WO2006025626A1 - Plasma generation system - Google Patents

Plasma generation system Download PDF

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Publication number
WO2006025626A1
WO2006025626A1 PCT/KR2004/002503 KR2004002503W WO2006025626A1 WO 2006025626 A1 WO2006025626 A1 WO 2006025626A1 KR 2004002503 W KR2004002503 W KR 2004002503W WO 2006025626 A1 WO2006025626 A1 WO 2006025626A1
Authority
WO
WIPO (PCT)
Prior art keywords
voltage
unit
storage unit
generation system
coupled
Prior art date
Application number
PCT/KR2004/002503
Other languages
French (fr)
Inventor
Hee-Jong Yoon
Original Assignee
Winix Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Winix Inc. filed Critical Winix Inc.
Publication of WO2006025626A1 publication Critical patent/WO2006025626A1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/36—Circuit arrangements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/4697—Generating plasma using glow discharges

Definitions

  • the present invention relates to a plasma generation system that can obtain a high efficiency with a relatively fewer number of wire turns by minimizing capacitance residing on the coil turns of a transformer.
  • Plasma that has been used in a variety of fields for a variety of purposes is generally generated by a high-voltage discharge between electrodes, when high voltages having different electric potential from each other are applied to the respective electrodes spaced away from each other at a predetermined distance.
  • a transformer is required.
  • the generation of the high voltage depends on only the coil ratio of the transformer. However, when a secondary coil is wound by thousands of turns, very high voltage loss is incurred due to the affect of the capacitance residing on the coil, thereby generating heat. The generation of the heat causes the devices disposed around the coils to be damaged or decreased in their service life.
  • a plasma generation system of the present invention is designed to obtain high efficiency with relatively fewer coil turns by minimizing capacitance residing on the coils of a transformer.
  • a diode and a capacitor are further provided to a secondary side of the transformer to reduce the coil ratio of the transformer and minimize the capacitance residing on the coil turns, thereby stabilizing the plasma discharge and reducing the manufacturing costs and weight.
  • Fig. 1 is a schematic diagram of a plasma generation system according to an embodiment of the present invention.
  • Fig. 2 is a voltage wave diagram at each point of a system depicted in Fig. 1.
  • the present invention has been made in an effort to solve the above- described problems of the prior art. It is an objective of the present invention to provide a plasma generation system that can realize high voltage discharge with relatively fewer coil turns by providing a special circuit to a secondary side of a transformer, thereby realizing high efficiency plasma by minimizing capacitance residing on the coil turns.
  • the present invention provides a plasma generation system comprising: a filtering unit for filtering out noise contained in AC power supplied from a commercial AC power unit; a first rectifying unit coupled to the filtering unit to rectify the filtered AC power; a first storage unit charging and discharging the rectified AC power; a switching unit performing a switching operation by the voltage charged and discharged on and from the first storage unit; a voltage transforming unit comprising primary and secondary coils that are wound at a predetermined turn ratio, the primary coil being coupled to an output terminal of the switching unit to apply the voltage to the secondary coil when the voltage is cut off by the switching unit, thereby boosting the voltage; a second storage unit having a first end coupled to the secondary coil and a second end coupled to a positive-ion discharge terminal, the second storage unit generating a positive-ion plasma discharge by being charged by "+-phase" voltage supplied from the voltage transforming unit and supplying discharge voltage to the positive-ion discharge terminal; a second rectifying unit coupled to the secondary coil of the voltage
  • the inventive plasma generation system includes: a line filter 20; a first diode 22; a resistor 24; a thyristor 26; a first capacitor 28; a transformer 30; a first electrode 32; a second capacitor 34; a second diode 36; a third capacitor 38; a third diode 40; and a second electrode 42.
  • the line filter 20 is connected to a commercial AC power source (AC100V- 220V/50-60Hz) to eliminate noise contained in the AC power being supplied.
  • AC100V- 220V/50-60Hz a commercial AC power source
  • the first diode 22 has an anode terminal connected to an output terminal of the line filter 20 to output DC power by rectifying the filtered AC power.
  • the resistor 24 has a first terminal connected to an output terminal of the first diode 22 to limit the current of the rectified power.
  • the thyristor 28 is formed of a bi-directional thyristor connected to a second end of the resistor 24 to perform a switching function by voltage charged or discharged on or from the first capacitor 28.
  • the charge and discharge are repeated by a time constant determined by capacities of the first capacitor 28 and the resistor 24.
  • the transformer 30 has primary and secondary coils 3OA and 3OB that are wound at a predetermined turn ratio.
  • the primary coil 3OA is coupled to an output terminal of the thyristor 26 to apply the voltage to the secondary coil 3OB when the voltage supply is cut by the thyristor 26 being turned off.
  • the second capacitor 34 has a first end coupled to the secondary coil 3OB of the transformer 30 and a second end coupled to a positive-ion discharge terminal 32.
  • the second capacitor 34 is charged or discharged by "+-phase" voltage directed from the secondary coil 3OB of the transformer 30.
  • the discharge voltage of the second capacitor 34 is applied to the positive-ion discharge terminal 32 to realize positive-ion plasma discharge.
  • the second diode 36 has an anode terminal coupled to the secondary coil 3OB of the transformer 30 and a cathode terminal coupled to the positive-ion discharge terminal 32.
  • the third capacitor 38 has a fist end coupled to a first end of the secondary coil 30b of the transformer 30, being charged and discharged by " — phase” voltage applied from the secondary coil 3OB.
  • the third diode 40 has a cathode coupled to the first end of the second coil 3OB, supplying the " — phase” voltage to the third capacitor 38 when the " — phase” voltage is applied from the secondary coil 3OB thereto.
  • the third capacitor 38 and the third diode 40 are linearly coupled to each other between both ends of the secondary coil 3OB of the transformer 30, and the negative-ion discharge terminal 42 is connected between the third capacitor 38 and the third diode 40.
  • the line filter 20 filters out the noise of the AC power to prevent interference caused by the noise.
  • the first diode 22 When the AC power, noise of which is eliminated by passing through the line filter, is applied to the first diode 22, it is rectified so that the sine-wave ® can be converted into a half-wave ® and then applied to the first capacitor 28 to be charged in the first capacitor 28.
  • the thyristor 26 is turned on to apply the voltage charged in the first capacitor 28 to the primary coil 3OA of the transformer 30.
  • the thyristor 26 is turned off the voltage being applied to the primary coil 3OA of the transformer 30. At this point, the voltage is directed to the secondary coil 3OB.
  • the charge and discharge operation is determined by an RC time constant and repeated with a wave form ⁇ .
  • the on/off switching of the thyristor 26 is repeated to apply a 50-60Hz switching frequency with voltage V1 @ to the primary coil 3OA of the transformer 30.
  • the secondary coil 3OA outputs voltage V2 ⁇ that is boosted according to the coil ratio.
  • the "+-phase" voltage is generated from the secondary coil 3OB of the transformer 30, the second diode 36 is conducted, thereby discharging the second capacitor 34.

Abstract

A plasma generation system is designed to realize high voltage discharge with relatively fewer coil turns by providing a special circuit to a secondary side of a transformer, thereby realizing high efficiency plasma by minimizing capacitance residing on the coil turns and reducing the manufacturing costs by using fewer coil turns.

Description

PLASMA GENERATION SYSTEM
BACKGROUND OF THE INVENTION
a) Field of the Invention
The present invention relates to a plasma generation system that can obtain a high efficiency with a relatively fewer number of wire turns by minimizing capacitance residing on the coil turns of a transformer.
b) Description of the Related Art
Plasma that has been used in a variety of fields for a variety of purposes is generally generated by a high-voltage discharge between electrodes, when high voltages having different electric potential from each other are applied to the respective electrodes spaced away from each other at a predetermined distance. In order to achieve the plasma discharge, since very high voltage must be applied to the electrodes, a transformer is required.
The generation of the high voltage depends on only the coil ratio of the transformer. However, when a secondary coil is wound by thousands of turns, very high voltage loss is incurred due to the affect of the capacitance residing on the coil, thereby generating heat. The generation of the heat causes the devices disposed around the coils to be damaged or decreased in their service life.
Furthermore, the thousands of turns of the coil cause the manufacturing costs and the weight to be relatively increased.
SUMMARY OF THE INVENTION
A plasma generation system of the present invention is designed to obtain high efficiency with relatively fewer coil turns by minimizing capacitance residing on the coils of a transformer.
That is, a diode and a capacitor are further provided to a secondary side of the transformer to reduce the coil ratio of the transformer and minimize the capacitance residing on the coil turns, thereby stabilizing the plasma discharge and reducing the manufacturing costs and weight. BRIEF DESCRIPTION OF THE DRAWINGS
The accompanying drawings, which are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this application, illustrate embodiment(s) of the invention and together with the description serve to explain the principle of the invention. In the drawings:
Fig. 1 is a schematic diagram of a plasma generation system according to an embodiment of the present invention; and
Fig. 2 is a voltage wave diagram at each point of a system depicted in Fig. 1.
DETAILED DESCRIPTION OF THE INVENTION
The present invention has been made in an effort to solve the above- described problems of the prior art. It is an objective of the present invention to provide a plasma generation system that can realize high voltage discharge with relatively fewer coil turns by providing a special circuit to a secondary side of a transformer, thereby realizing high efficiency plasma by minimizing capacitance residing on the coil turns.
It is another objective of the present invention to provide a plasma generation system that can be manufactured with less cost by using fewer coil turns.
To achieve the above objective, the present invention provides a plasma generation system comprising: a filtering unit for filtering out noise contained in AC power supplied from a commercial AC power unit; a first rectifying unit coupled to the filtering unit to rectify the filtered AC power; a first storage unit charging and discharging the rectified AC power; a switching unit performing a switching operation by the voltage charged and discharged on and from the first storage unit; a voltage transforming unit comprising primary and secondary coils that are wound at a predetermined turn ratio, the primary coil being coupled to an output terminal of the switching unit to apply the voltage to the secondary coil when the voltage is cut off by the switching unit, thereby boosting the voltage; a second storage unit having a first end coupled to the secondary coil and a second end coupled to a positive-ion discharge terminal, the second storage unit generating a positive-ion plasma discharge by being charged by "+-phase" voltage supplied from the voltage transforming unit and supplying discharge voltage to the positive-ion discharge terminal; a second rectifying unit coupled to the secondary coil of the voltage transforming unit to supply charging voltage to the second storage unit by being conducted with the " — phase" voltage; a third storage unit coupled to the secondary coil of the voltage transforming unit to be charged by " — phase" voltage applied from the voltage transforming unit; a third rectifying unit coupled to the secondary coil of the voltage transforming unit to supply charging voltage to the third storage unit by being conducted with the " — phase" voltage; and a negative-ion discharge terminal connected between the third storage unit and the third rectifying unit that are linearly connected to each other between both ends of the second coil of the voltage transforming unit.
Reference will now be made in detail to the preferred embodiments of the present invention, examples of which are illustrated in the accompanying drawings.
Wherever possible, the same reference numbers will be used throughout the drawings to refer to the same or like parts.
As shown in Fig. 1 , the inventive plasma generation system includes: a line filter 20; a first diode 22; a resistor 24; a thyristor 26; a first capacitor 28; a transformer 30; a first electrode 32; a second capacitor 34; a second diode 36; a third capacitor 38; a third diode 40; and a second electrode 42.
The line filter 20 is connected to a commercial AC power source (AC100V- 220V/50-60Hz) to eliminate noise contained in the AC power being supplied.
The first diode 22 has an anode terminal connected to an output terminal of the line filter 20 to output DC power by rectifying the filtered AC power.
The resistor 24 has a first terminal connected to an output terminal of the first diode 22 to limit the current of the rectified power.
The thyristor 28 is formed of a bi-directional thyristor connected to a second end of the resistor 24 to perform a switching function by voltage charged or discharged on or from the first capacitor 28.
The charge and discharge are repeated by a time constant determined by capacities of the first capacitor 28 and the resistor 24.
The transformer 30 has primary and secondary coils 3OA and 3OB that are wound at a predetermined turn ratio. The primary coil 3OA is coupled to an output terminal of the thyristor 26 to apply the voltage to the secondary coil 3OB when the voltage supply is cut by the thyristor 26 being turned off.
The second capacitor 34 has a first end coupled to the secondary coil 3OB of the transformer 30 and a second end coupled to a positive-ion discharge terminal 32. The second capacitor 34 is charged or discharged by "+-phase" voltage directed from the secondary coil 3OB of the transformer 30. The discharge voltage of the second capacitor 34 is applied to the positive-ion discharge terminal 32 to realize positive-ion plasma discharge.
The second diode 36 has an anode terminal coupled to the secondary coil 3OB of the transformer 30 and a cathode terminal coupled to the positive-ion discharge terminal 32. When the "+-phase" voltage is applied from the secondary coil 3OB of the transformer 30 to the second diode 36, the charge and discharge is realized at the second capacitor 34.
The third capacitor 38 has a fist end coupled to a first end of the secondary coil 30b of the transformer 30, being charged and discharged by " — phase" voltage applied from the secondary coil 3OB.
The third diode 40 has a cathode coupled to the first end of the second coil 3OB, supplying the " — phase" voltage to the third capacitor 38 when the " — phase" voltage is applied from the secondary coil 3OB thereto. The third capacitor 38 and the third diode 40 are linearly coupled to each other between both ends of the secondary coil 3OB of the transformer 30, and the negative-ion discharge terminal 42 is connected between the third capacitor 38 and the third diode 40.
The operation of the above-described plasma generation system will be described hereinafter.
Referring to Fig. 2, when 50-60Hz commercial AC power having a sine-wave @ is applied to the line filter 20, the line filter 20 filters out the noise of the AC power to prevent interference caused by the noise.
When the AC power, noise of which is eliminated by passing through the line filter, is applied to the first diode 22, it is rectified so that the sine-wave ® can be converted into a half-wave ® and then applied to the first capacitor 28 to be charged in the first capacitor 28.
At this point, when the voltage charged in the first capacitor 28 reaches the conductive voltage of the thyristor 26, the thyristor 26 is turned on to apply the voltage charged in the first capacitor 28 to the primary coil 3OA of the transformer 30.
In addition, when the voltage charged on the first capacitor 28 is discharged not to reach the conductive voltage of the thyristor, the thyristor 26 is turned off the voltage being applied to the primary coil 3OA of the transformer 30. At this point, the voltage is directed to the secondary coil 3OB. The charge and discharge operation is determined by an RC time constant and repeated with a wave form ©.
According to the charge and discharge by the RC time constant, the on/off switching of the thyristor 26 is repeated to apply a 50-60Hz switching frequency with voltage V1 @ to the primary coil 3OA of the transformer 30.
As the 50-60Hz switching frequency with the voltage V1 is applied to the secondary coil 3OA of the transformer 30 by the on/off switching operation, the secondary coil 3OA outputs voltage V2 © that is boosted according to the coil ratio. When the "+-phase" voltage is generated from the secondary coil 3OB of the transformer 30, the second diode 36 is conducted, thereby discharging the second capacitor 34.
When the " — phase" voltage is generated from the secondary coil 3OB of the transformer 30, the third diode 36 is conducted, thereby charging the third capacitor 38. By repeating this operation, twice the voltage that is charged in advance can be obtained.
"+-phase" voltage © charged in the second capacitor 34 is discharged to flow toward the positive-ion discharge terminal 32, thereby generating positive-ions, "-phase" voltage (D charged in the third capacitor 38 is discharged to flow toward the negative-ion discharge terminal 42, thereby generating negative-ions. When the above-described plasma generation system is applied to, for example, a water purifier by coupling the negative and positive-ion discharge terminals on a waterspout of the water purifier, bacteria causing fungi, harmful objects, and offensive odors can be neutralized into harmless objects. Accordingly, the user can drink safer water. It will be apparent to those skilled in the art that various modifications and variations can be made to the present invention. Thus, it is intended that the present invention covers the modifications and variations of this invention provided they come within the scope of the appended claims and their equivalents.

Claims

What is claimed is:
1. A plasma generation system comprising: a filtering unit for filtering out noise contained in AC power supplied from a commercial AC power unit; a first rectifying unit coupled to the filtering unit to rectify the filtered AC power, the mobile signboard assembly comprising, a first storage unit charging and discharging the rectified AC power; a switching unit performing a switching operation by the voltage charged and discharged on and from the first storage unit; a voltage transforming unit comprising primary and secondary coils that are wound at a predetermined turn ratio, the primary coil being coupled to an output terminal of the switching unit to apply the voltage to the secondary coil when the voltage is cut off by the switching unit, thereby boosting the voltage; a second storage unit having a first end coupled to the secondary coil and a second end coupled to a positive-ion discharge terminal, the second storage unit generating a positive-ion plasma discharge by being charged by "+-phase" voltage supplied from the voltage transforming unit and supplying discharge voltage to the positive-ion discharge terminal; a second rectifying unit coupled to the secondary coil of the voltage transforming unit to supply charging voltage to the second storage unit by being conducted with the " — phase" voltage; a third storage unit coupled to the secondary coil of the voltage transforming unit to be charged by " — phase" voltage applied from the voltage transforming unit; a third rectifying unit coupled to the secondary coil of the voltage transforming unit to supply charging voltage to the third storage unit by being conducted with the " — phase" voltage; and a negative-ion discharge terminal connected between the third storage unit and the third rectifying unit that are linearly connected to each other between both ends of the second coil of the voltage transforming unit.
2. The plasma generation system of claim 1 , wherein each of the first, second, and third rectifying units are formed of a diode.
3. The plasma generation system of claim 1 , wherein the charge and discharge of the first storage unit is determined by an RC time constant set by a resistor and a capacitor.
4. The plasma generation system of claim 1, wherein the switching unit is formed of a bi-directional thyristor.
5. The plasma generation system of claim 1, wherein the voltage rectified by the switching operation of the switching unit is converted into a 50-60Hz switching frequency and is then applied to the voltage transforming unit, thereby generating positive/negative-ion plasma discharge.
PCT/KR2004/002503 2004-09-03 2004-09-30 Plasma generation system WO2006025626A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2004-0070506 2004-09-03
KR1020040070506A KR100594696B1 (en) 2004-09-03 2004-09-03 Plasma Generation System

Publications (1)

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WO2006025626A1 true WO2006025626A1 (en) 2006-03-09

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014084963A1 (en) * 2012-11-28 2014-06-05 Exelon Generation Company, Llc Electrical transformer
WO2015190326A1 (en) * 2014-06-14 2015-12-17 プラス・ウェア株式会社 Plasma generator and surface melting method
US9899933B2 (en) 2015-07-24 2018-02-20 Tibbar Plasma Technologies, Inc. Electrical transformer
US10172226B2 (en) 2016-10-28 2019-01-01 Tibbar Plasma Technologies, Inc. DC-AC electrical transformer
US10178749B2 (en) 2016-10-27 2019-01-08 Tibbar Plasma Technologies, Inc. DC-DC electrical transformer
US10334713B2 (en) 2017-05-22 2019-06-25 Tibbar Plasma Technologies, Inc. DC to DC electrical transformer

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US6662793B1 (en) * 1999-09-15 2003-12-16 Knite, Inc. Electronic circuits for plasma-generating devices

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014084963A1 (en) * 2012-11-28 2014-06-05 Exelon Generation Company, Llc Electrical transformer
WO2015190326A1 (en) * 2014-06-14 2015-12-17 プラス・ウェア株式会社 Plasma generator and surface melting method
US9474142B2 (en) 2014-06-14 2016-10-18 Plusware Corporation Plasma generating apparatus and on-liquid melting method
US9899933B2 (en) 2015-07-24 2018-02-20 Tibbar Plasma Technologies, Inc. Electrical transformer
US10178749B2 (en) 2016-10-27 2019-01-08 Tibbar Plasma Technologies, Inc. DC-DC electrical transformer
US10172226B2 (en) 2016-10-28 2019-01-01 Tibbar Plasma Technologies, Inc. DC-AC electrical transformer
US10334713B2 (en) 2017-05-22 2019-06-25 Tibbar Plasma Technologies, Inc. DC to DC electrical transformer

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