WO2007003175A3 - Method and device for the analysis of ordered structures - Google Patents
Method and device for the analysis of ordered structures Download PDFInfo
- Publication number
- WO2007003175A3 WO2007003175A3 PCT/DE2006/001148 DE2006001148W WO2007003175A3 WO 2007003175 A3 WO2007003175 A3 WO 2007003175A3 DE 2006001148 W DE2006001148 W DE 2006001148W WO 2007003175 A3 WO2007003175 A3 WO 2007003175A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- structures
- structural image
- evaluated
- analysis
- produced
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N21/4788—Diffraction
Landscapes
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Microscoopes, Condenser (AREA)
Abstract
The invention relates to a method for the analysis of ordered structures with limited geometry. According to said method, a first structural image with Bragg reflexes is produced by appropriate irradiation of the structures, and a second structural image is produced from said first structural image, under partial direction-selective and structure-selective masking of the Bragg reflexes, with masking-specific colour and/or intensity progressions that are then detected and evaluated in a suitable manner. The axial symmetry of the structures, the orientation of individual elementary cells and the location correlation thereof, and the type and number of available structures are determined by local resolution. The second structural image can be evaluated by means of a data processing device. The inventive method can be used, for example, for quality control during the production of ordered monolayers and multilayers of colloids, especially two-dimensional or three-dimensional optical grids and data memories. The invention also relates to a device for carrying out said method.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102005031180.6 | 2005-07-01 | ||
DE102005031180A DE102005031180B4 (en) | 2005-07-01 | 2005-07-01 | Structure analysis method for ordered structures and use of the method |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2007003175A2 WO2007003175A2 (en) | 2007-01-11 |
WO2007003175A3 true WO2007003175A3 (en) | 2007-05-03 |
Family
ID=37545108
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/DE2006/001148 WO2007003175A2 (en) | 2005-07-01 | 2006-07-03 | Method and device for the analysis of ordered structures |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE102005031180B4 (en) |
WO (1) | WO2007003175A2 (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2539503A1 (en) * | 1974-09-09 | 1976-03-18 | Tokyo Shibaura Electric Co | METHOD AND APPARATUS FOR FINDING DEFECTS IN A TEMPLATE |
EP0028774A2 (en) * | 1979-11-07 | 1981-05-20 | Kabushiki Kaisha Toshiba | Apparatus for detecting defects in a periodic pattern |
US5719405A (en) * | 1992-09-01 | 1998-02-17 | Nikon Corporation | Particle inspecting apparatus and method using fourier transform |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2616716A1 (en) * | 1976-04-15 | 1977-11-03 | Philips Patentverwaltung | Image fault detection system - uses optical filter in plane of spatial frequency diffraction spectrum blocking correct spectrum |
US4407569A (en) * | 1981-07-07 | 1983-10-04 | Carl Zeiss-Stiftung | Device for selectively available phase-contrast and relief observation in microscopes |
DE3926199A1 (en) * | 1989-08-08 | 1991-02-14 | Siemens Ag | Fault detector for complex, relatively regular structures - uses shutter in Fourier plane of beam path of light microscope |
DE4236803C2 (en) * | 1992-10-30 | 1996-03-21 | Leica Mikroskopie & Syst | Microscope for microscopic amplitude and / or phase objects |
-
2005
- 2005-07-01 DE DE102005031180A patent/DE102005031180B4/en not_active Expired - Fee Related
-
2006
- 2006-07-03 WO PCT/DE2006/001148 patent/WO2007003175A2/en active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2539503A1 (en) * | 1974-09-09 | 1976-03-18 | Tokyo Shibaura Electric Co | METHOD AND APPARATUS FOR FINDING DEFECTS IN A TEMPLATE |
EP0028774A2 (en) * | 1979-11-07 | 1981-05-20 | Kabushiki Kaisha Toshiba | Apparatus for detecting defects in a periodic pattern |
US5719405A (en) * | 1992-09-01 | 1998-02-17 | Nikon Corporation | Particle inspecting apparatus and method using fourier transform |
Non-Patent Citations (1)
Title |
---|
RALF BIEHL: "Optische Mikroskopie an kolloidalen Suspensionen unter Nichtgleichgewichtsbedingungen", October 2001, MAINZ, XP002421451 * |
Also Published As
Publication number | Publication date |
---|---|
DE102005031180A1 (en) | 2007-01-04 |
DE102005031180B4 (en) | 2008-06-05 |
WO2007003175A2 (en) | 2007-01-11 |
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