WO2007100314A3 - Silicon nanoparticle formation by electrodeposition from silicate - Google Patents

Silicon nanoparticle formation by electrodeposition from silicate Download PDF

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Publication number
WO2007100314A3
WO2007100314A3 PCT/US2006/005068 US2006005068W WO2007100314A3 WO 2007100314 A3 WO2007100314 A3 WO 2007100314A3 US 2006005068 W US2006005068 W US 2006005068W WO 2007100314 A3 WO2007100314 A3 WO 2007100314A3
Authority
WO
WIPO (PCT)
Prior art keywords
electrodeposition
silicate
nanoparticle formation
silicon nanoparticle
platinum
Prior art date
Application number
PCT/US2006/005068
Other languages
French (fr)
Other versions
WO2007100314A2 (en
Inventor
Munir H Nayfeh
Laila Abuhassan
Original Assignee
Univ Illinois
Univ Jordan
Munir H Nayfeh
Laila Abuhassan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Illinois, Univ Jordan, Munir H Nayfeh, Laila Abuhassan filed Critical Univ Illinois
Publication of WO2007100314A2 publication Critical patent/WO2007100314A2/en
Publication of WO2007100314A3 publication Critical patent/WO2007100314A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/33—Silicon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00—Electrolytic coating other than with metals
    • C25D9/04—Electrolytic coating other than with metals with inorganic materials
    • C25D9/06—Electrolytic coating other than with metals with inorganic materials by anodic processes

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  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)

Abstract

The invention provides a method for the formation of silicon nanoparticles, in sizes that fluoresce, by electrodeposition of silicon material onto a non-reactive (with HF) metal (e.g., platinum) surface from a solution of silicate and HF or HF/H2O2. In an embodiment of the invention, a positively biased substrate with a platinum surface is immersed in a solution of sodium metasilicate in HF/H2O2, a current is drawn and a coating of silicon nanoparticles is formed on the platinum surface.
PCT/US2006/005068 2005-03-23 2006-02-14 Silicon nanoparticle formation by electrodeposition from silicate WO2007100314A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/088,269 2005-03-23
US11/088,269 US20060213779A1 (en) 2005-03-23 2005-03-23 Silicon nanoparticle formation by electrodeposition from silicate

Publications (2)

Publication Number Publication Date
WO2007100314A2 WO2007100314A2 (en) 2007-09-07
WO2007100314A3 true WO2007100314A3 (en) 2009-05-22

Family

ID=37034101

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/005068 WO2007100314A2 (en) 2005-03-23 2006-02-14 Silicon nanoparticle formation by electrodeposition from silicate

Country Status (2)

Country Link
US (1) US20060213779A1 (en)
WO (1) WO2007100314A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100044344A1 (en) * 2005-07-26 2010-02-25 Nayfeh Munir H Silicon Nanoparticle Formation From Silicon Powder and Hexacholorplatinic Acid
BRPI0618291A2 (en) * 2005-11-10 2011-08-30 Univ Illinois photovoltaic devices for converting light into electric energy
US20080173546A1 (en) * 2007-01-22 2008-07-24 Seung Kwon Seol Fabrication of freestanding micro hollow tubes by template-free localized electrochemical deposition
US9475985B2 (en) * 2007-10-04 2016-10-25 Nanosi Advanced Technologies, Inc. Nanosilicon-based room temperature paints and adhesive coatings
US11827993B1 (en) 2020-09-18 2023-11-28 GRU Energy Lab Inc. Methods of forming active materials for electrochemical cells using low-temperature electrochemical deposition

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3992235A (en) * 1975-05-21 1976-11-16 Bell Telephone Laboratories, Incorporated Etching of thin layers of reactive metals
US4108738A (en) * 1977-02-18 1978-08-22 Bell Telephone Laboratories, Incorporated Method for forming contacts to semiconductor devices
US4620904A (en) * 1985-10-25 1986-11-04 Otto Kozak Method of coating articles of magnesium and an electrolytic bath therefor
US6585947B1 (en) * 1999-10-22 2003-07-01 The Board Of Trustess Of The University Of Illinois Method for producing silicon nanoparticles
US20030178571A1 (en) * 2001-11-21 2003-09-25 The Board Of Trustees Of The University Of Illinois Coated spherical silicon nanoparticle thin film UV detector with UV response and method of making

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3597624A (en) * 1969-01-30 1971-08-03 Bell Telephone Labor Inc Optical raman oscillator employing colloidal suspension or emulsion
US3852175A (en) * 1972-06-08 1974-12-03 Ppg Industries Inc Electrodes having silicon base members
US4931692A (en) * 1987-10-14 1990-06-05 Canon Kabushiki Kaisha Luminescing member, process for preparation thereof, and electroluminescent device employing same
US5275713A (en) * 1990-07-31 1994-01-04 Rudolf Hradcovsky Method of coating aluminum with alkali metal molybdenate-alkali metal silicate or alkali metal tungstenate-alkali metal silicate and electroyltic solutions therefor
US5308804A (en) * 1992-12-15 1994-05-03 Lee Huai Chuan Moving disks made of semiconductor nanocrystallite embedded glass
JP3443856B2 (en) * 1992-12-28 2003-09-08 ソニー株式会社 Quantum box assembly device and operation method thereof
US5942748A (en) * 1993-09-09 1999-08-24 The United States Of America As Represented By The Secretary Of The Navy Liquid level sensor and detector
US5527386A (en) * 1993-10-28 1996-06-18 Manfred R. Kuehnle Composite media with selectable radiation-transmission properties
GB9323498D0 (en) * 1993-11-15 1994-01-05 Isis Innovation Making particles of uniform size
US5537000A (en) * 1994-04-29 1996-07-16 The Regents, University Of California Electroluminescent devices formed using semiconductor nanocrystals as an electron transport media and method of making such electroluminescent devices
DE69519384T2 (en) * 1994-09-29 2001-05-23 British Telecomm Optical fiber with quantum dots
US5561679A (en) * 1995-04-10 1996-10-01 Ontario Hydro Radioluminescent semiconductor light source
US5747180A (en) * 1995-05-19 1998-05-05 University Of Notre Dame Du Lac Electrochemical synthesis of quasi-periodic quantum dot and nanostructure arrays
US5703896A (en) * 1995-06-07 1997-12-30 The Regents Of The University Of Colorado Silicon quantum dot laser
US5690807A (en) * 1995-08-03 1997-11-25 Massachusetts Institute Of Technology Method for producing semiconductor particles
US5714766A (en) * 1995-09-29 1998-02-03 International Business Machines Corporation Nano-structure memory device
US5695617A (en) * 1995-11-22 1997-12-09 Dow Corning Corporation Silicon nanoparticles
JP3275761B2 (en) * 1996-05-13 2002-04-22 トヨタ自動車株式会社 Valve train for internal combustion engine
US5891548A (en) * 1996-10-03 1999-04-06 Dow Corning Corporation Encapsulated silica nanoparticles
US5852306A (en) * 1997-01-29 1998-12-22 Micron Technology, Inc. Flash memory with nanocrystalline silicon film floating gate
FR2762931B1 (en) * 1997-05-05 1999-06-11 Commissariat Energie Atomique QUANTUM ISLANDS DEVICE AND MANUFACTURING METHOD
US6060743A (en) * 1997-05-21 2000-05-09 Kabushiki Kaisha Toshiba Semiconductor memory device having multilayer group IV nanocrystal quantum dot floating gate and method of manufacturing the same
US5770022A (en) * 1997-06-05 1998-06-23 Dow Corning Corporation Method of making silica nanoparticles
US6473406B1 (en) * 1997-07-31 2002-10-29 Cisco Technology, Inc. Method and apparatus for transparently proxying a connection
JP3854731B2 (en) * 1998-03-30 2006-12-06 シャープ株式会社 Microstructure manufacturing method
US6597496B1 (en) * 1999-10-25 2003-07-22 The Board Of Trustees Of The University Of Illinois Silicon nanoparticle stimulated emission devices
US6456423B1 (en) * 1999-10-22 2002-09-24 The Board Of Trustees Of The University Of Illinois Silicon nanoparticle microcrystal nonlinear optical devices
US6410934B1 (en) * 2001-02-09 2002-06-25 The Board Of Trustees Of The University Of Illinois Silicon nanoparticle electronic switches
US6649402B2 (en) * 2001-06-22 2003-11-18 Wisconsin Alumni Research Foundation Microfabricated microbial growth assay method and apparatus
WO2003010511A2 (en) * 2001-07-23 2003-02-06 Trustees Of Boston University Low resolution surface enhanced raman spectroscopy on sol-gel substrates
US6660152B2 (en) * 2001-11-15 2003-12-09 The Board Of Trustees Of The University Of Illinois Elemental silicon nanoparticle plating and method for the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3992235A (en) * 1975-05-21 1976-11-16 Bell Telephone Laboratories, Incorporated Etching of thin layers of reactive metals
US4108738A (en) * 1977-02-18 1978-08-22 Bell Telephone Laboratories, Incorporated Method for forming contacts to semiconductor devices
US4620904A (en) * 1985-10-25 1986-11-04 Otto Kozak Method of coating articles of magnesium and an electrolytic bath therefor
US6585947B1 (en) * 1999-10-22 2003-07-01 The Board Of Trustess Of The University Of Illinois Method for producing silicon nanoparticles
US20030178571A1 (en) * 2001-11-21 2003-09-25 The Board Of Trustees Of The University Of Illinois Coated spherical silicon nanoparticle thin film UV detector with UV response and method of making

Also Published As

Publication number Publication date
US20060213779A1 (en) 2006-09-28
WO2007100314A2 (en) 2007-09-07

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