WO2006121299A3 - Organometallic precursor and production of superconducting oxide thin films - Google Patents

Organometallic precursor and production of superconducting oxide thin films Download PDF

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Publication number
WO2006121299A3
WO2006121299A3 PCT/KR2006/001771 KR2006001771W WO2006121299A3 WO 2006121299 A3 WO2006121299 A3 WO 2006121299A3 KR 2006001771 W KR2006001771 W KR 2006001771W WO 2006121299 A3 WO2006121299 A3 WO 2006121299A3
Authority
WO
WIPO (PCT)
Prior art keywords
organometallic precursor
substrate
metal
precursor solution
production
Prior art date
Application number
PCT/KR2006/001771
Other languages
French (fr)
Other versions
WO2006121299A2 (en
Inventor
Gye-Won Hong
Hee-Gyoun Lee
Byeong-Joo Kim
Original Assignee
Univ Korea Polytechnic
Gye-Won Hong
Hee-Gyoun Lee
Byeong-Joo Kim
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Korea Polytechnic, Gye-Won Hong, Hee-Gyoun Lee, Byeong-Joo Kim filed Critical Univ Korea Polytechnic
Publication of WO2006121299A2 publication Critical patent/WO2006121299A2/en
Publication of WO2006121299A3 publication Critical patent/WO2006121299A3/en

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1279—Process of deposition of the inorganic material performed under reactive atmosphere, e.g. oxidising or reducing atmospheres
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming superconductor layers
    • H10N60/0324—Processes for depositing or forming superconductor layers from a solution

Abstract

Disclosed herein are method for preparing an organometallic precursor solution by dissolving a metal salt and a metal oxide in an aqueous solution of an organic acid (S 1 ), evaporating the solvent (S 2) and dissolving the formed viscous jelly in organic solvent (S 3). The organometallic precursor solution is applied to a substrate (S 4) whose surface is textured (a ceramic single crystal substrate or a metal-ceramic composite substrate in which a textured ceramic thin film is formed on a metal substrate ) to produce an oxide superconductor. According to the method for preparing the organometallic precursor solution, an organic acid is used as a raw material other than trifluoroacetic acid, thereby enabling production of an oxide superconducting thin film with excellent superconductivity at reduced costs without being largely affected by the presence of moisture in air even during storage and processing, such as coating, in air.
PCT/KR2006/001771 2005-05-12 2006-05-12 Organometallic precursor and production of superconducting oxide thin films WO2006121299A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2005-0039847 2005-05-12
KR1020050039847A KR100665587B1 (en) 2005-05-12 2005-05-12 Method for providing metal organic precursor solution and oxide superconducting film fabricated thereof

Publications (2)

Publication Number Publication Date
WO2006121299A2 WO2006121299A2 (en) 2006-11-16
WO2006121299A3 true WO2006121299A3 (en) 2007-04-05

Family

ID=37396988

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2006/001771 WO2006121299A2 (en) 2005-05-12 2006-05-12 Organometallic precursor and production of superconducting oxide thin films

Country Status (2)

Country Link
KR (1) KR100665587B1 (en)
WO (1) WO2006121299A2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7902120B2 (en) 2006-07-24 2011-03-08 American Superconductor Corporation High temperature superconductors having planar magnetic flux pinning centers and methods for making the same
SG185284A1 (en) * 2007-10-05 2012-11-29 Agency Science Tech & Res Methods of forming a nanocrystal
KR100998310B1 (en) * 2008-02-29 2010-12-06 주식회사 서남 Method of forming a precursor solution for metal organic deposition and mothod of forming a superconducting thick film using thereof
US8236733B2 (en) 2009-07-20 2012-08-07 Seoul National University Industry Foundation Method of forming a precursor solution for metal organic deposition and method of forming superconducting thick film using the same
KR101158747B1 (en) * 2010-02-05 2012-06-22 주식회사 서남 Method of forming ceramic wire, system of forming the same, and superconductor wire using the same
CN104599783B (en) * 2014-12-31 2017-09-26 北京英纳超导技术有限公司 A kind of preparation method of Bi2223 sulls
US20180347039A1 (en) * 2017-06-05 2018-12-06 Applied Materials, Inc. Aerosol Assisted CVD For Industrial Coatings

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030207043A1 (en) * 2001-07-30 2003-11-06 Fritzemeier Leslie G. Ion texturing methods and articles
US20040192559A1 (en) * 2002-03-05 2004-09-30 Kabushiki Kaisha Toshiba Superconductor layer and method of manufacturing the same
WO2005007576A1 (en) * 2003-07-18 2005-01-27 Korea Polytechnic University Method for manufacturing metal organic deposition precursor solution using superconduction oxide and film superconductor

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100544561B1 (en) * 2000-08-07 2006-01-23 아이지씨-수퍼파워, 엘엘씨 Fabrication of High Current Coated High Temperature Superconducting Tapes
JP2003034527A (en) 2001-05-15 2003-02-07 Internatl Superconductivity Technology Center Thick film of tape-like oxide superconductor and method for manufacturing it
JP4422959B2 (en) 2002-11-18 2010-03-03 昭和電線ケーブルシステム株式会社 Method for producing Y-based tape-shaped oxide superconductor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030207043A1 (en) * 2001-07-30 2003-11-06 Fritzemeier Leslie G. Ion texturing methods and articles
US20040192559A1 (en) * 2002-03-05 2004-09-30 Kabushiki Kaisha Toshiba Superconductor layer and method of manufacturing the same
WO2005007576A1 (en) * 2003-07-18 2005-01-27 Korea Polytechnic University Method for manufacturing metal organic deposition precursor solution using superconduction oxide and film superconductor

Also Published As

Publication number Publication date
WO2006121299A2 (en) 2006-11-16
KR20060117088A (en) 2006-11-16
KR100665587B1 (en) 2007-01-09

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