WO2007066582A1

WO2007066582A1 - Temperature control apparatus, exposure apparatus, temperature control method and device manufacturing method

Info

Publication number: WO2007066582A1
Application number: PCT/JP2006/324028
Authority: WO
Inventors: Toshihiko Tsuji; Tsukasa Ogiwara
Original assignee: Nikon Corporation
Priority date: 2005-12-05
Filing date: 2006-11-30
Publication date: 2007-06-14
Also published as: TW200731342A

Abstract

A temperature control apparatus controls the temperature of a body (104), the temperature of which is to be controlled, to be at a prescribed temperature by means of a first medium flowing in a circulation flow path. The temperature control apparatus is provided with a first heat exchanger (54), which exchanges heat between the first medium and a second medium (B) which is supplied from a supply source independent from a processing apparatus and the temperature control apparatus and is at a temperature lower than the prescribed temperature, and a second heat exchanger (52) which exchanges heat between the first medium and a third medium (C) which is at a temperature higher than the prescribed temperature.

Description

Location

, Exposure equipment, temperature and chair manufacturing fields

0001, relates to a method of manufacturing a device and chair using this device each time the device is heated to a predetermined temperature.

, Claiming priority on the basis of No. 25 35 943, filed on May 25, 2005, the content of which is incorporated herein.

002 Conducting precision work such as conductors and manufacturing to maintain a stable operating condition throughout the manufacturing year, and maintain a stable environment in order to maintain a high level of personality even in a stopped condition. Need to be done. The conductors, manufacturing, and temperature and humidity control are installed in a room, and especially semiconductors and manufacturing equipment with a high degree of processing are housed in a chamber called a cha that is cut by a partition wall.

In order to maintain the boundary between semiconductors and manufacturing equipment, the inside of 000 3 Chan is a space that is precisely controlled to the target degree, that is, positive, positive, and 5 C degrees. Conductor and manufacturing The temperature is controlled by the controlled temperature.

A control of 000 4 Chan is usually performed using a freezing cycle. In this cycle, the air inside the chamber is installed inside the air conditioner, and the air that absorbs the heat generated by the semiconductor / manufacturing equipment is cooled to below the constant temperature of the chamber and then set using an electric heater or the like. The temperature is controlled every time.

On the other hand, as the cost of semiconductors and semiconductors increases, the amount of power consumed at the same time increases as semiconductors and manufacturing become larger, and semiconductor factories tend to increase. PLUS INUS • “PLUS INUS • Semiconductors / manufacturing that requires a degree of control of 5 C. In order to achieve this degree of control, the stage was equipped with cooling for the stage semiconductor / manufacturing equipment.

W 74 8 Of Ming

Problems that Ming is trying to solve

006 In the conductor manufacturing industry, it is required to maximize the power of semiconductors / manufacturing equipment and its peripheral devices in terms of environmental protection and reduction of power consumption.

Also, when semiconductors and manufacturing refrigerators are prepared, there is a problem that not only the environmental protection and reduction of power consumption, but also the cost of the equipment is high. 0007, It is an object of the present invention to provide a manufacturing method of an exposure apparatus and a chair for reducing the power consumption required for controlling the apparatus cost.

To solve the problem

0008, the processing device () (4), the first flowing through

() Is a device that heats up to a predetermined temperature, and heat is exchanged between () which is supplied from a source independent of the body and the processing device and which is lower than the constant temperature, and a heat exchanger (54). If the body and the temperature are higher than the specified temperature

A heat exchanger (52) is provided for heat exchange with (c).

000 Also, the light (X) turns on the light exposure (w).

, 4) for storing the above, and

The above-mentioned device is provided for supplying the first body into the moving part (2) or the chamber for moving it to heat it to a predetermined temperature.

001 Further, it is characterized by using the above-mentioned device in the gray process, made by Ming chair.

Of Ming

[0111] It is clear that the power consumption required for the above can be reduced while controlling the first for the above.

This is the stem of the stem related to the 002 state. Figure 2 shows a two-unit configuration.

It is the stem of the stem according to three states.

It is the stem of the stem related to four states.

It is the stem of the stem related to 5 states.

It is the stem of the stem according to 6 states.

7 shows how to make a chair using a table.

Of the issue

001 C ~ C5 position, X position, 36 pumps, 42 exchangers,

, 52 exchangers, 54 exchangers, 56 exchangers, 58 exchangers, 62, 64, equipment, 4 chan, 6 academic systems, ~ 7, ~ meter

Good for carrying out Ming

[0114] An appropriate implementation of the present invention will be described below with reference to aspects.

(State)

Is the stem of the stem according to the apparent state. In the exposure X, Chan 4 is

Scan type dew for projecting the tan on the W

Is housed. The scanning dew drives multiple moving parts 2 (physically, aters) and interacts with W. As the moving speed of W and W increases, the amount of semiconductor elements produced within a certain period of time increases, so the drive unit 2 is large and the amount of heat generated is large.

[0115] The heat generated from these causes an accuracy problem when manufacturing a semiconductor. For example, if the projection system 6 changes in temperature, the image changes, and the degree of matching of the conductor tans that needs to be controlled at the nominal position decreases. Moreover, when the stage that moves W by heat expands thermally, the matching degree of the semiconductor tan also decreases. Against this background, the first, specifically air gas (for example, Gas) is always supplied. Below, we will explain on the premise that the first is air. In 0016 Chan 4, the air adjusted to a certain degree is sent into Chan 4.

There are P and P2, which removes the heat that has taken away heat in Chillan4. In addition, a meter for measuring the air temperature in Chan 4 is installed in Jiang 4, and a meter 3 for measuring the air temperature in P2 is installed in pipe P2. The inside of the cheer 4 is set at a certain degree according to the situation. Generally, the temperature inside Cyan 4 is maintained at a constant temperature from C to 25C, but in the state, the explanation will be made on the assumption that the temperature will be adjusted after 23C plus • C.

State 0117 is the first adjacent to Jiang 4 above.

It is located inside. A first exchanger 54 connected to the pipe P2 is arranged in the room to cool the air collected from the chain 4. Also the first

A second exchanger 52 is disposed in the first exchanger 54 in order to store the air cooled by the first exchanger 54. Further, a pipe P3 is arranged between the first exchanger 54 and the second exchanger 52. The exchanger 52 is connected to P, which sends air, which is conditioned to a certain degree, into the chamber 4. The second exchanger 52, the pipe P, the chain 4, the pipe P2, and the first exchanger 54 P3 form an air passage.

At 0018 P3, the first exchanger 54 is equipped with a meter 2 for measuring the air content. Note that pipe P is provided with 32, but this is for supplying air into the pipe of pipe P or P3, and it is not provided in pipe P, pipe P2, or pipe P3. Moyo. In addition, a pipe () is generally installed in the pipe P located at CHIANG 4 in order to prevent the dyeing of W in the projection system 6 or to prevent the dyeing of W. [0119] The exchanger 52 is connected to the pipe P4 for supplying the high temperature body which is the third C supplied from the factory (conductor) and the pipe P5 for discharging the heat-exchanged third C from the factory. In addition, the first exchanger 54 has a second The pipe P6 for supplying the low temperature body is connected to the pipe P7 for discharging the second heat-exchanged factory. That is, in the state, exposure X

From the factory, which is a source independent of C,

() Is supplied.

The pipe P6 for supplying 002 to the first exchanger 54 has a heat-insulated low temperature.

64, a variable that adjusts the amount of the cold body from the low temperature 64, and a degree meter 5 that detects the degree of the low temperature body via the variable are arranged in order from the upstream side. On the other hand, the pipe P7 for discharging the second from the first exchanger 54 to the field is provided with a flow rate. In addition, in the pipe P4 that supplies the third C to the second exchanger 52, the insulated high temperature 62, the variable 2 for adjusting the amount of the body from the high temperature 62, and the temperature of the high temperature body via the variable 2 are set. A total of 4 to detect is arranged in order from the upstream. On the other hand, there is a flow rate in the pipe P5 that outputs the third C from the second exchanger 52.

002 Here, in addition to semiconductors and exposure X

It is equipped with a gist device, a W device, a pong device, a carry device, etc., and a facility for supplying the hot body required for them. The second of the states is the cryogenic body that is normally supplied and used in the semiconductor field. On the other hand, the third C is a hot body that is normally supplied and used in the field. These cold bodies and

, Specifically water.

In the present specification, a low temperature body is a body having a low temperature with respect to the temperature of Chan 4, and a high temperature body is a body having a high temperature with respect to the temperature of Chang 4. Therefore, in this embodiment, since it is the target of Chang 4 of 23 OC, for example, the water of 25 C supplied from the semiconductor plant is a high temperature body, and the water of C is a low temperature body.

002 3 shows the fine structure of the exposure X. It will be described below

The detailed structure of X is the same in the state described later. X is a step-an-skiyan movement that synchronizes with W in one dimension and transfers the tan formed in to each region on W via the projection system 6, that is, It is a loose scanning step. This is X exposed in Jiang 4

The Cyan 4 is installed on the floor inside the bun, firstly adjacent to it.

024 is a movable system 4 that retains the movable system 2 that illuminates by exposure to light 4, a movable system 6 that projects the emitted light onto W, and a movable stage 2 that holds the W W. The main body ram 25, which holds the projection system 6 etc. and the stage 2, is used to control the exposure overall.

.

002 Academic system 2 is supported by class 4, and the degree of

Optical Integrator, Densers, Lenses, Variable to set the area due to the upper dew to a stud shape

) Is included. These faculties will be housed in the lighting housing 2a with predetermined responsibilities.

[0026] The illumination system 2 is connected to the exposure through the rotating system (the system). The routing system includes a part of the optical system called beam, ching, and so on. With this structure, Gakusei 2 is able to achieve a higher degree of distribution in the above prescribed region.

In addition, the lighting housing 2a and the routing system () are housed in non-gas (eg, um, etc.) in each part, so that the cleanliness is maintained very well.

002 In addition, most of the lighting housing 2a is supported by the support 26. For example, it is emitted from a lamp. Ultraviolet light such as (,,,) and scratches (248) and scratches () are used.

The 002 stage 4 supports, and performs two movements and a small rotation in a plane perpendicular to A of the projection system 6. In addition, is vacant due to the structure of the frame formed on the mouth of the cage 4. The two-way position and rotation of class 4 are measured in time by the, and output to that control unit. It is supported by the class 4 by driving the actuator based on the result of the table. The class 4 is supported by the support 26.

002 Student 6 forms the tan formed in at a predetermined rate.

It is projected on W and consists of multiple children. These optics

Supported by 6a. In the embodiment, the projection system 6 has projections 4 or 5, for example, and forms a stern of the projection area conjugate to the aforementioned area. It should be noted that the projection system 6 may be reduced, and the system and the system may be shifted. The inside of 6a is cleaned with non-gas (for example, um, etc.), so that it can be cleaned very well.

003 Also, the projection system 6 is installed on the plate of the main ram 27 and supported. The wastage 2 holds W and performs two movements and a small rotation in a plane perpendicular to the optical axis A by holding the drive W. C W is held by vacuum on the surface of Stage 2. In addition, a movement 22 is provided on the stage 2, and a unit 24 is provided on the opposite side. The two-way position and rotation of the waste 2 are measured in time by the 24, and the measurement result is output to the control unit. By driving the actuator etc. based on the result of the 24, the W held by the stage 2 is performed. The stage 2 is supported on the stage forming the main ram 27. The 003 ram 25 is supported by a plurality of 29 toward the spout 28 installed on the surface of the Jiang 4. The ram 25 has a main ram 27 supported by vibration proof 29 and a support ram 26 erected on the main ram 27 portion. The projection system 6 is supported by the main ram, which is the main ram 27. The support system 26 supports class 4 and lighting system 2.

003 32, the environment (, temperature and pressure were kept almost constant)

And a da chamber and a da located in this part. Note that the exposure is arranged in that part. There is an outlet for jetting the air supplied from the pipe P into the channel 4 on the surface, so that the air is sent between the jet tray and the side. A tan 8 is provided for exposure, and the end of a tan duct 9 is connected to this tan 8. It is connected to the pipe P2 of the duct 9. In other words, the air in the exposure is returned to the pipe P2 from the tank 8 through the tank duct 9.

003 (state)

Next, the operation of the stem according to the state will be explained.

In order to adjust the inside of Cyan 4 of X to 23C plus C, Cyan 4 is supplied with air of 23C which is the standard value of air conditioning through the second exchanger 52 to 32P. The temperature meter measures the air temperature in Chan 4 in order to confirm that 23C is being supplied to Channel 4.

003 The area where the temperature needs to be adjusted to a high level is housed in Jiang 4. A drive unit 2 that generates heat is arranged in the. For example, I can reach 5 C to 7 C. In Jiang 4, the air conditioning by down-type is carried out toward ((). Is discharged to the department. The probometer 3 measures the degree of air blown out below the chain 4. The discharged air has risen to 237C, for example.

It is introduced into the first exchanger 54 through the pipe P2 of 237C. On the other hand, a low temperature () is supplied from the factory to the first exchanger 54 via the pipe P6 as an object of heat exchange. Since the temperature and the flow rate fluctuate, the temperature is temporarily stored in the low temperature 64, which reduces the temperature of the low temperature body and suppresses the flow rate fluctuation. , Is supplied to the first exchanger 54 via a variable adjusted so that a predetermined amount flows under control. At the mouth of the exchanger 54, the temperature of the low temperature body is measured by the thermometer 5. Here, the following is performed assuming that the temperature of the low temperature body measured by the thermometer 5 is 2C.

In the exchanger 54, the first air and the second cold body are heat-exchanged. For example, strong heat transfer to food such as stainless steel causes the air and the low temperature body to pass through the wall such as metal, and indirectly exchanges heat with the air and the low temperature body.

In the state, if the goal is to make the inside of the chamber 4 23C, the first exchanger 54 cools the air of 23C flowing in the pipe P2 to 23C below the C by the low temperature body, for example 22C. Supply to pipe P3. Physically, the variable is controlled by the control to adjust the amount of the 2 C body flowing to the first exchanger 54, and the air degree is reduced from 23 7C to 227C. When the temperature rises, it is discharged to the factory via pipe P7.

Here, since the temperature of the low temperature body flowing through the pipe P6 is 2 C, it is possible to reduce the degree of the air flowing through the pipe P2 in the first exchanger 54 to a temperature close to C. However, it is preferable to control the air flowing through the first exchanger 54 to the pipe P2 so that it is lower than the target 23 C at 22.7 mentioned above. This is because it is necessary to raise the temperature to 23 C in the second exchanger 52, and when increasing the degree of air, if the difference is too large, the temperature (Hong) becomes large and the temperature in the second exchanger 52 becomes large. It is difficult to adjust the degree.

003 In order to measure that the air flowing to P2 is 227C, the temperature is measured with the thermometer 2 placed in the pipe P2, and the measured value is sent to the control as an id signal. Be done. It is introduced into the 2nd exchanger 52 of 22 7C and exchanges heat with the hot body supplied from the factory as an object of heat exchange. Since the temperature and the flow rate fluctuate, they are temporarily stored in the low temperature 64 and then supplied to the second exchanger 52.

Since a certain amount can be obtained at 62, the flow rate can be suppressed as the temperature of the hot body changes. Adjusts the feed rate of the hot body exchanger 52 by controlling variable 2. The temperature is measured by the thermometer 4 for the high temperature body at the mouth of the exchanger 52.

[0139] The exchanger 52 exchanges the first air and the third C high temperature body. Good heat transfer to food such as stainless steel, etc. Air and hot body are separated via the wall made of metal, etc., and heat is indirectly exchanged between air and hot body.

In the state, if the goal is to make the inside of Chang 4 23C, the second exchanger 52 feeds the gas of 227C flowing to the pipe P3 to the pipe P after making it up to 23C by the high temperature body. . Physically, the variable 2 is controlled by the control to adjust the amount of the body of 25 C flowing to the second exchanger 52, and the air degree is increased from 22 7 C to 23 C. , It is discharged to the factory via pipe P5 with the temperature lowered.

004 Here, the control specifically uses P control using proportional, integral, and action, or the control that defines the man, the number, and the fuzzy to put the human camellia in the evaluation. Then, control the temperature inside Chan 4. The thermometer 5 without thermometer is constantly measured to adjust the thermometer to 230 ° C, and the variable 2 is controlled by adjusting the amount of the low temperature body and the body. In addition, the amount of air flowing in Chan 4 is adjusted, and the amount of air circulating in Chan is controlled by Atta 32.

004 (state)

3 is the body structure of the stem according to the clear state. This stem is equipped with C2, which is a modification of the C part of the first state, and those with the same function as C are given the same symbols.

The difference between the state and the first state is that The point is that the body is not directly introduced into the first exchanger 54 or the second exchanger 52. That is, in addition to the second and first states, a first intermediate heat exchanger 58 and a second intermediate heat exchanger 56 are further provided.

004 If other equipment in the plant uses a large amount of cold and hot bodies, the degree and amount of cold bodies and bodies supplied from the factory will increase. In order to prevent this, in the first state, a high temperature 62 64 was provided to control the temperature and quantity. However, when the temperature and movement of the low temperature body and body supplied from the factory are large, it is determined that the high temperature 6264 alone is not sufficient. In the state, the amount and the degree of the low temperature body and the body introduced into the first exchanger 54 or the second exchanger 52 are very large and suitable.

In particular, the points different from the first state are explained as follows.

In the second state, a first exchanger 54, a second exchanger 52, a first intermediate heat exchanger 58 and a second intermediate heat exchanger 56 are arranged. The intermediate heat exchanger 58 is connected to a pipe P6 for supplying a low-temperature body supplied from the factory and a pipe P7 for discharging the heat-exchanged body from the factory. Further, the second intermediate heat exchanger 56 is connected to a pipe P4 for supplying a hot body supplied from the field and a pipe P5 for discharging the heat-exchanged body from the factory.

In the pipe P6 for supplying the 004 body, the low temperature 64 from the upstream side, the variable temperature, and the thermometer 5 are arranged, as described in the first state. Further, a high temperature 62, a variable 2 and a thermometer 4 are arranged from the upstream side in the pipe P4 for supplying the high temperature body. The one intermediate heat exchanger 58 is followed by the first exchanger 54 P P, and the auxiliary () is unidirectional in these pipes by the pump 36. The second intermediate heat exchanger 56 is followed by the second exchanger 52 P89, which is assisted in these pipes by the pump 36 (

) Is in a fixed direction. Body and second

Since it is only closed within 2, it can be used for any body type, such as NAT (trade name of Sum Co., Ltd.) or (IDOTE). It can be a body such as water or a body of species.

Between the intermediate heat exchanger 58 and the first exchanger 54, the variable 3 and the thermometer 7 are arranged in the order from the direction of the flow. Between the two intermediate heat exchangers 56 and the second exchanger 52, variable 4 thermometers 6 are arranged in the order from the direction of the flow. In addition, for control, 32, thermometer without temperature meter 7,

None 4 are continued respectively.

004 (state)

Next, I will explain only the differences between the first-stage system and the first-stage system.

At 237C discharged from Chang 4, it is introduced into the first exchanger 54. On the other hand, an auxiliary body circulating between the first exchanger 54 and the first intermediate heat exchanger 58 is supplied through the pipe P. One intermediate heat exchanger 58 is supplied with an average of 2 C of body supplied from the factory. For this reason, when measured with the thermometer 7, the variable is controlled by the control so that a substantially constant body of 22C flows. It is discharged via pipe P7 in the condition that the temperature is low and the temperature rises.

In the exchanger 54, the air and the auxiliary body are exchanged. If the target is to set the inside of the channel 4 to 23C, the first exchanger 54 controls so that the air of 23 7C flowing in the pipe P2 is cooled to 22 7C and then flows into the pipe P3. Physically, the variable 3 is controlled by adjusting the amount of 22 C body flowing into the first exchanger 54. The temperature control is easy because the temperature of the auxiliary equipment is stable and the temperature is stable compared to the low temperature body directly supplied from the factory.

227C in 004 P3 is introduced into the second exchanger 52. On the other hand, an auxiliary body that circulates between the second intermediate heat exchanger 56 and the second intermediate heat exchanger 56 as a target for heat exchange is supplied to the second exchanger 52 through the pipe P8. (2) The intermediate heat exchanger 56 is supplied with an average of 25C of body that is input from the factory through P4. For this reason, when measured with the thermometer 6, it is possible to change it by control so that a body of 24 C that is almost constant flows. 2 is controlled. It is discharged via pipe P5 in the condition that the high temperature and the temperature are lowered.

In the exchanger 52, the air is exchanged with the auxiliary body. The exchanger 52 controls the air at 227C flowing in the pipe P3 to 23C, and controls the air to flow in the pipe P. Physically, the variable 2 is controlled by adjusting the amount of the body of 24 C flowing into the second exchanger 52. The temperature is stable because the second high temperature inside is stable and the temperature is stable compared to the high temperature body supplied directly from the factory.

In the second state, if the first intermediate heat exchanger 58 and the second intermediate heat exchanger 56 can easily control the heat exchange, the high temperature 62 64 need not be provided. In addition, if the temperature of the cold body and the body supplied from the factory are roughly expected, it is not always necessary to provide the temperature meter 4 or the thermometer 5 for measuring the temperature of the cold body and the body. This is because the body and body degree can be measured with the thermometer 6 or the thermometer 7. Also, high temperature 62

You can switch the positions of 2 and 64.

The 0051 uses the P control to constantly measure the thermometer without the thermometer 7 and controls the variable 4 to control the temperature inside the channel 4. If the pump 36 is a variable pump,

It is also possible to control the flow rate with a variable pump without providing 4.

005 2 (state)

4 is the stem of the stem according to the clear state. This stem is equipped with C3 which is a modification of the C part of the first state, and those with the same function as C are given the same symbols.

The difference from the state is that the high temperature body supplied from the factory is not necessary, and the air discharged from the chair 4 is first heat-exchanged in the third exchanger 42 and then heat-exchanged. This is the point that air is used as the first exchanger 54. Well In the third state 4, the heat of the air discharged from the chamber 4 is effectively used.

Further, the points different from the first embodiment will be described as follows.

The first exchanger 54, the second exchanger 52, and the exchanger 42 are arranged at 4. Exchanger 42 includes a third exchange 42 and a second exchange 42.

The pipe P 2 connecting with () and the pipe P 3 connecting the second exchanger 52 to the third exchanger 42 are connected. The exchanger 42 is arranged between the P2 connecting the first exchanger 4 of the Cha 4 and P2. Further, the thermometer 3 provided in the pipe P2 is arranged between the third exchanger 42 and the first exchanger 54 so that the degree of the cooled and cooled air can be determined.

A pipe 44 for supplying 52 exchangers is provided with a heater 44, a variable 5 and a thermometer 8 from the upstream side. Further, the pump 36 is connected to the pipe P 2 or the pipe P 3, and the body is oriented in a certain direction in the pipes of the second exchanger 52, the third exchanger 42, and the pipe P 2 P 3 by the pump 36. . Since it is only enclosed within No. 34, it does not matter if the body or species is of any body type, such as NAT (trade name of Sum Co., Ltd.) or (Idote), or water. It can be the body.

005 (state)

Next, I will explain only the differences between the first-state system and the first-state system.

First, it is introduced into the third exchanger 42 of, for example, 237 C discharged from Chang 4. On the other hand, the body circulating between the third exchanger 42 and the second exchanger 52 is supplied through the pipe P 3. After passing through the exchanger 52, the degree of air is almost equal to 23 C due to the exchange with the air, and it is supplied to the third exchanger 42 in the state of 23 C. In the exchanger 42, heat is exchanged between the air at 237 C and the body at 23 C, and the temperature drops to 234 C in the case of air, for example, and it rises to 234 C, which is almost equivalent to the air in the body, and cools to 234 C. The separated air is introduced into the first exchanger 54. One, about 23 4C After being warmed up, it passes through the auxiliary heater 44 and is introduced into the second exchanger 52. In the 0056 exchanger 54, the air cooled to 234 ° C. in the third exchanger 42 and the low temperature body are exchanged. Will be seen. Similar to the state, the oC body supplied from the factory flows into the first exchanger 54. If the goal is to make the inside of Chan 4 C, the first exchanger 54 controls so that the air of 23 3C flowing to the pipe P2 is cooled to 227C and then flows to the pipe P3. Physically, the variable is controlled by adjusting the amount of the body of C flowing into the first exchanger 54 and controlling it.

227C in P007 P3 is introduced into the second exchanger 52. On the other hand, the body of 234C is supplied to the second exchanger 52 through the pipe P 2. The exchanger 52 controls so that the air of 22 7 C flowing in the pipe P3 is reduced to 23 C and flows into the pipe P. Physically, the control uses a variable 5 to control the amount of the body of 23 4C flowing into the second exchanger 52 while confirming the degree of the air supplied to the chamber 4 with the thermometer.

Here, the operation of the auxiliary heater 44 will be described. In the present embodiment, the exposure is used to control the degree of the air introduced into the chamber 4. However, immediately after the start of exposure, the temperature in the area of (3) has not risen yet, and it is almost the same as the supplied air of the air discharged through the pipe P2. Therefore, immediately after the start of exposure, the body temperature does not rise to the desired degree, and it is not possible to control the air temperature via the second exchanger 52. Therefore, immediately after the start of exposure, the auxiliary heater 44 is used to warm the body and control the air level. Here, the control is based on the result of the thermometer 8 of the auxiliary heater 44.

As the air discharged from the pipe P2 increases with time, it is necessary to heat the body using the auxiliary heater 44, so the control reduces the power of the auxiliary heater 44, or Stop if necessary. In addition, the control does not change the degree of body movement not only after exposure. Therefore, the auxiliary heater 44 can always be operated based on the result of the thermometer 8. In this case, it is desirable that the auxiliary heater 44 has the minimum force necessary to compensate for fluctuations in the body.

006 uses the P control to control variable 5 based on the results of thermometer without thermometer 3 and thermometer 58, to control the temperature inside channel 4.

006 (state)

5 is a stem of the stem according to the clear state. This stem is equipped with C4 which is a modification of the C part of the first state, and those having the same function as C are given the same symbols.

The fourth aspect is that the fourth state requires a high-temperature body supplied from the factory.Instead, the heat from the heater 32 and its board is exchanged with the fourth exchanger 34, and the heat is exchanged. This is the second exchanger 52. This is an embodiment in which the heat of the heat source in the 4th chamber is effectively utilized in the 4th state.

Further, the points different from the first embodiment will be described below.

The fourth exchanger 34 is arranged at 32, which is arranged at the offset of P, the pipe P2, or the pipe P3. In addition, in 5, 32 is placed in pipe P3.

The 006 exchanger can be a device that is directly attached to the pump tank, and the fourth exchanger 34 has a main purpose of absorbing the heat of the pump, so it is a profitable path for 4. Only the picture is drawn. The four exchangers 6 are provided with the first exchanger 54, the exchanger 52, and the exchanger 34. To the exchanger 34, a pipe P 4 branched from a pipe P 7 for discharging low temperature () stored in the first exchanger 54 is connected. Here, the low temperature () introduced into the fourth exchanger 34 increases in temperature due to the fourth exchanger 34 and becomes high temperature (). In this embodiment, the low temperature () and the high temperature () are the same () flowing in the same flow. The description will be given by changing the name of the body of the converter 34.

In addition, a pipe 44 for supplying the second exchanger 52 from the fourth exchanger 34 is provided with a heater 44 from the upstream side, a variable 6 and a thermometer 9. In the case of 4, the pump 36 is arranged in the pipe P 5, but it may be arranged in the pipe P 4. Moreover, if the force from the pipe P7 for discharging the hot body is strong, it is not necessary to install the pump 36. After being introduced into the exchanger 52 and undergoing heat exchange, it is shipped to the factory. 006 (state)

Next, only the differences in the operation of the fourth-state stem from the first-state will be explained.

The water, which is a 2 C body supplied to the exchanger 54, is discharged via the pipe P7 in a state where the temperature has risen in the first exchanger 54, for example, every 25 ° C. It is sent to the 4th exchanger 34 every 25C. The low-temperature heat sent to the exchanger 34 and the heat generated at 32 are collected by the fourth exchanger 34 and discharged from the fourth exchanger 34 as a body of 235C.

227 CC in P006 P3 is introduced into the second exchanger 52. On the other hand, the body of 235C is supplied to the second exchanger 52 through the pipe P5. The exchanger 52 controls so that the air of 22 7 C flowing in the pipe P3 is reduced to 23 C and flows into the pipe P. Physically, the control uses the variable 6 to control the amount of the 2 3 5 C body flowing to the second exchanger 52 while confirming the degree of the air supplied to the chamber 4 with the thermometer. It is sent to the factory via the exchanger 52.

Note that, as in the third state, the heat generated in the stator 32 during the startup is low, so it is necessary to adjust the temperature of the high temperature body with the auxiliary heater 44. Also, even after exposure to light, the heater 44 can be used to control the fluctuation of the hot body, as in the third state. In addition, in the fourth state, the open path was constructed by the pipes P 4 P 5, but as in the third state, the circuit was constructed by the fourth exchanger 34, the second exchanger 52, and the pipes P 4 P 5. Even Control the variable 6 based on the results of the thermometer without thermometer 3 and thermometer 5 g using the P control to control the temperature inside channel 4.

In the fourth state, the low temperature body is heated only by the fourth exchanger 34, but the low temperature body may be heated by using the heat generated by the pump 36 other than this. . As a result, the power of the heater 44 can be reduced, and more energy can be achieved.

006 (state)

6 is the stem of the stem according to the clear state. This stem is equipped with C5, which is a modification of the C part of the first state, and those with the same function as C are given the same symbols.

The fifth aspect is that the fifth state requires a high-temperature body supplied from the factory, and instead, the low-temperature (heated through the first exchanger 54) (

) Is the auxiliary heater 44 and the second exchanger 52. In other words, it is an embodiment that effectively utilizes the heat discharged from the first exchanger 54 within the fifth state 8.

Further, the differences from the first embodiment will be described below.

A pipe P 6 is provided so as to branch from the pipe P 7 for discharging the low temperature () stored in the exchanger 54. In addition, a heater 44, a pump 36, a variable 7 and a thermometer are arranged from upstream in the pipe P 6. Note that the pon 36 is not necessary when the force from the pipe P7 that discharges the low temperature body is strong.

After being introduced into the exchanger 52 and undergoing heat exchange, it is shipped to the factory.

007 0 (state)

Next, I will explain only the differences in the operation of the fifth state from the first state.

Water, which is the body of 2 OC supplied to the exchanger 54, is discharged via the pipe P7 in a state where the temperature has risen in the first exchanger 54, for example, at a temperature of 225 ° C. Since the temperature of 22 5C is too high to supply to the second exchanger 52, it is heated up to 23 5C by the low temperature auxiliary heater 44 and the high temperature (

). In the present embodiment, the high temperature () is the same () branched from the low temperature (), but for the sake of explanation, the description of the body of the above-mentioned heater 44 will be changed.

225C in P0071 P3 is introduced into the second exchanger 52. On the other hand, the body of 235C is supplied to the second exchanger 52. The exchanger 52 controls the air at 225C flowing in the pipe P3 to 23C, and controls the air to flow in the pipe P. Physically, the control uses the variable 7 to control the amount of the 2 3 5 C body flowing to the second exchanger 52 while confirming the degree of the air supplied to the chamber 4 with the thermometer. It is sent to the factory via the exchanger 52.

007 uses the P control to control variable 7 based on the results of thermometer without thermometer 3 and thermometer 5 to control the temperature inside channel 4.

007 ()

The above has described an embodiment in which the air supplied to the channel 4 is adjusted to a predetermined temperature. It is necessary to limit the supply to Chan to air. For example, it could be gas.

Also, although various states of heating the inside of the Chan 4 that stores the exposure have been described, it is possible to configure the exposure by only applying the inside of the Chan 4. In particular, if a temperature change occurs in the projection system 6, the image will change, and the conductor tans that need to be controlled at the nominal position cannot be combined. Therefore, in addition to Chan 4, a projection system 6 can be installed to keep Projection 6 densely heated.

In exposure, since a large amount of heat is generated in the moving part 2 such as the attendant and its path, a tube is directly prepared for the driving part 2 and its path from the second exchanger 52 to the driving part 2 and driven. Part 2 and its road It is preferable that That is, drive unit 2 and chain 4

One of the six faculties can be applied as.

007 When connecting 6 pipes of moving part 2 system, it is not necessary to let the body flow through the pipes or air gas. For example, it may be a body such as NAT (trade name of Sum company) or (IDOTE).

It is also applicable to the step-and-amp type throwing in which the scan position and the turn position are stopped together, and the c is stepped in sequence. The exposure X can also be applied to a step-and-stitch type exposure in which at least two tans are partially overlapped and transferred on the c. The exposure X can also be applied to a device that closely turns a disc that does not use a projection system to turn it.

Also, as the exposure X, it can be applied to a device. That's it

As such, for example, a method disclosed in International Publication No. 2453958 is known as a method of filling the space between the projection system and the base with a body. Further, as the exposure X, it is also applicable to a device in which a stage holding the exposed material is moved in the bath, and a device for forming a predetermined on the stage and holding the substrate in it.

Further, as the exposure X, as disclosed in 354 (publication publication 999 23692), a measuring stage equipped with various materials and / or sensors that can move while holding a substrate such as c. It can also be applied to a device equipped with.

00080 The operation procedure, or combination, etc. in the above-mentioned state is an example, and it can be based on the process condition and the design within the range that is not deviated from the reason.

In addition, in the above state, the movable stage is not limited to the conductor window made of semiconductor device, but the glass for display device, Servos for shoes, or discs or slabs used in the location (English, English), etc. are applicable.

The device type is not limited to a semiconductor device device that uses a semiconductor tank, and a device, a pad, (CC), an equine chip, an S chip, or a mask or a mask device made by a child manufacturing display device. It can also be applied to equipment for manufacturing etc., and can also be applied to insta-type equipment that has multiple usages. Twin stage type construction and, for example,

63 99 and 2 4783 (6 34 7, 6 4 44, 6 549 269 and 6 59 634), 2 5 595 8 (5 969 44) or in the US 6 2 8 4 7. Furthermore, the description may be applied to the stage of 2 4 6848 (publication 2 5 22242) filed earlier by the applicant of the present application.

It should be noted that in the above-mentioned state, a disc having a predetermined tan (or a tan tan) formed on the transient, or a disc having a predetermined tan formed on the emissive is used. However, it is not limited to them. For example, instead of such a disc, a tan or a reflection tan or a luminescence tan is formed based on the data of the exposure tan (also called a morpho-form tan, for example, the image display ()). Includes seeds (Dg a Mc omo Devce) etc.

The light can also be applied to exposures that are actually created by the interaction of a plurality of bundles, for example, called two lights. It is disclosed in the law and, for example, in International Publication No. 3568.

In addition, not only Kaki (248) Kaki (93, 2 Kiza (57), etc., but also () (365), etc. can be used for the position to which Ming is applied. If only system reduction And even a deviation of the system.

0087 Stage or cluster (U P5623853 or U

When using P5528118), it is possible to use either the air bearing with the air bearing or the air levitation with the air bearing or the actansuka. In addition, the stages WST and RS may be of a type that moves along a guide or a guide type that does not have a guide.

As a moving mechanism of the stage, it is also possible to use a flat plate that drives a stage by a magnetic force that opposes a two-dimensionally arranged stone and an two-dimensionally arranged arm. In this case, connect one side of the magnet to the stage and connect the side to the magnet to the moving surface of the stage.

0089 It is generated by the movement of the stage and is not transmitted to the projection system.

8 As described in 66 475 (5 528 8), you may use a mechanical mechanism to let it escape to ().

It is caused by the movement of the 0. 009 class, 8 33 224 (

As described in 5 874 82), it is possible to mechanically escape to () using a rubber.

Also, it is manufactured by assembling various systems including exposure and exposure, while maintaining a predetermined mechanical degree, electrical degree, and optical degree. In order to secure these various degrees, after this establishment, various systems are used to achieve optical degrees, various types are used to achieve mechanical degrees, and various electrical levels are used. Adjustments are made to achieve degrees. The process of establishing the system from the system includes mechanical connection, connection of electrical circuits, and air pressure between various systems. It goes without saying that there is a system stand-up process before this system stand-up process. After the process of setting up the system is completed, the overall adjustment is performed and the degree as an exposed body is secured. In addition, it is desirable that the exposure temperature and kun are controlled. It should be noted that, as far as legally permitted, all examples of exposure equipment and the like are incorporated into the text of this document.

0093 (made of chair)

7 shows the manufacturing method of the chair using X as described above.

As shown in Fig. 7, equates such as conductor chairs have a step of performing an equate measurement step, a step of manufacturing a step based on this step, a step 2 of manufacturing materials, and the steps of the above-described embodiment. Exposure process, exposing process, developing process, developing process, including process such as (key) etching process, step 3 It will be manufactured through the inspection step 5 and so on.

It can also be applied to devices that require strictness, such as manufacturing equipment, jig equipment, and electronic beam equipment for drawing.

It will be apparent to those skilled in the art that changes can be made to Ming without departing from Ming's thoughts and technical scope.

However, unlike the conventional method, refrigeration is not provided for each device, which is advantageous in terms of environmental protection and power consumption reduction. In addition, the equipment unit can be dispensed with a refrigerator or the like.

Claims

Wanted

A device that heats up to a predetermined temperature by the first body flowing through

A heat exchange is performed between the body and a body which is supplied from a source independent of the processing device and which has a temperature lower than a constant temperature, and between the body and a body which has a temperature higher than the constant temperature. And a heat exchanger for heat exchange.

2 In the exchanger, the heat of the body is transferred to the

It is described in "Transmitting to the body".

The method according to claim 2, further comprising a first tank for temporarily storing three bodies upstream of the exchanger.

The first sensor to measure the degree of 4 bodies,

The first to adjust the amount of the body,

The control which controls the above based on the information of the sensor is further included, and the shift of 3 is given.

5 The second adjustment to adjust the amount of body is further provided,

5. The control according to 4 above, which controls the two adjustments based on the information from the sensor.

6 further comprising a second sensor upstream of the exchanger for detecting the degree of the body, a third sensor upstream of the exchanger for detecting the degree of the body,

5. The control of the two adjustments based on the information of the sensor and the sensor.

If 7 bodies are supplied from a source independent of the above-mentioned processing device and the above, it is described in the deviation of 6.

8. The method according to 7, further comprising a second tank for temporarily storing 8 bodies upstream of the exchanger.

9 is provided between the exchange and 6. If further provided with a third exchanger for transmitting the above to the body, it is described in any of 6 above.

7. A fourth exchanger provided between 0 and the exchanger, further comprising a fourth exchanger for transmitting the pump of the body to the body.

, If the body is elevated after passing through the exchanger, it is described in the deviation of 6.

2 The processing device has a source different from the above.

The above, the shift of 6 if the body is raised by the exchange with the downstream of the exchanger.

3 is a device for driving a movable stage on which the vehicle is mounted, and the body supplied to the device is described in the deviation of 2.

4, to turn on the light exposure,

Item 4. In the item 3, there is a feature that the gas is supplied to the chamber containing the item.

5 In the place where the tan is put on,

The moving part that moves the device is provided with the device according to claim 4 for supplying the first body into the chamber and heating it to a predetermined temperature.

6 In the manufacturing method of the chair including the gray process, the manufacturing process of the chair using the device described in 5 in the above-mentioned gray process.

7 A device that can be heated by the first body to a specified temperature

A body with a temperature lower than the constant temperature can be obtained upstream of the exchanger. A heat exchanger for exchanging heat between the body and the body; and a heat exchanger for exchanging heat between the body and a body having a temperature higher than the constant temperature.

8.The method according to 7, further comprising a second tank for holding eight bodies upstream of the exchanger.

9. The heat exchanger according to claim 7 or 8, wherein the heat exchanger has two intermediate heat exchangers for heat exchange between the body and the body via the fourth body.

20. The heat exchanger according to 7, which has a first intermediate heat exchanger for heat exchange between the body and the body through the fifth body.

The method of heating to a predetermined temperature by the first body is provided by the processing device described in any of 7 to 2, further comprising a sensor for measuring the degree of the two bodies and an adjustment for adjusting the amount of the body.

Receiving a body temperature lower than the constant temperature from the facility in which the physical processing device is installed;

Heat exchange between the body and the body,

Heat exchange between the body and a body having a temperature higher than the constant temperature.

After temporarily storing 23 bodies in the first tank, heat exchange between the bodies is described in FIG.

The method according to claim 23 or claim 23, wherein the degree of 24 bodies is measured, and the amount of the body is adjusted based on the measurement result.

In the manufacturing method of the chair including the 25 steps, the manufacturing method of the chair using the method described in the deviations of 22 to 24 in the above steps.