] (Post-processing)
アルカリ性現像液で現像処理された平版印刷版材料は、水洗水、界面活性剤等を 含有するリンス液、アラビアガムや澱粉誘導体等を主成分とするフィエッシャーや保 護ガム液で後処理を施される。これらの処理を種々組み合せて用いることができ、例 えば現像→水洗→界面活性剤を含有するリンス液処理や現像→水洗→フィニッシャ 一液による処理が、リンス液ゃフィエッシャー液の疲労が少なく好ましい。更にリンス 液ゃフィニッシヤー液を用いた向流多段処理も好ましレ、態様である。  The lithographic printing plate material developed with an alkaline developer is subjected to post-treatment with washing water, a rinsing solution containing a surfactant, a fischer or a protective gum solution mainly composed of gum arabic or starch derivatives. Is done. These treatments can be used in various combinations, for example, development → washing → treatment of rinsing liquid containing surfactant and development → water washing → finisher with one liquid is preferable because the rinse liquid has less fatigue of the Fischer liquid. . Furthermore, countercurrent multistage treatment using a rinse liquid or a finish liquid is also preferred.
[0159] これらの後処理は、一般に現像部と後処理部とから成る自動現像機を用いて行わ れる。後処理液は、スプレーノズルから吹き付ける方法、処理液が満たされた処理槽 中を浸漬搬送する方法が用いられる。又、現像後一定量の少量の水洗水を版面に 供給して水洗し、その廃液を現像液原液の希釈水として再利用する方法も知られて いる。このような自動処理においては、各処理液に処理量や稼働時間等に応じてそ れぞれの補充液を補充しながら処理することができる。又、実質的に未使用の後処 理液で処理する、いわゆる使い捨て処理方式も適用できる。このような処理によって 得られた平版印刷版は、オフセット印刷機に掛けられ、多数枚の印刷に用いられる。 実施例 [0159] These post-processing are generally performed using an automatic developing machine including a developing unit and a post-processing unit. As the post-treatment liquid, a method of spraying from a spray nozzle or a method of immersing and conveying in a treatment tank filled with the treatment liquid is used. In addition, a method is also known in which a certain amount of a small amount of washing water is supplied to the plate surface after development, and the waste solution is reused as dilution water for the developing solution stock solution. In such automatic processing, each processing solution can be processed while being replenished with each replenisher according to the processing amount, operating time, and the like. In addition, a so-called disposable treatment method in which treatment is performed with a substantially unused post-treatment liquid is also applicable. By such processing The obtained lithographic printing plate is loaded on an offset printing machine and used for printing a large number of sheets. Example
[0160] 以下、実施例を挙げて本発明を詳細に説明する力 本発明の態様はこれに限定さ れない。尚、実施例における「部」は、特に断りない限り「質量部」を表す。  [0160] Hereinafter, the ability to explain the present invention in detail with reference to examples is not intended to limit the embodiments of the present invention. In the examples, “parts” represents “parts by mass” unless otherwise specified.
<感光性平版印刷版の作製 >  <Preparation of photosensitive lithographic printing plate>
(支持体 1の作製)  (Preparation of support 1)
厚さ 0. 3mmのアルミニウム板(材質 1050,調質 H16)を 65°Cに保たれた 5%水酸 化ナトリウム水溶液に浸漬し、 1分間の脱脂処理を行った後、水洗した。この脱脂ァ ノレミニゥム板を、 25°Cに保たれた 10 %塩酸水溶液中に 1分間浸漬して中和した後、 水洗した。  A 0.3 mm thick aluminum plate (material 1050, tempered H16) was immersed in a 5% aqueous sodium hydroxide solution maintained at 65 ° C, degreased for 1 minute, and then washed with water. This degreased aluminum plate was neutralized by immersing it in a 10% aqueous hydrochloric acid solution maintained at 25 ° C. for 1 minute, and then washed with water.
[0161] 次いで、このアルミニウム板を、 0. 3質量%の硝酸水溶液中で、 25°C、電流密度 1 OOA/dm2の条件下に交流電流により 60秒間、電解粗面化を行った後、 60°Cに保 たれた 5 %水酸化ナトリゥム水溶液中で 10秒間のデスマット処理を行った。 [0161] Then, the aluminum plate in a nitric acid aqueous solution of 0.3 wt%, 25 ° C, 60 seconds by alternating current under condition of current density of 1 OOA / dm 2, after the electrolytic surface roughening The desmutting treatment was performed for 10 seconds in a 5% aqueous sodium hydroxide solution maintained at 60 ° C.
[0162] デスマット処理を行った粗面化アルミニウム板を、 15%硫酸溶液中で、 25°C、電流 密度 10A/dm2、電圧 15Vの条件下に 1分間陽極酸化処理を行い、更に 1 %ポリビ ニルホスホン酸で 75°Cで親水化処理を行って支持体 1を作製した。 [0162] Desmutted roughened aluminum plate was anodized in 15% sulfuric acid solution at 25 ° C, current density 10A / dm 2 , voltage 15V for 1 minute, and 1% The support 1 was prepared by subjecting it to hydrophilic treatment with polyvinyl phosphonic acid at 75 ° C.
[0163] この時、表面の中心線平均粗さ(Ra)は 0. 65 111であった。  [0163] At this time, the centerline average roughness (Ra) of the surface was 0.665111.
[0164] 上記支持体 1上に、下記組成の感光層塗布液 1を乾燥時 1. 7g/m2になるようワイ ヤーバーで塗布し、 80°Cで 2分間乾燥し、続いて下記の酸素遮断層塗工液 1を乾燥 時 1. 5g/m2になるようワイヤーバーで塗布し、 75°Cで 1. 5分間乾燥し平版印刷版 材 [0164] Photosensitive layer coating solution 1 having the following composition was coated on the above support 1 with a wire bar so as to be 1.7 g / m 2 when dried, dried at 80 ° C for 2 minutes, and then the following oxygen Apply the barrier layer coating solution 1 to 1.5 g / m 2 when dried with a wire bar and dry at 75 ° C for 1.5 minutes for lithographic printing plate
料;!〜 8を得た。  We got a fee;! ~ 8.
[0165] (感光層塗布液 1) [0165] (Photosensitive layer coating solution 1)
高分子結合材 (メタクリル酸/メタクリル酸メチル = 14/86の共重合体、質量平均 分子量 = 36000) 44. 0部  Polymer binder (methacrylic acid / methyl methacrylate copolymer = 14/86, mass average molecular weight = 36000) 44.0 parts
分光増感剤 A 4. 0部  Spectral sensitizer A 4.0 parts
鉄アレーン錯体:ィルガキュア 261 (チバスぺシャリティーケミカルズ社製)  Iron arene complex: Irgacure 261 (Ciba Specialty Chemicals)
2. 9部 トリァジン化合物 (TAZ— 107 :みどり化学社製) 1. 5部 2. 9 copies Triazine compound (TAZ-107: Midori Chemical Co., Ltd.) 1. 5 parts
N— n ブチルジェタノールァミン(1モル)、 1 , 3—ビス(1 イソシアナ一トー 1ーメ チルェチル)ベンゼン(2モル)、 2—ヒドロキシェチルメタタリレート(2モル)の反応生 成物 33. 0部  Reaction generation of N—n butyljetanolamine (1 mol), 1,3-bis (1 isocyanatototo 1-methylethyl) benzene (2 mol), 2-hydroxyethyl methacrylate (2 mol) 33. 0 parts
ポリエチレングリコール # 200ジメタクリレー HNKエステル 3G、新中村化学工業社 製、モノマー SP : 9. 89) 11. 0部  Polyethylene glycol # 200 dimetacrine HNK ester 3G, manufactured by Shin-Nakamura Chemical Co., Ltd., monomer SP: 9. 89) 11.0 parts
単官能モノマー(表 1に記載のモノマー、添加量で)  Monofunctional monomer (monomer listed in Table 1 with added amount)
フタロシアニン顔料(MHI454、御国色素社製) 5· 4部  Phthalocyanine pigment (MHI454, made by Gokoku Color Co., Ltd.) 5/4 parts
2— t ブチノレー 6—(3— t ブチルー 2 ヒドロキシー5 メチルベンジル)ー4 エ 'ート(スミライザ一 GS:住友 3M社製) 0. 2部 シロキサン系界面活性剤(BYK337;ビックケミ一社製) 0. 9部 ヒンダードアミン光安定化剤(LS 770、三共ライフテック社製) 0. 1部 フッ素系界面活性剤 (F178K、大日本インキ化学工業社製) 0. 1部 ァミン化合物(ANCAMIN K—54、エアプロダクツ社製) 1. 4部 プロピレングリコーノレメチノレエーテノレ 820部  2-t Butinole 6- (3-t-butyl-2-hydroxy-5-methylbenzyl) -4 ate (Sumilyzer GS: manufactured by Sumitomo 3M) 0.2 parts Siloxane-based surfactant (BYK337; manufactured by Big Chemi) 0. 9 parts Hindered amine light stabilizer (LS 770, Sankyo Lifetech Co., Ltd.) 0.1 part Fluorosurfactant (F178K, Dainippon Ink and Chemicals) 0.1 part Amamine (ANCAMIN K-54 (Product made by Air Products) 1. 4 parts Propylene Glyconore Mechinoleatere 820 parts
(酸素遮断層塗工液 1)  (Oxygen barrier coating solution 1)
ポリビュルアルコール(セルボール 103 : Celaneas社製) 79· 0部  Polybur alcohol (Celball 103: Celaneas) 79 · 0 parts
ビュルピロリドン/酢酸ビュル共重合体(ルビテック VA64W: BASF製)  Bullpyrrolidone / Butyl acetate copolymer (Rubitec VA64W: manufactured by BASF)
20. 0部  20.0 copies
サーフィノール 465 (エアープロダクツ社製) 1. 0部  Surfynol 465 (Air Products) 1. 0 parts
水 900部  900 parts of water
[化 1] 醒 HEAA ACMQ [Chemical 1] Awake HEAA ACMQ
ん I。、 へ γ  I. , To γ
ο Ο  ο Ο
0  0
HE A N1PAM
Figure imgf000034_0001
分光増感剤 A
Figure imgf000034_0002
HE A N1PAM
Figure imgf000034_0001
Spectral sensitizer A
Figure imgf000034_0002
[0167] <感光性平版印刷版材料の評価〉 [0167] <Evaluation of photosensitive lithographic printing plate material>
《感度》  << Sensitivity >>
レーザーの露光エネルギーを変化させながら、 100%ベタ画像を出力する。上記の 画像形成方法に従い、現像した画像の各エネルギーの濃度を濃度計〔D196: GRE TAG社製〕で測定する。  A 100% solid image is output while changing the exposure energy of the laser. According to the above image forming method, the density of each energy of the developed image is measured with a densitometer [D196: manufactured by GRE TAG].
[0168] 感光材料の飽和ベタ濃度から濃度が落ちはじめる露光エネルギーを感度とした。 [0168] The exposure energy at which the density began to drop from the saturated solid density of the photosensitive material was taken as the sensitivity.
飽和ベタ濃度 X 0. 9となるエネルギー量を換算して求めた。  The amount of energy at which the saturated solid density X 0.9 was obtained was converted.
[0169] 《アンダー現像性》 [0169] 《Under developability》
現像液の液温度を 2°C刻みで変化させ、現像処理を行い、非画像部の現像性を評 価した。  The developer temperature was changed in steps of 2 ° C, development processing was performed, and the developability of the non-image area was evaluated.
[0170] 現像後、印刷し非画像部に汚れ若しくはシャドー部のインキ絡みの生じることのな い現像液温下限を求めた。  [0170] After development, the lower limit of the developing solution temperature at which printing and non-image areas were not smudged or ink entangled in the shadow areas was determined.
[0171] 印刷条件: 175線の画像を適性露光量で露光、 105°Cで熱処理後、各温度で現像 して作製した平版印刷版を、印刷機 (三菱重工業社製 DAIYA1F— 1)で、コート紙 、印刷インキ(大日本インキ化学工業社製の、大豆油インキ"ナチユラリス 100")及び 湿し水(東京インク社製 H液 SG— 51濃度 1. 5%)を用いて印刷を行い、刷りだし 10 00枚後の非画像部及びシャドーを目視評価し、基準である現像温度 28°Cの印刷物 と比較し良否判断した。 [0171] Printing conditions: A lithographic printing plate produced by exposing an image of 175 lines with an appropriate exposure amount, heat-treating at 105 ° C, and developing at each temperature, using a printing machine (DAIYA1F-1 manufactured by Mitsubishi Heavy Industries, Ltd.) Printed using coated paper, printing ink (Dainippon Ink Chemical Co., Ltd., soybean oil ink "Naturalis 100") and dampening water (Tokyo ink H liquid SG-51 concentration 1.5%) Imprint 10 The non-image area and shadow after 00 sheets were visually evaluated and compared with a printed material having a development temperature of 28 ° C. as a reference, and judged as good or bad.
[0172] 《耐刷性》 [0172] <Press life>
下記印刷条件下で、 80 ^ j/cm2で露光した 175線の評価チャートを印刷し、印刷 開始から、再現網点が 3%変動するまでの印刷枚数を耐刷性と評価した。 Under the following printing conditions, an evaluation chart of 175 lines exposed at 80 ^ j / cm 2 was printed, and the number of printed sheets from the start of printing until the reproduction halftone dot changed by 3% was evaluated as printing durability.
[0173] (印刷条件) [0173] (Printing conditions)
印刷機: DAIYA1F— 1:三菱重工業社製  Printing machine: DAIYA1F— 1: Mitsubishi Heavy Industries
紙:コート紙 (再生パルプ含有率 20%北越製紙社製)  Paper: Coated paper (Recycled pulp content 20%, manufactured by Hokuetsu Paper Co., Ltd.)
ブランケット: SR100 (SRIハイブリッド社製)  Blanket: SR100 (manufactured by SRI Hybrid)
印刷インキ:大豆油インキ ナチユラリス 100 (Y, M, C, K):大日本インキ化学ェ 業社製  Printing ink: Soybean oil ink Natyralis 100 (Y, M, C, K): Dainippon Ink & Chemicals
湿し水: H液 SG— 51濃度 1. 5 %:東京インク社製  Dampening solution: Liquid H SG-51 concentration 1.5%: manufactured by Tokyo Ink
印刷スピード: 4000枚/時  Printing speed: 4000 sheets / hour
《露光時の網点再現性》  <Reproducibility of halftone dots during exposure>
23°C、 60%の環境下において、各々の印刷版の適性露光量において 50%出力 で露光を行い、 1時間後にプレヒート、現像処理を行ったものと、露光後即処理をした ものとの網点再現性を比較した。網点再現性は、 CC DOT (X— Rite社製)で測定 した。  Under an environment of 23 ° C and 60%, each printing plate was exposed with 50% output at the appropriate exposure amount, preheated and developed after 1 hour, and processed immediately after exposure. The halftone dot reproducibility was compared. Halftone dot reproducibility was measured with CC DOT (X—Rite).
[0174] 上記各種評価の結果をまとめて表 1に示す。  [0174] The results of the various evaluations are summarized in Table 1.
[0175] [表 1] [0175] [Table 1]
Figure imgf000036_0001
表 1に示した結果から明らかなように本発明に係る平版印刷版材料は、感度、耐刷 性、現像性、及び潜像安定性(露光した後、加熱処理を行うまでの経時での網点再 現性の耐変動性)にお!/、て優れて!/、ること力 S分力、る。
Figure imgf000036_0001
As is apparent from the results shown in Table 1, the lithographic printing plate material according to the present invention has a sensitivity, printing durability, developability, and latent image stability (the time-lapse network from exposure to heat treatment). (Variable resistance of point reproducibility)! /, Excellent! /, Power of S component.

Claims

請求の範囲 The scope of the claims
[1] 支持体上に、重合可能なエチレン性不飽和結合含有化合物、重合開始剤、分光 増感剤、及び高分子結合剤を含有する感光層を有する感光性平版印刷版材料にお いて、該感光層が、重合可能なエチレン性不飽和結合含有化合物として、双極子モ 一メントが 2. 3〜6. 0Dである単官能モノマーを含有することを特徴とする感光性平 版印刷版材料。  [1] In a photosensitive lithographic printing plate material having a photosensitive layer containing a polymerizable ethylenically unsaturated bond-containing compound, a polymerization initiator, a spectral sensitizer, and a polymer binder on a support, The photosensitive lithographic printing plate material, wherein the photosensitive layer contains a monofunctional monomer having a dipole moment of 2.3 to 6.0 D as a polymerizable ethylenically unsaturated bond-containing compound .
[2] 前記単官能モノマーがアクリルアミド誘導体であることを特徴とする請求の範囲第 1 項に記載の感光性平版印刷版材料。  [2] The photosensitive lithographic printing plate material of [1], wherein the monofunctional monomer is an acrylamide derivative.
[3] 前記アクリルアミド誘導体が N—アルキルアクリルアミドであることを特徴とする請求 の範囲第 2項に記載の感光性平版印刷版材料。 3. The photosensitive lithographic printing plate material according to claim 2, wherein the acrylamide derivative is N-alkylacrylamide.
[4] 前記感光層が、重合可能なエチレン性不飽和結合含有化合物として、 1分子中に アミド結合と 3級アミノ基を有する多官能アタリレートを含有することを特徴とする請求 の範囲第 1項〜第 3項のいずれか一項に記載の感光性平版印刷版材料。 [4] The photosensitive layer contains, as a polymerizable ethylenically unsaturated bond-containing compound, a polyfunctional acrylate having an amide bond and a tertiary amino group in one molecule. Item 4. The photosensitive lithographic printing plate material according to any one of Items 1 to 3.
PCT/JP2007/066103 2006-08-30 2007-08-20 Photosensitive lithographic printing plate material WO2008026465A1 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009175647A (en) * 2008-01-28 2009-08-06 Fujifilm Corp Photosensitive resin composition, photo spacer, forming method for it, protective film, coloring pattern, substrate for display device and display device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60225150A (en) * 1984-04-20 1985-11-09 Goou Kagaku Kogyo Kk Resin composition curable with ultraviolet rays
JP2005165008A (en) * 2003-12-03 2005-06-23 Konica Minolta Medical & Graphic Inc Photosensitive composition and photosensitive lithographic printing plate
JP2005329708A (en) * 2004-03-19 2005-12-02 Fuji Photo Film Co Ltd Original plate of lithographic plate
JP2006064952A (en) * 2004-08-26 2006-03-09 Mitsubishi Paper Mills Ltd Photosensitive lithographic printing plate and development processing method
JP2007025238A (en) * 2005-07-15 2007-02-01 Fujifilm Holdings Corp Polymerizable composition and negative lithographic printing original plate using the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60225150A (en) * 1984-04-20 1985-11-09 Goou Kagaku Kogyo Kk Resin composition curable with ultraviolet rays
JP2005165008A (en) * 2003-12-03 2005-06-23 Konica Minolta Medical & Graphic Inc Photosensitive composition and photosensitive lithographic printing plate
JP2005329708A (en) * 2004-03-19 2005-12-02 Fuji Photo Film Co Ltd Original plate of lithographic plate
JP2006064952A (en) * 2004-08-26 2006-03-09 Mitsubishi Paper Mills Ltd Photosensitive lithographic printing plate and development processing method
JP2007025238A (en) * 2005-07-15 2007-02-01 Fujifilm Holdings Corp Polymerizable composition and negative lithographic printing original plate using the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009175647A (en) * 2008-01-28 2009-08-06 Fujifilm Corp Photosensitive resin composition, photo spacer, forming method for it, protective film, coloring pattern, substrate for display device and display device

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