WO2007011630A3 - Systems, circuits and methods for reducing thermal damage and extending the detection range of an inspection system by avoiding detector and circuit saturation - Google Patents
Systems, circuits and methods for reducing thermal damage and extending the detection range of an inspection system by avoiding detector and circuit saturation Download PDFInfo
- Publication number
- WO2007011630A3 WO2007011630A3 PCT/US2006/027129 US2006027129W WO2007011630A3 WO 2007011630 A3 WO2007011630 A3 WO 2007011630A3 US 2006027129 W US2006027129 W US 2006027129W WO 2007011630 A3 WO2007011630 A3 WO 2007011630A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- circuits
- methods
- detection range
- systems
- thermal damage
- Prior art date
Links
- 238000001514 detection method Methods 0.000 title abstract 6
- 238000007689 inspection Methods 0.000 title abstract 6
- 238000000034 method Methods 0.000 title abstract 4
- 230000003685 thermal hair damage Effects 0.000 title abstract 2
- 230000007547 defect Effects 0.000 abstract 3
- 238000005259 measurement Methods 0.000 abstract 2
- 239000002245 particle Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/10—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void
- G01J1/16—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void using electric radiation detectors
- G01J1/18—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void using electric radiation detectors using comparison with a reference electric value
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J43/00—Secondary-emission tubes; Electron-multiplier tubes
- H01J43/04—Electron multipliers
- H01J43/30—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Pathology (AREA)
- Immunology (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Signal Processing (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Electronic Switches (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analyzing Materials Using Thermal Means (AREA)
Abstract
Inspection systems, circuits and methods are provided to enhance defect detection by addressing anode saturation as a limiting factor of the measurement detection range of a photomultiplier tube (PMT) detector. Inspection systems, circuits and methods are also provided to enhance defect detection by addressing saturation levels of the amplifier and analog-digital circuitry as a limiting factor of the measurement detection range of an inspection system. In addition, inspection systems, circuits, and methods are provided to enhance defect detection by reducing thermal damage to large particles by dynamically altering the incident laser beam power level supplied to the specimen during a surface inspection scan.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008521588A JP5302678B2 (en) | 2005-07-14 | 2006-07-12 | Systems, circuits, and methods for extending the detection range by reducing thermal damage in inspection systems by avoiding detector and circuit saturation |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/181,237 US7423250B2 (en) | 2005-07-14 | 2005-07-14 | Systems, circuits and methods for extending the detection range of an inspection system by avoiding circuit saturation |
US11/181,228 US7436508B2 (en) | 2005-07-14 | 2005-07-14 | Systems, circuits and methods for reducing thermal damage and extending the detection range of an inspection system |
US11/181,228 | 2005-07-14 | ||
US11/181,237 | 2005-07-14 | ||
US11/181,519 US7414715B2 (en) | 2005-07-14 | 2005-07-14 | Systems, circuits and methods for extending the detection range of an inspection system by avoiding detector saturation |
US11/181,519 | 2005-07-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2007011630A2 WO2007011630A2 (en) | 2007-01-25 |
WO2007011630A3 true WO2007011630A3 (en) | 2007-04-05 |
Family
ID=37669352
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2006/027129 WO2007011630A2 (en) | 2005-07-14 | 2006-07-12 | Systems, circuits and methods for reducing thermal damage and extending the detection range of an inspection system by avoiding detector and circuit saturation |
Country Status (2)
Country | Link |
---|---|
JP (2) | JP5302678B2 (en) |
WO (1) | WO2007011630A2 (en) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7746462B2 (en) * | 2007-05-21 | 2010-06-29 | Kla-Tencor Technologies Corporation | Inspection systems and methods for extending the detection range of an inspection system by forcing the photodetector into the non-linear range |
US7787114B2 (en) * | 2007-06-06 | 2010-08-31 | Kla-Tencor Technologies Corp. | Systems and methods for inspecting a specimen with light at varying power levels |
US7973921B2 (en) * | 2008-06-25 | 2011-07-05 | Applied Materials South East Asia Pte Ltd. | Dynamic illumination in optical inspection systems |
US9279774B2 (en) * | 2011-07-12 | 2016-03-08 | Kla-Tencor Corp. | Wafer inspection |
US8755044B2 (en) * | 2011-08-15 | 2014-06-17 | Kla-Tencor Corporation | Large particle detection for multi-spot surface scanning inspection systems |
US9184034B2 (en) * | 2012-03-19 | 2015-11-10 | Kla-Tencor Corporation | Photomultiplier tube with extended dynamic range |
JP2014119282A (en) * | 2012-12-13 | 2014-06-30 | Fuji Electric Co Ltd | Linearity-compensating bleeder circuit and radiation detector |
AU2014354949B2 (en) * | 2013-11-26 | 2019-10-31 | Perkinelmer U.S. Llc | Detectors and methods of using them |
WO2016121756A1 (en) | 2015-01-30 | 2016-08-04 | 株式会社日立ハイテクノロジーズ | Examination device |
US10186406B2 (en) * | 2016-03-29 | 2019-01-22 | KLA—Tencor Corporation | Multi-channel photomultiplier tube assembly |
JP6850549B2 (en) * | 2016-05-12 | 2021-03-31 | 日本信号株式会社 | Optical ranging device |
CA3026955A1 (en) * | 2016-06-09 | 2017-12-14 | ETP Ion Detect Pty Ltd | Improvements in electron multipliers |
US10324045B2 (en) * | 2016-08-05 | 2019-06-18 | Kla-Tencor Corporation | Surface defect inspection with large particle monitoring and laser power control |
WO2018085237A1 (en) * | 2016-11-02 | 2018-05-11 | Corning Incorporated | Method and apparatus for inspecting defects on transparent substrate and method of emitting incident light |
WO2019159334A1 (en) | 2018-02-16 | 2019-08-22 | 株式会社日立ハイテクノロジーズ | Defect inspection device |
US11346791B2 (en) | 2018-02-28 | 2022-05-31 | Hitachi High-Tech Corporation | Inspection device and inspection method thereof |
JP7071181B2 (en) | 2018-03-20 | 2022-05-18 | キヤノン株式会社 | Foreign matter inspection equipment, molding equipment and article manufacturing method |
JP2021519841A (en) | 2018-03-30 | 2021-08-12 | ベクトン・ディキンソン・アンド・カンパニーBecton, Dickinson And Company | Water-soluble polymer dye with pendant chromophore |
EP3811055A4 (en) | 2018-06-19 | 2022-08-10 | Becton, Dickinson and Company | Variable multiplexing switches for detector arrays, systems and methods of use thereof |
US11099066B2 (en) | 2018-06-28 | 2021-08-24 | Becton, Dickinson And Company | Light detection systems having input and output modulators, and methods of use thereof |
WO2023076325A2 (en) * | 2021-10-26 | 2023-05-04 | Smiths Detection Inc. | Systems and methods for suppressing x-ray interference in radiation portal monitors |
WO2024134724A1 (en) * | 2022-12-19 | 2024-06-27 | 株式会社日立ハイテク | Optical-type foreign matter inspection device |
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US3488434A (en) * | 1967-03-24 | 1970-01-06 | Fairchild Camera Instr Co | Control system for photosensitive video recorder |
US3997779A (en) * | 1973-10-25 | 1976-12-14 | Max-Planck-Gesellschaft Zur Forderung Der Wissenschaften E.V. | Circuit device for secondary electron multipliers |
US4048510A (en) * | 1975-02-27 | 1977-09-13 | Ferranti Limited | Circuit arrangements for controlling detector signals in surface inspection systems |
US4767211A (en) * | 1984-10-08 | 1988-08-30 | Hitachi, Ltd. | Apparatus for and method of measuring boundary surface |
US4806776A (en) * | 1980-03-10 | 1989-02-21 | Kley Victor B | Electrical illumination and detecting apparatus |
US5860972A (en) * | 1995-10-26 | 1999-01-19 | Xintec Corporation | Method of detection and destruction of urinary calculi and similar structures |
US6348682B1 (en) * | 1999-11-12 | 2002-02-19 | Institute Of Microelectronics | Photodetector circuit and methods |
US20020043109A1 (en) * | 1997-12-19 | 2002-04-18 | Siu Bernard K. | System and method for laser ultrasonic bond integrity evaluation |
US6621571B1 (en) * | 1999-10-29 | 2003-09-16 | Hitachi, Ltd. | Method and apparatus for inspecting defects in a patterned specimen |
US20040016867A1 (en) * | 2002-07-29 | 2004-01-29 | Applied Materials Israel, Inc. | Amplifier circuit with enhanced dynamic range for use in a wafer inspection method or optical inspection tool |
US6833913B1 (en) * | 2002-02-26 | 2004-12-21 | Kla-Tencor Technologies Corporation | Apparatus and methods for optically inspecting a sample for anomalies |
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JPH0961537A (en) * | 1995-08-30 | 1997-03-07 | Rigaku Corp | Photodetector |
US6002122A (en) * | 1998-01-23 | 1999-12-14 | Transient Dynamics | High-speed logarithmic photo-detector |
JP3863290B2 (en) * | 1998-05-12 | 2006-12-27 | 浜松ホトニクス株式会社 | Light intensity detector |
JP3745564B2 (en) * | 1999-07-08 | 2006-02-15 | 三菱電機株式会社 | Defect inspection method and defect inspection apparatus |
JP2002181725A (en) * | 2000-12-11 | 2002-06-26 | Mitsubishi Electric Corp | Method for analyzing minute foreign matter, analysis apparatus, method for manufacturing semiconductor device and liquid crystal display device |
US6657714B2 (en) * | 2001-09-24 | 2003-12-02 | Applied Materials, Inc. | Defect detection with enhanced dynamic range |
JP2005276488A (en) * | 2004-03-23 | 2005-10-06 | Chube Univ | Photomultiplier tube signal processor and imaging plate signal processor using it |
-
2006
- 2006-07-12 JP JP2008521588A patent/JP5302678B2/en active Active
- 2006-07-12 WO PCT/US2006/027129 patent/WO2007011630A2/en active Application Filing
-
2012
- 2012-04-17 JP JP2012093665A patent/JP5722824B2/en active Active
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3488434A (en) * | 1967-03-24 | 1970-01-06 | Fairchild Camera Instr Co | Control system for photosensitive video recorder |
US3997779A (en) * | 1973-10-25 | 1976-12-14 | Max-Planck-Gesellschaft Zur Forderung Der Wissenschaften E.V. | Circuit device for secondary electron multipliers |
US4048510A (en) * | 1975-02-27 | 1977-09-13 | Ferranti Limited | Circuit arrangements for controlling detector signals in surface inspection systems |
US4806776A (en) * | 1980-03-10 | 1989-02-21 | Kley Victor B | Electrical illumination and detecting apparatus |
US4767211A (en) * | 1984-10-08 | 1988-08-30 | Hitachi, Ltd. | Apparatus for and method of measuring boundary surface |
US5860972A (en) * | 1995-10-26 | 1999-01-19 | Xintec Corporation | Method of detection and destruction of urinary calculi and similar structures |
US20020043109A1 (en) * | 1997-12-19 | 2002-04-18 | Siu Bernard K. | System and method for laser ultrasonic bond integrity evaluation |
US6621571B1 (en) * | 1999-10-29 | 2003-09-16 | Hitachi, Ltd. | Method and apparatus for inspecting defects in a patterned specimen |
US6348682B1 (en) * | 1999-11-12 | 2002-02-19 | Institute Of Microelectronics | Photodetector circuit and methods |
US6833913B1 (en) * | 2002-02-26 | 2004-12-21 | Kla-Tencor Technologies Corporation | Apparatus and methods for optically inspecting a sample for anomalies |
US20040016867A1 (en) * | 2002-07-29 | 2004-01-29 | Applied Materials Israel, Inc. | Amplifier circuit with enhanced dynamic range for use in a wafer inspection method or optical inspection tool |
Also Published As
Publication number | Publication date |
---|---|
JP5722824B2 (en) | 2015-05-27 |
JP5302678B2 (en) | 2013-10-02 |
WO2007011630A2 (en) | 2007-01-25 |
JP2009501902A (en) | 2009-01-22 |
JP2012159513A (en) | 2012-08-23 |
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