WO2006124792A3 - Superhard cutters and associated methods - Google Patents

Superhard cutters and associated methods Download PDF

Info

Publication number
WO2006124792A3
WO2006124792A3 PCT/US2006/018761 US2006018761W WO2006124792A3 WO 2006124792 A3 WO2006124792 A3 WO 2006124792A3 US 2006018761 W US2006018761 W US 2006018761W WO 2006124792 A3 WO2006124792 A3 WO 2006124792A3
Authority
WO
WIPO (PCT)
Prior art keywords
associated methods
cutting
superhard cutters
base
working side
Prior art date
Application number
PCT/US2006/018761
Other languages
French (fr)
Other versions
WO2006124792A2 (en
Inventor
Chien-Min Sung
Original Assignee
Chien-Min Sung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chien-Min Sung filed Critical Chien-Min Sung
Priority to EP06759862A priority Critical patent/EP1879719A2/en
Priority to JP2008512410A priority patent/JP2008540154A/en
Publication of WO2006124792A2 publication Critical patent/WO2006124792A2/en
Publication of WO2006124792A3 publication Critical patent/WO2006124792A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D7/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
    • B24D7/06—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor with inserted abrasive blocks, e.g. segmental
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Nonmetal Cutting Devices (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

A cutting device (10) comprises a base (12) having a working side (14) that is oriented to face a workpiece (19) from which material is to be removed. A plurality of individual cutting elements (16) are arranged on the working side of the base, with each cutting element having a peak that comprises at least one cutting edge (18) that is formed from a polycrystalline superhard material. The peaks of the cutting elements are aligned in a common plane (20).
PCT/US2006/018761 2005-05-16 2006-05-12 Superhard cutters and associated methods WO2006124792A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP06759862A EP1879719A2 (en) 2005-05-16 2006-05-12 Superhard cutters and associated methods
JP2008512410A JP2008540154A (en) 2005-05-16 2006-05-12 Carbide cutting tool and related method

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US68179805P 2005-05-16 2005-05-16
US60/681,798 2005-05-16
US11/357,713 2006-02-17
US11/357,713 US20060258276A1 (en) 2005-05-16 2006-02-17 Superhard cutters and associated methods

Publications (2)

Publication Number Publication Date
WO2006124792A2 WO2006124792A2 (en) 2006-11-23
WO2006124792A3 true WO2006124792A3 (en) 2007-08-16

Family

ID=37419762

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/018761 WO2006124792A2 (en) 2005-05-16 2006-05-12 Superhard cutters and associated methods

Country Status (6)

Country Link
US (1) US20060258276A1 (en)
EP (1) EP1879719A2 (en)
JP (1) JP2008540154A (en)
KR (1) KR20080007343A (en)
TW (1) TWI304761B (en)
WO (1) WO2006124792A2 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8974270B2 (en) 2011-05-23 2015-03-10 Chien-Min Sung CMP pad dresser having leveled tips and associated methods
US9138862B2 (en) 2011-05-23 2015-09-22 Chien-Min Sung CMP pad dresser having leveled tips and associated methods
US9199357B2 (en) 1997-04-04 2015-12-01 Chien-Min Sung Brazed diamond tools and methods for making the same
US9221154B2 (en) 1997-04-04 2015-12-29 Chien-Min Sung Diamond tools and methods for making the same
US9238207B2 (en) 1997-04-04 2016-01-19 Chien-Min Sung Brazed diamond tools and methods for making the same
US9409280B2 (en) 1997-04-04 2016-08-09 Chien-Min Sung Brazed diamond tools and methods for making the same
US9463552B2 (en) 1997-04-04 2016-10-11 Chien-Min Sung Superbrasvie tools containing uniformly leveled superabrasive particles and associated methods
US9475169B2 (en) 2009-09-29 2016-10-25 Chien-Min Sung System for evaluating and/or improving performance of a CMP pad dresser

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9868100B2 (en) 1997-04-04 2018-01-16 Chien-Min Sung Brazed diamond tools and methods for making the same
US20070060026A1 (en) * 2005-09-09 2007-03-15 Chien-Min Sung Methods of bonding superabrasive particles in an organic matrix
US8622787B2 (en) 2006-11-16 2014-01-07 Chien-Min Sung CMP pad dressers with hybridized abrasive surface and related methods
US8393934B2 (en) 2006-11-16 2013-03-12 Chien-Min Sung CMP pad dressers with hybridized abrasive surface and related methods
US9724802B2 (en) 2005-05-16 2017-08-08 Chien-Min Sung CMP pad dressers having leveled tips and associated methods
US8398466B2 (en) 2006-11-16 2013-03-19 Chien-Min Sung CMP pad conditioners with mosaic abrasive segments and associated methods
TWI406736B (en) * 2005-08-25 2013-09-01 Hiroshi Ishizuka Tool having sintered-body abrasive portion and method for producing the same
US20150017884A1 (en) * 2006-11-16 2015-01-15 Chien-Min Sung CMP Pad Dressers with Hybridized Abrasive Surface and Related Methods
US20080153398A1 (en) * 2006-11-16 2008-06-26 Chien-Min Sung Cmp pad conditioners and associated methods
DE102007051047B4 (en) * 2007-10-16 2023-03-23 Nagel Maschinen- Und Werkzeugfabrik Gmbh Press-on device for finishing belt and device and method for finishing peripheral surfaces on cylindrical workpiece sections
CN101903131B (en) 2007-11-13 2013-01-02 宋健民 CMP pad dressers
US9011563B2 (en) 2007-12-06 2015-04-21 Chien-Min Sung Methods for orienting superabrasive particles on a surface and associated tools
CN101463836B (en) * 2007-12-17 2014-08-13 建准电机工业股份有限公司 Fan frame body
BRPI0821673A2 (en) * 2007-12-31 2015-06-16 Saint Gobain Abrasives Inc Interface pad intended for use between an abrasive article and a support tool
GB0823086D0 (en) * 2008-12-18 2009-01-28 Univ Nottingham Abrasive Tools
SG181678A1 (en) 2009-12-30 2012-07-30 3M Innovative Properties Co Polishing pads including phase-separated polymer blend and method of making and using the same
WO2011082156A2 (en) * 2009-12-30 2011-07-07 3M Innovative Properties Company Organic particulate loaded polishing pads and method of making and using the same
KR101091030B1 (en) * 2010-04-08 2011-12-09 이화다이아몬드공업 주식회사 Method for producing pad conditioner having reduced friction
CN103221180A (en) 2010-09-21 2013-07-24 铼钻科技股份有限公司 Superabrasive tools having substantially leveled particle tips and associated methods
US20120171935A1 (en) * 2010-12-20 2012-07-05 Diamond Innovations, Inc. CMP PAD Conditioning Tool
JP2013049112A (en) * 2011-08-31 2013-03-14 Kyushu Institute Of Technology Polishing pad and manufacturing method thereof
CN103372809A (en) * 2012-04-12 2013-10-30 江西赛维Ldk太阳能高科技有限公司 Method for improving silicon block ground surface quality
JP6188286B2 (en) 2012-07-13 2017-08-30 スリーエム イノベイティブ プロパティズ カンパニー Polishing pad and glass, ceramics, and metal material polishing method
CN103681535B (en) * 2012-09-01 2016-10-19 万国半导体股份有限公司 Wafer-level package device with thick bottom base and preparation method thereof
JP5976228B2 (en) * 2013-08-26 2016-08-23 株式会社東京精密 Dicing blade
JP6337458B2 (en) * 2013-12-16 2018-06-06 株式会社リコー Polishing sheet and polishing tool
JP6199231B2 (en) * 2014-04-15 2017-09-20 株式会社ノリタケカンパニーリミテド Whetstone for lapping
CN112388522A (en) * 2019-08-12 2021-02-23 南昌巨晶砂轮科技有限公司 Preparation method of grinding tool for grinding arc teeth
WO2022014978A1 (en) * 2020-07-16 2022-01-20 한국생산기술연구원 Polishing pad, polishing device including same, and manufacturing method thereof
KR102570825B1 (en) * 2020-07-16 2023-08-28 한국생산기술연구원 Polishing pad including porous protruding pattern and polishing apparatus including the same

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9199357B2 (en) 1997-04-04 2015-12-01 Chien-Min Sung Brazed diamond tools and methods for making the same
US9221154B2 (en) 1997-04-04 2015-12-29 Chien-Min Sung Diamond tools and methods for making the same
US9238207B2 (en) 1997-04-04 2016-01-19 Chien-Min Sung Brazed diamond tools and methods for making the same
US9409280B2 (en) 1997-04-04 2016-08-09 Chien-Min Sung Brazed diamond tools and methods for making the same
US9463552B2 (en) 1997-04-04 2016-10-11 Chien-Min Sung Superbrasvie tools containing uniformly leveled superabrasive particles and associated methods
US9475169B2 (en) 2009-09-29 2016-10-25 Chien-Min Sung System for evaluating and/or improving performance of a CMP pad dresser
US8974270B2 (en) 2011-05-23 2015-03-10 Chien-Min Sung CMP pad dresser having leveled tips and associated methods
US9138862B2 (en) 2011-05-23 2015-09-22 Chien-Min Sung CMP pad dresser having leveled tips and associated methods

Also Published As

Publication number Publication date
TW200730302A (en) 2007-08-16
US20060258276A1 (en) 2006-11-16
KR20080007343A (en) 2008-01-18
JP2008540154A (en) 2008-11-20
TWI304761B (en) 2009-01-01
WO2006124792A2 (en) 2006-11-23
EP1879719A2 (en) 2008-01-23

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