WO2007033188A3 - Substrate-enhanced electroless deposition (seed) of metal nanoparticles on carbon nanotubes - Google Patents
Substrate-enhanced electroless deposition (seed) of metal nanoparticles on carbon nanotubes Download PDFInfo
- Publication number
- WO2007033188A3 WO2007033188A3 PCT/US2006/035511 US2006035511W WO2007033188A3 WO 2007033188 A3 WO2007033188 A3 WO 2007033188A3 US 2006035511 W US2006035511 W US 2006035511W WO 2007033188 A3 WO2007033188 A3 WO 2007033188A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- carbon nanotubes
- substrate
- metal
- metal nanoparticles
- electroless deposition
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1635—Composition of the substrate
- C23C18/1639—Substrates other than metallic, e.g. inorganic or organic or non-conductive
- C23C18/1641—Organic substrates, e.g. resin, plastic
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/54—Contact plating, i.e. electroless electrochemical plating
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Electrochemistry (AREA)
- Carbon And Carbon Compounds (AREA)
- Catalysts (AREA)
Abstract
An electroless deposition method of depositing metal nanoparticles onto conductive substrates such as carbon nanotubes is provided. The carbon nanotubes are provided on a support comprising a metal substrate and then immersed in an aqueous solution containing metal ions. The metal substrate metal has a redox potential which is lower than that of the metal ions in solution such that the metal ions are readily reduced into metal nanoparticles on the carbon nanotubes.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US71646405P | 2005-09-12 | 2005-09-12 | |
US60/716,464 | 2005-09-12 | ||
US11/522,545 US7538062B1 (en) | 2005-09-12 | 2006-09-11 | Substrate-enhanced electroless deposition (SEED) of metal nanoparticles on carbon nanotubes |
US11/522,545 | 2006-09-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2007033188A2 WO2007033188A2 (en) | 2007-03-22 |
WO2007033188A3 true WO2007033188A3 (en) | 2008-08-14 |
Family
ID=37564162
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2006/035511 WO2007033188A2 (en) | 2005-09-12 | 2006-09-12 | Substrate-enhanced electroless deposition (seed) of metal nanoparticles on carbon nanotubes |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2007033188A2 (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8354855B2 (en) | 2006-10-16 | 2013-01-15 | Formfactor, Inc. | Carbon nanotube columns and methods of making and using carbon nanotube columns as probes |
US8130007B2 (en) | 2006-10-16 | 2012-03-06 | Formfactor, Inc. | Probe card assembly with carbon nanotube probes having a spring mechanism therein |
US8149007B2 (en) | 2007-10-13 | 2012-04-03 | Formfactor, Inc. | Carbon nanotube spring contact structures with mechanical and electrical components |
US8272124B2 (en) | 2009-04-03 | 2012-09-25 | Formfactor, Inc. | Anchoring carbon nanotube columns |
WO2011014929A1 (en) * | 2009-08-07 | 2011-02-10 | Commonwealth Scientific And Industrial Research Organisation | Deposition of metals |
US8872176B2 (en) | 2010-10-06 | 2014-10-28 | Formfactor, Inc. | Elastic encapsulated carbon nanotube based electrical contacts |
RU2475445C2 (en) * | 2010-12-20 | 2013-02-20 | Государственное образовательное учреждение высшего профессионального образования "Тамбовский государственный университет имени Г.Р. Державина" | Method for obtaining volume nanostructured material |
US20130025907A1 (en) * | 2011-07-26 | 2013-01-31 | Tyco Electronics Corporation | Carbon-based substrate conductor |
FR3078898B1 (en) * | 2018-03-16 | 2023-10-13 | Nexans | METHOD FOR MANUFACTURING A CARBON-METAL COMPOSITE MATERIAL AND ITS USE TO MANUFACTURE AN ELECTRIC CABLE |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004007798A1 (en) * | 2002-07-17 | 2004-01-22 | Atotech Deutschland Gmbh | Immersion plating of silver |
US20050148174A1 (en) * | 2002-05-06 | 2005-07-07 | Infineon Technologies Ag | Contact-connection of nanotubes |
-
2006
- 2006-09-12 WO PCT/US2006/035511 patent/WO2007033188A2/en active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050148174A1 (en) * | 2002-05-06 | 2005-07-07 | Infineon Technologies Ag | Contact-connection of nanotubes |
WO2004007798A1 (en) * | 2002-07-17 | 2004-01-22 | Atotech Deutschland Gmbh | Immersion plating of silver |
Non-Patent Citations (1)
Title |
---|
YI FENG, HAILONG YUAN: "Electroless plating of carbon nanotubes with silver", JOURNAL OF MATERIAL SCIENCE, vol. 39, 2004, pages 3241 - 3243, XP002482374 * |
Also Published As
Publication number | Publication date |
---|---|
WO2007033188A2 (en) | 2007-03-22 |
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