WO2007059876A2 - Spiral en verre athermique pour mouvement d’horlogerie et son procede de fabrication - Google Patents
Spiral en verre athermique pour mouvement d’horlogerie et son procede de fabrication Download PDFInfo
- Publication number
- WO2007059876A2 WO2007059876A2 PCT/EP2006/010854 EP2006010854W WO2007059876A2 WO 2007059876 A2 WO2007059876 A2 WO 2007059876A2 EP 2006010854 W EP2006010854 W EP 2006010854W WO 2007059876 A2 WO2007059876 A2 WO 2007059876A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- turns
- spiral
- glass
- mask
- cte
- Prior art date
Links
- 239000011521 glass Substances 0.000 title claims abstract description 39
- 238000000034 method Methods 0.000 title claims description 23
- 238000010438 heat treatment Methods 0.000 claims abstract description 17
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 claims abstract description 5
- 238000005286 illumination Methods 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 230000004048 modification Effects 0.000 claims description 10
- 238000012986 modification Methods 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 9
- 239000002253 acid Substances 0.000 claims description 5
- 238000005530 etching Methods 0.000 claims description 4
- 238000003486 chemical etching Methods 0.000 abstract description 6
- 239000000203 mixture Substances 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 102100025854 Acyl-coenzyme A thioesterase 1 Human genes 0.000 description 1
- 101710175445 Acyl-coenzyme A thioesterase 1 Proteins 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 239000006090 Foturan Substances 0.000 description 1
- 241000511976 Hoya Species 0.000 description 1
- 229910001374 Invar Inorganic materials 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 229910001257 Nb alloy Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910001093 Zr alloy Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002671 adjuvant Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000010310 metallurgical process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 238000005491 wire drawing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/20—Compensation of mechanisms for stabilising frequency
- G04B17/22—Compensation of mechanisms for stabilising frequency for the effect of variations of temperature
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F1/00—Springs
- F16F1/02—Springs made of steel or other material having low internal friction; Wound, torsion, leaf, cup, ring or the like springs, the material of the spring not being relevant
- F16F1/04—Wound springs
- F16F1/10—Spiral springs with turns lying substantially in plane surfaces
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/002—Other surface treatment of glass not in the form of fibres or filaments by irradiation by ultraviolet light
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F1/00—Springs
- F16F1/02—Springs made of steel or other material having low internal friction; Wound, torsion, leaf, cup, ring or the like springs, the material of the spring not being relevant
- F16F1/021—Springs made of steel or other material having low internal friction; Wound, torsion, leaf, cup, ring or the like springs, the material of the spring not being relevant characterised by their composition, e.g. comprising materials providing for particular spring properties
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/04—Oscillators acting by spring tension
- G04B17/06—Oscillators with hairsprings, e.g. balance
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/04—Oscillators acting by spring tension
- G04B17/06—Oscillators with hairsprings, e.g. balance
- G04B17/066—Manufacture of the spiral spring
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/20—Compensation of mechanisms for stabilising frequency
- G04B17/22—Compensation of mechanisms for stabilising frequency for the effect of variations of temperature
- G04B17/227—Compensation of mechanisms for stabilising frequency for the effect of variations of temperature composition and manufacture of the material used
-
- G—PHYSICS
- G04—HOROLOGY
- G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
- G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
-
- G—PHYSICS
- G04—HOROLOGY
- G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
- G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
- G04D3/0074—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment
- G04D3/0089—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment for components of the regulating mechanism, e.g. coil springs
Definitions
- the present invention relates to a hairspring for a watch movement made of a special glass and to a method making it possible to render its mechanical properties, and in particular its temperature coefficient of Young's modulus (CTE) almost completely independent of the temperature, while enjoying its non-magnetic properties.
- CTE Young's modulus
- EP 0 886 195 discloses, for example, Niobium and Zirconium alloy compositions further containing an interstitial dopant agent formed at least in part of oxygen and making it possible to control the value of the CTE.
- an interstitial dopant agent formed at least in part of oxygen and making it possible to control the value of the CTE.
- the final product has a high cost.
- the manufacture of a metal hairspring uses complex metallurgical processes (wire drawing, hardening, annealing, etc.) which do not guarantee perfect reproducibility of the desired elastic properties, so that it is still necessary to proceed. the pairing of the balance and the hairspring during assembly.
- Patent CH 307 683 published in 1955 proposes to manufacture a glass hairspring having a silica content such that its coefficient of expansion has a value practically zero without the need to add any rare metal. This document does not describe how such a spiral is fashioned, nor what is the influence on the CTE.
- EP 1519250 describes a thermocompensated balance-spring resonator by cutting and structuring according to orientations determined with respect to the crystallographic axes of a quartz crystal. Such manufacturing process can only be implemented by qualified persons. On the other hand, the crystalline nature of quartz renders the spiral brittle under shock by causing cracks that propagate along crystalline planes.
- the present invention therefore aims to overcome the disadvantages of the aforementioned prior art by providing a glass hairspring manufactured by a method for both locally controlling the mechanical properties, in particular the thermal coefficient of Young's modulus (CTE) of said hairspring and that its coefficient of elasticity and ability to perform a batch manufacturing at lower cost.
- CTE thermal coefficient of Young's modulus
- the material chosen to manufacture a glass spiral composed of turns of uniform height h and locally of width I is a photostructurable glass having initially a thermal coefficient of the Young's modulus (CTE 0 ) preferably close to zero.
- CTE 0 thermal coefficient of the Young's modulus
- Such a glass makes it possible to locally modify the thermal coefficient of Young's modulus (CTEj) by irradiation, said irradiation possibly being supplemented by a heat treatment at high temperature.
- This modification can be performed for one or more turns or zones of turns having different CTEj along the spiral.
- the modification of the CTEj can also be performed on part of the width of the turns, over all or part of their length, or even only a part of the height of the turns.
- Such a hairspring can be manufactured in a batch from a photostructurable glass plate having the Young's modulus coefficient CTE 0 , according to two methods based on the same principles.
- a first method UV illumination is effected through a first mask on areas of the glass corresponding to the spaces to be subsequently released between the turns.
- a high temperature heat treatment is carried out which makes it possible to weaken the zones having been illuminated, without having a destructive effect.
- a new UV illumination is performed through a second mask whose windows are arranged above turns, zones of turns, over all or part of their width to modify the initial CTE 0 to a value CTEj.
- the previous step can be renewed with a third mask, and with UV illumination characteristics allowing the initial CTE 0 to be changed to a CTE 2 value on only a part of the height of the hairspring, preferably by performing this step at the same time. both on the upper and lower surfaces of said hairspring.
- the second and third masks may have common window areas, so that the initial CTE 0 is changed to a CTE value 3 that may be different from the previous ones.
- the zones between the turns which have been weakened by UV and thermal treatment are removed by chemical etching.
- a glass plate is fastened to a substrate which is insensitive to acid attack and the spiral is first shaped by means of a first mask by UV illumination, and heat treatment and then acid etching. At the end of this step the turns are separated but remain bonded to the substrate.
- UV illumination is performed through a mask whose windows correspond to zones of turns whose CTEj is to be modified.
- the hairspring is released from the substrate and an additional heat treatment is optionally carried out to obtain a further adjustment of the CTE. If necessary, it is possible to carry out an additional heat treatment to obtain a further adjustment of the CTE, after each UV illumination to modify CTE 0 , whether in the first or the second process.
- the mask used to define the outline of the spiral may also make it possible to vary the pitch and / or the width of the turns along said spiral or on specific zones of turn.
- FIGS. 7 to 9 represent the steps of a first method making it possible to modify a chosen zone of the spiral
- FIGS. 10A, 10B and 10C represent the sections of three different turns modified by the first method; - AT -
- FIGS. 11 to 13 show a second method making it possible to modify a chosen zone of the spiral
- FIGS. 14A, 14B and 14C show the straight sections of three different turns modified by the second method.
- Figure 1 there is shown in plan view a spiral made from a photostructurable glass having a low thermal coefficient Young's modulus CTE 0 .
- glasses whose compositions based on silicates incorporate certain dopants and / or adjuvants, such as oxides of cerium, silver, tin, or antimony, which will render parts of this glass, subjected to ultraviolet irradiation and heat treatment, chemically easily attackable anisotropically, for example by a hydrofluoric acid solution.
- This property is well known and already used to manufacture, for example, microfluidic devices.
- Such glasses are for example available from Schott AG in Germany under the brand Foturan ® or Hoya Corp in Japan under the reference PEG 3.
- Such photostructurable glasses are currently only used for their properties for obtaining MEMS by unconventional machining techniques.
- FIGS. 2 to 6 show, in top view, examples of modification of the CTE of a spiral turnaround L initially having a thermal coefficient of the Young's modulus of CTE 0 .
- FIG. 2 shows that, for a zone 11, over the entire width I, the initial CTEo has been modified to CTE-
- FIG. 4 illustrates another embodiment in which the initial thermal coefficient of Young's modulus CTEo only on an area 11 of the hairspring having a width F less than I.
- the zone 11 is located substantially in the center, but it is obvious that it could be provided in the thickness of the outer surface or inner surface, or in both at the same time.
- FIG. 5 illustrates another variant in which the thermal coefficient of the Young's modulus is modified from the value CTE 0 to a value CTEi in an outer zone 11 of width T and to a value CTE 2 in an inner zone 12 of width I " These two zones being contiguous, FIG.
- the method together with the modification of the CTE, can have a favorable influence on the coefficient of expansion ⁇ s> which is involved in the determination of the frequency, even if its influence is much less important.
- Figures 7 to 10c show in section, along the arrow S, three contiguous turns of height h, being observed that the height / width of the turn is not respected for a better understanding of the drawings.
- UV illumination is carried out as shown in FIG. 7 through a mask 3.
- the mask 3 comprises a window 3a whose opening is located above areas 15 to be subsequently removed to obtain the space desired between the turns, ie a pitch p., which in this example remains constant at all points, the turns having a uniform width L
- the UV radiation source used depends on the absorption band of the glass used. This is for example a UV lamp whose peak spectral distribution is between 200 and 400 nm. It is also possible to use another radiation source such as an Eximer XeCl2 laser whose emission peak is 308 nm, or KrF 2 having an emission peak at 248 nm.
- the photostructurable glass plate 1 is subjected to a high temperature heat treatment, of the order of 600 ° C depending on the composition of the glass.
- This heat treatment makes it possible to make the zones 15 having have UV illumination more easily and selectively removable by subsequent chemical etching.
- a second mask 5 has windows 5a, 5b and so on. ... arranged above the turns or zones of turns 11 whose initial CTE 0 is to be modified to a determined value CTEi, by UV irradiation through said windows. It will be observed that these windows can be provided on only a part of the width of a turn.
- the window 5b has a width l b located substantially in the median portion of the turn
- the window 5c has a width l c located on an edge of the turn.
- This chemical etching is carried out conventionally, for example in a bath of hydrofluoric acid at about 10%, at room temperature and under ultrasound.
- FIG. 10a shows a zone 11 of width l b whose CTE has been modified in CTE 1 , on either side of two zones 10 whose initial CTE 0 has not been modified.
- FIG. 10b the modification of CTE 0 to a value CTE 1 is carried out over a width l c located near the edge of the turn. It is obvious that other modified CTE zone configurations are possible depending on the shapes of the windows of the mask 5, and that these configurations may concern a turn zone, several turns, or even the entire spiral.
- FIG. 9 it is seen that it is possible, before carrying out the chemical etching, to subject turns or turn zones to a new UV illumination through a mask 6 which, in this example, has windows 6d having the same width as the spiral.
- an appropriate UV irradiation for example an Eximer KrF 2 laser at 248 nm and controlling the exposure time, it is possible to modify the thermal coefficient of the Young's modulus from the initial value CTE 0 to a value CTE 2 in a zone 12 which penetrates only a part JV of the height h of the spiral.
- FIG. 11 illustrates a second manufacturing method and a number of variants that would also be applicable to the first method.
- a glass plate 1 having a thickness h, having the characteristics indicated at the beginning is fixed on a substrate 2 insensitive to acid attacks.
- the substrate 2 is for example a ceramic plate.
- the spiral is then shaped by UV illumination through a mask 7 whose windows 7a, 7b correspond to the free spaces between the turns and whose opaque portions determine the planar contour of the spiral.
- a suitable mask 7 it is possible to design the outline of the spiral with a variable pitch p a , Pb, etc., with a variable width li, I2, 13, etc. or with both.
- a heat treatment at high temperature is completed by a heat treatment at high temperature to weaken areas that have just been illuminated.
- the illuminated portions are removed by acid etching as indicated in the first method.
- a UV illumination is carried out through a second mask 8 whose windows 8c, 8d, 8e will define zones 11 of turns whose thermal coefficient of the Young's modulus will be modified by the value CTEo at the value CTE-), possibly carrying out additional heat treatment at high temperature.
- new windows 9 ⁇ , 9f, 9g will define new areas 12 of the spiral for which the thermal coefficient of the module Young will have been modified to a CTE2 value, or even zones 13 where it will have been modified to a value CTE3 if windows, or window areas of masks 8 and 9 coincide, as is the case for windows 8c and 9e .
- the modified zones may optionally be subjected to additional heat treatment at high temperature.
- the spiral is separated from the substrate 2.
- turns or zones of turns having respectively the values of CTE, CTE3 / CTE0 (FIG. 14a), CTE2 / CT1 have been obtained.
- Fig. 14b CTE 2 / CTE 0 / CTEi.
- the skilled person can design other variants without departing from the scope of the invention to improve the mechanical properties of a glass hairspring, and particularly its insensitivity to variations. of temperature, which are harmful to isochronism.
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- Organic Chemistry (AREA)
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- Life Sciences & Earth Sciences (AREA)
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- General Chemical & Material Sciences (AREA)
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Abstract
Description
Claims
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020087012485A KR101247907B1 (ko) | 2005-11-25 | 2006-11-13 | 글래스 밸런스 스프링과 스프링 밸런스 시스템 및 이를 제조하기 위한 방법 |
US12/095,088 US7753581B2 (en) | 2005-11-25 | 2006-11-13 | Spiral spring made of athermal glass for clockwork movement and method for making same |
CN2006800515054A CN101361027B (zh) | 2005-11-25 | 2006-11-13 | 由绝热玻璃制成的用于钟表机构机芯的螺旋游丝及其制造方法 |
JP2008541616A JP5061117B2 (ja) | 2005-11-25 | 2006-11-13 | 時計のムーブメント用の熱ガラス製ゼンマイとその製造方法 |
EP06829020A EP1958031B1 (fr) | 2005-11-25 | 2006-11-13 | Spiral en verre athermique pour mouvement d horlogerie et son procede de fabrication |
HK09106337.0A HK1128777A1 (en) | 2005-11-25 | 2009-07-14 | Spiral spring made of athermal glass for clockwork movement and method for making same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP05025724A EP1791039A1 (fr) | 2005-11-25 | 2005-11-25 | Spiral en verre athermique pour mouvement d'horlogerie et son procédé de fabrication |
EP05025724.5 | 2005-11-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2007059876A2 true WO2007059876A2 (fr) | 2007-05-31 |
WO2007059876A3 WO2007059876A3 (fr) | 2007-10-04 |
Family
ID=37101394
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2006/010854 WO2007059876A2 (fr) | 2005-11-25 | 2006-11-13 | Spiral en verre athermique pour mouvement d’horlogerie et son procede de fabrication |
Country Status (8)
Country | Link |
---|---|
US (1) | US7753581B2 (fr) |
EP (2) | EP1791039A1 (fr) |
JP (1) | JP5061117B2 (fr) |
KR (1) | KR101247907B1 (fr) |
CN (1) | CN101361027B (fr) |
HK (1) | HK1128777A1 (fr) |
TW (1) | TW200731037A (fr) |
WO (1) | WO2007059876A2 (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2590325A1 (fr) | 2011-11-04 | 2013-05-08 | The Swatch Group Research and Development Ltd. | Résonateur thermocompensé en céramique |
CN106104393A (zh) * | 2014-01-29 | 2016-11-09 | 卡地亚国际股份公司 | 由在其组成中包含硅的陶瓷制成的热补偿的游丝和用于调节游丝的方法 |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8414185B2 (en) * | 2007-11-28 | 2013-04-09 | Manufacture Et Fabrique De Montres Et Chronometres Ulysse Nardin Le Locle S.A. | Mechanical oscillator having an optimized thermoelastic coefficient |
EP2104007A1 (fr) * | 2008-03-20 | 2009-09-23 | Nivarox-FAR S.A. | Spiral monobloc en matériau à base de silicium et son procédé de fabrication |
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- 2006-11-13 JP JP2008541616A patent/JP5061117B2/ja active Active
- 2006-11-13 WO PCT/EP2006/010854 patent/WO2007059876A2/fr active Application Filing
- 2006-11-13 KR KR1020087012485A patent/KR101247907B1/ko not_active IP Right Cessation
- 2006-11-13 US US12/095,088 patent/US7753581B2/en active Active
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2590325A1 (fr) | 2011-11-04 | 2013-05-08 | The Swatch Group Research and Development Ltd. | Résonateur thermocompensé en céramique |
WO2013064351A1 (fr) | 2011-11-04 | 2013-05-10 | The Swatch Group Research And Development Ltd | Résonateur thermocompensé en céramique |
EP2774268B1 (fr) * | 2011-11-04 | 2019-01-23 | The Swatch Group Research and Development Ltd. | Résonateur thermocompensé en céramique |
CN106104393A (zh) * | 2014-01-29 | 2016-11-09 | 卡地亚国际股份公司 | 由在其组成中包含硅的陶瓷制成的热补偿的游丝和用于调节游丝的方法 |
Also Published As
Publication number | Publication date |
---|---|
EP1958031B1 (fr) | 2012-06-06 |
TW200731037A (en) | 2007-08-16 |
US20090016173A1 (en) | 2009-01-15 |
JP2009517637A (ja) | 2009-04-30 |
US7753581B2 (en) | 2010-07-13 |
KR20080072002A (ko) | 2008-08-05 |
HK1128777A1 (en) | 2009-11-06 |
CN101361027A (zh) | 2009-02-04 |
EP1791039A1 (fr) | 2007-05-30 |
WO2007059876A3 (fr) | 2007-10-04 |
KR101247907B1 (ko) | 2013-04-02 |
JP5061117B2 (ja) | 2012-10-31 |
EP1958031A2 (fr) | 2008-08-20 |
CN101361027B (zh) | 2012-05-30 |
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