WO2006073003A1

WO2006073003A1 - Work transfer apparatus

Info

Publication number: WO2006073003A1
Application number: PCT/JP2005/004306
Authority: WO
Inventors: Yasuhito Kawaman
Original assignee: Hitachi Zosen Corporation
Priority date: 2005-01-06
Filing date: 2005-03-11
Publication date: 2006-07-13
Also published as: JP2006187832A; TW200624355A; JP4760016B2; TWI352644B

Abstract

A work transfer apparatus, which has an advantage of not having a foreign material meshed between a work and a work suction table, further, eliminates a problem of entangled tube, and thus continuously and easily performs a plurality of processes. The work transfer apparatus is provided with a plurality of work suction tables (3), which suck by vacuum the work (W) continuously transferred and placed on the table at a prescribed position; a vacuum supplying head (4) as a plurality of vacuum supplying mechanisms, which is provided in the vicinity of work processing positions (B, C) to advance and retract to and from each work suction table (3), is advanced to supply the table (3) with vacuum when the work suction table is stopped, and is retracted to be separated from the table (3) when the work suction table is being transferred; and a check valve (17) as a vacuum maintaining mechanism, which is provided on each work suction table (3) to maintain work suction table vacuum conditions when the vacuum supplying mechanism is retracted.

Description

Specification

Work transfer device

Technical field

TECHNICAL FIELD [0001] The present invention relates to a work transfer apparatus suitable for a polishing apparatus for polishing a work such as a glass plate or a wafer.

Background art

[0002] As a workpiece transfer device of a polishing machine, multiple workpiece suction tables that vacuum-suck workpieces placed on a table are continuously transferred, and polishing can be performed in the workpiece suction state at the workpiece processing position. Is known (Patent Document 1).

Patent Document 1: JP-A-6-339845

Disclosure of the invention

Problems to be solved by the invention

[0003] In this Patent Document 1, a vacuum is constantly supplied to a work suction table by connecting a telescopic tube connected to each work suction table to a vacuum source via a rotary joint. Therefore, there is an advantage that foreign matter does not get caught between the workpiece and the workpiece suction table. However, if the tube expands and contracts, the tube may become entangled. Therefore, it is difficult to increase the workpiece supply position force and the distance to the workpiece discharge position, and it can be applied to polishing devices that perform multiple polishing processes continuously. It was a problem of difficulty U.

[0004] This invention has the advantage that foreign matter does not get caught between the workpiece and the workpiece adsorption platform, and the problem of the tube becoming entangled is prevented, whereby a plurality of processes are continuously performed. An object of the present invention is to provide a workpiece transfer device that can be easily performed.

Means for solving the problem

[0005] A workpiece transfer device according to the present invention vacuum-sucks a workpiece that is continuously transferred and stopped at a workpiece supply position, a plurality of workpiece machining positions, and a workpiece discharge position, and placed on a table at a required position. Multiple workpiece suction tables, and at least near each work carriage position so that they can move forward and backward with respect to each workpiece suction table. The vacuum supply mechanism that is moved forward to supply the vacuum to the same table and retracted when the workpiece suction table is transported and separated from the same table, and the workpiece suction table provided in each workpiece suction table when the vacuum supply mechanism is retracted It is characterized by having a vacuum maintaining mechanism for maintaining a vacuum state.

[0006] In order to continuously convey the workpiece suction table, a hanging transmission mechanism such as an endless chain or an endless belt (endless continuous body) that can be rotationally driven is usually used.

[0007] For example, a handling robot may be arranged at the workpiece supply position and the workpiece discharge position. At the workpiece supply position, a workpiece is supplied by a robot or an operator. The workpiece is discharged. For example, a grindstone head for polishing is disposed at each of the plurality of grinding positions. For the multiple workpiece machining positions, for example, chamfering of one surface of the workpiece peripheral part and chamfering of the other surface are performed separately, and rough finishing and fine finishing after chamfering are sequentially performed. It is supposed to be done. The number of work carcass positions can be increased or decreased freely according to the required car, not limited.

[0008] The work suction platform has a suction groove that is open to the suction surface, and vacuum is supplied (suction) to the passage that leads to this groove to hold the work by suction. be able to.

[0009] The vacuum supply mechanism connects a vacuum pipe connected to a vacuum source to a workpiece suction table, and the vacuum supply mechanism is provided with a connection head that holds the tip of the vacuum pipe. Then, a head connection port is provided at a position corresponding to the connection head of the workpiece suction table, and a vacuum can be supplied by abutting the connection head against the head connection port when the vacuum supply mechanism is advanced. The vacuum supply to each vacuum pipe is controlled by opening and closing an electromagnetic valve interposed between each vacuum pipe and the vacuum source. The vacuum supply mechanism may be provided at a workpiece supply position that is not only a plurality of workpiece machining positions, and the configuration of the workpiece supply position may be the same as the configuration of the workpiece machining position. This is different from the configuration of.

[0010] The vacuum maintaining mechanism is, for example, a check valve that is closed when the internal passage (vacuum introduction passage) of the work suction platform is lower in pressure than the outside and opened when the outside is at a lower pressure. . With such a check valve, the vacuum state of the workpiece suction table is maintained when the vacuum supply mechanism is retracted. At the same time, the vacuum state of the work suction table can be reduced to a lower pressure during the vacuum supply by the vacuum supply mechanism. As the vacuum maintaining mechanism, there can be used check valves of various known structures that allow fluid flow only in one direction and block flow in the opposite direction, and the like. The check valve forms an external passage that connects the vacuum introduction passage in the work suction table and the vacuum connection passage in the work suction stand, and may be provided in the middle of the external passage. It may be built in the head connection port of the workpiece suction table. Note that the force for closing the vacuum maintaining mechanism (for example, the check valve) may be due to the elastic force of the spring built in the valve, which is also dependent on the back pressure of the fluid.

[0011] Each of the plurality of vacuum supply mechanisms may be individually movable, for example, with a fluid pressure cylinder attached thereto, and the plurality of vacuum supply mechanisms may move forward and backward with respect to the workpiece suction table. On a possible support base, it may be fixed at the same interval as the work suction base to be vacuum-sucked. In the latter case, all the vacuum supply mechanisms can be moved by moving the support base by one drive device (for example, a fluid pressure cylinder), so that the device can be simplified.

[0012] The workpiece transfer device is provided in each workpiece suction table and releases a vacuum of the platform by an external operation, and is provided in the vicinity of the workpiece discharge position so as to be movable forward and backward with respect to the workpiece suction table. It is sometimes preferable to further include a vacuum release head for releasing the vacuum of the same vacuum release mechanism. The vacuum release mechanism includes, for example, a vacuum release passage provided inside the workpiece suction table, a rotation shaft provided outside the workpiece suction table, a lever supported rotatably on the rotation shaft, and a lever. It has a sealing material that is provided at one end and closes the vacuum release passage. When the other end of the lever is pressed by the vacuum release head, the lever rotates in the direction to open the vacuum release passage. It is supposed to be allowed. In this way, the vacuum at the work discharge position can be released by the same operation as the vacuum supply operation by the vacuum supply mechanism, and the work can be easily discharged. The vacuum release mechanism consists of a valve body, a valve core, and a coil spring. Normally, the valve core is closed by being urged by the coil spring, and the vacuum is released by pressing the valve core with a vacuum release head. It is good also as composition to do. The invention's effect

[0013] According to the workpiece transfer device of the present invention, at a plurality of workpiece processing positions, the vacuum supply mechanism advances and vacuum is supplied to the workpiece suction table, so that polishing or the like is performed at the stop position of the workpiece suction table. The workpiece to be processed is held on the workpiece suction table with an attractive force that can withstand the processing, and the vacuum state of the workpiece suction table is maintained between the processing positions by the vacuum maintenance mechanism. A workpiece that is only transported without being held is held on the workpiece suction table with a suction force that can withstand the transport. In this way, since the workpiece can be processed without transferring the workpiece, it is possible to prevent foreign matter such as processing waste from being caught between the workpiece and the workpiece adsorption platform. The vacuum supply mechanism is also retracted when the workpiece suction table is transported and is released from the workpiece suction table, so that a tube that does not interfere with the workpiece suction table transport is always connected to supply the vacuum. Compared to this, it is possible to easily perform a plurality of processes with a large degree of freedom in the device layout.

Brief Description of Drawings

FIG. 1 is a plan view showing an embodiment of a workpiece transfer apparatus according to the present invention.

FIG. 2 is a front view of the same.

FIG. 3 is a vertical sectional view taken along the center line of the vacuum supply head.

FIG. 4 is an enlarged plan view of the workpiece suction table.

FIG. 5 is an enlarged side view of the workpiece suction table.

FIG. 6 is a vertical sectional view taken along the center line of the vacuum release head.

Explanation of symbols

[0015] (1) Workpiece transfer device

(2) Endless chain device Endless chain (2a)

(3) Workpiece suction table

(4) Vacuum supply head (vacuum supply mechanism)

(5) Vacuum release mechanism

(6) Vacuum release head

(7) Head support (support)

(17) Check valve (vacuum maintenance mechanism) (A) Work supply position

(B) First workpiece machining position

(C) Second workpiece machining position

(D) Work discharge position

(W) Workpiece

BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following description, the top of Figure 1 is the front, the bottom is the back, and the left and right are left and right.

FIGS. 1 to 6 show an embodiment of a workpiece transfer device according to the present invention. The workpiece transfer device (1) includes an endless chain device (2) and an endless chain device ( 2) and is successively transferred to the workpiece supply position (A), the first workpiece machining position (B), the second workpiece machining position (C), and the workpiece discharge position (D) and placed on the table. Multiple workpiece suction tables (3) that vacuum-suck the placed workpiece (W), near the workpiece supply position (A), the first workpiece machining position (B), and the second workpiece machining position (C) At the same position (A), (B), and (C), each work suction table (3) is provided so that it can be moved forward and backward. A plurality of vacuum supply heads (vacuum supply mechanisms) (4) that are retracted and removed from the same table (3) during the transfer of the table, and vacuums on the same table (3) provided on each workpiece suction table (3) A vacuum release mechanism (5) for releasing by the operation of external force and a workpiece suction platform (3) near the workpiece discharge position (D) are provided so as to be able to advance and retreat and move forward when the workpiece suction platform stops. Then the vacuum release mechanism (5) of the same platform (3) is moved to the vacuum release side, and the vacuum release head (6) is retracted and released from the same platform (3) when the workpiece suction table is transferred. A head support base (7) that supports the supply head (4) and the vacuum release head (6) to move forward and backward with respect to the work suction base (3), and a head moving means for moving the head support base (7) forward and backward (8) And have.

[0018] At the first workpiece machining position (B), a first turret head (9) for polishing a lower corner portion for chamfering one surface of the peripheral portion of the workpiece (W) is disposed, At the second work carpenter position (C), a second turret head (10) for polishing the top corner of the other side of the peripheral edge of the workpiece (W) is disposed. ing. Various types of machining are possible at the machining positions (B) and (C). Of course, the machining positions (B) and (C) are not limited to two. [0019] The endless chain device (2) includes a drive sprocket (12) provided on the workpiece discharge side and driven by a drive motor (11), and a follower provided on the workpiece supply side and in the vicinity of the drive sprocket (12). A sprocket (13) and an endless chain (2a) wound around these sprockets (12X13) are provided. The endless chain device (2) can be replaced with an endless belt device including a driving pulley, a driven pulley, and an endless belt.

[0020] As shown in Fig. 3 and Fig. 5, guide rails (14) that guide the front of each workpiece suction stand (3) in parallel with the straight part on the workpiece transfer side of the endless chain device (2) Each cake suction stand (3) is provided with a guide roller (15) that is rotated by being guided by the guide rail (14). A suction surface cleaning brush (3a) for cleaning the suction surface (3a) of the workpiece suction platform (3) after discharging the workpiece (W) is placed on the straight part of the endless chain device (2) opposite to the workpiece transfer side. 16) is provided.

[0021] As shown in detail in Figs. 4 to 6, the workpiece suction platform (3) is arranged in parallel on the left and right and front and back, and is open to a suction surface (3a) serving as a workpiece placement surface. One suction groove (31), a vertical passage (32) whose upper end communicates with the suction groove (31) and extends downward, one end communicates with the vertical passage (32), and the other end opens on the right side of the table A vacuum introduction passage (33), an L-shaped vacuum connection passage (34) with one end opened on the left side of the table and the other end opened on the rear surface of the table, and a vacuum introduction passage arranged outside the workpiece suction table (3) An external passage (35) that communicates the opening on the right side of the base of (33) and the opening on the left side of the base of the vacuum connection passage (34), a vacuum maintaining mechanism (17) provided in the middle of the external passage (35), It has a vacuum release passage (36) that branches off from the empty introduction passage (33) and opens to the rear surface of the table, and is connected to the opening force on the rear surface of the vacuum connection passage (34) to the vacuum supply head (4). Head connection port (3 4a) and the rear opening of the base of the vacuum release passage (36) serves as a vacuum release mechanism attachment port (36a) that is closed or released by the vacuum release mechanism (5). The adsorption surface (3a) of the workpiece adsorption platform (3) is made of a material that does not damage the workpiece (W) such as SUS or grease. Each vacuum suction stand (3) is attached to the endless chain device (2) at equal intervals.

[0022] The vacuum maintaining mechanism (17) is a check valve that is closed when the vacuum introduction passage (33) of the work adsorption platform (3) is at a lower pressure than the outside, and is opened when the outside is at a lower pressure. It is said that. As a result, the vacuum state of the work suction platform (3) is maintained even when the vacuum supply mechanism is retracted.

As shown in detail in FIG. 3, the vacuum supply head (4) has an axis extending in the front-rear direction and has a front end. A cylindrical case with a bottom (37) with an opening on the side and a head connection port on the work suction platform (3) that is attached to the tip of the vacuum pipe (18) and movably arranged in the case (37) The connection head (38) abutted against (34a) and the coil spring (39) arranged between the case (37) and the connection head (38) to urge the connection head (38) forward And a stagger (40) provided at the periphery of the opening of the case (37) to prevent the connection head (38) from coming off, and the vacuum pipe (18) opening to surround the tip of the connection head (38). And an annular sealing material (41) provided. The vacuum pipe (18) of each vacuum supply head (4) is connected to a vacuum source (20) via a solenoid valve (19). A through hole (37b) for inserting the vacuum pipe (18) is provided at the center of the bottom wall (37a) of the case (37). The connection head (38) has a large diameter portion (38a) guided to the inner periphery of the case (37) and a small diameter portion (38b) protruding forward of the opening force of the case (37). 40) is adapted to abut on a step between the large diameter portion (38a) and the small diameter portion (38b). One end of the coil spring (39) is received by the outer peripheral edge of the bottom wall (37a) of the case (37), and the other end is received by the rear surface of the large diameter portion (38a) of the connection head (38). The connection head (38) is biased forward by the coil spring (39), so that the connection head (38) can be fluid-tightly connected to the head connection port (34a) of the work suction platform (3).

[0024] As shown in detail in Figs. 4 to 6, the vacuum release mechanism (5) includes a rotating shaft (43) supported on the rear surface of the work suction platform (3) via a bearing (42). ), A lever (44) rotatably supported by the rotation shaft (43), and a seal member (45) provided at the lower end of the lever (44) to close the vacuum release passage (36). Have. The lever (44) has its upper part (44a) slightly bent with respect to the lower part (44b) and is supported by the rotating shaft (43) in the bent position. ing. Normally, the sealing material (45) is sucked into the vacuum release passage (36) and is brought into close contact with the rear surface of the work suction table (3) because the inside of the work suction table (3) is evacuated. As a result, the vacuum release passageway (36) is closed. When the vacuum release head (6) is advanced and the portion (44a) above the pivot shaft (43) is pressed against the vacuum release head (6), the lever (44) According to the principle, the vacuum suction force is piled and rotated, and the vacuum release mechanism (5) is moved to the vacuum release side. FIG. 6 shows a solid line when the vacuum release head (6) is in the retracted position and a two-dot chain line when it is in the advanced position.

[0025] The vacuum release head (6) is supported by the head support (7) in the same manner as the vacuum supply head (4). As a result, the vacuum release mechanism (5) is moved to the vacuum release side at the same timing as the vacuum supply head (4) supplies the workpiece suction table (3) with vacuum.

[0026] The head support (7) is disposed so as to be parallel to the linear portion of the endless chain device (2) on the workpiece conveyance side, and is advanced and retracted while maintaining this parallel state. The vacuum supply head (4) and the vacuum release head (6) are supported by the head support base (7) at the same interval as the workpiece suction base (3).

[0027] The head moving means (8) includes a fluid pressure cylinder (21) in which a rod (22) tip (22a) is brought into contact with a rear surface of a central portion of the head support (7), and a head support ( 7) Lower surface of slide guide (23) provided at two power points and a pair of slide rails (24) for guiding each slide guide (23). The extension of the rod (22) of the cylinder (21) 'can be moved according to the contraction

[0028] The polishing process using the workpiece transfer device (1) is performed as follows.

[0029] The work (W) is first placed on the work suction platform (3) in the work supply position (A) by a handling robot or an operator. Next, the cylinder rod (22) of the head moving means (8) is extended to advance the head support (7), whereby the vacuum supply head (4) is moved to the work suction table (W) on which the work (W) is placed ( Connected to 3), vacuum is supplied to the work suction platform (3). As a result, the workpiece (W) on the workpiece suction table (3) at the workpiece supply position (A) is vacuum-sucked. Next, the cylinder rod (22) is contracted to retract the head support (7), and the workpiece suction table (3) force vacuum supply head (4) is released. Next, the endless chain device (2) is rotationally driven to move the workpiece suction table (3) by an interval of the workpiece suction table (3). As a result, the workpiece suction stand (3) that was at the workpiece supply position (A) moves to the first machining position (B). During this movement, the vacuum suction state of the workpiece suction stand (3) is maintained by the action of the check valve (17), and the workpiece (W) is transported while being in close contact with the workpiece suction stand (3). The Next, the workpiece (W) is placed and the cylinder rod (22) is extended in the same manner as described above, whereby a new workpiece (W) is placed on the workpiece suction stand (3) at the workpiece supply position (A). ) Is vacuum-sucked, and the work (W) on the work-suction table (3) moved to the first machining position (B) is vacuum-sucked again. The workpiece (W) on the workpiece adsorption platform (3) at the first workpiece machining position (B) is sufficient for the force that is applied when the turret head (9) with a polishing force is applied by vacuum adsorption. Supported to withstand. In this state, the first machining position Predetermined machining is performed on the workpiece (W) in (B). When this machining is completed, the cylinder rod (22) is contracted and the workpiece suction platform (3) is moved in the same manner as described above, whereby the workpiece (W) at the workpiece supply position (A) is moved to the first position. The workpiece (W) at the first machining position (B) is moved to the first machining position (B) by the second machining position (C). Then, by repeatedly placing the workpiece (W), extending the cylinder rod (22), machining the workpiece (W), contracting the cylinder rod (22) and moving the workpiece adsorption platform (3), the workpiece (W ) Can be processed continuously.

[0030] The workpiece (W) that has been subjected to the caulking process at the final (second illustration) machining position (C) is the workpiece (W) at the first calorific position (B). By moving to position (C), it is moved to workpiece discharge position (D). The vacuum release head (6) in the workpiece discharge position (D) is moved integrally with the vacuum supply head (4) by the extension of the cylinder rod (22). Since the vacuum release head (6) is configured as described above, it engages with the vacuum release mechanism (5) and moves it to the vacuum release side (see the two-dot chain line in FIG. 6).

[0031] In the above configuration, the configuration of the workpiece supply position (A) and the workpiece discharge position (D) is the same as the configuration of the first workpiece machining position (B) and the second workpiece machining position (C). , Each position

(A) (B) (C) (D) vacuum supply head (4) or vacuum release head (6) is moved by one head support (7). The vacuum supply head or vacuum release head at the workpiece discharge position is separated from the structure of the workpiece processing position (B) (C), and one vacuum supply head (4) at the workpiece processing position (B) (C) is used. The vacuum supply head or vacuum release head at the workpiece supply position and Z or workpiece discharge position may be moved to the individual U by being moved by the head support (7).

Industrial applicability

[0032] Since a plurality of processes can be performed continuously and easily, when used in a polishing apparatus for polishing a workpiece such as a glass plate or a wafer, it contributes to an improvement in polishing efficiency and polishing accuracy. be able to.

Claims

The scope of the claims

[1] A plurality of workpiece suction tables that are continuously transported and vacuum-sucked at a required position and sequentially stopped at a workpiece supply position, a plurality of workpiece machining positions, and a workpiece discharge position; At least in the vicinity of each workpiece machining position, it is provided so as to be able to move forward and backward with respect to each workpiece suction table. A plurality of vacuum supply mechanisms that can be separated from the workpiece, and a vacuum maintaining mechanism that is provided in each workpiece suction table and maintains a vacuum state of the workpiece suction table when the vacuum supply mechanism is retracted.

[2] The plurality of vacuum supply mechanisms are fixed on a support table that can be moved back and forth with respect to the workpiece suction table at the same interval as the workpiece suction table to be vacuum-sucked. Work transfer device.

[3] A vacuum release mechanism that is provided on each workpiece suction table to release the vacuum of the same table by operating external force, and is provided in the vicinity of the workpiece discharge position so that it can be moved forward and backward with respect to the workpiece suction table. The workpiece transfer apparatus according to claim 1, further comprising: a vacuum release head that releases the vacuum of the vacuum release mechanism.