JP2007148322A - Photosensitive resin composition for flexographic printing - Google Patents
Photosensitive resin composition for flexographic printing Download PDFInfo
- Publication number
- JP2007148322A JP2007148322A JP2006042478A JP2006042478A JP2007148322A JP 2007148322 A JP2007148322 A JP 2007148322A JP 2006042478 A JP2006042478 A JP 2006042478A JP 2006042478 A JP2006042478 A JP 2006042478A JP 2007148322 A JP2007148322 A JP 2007148322A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive resin
- resin composition
- flexographic printing
- hydrocarbon
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000011342 resin composition Substances 0.000 title claims abstract description 54
- 239000004014 plasticizer Substances 0.000 claims abstract description 28
- 229930195733 hydrocarbon Natural products 0.000 claims abstract description 25
- 150000002430 hydrocarbons Chemical class 0.000 claims abstract description 25
- 239000004215 Carbon black (E152) Substances 0.000 claims abstract description 24
- 229920003244 diene elastomer Polymers 0.000 claims abstract description 15
- 239000000178 monomer Substances 0.000 claims abstract description 14
- 229920002725 thermoplastic elastomer Polymers 0.000 claims abstract description 14
- 239000003999 initiator Substances 0.000 claims abstract description 10
- 239000007788 liquid Substances 0.000 claims abstract description 8
- 239000011347 resin Substances 0.000 claims description 38
- 229920005989 resin Polymers 0.000 claims description 38
- 229920002554 vinyl polymer Polymers 0.000 claims description 13
- 229920001400 block copolymer Polymers 0.000 claims description 12
- 125000003118 aryl group Chemical group 0.000 claims description 11
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 9
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 7
- 239000013032 Hydrocarbon resin Substances 0.000 claims description 6
- 229920006270 hydrocarbon resin Polymers 0.000 claims description 6
- 230000009477 glass transition Effects 0.000 claims description 4
- 150000001491 aromatic compounds Chemical class 0.000 claims description 3
- 125000004122 cyclic group Chemical group 0.000 claims description 3
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 abstract description 15
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- 239000010410 layer Substances 0.000 description 22
- 239000002904 solvent Substances 0.000 description 17
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 16
- -1 benzyl dimethyl ketal Chemical compound 0.000 description 15
- 238000005984 hydrogenation reaction Methods 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
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- 150000001993 dienes Chemical class 0.000 description 6
- 150000003505 terpenes Chemical class 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 238000005227 gel permeation chromatography Methods 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
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- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
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- 230000015572 biosynthetic process Effects 0.000 description 4
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- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 4
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- 239000004793 Polystyrene Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 239000003759 ester based solvent Substances 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 229920002647 polyamide Polymers 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 238000012805 post-processing Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- GRWFGVWFFZKLTI-IUCAKERBSA-N (-)-α-pinene Chemical compound CC1=CC[C@@H]2C(C)(C)[C@H]1C2 GRWFGVWFFZKLTI-IUCAKERBSA-N 0.000 description 2
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- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 230000003078 antioxidant effect Effects 0.000 description 2
- 150000001728 carbonyl compounds Chemical class 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- 239000000806 elastomer Substances 0.000 description 2
- ANFZRGMDGDYNGA-UHFFFAOYSA-N ethyl acetate;propan-2-ol Chemical compound CC(C)O.CCOC(C)=O ANFZRGMDGDYNGA-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 230000002070 germicidal effect Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 2
- 239000000025 natural resin Substances 0.000 description 2
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
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- 238000003825 pressing Methods 0.000 description 2
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- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
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- 229950011008 tetrachloroethylene Drugs 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
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Images
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Abstract
【課題】優れた細線再現性および高いエステル溶剤耐性を同時に満たす感光性樹脂組成物の提供。
【解決手段】少なくとも熱可塑性エラストマー(a)、光重合性不飽和単量体(b)、炭化水素系可塑剤(c)、30℃で粘度が2000(Pa・s)以下の液状の共役ジエンゴム(d)および光重合開始剤(e)を含むフレキソ印刷用感光性樹脂組成物であって、炭化水素系可塑剤(c)の重量平均分子量が2000以下、不飽和結合量が0.5mol/100g以下、且つ20℃における屈折率が1.497以上であることを特徴とするフレキソ印刷用感光性樹脂組成物。
【選択図】なしProvided is a photosensitive resin composition that simultaneously satisfies excellent fine line reproducibility and high ester solvent resistance.
At least a thermoplastic elastomer (a), a photopolymerizable unsaturated monomer (b), a hydrocarbon plasticizer (c), and a liquid conjugated diene rubber having a viscosity of 2000 (Pa · s) or less at 30 ° C. A photosensitive resin composition for flexographic printing comprising (d) and a photopolymerization initiator (e), wherein the hydrocarbon-based plasticizer (c) has a weight average molecular weight of 2000 or less and an unsaturated bond amount of 0.5 mol / A photosensitive resin composition for flexographic printing, having a refractive index of 100 g or less and a refractive index at 20 ° C. of 1.497 or more.
[Selection figure] None
Description
本発明は、フレキソ印刷版に用いられる感光性樹脂組成物に関する。 The present invention relates to a photosensitive resin composition used for flexographic printing plates.
フレキソ印刷用の感光性樹脂組成物は、特許文献1や2に記載されるように、熱可塑性エラストマー、光重合性不飽和単量体、可塑剤および光重合開始剤を含有するものが一般的である。
フレキソ印刷版用の構成体としては、ポリエステルフィルムなどを支持体とし、その上に、上記の感光性樹脂組成物、さらに、必要に応じて感光性樹脂組成物の上にネガフィルムとの接触をなめらかにする目的で、スリップ層または保護層、もしくは赤外レーザーで切除可能な赤外線感受性物質を含む紫外線遮蔽層が設けられるのが一般的である。
このようなフレキソ印刷版用感光性構成体からフレキソ印刷版を製版するには、まず支持体を通して全面に紫外線露光を施し(バック露光)、薄い均一な硬化層を設け、次いでネガフィルムを通して、もしくは紫外線遮蔽層の上から直接、感光性樹脂層の面に画像露光(レリーフ露光)を行い、未露光部分を、現像用溶剤で洗い流すか、あるいは熱溶融後に吸収層で吸収除去後に、後処理露光することによって製造されるのが一般的である。
As described in Patent Documents 1 and 2, a photosensitive resin composition for flexographic printing generally contains a thermoplastic elastomer, a photopolymerizable unsaturated monomer, a plasticizer, and a photopolymerization initiator. It is.
As a structural body for flexographic printing plates, a polyester film or the like is used as a support, and on the photosensitive resin composition, a negative film is contacted on the photosensitive resin composition as necessary. For smoothing purposes, it is common to provide a slip layer or protective layer, or an ultraviolet shielding layer containing an infrared sensitive material that can be excised with an infrared laser.
In order to make a flexographic printing plate from such a photosensitive composition for a flexographic printing plate, first, the entire surface is exposed to ultraviolet rays (back exposure), a thin uniform cured layer is provided, and then through a negative film, or Image exposure (relief exposure) is performed directly on the surface of the photosensitive resin layer from above the UV shielding layer, and unexposed areas are washed away with a developing solvent, or absorbed and removed by an absorption layer after heat melting and post-process exposure. It is common to manufacture by doing.
フレキソ印刷用感光性樹脂版を用いた一般的な印刷は、凹凸のある樹脂版の凸部の表面に、インキ供給ロール等で、エステル溶剤等を含むインキを供給し、次に、樹脂版を被印刷体に接触させて、凸部表面のインキを被印刷体に転移させて行われる。
このようなフレキソ印刷においては、ネガフィルムに忠実な形状(解像力)が得られなかったり、エステル溶剤耐性がない場合、長時間印刷中に、印刷版が破壊されたり、膨潤して本来の絵柄でない部分まで、印刷されることがある。
このような感光性樹脂組成物に関し、種々の可塑剤が提案されている。
In general printing using a photosensitive resin plate for flexographic printing, an ink containing an ester solvent or the like is supplied to the surface of a convex portion of an uneven resin plate by an ink supply roll or the like. It is performed by bringing the ink on the surface of the convex portion into contact with the printing medium and transferring the ink on the surface of the convex portion to the printing medium.
In such flexographic printing, if the shape (resolution) faithful to the negative film is not obtained or the solvent is not resistant to ester solvent, the printing plate will be destroyed or swelled during printing for a long time. Some parts may be printed.
Various plasticizers have been proposed for such photosensitive resin compositions.
特許文献3には、耐溶剤性を向上するための可塑剤として、分子量が25000以上の分子中の不飽和結合量が多く、高価格な液状ポリイソプレンが用いられている。対照として実施例1には、炭化水素系可塑剤として屈折率が低いナフテンオイルが用いられている。また、実施例1〜9には、炭化水素系可塑剤として、不飽和結合量が多いスチレン系オリゴマーが用いられている。
特許文献4の実施例1〜3には、炭化水素系可塑剤として、屈折率の低い流動パラフィンが用いられている。
In Examples 1 to 3 of Patent Document 4, liquid paraffin having a low refractive index is used as the hydrocarbon plasticizer.
特許文献5には、エステル溶剤等を含むインキ耐性を向上するため、エラストマー樹脂、重量平均分子量が2000以下、不飽和結合量が0.5mol/100g以下、且つ20℃における屈折率が1.497以上の水素化テルペン樹脂、光重合性不飽和単量体、光重合開始剤および、必要に応じて、染料、顔料、重合禁止剤、酸化防止剤および光劣化防止剤を含む感光性樹脂組成物が提案されている。その例として、実施例には、スチレンイソプレンスチレンブロック共重合体、水素化テルペン樹脂、2種の光重合性モノマーおよび光重合開始剤として、ベンジルジメチルケタールを含む感光性樹脂組成物が示されている。 In Patent Document 5, an elastomer resin, a weight average molecular weight of 2000 or less, an unsaturated bond amount of 0.5 mol / 100 g or less, and a refractive index at 20 ° C. of 1.497 are used to improve ink resistance including an ester solvent. A photosensitive resin composition comprising the above hydrogenated terpene resin, photopolymerizable unsaturated monomer, photopolymerization initiator, and, if necessary, a dye, a pigment, a polymerization inhibitor, an antioxidant and a photodegradation inhibitor Has been proposed. For example, the examples show a photosensitive resin composition containing benzyl dimethyl ketal as a styrene isoprene styrene block copolymer, a hydrogenated terpene resin, two photopolymerizable monomers, and a photopolymerization initiator. Yes.
以上の通り、従来の技術では、熱可塑性エラストマー、光重合性不飽和単量体、重量平均分子量が2000以下で、分子中の不飽和結合量が低く、且つ屈折率が高い炭化水素系可塑剤、共役ジエンゴムおよび光重合開始剤を含むフレキソ印刷用感光性樹脂は知られていない。
本発明における技術的課題は、(1)印刷版の画像再現性が高く、および(2)エステル溶剤耐性を同時に満たす感光性樹脂組成物を提供することを目的とする。 It is an object of the present invention to provide a photosensitive resin composition that (1) has high image reproducibility of a printing plate and (2) simultaneously satisfies ester solvent resistance.
本発明者は、上記課題を解決するため鋭意研究を重ねた結果、下記の新規な感光性樹脂組成物を用いることで、該課題を解決できることを見出し、本発明をなすに至った。
すなわち、本発明は下記の通りである。
1.少なくとも熱可塑性エラストマー(a)、光重合性不飽和単量体(b)、炭化水素系可塑剤(c)、30℃で粘度が2000(Pa・s)以下の液状の共役ジエンゴム(d)および光重合開始剤(e)を含むフレキソ印刷用感光性樹脂組成物であって、炭化水素系可塑剤(c)の重量平均分子量が2000以下、不飽和結合量が0.5mol/100g以下、且つ20℃における屈折率が1.497以上であることを特徴とするフレキソ印刷用感光性樹脂組成物。
2.共役ジエンゴム(d)のビニル含有量が50mol%以上であることを特徴とする1.に記載のフレキソ印刷用感光性樹脂組成物。
3.共役ジエンゴム(d)のビニル含有量が70mol%以上であることを特徴とする1.または2.に記載のフレキソ印刷用感光性樹脂組成物。
4.感光性樹脂組成物中の炭化水素系可塑剤(c)の含有量が、6wt%〜30wt%であることを特徴とする1.〜3.のいずれかに記載のフレキソ印刷用感光性樹脂組成物。
As a result of intensive studies to solve the above-mentioned problems, the present inventor has found that the problems can be solved by using the following novel photosensitive resin composition, and has reached the present invention.
That is, the present invention is as follows.
1. At least a thermoplastic elastomer (a), a photopolymerizable unsaturated monomer (b), a hydrocarbon plasticizer (c), a liquid conjugated diene rubber (d) having a viscosity of 2000 (Pa · s) or less at 30 ° C., and A photosensitive resin composition for flexographic printing comprising a photopolymerization initiator (e), wherein the hydrocarbon-based plasticizer (c) has a weight average molecular weight of 2000 or less, an unsaturated bond amount of 0.5 mol / 100 g or less, and A photosensitive resin composition for flexographic printing, having a refractive index of 1.497 or more at 20 ° C.
2. 1. The vinyl content of the conjugated diene rubber (d) is 50 mol% or more. The photosensitive resin composition for flexographic printing described in 1.
3. 1. The vinyl content of the conjugated diene rubber (d) is 70 mol% or more. Or 2. The photosensitive resin composition for flexographic printing described in 1.
4). The content of the hydrocarbon plasticizer (c) in the photosensitive resin composition is 6 wt% to 30 wt%. ~ 3. The photosensitive resin composition for flexographic printing according to any one of the above.
5.熱可塑性エラストマー(a)が、芳香族を有するブロック共重合体であって、ブロック共重合体中の芳香族化合物の含有量が、28wt%以下であることを特徴とする請求項1.〜4.のいずれかに記載のフレキソ印刷用感光性樹脂組成物。
6.光重合性不飽和単量体(b)として、少なくとも、多官能(メタ)アクリレートを、感光性樹脂組成物中に3wt%以上含有することを特徴とする1.〜5.のいずれかに記載のフレキソ印刷用感光性樹脂組成物。
7.炭化水素系可塑剤(c)が、環状構造を有する炭化水素樹脂を水素添加して得られた樹脂であることを特徴とする1.〜6.のいずれかに記載のフレキソ印刷用感光性樹脂組成物。
8.炭化水素系可塑剤(c)のガラス転移温度が-20℃以上、且つ20℃の屈折率が1.510以上であることを特徴とする1.〜7.のいずれかに記載のフレキソ印刷用感光性樹脂組成物。
9.支持体と、その面上に形成された1.〜8.のいずれかに記載のフレキソ印刷用感光性樹脂組成物の層からなる積層構造を有するフレキソ印刷版用感光性構成体。
5. The thermoplastic elastomer (a) is an aromatic block copolymer, and the content of the aromatic compound in the block copolymer is 28 wt% or less. ~ 4. The photosensitive resin composition for flexographic printing according to any one of the above.
6). 1. As a photopolymerizable unsaturated monomer (b), at least polyfunctional (meth) acrylate is contained in the photosensitive resin composition in an amount of 3 wt% or more. ~ 5. The photosensitive resin composition for flexographic printing according to any one of the above.
7). 1. The hydrocarbon plasticizer (c) is a resin obtained by hydrogenating a hydrocarbon resin having a cyclic structure. ~ 6. The photosensitive resin composition for flexographic printing according to any one of the above.
8). 1. The glass transition temperature of the hydrocarbon plasticizer (c) is −20 ° C. or higher and the refractive index at 20 ° C. is 1.510 or higher. ~ 7. The photosensitive resin composition for flexographic printing according to any one of the above.
9. 1. Support and formed on its surface ~ 8. A photosensitive composition for flexographic printing plates having a laminated structure comprising a layer of the photosensitive resin composition for flexographic printing according to any one of the above.
本発明の感光性樹脂組成物は、印刷版の画像再現性が高く、およびエステル溶剤耐性を同時に満たす。 The photosensitive resin composition of this invention has high image reproducibility of a printing plate, and satisfy | fills ester solvent tolerance simultaneously.
以下、本願発明について具体的に説明する。
本発明における熱可塑性エラストマー(a)とは、高温で可塑化されて成型でき、常温ではゴム弾性体としての性質を示す高分子で、その中でも、製版時間の短縮化や印刷版の画像再現性の点で、芳香族を有する熱可塑性ブロック共重合体が好ましい。
芳香族を有する熱可塑性ブロック共重合体とは、少なくとも、ビニル芳香族炭化水素を主体とする重合体ブロックと、共役ジエンを主体とする重合体ブロックを有する。
本願において「主体」とは、70wt%以上を指す。
ビニル芳香族炭化水素としては例えばスチレン、P-メチルスチレン、第三級ブチルスチレン、α-メチルスチレン、1,1-ジフェニルエチレンなどが挙げられ、中でも入手性の点でスチレンが好ましい。
Hereinafter, the present invention will be specifically described.
The thermoplastic elastomer (a) in the present invention is a polymer that can be plasticized and molded at high temperatures and exhibits properties as a rubber elastic body at room temperature. Among them, shortening of plate making time and image reproducibility of printing plates In this respect, an aromatic thermoplastic block copolymer is preferred.
The thermoplastic block copolymer having an aromatic has at least a polymer block mainly composed of vinyl aromatic hydrocarbon and a polymer block mainly composed of conjugated diene.
In the present application, the “main body” refers to 70 wt% or more.
Examples of the vinyl aromatic hydrocarbon include styrene, P-methylstyrene, tertiary butylstyrene, α-methylstyrene, 1,1-diphenylethylene, and among them, styrene is preferable from the viewpoint of availability.
芳香族を有する熱可塑性ブロック共重合体中のビニル芳香族炭化水素の含有量は、未硬化樹脂構成体の耐コールドフロー性の点で、13wt%以上が好ましく、耐溶剤性の点で、28wt%以下が好ましい。14wt%〜25wt%の範囲がより好ましく、15wt%〜25wt%の範囲がさらに好ましい。
共役ジエンとしては、ブタジエンやイソプレンおよび/またはその水素添加物などが挙げられる。これらの単量体は、単独でも2種以上の併用でもよい。水素添加は、芳香族を有する熱可塑性ブロック共重合体の製造後に行っても良い。
この中でも表面の低粘着性化、印刷版の耐磨耗性あるいは耐カケの点で、ブタジエンおよび/またはその水素添加物が好ましい。
The content of the vinyl aromatic hydrocarbon in the thermoplastic block copolymer having an aromatic is preferably 13 wt% or more in terms of cold flow resistance of the uncured resin component, and 28 wt% in terms of solvent resistance. % Or less is preferable. The range of 14 wt% to 25 wt% is more preferable, and the range of 15 wt% to 25 wt% is more preferable.
Examples of the conjugated diene include butadiene and isoprene and / or a hydrogenated product thereof. These monomers may be used alone or in combination of two or more. Hydrogenation may be performed after the production of the aromatic block copolymer having aromatics.
Of these, butadiene and / or a hydrogenated product thereof is preferable from the viewpoints of lowering the tackiness of the surface, wear resistance of the printing plate, and anti-caking.
共役ジエンブロック中のビニル含有量としては、耐カケ性の点で、5wt%〜40wt%の範囲が好ましい。
必要に応じて、エチレンやプロピレンを主体とするブロックを含有しても良い。
芳香族を有する熱可塑性ブロック共重合体の構造は、製造の容易さより、直鎖状でも、3〜6分岐のラジアル状でも良い。
芳香族を有する熱可塑性ブロック共重合体中には、印刷版の柔軟性や耐カケ性の点で、ビニル芳香族炭化水素ブロックと共役ジエンブロックを有するジブロック体を10wt%以上含有することが好ましい。
The vinyl content in the conjugated diene block is preferably in the range of 5 wt% to 40 wt% from the viewpoint of anti-caking property.
If necessary, a block mainly composed of ethylene or propylene may be contained.
The structure of the aromatic block copolymer having an aromatic group may be linear or 3 to 6-branched radial form in terms of ease of production.
The thermoplastic block copolymer having aromatics may contain a diblock body having a vinyl aromatic hydrocarbon block and a conjugated diene block in an amount of 10 wt% or more from the viewpoint of flexibility and anti-caking property of the printing plate. preferable.
熱可塑性エラストマー(a)の重量平均分子量は、特に制限はないが、成型加工性と得られる感光性樹脂の固体維持性のバランスに優れるものが良く、ゲル浸透クロマトグラフィー(GPC)用いたポリスチレン換算標準ポリスチレン換算で8万〜40万が好ましい。
熱可塑性エラストマー(a)の感光性樹脂組成物中の含有量は、未硬化樹脂構成体の耐コールドフロー性や耐カケ性の点で、40wt%以上、柔軟性の点で、90wt%以下が好ましい。50wt%〜90wt%の範囲がより好ましく、60wt%〜85wt%の範囲がさらに好ましい。
必要に応じて、感光性樹脂組成物中に、20wt%以下であれば、その他のエラストマーを併用しても構わない。
The weight average molecular weight of the thermoplastic elastomer (a) is not particularly limited, but it should be excellent in the balance between molding processability and solid retention of the obtained photosensitive resin, and converted to polystyrene using gel permeation chromatography (GPC). 80,000 to 400,000 are preferable in terms of standard polystyrene.
The content of the thermoplastic elastomer (a) in the photosensitive resin composition is 40 wt% or more from the viewpoint of cold flow resistance and chipping resistance of the uncured resin structure, and 90 wt% or less from the viewpoint of flexibility. preferable. The range of 50 wt% to 90 wt% is more preferable, and the range of 60 wt% to 85 wt% is more preferable.
If necessary, another elastomer may be used in the photosensitive resin composition as long as it is 20 wt% or less.
本発明における光重合性不飽和単量体(b)とは、アクリル酸、メタクリル酸、フマル酸、マレイン酸などのエステル類、アクリルアミドやメタクリルアミドの誘導体、アリルエステル、スチレン及びその誘導体、N置換マレイミド化合物などがあげられる。
具体的な例としては、ヘキサンジオール、ノナンジオールなどのアルカンジオールのジアクリレート及びジメタクリレート、あるいはエチレングリコール、ジエチレングリコール、プロピレングリコール、ジプロピレングリコール、ポリエチレングリコール、ブチレングリコールのジアクリレート及びジメタクリレート、トリメチロールプロパントリ(メタ)アクリレート、ジメチロールトリシクロデカンジ(メタ)アクリレート、イソボロニル(メタ)アクリレート、フェノキシポリエチレングリコール(メタ)アクリレート、ペンタエリトリットテトラ(メタ)アクリレート、N,N’-ヘキサメチレンビスアクリルアミド及びメタクリルアミド、スチレン、ビニルトルエン、ジビニルベンゼン、ジアクリルフタレート、トリアリルシアヌレート、フマル酸ジエチルエステル、フマル酸ジブチルエステル、フマル酸ジオクチルエステル、フマル酸ジステアリルエステル、フマル酸ブチルオクチルエステル、フマル酸ジフェニルエステル、フマル酸ジベンジルエステル、マレイン酸ジブチルエステル、マレイン酸ジオクチルエステル、フマル酸ビス(3-フェニルプロピル)エステル、フマル酸ジラウリルエステル、フマル酸ジベヘニルエステル、N-ラウリルマレイミド等を挙げることができる。これらは単独で用いてもよいし、2種類以上を組み合わせて用いてもよい。
The photopolymerizable unsaturated monomer (b) in the present invention is an ester such as acrylic acid, methacrylic acid, fumaric acid, maleic acid, a derivative of acrylamide or methacrylamide, an allyl ester, styrene or a derivative thereof, N-substituted And maleimide compounds.
Specific examples include diacrylates and dimethacrylates of alkanediols such as hexanediol and nonanediol, or diacrylates and dimethacrylates of ethylene glycol, diethylene glycol, propylene glycol, dipropylene glycol, polyethylene glycol, butylene glycol, and trimethylol. Propane tri (meth) acrylate, dimethylol tricyclodecane di (meth) acrylate, isobornyl (meth) acrylate, phenoxypolyethylene glycol (meth) acrylate, pentaerythritol tetra (meth) acrylate, N, N'-hexamethylenebisacrylamide And methacrylamide, styrene, vinyl toluene, divinyl benzene, diacryl phthalate, triallyl cyanu , Diethyl fumarate, dibutyl fumarate, dioctyl fumarate, distearyl fumarate, butyl octyl fumarate, diphenyl fumarate, dibenzyl ester fumarate, dibutyl maleate, dioctyl maleate Bis (3-phenylpropyl) fumarate, dilauryl fumarate, dibehenyl fumarate, N-laurylmaleimide and the like. These may be used alone or in combination of two or more.
光重合性不飽和単量体(b)の含有量は、低すぎると、細かい点や文字の形成性が低下し、高すぎると、露光前の感光性樹脂版が積層されたときの耐コールドフロー性が低下し、印刷版の柔軟性が低下するため、感光性樹脂組成物中の1wt%〜20wt%の範囲が好ましい。
耐エステル溶剤性の点から、2官能以上の多官能(メタ)アクリレートを有する光重合性不飽和単量体を、3wt%〜15wt%の範囲で含有することが好ましい。5wt%〜15wt%の範囲がより好ましく、さらに、多官能アクリレートと多官能メタクリレートを併用するのが好ましい。
If the content of the photopolymerizable unsaturated monomer (b) is too low, the formation of fine dots and characters will be reduced. If it is too high, the cold resistance when the photosensitive resin plate before exposure is laminated will be reduced. Since the flowability is lowered and the flexibility of the printing plate is lowered, the range of 1 wt% to 20 wt% in the photosensitive resin composition is preferable.
From the viewpoint of resistance to ester solvents, it is preferable to contain a photopolymerizable unsaturated monomer having a polyfunctional (meth) acrylate having two or more functions in a range of 3 wt% to 15 wt%. The range of 5 wt% to 15 wt% is more preferable, and it is preferable to use a polyfunctional acrylate and a polyfunctional methacrylate in combination.
本発明に必須の炭化水素系可塑剤(c)とは、重量平均分子量が2000以下、不飽和結合量が0.5mol/100g以下、且つ20℃における屈折率が1.496以上であることを特徴とする炭化水素樹脂である。
炭化水素樹脂は、実質、炭素と水素からなる樹脂で、具体例としては、天然樹脂系のロジンあるいはテルペン、合成樹脂系の脂肪族(C5)樹脂、芳香族(C9)樹脂、共重合(C5+C9)樹脂、脂環族樹脂、クマロン・インデン樹脂あるいはスチレン系樹脂等および/またはそれらの水素添加樹脂が挙げられる。
天然樹脂系のロジンには、ガムロジン、重合ロジン、変性ロジンのグリセリンおよびペンタエリスリトールエスエル等、テルペンには、テルペン樹脂(α-ピネン、β-ピネン、ジペンテン系)、芳香族変性テルペン樹脂およびテルペンフェノール樹脂等が挙げられる。
The hydrocarbon plasticizer (c) essential for the present invention means that the weight average molecular weight is 2000 or less, the unsaturated bond amount is 0.5 mol / 100 g or less, and the refractive index at 20 ° C. is 1.496 or more. It is a featured hydrocarbon resin.
The hydrocarbon resin is substantially a resin composed of carbon and hydrogen. Specific examples thereof include natural resin rosin or terpene, synthetic resin aliphatic (C5) resin, aromatic (C9) resin, copolymer (C5 + C9). ) Resin, alicyclic resin, coumarone-indene resin, styrene resin, and / or their hydrogenated resins.
Natural resin-based rosins include gum rosin, polymerized rosin, modified rosin glycerin and pentaerythritol sell, etc. Terpenes include terpene resins (α-pinene, β-pinene, dipentene), aromatic modified terpene resins and terpene phenols Examples thereof include resins.
また、合成樹脂系の脂肪族(C5)樹脂には、イソプレンやピペリレン等の重合物、芳香族(C9)樹脂には、スチレン、ビニルトルエンあるいはインデン等の重合物、脂環族樹脂には、ジシクロペンタジエン等の重合物が挙げられる。
これらは、単独で用いてもよいし、2種類以上を混合して用いて良い。
本発明でいう「実質、炭素と水素からなる樹脂」とは、炭化水素樹脂中に、炭素および水素以外の窒素、酸素、硫黄あるいは塩素等の元素量が、1mol/100g未満を指す。耐エステル溶剤性の点で、0.5mol/100g未満が好ましく、0.2mol/100g未満がさらに好ましい。
Synthetic resin-based aliphatic (C5) resins include polymers such as isoprene and piperylene, aromatic (C9) resins include polymers such as styrene, vinyltoluene and indene, and alicyclic resins include Polymers such as dicyclopentadiene are exemplified.
These may be used alone or in combination of two or more.
In the present invention, “substantially a resin composed of carbon and hydrogen” refers to an amount of elements such as nitrogen, oxygen, sulfur or chlorine other than carbon and hydrogen in the hydrocarbon resin of less than 1 mol / 100 g. In terms of ester solvent resistance, it is preferably less than 0.5 mol / 100 g, more preferably less than 0.2 mol / 100 g.
このなかでも、耐エステル溶剤性のため、環状構造を有する炭化水素樹脂を水素添加(水添)して得られた樹脂が最も好ましい。
水添する方法としては、特に限定されるものではなく、例えば、パラジウム、ルテニウム、ロジウムなどの貴金属またはそれらを活性炭素、活性アルミナ、珪藻土などの坦体上に担持したものを触媒として使用して行う方法が挙げられる。
この時、粉末状の触媒を懸濁攪拌しながら反応を行うバッチ方式にすることも、成形した触媒を充填した反応塔を用いた連続方式にすることも可能であり、反応形式に特に制限はない。
Among these, a resin obtained by hydrogenating (hydrogenating) a hydrocarbon resin having a cyclic structure is most preferable because of resistance to ester solvents.
The hydrogenation method is not particularly limited, and for example, a noble metal such as palladium, ruthenium, rhodium or the like supported on a carrier such as activated carbon, activated alumina, or diatomaceous earth is used as a catalyst. The method of performing is mentioned.
At this time, it is possible to use a batch system in which the reaction is performed while suspending and stirring the powdered catalyst, or a continuous system using a reaction tower packed with the molded catalyst, and there are no particular restrictions on the reaction format. Absent.
水添の際、反応溶媒は用いなくてもよいが、通常、アルコール類、エーテル類、エステル類、飽和炭化水素類が使用される。
水添の際の反応温度は、特に限定されないが、通常20〜250℃、好ましくは、50〜200℃である。反応温度が20℃未満であると、水素化速度が遅くなり、一方、250℃を超えると、水添物の分解が多くなる恐れがある。
炭化水素系可塑剤(c)の重量平均分子量は、2000以下で、樹脂中に溶解し易く、透明性が高く、シャープな細線再現性が得られる。400〜1500の範囲がより好ましく、700〜1500の範囲がさらに好ましい。
In the hydrogenation, the reaction solvent may not be used, but alcohols, ethers, esters, and saturated hydrocarbons are usually used.
The reaction temperature during hydrogenation is not particularly limited, but is usually 20 to 250 ° C, preferably 50 to 200 ° C. When the reaction temperature is less than 20 ° C., the hydrogenation rate becomes slow. On the other hand, when the reaction temperature exceeds 250 ° C., decomposition of the hydrogenated product may increase.
The weight average molecular weight of the hydrocarbon-based plasticizer (c) is 2000 or less, is easily dissolved in the resin, has high transparency, and provides a sharp fine line reproducibility. The range of 400-1500 is more preferable, and the range of 700-1500 is further more preferable.
重量平均分子量は、ゲル浸透クロマトグラフィー(GPC)用いたポリスチレン換算から求めた値である。具体的には、HLC-8020(東ソー製GPC、商品名、カラムTSK-GEL-GMHXL)のRI検出器で分析し算出した。
炭化水素系可塑剤(c)の不飽和結合量は、0.5mol/100g以下で、耐エステル溶剤性が得られる。不飽和結合量が低い方が、耐エステル溶剤性がさらに高く、0.33mol/100g以下が好ましく、0.1mol/100g以下がより好ましい。
不飽和結合量は、炭化水素系可塑剤中の全不飽和結合量で、主鎖中や側鎖中の場所には依存しない。例えば、ベンゼン環の不飽和結合数は、3である。
The weight average molecular weight is a value determined from polystyrene conversion using gel permeation chromatography (GPC). Specifically, it was analyzed and calculated with an RI detector of HLC-8020 (GPC manufactured by Tosoh, trade name, column TSK-GEL-GMHXL).
The unsaturated bond amount of the hydrocarbon plasticizer (c) is 0.5 mol / 100 g or less, and ester solvent resistance is obtained. The lower the amount of unsaturated bonds, the higher the ester solvent resistance, preferably 0.33 mol / 100 g or less, more preferably 0.1 mol / 100 g or less.
The unsaturated bond amount is the total unsaturated bond amount in the hydrocarbon plasticizer and does not depend on the position in the main chain or side chain. For example, the number of unsaturated bonds in the benzene ring is 3.
不飽和結合量は、プロトンNMR(磁気共鳴スペクトル)より求めることができる。オレフィン性二重結合が存在する場合は、4.5〜6.0ppm付近にH-スペクトルが、ベンゼン環が存在する場合は、7.0ppm付近にH-スペクトルが現れ、それらの面積比より求めることができる。
炭化水素系可塑剤(c)の20℃における屈折率は、1.497以上で、印刷版の細線再現性および耐エステル溶剤性が得られる。1.510以上がより好ましく、1.520以上がさらに好ましい。
屈折率は、JIS(K0062)法で測定することができる。試料の平滑面が得られない場合は、キシレンに溶解し、30wt%、50wt%および70wt%の溶液状態で同様に測定し、100wt%の濃度に外挿して求めることができる。
The amount of unsaturated bonds can be determined from proton NMR (magnetic resonance spectrum). When an olefinic double bond is present, an H-spectrum appears in the vicinity of 4.5 to 6.0 ppm, and when a benzene ring is present, an H-spectrum appears near 7.0 ppm. be able to.
The refractive index of the hydrocarbon-based plasticizer (c) at 20 ° C. is 1.497 or more, and the fine line reproducibility and ester solvent resistance of the printing plate can be obtained. 1.510 or more is more preferable, and 1.520 or more is more preferable.
The refractive index can be measured by the JIS (K0062) method. If a smooth surface of the sample cannot be obtained, it can be obtained by dissolving in xylene, measuring in the same manner in a solution state of 30 wt%, 50 wt% and 70 wt%, and extrapolating to a concentration of 100 wt%.
炭化水素系可塑剤(c)のガラス転移温度は、印刷版の細線再現性、耐エステル溶剤性あるいは印刷時の微小な網点の濃度ムラを抑制する点で、−20℃以上が好ましい。0℃以上がより好ましく、20℃以上がさらに好ましい。
ガラス転移温度は、示差走査熱量測定(DSC)で測定することができる。
感光性樹脂組成物中の炭化水素系可塑剤(c)の含有量は、耐溶剤性の点で、6wt%以上が好ましく、微小画像の形成性の点で、30wt%以下が好ましい。8wt%〜25wt%の範囲がより好ましく、8wt%〜20wt%の範囲がさらに好ましい。
The glass transition temperature of the hydrocarbon-based plasticizer (c) is preferably −20 ° C. or higher in terms of fine line reproducibility of the printing plate, resistance to ester solvents, or suppression of uneven density of minute halftone dots during printing. 0 degreeC or more is more preferable, and 20 degreeC or more is further more preferable.
The glass transition temperature can be measured by differential scanning calorimetry (DSC).
The content of the hydrocarbon-based plasticizer (c) in the photosensitive resin composition is preferably 6 wt% or more from the viewpoint of solvent resistance, and preferably 30 wt% or less from the viewpoint of microimage formation. The range of 8 wt% to 25 wt% is more preferable, and the range of 8 wt% to 20 wt% is more preferable.
本発明に必須の30℃で粘度が2000(Pa・s)以下の液状の共役ジエンゴム(d)とは、分子中にジエンを80wt%以上含有し、アクリレート基やメタクリレート基の反応基を含まないものである。
粘度は、JIS−K−7117で、測定することができる。
ジエンとしては、入手性の点で、イソプレンおよび/またはブタジエンが好ましく、耐カケ性の点で、ブタジエンがより好ましい。
具体的には、ポリブタジエンやポリイソプレン等が挙げられる。
共役ジエンゴム(d)中のビニル含有量は、好ましくは、微小な画像の形成性や耐カケ性の点で高い方が良く、50mol%以上、70mol%以上がより好ましく、75mol%以上がさらに好ましい。〜共役ジエンゴム中のビニル含有量は、プロトンNMR(核磁気共鳴スペクトル)より求めることができる。
The liquid conjugated diene rubber (d) having a viscosity of 2000 (Pa · s) or less at 30 ° C., which is essential for the present invention, contains 80% by weight or more of diene in the molecule and does not contain a reactive group such as an acrylate group or a methacrylate group. Is.
The viscosity can be measured according to JIS-K-7117.
The diene is preferably isoprene and / or butadiene from the viewpoint of availability, and butadiene is more preferable from the viewpoint of anti-caking property.
Specific examples include polybutadiene and polyisoprene.
The vinyl content in the conjugated diene rubber (d) is preferably higher in terms of the ability to form a fine image and the anti-scratch property, more preferably 50 mol% or more, 70 mol% or more, and even more preferably 75 mol% or more. . The vinyl content in the conjugated diene rubber can be determined from proton NMR (nuclear magnetic resonance spectrum).
共役ジエンゴム(d)中の重量平均分子量は、取り扱い性と感光性樹脂組成物の相溶性の点で、低い方が良く、一方、耐カケ性の点で高い方が良く、1000〜50000の範囲が好ましく、2000〜30000の範囲がより好ましく、3000〜20000の範囲がさらに好まししい。 共役ジエンゴム(d)の含有量は、画像再現性、耐カケ性および柔軟性の点で、感光性樹脂組成物中に、3wt%以上が好ましく、印刷版用感光性構成体の固体維持性の点で、40wt%以下が好ましく、5wt%〜30wt%の範囲がより好ましく、7wt%〜20wt%の範囲がさらに好ましい。 The weight average molecular weight in the conjugated diene rubber (d) is preferably low in terms of handleability and the compatibility of the photosensitive resin composition, and on the other hand, it is preferably high in terms of anti-caking property, and ranges from 1000 to 50000. Is preferable, the range of 2000 to 30000 is more preferable, and the range of 3000 to 20000 is more preferable. The content of the conjugated diene rubber (d) is preferably 3 wt% or more in the photosensitive resin composition from the viewpoint of image reproducibility, anti-scratch property, and flexibility. In this respect, 40 wt% or less is preferable, a range of 5 wt% to 30 wt% is more preferable, and a range of 7 wt% to 20 wt% is more preferable.
本発明でいう光重合開始剤(e)とは、光のエネルギーを吸収し、ラジカルを発生する化合物であり、公知の各種のものを用いることが出来るが、各種の有機カルボニル化合物、特に芳香族カルボニル化合物が好適である。
具体例としては、ベンゾフェノン、4,4-ビス(ジエチルアミノ)ベンゾフェノ ン、t-ブチルアントラキノン、2-エチルアントラキノン、2,4-ジエチルチオキサントン、イソプロピルチオキサントン、2,4-ジクロロチオキサントン等のチオキサントン類;ジエトキシアセトフェノン、2-ヒドロキシ-2-メチル-1-フェニルプロパン-1-オ ン、ベンジルジメチルケタール、1-ヒドロキシシクロヘキシル-フェニルケトン、2-メチル-2-モルホリノ(4-チオメチルフェニル)プロパン-1-オン、2-ベンジル-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン等のアセトフェノン類;ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、ベンゾインイソブチルエーテル等のベンゾインエーテル類;2,4,6-トリメチルベンゾイルジフェニルホスフィンオキサイド、ビス(2,6-ジメトキシベンゾイル)-2,4,4-トリメチルペンチルホスフィンオキサイド、ビス(2,4,6- トリメチルベンゾイル)-フェニルホスフィンオキサイド等のアシルホスフィンオキサイド類;メチルベンゾイルホルメート;1,7-ビスアクリジニルヘプタン;9 -フェニルアクリジン;等が挙げられる。これらは単独で用いてもよいし、2種類以上を組み合わせて用いてもよい。
The photopolymerization initiator (e) referred to in the present invention is a compound that absorbs light energy and generates radicals, and various known compounds can be used, but various organic carbonyl compounds, particularly aromatic compounds. Carbonyl compounds are preferred.
Specific examples include thioxanthones such as benzophenone, 4,4-bis (diethylamino) benzophenone, t-butylanthraquinone, 2-ethylanthraquinone, 2,4-diethylthioxanthone, isopropylthioxanthone, and 2,4-dichlorothioxanthone; Ethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropane-1-one, benzyldimethyl ketal, 1-hydroxycyclohexyl-phenylketone, 2-methyl-2-morpholino (4-thiomethylphenyl) propane-1 Acetophenones such as 2-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone; benzoin ethers such as benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis (2,6-dimethoxybenzoyl) -2,4,4-trimethylpentylphosphine oxide, bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide Acyl phosphine oxides such as methylbenzoylformate, 1,7-bisacridinylheptane, 9-phenylacridine, and the like. These may be used alone or in combination of two or more.
光重合開始剤(d)の含有量は、低すぎると、細かい点や文字の形成性が低下し、高すぎると、紫外線等の活性光の透過率低下するため、感光性樹脂組成物中の1wt%〜5wt%の範囲が好ましい。1.5wt%〜4wt%の範囲がより好ましい。
また、所望に応じ種々の補助添加成分、例えば可塑剤、熱重合防止剤、紫外線吸収剤、ハレーション防止剤、光安定剤ならびに酸化防止剤などを添加することができる。
本発明の印刷版(2.84mm厚み)のショアーA硬度は、エステル溶剤を含有したインキを用いた印刷再現性あるいは耐エステル溶剤性の点で、45°以上が好ましい。50°以上がより好ましく、55°以上がさらに好ましい。
If the content of the photopolymerization initiator (d) is too low, the formation of fine spots and characters will be reduced, and if it is too high, the transmittance of active light such as ultraviolet rays will be reduced, so in the photosensitive resin composition The range of 1 wt% to 5 wt% is preferable. The range of 1.5 wt% to 4 wt% is more preferable.
Further, various auxiliary additive components such as a plasticizer, a thermal polymerization inhibitor, an ultraviolet absorber, an antihalation agent, a light stabilizer and an antioxidant can be added as desired.
The Shore A hardness of the printing plate (2.84 mm thickness) of the present invention is preferably 45 ° or more from the viewpoint of printing reproducibility using an ester solvent-containing ink or ester solvent resistance. 50 ° or more is more preferable, and 55 ° or more is more preferable.
本発明のフレキソ印刷版用構成体は、種々の方法で調製することができる。
例えば、感光性樹脂組成物の原料を適当な溶媒、例えばクロロホルム、テトラクロルエチレン、メチルエチルケトン、トルエン等の溶剤に溶解させて混合し、型枠の中に流延して溶剤を蒸発させ、そのまま板状にすることができる。また、溶剤を用いず、ニーダ、ロールミルあるいはスクリュウ押出機で混練後、カレンダーロールやプレスなどにより所望の厚さに成型することができるが、本発明はこれらの調製方法に限定されるものではない。
The flexographic printing plate composition of the present invention can be prepared by various methods.
For example, the raw material of the photosensitive resin composition is dissolved and mixed in a suitable solvent such as chloroform, tetrachloroethylene, methyl ethyl ketone, toluene, etc., and cast into a mold to evaporate the solvent. Can be made. Further, it can be molded to a desired thickness by a calender roll or a press after kneading with a kneader, roll mill or screw extruder without using a solvent, but the present invention is not limited to these preparation methods. .
感光性樹脂組成物は通常粘着性を有するので、製版時その上に重ねられるネガフィルムとの接触性をよくするために、或いはネガフィルムの再使用を可能にするために、樹脂層表面に溶剤可溶性の薄いたわみ性の保護層(例えば特公平5−13305号公報参照)を設けても良い。またこのたわみ性の保護層の代わりに、赤外線感受性物質を含む紫外線遮蔽層を設け、赤外線レーザーでの直接描画により、このたわみ性の層そのものをネガチブとして用いても良い。いずれの場合も露光が終了してから未露光部を洗い出しする際に、この薄いたわみ性の保護層も同時に除去される。 Since the photosensitive resin composition usually has adhesiveness, a solvent is applied to the surface of the resin layer in order to improve the contact property with the negative film superimposed on it during plate making or to enable reuse of the negative film. A soluble thin flexible protective layer (see, for example, Japanese Patent Publication No. 5-13305) may be provided. Instead of the flexible protective layer, an ultraviolet shielding layer containing an infrared sensitive substance may be provided, and the flexible layer itself may be used as a negative by direct drawing with an infrared laser. In any case, when the unexposed portion is washed out after the exposure is completed, the thin flexible protective layer is removed at the same time.
溶剤可溶な薄いたわみ性の保護層として、例えば洗い出し液に可溶性のポリアミド、部分ケン化ポリ酢酸ビニル、セルロースエステルなどの層を感光性樹脂層の表面に設けようとする場合には、これを適当な溶剤に溶かしてその溶液を直接感光性樹脂層にコーティングしてもよい。あるいはポリエステル、ポリプロピレン等のフィルムにコーティング(保護フィルム)し、その後この保護フィルムを感光性樹脂層にラミネートまたはプレス圧着して保護膜を転写させても良い。
保護フィルムや支持体は通常感光性樹脂組成物のシート成形後、ロールラミネートにより感光性樹脂組成物に密着させ、ラミネート後加熱プレスすると一層厚み精度の良い感光性樹脂層を得ることができる。
As a solvent-soluble thin flexible protective layer, for example, when a layer of polyamide, partially saponified polyvinyl acetate, cellulose ester or the like soluble in the washing solution is to be provided on the surface of the photosensitive resin layer, this is used. The photosensitive resin layer may be directly coated by dissolving in an appropriate solvent. Alternatively, the protective film may be transferred by coating (protective film) on a film of polyester, polypropylene, etc., and then laminating or press-pressing the protective film on the photosensitive resin layer.
The protective film and the support are usually adhered to the photosensitive resin composition by roll lamination after forming the sheet of the photosensitive resin composition, and a photosensitive resin layer with higher thickness accuracy can be obtained by heating and pressing after lamination.
フレキソ印刷版用感光性構成体からフレキソ印刷版を製版する一般的な方法としては、まず支持体を通して全面に紫外線露光を施し(バック露光)、薄い均一な硬化層を設け、次いでネガフィルムを通して、もしくは紫外線遮蔽層の上から直接、感光性樹脂層の面に画像露光(レリーフ露光)をおこない、未露光部分を現像用溶剤で洗い流すか、あるいは熱溶融後に吸収層で吸収除去後に、後処理露光することによって製造されるのが一般的である。
版表面の表面張力を変更するための画像露光として、200nm〜300nmの波長範囲の紫外線を露光後に、310nm〜400nmの波長範囲の紫外線で露光してもよい。
ネガフィルム側からの露光(レリーフ露光)と支持体側からの露光(バック露光)は、どちらを先におこなっても良いし、また両方を同時におこなってもよい。
As a general method for making a flexographic printing plate from a photosensitive composition for a flexographic printing plate, first, an ultraviolet exposure is performed on the entire surface through a support (back exposure), a thin uniform cured layer is provided, and then through a negative film, Alternatively, image exposure (relief exposure) is performed directly on the surface of the photosensitive resin layer from above the ultraviolet shielding layer, and the unexposed part is washed away with a developing solvent, or after heat-melting and absorbed and removed by the absorbing layer, post-processing exposure It is common to manufacture by doing.
As image exposure for changing the surface tension of the plate surface, ultraviolet light in a wavelength range of 200 nm to 300 nm may be exposed to ultraviolet light in a wavelength range of 310 nm to 400 nm.
Either the exposure from the negative film side (relief exposure) or the exposure from the support side (back exposure) may be performed first, or both may be performed simultaneously.
露光光源としては、高圧水銀灯、紫外線蛍光灯、カーボンアーク灯、キセノンランプあるいはダイオードランプ等があげられる。
未露光部を現像するのに用いられる現像溶剤としては、ヘプチルアセテート、3-メトキシブチルアセテート等のエステル類、石油留分、トルエン、デカリン等の炭化水素類やテトラクロルエチレン等の塩素系有機溶剤にプロパノール、ブタノール、ペンタノール等のアルコール類を混合したものをあげることができる。
現像溶剤による未露光部の洗い出しは、ノズルからの噴射によって、またはブラシによるブラッシングでおこなわれる。
後処理露光として、表面に波長300nm以下の光を照射する方法が一般的である。必要に応じて、300nmよりも大きい光も併用しても構わない。
Examples of the exposure light source include a high pressure mercury lamp, an ultraviolet fluorescent lamp, a carbon arc lamp, a xenon lamp, and a diode lamp.
Developer solvents used to develop unexposed areas include esters such as heptyl acetate and 3-methoxybutyl acetate, hydrocarbons such as petroleum fractions, toluene and decalin, and chlorinated organic solvents such as tetrachloroethylene. And a mixture of alcohols such as propanol, butanol and pentanol.
Washing out the unexposed area with the developing solvent is performed by jetting from a nozzle or by brushing with a brush.
As post-processing exposure, a method of irradiating the surface with light having a wavelength of 300 nm or less is common. If necessary, light larger than 300 nm may be used in combination.
以下、参考例、実施例、及び比較例により本発明についてより具体的に説明するが、本発明はこれらの実施例に限定されるものではない。 Hereinafter, the present invention will be described more specifically with reference examples, examples, and comparative examples, but the present invention is not limited to these examples.
[参考例]
(1)熱可塑性エラストマーAの合成
ジャケットと攪拌機の付いた10Lステンレス製反応器を充分窒素置換した後、シクロヘキサン7000cc、テトラヒドロフラン1g、N、N、N’、N’-テトラメチルエチレンジアミン0.8g、スチレン170gを仕込み、ジャケットに温水を通水して内容物を約70℃に設定した。この後、n-ブチルリチウムシクロヘキサン溶液(純分で1.15g)を添加し、スチレンの重合を開始した。スチレンが完全に重合してから、ブタジエン(1,3-ブタジエン)830gを添加して重合を継続し、ブタジエンの重合が完全に終了4分後、テトラメトキシシラン0.83gを添加し、カップリング反応させた。得られたブロック共重合体溶液の一部をサンプリングし、その後溶媒を加熱除去した。該ポリマーは,スチレン含量が17重量%,ポリプタジエン部の1,2ビニル結合量が35重量%であった。
尚、スチレン含有量は紫外分光分析法(UV)を用いて測定した。また、ビニル結合量は赤外分析法(IR)を用いて測定し、ハンプトン法により算出した。
[Reference example]
(1) Synthesis of thermoplastic elastomer A 10 L stainless steel reactor equipped with a jacket and a stirrer was sufficiently purged with nitrogen, and then 7000 cc of cyclohexane, 1 g of tetrahydrofuran, N, N, N ′, 0.8 g of N′-tetramethylethylenediamine, 170 g of styrene was charged, and warm water was passed through the jacket to set the contents at about 70 ° C. Thereafter, an n-butyllithium cyclohexane solution (1.15 g in pure content) was added to initiate styrene polymerization. After styrene is completely polymerized, 830 g of butadiene (1,3-butadiene) is added and polymerization is continued. After 4 minutes of complete polymerization of butadiene, 0.83 g of tetramethoxysilane is added and coupled. Reacted. A part of the obtained block copolymer solution was sampled, and then the solvent was removed by heating. The polymer had a styrene content of 17% by weight and a 1,2-vinyl bond content of the polyptadiene part of 35% by weight.
The styrene content was measured using ultraviolet spectroscopic analysis (UV). The vinyl bond amount was measured using infrared analysis (IR) and calculated by the Hampton method.
次に,残りのブロック共重合体溶液を用いて、ビスシクロペンタジェニルチタニウムクロリドとn-ブチルリチウムを水添触媒として、温度70℃で水素添加を行った。水素添加率は,供給する水素ガス量を流量計で測定し、目標水添率を達成した時点でガスの供給を止めることでコントロールした。その後、水を10gを添加、攪拌後、n-オクタデシル-3-(3’,5’ジ-tert-ブチル-4’-ヒドロキシフェニル)プロピオネートを3.0g、2,4-ビス(n-オクチルチオメチル)-O-クレゾールを1.5g添加し、得られた該溶液をスチームストリッピングすることにより、溶媒を除去し含水クラムを得た。引き続き、熱ロールにより脱水乾燥させ、ブタジエン中の水素添加率15%の熱可塑性エラストマーのサンプルを得た。水素添加率は、核磁気共鳴装置(NMR)を用いて確認した。 Next, using the remaining block copolymer solution, hydrogenation was performed at a temperature of 70 ° C. using biscyclopentagenyl titanium chloride and n-butyl lithium as a hydrogenation catalyst. The hydrogenation rate was controlled by measuring the amount of hydrogen gas supplied with a flow meter and stopping the gas supply when the target hydrogenation rate was achieved. Thereafter, 10 g of water was added, and after stirring, 3.0 g of n-octadecyl-3- (3 ′, 5′di-tert-butyl-4′-hydroxyphenyl) propionate, 2,4-bis (n-octyl) 1.5 g of (thiomethyl) -O-cresol was added, and the resulting solution was subjected to steam stripping to remove the solvent and obtain a hydrous crumb. Subsequently, it was dehydrated and dried with a hot roll to obtain a sample of a thermoplastic elastomer having a hydrogenation rate of 15% in butadiene. The hydrogenation rate was confirmed using a nuclear magnetic resonance apparatus (NMR).
(2)感光性樹脂組成物および感光性構成体の作成
感光性樹脂組成として、表1と表3に示した組成をニーダーにて140℃で60分間混合し感光性樹脂組成物を得た。
得られた感光性樹脂組成物を、熱可塑性エラストマーを含有する接着剤がコートされた厚さ125μのポリエステルフィルムの支持体と、厚さ4μのポリアミド層を有する100μのポリエステル製カバーシートとで挟み、3mmのスペーサーを用いてプレス機で130℃の条件で200kg/cm2の圧力を4分間かけてフレキソ印刷版用感光性構成体を成形した。
(2) Preparation of photosensitive resin composition and photosensitive structure As the photosensitive resin composition, the compositions shown in Tables 1 and 3 were mixed in a kneader at 140 ° C. for 60 minutes to obtain a photosensitive resin composition.
The obtained photosensitive resin composition is sandwiched between a support of a 125 μm thick polyester film coated with an adhesive containing a thermoplastic elastomer and a 100 μm polyester cover sheet having a 4 μm thick polyamide layer. The photosensitive structure for flexographic printing plates was molded using a 3 mm spacer with a press machine at 130 ° C. and a pressure of 200 kg / cm 2 for 4 minutes.
(3)フレキソ印刷版の作成
(2)のフレキソ印刷版用感光性構成体のカバーシートをはぎとり、感光性樹脂層の上にあるポリアミドの保護膜層の上にネガフィルムを密着させ、AFP−1500露光機(旭化成ケミカルズ製、商品名)上で370nmに中心波長を有する紫外線蛍光灯を用いて、まず支持体側から300mJ/cm2の全面露光をおこなった後、引き続きネガフィルムを通して6000mJ/cm2の画像(レリーフ)露光をおこなった。
このときの露光強度をオーク製作所製のUV照度計MO-2型機でUV-35フィルターを用いて、バック露光を行なう側である下側ランプからの紫外線をガラス板上で測定した強度は10.3mW/cm2、レリーフ露光側である上側ランプからの紫外線を測定した強度は12.5mW/cm2であった。
(3) Preparation of flexographic printing plate Remove the cover sheet of the photosensitive composition for flexographic printing plate of (2), and adhere a negative film on the polyamide protective film layer on the photosensitive resin layer. Using an ultraviolet fluorescent lamp having a central wavelength of 370 nm on a 1500 exposure machine (trade name, manufactured by Asahi Kasei Chemicals), first, an entire exposure of 300 mJ / cm 2 was performed from the support side, and then an image of 6000 mJ / cm 2 was passed through a negative film. (Relief) Exposure was performed.
The exposure intensity at this time was measured by measuring UV rays from the lower lamp on the side of the back exposure on a glass plate using a UV-35 filter with a UV illuminance meter MO-2 manufactured by Oak Manufacturing Co., Ltd. .3 mW / cm.sup.2, and the intensity of ultraviolet rays measured from the upper lamp on the relief exposure side was 12.5 mW / cm.sup.2.
ついで、3-メトキシブチルアセテートを現像液として、AFP-1500現像機(旭化成ケミカルズ製、商品名)の回転するシリンダーに版を両面テープで貼り付けて、液温25℃で5分間現像をおこない、60℃で2時間乾燥させた。その後、後処理露光として、254nmに中心波長をもつ殺菌灯を用いて版表面全体に2000mJ/cm2、続いて紫外線蛍光灯を用いて1000mJ/cm2の露光を行なってフレキソ印刷版を得た。なおここで殺菌灯による後露光量は、MO-2型機のUV-25フィルターを用いて測定された照度から算出したものである。 Next, using 3-methoxybutyl acetate as a developer, the plate was attached to a rotating cylinder of an AFP-1500 developing machine (trade name, manufactured by Asahi Kasei Chemicals) with double-sided tape, and developed at a liquid temperature of 25 ° C. for 5 minutes. Dry at 60 ° C. for 2 hours. Thereafter, as a post-processing exposure, the entire plate surface was exposed to 2000 mJ / cm 2 using a germicidal lamp having a central wavelength at 254 nm, and then exposed to 1000 mJ / cm 2 using an ultraviolet fluorescent lamp to obtain a flexographic printing plate. Here, the post-exposure amount with the germicidal lamp is calculated from the illuminance measured using the UV-25 filter of the MO-2 type machine.
(4)評価方法
4−1)画像再現性
(4−1−1)細線の再現性
(3)で得られたレリーフ画像の500μm幅の凹細線と凸細線の形状を、顕微鏡を用いて評価した。凹細線の溝が深く、且つ凸細線がシャープで太りがないものが良く、○とし、凹細線の溝が浅く、凸細線がシャープでなく太った場合は問題で、×とした。
(4−1−2)微小画像の形成性
(3)で得られたレリーフ画像の59線(1/cm)の1%のハイライト部を、顕微鏡を用いて評価した。形成していれば良く、○とし、形成していなければ、問題で、×とした。
(4) Evaluation Method 4-1) Image Reproducibility (4-1-1) Fine Line Reproducibility The shape of the 500 μm wide concave and convex fine lines of the relief image obtained in (3) was evaluated using a microscope. did. It is preferable that the groove of the concave fine wire is deep and the convex fine wire is sharp and not thick, and it is marked with ◯, and when the groove of the concave thin wire is shallow and the convex fine wire is not sharp and thick, it is x.
(4-1-2) Formability of Micro Image A 1% highlight portion of 59 lines (1 / cm) of the relief image obtained in (3) was evaluated using a microscope. If it was formed, it was good, and if it was not formed, it was a problem.
(4−2)エステル溶剤耐性
(4−2−1)厚み変化
(4)で得られた印刷版を20wt%酢酸エチル-イソプロピルアルコール溶液に、25℃で6時間浸漬後の厚み変化量a(mm)=(浸漬後の厚み-初期厚み)と、浸漬後に取り出し50℃で7日間乾燥したときの厚み変化b(mm)=(初期厚み-乾燥後厚み)の和(a+b)を測定し、厚み変化が小さい方が、エステル溶剤耐性が高く、最もよいものを◎、次に良いものを○、厚み変化の大きいものを×とした。
(4−2−2)耐カケ性
印刷版が溶剤インキに膨潤したときの版上にある文字部の機械的強度を以下のモデル実験で評価した。(4)で得られた図1に示すような8ポイントから12ポイントの大きさの文字がある印刷版を、20wt%酢酸エチル-イソプロピルアルコール溶液に、4時間浸漬後に、NP式耐刷力試験機(新村印刷株製、商品名、接触体:布、荷重1kg)を用いて、100回左右に擦った後に、文字の破壊の程度を顕微鏡で観察した。、8ポイントの文字のみ破壊した場合は次に良く、○とし、10ポイントの文字が破壊した場合はその次に良く、○‘とし、12ポイントの文字も破壊した場合は、×とした。
(4-2) Resistance to ester solvent (4-2-1) Change in thickness (4) Thickness change a after immersion of the printing plate obtained in (4) in a 20 wt% ethyl acetate-isopropyl alcohol solution at 25 ° C for 6 hours mm) = (thickness after immersion−initial thickness) and the sum (a + b) of thickness change b (mm) = (initial thickness−thickness after drying) when taken out after immersion and dried at 50 ° C. for 7 days, The smaller the change in the thickness, the higher the ester solvent resistance. The best one was ◎, the next best one was ○, and the one with the largest thickness change was ×.
(4-2-2) Scratch resistance The mechanical strength of the character portion on the plate when the printing plate was swollen by the solvent ink was evaluated by the following model experiment. NP-type printing durability test after immersing the printing plate with characters of 8 to 12 points as shown in FIG. 1 obtained in (4) in a 20 wt% ethyl acetate-isopropyl alcohol solution for 4 hours. Using a machine (manufactured by Shinmura Printing Co., Ltd., trade name, contact body: cloth, load 1 kg), after rubbing 100 times left and right, the degree of destruction of the characters was observed with a microscope. When only 8 point characters were destroyed, it was next better, ○, when 10 point characters were destroyed, next better, ○ ', and when 12 point characters were also destroyed, ×.
[実施例1〜3、比較例1〜4]
実施例1〜3、比較例1〜4の評価試験結果を表2に記載する。
熱可塑性エラストマー、光重合性不飽和単量体、重量平均分子量が2000以下、不飽和結合量が0.5mol/100g以下、且つ屈折率が1.497以上の炭化水素系可塑剤、液状の共役ジエンゴムおよび光重合開始剤を含有することで、初めて、優れた再現性および高いエステル溶剤耐性を同時に満たせることが分かる。
[Examples 1 to 3, Comparative Examples 1 to 4]
The evaluation test results of Examples 1 to 3 and Comparative Examples 1 to 4 are shown in Table 2.
Thermoplastic elastomer, photopolymerizable unsaturated monomer, hydrocarbon-based plasticizer having a weight average molecular weight of 2000 or less, an unsaturated bond amount of 0.5 mol / 100 g or less, and a refractive index of 1.497 or more, a liquid conjugate It can be seen that, by containing a diene rubber and a photopolymerization initiator, excellent reproducibility and high ester solvent resistance can be satisfied at the same time.
[実施例1と4、比較例5と6]
感光性樹脂組成物中に、液状の共役ジエンゴムを含有することで、微小画像の形成性や溶剤膨潤時の耐カケ性を満たすことが分かる。
[Examples 1 and 4, Comparative Examples 5 and 6]
It can be seen that inclusion of a liquid conjugated diene rubber in the photosensitive resin composition satisfies the formability of microimages and the anti-fogging property during solvent swelling.
本発明の組成物は、フレキソ印刷用感光性樹脂組成物の分野で好適に利用できる。 The composition of the present invention can be suitably used in the field of a photosensitive resin composition for flexographic printing.
Claims (9)
〜 The glass transition temperature of the hydrocarbon-based plasticizer (c) is -20 ° C or higher, and the refractive index at 20 ° C is 1.510 or higher, for flexographic printing according to any one of claims 1 to 7. Photosensitive resin composition.
~
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EP2165828A1 (en) | 2008-09-17 | 2010-03-24 | FUJIFILM Corporation | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same |
JP2011523716A (en) * | 2008-05-19 | 2011-08-18 | フリント グループ ジャーマニー ゲーエムベーハー | Photopolymerizable flexographic printing element for printing with UV inks |
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JP2014157191A (en) * | 2013-02-14 | 2014-08-28 | Asahi Kasei E-Materials Corp | Photosensitive resin composition for printing plate |
JP2019109444A (en) * | 2017-12-20 | 2019-07-04 | 旭化成株式会社 | Method for producing photosensitive resin plate for flexographic printing |
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