WO2007051142A3 - Metal cuboid semiconductor device and method - Google Patents
Metal cuboid semiconductor device and method Download PDFInfo
- Publication number
- WO2007051142A3 WO2007051142A3 PCT/US2006/060265 US2006060265W WO2007051142A3 WO 2007051142 A3 WO2007051142 A3 WO 2007051142A3 US 2006060265 W US2006060265 W US 2006060265W WO 2007051142 A3 WO2007051142 A3 WO 2007051142A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- cuboids
- cuboid
- copper
- height
- sides
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 239000002184 metal Substances 0.000 title 1
- 150000001875 compounds Chemical class 0.000 abstract 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 3
- 229910052802 copper Inorganic materials 0.000 abstract 3
- 239000010949 copper Substances 0.000 abstract 3
- 238000005538 encapsulation Methods 0.000 abstract 2
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01046—Palladium [Pd]
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01047—Silver [Ag]
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/0105—Tin [Sn]
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/10251—Elemental semiconductors, i.e. Group IV
- H01L2924/10253—Silicon [Si]
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1532—Connection portion the connection portion being formed on the die mounting surface of the substrate
- H01L2924/1533—Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate
- H01L2924/15331—Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate being a ball array, e.g. BGA
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/20—Parameters
- H01L2924/207—Diameter ranges
- H01L2924/20752—Diameter ranges larger or equal to 20 microns less than 30 microns
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/30107—Inductance
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3025—Electromagnetic shielding
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Lead Frames For Integrated Circuits (AREA)
- Wire Bonding (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
A semiconductor device comprising a semiconductor chip (101) assembled on a first copper cuboid (110); the cuboid has sides of a height (111). The device further has a plurality of second copper cuboids (120) suitable for wire bond attachment; the second cuboids have sides of a height (121) substantially equal to the height of the first cuboid. The back surfaces of all cuboids are aligned in a plane (130). Encapsulation compound (140) is adhering to and embedding the chip, the wire bonds, and the sides of all cuboids so that the compound forms a first surface (140b) aligned with the plane of the back cuboid surfaces and a second surface (140a) above the embedded wires. For devices intended for stacking, the devices further comprise a plurality of vias (160) through the encapsulation compound from the first to the second compound surfaces; the vias are filled with copper, and the via locations are matching between the devices-to-be-stacked.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008538167A JP2009514237A (en) | 2005-10-26 | 2006-10-26 | Metal cubic semiconductor device and method |
EP06839559.9A EP1952440B1 (en) | 2005-10-26 | 2006-10-26 | Metal cuboid semiconductor device and method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/259,015 US7504716B2 (en) | 2005-10-26 | 2005-10-26 | Structure and method of molded QFN device suitable for miniaturization, multiple rows and stacking |
US11/259,015 | 2005-10-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2007051142A2 WO2007051142A2 (en) | 2007-05-03 |
WO2007051142A3 true WO2007051142A3 (en) | 2008-09-25 |
Family
ID=37968669
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2006/060265 WO2007051142A2 (en) | 2005-10-26 | 2006-10-26 | Metal cuboid semiconductor device and method |
Country Status (5)
Country | Link |
---|---|
US (1) | US7504716B2 (en) |
EP (1) | EP1952440B1 (en) |
JP (1) | JP2009514237A (en) |
CN (1) | CN101361163A (en) |
WO (1) | WO2007051142A2 (en) |
Families Citing this family (55)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101053079A (en) | 2004-11-03 | 2007-10-10 | 德塞拉股份有限公司 | Stacked packaging improvements |
US8058101B2 (en) | 2005-12-23 | 2011-11-15 | Tessera, Inc. | Microelectronic packages and methods therefor |
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US20120146206A1 (en) | 2010-12-13 | 2012-06-14 | Tessera Research Llc | Pin attachment |
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US10141270B2 (en) * | 2016-12-09 | 2018-11-27 | Amkor Technology, Inc. | Semiconductor device and method of manufacturing thereof |
US10299368B2 (en) | 2016-12-21 | 2019-05-21 | Invensas Corporation | Surface integrated waveguides and circuit structures therefor |
US10354987B1 (en) | 2018-03-22 | 2019-07-16 | Sandisk Technologies Llc | Three-dimensional memory device containing bonded chip assembly with through-substrate via structures and method of making the same |
US10354980B1 (en) | 2018-03-22 | 2019-07-16 | Sandisk Technologies Llc | Three-dimensional memory device containing bonded chip assembly with through-substrate via structures and method of making the same |
US10886231B2 (en) * | 2018-06-29 | 2021-01-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of forming RDLS and structure formed thereof |
US10879260B2 (en) | 2019-02-28 | 2020-12-29 | Sandisk Technologies Llc | Bonded assembly of a support die and plural memory dies containing laterally shifted vertical interconnections and methods for making the same |
DE102022109053A1 (en) | 2022-04-13 | 2023-10-19 | Infineon Technologies Ag | Producing a package using a solderable or sinterable metallic connection structure which is applied to a sacrificial support |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7005327B2 (en) * | 2002-09-11 | 2006-02-28 | Advanced Semiconductor Engineering, Inc. | Process and structure for semiconductor package |
US7119421B2 (en) * | 2002-06-06 | 2006-10-10 | Koninklijke Philips Electronics N.V. | Quad flat non-leaded package comprising a semiconductor device |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6525406B1 (en) * | 1999-10-15 | 2003-02-25 | Amkor Technology, Inc. | Semiconductor device having increased moisture path and increased solder joint strength |
US6551859B1 (en) * | 2001-02-22 | 2003-04-22 | National Semiconductor Corporation | Chip scale and land grid array semiconductor packages |
JP4034073B2 (en) * | 2001-05-11 | 2008-01-16 | 株式会社ルネサステクノロジ | Manufacturing method of semiconductor device |
DE10147375B4 (en) * | 2001-09-26 | 2006-06-08 | Infineon Technologies Ag | Electronic component with a semiconductor chip and method for producing the same |
-
2005
- 2005-10-26 US US11/259,015 patent/US7504716B2/en active Active
-
2006
- 2006-10-26 EP EP06839559.9A patent/EP1952440B1/en not_active Expired - Fee Related
- 2006-10-26 WO PCT/US2006/060265 patent/WO2007051142A2/en active Application Filing
- 2006-10-26 CN CNA2006800402338A patent/CN101361163A/en active Pending
- 2006-10-26 JP JP2008538167A patent/JP2009514237A/en not_active Abandoned
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7119421B2 (en) * | 2002-06-06 | 2006-10-10 | Koninklijke Philips Electronics N.V. | Quad flat non-leaded package comprising a semiconductor device |
US7005327B2 (en) * | 2002-09-11 | 2006-02-28 | Advanced Semiconductor Engineering, Inc. | Process and structure for semiconductor package |
Also Published As
Publication number | Publication date |
---|---|
EP1952440B1 (en) | 2019-12-11 |
WO2007051142A2 (en) | 2007-05-03 |
EP1952440A4 (en) | 2010-10-06 |
US20070090524A1 (en) | 2007-04-26 |
CN101361163A (en) | 2009-02-04 |
US7504716B2 (en) | 2009-03-17 |
JP2009514237A (en) | 2009-04-02 |
EP1952440A2 (en) | 2008-08-06 |
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