WO2007068193A1 - A process for recovering and recycling of waste ammoniacal alkaline copper etchant by using metallic aluminum - Google Patents

A process for recovering and recycling of waste ammoniacal alkaline copper etchant by using metallic aluminum Download PDF

Info

Publication number
WO2007068193A1
WO2007068193A1 PCT/CN2006/003361 CN2006003361W WO2007068193A1 WO 2007068193 A1 WO2007068193 A1 WO 2007068193A1 CN 2006003361 W CN2006003361 W CN 2006003361W WO 2007068193 A1 WO2007068193 A1 WO 2007068193A1
Authority
WO
WIPO (PCT)
Prior art keywords
copper
reaction
etchant
tank
aluminum
Prior art date
Application number
PCT/CN2006/003361
Other languages
French (fr)
Chinese (zh)
Other versions
WO2007068193A8 (en
Inventor
Gerald A. Krulik
Original Assignee
Daren Technology Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daren Technology Limited filed Critical Daren Technology Limited
Publication of WO2007068193A1 publication Critical patent/WO2007068193A1/en
Publication of WO2007068193A8 publication Critical patent/WO2007068193A8/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/46Regeneration of etching compositions
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/70Treatment of water, waste water, or sewage by reduction
    • C02F1/705Reduction by metals
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B15/00Obtaining copper
    • C22B15/0063Hydrometallurgy
    • C22B15/0084Treating solutions
    • C22B15/0089Treating solutions by chemical methods
    • C22B15/0091Treating solutions by chemical methods by cementation
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B3/00Extraction of metal compounds from ores or concentrates by wet processes
    • C22B3/20Treatment or purification of solutions, e.g. obtained by leaching
    • C22B3/44Treatment or purification of solutions, e.g. obtained by leaching by chemical processes
    • C22B3/46Treatment or purification of solutions, e.g. obtained by leaching by chemical processes by substitution, e.g. by cementation
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/001Processes for the treatment of water whereby the filtration technique is of importance
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/16Nature of the water, waste water, sewage or sludge to be treated from metallurgical processes, i.e. from the production, refining or treatment of metals, e.g. galvanic wastes
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/01Density
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/02Temperature
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/06Controlling or monitoring parameters in water treatment pH
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/40Liquid flow rate
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B15/00Obtaining copper
    • C22B15/0063Hydrometallurgy
    • C22B15/0065Leaching or slurrying
    • C22B15/0078Leaching or slurrying with ammoniacal solutions, e.g. ammonium hydroxide
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B7/00Working up raw materials other than ores, e.g. scrap, to produce non-ferrous metals and compounds thereof; Methods of a general interest or applied to the winning of more than two metals
    • C22B7/006Wet processes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling

Definitions

  • the present invention relates to a process for recovering and reusing waste ammonia-containing alkaline copper etchants using metallic aluminum which does not substantially increase unwanted soluble by-products.
  • the printed circuit board industry typically removes unwanted copper from printed circuit boards using an alkaline copper etchant containing ammonia.
  • the ammonia-containing alkaline copper etchant is a mixture of copper ammonium chloride, ammonium chloride, ammonium hydroxide, ammonium carbonate, and a small amount of other substances.
  • ammonium chloride copper When copper is in the state of divalent (+2) copper, ammonium chloride copper itself is active. Ammonium chloride copper corrodes and dissolves metallic copper to form monovalent (+1) copper ammonium chloride. As a corrosive material, the monovalent copper salt is inactive. The monovalent copper salt is reoxidized to the active etchant or divalent copper by oxygen in the atmosphere.
  • This etchant is widely used in the production process of printed circuit boards. This etchant is etched at a high rate and a large amount of copper can be retained in the solution after etching. After etching, the maximum copper loading under normal conditions is 105-188 grams of copper per liter (14-25 ounces of copper per gallon). The solution containing copper is not discarded. It is recycled and processed to remove excess copper to obtain new etchants and metallic copper.
  • the process of recovering ammonia-containing alkaline copper etchants is complex and expensive.
  • One such method is to contact the waste etchant with a liquid ion exchange (LIX) material dissolved in an organic solvent that is immiscible with water, such as kerosene.
  • LIX liquid ion exchange
  • This is usually a continuous processing method using a convection device.
  • the copper-containing LIX/kerosene mixture is contacted with a sulfuric acid solution.
  • Sulfuric acid extracts copper from the LIX/kerosene mixture to recover the ion exchange material.
  • the copper sulfate/sulfuric acid solution can be used to produce lower priced copper sulfate crystals.
  • the copper sulfate/sulfuric acid solution can be electrolyzed in an electrolysis cell to recover higher valence metal copper.
  • the yield of discarded gas-containing alkaline copper etchants is very large. Generally, 7 to 10 squares per process
  • the double-sided printed circuit material of the foot produces a gallon of waste etchant. Even a medium-sized factory can produce more than 400,000 liters (100,000 gallons) of waste etchant per year. Because the amount of used ammonia-containing etchant is very large and the recovery is very complicated, the used etchant is transported to an off-site recycling facility for processing. The transport of large amounts of etchant is very expensive and dangerous, and these dangerous goods are also likely to leak.
  • Another known method for the recovery of ammonia-containing alkaline copper etchants is to use a dedicated electrolytic cell connected to an etching apparatus to remove copper, which is typically processed using two cells with a membrane separator. deal with. Direct electrolysis of ammonia-containing alkaline copper etchants is impractical due to the presence of chlorides, as chlorine and other by-products are produced during electrolysis. Therefore, the industry has changed the chloride system to a solubilized system. However, the use of ammonium hydroxide-reducing copper instead of ammonium chloride copper as the active agent, the etching rate of the etchant becomes very slow.
  • a new processing method has been developed which utilizes metal aluminum to remove copper through a simple, single-step reaction without the generation of harmful impurities and without the use of expensive membrane separators and rectifiers.
  • This method is very effective, it is very fast, and it is very efficient, but the amount of copper recovered per unit of aluminum varies greatly, and it is difficult to control due to the large amount of heat released during the reaction (U.S. Patent No. 5,524, Another method of 780 AX on this basis has some improvements in the control of the reaction rate (U.S. Patent No. 5,556, 553 A).
  • the present invention provides an improved process for the copper removal reaction using metallic aluminum, allowing continuous processing of the etchant.
  • a separate control tank without metal aluminum can be used to adjust the corresponding process parameters.
  • the process parameters can include temperature, copper concentration, pH, specific gravity, ammonia capacity, chloride content, and circulation rate. Once the relevant process parameters are set, the ammonia-containing etchant solution can be transferred to one or more reaction tanks filled with metal aluminum, in which the dissolved copper becomes solid as the metal aluminum becomes solid aluminum hydroxide. copper.
  • reaction control can be achieved and copper can be removed more thoroughly.
  • the exothermic reaction of copper ions with aluminum can be more easily controlled.
  • the present invention is capable of removing copper more efficiently and faster without the risk of uncontrolled exothermic reactions.
  • a portion of the flow is returned to the control tank through a bypass loop, allowing for higher flow rates.
  • a large amount of liquid in the reaction tank can be used as a heat absorbing body, providing time for the heating or cooling of the reaction tank having metal aluminum.
  • reaction vessels may be arranged in any known configuration.
  • the reaction vessels can be simply arranged in series to deliver the product from one tank to the inlet of the next reactor. This configuration does not require a bypass tube loop.
  • the initial tank has the highest concentration of copper and the fastest reaction. With the removal of dissolved copper, the reaction slows down and the used ammonia-containing etching solution can be simply heated to any desired extent to accelerate copper removal to any degree desired.
  • the compensation heating can be an in-line heater, an immersion heater, a water jacket heater or any other means.
  • Reaction tank can be viewed Replace with the situation, where the first row of tanks is replaced the fastest because they are the fastest filled with copper metal. Multiple reaction tanks can be arranged in parallel.
  • the plurality of reaction vessels can be arranged in a manner to mix the flow channels.
  • a good arrangement is to use a high flow rate in series from the control tank to enter the multi-head conduit and then to the reactor tanks arranged in parallel. The products in the tanks arranged in parallel are brought together and pumped in series into a second multi-headed conduit and then split again to the second parallel-arranged reaction tank. After three repetitions, the copper-containing ammonia-containing etchant blend can be filtered and transferred to a storage device or reused.
  • a pump can be used to direct the flow, or multiple smaller pumps can be used.
  • the hybrid structure provides maximum flexibility in removing copper, which allows for maximum flow and greater copper removal capacity before the reactor tank needs to be refilled and refurbished.
  • the first parallel reaction tanks require frequent replacement because new waste ammonia-containing etchants are first reacted in these tanks.
  • the dissolved copper received in the reaction tanks in the rear row is gradually reduced, so the number of replacements is less.
  • a filter unit can be optionally used in each reaction tank.
  • the filter unit can be simply a sealed filter bag containing metal aluminum.
  • the copper and aluminum hydroxide reaction products are all solid materials.
  • the input waste ammonia-containing etchant can be simply pumped directly into the bag to react with the metal aluminum.
  • the filter bag retains all of the solid reaction product. This allows the particle-free treated etchant to be discharged from the reaction tank.
  • each reaction tank provides an added benefit. After the metal aluminum is consumed, the filter bag is filled with metallic copper and solid aluminum hydroxide. The reaction tank can be opened and the filter bag assembly can be removed and replaced with a new filter bag assembly. After removing the copper and aluminum hydroxide, the filter bag assembly can be washed and reused, and new aluminum is added. A more efficient method is to remove the entire reaction tank from the row after the aluminum metal is consumed. The new mobile reactor can be simply placed in place, and the recovery of the ammonia-containing etchant can be quickly restored. Used reaction tanks can be refurbished and can be replaced at any convenient time and place. The most economical option is to ship all used reaction vessels to a centralized recycling facility for disposal.
  • control slots allow for the setting of important process parameters, but are not actually used to remove copper ions.
  • the reaction tank is filled with metallic aluminum, and copper removal occurs in it.
  • a plurality of reaction tanks are simply used in the process, with optional filter structures or temperature adjustment devices inside or outside the reaction tank. detailed description
  • the test solution is a waste ammonia-containing copper etchant obtained from commercial printed circuit manufacturers. This material
  • the etchant (Ultra traetch50, MacDermid) is usually a commercially available waste ammonia etchant.
  • the original etchant has a pH of 8. 2-8. 8 with about 120-188 g/l of copper.
  • the waste etchant contains different ratios of (1+) copper and (2+) copper, depending on the parameters of the process, and subsequent storage, exposure to the atmosphere, such as different total time, temperature, and cooling time.
  • the etchant starting solution is essentially the same as the used ammonia-containing etchant, and the copper concentration can be as low as 100-120 grams per liter, depending on the manufacturer and process.
  • the etchant uses ammonium chloride copper as the active etchant, so the etchant starting solution must contain copper.
  • the etchant supplement is substantially free of copper.
  • Etchant Supplement Material Safety Data Sheet (MSDS) List ammonium chloride 10-25 weight percent, ammonium hydroxide 20-40 weight percent, pH 9-10.
  • MSDS Etchant Supplement Material Safety Data Sheet
  • a new printed circuit manufacturer can start the copper etching step with an etchant starting solution. Thereafter, the used etchant is mixed in the extender to maintain a given pH, specific gravity, and copper content to facilitate etching. For UUraetch50 this For a product, the recommended pH range is 8. 2- 8. 8, the working specific gravity is 1.20- 1. 202, and the copper content of the waste etchant is between about 120 and 188 g/l.
  • the waste ammonia-containing copper etchant test solution used herein did not directly analyze the ratio of (1+) copper to (2+) copper, and instead compares the amount of aluminum consumed per gram of copper content. For example, if all of the dissolved copper in the waste etchant is in the form of (2+) ammonium chloride, the theoretical consumption of aluminum is 1 gram of aluminum per cubic gram of copper recovered. For example, if all of the dissolved copper in the waste etchant is in the form of (1+) ammonium chloride, theoretically, the consumption of aluminum is 7 grams of copper per gram of copper consumed per gram of recovery.
  • (2+) copper ammonium chloride is an active etchant material, it can re-dissolve the copper formed during the reaction with aluminum, thereby reducing the efficiency to under the theoretical value of 3.5 grams of copper per gram of aluminum. . Therefore, the economic recovery method will depend decisively on the value of (2+) ammonium chloride copper and (1+) ammonium chloride.
  • Economics also depend on the system's feed rate and resistance to shutdown. For example, if the temperature is too high, the solution will boil and spill and stop production. Therefore, it is critical that the recovery system be designed so that the waste etchant is preferably processed continuously. Proper design will optimize copper removal speed while reducing control and minimizing manpower.
  • reaction vessel a single can was used as the reaction vessel. This is a polypropylene slant bottom can.
  • the tank is filled with a fluorocarbon coated stainless steel heater and a fluorocarbon serpentine water cooler. Approximately 24 x 24 x 0. 32 cm, 2,874 grams of 14 pieces of aluminum were placed on the grid in the tank.
  • the tank contained 66 liters of an almost pure ammonia-containing etchant containing 0.1 g/l of copper. The solution is heated to 70 ° C to reach an initial reaction temperature.
  • the copper-containing copper etchant containing 130 g/L of copper was slowly pumped into the tank at a rate of 2.4 liters per minute to increase the copper concentration at a rate of 4.7 g/min. . While monitoring the temperature, the speed of copper addition is controlled by turning the pump on or off. Cooling was used to keep the temperature below about 75 degrees Celsius. Electrical heating is used only to adjust the initial temperature, and further heating comes from An exothermic reaction between copper ions and aluminum.
  • the total reaction time was 27 minutes before heating and boiling were uncontrollable.
  • a total of 68. 2 g / liter of copper was pumped in 14. 5 minutes.
  • the control tank is not filled with metal aluminum. It is only used to dilute the concentrated etchant and heat it to the operating temperature. If necessary, it is allowed to adjust the corresponding process parameters, including temperature, copper concentration, H value, specific gravity, ammonia capacity, chlorine. Compound content and circulation speed, etc.
  • the second type is the reaction tank. Once the relevant process parameters are set in the control tank, the spent etchant after the adjustment process is output from the control tank and enters the reaction tank to remove copper.
  • the reaction tank is filled with metallic aluminum for reversing the copper ions dissolved in the waste etchant.
  • the metallic aluminum can be placed in a filter bag in a reaction tank or other solid support as long as the solution is free to flow relative to the metallic aluminum.
  • the control tank can be the same as the tank structure in the foregoing example, and the reaction tank can be selectively used to be smaller, which makes it easier to control the reaction, and can be cooled by, for example, immersing it in a water bath.
  • the reactor tanks can be arranged in a simple series to allow the product in one reactor to be transported to the inlet of the next reactor to increase the efficiency of copper removal.
  • the concentration of copper in the reaction vessel gradually decreases, the reaction rate decreases, and the amount of heat released is also reduced, so that the solution temperature is lowered to such an extent that it is disadvantageous for further removal of copper.
  • additional compensation heating can be provided to the reaction vessel to allow the reaction solution to be simply heated to any desired extent to force copper removal to any degree desired.
  • the compensation heating can be an in-line heater, an immersion heater, a water jacket heater or any other means.
  • Example 3 This example is an example of an improved design proposed on the basis of an example suitable for large-scale continuous copper removal.
  • the reaction tanks are arranged in a mixed manner to increase control and efficiency.
  • control tank is not filled with metallic aluminum, only used to dilute the concentrated etchant and heat it to the operating temperature, allowing adjustment of the corresponding process parameters, including temperature, copper concentration, pH, specific gravity, if required. , ammonia water capacity, chloride content and circulation speed.
  • the spent etchant after the adjustment process is output from the control tank and pumped through the first multi-head conduit to a plurality of parallel reaction tanks of the first row, for example 5 In a parallel reaction tank.
  • each reactor in this row has essentially the same amount of waste etchant.
  • the products coming out of each of the reaction tanks of the first row are collected into the first sump or the collection tank.
  • This example uses a bypass loop.
  • the purpose of the bypass loop is to allow control of the concentration of copper in the control tank.
  • the bypass circulation circuit is disposed at the outlet of the first sump, allowing a portion of the flow to flow back to the control tank, and the remaining flow to the second plurality of conduits of the second row of reaction vessels. If the concentration of copper in the control bath is required to be 20% of the concentration of copper in the waste etchant, then the product coming out of the first row of reactors is only 20°/.
  • the system can be drained and other concentrations of copper will continuously accumulate in the control tank.
  • two pumps can be used to simultaneously add new etchant and waste etchant to the control tank at a fixed ratio, but this is not economical relative to the use of a bypass loop.
  • the sump can be provided with a cooler; a cooler or radiator can be added to the loop of the bypass loop back to the control tank; or other cooling devices can be used if needed.
  • the most efficient heating is the use of an in-line heater that is mounted to the lower end of the branch circuit leading to the bypass loop of the second multi-head conduit.
  • the concentration of the copper in the control tank is desirably 20% of the concentration in the waste etchant.
  • the diluted solution was pumped from the control tank and entered the first row of reaction tanks at a rate of 25 liters per minute. If five reactors were used in the first row, each reactor received 5 liters per minute of diluted etchant for reaction with the metal aluminum.
  • the first collection tank collects a mixed stream of products discharged from the five reaction tanks of the first row at a flow rate of 25 liters/min. It is then pumped into the 5 reaction tanks of the second row.
  • the bypass loop is adjusted to flow 20 liters/minute of flow in the first sump back to the control tank. A flow rate of 5 liters per minute was allowed to flow to the 5 reaction tanks of the second row. This keeps the concentration of copper in the control tank constant.
  • the cooler can be selected to be placed in the control tank or bypass loop.
  • a flow rate of 5 liters/minute to the second row of 5 reactors can be pumped through an in-line heater to increase the temperature.
  • the flow of solution through the second row of reactors will be only 1 liter per minute per tank, which results in a residence time five times that of the first row of tanks.
  • the concentration of copper entering the second row of tanks is much lower, so the overall residence time for the reaction with the metal aluminum is longer and, optionally, the reaction temperature is higher, which will cause most of the remaining copper to precipitate.
  • the process is repeated again, except that no additional bypass loops are required.
  • the temperature can be further raised in the third or even rear reaction tank to obtain any desired final copper concentration.
  • the reaction products of copper ions and aluminum metal are copper metal and aluminum hydroxide. Copper metal has a high specific gravity and is not moved by the flow rate. Although aluminum can be placed on any bracket to allow the solution to come into contact with it freely, this may also cause problems because the metal aluminum is loaded in a block, sheet, sphere or other shape and is fixed by the bracket. Make it not carried away by the flow described. However, its product, aluminum hydroxide, is light and fluffy, and is limited by special methods, which can be carried by flow to different reaction tanks.
  • a large amount of aluminum hydroxide is a drawback for any large-scale continuous production process unless it is limited in some way. If free flow is allowed, the flow of aluminum hydroxide between the can and the can gradually increases with the removal of copper. It will accumulate in low flow areas, which will increase pump wear, reduce flow and increase pressure.
  • Another example of an improved design is suitable for large scale continuous copper removal, which is related to the structure of the reaction tank.
  • the system design is further improved to prevent the movement of the aluminum hydroxide reaction product if the metal aluminum is placed in a porous container.
  • a porous filter bag such as 25 to 100 micron polypropylene. This can be tightly closed after the metal is added and has an inlet for the copper-containing etchant. The etchant that reacts will flow freely through the bag while copper metal, aluminum metal and aluminum hydroxide remain in the filter bag. This prevents excessive pump wear and pump reversal Pressure, and eliminates pipe blockage and deposits in the tank. Therefore, in the end, it is only necessary to use the end filter structure to filter out the particles that have been leaked from the main filter structure, and the etchant that needs to be finally recovered is obtained.
  • reaction products of copper ions and aluminum metal are copper metal and aluminum hydroxide.
  • the metal aluminum in the reaction tank is finally substantially depleted and filled with copper metal and aluminum hydroxide. If the filter bag is not used, the entire reaction tank must be removed for maintenance and cleaning.
  • filter bag Another benefit of using a filter bag is related to the repair of the reaction tank.
  • the filter bag can be easily removed from the reaction tank and replaced with a new bag containing metal aluminum.
  • Old filter bags can be disposed of in situ or processed on a centralized reprocessing equipment to recover unused aluminum, copper, and aluminum hydroxide.
  • the filter bag is porous and difficult to drain and dry. The remaining ammonia vapor will cause trouble after vaporization.
  • An alternative improvement to this process is the use of a transportable, replaceable reaction tank.
  • a more efficient method is to remove the entire reaction tank from the row after the aluminum metal is consumed.
  • the new mobile reactor can be placed in place simply, and the recovery of the ammonia-containing etchant can be recovered very quickly.
  • Used reaction tanks can be refurbished and can be replaced at any convenient time and place.
  • the most economical option is to ship all used reaction tanks to a centralized recycling facility for disposal.
  • Another example of such an improved design is particularly suitable for large scale continuous copper removal.
  • the reaction tank used in this example is designed to be mobile, easy to transport, easy to remove from the production line, emptied and rinsed, and can be transported or moved to any desired processing location. If the used reaction tank is essentially dry and sealed, it will not pose any environmental hazard. The lost production time is reduced because the cans can be easily disassembled and replaced.
  • reaction tank can also be designed to be non-mobile for replenishing aluminum locally and removing reaction products.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Geology (AREA)
  • Hydrology & Water Resources (AREA)
  • Water Supply & Treatment (AREA)
  • ing And Chemical Polishing (AREA)
  • Removal Of Specific Substances (AREA)

Abstract

A process for recovering and recycling of waste ammoniacal alkaline copper etchant by means of using metallic aluminum comprises: employing a control container for control of processing parameters and then providing one or more aluminum-containing reactors to remove copper. Said processing parameters comprise temperature, copper concentration, pH value, specific gravity, ammonia water content, chloride content and circulating rate etc. The reactors can be arranged in series, parallel or series parallel, and optionally heated to remove copper. Optionally, the reactors can have individual filtrating equipment that can reserve solid reaction product. The recycled enchant is suitable for chemical adjustment and reuse.

Description

使用金属铝回收及再利用废弃含氨碱性铜蚀刻剂的方法 技术领域  Method for recycling and recycling waste ammonia-containing alkaline copper etchant using metal aluminum
本发明涉及一种使用金属铝回收及再利用废弃含氨碱性铜蚀刻剂的方 法, 该方法基本上不会增加不需要的可溶性副产品。  The present invention relates to a process for recovering and reusing waste ammonia-containing alkaline copper etchants using metallic aluminum which does not substantially increase unwanted soluble by-products.
背景技术 Background technique
作为制造过程的一部分, 印刷电路板工业通常使用含氨的碱性铜蚀刻剂 从印刷电路板上去除不需要的铜。 含氨的碱性铜蚀刻剂是一种氯化铵铜、 氯 化铵、 氢氧化铵、 碳酸铵以及少量其它物质的混合物。 当铜是二价(+2 )铜 的状态时, 氯化铵铜本身是活性的。 氯化铵铜腐蚀和溶解金属铜, 形成一价 ( +1 )铜的氯化铵。 作为一种腐蚀材料, 一价铜盐是非活性的。 一价铜盐通 过大气中的氧气再氧化为活性的蚀刻剂或二价铜的形式。  As part of the manufacturing process, the printed circuit board industry typically removes unwanted copper from printed circuit boards using an alkaline copper etchant containing ammonia. The ammonia-containing alkaline copper etchant is a mixture of copper ammonium chloride, ammonium chloride, ammonium hydroxide, ammonium carbonate, and a small amount of other substances. When copper is in the state of divalent (+2) copper, ammonium chloride copper itself is active. Ammonium chloride copper corrodes and dissolves metallic copper to form monovalent (+1) copper ammonium chloride. As a corrosive material, the monovalent copper salt is inactive. The monovalent copper salt is reoxidized to the active etchant or divalent copper by oxygen in the atmosphere.
这种蚀刻剂被广泛用于印刷电路板的生产过程中。 这种蚀刻剂的蚀刻速 度很快, 并且蚀刻之后的溶液中可以保有大量的铜。 蚀刻之后, 正常情况下 铜的最大载有量是 105-188克铜 /升(14- 25盎司铜 /加仑)。 含有铜的溶液并 不会被丟弃。 人们会回收并处理它, 以除去过量的铜获得新的蚀刻剂和金属 铜。  This etchant is widely used in the production process of printed circuit boards. This etchant is etched at a high rate and a large amount of copper can be retained in the solution after etching. After etching, the maximum copper loading under normal conditions is 105-188 grams of copper per liter (14-25 ounces of copper per gallon). The solution containing copper is not discarded. It is recycled and processed to remove excess copper to obtain new etchants and metallic copper.
商业化的回收工厂中, 回收含氨的碱性铜蚀刻剂的方法很复杂并且很贵。 其中一种方法是, 使废弃蚀刻剂与一种溶解在与水不相溶的有机溶剂 (例如 煤油) 中的液体离子交换(LIX )材料接触。 这通常是一种使用对流装置的连 续处理方法。 同样使用对流装置, 含有铜的 LIX/煤油混合物与一种硫酸溶液 接触。 硫酸从 LIX/煤油混合物中提取出铜以回收该离子交换材料。 该铜硫酸 盐 /含硫酸溶液可被用于生产较低价的硫酸铜晶体。 或者, 该铜硫酸盐 /含硫 酸溶液可以在电解槽中电解以回收较高价金属铜。  In commercial recycling plants, the process of recovering ammonia-containing alkaline copper etchants is complex and expensive. One such method is to contact the waste etchant with a liquid ion exchange (LIX) material dissolved in an organic solvent that is immiscible with water, such as kerosene. This is usually a continuous processing method using a convection device. Also using a convection device, the copper-containing LIX/kerosene mixture is contacted with a sulfuric acid solution. Sulfuric acid extracts copper from the LIX/kerosene mixture to recover the ion exchange material. The copper sulfate/sulfuric acid solution can be used to produce lower priced copper sulfate crystals. Alternatively, the copper sulfate/sulfuric acid solution can be electrolyzed in an electrolysis cell to recover higher valence metal copper.
废弃的含氣的碱性铜蚀刻剂的产量非常大。 一般地, 每加工 7到 10平方 英尺的双面印制电路材料会产生一加仑的废弃蚀刻剂。 甚至一个中等大小的 工厂每年可以产生超过 400, 000升(十万加仑)的废弃蚀刻剂。 因为使用过 的含氨蚀刻剂的量非常大, 并且回收又非常复杂, 因此使用过的蚀刻剂都被 运送到场外的回收设备进行处理。 大量蚀刻剂的转运非常昂贵, 并且也很危 险, 而且这些危险品亦很可能溢漏。 The yield of discarded gas-containing alkaline copper etchants is very large. Generally, 7 to 10 squares per process The double-sided printed circuit material of the foot produces a gallon of waste etchant. Even a medium-sized factory can produce more than 400,000 liters (100,000 gallons) of waste etchant per year. Because the amount of used ammonia-containing etchant is very large and the recovery is very complicated, the used etchant is transported to an off-site recycling facility for processing. The transport of large amounts of etchant is very expensive and dangerous, and these dangerous goods are also likely to leak.
商业化的碱性蚀刻剂回收设备很大并且很复杂。 它们具有多个逆流萃取 流动塔, 其中装有大量的再循环蚀刻剂、 煤油、 危险的有机絡合剂、 硫酸以 及硫酸铜。 所有这些材料都是有毒的, 并且在发生意外事故以及化学溢漏的 时候是非常危险的。 煤油溶液同时还是可燃的, 常存在造成火灾危险。 如果 铜的回收是通过电镀来实现的, 则需要很大功率消耗的大型整流器。  Commercial alkaline etchant recovery equipment is large and complex. They have a plurality of countercurrent extraction flow columns containing a large amount of recycled etchant, kerosene, hazardous organic complexing agents, sulfuric acid, and copper sulfate. All of these materials are toxic and are very dangerous in the event of accidents and chemical spills. The kerosene solution is also flammable and often poses a fire hazard. If the recovery of copper is achieved by electroplating, a large rectifier with a large power consumption is required.
另一种已知的用于含氨的碱性铜蚀刻剂回收的方法是, 使用一种专门的 电解电池连接到蚀刻设备上来除铜, 其通常使用两个带有薄膜分离器的电池 来加工处理。 由于氯化物的存在, 对含氨的碱性铜蚀刻剂进行直接电解是不 现实的, 因为在电解的时候会产生氯气和其它副产品。 因此业界将氯化物的 系统改为疏酸盐的系统。 但使用了减酸铵铜来代替氯化铵铜作为活性剂, 蚀 刻剂的蚀刻速度却变得很慢。 另外, 因为这种近距离系统的设计受到了电解 回收速度的限制, 蚀刻速度更被拖慢, 实际的蚀刻速度要比基于氯化铜的含 氨碱性铜蚀刻剂的情况慢 3倍。 许多印刷电路厂商的含氨蚀刻设备都处于或 接近处于满负荷工作状态, 且每天经常需要完全使用两班甚至三班。 因此, 使用这种加工方法需要在昂贵的设备上投入 3倍的支出。  Another known method for the recovery of ammonia-containing alkaline copper etchants is to use a dedicated electrolytic cell connected to an etching apparatus to remove copper, which is typically processed using two cells with a membrane separator. deal with. Direct electrolysis of ammonia-containing alkaline copper etchants is impractical due to the presence of chlorides, as chlorine and other by-products are produced during electrolysis. Therefore, the industry has changed the chloride system to a solubilized system. However, the use of ammonium hydroxide-reducing copper instead of ammonium chloride copper as the active agent, the etching rate of the etchant becomes very slow. In addition, because the design of such a close-range system is limited by the rate of electrolytic recovery, the etching rate is slowed down, and the actual etching speed is three times slower than that of the copper chloride-based ammonia-containing alkaline copper etchant. Many of the printed circuit manufacturers' ammonia-containing etching equipment are at or near full-load operation, and often need to use two or even three shifts a day. Therefore, the use of this processing method requires three times the expenditure on expensive equipment.
业已开发出了一种新的加工方法, 其利用金属铝通过一种简单的、 单步 反应来除铜, 而不会产生有害的杂质, 并且无需使用昂贵的薄膜分离器和整 流器。 这种方法非常有效, 其反应很快, 并且效率很高, 但是每单位铝回收 的铜的量变化很大, 并且由于反应过程放热量很大, 因此很难控制 (美国专 利 US 5, 524, 780 A X 在此基 上的另一种方法对反应速度的控制进行了一些 改进 (美国专利 US 5, 556, 553 A )。  A new processing method has been developed which utilizes metal aluminum to remove copper through a simple, single-step reaction without the generation of harmful impurities and without the use of expensive membrane separators and rectifiers. This method is very effective, it is very fast, and it is very efficient, but the amount of copper recovered per unit of aluminum varies greatly, and it is difficult to control due to the large amount of heat released during the reaction (U.S. Patent No. 5,524, Another method of 780 AX on this basis has some improvements in the control of the reaction rate (U.S. Patent No. 5,556, 553 A).
上述已知的方法试图在一个单罐(或单个容器) 中使用浓缩 (美国专利 US 5, 524, 780 A )或者稀释的含氨铜蚀刻剂 (美国专利 US 5, 556, 553 A )来 除铜。 在连续处理的时候温度很高并且难以控制, 甚至需要加热或者冷却。 因此需要通过放慢反应物的添加速度或者通过稀释废弃蚀刻溶液的方法, 来 控制加工温度。 发明内容 The above known methods attempt to use concentration in a single can (or a single container) (US patent) US 5, 524, 780 A) or a diluted ammonia-containing copper etchant (U.S. Patent No. 5,556,553 A) to remove copper. The temperature is high and difficult to control during continuous processing, even heating or cooling is required. Therefore, it is necessary to control the processing temperature by slowing down the rate of addition of the reactants or by diluting the method of discarding the etching solution. Summary of the invention
本发明的目的在于提供一种回收含氨的含氨的碱性铜蚀刻剂的改进的方 法, 其价格便宜, 危险小, 并且比 LIX/电解法或直接电解法都快。  SUMMARY OF THE INVENTION It is an object of the present invention to provide an improved process for recovering ammonia-containing ammonia-containing alkaline copper etchants which is inexpensive, less hazardous, and faster than LIX/electrolysis or direct electrolysis.
本发明提出一种改进的方法, 其使用金属铝进行除铜反应, 允许连续处 理廈弃蚀刻剂。 本发明提出的改进的方法中, 一个没有装金属铝的单独的控 制槽可用于调整相应的工艺参数。 该工艺参数可以包括温度、铜浓度、 pH值、 比重、 氨水容量、 氯化物含量以及循环速度。 一旦相关工艺参数被设定好了, 含氨的蚀刻剂溶液可以输送到一个或多个装有金属铝的反应罐中 , 在其中随 着金属铝变为固体氢氧化铝, 溶解铜变为了固体铜。  SUMMARY OF THE INVENTION The present invention provides an improved process for the copper removal reaction using metallic aluminum, allowing continuous processing of the etchant. In the improved method proposed by the present invention, a separate control tank without metal aluminum can be used to adjust the corresponding process parameters. The process parameters can include temperature, copper concentration, pH, specific gravity, ammonia capacity, chloride content, and circulation rate. Once the relevant process parameters are set, the ammonia-containing etchant solution can be transferred to one or more reaction tanks filled with metal aluminum, in which the dissolved copper becomes solid as the metal aluminum becomes solid aluminum hydroxide. copper.
通过使用多个反应罐, 可以获得更好的反应控制, 并且可以更彻底的除 铜。 铜离子与铝的放热反应可以更容易控制。 即使是只使用一个反应罐, 本 发明也能够更有效以及更快的除铜, 而不会产生放热反应失控的危险。 通过 一个旁路循环回路将一部分流量回流到控制槽中, 从而可以使用较高的流速。 反应罐中大量的液体可以作为吸热体, 为有金属铝的反应罐中加热或冷却的 发生提供了时间。  By using multiple reaction tanks, better reaction control can be achieved and copper can be removed more thoroughly. The exothermic reaction of copper ions with aluminum can be more easily controlled. Even with only one reaction tank, the present invention is capable of removing copper more efficiently and faster without the risk of uncontrolled exothermic reactions. A portion of the flow is returned to the control tank through a bypass loop, allowing for higher flow rates. A large amount of liquid in the reaction tank can be used as a heat absorbing body, providing time for the heating or cooling of the reaction tank having metal aluminum.
为了以连续的方式更完全的除铜, 多个反应罐可以以任何已知的结构排 列。 反应罐可以简单的串联排列, 使一个罐中的产物输送到下一个反应罐的 入口。 这种结构不需要旁路管回路。 起始的罐中铜浓度最高, 反应也最快。 随着溶解铜的去除, 反应放緩, 使用过的含氨蚀刻溶液可以被简单的加热到 任何需要的程度, 以按照任何需要的程度来加快除铜。 补偿加热可以采用直 列式的加热器、 浸没式加热器、 水套加热器或其它任何方式。 反应罐可以视 情况而替换, 其中第一排罐替换得最快, 因为它们充满铜金属的速度最快。 多个反应罐可以并联布置。 所有从控制槽出来的产品同时输送给所有的 反应罐。 这种结构并不能从含氨蚀刻剂中完全的除铜, 因为任何体积的溶液 仅仅通过了一个单独的反应罐。 然而, 这对于印刷电路板的加工还是有用的, 因为新蚀刻剂中需要一定量的铜, 以确保蚀刻可以被接受。 这种结构的优点 是所有的反应罐都是同时替换的, 因为它们都同时装满了基本上同样多的铜 金属。 In order to more completely remove copper in a continuous manner, multiple reaction vessels may be arranged in any known configuration. The reaction vessels can be simply arranged in series to deliver the product from one tank to the inlet of the next reactor. This configuration does not require a bypass tube loop. The initial tank has the highest concentration of copper and the fastest reaction. With the removal of dissolved copper, the reaction slows down and the used ammonia-containing etching solution can be simply heated to any desired extent to accelerate copper removal to any degree desired. The compensation heating can be an in-line heater, an immersion heater, a water jacket heater or any other means. Reaction tank can be viewed Replace with the situation, where the first row of tanks is replaced the fastest because they are the fastest filled with copper metal. Multiple reaction tanks can be arranged in parallel. All products coming out of the control tank are delivered to all reactors simultaneously. This structure does not completely remove copper from the ammonia-containing etchant because any volume of solution passes only through a single reaction tank. However, this is still useful for the processing of printed circuit boards because a certain amount of copper is required in the new etchant to ensure that the etch is acceptable. The advantage of this configuration is that all of the reactors are replaced at the same time because they are all filled with substantially the same amount of copper metal.
多个反应罐最好可以布置为混联流动通道的方式。 一种好的布置方式是, 从控制槽中使用串联的高流速进入多头导管, 然后流向并联排列的反应罐。 并联排列的罐中的产品汇集起来, 并串联地泵到一个第二多头导管中, 然后 再次分流给第二并联排列的反应罐。 重复三次之后, 不含铜的含氨蚀刻剂的 混合产品可以进行过滤, 并输送到存储装置或再使用。 可以使用一个泵来引 导流动, 或者可以使用多个较小的泵。  Preferably, the plurality of reaction vessels can be arranged in a manner to mix the flow channels. A good arrangement is to use a high flow rate in series from the control tank to enter the multi-head conduit and then to the reactor tanks arranged in parallel. The products in the tanks arranged in parallel are brought together and pumped in series into a second multi-headed conduit and then split again to the second parallel-arranged reaction tank. After three repetitions, the copper-containing ammonia-containing etchant blend can be filtered and transferred to a storage device or reused. A pump can be used to direct the flow, or multiple smaller pumps can be used.
混联结构提供了大量除铜的最大灵活性, 其允许最大的流量, 并且在反 应罐需要再充填以及整修之前具有较大的除铜能力。 一般地, 第一片并联反 应罐需要经常的替换, 因为新的废弃含氨蚀刻剂最先在这些罐中反应。 后面 排的反应罐接受的溶解铜逐渐减少, 因此需要替换的次数较少。  The hybrid structure provides maximum flexibility in removing copper, which allows for maximum flow and greater copper removal capacity before the reactor tank needs to be refilled and refurbished. In general, the first parallel reaction tanks require frequent replacement because new waste ammonia-containing etchants are first reacted in these tanks. The dissolved copper received in the reaction tanks in the rear row is gradually reduced, so the number of replacements is less.
另一个发明是在每个反应罐中可以选择使用一个过滤装置。 此过滤装置 可以简单的是一个密封过滤袋, 其中装有金属铝。 铜以及氢氧化铝反应产物 都是固体物质。 输入的废弃含氨蚀刻剂可以简单的直接泵入袋中与金属铝反 应。 过滤袋保留所有的固体反应产物。 这可以使不含颗粒的处理过的蚀刻剂 从反应罐排出。 通过在每个反应罐中使用过滤装置, 泵的磨损以及阻塞基本 上被减少或消除了, 这提 了较大的经济效益。  Another invention is that a filter unit can be optionally used in each reaction tank. The filter unit can be simply a sealed filter bag containing metal aluminum. The copper and aluminum hydroxide reaction products are all solid materials. The input waste ammonia-containing etchant can be simply pumped directly into the bag to react with the metal aluminum. The filter bag retains all of the solid reaction product. This allows the particle-free treated etchant to be discharged from the reaction tank. By using a filter unit in each reaction tank, pump wear and blockage are substantially reduced or eliminated, which provides greater economic benefits.
在每个反应罐中使用一个过滤袋获得了一个额外的好处。 金属铝消耗之 后, 过滤袋中就装满了金属铜以及固体氢氧化铝。 反应罐可以筒单地打开并 将过滤袋组件拆下, 然后替换上一个新过滤袋组件。 在除去铜以及氢氧化铝 之后, 该过滤袋组件可以洗净然后再利用, 并再加入新的铝。 一个更有效的方法是在金属铝被消耗之后将整个反应罐从排中拆下。 新 的可移动式反应罐可以简单的放置就位, 而后含氨蚀刻剂的回收加工可以很 快的恢复。 用过的反应罐可以被翻新并可以在任何方便的时间和地点被替换 使用。 最经济的选择是将所有使用过的反应罐送到一个集中回收设备进行处 理。 The use of a filter bag in each reaction tank provides an added benefit. After the metal aluminum is consumed, the filter bag is filled with metallic copper and solid aluminum hydroxide. The reaction tank can be opened and the filter bag assembly can be removed and replaced with a new filter bag assembly. After removing the copper and aluminum hydroxide, the filter bag assembly can be washed and reused, and new aluminum is added. A more efficient method is to remove the entire reaction tank from the row after the aluminum metal is consumed. The new mobile reactor can be simply placed in place, and the recovery of the ammonia-containing etchant can be quickly restored. Used reaction tanks can be refurbished and can be replaced at any convenient time and place. The most economical option is to ship all used reaction vessels to a centralized recycling facility for disposal.
综上所述, 该方法可以通过同时使用一个控制槽和一个或多个反应罐来 进行改进。 控制槽允许设置重要的工艺参数、 但是并不实际用来除去铜离子。 反应罐中装有金属铝, 除铜加工发生在其中。 在此过程中简单的使用了多个 反应罐, 并在反应罐内或外带有可选择的过滤结构或温度调节装置。 具体实施方式  In summary, the method can be improved by simultaneously using one control tank and one or more reaction tanks. Control slots allow for the setting of important process parameters, but are not actually used to remove copper ions. The reaction tank is filled with metallic aluminum, and copper removal occurs in it. A plurality of reaction tanks are simply used in the process, with optional filter structures or temperature adjustment devices inside or outside the reaction tank. detailed description
虽然此处所公开的内容是具体而详细的, 但是所述方法仅仅是对本发明 的解释说明。 本领域的任何人都可以利用这些构思在所示例子的基 上发展 出许多处理方法。  Although the disclosure herein is specific and detailed, the method is merely illustrative of the invention. Anybody skilled in the art can use these concepts to develop a number of processing methods based on the examples shown.
试液是从商业印刷电路厂商获得的废弃含氨铜蚀刻剂。 这种材料 The test solution is a waste ammonia-containing copper etchant obtained from commercial printed circuit manufacturers. This material
( Ul traetch50 , MacDermid公司)通常是市场上可买到的废弃含氨蚀刻剂。 按原始样品, 废弃蚀刻剂的 pH值为 8. 2-8. 8 , 带有大约 120- 188克 /升的铜。 该废弃蚀刻剂包含不同比率的 (1+ )铜和(2+ )铜, 取决于处理过程以及随 后的贮存中, 暴露在大气中诸如不同的总时间、 温度以及冷却时间等参数的 影响。 蚀刻剂起始溶液与使用过的含氨蚀刻剂基本上相同, 铜浓度可低至 100-120克 /升, 这取决于不同的厂家以及处理过程。 该蚀刻剂运用氯化铵铜 作为活性蚀刻剂, 因此蚀刻剂起始溶液必须包含铜。 蚀刻剂补充剂基本上不 含铜。 蚀刻剂补充剂材料安全说明书 (MSDS )表列: 氯化铵 10-25 重量百分 数, 氢氧化铵 20-40重量百分数, pH值 9-10。 一个新的印刷电路厂商可以利 用蚀刻剂起始溶液开始铜蚀刻步骤。 此后, 补充剂中混合使用过的蚀刻剂, 用于保持给定的 pH值、 比重以及含铜量, 以利于蚀刻。 对于 UUraetch50这 种产品, 建议的 pH值范围为 8. 2- 8. 8, 工作比重为 1. 20- 1. 202 , 并且废弃蚀 刻剂的含铜量在大约 120和 188克 /升之间。 (Ultra traetch50, MacDermid) is usually a commercially available waste ammonia etchant. The original etchant has a pH of 8. 2-8. 8 with about 120-188 g/l of copper. The waste etchant contains different ratios of (1+) copper and (2+) copper, depending on the parameters of the process, and subsequent storage, exposure to the atmosphere, such as different total time, temperature, and cooling time. The etchant starting solution is essentially the same as the used ammonia-containing etchant, and the copper concentration can be as low as 100-120 grams per liter, depending on the manufacturer and process. The etchant uses ammonium chloride copper as the active etchant, so the etchant starting solution must contain copper. The etchant supplement is substantially free of copper. Etchant Supplement Material Safety Data Sheet (MSDS) List: ammonium chloride 10-25 weight percent, ammonium hydroxide 20-40 weight percent, pH 9-10. A new printed circuit manufacturer can start the copper etching step with an etchant starting solution. Thereafter, the used etchant is mixed in the extender to maintain a given pH, specific gravity, and copper content to facilitate etching. For UUraetch50 this For a product, the recommended pH range is 8. 2- 8. 8, the working specific gravity is 1.20- 1. 202, and the copper content of the waste etchant is between about 120 and 188 g/l.
此处使用的废弃含氨铜蚀刻剂试液没有对(1+ )铜和(2+ )铜的比率直 接进行分析, 代之以对每克铜含量所消耗的铝的量进行比较。 例如, 如果在 废弃蚀刻剂中所有的溶解铜都是以 (2+ )氯化铵铜的形式存在, 则理论上铝 的消耗量为每回收 3. 5克的铜消耗 1克的铝。 例如, 如果在废弃蚀刻剂中所 有的溶解铜都是以 (1+ )氯化铵铜的形式存在, 则理论上铝的消耗量为每回 收 7, 0克的铜消耗 1克的铝。 因为 (2+ )铜氯化铵是活性的蚀刻剂材料, 它 可以使与铝的反应过程中形成的铜再溶解,从而使效率降低到每克铝回收 3. 5 克铜的理论值之下。 因此经济的回收方法将决定性地取决于 (2+ )氯化铵铜 与 (1+ )氯化铵铜的数值。  The waste ammonia-containing copper etchant test solution used herein did not directly analyze the ratio of (1+) copper to (2+) copper, and instead compares the amount of aluminum consumed per gram of copper content. For example, if all of the dissolved copper in the waste etchant is in the form of (2+) ammonium chloride, the theoretical consumption of aluminum is 1 gram of aluminum per cubic gram of copper recovered. For example, if all of the dissolved copper in the waste etchant is in the form of (1+) ammonium chloride, theoretically, the consumption of aluminum is 7 grams of copper per gram of copper consumed per gram of recovery. Since (2+) copper ammonium chloride is an active etchant material, it can re-dissolve the copper formed during the reaction with aluminum, thereby reducing the efficiency to under the theoretical value of 3.5 grams of copper per gram of aluminum. . Therefore, the economic recovery method will depend decisively on the value of (2+) ammonium chloride copper and (1+) ammonium chloride.
经济性还取决于系统的供料速度及停产的抗阻力, 例如温度过高会导致 溶液沸腾以及溢漏而停产, 所以关键的是回收系统须要设计使得废弃蚀刻剂 最好可以连续处理作业。 适当的设计将使除铜速度最佳, 同时使控制难度降 低以及所需人力最少。  Economics also depend on the system's feed rate and resistance to shutdown. For example, if the temperature is too high, the solution will boil and spill and stop production. Therefore, it is critical that the recovery system be designed so that the waste etchant is preferably processed continuously. Proper design will optimize copper removal speed while reducing control and minimizing manpower.
示例 1  Example 1
这是前述专利中所使用的原始设计, 其与本方法的铜回收以及含氨蚀刻 剂的回收相关。  This is the original design used in the aforementioned patents, which is related to the copper recovery of the process and the recovery of ammonia-containing etchants.
在此试验中, 使用了一个单罐作为反应容器。 这是一种聚丙烯斜底罐。 该罐中装有一涂敷氟碳化合物的不锈钢加热器以及一氟碳化合物蛇形管水冷 却器。 大约 24x24x0. 32厘米, 重量 2874克的 14片铝放置在罐中的格栅上。 该罐中装有 66升几乎纯的含氨蚀刻剂, 其中包含 0. 1克 /升的铜。 溶液加热 到 70°C使之到达一初始反应温度。  In this test, a single can was used as the reaction vessel. This is a polypropylene slant bottom can. The tank is filled with a fluorocarbon coated stainless steel heater and a fluorocarbon serpentine water cooler. Approximately 24 x 24 x 0. 32 cm, 2,874 grams of 14 pieces of aluminum were placed on the grid in the tank. The tank contained 66 liters of an almost pure ammonia-containing etchant containing 0.1 g/l of copper. The solution is heated to 70 ° C to reach an initial reaction temperature.
室温下包含 130克 /升铜的废弃含氨铜蚀刻剂慢慢地以 2. 4升 /分钟的速 度被泵送入该罐中, 从而以 4. 7克 /分钟的速度增大铜的浓度。 在监视温度的 同时, 通过打开或断开泵来控制铜加入的速度。 为了保持温度在大约 75摄氏 度之下而用到了冷却。 使用电加热仅仅是为了调整初温, 进一步地加热来自 于铜离子和铝之间的放热反应。 The copper-containing copper etchant containing 130 g/L of copper was slowly pumped into the tank at a rate of 2.4 liters per minute to increase the copper concentration at a rate of 4.7 g/min. . While monitoring the temperature, the speed of copper addition is controlled by turning the pump on or off. Cooling was used to keep the temperature below about 75 degrees Celsius. Electrical heating is used only to adjust the initial temperature, and further heating comes from An exothermic reaction between copper ions and aluminum.
在加热和发生沸腾无法控制之前, 反应的总时间为 27分钟。 在 14. 5分 钟时间内总共有 68. 2克 /升的铜被泵入。  The total reaction time was 27 minutes before heating and boiling were uncontrollable. A total of 68. 2 g / liter of copper was pumped in 14. 5 minutes.
反应完成之后, 铜、 剩余的铝碎片以及氢氧化铝沉淀物通过过滤从溶液 中分离。  After the reaction was completed, copper, remaining aluminum fragments, and aluminum hydroxide precipitate were separated from the solution by filtration.
这是一种利用一个罐同时进行控制和反应的总体设计。  This is an overall design that uses a single tank for simultaneous control and reaction.
示例 2  Example 2
这是一种改进设计的示例。 与前述示例不同, 使用了两种类型的罐, 用 于增加对反应过程的控制。  This is an example of an improved design. Unlike the previous examples, two types of canisters are used to increase control of the reaction process.
在本示例中用到了两种类型的罐, 其中一类是控制槽。 控制槽中没有装 金属铝, 仅用于稀释浓缩蚀刻剂以及将其加热到工作温度, 在需要的情况下 允许调整相应的工艺参数, 包括温度、 铜浓度、 H值、 比重、 氨水容量、 氯 化物含量以及循环速度等。 第二类是反应罐。 一旦相关工艺参数在控制槽中 设定好了, 经过调整处理之后的废弃蚀刻剂从控制槽中输出, 进入到反应罐 中除铜。 反应罐中装有金属铝, 用于与溶解在废弃蚀刻剂中的铜离子反 。 选择性地, 金属铝可以放在反应罐中的过滤袋中或其它的实心支架上, 只要 溶液可以自由地相对金属铝流动即可。 在本示例中, 控制槽可以与前述示例 中的槽结构相同, 而反应罐可以选择使用较小的, 这样更易于对反应控制, 并可选择诸如将其浸入到水浴槽中的方式进行冷却。  Two types of cans are used in this example, one of which is the control slot. The control tank is not filled with metal aluminum. It is only used to dilute the concentrated etchant and heat it to the operating temperature. If necessary, it is allowed to adjust the corresponding process parameters, including temperature, copper concentration, H value, specific gravity, ammonia capacity, chlorine. Compound content and circulation speed, etc. The second type is the reaction tank. Once the relevant process parameters are set in the control tank, the spent etchant after the adjustment process is output from the control tank and enters the reaction tank to remove copper. The reaction tank is filled with metallic aluminum for reversing the copper ions dissolved in the waste etchant. Alternatively, the metallic aluminum can be placed in a filter bag in a reaction tank or other solid support as long as the solution is free to flow relative to the metallic aluminum. In the present example, the control tank can be the same as the tank structure in the foregoing example, and the reaction tank can be selectively used to be smaller, which makes it easier to control the reaction, and can be cooled by, for example, immersing it in a water bath.
反应罐可以简单的串联排列 , 使一个反应罐中的产物输送到下一个反应 罐的入口, 增加除铜效率。  The reactor tanks can be arranged in a simple series to allow the product in one reactor to be transported to the inlet of the next reactor to increase the efficiency of copper removal.
随着溶解铜的去除, 反应罐中铜的浓度逐渐降低, 反应速率将会下降, 释放出的热量也会减少, 从而溶液温度将会降低到不利于铜的进一步去除的 程度。 在需要的情况下, 可以对反应罐提供额外的补偿加热, 使反应溶液被 简单的加热到任何需要的程度, 以按照任何需要的程度来强迫除铜。 补偿加 热可以采用直列式的加热器、 浸没式加热器、 水套加热器或其它任何方式。  As the dissolved copper is removed, the concentration of copper in the reaction vessel gradually decreases, the reaction rate decreases, and the amount of heat released is also reduced, so that the solution temperature is lowered to such an extent that it is disadvantageous for further removal of copper. If necessary, additional compensation heating can be provided to the reaction vessel to allow the reaction solution to be simply heated to any desired extent to force copper removal to any degree desired. The compensation heating can be an in-line heater, an immersion heater, a water jacket heater or any other means.
示例 3 本示例是在示例 的基础上所提出的一种改进设计的示例, 适合于大规 模的连续除铜。 在本示例中, 反应罐被混联布置, 以增加控制和效率。 Example 3 This example is an example of an improved design proposed on the basis of an example suitable for large-scale continuous copper removal. In this example, the reaction tanks are arranged in a mixed manner to increase control and efficiency.
与前述示例相同, 控制槽中没有装金属铝, 仅用于稀释浓缩蚀刻剂以及 将其加热到工作温度, 在需要的情况下允许调整相应的工艺参数, 包括温度、 铜浓度、 pH值、 比重、 氨水容量、 氯化物含量以及循环速度等。  As in the previous example, the control tank is not filled with metallic aluminum, only used to dilute the concentrated etchant and heat it to the operating temperature, allowing adjustment of the corresponding process parameters, including temperature, copper concentration, pH, specific gravity, if required. , ammonia water capacity, chloride content and circulation speed.
一旦相关工艺参数在控制槽中设定好了, 经过调整处理之后的废弃蚀刻 剂从控制槽中输出, 通过第一多头导管泵送到第一排的多个并联的反应罐中, 例如 5 个并联的反应罐中。 因此这一排的每个反应罐中基本上具有相同量的 废弃蚀刻剂。 从第一排的每个反应罐中出来的产品汇集进入到第一集存槽或 收集罐。  Once the relevant process parameters are set in the control tank, the spent etchant after the adjustment process is output from the control tank and pumped through the first multi-head conduit to a plurality of parallel reaction tanks of the first row, for example 5 In a parallel reaction tank. Thus each reactor in this row has essentially the same amount of waste etchant. The products coming out of each of the reaction tanks of the first row are collected into the first sump or the collection tank.
本示例使用到了一旁路循环回路。 旁路循环回路的用途是允许控制控制 槽中的铜的浓度。 旁路循环回路设置在第一集存槽的出口, 使一部分流量流 回到控制槽, 其余的流量流向第二排反应罐的第二多头导管。 如果控制槽中 铜的浓度要求为废弃蚀刻剂中铜的浓度的 20%,那么从第一排反应罐中出来的 产品只有 20°/。可以排出系统,其它浓度的铜将会连续地积聚在控制槽中。或者, 可以使用两个泵以一个固定的比率来同时向控制槽中加入新的蚀刻剂和废弃 蚀刻剂, 但是这相对于使用旁路回路而言并不经济。  This example uses a bypass loop. The purpose of the bypass loop is to allow control of the concentration of copper in the control tank. The bypass circulation circuit is disposed at the outlet of the first sump, allowing a portion of the flow to flow back to the control tank, and the remaining flow to the second plurality of conduits of the second row of reaction vessels. If the concentration of copper in the control bath is required to be 20% of the concentration of copper in the waste etchant, then the product coming out of the first row of reactors is only 20°/. The system can be drained and other concentrations of copper will continuously accumulate in the control tank. Alternatively, two pumps can be used to simultaneously add new etchant and waste etchant to the control tank at a fixed ratio, but this is not economical relative to the use of a bypass loop.
集存槽可以备有一冷却器; 一冷却器或散热器可以增加到旁路循环回路 返回控制槽的回路上; 或者需要的情况下可以使用其它的冷却装置。 加热效 率最高是使用直列式加热器, 将其安装到通向第二多头导管的旁路循环回路 的支管下端。  The sump can be provided with a cooler; a cooler or radiator can be added to the loop of the bypass loop back to the control tank; or other cooling devices can be used if needed. The most efficient heating is the use of an in-line heater that is mounted to the lower end of the branch circuit leading to the bypass loop of the second multi-head conduit.
为了显示过程, 假定 5升 /分钟的废弃蚀刻剂被泵入控制槽。 假设该铜在 控制槽中的浓度期望为废弃蚀刻剂中的浓度的 20%。稀释溶液从控制槽用泵抽 出, 以 25升 /分钟的速度进入第一排反应罐。 如果第一排用到了 5个反应罐, 每个反应罐接收 5升 /分钟的稀释蚀刻剂用于与金属铝反应。 第一集存槽收集 第一排的 5个反应罐排出的产品的混合流, 流量为 25升 /分钟。 然后泵入第 二排的 5个反应罐中。 旁路循环回路被调节为使第一集存槽中 20升 /分钟的流量流回到控制槽。 5升 /分钟的流量被允许流向第二排的 5个反应罐。 这使得控制槽中的铜的浓 度保持恒定。 冷却器可以被选择设置于控制槽或旁路循环回路。 To demonstrate the process, it is assumed that a 5 liter/minute waste etchant is pumped into the control tank. It is assumed that the concentration of the copper in the control tank is desirably 20% of the concentration in the waste etchant. The diluted solution was pumped from the control tank and entered the first row of reaction tanks at a rate of 25 liters per minute. If five reactors were used in the first row, each reactor received 5 liters per minute of diluted etchant for reaction with the metal aluminum. The first collection tank collects a mixed stream of products discharged from the five reaction tanks of the first row at a flow rate of 25 liters/min. It is then pumped into the 5 reaction tanks of the second row. The bypass loop is adjusted to flow 20 liters/minute of flow in the first sump back to the control tank. A flow rate of 5 liters per minute was allowed to flow to the 5 reaction tanks of the second row. This keeps the concentration of copper in the control tank constant. The cooler can be selected to be placed in the control tank or bypass loop.
如果需要的话, 流向第二排 5个反应罐的 5升 /分钟的流量可以被泵过一 直列式加热器, 用以增加温度。溶液流过第二排反应罐的流量将会仅仅只有 1 升每分钟每罐, 这使得驻留时间为第一排罐中的 5倍。 进入第二排罐的铜浓 度要低得多 , 因此与金属铝反应的综合驻留时间更长, 并且有选择的使反应 温度更高, 将会使得剩余的铜的大部分析出。  If desired, a flow rate of 5 liters/minute to the second row of 5 reactors can be pumped through an in-line heater to increase the temperature. The flow of solution through the second row of reactors will be only 1 liter per minute per tank, which results in a residence time five times that of the first row of tanks. The concentration of copper entering the second row of tanks is much lower, so the overall residence time for the reaction with the metal aluminum is longer and, optionally, the reaction temperature is higher, which will cause most of the remaining copper to precipitate.
处理过程再重复一次, 除了不再需要别的旁路回路之外。 温度可以进一 步在第三排乃至后面排的反应罐中升高, 以获得任何需要的最终铜浓度。  The process is repeated again, except that no additional bypass loops are required. The temperature can be further raised in the third or even rear reaction tank to obtain any desired final copper concentration.
示例 4  Example 4
铜离子和金属铝的反应产物是铜金属和氢氧化铝。 铜金属比重高, 不会 被流速移动。 虽然铝可以筒单的放置在任何支架上使溶液自由地与之接触, 但是这也可能会产生问题, 因为金属铝虽然以块状、 片状、 球形或其它的形 状载入, 并用支架固放使之不会被所述的流动带走。 然而其产物氢氧化铝又 轻又蓬松, 除以特别方法限制, 否则会被流动带至不同的反应罐内。  The reaction products of copper ions and aluminum metal are copper metal and aluminum hydroxide. Copper metal has a high specific gravity and is not moved by the flow rate. Although aluminum can be placed on any bracket to allow the solution to come into contact with it freely, this may also cause problems because the metal aluminum is loaded in a block, sheet, sphere or other shape and is fixed by the bracket. Make it not carried away by the flow described. However, its product, aluminum hydroxide, is light and fluffy, and is limited by special methods, which can be carried by flow to different reaction tanks.
大量的氢氧化铝对于任何大规模连续生产过程都是个缺陷, 除非以某种 方式加以限制。 如果允许自由流动, 随着铜的去除, 氢氧化铝在罐与罐之间 的流动会逐渐增加。 它将会在低流动区域积聚, 将会增加泵的磨损, 流速减 少并增力口果压。  A large amount of aluminum hydroxide is a drawback for any large-scale continuous production process unless it is limited in some way. If free flow is allowed, the flow of aluminum hydroxide between the can and the can gradually increases with the removal of copper. It will accumulate in low flow areas, which will increase pump wear, reduce flow and increase pressure.
另一个例子的改进设计适合于大规模的连续地除铜, 其与反应罐的结构 相关。  Another example of an improved design is suitable for large scale continuous copper removal, which is related to the structure of the reaction tank.
系统设计被进一步地改进为, 如果将金属铝放置在一多孔的容器中, 将 可以防止氢氧化铝反应产物的移动。 一种合适的容器是一多孔的过滤袋, 例 如 25到 100微米的聚丙烯。 这可以在金属加入之后紧紧地封闭, 并具有一用 于含铜蚀刻剂的入口。 发生反应的蚀刻剂将会自由流过袋子, 同时铜金属、 金属铝和氢氧化铝都会保留在过滤袋中。 这防止了泵的过度磨损以及泵的反 压, 并且消除了管道阻塞以及罐中的沉淀。 因此, 最后只需要使用末端过滤 结构将从主过滤结构中漏掉的微粒过滤出来, 就获得了最终需要回收的蚀刻 剂了。 The system design is further improved to prevent the movement of the aluminum hydroxide reaction product if the metal aluminum is placed in a porous container. One suitable container is a porous filter bag, such as 25 to 100 micron polypropylene. This can be tightly closed after the metal is added and has an inlet for the copper-containing etchant. The etchant that reacts will flow freely through the bag while copper metal, aluminum metal and aluminum hydroxide remain in the filter bag. This prevents excessive pump wear and pump reversal Pressure, and eliminates pipe blockage and deposits in the tank. Therefore, in the end, it is only necessary to use the end filter structure to filter out the particles that have been leaked from the main filter structure, and the etchant that needs to be finally recovered is obtained.
示例 5  Example 5
铜离子和金属铝的反应产物是铜金属和氢氧化铝。 反应罐中的金属铝最 后基本上被耗尽, 并装满了铜金属和氢氧化铝。 如果不使用过滤袋, 整个反 应罐必需拆下进行保养和清洗。  The reaction products of copper ions and aluminum metal are copper metal and aluminum hydroxide. The metal aluminum in the reaction tank is finally substantially depleted and filled with copper metal and aluminum hydroxide. If the filter bag is not used, the entire reaction tank must be removed for maintenance and cleaning.
使用过滤袋的另一个好处与反应罐的修复相关。 过滤袋可以方便地从反 应罐中拆下, 并代之以装有金属铝的新袋子。 旧的过滤袋可以就地处理, 或 者在一个集中再加工设备上进行处理, 以收回未使用的铝、 铜以及氢氧化铝。  Another benefit of using a filter bag is related to the repair of the reaction tank. The filter bag can be easily removed from the reaction tank and replaced with a new bag containing metal aluminum. Old filter bags can be disposed of in situ or processed on a centralized reprocessing equipment to recover unused aluminum, copper, and aluminum hydroxide.
过滤袋是多孔的, 并且很难排水以及干燥。 剩余的氨水汽化后会造成麻 烦。 对此过程的一种可选择的改进是使用便于运输的、 可替换的反应罐。  The filter bag is porous and difficult to drain and dry. The remaining ammonia vapor will cause trouble after vaporization. An alternative improvement to this process is the use of a transportable, replaceable reaction tank.
一个更有效的方法是在金属铝被消耗之后将整个反应罐从排中拆下。 新 的可移动式反应罐可以简单的放置就位, 而后含氨蚀刻剂的回收加工可以很 快的恢复。 用过的反应罐可以被翻新并可以在任何方便的时间和地点被替换 使用。 最经济的选择是将所有使用过的反应罐送到一个集中回收设备进行处 理。 这种改进设计的另一个示例尤其适合于大规模的连续除铜。  A more efficient method is to remove the entire reaction tank from the row after the aluminum metal is consumed. The new mobile reactor can be placed in place simply, and the recovery of the ammonia-containing etchant can be recovered very quickly. Used reaction tanks can be refurbished and can be replaced at any convenient time and place. The most economical option is to ship all used reaction tanks to a centralized recycling facility for disposal. Another example of such an improved design is particularly suitable for large scale continuous copper removal.
本示例中所用的反应罐设计为移动式的, 其便于运输, 可以方便地从生 产线上拆下, 排空以及冲洗, 并可运送或者移动到任何需要的处理地点。 如 果用过的反应罐基本上是干的以及密封的就不会带来任何环境危害。 损失的 生产时间是艮少的 , 因为罐可以很方便地拆卸与置换。  The reaction tank used in this example is designed to be mobile, easy to transport, easy to remove from the production line, emptied and rinsed, and can be transported or moved to any desired processing location. If the used reaction tank is essentially dry and sealed, it will not pose any environmental hazard. The lost production time is reduced because the cans can be easily disassembled and replaced.
当然, 反应罐也可以设计为非移动式的, 用于在当地补充铝以及除去反 应产物。  Of course, the reaction tank can also be designed to be non-mobile for replenishing aluminum locally and removing reaction products.

Claims

权利要求书 Claim
1.一种使用金属铝回收及再利用废弃含氨碱性铜蚀刻剂的方法, 包括使 用一控制槽控制工艺参数, 之后使用一个或多个装有铝的独立的反应罐来除 铜。 A method of recovering and reusing waste ammonia-containing alkaline copper etchant using metal aluminum, comprising controlling a process parameter using a control cell, and then using one or more separate reaction vessels containing aluminum to remove copper.
2.如权利要求 1 所述的方法, 其特征在于, 该控制槽用于控制影响所述 蚀刻剂的工艺参数包括: 温度、 铜浓度、 pH值、 比重、 氨水容量、 氯化物含 量以及循环速度。  The method according to claim 1, wherein the control tank is used to control process parameters affecting the etchant, including: temperature, copper concentration, pH value, specific gravity, ammonia water capacity, chloride content, and circulation speed. .
3.如权利要求 1 所述的方法, 其特征在于, 该控制槽使用加热或冷却, 以保持用于处理所述蚀刻剂的有效反应温度。  3. The method of claim 1 wherein the control tank uses heating or cooling to maintain an effective reaction temperature for treating the etchant.
4.如权利要求 1 所述的方法, 其特征在于, 该控制槽通过控制所述独刻 剂的输入量以及循环流量来保持有效的铜浓度。  The method of claim 1 wherein the control tank maintains an effective copper concentration by controlling the amount of input of the single agent and the circulating flow rate.
5.如权利要求 1 所述的方法, 其特征在于, 该控制槽供料给至少一个载 有用于从所述蚀刻剂中除铜的铝的反应罐。  The method of claim 1 wherein the control tank feeds at least one reaction tank carrying aluminum for removing copper from the etchant.
6.如权利要求 1 所述的方法, 其特征在于, 该控制槽供料给多个载有用 于从所述蚀刻剂中除铜的铝的反应罐。  The method according to claim 1, wherein the control tank is fed to a plurality of reaction tanks for carrying aluminum for removing copper from the etchant.
7.如权利要求 6所述的方法, 其特征在于, 该控制槽供料给多个载有用 于除铜的铝的反应罐, 所述反应罐使用一个或多个辅助的温控装置来加快从 所述蚀刻剂中除铜的速度。  7. The method of claim 6 wherein the control tank feeds a plurality of reaction tanks carrying aluminum for copper removal, the reaction tanks being accelerated using one or more auxiliary temperature control devices The rate at which copper is removed from the etchant.
8.如权利要求 6所述的方法, 其特征在于, 该反应罐设计为可移动式的, 用于在不同的地点补充铝以及除去反应产物。  8. A method according to claim 6 wherein the reaction tank is designed to be portable for replenishing aluminum at different locations and removing reaction products.
9.如权利要求 6所述的方法, 其特征在于, 该反应罐设计为非移动式的, 用于在当地补充铝以及除去反应产物。  9. A method according to claim 6 wherein the reaction tank is designed to be non-mobile for replenishing aluminum locally and removing reaction products.
10.如权利要求 6所述的方法, 其特征在于, 该控制槽供料给多个串联布 置的反应罐。  10. The method of claim 6 wherein the control tank is fed to a plurality of reactor tanks arranged in series.
11.如权利要求 6所述的方法, 其特征在于, 该控制槽供料给多个并联布 置的反应罐。 11. The method of claim 6 wherein the control tank is fed to a plurality of reaction vessels arranged in parallel.
12.如权利要求 6所述的方法, 其特征在于, 该控制槽供料给多个混联布 置的反应罐。 12. The method of claim 6 wherein the control tank is fed to a plurality of mixing tanks.
13.如权利要求 5所迷的方法, 其特征在于, 该反应罐使用独立的过滤结 构从所述蚀刻剂中去除固态物质。  13. A method according to claim 5 wherein the reaction vessel uses a separate filtration structure to remove solid matter from the etchant.
14.如权利要求 13所述的方法, 其特征在于, 所述反应罐中使用过滤袋。 14. The method of claim 13 wherein a filter bag is used in the reaction tank.
15.如权利要求 13所述的方法, 其特征在于, 所述反应罐使用交叉流动 过滤结构。 15. The method of claim 13 wherein the reaction tank uses a cross flow filtration structure.
16.如权利要求 5所述的方法, 其特征在于, 该反应罐使用末端过滤结构 从所述蚀刻剂中去除固态物质。  16. The method of claim 5 wherein the reaction tank removes solid matter from the etchant using a terminal filtration structure.
17.如权利要求 5所述的方法, 其特征在于, 该反应罐使用沉积法从所述 蚀刻剂中去除固态物质。  17. The method of claim 5 wherein the reaction vessel removes solid matter from the etchant using a deposition process.
PCT/CN2006/003361 2005-12-12 2006-12-11 A process for recovering and recycling of waste ammoniacal alkaline copper etchant by using metallic aluminum WO2007068193A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CNA2005101301492A CN1982505A (en) 2005-12-12 2005-12-12 Method for recovering and reutilizing copper etching agent containing amino-soda by metal aluminum
CN200510130149.2 2005-12-12

Publications (2)

Publication Number Publication Date
WO2007068193A1 true WO2007068193A1 (en) 2007-06-21
WO2007068193A8 WO2007068193A8 (en) 2007-09-07

Family

ID=38162561

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2006/003361 WO2007068193A1 (en) 2005-12-12 2006-12-11 A process for recovering and recycling of waste ammoniacal alkaline copper etchant by using metallic aluminum

Country Status (2)

Country Link
CN (1) CN1982505A (en)
WO (1) WO2007068193A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102240814B (en) * 2010-05-12 2013-09-25 陈卓贤 Method for preparing superfine copper powder by utilizing environmentally-friendly recycled circuit board etching waste liquor
CN101833341B (en) * 2010-05-19 2012-02-22 四川超声印制板有限公司 Automatic control system of PH value in alkaline etching and control method thereof
CN103803737B (en) * 2012-11-06 2015-10-28 重庆龙健金属制造有限公司 A kind for the treatment of process containing copper etchant solution

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6314883A (en) * 1986-07-03 1988-01-22 Densan:Kk Treatment of spent cupric chloride solution
SU1650742A1 (en) * 1989-01-30 1991-05-23 Предприятие П/Я Р-6707 Method of recovering copper from spent pickling solutions
JPH0770658A (en) * 1993-09-01 1995-03-14 Entetsu Kako Kk Method for recovering valuable material from copper ion-containing solution
US5524780A (en) * 1995-01-31 1996-06-11 Applied Electroless Concepts Inc. Control of regeneration of ammoniacal copper etchant
US5556553A (en) * 1995-05-23 1996-09-17 Applied Electroless Concepts, Inc. Recycle process for regeneration of ammoniacal copper etchant

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6314883A (en) * 1986-07-03 1988-01-22 Densan:Kk Treatment of spent cupric chloride solution
SU1650742A1 (en) * 1989-01-30 1991-05-23 Предприятие П/Я Р-6707 Method of recovering copper from spent pickling solutions
JPH0770658A (en) * 1993-09-01 1995-03-14 Entetsu Kako Kk Method for recovering valuable material from copper ion-containing solution
US5524780A (en) * 1995-01-31 1996-06-11 Applied Electroless Concepts Inc. Control of regeneration of ammoniacal copper etchant
US5556553A (en) * 1995-05-23 1996-09-17 Applied Electroless Concepts, Inc. Recycle process for regeneration of ammoniacal copper etchant

Also Published As

Publication number Publication date
WO2007068193A8 (en) 2007-09-07
CN1982505A (en) 2007-06-20

Similar Documents

Publication Publication Date Title
CN109161895B (en) Copper recovery and regeneration system and method for acidic copper chloride etching solution
CN111032917B (en) Ammonia distillation recycling process and system for alkaline etching waste liquid of circuit board
JP2015166310A (en) Process for preparing high purity lithium carbonate and other high purity lithium-containing compound
WO2022022461A1 (en) Method and apparatus for regeneration and reuse of alkaline etching waste liquid
US3788915A (en) Regeneration of spent etchant
CN109065202B (en) System and method for treating radioactive nuclear waste organic phase
CN103274483B (en) The nickel recovery process of nickel coating strip waste liquid
CN113336258A (en) Method for preparing active copper oxide from sponge copper
WO2007068193A1 (en) A process for recovering and recycling of waste ammoniacal alkaline copper etchant by using metallic aluminum
Keskitalo et al. Analysis of key patents of the regeneration of acidic cupric chloride etchant waste and tin stripping waste
US3783113A (en) Electrolytic regeneration of spent etchant
CN214050523U (en) Cooling crystallization device for recovering metal ions from waste acid solution
CN109112597B (en) Configuration and method for reforming oxidation line to recover oxidation liquid and protect mono-nickel salt coloring tank
CN218403896U (en) Discharge wastewater recycling treatment device and waste lithium battery treatment system
CN112225302A (en) Ammonia nitrogen wastewater treatment method and system
JPS59131525A (en) Process and device for recovering trivalent chromate from circulating water produced in tanning process using chromiumbath
US20230312368A1 (en) Process for preparing battery grade metal sulphate solutions
CN112410792B (en) PCB iron-free nitric acid type tin stripping water and regeneration and reuse method thereof
US5524780A (en) Control of regeneration of ammoniacal copper etchant
US5556553A (en) Recycle process for regeneration of ammoniacal copper etchant
CN109137034B (en) Configuration and method for recovering anodic oxidation liquid by reforming existing oxidation tank
JP2927352B1 (en) Etching waste liquid recycling method and its apparatus
JP2002327288A (en) Method for collecting hydrochloric acid and copper from copper chloride solution
JPH06146022A (en) Etching treatment device
JP4184819B2 (en) Method for treating copper etch effluent

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application
NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 06828285

Country of ref document: EP

Kind code of ref document: A1