WO2007072613A1 - Elastomer constituent and photosensitive composition making use of the same - Google Patents

Elastomer constituent and photosensitive composition making use of the same Download PDF

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Publication number
WO2007072613A1
WO2007072613A1 PCT/JP2006/318236 JP2006318236W WO2007072613A1 WO 2007072613 A1 WO2007072613 A1 WO 2007072613A1 JP 2006318236 W JP2006318236 W JP 2006318236W WO 2007072613 A1 WO2007072613 A1 WO 2007072613A1
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Prior art keywords
polymer
block
photosensitive composition
elastomer
weight
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PCT/JP2006/318236
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French (fr)
Japanese (ja)
Inventor
Motokazu Takeuchi
Fumiaki Miura
Masatoshi Torii
Takumi Miyachi
Original Assignee
Kraton Jsr Elastomers K.K.
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Application filed by Kraton Jsr Elastomers K.K. filed Critical Kraton Jsr Elastomers K.K.
Priority to JP2007550997A priority Critical patent/JP5163872B2/en
Publication of WO2007072613A1 publication Critical patent/WO2007072613A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L51/00Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L51/006Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to block copolymers containing at least one sequence of polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L53/02Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers of vinyl-aromatic monomers and conjugated dienes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Definitions

  • the present invention relates to 1) a single elastomer composition, and 2) a photosensitive composition. More specifically, an elastomer-one composition obtained by combining two types of specific conjugated diene-based block (co) polymers, and a photopolymerizable unsaturated monomer, a photopolymerization initiator, and the elastomer-one composition.
  • the present invention relates to a photosensitive composition which is excellent in image developability, sharp printability even in small letters, and dimensional stability, and further, in the case where a hydrophilic polymer is added, in addition to water developability.
  • the photosensitive composition is used as a plate material for letterpress printing represented by flexo printing and letter press printing, and is widely used mainly for films, labels, envelopes, heavy bags, wrapping paper, corrugated cardboard and the like. It is done.
  • thermoplastic block copolymer is mainly used as one elastomer component of the photosensitive composition, and among them, a styrene-based polymer block composed mainly of styrene and a polymer block composed mainly of butadiene or isoprene.
  • Plasticizable elastomers SBS, SIS
  • Patent Document 1 Patent Document 2, Patent Document 3.
  • a styrene-based thermoplastic elastomer As a method for obtaining a photosensitive composition, a styrene-based thermoplastic elastomer, liquid polyvinyl alcohol, a photopolymerizable monomer, a photopolymerization initiator, and a hydrophilic polymer when water developable is made at 100 ° C to 200 ° C. It is common to knead
  • the control of the amount of gel includes (1) prevention of thermal deterioration during kneading, (2) management of gel amount in raw materials, etc. For (1), appropriate adjustment of kneading temperature and anti-aging agent It corresponds by optimizing the amount of antioxidants).
  • (2) is dealt with by managing the amount of gel derived from the raw material.
  • the one that most affects the amount of gel is the styrenic thermoplastic elastomer It is done.
  • Examples of using a type (SEBS, SEPS) or a partially saturated type (SBBS) of saturated double bonds of polymer block portion mainly composed of butadiene or isoprene as a measure for reducing gel amount are disclosed. Speak! (Patent Document 4).
  • the co-crosslinking property of the styrene-based thermoplastic elastomer with the photopolymerizable monomer by the photopolymerization initiator is inferior and preferable.
  • the rate of light curing which is considered to be compounded to an appropriate amount or more of the amount of an antioxidant (antioxidant) in the styrenic thermoplastic elastomer is decreased, and the material cost is further increased.
  • Patent Document 5 Japanese Patent Document 6
  • Patent Document 1 Japanese Patent Application Laid-Open No. 5-94015
  • Patent Document 2 Japanese Patent Application Laid-Open No. 2003-280186
  • Patent Document 3 Japanese Patent Application Laid-Open No. 5-134425
  • Patent Document 4 Japanese Patent Application Laid-Open No. 9-40728
  • Patent Document 5 JP-A-5-134410
  • Patent Document 6 Japanese Patent Application Laid-Open No. 2000-181060
  • the present invention relates to an elastomer composition suitable for a printing plate material having a specific conjugated diene block (co) polymer as a main component, a laser processing characteristic using the elastomer composition, an image development It is an object of the present invention to provide a photosensitive composition which is excellent in water resistance, printability even in small letters, and water developability when a hydrophilic polymer is added.
  • the present invention relates to (a) a polymer block composed mainly of at least two aromatic bi-loi-blends and a polymer block copolymer composed mainly of at least one conjugated agent, And 20 to 40% of the total bonded aromatic vinyl compound content in the block copolymer, and 10 to 50% of the boule bond content in the polymer block mainly composed of a conjugated gene.
  • a block copolymer having a peak molecular weight of 70,000 to 300,000 in terms of standard polystyrene measured by gel permeation chromatography (GPC) (hereinafter also referred to as "(a) block copolymer")
  • the present invention also relates
  • one constituent of the elastomer of the present invention is
  • (I) 20 to 80% of the vinyl bond content in the copolymer block mainly composed of the conjugated diene of the block (co) polymer is preferably 30 to 80%. Also, (() Mel ⁇ ⁇ ⁇ ⁇ ⁇ (190. C, 2 1 2 N) force ⁇ ). 1 to 20 g Z 1 o minutes,
  • an antiblocking agent is contained in an amount of not more than 0.2 parts by weight with respect to 100 parts by weight of the elastomer-constituting member
  • the content of the total amount of the bonded aromatic vinyl compound in the (a) block copolymer is 20 to 35%, and gel permeation chromatography of the copolymer is also carried out.
  • the peak molecular weight in terms of standard polystyrene measured by (GPC) is 100, Forced to be between 000 and 250,000!
  • the peak molecular weight in terms of standard polystyrene measured by gel permeation chromatography (GPC) of the (i) block (co) polymer is 10,000 to 50, It is 000!
  • the blending proportions of the respective components in the photosensitive composition of the present invention are 10) to 90% by weight of the (i) elastomer composition and 1 to 50% by weight of (g) the photopolymerizable unsaturated monomer.
  • (co) liquid polybutadiene can further be contained.
  • the blending amount of (co) liquid polybutadiene is 50% by weight or less in the photosensitive composition.
  • the photosensitive composition of the present invention may further contain a (j) hydrophilic polymer.
  • the blending amount of the (h) hydrophilic polymer is 5 to 80 wt% in the photosensitive composition.
  • the elastomer composition of the present invention is suitable as an elastomer component of a printing plate material for relief printing represented by flexo printing and letter press printing.
  • the photosensitive composition of the present invention is hydrophilic if the elastomer composition of the present invention, the photopolymerizable unsaturated monomer, the photopolymerization initiator and, if necessary, liquid polybutadiene and water developability are required. It is a composition with water soluble polymer, has good laser processability, image developability, sharp printability even for small letters, excellent water developability when hydrophilic polymer is added, and photosensitivity for flexo plate Photosensitive combination usable for resin, photosensitive resin for letterpress etc It is a product.
  • the elastomer composition used in the present invention comprises (a) a polymer block mainly composed of at least two aromatic vinyl compound and a polymer block mainly composed of at least one conjugated agent.
  • Block copolymer and (i) a polymer block mainly composed of one or more conjugated dienes, and a block which may contain the block and one or more aromatic bi-lodine compound polymer blocks
  • the (co) polymer is a main component.
  • aromatic vinyl ethylene compound used to obtain the (a) to (i) components styrene, t-butynostyrene, a-methinolestyrene, p-methinolestyrene, dibibi And 1, 1-diphenylenostyrene, N, N dimethi nol p amino ethynole styrene, N, N jetyl p-aminoethyl styrene, buryl pyridine, etc., and particularly styrene, a-methyl styrene And p-methylstyrene is preferred.
  • the content of the aromatic boule compound of the (a) block copolymer is 20% by weight to 40% by weight, preferably 20% by weight to 35% by weight. If the content is less than 20% by weight, the photosensitive composition of the present invention has low plate strength after exposure to a flexographic printing plate or a letterpress printing plate, and defects in the plate material during the washing-out step or excessive Sharp printing can not be performed when printing pressure is strong. On the other hand, if it exceeds 40% by weight, the flexibility of the printing material is poor, which is not preferable because it causes blur and printing unevenness.
  • the content of the aromatic vinyl compound of the (i) block (co) polymer is 0 wt% to 25 wt%, preferably 0 wt% to 20 wt%. If this content exceeds 25% by weight, the flexibility of the printing material is poor, which is not preferable because it causes blurring and printing unevenness. Also, the boule bond content in the (a) block copolymer is 10% to 50%, preferably 10% to 30%. If this content is less than 10%, industrial production is difficult. On the other hand, if it exceeds 50%, in the photosensitive composition of the present invention, after exposure, the plate strength is low when it is used as a flexographic printing plate or letterpress printing plate; You can not make a sharp mark j if you use it.
  • the boule bond content of the (i) block (co) polymer is 10% to 80%, preferably 20%.
  • the vinyl bond content of (i) block (co) polymer is Is more preferably 30 to 80%.
  • the peak molecular weight in the (a) block copolymer is 70,000 to 300,000, preferably 100,000 to 250,000 in terms of standard polystyrene measured by gel permeation chromatography (GPC). It is. Less than 70,000, photosensitive photosensitive yarn composition of the present invention ⁇ After exposure to light, the plate strength of the flexographic printing plate and the letterpress printing plate is too low. Sharp printing can not be performed when defects or excessive printing pressure is applied. On the other hand, if it exceeds 300,000, the miscibility with the photopolymerizable unsaturated monomer used in the photosensitive composition of the present invention is poor, which is preferable.
  • peak molecular weight refers to the molecular weight of the peak tip (peak of peak), and the same applies to the following.
  • the peak molecular weight of the block (co) polymer is 5,000 or more and less than 70,000 in terms of standard polystyrene measured by gel permeation chromatography (GPC), and A) The peak molecular weight in the block copolymer is less than 1Z3, preferably less than 1Z5.
  • B If the molecular weight of the component is less than 5,000, it is unrealistic in terms of economics. Further, when the molecular weight of the (i) component is 70,000 or more, or 1Z3 or more of the peak molecular weight of the (a) component, the flexibility is inferior or the processability at the time of producing the photosensitive composition is inferior.
  • the peak molecular weight in the block (co) polymer is preferably 10,000 to 50,000, more preferably in terms of standard polystyrene measured by gel permeation chromatography (GPC). ⁇ Is 10,000-40,000. If it is less than 10,000, the photosensitive composition of the present invention In addition, after exposure, the plate strength is low when it is used as a flexographic printing plate or a letterpress printing plate, and sharp defects can not be obtained if defects in the plate material or excessive printing pressure occurs during the washing process. Absent. On the other hand, when it exceeds 50,000, it is inferior to the processability at the time of producing a photosensitive composition.
  • (A) When the block copolymer content is less than 60% by weight, in the photosensitive composition of the present invention, after exposure, the plate strength is low when forming a flexographic printing plate or a letterpress printing plate. Sharp printing can not be performed when material defects or excessive printing pressure is strong. On the other hand, if it exceeds 95% by weight, the processability at the time of producing a photosensitive composition is inferior.
  • the polymer block mainly composed of the conjugated diene in (a) block copolymer and (ii) block (co) polymer may contain an aromatic vinyl compound. .
  • the structure may be random or incremental taper blocks.
  • a random and taper analysis method a method by GPC of decomposition products obtained by ozone cleaving all double bonds of butadiene units by Tanaka et al. (“Rubber Chemical Technology”, No. 59, p. 16, 1986) And the acid decomposition method using osmium tetraoxide and t-butyl hydroxide peroxide (“Journalist's polymer” science, 1st page, page 429, 1946).
  • a polymer block mainly composed of an aromatic vinyl compound and a polymer block mainly composed of a conjugated gene are adjusted by containing a bonded aromatic vinyl compound in a polymer block mainly composed of a conjugated gene
  • the amount of the conjugated aromatic vinyl compound in the polymer block mainly composed of the conjugated diene is 30% by weight or less, and when it exceeds 30% by weight, the molecular weight of the polymer block mainly composed of the aromatic vinyl compound is small
  • the photosensitive composition is used as a photosensitive composition, the plate strength of the flexographic printing plate and the letterpress printing plate after exposure is too low. It is not preferable because sharp printing can not be performed.
  • the structure containing the aromatic vinyl compound may be a random structure or a tapered block in which the aromatic vinyl compound gradually increases.
  • the melt flow rate (190 ° C, 21.2 N) of one elastomer component of the present invention is preferred. Or 0.5 to 20 g Z10, more preferably 0.5 to 8 g Z10.
  • the amount is less than 1 lgZlO, the photosensitive composition has poor image compatibility with the photopolymerizable unsaturated monomer and the photopolymerization initiator, and when the water developability is required, the compatibility with the hydrophilic polymer is poor. And unfavorably cause deterioration of plate strength. On the other hand, if it exceeds 20 gZlO, the plate strength is low and it is not preferable.
  • the melt flow rate can be adjusted, for example, by the amount of the polymerization initiator.
  • the (f) toluene insoluble content of one elastomer component is preferably 20 ppm or less, more preferably 15 ppm or less, particularly preferably 10 ppm or less.
  • the toluene insoluble content exceeds 20 ppm, in the photosensitive composition of the present invention, it is not preferable because it causes defects of the printing plate during the washing step and sharpness of small characters during printing.
  • the toluene insoluble content is a value measured by the method described later. The toluene insolubles can be easily adjusted by mild or rapid conditions for dissolution.
  • the hardness measurement method according to JIS K6253 (A) of the elastomer single body preferably has a hardness of 30 to 70, and more preferably 35 to 70. If it exceeds 70, it is not preferable because it has poor flexibility and causes blurring and printing unevenness. On the other hand, if it is less than 30, the plate strength is low when it is made a flexo printing plate or a letterpress printing plate after exposure, and sharp printing can not be performed if defects in the printing plate or excessive printing pressure occurs during the washing step. .
  • the hardness can be easily adjusted by the total bonding content of the aromatic vinyl compound.
  • block copolymer and (i) block (co) polymer used for one elastomer component of the present invention, and further, one elastomer component of the present invention containing these as a main component It may be in the form of pellet, porous pellet or crumb.
  • (a) block copolymer, and (ii) block (co) polymer are dissolved in a hydrocarbon solvent using an organic lithium compound as an initiator and then added to the solution. It is preferable to obtain the respective polymer solutions obtained by legally mixing them separately, mixing and homogenizing the obtained respective polymer solutions and then removing them by dissolving.
  • the above (i) block (co) polymer solution may be further mixed with solution, homogenized, and then dissolved. it can.
  • the (i) component can be finished separately using a special manufacturing method, but (a) In production facilities generally used for block copolymers etc., substantial production can not be achieved due to problems of stickiness and drying defects. In addition, even special equipment is not suitable for mass production, and it can not be denied that it is cost-wise disadvantageous. Therefore, mixing with the component (a) may be followed by homogenization followed by dissolution and drying. It is preferable practically.
  • the (i) block (co) polymer may be polymerized simultaneously with the polymerization of the (a) block copolymer described above to produce an elastomer single-piece construction of the present invention.
  • an aromatic vinyl compound and a polymerization initiator (initiator 1) are brought into contact and reacted, and then a conjugated gene is added, After the reaction is completed, a polymerization initiator (initiator-2) is added, and a conjugated diene is added again, and (a) block (co) polymer is continued while (b) block copolymer production is continued.
  • an aromatic vinyl compound may be reacted to simultaneously produce (a) a block copolymer and (b) a block (co) polymer to make a single elastomer.
  • the addition of the second stage initiator is preferably after the completion of the polymerization of the first stage conjugated gen, but the amount of the conjugated gen addition of the first stage is adjusted. However, it may be added in the middle of the polymerization, and the addition of the second stage coagent may be omitted.
  • the addition amounts of the first and second stage initiators, and the addition amounts of the first stage aromatic vinyl copolymer and the conjugated diene can be carried out by adjusting the amount of addition of conjugated ben and aromatic burle compound in the second stage.
  • Specific examples of the method for producing the (a) block copolymer or (i) block (co) polymer used in the present invention include, for example, organic lithium compounds and the like in an inert hydrocarbon solvent. It can be produced by sequentially polymerizing an aromatic vinyl compound and a conjugated gene, which is used as a polymerization initiator.
  • it can be produced by first polymerizing an aromatic vinyl compound and then polymerizing a conjugated diene, then reacting a coupling agent or again reacting an aromatic vinyl compound.
  • a desired amount of an aromatic bi-Louisium compound may be added and copolymerized, if necessary.
  • the production method does not use a coupling agent.
  • a coupling agent is used, the transparency of the coupling agent is deteriorated due to the residue of the coupling agent, which affects the developability.
  • hydrocarbons such as pentane, n-hexane, heptane, octane, methylcyclopentane, cyclohexane, benzene, xylene and the like can be used.
  • Xane is preferred.
  • organic alkali metal compound which is a polymerization initiator
  • an organic lithium compound is preferable.
  • organic monolithium, organic dilithium and organic lithium compound are used.
  • a Lewis base such as ether, amine and the like, specifically jetyl ether, tetrahydrofuran, propyl ether, butyl ether, Higher ether, ethylene glycolomethylethione ethylene glycol, ethylene glycolo regethinole tenolee, ethylene glycolo regethinole tenolee, ethylene glycolo resin dibutyle nore tenolee, propylene glycol dimethyl ether, propylene glycol dimethyl ether, diethylene glycol dimethyl ether, diethyleneglycolo dibutyl ether nore tenolee Ether derivatives of polyethylene glycol such as ethylene glycono rebutinore tenore ethylene glycono resibut no ester, tetramethyl as amine Ji Renjiamin, pyridine, tertiary
  • the polymerization reaction is usually carried out at 20 to 120 ° C, preferably 30 to 100 ° C. Also, even if polymerization is carried out under control at a constant temperature, it may be carried out under elevated temperature without heat removal.
  • a bifunctional coupling agent is preferably used as a coupling agent which may be used for the production of (a) block copolymer and (i) block (co) polymer.
  • the bonding content of the aromatic vinyl compound of the (a) to (i) components is controlled by the supply amount of the monomer at the time of polymerization in each stage, and it is controlled as needed.
  • the binding content is adjusted by varying the components of the microregulator.
  • the structure of a conjugated vinyl-based polymer block of an aromatic vinyl complex, Z conjugated is also controlled by the above-mentioned microregulator.
  • the structural control of the aromatic vinyl compound Z-conjugated agent is to control the bonding state of the random, tapered or block structure of the aromatic vinyl compound bonded to the conjugated agent.
  • weight average molecular weight and melt flow rate of the (a) to (i) components are adjusted by the addition amount of a polymerization initiator, for example, sec-butyllithium.
  • an elastomer composition having (a) a block copolymer and (b) a block (co) polymer as main components can be obtained by the following method after polymerization according to the above method. .
  • the polymer solution is poured into hot water with stirring, the solvent is distilled off, the water-containing polymer is dewatered with a screw-type squeezer, acetone or alcohol is coated and precipitated, and the method is dried with a band dryer. And direct solvent removal using an extruder.
  • the method is charged into hot water with stirring, the solvent is distilled off, and the water-containing polymer is dewatered with a screw-type squeezer.
  • the dewatered one elastomer composition of the present invention may block by its own weight.
  • the antiblocking agent may be added in an amount of 0.2 parts by weight or less in terms of 100 parts by weight of one elastomer. When it exceeds 0.2 parts by weight, the image developability of the photosensitive composition of the present invention and the clear printability of even small characters are inferior.
  • Preferred antiblocking agents are inorganic substances such as silica, talc and calcium stearate, and metal soaps.
  • the blocking inhibitor preferably has an average particle size of 30 m or less, and more preferably 1 to 20 ⁇ m, as measured by Coulter Counter 1 method.
  • the photosensitive composition of the present invention is a photosensitive composition obtained by blending the above-mentioned (k) one elastomer component with (g) a photopolymerizable unsaturated monomer and (k) a photopolymerization initiator. It is a composition.
  • the (i) elastomer composition when the blending amount is too small, the (i) elastomer composition is inferior in flexibility and lacks sharpness in small characters. On the other hand, if it is too large, the image developability is poor. Accordingly, the (i) one component of the elastomer is preferably 10 to 90% by weight, more preferably 50 to 90% by weight, based on the total amount of the photosensitive composition.
  • the photopolymerizable unsaturated monomer (g) used in the photosensitive composition is an unsaturated compound having a photopolymerizable ethylenic double bond, and a general photosensitive elastomer composition. As long as it can be used for products and photosensitive resin compositions, it can be used without particular limitation.
  • ethylene glycol mono (meth) atalylate diethylene glycol mono (meth) atalylate, propylene glycol mono (meth) atalylate, polyethylene glycol mono (meth) atalylate, polypropylene glycol mono (meth) atarilate , Polyethylene glycol monomethoxy monoazatalylate, N-methylol acrylamide, N-ethyrol acrylamide, N-propyrrole acrylamide, N-methylol (meth) acrylamide, N-ethylol (meth) acrylamide, N-propyrrole methacrylamide, Diacetone acrylamide, hydroxypropyl atalylate, triacryl formal, diacrylamide dimethylene ether, methylene bis acrylamide, ethylene glycol di (Meth) atalylate, diethylene glycol di (meth) atalylate, triethylene glycol di (meth) atalylate, tetraethylene glycol di (meth) atalylate, t
  • photopolymerizable unsaturated monomers may be used alone or in combination of two or more.
  • the amount of the photopolymerizable unsaturated monomer is preferably 1 to 50% by weight, more preferably 1 to 20% by weight, based on the total amount of the photosensitive composition.
  • the photopolymerization initiator (f) used for the photosensitive composition is particularly limited as long as it can be used for general photosensitive elastomer compositions and photosensitive resin compositions. It can be used without any problems.
  • benzophenones, benzoins, acetifephenones, a-diketones, acyloines, acyloin ethers, benzyl alkyl ketals, polynuclear quinones, thioxanthones, glycyl phosphines, etc. are specifically mentioned.
  • Benzophenone Chlorbenzophenone, Acetophenone, Benzyl, Diacetyl, Benzoin, Viva in, Benzoin methyl ether, Benzoin ethyl ether, Benzoin isopropyl ether, Benzoin butyl ether, Hydroquinone monomethyl ether, Benzyl dimethyl ketal, benziljetil ketal , Benzyl diisopropyl Examples include luketal, anthraquinone, 2-acetylanthraquinone, 1,4-naphthoquinone, methylnaphthoquinone, 2-chloroanthraquinone, thioxanthone, 2-chlorothioxanthone, and acyl phosphine oxide.
  • photopolymerization initiators may be used alone or in combination of two or more.
  • the blending amount of the photopolymerization initiator is preferably 0.1 to 10% by weight, more preferably 0.1 to 5% by weight, based on the total amount of the photosensitive composition.
  • a (co) liquid polybutadiene can be further blended into the photosensitive composition of the present invention.
  • the liquid polybutadiene is a liquid polybutadiene at a normal temperature (23 ° C.) having a weight average molecular weight in terms of polystyrene of about 100 to 20,000, preferably about 500 to 10,000.
  • the blending amount of (co) liquid polybutadiene used in the photosensitive composition is preferably 0 to 50% by weight, more preferably 5 to 40% by weight, based on the total amount of the photosensitive composition. If more than 50 by weight 0/0, sharp when after exposure, flexographic printing plate, defects and excessive printing pressure plate strength is Teigu washout process when plate material when the letterpress printing plate did not force Unable to print.
  • the photosensitive composition of the present invention can be made water-developable by incorporating a (j) hydrophilic polymer.
  • the hydrophilic polymer used in the photosensitive composition requiring water developability is water or a developer containing an aqueous alkaline solution, an aqueous acidic solution, an organic solvent, or a surfactant containing water or water as a main component. It means a polymer that is soluble or swelled (dispersed), COOM group [carboxylic acid (metal) base], SO M group [sulfonic acid (metal)
  • M represents a hydrogen atom, periodic table group I, ⁇ , a group III element, an amine, an ammonium
  • It is a polymer having a hydrophilic group such as NH 2 or -OH and having no crosslinking. .
  • hydrophilic polymers examples include polyvinyl alcohol (PVA), carboxyme
  • PVA polyvinyl alcohol
  • carboxyme In addition to general-purpose resins such as chill cellulose, gen-based rubbers obtained by copolymerizing (meth) acrylic acid and a mixture of jenny, liquid polybutadiene modified with maleic anhydride, and COOM group (MOM as an especially effective skeleton) the I, [pi, III group element is a hydrogen atom, the periodic table, Amin, ⁇ Nmo - ⁇ shows the beam) to 50 to 50, 000 is equivalent ZL0 6 g with polymer, the periodic table I, as a II group element And alkali metals such as sodium, potassium and lithium, alkaline earth metals such as calcium and magnesium, boron and aluminum.
  • hydrophilic polymer examples include COOM group-containing polyurethane, -COOM group-containing polyester, COOM group-containing epoxy compound, COOM group-containing polyamic acid, -COOM group-containing acrylonitrile-butadiene copolymer, -COOM group Containing styrene-butadiene polymer, COOM group-containing polybutadiene, polybutyl alcohol (PVA), polyacrylamide, sodium polyacrylate, carboxymethylcellulose (CMC), hydroxyl cellulose (MRC), methylcellulose (MC), polyethylene glycol
  • hydroxide, polyethyleneimine, and the compound derivative may be used, but not limited thereto.
  • the compound used to neutralize at least a part of the carboxyl group contained in the above-mentioned hydrophilic polymer includes hydroxides of alkali metals such as sodium hydroxide, carbonates and the like.
  • Alkali metal carbonates such as lithium, potassium carbonate and sodium carbonate
  • hydroxides of alkali metals such as potassium tetrabutoxide and sodium methoxide
  • hydroxides of polyvalent metals such as calcium hydroxide, magnesium hydroxide and aluminum hydroxide
  • Polyvalent metal alkoxides such as aluminum isopropoxide, tertiary amine such as tolylamine, tri-n-propylamine, secondary amine such as jetlyamine, di-n-propylamine, n-propylamine, etc.
  • Primary amines, cyclic amines such as morpholine, N, N Examples include amino group-containing (meth) atalylate such as noethyl (meth) atalylate, N, N dimethylaminoethyl (meth) atalylate, ammonium salts such as ammonium carbonate and the like. These may be used alone or in combination of two or more.
  • the above-mentioned hydrophilic polymer may have a polyoxyalkylene chain as a hydrophilic portion in addition to the COOM group, and may have an ethylenically unsaturated group so as to act as a crosslinking agent. May be
  • a polymer having a hydrophilic group such as a hydroxyl group, an amine group or a sulfonic acid group and z or a polyoxyalkylene chain may be used in combination. .
  • the amount of the (h) hydrophilic polymer in the photosensitive composition of the present invention is preferably 5 to 80% by weight in consideration of water-based developability and water-resistant ink resistance when water developability is required. More preferably, it is 7 to 40% by weight. If the amount is less than 5% by weight, the water developability is inferior. If the amount is more than 80% by weight, the flexibility is inferior to cause blur and printing unevenness, which is not preferable.
  • the photosensitive composition of the present invention may optionally contain various auxiliary additives such as plasticizers, fillers such as calcium carbonate, other thermoplastic polymers, Antioxidants, pigments, crosslinkers, flame retardants, UV absorbers, antihalation agents, light stabilizers and the like can be added.
  • auxiliary additives such as plasticizers, fillers such as calcium carbonate, other thermoplastic polymers, Antioxidants, pigments, crosslinkers, flame retardants, UV absorbers, antihalation agents, light stabilizers and the like can be added.
  • the compounding amount of these auxiliary additive components is 5% by weight or less in the photosensitive composition of the present invention.
  • plasticizers hydrocarbon oils such as naphthenic oil and paraffin oil, liquid polystyrene, modified products of liquid polybutadiene, liquid acrylonitrile / butadiene copolymer, liquid styrene / butadiene copolymer, number average molecular weight 2 And polystyrenes, sebacates, phthalates and so on.
  • hydrocarbon oils such as naphthenic oil and paraffin oil, liquid polystyrene, modified products of liquid polybutadiene, liquid acrylonitrile / butadiene copolymer, liquid styrene / butadiene copolymer, number average molecular weight 2 And polystyrenes, sebacates, phthalates and so on.
  • thermoplastic polymers other styrene-butadiene-styrene block copolymers, styrene-isoprene-styrene-block copolymer, other thermoplastic elastomers, liquid rubber, thermoplastic resin,
  • other polymers such as styrene-butadiene rubber latex, ethylene-acetate-cobalt copolymer, ethylene-ethyl acetate copolymer, atactic polypropylene, syndiotactic 1,2-polybutadiene, ethylene propylene rubber and the like can be mentioned.
  • the components (a) to (i) of the present invention and the other thermoplastic polymer are kneaded at an arbitrary ratio, pelletized and / or powdered. It can also be used.
  • the antioxidant contains phenol. It is preferable that at least one selected from the group consisting of phosphorus compounds, phenol compounds and ratatone compounds, which does not generate any phenol after hydrolysis, is also selected. Examples of this phosphorus compound and Z or phenol compound include 2,6 di-t-butyl taresol, 4,6 bis (octylthiomethyl) -o-cresol, 1,3,5-tri-methyl-2,4,6 tris.
  • the above-mentioned antioxidizing agent used for the photosensitive composition is preferably 0.2 to 4.0% by weight, more preferably 0.3 to 3.0% by weight, in the photosensitive composition. If the amount is less than 0.2% by weight, the amount of gel increases, which is not preferable for the sharpness of small characters. On the other hand, when it exceeds 4.0% by weight, the light curing speed is unfavorably lowered.
  • the phosphorus compound and the ratatone compound for example, an ionic compound may be added together.
  • stabilizers such as light stabilizers may be added.
  • light stabilizers benzotriazole-based, benzophenone-based, etc., may be used.
  • the raw material to be compounded is a suitable solvent such as esters such as butyl acetate and 3-methoxybutyl acetate, petroleum fractions, hydrocarbons such as decalin and toluene, ketones such as methyl ethyl ketone and methyl isobutyl ketone , Ethers such as tetrahydrofuran, chlorforms such as chloroform, carbon tetrachloride, 1, 1, 1-trichloroethane, tetrachlorethylene, trichlorethylene, etc. and alcohols such as propanol, butanol, pentanol etc.
  • esters such as butyl acetate and 3-methoxybutyl acetate
  • petroleum fractions such as decalin and toluene
  • ketones such as methyl ethyl ketone and methyl isobutyl ketone
  • Ethers such as tetrahydrofuran
  • chlorforms such as chloro
  • the layer with higher thickness accuracy can be obtained. Is obtained.
  • the photosensitive composition is mixed using an extruder, a mixer, a Bantry mixer or the like, it is possible to form a desired thickness by hot press molding, calendering or extrusion.
  • the support and the flexible film layer can be adhered to the photosensitive layer by roll lamination after sheet formation. After lamination, heat pressing can be performed to obtain a photosensitive layer with high accuracy.
  • a support such as a polyester may be provided on the opposite side of the relief in order to maintain the accuracy as a printing plate.
  • the photosensitive composition of the present invention may be tacky depending on its composition, so in order to improve the contact with the transparent picture simple substance (negative film) to be superimposed thereon, the reuse of the image simple substance is required.
  • a flexible film layer may be provided on the surface.
  • a low pressure mercury lamp, a high pressure mercury lamp, an ultraviolet fluorescent lamp, a carbon arc lamp, a xenon lamp, a zirconium lamp, sunlight, etc. is there.
  • the photosensitive composition of the present invention can also be processed by a laser.
  • a carbon dioxide gas laser can mainly be used as a laser oscillation device.
  • the dose of the actinic radiation source is usually in the range of 10 to 3 , OOO mj Z cm 2 .
  • the photosensitive composition of the present invention is irradiated with an actinic ray through a transparent image carrier to form an image
  • a developer used to elute the unexposed area dissolves the unexposed area well. It is preferable that the image area which has been dispersed and exposed is hardly affected.
  • chlorine such as 1, 1, 1-trichloroethane, tetrachlorethylene, etc.
  • examples include organic solvents, esters such as butyl acetate and 3-methyloxy acetate, petroleum fractions, hydrocarbons such as toluene, and mixtures thereof with alcohols such as propanol and butanol added thereto as an example.
  • esters such as butyl acetate and 3-methyloxy acetate
  • petroleum fractions such as toluene
  • hydrocarbons such as toluene
  • alcohols such as propanol and butanol added thereto as an example.
  • the water system is water such as tap water, well water, industrial water and the like, and may or may not contain a surfactant.
  • Elution of the unexposed area is carried out by spraying with a nozzle force or by brushing with a brush.
  • the content of bound styrene was calculated by the absorption intensity force calibration curve method at a wavelength of 699 cm 1 using an infrared spectrometer (Fourier transform type infrared spectrometer made by Perkin Elmer One ).
  • the boule bond content in butadiene was calculated by the Morello method.
  • the line width corresponding to the negative of the printed image is distorted to the shape of a convex thin line of 0.1 mm width, and reproduced in the same width as the fat-free negative.
  • ⁇ ⁇ the shape of the convex thin line of 0.2 mm width is distorted, the case of reproducing with the same width as the negative without fat power is ⁇ , and the case of being reproduced substantially in the width of 0.2 mm.
  • X was not reproduced.
  • a weight of 720 g was placed on a sheet of 3 ⁇ 3 cm in size, and the reduction (%) of plate thickness after 7 days at 40 ° C. was measured.
  • the plate thickness reduction rate (%) is 5% or less, it is ⁇ , and when it is more than 5%, it is X.
  • the sheet produced in (9) was subjected to laser processing, and the flame generation during processing, the stickiness of the processed surface, and the odor were evaluated. "O” means good or none, “X” means bad or big.
  • the mixed solution was steam-stripped and the solvent was removed to obtain a water-containing crumb. Subsequently, the resultant was dewatered and dried by a heat roll, and pelletized by a 50 mm extruder, to obtain an elastomer (1).
  • Table 1 shows the analysis values and physical property values.
  • the obtained photosensitive composition was placed in a 3 mm-thick sheet mold, sandwiched between upper and lower 0.1 mm polyester films, heated at 130 ° C. with a press, and cooled to form a 3 mm-thick sheet. After molding, one of the polyester films is peeled off, and an exposure amount of 90 0 WZ cm 2 is achieved so that the thickness of the cured layer is about 1.5 mm using an ultraviolet exposure machine (manufactured by Nippon Denshi Seiki Co., Ltd., JE-A4-SS type). Exposed for 2 minutes.
  • an ultraviolet exposure machine manufactured by Nippon Denshi Seiki Co., Ltd., JE-A4-SS type
  • the polyester film on the side not exposed was peeled off, the negative film for evaluation of reproducibility was brought into close contact with the surface, and this side was exposed for 15 minutes with the same exposure amount by the above-mentioned exposure machine.
  • the results are shown in Table 3.
  • a photosensitive composition was prepared in the same manner as in Example 7, except that Example 13 used an elastomer (No. 2) and Example 14 used an elastomer (No. 1). The results are shown in Table 5
  • polyvinyl alcohol Z polyethylene glycol copolymer manufactured by Heckiston Earth, GE597 was used as a hydrophilic polymer. The results are shown in Table 5.
  • the photosensitive composition of the present invention is also excellent in water developability.
  • the components (a) to (i) are prepared by changing the amounts of styrene, 1,3 butadiene, sec butyl lithium and ethylene glycol jetyl ether, and (a) component and (i) component Using the same method as in Example 1 except that the blending ratio was varied, a single elastomer (Hi) was obtained. The results are shown in Table 6.
  • An elastomer-one composition (heat 2) shown in Table 7 was obtained in the same manner as in Comparative Example 1 except that the amount of the antiblocking agent added was changed.
  • the amounts of styrene, 1,3-butadiene and sec butyl lithium are changed to prepare the components (a) to (i), a single elastomer is produced. I got (He 3). The results are shown in Table 6.
  • Examples 1 to 6 which are one elastomer component including the (a) block copolymer and the (i) block (co) polymer of the present invention, are within the scope of the present invention. Yes, the fluidity is excellent, and the hardness that the gel content (toluene insoluble content) is low is 70 or less. Also, from Tables 3 to 5, Examples 7 to 15 which are photosensitive compositions using one of these elastomer constructions have image developability, clear printability even with small characters, dimensional stability, laser processing It can be seen that the water resistance and water developability are good.
  • Comparative Example 1 the blend ratio of (a) block copolymer and (i) block (co) polymer is outside the scope of the present invention.
  • the photosensitive composition of Comparative Example 4 using this elastomer-one composition is inferior in clear printability in small letters and dimensional stability.
  • Comparative Example 2 since the blend ratio of (a) block copolymer and (i) block (co) polymer is out of the range of the present invention, and the amount of the antiblocking agent is large, The photosensitive composition of Comparative Example 5 used is inferior in image developability as well as sharp printability with small letters, dimensional stability.
  • Comparative Example 3 the content of the aromatic compound in the (a) block copolymer is out of the range of the present invention, and additionally, the hardness of one constituent unit of the elastomer is too high.
  • the photosensitive composition of No. 6 is inferior in sharp printability in small letters and dimensional stability.
  • the elastomer composition comprising the (a) block copolymer and the (i) block (co) polymer of the present invention is suitable for use in letterpress printing plate materials since the amount of gel is small.
  • the photosensitive composition of the present invention is excellent in image developability, clear printability even in small characters, dimensional stability, laser processability, and when a hydrophilic polymer is blended, it is further improved in water developability. Because of its superiority, it is used as a plate material for letterpress printing represented by flexo printing and letter press printing, and is widely used mainly for films, labels, envelopes, heavy bags, wrapping paper, corrugated cardboard and the like.

Abstract

An elastomer constituent that is suitable for use in a printing plate material; and a photosensitive composition making use of the elastomer constituent that excels in laser workability performance, image developability, clear printing even with respect to small letters and, with a hydrophilic polymer added thereto, water developability. There is provided an elastomer constituent comprised mainly of a block (co)polymer containing as indispensable components a polymer block composed mainly of at least two aromatic vinyl compounds, a copolymer block of specified structure consisting of a polymer block composed mainly of at least one conjugated diene and a polymer block composed mainly of one or more conjugated dienes wherein one or more aromatic vinyl compound polymer blocks may be contained. Further, there is provided a photosensitive composition comprising the above elastomer constituent, a photopolymerizable unsaturated monomer and a photopolymerization initiator.

Description

明 細 書  Specification
エラストマ一構成体およびそれを用いた感光性組成物  Elastomer-one composition and photosensitive composition using the same
技術分野  Technical field
[0001] 本発明は、 1)エラストマ一構成体、 2)感光性組成物に関する。さらに詳しくは、特 定の共役ジェン系ブロック(共)重合体を 2種類組み合わせて配合してなるエラストマ 一構成体、ならびにこのエラストマ一構成体に光重合性不飽和単量体、光重合開始 剤を加えることにより、画像現像性、小さな文字でも鮮明な印刷性、寸法安定性に優 れ、さらに親水性ポリマーを添加した場合には水現像性に優れた感光性組成物に関 する。  [0001] The present invention relates to 1) a single elastomer composition, and 2) a photosensitive composition. More specifically, an elastomer-one composition obtained by combining two types of specific conjugated diene-based block (co) polymers, and a photopolymerizable unsaturated monomer, a photopolymerization initiator, and the elastomer-one composition. The present invention relates to a photosensitive composition which is excellent in image developability, sharp printability even in small letters, and dimensional stability, and further, in the case where a hydrophilic polymer is added, in addition to water developability.
背景技術  Background art
[0002] 感光性組成物は、フレキソ印刷やレタープレス印刷に代表される凸版印刷用の版 材に使用され、主に、フィルム、ラベル、封筒、重袋、包装紙類、段ボールなどに広く 用いられている。  [0002] The photosensitive composition is used as a plate material for letterpress printing represented by flexo printing and letter press printing, and is widely used mainly for films, labels, envelopes, heavy bags, wrapping paper, corrugated cardboard and the like. It is done.
感光性組成物のエラストマ一成分として、主に熱可塑性ブロック共重合体が使用さ れ、その中でもスチレンを主体とする重合体ブロックと、ブタジエンまたはイソプレンを 主体とする重合体ブロック力 なるスチレン系熱可塑性エラストマ一(SBS、 SIS)が 特に良く開示されている (特許文献 1、特許文献 2、特許文献 3)。  A thermoplastic block copolymer is mainly used as one elastomer component of the photosensitive composition, and among them, a styrene-based polymer block composed mainly of styrene and a polymer block composed mainly of butadiene or isoprene. Plasticizable elastomers (SBS, SIS) are disclosed particularly well (Patent Document 1, Patent Document 2, Patent Document 3).
感光性組成物を得る方法として、スチレン系熱可塑性エラストマ一、液状ポリブタジ ェン、光重合性モノマー、光重合開始剤および水現像可能とする場合は親水性重合 体とを 100°C〜200°Cの混合機で混練するのが一般的である。その際、画像再現性 に優れ、小さな文字でも鮮明な印刷性を有するための一つの要因として、感光性組 成物のゲル量を抑制しかつ低硬度と高強度を有することが挙げられる。  As a method for obtaining a photosensitive composition, a styrene-based thermoplastic elastomer, liquid polyvinyl alcohol, a photopolymerizable monomer, a photopolymerization initiator, and a hydrophilic polymer when water developable is made at 100 ° C to 200 ° C. It is common to knead | mix with a C mixer. At that time, one of the factors for having excellent image reproducibility and having clear printability even for small characters is to suppress the gel amount of the photosensitive composition and to have low hardness and high strength.
[0003] ゲル量の抑制としては、(1)混練時の熱劣化防止、(2)原材料中のゲル量管理な どがあり、 (1)については混練り温度の適正化や老化防止剤 (酸化防止剤)量の適正 化で対応している。 [0003] The control of the amount of gel includes (1) prevention of thermal deterioration during kneading, (2) management of gel amount in raw materials, etc. For (1), appropriate adjustment of kneading temperature and anti-aging agent It corresponds by optimizing the amount of antioxidants).
また、(2)については、原料由来のゲル量を管理することで対応している。 原材料のうち、最もゲル量に影響するのは、スチレン系熱可塑性エラストマ一といわ れている。ゲル量削減の対策として、ブタジエンまたはイソプレンを主体とする重合体 ブロック部分の残存二重結合を飽和したタイプ(SEBS、 SEPS)や部分的に飽和し たタイプ (SBBS)を使用する例が開示されて!ヽる (特許文献 4)。 In addition, (2) is dealt with by managing the amount of gel derived from the raw material. Of the raw materials, the one that most affects the amount of gel is the styrenic thermoplastic elastomer It is done. Examples of using a type (SEBS, SEPS) or a partially saturated type (SBBS) of saturated double bonds of polymer block portion mainly composed of butadiene or isoprene as a measure for reducing gel amount are disclosed. Speak! (Patent Document 4).
飽和タイプにした場合、光重合開始剤によるスチレン系熱可塑性エラストマ一と光 重合性モノマーとの共架橋性に劣り好ましくな 、。  In the case of the saturated type, the co-crosslinking property of the styrene-based thermoplastic elastomer with the photopolymerizable monomer by the photopolymerization initiator is inferior and preferable.
また、スチレン系熱可塑性エラストマ一中の老化防止剤 (酸化防止剤)量を適正値 以上に配合することも考えられる力 光硬化速度が遅くなり、さらに材料コストの上昇 の問題もあり好ましくない。  Further, it is not preferable because the rate of light curing which is considered to be compounded to an appropriate amount or more of the amount of an antioxidant (antioxidant) in the styrenic thermoplastic elastomer is decreased, and the material cost is further increased.
低硬度化と高強度化しては、使用するエラストマ一成分であるスチレン系熱可塑性 エラストマ一の分子設計を変更することで対応しているが (特許文献 5、特許文献 6) 、低硬度化のためには液状ポリマーを多量に添加しなければならず、材料コストが大 幅にアップする問題があった。  It is possible to cope with low hardness and high strength by changing the molecular design of styrenic thermoplastic elastomer which is one component of elastomer used (Patent Document 5, Patent Document 6), but In order to achieve this, it is necessary to add a large amount of liquid polymer, and there is a problem that the material cost is greatly increased.
特許文献 1:特開平 5 - 94015号公報  Patent Document 1: Japanese Patent Application Laid-Open No. 5-94015
特許文献 2:特開 2003— 280186号公報  Patent Document 2: Japanese Patent Application Laid-Open No. 2003-280186
特許文献 3:特開平 5 - 134425号公報  Patent Document 3: Japanese Patent Application Laid-Open No. 5-134425
特許文献 4:特開平 9—40728号公報  Patent Document 4: Japanese Patent Application Laid-Open No. 9-40728
特許文献 5:特開平 5 - 134410号公報  Patent Document 5: JP-A-5-134410
特許文献 6:特開 2000— 181060号公報  Patent Document 6: Japanese Patent Application Laid-Open No. 2000-181060
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problem that invention tries to solve
[0004] 本発明は、特定の共役ジェン系ブロック(共)重合体を主成分とする印刷版材用に 適したエラストマ一構成体、このエラストマ一構成体を用いてなるレーザー加工特性 、画像現像性、小さな文字でも鮮明な印刷性、さらに親水性ポリマーを添加した場合 には水現像性に優れた感光性組成物を提供することを目的とする。 The present invention relates to an elastomer composition suitable for a printing plate material having a specific conjugated diene block (co) polymer as a main component, a laser processing characteristic using the elastomer composition, an image development It is an object of the present invention to provide a photosensitive composition which is excellent in water resistance, printability even in small letters, and water developability when a hydrophilic polymer is added.
課題を解決するための手段  Means to solve the problem
[0005] 本発明者らは、上記の性能を有する感光性組成物を開発するために、鋭意検討を 重ねた結果、ある特定の範囲の構造でゲル量が少な!/ヽ芳香族ビニル化合物と共役 ジェンとのブロック共重合体が、非常に優れた性能を示し、本目的が達成されること を見いだし、本発明を完成させるに至った。 [0005] As a result of intensive studies to develop a photosensitive composition having the above-mentioned performance, the present inventors have found that the gel amount is small in a specific range of structure! / ヽ aromatic vinyl compound Block copolymers with conjugated gen show very good performance and this purpose is achieved The present invention has been completed.
本発明は、(ァ)少なくとも 2個の芳香族ビ-ルイ匕合物を主体とする重合体ブロックと 、少なくとも 1個の共役ジェンを主体とする重合体ブロック力 なるブロック共重合体 であって、該ブロック共重合体中の全結合芳香族ビ-ルイ匕合物含量が 20〜40%で あり、共役ジェンを主体とする重合体ブロック中のビュル結合含量が 10〜50%であ り、かつゲルパーミエーシヨンクロマトグラフ(GPC)で測定した標準ポリスチレン換算 のピーク分子量が 70, 000〜300, 000であるブロック共重合体(以下「(ァ)ブロック 共重合体」とも 、う)と、(ィ) 1個以上の共役ジェンを主体とする重合体ブロックを必須 とし、これと 1個以上の芳香族ビニルイ匕合物重合体ブロックを含むことのあるブロック( 共)重合体であって、かつ該ブロック(共)重合体の全結合芳香族ビニル化合物含量 力 SO〜25%であって、共役ジェンを主体とする重合体ブロック中のビニル結合含量 力 10〜80%であり、ゲルパーミエーシヨンクロマトグラフ(GPC)で測定した標準ポリ スチレン換算のピーク分子量が 5, 000以上、 70, 000未満であって、かつ(ァ)ブロ ック共重合体のピーク分子量の 1Z3未満であるブロック(共)重合体 (以下「 (ィ)プロ ック(共)重合体」とも 、う)を、(ァ) / (ィ)(重量比) = 60〜95Z5〜40の割合で含有 するエラストマ一構成体に関する。  The present invention relates to (a) a polymer block composed mainly of at least two aromatic bi-loi-blends and a polymer block copolymer composed mainly of at least one conjugated agent, And 20 to 40% of the total bonded aromatic vinyl compound content in the block copolymer, and 10 to 50% of the boule bond content in the polymer block mainly composed of a conjugated gene. And a block copolymer having a peak molecular weight of 70,000 to 300,000 in terms of standard polystyrene measured by gel permeation chromatography (GPC) (hereinafter also referred to as "(a) block copolymer"), (B) A block (co) polymer which essentially comprises a polymer block mainly composed of one or more conjugated dienes and which may contain this and one or more aromatic vinyl copolymer polymers block, And the total bond viscosity of the block (co) polymer Aromatic vinyl compound content: SO to 25%, vinyl bond content in polymer block mainly composed of conjugated gen: 10 to 80%, standard poly determined by gel permeation chromatography (GPC) Block (co) polymers having a styrene-equivalent peak molecular weight of 5,000 or more and less than 70,000 and (a) less than 1Z3 of the peak molecular weight of the block copolymer (hereinafter referred to as “(i) pro The present invention also relates to an elastomer composition comprising (1) / (i) (weight ratio) = 60 to 95Z5 to 40).
ここで、本発明のエラストマ一構成体は、  Here, one constituent of the elastomer of the present invention is
(ィ)ブロック(共)重合体の共役ジェンを主体とする共重合ブロック中のビニル結合 含量が 20〜80%であることが好ましぐさらには 30〜80%であることが好ましい。 また、(ゥ)メル卜フローレ一卜(190。C、 21. 2N)力^). l〜20gZl〇分、  (I) 20 to 80% of the vinyl bond content in the copolymer block mainly composed of the conjugated diene of the block (co) polymer is preferably 30 to 80%. Also, (() Mel 卜 レ レ レ レ (190. C, 2 1 2 N) force ^). 1 to 20 g Z 1 o minutes,
(ェ)トルエン不溶分が 20ppm以下、および  (E) Toluene insoluble content is 20 ppm or less, and
(ォ) JIS K6253記載の硬度測定法タイプ A硬度が 30〜70であり、かつ  (E) Hardness measurement method according to JIS K6253 Type A hardness is 30 to 70, and
(力)ブロッキング防止剤が該エラストマ一構成体 100重量部に対して 0. 2重量部 以下含有されている、  (Force) an antiblocking agent is contained in an amount of not more than 0.2 parts by weight with respect to 100 parts by weight of the elastomer-constituting member,
ことが好ましい。 Is preferred.
さらに、本発明のエラストマ一構成体において、上記 (ァ)ブロック共重合体中の全 結合芳香族ビ-ルイ匕合物含量は 20〜35%で、かつ該共重合体のゲルパーミエ一 シヨンクロマトグラフ(GPC)で測定した標準ポリスチレン換算のピーク分子量は 100, 000〜250, 000であること力 子まし!/ヽ。 Furthermore, in the elastomer single composition of the present invention, the content of the total amount of the bonded aromatic vinyl compound in the (a) block copolymer is 20 to 35%, and gel permeation chromatography of the copolymer is also carried out. The peak molecular weight in terms of standard polystyrene measured by (GPC) is 100, Forced to be between 000 and 250,000!
さらに、本発明のエラストマ一構成体において、上記 (ィ)ブロック(共)重合体のゲ ルパーミエーシヨンクロマトグラフ(GPC)で測定した、標準ポリスチレン換算のピーク 分子量は、 10, 000〜50, 000であること力 子まし!/ヽ。  Furthermore, in the elastomer single composition of the present invention, the peak molecular weight in terms of standard polystyrene measured by gel permeation chromatography (GPC) of the (i) block (co) polymer is 10,000 to 50, It is 000!
次に、本発明は、  Next, the present invention
上記 (キ)エラストマ一構成体、  Said (k) Elastomer one component,
(ク)光重合性不飽和単量体、および  (G) photopolymerizable unsaturated monomers, and
(ケ)光重合開始剤、  (F) Photopolymerization initiator,
を含有することを特徴とする感光性に関する。 It relates to the photosensitivity characterized by containing.
ここで、本発明の感光性組成物中における各成分の配合割合は、(キ)エラストマ一 構成体が 10〜90重量%、(ク)光重合性不飽和単量体が 1〜50重量%、(ケ)光重 合開始剤が 0. 01〜: L0重量%〔ただし、(キ) + (ク) + (ケ) = 100重量%〕である。 また、本発明の感光性組成物において、さらに(コ)液状ポリブタジエンを含有する ことができる。  Here, the blending proportions of the respective components in the photosensitive composition of the present invention are 10) to 90% by weight of the (i) elastomer composition and 1 to 50% by weight of (g) the photopolymerizable unsaturated monomer. And (f) The photopolymerization initiator is 0.010 to L0% by weight (wherein (f) + (f) + (f) = 100% by weight). In the photosensitive composition of the present invention, (co) liquid polybutadiene can further be contained.
この場合、(コ)液状ポリブタジエンの配合量は、感光性組成物中に、 50重量%以 下である。  In this case, the blending amount of (co) liquid polybutadiene is 50% by weight or less in the photosensitive composition.
さらに、本発明の感光性組成物において、さらに(サ)親水性ポリマーを含有するこ とがでさる。  Furthermore, the photosensitive composition of the present invention may further contain a (j) hydrophilic polymer.
この場合、(サ)親水性ポリマーの配合量は、感光性組成物中に、 5〜80重量%で ある。  In this case, the blending amount of the (h) hydrophilic polymer is 5 to 80 wt% in the photosensitive composition.
発明の効果 Effect of the invention
本発明のエラストマ一構成体は、フレキソ印刷やレタープレス印刷に代表される凸 版印刷用の版材のエラストマ一成分として好適である。  The elastomer composition of the present invention is suitable as an elastomer component of a printing plate material for relief printing represented by flexo printing and letter press printing.
また、本発明の感光性組成物は、本発明のエラストマ一構成体と光重合性不飽和 単量体と光重合開始剤と必要に応じて液状ポリブタジエンおよび水現像性を必要と する場合は親水性ポリマーとの組成物であり、レーザー加工特性、画像現像性、小さ な文字でも鮮明な印刷性、親水性ポリマーを添加した場合には水現像性に優れ、ひ いては、フレキソ版用感光性榭脂、凸版用感光性榭脂などに使用可能な感光性組 成物である。 Further, the photosensitive composition of the present invention is hydrophilic if the elastomer composition of the present invention, the photopolymerizable unsaturated monomer, the photopolymerization initiator and, if necessary, liquid polybutadiene and water developability are required. It is a composition with water soluble polymer, has good laser processability, image developability, sharp printability even for small letters, excellent water developability when hydrophilic polymer is added, and photosensitivity for flexo plate Photosensitive combination usable for resin, photosensitive resin for letterpress etc It is a product.
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
[0008] 以下、本発明について詳細に説明する。  Hereinafter, the present invention will be described in detail.
まず、本発明のエラストマ一構成体について説明する。  First, an elastomer construction of the present invention will be described.
本発明に使用されるエラストマ一構成体は、(ァ)少なくとも 2個の芳香族ビニルイ匕 合物を主体とする重合体ブロックと、少なくとも 1個の共役ジェンを主体とする重合体 ブロックカゝらなるブロック共重合体と、(ィ) 1個以上の共役ジェンを主体とする重合体 ブロックを必須とし、これと 1個以上の芳香族ビ-ルイ匕合物重合体ブロックを含むこと のあるブロック(共)重合体とを主成分とする。  The elastomer composition used in the present invention comprises (a) a polymer block mainly composed of at least two aromatic vinyl compound and a polymer block mainly composed of at least one conjugated agent. Block copolymer, and (i) a polymer block mainly composed of one or more conjugated dienes, and a block which may contain the block and one or more aromatic bi-lodine compound polymer blocks The (co) polymer is a main component.
[0009] ここで、(ァ)〜 (ィ)成分を得るために用いられる芳香族ビニルイ匕合物としては、スチ レン、 t ブチノレスチレン、 a—メチノレスチレン、 p—メチノレスチレン、ジビ-ノレべンゼ ン、 1, 1—ジフエニノレスチレン、 N, N ジメチノレ一 p アミノエチノレスチレン、 N, N ジェチルー p—アミノエチルスチレン、ビュルピリジンなどが挙げられ、特にスチレ ン、 a—メチルスチレン、 p—メチルスチレンが好ましい。 Here, as the aromatic vinyl ethylene compound used to obtain the (a) to (i) components, styrene, t-butynostyrene, a-methinolestyrene, p-methinolestyrene, dibibi And 1, 1-diphenylenostyrene, N, N dimethi nol p amino ethynole styrene, N, N jetyl p-aminoethyl styrene, buryl pyridine, etc., and particularly styrene, a-methyl styrene And p-methylstyrene is preferred.
[0010] また、(ァ)〜 (ィ)成分を得るために用いられる共役ジェンとしては、 1, 3 ブタジェ ン、イソプレン、 1, 3 ペンタジェン、 2—メチル 1, 3 ペンタジェン、 1, 3 へキ サジェン、 4, 5 ジェチルー 1, 3—ォクタジェン、 3 ブチルー 1, 3—ォクタジェン 、クロ口プレンなどが挙げられるが、 1, 3 ブタジエン、イソプレン、 1, 3 ペンタジェ ンが好ましぐより好ましくは 1, 3 ブタジエン、イソプレンである。  In addition, as conjugated dienes used to obtain components (a) to (i), 1,3 butadiene, isoprene, 1,3 pentagen, 2-methyl 1,3 pentagen, 1,3 Examples of these include Sagen, 4,5 Jetyl-1, 3-Octagen, 3Butyl-1, 3-Octadiene, and Croupprene, but 1,3-butadiene, isoprene and 1, 3-pentadiene are preferred, with 1, being preferred. 3 Butadiene, isoprene.
[0011] ここで、(ァ)ブロック共重合体の芳香族ビュル化合物含量は、 20重量%〜40重量 %、好ましくは 20重量%〜35重量%である。この含量が 20重量%未満では、本発 明の感光性組成物において、露光後、フレキソ印刷版、レタープレス印刷版としたと きの版強度が低ぐ洗い出し工程時版材の欠陥や過剰の印圧が力かった場合にシャ ープな印刷ができない。一方、 40重量%を超えると、版材の柔軟性が劣りカスレや印 刷ムラの原因となり好ましくない。  Here, the content of the aromatic boule compound of the (a) block copolymer is 20% by weight to 40% by weight, preferably 20% by weight to 35% by weight. If the content is less than 20% by weight, the photosensitive composition of the present invention has low plate strength after exposure to a flexographic printing plate or a letterpress printing plate, and defects in the plate material during the washing-out step or excessive Sharp printing can not be performed when printing pressure is strong. On the other hand, if it exceeds 40% by weight, the flexibility of the printing material is poor, which is not preferable because it causes blur and printing unevenness.
[0012] また、(ィ)ブロック(共)重合体の芳香族ビニル化合物含量は、 0重量%〜25重量 %、好ましくは 0重量%〜20重量%である。この含量が 25重量%を超えると、版材の 柔軟性が劣り、カスレや印刷ムラの原因となり好ましくない。 [0013] また、(ァ)ブロック共重合体中のビュル結合含量は、 10%〜50%、好ましくは 10 %〜30%である。この含量が 10%未満では、工業生産が困難である。一方、 50% を超えると、本発明の感光性組成物において、露光後、フレキソ印刷版、レタープレ ス印版としたときの版強度が低ぐ洗い出し工程時版材の欠陥や過剰の印圧がかか つた場合にシャープな印 jができな 、。 The content of the aromatic vinyl compound of the (i) block (co) polymer is 0 wt% to 25 wt%, preferably 0 wt% to 20 wt%. If this content exceeds 25% by weight, the flexibility of the printing material is poor, which is not preferable because it causes blurring and printing unevenness. Also, the boule bond content in the (a) block copolymer is 10% to 50%, preferably 10% to 30%. If this content is less than 10%, industrial production is difficult. On the other hand, if it exceeds 50%, in the photosensitive composition of the present invention, after exposure, the plate strength is low when it is used as a flexographic printing plate or letterpress printing plate; You can not make a sharp mark j if you use it.
[0014] また、(ィ)ブロック(共)重合体のビュル結合含量は、 10%〜80%、好ましくは 20 Further, the boule bond content of the (i) block (co) polymer is 10% to 80%, preferably 20%.
%〜80%である。この含量が 10%未満または 80%を超えることは、工業生産が困難 である。なお、本発明の感光性組成物において、露光後、フレキソ印刷版、レタープ レス印刷版としたとき、シャープな印刷を行うためには、(ィ)ブロック(共)重合体のビ -ル結合含量は、さらに好ましくは 30〜80%である。 % To 80%. If this content is less than 10% or more than 80%, industrial production is difficult. In the photosensitive composition of the present invention, when it is converted to a flexographic printing plate or a letterpress printing plate after exposure, in order to obtain sharp printing, the vinyl bond content of (i) block (co) polymer is Is more preferably 30 to 80%.
[0015] さらに、(ァ)ブロック共重合体中のピーク分子量は、ゲルパーミエーシヨンクロマトグ ラフ(GPC)で測定した標準ポリスチレン換算で 70, 000〜300, 000、好ましくは 10 0,000〜250, 000である。 70, 000未満 ίま、本発明の感光'性糸且成物【こお ヽて、露 光後、フレキソ印刷版、レタープレス印刷版としたときの版強度が低ぐ洗い出し工程 時版材の欠陥や過剰の印圧が力かった場合にシャープな印刷ができない。一方、 3 00, 000を超えると、本発明の感光性組成物に使用する光重合性不飽和単量体と の混和性に劣り好ましくな 、。  Furthermore, the peak molecular weight in the (a) block copolymer is 70,000 to 300,000, preferably 100,000 to 250,000 in terms of standard polystyrene measured by gel permeation chromatography (GPC). It is. Less than 70,000, photosensitive photosensitive yarn composition of the present invention 【After exposure to light, the plate strength of the flexographic printing plate and the letterpress printing plate is too low. Sharp printing can not be performed when defects or excessive printing pressure is applied. On the other hand, if it exceeds 300,000, the miscibility with the photopolymerizable unsaturated monomer used in the photosensitive composition of the present invention is poor, which is preferable.
なお、本発明において、「ピーク分子量」とは、ピーク先端 (ピークの頂上)の分子量 を示し、以下も同様である。  In the present invention, “peak molecular weight” refers to the molecular weight of the peak tip (peak of peak), and the same applies to the following.
[0016] (ィ)ブロック(共)重合体のピーク分子量は、ゲルパーミエーシヨンクロマトグラフ(G PC)で測定した標準ポリスチレン換算で、 5, 000以上、 70, 000未満であって、かつ (ァ)ブロック共重合体中のピーク分子量の 1Z3未満、好ましくは 1Z5未満である。 ( ィ)成分の分子量が 5, 000未満では、経済性の面で現実性が低い。また、(ィ)成分 の分子量が 70, 000以上、あるいは(ァ)成分のピーク分子量の 1Z3以上では、柔 軟性に劣ったり、感光性組成物を作製する際の加工性に劣る。  (Ii) The peak molecular weight of the block (co) polymer is 5,000 or more and less than 70,000 in terms of standard polystyrene measured by gel permeation chromatography (GPC), and A) The peak molecular weight in the block copolymer is less than 1Z3, preferably less than 1Z5. (B) If the molecular weight of the component is less than 5,000, it is unrealistic in terms of economics. Further, when the molecular weight of the (i) component is 70,000 or more, or 1Z3 or more of the peak molecular weight of the (a) component, the flexibility is inferior or the processability at the time of producing the photosensitive composition is inferior.
[0017] (ィ)ブロック(共)重合体中のピーク分子量は、ゲルパーミエーシヨンクロマトグラフ( GPC)で測定した標準ポリスチレン換算で、 10, 000-50, 000力 子ましく、さらに好 まし <は 10、 000-40, 000である。 10, 000未満では、本発明の感光性組成物に おいて、露光後、フレキソ印刷版、レタープレス印刷版としたときの版強度が低ぐ洗 い出し工程時版材の欠陥や過剰の印圧が力かった場合にシャープな印刷ができず 好ましくない。一方、 50, 000を超えると、感光性組成物を作製する際の加工性に劣 る。 (I) The peak molecular weight in the block (co) polymer is preferably 10,000 to 50,000, more preferably in terms of standard polystyrene measured by gel permeation chromatography (GPC). <Is 10,000-40,000. If it is less than 10,000, the photosensitive composition of the present invention In addition, after exposure, the plate strength is low when it is used as a flexographic printing plate or a letterpress printing plate, and sharp defects can not be obtained if defects in the plate material or excessive printing pressure occurs during the washing process. Absent. On the other hand, when it exceeds 50,000, it is inferior to the processability at the time of producing a photosensitive composition.
[0018] (ァ)ブロック共重合体と (ィ)ブロック (共)重合体の割合は、(ァ) / (ィ)(重量比) = 60〜95Z5〜40、好ましくは 70〜95Z5〜35、さらに好ましくは 75〜95,5〜30 である。 (ァ)ブロック共重合体が 60重量%未満では、本発明の感光性組成物にお いて、露光後、フレキソ印刷版、レタープレス印刷版としたときの版強度が低ぐ洗い 出し工程時版材の欠陥や過剰の印圧が力かった場合にシャープな印刷ができない 。一方、 95重量%を超えると、感光性組成物を作製する際の加工性に劣る。  The ratio of (a) block copolymer to (i) block (co) polymer is (a) / (i) (weight ratio) = 60 to 95Z5 to 40, preferably 70 to 95Z5 to 35, More preferably, it is 75 to 95, 5 to 30. (A) When the block copolymer content is less than 60% by weight, in the photosensitive composition of the present invention, after exposure, the plate strength is low when forming a flexographic printing plate or a letterpress printing plate. Sharp printing can not be performed when material defects or excessive printing pressure is strong. On the other hand, if it exceeds 95% by weight, the processability at the time of producing a photosensitive composition is inferior.
[0019] なお、(ァ)ブロック共重合体および (ィ)ブロック(共)重合体中の共役ジェンを主体 とする重合体ブロックには、芳香族ビ-ルイ匕合物を含んでいてもよい。その構造は、 ランダム状でも、漸増するテーパーブロックでもよい。ランダム、テーパーの分析手法 としては田中らによるブタジエン単位の二重結合を全てオゾン開裂して得られた分解 物の GPCによる方法(「ラバー ·ケミカル ·テクノロジー」第 59卷、第 16頁、 1986年) や、四酸ィ匕オスミウムと tーブチルノヽイド口パーォキシドによる酸ィ匕分解法(「ジャーナ ル'ォブ'ポリマー'サイエンス」第 1卷、第 429頁、 1946年)などがある。共役ジェン を主体とする重合体ブロックに結合芳香族ビニルイヒ合物を含有させることにより、芳 香族ビニル化合物を主体とする重合体ブロックおよび共役ジェンを主体とする重合 体ブロックの鎖長を調節することで、本発明の感光性組成物に使用する光重合性不 飽和単量体との混和性が向上する。共役ジェンを主体とする重合体ブロック中の結 合芳香族ビニル化合物の量は、 30重量%以下であり、 30重量%を超えると、芳香族 ビニル化合物を主体とする重合体ブロックの分子量が小さくなりすぎるため、感光性 組成物とした場合、露光後、フレキソ印刷版、レタープレス印刷版としたときの版強度 が低ぐ洗い出し工程時版材の欠陥や過剰の印圧が力かった場合にシャープな印 刷ができず好ましくない。芳香族ビ-ルイ匕合物を含む構造は、ランダム構造でも、芳 香族ビ-ルイ匕合物が漸増するテーパーブロックでもよい。  The polymer block mainly composed of the conjugated diene in (a) block copolymer and (ii) block (co) polymer may contain an aromatic vinyl compound. . The structure may be random or incremental taper blocks. As a random and taper analysis method, a method by GPC of decomposition products obtained by ozone cleaving all double bonds of butadiene units by Tanaka et al. (“Rubber Chemical Technology”, No. 59, p. 16, 1986) And the acid decomposition method using osmium tetraoxide and t-butyl hydroxide peroxide ("Journalist's polymer" science, 1st page, page 429, 1946). A polymer block mainly composed of an aromatic vinyl compound and a polymer block mainly composed of a conjugated gene are adjusted by containing a bonded aromatic vinyl compound in a polymer block mainly composed of a conjugated gene Thus, the miscibility with the photopolymerizable unsaturated monomer used in the photosensitive composition of the present invention is improved. The amount of the conjugated aromatic vinyl compound in the polymer block mainly composed of the conjugated diene is 30% by weight or less, and when it exceeds 30% by weight, the molecular weight of the polymer block mainly composed of the aromatic vinyl compound is small If the photosensitive composition is used as a photosensitive composition, the plate strength of the flexographic printing plate and the letterpress printing plate after exposure is too low. It is not preferable because sharp printing can not be performed. The structure containing the aromatic vinyl compound may be a random structure or a tapered block in which the aromatic vinyl compound gradually increases.
[0020] 本発明のエラストマ一構成体の(ゥ)メルトフローレート(190°C、 21. 2N)は、好まし くは 0. l〜20gZlO分、さらに好ましくは 0. 5〜8gZlO分である。 0. lgZlO分未 満では、感光性組成物において、光重合性不飽和単量体と光重合開始剤および水 現像性を必要とする場合は親水性ポリマーとの相溶性が悪ぐ画像現像性や版強度 の低下を起こし好ましくない。一方、 20gZlO分を超えると、版強度が低くなり好まし くない。なお、本発明のエラストマ一構成体において、メルトフローレートは、例えば 重合開始剤の量により調整することができる。 [0020] The melt flow rate (190 ° C, 21.2 N) of one elastomer component of the present invention is preferred. Or 0.5 to 20 g Z10, more preferably 0.5 to 8 g Z10. When the amount is less than 1 lgZlO, the photosensitive composition has poor image compatibility with the photopolymerizable unsaturated monomer and the photopolymerization initiator, and when the water developability is required, the compatibility with the hydrophilic polymer is poor. And unfavorably cause deterioration of plate strength. On the other hand, if it exceeds 20 gZlO, the plate strength is low and it is not preferable. In the elastomer single-piece construction of the present invention, the melt flow rate can be adjusted, for example, by the amount of the polymerization initiator.
[0021] また、エラストマ一構成体の(ェ)トルエン不溶分は、好ましくは 20ppm以下、さらに 好ましくは 15ppm以下、特に好ましくは lOppm以下である。トルエン不溶分が 20pp mを超えると、本発明の感光性組成物において、洗い出し工程時版材の欠陥の原因 や印刷時小さな文字の鮮明さにかけ好ましくない。ここで、トルエン不溶分は、後記し た方法により測定された値である。トルエン不溶分は、脱溶時の条件を穏やかにした り、急激にしたりすることにより、容易に調整することができる。  Further, the (f) toluene insoluble content of one elastomer component is preferably 20 ppm or less, more preferably 15 ppm or less, particularly preferably 10 ppm or less. When the toluene insoluble content exceeds 20 ppm, in the photosensitive composition of the present invention, it is not preferable because it causes defects of the printing plate during the washing step and sharpness of small characters during printing. Here, the toluene insoluble content is a value measured by the method described later. The toluene insolubles can be easily adjusted by mild or rapid conditions for dissolution.
[0022] さらに、エラストマ一構成体の (ォ) JIS K6253記載の硬度測定法タイプ A硬度は 、好ましくは 30〜70、さらに好ましくは 35〜70である。 70を超えると、柔軟性が劣り カスレや印刷ムラの原因となり好ましくない。一方、 30未満では、露光後、フレキソ印 刷版、レタープレス印刷版としたときの版強度が低ぐ洗い出し工程時版材の欠陥や 過剰の印圧が力かった場合にシャープな印刷ができない。硬度は、芳香族ビニルイ匕 合物の全結合含量により、容易に調整することができる。  Furthermore, the hardness measurement method according to JIS K6253 (A) of the elastomer single body preferably has a hardness of 30 to 70, and more preferably 35 to 70. If it exceeds 70, it is not preferable because it has poor flexibility and causes blurring and printing unevenness. On the other hand, if it is less than 30, the plate strength is low when it is made a flexo printing plate or a letterpress printing plate after exposure, and sharp printing can not be performed if defects in the printing plate or excessive printing pressure occurs during the washing step. . The hardness can be easily adjusted by the total bonding content of the aromatic vinyl compound.
[0023] なお、本発明のエラストマ一構成体に用いられる(ァ)ブロック共重合体や (ィ)プロ ック(共)重合体、さらにはこれらを主成分とする本発明のエラストマ一構成体は、ペレ ット、ポーラスペレット、クラムいずれの形状でも良い。  It is to be noted that (a) block copolymer and (i) block (co) polymer used for one elastomer component of the present invention, and further, one elastomer component of the present invention containing these as a main component It may be in the form of pellet, porous pellet or crumb.
[0024] 本発明のエラストマ一構成体を製造するには、(ァ)ブロック共重合体、および (ィ) ブロック (共)重合体を、炭化水素溶媒中で有機リチウム化合物を開始剤として溶液 重合法で各々別個に重合し、得られたそれぞれの重合体溶液を混合して均一化し た後、脱溶して得る方法が好ましい。例えば、上記のように (ァ)ブロック共重合体を 製造した後、さらに、上記 (ィ)ブロック (共)重合体溶液を溶液混合し、均一化した後 脱溶すること〖こより製造することができる。  In order to produce an elastomer composition of the present invention, (a) block copolymer, and (ii) block (co) polymer are dissolved in a hydrocarbon solvent using an organic lithium compound as an initiator and then added to the solution. It is preferable to obtain the respective polymer solutions obtained by legally mixing them separately, mixing and homogenizing the obtained respective polymer solutions and then removing them by dissolving. For example, after producing the (a) block copolymer as described above, the above (i) block (co) polymer solution may be further mixed with solution, homogenized, and then dissolved. it can.
ここで、(ィ)成分は、特殊な製造方法を用いての単独仕上げも可能であるが、(ァ) ブロック共重合体などに一般に使用される製造設備においては、ベたつきや乾燥不 備の問題で実質製造できない。また、特殊な設備においても、量産化には適さず、コ スト的に不利になることは否めないため、(ァ)成分と混合して均一化の後、脱溶、乾 燥を行うことが実用上好ましい。 Here, the (i) component can be finished separately using a special manufacturing method, but (a) In production facilities generally used for block copolymers etc., substantial production can not be achieved due to problems of stickiness and drying defects. In addition, even special equipment is not suitable for mass production, and it can not be denied that it is cost-wise disadvantageous. Therefore, mixing with the component (a) may be followed by homogenization followed by dissolution and drying. It is preferable practically.
[0025] また、(ィ)ブロック(共)重合体を、上記の(ァ)ブロック共重合体の重合と同時に重 合して、本発明のエラストマ一構成体を製造することができる。例えば、第一段階とし て (ァ)ブロック共重合体を製造するため、芳香族ビニル化合物と重合開始剤(開始 剤 1)を接触させて反応させたのち、共役ジェンを添加し、実質的に反応が終了し た後、重合開始剤(開始剤— 2)を加え、再度、共役ジェンを添加し、(ァ)ブロック共 重合体の製造を継続しつつ、(ィ)ブロック (共)重合体の製造を開始する。最後に、 芳香族ビニル化合物を反応させて (ァ)ブロック共重合体、(ィ)ブロック(共)重合体の 製造を同時に行い、エラストマ一構成体としてもよい。ここで、製造する重合体の分子 構造の制御上、第 2段の開始剤添加は、第 1段の共役ジェンの重合終了後が好まし いが、第 1段の共役ジェン添加量を調整しつつ、重合の途中で添加し、第 2段の共 役ジェンの添加を省略しても差し支えない。また、製造する重合体の分子構造を精 度よく制御するには、第 1段、第 2段の開始剤の添加量、第 1段の芳香族ビ-ルイ匕合 物及び共役ジェンの添加量と第 2段の共役ジェンと芳香族ビュル化合物添加量の 調整で行うことが出来る。  Also, the (i) block (co) polymer may be polymerized simultaneously with the polymerization of the (a) block copolymer described above to produce an elastomer single-piece construction of the present invention. For example, in order to produce (a) a block copolymer as the first step, an aromatic vinyl compound and a polymerization initiator (initiator 1) are brought into contact and reacted, and then a conjugated gene is added, After the reaction is completed, a polymerization initiator (initiator-2) is added, and a conjugated diene is added again, and (a) block (co) polymer is continued while (b) block copolymer production is continued. Start production of Finally, an aromatic vinyl compound may be reacted to simultaneously produce (a) a block copolymer and (b) a block (co) polymer to make a single elastomer. Here, in order to control the molecular structure of the polymer to be produced, the addition of the second stage initiator is preferably after the completion of the polymerization of the first stage conjugated gen, but the amount of the conjugated gen addition of the first stage is adjusted. However, it may be added in the middle of the polymerization, and the addition of the second stage coagent may be omitted. Also, in order to precisely control the molecular structure of the polymer to be produced, the addition amounts of the first and second stage initiators, and the addition amounts of the first stage aromatic vinyl copolymer and the conjugated diene And, it can be carried out by adjusting the amount of addition of conjugated ben and aromatic burle compound in the second stage.
[0026] 本発明に使用される(ァ)ブロック共重合体や (ィ)ブロック (共)重合体の製造方法 の具体例としては、例えば不活性炭化水素溶媒中において、有機リチウム化合物な どを重合開始剤に用い、芳香族ビ-ルイ匕合物と共役ジェンを逐次重合させることに より製造することができる。 Specific examples of the method for producing the (a) block copolymer or (i) block (co) polymer used in the present invention include, for example, organic lithium compounds and the like in an inert hydrocarbon solvent. It can be produced by sequentially polymerizing an aromatic vinyl compound and a conjugated gene, which is used as a polymerization initiator.
例えば、まず芳香族ビニル化合物を重合させ、次いで共役ジェンを重合させたの ち、カップリング剤を反応させるか、再度、芳香族ビニルイ匕合物を反応させることによ り製造することができる。また、共役ジェンの重合において、必要に応じて所望量の 芳香族ビ-ルイ匕合物を添加し、共重合してもよい。好ましくは、カップリング剤を使用 しない製造方法である。カップリング剤を使用すると、カップリング剤残渣により透明 性が劣り、現像性に影響を及ぼす。 [0027] 上記不活性炭化水素溶媒としては、ペンタン、 n—へキサン、ヘプタン、オクタン、メ チルシクロペンタン、シクロへキサン、ベンゼン、キシレンなどの炭化水素が用いられ る力 これらの中ではシクロへキサンが好ましい。 For example, it can be produced by first polymerizing an aromatic vinyl compound and then polymerizing a conjugated diene, then reacting a coupling agent or again reacting an aromatic vinyl compound. In addition, in polymerization of a conjugated diene, a desired amount of an aromatic bi-Louisium compound may be added and copolymerized, if necessary. Preferably, the production method does not use a coupling agent. When a coupling agent is used, the transparency of the coupling agent is deteriorated due to the residue of the coupling agent, which affects the developability. [0027] As the above-mentioned inert hydrocarbon solvent, hydrocarbons such as pentane, n-hexane, heptane, octane, methylcyclopentane, cyclohexane, benzene, xylene and the like can be used. Xane is preferred.
重合開始剤である有機アルカリ金属化合物としては、有機リチウム化合物が好まし い。この有機リチウム化合物としては、有機モノリチウム、有機ジリチウム、有機ポリリ チウム化合物が用いられる。  As an organic alkali metal compound which is a polymerization initiator, an organic lithium compound is preferable. As this organic lithium compound, organic monolithium, organic dilithium and organic lithium compound are used.
これらの具体例としては、ェチルリチウム、 n—プロピルリチウム、イソプロピルリチウ ム、 n—ブチルリチウム、 sec—ブチルリチウム、イソプレニルジリチウムなどが挙げら れ、モノマー 100重量部当たり 0.02〜2重量部の量で用いられる。  Specific examples thereof include ethyllithium, n-propyllithium, isopropyllithium, n-butyllithium, sec-butyllithium, isoprenyldilithium and the like, and the amount of 0.02 to 2 parts by weight per 100 parts by weight of the monomer. Used in
[0028] また、この際、ミクロ構造、すなわち共役ジェン部分のビュル結合含量の調節剤とし て、ルイス塩基、例えばエーテル、ァミンなど、具体的にはジェチルエーテル、テトラ ヒドロフラン、プロピルエーテル、ブチルエーテル、高級エーテル、またエチレングリコ ーノレジメチノレエーテノレ、エチレングリコーノレジェチノレエーテノレ、エチレングリコーノレジ ブチノレエーテノレ、プロピレングリコールジメチルエーテル、プロピレングリコールジェ チルエーテル、ジエチレングリコールジメチルエーテル、ジエチレングリコーノレジブチ ノレエーテノレ、トリエチレングリコーノレブチノレエーテノレエチレングリコーノレジブチノレエ一 テルなどのポリエチレングリコールのエーテル誘導体、ァミンとしてはテトラメチルェチ レンジァミン、ピリジン、トリプチルァミンなどの第 3級ァミンなどが挙げられ、不活性炭 化水素溶媒とともに用いられる。 Also, at this time, as a regulator of microstructure, ie, content of buryl bond of conjugated gen moiety, a Lewis base such as ether, amine and the like, specifically jetyl ether, tetrahydrofuran, propyl ether, butyl ether, Higher ether, ethylene glycolomethylethione ethylene glycol, ethylene glycolo regethinole tenolee, ethylene glycolo regethinole tenolee, ethylene glycolo resin dibutyle nore tenolee, propylene glycol dimethyl ether, propylene glycol dimethyl ether, diethylene glycol dimethyl ether, diethyleneglycolo dibutyl ether nore tenolee Ether derivatives of polyethylene glycol such as ethylene glycono rebutinore tenore ethylene glycono resibut no ester, tetramethyl as amine Ji Renjiamin, pyridine, tertiary Amin such Toripuchiruamin and the like, used in conjunction with an inert hydrocarbon solvent.
これらは、共役ジェンを主体とする重合体ブロックの重合において、芳香族ビニル 化合物を共重合させる際、芳香族ビニル化合物 Z共役ジェンの構造調節剤としても 用!/、ることができる。  These can also be used as a structure regulator of the aromatic vinyl compound Z conjugated gen when copolymerizing the aromatic vinyl compound in the polymerization of a polymer block mainly composed of a conjugated diene!
[0029] 重合反応は、通常、 20〜120°C、好ましくは 30〜100°Cで実施される。また、重合 は、一定温度にコントロールして実施しても、また熱除去をしないで上昇温度下に実 施してちょい。  [0029] The polymerization reaction is usually carried out at 20 to 120 ° C, preferably 30 to 100 ° C. Also, even if polymerization is carried out under control at a constant temperature, it may be carried out under elevated temperature without heat removal.
[0030] (ァ)ブロック共重合体や (ィ)ブロック(共)重合体の製造に用いられることのあるカツ プリング剤としては、好ましくは 2官能性カップリング剤が使われる。このようなものとし ては、例えば、ジブロモメタン、ジブロモェタン、ジブロモプロパン、メチレンクロライド 、ジクロロエタン、ジクロロプロパン、ジクロロブタンなどのジハロゲン化アルカン、ジク ロロシラン、メチルジクロロシラン、ジメチルジクロロシラン、モノェチルジクロロシラン、 ジェチルジクロロシラン、モノブチルジクロロシラン、ジブチルジクロロシラン、モノへキ シルジクロロシラン、ジへキシルジクロロシラン、ジブ口モシラン、モノメチルジブ口モシ ラン、ジメチルジブ口モシランなどのハロゲン化ケィ素化合物、ジビュルベンゼン、ジ ビュルナフタレンなどのジ芳香族ビュル化合物、ギ酸ェチル、酢酸ェチル、酢酸ブチ ル、プロピオン酸メチル、酢酸フエ-ル、安息香酸ェチル、安息香酸フエ-ル、アジピ ン酸ジェチルのようなエステル化合、ジブチルジクロロスズ、テトラクロロスズなどのス ズ化合物、ビスフエノール一 A、ビスフエノール一 AD、ビスフエノール一 F、 3—グリシ ドキシプロピルトリメトキシシラン、その他のエポキシィ匕合物、プロピ才ン酸クロリド、ァ ジピン酸ジクロリドなどの酸クロリド、 1, 4—クロルメチルベンゼン、トリレンジイソシァ ネートなどが挙げられる。 A bifunctional coupling agent is preferably used as a coupling agent which may be used for the production of (a) block copolymer and (i) block (co) polymer. As such, for example, dibromomethane, dibromoethane, dibromopropane, methylene chloride , Dihalogenated alkanes such as dichloroethane, dichloropropane, dichlorobutane, dichlorosilane, methyldichlorosilane, dimethyldichlorosilane, monoethyldichlorosilane, getyldichlorosilane, monobutyldichlorosilane, dibutyldichlorosilane, monohexyl dichlorosilane Halogenated compounds such as chlorosilanes, dihexyldichlorosilanes, dibutary mosilanes, monomethyl dibutary mosilans, dimethyl dibutary mosilanes, diaromatic bee compounds such as dibuylbenzenes and dibuernaphthalenes, cetyl formate, ethyl acetate, Ester compounds such as butyl acetate, methyl propionate, phenyl acetate, ethyl benzoate, phenyl benzoate, and diethyl ether adipate, sulfur compounds such as dibutyl dichloro tin and tetrachloro tin, bis pheno R 1 A, Bisphenol 1 AD, Bisphenol 1 F, 3-glycidoxypropyltrimethoxysilane, other epoxy compounds, propyuric acid chloride, acid chloride such as dihydroxy acid dichloride, 1, 4- Chloromethylbenzene, tolylene diisocyanate and the like can be mentioned.
[0031] また、(ァ)〜 (ィ)成分の芳香族ビニルイ匕合物の結合含量は、各段階における重合 時のモノマーの供給量で調節され、必要に応じて調節される共役ジェンのビュル結 合含量は、上記ミクロ調節剤の成分を変量することにより調節される。また、共役ジェ ンを主体とする重合体ブロックの芳香族ビニルイ匕合物 Z共役ジェンの構造も、上記ミ クロ調節剤で調節される。ここで、芳香族ビニル化合物 Z共役ジェンの構造調節とは 、共役ジェン中に結合する芳香族ビニルイ匕合物のランダム、テーパー、ブロック構造 などの結合状態を制御することを 、う。  Further, the bonding content of the aromatic vinyl compound of the (a) to (i) components is controlled by the supply amount of the monomer at the time of polymerization in each stage, and it is controlled as needed. The binding content is adjusted by varying the components of the microregulator. In addition, the structure of a conjugated vinyl-based polymer block of an aromatic vinyl complex, Z conjugated, is also controlled by the above-mentioned microregulator. Here, the structural control of the aromatic vinyl compound Z-conjugated agent is to control the bonding state of the random, tapered or block structure of the aromatic vinyl compound bonded to the conjugated agent.
また、(ァ)〜 (ィ)成分の重量平均分子量やメルトフローレートは、重合開始剤、例 えば、 sec—ブチルリチウムの添カ卩量で調節される。  Further, the weight average molecular weight and melt flow rate of the (a) to (i) components are adjusted by the addition amount of a polymerization initiator, for example, sec-butyllithium.
[0032] さらに、(ァ)ブロック共重合体および (ィ)ブロック(共)重合体を主成分とするエラス トマ一構成体は、上記の方法で重合した後、以下の方法で得ることができる。  Further, an elastomer composition having (a) a block copolymer and (b) a block (co) polymer as main components can be obtained by the following method after polymerization according to the above method. .
例えば、重合体溶液を熱湯中に撹拌下投入し、溶媒を蒸留除去し、含水ポリマー をスクリュー型搾り機で脱水する方法、アセトンまたはアルコールなどをカ卩えて沈殿さ せ、バンドドライヤーで乾燥する方法、直接押出機にて脱溶剤する方法などがある。 好ましくは、熱湯中に撹拌下投入し、溶媒を蒸留除去し、含水ポリマーをスクリュー型 搾り機で脱水する方法である。 脱水後の本発明のエラストマ一構成体は、 自重でブロッキングすることもあるため、For example, the polymer solution is poured into hot water with stirring, the solvent is distilled off, the water-containing polymer is dewatered with a screw-type squeezer, acetone or alcohol is coated and precipitated, and the method is dried with a band dryer. And direct solvent removal using an extruder. Preferably, the method is charged into hot water with stirring, the solvent is distilled off, and the water-containing polymer is dewatered with a screw-type squeezer. The dewatered one elastomer composition of the present invention may block by its own weight.
(力)ブロッキング防止剤をエラストマ一構成体 100重量部換算で 0. 2重量部以下添 カロしても良い。 0. 2重量部を超えると、本発明の感光性組成物の画像現像性や小さ な文字でも鮮明な印刷性において劣る。好ましいブロッキング防止剤としては、シリカ 、タルク、ステアリン酸カルシウムなどの無機物や金属石けんである。ブロッキング防 止剤は、コールターカウンタ一法で測定した平均粒径が好ましくは 30 m以下、さら に好ましくは 1〜20 μ mである。 (Force) The antiblocking agent may be added in an amount of 0.2 parts by weight or less in terms of 100 parts by weight of one elastomer. When it exceeds 0.2 parts by weight, the image developability of the photosensitive composition of the present invention and the clear printability of even small characters are inferior. Preferred antiblocking agents are inorganic substances such as silica, talc and calcium stearate, and metal soaps. The blocking inhibitor preferably has an average particle size of 30 m or less, and more preferably 1 to 20 μm, as measured by Coulter Counter 1 method.
[0033] 次に、本発明の感光性組成物は、以上の(キ)エラストマ一構成体に (ク)光重合性 不飽和単量体および (ケ)光重合開始剤を配合した感光性の組成物である。  Next, the photosensitive composition of the present invention is a photosensitive composition obtained by blending the above-mentioned (k) one elastomer component with (g) a photopolymerizable unsaturated monomer and (k) a photopolymerization initiator. It is a composition.
本発明の感光性組成物において、(キ)エラストマ一構成体は、配合量が少なすぎ ると、柔軟性に劣り小さな文字での鮮明性に欠ける。一方、多すぎると画像現像性に 劣る。従って、(キ)エラストマ一構成体は、感光性組成物全量に対して 10〜90重量 %が好ましぐさらに好ましくは 50〜90重量%である。  In the photosensitive composition of the present invention, when the blending amount is too small, the (i) elastomer composition is inferior in flexibility and lacks sharpness in small characters. On the other hand, if it is too large, the image developability is poor. Accordingly, the (i) one component of the elastomer is preferably 10 to 90% by weight, more preferably 50 to 90% by weight, based on the total amount of the photosensitive composition.
[0034] 上記感光性組成物に用いられる(ク)光重合性不飽和単量体としては、光重合可能 なエチレン性二重結合を有する不飽和化合物であり、一般の感光性エラストマ一組 成物や感光性榭脂組成物に用いられ得るものであれば特に制限されることなく用い ることができる。具体的には、エチレングリコールモノ (メタ)アタリレート、ジエチレング リコールモノ(メタ)アタリレート、プロピレングリコールモノ(メタ)アタリレート、ポリェチ レングリコールモノ(メタ)アタリレート、ポリプロピレングリコールモノ(メタ)アタリレート、 ポリエチレングリコールモノメトキシモノアタリレート、 N—メチロールアクリルアミド、 N ーェチロールアクリルアミド、 N—プロピロールアクリルアミド、 N—メチロール (メタ)ァ クリルアミド、 N—ェチロール (メタ)アクリルアミド、 N—プロピロールメタクリルアミド、 ダイアセトンアクリルアミド、ヒドロキシプロピルアタリレート、トリアクリルホルマール、ジ アクリルアミドジメチレンエーテル、メチレンビスアクリルアミド、エチレングリコールジ( メタ)アタリレート、ジエチレングリコールジ (メタ)アタリレート、トリエチレングリコールジ (メタ)アタリレート、テトラエチレングリコールジ (メタ)アタリレート、ポリエチレングリコ ールジ(メタ)アタリレート、トリメチロールプロパントリ(メタ)アタリレート、トリメチロール プロパンジ (メタ)アタリレート、オリゴウレタンジ(メタ)アタリレート、 1, 3—ブタンジォ ールジ(メタ)アタリレート、 1, 4 ブタンジオールジ(メタ)アタリレート、 1, 6 へキサ ンジオールジ (メタ)アタリレート、グリセリンジ (メタ)アタリレート、ネオペンチルダリコー ルジ(メタ)アタリレート、 1, 10—デカンジオールジ (メタ)アタリレート、ビスフエノール Aのエチレンオキサイド付加物ジ (メタ)アタリレート、エチレンオキサイド変性トリメチロ ールプロパントリアタリレート、ペンタエリスリトールテトラ(メタ)アタリレート、ペンタエリ スリトールトリ(メタ)アタリレート、トリアクリルホルマール、メタクリルアミド、スチレン、ビ -ルトルエン、ジビュルベンゼン、ジァリルフタレート、トリァリルシアヌレート、フマル 酸ジェチルエステル、フマル酸ジブチルエステル、フマル酸ジォクチルエステル、フ マル酸ジステアリルエステル、フマル酸ブチルォクチルエステル、フマル酸ジフエ- ルエステル、フマル酸ジベンジルエステル、マレイン酸ジブチルエステル、マレイン酸 ジォクチルエステル、フマル酸ビス(3—フエ-ルプロピル)エステル、フマル酸ジラウ リルエステル、フマル酸ジベへ-ルエステル、 N—n—へキシルマレイミド、 N シクロ へキシルマレイミド、 N—n—ォクチルマレイミド、 N— 2—ェチルへキシルマレイミド、 N—n—デシルマレイミド、 N—n—ラウリルマレイミドなどが挙げられる。 The photopolymerizable unsaturated monomer (g) used in the photosensitive composition is an unsaturated compound having a photopolymerizable ethylenic double bond, and a general photosensitive elastomer composition. As long as it can be used for products and photosensitive resin compositions, it can be used without particular limitation. Specifically, ethylene glycol mono (meth) atalylate, diethylene glycol mono (meth) atalylate, propylene glycol mono (meth) atalylate, polyethylene glycol mono (meth) atalylate, polypropylene glycol mono (meth) atarilate , Polyethylene glycol monomethoxy monoazatalylate, N-methylol acrylamide, N-ethyrol acrylamide, N-propyrrole acrylamide, N-methylol (meth) acrylamide, N-ethylol (meth) acrylamide, N-propyrrole methacrylamide, Diacetone acrylamide, hydroxypropyl atalylate, triacryl formal, diacrylamide dimethylene ether, methylene bis acrylamide, ethylene glycol di (Meth) atalylate, diethylene glycol di (meth) atalylate, triethylene glycol di (meth) atalylate, tetraethylene glycol di (meth) atalylate, polyethylene glycol di (meth) atalylate, trimethylolpropane tri (meth) Atalylate, trimethylol propane di (meth) atalylate, oligourethane di (meth) atalylate, 1, 3-butanedio Di- (meth) atalylate, 1, 4-butanediol di (meth) atalylate, 1, 6 hexandiol di (meth) atalylate, glycerin di (meth) atalylate, neopentyl diaryl di (meth) atalylate, 1, 10-decanediol di (meth) atalylate, ethylene oxide adduct of bis phenol A di (meth) atalylate, ethylene oxide modified trimethylol propane triarylate, pentaerythritol tetra (meth) atalylate, pentaerythritol triol (Meth) atarylates, triacrylic formals, methacrylamides, styrenes, butyltoluenes, diarylbenzenes, diaryl phthalates, triaryl cyanurates, fumaric acid getil esters, fumaric acid dibutyl esters, fumaric acid dioxtyl esters , Fumaric acid distearyl ester, fumaric acid butyloctyl ester, fumaric acid diaryl ester, fumaric acid dibenzyl ester, maleic acid dibutyl ester, maleic acid dioctyyl ester, fumaric acid bis (3-phenylpropyl) ester , Fumaric acid dilauryl ester, fumaric acid diperyl ester, N-n-hexyl maleimide, N-cyclohexyl maleimide, N-n-octyl maleimide, N- 2-ethyl hexyl maleimide, N- n-decyl maleimide And N-n-laurylmaleimide.
これらの光重合性不飽和単量体は、単独で用いても 2種以上を併用しても良い。  These photopolymerizable unsaturated monomers may be used alone or in combination of two or more.
[0035] 光重合性不飽和単量体は配合量が少なすぎると、細かい点や文字の形成性を低 下させる。一方、配合量が多すぎると、得られた版の硬度が高くなつてインキ乗りが悪 くなる。(ク)光重合性不飽和単量体の配合量は、感光性組成物全量に対して 1〜50 重量%が好ましく、さらに好ましくは 1〜 20重量%である。  [0035] When the content of the photopolymerizable unsaturated monomer is too small, the formation of fine dots and characters is reduced. On the other hand, if the blending amount is too large, the hardness of the obtained plate becomes high and the ink riding becomes worse. The amount of the photopolymerizable unsaturated monomer is preferably 1 to 50% by weight, more preferably 1 to 20% by weight, based on the total amount of the photosensitive composition.
[0036] また、感光性組成物に用いられる(ケ)光重合開始剤としては、一般の感光性エラス トマ一組成物や感光性榭脂組成物に用いられ得るものであれば特に制限されること なく用いることができる。例えば、ベンゾフエノン類、ベンゾイン類、ァセチフエノン類、 aージケトン類、ァシロイン類、ァシロインエーテル類、ベンジルアルキルケタール類 、多核キノン類、チォキサントン類、ァシルフォスフィン類などが挙げられ、具体的に は、ベンゾフエノン、クロルべンゾフエノン、ァセトフエノン、ベンジル、ジァセチル、ベ ンゾイン、ビバ口イン、ベンゾインメチルエーテル、ベンゾインェチルエーテル、ベンゾ インイソプロピルエーテル、ベンゾインブチルエーテル、ハイドロキノンモノメチルエー テル、ベンジルジメチルケタール、ベンジルジェチルケタール、ベンジルジイソプロピ ルケタール、アントラキノン、 2 ェチルアントラキノン、 1, 4 ナフトキノン、メチルナ フトキノン、 2—クロルアントラキノン、チォキサントン、 2—クロルチオキサントン、ァシ ルフォスフィンオキサイドなどが挙げられる。 Further, the photopolymerization initiator (f) used for the photosensitive composition is particularly limited as long as it can be used for general photosensitive elastomer compositions and photosensitive resin compositions. It can be used without any problems. For example, benzophenones, benzoins, acetifephenones, a-diketones, acyloines, acyloin ethers, benzyl alkyl ketals, polynuclear quinones, thioxanthones, glycyl phosphines, etc. are specifically mentioned. Benzophenone, Chlorbenzophenone, Acetophenone, Benzyl, Diacetyl, Benzoin, Viva in, Benzoin methyl ether, Benzoin ethyl ether, Benzoin isopropyl ether, Benzoin butyl ether, Hydroquinone monomethyl ether, Benzyl dimethyl ketal, benziljetil ketal , Benzyl diisopropyl Examples include luketal, anthraquinone, 2-acetylanthraquinone, 1,4-naphthoquinone, methylnaphthoquinone, 2-chloroanthraquinone, thioxanthone, 2-chlorothioxanthone, and acyl phosphine oxide.
これらの光重合開始剤は、単独で用いても 2種以上を併用しても良 ヽ。  These photopolymerization initiators may be used alone or in combination of two or more.
[0037] (ケ)光重合性開始剤は、配合量が少なすぎると光重合開始能が不十分となる傾向 があり、一方多すぎると自らの遮光により感光性組成物内部が硬化しなくなり、現像 により画像が欠けやすくなる。(ケ)光重合性開始剤の配合量は、感光性組成物全量 に対して、 0. 01〜10重量%が好ましぐさらに好ましくは 0. 1〜5重量%である。  If the blending amount of the photopolymerization initiator is too small, the photopolymerization initiation ability tends to be insufficient. If the blending amount is too large, the inside of the photosensitive composition does not cure due to light shielding by itself. Development makes it easy to lose images. The blending amount of the photopolymerization initiator is preferably 0.1 to 10% by weight, more preferably 0.1 to 5% by weight, based on the total amount of the photosensitive composition.
[0038] 本発明の感光性組成物には、さらに(コ)液状ポリブタジエンを配合することができ る。ここで、液状ポリブタジエンとは、ポリスチレン換算の重量平均分子量が 100〜20 ,000、好ましくは 500〜10,000程度の常温(23°C)において液状のポリブタジエン である。  [0038] A (co) liquid polybutadiene can be further blended into the photosensitive composition of the present invention. Here, the liquid polybutadiene is a liquid polybutadiene at a normal temperature (23 ° C.) having a weight average molecular weight in terms of polystyrene of about 100 to 20,000, preferably about 500 to 10,000.
本発明の感光性組成物に、(コ)液状ポリブタジエンを配合することにより、製版時 のシート加工性、露光後、フレキソ印刷版、レタープレス印刷版としたときの版強度と バランスが良 ヽと ヽぅ効果を奏する。  By blending (co) liquid polybutadiene with the photosensitive composition of the present invention, the sheet processability at plate making, plate strength after exposure, and plate strength and balance when made into a flexographic printing plate and a letterpress printing plate are good. It produces acupuncture effect.
感光性組成物に用いられる(コ)液状ポリブタジエンの配合量は、感光性組成物全 量に対して、 0〜50重量%が好ましぐさらに好ましくは 5〜40重量%である。 50重 量0 /0を超えると、露光後、フレキソ印刷版、レタープレス印刷版としたときの版強度が 低ぐ洗い出し工程時版材の欠陥や過剰の印圧が力かった場合にシャープな印刷 ができず好ましくない。 The blending amount of (co) liquid polybutadiene used in the photosensitive composition is preferably 0 to 50% by weight, more preferably 5 to 40% by weight, based on the total amount of the photosensitive composition. If more than 50 by weight 0/0, sharp when after exposure, flexographic printing plate, defects and excessive printing pressure plate strength is Teigu washout process when plate material when the letterpress printing plate did not force Unable to print.
[0039] さらに、本発明の感光性組成物には、(サ)親水性ポリマーを配合することにより、水 現像性とすることができる。この水現像性を必要とする感光性組成物に用いられる ( サ)親水性ポリマーとは、水または水を主成分として、アルカリ性水溶液、酸性水溶液 、有機溶剤、または界面活性剤を含む現像液に可溶あるいは膨潤 (分散)するポリマ 一を意味し、 COOM基 [カルボン酸 (金属)塩基]、 SO M基 [スルホン酸 (金属)  Furthermore, the photosensitive composition of the present invention can be made water-developable by incorporating a (j) hydrophilic polymer. The hydrophilic polymer used in the photosensitive composition requiring water developability is water or a developer containing an aqueous alkaline solution, an aqueous acidic solution, an organic solvent, or a surfactant containing water or water as a main component. It means a polymer that is soluble or swelled (dispersed), COOM group [carboxylic acid (metal) base], SO M group [sulfonic acid (metal)
3  3
塩基] (Mは水素原子、周期表第 I、 Π、 III族元素、ァミン、アンモ-ゥムを示す) NH 、—OHなどの親水基を有し、かつ線状で架橋のないポリマーである。  Base] (M represents a hydrogen atom, periodic table group I, Π, a group III element, an amine, an ammonium) It is a polymer having a hydrophilic group such as NH 2 or -OH and having no crosslinking. .
2  2
このような親水性ポリマーの例として、ポリビニルアルコール(PVA)、カルボキシメ チルセルロースなどの汎用樹脂のほかに、(メタ)アクリル酸とジェンィ匕合物を共重合 させたジェン系ゴム、無水マレイン酸で変性した液状ポリブタジエン、また特に効果 的な骨格としては COOM基 (Mは水素原子、周期表第 I、 Π、 III族元素、ァミン、ァ ンモ-ゥムを示す)を 50〜50, 000当量 Zl06g有するポリマーであり、上記周期表 第 I、 II族元素としては、ナトリウム、カリウム、リチウムなどのアルカリ金属、カルシウム 、マグネシウムなどのアルカリ土類金属、ホウ素、アルミニウムなどが挙げられる。 なお、本発明において、 COOM基が 50当量 Zl06g未満では,水に対する親和 性に劣り、中性水で現像することが難しぐ一方 50, 000当量 Zl06gを超えると、耐 水系インキ性が劣るので好ましくな 、。 Examples of such hydrophilic polymers include polyvinyl alcohol (PVA), carboxyme In addition to general-purpose resins such as chill cellulose, gen-based rubbers obtained by copolymerizing (meth) acrylic acid and a mixture of jenny, liquid polybutadiene modified with maleic anhydride, and COOM group (MOM as an especially effective skeleton) the I, [pi, III group element is a hydrogen atom, the periodic table, Amin, § Nmo - © shows the beam) to 50 to 50, 000 is equivalent ZL0 6 g with polymer, the periodic table I, as a II group element And alkali metals such as sodium, potassium and lithium, alkaline earth metals such as calcium and magnesium, boron and aluminum. In the present invention, the COOM group 50 equivalent ZL0 less than 6 g, poor affinity for water, while it is difficult tool developed with neutral water 50, 000 exceeds the equivalent ZL0 6 g, resistance to aqueous ink resistance Because it is inferior, it is desirable.
[0040] 親水性ポリマーとしては、具体的には COOM基含有ポリウレタン、—COOM基 含有ポリエステル、 COOM基含有エポキシィ匕合物、 COOM基含有ポリアミド酸 、—COOM基含有アクリロニトリル—ブタジエンコポリマー、—COOM基含有スチレ ン—ブタジエンポリマー、 COOM基含有ポリブタジエン、ポリビュルアルコール(P VA)、ポリアクリルアミド、ポリアクリル酸ナトリウム、カルボキシメチルセルロース(CM C)、ヒドロキシェチルセルロース(MRC)、メチルセルロース(MC)、ポリエチレンォキ サイド、ポリエチレンィミン、および該化合物誘導体などが使用できるが、これらに限 定されるものではない。 Specific examples of the hydrophilic polymer include COOM group-containing polyurethane, -COOM group-containing polyester, COOM group-containing epoxy compound, COOM group-containing polyamic acid, -COOM group-containing acrylonitrile-butadiene copolymer, -COOM group Containing styrene-butadiene polymer, COOM group-containing polybutadiene, polybutyl alcohol (PVA), polyacrylamide, sodium polyacrylate, carboxymethylcellulose (CMC), hydroxyl cellulose (MRC), methylcellulose (MC), polyethylene glycol For example, hydroxide, polyethyleneimine, and the compound derivative may be used, but not limited thereto.
[0041] なお、上記親水性ポリマーに含有されるカルボキシル基の少なくとも一部を中和す るために使用される化合物としては、水酸ィ匕ナトリウムなどのアルカリ金属の水酸ィ匕 物、炭酸リチウム、炭酸カリウム、炭酸ナトリウムなどの炭酸アルカリ金属塩、カリウム —tーブトキサイド、ナトリウムメトキサイドなどのアルカリ金属のアルコキサイド、水酸 化カルシウム、水酸化マグネシウム、水酸化アルミニウムなどの多価金属の水酸化物 、アルミゥムイソプロポキサイドをはじめとする多価金属アルコキサイド、トリェチルアミ ン、トリ— n—プロピルァミンなどの第 3級ァミン、ジェチルァミン、ジ— n—プロピルァ ミンなどの第 2級ァミン、 n—プロピルァミンなどの第 1級ァミン、モルホリンなどの環状 ァミン、 N, N ジェチルアミノエチル (メタ)アタリレート、 N, N ジメチルアミノエチル (メタ)アタリレートなどのアミノ基含有 (メタ)アタリレート、炭酸アンモ-ゥムなどのアン モ -ゥム塩などを挙げることができる。 これらは、単独あるいは複数類組み合わせて使用してもよ 、。 The compound used to neutralize at least a part of the carboxyl group contained in the above-mentioned hydrophilic polymer includes hydroxides of alkali metals such as sodium hydroxide, carbonates and the like. Alkali metal carbonates such as lithium, potassium carbonate and sodium carbonate, hydroxides of alkali metals such as potassium tetrabutoxide and sodium methoxide, hydroxides of polyvalent metals such as calcium hydroxide, magnesium hydroxide and aluminum hydroxide , Polyvalent metal alkoxides such as aluminum isopropoxide, tertiary amine such as tolylamine, tri-n-propylamine, secondary amine such as jetlyamine, di-n-propylamine, n-propylamine, etc. Primary amines, cyclic amines such as morpholine, N, N Examples include amino group-containing (meth) atalylate such as noethyl (meth) atalylate, N, N dimethylaminoethyl (meth) atalylate, ammonium salts such as ammonium carbonate and the like. These may be used alone or in combination of two or more.
[0042] なお、上記親水性ポリマーは、 COOM基以外に親水部としてポリオキシアルキレ ン鎖を有して ヽてもよく、また架橋剤として作用できるようにエチレン性不飽和基を含 有していても良い。また、本発明において、親水性ポリマーとして、上記親水性ポリマ 一以外に、例えば水酸基、アミン基、スルホン酸基などの親水性基および zあるいは ポリオキシアルキレン鎖を有するポリマーなどを併用しても良い。  The above-mentioned hydrophilic polymer may have a polyoxyalkylene chain as a hydrophilic portion in addition to the COOM group, and may have an ethylenically unsaturated group so as to act as a crosslinking agent. May be In the present invention, as the hydrophilic polymer, in addition to the above hydrophilic polymer, for example, a polymer having a hydrophilic group such as a hydroxyl group, an amine group or a sulfonic acid group and z or a polyoxyalkylene chain may be used in combination. .
本発明の感光性組成物中の(サ)親水性ポリマーの配合量は、水現像性を必要と する場合には、水系現像性や耐水系インク性を考慮して好ましくは 5〜80重量%、さ らに好ましくは 7〜40重量%である。 5重量%未満では、水現像性に劣り、一方、 80 重量%を超えると、柔軟性が劣りカスレや印刷ムラの原因となり好ましくない。  The amount of the (h) hydrophilic polymer in the photosensitive composition of the present invention is preferably 5 to 80% by weight in consideration of water-based developability and water-resistant ink resistance when water developability is required. More preferably, it is 7 to 40% by weight. If the amount is less than 5% by weight, the water developability is inferior. If the amount is more than 80% by weight, the flexibility is inferior to cause blur and printing unevenness, which is not preferable.
[0043] そのほか、本発明の感光性組成物には、上記した必須成分のほかに、所望に応じ 種々の補助添加成分、例えば可塑剤、炭酸カルシウムなどの充填剤、他の熱可塑性 重合体、酸化防止剤、顔料、架橋剤、難燃剤、紫外線吸収剤、ハレーション防止剤、 光安定剤などを添加することができる。これらの補助添加成分の配合量は、本発明 の感光性組成物中に 5重量%以下である。  In addition to the above-described essential components, the photosensitive composition of the present invention may optionally contain various auxiliary additives such as plasticizers, fillers such as calcium carbonate, other thermoplastic polymers, Antioxidants, pigments, crosslinkers, flame retardants, UV absorbers, antihalation agents, light stabilizers and the like can be added. The compounding amount of these auxiliary additive components is 5% by weight or less in the photosensitive composition of the present invention.
[0044] このうち、可塑剤としては、ナフテン油、パラフィン油などの炭化水素油、液状ポリィ ソプレン、液状ポリブタジエンの変性物、液状アクリロニトリル ブタジエン共重合体、 液状スチレン ブタジエン共重合体、数平均分子量 2, 000以下のポリスチレン、セ バチン酸エステル、フタル酸エステルなどが挙げられる。  Among these, as plasticizers, hydrocarbon oils such as naphthenic oil and paraffin oil, liquid polystyrene, modified products of liquid polybutadiene, liquid acrylonitrile / butadiene copolymer, liquid styrene / butadiene copolymer, number average molecular weight 2 And polystyrenes, sebacates, phthalates and so on.
[0045] また、他の熱可塑性重合体としては、他のスチレン ブタジエン スチレンブロック 共重合体、スチレン イソプレン スチレンブロック共重合体のほ力、他の熱可塑性 エラストマ一、液状ゴムや熱可塑性榭脂、例えばスチレン ブタジエンゴムラテックス 、エチレン 酢酸ビュル共重合体、エチレン アクリル酸ェチル共重合体、ァタクチ ックポリプロピレン、シンジオタクチック 1, 2—ポリブタジエン榭旨、エチレン プロピ レンゴムなどの他の重合体が挙げられる。この場合、あら力じめ本発明の(ァ)〜 (ィ) 成分と上記他の熱可塑性重合体とを、任意の割合で混練りしたのち、ペレット化およ びまたは粉体ィ匕して使用することもできる。  Further, as other thermoplastic polymers, other styrene-butadiene-styrene block copolymers, styrene-isoprene-styrene-block copolymer, other thermoplastic elastomers, liquid rubber, thermoplastic resin, For example, other polymers such as styrene-butadiene rubber latex, ethylene-acetate-cobalt copolymer, ethylene-ethyl acetate copolymer, atactic polypropylene, syndiotactic 1,2-polybutadiene, ethylene propylene rubber and the like can be mentioned. In this case, the components (a) to (i) of the present invention and the other thermoplastic polymer are kneaded at an arbitrary ratio, pelletized and / or powdered. It can also be used.
[0046] さらに、感光性組成物中は、酸化防止剤 (抗酸化剤)として、ノユルフェノールを含 有せず、加水分解後ノユルフェノールを発生しない、リン系化合物、フエノール系化 合物およびラタトン系化合物の群力も選ばれた少なくとも 1種を含むことが好ましい。 このリン系化合物および Zまたはフエノール系化合物としては、例えば 2, 6 ジー t ブチルタレゾール、4, 6 ビス(ォクチルチオメチル)—o クレゾール、 1, 3, 5— トリメチルー 2, 4, 6 トリス(3, 5 ジ一 t ブチル 4 ヒドロキシベンジル)ベンゼ ン、 2, 2—メチレンビス(6— t—ブチルー 4 メチルフエノール)、ペンタエリスリトール テトラキス [3— (3, 5—ジ tーブチルー 4ーヒドロキシフエ-ル)プロピオネート]、ォ クタデシルー 3— (3, 5 ジ一 t—ブチル 4 ヒドロキシフエ-ル)プロピオネート、 2 — t ブチル 6— (3— t—ブチル 2 ヒドロキシ一 5—メチルベンジル) 4—メチ ルフエ-ルアタリレート、 2— [1— (2 ヒドロキシ— 3, 5 ジ— t ペンチルフエ-ル) ェチル] 4, 6—ジ—t—ペンチルフエ-ルアタリレート、 6—[3—(3—t ブチルー 4ーヒドロキシー5—メチル)プロポキシ ]—2, 4, 8, 10—テトラー tーブチルジベンズ [d, f] [l, 3, 2]ジォキサフォスフエピン、トリス(2, 4 ジ一 t ブチルフエ-ル)フォ スフアイト、テトラキス(2, 4 ジ一 t—ブチルフエ-ル) [1, 1—ビフエ-ル]— 4, 4, 一 ジィルビスフォスファイト、 2, 2—メチレンビス(4, 6 ジ一 t—ブチルフエ-ル)ォクチ ルフォスファイト、 3 ヒドロキシ一 5, 7 ジ一 tert—ブチル一フラン一 2—オンと o— キシレンとの反応生成物、 3 ヒドロキシ 5, 7 ジ—tert—ブチルーフラン 2—ォ ンと p キシレンとの反応生成物、 3—ヒドロキシ 5, 7—ジ tert—ブチルーフラン 2 オンと m—キシレンとの反応生成物、 3 ヒドロキシ 5, 7 ジ tert ブチル フラン 2—オンとトルエンとの反応生成物などである。 [0046] Furthermore, in the photosensitive composition, as the antioxidant (antioxidant), it contains phenol. It is preferable that at least one selected from the group consisting of phosphorus compounds, phenol compounds and ratatone compounds, which does not generate any phenol after hydrolysis, is also selected. Examples of this phosphorus compound and Z or phenol compound include 2,6 di-t-butyl taresol, 4,6 bis (octylthiomethyl) -o-cresol, 1,3,5-tri-methyl-2,4,6 tris. (3,5-di-t-butyl 4-hydroxybenzyl) benzene, 2,2-methylenebis (6-t-butyl-4 methylphenol), pentaerythritol tetrakis [3- (3,5-di-t-butyl-4-hydroxyphenyl) Propionate], Octadecyl- 3-(3, 5 di-t-butyl 4-hydroxyphenyl) propionate, 2-t-butyl 6- (3-t-butyl 2-hydroxyl 5- methylbenzyl) 4- methylphenyl Atarylate, 2- [1- (2-hydroxy-3,5 di-t pentyl phenyl) hexyl] 4, 6-di-tert-pentyl phenyl arylate, 6- [3- (3-t butyl-4-hydroxy- Five- Chill) propoxy]-2, 4, 8, 10-tetra-tert-butyldibenz [d, f] [l, 3, 2] diophosphosphepin, tris (2,4-di-t-butylphenyl) phosphate, Tetrakis (2, 4 di-t-butylphenyl) [1, 1-biphenyl] — 4, 4, di-bisbisphosphite, 2, 2- methylene bis (4, 6 di-t-butyl phenyl) Octyl phosphite, reaction product of 3-hydroxy-1,5-di-tert-butyl-furan-one and o-xylene, 3-hydroxy-5,7-di-tert-butyl-furan 2-one and p-xylene Products of the reaction, products of reaction of 3-hydroxy 5, 7-di-tert-butyl-furan 2-one with m-xylene, products of reaction of 3-hydroxy 5, 7-di-tert-butyl furan 2-one with toluene, etc. .
感光性組成物に用いられる上記酸ィ匕防止剤は、該感光性組成物中に、好ましくは 0. 2〜4. 0重量%、さらに好ましくは 0. 3〜3. 0重量%である。 0. 2重量%未満で は、ゲル量が多くなり小さな文字の鮮明さにかけ好ましくない。一方、 4. 0重量%を 超えると、光硬化速度が遅くなり好ましくない。  The above-mentioned antioxidizing agent used for the photosensitive composition is preferably 0.2 to 4.0% by weight, more preferably 0.3 to 3.0% by weight, in the photosensitive composition. If the amount is less than 0.2% by weight, the amount of gel increases, which is not preferable for the sharpness of small characters. On the other hand, when it exceeds 4.0% by weight, the light curing speed is unfavorably lowered.
なお、フエノール系化合物、リン系化合物およびラタトン系化合物以外の酸ィヒ防止 剤として、例えばィォゥ系化合物も併せて添加してもよい。また、光安定剤などの安 定剤を添加することもできる。光安定剤としては、ベンゾトリアゾール系、ベンゾフエノ ン系などの 、ずれでもよ 、。 [0048] 本発明の感光性組成物は、種々の方法で調製することができる。例えば、配合され る原料を適当な溶剤、例えばブチルアセテート、 3—メトキシブチルアセテートなどの エステル類、石油留分、デカリン、トルエンなどの炭化水素類、メチルェチルケトン、メ チルイソブチルケトンなどのケトン類、テトラヒドロフランなどのエーテル類やクロ口ホル ム、四塩化炭素、 1, 1, 1—トリクロルェタン、テトラクロルエチレン、トリクロルエチレン などの塩素系にプロパノール、ブタノール、ペンタノールなどのアルコール類を混合 した混合溶剤に溶解させて混合し、型枠の中に流し込み溶剤を蒸発させ、そのまま 板とすることができるし、この感光性組成物の板に加熱プレス処理すればより厚みの 精度のよい層が得られる。また、押出機や-一ダー、バンノ リーミキサーなどを用い て感光性組成物を混合した後に、熱プレス成形やカレンダー処理または押出成形に より所望の厚さを形成することが可能である。支持体や可とう性フィルム層は、シート 成形後ロールラミネートにより感光層に密着させることができる。ラミネート後に加熱プ レスして精度の良い感光層を得ることもできる。 As an acid inhibitor other than the phenolic compound, the phosphorus compound and the ratatone compound, for example, an ionic compound may be added together. In addition, stabilizers such as light stabilizers may be added. As light stabilizers, benzotriazole-based, benzophenone-based, etc., may be used. [0048] The photosensitive composition of the present invention can be prepared by various methods. For example, the raw material to be compounded is a suitable solvent such as esters such as butyl acetate and 3-methoxybutyl acetate, petroleum fractions, hydrocarbons such as decalin and toluene, ketones such as methyl ethyl ketone and methyl isobutyl ketone , Ethers such as tetrahydrofuran, chlorforms such as chloroform, carbon tetrachloride, 1, 1, 1-trichloroethane, tetrachlorethylene, trichlorethylene, etc. and alcohols such as propanol, butanol, pentanol etc. It is possible to dissolve it in a mixed solvent and mix it, pour it into a mold, evaporate the solvent, and leave it as a plate as it is. If the plate of this photosensitive composition is heat-pressed, the layer with higher thickness accuracy can be obtained. Is obtained. In addition, after the photosensitive composition is mixed using an extruder, a mixer, a Bantry mixer or the like, it is possible to form a desired thickness by hot press molding, calendering or extrusion. The support and the flexible film layer can be adhered to the photosensitive layer by roll lamination after sheet formation. After lamination, heat pressing can be performed to obtain a photosensitive layer with high accuracy.
[0049] なお、本発明の感光性組成物は、印刷版としての精度を維持するために、ポリエス テルなどの支持体をレリーフの反対側に設けても良い。 In the photosensitive composition of the present invention, a support such as a polyester may be provided on the opposite side of the relief in order to maintain the accuracy as a printing plate.
また、本発明の感光性組成物は、その組成によっては粘着性を生じるので、その上 に重ねられる透明画単体 (ネガフィルム)との接触性を良くするためと、その画像単体 の再利用を可能にするために、その表面に可とう性フィルム層を設けても良い。  Further, the photosensitive composition of the present invention may be tacky depending on its composition, so in order to improve the contact with the transparent picture simple substance (negative film) to be superimposed thereon, the reuse of the image simple substance is required. In order to make it possible, a flexible film layer may be provided on the surface.
[0050] 本発明の感光性組成物を光硬化するのに用いられる活性光線源としては、低圧水 銀灯、高圧水銀灯、紫外線蛍光灯、カーボンアーク灯、キセノンランプ、ジルコニウム ランプ、太陽光などがある。 As an actinic ray source used for photocuring the photosensitive composition of the present invention, a low pressure mercury lamp, a high pressure mercury lamp, an ultraviolet fluorescent lamp, a carbon arc lamp, a xenon lamp, a zirconium lamp, sunlight, etc. is there.
また、本発明の感光性組成物は、レーザーによる加工も可能である。レーザー発振 装置としては、主に炭酸ガスレーザーを使用することができる。  The photosensitive composition of the present invention can also be processed by a laser. A carbon dioxide gas laser can mainly be used as a laser oscillation device.
ここで、活性光線源の照射量は、通常、 10〜3, OOOmjZcm2の範囲である。 Here, the dose of the actinic radiation source is usually in the range of 10 to 3 , OOO mj Z cm 2 .
[0051] 本発明の感光性組成物に透明画像担体を通して活性光線を照射して画像を形成 させたあと、未露光部を溶出するのに用いられる現像液は、未露光部を良く溶解また は分散し、露光してできた画像部にはほとんど影響を与えないものがよい。 After the photosensitive composition of the present invention is irradiated with an actinic ray through a transparent image carrier to form an image, a developer used to elute the unexposed area dissolves the unexposed area well. It is preferable that the image area which has been dispersed and exposed is hardly affected.
例えば、溶剤系では、 1, 1, 1—トリクロルェタン、テトラクロルエチレンなどの塩素 系有機溶剤や、ブチルアセテート、 3—メチキシアセテートなどのエステル類、石油溜 分、トルエンなどの炭化水素類などやこれらにプロパノールゃブタノールなどのアル コール類を添加混合した物を例として挙げることができる。 For example, in the solvent system, chlorine such as 1, 1, 1-trichloroethane, tetrachlorethylene, etc. Examples include organic solvents, esters such as butyl acetate and 3-methyloxy acetate, petroleum fractions, hydrocarbons such as toluene, and mixtures thereof with alcohols such as propanol and butanol added thereto as an example. Can.
水系としては、水道水、井戸水、工業用水などの水であり、界面活性剤を含んでい ても含んでいなくてもよい。  The water system is water such as tap water, well water, industrial water and the like, and may or may not contain a surfactant.
未露光部の溶出はノズル力もの噴射によって、またはブラシによるブラッシングで行 われる。  Elution of the unexposed area is carried out by spraying with a nozzle force or by brushing with a brush.
実施例  Example
[0052] 以下、実施例を挙げて本発明をさらに具体的に説明する力 本発明は、これらの実 施例に限定されるものではない。  EXAMPLES The present invention will be described more specifically with reference to examples. The present invention is not limited to these examples.
なお、実施例中、部および%は、特に断らない限り重量基準である。  In the examples, parts and% are by weight unless otherwise specified.
また、実施例中の各種評価は、次のようにして求めたものである。  In addition, various evaluations in the examples are obtained as follows.
[0053] < (ァ)ブロック共重合体、(ィ)ブロック(共)重合体、あるいはこれらの混合物力もなる エラストマ一構成体の特性 > <(A) Block Copolymer, (i) Block (Co) Polymer, or a Mixture of These Also Properties of One Elastomer>
(1)重量平均分子量 (Mw)  (1) Weight average molecular weight (Mw)
重量平均分子量測定には、東ソ一社製、ゲルパーミエーシヨンクロマトグラフィー( HLC -8220)を用い、カラムはウォーターズ (Waters)社製のウルトラボンダゲル(U ltrabondagel) E750Aを用いた。溶媒にはテトラヒドロフランを使用し、測定条件は 温度 45°C、流速 1. OmlZ分、試料濃度 0. 1%、注入量 20 1で測定し、標準ポリス チレンで換算した値である。  For measurement of weight average molecular weight, gel permeation chromatography (HLC-8220) manufactured by Higashi Soichi Co., Ltd. was used, and Ultrabondagel E750A manufactured by Waters was used as a column. Tetrahydrofuran is used as the solvent, and the measurement conditions are a temperature of 45 ° C., a flow rate of 1. Oml Z, a sample concentration of 0.1%, an injection amount of 201, and a value converted with a standard polystyrene.
(2)結合スチレン含量  (2) bound styrene content
赤外分光分析装置 (パーキンエルマ一社製、フーリエ変換型赤外分光分析装置) を用い、波長 699cm_ 1の吸収強度力 検量線法により結合スチレンの含量を算出し た。 The content of bound styrene was calculated by the absorption intensity force calibration curve method at a wavelength of 699 cm 1 using an infrared spectrometer (Fourier transform type infrared spectrometer made by Perkin Elmer One ).
(3)ブタジエン中ビュル結合含量の定量分析  (3) Quantitative analysis of boule bond content in butadiene
上記で得られた、 450〜l,200cm_ 1を測定範囲として測定した分析結果を基に、 モレロ法にてブタジエン中のビュル結合含量を算出した。 Based on the analysis results obtained by measuring 450 to 1 , 200 cm.sup.- 1 obtained as described above, the boule bond content in butadiene was calculated by the Morello method.
[0054] (4)メルトフローレート [MFR(D)]の分析 本分析には、テスター産業社製、オートメルトインデクサ一 (TP-404型)を用いた。 分析試料は、上記エラストマ一構成体を JIS K7210の D法(190°C、 21. 2N荷重) に従い測定した。単位は、 gZlO分である。 (4) Analysis of Melt Flow Rate [MFR (D)] For this analysis, Automelt Indexer 1 (TP-404 type) manufactured by Tester Sangyo Co., Ltd. was used. The analysis sample measured the said one elastomer composition according to D method (190 degreeC, 21.2N load) of JISK7210. The unit is gZlO minutes.
(5)トルエン不溶分  (5) Toluene insolubles
ブロック(共)重合体 lOOgをトルエン 700ml〖こ溶解後、トルエン不溶分を 100メッシ ュ金網でろ過し測定した。  After dissolving 100 g of block (co) polymer lOOg in toluene, the insoluble matter in toluene was measured by filtration through a 100 mesh wire mesh.
(6)硬度  (6) Hardness
タイプ Aデュー口メーターにて、 JIS K6253に従い測定した。  It was measured according to JIS K6253 using a Type A Deuterus meter.
[0055] <感光性組成物の特性 > <Characteristics of Photosensitive Composition>
(7)画像現像性  (7) Image developability
実施例 1で示す方法で現像を行ったとき、非露光部の現像深さ 1mm程度で印刷画 像のネガに対応する凹凸形状が得られたものを〇とし、非露光部が現像されにくく現 像深さ 0. 7mm以下のものを Xとした。  When development was carried out according to the method described in Example 1, a non-exposed area is hardly developed and a non-exposed area is difficult to be developed, with a development depth of about 1 mm at the non-exposed area corresponding to the negative of the printed image. An image with a depth of 0.7 mm or less was X.
(8)小さな文字でも鮮明な印刷性  (8) Even small letters and clear printability
実施例 1で示す方法で現像を行ったとき、印刷画像のネガに対応する線幅にぉ ヽ て、 0. 1mm幅の凸細線の形状にゆがみ、太りがなぐネガと同一の幅で再現してい る場合を◎とし、 0. 2mm幅の凸細線の形状にゆがみ、太り力なく、ネガと同一の幅 で再現している場合を〇とし、 0. 2mm幅でほぼ再現されている場合を△、再現され ていない場合を Xとした。  When development is carried out by the method described in Example 1, the line width corresponding to the negative of the printed image is distorted to the shape of a convex thin line of 0.1 mm width, and reproduced in the same width as the fat-free negative. In the case of て い, the shape of the convex thin line of 0.2 mm width is distorted, the case of reproducing with the same width as the negative without fat power is 〇, and the case of being reproduced substantially in the width of 0.2 mm. 、, X was not reproduced.
[0056] (9)寸法安定性 (9) Dimensional stability
露光前のシートの寸法安定性を評価するため、大きさ 3 X 3cmのシート上に 720g の重りを乗せ、 40°C7日後の版厚の低下率 (%)を測定した。版厚低下率 (%)が 5% 以下のものを〇、 5%より大きなものを Xとした。  In order to evaluate the dimensional stability of the sheet before exposure, a weight of 720 g was placed on a sheet of 3 × 3 cm in size, and the reduction (%) of plate thickness after 7 days at 40 ° C. was measured. When the plate thickness reduction rate (%) is 5% or less, it is 〇, and when it is more than 5%, it is X.
(10)レーザー加工性  (10) Laser processability
密閉型炭酸ガスレーザー発振器 (米国シンラッド社製、出力; 25W)が搭載された レーザー加工機 [グレイト コンピュータ社(Great Computer Corporation)製、「 レーザー プロ(Laser Pro)」)にて、スピード(SPEED) 20 (%)、出力(POWER) 100 (%)、および解像度 1000 (dpi)として用いた。ここで、スピード 20 (%)とは、カロ ェ速度であり、 2. 5mmZsec〜1066mmZsecに可変できることから、 20 (%)は約 200mmZsecを意味する。また、出力は、最大 25Wで 0〜100 (%)可変であり、 10 0 (%)は 25Wを示す。 Sealed carbon dioxide laser oscillator (USA Shinraddo Co., output; 25W) at the mounted laser processing machine [Great Computer Corporation (Great Computer Corporation), manufactured by "Laser Pro (L ase r Pro)"), the speed ( SPEED was used as 20 (%), power (POWER) 100 (%), and resolution 1000 (dpi). Here, speed 20 (%) is 20 (%) means about 200 mm Zsec because it is a velocity and can be varied from 2.5 mm Zsec to 1066 mm Zsec. The output is variable from 0 to 100 (%) at a maximum of 25 W, and 10 0 (%) indicates 25 W.
(9)において作製されたシートをレーザー加工し、加工時の発炎、加工表面のベタ ツキ、臭気を評価した。「〇」は良いまたは無しを、「X」は悪いまたは大きいを意味す る。  The sheet produced in (9) was subjected to laser processing, and the flame generation during processing, the stickiness of the processed surface, and the odor were evaluated. "O" means good or none, "X" means bad or big.
実施例 1  Example 1
(ァ)ブロック共重合体、(ィ)ブロック(共)重合体、およびこれら力 なるエラストマ一 5¾ί本の 1¾告  (A) block copolymers, (i) block (co) polymers, and elastomers of these properties.
ジャケットと攪拌機の付いた内容積 100リットルのステンレス製重合容器を充分に窒 素で置換した後、シクロへキサン 50kg、スチレン 0. 8kgを仕込み、ジャケットに温水 を通して内容物を 40°Cとした。  After completely replacing the 100-liter stainless steel polymerization vessel with a jacket and a stirrer with nitrogen, 50 kg of cyclohexane and 0.8 kg of styrene were charged, and the contents were brought to 40 ° C. by passing warm water through the jacket.
次いで、 sec—ブチルリチウム 5. Ogを添カ卩して重合を開始した。スチレン重合完了 後、内容物温度が 80°Cになるように温調しながら、 1, 3—ブタジエン 6. 4kgをゆつく りと添加した。重合完了後、スチレン 0. 8kgを添加し、 30分間反応させた。反応後、 メタノール lmlを添加して、 10分撹拌した後、ブレンド容器に移液し、酸化防止剤で あるスミライザ一 BHT (住友ィ匕学工業社製)を 50g、ィルガノックス B220/FF (チノく' スペシャルティ ·ケミカルズ社製)を 50g添加した。  Then, 5.Og of sec-butyllithium was added to initiate polymerization. After completion of the styrene polymerization, 6.4 kg of 1,3-butadiene was slowly added with temperature control so that the content temperature would be 80.degree. After completion of polymerization, 0.8 kg of styrene was added and reacted for 30 minutes. After the reaction, 1 ml of methanol was added, and after stirring for 10 minutes, the mixture was transferred to a blending container, and 50 g of Sumilizer 1 BHT (manufactured by Sumitomo Chemical Co., Ltd.), which is an antioxidant, Irganox B220 / FF (CHINOKU) '50g of Specialty Chemicals was added.
さらに、ジャケットと攪拌機の付いた内容積 100リットルのステンレス製重合容器を 充分に窒素で置換した後、シクロへキサン 15kg、スチレン 0. 3kg、エチレングリコー ルジェチルエーテル 20gを仕込み、ジャケットに温水を通して内容物を 40°Cとした。 次いで、 sec—ブチルリチウム l lgを添加して重合を開始した。スチレン重合完了後 、内容物温度が 50°Cになるように温調しながら、 1, 3—ブタジエン 1. 7kgをゆっくりと 添加し、 30分間反応させた。反応後、メタノール 20mlを添加して、 10分撹拌した後 、ブレンド容器に移液し混合溶液を作製した。  Furthermore, after completely replacing the 100-liter stainless steel polymerization vessel with a jacket and a stirrer with nitrogen, 15 kg of cyclohexane, 0.3 kg of styrene, and 20 g of ethylene glycol acetyl ether are charged, and the contents are passed through warm water through the jacket. The temperature was 40 ° C. Then, 1 l of sec-butyllithium was added to initiate polymerization. After completion of the styrene polymerization, 1.7 kg of 1,3-butadiene was slowly added while the temperature was adjusted so that the content temperature became 50 ° C., and the reaction was allowed to proceed for 30 minutes. After the reaction, 20 ml of methanol was added, and after stirring for 10 minutes, the mixture was transferred to a blending vessel to prepare a mixed solution.
この混合溶液をスチームストリツビングし、溶媒を除去し含水クラムを得た。引き続き 、熱ロールにより脱水乾燥後、 50mm押出機によりペレツトイ匕し、エラストマ一構成体 (ハ一 1)を得た。 (ハ一 1)を得るために、ブロッキング防止剤としてステアリン酸カル シゥム(日東化成工業社製 Ca— St、コールターカウンタ一法で測定した平均粒径 = 12 m)を使用し、該エラストマ一構成体 (ノヽ— 1) 100gに対し 0. lg (PHR)添カロ した。表 1にその分析値、物性値を示した。 The mixed solution was steam-stripped and the solvent was removed to obtain a water-containing crumb. Subsequently, the resultant was dewatered and dried by a heat roll, and pelletized by a 50 mm extruder, to obtain an elastomer (1). Stearic acid as an antiblocking agent to obtain A shim (Ca-St manufactured by Nitto Kasei Kogyo Co., Ltd., average particle diameter measured by Coulter Counter = 12 m) was used, and 0.1 g (PHR) added to 100 g of the elastomer (No. 1). did. Table 1 shows the analysis values and physical property values.
[0058] 実施例 2〜6 Examples 2 to 6
(ァ)ブロック共重合体、 (ィ)ブロック(共)重合体、およびこれら力 なるエラストマ一 5¾ί本の 1¾告  (A) block copolymers, (i) block (co) polymers, and elastomers of these properties.
スチレン、 1, 3ブタジエン、 sec—ブチルリチウムの仕込量、ビニル調整剤としてェ チレングリコールジェチルエーテルを変量、およびブロッキング防止剤量を変更する 以外は、実施例 1と同様にして得た。結果を表 1〜2に示す。  It was obtained in the same manner as in Example 1 except that the charge of styrene, 1,3-butadiene and sec-butyllithium, ethylene glycol jetyl ether as a vinyl modifier, and the amount of antiblocking agent were changed. The results are shown in Tables 1 and 2.
[0059] 実施例 7 Example 7
 of
上記で得たエラストマ一構成体 (ノヽ— 1) 90部、 1, 6—へキサンジォールジアタリレ ート 8部、 2, 2—ジメトキシ一 2—フエニルァセトフエノン 1. 5部、 2, 6—ジ一 t—ブチ ルクレゾール 0. 5部を 3L-—ダ一にて 150°Cで混練りした。  One part of the elastomer obtained as described above (No. 1) 90 parts, 8 parts of 1, 6-hexanediarylate, 1.5 parts of 2, 2-dimethoxy-2-phenylacetophenone, 0.5 parts of 2, 6-di-t-butylcresol was kneaded at 150 ° C. in a 3 L-binder.
得られた感光性組成物を 3mm厚用シート金型に入れ、上下 0. 1mmのポリエステ ルフィルムではさみ、プレス機にて 130°Cで加熱後冷却して厚さ 3mmシートを成形し た。成形後、片方のポリエステルフィルムをはがし、紫外線露光機(日本電子精機社 製、 JE—A4— SS型)を用いて、硬化層の厚みを 1. 5mm程度となるように露光量 90 0 WZcm2で 2分間、露光した。次に、露光していない面のポリエステルフィルムを はがし、再現性評価用のネガフィルムを表面に密着させて、この面を前述の露光機 で、同様の露光量で 15分間露光した。ネガフィルムをはがし、トリクロロェタン Zイソ プロピルアルコール (混合比率 = 80Z20)の混合溶剤で未露光部分を溶解除去し た。その後、 50°Cで 30分乾燥し、未露光部分が除去された面を上記光源で、同様 の露光量で 10分間再露光し感光特性を評価した。結果を表 3に示す。 The obtained photosensitive composition was placed in a 3 mm-thick sheet mold, sandwiched between upper and lower 0.1 mm polyester films, heated at 130 ° C. with a press, and cooled to form a 3 mm-thick sheet. After molding, one of the polyester films is peeled off, and an exposure amount of 90 0 WZ cm 2 is achieved so that the thickness of the cured layer is about 1.5 mm using an ultraviolet exposure machine (manufactured by Nippon Denshi Seiki Co., Ltd., JE-A4-SS type). Exposed for 2 minutes. Next, the polyester film on the side not exposed was peeled off, the negative film for evaluation of reproducibility was brought into close contact with the surface, and this side was exposed for 15 minutes with the same exposure amount by the above-mentioned exposure machine. The negative film was removed, and the unexposed area was dissolved away with a mixed solvent of trichloroethene Z-isopropyl alcohol (mixing ratio = 80Z20). Thereafter, it was dried at 50 ° C. for 30 minutes, and the surface from which the unexposed area was removed was re-exposed for 10 minutes at the same exposure amount with the above light source to evaluate the photosensitive characteristics. The results are shown in Table 3.
[0060] 実施例 8〜12 [0060] Examples 8 to 12
糸且 の  Ito
実施例 7と同様の方法にて調製し、評価した。結果を表 3〜4に示す。  It was prepared and evaluated in the same manner as in Example 7. The results are shown in Tables 3 and 4.
[0061] 実施例 13〜14 糸且 の Examples 13 to 14 Ito
実施例 13はエラストマ一構成体 (ノヽ 2)を、実施例 14はエラストマ一構成体 (ノヽ 1)を用いた以外は、実施例 7と同様に感光性組成物を調製した。結果を表 5に示す  A photosensitive composition was prepared in the same manner as in Example 7, except that Example 13 used an elastomer (No. 2) and Example 14 used an elastomer (No. 1). The results are shown in Table 5
[0062] 実施例 15 Example 15
糸且 の  Ito
上記で得たエラストマ一構成体 (ノヽ—4) 50部、親水性ポリマー 40部、 1, 6 へキ サンジオールアタリレート 8部、 2, 2 ジメトキシ一 2 フエ-ルァセトフエノン 1. 5部、 2, 6 ジ— t—ブチルタレゾール 0. 5部を 3L-—ダ一にて 150°Cで混練りし、未露 光部の溶解除去溶剤として濃度 2%、温度 50°Cのポリオキシエチレンノユルフェ-ル エーテル水溶液を用いた以外は、実施例 7と同様の方法で感光特性およびレーザー 加工性を評価した。  50 parts of one elastomer (no. 4) obtained above, 40 parts of a hydrophilic polymer, 8 parts of a 1,6 hexanediol atalylate, 2,5 dimethoxy-l 2-phenylacetophenone 1.5 parts, 2, 0.5 parts of di-t-butyl taresol is kneaded at 150 ° C. in a 3 L mixer and dissolved as a solvent for removal of the unexposed part, 2% concentration, 50 ° C. at a temperature of 50 ° C. The photosensitive properties and the laser processability were evaluated in the same manner as in Example 7 except that an aqueous solution of phenyl ether was used.
なお、親水性ポリマーは、ポリビニルアルコール Zポリエチレングリコール共重合体 (へキストネ土製、 GE597)を使用した。結果を表 5に示す。  In addition, as a hydrophilic polymer, polyvinyl alcohol Z polyethylene glycol copolymer (manufactured by Heckiston Earth, GE597) was used. The results are shown in Table 5.
実施例 15より、親水性ポリマーを配合すると、本発明の感光性組成物は、水現像 性にも優れることが分かる。  From Example 15, it is understood that when a hydrophilic polymer is blended, the photosensitive composition of the present invention is also excellent in water developability.
[0063] 比較例 1 Comparative Example 1
エラストマ一構成体の製诰  Manufacturing of Elastomer-One Component
スチレン、 1, 3 ブタジエン、 sec ブチルリチウム、エチレングリコールジェチルェ 一テルの仕込量を変更して、(ァ)〜 (ィ)成分を調製するとともに、(ァ)成分と (ィ)成 分の配合割合を変量する以外は、実施例 1と同様の方法を用い、エラストマ一構成 体 (ヒ— 1)を得た。結果を表 6に示す。  The components (a) to (i) are prepared by changing the amounts of styrene, 1,3 butadiene, sec butyl lithium and ethylene glycol jetyl ether, and (a) component and (i) component Using the same method as in Example 1 except that the blending ratio was varied, a single elastomer (Hi) was obtained. The results are shown in Table 6.
[0064] 比較例 2〜3  Comparative Examples 2 to 3
ブロッキング防止剤の添加量を変更する以外には、比較例 1と同様にして、表 7に 示すエラストマ一構成体(ヒー 2)を得た。また、スチレン、 1, 3 ブタジエン、 sec ブ チルリチウムの仕込量を変更して、(ァ)〜 (ィ)成分を調製する以外は、実施例 1と同 様の方法を用い、エラストマ一構成体 (ヒー 3)を得た。結果を表 6に示す。  An elastomer-one composition (heat 2) shown in Table 7 was obtained in the same manner as in Comparative Example 1 except that the amount of the antiblocking agent added was changed. In addition, using the same method as in Example 1, except that the amounts of styrene, 1,3-butadiene and sec butyl lithium are changed to prepare the components (a) to (i), a single elastomer is produced. I got (He 3). The results are shown in Table 6.
[0065] 比較例 4〜6 糸且 の Comparative Examples 4 to 6 Ito
実施例 7と同様の方法にて調製し、感光特性、レーザー加工性を評価した。結果を 表 7に示す。  It prepared by the method similar to Example 7, and evaluated the photosensitive characteristic and laser processability. The results are shown in Table 7.
[表 1] [table 1]
Figure imgf000025_0001
Figure imgf000025_0001
* 1:ステアリン酸カルシウム * 1: Calcium stearate
表 2] Table 2]
Figure imgf000026_0001
Figure imgf000026_0001
* 1:ステアリン酸カルシウム * 1: Calcium stearate
表 3] Table 3]
Figure imgf000027_0001
Figure imgf000027_0001
*2:1, 6—へキサンジオールジアタリレート  * 2: 1, 6—Hexanediol diazallylate
*3:2, 2—ジメトキシ一 2—フエ-ルァセトフエノン *4:B— 2000 *5:2, 6—ジ一 t—ブチノレクレゾ一ノレ *6:GE597 * 3: 2, 2-Dimethoxy-l-phenylacetophenone * 4: B- 2000 * 5: 2, 6-di-t-butynorecreose-onele * 6: GE 597
表 4] Table 4]
Figure imgf000028_0001
Figure imgf000028_0001
*2:1, 6—へキサンジオールジアタリレート  * 2: 1, 6—Hexanediol diazallylate
*3:2, 2—ジメトキシ一 2—フエ-ルァセトフエノン *4:B— 2000 *5:2, 6—ジ一 t—ブチノレクレゾ一ノレ *6:GE597 * 3: 2, 2-Dimethoxy-l-phenylacetophenone * 4: B- 2000 * 5: 2, 6-di-t-butynorecreose-onele * 6: GE 597
[表 5] [Table 5]
Figure imgf000029_0001
Figure imgf000029_0001
*2:1, 6—へキサンジオールジアタリレート  * 2: 1, 6—Hexanediol diazallylate
*3:2, 2—ジメトキシ一 2—フエ-ルァセトフエノン *4:B— 2000 *5:2, 6—ジ一 t—ブチノレクレゾ一ノレ *6:GE597 * 3: 2, 2-Dimethoxy-l-phenylacetophenone * 4: B- 2000 * 5: 2, 6-di-t-butynorecreose-onele * 6: GE 597
表 6] Table 6]
Figure imgf000030_0001
Figure imgf000030_0001
* 1:ステアリン酸カルシウム * 1: Calcium stearate
[0072] [表 7] [Table 7]
Figure imgf000031_0001
Figure imgf000031_0001
*2:1, 6—へキサンジオールジアタリレート * 2: 1, 6—Hexanediol diazallylate
*3:2, 2—ジメトキシ一 2—フエ-ルァセトフエノン *4:B— 2000  * 3: 2, 2-Dimethoxy-1-2-Phacetophenone * 4: B-2000
*5:2, 6—ジ一 t—ブチノレクレゾ一ノレ *6:GE597  * 5: 2, 6-Di-t-Butyno lek Reso 1 Nore * 6: GE 597
[0073] 表 1〜2より、本発明の(ァ)ブロック共重合体および (ィ)ブロック(共)重合体を含む エラストマ一構成体である実施例 1〜6は、本発明の範囲内であり、流動性に優れ、 ゲル分(トルエン不溶分)が少なぐ硬度も 70以下である。また、表 3〜5より、これらの エラストマ一構成体を用いた感光性組成物である実施例 7〜実施例 15は、画像現像 性、小さな文字でも鮮明な印刷性、寸法安定性、レーザー加工性、水現像性が良好 であることがわかる。 From Tables 1 to 2, Examples 1 to 6, which are one elastomer component including the (a) block copolymer and the (i) block (co) polymer of the present invention, are within the scope of the present invention. Yes, the fluidity is excellent, and the hardness that the gel content (toluene insoluble content) is low is 70 or less. Also, from Tables 3 to 5, Examples 7 to 15 which are photosensitive compositions using one of these elastomer constructions have image developability, clear printability even with small characters, dimensional stability, laser processing It can be seen that the water resistance and water developability are good.
[0074] これに対し、表 6〜7に記載のように、比較例 1は、(ァ)ブロック共重合体と (ィ)プロ ック (共)重合体の配合割合が本発明の範囲外であり、このエラストマ一構成体を用 いた比較例 4の感光性組成物は、小さな文字での鮮明な印刷性、寸法安定性に劣る 。比較例 2は、(ァ)ブロック共重合体と (ィ)ブロック (共)重合体の配合割合が本発明 の範囲外であり、加えてブロッキング防止剤量が多いため、このエラストマ一構成体 を用いた比較例 5の感光性組成物は、小さな文字での鮮明な印刷性、寸法安定性 に加えて画像現像性も劣る。比較例 3は、(ァ)ブロック共重合体中の芳香族ビュル 化合物含量が本発明の範囲外であり、加えてエラストマ一構成単位の硬度が高すぎ 、このエラストマ一構成体を用いた比較例 6の感光性組成物は、小さな文字での鮮明 な印刷性、寸法安定性に劣る。 On the other hand, as described in Tables 6 to 7, in Comparative Example 1, the blend ratio of (a) block copolymer and (i) block (co) polymer is outside the scope of the present invention. The photosensitive composition of Comparative Example 4 using this elastomer-one composition is inferior in clear printability in small letters and dimensional stability. . In Comparative Example 2, since the blend ratio of (a) block copolymer and (i) block (co) polymer is out of the range of the present invention, and the amount of the antiblocking agent is large, The photosensitive composition of Comparative Example 5 used is inferior in image developability as well as sharp printability with small letters, dimensional stability. In Comparative Example 3, the content of the aromatic compound in the (a) block copolymer is out of the range of the present invention, and additionally, the hardness of one constituent unit of the elastomer is too high. The photosensitive composition of No. 6 is inferior in sharp printability in small letters and dimensional stability.
産業上の利用可能性 Industrial applicability
本発明の(ァ)ブロック共重合体および (ィ)ブロック(共)重合体を含むエラストマ一 構成体は、ゲル量が少な ヽことから凸版印刷版材用に好適である。  The elastomer composition comprising the (a) block copolymer and the (i) block (co) polymer of the present invention is suitable for use in letterpress printing plate materials since the amount of gel is small.
また、本発明の感光性組成物は、画像現像性、小さな文字でも鮮明な印刷性、寸 法安定性、レーザー加工性に優れ、親水性ポリマーを配合した場合にはさらに水現 像性にも優れているので、フレキソ印刷やレタープレス印刷に代表される凸版印刷用 の版材に使用され、主に、フィルム、ラベル、封筒、重袋、包装紙類、段ボールなどに 広く用いられている。  Further, the photosensitive composition of the present invention is excellent in image developability, clear printability even in small characters, dimensional stability, laser processability, and when a hydrophilic polymer is blended, it is further improved in water developability. Because of its superiority, it is used as a plate material for letterpress printing represented by flexo printing and letter press printing, and is widely used mainly for films, labels, envelopes, heavy bags, wrapping paper, corrugated cardboard and the like.

Claims

請求の範囲 The scope of the claims
[1] (ァ)少なくとも 2個の芳香族ビニルイ匕合物を主体とする重合体ブロックと、少なくとも 1個の共役ジェンを主体とする重合体ブロック力 なるブロック共重合体であって、該 ブロック共重合体中の全結合芳香族ビ-ルイ匕合物含量が 20〜40%であり、共役ジ ェンを主体とする重合体ブロック中のビュル結合含量が 10〜50%であり、かつゲル パーミエーシヨンクロマトグラフ(GPC)で測定した標準ポリスチレン換算のピーク分子 量が 70, 000〜300, 000であるブロック共重合体と、(ィ) 1個以上の共役ジェンを 主体とする重合体ブロックを必須とし、これと 1個以上の芳香族ビニル化合物重合体 ブロックを含むことのあるブロック(共)重合体であって、かつ該ブロック(共)重合体の 全結合芳香族ビ-ルイ匕合物含量力^〜 25%であって、共役ジェンを主体とする重合 体ブロック中のビュル結合含量が 10〜80%であり、ゲルパーミエーシヨンクロマトグラ フ(GPC)で測定した標準ポリスチレン換算のピーク分子量が 5, 000以上、 70, 000 未満であって、かつ(ァ)ブロック共重合体のピーク分子量の 1Z3未満であるブロック (共)重合体を、(ァ) Z (ィ)(重量比)=60〜95 5〜40の割合で含有するェラスト マー構成体。  [1] (a) A block copolymer comprising a polymer block mainly composed of at least two aromatic vinyl compounds and a polymer block unit mainly composed of at least one conjugated agent, wherein the block copolymer comprises And 20 to 40% of the total bonded aromatic vinyl compound content in the copolymer, and 10 to 50% of boule bond content in the polymer block mainly composed of conjugated diene, and a gel. A block copolymer having a peak molecular weight of 70,000 to 300,000 in terms of standard polystyrene measured by permeation chromatography (GPC), and a polymer block mainly composed of (i) one or more conjugated dienes. And a block (co) polymer which may contain one or more aromatic vinyl compound polymers and a totally bonded aromatic vinyl compound copolymer of the block (co) polymer. Content power ^ ~ 25%, and The boule bond content in the main polymer block is 10 to 80%, and the peak molecular weight in terms of standard polystyrene measured by gel permeation chromatography (GPC) is 5,000 or more and less than 70,000. And (a) a block (co) polymer having a peak molecular weight of less than 1Z3 of the block copolymer, in a ratio of (a) Z (i) (weight ratio) = 60 to 955 to 40. Mer composition.
[2] (ィ)ブロック(共)重合体の共役ジェンを主体とする共重合ブロック中のビュル結合 含量が 20〜80%である請求項 1記載のエラストマ一構成体。  [2] The elastomer composition according to claim 1, wherein the content of the boule bond in the copolymer block consisting mainly of the conjugated diene of the block (co) polymer is 20 to 80%.
[3] (ィ)ブロック(共)重合体の共役ジェンを主体とする共重合ブロック中のビュル結合 含量が 30〜80%である請求項 1または 2記載のエラストマ一構成体。 [3] The elastomer composition according to claim 1 or 2, wherein a boule bond content in a copolymer block mainly composed of a conjugated diene of a block (co) polymer is 30 to 80%.
[4] エラストマ一構成体の、 [4] of elastomer composition
(ゥ)メル卜フローレ一卜(190。C、 21. 2N)力 O. l〜20gZl〇分、  (ゥ) Mel 卜 レ レ レ レ (190. C, 21. 2 N) power O. l-20 g Z l o minutes,
(ェ)トルエン不溶分が 20ppm以下、および  (E) Toluene insoluble content is 20 ppm or less, and
(ォ) JIS K6253記載の硬度測定法タイプ A硬度が 30〜70であり、かつ (力)ブロッキング防止剤が該エラストマ一構成体 100重量部に対して 0. 2重量部 以下含有されている、  (O) Hardness measurement method according to JIS K6253 Type A hardness is 30 to 70, and (force) an antiblocking agent is contained in an amount of not more than 0.2 parts by weight with respect to 100 parts by weight of the single elastomer.
請求項 1〜3いずれか〖こ記載のエラストマ一構成体。  An elastomer as claimed in any one of claims 1 to 3.
[5] (ァ)ブロック共重合体中の全結合芳香族ビニルイ匕合物含量が 20〜35重量%であ り、かつ該ブロック共重合体のゲルパーミエーシヨンクロマトグラフ(GPC)で測定した 標準ポリスチレン換算のピーク分子量が 100, 000〜250, 000である請求項 1〜4[5] (a) The content of the total bonded aromatic vinyl compound in the block copolymer is 20 to 35% by weight, and it is determined by gel permeation chromatography (GPC) of the block copolymer The peak molecular weight in terms of standard polystyrene is 100,000 to 250,000.
Vヽずれかに記載のエラストマ一構成体。 V. The elastomer composition according to any one of the above.
[6] (ィ)ブロック(共)重合体のゲルパーミエーシヨンクロマトグラフ(GPC)で測定した標 準ポリスチレン換算のピーク分子量が 10, 000〜50, 000である請求項 1〜5いずれ かに記載のエラストマ一構成体。 [6] (i) The peak molecular weight in terms of standard polystyrene measured by gel permeation chromatography (GPC) of the block (co) polymer is from 10,000 to 50,000. The elastomer 1 structure of a statement.
[7] (キ)請求項 1〜6いずれかに記載のエラストマ一構成体、 [7] (K) An elastomer according to any one of claims 1 to 6,
(ク)光重合性不飽和単量体、および  (G) photopolymerizable unsaturated monomers, and
(ケ)光重合開始剤  (F) Photopolymerization initiator
を含有することを特徴とする感光性組成物。  A photosensitive composition characterized by containing.
[8] 感光性組成物中に、(キ)エラストマ一構成体が 10〜90重量%、(ク)光重合性不 飽和単量体が 1〜50重量%、(ケ)光重合開始剤が 0. 01〜: L0重量%〔ただし、(キ)[8] In the photosensitive composition, 10 to 90% by weight of (k) one elastomer component, (5) 1 to 50% by weight of (k) photopolymerizable unsaturated monomer, and (k) photopolymerization initiator 0.10 to 1: L0% by weight [but (i)
+ (ク) + (ケ) = 100重量%〕配合されている請求項 7記載の感光性組成物。 The photosensitive composition according to claim 7, wherein + (f) + (f) = 100% by weight].
[9] さらに、(コ)液状ポリブタジエンを含有する請求項 7または 8記載の感光性組成物。 [9] The photosensitive composition according to claim 7 or 8, further comprising (co) liquid polybutadiene.
[10] 感光性組成物中に、(コ)液状ポリブタジエンが 50重量%以下配合されている請求 項 9に記載の感光性組成物。 [10] The photosensitive composition according to Claim 9, wherein 50 wt% or less of (co) liquid polybutadiene is blended in the photosensitive composition.
[11] さらに、(サ)親水性ポリマーを含有する請求項 7〜10いずれかに記載の感光性組 成物。 [11] The photosensitive composition according to any one of claims 7 to 10, further comprising (j) a hydrophilic polymer.
[12] 感光性組成物中に、(サ)親水性ポリマーが 5〜80重量%配合されている請求項 1 1記載の感光性組成物。  12. The photosensitive composition according to claim 11, wherein 5 to 80% by weight of the hydrophilic polymer is blended in the photosensitive composition.
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6248744A (en) * 1985-07-18 1987-03-03 ダブリユ.アール.グレイス アンド カンパニー ― コネチカット Photosensitive elastomer composition
JPH09216918A (en) * 1995-12-06 1997-08-19 Nippon Zeon Co Ltd Hydrophilic copolymer, process for producing the same, photosensitive composition, and photosensitive rubber plate
JPH11335433A (en) * 1998-05-22 1999-12-07 Nippon Elastomer Kk New rubbery polymer, its production and resin composition of the same
JP2003066605A (en) * 2001-08-23 2003-03-05 Asahi Kasei Corp Photosensitive resin composition for flexographic printing
WO2003060009A1 (en) * 2002-01-10 2003-07-24 Japan Elastomer Co., Ltd. Block copolymer
WO2005123834A1 (en) * 2004-06-18 2005-12-29 Kraton Jsr Elastomers K.K. Block copolymer composition for asphalt modification, process for producing the same, and asphalt composition

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6248744A (en) * 1985-07-18 1987-03-03 ダブリユ.アール.グレイス アンド カンパニー ― コネチカット Photosensitive elastomer composition
JPH09216918A (en) * 1995-12-06 1997-08-19 Nippon Zeon Co Ltd Hydrophilic copolymer, process for producing the same, photosensitive composition, and photosensitive rubber plate
JPH11335433A (en) * 1998-05-22 1999-12-07 Nippon Elastomer Kk New rubbery polymer, its production and resin composition of the same
JP2003066605A (en) * 2001-08-23 2003-03-05 Asahi Kasei Corp Photosensitive resin composition for flexographic printing
WO2003060009A1 (en) * 2002-01-10 2003-07-24 Japan Elastomer Co., Ltd. Block copolymer
WO2005123834A1 (en) * 2004-06-18 2005-12-29 Kraton Jsr Elastomers K.K. Block copolymer composition for asphalt modification, process for producing the same, and asphalt composition

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US8791196B2 (en) 2009-03-31 2014-07-29 Zeon Corporation Adhesive composition for labels
US8470929B2 (en) 2009-03-31 2013-06-25 Zeon Corporation Composition for stretchable film
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