JP2007025238A - Polymerizable composition and negative lithographic printing original plate using the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a negative lithographic printing original plate excellent in sensitivity and printing durability, and a polymerizable composition useful as a recording layer of the lithographic printing original plate. <P>SOLUTION: The polymerizable composition contains (A) a compound having at least one ethylenically unsaturated bond represented by formula (I), (B) an infrared absorbent and (C) a radical polymerization initiator, wherein M represents a substituent represented by a skeleton structure comprising a structure of which dipole moment is ≥0.55 Debye; L represents a divalent organic group; R<SP>1</SP>represents H or methyl; and n represents an integer of 1-6. The polymerizable composition is useful as a recording layer of the negative lithographic printing original plate. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention includes three-dimensional stereolithography, holography, lithographic printing plate materials, synthetic resin relief plates used for flexographic printing, color proofs, photoresists, color filters and other image forming materials, inks, paints, adhesives, etc. In particular, a polymerizable composition that can be directly made from a digital signal of a computer or the like using an infrared laser, and that is suitably used as a recording layer of a lithographic printing plate precursor capable of direct plate making, and the same Relates to a negative lithographic printing plate precursor using

  The development of lasers in recent years has been remarkable, and in particular, solid-state lasers, semiconductor lasers, and gas lasers that emit ultraviolet light, visible light, and infrared light having a wavelength of 300 nm to 1200 nm can be easily obtained with high output and small size. In particular, solid lasers and semiconductor lasers (hereinafter sometimes referred to as “infrared lasers”) that emit infrared rays having a wavelength of 760 nm to 1200 nm are used for direct printing plates using digital data from computers, etc., particularly in the field of lithographic printing. It is very useful as a recording light source for plate making. Along with this, various studies have been conducted on recording materials for lithographic printing plate precursors that are sensitive to these various laser beams, and positive recording materials compatible with infrared lasers having a photosensitive wavelength of 760 nm or more (for example, see Patent Document 1), acids. A catalyst-crosslinking negative recording material (see, for example, Patent Document 2) is known.

  In general, a negative type image-forming material that can be recorded by infrared exposure includes an infrared absorber that absorbs infrared light energy and converts it into heat, and a radical that generates radicals by heat obtained from the infrared absorber. By having a recording layer made of a polymerizable composition containing a polymerization initiator and a polymerizable compound that polymerizes the generated radical as an initiator, and the polymerization reaction of the polymerizable compound occurs and proceeds in the exposed area. A recording method is used in which the recording layer is cured to form an image. Such a negative type image forming material has a problem that its sensitivity is lower than that of a positive type in which the recording layer is solubilized by the energy of infrared light. Therefore, a negative lithographic printing plate precursor composed of a highly sensitive polymerizable composition for such an infrared recording light source, that is, a negative image forming material whose solubility in a developer is greatly reduced by infrared exposure. It has been demanded.

As an image forming material for the purpose of improving sensitivity, for example, a chemically amplified photosensitive material (see, for example, Patent Document 3) or a photosensitive material using polymerization of an ethylenically unsaturated compound (see, for example, Patent Document 4). And the like containing components having excellent reactivity to light and heat. Furthermore, in the light-sensitive material using polymerization of an ethylenically unsaturated compound, a light-sensitive material to which a reducing additive is added (for example, see Patent Document 5), a light-sensitive material to which a dithio compound or the like is added (for example, Patent Document 6). For example). However, none of these photosensitive materials satisfies practical sensitivity.
In addition, such a recording material may be unsatisfactory in storage stability, such as undesired reactions occurring due to handling under white light or changes in environmental temperature, or polymerization inhibition due to oxygen in the air. there were.

Furthermore, as a light-sensitive material also for the purpose of improving sensitivity, an infrared-sensitive polymerizable composition using N-phenylglycine or the like (see, for example, Patent Document 7), or a polycarboxylic acid such as N-phenyliminodiacetic acid. An infrared photosensitive polymerizable composition using an acid compound is known (see, for example, Patent Document 8), but a development time capable of achieving both complete removal of a non-image area and formation of an image area without damage. There are problems that the range (development tolerance) is small, the sensitivity is lowered with time, and the printing durability is insufficient.
U.S. Pat. No. 4,708,925 JP-A-8-276558 Japanese Patent Laid-Open No. 11-65105 JP 2000-89455 A JP 2002-82429 A JP 2002-90985 A JP-A-1-287105 International Publication No. 00/48836 pamphlet

  The object of the present invention, which has been made in consideration of the above-mentioned drawbacks of the conventional techniques, is a negative lithographic printing plate precursor excellent in sensitivity and printing durability, and a recording layer of such a negative lithographic printing plate precursor. It is an object of the present invention to provide a polymerizable composition that can be cured with high sensitivity and can form a film with high strength.

As a result of intensive studies, the present inventors have used a compound having at least one ethylenically unsaturated bond represented by the following general formula (I) as the polymerizable compound (crosslinking agent) in the polymerizable composition, The inventors have found that the above object can be achieved and have completed the present invention.
That is, the polymerizable composition of the present invention comprises (A) a compound having at least one ethylenically unsaturated bond represented by the following general formula (I), (B) an infrared absorber, and (C) radical polymerization. And an initiator.

(In General Formula (I), M represents a substituent represented by a skeleton structure having a dipole moment of 0.55 Debye or more, L represents a divalent organic group, and R ¹ represents a hydrogen atom or a methyl group. n represents an integer of 1 to 6.)

  As the compound (A) having at least one ethylenically unsaturated bond represented by the following general formula (I), a compound represented by the following general formula (II) is a preferred embodiment.

(In the general formula (II), Z is an aromatic heterocyclic group having a structure having at least one oxygen atom, sulfur atom and nitrogen atom and a dipole moment of 0.55 Debye or more, and L is a divalent organic group. Group R ¹ represents a hydrogen atom or a methyl group, and n represents an integer of 1 to 6.)

  In addition, the polymerizable composition according to claim 3 of the present invention includes (A) a compound having at least one ethylenically unsaturated bond represented by the following general formula (III), (B) an infrared absorber, (C) a radical polymerization initiator.

(In General Formula (III), Y is an aromatic heterocyclic group having a polarization structure having at least one oxygen atom, sulfur atom and nitrogen atom, L is a divalent organic group, R ¹ is a hydrogen atom or Represents a methyl group, and n represents an integer of 1 to 6.)

  The negative lithographic printing plate precursor according to claim 4 of the present invention is provided with a recording layer containing the polymerizable composition according to any one of claims 1 to 3 on a support. It is characterized by that.

  Although the action of the present invention is not clear, a compound having at least one ethylenically unsaturated bond represented by the general formula (I) (hereinafter, referred to as “specific polymerizable compound” as appropriate) Because of having a skeletal structure with a high dipole moment, when forming a film with this polymerizable composition, the specific polymerizable compound is closely packed and oriented by interacting with each other in the high dipole moment structure. It is considered a thing. When this film is exposed to infrared rays, it is presumed that the polymerization chain due to the polymerization initiation radical generated by the exposure is promoted by the orientation of the specific polymerizable compound, and the polymerization reaction becomes highly efficient. Therefore, it is considered that the polymerizable composition of the present invention is cured with high sensitivity upon exposure, has a high crosslink density in the exposed area, and is excellent in film strength. Further, a negative lithographic printing plate precursor using such a polymerizable composition as a recording layer is capable of recording with high sensitivity, and due to the crosslinking density, not only the film strength but also the penetration of an alkaline aqueous solution Is suppressed and the development resistance is improved, so that the printing durability during printing is excellent.

  According to the present invention, a negative lithographic printing plate precursor having an image formed with high sensitivity and excellent printing durability and a recording layer of such a negative lithographic printing plate precursor are cured with high sensitivity and cured. A polymerizable composition having excellent film strength can be obtained.

[Polymerizable composition]
The polymerizable composition of the present invention comprises (A) a compound (specific polymerizable compound) having at least one ethylenically unsaturated bond represented by the general formula (I), (B) an infrared absorber, C) a radical polymerization initiator.
Hereinafter, each composition of such a polymerizable composition will be sequentially described.

[(A) Compound having at least one ethylenically unsaturated bond represented by formula (I) (specific polymerizable compound)]
The (A) specific polymerizable compound used in the present invention is a compound having at least one ethylenically unsaturated bond represented by the following general formula (I).

In general formula (I), M represents a substituent represented by a skeleton structure having a dipole moment of 0.55 Debye or more, L represents a divalent organic group, and R ¹ represents a hydrogen atom or a methyl group.
Here, the dipole moment used in the present invention will be described.
The dipole moment in the present invention employs a value calculated by the following method using the molecular orbital method. The molecular orbital method used in the present invention solves the Hartree-Fock-Roothan equation FC = SCE (F: Hartley-Fock matrix, C: AO coefficient matrix, S: overlap integral, E: energy eigenvalue physics matrix) In the present invention, “MOPAC” which is a calculation program for the semi-empirical molecular orbital method is used. “MOPAC” is a method for ignoring the differential overlap of two-electron integrals, and further reducing the amount of calculations by using parameters (for example, AM1 parameters) instead of integral calculations for atoms and some typical molecular experimental values. It is a calculation method widely known in the industry, and details are described in “5th edition, Experimental Chemistry Course 12: Computational Chemistry” (Maruzen), p. 48-59, edited by the Chemical Society of Japan. With reference to these descriptions, the dipole moment in this specification can be calculated.

Examples of the substituent having a dipole moment represented by M of 0.55 Debye or more include one to three benzene rings forming a condensed ring, and a benzene ring and a five-membered unsaturated ring forming a condensed ring. Specific examples include a phenyl group, a naphthyl group, an anthryl group, a phenanthryl group, an indenyl group, an acenaphthenyl group, and a fluorenyl group, and among them, a phenyl group and a naphthyl group are particularly preferable.
In addition, these aromatic groups may have a substituent, and examples of such a substituent include a group composed of a monovalent nonmetallic atomic group excluding a hydrogen atom. For example, what was shown as a substituent in the below-mentioned alkyl group, a substituted alkyl group, or a substituted alkyl group can be mentioned.

  In the polymerizable composition of the present invention, the specific polymerizable compound represented by the general formula (I) is a skeleton structure having a structure having a dipole moment of 0.55 Debye or more, and at least a heteroatom is present in the polymerizable composition. It is preferably an aromatic heterocyclic group having one, and specifically, a compound represented by the following general formula (II) is a preferred embodiment.

In general formula (II), Z is an aromatic heterocyclic group having a structure having at least one oxygen atom, sulfur atom and nitrogen atom and a dipole moment of 0.55 Debye or more, and L is a divalent organic group. , R ¹ represents a hydrogen atom or a methyl group.

  As the aromatic heterocyclic group represented by Z, an aromatic heterocyclic group having at least one oxygen atom, sulfur atom, nitrogen atom, specifically, for example, a pyrrole ring group, a furan ring group, Thiophene ring group, benzopyrrole ring group, benzofuran ring group, benzothiophene ring group, pyrazole ring group, isoxazole ring group, isothiazole ring group, indazole ring group, benzoisoxazole ring group, benzoisothiazole ring group, imidazole ring Group, oxazole ring group, oxadiazole ring group, thiazole ring group, thiadiazole group, benzimidazole ring group, benzoxazole ring group, benzothiazole ring group, pyridine ring group, quinoline ring group, isoquinoline ring group, pyridazine ring group, Pyrimidine ring group, pyrazine ring group, phthalazine ring group, quinazoline ring group, quinoxaline ring group, acylid Ring group, phenanthridine ring group, carbazole ring group, purine ring group, pyran ring group, piperidine ring group, piperazine ring group, morpholine ring group, indole ring group, indolizine ring group, chromene ring group, cinnoline ring group, Examples thereof include an acridine ring group, a phenothiazine ring group, a tetrazole ring group, and a triazine ring group. Among them, those having a pyridine structure, a thiophene structure, a thiadiazole structure, and an oxadiazole structure are particularly preferable embodiments.

  Moreover, these heterocyclic groups may have a substituent, and examples of such a substituent include a group composed of a monovalent nonmetallic atomic group excluding a hydrogen atom. For example, what was shown as a substituent in the below-mentioned alkyl group, a substituted alkyl group, or a substituted alkyl group can be mentioned.

  As the monovalent substituent consisting of a nonmetallic atom on the substituent represented by M or Z, a halogen atom, an amino group which may have a substituent, an alkoxycarbonyl group, a hydroxyl group, an ether group, a thiol group, A thioether group, a silyl group, a nitro group, a cyano group, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, and a heterocyclic group, each of which may have a substituent, are preferable.

  Examples of the alkyl group in the monovalent substituent include linear, branched, and cyclic alkyl groups having 1 to 20 carbon atoms. Specific examples thereof include a methyl group and an ethyl group. Propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, dodecyl group, tridecyl group, hexadecyl group, octadecyl group, eicosyl group, isopropyl group, isobutyl group, s Examples include -butyl group, t-butyl group, isopentyl group, neopentyl group, 1-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, cyclohexyl group, cyclopentyl group, and 2-norbornyl group. Of these, linear alkyl groups having 1 to 12 carbon atoms, branched alkyl groups having 3 to 12 carbon atoms, and cyclic alkyl groups having 5 to 10 carbon atoms are more preferable.

  Examples of the substituent of the substituted alkyl group include a substituent composed of a monovalent nonmetallic atom excluding a hydrogen atom. Preferred examples include a halogen atom (—F, —Br, —Cl, —I), a hydroxyl group. , Alkoxy group, aryloxy group, mercapto group, alkylthio group, arylthio group, alkyldithio group, aryldithio group, amino group, N-alkylamino group, N, N-dialkylamino group, N-arylamino group, N, N -Diarylamino group, N-alkyl-N-arylamino group, acyloxy group, carbamoyloxy group, N-alkylcarbamoyloxy group, N-arylcarbamoyloxy group, N, N-dialkylcarbamoyloxy group, N, N-diaryl Carbamoyloxy group, N-alkyl-N-arylcarbamoyloxy group, alkyl Sulfoxy group, arylsulfoxy group, acylthio group, acylamino group, N-alkylacylamino group, N-arylacylamino group, ureido group, N′-alkylureido group, N ′, N′-dialkylureido group, N ′ An arylureido group, an N ′, N′-diarylureido group, an N′-alkyl-N′-arylureido group, an N-alkylureido group, an N-arylureido group, an N′-alkyl-N-alkylureido group, N′-alkyl-N-arylureido group, N ′, N′-dialkyl-N-alkylureido group, N ′, N′-dialkyl-N-arylureido group, N′-aryl-N-alkylureido group, N′-aryl-N-arylureido group, N ′, N′-diaryl-N-alkylureido group, N ′, N′-dia -N-arylureido group, N'-alkyl-N'-aryl-N-alkylureido group, N'-alkyl-N'-aryl-N-arylureido group, alkoxycarbonylamino group, aryloxycarbonylamino Group, N-alkyl-N-alkoxycarbonylamino group, N-alkyl-N-aryloxycarbonylamino group, N-aryl-N-alkoxycarbonylamino group, N-aryl-N-aryloxycarbonylamino group, formyl group , Acyl group, carboxyl group, alkoxycarbonyl group, aryloxycarbonyl group, carbamoyl group, N-alkylcarbamoyl group, N, N-dialkylcarbamoyl group, N-arylcarbamoyl group, N, N-diarylcarbamoyl group, N-alkyl -N-arylcarbamoyl Group, alkylsulfinyl group, arylsulfinyl group, alkylsulfonyl group,

Arylsulfonyl group, sulfo group (—SO ₃ H) and its conjugate base group (referred to as sulfonate group), alkoxysulfonyl group, aryloxysulfonyl group, sulfinamoyl group, N-alkylsulfinamoyl group, N, N-dialkyls Rufiinamoyl group, N-arylsulfinamoyl group, N, N-diarylsulfinamoyl group, N-alkyl-N-arylsulfinamoyl group, sulfamoyl group, N-alkylsulfamoyl group, N, N- dialkylsulfamoyl group, N- aryl sulfamoyl group, N, N- diaryl sulfamoyl group, N- alkyl -N- arylsulfamoyl group, a phosphono group (-PO ₃ H ₂₎ and its conjugated base group (referred to as phosphonato group), dialkylphosphono group (-PO ₃ (alkyl) ₂₎ wherein "alk l = alkyl group, hereinafter the "diarylphosphono group (-PO ₃ (aryl) _2)" aryl = aryl group, hereinafter the "alkylaryl phosphono group _{(-PO 3 (alkyl) (aryl} )), mono Alkylphosphono group (—PO ₃ (alkyl)) and its conjugate base group (referred to as alkylphosphonato group), monoarylphosphono group (—PO ₃ H (aryl)) and its conjugate base group (arylphosphonate group) ), Phosphonooxy group (—OPO ₃ H ₂ ) and its conjugate base group (referred to as phosphonatoxy group), dialkylphosphonooxy group (—OPO ₃ H (alkyl) ₂ ), diarylphosphonooxy group (—OPO _3). (aryl) _2), alkylaryl phosphono group _{(-OPO 3 (alkyl) (aryl} )), monoalkyl phosphonates Oxy group (-OPO ₃ H (alkyl)) and its conjugated base group (alkyl referred to as phosphonic Hona preparative group), monoarylphosphono group (-OPO ₃ H (aryl)) and its conjugated base group (aryl phosphite Hona DOO Oxy group), cyano group, nitro group, aryl group, alkenyl group, alkynyl group, heterocyclic group, silyl group and the like.

  Specific examples of the alkyl group in these substituents include the aforementioned alkyl groups, and specific examples of the aryl group in the above substituents include a phenyl group, a biphenyl group, a naphthyl group, a tolyl group, a xylyl group, and a mesityl group. , Cumenyl group, chlorophenyl group, bromophenyl group, chloromethylphenyl group, hydroxyphenyl group, methoxyphenyl group, ethoxyphenyl group, phenoxyphenyl group, acetoxyphenyl group, benzoyloxyphenyl group, methylthiophenyl group, phenylthiophenyl group , Methylaminophenyl group, dimethylaminophenyl group, acetylaminophenyl group, carboxyphenyl group, methoxycarbonylphenyl group, ethoxyphenylcarbonyl group, phenoxycarbonylphenyl group, N-phenylcarbamoylpheny Group, cyanophenyl group, sulfophenyl group, sulfonatophenyl group, phosphonophenyl group, and a phosphate Hona preparative phenyl group.

Examples of alkenyl groups include vinyl, 1-propenyl, 1-butenyl, cinnamyl, 2-chloro-1-ethenyl, etc. Examples of alkynyl include ethynyl, 1 -Propynyl group, 1-butynyl group, trimethylsilylethynyl group and the like.
The R ⁰¹ of the acyl group (R ⁰¹ CO-), include hydrogen atom, and the above-described alkyl group, an aryl group. Among these substituents, halogen atoms (—F, —Br, —Cl, —I), alkoxy groups, aryloxy groups, alkylthio groups, arylthio groups, N-alkylamino groups, N, N are more preferable. -Dialkylamino group, acyloxy group, N-alkylcarbamoyloxy group, N-arylcarbamoyloxy group, acylamino group, formyl group, acyl group, carboxyl group, alkoxycarbonyl group, aryloxycarbonyl group, carbamoyl group, N-alkylcarbamoyl group Group, N, N-dialkylcarbamoyl group, N-arylcarbamoyl group, N-alkyl-N-arylcarbamoyl group, sulfo group, sulfonate group, sulfamoyl group, N-alkylsulfamoyl group, N, N-dialkylsulfa group Moyl group, N-arylsulfur Amoyl group, N-alkyl-N-arylsulfamoyl group, phosphono group, phosphonato group, dialkylphosphono group, diarylphosphono group, monoalkylphosphono group, alkylphosphonato group, monoarylphosphono group, arylphospho Examples thereof include a nato group, a phosphonooxy group, a phosphonatooxy group, an aryl group, and an alkenyl group.
Examples of the heterocyclic group include a pyridyl group and a piperidinyl group. Examples of the silyl group include a trimethylsilyl group.

  On the other hand, examples of the alkylene group in the substituted alkyl group include divalent organic residues obtained by removing any one of the hydrogen atoms on the alkyl group having 1 to 20 carbon atoms. Can include linear alkylene groups having 1 to 12 carbon atoms, branched chains having 3 to 12 carbon atoms, and cyclic alkylene groups having 5 to 10 carbon atoms. Preferable specific examples of the substituted alkyl group obtained by combining such a substituent and an alkylene group include a chloromethyl group, a bromomethyl group, a 2-chloroethyl group, a trifluoromethyl group, a methoxymethyl group, and an isopropoxymethyl group. , Butoxymethyl group, s-butoxybutyl group, methoxyethoxyethyl group, allyloxymethyl group, phenoxymethyl group, methylthiomethyl group, tolylthiomethyl group, pyridylmethyl group, tetramethylpiperidinylmethyl group, N-acetyltetra Methylpiperidinylmethyl group, trimethylsilylmethyl group, methoxyethyl group, ethylaminoethyl group, diethylaminopropyl group, morpholinopropyl group, acetyloxymethyl group, benzoyloxymethyl group, N-cyclohexylcarbamoyloxyethyl Group, N-phenylcarbamoyloxyethyl group, acetylaminoethyl group, N-methylbenzoylaminopropyl group, 2-oxoethyl group, 2-oxopropyl group, carboxypropyl group, methoxycarbonylethyl group, allyloxycarbonylbutyl group, chloro Phenoxycarbonylmethyl group, carbamoylmethyl group, N-methylcarbamoylethyl group, N, N-dipropylcarbamoylmethyl group, N- (methoxyphenyl) carbamoylethyl group, N-methyl-N- (sulfophenyl) carbamoylmethyl group, Sulfobutyl group, sulfonatobutyl group, sulfamoylbutyl group, N-ethylsulfamoylmethyl group, N, N-dipropylsulfamoylpropyl group, N-tolylsulfamoylpropyl group, N-methyl-N- (phosphonov Nyl) sulfamoyloctyl group, phosphonobutyl group, phosphonatohexyl group, diethylphosphonobutyl group, diphenylphosphonopropyl group, methylphosphonobutyl group, methylphosphonatobutyl group, tolylphosphonohexyl group, tolylphosphonatohexyl Group, phosphonooxypropyl group, phosphonatoxybutyl group, benzyl group, phenethyl group, α-methylbenzyl group, 1-methyl-1-phenylethyl group, p-methylbenzyl group, cinnamyl group, allyl group, 1- Examples thereof include a propenylmethyl group, a 2-butenyl group, a 2-methylallyl group, a 2-methylpropenylmethyl group, a 2-propynyl group, a 2-butynyl group, and a 3-butynyl group.

Examples of the aryl group include those in which 1 to 3 benzene rings form a condensed ring, and those in which a benzene ring and a 5-membered unsaturated ring form a condensed ring. Specific examples include a phenyl group, A naphthyl group, an anthryl group, a phenanthryl group, an indenyl group, an acenaphthenyl group, and a fluorenyl group can be exemplified, and among these, a phenyl group and a naphthyl group are more preferable.
As the substituted aryl group, those having a group consisting of a monovalent non-metallic atomic group excluding a hydrogen atom as a substituent on the ring-forming carbon atom of the aforementioned aryl group are used. Examples of preferred substituents include the alkyl groups, substituted alkyl groups, and those previously shown as substituents in the substituted alkyl group.

  Preferred examples of such a substituted aryl group include biphenyl group, tolyl group, xylyl group, mesityl group, cumenyl group, chlorophenyl group, bromophenyl group, fluorophenyl group, chloromethylphenyl group, trifluoromethylphenyl group. Hydroxyphenyl group, methoxyphenyl group, methoxyethoxyphenyl group, allyloxyphenyl group, phenoxyphenyl group, methylthiophenyl group, tolylthiophenyl group, ethylaminophenyl group, diethylaminophenyl group, morpholinophenyl group, acetyloxyphenyl group, Benzoyloxyphenyl group, N-cyclohexylcarbamoyloxyphenyl group, N-phenylcarbamoyloxyphenyl group, acetylaminophenyl group, N-methylbenzoylaminophenyl group, cal Xiphenyl group, methoxycarbonylphenyl group, allyloxycarbonylphenyl group, chlorophenoxycarbonylphenyl group, carbamoylphenyl group, N-methylcarbamoylphenyl group, N, N-dipropylcarbamoylphenyl group, N- (methoxyphenyl) carbamoylphenyl group N-methyl-N- (sulfophenyl) carbamoylphenyl group, sulfophenyl group, sulfonatophenyl group, sulfamoylphenyl group, N-ethylsulfamoylphenyl group, N, N-dipropylsulfamoylphenyl group, N-tolylsulfamoylphenyl group, N-methyl-N- (phosphonophenyl) sulfamoylphenyl group, phosphonophenyl group, phosphonatophenyl group, diethylphosphonophenyl group, diphenylphosphonophenyl Methylphosphonophenyl group, methylphosphonatophenyl group, tolylphosphonophenyl group, tolylphosphonophenyl group, allylphenyl group, 1-propenylmethylphenyl group, 2-butenylphenyl group, 2-methylallylphenyl group, A 2-methylpropenylphenyl group, a 2-propynylphenyl group, a 2-butynylphenyl group, a 3-butynylphenyl group, and the like can be given.

An alkenyl group, a substituted alkenyl group, an alkynyl group, and a substituted alkynyl group (—C (R ⁰² ) ═C (R ⁰³ ) (R ⁰⁴ ) and —C≡C (R ⁰⁵ )) include R ⁰² , R ⁰³ , R ⁰⁴ , and R ⁰⁵ can be a group composed of a monovalent nonmetallic atom. Preferable examples of R ⁰² , R ⁰³ , R ⁰⁴ , and R ⁰⁵ include a hydrogen atom, a halogen atom, an alkyl group, a substituted alkyl group, an aryl group, and a substituted aryl group. Specific examples thereof include those shown as the above examples. More preferred groups of R ⁰² , R ⁰³ , R ⁰⁴ , and R ⁰⁵ include a hydrogen atom, a halogen atom, and a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms.

Preferable specific examples of such alkenyl group, substituted alkenyl group, alkynyl group and substituted alkynyl group include vinyl group, 1-propenyl group, 1-butenyl group, 1-pentenyl group, 1-hexenyl group and 1-octenyl group. 1-methyl-1-propenyl group, 2-methyl-1-propenyl group, 2-methyl-1-butenyl group, 2-phenyl-1-ethenyl group, 2-chloro-1-ethenyl group, ethynyl group, 1 -A propynyl group, 1-butynyl group, and phenylethynyl group can be mentioned.
Examples of the heterocyclic group include the pyridyl group exemplified as the substituent of the substituted alkyl group.

As the substituted oxy group (R ⁰⁶ O—), a group in which R ⁰⁶ is a group composed of a monovalent nonmetallic atom excluding a hydrogen atom can be used. Preferred substituted oxy groups include alkoxy groups, aryloxy groups, acyloxy groups, carbamoyloxy groups, N-alkylcarbamoyloxy groups, N-arylcarbamoyloxy groups, N, N-dialkylcarbamoyloxy groups, N, N-diarylcarbamoyloxy groups. Groups, N-alkyl-N-arylcarbamoyloxy groups, alkylsulfoxy groups, arylsulfoxy groups, phosphonooxy groups, and phosphonatoxy groups. Examples of the alkyl group and aryl group in these include the alkyl groups, substituted alkyl groups, aryl groups, and substituted aryl groups described above. Examples of the acyl group (R ⁰⁷ CO—) in the acyloxy group include those in which R ⁰⁷ is the alkyl group, substituted alkyl group, aryl group, and substituted aryl group mentioned above. Among these substituents, an alkoxy group, an aryloxy group, an acyloxy group, and an arylsulfoxy group are more preferable. Specific examples of preferred substituted oxy groups include methoxy, ethoxy, propyloxy, isopropyloxy, butyloxy, pentyloxy, hexyloxy, dodecyloxy, benzyloxy, allyloxy, phenethyloxy, Carboxyethyloxy group, methoxycarbonylethyloxy group, ethoxycarbonylethyloxy group, methoxyethoxy group, phenoxyethoxy group, methoxyethoxyethoxy group, ethoxyethoxyethoxy group, morpholinoethoxy group, morpholinopropyloxy group, allyloxyethoxyethoxy group, Phenoxy group, tolyloxy group, xylyloxy group, mesityloxy group, mesityloxy group, cumenyloxy group, methoxyphenyloxy group, ethoxyphenyloxy group, chlorophenyl Alkoxy group, bromophenyl group, acetyloxy group, benzoyloxy group, naphthyloxy group, a phenylsulfonyloxy group, a phosphonooxy group, phosphonatoxy group, and the like.

The substituted amino group (R ⁰⁸ NH—, (R ⁰⁹ ) (R ⁰¹⁰ ) N—) including an amide group is a group in which R ⁰⁸ , R ⁰⁹ , and R ⁰¹⁰ are monovalent nonmetallic atomic groups excluding hydrogen atoms Can be used. R ⁰⁹ and R ⁰¹⁰ may be bonded to form a ring. Preferred examples of the substituted amino group include an N-alkylamino group, an N, N-dialkylamino group, an N-arylamino group, an N, N-diarylamino group, an N-alkyl-N-arylamino group, an acylamino group, N-alkylacylamino group, N-arylacylamino group, ureido group, N′-alkylureido group, N ′, N′-dialkylureido group, N′-arylureido group, N ′, N′-diarylureido group N′-alkyl-N′-arylureido group, N-alkylureido group, N-arylureido group, N′-alkyl-N-alkylureido group, N′-alkyl-N-arylureido group, N ′, N′-dialkyl-N-alkylureido group, N′-alkyl-N′-arylureido group, N ′, N′-dialkyl-N-alkylureido group, N ′, '-Dialkyl-N'-arylureido group, N'-aryl-N-alkylureido group, N'-aryl-N-arylureido group, N', N'-diaryl-N-alkylureido group, N ', N′-diaryl-N-arylureido group, N′-alkyl-N′-aryl-N-alkylureido group, N′-alkyl-N′-aryl-N-arylureido group, alkoxycarbonylamino group, aryloxy A carbonylamino group, an N-alkyl-N-alkoxycarbonylamino group, an N-alkyl-N-aryloxycarbonylamino group, an N-aryl-N-alkoxycarbonylamino group, and an N-aryl-N-aryloxycarbonylamino group. Can be mentioned. Examples of the alkyl group and aryl group include those described above as the alkyl group, substituted alkyl group, aryl group, and substituted aryl group, such as acylamino group, N-alkylacylamino group, and N-arylacylamino. R ⁰⁷ groups definitive acyl group (R ⁰⁷ CO-) are as described above. Of these, more preferred are an N-alkylamino group, an N, N-dialkylamino group, an N-arylamino group, and an acylamino group. Specific examples of preferred substituted amino groups include methylamino group, ethylamino group, diethylamino group, morpholino group, piperidino group, pyrrolidino group, phenylamino group, benzoylamino group, acetylamino group and the like.

As the substituted sulfonyl group (R ⁰¹¹ —SO ₂ —), those in which R ⁰¹¹ is a group composed of a monovalent nonmetallic atomic group can be used. More preferable examples include an alkylsulfonyl group and an arylsulfonyl group. Examples of the alkyl group and aryl group in these include those described above as the alkyl group, substituted alkyl group, aryl group, and substituted aryl group. Specific examples of such a substituted sulfonyl group include a butylsulfonyl group, a phenylsulfonyl group, a chlorophenylsulfonyl group, and the like.

As described above, the sulfonate group (—SO ₃ ⁻ ) means a conjugate base anion group of the sulfo group (—SO ₃ H), and is usually preferably used together with a counter cation. Examples of such counter cations include those generally known, that is, various oniums (ammonium compounds, sulfonium compounds, phosphonium compounds, iodonium compounds, azinium compounds, etc.), and metal ions (Na ⁺ , K ⁺ , Ca). ²⁺ , Zn ^2+, etc.).

As the substituted carbonyl group (R ⁰¹³ —CO—), those in which R ⁰¹³ is a group composed of a monovalent nonmetallic atom can be used. Preferred examples of the substituted carbonyl group include formyl group, acyl group, carboxyl group, alkoxycarbonyl group, aryloxycarbonyl group, carbamoyl group, N-alkylcarbamoyl group, N, N-dialkylcarbamoyl group, N-arylcarbamoyl group, N, N-diarylcarbamoyl group, N-alkyl-N′-arylcarbamoyl group may be mentioned. Examples of the alkyl group and aryl group in these include those described above as the alkyl group, substituted alkyl group, aryl group, and substituted aryl group. Among these, more preferred substituted carbonyl groups include formyl group, acyl group, carboxyl group, alkoxycarbonyl group, aryloxycarbonyl group, carbamoyl group, N-alkylcarbamoyl group, N, N-dialkylcarbamoyl group, N-ary. A rucarbamoyl group can be mentioned, and even more preferred are a formyl group, an acyl group, an alkoxycarbonyl group and an aryloxycarbonyl group. Specific examples of preferred substituted carbonyl groups include formyl group, acetyl group, benzoyl group, carboxyl group, methoxycarbonyl group, ethoxycarbonyl group, allyloxycarbonyl group, dimethylaminophenylethenylcarbonyl group, methoxycarbonylmethoxycarbonyl group, N -Methylcarbamoyl group, N-phenylcarbamoyl group, N, N-diethylcarbamoyl group, morpholinocarbonyl group and the like.

As the substituted sulfinyl group (R ⁰¹⁴ —SO—), those in which R ⁰¹⁴ is a group composed of a monovalent nonmetallic atomic group can be used. Preferable examples include alkylsulfinyl group, arylsulfinyl group, sulfinamoyl group, N-alkylsulfinamoyl group, N, N-dialkylsulfinamoyl group, N-arylsulfinamoyl group, N, N-diarylsulfinamoyl. Group, N-alkyl-N-arylsulfinamoyl group. Examples of the alkyl group and aryl group in these include those described above as the alkyl group, substituted alkyl group, aryl group, and substituted aryl group. Of these, more preferred examples include an alkylsulfinyl group and an arylsulfinyl group. Specific examples of such a substituted sulfinyl group include a hexylsulfinyl group, a benzylsulfinyl group, and a tolylsulfinyl group.

  The substituted phosphono group means a group in which one or two hydroxyl groups on the phosphono group are substituted with other organic oxo groups, and preferred examples thereof include the above-mentioned dialkylphosphono group, diarylphosphono group, alkylarylphospho group. Group, monoalkylphosphono group and monoarylphosphono group. Of these, dialkylphosphono groups and diarylphosphono groups are more preferred. Specific examples thereof include a diethyl phosphono group, a dibutyl phosphono group, a diphenyl phosphono group, and the like.

As described above, the phosphonate group (—PO ₃ H ₂ ⁻ , —PO ₃ H ⁻ ) is a conjugate base anion derived from the acid first dissociation or acid second dissociation of the phosphono group (—PO ₃ H ₂ ). Means group. Usually, it is preferable to use it with a counter cation. Such counter cations include those generally known, that is, various oniums (ammonium, sulfonium, phosphonium, iodonium, azinium, etc.) and metal ions (Na ⁺ , K ⁺ , Ca ²⁺ , Zn ²⁺ etc.).

The substituted phosphonato group is a conjugated base anion group obtained by substituting one organic oxo group in the above-described substituted phosphono group. As a specific example, the above-described monoalkylphosphono group (—PO ₃ H ( alkyl)), and a conjugate base of a monoarylphosphono group (—PO ₃ H (aryl)).

  Below, the specific example of the frame | skeleton structure used for the partial structure represented by M or Z is shown with the molecular orbital calculation result of the dipole moment. The molecular orbital calculation is a result of calculation using a molecular orbital calculation program (MOPAC: AM1 parameter) manufactured by Fujitsu.

  The dipole moment of the skeleton structure used in the partial structure represented by M or Z of the present invention is preferably 2.0 Debye or more, and more preferably 3.0 or more. As a particularly preferred skeleton structure, a skeleton structure having the above partial structure is exemplified.

  Next, L will be described. Examples of the divalent organic group represented by L include an alkylene group, a phenylene group, and a naphthylene group. The divalent organic group may further have a substituent. Examples of the substituent that can be introduced include an alkyl group, an aryl group, an alkoxy group, an acyloxy group, a halogen atom, a hydroxy group, an amino group, and a cyano group. Group, nitro group, and the like. L may have a hetero atom. Specific examples of the linking group having a hetero atom include those having the following partial structures.

  Here, “having the following partial structure” means that L as a linking group or terminal group has at least one of the partial structures, and may have a plurality of the partial structures. Therefore, L may be the partial structure itself, and may be a group in which a plurality of these are connected, or a group in which the partial structure is connected to another hydrocarbon group or the like. Specific examples of particularly preferable L include the structures shown below.

以下に、本発明に係る（Ａ）特定重合性化合物の好ましい具体例〔例示化合物（Ａ−１）〜（Ａ−４２）〕を挙げるが、本発明はこれらに限定されるものではない。

Although the preferable specific example [Exemplary compound (A-1)-(A-42)] of (A) specific polymeric compound which concerns on this invention is given to the following, this invention is not limited to these.

Such a compound can be synthesized by a known method. An example is shown below.
<Synthesis of Compound (A-3)>
Under a nitrogen stream, 40 g of bismuthiol was placed in a 1 L eggplant-shaped flask and dissolved in 500 mL of methanol. 69.8 g of 2-bromoethanol and 59.2 g of triethylamine were added and stirred while cooling with ice. After 8 hours, the reaction solution was poured into 1 L of water and extracted by adding ethyl acetate. The organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated with a rotary evaporator to precipitate crystals (A-3 precursor: 22 g, 35%).
Subsequently, 20 g of the A-3 precursor was dissolved in 500 mL of acetone, and 21.2 g of triethylamine was added. After cooling the reaction solution with ice, 19.3 g of methacrylic acid chloride was added dropwise and stirred for 5 hours while cooling with ice. The reaction solution was poured into 1 L of water, and extraction was performed by adding ethyl acetate. The organic layer was washed with saturated brine, dried over magnesium sulfate, concentrated with a rotary evaporator, and purified using column chromatography to obtain A-3 (9 g, 48%). It was confirmed from the NMR spectrum, IR spectrum, and mass spectrometry spectrum that it was the compound (A-3).
Other specific polymerizable compounds can be obtained in the same manner by changing the starting materials.

The specific polymerizable compound (A) according to the present invention described above is used in detail, such as its structure, whether it is used alone or in combination, the purpose of use, for example, lithographic printing of the polymerizable composition of the present invention When used as a recording material for a plate precursor, it can be set arbitrarily according to the performance design of the final planographic printing plate precursor. For example, it is selected from the following viewpoints. From the viewpoint of photosensitive speed, a structure having a high unsaturated group content per molecule is preferable, and in many cases, a bifunctional or higher functionality is preferable. Further, in order to increase the strength of the image portion, that is, the cured film, those having three or more functionalities are preferable, and furthermore, different functional numbers and different polymerizable groups (for example, acrylic acid ester, methacrylic acid ester, styrenic compound, vinyl ether type). A method of adjusting both photosensitivity and intensity by using a compound) is also effective. A compound having a large molecular weight or a compound having high hydrophobicity is excellent in photosensitive speed and film strength, but is not preferable in terms of development speed and precipitation in a developer. Further, the selection / use method of the addition polymerization compound is also an important factor for the compatibility and dispersibility with other components (for example, binder polymer, initiator, colorant, etc.) in the recording layer. The compatibility may be improved by using a low-purity compound or using two or more kinds in combination. In addition, a specific structure may be selected for the purpose of improving the adhesion of the substrate and an overcoat layer described later. Regarding the compounding ratio of the specific polymerizable compound in the recording layer, a larger amount is advantageous in terms of sensitivity, but if it is too much, an undesirable phase separation occurs or a problem in the manufacturing process due to the adhesiveness of the recording layer For example, problems such as transfer of recording layer components, manufacturing defects due to adhesion, and precipitation from the developer may occur.
From these viewpoints, the specific polymerizable compound (A) is preferably used in the range of 5 to 80% by mass, more preferably 25 to 75% by mass with respect to the non-volatile component in the polymerizable composition. These may be used alone or in combination of two or more. In addition, the usage of the specific polymerizable compound can be arbitrarily selected from the viewpoint of polymerization inhibition with respect to oxygen, resolution, fogging, refractive index change, surface adhesiveness, etc. Depending on the case, a layer configuration and coating method such as undercoating and overcoating can be performed.

[(B) Infrared absorber]
The polymerizable composition of the present invention is characterized by containing an infrared absorber that absorbs infrared light and converts it into heat energy. By exposure at a wavelength that can be absorbed by the infrared absorber, a radical generation reaction of a radical polymerization initiator described later and a polymerization reaction of a polymerizable compound described later are accelerated. Examples of such infrared absorbers include known spectral sensitizing dyes or dyes or pigments that absorb light and interact with a radical photopolymerization initiator.

<Spectral sensitizing dye or dye>
Spectral sensitizing dyes or dyes preferred as infrared absorbers for use in the present invention are polynuclear aromatics (for example, pyrene, perylene, triphenylene), xanthenes (for example, fluorescein, eosin, erythrosine, rhodamine B, rose bengal). ), Cyanines (eg, thiacarbocyanine, oxacarbocyanine), merocyanines (eg, merocyanine, carbomerocyanine), thiazines (eg, thionine, methylene blue, toluidine blue), acridines (eg, acridine orange, chloroflavin) , Acriflavine), phthalocyanines (eg, phthalocyanine, metal phthalocyanine), porphyrins (eg, tetraphenylporphyrin, central metal-substituted porphyrins), chlorophylls (eg, chloro I le, chlorophyllin, center metal-substituted chlorophyll), metal complexes, anthraquinones, such as (anthraquinone), squaryliums, for example (squarylium), for example, the following compounds.

  More preferable spectral sensitizing dyes or dyes include pyrylium salts described in JP-B-40-28499, for example,

Cyanines described in JP-B-46-42363, for example,

Benzofuran dyes described in JP-A-2-63053, for example,

Conjugated ketone dyes disclosed in JP-A-2-85858 and JP-A-2-216154, for example,

A dye described in JP-A No. 57-10605, an azocinnamylidene derivative described in JP-B-2-30321, for example,

Cyanine dyes described in JP-A-1-287105, for example,

Xanthene dyes described in JP-A-62-31844, JP-A-62-31848, JP-A-62-143043, for example,

Aminostyryl ketone described in JP-B-59-28325, for example,

Etc.
The following infrared absorbers (dyes or pigments) are also preferably used as sensitizing dyes. Preferred examples of the dye include cyanine dyes described in JP-A-58-125246, JP-A-59-84356, JP-A-59-202829, JP-A-60-78787, and the like. Examples include cyanine dyes described in Japanese Patent No. 434,875.

  In addition, as cyanine dyes that can be suitably used in the present invention, paragraph numbers [0017] to [0019] of JP-A No. 2001-133969, paragraph numbers [0012] to [0038] of JP-A No. 2002-40638, Those described in paragraph numbers [0012] to [0023] of JP-A-2002-23360 can be mentioned. Specific examples include those exemplified below.

  Further, near infrared absorption sensitizers described in US Pat. No. 5,156,938 are also preferably used, and further substituted aryl benzoates described in US Pat. No. 3,881,924 are also used. (Thio) pyrylium salt, trimethine thiapyrylium salt described in JP-A-57-142645 (US Pat. No. 4,327,169), JP-A 58-181051, 58-220143, 59 -41363, 59-84248, 59-84249, 59-146063, 59-146061, pyranyl compounds described in JP-A-59-216146, cyanine dyes described in US The pentamethine thiopyrylium salt described in Japanese Patent No. 4,283,475, and the like described in Japanese Patent Publication Nos. 5-13514 and 5-19702 That pyrylium compounds are also preferably used.

  In addition, near infrared absorbing dyes described as formulas (I) and (II) in US Pat. No. 4,756,993 and phthalocyanine dyes described in EP 916513A2 are also preferable dyes. Can do.

  Furthermore, the anionic infrared absorber described in Japanese Patent Application No. 10-79912 can also be suitably used. An anionic infrared absorbing agent refers to an anionic infrared absorbing agent having an anionic structure without a cationic structure in the mother nucleus of a dye that substantially absorbs infrared rays. Examples include (a) anionic metal complexes, (b) anionic carbon black, (c) anionic phthalocyanine, and (d) compounds represented by the following general formula (21). The counter cation of these anionic infrared absorbers is a monovalent cation containing a proton or a polyvalent cation.

  Here, (a) an anionic metal complex refers to an anion that is an anion of the central metal and the entire ligand of the complex part that substantially absorbs light.

  (B) Examples of the anionic carbon black include carbon black to which anionic groups such as sulfonic acid, carboxylic acid, and phosphonic acid groups are bonded as substituents. In order to introduce these groups into carbon black, as described in Carbon Black Handbook 3rd Edition (Edited by Carbon Black Association, April 5, 1995, published by Carbon Black Association), page 12, What is necessary is just to take means, such as oxidizing carbon black.

  (C) Anionic phthalocyanine refers to a phthalocyanine skeleton having the anion group previously mentioned in the description of (b) as a substituent bonded to form an anion as a whole.

Next, (d) the compound represented by the general formula (21) will be described in detail. In the general formula (21), G ⁹ represents an anionic substituent, and G ¹⁰ represents a neutral substituent. (X ¹⁰ ) ⁺ represents a 1 to m-valent cation containing a proton, and m represents an integer of 1 to 6. M ⁵ represents a conjugated chain, and this conjugated chain M ⁵ may have a substituent or a ring structure. The conjugated chain M ⁵ can be represented by the following formula.

In the formula, R ⁸⁰ , R ⁸¹ and R ⁸² are each independently a hydrogen atom, halogen atom, cyano group, alkyl group, aryl group, alkenyl group, alkynyl group, carbonyl group, thio group, sulfonyl group, sulfinyl group, oxy A group and an amino group, which may be linked to each other to form a ring structure. n represents an integer of 1 to 8.

  Of the anionic infrared absorbers represented by the general formula (21), those of the following IRA-1 to IRA-5 are preferably used.

  Moreover, the cationic infrared absorber shown to the following IRC-1-IRC-44 can also be used preferably.

In the structural formula, T ⁻ represents a monovalent counter anion, preferably a halogen anion (F ⁻ , Cl ⁻ , Br ⁻ , I ⁻ ), a Lewis acid anion (BF ₄ ⁻ , PF ₆ ⁻ , SbCl _6). ⁻ , ClO ₄ ⁻ ), an alkyl sulfonate anion, and an aryl sulfonate anion.

  The alkyl of the alkyl sulfonic acid means a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, specifically, a methyl group, an ethyl group, a propyl group, a butyl group. , Pentyl, hexyl, heptyl, octyl, nonyl, decyl, undecyl, dodecyl, tridecyl, hexadecyl, octadecyl, eicosyl, isopropyl, isobutyl, s-butyl, t- A butyl group, isopentyl group, neopentyl group, 1-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, cyclohexyl group, cyclopentyl group, and 2-norbornyl group can be exemplified. Of these, linear alkyl groups having 1 to 12 carbon atoms, branched alkyl groups having 3 to 12 carbon atoms, and cyclic alkyl groups having 5 to 10 carbon atoms are more preferable.

  The aryl of the aryl sulfonic acid includes one consisting of one benzene ring, two or three benzene rings forming a condensed ring, and one having a benzene ring and a 5-membered unsaturated ring forming a condensed ring. Specific examples thereof include a phenyl group, a naphthyl group, an anthryl group, a phenanthryl group, an indenyl group, an acenabutenyl group, and a fluorenyl group. Among these, a phenyl group and a naphthyl group are more preferable.

  Moreover, the nonionic infrared absorber shown to the following IRN-1-IRN-9 can also be used preferably.

  Among the exemplified compounds, IRA-1 is a particularly preferable anionic infrared absorber, and IRC-7, IRC-30, IRC-40, and IRC-42 are nonionic infrared absorbers as cationic infrared absorbers. As IRN-9.

<Pigment>
Examples of the pigment used in the polymerizable composition in the present invention include commercially available pigments and Color Index (CI) manual, “Latest Pigment Handbook” (edited by the Japan Pigment Technology Association, published in 1977), “Latest Pigment Application Technology”. (CMC Publishing, published in 1986) and “Printing Ink Technology” published by CMC Publishing, published in 1984) can be used.

  Examples of the pigment include black pigments, yellow pigments, orange pigments, brown pigments, red pigments, purple pigments, blue pigments, green pigments, fluorescent pigments, metal powder pigments, and other polymer-bonded dyes. Specifically, insoluble azo pigments, azo lake pigments, condensed azo pigments, chelate azo pigments, phthalocyanine pigments, anthraquinone pigments, perylene and perinone pigments, thioindigo pigments, quinacridone pigments, dioxazine pigments, isoindolinone pigments In addition, quinophthalone pigments, dyed lake pigments, azine pigments, nitroso pigments, nitro pigments, natural pigments, fluorescent pigments, inorganic pigments, carbon black, and the like can be used. Among these pigments, carbon black is preferable.

  These pigments may be used without surface treatment, or may be used after surface treatment. The surface treatment method includes a method of surface coating with a resin or wax, a method of attaching a surfactant, a method of bonding a reactive substance (eg, silane coupling agent, epoxy compound, polyisocyanate, etc.) to the pigment surface, etc. Can be considered. The above-mentioned surface treatment methods are described in “Characteristics and Applications of Metal Soap” (Shobobo), “Printing Ink Technology” (CMC Publishing, 1984) and “Latest Pigment Application Technology” (CMC Publishing, 1986). Yes.

  The particle size of the pigment is preferably in the range of 0.01 μm to 10 μm, more preferably in the range of 0.05 μm to 1 μm, and particularly preferably in the range of 0.1 μm to 1 μm. When the particle diameter of the pigment is less than 0.01 μm, it is not preferable from the viewpoint of stability of the dispersion in the image recording layer coating solution, and when it exceeds 10 μm, it is not preferable from the viewpoint of uniformity of the image recording layer.

  As a method for dispersing the pigment, a known dispersion technique used in ink production, toner production, or the like can be used. Examples of the disperser include an ultrasonic disperser, a sand mill, an attritor, a pearl mill, a super mill, a ball mill, an impeller, a disperser, a KD mill, a colloid mill, a dynatron, a three-roll mill, and a pressure kneader. Details are described in "Latest Pigment Applied Technology" (CMC Publishing, 1986).

In addition, although the infrared absorber added in order to accelerate | stimulate the hardening reaction of the polymeric composition of this invention may be added directly with another component in a composition, another layer adjacent to this is provided. Even if it is added thereto, the same effect can be obtained.
In particular, when the polymerizable composition of the present invention is used as a material for a negative recording layer of a lithographic printing plate precursor, it may be added to the same layer as the recording layer, or another layer may be provided and added thereto. However, when a negative lithographic printing plate precursor is produced, the optical density at the absorption maximum in the wavelength range of 300 nm to 1200 nm of the recording layer is between 0.1 and 3.0. It is preferable from the viewpoint of sensitivity. Since the optical density is determined by the addition amount of the sensitizing dye and the thickness of the recording layer, the predetermined optical density can be obtained by controlling both conditions. The optical density of the recording layer can be measured by a conventional method. As a measuring method, for example, on a transparent or white support, a recording layer having a thickness appropriately determined in a range where the coating amount after drying is necessary as a lithographic printing plate is formed, and a transmission optical densitometer is used. Examples thereof include a measuring method, a method of forming a recording layer on a reflective support such as aluminum, and measuring a reflection density.

  In terms of the content of the infrared absorber, from the viewpoint of sensitivity and uniform film-forming property, 0.01 to 50% by mass, preferably 0.1 to 15% by mass, in the total solid content of the polymerizable composition, In particular, in the case of a dye, 0.5 to 15% by mass, preferably 1 to 10% by mass, and in the case of a pigment, 0.1 to 15% by mass, preferably 1 to 10% by mass can be added.

[(C) radical polymerization initiator]
The polymerizable composition of the present invention is characterized by containing a radical polymerization initiator. The radical polymerization initiator is a compound that generates radicals by light and / or heat energy and initiates and accelerates a polymerization reaction of a compound (polymerizable compound) having at least one ethylenically unsaturated bond (D) described later. Point to.
In the present invention, preferred radical polymerization initiators include (a) aromatic ketones, (b) onium salt compounds, (c) organic peroxides, (d) thio compounds, (e) hexaarylbiimidazole compounds, (F) Ketooxime ester compounds, (g) borate compounds, (h) azinium compounds, (i) metallocene compounds, (j) active ester compounds, (k) compounds having a carbon halogen bond, and the like. Specific examples of the above (a) to (k) are given below, but the present invention is not limited to these.

(A) Aromatic ketones (a) Aromatic ketones preferred as the radical polymerization initiator used in the present invention include “RADIATION CURING IN POLYMER SCIENCE AND TECHNOLOGY” P. Fouassier, J. et al. F. Examples include compounds having a benzophenone skeleton or a thioxanthone skeleton described in Rabek (1993), p77-117. For example,

Is mentioned. Among them, examples of particularly preferred (a) aromatic ketones include α-thiobenzophenone compounds described in JP-B-47-6416, benzoin ether compounds described in JP-B-47-3981, for example, the following compounds.

  Examples of the α-substituted benzoin compounds described in JP-B-47-22326 include the following compounds.

  Examples thereof include benzoin derivatives described in JP-B-47-23664, aroylphosphonic acid esters described in JP-A-57-30704, dialkoxybenzophenones described in JP-B-60-26483, for example, the following compounds.

  Examples of the benzoin ethers described in JP-B-60-26403 and JP-A-62-181345 include the following compounds.

  Examples of the α-aminobenzophenones described in JP-B-1-34242, US Pat. No. 4,318,791, and European Patent 0284561A1, such as the following compounds.

  P-Di (dimethylaminobenzoyl) benzene described in JP-A-2-211452, for example, the following compounds may be mentioned.

  Examples of the thio-substituted aromatic ketone described in JP-A-61-194062 include the following compounds.

  The acylphosphine sulfide described in JP-B-2-9597, for example, the following compounds may be mentioned.

  Examples of the acylphosphine described in JP-B-2-9596 include the following compounds.

  Further, thioxanthones described in JP-B-63-61950, coumarins described in JP-B-59-42864, and the like can also be mentioned.

(B) Onium Salt Compound Preferred examples of the radical polymerization initiator (b) onium salt compound used in the present invention include compounds represented by the following general formulas (1) to (3).

In formula (1), Ar ¹ and Ar ² each independently represent a 20 or less carbon atoms an aryl group which may have a substituent. Preferred substituents when this aryl group has a substituent include a halogen atom, a nitro group, an alkyl group having 12 or less carbon atoms, an alkoxy group having 12 or less carbon atoms, or a group having 12 or less carbon atoms. An aryloxy group is mentioned. (Z ² ) ⁻ represents a counter ion selected from the group consisting of halogen ion, perchlorate ion, carboxylate ion, tetrafluoroborate ion, hexafluorophosphate ion, and sulfonate ion, preferably perchloric acid Ions, hexafluorophosphate ions, and aryl sulfonate ions.

In Formula (2), Ar ³ represents an aryl group having 20 or less carbon atoms, which may have a substituent. Preferred examples of the substituent include a halogen atom, a nitro group, an alkyl group having 12 or less carbon atoms, an alkoxy group having 12 or less carbon atoms, an aryloxy group having 12 or less carbon atoms, and 12 or less carbon atoms. Examples thereof include an alkylamino group, a dialkylamino group having 12 or less carbon atoms, an arylamino group having 12 or less carbon atoms, or a diarylamino group having 12 or less carbon atoms. (Z ³ ) ⁻ represents a counter ion having the same meaning as (Z ² ) ⁻ .

In formula (3), R ²³ , R ²⁴ and R ²⁵ may be the same or different and each represents a hydrocarbon group having 20 or less carbon atoms which may have a substituent. Preferable substituents include a halogen atom, a nitro group, an alkyl group having 12 or less carbon atoms, an alkoxy group having 12 or less carbon atoms, or an aryloxy group having 12 or less carbon atoms. (Z ⁴ ) ⁻ represents a counter ion having the same meaning as (Z ² ) ⁻ .

  Specific examples of onium salts that can be suitably used in the present invention include those described in paragraphs [0030] to [0033] of Japanese Patent Application No. 11-310623 previously proposed by the present applicant. And those described in paragraphs [0015] to [0046] of Japanese Patent Application No. 2000-160323, Japanese Patent Application No. 2000-266797, Japanese Patent Application No. 2001-177150, Japanese Patent Application No. 2000-160323, Specific aromatic sulfonium salt compounds described in Japanese Patent Application No. 2000-184603, Japanese Patent Application No. 2000-310808, Japanese Patent Application No. 2002-265467, and Japanese Patent Application No. 2002-366539 may be mentioned.

  The onium salt used in the present invention preferably has a maximum absorption wavelength of 400 nm or less, and more preferably 360 nm or less. By making the absorption wavelength in the ultraviolet region in this way, the lithographic printing plate precursor can be handled under white light.

(C) Organic peroxide Preferred as the radical polymerization initiator used in the present invention (c) Organic peroxide includes almost all organic compounds having one or more oxygen-oxygen bonds in the molecule. Examples thereof include methyl ethyl ketone peroxide, cyclohexanone peroxide, 3,3,5-trimethylcyclohexanone peroxide, methylcyclohexanone peroxide, acetylacetone peroxide, 1,1-bis (tertiarybutylperoxy) -3,3. 5-trimethylcyclohexane, 1,1-bis (tertiarybutylperoxy) cyclohexane, 2,2-bis (tertiarybutylperoxy) butane, tertiary butyl hydroperoxide, cumene hydroperoxide, diisopropylbenzene high Dropper oxide, parameter hydroperoxide, 2,5-dimethylhexane-2,5-dihydroperoxide, 1,1,3,3-tetramethylbutyl hydroperoxide, ditertiary butyl peroxide, tertiary butyl Cumyl peroxide, dicumyl peroxide, bis (tertiarybutylperoxyisopropyl) benzene, 2,5-dimethyl-2,5-di (tertiarybutylperoxy) hexane, 2,5-xanoyl peroxide, peroxy Succinic oxide, benzoyl peroxide, 2,4-dichlorobenzoyl peroxide, meta-toluoyl peroxide, diisopropyl peroxydicarbonate, di-2-ethylhexyl peroxydicarbonate, di-2-ethoxyethyl peroxydicarbonate Dimethoxyisopropyl peroxycarbonate, di (3-methyl-3-methoxybutyl) peroxydicarbonate, tertiary butyl peroxyacetate, tertiary butyl peroxypivalate, tertiary butyl peroxyneodecanoate, Tertiary butyl peroxyoctanoate, tertiary butyl peroxy-3,5,5-trimethylhexanoate, tertiary butyl peroxylaurate, tertiary carbonate, 3,3'4,4'-tetra- ( t-butylperoxycarbonyl) benzophenone, 3,3′4,4′-tetra- (t-amylperoxycarbonyl) benzophenone, 3,3′4,4′-tetra- (t-hexylperoxycarbonyl) benzophenone , 3,3'4,4'-tetra- ( t-octylperoxycarbonyl) benzophenone, 3,3′4,4′-tetra- (cumylperoxycarbonyl) benzophenone, 3,3′4,4′-tetra- (p-isopropylcumylperoxycarbonyl) benzophenone, Examples include carbonyldi (t-butylperoxydihydrogen diphthalate), carbonyldi (t-hexylperoxydihydrogen diphthalate), and the like.

  Among them, 3,3′4,4′-tetra- (t-butylperoxycarbonyl) benzophenone, 3,3′4,4′-tetra- (t-amylperoxycarbonyl) benzophenone, 3,3′4 4'-tetra- (t-hexylperoxycarbonyl) benzophenone, 3,3'4,4'-tetra- (t-octylperoxycarbonyl) benzophenone, 3,3'4,4'-tetra- (cumylper) Peroxyesters such as (oxycarbonyl) benzophenone, 3,3′4,4′-tetra- (p-isopropylcumylperoxycarbonyl) benzophenone, di-t-butyldiperoxyisophthalate are preferred.

(D) Thio compound (d) Thio compounds preferable as the radical polymerization initiator used in the present invention include compounds having a structure represented by the following general formula (4).

(Wherein R ²⁶ represents an alkyl group, an aryl group or a substituted aryl group, R ²⁷ represents a hydrogen atom or an alkyl group, and R ²⁶ and R ²⁷ are bonded to each other to form an oxygen, sulfur and nitrogen atom. (A group of nonmetallic atoms necessary to form a 5-membered to 7-membered ring which may contain a selected heteroatom.)
As an alkyl group in the said General formula (4), a C1-C4 thing is preferable. As the aryl group, those having 6 to 10 carbon atoms such as phenyl and naphthyl are preferable, and as the substituted aryl group, a halogen atom such as a chlorine atom and an alkyl such as a methyl group as described above. And those substituted with an alkoxy group such as a group, a methoxy group, and an ethoxy group. R ²⁷ is preferably an alkyl group having 1 to 4 carbon atoms. Specific examples of the thio compound represented by the general formula (4) include the following compounds.

(E) Hexaarylbiimidazole compound (e) Hexaarylbiimidazole compounds preferable as the radical polymerization initiator used in the present invention include lophine dimers described in JP-B Nos. 45-37377 and 44-86516, for example, 2,2′-bis (o-chlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o-bromophenyl) -4,4 ′, 5,5′- Tetraphenylbiimidazole, 2,2′-bis (o, p-dichlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o-chlorophenyl) -4,4 ′ , 5,5′-tetra (m-methoxyphenyl) biimidazole, 2,2′-bis (o, o′-dichlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole 2,2′-bis (o-nitrophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o-methylphenyl) -4,4 ′, 5 Examples include 5′-tetraphenylbiimidazole, 2,2′-bis (o-trifluorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, and the like.

(F) Ketooxime ester compound (f) Preferred ketoxime ester compounds as radical polymerization initiators used in the present invention include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one , 3-p-toluenesulfonyloxyiminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one, and the like.

(G) Borate compound As an example of the (g) borate compound preferable as a radical polymerization initiator used for this invention, the compound represented by following General formula (5) can be mentioned.

(Wherein R ²⁸ , R ²⁹ , R ³⁰ and R ³¹ may be the same or different from each other, and each represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkenyl group, A substituted or unsubstituted alkynyl group or a substituted or unsubstituted heterocyclic group, R ²⁸ , R ²⁹ , R ³⁰ and R ³¹ may be combined with each other to form a cyclic structure; Provided that at least one of R ²⁸ , R ²⁹ , R ³⁰ and R ³¹ is a substituted or unsubstituted alkyl group (Z ⁵ ) ⁺ represents an alkali metal cation or a quaternary ammonium cation.)
Examples of the alkyl group for R ^{28 to} R ³¹ include straight-chain, branched, and cyclic groups, and those having 1 to 18 carbon atoms are preferable. Specifically, methyl, ethyl, propyl, isopropyl, butyl, pentyl, hexyl, octyl, stearyl, cyclobutyl, cyclopentyl, cyclohexyl and the like are included. The substituted alkyl group includes an alkyl group as described above, a halogen atom (for example, —Cl, —Br, etc.), a cyano group, a nitro group, an aryl group (preferably a phenyl group), a hydroxy group, —COOR ³² (here R ³² represents a hydrogen atom, an alkyl group having 1 to 14 carbon atoms, or an aryl group), —OCOR ³³ or —OR ³⁴ (where R ³³ and R ³⁴ are alkyl groups having 1 to 14 carbon atoms, or aryl. And a group having a substituent represented by the following formula.

(Wherein R ³⁵ and R ³⁶ independently represent a hydrogen atom, an alkyl group having 1 to 14 carbon atoms, or an aryl group)
The aryl group of R ^{28 to} R ³¹ includes 1 to 3 ring aryl groups such as a phenyl group and a naphthyl group, and the substituted aryl group is a substitution of the above substituted alkyl group with the above aryl group. Those having a group or an alkyl group having 1 to 14 carbon atoms are included. Examples of the alkenyl group for R ^{28 to} R ³¹ include linear, branched and cyclic groups having 2 to 18 carbon atoms. Examples of the substituent of the substituted alkenyl group include those listed as the substituents of the substituted alkyl group. Examples of the alkynyl group of R ^{28 to} R ³¹ include straight chain or branched groups having 2 to 28 carbon atoms, and examples of the substituent of the substituted alkynyl group include those listed as the substituents of the substituted alkyl group. included. In addition, examples of the heterocyclic group of R ^{28 to} R ³¹ include a 5- or more-membered heterocyclic group containing at least one of N, S, and O, and preferably a 5- to 7-membered heterocyclic group. May contain a condensed ring. Furthermore, you may have what was mentioned as a substituent of the above-mentioned substituted aryl group as a substituent. Specific examples of the compound represented by the general formula (5) are described in US Pat. Nos. 3,567,453 and 4,343,891, European Patents 109,772 and 109,773. Examples include compounds and those shown below.

(H) Azinium Compound Preferred examples of the (h) azinium salt compound used as the radical polymerization initiator used in the present invention include JP-A-63-138345, JP-A-63-142345, and JP-A-63-142346. Examples include compounds having an N—O bond described in Japanese Utility Model Laid-Open Nos. 63-143537 and 46-42363.

(I) Metallocene Compound (i) Metallocene compounds preferred as the radical polymerization initiator used in the present invention include those disclosed in JP 59-152396, JP 61-151197, JP 63-41484, and JP Examples thereof include titanocene compounds described in JP-A-2-249 and JP-A-2-4705, and iron-arene complexes described in JP-A-1-304453 and JP-A-1-152109.

  Specific examples of the titanocene compound include di-cyclopentadienyl-Ti-di-chloride, di-cyclopentadienyl-Ti-bis-phenyl, and di-cyclopentadienyl-Ti-bis-2,3. 4,5,6-pentafluorophen-1-yl, di-cyclopentadienyl-Ti-bis-2,3,5,6-tetrafluorophen-1-yl, di-cyclopentadienyl-Ti- Bis-2,4,6-trifluorophen-1-yl, di-cyclopentadienyl-Ti-2,6-difluorophen-1-yl, di-cyclopentadienyl-Ti-bis-2,4 -Difluorophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,3,4,5,6-pentafluorophen-1-yl, di-methylcyclopentadienyl-Ti- -2,3,5,6-tetrafluorophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,4-difluorophen-1-yl, bis (cyclopentadienyl) -bis (2,6-difluoro-3- (pyridin-1-yl) phenyl) titanium bis (cyclopentadienyl) bis [2,6-difluoro-3- (methylsulfonamido) phenyl] titanium, bis (cyclopentadi Enyl) bis [2,6-difluoro-3- (N-butylbialoyl-amino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-butyl- (4-chlorobenzoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3 -(N-benzyl-2,2-dimethylpentanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (2-ethylhexyl) -4-tolyl-sulfonyl] ) Amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (3-oxaheptyl) benzoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2 , 6-Difluoro-3- (N- (3,6-dioxadecyl) benzoylamino) phenyl] titanium, bis (cyclopentadienyl) bi [2,6-difluoro-3- (trifluoromethylsulfonyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (trifluoroacetyl) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,6-difluoro-3- (2-chlorobenzoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (4-chloro Benzoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (3,6-dioxadecyl) -2,2-dimethylpentanoylamino) phenyl] titanium, bis (Cyclopentadienyl) bis [2,6-difluoro-3- (N- (3,7-dimethyl-7-methoxyoctyl) benzoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6 -Difluoro-3- (N-cyclohexylbenzoylamino) phenyl] titanium and the like.

(J) Active ester compound Preferred as the radical polymerization initiator used in the present invention (j) is an imide sulfonate compound described in JP-B-62-2223, JP-B-63-14340, JP-A-59-174831. The active sulfonates described in No. can be mentioned.

(K) Compound having a carbon halogen bond (k) Compounds having a carbon halogen bond that are preferable as the radical polymerization initiator used in the present invention include those represented by the following general formulas (6) to (12). .

(Wherein, X ² represents a halogen atom, Y ¹ is _{^{-C (X 2) 3, -NH}} 2, -NHR 38, -NR 38, represent -OR ^38. Wherein R ³⁸ represents an alkyl group, a substituted An alkyl group, an aryl group, or a substituted aryl group, and R ³⁷ represents —C (X ² ) ₃ , an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, or a substituted alkenyl group.

(However, R ³⁹ is an alkyl group, a substituted alkyl group, an alkenyl group, a substituted alkenyl group, an aryl group, a substituted aryl group, a halogen atom, an alkoxy group, a substituted alkoxyl group, a nitro group, or a cyano group, and X ³ is a halogen atom. And n is an integer of 1 to 3.)

(However, R ⁴⁰ is an aryl group or a substituted aryl group, R ⁴¹ is a group or halogen shown below, and Z ⁶ is —C (═O) —, —C (═S) — or —SO _2- , X ³ is a halogen atom, and m is 1 or 2.)

(R ⁴² and R ⁴³ are an alkyl group, a substituted alkyl group, an alkenyl group, a substituted alkenyl group, an aryl group or a substituted aryl group, and R ⁴⁴ is the same as R ³⁸ in the general formula (6).)

Wherein R ⁴⁵ is an optionally substituted aryl group or heterocyclic group, R ⁴⁶ is a trihaloalkyl group or trihaloalkenyl group having 1 to 3 carbon atoms, p is 1, 2 or 3.)

(Equation (10), .L ⁷ which represents a carbonylmethylene heterocyclic compound having a trihalogenomethyl group is a hydrogen atom or the ^{formula: CO- (R 47) q (} C (X 4) 3) at r substituent Q ² is a sulfur, selenium or oxygen atom, dialkylmethylene group, alkene-1,2-ylene group, 1,2-phenylene group or N—R group, and M ⁴ is a substituted or unsubstituted alkylene group or An alkenylene group or a 1,2-arylene group; R ⁴⁸ is an alkyl group, an aralkyl group or an alkoxyalkyl group; and R ⁴⁷ is a carbocyclic or heterocyclic divalent aromatic group. And X ⁴ is a chlorine, bromine or iodine atom and q = 0 and r = 1 or q = 1 and r = 1 or 2.)

(Formula (11) represents a 4-halogeno-5- (halogenomethyl-phenyl) -oxazole derivative. X ⁵ is a halogen atom, t is an integer of 1 to 3, and s is an integer of 1 to 4. in and, R ⁴⁹ is a hydrogen atom or a CH _3-t X ⁵ _t group, R ⁵⁰ is s-valent optionally substituted unsaturated organic group.)

(Formula (12) represents a 2- (halogenomethyl-phenyl) -4-halogeno-oxazole derivative. X ⁶ is a halogen atom, v is an integer of 1 to 3, and u is an integer of 1 to 4. R ⁵¹ is a hydrogen atom or a CH _3-v X ⁶ _v group, and R ⁵² is an u-valent unsaturated organic group which may be substituted.)

  Specific examples of such a compound having a carbon-halogen bond include those described in Wakabayashi et al., Bull. Chem. Soc. Japan, 42, 2924 (1969), such as 2-phenyl 4,6-bis (trichloromethyl) -S-triazine, 2- (p-chlorophenyl) -4,6-bis (trichloromethyl)- S-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -S-triazine, 2- (p-methoxyphenyl) -4,6-bis (trichloromethyl) -S-triazine, 2 -(2 ', 4'-dichlorophenyl) -4,6-bis (trichloromethyl) -S-triazine, 2,4,6-tris (trichloromethyl) -S-triazine, 2-methyl-4,6 -Bis (trichloromethyl) -S-triazine, 2-n-nonyl-4,6-bis (trichloromethyl) -S-triazine, 2- (α, α, β-trichloroethyl) -4,6 Bis (trichloromethyl) -S- triazine. In addition, compounds described in British Patent 1388492, for example, 2-styryl-4,6-bis (trichloromethyl) -S-triazine, 2- (p-methylstyryl) -4,6-bis (trichloromethyl) -S-triazine, 2- (p-methoxystyryl) -4,6-bis (trichloromethyl) -S-triazine, 2- (p-methoxystyryl) -4-amino-6-trichloromethyl-S-triazine, etc. And compounds described in JP-A-53-133428, such as 2- (4-methoxy-naphth-1-yl) -4,6-bis-trichloromethyl-S-triazine, 2- (4-ethoxy-naphtho) 1-yl) -4,6-bis-trichloromethyl-S-triazine, 2- [4- (2-ethoxyethyl) -naphth-1-yl] -4,6-bis-trick Rumethyl-S-triazine, 2- (4,7-dimethoxy-naphth-1-yl) -4,6-bis-trichloromethyl-S-triazine), 2- (acenaphtho-5-yl) -4,6- Examples include compounds described in German Patent No. 3333724, such as bis-trichloromethyl-S-triazine, and the like.

  F.F. C. J. Schaefer et al. Org. Chem. 29, 1527 (1964), such as 2-methyl-4,6-bis (tribromomethyl) -S-triazine, 2,4,6-tris (tribromomethyl) -S-triazine, 2,4 , 6-tris (dibromomethyl) -S-triazine, 2-amino-4-methyl-6-tribromomethyl-S-triazine, 2-methoxy-4-methyl-6-trichloromethyl-S-triazine, etc. Can do. Furthermore, for example, the following compounds described in JP-A-62-258241 can be exemplified.

  Furthermore, for example, the following compounds described in JP-A-5-281728 can be mentioned.

  Or even more P. Hutt, E .; F. Elslager and L.L. M.M. The following compounds that can be easily synthesized by those skilled in the art according to the synthesis method described in “Journalof Heterocyclic Chemistry”, Volume 7 (No. 3) by Herbel, page 511 et seq. (1970) Examples of the group include the following compounds.

(L) Azo-based compound Preferred as the radical polymerization initiator used in the present invention (i) As the azo-based compound, 2,2′-azobisisobutyronitrile, 2,2′-azobispropionitrile, 1 , 1′-azobis (cyclohexane-1-carbonitrile), 2,2′-azobis (2-methylbutyronitrile), 2,2′-azobis (2,4-dimethylvaleronitrile), 2,2′- Azobis (4-methoxy-2,4-dimethylvaleronitrile), 4,4′-azobis (4-cyanovaleric acid), dimethyl 2,2′-azobisisobutyrate, 2,2′-azobis (2-methylpropionamide) Oxime), 2,2′-azobis [2- (2-imidazolin-2-yl) propane], 2,2′-azobis {2-methyl-N- [1,1-bis (hydroxymethyl) -2- Hydro Cyethyl] propionamide}, 2,2′-azobis [2-methyl-N- (2-hydroxyethyl) propionamide], 2,2′-azobis (N-butyl-2-methylpropionamide), 2,2 '-Azobis (N-cyclohexyl-2-methylpropionamide), 2,2'-azobis [N- (2-propenyl) -2-methylpropionamide], 2,2'-azobis (2,4,4- Trimethylpentane) and the like.

  As still more preferred examples of the radical polymerization initiator in the present invention, the above-mentioned (a) aromatic ketones, (b) onium salt compounds, (c) organic peroxides, (e) hexaarylbiimidazole compounds, ( i) a metallocene compound, (k) a compound having a carbon halogen bond, and the most preferred examples include an aromatic iodonium salt, an aromatic sulfonium salt, a titanocene compound, and a general formula (6). Mention may be made of trihalomethyl-S-triazine compounds.

These radical polymerization initiators are polymerized in a proportion of 0.1 to 50% by mass, preferably 0.5 to 30% by mass, particularly preferably 5 to 20% by mass, based on the total solid content of the polymerizable composition. Can be added to the composition.
The radical polymerization initiator in the present invention is preferably used alone or in combination of two or more.

[(D) Other compounds having at least one ethylenically unsaturated bond]
In the polymerizable composition of the present invention, if necessary, a compound having at least one other ethylenically unsaturated bond not included in the specific polymerizable compound (A) of the present invention (other polymerizable compounds as optional components). Compound). The polymerizable compound is selected from compounds having at least one ethylenically unsaturated bond, preferably two or more. Such a compound group is widely known in the industrial field, and can be used without any particular limitation in the present invention. These have chemical forms such as monomers, prepolymers, i.e. dimers, trimers and oligomers, or mixtures thereof and copolymers thereof. Examples of monomers and copolymers thereof include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), and esters and amides thereof. In this case, an ester of an unsaturated carboxylic acid and an aliphatic polyhydric alcohol compound, or an amide of an unsaturated carboxylic acid and an aliphatic polyvalent amine compound is used. In addition, an addition reaction product of an unsaturated carboxylic acid ester or amide having a nucleophilic substituent such as a hydroxy group, an amino group or a mercapto group with a monofunctional or polyfunctional isocyanate or epoxy, and a monofunctional or polyfunctional compound. A dehydration condensation reaction product with a functional carboxylic acid is also preferably used. Further, an addition reaction product of an unsaturated carboxylic acid ester or amide having an electrophilic substituent such as an epoxy group or an epoxy group with a monofunctional or polyfunctional alcohol, amine or thiol, a halogen group or In addition, a substitution reaction product of an unsaturated carboxylic acid ester or amide having a leaving substituent such as a tosyloxy group and a monofunctional or polyfunctional alcohol, amine or thiol is also suitable. As another example, it is also possible to use a group of compounds substituted with unsaturated phosphonic acid, styrene, vinyl ether or the like instead of the unsaturated carboxylic acid.

  Specific examples of the monomer of an ester of an aliphatic polyhydric alcohol compound and an unsaturated carboxylic acid include acrylic acid esters such as ethylene glycol diacrylate, triethylene glycol diacrylate, 1,3-butanediol diacrylate, and tetramethylene glycol. Diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, trimethylolpropane tri (acryloyloxypropyl) ether, trimethylolethane triacrylate, hexanediol diacrylate, 1,4-cyclohexanediol diacrylate , Tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate , Pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, polyester acrylate oligomer.

  Methacrylic acid esters include tetramethylene glycol dimethacrylate, triethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate, ethylene glycol dimethacrylate, 1,3-butanediol dimethacrylate, Hexanediol dimethacrylate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol hexamethacrylate, sorbitol trimethacrylate, sorbitol tetramethacrylate, bis [p- (3-methacryloxy- 2-hydroxypro ) Phenyl] dimethyl methane, bis - [p- (methacryloxyethoxy) phenyl] dimethyl methane.

  Itaconic acid esters include ethylene glycol diitaconate, propylene glycol diitaconate, 1,3-butanediol diitaconate, 1,4-butanediol diitaconate, tetramethylene glycol diitaconate, pentaerythritol diitaconate And sorbitol tetritaconate. Examples of crotonic acid esters include ethylene glycol dicrotonate, tetramethylene glycol dicrotonate, pentaerythritol dicrotonate, and sorbitol tetradicrotonate. Examples of isocrotonic acid esters include ethylene glycol diisocrotonate, pentaerythritol diisocrotonate, and sorbitol tetraisocrotonate. Examples of maleic acid esters include ethylene glycol dimaleate, triethylene glycol dimaleate, pentaerythritol dimaleate, and sorbitol tetramaleate.

  Examples of other esters include aliphatic alcohol esters described in JP-B-46-27926, JP-B-51-47334, JP-A-57-196231, JP-A-59-5240, JP-A-59-5241. Those having an aromatic skeleton described in JP-A-2-226149 and those containing an amino group described in JP-A-1-165613 are also preferably used. Furthermore, the ester monomers described above can also be used as a mixture.

  Specific examples of amide monomers of aliphatic polyvalent amine compounds and unsaturated carboxylic acids include methylene bis-acrylamide, methylene bis-methacrylamide, 1,6-hexamethylene bis-acrylamide, 1,6-hexamethylene bis. -Methacrylamide, diethylenetriamine trisacrylamide, xylylene bisacrylamide, xylylene bismethacrylamide and the like. Examples of other preferable amide monomers include those having a cyclohexylene structure described in JP-B-54-21726.

  In addition, urethane-based addition polymerizable compounds produced by using an addition reaction of isocyanate and hydroxyl group are also suitable, and specific examples thereof include, for example, one molecule described in JP-B-48-41708. A vinyl urethane compound containing two or more polymerizable vinyl groups in one molecule obtained by adding a vinyl monomer containing a hydroxyl group represented by the following general formula to a polyisocyanate compound having two or more isocyanate groups. Can be mentioned.

CH ₂ ═C (R ^A ) COOCH ₂ CH (R ^B ) OH... General formula (wherein R ^A and R ^B represent H or CH ₃ )

  Also, urethane acrylates such as those described in JP-A-51-37193, JP-B-2-32293, and JP-B-2-16765, JP-B-58-49860, JP-B-56-17654, Urethane compounds having an ethylene oxide skeleton described in JP-B-62-39417 and JP-B-62-39418 are also suitable. Furthermore, by using polymerizable compounds having an amino structure or a sulfide structure in the molecule described in JP-A-63-277653, JP-A-63-260909, and JP-A-1-105238, In addition, a polymerizable composition excellent in photosensitive speed can be obtained.

  Other examples include polyester acrylates, epoxy resins and (meth) acrylic acid as described in JP-A-48-64183, JP-B-49-43191, JP-B-52-30490, and JP-A-52-30490. Mention may be made of polyfunctional acrylates and methacrylates such as reacted epoxy acrylates. Further, specific unsaturated compounds described in JP-B-46-43946, JP-B-1-40337 and JP-B-1-40336, vinylphosphonic acid compounds described in JP-A-2-25493, and the like can also be mentioned. . In some cases, a structure containing a perfluoroalkyl group described in JP-A-61-22048 is preferably used. Furthermore, Journal of Japan Adhesion Association vol. 20, no. 7, pages 300 to 308 (1984), which are introduced as photocurable monomers and oligomers, can also be used.

  These polymerizable compounds as optional components are used in the range of 1 to 50% by mass as desired with respect to the non-volatile components in the polymerizable composition, but 20 to the specific polymerizable compound (A). It is preferable that it is below mass%.

[(E) Binder polymer]
In the polymerizable composition of the present invention, a binder polymer (E) can be used as needed for the purpose of improving the film properties. It is preferable to use a linear organic polymer as the binder polymer. As such a “linear organic polymer”, a known one can be arbitrarily used. Preferably, a linear organic polymer that is soluble or swellable in water or weak alkaline water is selected to enable water development or weak alkaline water development. The linear organic polymer is selected and used not only as a film-forming agent for the image recording layer but also according to its use as water, weak alkaline water or an organic solvent developer. For example, when a water-soluble organic polymer is used, water development becomes possible. Examples of such linear organic polymers include radical polymers having a carboxylic acid group in the side chain, such as JP-A-59-44615, JP-B-54-34327, JP-B-58-12777, and JP-B-54-25957. , JP 54-92723, JP 59-53836, JP 59-71048, ie, methacrylic acid copolymer, acrylic acid copolymer, itaconic acid copolymer. Examples thereof include a polymer, a crotonic acid copolymer, a maleic acid copolymer, and a partially esterified maleic acid copolymer. Similarly, there is an acidic cellulose derivative having a carboxylic acid group in the side chain. In addition, those obtained by adding a cyclic acid anhydride to a polymer having a hydroxyl group are useful.

  Among these, in particular, (meth) acrylic resins having a benzyl group or an allyl group and a carboxyl group in the side chain, and Japanese Patent Application Laid-Open Nos. 2000-187322, 2002-62648, 2001-253217, and Japanese Patent Application Alkali-soluble resins having a double bond in the side chain described in JP-A-2002-287920, JP-A-2002-62648 and the like are excellent in balance of film strength, sensitivity, and developability, and are preferable.

  In addition, Japanese Patent Publication No. 7-2004, Japanese Patent Publication No. 7-120041, Japanese Patent Publication No. 7-120042, Japanese Patent Publication No. 8-12424, Japanese Patent Laid-Open No. 63-287944, Japanese Patent Laid-Open No. 63-287947, Japanese Patent Laid-Open No. Urethane-based binder polymers containing acid groups described in Japanese Patent No. 271741 and Japanese Patent Application No. 10-116232 are very excellent in strength, and are advantageous in terms of printing durability and suitability for low exposure.

  In addition, polyvinyl pyrrolidone, polyethylene oxide, and the like are useful as the water-soluble linear organic polymer. In order to increase the strength of the cured film, alcohol-soluble nylon, polyether of 2,2-bis- (4-hydroxyphenyl) -propane and epichlorohydrin, and the like are also useful.

The weight average molecular weight of the polymer used in the present invention is preferably 5000 or more, more preferably in the range of 10,000 to 300,000, and the number average molecular weight is preferably 1000 or more, more preferably 2000 to 2000 The range is 250,000. The polydispersity (weight average molecular weight / number average molecular weight) is preferably 1 or more, and more preferably 1.1 to 10.
These polymers may be random polymers, block polymers, graft polymers or the like, but are preferably random polymers.

The polymer used in the present invention can be synthesized by a conventionally known method. Solvents used in the synthesis include, for example, tetrahydrofuran, ethylene dichloride, cyclohexanone, methyl ethyl ketone, acetone, methanol, ethanol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, 2-methoxyethyl acetate, diethylene glycol dimethyl ether, 1-methoxy. Examples include 2-propanol, 1-methoxy-2-propyl acetate, N, N-dimethylformamide, N, N-dimethylacetamide, toluene, ethyl acetate, methyl lactate, ethyl lactate, dimethyl sulfoxide, and water. These solvents are used alone or in combination of two or more.
As the radical polymerization initiator used for synthesizing the polymer used in the present invention, known compounds such as azo initiators and peroxide initiators can be used.

The binder polymer used in the present invention may be used alone or in combination. In particular, when the polymerizable composition of the present invention is used as an image recording layer of a lithographic printing plate precursor, the amount of these binder polymers added is determined based on the total solid content of the image recording layer from the viewpoint of image formability and image portion strength. It is added in a proportion of 20 to 95% by mass, preferably 30 to 90% by mass. The compound having at least one ethylenically unsaturated double bond and the linear organic polymer are preferably in the range of 1/9 to 7/3 by mass ratio.
The polymerizable composition of the present invention obtained as described above is cured with high sensitivity by applying energy such as infrared laser exposure, is excellent in the strength of the cured film in the exposed area, and is three-dimensional stereolithography, holography, and lithographic printing. It is preferably used for recording layers of printing materials such as printing plate precursors, synthetic resin relief plates used for flexographic printing, color proofs, photoresists and color filters, inks, paints, and adhesives. It is most suitably used as a recording layer for a lithographic printing plate precursor.

[Negative lithographic printing plate precursor]
The negative lithographic printing plate precursor of the present invention is characterized in that a recording layer containing the polymerizable composition of the present invention is provided on a support. Hereinafter, each structure of the negative planographic printing plate precursor of the present invention will be described.

(Support)
The support used when forming the lithographic printing plate precursor using the polymerizable composition of the present invention is not particularly limited as long as it is a dimensionally stable plate-like material. For example, paper, plastic ( For example, paper laminated with polyethylene, polypropylene, polystyrene, etc., metal plate (eg, aluminum, zinc, copper, etc.), plastic film (eg, cellulose diacetate, cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate butyrate) Cellulose, cellulose nitrate, polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, etc.). These may be a single component sheet such as a resin film or a metal plate, or may be a laminate of two or more materials. For example, a paper or plastic film on which a metal as described above is laminated or vapor-deposited. And laminated sheets of different plastic films.

As the support, a polyester film or an aluminum plate is preferable, and among them, an aluminum plate that has good dimensional stability and is relatively inexpensive is particularly preferable. A suitable aluminum plate is a pure aluminum plate or an alloy plate containing aluminum as a main component and containing a trace amount of different elements, and may be a plastic film on which aluminum is laminated or vapor-deposited. Examples of foreign elements contained in the aluminum alloy include silicon, iron, manganese, copper, magnesium, chromium, zinc, bismuth, nickel, and titanium. The content of foreign elements in the alloy is at most 10% by mass. Particularly suitable aluminum in the present invention is pure aluminum, but completely pure aluminum is difficult to produce in the refining technique, and may contain slightly different elements. Thus, the composition of the aluminum plate applied to the present invention is not specified, and an aluminum plate made of a publicly known material can be appropriately used.
The aluminum plate has a thickness of about 0.1 to 0.6 mm, preferably 0.15 to 0.4 mm, and particularly preferably 0.2 to 0.3 mm.

Prior to roughening the aluminum plate, a degreasing treatment with, for example, a surfactant, an organic solvent, or an alkaline aqueous solution for removing rolling oil on the surface is performed as desired.
The surface roughening treatment of the aluminum plate is performed by various methods. For example, a method of mechanically roughening, a method of electrochemically dissolving and roughening a surface, and a method of selectively dissolving a surface chemically. This is done by the method of As the mechanical method, a known method such as a ball polishing method, a brush polishing method, a blast polishing method, or a buff polishing method can be used. Further, as an electrochemical surface roughening method, there is a method of performing alternating current or direct current in hydrochloric acid or nitric acid electrolyte. Further, as disclosed in JP-A-54-63902, a method in which both are combined can also be used.

  The aluminum plate roughened in this way can be subjected to an anodizing treatment to enhance the water retention and wear resistance of the surface through an alkali etching treatment and a neutralization treatment, if desired. As the electrolyte used for the anodizing treatment of the aluminum plate, various electrolytes that form a porous oxide film can be used. In general, sulfuric acid, phosphoric acid, oxalic acid, chromic acid, or a mixed acid thereof is used. The concentration of these electrolytes is appropriately determined depending on the type of electrolyte.

The treatment conditions for anodization vary depending on the electrolyte used, and thus cannot be specified in general. However, in general, the electrolyte concentration is 1 to 80% by mass solution, the liquid temperature is 5 to 70 ° C., and the current density is 5 to 60 A / day. dm ² , voltage 1 to 100 V, and electrolysis time 10 seconds to 5 minutes are suitable.
The amount of the anodized film is suitably 1.0 g / m ² or more, but more preferably in the range of 2.0 to 6.0 g / m ^2. When the anodic oxide coating is less than 1.0 g / m ² , the printing durability is insufficient, or the non-image part of the lithographic printing plate is easily scratched, so that the ink adheres to the scratched part during printing. “Scratches and dirt” are likely to occur.
Such anodizing treatment is applied to the surface used for printing the support of the lithographic printing plate, but an anodized film of 0.01 to 3 g / m ² is also formed on the back surface due to the back of the lines of electric force. It is common to form.

The hydrophilic treatment of the support surface is performed after the anodizing treatment, and conventionally known treatment methods are used. Such hydrophilization treatment is disclosed in US Pat. Nos. 2,714,066, 3,181,461, 3,280,734 and 3,902,734. There are various alkali metal silicate methods (for example, sodium silicate aqueous solution). In this method, the support is immersed in an aqueous sodium silicate solution or electrolytically treated. In addition, disclosed in Japanese Patent Publication No. 36-22063 is potassium fluoride zirconate and U.S. Pat. Nos. 3,276,868, 4,153,461, and 4,689,272. A method of treating with polyvinylphosphonic acid as described above is used.
Among these, a particularly preferred hydrophilic treatment in the present invention is a silicate treatment. The silicate treatment will be described below.

The anodized film of the aluminum plate subjected to the treatment as described above has an alkali metal silicate content of 0.1 to 30% by mass, preferably 0.5 to 10% by mass, and a pH at 25 ° C. of 10 to 13. It is immersed in a certain aqueous solution at, for example, 15 to 80 ° C. for 0.5 to 120 seconds. If the pH of the alkali metal silicate aqueous solution is lower than 10, the solution will gel, and if it is higher than 13.0, the oxide film will be dissolved. Examples of the alkali metal silicate used in the present invention include sodium silicate, potassium silicate, and lithium silicate. Examples of the hydroxide used to increase the pH of the alkali metal silicate aqueous solution include sodium hydroxide, potassium hydroxide, and lithium hydroxide. In addition, you may mix | blend alkaline-earth metal salt or a group IVB metal salt with said process liquid. Alkaline earth metal salts include nitrates such as calcium nitrate, strontium nitrate, magnesium nitrate, and barium nitrate, and water-soluble salts such as sulfate, hydrochloride, phosphate, acetate, oxalate, and borate. Can be mentioned. Examples of Group IVB metal salts include titanium tetrachloride, titanium trichloride, potassium titanium fluoride, potassium potassium oxalate, titanium sulfate, titanium tetraiodide, zirconium chloride, zirconium dioxide, zirconium oxychloride, zirconium tetrachloride, etc. Can do. Alkaline earth metal salts or Group IVB metal salts can be used alone or in combination of two or more. A preferable range of these metal salts is 0.01 to 10% by mass, and a more preferable range is 0.05 to 5.0% by mass.
Since the hydrophilicity on the surface of the aluminum plate is further improved by the silicate treatment, the ink hardly adheres to the non-image area during printing, and the stain performance is improved.

(Formation of recording layer)
As a method of providing the recording layer on the support, it can be produced by dissolving the polymerizable composition described above in a solvent to form a recording layer coating solution and coating the support on the support. Solvents used here include ethylene dichloride, cyclohexanone, methyl ethyl ketone, methanol, ethanol, propanol, ethylene glycol monomethyl ether, 1-methoxy-2-propanol, 2-methoxyethyl acetate, 1-methoxy-2-propyl acetate, dimethoxy Examples include ethane, methyl lactate, ethyl lactate, N, N-dimethylacetamide, N, N-dimethylformamide, tetramethylurea, N-methylpyrrolidone, dimethyl sulfoxide, sulfolane, γ-butyrolactone, toluene, water and the like. It is not limited to this. These solvents are used alone or in combination. The concentration of the above components (total solid content including additives) in the solvent is preferably 1 to 50% by mass.

Further, the coating amount (solid content) of the recording layer on the support obtained after coating and drying varies depending on the application, but generally speaking, it is preferably 0.5 to 5.0 g / m ² for a lithographic printing plate precursor. As the coating amount decreases, the apparent sensitivity increases, but the film properties of the recording layer decrease.
Various methods can be used as the coating method, and examples thereof include bar coater coating, spin coating, spray coating, curtain coating, dip coating, air knife coating, blade coating, and roll coating.

  In the recording layer coating liquid according to the present invention, a surfactant for improving the coating property, for example, a fluorosurfactant described in JP-A-62-170950 can be added. . A preferable addition amount is 0.01 to 1% by mass, more preferably 0.05 to 0.5% by mass, based on the material solid content of the entire recording layer.

Furthermore, in the negative lithographic printing plate precursor according to the present invention, a backcoat layer, an intermediate layer, a protective layer, and the like described later can be formed in the same manner as the recording layer.
Hereinafter, a lithographic printing plate precursor having a negative recording layer, which is the most preferred use of the polymerizable composition of the present invention, will be described.

(Various additives)
Various additives listed below may be added to the recording layer of the lithographic printing plate precursor according to the invention.
For example, a dye having a large absorption in the visible light region can be used as an image colorant. Specifically, Oil Yellow # 101, Oil Yellow # 103, Oil Pink # 312, Oil Green BG, Oil Blue BOS, Oil Blue # 603, Oil Black BY, Oil Black BS, Oil Black T-505 (orientated chemistry) Kogyo Co., Ltd.), Victoria Pure Blue, Crystal Violet (CI42555), Methyl Violet (CI42535), Ethyl Violet, Rhodamine B (CI145170B), Malachite Green (CI42000), Methylene Blue (CI522015), etc., and JP-A-62-2 And dyes described in No. 293247. In addition, pigments such as phthalocyanine pigments, azo pigments, carbon black, and titanium oxide can also be suitably used.

  These colorants are preferably added since it is easy to distinguish an image area from a non-image area after image formation. The added amount is 0.01 to 10% by mass with respect to the total solid content of the recording layer coating solution.

  In the present invention, it is desirable to add a small amount of a thermal polymerization inhibitor in order to prevent unnecessary thermal polymerization of the polymerizable compound during preparation or storage of the polymerizable composition. Suitable thermal polymerization inhibitors include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-t-butylphenol ), 2,2′-methylenebis (4-methyl-6-tert-butylphenol), N-nitroso-N-phenylhydroxylamine aluminum salt and the like. The addition amount of the thermal polymerization inhibitor is preferably about 0.01% by mass to about 5% by mass with respect to the mass of the entire composition. If necessary, higher fatty acid derivatives such as behenic acid and behenic acid amide may be added to prevent polymerization inhibition due to oxygen and may be unevenly distributed on the surface of the recording layer in the course of drying after coating. . The amount of the higher fatty acid derivative added is preferably about 0.1% by mass to about 10% by mass of the total composition.

  Further, in order to expand the processing stability of the recording layer with respect to the development conditions, nonionic surfactants such as those described in JP-A-62-251740 and JP-A-3-208514, JP-A-59-121044. An amphoteric surfactant as described in JP-A-4-13149 can be added.

  Specific examples of the nonionic surfactant include sorbitan tristearate, sorbitan monopalmitate, sorbitan trioleate, stearic acid monoglyceride, polyoxyethylene nonylphenyl ether and the like.

Specific examples of amphoteric surfactants include alkyldi (aminoethyl) glycine, alkylpolyaminoethylglycine hydrochloride, 2-alkyl-N-carboxyethyl-N-hydroxyethylimidazolinium betaine, N-tetradecyl-N, N- Examples include betaine type (for example, trade name Amorgen K, manufactured by Dai-ichi Kogyo Co., Ltd.).
The proportion of the nonionic surfactant and the amphoteric surfactant in the recording layer coating solution is preferably 0.05 to 15% by mass, more preferably 0.1 to 5% by mass.

  Furthermore, a plasticizer is added to the recording layer coating solution according to the present invention as needed to impart flexibility of the coating film. For example, polyethylene glycol, tributyl citrate, diethyl phthalate, dibutyl phthalate, dihexyl phthalate, dioctyl phthalate, tricresyl phosphate, tributyl phosphate, trioctyl phosphate, tetrahydrofurfuryl oleate and the like are used.

(Back coat layer)
A back coat layer is provided on the back surface of the support of the planographic printing plate precursor according to the present invention, if necessary. Such a back coat layer comprises a metal oxide obtained by hydrolysis and polycondensation of an organic polymer compound described in JP-A-5-45885 and an organic or inorganic metal compound described in JP-A-6-35174. A coating layer is preferably used.
Among these coating layers, silicon alkoxy compounds such as Si (OCH ₃ ) ₄ , Si (OC ₂ H ₅ ) ₄ , Si (OC ₃ H ₇ ) ₄ , and Si (OC ₄ H ₉ ) ₄ are available at a low price. The coating layer of the metal oxide provided therefrom is particularly preferred because of its excellent development resistance.

(Middle layer)
The lithographic printing plate precursor according to the invention may be provided with an intermediate layer for the purpose of improving the adhesion between the recording layer and the substrate and the stain resistance. Specific examples of such an intermediate layer include JP-B-50-7481, JP-A-54-72104, JP-A-59-101651, JP-A-60-149491, JP-A-60-232998, JP-A-3-56177, JP-A-4-282737, JP-A-5-16558, JP-A-5-246171, JP-A-7-159983, JP-A-7-314937, JP-A-8-202025, Special Kaihei 8-320551, JP 9-34104, JP 9-236911, JP 9-269593, JP 10-69092, JP 10-115931, JP 10-161317, JP 10-260536, JP-A-10-282682, JP-A-11-84684, Japanese Patent Application No. 8-225335, Japanese Patent Application No. 8-270098, Japanese Patent Application No. 9-195863, Japanese Patent Application No. 9-195864, Japanese Patent Application No. 9-89646, Japanese Patent Application No. 9-106068, Japanese Patent Application No. 9-183834, Japanese Patent Application No. 9-264411, Japanese Patent Application No. 9 -127232, Japanese Patent Application No. 9-245419, Japanese Patent Application No. 10-127602, Japanese Patent Application No. 10-170202, Japanese Patent Application No. 11-36377, Japanese Patent Application No. 11-165661, Japanese Patent Application No. 11-284091 No., Japanese Patent Application No. 2000-14697, and the like.

(Protective layer)
Since the lithographic printing plate precursor according to the invention is usually exposed in the air, it is preferable to further provide a protective layer on the recording layer. The protective layer prevents exposure of low molecular weight compounds such as oxygen and basic substances present in the atmosphere that hinder the image formation reaction caused by exposure in the recording layer, and enables exposure in the air. To do. Therefore, the properties desired for such a protective layer are low permeability of low-molecular compounds such as oxygen, and further, transmission of light used for exposure is not substantially inhibited, and excellent adhesion to the recording layer. And it is desirable that it can be easily removed in the development process after exposure.

  Such a device for the protective layer has been conventionally devised, and is described in detail in US Pat. No. 3,458,311 and JP-A-55-49729. As a material that can be used for the protective layer, for example, a water-soluble polymer compound having relatively excellent crystallinity is preferably used. Specifically, polyvinyl alcohol, polyvinyl pyrrolidone, acidic celluloses, gelatin, gum arabic, Water-soluble polymers such as acrylic acid are known, but among these, the use of polyvinyl alcohol as a main component gives the best results in terms of basic properties such as oxygen barrier properties and development removability. The polyvinyl alcohol used for the protective layer may be partially substituted with an ester, an ether and an acetal as long as it contains an unsubstituted vinyl alcohol unit for having necessary oxygen barrier properties and water solubility. Similarly, some of them may have other copolymer components. In particular, a mixture obtained by replacing polyvinyl pyrrolidone in a range of 15 to 50% by mass with respect to polyvinyl alcohol is preferable from the viewpoint of storage stability.

  Specific examples of polyvinyl alcohol include those having a hydrolysis rate of 71 to 100% and a molecular weight in the range of 300 to 2400. Specifically, Kuraray Co., Ltd. PVA-105, PVA-110, PVA-117, PVA-117H, PVA-120, PVA-124, PVA-124H, PVA-CS, PVA-CST, PVA-HC, PVA-203, PVA-204, PVA-205, PVA-210, PVA-217, PVA-220, PVA-224, PVA-217EE, PVA-217E, PVA-220E, PVA-224E, PVA-405, PVA- 420, PVA-613, L-8 and the like.

Components of the protective layer (selection of PVA, use of additives), coating amount, and the like are selected in consideration of fogging, adhesion, and scratch resistance in addition to oxygen barrier properties and development removability. In general, the higher the hydrolysis rate of the PVA used (the higher the content of the unsubstituted vinyl alcohol unit in the protective layer), the thicker the film thickness, the higher the oxygen barrier property, which is advantageous in terms of sensitivity. However, when the oxygen barrier property is extremely increased, there arises a problem that unnecessary polymerization reaction occurs during production and raw storage, and unnecessary fogging and image line thickening occur during image exposure. In addition, adhesion to the image area and scratch resistance are extremely important in handling the plate. That is, when a hydrophilic layer made of a water-soluble polymer is laminated on an oleophilic recording layer, film peeling due to insufficient adhesive force is likely to occur, and the peeled portion causes defects such as poor film hardening due to inhibition of oxygen polymerization. On the other hand, various proposals have been made to improve the adhesion between these two layers. For example, in US Pat. No. 292,501 and US Pat. No. 44,563, an acrylic emulsion or a water-insoluble vinyl pyrrolidone-vinyl acetate copolymer is contained in a hydrophilic polymer mainly composed of polyvinyl alcohol. It is described that sufficient adhesion can be obtained by mixing by mass% and laminating on a recording layer.
Any of these known techniques can be applied to the protective layer in the present invention. Such a coating method of the protective layer is described in detail in, for example, US Pat. No. 3,458,311 and JP-A-55-49729.

(Exposure, development and printing)
The lithographic printing plate precursor in which the polymerizable composition of the present invention is formed as a recording layer on the above-described support surface can be recorded with an infrared laser. Thermal recording with an ultraviolet lamp or a thermal head is also possible. In the present invention, image exposure is preferably performed by a solid-state laser and a semiconductor laser that emit infrared rays having a wavelength of 760 nm to 1200 nm.

  After exposure with an infrared laser, the polymerizable composition of the present invention is preferably developed with water or an alkaline aqueous solution.

When an alkaline aqueous solution is used as the developer, a conventionally known alkaline aqueous solution can be used as the developer and replenisher for the polymerizable composition of the present invention. For example, sodium silicate, potassium, tribasic sodium phosphate, potassium, ammonium, dibasic sodium phosphate, potassium, ammonium, sodium carbonate, potassium, ammonium, sodium bicarbonate, potassium, Examples include inorganic alkali salts such as ammonium, sodium borate, potassium, ammonium, sodium hydroxide, ammonium, potassium, and lithium. Moreover, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, triisopropylamine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, diisopropanolamine, Organic alkali agents such as ethyleneimine, ethylenediamine, and pyridine are also used.
These alkali agents are used alone or in combination of two or more.

  Furthermore, when developing using an automatic developing machine, the developer in the developing tank for a long time is added to the developer by adding an aqueous solution (replenisher) that is the same as the developer or higher in alkali strength than the developer. It is known that a large amount of a lithographic printing plate precursor can be processed without replacing the plate. This replenishment method is also preferably applied in the present invention.

  Various surfactants, organic solvents, and the like can be added to the developer and the replenisher as necessary for the purpose of promoting and suppressing developability, dispersing development residue, and improving the ink affinity of the printing plate image area. Preferred surfactants include anionic, cationic, nonionic and amphoteric surfactants. Preferred organic solvents include benzyl alcohol. Moreover, addition of polyethylene glycol or a derivative thereof, or polypropylene glycol or a derivative thereof is also preferable. In addition, non-reducing sugars such as arabit, sorbit and mannitol can be added.

  In addition, the developer and replenisher may contain inorganic quinone reducing agents such as hydroquinone, resorcin, sodium sulfite or sodium bisulfite, and organic carboxylic acids, antifoaming agents, and hard water softeners as necessary. It can also be added.

  The printing plate developed using the developer and replenisher described above is post-treated with a desensitizing solution containing washing water, a rinsing solution containing a surfactant and the like, gum arabic and starch derivatives. As the post-treatment when the polymerizable composition of the present invention is used as a printing plate material, these treatments can be used in various combinations.

In recent years, automatic developing machines for printing plate materials have been widely used in the plate making and printing industries in order to rationalize and standardize plate making operations. This automatic developing machine is generally composed of a developing unit and a post-processing unit, and includes an apparatus for conveying a printing plate material, processing liquid tanks and a spray device. Each processing liquid pumped up is sprayed from a spray nozzle for development processing. In addition, recently, a method is also known in which a printing plate material is immersed and conveyed in a processing liquid tank filled with a processing liquid by a submerged guide roll or the like. In such automatic processing, each processing solution can be processed while being supplemented with a replenisher according to the processing amount, operating time, and the like. In addition, the electrical conductivity can be detected by a sensor and replenished automatically.
In addition, a so-called disposable processing method in which processing is performed with a substantially unused processing solution can also be applied.

The lithographic printing plate obtained as described above can be subjected to a printing process after applying a desensitized gum if desired. However, if it is desired to obtain a lithographic printing plate with a higher printing durability, a burning treatment is performed. Is given.
In the case of burning a lithographic printing plate, before burning, an adjustment as described in JP-B-61-2518, JP-A-55-28062, JP-A-62-31859, JP-A-61-159655 is used. It is preferable to treat with a surface liquid.

As its method, with a sponge or absorbent cotton soaked with the surface-adjusting liquid, it is applied onto a lithographic printing plate, or a method in which the printing plate is immersed and applied in a vat filled with the surface-adjusting liquid, Application by an automatic coater is applied. Further, it is more preferable to make the coating amount uniform with a squeegee or a squeegee roller after coating.
In general, the amount of surface-adjusting solution applied is suitably 0.03 to 0.8 g / m ² (dry mass).
The lithographic printing plate coated with the surface-adjusting liquid is dried if necessary, and then heated to a high temperature with a burning processor (for example, burning processor BP-1300 sold by Fuji Photo Film Co., Ltd.). . In this case, the heating temperature and time are in the range of 180 to 300 ° C. and preferably in the range of 1 to 20 minutes, although depending on the type of components forming the image.

  The burned lithographic printing plate can be subjected to conventional treatments such as washing and gumming as needed, but a surface-conditioning solution containing a water-soluble polymer compound or the like is used. In such a case, a so-called desensitizing treatment such as gumming can be omitted.

  By such treatment, the lithographic printing plate obtained from the polymerizable composition of the present invention is applied to an offset printing machine or the like and used for printing a large number of sheets.

  EXAMPLES Hereinafter, although an Example demonstrates this invention in detail, this invention is not limited to these. In this example, the polymerizable composition of the present invention and the negative lithographic printing plate precursor which is its application are tested to evaluate the lithographic printing plate precursor and the polymerizable composition itself.

[Examples 1 to 18, Comparative Examples 1 and 2]
(Production of support)
A molten metal of JIS A1050 alloy containing 99.5% or more of aluminum and Fe 0.30%, Si 0.10%, Ti 0.02%, and Cu 0.013% was subjected to cleaning treatment and cast. In the cleaning process, a degassing process was performed to remove unnecessary gases such as hydrogen in the molten metal, and a ceramic tube filter process was performed. The casting method was a DC casting method. The solidified 500 mm thick ingot was chamfered 10 mm from the surface and homogenized at 550 ° C. for 10 hours so as not to coarsen the intermetallic compound.
Next, after hot rolling at 400 ° C. and intermediate annealing at 500 ° C. for 60 seconds in a continuous annealing furnace, cold rolling was performed to obtain an aluminum rolled plate having a plate pressure of 0.30 mm. By controlling the roughness of the rolling roll, the centerline average surface roughness Ra after cold rolling was controlled to 0.2 μm. Then, it applied to the tension leveler in order to improve planarity.

Next, the surface treatment for making a lithographic printing plate support was performed.
First, in order to remove the rolling oil on the surface of the aluminum plate, degreasing treatment was carried out with a 10% sodium aluminate aqueous solution at 50 ° C. for 30 seconds, and neutralization and smut removal treatment were carried out with a 30% sulfuric acid aqueous solution at 50 ° C. for 30 seconds.
Next, in order to improve the adhesion between the support and the recording layer and to provide water retention to the non-image area, a so-called graining treatment was performed to roughen the surface of the support. While maintaining an aqueous solution containing 1% nitric acid and 0.5% aluminum nitrate at 45 ° C. and flowing an aluminum web through the aqueous solution, an alternating waveform with a current density of 20 A / dm ² and a duty ratio of 1: 1 by an indirect power supply cell Then, electrolytic graining was performed by giving an anode side electric quantity of 240 C / dm ² . Thereafter, etching treatment was performed with a 10% sodium aluminate aqueous solution at 50 ° C. for 30 seconds, and neutralization and smut removal treatment were performed with a 30% sulfuric acid aqueous solution at 50 ° C. for 30 seconds.

Furthermore, in order to improve wear resistance, chemical resistance and water retention, an oxide film was formed on the support by anodic oxidation. An anodized film of 2.5 g / m ² by using a 20% sulfuric acid aqueous solution as an electrolyte at 35 ° C. and carrying out an electrolytic treatment with a direct current of 14 A / dm ² by an indirect power feeding cell while carrying an aluminum web into the electrolyte. Was made.

(Formation of recording layer)
A recording layer coating solution 1 having the following composition was prepared, applied to the aluminum support obtained as described above using a wire bar, and dried at 115 ° C. for 45 seconds in a hot air drying apparatus to form a recording layer. Formed. The coating amount after drying was in the range of 1.2 to 1.3 g / m ² . Furthermore, an overcoat layer coating solution having the following composition was applied using a slide hopper and dried at 120 ° C. for 75 seconds with a hot air dryer to obtain a lithographic printing plate precursor according to the present invention. The coating amount of the overcoat layer was 2.3 g / m ² .

<Recording layer coating solution 1>
(A) Specific polymerizable compound or compound for comparison (compound and amount described in Table 3)
-(B) component: Infrared absorber "IR-1" (structure shown below) 0.10 g
-Component (C): radical polymerization initiator (compound described in Table 3) 0.45 g
-(E) component: Binder polymer (compound described in Table 3) 1.90 g
・ Victoria Pure Blue Naphthalenesulfonate 0.04g
・ Fluorine-based surfactant 0.01g
(Megafuck F-176, manufactured by Dainippon Ink & Chemicals, Inc.)
・ Methyl ethyl ketone 9.0g
・ Methanol 10.0g
1-methoxy-2-propanol 8.0g

<Overcoat layer coating solution>
・ Polyvinyl alcohol 2.3g
(Saponification degree 98.5 mol%, polymerization degree 500)
・ Polyvinylpyrrolidone 0.7g
(K30, Tokyo Chemical Industry Co., Ltd. molecular weight 40,000)
・ Nonionic surfactant 0.05g
(EMAREX NP-10 manufactured by Nippon Emulsion Co., Ltd.)
・ Ion-exchanged water 96.95g

  Here, the infrared absorbers (IR-1) to (IR-3), radical polymerization initiators (S-1) to (S-6), and binder polymers (P-1) to (P) used in this example. The structure of -3) is shown below. The structures of the specific polymerizable compounds (A) used in the examples are those described in the text, and the structures of the compounds (C-1, C-2) used in the comparative examples are as shown below. is there.

  The dipole moments of the following structures forming the central skeleton of the compounds (C-1, C-2) used in the comparative examples are as shown below.

(exposure)
The obtained negative lithographic printing plate precursor is exposed with a Trend setter 3244VFS manufactured by Creo equipped with a water-cooled 40 W infrared semiconductor laser under the conditions of an output of 9 W, an outer drum rotation speed of 210 rpm, a plate surface energy of 100 mJ / cm ² , and a resolution of 2400 dpi. did.

(Development processing)
After the exposure, the film was developed using an automatic processor Stablon 900N manufactured by Fuji Photo Film Co., Ltd. As the developer, a 1: 4 water dilution of DV-2 manufactured by Fuji Photo Film Co., Ltd. was used for both the charging solution and the replenisher. The temperature of the developing bath was 30 ° C. As the finisher, a 1: 1 water dilution (pH = 10.8) of FN-6 manufactured by Fuji Photo Film Co., Ltd. was used.

[Evaluation of printing durability]
The obtained lithographic printing plate was printed with a GEOS-G (N) ink manufactured by Dainippon Ink with a R201 printer manufactured by Roland. The printed matter in the solid image portion was observed, and the printing durability was examined based on the number of sheets on which the image began to fade. The larger the number, the better the printing durability. The results are also shown in Table 3.

[Evaluation of sensitivity]
The amount of energy necessary for recording was calculated based on the line width and laser output of the image obtained by the above exposure (with an infrared laser having a wavelength of about 830 to 850 nm) and development, the loss in the optical system, and the scanning speed. The smaller the value, the higher the sensitivity. The results are also shown in Table 3.

According to the results of Table 3, the lithographic printing plate precursors of Examples 1 to 19 in which the specific polymerizable compound (A) was added to the recording layer were all excellent in printing durability and sensitivity.
On the other hand, instead of the specific polymerizable compound (A), a comparative compound (C-1) having no aromatic heterocyclic structure as a mother nucleus and having a dipole moment value outside the scope of the present invention is used. Any of Comparative Example 1 using Comparative Compound (C-2) having Comparative Compound (C-2) having an aromatic heterocyclic structure as a mother nucleus but having a dipole moment value outside the scope of the present invention was added. However, it was confirmed that the lithographic printing plate precursor had insufficient printing durability and sensitivity.

[Examples 19 to 28, Comparative Examples 3 and 4]
(Formation of undercoat layer)
An undercoat liquid having the following composition was applied to the same aluminum support as in Example 1 with a wire bar, and dried at 90 ° C. for 30 seconds using a hot air dryer. The coating amount after drying was 10 mg / m ² .

<Undercoat liquid>
・ Β-Alanine 0.1g
・ Phenylphosphonic acid 0.1g
・ Methanol 40g
・ Pure water 60g

(Formation of recording layer)
Next, the recording layer coating solution 2 having the following composition is prepared, applied to the above-mentioned undercoated aluminum plate using a wire bar, and dried at 115 ° C. for 45 seconds with a hot air drying apparatus to form a recording layer. did. The coverage of the recording layer after drying was in the range of 1.2 to 1.3 g / m ² .

<Recording layer coating solution 2>
(A) Specific polymerizable compound or comparative compound (compounds and amounts described in Table 4)
-(B) component: Infrared absorber "IR-1" (the said structure) 0.09g
Component (C): radical polymerization initiator “S-1” (the above structure) 0.40 g
-(E) component: Binder polymer (compound described in Table 4) 2.00 g
・ Victoria Pure Blue Naphthalenesulfonate 0.04g
・ Fluorine-based surfactant 0.01g
(Megafuck F-176, manufactured by Dainippon Ink & Chemicals, Inc.)
・ Methyl ethyl ketone 9.0g
・ Methanol 10.0g
1-methoxy-2-propanol 8.0g

(Exposure and development processing)
The obtained negative lithographic printing plate precursor was subjected to infrared laser exposure and development in the same manner as in Example 1 to obtain a lithographic printing plate.

[Evaluation of sensitivity and printing durability]
The obtained lithographic printing plate was printed with a Lithrone printing machine manufactured by Komori Corporation using DIC-GEOS (N) black ink manufactured by Dainippon Ink and Chemicals. At this time, the number of sheets that can be printed while maintaining a sufficient ink density was measured visually to evaluate the printing durability. The results are shown in Table 4.
The amount of energy necessary for recording was calculated based on the line width and laser output of the image obtained by the above exposure (with an infrared laser having a wavelength of about 830 to 850 nm) and development, the loss in the optical system, and the scanning speed. . The smaller the value, the higher the sensitivity. The results are also shown in Table 4.

According to the results of Table 4, it was found that the lithographic printing plate precursors of Examples 19 to 28 in which (A) the specific polymerizable compound was added to the recording layer were all excellent in sensitivity and printing durability.
On the other hand, the lithographic printing plate precursors of Comparative Examples 3 and 4 in which the comparative compounds (C-1 and C-2) are added in place of the specific polymerizable compound (A) have insufficient sensitivity and printing durability. It has been shown.

Claims (4)

(A) a compound having at least one ethylenically unsaturated bond represented by the following general formula (I):
(B) an infrared absorber;
(C) A polymerizable composition containing a radical polymerization initiator.

(In General Formula (I), M represents a substituent represented by a skeleton structure having a dipole moment of 0.55 Debye or more, L represents a divalent organic group, and R ¹ represents a hydrogen atom or a methyl group. n represents an integer of 1 to 6.) 2. The compound according to claim 1, wherein the compound (A) having at least one ethylenically unsaturated bond represented by the general formula (I) is a compound represented by the following general formula (II). Polymerizable composition.

(In the general formula (II), Z is an aromatic heterocyclic group having a structure having at least one oxygen atom, sulfur atom and nitrogen atom and a dipole moment of 0.55 Debye or more, and L is a divalent organic group. Group R ¹ represents a hydrogen atom or a methyl group, and n represents an integer of 1 to 6.) (A) a compound having at least one ethylenically unsaturated bond represented by the following general formula (III):
(B) an infrared absorber;
(C) A polymerizable composition containing a radical polymerization initiator.

(In General Formula (III), Y is an aromatic heterocyclic group having a polarization structure having at least one oxygen atom, sulfur atom and nitrogen atom, L is a divalent organic group, R ¹ is a hydrogen atom or Represents a methyl group, and n represents an integer of 1 to 6.)   A negative lithographic printing plate precursor comprising a recording layer containing the polymerizable composition according to any one of claims 1 to 3 provided on a support.