WO2008007223A2 - Produit conçu pour être utilisé avec un système de manipulation - Google Patents

Produit conçu pour être utilisé avec un système de manipulation Download PDF

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Publication number
WO2008007223A2
WO2008007223A2 PCT/IB2007/002907 IB2007002907W WO2008007223A2 WO 2008007223 A2 WO2008007223 A2 WO 2008007223A2 IB 2007002907 W IB2007002907 W IB 2007002907W WO 2008007223 A2 WO2008007223 A2 WO 2008007223A2
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WO
WIPO (PCT)
Prior art keywords
plateau
product
plate
handling system
face
Prior art date
Application number
PCT/IB2007/002907
Other languages
English (en)
Other versions
WO2008007223A3 (fr
Inventor
Jean Michel Processe
Florent Haddad
Alain Gaudon
Original Assignee
Recif Technologies
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Recif Technologies filed Critical Recif Technologies
Publication of WO2008007223A2 publication Critical patent/WO2008007223A2/fr
Publication of WO2008007223A3 publication Critical patent/WO2008007223A3/fr

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
    • B28D5/0088—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being angularly adjustable

Definitions

  • Embodiments of the invention relate to a product, designed to be used in the semiconductor, MEMS (Micro-Electro-Mechanical), flat screen and/or solar cell industries, the product being able to be gripped by a handling arm, the product comprising a plate made from an inorganic material such (as silicon, quartz, silicon carbide, silicon nitride, arsenic, and/or gallium arsenide, comprising first and second opposite faces.
  • an inorganic material such as silicon, quartz, silicon carbide, silicon nitride, arsenic, and/or gallium arsenide, comprising first and second opposite faces.
  • Embodiments of the invention relate to, among others, the systems which permit these products to be handled.
  • a relatively thin disc such as silicon or other similar material is called a "wafer".
  • the disc acts as a support for the fabrication of micro structures using techniques such as doping, etching, deposition of other materials or photolithography.
  • the disc is therefore of crucial importance especially in the fabrication of integrated circuits.
  • Such a disc may have different diameters, for example, between 25 and 300 mm, for a thickness generally between about 0.15 mm and 1 mm.
  • a tendency today is to use discs of the largest possible diameter in order to be able to etch more electronic circuits like chips simultaneously, while limiting the material losses, especially on the edge of the disc. This is because the cost of manufacturing these discs is very high, taking into account the treatments involved and the precautions that must be taken for their fabrication: clean rooms, controlled atmosphere, protection of the personnel, etc.
  • the disc In order to be able to operate correctly on the disc with machines, which the technicians in this field are familiar with, the disc has an identifier such as a brand, a sign, etc. to define the orientation of the crystalline planes of the semiconductor.
  • the identifier may be a flat on the edge of the disc, a slot, etc.
  • robot type means or similar means is be used, which will firstly collect the discs from where they are stored after fabrication, and then take them to the machines and finally to position them on these machines according to the desired orientation by means of the identifier defined above.
  • These robot type or similar means essentially comprise a handling system capable of gripping each disc, pointing out that, by handling system, it is meant any device which, regardless of its structure, essentially comprising an arm, has for its minimal functions the gripping and/or transporting of objects from one place to another and/or their orientation in space with respect to a given reference.
  • each contact of a handling arm with a disc as described above is a potential source of pollution of this disc, for example, the generation of particles by tearing or friction and/or the contamination by physical - chemical transfers (diffusion of metallic ions, etc.) between the arm and the disc.
  • These particles and physical-chemical transfers are able to destroy electronic circuits such as chips, micro processors, etc. mentioned previously, and consequently reduce the number of electronic circuits that it is possible to create on the discs.
  • One purpose of this invention is to create a product designed to be used in the semiconductor, MEM, flat screen and/or solar cell industries, which permits the above disadvantages to be limited as much as possible.
  • Another purpose of this invention is to create a product designed to be used in the semiconductor, MEM, flat screen and/or solar cell industries that can be handled easily.
  • Another purpose of this invention is to create a handling system for these products designed to be used in the semiconductor, MEM, flat screen and/or solar cell industries, to grip, transport and orient them in space.
  • the purpose of this invention is a product, designed to be used in the semiconductor, MEM, flat screen and/or solar cell industries, the product being able to be gripped by a handling system, the product comprising:
  • first gripping means assembled in association with the plateau, the first gripping means being capable of cooperating and also removable with second gripping means in addition to the first gripping means, the second additional gripping means belonging to the handling system.
  • a plateau between the plate and, for example, a handling arm of a handling system has one essential advantage in that the arm no longer comes into contact with the plate, but with an intermediate part, the plateau. In this way, the contamination due to the contact between the arm and the plate, and the relative movement between the plate and the arm is greatly reduced, as the plateau is temporarily fixed to the plate and therefore immobile with respect to the latter while it is being handled. For example, every time the plate is taken and deposed, it is always the same part of the plateau that is in contact with the plate as the plateau has not left the plate.
  • the attachment means of the plate on the plateau is composed of means of attaching the plate by adhesion to the plateau.
  • This characteristic proposes attachment of the plate to the plateau with reduced contamination due to adhesion attachment means.
  • the means of attaching the plate by adhesion to the plateau comprises a plurality of pins each equipped with an adhesive material.
  • the adhesive pins allow the plate to be associated advantageously to the plateau by determined attachment points advantageously defining a reduced contact surface on the plate permitting the liaison surface area to be reduced to a necessary minimum and thus to limit the contamination.
  • the attachment means is composed of means of clamping the plateau on the edge of the plate.
  • This attachment means is an example of an alternative to the previous attachment means, presenting the advantage of attaching the plate by its periphery.
  • the means of clamping the plateau on the edge of the plate is composed of at least three fingers capable of gripping the edge of the plate, and means that may be controlled to connect the fingers with the plateau.
  • the first gripping means is composed of at least one of the following means: a large rest surface and one of the two parts of a male - female connection.
  • the product according to the invention comprises means of exerting a traction force on the plateau so that the plateau is able to be pressed against at least one part of the handling system.
  • This characteristic proposes a means of association by simple contact of the plateau on the handling system, due to the presence of a liaison force drawing them to one another. This characteristic permits contamination to be reduced while limiting or avoiding relative movements of the plateau equipped with the plate with respect to the handling system in which a contact, for example, by friction or rolling between these members, would be maintained.
  • the traction force is one of the following forces: magnetic force, suction force, gravitational force, or a combination of at least two of these three types of forces.
  • the product according to the invention comprises first centering means to apply the centering forces on the plateau so that the plateau is able to be centered with respect to one part of the handling system.
  • first centering means is composed by at least one magnet generally of an annular shape, continuous or discontinuous, whose internal and external circular faces are respectively polarized North and South, wherein the annular magnet is mounted protrudingly on the face of the plateau opposite the face of the latter which is opposite the plate, so that the North-South polarization plane of the annular magnet is more or less parallel to the general plane of the face of the plateau that is opposite the plate, wherein the annular magnet is moreover disposed to be able to be plunged into an additional recess in the handling system, the additional recess comprising a magnetized ring according to one North-South polarization plane more or less the same as the North-South polarization plane of the annular magnet.
  • the plateau comprises a central thrust portion connected to the face of the plateau opposite to the face which is opposite the plate, on which a translation force may be applied to move the plateau in a translation direction that is more or less perpendicular to the face opposite the plate and a rotation moment to pivot the plateau around the translation direction.
  • This characteristic permits a joint orientation of the plateau and the associated plate, by exerting the required forces on the plateau for the dissociation of the handling system and once the plateau has been dissociated, a moment required for the rotation of the latter so as to orientate the plate that is attached to it.
  • the plateau is composed of an external ring, a central core and spokes linking the central core to the external ring.
  • Another purpose of this invention is a handling system for handling a product as defined above, characterized by the fact that it comprises:
  • the gripping system according to the invention permits the product composed of the plate and its associated plateau to move in space, for example, in order to transfer the plate of one processing tool to another processing tool.
  • the handling system according to the invention comprises among others:
  • an aligning device comprising a body and a control rod for a rotation moment mounted in cooperation with the body so as to form a part which extends beyond the body, wherein the control rod can pivot around the translation direction more or less perpendicularly to the face opposite the plate, and • means so that the axis of rotation of the control rod can pass more or less by the centre of the central orifice and is more or less perpendicular to the plane of this central orifice.
  • This characteristic proposes a complete alignment system for the product, integrating an aligning device, which may or may not be on board the means of moving the deck, which is to say on the robot on which the deck is mounted, so that the deck and the aligning device may cooperate so as to align the plateau and plate assembly.
  • the end of the rod extending beyond the body comprises means of connecting it in rotation with the plateau when this end of the rod comes into contact with the central thrust portion.
  • the handling system comprises among others means of storing a plurality of interchangeable plateaus each comprising first gripping means capable of cooperating and removable with the second gripping means of the deck.
  • the handling system according to the invention comprises among others means of cleaning a plateau.
  • Figure 1 shows the principle diagram of the product according to the invention in its first definition, designed to be used in the semiconductor, MEM, flat screen and/or solar cell industries.
  • Figures 2 to 5 show, in diagrammatical form, four possible embodiments of the product according to the invention in accordance with the diagram shown in figure 1.
  • Figure 6 shows, in a perspective view, an assembly illustrating a first example of an embodiment of a handling system according to the invention that may be used to handle the product according to the invention as shown diagrammatically in figures 1 to 5.
  • Figure 7 shows a partial axial cross sectional view of the example of figure 6.
  • Figure 8 shows a partial axial cross sectional view of the example of figure 6 according to one variant of the embodiment.
  • Figure 9 shows, in a perspective view, an assembly illustrating a second example of an embodiment of a handling system according to the invention.
  • Figure 10 shows, in a perspective view, an assembly illustrating a third example of an embodiment of a handling system according to the invention.
  • the object of the invention comprises "at least one" member with a given function
  • the embodiment described may comprise several of these members.
  • the embodiment of the object according to the invention as shown comprises several members with identical functions and if, in the description, it is not stated that the object according to this invention must necessarily comprise a particular number of these members, the object of the invention may be defined as comprising "at least one" of these members.
  • This invention relates to a product Pr designed to be used in the semiconductor, MEM, flat screen and/or solar cell industries as mentioned in the introduction of this description.
  • This invention relates more particularly to a product that is designed to be gripped by a handling system Bm of which a preferential embodiment will be provided below.
  • this product comprises a plate 1, for example, made of a silicon semiconductor or intended to be a semiconductor, comprising first 2 and second 3 opposite plate faces.
  • this plate 1 may be of any shape, but generally it has the shape of a disc (or other similar shape).
  • the product Pr comprises, among others, a plateau 4 defined by at least one plateau face 5 opposite the first or second face of the plate 1, which is to say the second face 3 on figure 1.
  • the product Pr also comprises a mechanism such as a means 7 of attaching the plate 1 to the plateau 4 so that the plateau face 5 of the plateau is opposite one face 3 of the plate, and a first gripping mechanism such as a first gripping means 11 mounted in association with the plateau 4, wherein the components of the first gripping means are capable of cooperating and are removable, as described below, with a preferred embodiment of the handling system, with a second gripping mechanism such as a second gripping means 12 in addition to the first gripping means 11, the second additional gripping means belonging to the handling system Bm.
  • Figure 1 shows one embodiment an attachment mechanism such as attachment means 7 for attaching the plate on the plateau, which is composed of means 15 of clamping the plateau onto the edge 16 of the plate 1.
  • the means 15 of clamping the plateau on the edge of the plate is, for example, composed of at least three fingers 17 disposed, for example, at 120 degrees fitted so that they can grip the edge 16 of the plate 1, and a controlling mechanism such as means 18 that can be controlled to connect these fingers 17 with the plateau 4.
  • These controllable liaison means 18 may be of any type, for example, electromagnetic coupled with return springs as shown in figure 1.
  • other embodiments of these controllable liaison means 18 may be provided, that are themselves known to those skilled in the art and which consequently will not be described in fuller detail here purely to simplify the description.
  • the controllable liaison means 18 shown in figure 1 may indeed be present in the four other embodiments shown in figures 2 to 5, but which, in the aim of simplifying the representation of the diagrams in these figures 2 to 5, have deliberately not been shown.
  • the face of the plate 1 opposite the plateau 4 will preferably not be in contact with the face 5 of the plateau.
  • the clamping means 15 will preferably be in contact with the peripheral part of the plate 1, and only these means.
  • an adhesive material for example, an adhesive polymer, is designed to be in contact with the plate 1. This adhesive material may be spread over several contact pins, for example, three pins.
  • the first gripping means 11 is advantageously composed by at least one of the following means: a support surface that is advantageously flat 19, figures 1 to 5, and/or one 20 of the two parts 20, 21 of a male - female connection, figures 3 and 5.
  • the first gripping means 11 is composed of the male part 20 of a flattened revolution cone male - female connection that is able to fit into the additional female part 21.
  • the plateau 4 comprises among others means 30 of exerting on it a traction force.
  • these traction means 30 may be made in different ways. However, it will be preferably chosen from the means that is capable of creating one of the following forces: magnetic force (for example: a permanent magnet positioned opposite another magnet with inverted polarity or opposite a magnetic material, an embodiment according to figure 5), suction force (for example, by means of a vacuum pump, embodiment according to figure 4, gravitational force (vertically stacked so that the plateau 4 is in a horizontal position, below the plate 1), or a combination of at least two of these three types of force (embodiments according to figures 2 to 5).
  • magnetic force for example: a permanent magnet positioned opposite another magnet with inverted polarity or opposite a magnetic material, an embodiment according to figure 5
  • suction force for example, by means of a vacuum pump, embodiment according to figure 4, gravitational force (vertically stacked so that the plateau 4 is in a horizontal position, below the plate 1)
  • gravitational force vertically stacked so that the plateau 4 is in a horizontal position, below the plate 1
  • the first centering means 40 may be provided to apply the centering forces onto the plateau 4 so that it is possible to centre the plateau and/or so that it centers itself automatically with respect to a part of the handling arm Bm, as for example, in the case of the embodiments according to figures 3 and 5.
  • the first centering means 40 is, for example, composed by at least one magnet generally of an annular shape 42, continuous or discontinuous, whose internal and external circular faces 43, 44, are respectively polarized
  • the annular magnet 42 may adopt a minimal form composed by at least three sectors positioned in an annular configuration.
  • the annular magnet 42 is fitted so that it may be plunged (or placed), for example, in an additional recess 46, figure 5, created in the handling system Bm.
  • the additional recess 46 comprising a magnetized ring 47 is in a North-South polarization plane more or less the same as the North-South polarization plane of the annular magnet 42.
  • the magnetized ring 47 is able to surround the annular magnet 42 when the plateau is in contact with part of the handling system Bm as shown diagrammatically in figure 5, so that the internal face of the annular ring has a polarity that is inverted with respect to that of the external face 44 of the annular magnet 42.
  • magnetized ring 47 and/or annular magnet 42 it is understood that this means complete rings or portions of rings positioned in a circle or similar configuration so that the assembly is magnetically equivalent to a complete ring.
  • the plateau 4 advantageously comprises a central thrust portion 50 connected, either directly or indirectly, to the face 45 of the plateau opposite its face 5 opposite the plate 1.
  • a translation force Fp to move the plateau 4 and its associated plate in a translation direction, in one direction or the other, more or less perpendicularly to the face 5 opposite the plate 1, and a rotation moment Fr to pivot the plateau 4, and thus simultaneously the plate 1, more or less around the translation direction, very advantageously when the plateau is no longer in contact with the deck.
  • This central thrust portion 50 may have different forms. It may be composed of the central part itself of the face 45 defined above, as in the embodiments according to figures 1, 2 and 4, or by the small base of the male part of the flattened cone connection, figure 3, or by a pin that is also used to compose the attachment means of the support of the annular magnet 42 according to the embodiment of figure 5 described above.
  • the plate 1 comprises an identifier to orientate it angularly with respect to a reference connected to the deck or robot bearing it.
  • the product To orientate the plate connected to 4, which is to say in fact the product, it is preferable that the product not be pressed on the second gripping means 12 of the handling system Bm. To this end, the product must be moved away from the second gripping means 12 by exerting the force Fp on the product, then pivoting it by exerting on it the moment Fr until the identifier connected to the plate is in the correct position. The product is then brought towards the handling system so that its first gripping means 11 cooperates with the second gripping means 12.
  • Another purpose of this invention is to create a handling system Bm specially structured to cooperate with the product Pr defined above.
  • FIG. 1 One embodiment of the handling system according to the invention is shown in figure 6.
  • This handling system Bm of the product Pr comprises a deck 60, second gripping means 12 in addition to the first gripping means 11 defined above, wherein the second gripping means 12 is made in the deck 60, and known means 61 of moving the deck 60 according to a desired trajectory (not entirely shown).
  • These means 61 for moving the deck 60 is only shown very diagrammatically in figure 6. In general, it is of the robot type with at least three axes or more.
  • One example of an embodiment of these means 61 is described and shown in the publication WO 99/57752, which is herein incorporated by reference in its entirety.
  • the deck 60 is composed of a pallet that may have different forms.
  • Figure 6 shows a pallet in the form of a U shaped fork that may be positioned on the face 45 of the plateau 4. It may also be presented in the form of a crown with a central orifice.
  • at least one of the two arms of the U shaped pallet comprises a duct which opens onto the face of the pallet, that can come into contact with the face 45 of the plateau 4, advantageously with a flared opening with respect to the diameter of the duct to create a suction cup which, when the vacuum is obtained in the duct by means of a vacuum pump (not shown), will maintain the plateau pressed onto the pallet.
  • the pallet defines a concave recess, of a flattened cone shape 21 to house the male part 20 of the product, or cylindrical so that the annular magnet 42 can be plunged into the space of the magnetized ring 47, which is at least partially attached to the pallet.
  • This central orifice 63 is created so that, when the first gripping means 11 cooperates with the second additional gripping means 12, the plateau 4 is more or less centered on it and therefore the central thrust portion 50 is aligned with this central orifice 63.
  • the handling system comprises an aligning device 65 which is a device that is well known to those skilled in the art and which will not be detailed further here.
  • an example of this type of device comprises a body 66 and, mounted in cooperation with this body 66, a rotary control rod 68 for the moment of rotation Fr defined above, the body 66 comprising means of controlling the rod 68 in rotation, the latter forming a protrusion extending or in relief of the body 66, wherein the control rod 68 is able to extend beyond the body 66, to permit translation of the plateau 4 and the associated plate, in a translation direction more or less perpendicular to the face 5 opposite the plate 1, as explained below, and to pivot around this same translation direction.
  • the body 66 of the aligning device can be on board the means 61 of moving the deck 60 in a desired trajectory, as explained below, in cooperation with the deck 60 so that the axis of rotation of the control rod 68 is able to pass more or less via the centre of the central orifice 63 and is more or less perpendicular to the plane of this central orifice 63.
  • the end 69 of the rod 68 which extends beyond the body 66 comprises means 70 to connect it in rotation with the plateau 4 when the latter comes into contact with the central thrust portion 50 and to orientate the product as described above.
  • the handling system Bm advantageously comprises second centering means 80 to centre the end 69 of the rod 68 of the aligning device on the central thrust portion 50 of the plateau 4, when they later come into contact with one or the other, in order to improve the performance of the angular orientation of the plateau.
  • These second centering means may be made by means of a male - female type connection 80, for example, conical, wherein a male cone 81 can thus be formed on the end 69 of the rod 68 of the aligning device 65 that is capable of fitting into an associated female cone 82 formed in the central thrust portion 50 of the plateau 4, the axis of revolution 83 of the male and female cones being the same as the axis of rotation on which the moment of rotation Fr is applied.
  • the second centering means may adopt the form of a plurality of conical connections as described above, spread out on the plateau so that they are equidistant from the axis of rotation on which the moment of rotation Fr is applied.
  • the handling system with aligning device operates as follows, described by way of example.
  • the means so that the axis of rotation of the control rod 68 may pass more or less via the centre of the central orifice 63 and be more or less perpendicular to the plane of the central orifice 63 may be composed by means 61 for moving the deck 60 described above.
  • the deck 60 carrying the product Pr is brought into contact with the central thrust portion 50 and the end 69 so as to create a rotary connection between these two members, by all known means, for example, an adhesive connection, induced by a magnetic force or a gravitational force, or any other connection in particular controlled by an actuator.
  • the deck 60 then continues its relative movement with respect to the aligning device so as to move the product Pr away from the deck.
  • the end of the rod 68 is immobile with respect to the deck in movement and exerts the translation force Fp described above, this being made possible by the end 69 of the rod 68 extending beyond the aligning device which will be such that the deck 60 can be separated from the plateau.
  • the means 30 of exerting a traction force on the plateau 4 so that it can be pressed against at least one part of the handling system will of course be deactivated.
  • Figure 6 shows a product Pr cooperating with a handling system Bm in accordance with the invention.
  • This figure which is a perspective view, shows the respective positions of the product Pr and the deck 60 when the latter is in a position distant from the product Pr, so that the product Pr may be easily pivoted to obtain the desired orientation by the control rod of the aligning device.
  • the plate 1 in the form of a disc, is shown transparently.
  • the plateau 4 it is composed of an external ring 401 and a central core 402 composing the central thrust portion 50 defined previously, wherein the central core is connected to the external ring 401 by spokes 403.
  • This embodiment allows a plateau 4 to be obtained that is both rigid and light, made of a metallic material or a composite material, for example, in carbon fibers embedded in a polymerizable resin.
  • the aligning device 65 may be dissociated from the robot and disposed in a determined place distant from the robot.
  • the deck equipped with the latter will be brought above the aligning device so that the axis of rotation of the rod is aligned with the translation direction, the means 70 of the end 69 of the rod 68, to connect it in rotation the plateau 4 being positioned above its central thrust portion 50 and lowered onto it so that the plateau 4 comes into contact with the rod 68 of the aligning device 65.
  • the deck 60 is then lowered so that the plateau 4 and the associated plate 1 are raised to arrive finally at the same configuration as that previously explained in the case where the aligning device is on board the robot.
  • Such a configuration may have the advantage of lightening the robot, but reduces the simultaneous alignment and movement possibilities of the plateau and the associated plate; the alignment is only made at the position where the aligning device is situated.
  • a handling system Bm equipped with a plateau 4 in compliance with the invention described above may be brought to grip, with the same plateau 4, several different types of plates, for example, semiconductors, stored in different containers, these different plates having coatings or levels of cleanliness that are incompatible with one another.
  • the plateau In order to avoid one of the coatings contaminating the plateau then the contaminated plateau in turn contaminating another plate, it may be possible to change the plateau to suit the type of plate to be handled. In this case, it is possible to use a clean plateau, which is to say decontaminated and cleaned for each plate transfer.
  • the system Bm may be controlled so that it searches, in a plate 4 magazine 200, the plateau that is appropriate for the type of plate or type of processing that the plate is to undergo.
  • the magazine 200 may, for example, be in the form of a plurality of identical supports 201 stacked on top of one another, each comprising a deck 202 capable of holding the central core 402 of a plateau 4, as shown in figure 9.
  • the deck 202 of each support 201 may adopt a similar form to that of the end 69 of the rod 68 of the aligning device 65 described above, which also holds the central core 402 of a plateau 4.
  • the support 201 may adopt any suitable form, preferably freeing up a space next to the first gripping means 11, which is to say in the example is a space next to the external ring 401 of the plateau 4, in order to permit the deck 60 to have access so that it can deposit and collect a plateau 4 by its external ring 401.
  • the assembly of the supports 201 may be fixed in a container (not shown) provided to stock the plateaus 4 and located at a determined position accessible to the deck.
  • plateau 4 on the deck may be replaced by another plateau of another type if the handling mode of the plate has to be changed.
  • plateaus may be envisaged to handle the plates by gripping them by their rear face or plateaus that touch and grip the plates by their edge, all these different plateaus comprising the same first gripping means 11 so as to associate to a same deck 60 equipped with second gripping means 12 in addition to the first gripping means 11.
  • the plateaus can handle plates of different thicknesses in particular ultra-thin plates that are particularly flexible.
  • three support points under the plate may be sufficient, wherein these points are advantageously spread out homogeneously on the edge of the plateau.
  • FIG. 10 shows an example of an embodiment of a cleaning module 300.
  • This module 300 is in the form of a support 301 of the plateau 4, equipped with a deck 302 capable of holding the central core 402 of a plateau 4, as shown in figure 10.
  • the deck 302 of the support 301 may adopt a form similar to that of the end 69 of the rod 68 of the aligning device 65 described above, which also holds the central core 402 of a plateau 4.
  • a support 301 may adopt any suitable form, preferably freeing up a space next to the first gripping means 11, which is to say in the example is a space next to the external ring 401 of the plateau 4, in order to allow the deck 60 access so that a plateau 4 may be collected and deposited by its external ring 401.
  • the support 301 comprises a cleaning head 303 directed towards the part of the plateau to be cleaned, which is to say the external ring 401 in the example shown in figure 10.
  • the cleaning head 303 is supplied in cleaning fluids, substances, and/or waves via a feed duct 304, for example, channeling pressurized ionized nitrogen.
  • the deck 302 is advantageously mounted rotarily on the support 301 so as to allow all of the parts of the plateau to be cleaned to pass, below the cleaning head 303, by rotation of the latter.
  • a plateaus storage magazine may be combined with a cleaning module, for example, by equipping each plateau support 201 of the magazine 300 of figure 9, with a cleaning head acting on the parts of the stored plateau to be cleaned; in this case, the deck 202 supporting the plateau will be advantageously mounted rotarily.
  • identification means for each plateau.
  • the identification means will make it possible to determine when and where the plateau has been used, if it requires maintenance, if it is adapted to the type of handling desired, etc.
  • This identification means may, for example, take on the form of an alpha-numerical code, a bar code, or a 2D or data-matrix type code, or a combination of these codes. These codes may be etched or written on one of the faces of the plateau 4, preferably on the lower face that is not located opposite plate 1.
  • the presence of a means of indexing the plateau is required, whose position with respect to that of the identification code is predetermined, so as to permit angular orientation of the plateau in rotation so that the identification means is situated in the reading position.
  • the indexing means may be, for example, created by a mark, a slot on the plateau 4, or a magnet integrated into the plateau that actuates a Hall effect sensor.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manipulator (AREA)

Abstract

La présente invention concerne un produit (Pr) pouvant être utilisé dans les industries des semi-conducteurs, MEM, écrans plats et/ou cellules solaires, le produit pouvant être agrippé par un système de manipulation (Bm). Le produit peut comprendre : une plaque (1) fabriquée en silicium, quartz, carbure de silicium, nitrure de silicium, arsenic, et/ou arséniure de gallium, comprenant une première (2) et une seconde (3) faces opposées, un plateau (4) défini par au moins une face (5) opposée à la plaque, un moyen de fixation (7) de la plaque (1) sur le plateau de sorte que la ou les faces (5) du plateau (4) soient opposées à la première (2) ou la seconde (3) face de la plaque, et un premier moyen de préhension (11) monté en association avec le plateau (4), lesdits premiers moyens de préhension pouvant coopérer et pouvant être retirés desdits seconds moyens de préhension (12) en plus des premiers moyens de préhension (11), les seconds moyens de préhension supplémentaires appartenant au système de manipulation. Un autre mode de réalisation de la présente invention concerne un système de manipulation du produit.
PCT/IB2007/002907 2006-06-27 2007-06-27 Produit conçu pour être utilisé avec un système de manipulation WO2008007223A2 (fr)

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Application Number Priority Date Filing Date Title
US11/426,800 US20070297885A1 (en) 2006-06-27 2006-06-27 Product designed to be used with handling system
US11/426,800 2006-06-27

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WO2008007223A2 true WO2008007223A2 (fr) 2008-01-17
WO2008007223A3 WO2008007223A3 (fr) 2008-05-02

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WO (1) WO2008007223A2 (fr)

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KR102540125B1 (ko) * 2017-08-30 2023-06-05 주성엔지니어링(주) 기판안치수단 및 기판처리장치

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US20070297885A1 (en) 2007-12-27

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