WO2006120881A1

WO2006120881A1 - Chemical supply system and chemical supply pump

Info

Publication number: WO2006120881A1
Application number: PCT/JP2006/308530
Authority: WO
Inventors: Katsuya Okumura; Shinichi Nitta; Tatsushi Nabei; Kazuhiro Sugata; Atsuyuki Sakai
Original assignee: Ckd Corporation; Octec Inc.
Priority date: 2005-05-13
Filing date: 2006-04-24
Publication date: 2006-11-16
Also published as: JP2006316711A

Abstract

A chemical supply system in which suction or delivery flow rate of chemical is controlled with high precision while troubles incident to heat generation is removed. In a chemical supply pump (10), a bellows partition member (12) as a variable volume member is housed in a pump housing (11) which is used to section a pump chamber (13) from a pressure action chamber (14). The pressure action chamber (14) is connected with an electro-pneumatic regulator (28). The bellows partition member (12) is coupled with a rod (33) and moving amount of which is detected by a position detector (36). A controller (40) sets a target working amount of the bellows when the chemical is sucked or delivered, and controls the electro-pneumatic regulator (28) based on the difference between the target working amount and an actual working amount determined from detection results by the position detector (36).

Description

Specification

Chemical supply system and chemical supply pump

Technical field

TECHNICAL FIELD [0001] The present invention relates to a chemical solution supply system for inhaling and discharging a chemical solution by a chemical solution supply pump, and dropping the discharged chemical solution, specifically, a chemical solution such as a photoresist solution. The present invention relates to a chemical solution supply system suitable for use in a chemical solution use process of a semiconductor manufacturing apparatus such as a coating process. The present invention also relates to a chemical solution supply pump suitable for use in a chemical solution use process of a semiconductor manufacturing apparatus such as a chemical solution application process such as a photoresist solution.

Background art

In a chemical solution use process of a semiconductor manufacturing apparatus, a chemical solution supply pump is used to apply a predetermined amount of a chemical solution such as a photoresist solution to a semiconductor wafer. As the chemical supply pump, the pump chamber filled with the chemical solution and the pressure working chamber for introducing compressed air are separated by a flexible membrane such as bellows or diaphragm, and the air pressure in the pressure working chamber is variably adjusted. There is one in which a flexible film is deformed to suck and discharge a chemical solution.

[0003] In the configuration in which the flexible membrane is deformed by the air pressure as described above, it is difficult to finely adjust the deformation speed of the flexible membrane, and the discharge flow rate of the chemical solution can be controlled with high accuracy. There was a problem that it was not possible.

On the other hand, there is a chemical supply pump in which a flexible film is deformed by an electric motor instead of air pressure, and chemical liquid is sucked and discharged by the deformation (see, for example, Patent Document 1). Control by such an electric motor makes it possible to control the deformation speed of the flexible membrane.

[0005] However, in the case of a chemical solution supply pump using an electric motor, heat is generated when continuous operation is performed at a high load or high speed, so that it cannot be used when temperature control of the chemical solution is required. was there. In addition, when using chemicals used in the semiconductor manufacturing process, especially hydrochloric acid, there is a possibility that the chemicals may permeate even if corrosion resistance is prevented by using tetrafluorinated styrene resin (Teflon (registered trademark)) as the wetted material. For this reason, there is a problem that it is not suitable for using an electric motor. Other configurations with electric motors for power transmission and deceleration In some cases, a complicated mechanism is required, which is expensive, and there is a problem that the force is hindered from downsizing the pump.

Patent Document 1: Japanese Patent Laid-Open No. 10-54368

Disclosure of the invention

Problems to be solved by the invention

[0006] The main object of the present invention is to provide a chemical solution supply system that can control the flow rate of chemical solution suction or discharge with high accuracy, and can eliminate adverse effects caused by heat generation.

Means for solving the problem

[0007] The chemical solution supply system according to the present invention is configured as follows. That is,

It has a pump chamber for filling a chemical solution and a pressure action chamber that is partitioned from the pump chamber by a volume variable member, and operates the variable volume member according to the gas pressure in the pressure action chamber. A chemical supply pump for sucking or discharging the chemical based on the volume change of the pump chamber accompanying

Pressure adjusting means for adjusting the pressure of the gas supplied to the pressure working chamber; and an operation amount detecting means for detecting an operation amount of the volume variable member;

The target operating amount of the volume variable member is set when the chemical solution is sucked or discharged by the chemical solution supply pump, and the deviation between the target operating amount and the detection result force by the operating amount detection means is calculated. Control means for controlling the pressure adjusting means based on;

Equipped with.

[0008] In this chemical solution supply system, the target operation amount of the volume variable member is set when the chemical solution is sucked or discharged by the chemical solution supply pump, and the target operation amount and the detection result force by the operation amount detection means are actually obtained. The pressure adjusting means is controlled based on the deviation from the operating amount. In this case, since the operation amount of the variable volume member and the change in the volume of the pump chamber are substantially correlated, feedback control of the operation amount of the variable volume member as described above effectively causes a change in the volume of the pump chamber. Can be controlled as desired. As a result, the suction flow rate or the discharge flow rate of the chemical solution can be controlled to a desired flow rate with high accuracy. In addition, since the chemical supply pump sucks or discharges chemical liquid using the gas pressure (for example, pneumatic force) adjusted by the pressure adjusting means as a drive source, unlike the electric system that controls the flow rate by the electric motor, Even a chemical solution requiring temperature control that does not cause the harmful effects of can be suitably used.

[0009] For example, as a method for feedback control of the discharge flow rate, a configuration in which a flow rate sensor or a variable throttle is provided in the chemical solution discharge passage is conceivable. However, in such a configuration, a liquid pool at a location where a sensor or a throttle is installed is considered. This can cause inconveniences when the chemical solution deteriorates or when special processing is forced to prevent corrosion of the sensor due to the chemical solution. In this respect, according to this configuration, a simple system configuration without the above-described disadvantage can be realized, and as a result, the system can be reduced in size and cost can be reduced.

[0010] As a preferred example of the chemical liquid supply system, there may be mentioned one further provided with a means for calculating the discharge flow rate of the chemical liquid based on the detection result by the operation amount detection means.

[0011] As described above, the operation amount of the variable volume member and the volume change of the pump chamber have a correlation.

Based on the detection result by the operation amount detection means, the discharge flow rate of the chemical liquid can be calculated. For example, in a configuration in which the discharge flow rate is measured by a flow sensor provided in the chemical flow passage (discharge passage, etc.), it is necessary to consider changes in the characteristics of the chemical liquid (changes in specific gravity, viscosity, etc.) due to temperature changes. According to the above configuration, the discharge flow rate can be calculated in response to the volume change of the pump chamber without being affected by the change in the characteristics of the chemical solution.

[0012] The control means sets a target value of the moving speed of the variable volume member as the target operation amount, and an actual volume obtained based on the target value and a detection result by the operation amount detection means. It is preferable to control the pressure adjusting means based on a deviation from the moving speed of the variable member.

In this configuration, since the moving speed of the volume variable member can be controlled as desired, an appropriate chemical solution discharge operation can be realized every time even when the chemical solution discharge operation is repeated.

In this configuration, a relationship between the operation amount of the volume variable member and the pump discharge amount is further defined, and the control means uses the relationship to move the movement based on a flow rate command value each time. It is preferable to set a target value for speed.

[0015] The relationship between the operation amount of the variable volume member and the pump discharge amount is defined, and the relationship is used. If the target value of the moving speed of the variable volume member is set based on each flow rate command value, the target value of the moving speed can be easily set.

[0016] In any of the above-described configurations, there is provided a means for linearly calculating a relationship between the operation amount of the volume variable member and the pump discharge amount for each of the sections divided into a plurality within the operation range of the volume variable member, The control means preferably controls the pressure adjusting means using the linearized relationship.

[0017] As described above, the amount of operation of the variable volume member and the volume change (pump discharge amount) of the pump chamber are generally correlated with each other. Strictly speaking, depending on what is used as the variable volume member, the variable volume member It is considered that the operation amount of the pump and the volume change of the pump chamber become nonlinear. In this respect, in this configuration, the relationship between the operation amount of the variable volume member and the pump discharge amount is linearized for each of the sections divided into a plurality of within the operation range of the variable volume member, and the pressure is calculated using the linearized relationship. Control the adjusting means. As a result, the volume in the pump chamber can be changed appropriately, and the control accuracy of the chemical liquid suction flow rate or discharge flow rate is improved.

[0018] Further, in the above-described displacement configuration, an axially expandable / contractible bellows is used as the volume variable member of the chemical solution supply pump, and the operation amount detecting means allows the volume variable member to be expanded. The amount of expansion and contraction of the bellows is detected as the operation amount,

The control means preferably controls the pressure adjusting means based on the amount of expansion and contraction of the bellows.

[0019] The bellows expands and contracts in the axial direction, and at that time, the volume change amount of the pump chamber with respect to the expansion and contraction amount of the bellows (that is, the amount of the chemical at the time of suction Z discharge) becomes substantially linear. Therefore, by controlling the pressure adjusting means based on the expansion / contraction amount of the bellows, the volume in the pump chamber can be appropriately changed, and the control accuracy of the chemical liquid suction flow rate or discharge flow rate is improved.

[0020] Alternatively, a diaphragm is used as the volume variable member of the chemical solution supply pump, and the amount of deformation of the diaphragm is detected as the operation amount of the volume variable member by the operation amount detection means.

Means for linearizing the relationship between the diaphragm deformation amount and the pump discharge amount for each section divided into a plurality of sections within the deformation range of the diaphragm, and the control means comprises the linear It is preferable to control the pressure adjusting means using the converted relationship.

[0021] Unlike a system using a bellows, in a chemical solution supply system using a diaphragm, the volume change amount of the pump chamber with respect to the diaphragm deformation amount (that is, the chemical solution amount at the time of suction Z discharge) is not linear. However, if the deformation range of the diaphragm is divided into a plurality of sections and viewed in each section, the relationship between the volume change amount of the pump chamber and the diaphragm deformation amount can be approximated to a linear characteristic. In such a case, in this configuration, the relationship between the diaphragm deformation amount and the pump discharge amount is linearized for each of the sections divided into a plurality within the diaphragm deformation range, and the pressure adjusting means is controlled using the linearized relationship. As a result, the volume in the pump chamber can be appropriately changed, and as a result, the control accuracy of the chemical liquid suction flow rate or the discharge flow rate is improved.

[0022] The configuration using the diaphragm as the variable volume member has an advantage that the liquid pool is less than the configuration using the bellows. Therefore, it is possible to realize a chemical supply system that can control the chemical flow rate with high accuracy and a small amount of liquid pool.

[0023] In this configuration, the relationship between the diaphragm deformation amount and the pump discharge amount can be linearized by linear interpolation based on the diaphragm deformation amount and the pump discharge amount at the boundary points of the respective sections. preferable.

[0024] If the data of the diaphragm deformation amount and the pump discharge amount at the boundary points of the respective sections are prepared in advance, the diaphragm deformation amount and the pump discharge amount are determined by linear interpolation based on each data. The linear relationship of the relationship is possible. In such a case, linearization of the above relationship can be easily realized.

[0025] Even in the above-described configuration of the displacement, a detected body is connected to the variable volume member on the pressure acting chamber side, and the operation amount detection means is configured to operate the operation amount of the volume variable member. It is preferable to detect the amount of movement of the detected object.

[0026] According to this configuration, since the movement of the detection object accompanying the operation of the variable volume member is detected on the pressure acting chamber side isolated from the pump chamber, the position detector that constitutes the operation amount detecting means, etc. There is no risk of exposure to chemicals. Therefore, it is possible to realize a simple and inexpensive system that does not require any countermeasures against corrosion caused by chemicals for the position detector and the like.

[0027] Furthermore, a plurality of the chemical solution supply pumps are provided, and each of these pumps alternately perform a suction operation and The discharging operation may be performed.

[0028] In the chemical liquid supply pump having the above-described configuration, the suction and discharge of the chemical liquid are alternately repeated in the same pump chamber. Therefore, in the configuration using the single chemical liquid supply pump, the discharge of the chemical liquid is performed intermittently. It will be. In this regard, if a plurality of chemical liquid supply pumps are alternately operated for suction and discharge, the chemical liquid can be continuously discharged without being interrupted.

[0029] In particular, in the configuration in which the moving speed of the variable volume member is feedback-controlled as described above, the time required for the chemical solution discharge by each pump can be made constant every time, so that the supply of the chemical solution can be stabilized. Can do.

[0030] In any of the above configurations, a chemical supply pump provided with a biasing means for biasing the volume variable member in a direction opposite to the gas pressure in the pressure acting chamber is applied, and the operation amount detection means Means for calculating the pressure in the pump chamber based on the detected operation amount of the variable volume member and the gas pressure in the pressure action chamber;

It is preferable to provide means for controlling the pressure in the pump chamber based on the calculated pressure in the pump chamber.

In this configuration, the gas pressure in one side force / pressure working chamber acts on the variable volume member, and the urging force of the other side force urging means and the pressure in the pump chamber act. Then, the variable volume member is controlled to a position where these forces are balanced. In this case, Fs is the force received by the variable volume member due to the gas pressure in the pressure acting chamber, Fb is the force received by the variable volume member by the biasing means, and Fp is the force received by the variable volume member due to the pressure in the pump chamber.

Fs = Fb + Fp

The relationship is established. Here, Fb (force received by the variable volume member by the biasing means) correlates with the operating amount of the variable volume member, and can be calculated based on the operating amount of the variable volume member. Fs (force received by the variable volume member due to the gas pressure in the pressure chamber) can also calculate the gas pressure force in the pressure chamber. The pressure in the pump chamber can be calculated from Fp (the force received by the variable volume member due to the pressure in the pump chamber) and the pressure receiving area of the variable volume member. As described above, the pressure in the pump chamber is based on the operating amount of the volume variable member and the gas pressure in the pressure acting chamber. Force can be calculated. Then, by controlling the pressure in the pump chamber with the pressure in the pump chamber, proper pressure control is possible.

In addition, with this configuration, a pressure sensor for detecting the pressure in the pump chamber is not necessary.

. As a result, there is no sensor device or the like that is directly exposed to the chemical solution, so that it is possible to simplify the configuration and reduce the cost without being forced to take corrosion prevention measures with the chemical solution.

Alternatively, a chemical supply pump provided with a biasing means for biasing the volume variable member in a direction opposite to the gas pressure in the pressure working chamber is applied,

Means for calculating the pressure in the pump chamber based on the operation amount of the volume variable member detected by the operation amount detection means and the gas pressure in the pressure action chamber;

There may be provided means for determining whether clogging has occurred in the chemical solution discharge passage leading to the pump chamber by the calculated pressure in the pump chamber.

[0034] As described above, the force that the variable volume member receives due to the gas pressure in the pressure acting chamber (

Fs), the force received by the variable volume member by the biasing means (Fb), and the force received by the variable volume member by the pressure in the pump chamber (Fp),

Fs = Fb + Fp

In this case, the pressure in the pump chamber can be calculated based on the operation amount of the variable volume member and the gas pressure in the pressure acting chamber. At this time, if clogging occurs in the chemical solution discharge path, the pressure in the pump chamber increases due to pressure loss even if the chemical solution discharge amount is the same. Therefore, occurrence of clogging can be determined.

[0035] For example, a pressure determination value when discharge amount control is performed at a predetermined discharge flow rate is preliminarily determined, and clogging occurs when the calculated pressure in the pump chamber becomes larger than the pressure determination value. It is good to determine that it has occurred. The pressure judgment value should be determined based on the initial (new) pressure value. By performing the clogging determination, it is possible to eliminate process failures caused by clogging.

[0036] Further, with this configuration, a pressure sensor for detecting the pressure in the pump chamber is not necessary. As a result, there is no sensor device or the like that is directly exposed to the chemical solution, so that it is possible to simplify the configuration and reduce the cost without being forced to take corrosion prevention measures with the chemical solution.

[0037] In any of the above configurations, a suction valve is provided on the suction passage side leading to the pump chamber. And a chemical supply pump with a discharge valve on the discharge passage side leading to the pump chamber is applied.

The suction valve is closed and the discharge valve is opened at the time of discharge of the chemical liquid accompanying the operation of the variable volume member, and the state where the suction valve is closed and the discharge valve is opened after the discharge is completed is temporarily continued. It is preferable that the suction of the chemical solution is started by reversing the operation of the variable volume member.

According to this configuration, when the chemical solution is discharged from the chemical solution supply pump, the suction valve is closed and the discharge valve is opened, and the chemical solution is discharged from the pump chamber in accordance with the operation of the variable volume member. Then, after the discharge of the chemical liquid is completed, the state where the suction valve is closed and the discharge valve is opened is temporarily continued, and the operation of the variable volume member is reversed in that state, and the suction of the chemical liquid is started. At this time, suck back is performed by the suction operation of the chemical liquid with the suction valve closed and the discharge valve opened. As a result, dripping of the liquid under the medicine droplet can be prevented. The above configuration eliminates the need for a suck-back on-off valve, thus simplifying the configuration.

[0039] In this configuration, the time for performing the liquid arch I operation with the suction valve closed and the discharge valve opened after the completion of the chemical liquid discharge, or the suction speed is variably controlled. I prefer that.

[0040] In this way, the sucking back operation of the chemical solution can be arbitrarily controlled, and the sucking back amount can be controlled as desired.

[0041] Further, the chemical liquid supply pump according to the present invention was configured as follows. That is, it has a pump chamber for filling a chemical solution and a diaphragm operation chamber that is partitioned by a diaphragm, and the diaphragm is squeezed and deformed according to the volume change of the diaphragm operation chamber. A chemical supply pump that sucks or discharges the chemical based on a change in volume of the pump chamber accompanying stagnation deformation,

The diaphragm operation chamber and a fluid chamber communicating with the diaphragm operation chamber are filled with an incompressible fluid, and a movable body that linearly changes the volume of the fluid chamber with respect to the operation amount is provided, and the movable body is sandwiched between In the pressure operation chamber provided on the opposite side of the diaphragm operation chamber, pressure adjusting means for adjusting the gas pressure in the pressure operation chamber is provided. Connected.

In this chemical solution supply pump, the pressure of the gas in the pressure operation chamber is adjusted by the pressure adjusting means, and the movable body is operated by the pressure adjustment. When the movable body is activated, the volume of the fluid chamber changes linearly with respect to the amount of operation, and the volume of the diaphragm operation chamber changes accordingly. Then, the diaphragm swells and deforms according to the volume change of the diaphragm operation chamber, and the chemical liquid is sucked or discharged based on the volume change of the pump chamber accompanying the diaphragm deformation. At this time, the diaphragm operation chamber and the fluid chamber are filled with an incompressible fluid, and the volume change of the fluid chamber and the volume change of the diaphragm operation chamber coincide with each other (one increase is the other decrease). ). Moreover, the volume change of the fluid chamber with respect to the operating amount of the movable body is linear. Therefore, it becomes possible to control the flow rate at the time of suction or discharge of the chemical liquid with high accuracy based on the operation amount of the movable body.

[0043] In this chemical solution supply pump, it is preferable to make the effective sectional area of the movable body smaller than the effective sectional area of the diaphragm.

If the effective cross-sectional area of the movable body is made smaller than the effective cross-sectional area of the diaphragm, when the diaphragm is squeezed and deformed, the operation amount of the movable body becomes larger than the deformation amount of the diaphragm. Therefore, it is possible to control the amount of deformation of the diaphragm squeezingly.

[0045] Preferably, the movable body is a plunger having a shape with a relatively small area on the side facing the pressure operation chamber and a relatively small area on the side facing the fluid chamber.

[0046] According to this configuration, since the pressure receiving area on the pressure operation chamber side is relatively large! / にお, a sufficient force can be applied when the plunger is moved by the gas pressure. wear. As a result, the response of the plunger is improved, and as a result, the deformation speed of the diaphragm (chemical solution discharge amount, etc.) can be arbitrarily controlled.

[0047] Further, another chemical solution supply system according to the present invention was configured as follows. That is,

According to the present invention! , Any chemical supply pump,

An operation amount detecting means for detecting an operation amount of the movable body;

The target operation amount of the movable body is set during the suction or discharge of the chemical solution by the chemical solution supply pump, and the target operation amount and the detection result by the operation amount detection means are used. Control means for controlling the pressure adjusting means on the basis of a deviation from the obtained actual operation amount.

[0048] According to this chemical solution supply system, when the chemical solution is sucked or discharged by the chemical solution supply pump, the target operation amount of the movable body (such as a plunger whose operation amount is controlled by the gas pressure) is set, and the target operation amount is set. The pressure adjusting means is controlled based on the deviation between the amount and the actual operating amount obtained from the detection result by the operating amount detecting means. In such a case, since the operation amount of the movable body and the volume change of the pump chamber have a correlation, the volume change of the pump chamber is substantially as desired by performing feedback control of the operation amount of the movable body as described above. It will be possible to control. As a result, the suction flow rate or the discharge flow rate of the chemical liquid can be controlled to a desired flow rate with high accuracy. In addition, since the chemical supply pump performs suction or discharge of the chemical using the gas pressure (for example, air pressure) adjusted by the pressure adjusting means as a drive source, unlike the electric system that controls the flow rate by the electric motor, Even chemicals requiring temperature control that can cause adverse effects due to the above can be suitably used.

[0049] For example, as a method for feedback control of the discharge flow rate, a configuration in which a flow rate sensor or a variable throttle is provided in the chemical solution discharge passage is conceivable. In such a configuration, however, a liquid pool at a site where a sensor or a throttle is installed is considered. This can cause inconveniences when the chemical solution deteriorates or when special processing is forced to prevent corrosion of the sensor due to the chemical solution. In this respect, according to the configuration of the present means, a simple system configuration without the above-described inconvenience can be realized, and as a result, the system can be reduced in size and cost can be reduced.

[0050] As a preferable example of the chemical solution supply system, a device further including means for calculating the discharge flow rate of the chemical solution based on the detection result by the operation amount detection means can be mentioned.

[0051] Since the operating amount of the movable body and the volume change of the pump chamber have a correlation as described above, it is possible to calculate the discharge flow rate of the chemical liquid based on the detection result by the operating amount detecting means. For example, in a configuration in which the discharge flow rate is measured by a flow sensor provided in the chemical flow passage (discharge passage, etc.), it is necessary to take into account changes in the chemical characteristics (changes in specific gravity, viscosity, etc.) due to temperature changes. According to the above means, the discharge flow rate can be calculated in response to the volume change of the pump chamber without being affected by the change in the characteristics of the chemical solution. [0052] The control means sets a target value of the moving speed of the movable body as the target operation amount, and moves the actual movable body obtained based on the target value and the detection result by the operation amount detection means. Preferably, the pressure adjusting means is controlled based on a deviation from the speed.

In this configuration, since the moving speed of the movable body can be controlled as desired, an appropriate chemical liquid discharge operation can be realized every time even when the chemical liquid discharge operation is repeated.

In this configuration, the relationship between the operation amount of the movable body and the pump discharge amount is further defined.

Preferably, the control means sets the target value of the moving speed based on the flow rate command value each time using the relationship.

[0055] If the relationship between the operating amount of the movable body and the pump discharge amount is defined and the target value of the moving speed of the movable body is set based on the flow rate command value each time using the relationship, the moving speed Can be easily set.

[0056] Further, a plurality of the chemical solution supply pumps may be provided, and these pumps may be alternately operated for suction and discharge.

[0057] In the chemical liquid supply pump configured as described above, since the suction and discharge of the chemical liquid are alternately repeated in the same pump chamber, the discharge of the chemical liquid is performed intermittently in the configuration using the single chemical liquid supply pump. It will be. In this regard, if a plurality of chemical liquid supply pumps are alternately operated for suction and discharge, the chemical liquid can be continuously discharged without being interrupted.

[0058] In particular, in the configuration in which the moving speed of the movable body is feedback-controlled as described above, the time required for the chemical liquid discharge from each pump can be made constant every time, so that the chemical liquid supply can be stabilized. Can do.

Brief Description of Drawings

FIG. 1 is a configuration diagram showing an outline of a chemical solution supply system in an embodiment of the invention.

FIG. 2 is a diagram showing an outline of discharge flow rate control in a controller.

FIG. 3 is a graph showing pump discharge characteristics.

FIG. 4 is a diagram showing a schematic configuration of a system having two chemical liquid supply pumps.

FIG. 5 is a time chart for explaining a chemical solution discharge operation.

FIG. 6 is a configuration diagram showing an outline of a chemical liquid supply system according to a second embodiment. FIG. 7 is a diagram showing the relationship between diaphragm deformation and chemical discharge.

[FIG. 8] (a) is a diagram showing a conversion formula from diaphragm deformation amount X to discharge amount q, and (b) is a diagram showing a conversion formula from diaphragm deformation speed XZt to discharge flow rate Q.

FIG. 9 is a flowchart showing processing by the controller relating to movement speed calculation.

FIG. 10 is a flowchart showing processing by the controller regarding actual discharge flow rate calculation.

FIG. 11 is a time chart for explaining a discharge amount measuring procedure.

FIG. 12 is a configuration diagram showing an outline of a chemical liquid supply system in a third embodiment.

FIG. 13 is a time chart for explaining a suck back operation.

Explanation of symbols

[0060] 10 ··· chemical feed pump, 12 ··· Bellows type partition member, 13 ··· Pump chamber, 14 ··· Pressure action chamber, 15 ······ Pease, 16 "'ft¾l, ··· · Bucking I Noreb, 25 ··· Discharge Noreb, 28 ··· 3 Regulator, 35 ··· Compression coil panel, 36 ··· Position detector, 40 · “Controller, 50 ·” Chemical feed pump, 53 ... Diaphragm, 55 ... Pump chamber, 56 ... Pressure chamber, 63 ... Suction valve, 65 ... Discharge nozzle, 69 ... Electropneumatic regulator, 73 ... Rod 75 ... Compression coil panel, 7 6 ... Position detector, 80 "Controller, 100 ... Chemical liquid supply pump, 103 ... Diaphragm, 1 05 ... Pump, 106" Diaphragm, 113 ... Bucking I Noreb, 115 ··· 5 £ Output Noreb, 119 ··· Plunger, 122 ··· Pneumatic operation chamber, 123 ··· Fluid chamber, 127 ··· Pneumatic regulator, 1 35 ··· Position Detector, 140 ... The controller.

BEST MODE FOR CARRYING OUT THE INVENTION

[0061] (First embodiment)

Hereinafter, a first embodiment embodying the present invention will be described with reference to the drawings. In the present embodiment, a chemical solution supply system used in a production line for semiconductor devices or the like is embodied, and the basic configuration of the system will be described with reference to FIG.

The chemical solution supply system of FIG. 1 includes a chemical solution supply pump 10 for performing suction and discharge of the chemical solution. In the chemical supply pump 10, a bellows type partition member 12 as a variable volume member is accommodated in the pump housing 11, and the pump chamber 13 and the pressure action chamber 14 are partitioned by the bellows type partition member 12. ing. Bellows type partition 12 has an axially expandable bellows 15 and a partition plate 16 attached to one end of the bellows 15 (the lower end in the figure). The upper end is fixed to an annular fixing plate 17. The partition plate 16 moves due to the expansion and contraction of the bellows 15, and the volumes of the pump chamber 13 and the pressure acting chamber 14 change. In this case, since the total volume of the pump chamber 13 and the pressure chamber 14 is unchanged regardless of the expansion and contraction of the bellows 15, for example, the volume increase of the pump chamber 13 corresponds to the volume decrease of the pressure chamber 14 ( Of course, the same applies if the increase or decrease is reversed).

[0063] A suction port 18 and a discharge port 19 communicating with the pump chamber 13 are formed in the pump housing 11, a suction pipe 21 is connected to the suction port 18, and a discharge pipe 22 is connected to the discharge port 19. Has been. The suction pipe 21 is provided with a suction valve 23 that is a suction side opening / closing valve, and the suction valve 23 is opened and closed according to the energization state of the solenoid valve 24. Further, the discharge pipe 22 is provided with a discharge valve 25 which is a discharge side opening / closing valve, and the discharge valve 25 is opened / closed according to the energization state of the solenoid valve 26. The suction valve 23 and the discharge valve 25 are constituted by, for example, air operated valves that are opened and closed by air pressure. The air pressure acting on the valves 23 and 25 is adjusted according to the energization state of the electromagnetic valves 24 and 26, and the valves 23 and 25 are opened and closed accordingly.

[0064] The suction pipe 21 constitutes a chemical liquid supply passage for supplying a chemical liquid such as a resist liquid toward the pump chamber 13, and through the suction pipe 21, a chemical liquid bottle (chemical liquid storage container) (not shown) is provided. The chemical solution stored in the inside or the chemical solution supplied from the chemical solution piping of the factory is supplied to the pump chamber 13. Thereby, the chemical solution is filled in the pump chamber 13. The discharge pipe 22 constitutes a chemical liquid discharge passage for discharging the chemical liquid filled in the pump chamber 13, and the chemical liquid discharged from the pump chamber 13 through the discharge pipe 22 is discharged from the chemical liquid discharge nozzle ( (Not shown). The chemical solution discharge nozzle is directed downward, and is arranged such that the chemical solution is dropped at the center position of the semiconductor wafer placed on a rotating plate or the like. When an appropriate amount of chemical solution is dropped from the chemical solution discharge nozzle onto the semiconductor wafer, the chemical solution is applied to the wafer surface.

Similarly, the pumping / housing 11 is formed with a supply / exhaust port 27 communicating with the pressure working chamber 14, and an electropneumatic regulator 28 is connected to the supply / exhaust port 27. Electric air reguille 28 constitutes an air pressure adjusting means for adjusting the air pressure in the pressure working chamber 14, and supplies compressed air to the pressure working chamber 14 by switching operation of the built-in electromagnetic switching valve. The compressed air supply state is switched to the air release state where the air in the same pressure working chamber 14 is discharged to the outside.

[0066] A case body 31 is assembled to the pump housing 11, and an elongated cylindrical rod 33 is slidably inserted into a through-hole 32 formed in the pump housing 11, and the rod 33 is connected to the case body 31 side. Protruding. That is, the rod 33 has one end protruding into the pressure acting chamber 14 and the other end protruding into the internal space surrounded by the case body 31. The partition plate 16 of the bellows-type partition member 12 is coupled to the end of the pressure working chamber 14 side of the rod 33, and the rod 33 moves as the partition plate 16 moves (ie, the bellows 15 expands and contracts). Reciprocates up and down.

In addition, a panel receiving plate 34 is connected to the end of the rod 33 on the case body 31 side, and a compression coil panel 35 is interposed between the panel receiving plate 34 and the outer wall surface of the pump housing 11. Yes. The rod 33 is always urged upward in the figure by the urging force of the compression coil panel 35. The compression coil panel 35 corresponds to an urging means for urging the bellows-type partition member 12 in a direction opposite to the air pressure in the pressure acting chamber 14.

[0068] With the above configuration, in a state where compressed air is not introduced into the pressure working chamber 14 (atmospheric release state), the bellows 15 of the bellows type partition member 12 is brought into a contracted state by the urging force of the compression coil panel 35, The volume in the pump chamber 13 increases. At this time, the chemical solution is sucked into the pump chamber 13 through the suction pipe 21 by opening the suction valve 23 and closing the discharge valve 25. In the compressed air supply state, compressed air supplied from an air pressure source (not shown) is introduced into the pressure working chamber 14 through the electropneumatic regulator 28 and the supply / discharge port 27, and the air pressure in the pressure working chamber 14 is increased. The bellows 15 is expanded in accordance with the balance between the urging force of the compression coil panel 35 and the volume in the pump chamber 13 is reduced. At this time, the chemical solution filled in the pump chamber 13 is discharged through the discharge pipe 22 by closing the suction valve 23 and opening the discharge valve 25.

[0069] In the case body 31, a position detector 36 for detecting the amount of movement of the rod 33 (that is, the amount of expansion and contraction of the bellows 15) is provided. In FIG. 1, reference numeral 37 denotes the rod 33. This is a linear bearing for holding it so that it can be moved back. Reference numeral 38 is a shaft seal for preventing air leakage of 14 pressure acting chambers.

[0070] The controller 40 is mainly a microcomputer including a CPU and various memories.

This is an electronic control device configured to control the suction and discharge states of the chemical liquid by the chemical liquid supply pump 10. The controller 40 receives a suction Z discharge signal, a suction speed command, and a discharge flow rate command from a management computer (not shown) that manages the entire system, and receives a position detection signal from the position detector 36. Is done. Then, the controller 40 controls the open / close state of the suction valve 23 and the discharge valve 25 with the solenoid valves 24 and 26 energized or de-energized based on the input signal each time. On the other hand, a control command value (operating air pressure command value) for the electropneumatic regulator 28 is calculated, and the state of the electropneumatic regulator 28 is controlled by the command value. At this time, in particular, the controller 40 feeds back the state of the electropneumatic regulator 28 so that the moving speed of the partition plate 16 (rod 33) accompanying the expansion and contraction of the bellows 15 becomes the target moving speed at the time of sucking and discharging the chemical liquid. Control. In addition, the controller 40 calculates a discharge flow rate value based on the position detection signal of the position detector 36, and outputs the calculated value to a management computer or the like.

Next, the outline of the discharge flow rate control in the controller 40 will be described with reference to FIG.

[0072] The controller 40 calculates the moving speed of the partition plate 16 during chemical liquid suction based on the suction speed command, and calculates the moving speed of the partition plate 16 during chemical liquid discharge based on the discharge flow rate command. Here, at the time of calculating the moving speed at the time of discharging the chemical liquid, the moving speed is calculated based on the pump discharge characteristic representing the relationship between the moving speed and the discharge flow rate. Specifically, the movement amount of the partition plate 16 and the discharge amount of the chemical solution supply pump 10 have the relationship shown in FIG. According to FIG. 3, the pump discharge amount with respect to the movement amount of the partition plate 16 is linear, and the movement speed of the partition plate 16 is calculated using this relationship.

[0073] Here, when the discharge flow rate is Q, the bellows effective area is A, the movement distance of the partition plate 16 is X, and the movement time of the partition plate 16 is t,

Q = A * X / t

Represented as: In the above formula, “XZt” corresponds to the moving speed of the partition plate 16, and the moving speed can also be calculated by this formula. Further, the controller 40 selects either the moving speed at the time of suction or the moving speed at the time of discharge based on the suction Z discharge signal. The moving speed selected at this time corresponds to the target moving speed of the partition plate 16. Then, the operating air pressure command value is calculated based on the deviation between the target moving speed of the partition plate 16 and the actual moving speed (actual moving speed) of the partition plate 16, and the electric power is calculated based on the operating air pressure command value. Controls the drive of the empty regulator 28.

On the other hand, the controller 40 calculates the actual moving speed (actual moving speed) of the partition plate 16 based on the detection result of the position detector 36 provided in the chemical solution supply pump 10. The calculated value of the actual moving speed is used not only for feedback control of the electropneumatic regulator 28 but also for calculation of the discharge flow rate each time. Regarding the discharge flow rate calculation, the controller 40 converts the actual moving speed of the partition plate 16 into a discharge flow rate using the pump discharge characteristics described above (for example, the relationship shown in FIG. 3), and outputs the result to the management computer as a discharge flow rate value. To do.

[0076] In an actual chemical supply system, a plurality of chemical supply pumps 10 are provided, and each pump 10 can repeatedly perform a discharge operation and a supply operation, whereby a continuous chemical supply operation can be realized. It has become. FIG. 4 shows a schematic configuration of a system having two chemical solution supply pumps 10a and 10b. The two chemical liquid supply pumps 10a and 10b shown in FIG. 4 have the same configuration as the chemical liquid supply pump 10 described in FIG. 1, and the components of each pump are denoted by the same reference numerals and the description thereof. Is omitted. The suction piping 21 of each chemical solution supply pump 10a, 10b is connected to a common suction port (chemical solution bottle or factory chemical solution piping), and the discharge piping 22 is connected to a common discharge port (chemical solution discharge nozzle). Has been.

In FIG. 4, the left side chemical liquid supply pump 10a has the bellows 15 in a contracted state, and in this state, the bellows 15 thereafter expands to discharge the chemical liquid filled in the pump chamber 13. . In the right chemical solution supply pump 10b, the bellows 15 is in an extended state, and in this state, the bellows 15 is contracted thereafter, and the chemical solution is sucked into the pump chamber 13.

The controller 40 controls the open / close states of the suction valve 23 and the discharge valve 25 based on the signals input each time as described above, with the two chemical solution supply pumps 10a and 10b being controlled. On the other hand, the control command value for each electropneumatic regulator 28 (operating air pressure finger (Command value) is calculated and the state of the electropneumatic regulator 28 is controlled by the command value.

[0079] FIG. 5 is a time chart for explaining the chemical liquid discharge operation in the chemical liquid supply system. In FIG. 5, the continuous supply of chemical liquid to the semiconductor wafer is realized by the two chemical liquid supply pumps 10a, 10b alternately repeating the suction operation and the discharge operation. In the description of FIG. 5, for convenience, one chemical supply pump 10 is referred to as a pump (A), and the other chemical supply pump 10 is referred to as a pump (B), and the suction valve and the discharge valve are also referred to as (A), (B). To distinguish.

[0080] Before the timing tl, the pump (A) is in the state of the chemical supply pump 10a in FIG.

(B) is in the state of the chemical supply pump 10b in FIG. 4, and both the suction valve and the discharge valve are closed. After timing tl, chemical suction and discharge are performed at each pump as the START signal rises.

[0081] That is, on the pump (A) side, after the discharge valve (A) is opened at timing tl, the bellows 15 expands as the air pressure is increased by the electropneumatic regulator 28, and chemical solution is discharged (timing t2 ~ T6). In parallel with the discharge of the chemical solution from the pump (A), on the pump (B) side, the suction valve (B) is opened at timings t3 to t4 to suck the chemical solution. Then, the discharge valve (B) is opened at timing t5 after the completion of the chemical liquid suction. At timing t6, the bellows 15 expands as the air pressure is increased by the electropneumatic regulator 28 on the pump (B) side, and the chemical solution is discharged (timing t6 to t7). Thereafter, the suction (Z) discharge operation is alternately performed by the pumps (A) and (B), and the chemical liquid is continuously discharged from the tip of the chemical liquid discharge nozzle.

In such a case, the chemical solution discharge period TA by the pump (A) and the chemical solution discharge period TB by the pump (B) are set continuously, and the chemical solution is continuously discharged without interruption. In addition, since the discharge speed of the chemical liquid is controlled to be constant, the discharge periods TA and TB are the same, and the chemical liquid can be stably supplied.

[0083] According to the embodiment described above in detail, the following excellent effects can be obtained.

[0084] Since the moving speed of the partition plate 16 constituting the bellows-type partition member 12 is feedback controlled at the time of suction or discharge of the chemical solution, the volume change of the pump chamber 13 can be controlled as desired. As a result, the suction flow rate or the discharge flow rate of the chemical liquid can be controlled to a desired flow rate with high accuracy. The chemical supply pump 10 is also equipped with an electropneumatic regulator. The chemical liquid is sucked or discharged by using the air pressure adjusted by the modulator 28 as a driving source. For this reason, unlike an electric system that controls the flow rate by an electric motor, even a chemical solution that requires temperature management that is unlikely to cause adverse effects due to heat can be suitably used. In addition, the configuration of the pump drive system can be simplified as compared with the configuration of the electric actuator.

[0085] The position detector 36 detects the amount of movement of the rod 33 connected to the bellows-type partition member 12 (partition plate 16), and the detected amount of movement of the rod 33 (the amount of movement of the partition plate 16, the amount of the bellows 15) The amount of expansion and contraction was also agreed) as a feedback parameter. For this reason, the flow rate sensor is provided with a variable throttle in the chemical solution discharge passage, and compared with other configurations using the result as a feedback parameter, the deterioration of the chemical solution due to liquid accumulation at the installation site of the sensor, throttle, etc. If inconvenience occurs or special processing is applied to prevent corrosion of the sensor or the like due to chemicals, the inconvenience is eliminated. Therefore, a simple system configuration can be realized, and as a result, the system can be reduced in size and cost.

[0086] Further, since the discharge flow rate of the chemical solution is calculated based on the detection result of the position detector 36, the discharge flow rate that is not affected by the change in the characteristics of the chemical solution can be calculated with high accuracy.

Since the position detector 36 is provided in the case body 31 isolated from the pump chamber 13, there is no possibility that the position detector 36 is exposed to the chemical solution. Therefore, it is possible to realize a simple and inexpensive system that does not require any chemical solution corrosion prevention measures for the position detector and its accessories.

[0088] Since a plurality of chemical liquid supply pumps 10 are provided and each of these pumps 10 is configured to alternately perform a suction operation and a discharge operation, the chemical liquid can be continuously discharged without being interrupted. In addition, as described above, since the moving speed of the bellows type partitioning member 12 (partition plate 16) is feedback-controlled, the time required to discharge the chemical solution by each pump can be made constant each time, and the stable supply of the chemical solution can be achieved. Is possible.

[0089] (Second Embodiment)

Next, the second embodiment will be described focusing on differences from the first embodiment. In the present embodiment, as a configuration using the diaphragm type chemical liquid supply pump 50, FIG. 6 shows a schematic configuration of the chemical solution supply pump 50 and its surroundings.

[0090] In FIG. 6, the chemical solution supply pump 50 has bodies 51 and 52 that are divided into upper and lower parts, and in each of the bodies 51 and 52, recesses 51a and 52a are formed on opposing surfaces. ing . A diaphragm 53 made of a substantially circular flexible film is interposed between the bodies 51 and 52, and a peripheral portion 53 a of the diaphragm 53 is sandwiched between the bodies 51 and 52. A central thick part 53b is provided at the center of the diaphragm 53. In this case, the space formed between the recess 51a on the body 51 side and the diaphragm 53 is the pump chamber 55, and the space formed between the recess 52a on the body 52 side and the diaphragm 53 is the pressure action chamber 56. ing.

[0091] A suction port 58 and a discharge port 59 communicating with the pump chamber 55 are formed in the body 51. A suction pipe 61 is connected to the suction port 58, and a discharge pipe 62 is connected to the discharge port 59. Te! The suction pipe 61 is provided with a suction arch I valve 63 which is a suction side on-off valve. The suction valve 63 is opened and closed according to the energization state of the solenoid valve 64. Further, the discharge pipe 62 is provided with a discharge valve 65 which is a discharge side on-off valve, and the discharge valve 65 is opened and closed according to the energization state of the electromagnetic valve 66. The suction valve 63 and the discharge valve 65 may be constituted by, for example, air operated valves that are opened and closed by air pressure. The air pressure acting on the valves 63 and 65 is adjusted according to the energized state of the solenoid valves 64 and 66, and the valves 63 and 65 are opened and closed accordingly.

[0092] The suction pipe 61 constitutes a chemical liquid supply passage for supplying a chemical liquid such as a resist liquid toward the pump chamber 55, and through the suction pipe 61, a chemical liquid bottle (chemical liquid storage container) (not shown) is provided. The chemical solution stored in the inside or the chemical solution supplied from the chemical solution pipe of the factory is supplied to the pump chamber 55. Thereby, the chemical solution is filled in the pump chamber 55. Further, the discharge pipe 62 constitutes a chemical liquid discharge passage for discharging the chemical liquid filled in the pump chamber 55, and the chemical liquid discharged from the pump chamber 55 through the discharge pipe 62 is discharged from the chemical liquid discharge nozzle ( (Not shown).

The other body 52 is formed with a supply / discharge port 68 communicating with the pressure acting chamber 56, and an electropneumatic regulator 69 is connected to the supply / discharge port 68. The electropneumatic regulator 69 constitutes an air pressure adjusting means for adjusting the air pressure in the pressure working chamber 56, and compressed air is supplied to the pressure working chamber 56 by switching operation of the built-in electromagnetic switching valve. It can be switched between a compressed air supply state to be supplied and an open air state in which the air in the same pressure working chamber 56 is discharged to the outside.

[0094] A case body 71 is assembled to the body 52, and an elongated cylindrical rod 73 is slidably inserted into a through-hole 72 formed in the body 52, and the rod 73 protrudes toward the case body 71 side. I'm out. That is, one end of the rod 73 projects into the pressure acting chamber 56 and the other end projects into the internal space surrounded by the case body 71. The central thick portion 53b of the diaphragm 53 is coupled to the end of the rod 73 on the pressure acting chamber 56 side, and the mouth 73 reciprocates in the vertical direction in the figure as the diaphragm 53 is deformed.

Further, a panel receiving plate 74 is connected to the end portion of the rod 73 on the case body 71 side, and a compression coil panel 75 is interposed between the panel receiving plate 74 and the outer wall surface of the body 52. . The rod 73 is always urged upward in the figure by the urging force of the compression coil panel 75. The compression coil spring 75 corresponds to an urging means for urging the diaphragm 53 in a direction opposite to the air pressure in the pressure acting chamber 56.

[0096] With the above configuration, in a state where compressed air is not introduced into the pressure action chamber 56 (atmospheric release state), the diaphragm 53 stagnate and deforms upward in the drawing due to the urging force of the compression coil panel 75, and the pump chamber 55 Volume increases. At this time, the chemical solution is sucked into the pump chamber 55 through the suction pipe 61 by opening the suction valve 63 and closing the discharge valve 65. In the compressed air supply state, compressed air supplied from an air pressure source (not shown) is introduced into the pressure action chamber 56 through the electropneumatic regulator 69 and the supply / discharge port 68, and the air pressure in the pressure action chamber 56 is reduced. According to the balance with the urging force of the compression coil panel 75, the diaphragm 53 stagnates and deforms downward in the figure, and the volume in the pump chamber 55 decreases. At this time, by closing the suction valve 63 and opening the discharge valve 65, the chemical solution filled in the pump chamber 55 is discharged through the discharge pipe 62.

In the case body 71, a position detector 76 for detecting the amount of movement of the rod 73 (that is, the amount of deformation of the diaphragm 53) is provided. In FIG. 6, reference numeral 77 is a linear bearing for holding the rod 73 so as to be able to reciprocate, and reference numeral 78 is a shaft seal for preventing air leakage from the pressure working chamber 56.

[0098] The controller 80 is mainly composed of a microcomputer including a CPU and various memories. This is an electronic control device that controls the state of suction and discharge of the chemical liquid by the chemical liquid supply pump 50. The controller 80 receives a suction Z discharge signal, a suction speed command, and a discharge flow rate command from a management computer (not shown) that manages and manages the entire system, and a position detection signal from the position detector 76. Is done. Then, the controller 80 controls the open / close state of the suction valve 63 and the discharge valve 65 by energizing or de-energizing the solenoid valves 64 and 66 based on the signal input each time. On the other hand, a control command value (operating air pressure command value) for the electropneumatic regulator 69 is calculated, and the state of the electropneumatic regulator 69 is controlled by the command value. At this time, in particular, the controller 80 feedback-controls the state of the electropneumatic regulator 69 so that the deformation speed of the diaphragm 53 becomes the target speed at the time of sucking and discharging the chemical liquid. The controller 80 calculates the discharge flow rate value based on the position detection signal of the position detector 76, and outputs the calculated value to a management computer or the like.

By the way, the diaphragm-type chemical solution supply pump 50 as described above has a merit that the liquid pool is less than that of the bellows-type chemical solution supply pump, but has the merit, but the chemical solution discharge with respect to the deformation amount of the diaphragm 53. There is a concern that the amount becomes nonlinear and it becomes difficult to control the discharge amount. FIG. 7 is a diagram showing the relationship between the amount of deformation of the diaphragm and the discharge amount of the chemical solution. According to the figure, it can be seen that the diaphragm characteristic is nonlinear with respect to the ideal linear characteristic.

[0100] Therefore, in the present embodiment, the relationship between the diaphragm deformation amount and the pump discharge amount is linearized for each section divided into a plurality within the deformation range (full stroke range) of diaphragm 53, and the linear The state of the electropneumatic regulator 69 is controlled by using the connected relationship. For example, as shown in FIG. 7, the deformation range (XO to X5) of the diaphragm 53 is equally divided into five sections, and a linear characteristic is added to each section. When the chemical solution is sucked and discharged by the chemical solution supply pump 50, the state of the electropneumatic regulator 69 is controlled by using the linear characteristics of each section according to the deformation amount of the diaphragm 53 each time. Note that the data on the linear characteristics of each section is acquired by measurement, etc. and stored in memory in the controller 80 in advance.

[0101] Here, a method of linearity in each of the above sections will be described. [0102] When the deformation range of diaphragm 53 is equally divided into five, the diaphragm deformation amount that becomes the boundary point of each section is XO, XI, X2, X3, X4, X5, of which corresponding to diaphragm deformation amount X1 to X5 Measure the discharge amount ql, q2, q3, q4, q5 (the discharge amount is 0 for diaphragm deformation amount XO and measurement is not required). Then, linearization is performed for each section by linear interpolation based on the diaphragm deformation amount and the discharge amount at the boundary point of each section. At this time, the conversion formula from the diaphragm deformation amount X to the discharge amount q is defined as shown in FIG. 8 (a) according to the diaphragm deformation amount. Also, the conversion formula from the diaphragm deformation speed XZt to the discharge flow rate Q is defined as shown in FIG. 8 (b) according to the diaphragm deformation amount.

[0103] The characteristics linearized for each section as described above are the calculation of the deformation speed of the diaphragm 53 (calculation of the target value of the deformation speed) and the detection value of the amount of deformation of the diaphragm (position detection) This is used when calculating the actual discharge flow rate value based on the detection result of the vessel 76). That is, in the arithmetic logic described with reference to FIG. 2, the linear characteristic for each section is used in calculating the movement speed during discharge. Further, the linear characteristic for each section is used when converting the movement speed calculated based on the position detection result into the discharge flow rate.

FIG. 9 shows a processing flow by the controller 80 relating to the movement speed calculation, and FIG. 10 shows a processing flow by the controller 80 relating to the actual discharge flow rate calculation.

In FIG. 9, the discharge flow rate command value Qc is taken and the diaphragm deformation amount X is measured (steps Sl 1 and S12). Thereafter, it is determined in which of the above sections the diaphragm deformation amount X is present (steps S13 to S17), and a conversion formula to be applied this time is determined according to the determination result (steps S18 to S22). In this case, if X and XI, then conversion equation (1), if X1≤X <X2, conversion equation (2), if X2≤X <X3, conversion equation (3), X3≤X < If X4, conversion formula (4) is applied, and if X≥X4, conversion formula (5) is applied.

X / t = (XI -XO) / ql * Qc…

X / t = (X2-Xl) / (q2-ql) * Qc "-(2)

X / t = (X3-X2) / (q3-q2) * Qc

X / t = (X4-X3) / (q4-q3) * Qc '' (4)

XZt = (X5— X4) Z (q5— q4) * Qc · '· (5)

After determining the conversion formula to be applied this time as described above, using the determined conversion formula, The fram deformation speed xZt is calculated, and the discharge amount control is performed based on the xZt value (step S23).

In FIG. 10, the diaphragm deformation amount X is measured, and the diaphragm deformation speed X Zt is calculated (steps S31 and S32). Thereafter, it is determined in which of the sections the diaphragm deformation amount X is present (steps S33 to S37), and a conversion formula to be applied this time is determined according to the determination result (steps S38 to S42). In this case, if X and XI, then conversion equation (6) is satisfied, if X1≤X <X2, conversion equation (7) is satisfied, if X2≤X <X3, conversion equation (8) is satisfied, and X3≤X < Conversion formula (9) is applied if X4, and conversion formula (10) is applied if X≥X4.

Q = ql / (X1 -X0) * X / t--(6)

Q = (q2— ql) Z (X2— XI) * XZt · '· (7)

Q = (q3— q2) Z (X3— X2) * XZt · '· (8)

Q = (q4— q3) Z (X4— X3) * XZt · '· (9)

Q = (q5— q4) Z (X5—X4) * XZt "'(10)

After determining the conversion formula to be applied this time as described above, the discharge flow rate value Q is calculated using the determined conversion formula (step S43).

[0107] The method for measuring the discharge amounts ql to q5 is arbitrary. For example, the following methods (1) and (2) are conceivable.

[0108] (1) Change the amount of diaphragm deformation in the range of XO to X5, and measure the amount of discharge when the amount of deformation is XI, X2, X3, X4, X5 with a measuring instrument such as a graduated cylinder. . Specifically, first, with the suction valve 63 opened and the discharge valve 65 closed, the diaphragm 53 is deformed to the suction side to suck the chemical into the pump chamber 55. After suction of the chemical solution is completed, close the suction valve 63 and open the discharge nozzle 65, and wait. This state is diaphragm deformation amount = XO. Thereafter, the diaphragm 53 is slowly deformed to the discharge side until the deformation amount XI is reached, and the deformation operation is stopped at the deformation amount XI. Measure the discharge volume at this time with a measuring cylinder, etc., and record it as the discharge volume ql. Thereafter, when the diaphragm deformation amount is set to X2, X3, X4, and X5, the discharge amount is similarly measured and recorded as discharge amounts q2, q3, q4, and q5. Each of the above data is input to the controller 80 and stored in the memory.

[0109] (2) While the diaphragm deformation amount is feedback controlled by the controller 80, The discharge amount of the chemical solution is sequentially measured and stored in the memory. In such a case, a discharge amount measuring device is connected to the discharge pipe 62 (especially downstream of the discharge valve 65) of the chemical solution supply pump 50, and the discharge amount during the discharge operation of the pump 50 is measured by the discharge amount measuring device. The Then, the measurement result (measurement signal) of the discharge amount measuring instrument is sequentially input to the controller 80. As the discharge amount measuring device, for example, a so-called cylinder type discharge amount measuring device is used. In the cylinder-type discharge amount measuring device, the stroke amount of the plunger (plunger position) is made variable according to the amount of the chemical solution introduced into the chemical solution introduction chamber formed inside the measuring device, and the stroke amount of the plunger is detected. Measure the discharge rate.

[0110] The discharge amount measurement procedure in the case (2) will be described more specifically with reference to the time chart of FIG.

[0111] In FIG. 11, when the ON output of the measurement start signal is input to the controller 80, a series of discharge amount measurement processing is started. First, the pump chamber 55 and the discharge amount measuring device of the chemical solution supply pump 50 are started. The chemical solution is supplied to the chemical solution introduction chambers, and each chamber is filled with the chemical solution. That is, the opening / closing of the suction valve 63 and the discharge valve 65 and the amount of diaphragm deformation are controlled as shown in the figure so that the operations are performed in the order of suction → discharge → suction. The measuring valve is an on-off valve provided on the outlet side of the chemical solution introduction chamber of the discharge amount measuring device, and is opened during a period in which suction and discharge are performed once, and then closed.

[0112] Then, after timing tlO, the diaphragm 53 is deformed to the discharge side at a constant speed, and accordingly, the discharge flow rate with respect to each diaphragm deformation amount (diaphragm position) of XI to X5 is sequentially measured. At this time, first, at the timing til, the discharge amount ql at the diaphragm deformation amount = X1 is measured, and the ql value is stored in the memory in the controller 80. Similarly, at timings tl3, tl4, and 15, the diaphragm deformation amount = discharge amounts q2, q3, q4, and q5 at X2, X3, X4, and X5 are measured, and these values are stored in the controller 80. Stored in memory.

[0113] As described in the first embodiment, a plurality of chemical solution supply pumps 50 may be provided, and the pumps 50 may alternately perform a suction operation and a discharge operation. As a result, it is possible to continuously carry out the discharge of the chemical liquid without interruption. In addition, the time required to discharge the chemical liquid from each pump is constant each time, and a stable supply of chemical liquid can be realized. [0114] In the second embodiment described in detail above, the relationship between the diaphragm deformation amount and the pump discharge amount is linearized for each of the sections divided into a plurality within the deformation range of the diaphragm 53. The discharge amount control was performed using the relationship described above. For this reason, the suction flow rate or the discharge flow rate of the chemical liquid can be controlled with high accuracy even in the diaphragm type chemical liquid supply pump 50 in which the deformation amount and the discharge amount are not linear.

[0115] The chemical supply pump using a diaphragm as a variable volume member has an advantage that the liquid pool is less than that of the chemical supply pump using a bellows. Therefore, it is possible to realize a chemical supply system that can control the chemical flow rate with high accuracy and a small amount of liquid pool.

[0116] (Third embodiment)

In the third embodiment, another configuration of the diaphragm type chemical solution supply pump will be described.

[0117] In FIG. 12, the chemical supply pump 100 has two bodies 101 and 102 that are divided into left and right parts, and in each of the bodies 101 and 102, recesses 101a and 102a are formed on opposing surfaces. Has been. A diaphragm 103 made of a substantially circular flexible film is interposed between the bodies 101 and 102, and a peripheral edge 103a of the diaphragm 103 is held between the bodies 101 and 102. In this case, the space formed between the recess 101a on the body 101 side and the diaphragm 103 is the pump chamber 105, and the space formed between the recess 102a on the body 102 side and the diaphragm 103 is the diaphragm operation chamber 106. ing.

[0118] A suction port 108 and a discharge port 109 communicating with the pump chamber 105 are formed in the body 101. A suction pipe 111 is connected to the suction port 108, and a discharge pipe 112 is connected to the discharge port 109. It has been. The suction pipe 111 is provided with a suction arch I valve 113 which is a suction side on-off valve. The suction valve 113 is opened and closed according to the energization state of the solenoid valve 114. Further, the discharge pipe 112 is provided with a discharge valve 115 which is a discharge side opening / closing valve, and the discharge valve 115 is opened / closed according to the energized state of the electromagnetic valve 116. The suction valve 113 and the discharge valve 115 are constituted by, for example, air operated valves that are opened and closed by air pressure. The air pressure acting on the valves 113 and 115 is adjusted according to the energized state of the solenoid valves 114 and 116, and the valves 113 and 115 are opened and closed accordingly. [0119] The suction pipe 111 constitutes a chemical solution supply passage for supplying a chemical solution such as a resist solution toward the pump chamber 105. The suction pipe 111 passes through a suction solution 111 (not shown) in a chemical solution bottle (chemical solution storage container). The chemical solution stored in the tank or the chemical solution supplied from the factory chemical piping is supplied to the pump chamber 105. Thereby, the chemical solution is filled in the pump chamber 105. Further, the discharge pipe 112 constitutes a chemical liquid discharge path for discharging the chemical liquid filled in the pump chamber 105, and the chemical liquid discharged from the pump chamber 105 through the discharge pipe 112 is supplied with a chemical liquid discharge nozzle ( (Not shown).

The other body 102 is formed with a communication path 117 that communicates with the diaphragm operation chamber 106, and the communication path 117 communicates with the cylinder chamber 118. The cylinder chamber 118 forms a two-stage cylindrical space having different diameters, and a plunger 119 is slidably accommodated in the cylinder chamber 118. Plunger 119 has sliding parts 119a and 119b at the tip and intermediate part, and one side (the lower side in the figure) across the sliding part 119b is partly open to the atmosphere. A chamber 121 is formed, and a pneumatic operation chamber 122 is formed on the other side (the lower side in the figure). Seal members are assembled to the outer peripheral portions of the sliding portions 119a and 119b. In addition, the distal end side of the plunger 119 (below the sliding portion 119a) is a fluid chamber 123. In the space from the fluid chamber 123 to the communication path 117 and the diaphragm operation chamber 106, an incompressible fluid ( For example, silicon oil) is filled. Further, the upper end portion of the plunger 119 in the figure protrudes above the body 102 through the through hole 124.

[0121] The body 102 is formed with a supply / discharge port 125 communicating with the pneumatic operation chamber 122, and an electropneumatic regulator 127 is connected to the supply / discharge port 125. The electropneumatic regulator 127 constitutes an air pressure adjusting means for adjusting the air pressure in the pneumatic operation chamber 122, and is compressed into the pneumatic operation chamber 122 by switching the built-in electromagnetic switching valve. It can be switched between a compressed air supply state for supplying air and an open air state for discharging the air in the pneumatic operation chamber 122 to the outside.

[0122] A case body 131 is assembled to the body 102. A panel receiving plate 132 is connected to the tip of the plunger 119 in the case body 131, and a compression coil panel 133 is interposed between the panel receiving plate 132 and the outer wall surface of the body 102. The plunger 119 is always urged upward in the figure by the urging force of the compression coil panel 133. [0123] With the above configuration, in a state where the compressed air is not introduced into the pneumatic operation chamber 122 (atmospheric release state), the plunger 119 is held in a state where it is lifted upward by the urging force of the compression coil panel 133. . As a result, the incompressible fluid moves from the diaphragm operation chamber 106 to the fluid chamber 123, the diaphragm 103 stagnates to the right in the figure, and the volume in the pump chamber 105 increases. At this time, the chemical solution is sucked into the pump chamber 105 through the suction pipe 111 by opening the suction valve 113 and closing the discharge valve 115.

[0124] In addition, in the compressed air supply state, not shown! Compressed air supplied from the pneumatic source is introduced into the pneumatic operating chamber 122 through the electropneumatic regulator 127 and the supply / discharge port 125, and the pneumatic operation is performed. The plunger 119 moves downward in the figure according to the balance between the air pressure in the chamber 122 and the urging force of the compression coil panel 133. As a result, the incompressible fluid moves from the fluid chamber 123 to the diaphragm operation chamber 106, the diaphragm 103 stagnates to the left in the figure, and the volume in the pump chamber 105 decreases. At this time, the chemical solution filled in the pump chamber 105 is discharged through the discharge pipe 112 by closing the suction valve 113 and opening the discharge valve 115.

[0125] In the case body 131, a position detector 135 for detecting the movement amount of the plunger 119 is provided. In FIG. 12, reference numeral 137 is a linear bearing for holding the plunger 119 so as to be able to reciprocate, and reference numeral 138 is a shaft seal for preventing air leakage from the pneumatic operation chamber 122.

[0126] The controller 140 is an electronic control unit mainly composed of a microcomputer composed of a CPU, various memories, and the like, and controls the state of suction and discharge of the chemical liquid by the chemical liquid supply pump 100. The controller 140 receives a suction Z discharge signal, a suction speed command, and a discharge flow rate command from a management computer (not shown) that manages the entire system, and a position detection signal from the position detector 135. Is done. Then, the controller 140 controls the open / close state of the suction valve 113 and the discharge valve 115 with the electromagnetic valves 114 and 116 being energized or de-energized based on the signal input each time. On the other hand, a control command value (operating air pressure command value) for the electropneumatic regulator 127 is calculated, and the state of the electropneumatic regulator 127 is controlled by the command value. At this time, in particular, the controller 140 determines that the moving speed of the plunger 119 becomes the target speed during the suction and discharge of the chemical liquid. フィードバック Feedback control of the state of electropneumatic regulator 127. In addition, the controller 140 calculates a discharge flow rate value based on the position detection signal of the position detector 135 and outputs the calculated value to a management computer or the like.

[0127] The contents of the arithmetic processing by the controller 140 generally conform to the control logic shown in Fig. 2 and will be briefly described here.

The controller 140 calculates the moving speed of the plunger 119 during chemical liquid suction based on the suction speed command, and calculates the moving speed of the plunger 119 during chemical liquid discharge based on the discharge flow rate command. Here, at the time of calculating the movement speed at the time of discharging the chemical liquid, the movement speed is calculated based on the pump discharge characteristic representing the relationship between the movement speed and the discharge flow rate. That is, the movement amount of the plunger 119 and the pump discharge flow rate have a correlation, and the movement speed of the plunger 119 is calculated for the discharge flow rate command value force using a linear characteristic defined in advance. Then, the operating air pressure command value is calculated based on the deviation between the target moving speed of the plunger 119 and the actual moving speed (actual moving speed), and the electropneumatic regulator 127 is driven based on the operating air pressure command value. To control.

On the other hand, the controller 140 calculates the actual moving speed (actual moving speed) of the plunger 119 based on the detection result of the position detector 135. The calculated value of the actual moving speed is used for the feedback control of the electropneumatic regulator 127 and is used for the calculation of the discharge flow rate each time. For the discharge flow rate calculation, the controller 140 converts the actual movement speed of the plunger 119 into a discharge flow rate using the correlation (linear characteristics) between the movement amount of the plunger 119 and the pump discharge flow rate, and the result is used as the discharge flow rate value. Output to the management computer.

In the chemical solution supply pump 100 having the above configuration, the air pressure in the pneumatic operation chamber 122 is adjusted by the electropneumatic regulator 127, and the plunger 119 moves to the top or bottom of the figure by the pressure adjustment. When the plunger 119 moves, the volume of the fluid chamber 123 changes linearly with respect to the movement amount, and the volume of the diaphragm operation chamber 106 changes accordingly. The diaphragm 103 stagnates and deforms according to the volume change of the diaphragm operation chamber 106, and the suction or discharge of the chemical solution is performed based on the volume change of the pump chamber 105 accompanying the diaphragm deformation. At this time, the diaphragm operation chamber 106 and the fluid chamber 123 are filled with an incompressible fluid, and the volume change of the fluid chamber 123 and the volume change of the diaphragm operation chamber 106 are the same. Match (one increase is the other decrease). Further, the volume change of the fluid chamber 123 with respect to the movement amount of the plunger 119 is linear. Therefore, it is possible to control the flow rate at the time of suction or discharge of the chemical liquid with high accuracy based on the movement amount of the plunger 119.

[0131] In the chemical solution supply pump 100, the effective sectional area of the plunger 119 is smaller than the effective sectional area of the diaphragm 103. As a result, when the diaphragm 103 is squeezed and deformed, the plunger movement amount becomes larger than the diaphragm deformation amount. Therefore, the amount of deformation of the diaphragm 103 can be controlled with great force. At this time, if the effective area of the diaphragm is Ad and the diaphragm deformation amount Xd, the discharge amount V accompanying the diaphragm deformation is d * Xd. On the other hand, if the effective cross-sectional area of the plunger 119 is A and the plunger movement amount is X, the discharge amount V accompanying the plunger movement is V ^ A * X. Therefore, X = Ad / A * Xd, and the plunger movement amount X is amplified by the amplification factor AdZ A with respect to the diaphragm deformation amount Xd.

[0132] Further, the plunger 119 has two sliding portions 119a and 119b of different sizes, and the area on the side facing the pneumatic operation chamber 122 is relatively small in the area facing the fluid chamber 123. Has a relatively large shape. At this time, since the pressure receiving area of the plunger 119 on the side of the pneumatic operation chamber 122 is relatively large, a sufficient force can be applied when the plunger 119 is moved by air pressure. As a result, the responsiveness of the plunger 119 is improved, and as a result, the deformation speed of the diaphragm 103 (the discharge amount of the chemical solution, etc.) can be arbitrarily controlled.

[0133] As described in the first embodiment, a plurality of chemical solution supply pumps 100 may be provided, and these pumps 100 may alternately perform a suction operation and a discharge operation. Thereby, it becomes possible to carry out continuously without interrupting the discharge of the chemical liquid. In addition, the time required to discharge the chemical solution in each pump is constant every time, and a stable supply of the chemical solution can be realized.

In the third embodiment described in detail above, the discharge amount control is performed using the plunger movement amount not the diaphragm deformation amount as a feedback parameter. In this case, the pump discharge amount with respect to the diaphragm deformation amount is not linear, but it is relative to the plunger movement amount. Since the pump discharge amount is linear, the flow rate during the suction or discharge of the chemical solution can be controlled with high accuracy. Further, the chemical solution supply pump 100 sucks or discharges the chemical solution using the air pressure adjusted by the electropneumatic regulator 127 as a drive source. For this reason, unlike an electric system that controls the flow rate by an electric motor, there is no risk of adverse effects due to heat, and even a chemical solution that requires temperature management can be used suitably. In addition, the configuration of the pump drive system can be simplified as compared with the configuration of the electric actuator.

[0135] In another configuration in which a flow sensor, a variable throttle, or the like is provided in the chemical liquid discharge passage and the result is used as a feedback meter, the chemical liquid is deteriorated due to liquid accumulation in the installation site of the sensor, the throttle, or the like. If this occurs, or if special processing is forced to prevent corrosion of the sensor or the like due to chemicals, inconveniences arise, but this embodiment solves these problems. Therefore, a simple system configuration can be realized, and as a result, the system can be reduced in size and cost.

[0136] Further, since the discharge flow rate of the chemical liquid is calculated based on the detection result of the position detector 135, the discharge flow rate that is not affected by the characteristic change of the chemical solution can be calculated with high accuracy.

[0137] The present invention is not limited to the description of the above embodiment, and may be implemented as follows, for example.

[0138] Based on the result of position detection by the position detector (result of detecting the amount of operation of bellows, diaphragm, etc.), the pressure in the pump chamber is calculated, and based on the calculated pressure in the pump chamber! The clogging of the discharge passage may be determined. This will be described with respect to the configuration described in the first embodiment (FIG. 1).

In FIG. 1, the air pressure in the pressure working chamber 14 acts on the bellows-type partition member 12 from one side (the upper side in the figure), and the force on the other side (the lower side in the figure) is also applied to the compression coil panel. The urging force by 35 and the pressure in the pump chamber 13 act. Then, the bellows type partition member 12 is controlled at a position where these forces are balanced. In this case, the force received by the bellows partition member 12 due to the gas pressure in the pressure working chamber 14 is Fs, the force received by the bellows type cutting member 12 by the compression coil panel 35 is Fb, and the pressure in the pump chamber 13 is controlled by the pressure in the pump chamber 13. If the force received by the rose partition 12 is Fp, Fs = Fb + Fp

The relationship is established. Here, Fb (the force received by the bellows type partition member 12 by the compression coil panel 35) correlates with the operation amount of the bellows type partition member 12, and the panel constant is k, and when the suction is completed (at the time of complete contraction). Fb = k water (Xa + X) where Xa is the bellows position and X is the active bellows position.

Given in.

[0140] Fs (the force received by the bellows type partitioning member 12 by the air pressure in the pressure action chamber 14) can be calculated from the air pressure in the pressure action chamber 14, and the effective area of the bellows is A, If the air pressure of Ps is Ps,

Fs = A Water Ps

Given in.

[0141] Further, Fp (the force received by the bellows type partitioning member 12 by the pressure in the pump chamber 13) is P.

Fp = A water P

Given in.

In this case, since Fp = Fs-Fb, the pump chamber pressure P is

P = Ps -k / A * (Xa + X)

It becomes. Here, k, A, and Xa are fixed values, and the pump chamber pressure P can be calculated by measuring the air pressure Ps in the pressure working chamber 14 and the bellows position X during operation.

[0142] The pump chamber pressure P can basically be calculated from design dimensional data, etc., but considering individual differences, characteristics can be measured for each solid and the measured data stored in the controller. good. Thereby, the pump chamber pressure P can be accurately calculated.

[0143] Here, when the pressure loss on the discharge side is S, the discharge flow rate Q is roughly

Q = a / S * ^ P

(A is a constant). Therefore, when the pressure loss S increases, the pump chamber pressure P increases. In other words, when clogging (filter clogging, etc.) occurs in the discharge pipe, the pressure in the pump chamber increases due to pressure loss even if the chemical liquid discharge amount is the same. Therefore, occurrence of clogging can be determined. [0144] For example, if the pressure judgment value when performing discharge amount control at a predetermined discharge flow rate is preliminarily determined, and it is judged that clogging has occurred when the pump chamber pressure P becomes larger than the pressure judgment value, good. The pressure judgment value may be determined based on the initial (new) pressure value. When clogging occurs, for example, a sound or a lamp is notified, and the filter in the discharge pipe is replaced by the operator accordingly. By performing the clogging determination, it is possible to eliminate process malfunctions caused by clogging.

[0145] Further, in the configuration in which the pump chamber pressure P is calculated as described above, a pressure sensor for detecting the pump chamber pressure P is not necessary. As a result, there is no sensor device or the like that is directly exposed to the chemical solution, and therefore, it is possible to reduce the cost if the configuration is simplified without the need for countermeasures against corrosion by the chemical solution.

[0146] Besides performing the clogging determination based on the calculated value of the pump chamber pressure P, it is also possible to perform feedback control of the pump chamber pressure based on the calculated value of the pump chamber pressure P.

[0147] A suck back function may be added to prevent dripping at the end of discharge of the chemical liquid. FIG. 13 is a time chart for explaining the suck back operation.

In FIG. 13, when the chemical solution is discharged, the suction valve is closed and the discharge valve is opened, and the chemical solution is discharged from the pump chamber in accordance with the operation of the variable volume member. After the discharge of the chemical liquid, the suction valve is closed and the discharge valve is temporarily opened, and the operation of the volume variable member such as bellows is reversed and the suction of the chemical liquid is started. It is done. At this time, suck back is performed by a chemical liquid suction operation in a state where the suction valve is closed and the discharge valve is opened. TS in the figure is the suckback operation period. Thereby, dripping at the chemical liquid dropping nozzle or the like can be prevented. The above configuration eliminates the need for a suck-back on-off valve, thus simplifying the configuration.

[0149] The suck back operation period (TS in Fig. 13) and the suction speed during suck back may be variably controlled. As a result, the suck back operation of the chemical solution can be arbitrarily controlled, and the suck back amount can be controlled as desired.

In the above embodiment, when a bellows type chemical supply pump is used, the force explained that the pump discharge amount is linear with respect to the bellows expansion / contraction amount. It is also conceivable that nonlinear characteristics are included in the range. Therefore, the relationship between the bellows expansion / contraction amount and the pump discharge amount may be linearized for each section divided into a plurality of sections within the expansion / contraction range of the bellows, and the discharge amount control may be performed using the linear relationship. . This improves the control accuracy of the chemical liquid suction flow rate or the discharge flow rate. Note that the method described in the second embodiment is used as appropriate for the method of performing linear interpolation for each section.

[0151] In each of the above embodiments, when the air pressure in the pressure action chamber is reduced, the electropneumatic regulator is opened to the atmosphere, but this is changed. For example, a vacuum source is connected to the electropneumatic regulator, and the pressure inside the pressure working chamber is made negative by the operation of the vacuum source. By operating the air pressure, the amount of operation of bellows, diaphragm, etc. can be controlled arbitrarily. In this case, the compression coil panel provided in the case body can be eliminated.

[0152] In the chemical supply pump 100 described in the third embodiment, the force using the plunger 119 as a movable body that linearly changes the volume of the fluid chamber 123 with respect to the operation amount is changed. A bellows can be used as the movable body.

[0153] In each of the above-described embodiments, as a specific example of a chemical liquid supply system including a plurality of chemical liquid supply pumps, a plurality of chemical liquid supply pumps are combined and the pumps are connected by piping or the like. You may make it employ | adopt the pump unit with which these several chemical | medical solution supply pumps were integrated. As a result, piping and the like can be reduced and space can be saved.

Claims

The scope of the claims

[1] It has a pump chamber for filling a chemical solution and a pressure action chamber partitioned from the pump chamber by a volume variable member, and the volume variable member is operated according to the gas pressure in the pressure action chamber. A chemical supply pump for sucking or discharging the chemical based on a change in volume of the pump chamber accompanying the operation;

A chemical supply system characterized by comprising:

2. The chemical liquid supply system according to claim 1, further comprising means for calculating a discharge flow rate of the chemical liquid based on a detection result by the operation amount detection means.

[3] The control means sets a target value of the moving speed of the variable volume member as the target operation amount, and an actual volume obtained based on the target value and a detection result by the operation amount detection means. 3. The chemical solution supply system according to claim 1, wherein the pressure adjusting unit is controlled based on a deviation from a moving speed of the variable member.

[4] The relationship between the operation amount of the variable volume member and the pump discharge amount is defined, and the control means sets the target value of the moving speed based on the flow rate command value each time using the relationship. The chemical solution supply system according to claim 3, wherein:

[5] The apparatus includes a means for linearizing a relationship between an operation amount of the volume variable member and a pump discharge amount for each of a plurality of sections divided within an operation range of the volume variable member, and the control means includes the linearization described above. 5. The chemical solution supply system according to claim 1, wherein the pressure adjusting means is controlled using the relationship described above.

[6] A chemical liquid supply in which an axially expandable / contractible bellows is used as a volume variable member of the chemical liquid supply pump, and an expansion amount of the bellows is detected as an operation amount of the volume variable member by the operation amount detection means. A system, 6. The chemical solution supply system according to claim 1, wherein the control unit controls the pressure adjusting unit based on an expansion / contraction amount of the bellows.

[7] A chemical solution supply system in which a diaphragm is used as a volume variable member of the chemical solution supply pump, and a deformation amount of the diaphragm is detected as an operation amount of the volume variable member by the operation amount detection means,

Means for linearizing the relationship between the diaphragm deformation amount and the pump discharge amount for each section divided into a plurality of sections within the deformation range of the diaphragm, and the control means uses the linearized relationship for the pressure adjusting means. The chemical solution supply system according to any one of claims 1 to 4, wherein the chemical solution is controlled.

[8] The relationship between the diaphragm deformation amount and the pump discharge amount is linearized by linear interpolation based on the diaphragm deformation amount and the pump discharge amount at the boundary point of each section. Chemical supply system.

[9] The object to be detected is connected to the variable volume member on the pressure acting chamber side, and the operation amount detection means detects the movement amount of the object to be detected as the operation amount of the volume variable member. The chemical solution supply system according to any one of claims 1 to 8.

10. The chemical solution supply system according to any one of claims 1 to 9, wherein a plurality of the chemical solution supply pumps are provided, and these pumps are alternately operated for suction and discharge.

[11] Applying a chemical supply pump provided with a biasing means for biasing the volume variable member in a direction opposite to the gas pressure in the pressure action chamber,

11. The chemical solution supply system according to claim 1, further comprising means for performing pressure control of the pump chamber based on the calculated pressure in the pump chamber.

[12] Applying a chemical supply pump provided with a biasing means for biasing the volume variable member in a direction opposite to the gas pressure in the pressure action chamber,

The calculated pressure in the pump chamber is clogged in the chemical discharge passage leading to the pump chamber. 11. The chemical solution supply system according to claim 1, further comprising means for determining whether or not the occurrence has occurred.

Applying a chemical supply pump having a suction valve on the suction passage side leading to the pump chamber and a discharge valve on the discharge passage side leading to the pump chamber,

The suction valve is closed and the discharge valve is opened at the time of discharge of the chemical liquid accompanying the operation of the variable volume member, and the state where the suction valve is closed and the discharge valve is opened after the discharge is completed is temporarily continued. 13. The chemical solution supply system according to claim 1, wherein the suction of the chemical solution is started by reversing the operation of the volume variable member while maintaining the same.

14. The time for performing the chemical liquid arch I operation in a state in which the suction valve is closed and the discharge valve is opened after the completion of the discharge of the chemical liquid, or the suction speed is variably controlled. The chemical solution supply system described.

It has a pump chamber for filling a chemical solution and a diaphragm operation chamber that is partitioned by a diaphragm, and the diaphragm is squeezed and deformed according to the volume change of the diaphragm operation chamber. A chemical supply pump that sucks or discharges the chemical liquid based on the volume change of the pump chamber accompanying

The diaphragm operating chamber and a fluid chamber communicating with the diaphragm operating chamber are filled with an incompressible fluid, and a movable body is provided for linearly changing the volume of the fluid chamber with respect to the operation amount. And a pressure adjusting means for adjusting the pressure of the gas in the pressure operating chamber is connected to the pressure operating chamber provided on the opposite side of the diaphragm operating chamber.

16. The chemical supply pump according to claim 15, wherein the effective sectional area of the movable body is smaller than the effective sectional area of the diaphragm.

The movable body is a plunger having a shape in which an area on the side facing the fluid chamber is relatively small and an area on the side facing the pressure operation chamber is relatively large. The chemical solution supply pump described in 1.

A chemical supply pump according to any one of claims 15 to 17, When the chemical solution is sucked or discharged by the chemical solution supply pump, the target operation amount of the movable body is set, and the deviation between the target operation amount and the actual operation amount obtained from the detection result by the operation amount detection means is set. And a control means for controlling the pressure adjusting means on the basis thereof.

19. The chemical solution supply system according to claim 18, further comprising means for calculating a discharge flow rate of the chemical solution based on a detection result by the operation amount detection means.

[20] The control means sets a target value of the moving speed of the movable body as the target operation amount, and moves the actual movable body obtained based on the target value and a detection result by the operation amount detection means. 20. The chemical supply system according to claim 18 or 19, wherein the pressure adjusting unit is controlled based on a deviation from a speed.

[21] The relationship between the operating amount of the movable body and the pump discharge amount is defined, and the control means sets the target value of the moving speed based on the flow rate command value using the relationship! 21. The chemical solution supply system according to claim 20, wherein

22. The chemical solution supply system according to any one of claims 18 to 21, wherein a plurality of the chemical solution supply pumps are provided, and these pumps are alternately operated for suction and discharge.