WO2006094821A3 - Method for producing a thin magnesium oxide layer - Google Patents
Method for producing a thin magnesium oxide layer Download PDFInfo
- Publication number
- WO2006094821A3 WO2006094821A3 PCT/EP2006/002228 EP2006002228W WO2006094821A3 WO 2006094821 A3 WO2006094821 A3 WO 2006094821A3 EP 2006002228 W EP2006002228 W EP 2006002228W WO 2006094821 A3 WO2006094821 A3 WO 2006094821A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- magnesium oxide
- layer
- producing
- oxide layer
- produced
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5846—Reactive treatment
- C23C14/5853—Oxidation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/30—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
- H01F41/302—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F41/305—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices applying the spacer or adjusting its interface, e.g. in order to enable particular effect different from exchange coupling
- H01F41/307—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices applying the spacer or adjusting its interface, e.g. in order to enable particular effect different from exchange coupling insulating or semiconductive spacer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3254—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the spacer being semiconducting or insulating, e.g. for spin tunnel junction [STJ]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Magnetic Heads (AREA)
- Hall/Mr Elements (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to a method for producing thin magnesium oxide layers on a substrate. Initially, a layer made of metallic magnesium is applied to the substrate and then the magnesium layer is transformed into a magnesium oxide layer by means of oxidation, for example, by treating plasma containing oxygen ions. The inventive method enables, in particular, TMR-layer systems to be produced, wherein the insulating barrier or intermediate layer is produced according to said method. Said method enables very thin magnesium oxide layers having small thickness tolerances, to be produced.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102005011414.8 | 2005-03-11 | ||
DE200510011414 DE102005011414A1 (en) | 2005-03-11 | 2005-03-11 | Method for producing a thin magnesium oxide layer by means of plasma oxidation |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2006094821A2 WO2006094821A2 (en) | 2006-09-14 |
WO2006094821A3 true WO2006094821A3 (en) | 2007-04-26 |
Family
ID=36778295
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2006/002228 WO2006094821A2 (en) | 2005-03-11 | 2006-03-10 | Method for producing a thin magnesium oxide layer |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE102005011414A1 (en) |
WO (1) | WO2006094821A2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7479394B2 (en) * | 2005-12-22 | 2009-01-20 | Magic Technologies, Inc. | MgO/NiFe MTJ for high performance MRAM application |
DE102010060910A1 (en) * | 2010-11-30 | 2012-05-31 | Roth & Rau Ag | Method and apparatus for ion implantation |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10008482A1 (en) * | 2000-02-24 | 2001-09-13 | Ccr Gmbh Beschichtungstechnolo | High frequency plasma source with support for field coil, gas distribution and plasma jet extraction, has additional high frequency matching network |
DE10031002A1 (en) * | 2000-06-30 | 2002-01-10 | Ccr Gmbh Beschichtungstechnolo | Production of thin oxide or nitride layers used as tunnel barrier material for magnetoresistive sensors comprises using a plasma beam to convert the substrate into the corresponding oxide or nitride and adjusting the reaction speed |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003283000A (en) * | 2002-03-27 | 2003-10-03 | Toshiba Corp | Magnetoresistance effect element and magnetic storage device having the same |
-
2005
- 2005-03-11 DE DE200510011414 patent/DE102005011414A1/en not_active Withdrawn
-
2006
- 2006-03-10 WO PCT/EP2006/002228 patent/WO2006094821A2/en active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10008482A1 (en) * | 2000-02-24 | 2001-09-13 | Ccr Gmbh Beschichtungstechnolo | High frequency plasma source with support for field coil, gas distribution and plasma jet extraction, has additional high frequency matching network |
DE10031002A1 (en) * | 2000-06-30 | 2002-01-10 | Ccr Gmbh Beschichtungstechnolo | Production of thin oxide or nitride layers used as tunnel barrier material for magnetoresistive sensors comprises using a plasma beam to convert the substrate into the corresponding oxide or nitride and adjusting the reaction speed |
Non-Patent Citations (2)
Title |
---|
HEHN M ET AL: "Low-height sputter-deposited magnesium oxide tunnel barriers: experimental report and free electron modeling", EUROPEAN PHYSICAL JOURNAL B. CONDENSED MATTER, EDP SCIENCES; SPRINGER VERLAG, LES ULIS,, FR, vol. 40, no. 1, July 2004 (2004-07-01), pages 19 - 23, XP002365185, ISSN: 1434-6028 * |
KROZER A ET AL: "Hydrogen sorption kinetics in partly oxidized Mg films", JOURNAL OF ALLOYS AND COMPOUNDS, ELSEVIER SEQUOIA, LAUSANNE, CH, vol. 237, 15 April 1996 (1996-04-15), pages 74 - 80, XP004077066, ISSN: 0925-8388 * |
Also Published As
Publication number | Publication date |
---|---|
DE102005011414A1 (en) | 2006-09-14 |
WO2006094821A2 (en) | 2006-09-14 |
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