WO2006006612A1 - Method for forming spacer, spacer and display element - Google Patents

Method for forming spacer, spacer and display element Download PDF

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Publication number
WO2006006612A1
WO2006006612A1 PCT/JP2005/012877 JP2005012877W WO2006006612A1 WO 2006006612 A1 WO2006006612 A1 WO 2006006612A1 JP 2005012877 W JP2005012877 W JP 2005012877W WO 2006006612 A1 WO2006006612 A1 WO 2006006612A1
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WO
WIPO (PCT)
Prior art keywords
spacer
spacer particles
resin
intaglio
particles
Prior art date
Application number
PCT/JP2005/012877
Other languages
French (fr)
Japanese (ja)
Inventor
Shigekazu Teranishi
Michio Doi
Yutaka Sakai
Koji Tanabe
Original Assignee
Natoco Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Natoco Co., Ltd. filed Critical Natoco Co., Ltd.
Priority to JP2006529073A priority Critical patent/JPWO2006006612A1/en
Publication of WO2006006612A1 publication Critical patent/WO2006006612A1/en

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells
    • G02F1/13394Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells
    • G02F1/13398Spacer materials; Spacer properties
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1341Filling or closing of cells

Definitions

  • the present invention relates to a spacer forming method used for a liquid crystal display panel or the like, a spacer, and a display element.
  • Japanese Patent Application Laid-Open No. 2000-35582 discloses a spacer forming method by gravure offset printing. Claims 2 and 3 of Japanese Patent Application Laid-Open No. 2000-35582 use an ink in which 20 to 60% by weight of a spherical spacer is blended in a resin having a viscosity of 200 to 250 cps. In the examples, 5 // resin spacer particles and polyester resin are shown. Furthermore, it is described that the spacer particles are spherical, the cell opening diameter of the intaglio is 1 to 2 times the spacer particle size, and the cell depth of the intaglio is 0.5 to 2 times the particle size. Yes. Disclosure of the invention
  • the present inventor made the spacer particles spherical, the cell opening diameter of the intaglio was 1 to 2 times the spacer particle diameter, and the cell depth of the intaglio was 0.5 to 2 times the particle diameter.
  • the spacers were gravure offset printed on the substrate.
  • a resin-only structure that does not contain spacer particles does not have a gap control function as the originally planned spacer. Therefore, if there are a large number of resin-only structures that do not contain spacer particles, the substrate spacing cannot be maintained uniformly, and display unevenness is likely to occur.
  • the spacer particles sometimes accumulated in the recess after scraping off excess ink with the ink scraping blade.
  • spacer particles were stacked in each structure, and particles that did not touch the substrate were observed. In this case as well, the proper gap cannot be maintained over the entire surface of the printed board, resulting in gap unevenness and display unevenness.
  • An object of the present invention is to reduce the proportion of resin structures in which spacer particles are not present in a method of printing and forming a structure of resin and spacer particles on a substrate by a plate-type printing method using an intaglio. It is also to reduce the variation in the height of each structure. ⁇
  • the present invention forms a structure containing spacer particles and a resin on a substrate by printing an ink containing spacer particles and a resin on the substrate by a plate printing method using an intaglio.
  • the indentation opening diameter of the intaglio is 2.;! To 9.0 times the particle diameter of the spacer particles, and the indentation depth of the intaglio is It is characterized by being 0.85 to 1.7 times the particle diameter of the spacer particles.
  • the present invention also relates to a spacer, wherein the spacer is formed on the substrate by the method. Furthermore, the present invention relates to a display element characterized by having this spacer.
  • the present inventor increased the diameter of the concave opening of the intaglio plate to 2.1 times or more of the particle diameter of the spacer particles, so that We have found that the ratio of resin-only structures that do not contain spacer particles can be significantly reduced, and that the gap control function required to maintain a uniform substrate spacing can be fulfilled.
  • the concave opening diameter of the intaglio is preferably 2.2 times or more of the particle diameter of the spacer particles, more preferably 2.7 times or more,
  • the upper limit of the recess opening diameter of the intaglio is not more than 9.0 times the particle diameter of the spacer particles. If this exceeds 9.0 times, the number of spacer particles entering the recesses will be too large, and it will be difficult to maintain the shape during transfer, resulting in particle stacking and inability to contact the substrate. Particles are generated, and gap unevenness due to structures tends to occur.
  • FIG. 1 is a schematic diagram showing a printing apparatus that can be used for the Sgreen printing method.
  • FIG. 2 is a schematic diagram showing the transfer of the ink 24 onto the substrate 20.
  • Fig. 3 is a diagram schematically showing each process of screen printing.
  • FIG. 4 is a schematic diagram showing a state where the ink on the intaglio is scratched by the blade 2.
  • FIG. 5 is a plan view schematically showing the structure 29 on the substrate 20.
  • the plate-type printing ink used in the present invention includes spacer particles and a thermosetting resin composition in which the spacer particles are dispersed. If necessary, it contains a solvent, a viscosity modifier and other additives. Each of these elements will be described in turn.
  • the material of the spacer particles is not particularly limited, and examples thereof include resins, organic substances, inorganic substances, and compounds and mixtures thereof.
  • the resin is not particularly limited.
  • the coating material of the spacer particles is not particularly limited, and examples thereof include resins and low melting point metals.
  • the resin include, but are not limited to, for example, polyolefins such as polyethylene, ethylene / vinyl acetate copolymer, and ethylene / acrylic acid ester copolymer; polymethyl (meth) acrylate, polyethyl (meth) alkyl.
  • (Meth) acrylate polymers or copolymers such as relate, polybutyl (meth) acrylate; polystyrene, styrene / acrylic acid ester copolymer, SB type styrene / butylene block copolymer, SBS type styrene / Butadiene block copolymers, block polymers such as these water additives, thermoplastic resins such as vinyl polymers or copolymers, thermosetting resins such as epoxy resins, phenol resins, melamine resins, mixtures thereof, etc. But it ’s not just physically attached, it ’s chemically bonded. Preference is.
  • the particle surface and the polymer constituting the adhesive layer are bonded by a covalent bond.
  • the method include a graft polymerization method and a polymer reaction method.
  • a graft polymerization method a polymerizable vinyl group is introduced into the particle surface, the monomer is polymerized starting from the vinyl group, a polymerization initiator is introduced into the particle surface, and the initiator is used. Two methods for polymerizing the above monomers are conceivable. (Resin)
  • Resins that can be used in the present invention are not limited. Polyester resin, acrylic resin, epoxy resin, reaction product of polyester resin and acid anhydride, lactone-modified phenoxy resin, lactone-modified butyral, vinyl resin, phenol Examples thereof include resins and melamine resins.
  • the plate-type printing ink of the present invention may contain a solvent.
  • n-hexane, n-heptane aliphatic hydrocarbons such as rubber volatile oil, etc .
  • aromatic hydrocarbons such as cyclohexane, toluene, methylcyclohexane, etc .
  • methyl alcohol, ethyl alcohol, n_propyl alcohol, isopropanol Alcohols such as pill alcohol, n-butyl alcohol, sec-butyl alcohol, and isobutyl alcohol
  • esters such as methyl acetate, ethyl acetate, isopropyl acetate, and n-propyl acetate
  • acetone methyl ethyl ketone, methyl isobutyl ketone, etc. Ketones.
  • Aliphatic hydrocarbons such as mineral spirits; aromatic hydrocarbons such as xylene, solvent naphtha, tetralin and dipentene; alcohols such as cyclohexyl alcohol and 2-methylcyclohexyl alcohol; esters such as butylacetate; Hexanone, methylcyclohexanone, diacetone alcohol, ketone such as isophorone, glycol such as ethylene glycol, propylene glycol, etc .; Ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene Glycol ethers such as glycol monobutyl ether; ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol Over monomethyl E chill ether ⁇ cetearyl one bets like glycol ethers Es ether
  • Aliphatic hydrocarbons such as ink oil; alcohols such as tridecyl alcohol; diethylene glycol, triethylene glycol, dipropylene Glycol such as glycol; glycol ether such as jetylene glycol monobutyl ether; glycol ether ester such as diethylene glycol monobutyl ether acetate
  • a viscosity modifier may be used for the ink of the present invention in order to adjust the ink viscosity to be suitable for printing.
  • a viscosity modifier for example, Nippon Aerosil Co., Ltd., trade name Aerosil, Mizusawa Chemical Co., Ltd., trade name Mizukasil, Fuji Sirisya Chemical Co., Ltd., trade name Silica, Silo Hovic, Fuso Chemical Industry) Trade names such as Quo Tron Co., Ltd.).
  • the plate-type printing ink of the present invention can be used to form a spacer on a glass substrate for a liquid crystal panel by a printing method disclosed in JP-A-2000-35582. It is desirable to mix the spacer particles in the resin by 20 to 60% by weight. From the standpoint of suitability and printing accuracy for the silicone blanket used in this printing method, as a solvent, an alcohol having 11 or more carbon atoms (for example, trade name “Dianal” manufactured by Mitsubishi Chemical Corporation), boiling point 1 2 0 An aliphatic hydrocarbon solvent having a boiling point of 120 ° C or higher and an aromatic hydrocarbon solvent having a boiling point of 120 ° C or higher are preferred (reference: Jiro Aihara, Printing Printing Introductory Edition).
  • This preferred printing method will be mainly described.
  • the main body frame 10 is provided with a height-adjustable printing plate surface plate 1 1 provided with an intaglio 9 and a work surface plate 1 2 provided with a filter substrate 2 0. .
  • a bogie frame 13 is provided on the main body frame 10.
  • the dolly frame 1 3 moves on each surface plate.
  • a transfer cylinder 1 4 is supported on the carriage frame 1 3 and can be moved up and down.
  • the transfer sheet 3 is mounted on the outer peripheral surface of the transfer cylinder 14.
  • the carriage frame 13 is provided with an ink supply device 15, an ink supply blade 1 that is supported and fixed to an elevating air cylinder 1, and an ink removing blade 2.
  • the method for producing the printing intaglio 9 is not particularly limited, and can be produced by a known etching method.
  • the recess opening width of the intaglio can be controlled by controlling the opening width of the exposure mask.
  • the depth of the recess can be controlled by selecting the opening width, etching time and material.
  • FIGS. As shown in Fig. 2, set the intaglio 9 on the printing platen 11 and attach the silicon blanket 3 to the transfer cylinder 14.
  • Ink 2 4 is dropped on the intaglio 9 from the ink supply device 1 5 (Fig. 3a). Scatter the excess ink with the ink scraper blade 2 while smoothing the ink with the ink supply blade 1 while moving the carriage frame 1 3 (mouth), transfer the transfer cylinder 1 4 onto the intaglio 9 and transfer the ink 2 4 Transfer to the third side of the sheet (C) and transfer the ink on the third side of the transfer sheet to the 20th side of the substrate (2).
  • 2 2 is a non-pixel portion.
  • the opening diameter W of the recesses 19 of the intaglio plate by increasing the opening diameter W of the recesses 19 of the intaglio plate to be 2.1 times or more the particle diameter D of the spacer particles, a certain number of the recesses 19 are obtained. As a result, the proportion of resin-only structures that do not contain spacer particles can be significantly reduced on the printed circuit board.
  • the opening diameter W of the intaglio depression 9 is the particle diameter D of the spacer particle 2. By making it 7 times or more, the ratio of the resin-free structure containing only the spacer particles can be made 10% or less.
  • a large number of resin structures 29 including a resin 30 and a predetermined number of spacer particles 27 can be printed and transferred on a substrate 20.
  • the proportion of the resin structure not including the spacer particles 27 can be reduced to, for example, 30% or less, further 10% or less.
  • the concave opening diameter W of the intaglio increases and exceeds 9.0 times the particle diameter D of the spacer particles, the number of spacer particles 2 7 that enter the concave portion 19 becomes too large, and the transfer Sometimes it becomes difficult to maintain the shape, and the accumulation of particles occurs, or particles that cannot contact the substrate are generated, and the gap unevenness due to the structure is likely to occur.
  • the cell depth K of the intaglio is less than 0.85 times the spacer particle diameter D, when the excess ink 24 on the intaglio 9 is scraped off by the blade 2, it does not enter the recess. Along with the spacer particles 2 8, the particles 2 7 contained in the recesses to some extent are also easily scraped off. As a result, it was found that many resin-only structures without spacer particles are likely to occur on the printed substrate.
  • the spacer particles are likely to enter the recess in a state where two or more stages are stacked. It has been found that when the spacer particles are stacked in the recess 19, the spacer particles overlap in the structure, resulting in a variation in the height of the structure. Such a problem can be solved by the present invention.
  • Crosslinked polymer particles (a) and a resin composition (liquid) (b) were mixed to prepare an ink.
  • the proportion of the crosslinked polymer particles (a) in the total ink was set to 25% by weight.
  • crosslinked polymer particles (a) were prepared as described in JP-A No. 2 03-3-1 1 7 5 4 6.
  • a 2 L separable flask was charged with 400 g of polyvinylpyrrolidone 3.5% methanol solution, 42 g of styrene, 63 g of p-trimethylsilylstyrene, and gently stirred under a nitrogen stream. While heating to 60 ° C. Add 4 g of azobisisoptylonitrile and allow to react for 12 hours. After completion of the reaction, the mixture was cooled to room temperature, and 20 g of a 5% aqueous solution of potassium hydroxide was added, followed by stirring at 60 ° C. for 2 hours for hydrolysis and crosslinking reaction. The obtained particles were washed to obtain particles A.
  • toluene solution in which 10 g of interpenetrating polymer network-forming compound (2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane) is dissolved.
  • Epoxy was impregnated.
  • the epoxy-impregnated particles were heated at 200 ° C. for 16 hours and then washed to obtain crosslinked polymer particles B having a hydroxyl group derived from an epoxy group on the particle surface 4a.
  • the average particle size of particles B was 4.2 mm, and the coefficient of variation was 3%.
  • the resin composition was prepared as follows.
  • “Placcel 4 1 0 D” Poly-Strength Prolacton Tetraol, manufactured by Daicel Chemical Industries, Ltd. 4 5 parts by weight, carboxylic acid-containing poly-strength triol (poly-strength prolacton triol and tetrahydrofuran phthalic anhydride) And 1: 1 molar ratio adduct) 20 parts by weight, "Cymel 300" (Melamine resin, Mitsui Cytec Co., Ltd.) 3 5 parts by weight, "Dianar 1 3 5" (dissolved) Medium: Higher alcohol mixture having 13 and 15 carbon atoms (Mitsubishi Chemical Co., Ltd.) 25 parts by weight were mixed and reacted at 120 to 125 ° C for 6 to 7 hours.
  • the intaglio was produced by the method described in Examples of JP 2000-35582 A, using a glass intaglio.
  • the shape of the recess was a cylindrical shape, and the recess opening diameter and opening depth were changed as shown in Table 1.
  • an ultra-deep color 3D shape measurement microscope “V K- 9 5 0 0” manufactured by Keyence Corporation was used for the opening diameter and depth of the recess.
  • the openings were arranged in a lattice pattern.
  • the indentation opening diameter of the intaglio was set to 2.1 to 9.0 times the particle diameter of the spacer particle, and the indentation indentation depth was set to the spacer particle.
  • the particle size of 0.85 to 1.7 times the particle size of the spacer particles The ratio of non-existing resin structures can be reduced, and the variation in height of each structure can be reduced.
  • the indentation depth of the intaglio is 0.83 times the particle diameter of the spacer particles, but the proportion of the resin structure without the spacer particles is high. There are large variations in the height of structures.
  • the recess opening diameter of the intaglio is set to 1.67 times the particle diameter of the spacer particles, but the arrangement efficiency of the structure 29 is low.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Liquid Crystal (AREA)
  • Printing Methods (AREA)

Abstract

A method for printing and forming a structure of resin and spacer particles on a substrate by a plate-type printing method employing an intaglio, in which the ratio of a resin structure where the spacer particle does not exist is reduced and variation in height of the structure is reduced. A structure containing spacer particles (27) and resin (26) is formed on a substrate (20) by printing ink (24) containing the spacer particles (27) and resin (26) on the substrate (20) by a plate-type printing method employing an intaglio. Aperture diameter W of a recess (19) in the intaglio is 2.1-9.0 times as large as the particle size D of the spacer particles (27) and the depth K of the recess (19) in the intaglio is 0.85-1.7 times as large as the particle size D of the spacer particles (27).

Description

明細書  Specification
スぺーサ形成方法、 スぺーサおよび表示素子 発明の属する技術分野  Spacer forming method, spacer and display element TECHNICAL FIELD
本発明は、 液晶表示パネル等に使用されるスぺーサ形成方法、 スぺー サおよび表示素子に関するものである。  The present invention relates to a spacer forming method used for a liquid crystal display panel or the like, a spacer, and a display element.
背景技術  Background art
特開 2000— 35582号公報には、グラビアオフセッ ト印刷によるスぺー サ形成法が開示されている。特開 2000—35582号公報の請求項 2及び 3 に、 粘度 2 0 0 0〜 2 5 0 0 0 c p sの樹脂中に球状スぺーサを 2 0〜 6 0重量%配合したィンクを使用することが記載されており、 実施例で は、 5 //の樹脂スぺーサ粒子とポリエステル系樹脂が示されている。 ま す、 スぺーサ粒子を球形とし、 凹版のセル開口径をスぺーサ粒径の 1〜 2倍とし、 凹版のセル深度を粒径の 0 . 5〜 2倍とすることが記載され ている。 発明の開示  Japanese Patent Application Laid-Open No. 2000-35582 discloses a spacer forming method by gravure offset printing. Claims 2 and 3 of Japanese Patent Application Laid-Open No. 2000-35582 use an ink in which 20 to 60% by weight of a spherical spacer is blended in a resin having a viscosity of 200 to 250 cps. In the examples, 5 // resin spacer particles and polyester resin are shown. Furthermore, it is described that the spacer particles are spherical, the cell opening diameter of the intaglio is 1 to 2 times the spacer particle size, and the cell depth of the intaglio is 0.5 to 2 times the particle size. Yes. Disclosure of the invention
本発明者は、 この開示に基づき、 スぺーサ粒子を球形とし、 凹版のセ ル開口径をスぺーサ粒径の 1〜 2倍とし、 凹版のセル深度を粒径の 0 . 5〜 2倍とし、 スぺ一サを基板上にグラビアオフセッ ト印刷した。 しか し、 この結果、 印刷後の基板上に、 スぺーサ粒子を含まない樹脂のみの 構造物が多数存在していた。 スぺーサ粒子を含まない樹脂のみの構造物 は、 本来予定されているスぺ一ザとしてのギャップ制御機能がない。 し たがって、 スぺーサ粒子を含まない樹脂のみの構造物が多数存在する場 合には、 基板間隔を均一に保持できないために、 表示ムラを生じ易くな る また、 これとは別に、 特開 2000— 35582号公報記載の方法では、 凹版 上にインクを供給した後、 インクをかき取りブレードでかき取る。 しか し、 この際に、 凹版のセル深度がスぺーサ粒子径の 0 . 5倍に近いと、 凹部内に入ったスぺ一サ粒子が、 インクかき取りブレードによってかき 取られてしまうために、 凹部内にスぺーサ粒子が残留しないことがあつ た。 あるいは、 たとえ凹部内にスぺーサ粒子が残留していた場合であつ ても、 凹部内でかき取りブレードの進行方向へと向かってスぺ一サ粒子 が移動し、 凹部内で 1方向のみに偏って存在することがあった。 この結 果、 印刷した基板上には、 スぺーサ粒子の存在しない樹脂だけの構造物 が多数存在していたり、 あるいはスぺーサ粒子が構造物内で一部のみに 偏って存在しているために、 スぺ一サ本来のギヤップ制御機能を発揮で きない場合があった。 Based on this disclosure, the present inventor made the spacer particles spherical, the cell opening diameter of the intaglio was 1 to 2 times the spacer particle diameter, and the cell depth of the intaglio was 0.5 to 2 times the particle diameter. The spacers were gravure offset printed on the substrate. However, as a result, a large number of resin-only structures containing no spacer particles were present on the printed substrate. A resin-only structure that does not contain spacer particles does not have a gap control function as the originally planned spacer. Therefore, if there are a large number of resin-only structures that do not contain spacer particles, the substrate spacing cannot be maintained uniformly, and display unevenness is likely to occur. In addition, according to the method described in Japanese Patent Application Laid-Open No. 2000-35582, after supplying ink onto the intaglio, the ink is scraped off with a scraping blade. However, at this time, if the cell depth of the intaglio is close to 0.5 times the spacer particle diameter, the spacer particles that have entered the recess are scraped off by the ink scraping blade. In some cases, spacer particles did not remain in the recess. Or, even if the spacer particles remain in the recess, the spacer particles move in the recess toward the moving direction of the scraping blade, and only in one direction in the recess. There was sometimes a bias. As a result, there are a large number of resin-only structures that do not contain spacer particles on the printed substrate, or spacer particles are biased only partially in the structure. For this reason, the original gap-up control function of the spacer could not be demonstrated.
あるいは、 凹版の凹部深度がスぺ一サ粒子径の 2倍に近くなると、 ィ ンクかき取りブレードで余分なィンクをかき取った後に、 凹部内でスぺ ーサ粒子が積み重なることがあった。 つまり、 各構造物内でスぺーサ粒 子の積み重なりや基板に接しない粒子の発生が見られた。この場合にも、 印刷後の基板上で適正なギヤップを全面にわたって維持することはでき なくなるので、 ギャップムラが発生し、 表示ムラの原因となる。  Alternatively, when the indentation depth of the intaglio plate was close to twice the particle diameter of the spacer, the spacer particles sometimes accumulated in the recess after scraping off excess ink with the ink scraping blade. In other words, spacer particles were stacked in each structure, and particles that did not touch the substrate were observed. In this case as well, the proper gap cannot be maintained over the entire surface of the printed board, resulting in gap unevenness and display unevenness.
本発明の課題は、 凹版を用いた版式印刷法によって、 樹脂とスぺーサ 粒子との構造物を基板上に印刷形成する方法において、 スぺーサ粒子の 存在しない樹脂構造物の割合を減らし、 また各構造物の高さのばらつき を低減することである。 ·  An object of the present invention is to reduce the proportion of resin structures in which spacer particles are not present in a method of printing and forming a structure of resin and spacer particles on a substrate by a plate-type printing method using an intaglio. It is also to reduce the variation in the height of each structure. ·
本発明は、 スぺーサ粒子と樹脂とを含有するィンクを凹版を用いて版 式印刷法によって基板上に印刷することによって、 スぺーサ粒子と樹脂 とを含む構造物を基板上に形成する方法であって、 凹版の凹部開口径が スぺーサ粒子の粒子径の 2 . ;!〜 9 . 0倍であり、 凹版の凹部深度がス ぺ一サ粒子の粒子径の 0 . 8 5〜 1 . 7倍であることを特徴とする。 また、 本発明は、 前記方法によって前記基板上に形成されたことを特 徴とする、 スぺ一ザに係るものである。 更に、 本発明は、 このスぺーサ を有することを特徴とする、 表示素子に係るものである。 The present invention forms a structure containing spacer particles and a resin on a substrate by printing an ink containing spacer particles and a resin on the substrate by a plate printing method using an intaglio. The indentation opening diameter of the intaglio is 2.;! To 9.0 times the particle diameter of the spacer particles, and the indentation depth of the intaglio is It is characterized by being 0.85 to 1.7 times the particle diameter of the spacer particles. The present invention also relates to a spacer, wherein the spacer is formed on the substrate by the method. Furthermore, the present invention relates to a display element characterized by having this spacer.
本発明者は、 特開 2000— 35582号公報の開示に反し、 凹版の凹部開口 径をスぺーサ粒子の粒子径の 2 . 1倍以上に増加させることによって、 印刷後の基板上で、 スぺーサ粒子を含まない樹脂のみの構造物の割合を 著しく低減し、 基板間隔を均一に保持するのに必要なギヤップ制御機能 を好適に果たせることを見いだした。  Contrary to the disclosure of Japanese Laid-Open Patent Publication No. 2000-35582, the present inventor increased the diameter of the concave opening of the intaglio plate to 2.1 times or more of the particle diameter of the spacer particles, so that We have found that the ratio of resin-only structures that do not contain spacer particles can be significantly reduced, and that the gap control function required to maintain a uniform substrate spacing can be fulfilled.
この観点からは、 凹版の凹部開口径をスぺーサ粒子の粒子径の 2 . 2 倍以上とすることが好ましく、 2 . 7倍以上とすることが更に好ましく、 From this point of view, the concave opening diameter of the intaglio is preferably 2.2 times or more of the particle diameter of the spacer particles, more preferably 2.7 times or more,
4 . 2倍以上とすることがもっとも好ましい。 4.2 Most preferably, it is 2 times or more.
ここで、 凹版の凹部開口径の上限は、 スぺ一サ粒子の粒子径の 9 . 0 倍以下とする。 これが 9 . 0倍を超えると、 凹部内に入るスぺーサ粒子 の個数が多くなりすぎ、 転写時に形状を維持することが困難となり、 粒 子の積み重なりが発生したり、 基板に接することができない粒子が発生 し、 構造物によるギャップムラが発生しやすくなる。  Here, the upper limit of the recess opening diameter of the intaglio is not more than 9.0 times the particle diameter of the spacer particles. If this exceeds 9.0 times, the number of spacer particles entering the recesses will be too large, and it will be difficult to maintain the shape during transfer, resulting in particle stacking and inability to contact the substrate. Particles are generated, and gap unevenness due to structures tends to occur.
また、 凹版の凹部深度は、 スぺーサ粒子の粒子径の 0 . 8 5〜 1 . 7 倍でなければならないことも見いだした。 凹版のセル深度をスぺーサ粒 子径の 0 . 8 5倍以上 (好ましくは 1 . 0倍以上) とすることによって、 印刷した基板上において、 スぺーサ粒子の存在しない樹脂だけの構造物 を減らすことができ、 またスぺーサ粒子の構造物内での偏りを防止でき る。 凹版の凹部深度をスぺーサ粒子径の 1 . 7倍以下とすることによつ て、 構造物の高さを均一化することができる。 図面の簡単な説明 図 1は、スグリーン印刷法に利用できる印刷装置を示す模式図である。 図 2は、 基板 2 0上へのィンク 2 4の転写を示す模式図である。 It has also been found that the indentation depth of the intaglio must be between 0.85 and 1.7 times the particle size of the spacer particles. By setting the cell depth of the intaglio to 0.85 times or more (preferably 1.0 times or more) of the spacer particle diameter, a resin-only structure without spacer particles on the printed substrate In addition, the unevenness of the spacer particles in the structure can be prevented. The height of the structure can be made uniform by setting the indentation depth of the intaglio to be 1.7 times or less of the spacer particle diameter. Brief Description of Drawings FIG. 1 is a schematic diagram showing a printing apparatus that can be used for the Sgreen printing method. FIG. 2 is a schematic diagram showing the transfer of the ink 24 onto the substrate 20.
図 3は、 スクリーン印刷の各工程を模式的に示す図である。  Fig. 3 is a diagram schematically showing each process of screen printing.
図 4は、 凹版上のィンクをブレツ ド 2によってかきとつている状態を 示す模式図である。  FIG. 4 is a schematic diagram showing a state where the ink on the intaglio is scratched by the blade 2.
図 5は、 基板 2 0上の構造物 2 9を模式的に示す平面図である。 発明を実施するための最良の形態  FIG. 5 is a plan view schematically showing the structure 29 on the substrate 20. BEST MODE FOR CARRYING OUT THE INVENTION
本発明で使用する版式印刷用インクは、 スぺーサ粒子、 およびスぺー サ粒子を分散する熱硬化性樹脂組成物を含む。 また、 必要に応じて、 溶 媒、 粘度調整剤および他の添加剤を含む。 これらの各要素について順次 説明する。  The plate-type printing ink used in the present invention includes spacer particles and a thermosetting resin composition in which the spacer particles are dispersed. If necessary, it contains a solvent, a viscosity modifier and other additives. Each of these elements will be described in turn.
(版式印刷方式)  (Plate printing method)
これは凹版を用いた印刷方式を意味しており、 凹版印刷又はグラビア 印刷 (転写方式、 オフセッ ト方式、 パッ ド方式) を例示できる。  This means a printing method using intaglio, and intaglio printing or gravure printing (transfer method, offset method, pad method) can be exemplified.
(スぺーサ粒子)  (Spacer particles)
スぺーサ粒子の材質は特に限定されず、 例えば、 樹脂、 有機物、 無機 物、 これらの化合物や混合物等が挙げられる。 上記樹脂としては特に限 定されず、 例えば、 ポリエチレン、 ポリプロピレン、 ポリメチルペンテ ン、 ポリ塩化ビエル、 ポリテトラフルォロエチレン、 ポリスチレン、 ポ リメチルメ夕クリ レート、 ポリエチレンテレフ夕レート、 ポリプチレン テレフ夕レー ト、 ポリアミ ド、 ポリイ ミ ド、 ポリスルフォン、 ポリ フエ 二レンォキサイ ド、 ポリアセタール等の線状又は架橋高分子重合体; ェ ポキシ樹脂、 フヱノール樹脂、 メラミン樹脂、 ベンゾグアナミン樹脂、 不飽和ポリエステル樹脂、 ジビニルベンゼン重合体、 ジビニルベンゼン -スチレン共重合体、 ジビニルベンゼン-ァク リル酸エステル共重合体、 ジァリルフタレート重合体、 ト リアリルイソシァヌレート重合体等の架 橋構造を有する樹脂等が挙げられる。 The material of the spacer particles is not particularly limited, and examples thereof include resins, organic substances, inorganic substances, and compounds and mixtures thereof. The resin is not particularly limited. For example, polyethylene, polypropylene, polymethylpentene, polychlorinated vinyl, polytetrafluoroethylene, polystyrene, polymethyl methacrylate, polyethylene terephthalate, polypropylene terephthalate. , Polyamide, Polyimide, Polysulfone, Polyphenylene oxide, Polyacetal and other linear or cross-linked polymer; Epoxy resin, phenol resin, melamine resin, benzoguanamine resin, unsaturated polyester resin, divinylbenzene heavy , Divinylbenzene-styrene copolymer, divinylbenzene-acrylic acid ester copolymer, Examples thereof include resins having a bridge structure such as diallyl phthalate polymer and triallyl isocyanurate polymer.
また、 スぺーサ粒子の被覆物質としては特に限定されず、 例えば、 樹 脂、 低融点金属等が挙げられる。 上記樹脂としては特に限定されず、 例 えば、 ポリエチレン、 エチレン/酢酸ビニル共重合体、 エチレン/ァク リル酸エステル共重合体等のポリオレフイン類; ポリメチル (メタ) ァ クリレート、 ポリェチル (メタ) ァク リ レート、 ポリブチル (メタ) ァ クリレート等の (メタ) ァクリレート重合体又は共重合体; ポリスチレ ン、 スチレン/アクリル酸エステル共重合体、 S B型スチレン/ブ夕ジ ェンブロック共重合体、 S B S型スチレン /ブタジエンブロック共重合 体、 これらの水添加物等のブロックポリマー; ビニル系重合体又は共重 合体等の熱可塑性樹脂、 エポキシ樹脂、 フエノール樹脂、 メラミン樹脂 等の熱硬化性樹脂、 これらの混合物等が挙げられるが、 単に物理的に接 着しているのではなく、 化学的に結合しているのが好ましい。  Further, the coating material of the spacer particles is not particularly limited, and examples thereof include resins and low melting point metals. Examples of the resin include, but are not limited to, for example, polyolefins such as polyethylene, ethylene / vinyl acetate copolymer, and ethylene / acrylic acid ester copolymer; polymethyl (meth) acrylate, polyethyl (meth) alkyl. (Meth) acrylate polymers or copolymers such as relate, polybutyl (meth) acrylate; polystyrene, styrene / acrylic acid ester copolymer, SB type styrene / butylene block copolymer, SBS type styrene / Butadiene block copolymers, block polymers such as these water additives, thermoplastic resins such as vinyl polymers or copolymers, thermosetting resins such as epoxy resins, phenol resins, melamine resins, mixtures thereof, etc. But it ’s not just physically attached, it ’s chemically bonded. Preference is.
好適な実施形態においては、 スぺーサ粒子において、 粒子表面と、 付 着層を構成する重合体とを共有結合によって結合せしめる。 その方法と してはグラフ ト重合法、 および高分子反応法を例示できる。 グラフ ト重 合法においては、 粒子表面に重合可能なビニル基を導入し、 該ビニル基 を出発点として上記単量体を重合する方法、 粒子表面に重合開始剤を導 入し、 該開始剤により上記単量体を重合する方法の二つが考えられる。 (樹脂)  In a preferred embodiment, in the spacer particle, the particle surface and the polymer constituting the adhesive layer are bonded by a covalent bond. Examples of the method include a graft polymerization method and a polymer reaction method. In the graft polymerization method, a polymerizable vinyl group is introduced into the particle surface, the monomer is polymerized starting from the vinyl group, a polymerization initiator is introduced into the particle surface, and the initiator is used. Two methods for polymerizing the above monomers are conceivable. (Resin)
本発明で使用可能な樹脂は限定されず、 ポリエステル樹脂、 アクリル 樹脂、 エポキシ樹脂、 ポリエステル樹脂と酸無水物の反応物、 ラク トン 変性フヱノキシ樹脂、 ラク ト ン変性ブチラ—ル、 ビニル樹脂、 フヱノー ル樹脂、 メラミン樹脂を例示できる。  Resins that can be used in the present invention are not limited. Polyester resin, acrylic resin, epoxy resin, reaction product of polyester resin and acid anhydride, lactone-modified phenoxy resin, lactone-modified butyral, vinyl resin, phenol Examples thereof include resins and melamine resins.
(溶媒) 本発明の版式印刷用ィンクは溶媒を含有していてよい。 (solvent) The plate-type printing ink of the present invention may contain a solvent.
この溶媒としては、 以下を例示できる。  The following can be illustrated as this solvent.
( 1 ) 沸点 1 2 0 °C以下の低沸点溶剤  (1) Low boiling point solvent with a boiling point of 120 ° C or lower
n—へキサン、 n—ヘプタン、 ゴム揮発油等の脂肪族炭化水素 ; シク 口へキサン、 トルエン、 メチルシクロへキサン等の芳香族炭化水素 ; メ チルアルコール、 エチルアルコール、 n _プロピルアルコール、 イソプ 口ピルアルコール、 n—ブチルアルコール、 第二ブチルアルコール、 ィ ソブチルアルコール等のアルコール;酢酸メチル、 酢酸ェチル、 酢酸ィ ソプロピル、 酢酸 n—プロピル等のエステル ; アセ トン、 メチルェチル ケトン, メチルイソプチルケトン等のケトン類。  n-hexane, n-heptane, aliphatic hydrocarbons such as rubber volatile oil, etc .; aromatic hydrocarbons such as cyclohexane, toluene, methylcyclohexane, etc .; methyl alcohol, ethyl alcohol, n_propyl alcohol, isopropanol Alcohols such as pill alcohol, n-butyl alcohol, sec-butyl alcohol, and isobutyl alcohol; esters such as methyl acetate, ethyl acetate, isopropyl acetate, and n-propyl acetate; acetone, methyl ethyl ketone, methyl isobutyl ketone, etc. Ketones.
( 2 ) 沸点 1 2 0〜 2 3 0 °Cの中沸点溶剤  (2) Boiling point 1 2 0 ~ 2 30 ° C medium boiling solvent
ミネラルスピリ ッ ト等の脂肪族炭化水素 ; キシレン、 ソルベントナフ 夕、 テトラリン、 ジペンテン等の芳香族炭化水素 ; シクロへキシルアル コール、 2—メチルシクロへキシルアルコール等のアルコール ;酢酸ブ チル等のエステル ; シクロへキサノン、 メチルシクロへキサノン、 ジァ セ トンアルコール、 イソホロン等のケトン、 エチレングリコール、 プロ ピレングリコール等のグリコール ; ェチレングリコ一ルモノブチルェ一 テル、 プロピレングリコ一ルモノメチルエーテル、 プロピレングリコ一 ルモノェチルエーテル、 プロピレングリコールモノブチルエーテル等の グリコールエーテル; エチレングリコールモノブチルェ一テルァセテ一 ト、 プロピレングリコールモノメチルエーテルアセテート、 プロピレン グリコールモノェチルエーテルァセテ一ト等のグリコールエーテルエス テル  Aliphatic hydrocarbons such as mineral spirits; aromatic hydrocarbons such as xylene, solvent naphtha, tetralin and dipentene; alcohols such as cyclohexyl alcohol and 2-methylcyclohexyl alcohol; esters such as butylacetate; Hexanone, methylcyclohexanone, diacetone alcohol, ketone such as isophorone, glycol such as ethylene glycol, propylene glycol, etc .; Ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene Glycol ethers such as glycol monobutyl ether; ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol Over monomethyl E chill ether § cetearyl one bets like glycol ethers Es ether
( 3 ) 沸点 2 3 0〜 3 2 0 °Cの高沸点溶剤  (3) High boiling point solvent with boiling point of 2 30 to 3 20 ° C
インクオイル等の脂肪族炭化水素 ; ト リデシルアルコール等のアルコ ール ; ジエチレングリコール、 ト リエチレングリコール、 ジプロピレン グリコール等のグリコール ; ジェチレングリコールモノブチルエーテル 等のグリコールエーテル ; ジエチレングリコールモノブチルエーテルァ セテート等のグリコールエーテルエステル Aliphatic hydrocarbons such as ink oil; alcohols such as tridecyl alcohol; diethylene glycol, triethylene glycol, dipropylene Glycol such as glycol; glycol ether such as jetylene glycol monobutyl ether; glycol ether ester such as diethylene glycol monobutyl ether acetate
こう した溶剤例は、 例えば「印刷インク入門増補版」(相原次郎著 印 刷学会出版部) 第 4 3頁の表 2 . 8に記載されている。  Examples of these solvents are listed in Table 2.8 on page 43, for example, “Introduction to Printing Ink Supplement” (Jiro Aihara, Printing Society Press).
また、 本発明のィンクには、 印刷に適するィンク粘度に調整するため、 粘度調整剤を使用しても良い。 例えば粘度調整剤の一例として超微粉シ リカ (例えば日本ァエロジル株式会社製商品名ァエロジル、 水澤化学株 式会社商品名ミズカシル、 富士シリシァ化学株式会社製商品名サイ リシ ァ、 サイロホービック、 扶桑化学工業株式会社商品名クオ一トロンなど) があげられる。  In addition, a viscosity modifier may be used for the ink of the present invention in order to adjust the ink viscosity to be suitable for printing. For example, as an example of a viscosity modifier, ultra fine silica (for example, Nippon Aerosil Co., Ltd., trade name Aerosil, Mizusawa Chemical Co., Ltd., trade name Mizukasil, Fuji Sirisya Chemical Co., Ltd., trade name Silica, Silo Hovic, Fuso Chemical Industry) Trade names such as Quo Tron Co., Ltd.).
本発明の版式印刷用ィンクは、特開 2000-35582号公報に開示されてい る印刷法により、 液晶用パネル用ガラス基板上にスぺーサを形成するの に使用できる。 スぺーサ粒子を樹脂中に重量で 2 0〜 6 0 %混入するこ とが望ましい。 この印刷法で使用するシリコーンブランケッ トに対する 適性、 印刷精度の観点からは、 溶剤として、 炭素数 1 1以上のアルコ— ル (例えば三菱化学株式会社製商品名 「ダイヤナール」)、 沸点 1 2 0 °C 以上の脂肪族炭化水素溶剤、 沸点 1 2 0 °C以上の芳香族系炭化水素溶剤 が好ましい (参照文献: 印刷インク入門増補版 相原次郎著 印刷学会 出版部)。  The plate-type printing ink of the present invention can be used to form a spacer on a glass substrate for a liquid crystal panel by a printing method disclosed in JP-A-2000-35582. It is desirable to mix the spacer particles in the resin by 20 to 60% by weight. From the standpoint of suitability and printing accuracy for the silicone blanket used in this printing method, as a solvent, an alcohol having 11 or more carbon atoms (for example, trade name “Dianal” manufactured by Mitsubishi Chemical Corporation), boiling point 1 2 0 An aliphatic hydrocarbon solvent having a boiling point of 120 ° C or higher and an aromatic hydrocarbon solvent having a boiling point of 120 ° C or higher are preferred (reference: Jiro Aihara, Printing Printing Introductory Edition).
この好適な印刷方法を中心として説明する。  This preferred printing method will be mainly described.
好ましくは、 版のインク供給にあたっては、 凹版へのインク供給ブレ ードとインク接き取りブレードの 2枚のブレードを用いる。 そして凹版 面から樹脂をフィルター基板に転写するにあたっては、 転写シートとし てシリコンブラケッ トを使用する。 また、 転写シ一トとしてシリコンブ ラケッ 卜のほかに樹脂凸版を用いてもよい。 図 1に模式的に示す印刷機において、 本体フレーム 1 0に、 凹版 9を 設けた高さ調整可能な印刷版定盤 1 1、 及びフィルター基板 2 0を設け たワーク定盤 1 2を設置する。 本体フレーム 1 0の上には台車フレーム 1 3を設ける。 Preferably, when supplying ink to the plate, two blades are used: an ink supply blade for the intaglio plate and an ink contact blade. When transferring the resin from the surface of the intaglio to the filter substrate, a silicon bracket is used as the transfer sheet. In addition to the silicon bracket, a resin relief printing plate may be used as the transfer sheet. In the printing machine schematically shown in Fig. 1, the main body frame 10 is provided with a height-adjustable printing plate surface plate 1 1 provided with an intaglio 9 and a work surface plate 1 2 provided with a filter substrate 2 0. . A bogie frame 13 is provided on the main body frame 10.
台車フレーム 1 3は、 各定盤上を移動する。 台車フレーム 1 3には転 写胴 1 4が支持されており、 昇降可能となっている。 転写胴 1 4の外周 面には、 転写シート 3が装着される。 台車フレーム 1 3には、 インク供 給装置 1 5、 昇降用エアーシリンダ一に支持され固定されているィンク 供給ブレ一ド 1、 インク搔き取りブレード 2が設けられている。  The dolly frame 1 3 moves on each surface plate. A transfer cylinder 1 4 is supported on the carriage frame 1 3 and can be moved up and down. The transfer sheet 3 is mounted on the outer peripheral surface of the transfer cylinder 14. The carriage frame 13 is provided with an ink supply device 15, an ink supply blade 1 that is supported and fixed to an elevating air cylinder 1, and an ink removing blade 2.
印刷用凹版 9の作製方法は特に限定されず、 公知のエッチング法によ つて作製できる。 凹版の凹部開口幅は露光用マスクの開口幅を制御する ことによって制御できる。 また凹部深度は開口幅およびエツチング時間 や材質を選択することによって制御できる。  The method for producing the printing intaglio 9 is not particularly limited, and can be produced by a known etching method. The recess opening width of the intaglio can be controlled by controlling the opening width of the exposure mask. The depth of the recess can be controlled by selecting the opening width, etching time and material.
図 2、 図 3を参照しつつ製造法について説明する。図 2に示すように、 印刷版定盤 1 1に凹版 9をセッ 卜し、 転写胴 1 4にはシリコンブランケ ッ ト 3を装着する。 ィンク供給装置 1 5から凹版 9上にインク 2 4を滴 下する (図 3ィ)。台車フレーム 1 3を動かしながらインク供給ブレード 1でインクを均しながらインクかき取りブレード 2で余剰ィンクを搔き 取り (口)、 転写胴 1 4を凹版 9上に転動させィンク 2 4を転写シート 3 面に転写し (ハ)、転写シート 3面のィンクをフィル夕一基板 2 0面に転 写する (二)。 2 2は非画素部である。  The manufacturing method will be described with reference to FIGS. As shown in Fig. 2, set the intaglio 9 on the printing platen 11 and attach the silicon blanket 3 to the transfer cylinder 14. Ink 2 4 is dropped on the intaglio 9 from the ink supply device 1 5 (Fig. 3a). Scatter the excess ink with the ink scraper blade 2 while smoothing the ink with the ink supply blade 1 while moving the carriage frame 1 3 (mouth), transfer the transfer cylinder 1 4 onto the intaglio 9 and transfer the ink 2 4 Transfer to the third side of the sheet (C) and transfer the ink on the third side of the transfer sheet to the 20th side of the substrate (2). 2 2 is a non-pixel portion.
ここで、 たとえば図 4に示すように、 凹版の凹部 1 9の開口径 Wをス ぺーサ粒子の粒子径 Dの 2 . 1倍以上と大きくすることによって、 凹部 1 9内に、 ある程度の個数のスぺ一サ粒子 2 7が入り、 印刷後の基板上 において、 スぺーサ粒子を含まない樹脂のみの構造物の割合を著しく低 減できた。 凹版の凹部 1 9の開口径 Wをスぺーサ粒子の粒子径 Dの 2 . 7倍以上とすることによって、 スぺーサ粒子を含まない樹脂のみの構造 物の割合を 1 0 %以下とすることができる。 Here, for example, as shown in FIG. 4, by increasing the opening diameter W of the recesses 19 of the intaglio plate to be 2.1 times or more the particle diameter D of the spacer particles, a certain number of the recesses 19 are obtained. As a result, the proportion of resin-only structures that do not contain spacer particles can be significantly reduced on the printed circuit board. The opening diameter W of the intaglio depression 9 is the particle diameter D of the spacer particle 2. By making it 7 times or more, the ratio of the resin-free structure containing only the spacer particles can be made 10% or less.
なお、 図 5に示すように、 本発明によれば、 基板 2 0上に、 樹脂 3 0 と所定個数のスぺーサ粒子 2 7を包含する樹脂構造物 2 9を多数印刷転 写することが可能である。 言い換えると、 スぺーサ粒子 2 7を含まない 樹脂構造物の割合を例えば 3 0 %以下、 更には 1 0 %以下に減らすこと ができる。  As shown in FIG. 5, according to the present invention, a large number of resin structures 29 including a resin 30 and a predetermined number of spacer particles 27 can be printed and transferred on a substrate 20. Is possible. In other words, the proportion of the resin structure not including the spacer particles 27 can be reduced to, for example, 30% or less, further 10% or less.
ただし、 凹版の凹部開口径 Wが大きくなり、 スぺーサ粒子の粒子径 D の 9 . 0倍を超えると、 凹部 1 9内に入るスぺーサ粒子 2 7の個数が多 くなりすぎ、 転写時に形状を維持することが困難となり、 粒子の積み重 なりが発生したり、 基板に接することができない粒子が発生し、 構造物 によるギヤップムラが発生しやすくなる。  However, if the concave opening diameter W of the intaglio increases and exceeds 9.0 times the particle diameter D of the spacer particles, the number of spacer particles 2 7 that enter the concave portion 19 becomes too large, and the transfer Sometimes it becomes difficult to maintain the shape, and the accumulation of particles occurs, or particles that cannot contact the substrate are generated, and the gap unevenness due to the structure is likely to occur.
また、 凹版のセル深度 Kがスぺーサ粒子径 Dの 0 . 8 5倍未満である と、 ブレード 2によって凹版 9上の余剰のインク 2 4をかき取ったとき に、 凹部内に入っていないスぺ一サ粒子 2 8とともに、 凹部内にある程 度入っている粒子 2 7もかき取られてしまい易い。 この結果、 印刷した 基板上において、 スぺーサ粒子の存在しない樹脂だけの構造物が多く発 生しやすいことがわかった。  In addition, if the cell depth K of the intaglio is less than 0.85 times the spacer particle diameter D, when the excess ink 24 on the intaglio 9 is scraped off by the blade 2, it does not enter the recess. Along with the spacer particles 2 8, the particles 2 7 contained in the recesses to some extent are also easily scraped off. As a result, it was found that many resin-only structures without spacer particles are likely to occur on the printed substrate.
また、 凹版の凹部深度 Kがスぺーサ粒子径 Dの 1 . 7倍を超えると、 凹部内にスぺーサ粒子が 2段以上積み重なった状態で入り易い。 スぺー サ粒子が凹部 1 9内で積み重なると、 構造物内でのスぺ一サ粒子の重な りが起こり、 構造物の高さのバラツキをもたらすことを見いだした。 こ のような問題を本発明によって解決することができる。  In addition, when the indentation depth K of the intaglio exceeds 1.7 times the spacer particle diameter D, the spacer particles are likely to enter the recess in a state where two or more stages are stacked. It has been found that when the spacer particles are stacked in the recess 19, the spacer particles overlap in the structure, resulting in a variation in the height of the structure. Such a problem can be solved by the present invention.
このように、 本発明によれば、 図 5に示すように、 基板 2 0上に、 樹 脂 3 0 と所定個数のスぺ一サ粒子 2 7を包含する樹脂構造物 2 9を多数 印刷転写することが可能である。 実施例 As described above, according to the present invention, as shown in FIG. 5, a large number of resin structures 29 including resin 30 and a predetermined number of spacer particles 27 are printed and transferred on a substrate 20. Is possible. Example
架橋重合体粒子 (a ) および樹脂組成物 (液) (b ) を混合してインク を作製した。 インク全体に占める架橋重合体粒子 (a ) の割合は 2 5重 量%とした。  Crosslinked polymer particles (a) and a resin composition (liquid) (b) were mixed to prepare an ink. The proportion of the crosslinked polymer particles (a) in the total ink was set to 25% by weight.
本実施例においては、 架橋重合体粒子 (a ) は、 特開 2 0 0 3— 3 1 7 5 4 6号記載のようにして作製した。  In this example, the crosslinked polymer particles (a) were prepared as described in JP-A No. 2 03-3-1 1 7 5 4 6.
すなわち、 2 L セパラブルフラスコにポリビニルピロリ ドン 3 . 5 % メ夕ノール溶液 4 0 0 g、 スチレン 4 2 g、 p — ト リメ トキシシリルス チレン 6 3 gを充填し、 窒素気流下において緩やかに攪拌しつつ 6 0 °C に加温する。 ァゾビスイソプチロニト リル 4 gを加え、 1 2時間反応さ せる。 反応終了後室温に冷却した後、 水酸化カリウムの 5 %水溶液 2 0 0 gを追加し、 2時間 6 0 °Cで攪袢して加水分解及び架橋反応せしめた。 得られた粒子を洗浄し、 粒子 Aを得た。 粒子 A 2 0 gに対して、 相互侵 入高分子網目形成化合物 ( 2— ( 3 , 4—エポキシシクロへキシル) ェ チルト リメ トキシシラン) 1 0 gを溶解させたトルエン溶液 2 0 gを加 えてエポキシを含浸させた。 次いで、 該エポキシ含浸粒子を 2 0 0 °Cで 1 6時間加熱した後、 洗浄することにより、 粒子表面 4 aにエポキシ基 由来の水酸基を有する架橋重合体粒子 Bを得た。 粒子 Bの平均粒子径は 4 . 2〃 mであり、 変動係数は 3 %であった。  In other words, a 2 L separable flask was charged with 400 g of polyvinylpyrrolidone 3.5% methanol solution, 42 g of styrene, 63 g of p-trimethylsilylstyrene, and gently stirred under a nitrogen stream. While heating to 60 ° C. Add 4 g of azobisisoptylonitrile and allow to react for 12 hours. After completion of the reaction, the mixture was cooled to room temperature, and 20 g of a 5% aqueous solution of potassium hydroxide was added, followed by stirring at 60 ° C. for 2 hours for hydrolysis and crosslinking reaction. The obtained particles were washed to obtain particles A. To 20 g of particle A, add 20 g of toluene solution in which 10 g of interpenetrating polymer network-forming compound (2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane) is dissolved. Epoxy was impregnated. Subsequently, the epoxy-impregnated particles were heated at 200 ° C. for 16 hours and then washed to obtain crosslinked polymer particles B having a hydroxyl group derived from an epoxy group on the particle surface 4a. The average particle size of particles B was 4.2 mm, and the coefficient of variation was 3%.
また、 樹脂組成物は次のようにして作製し,た。  The resin composition was prepared as follows.
「プラクセル 4 1 0 D」 (ポリ力プロラク トンテトラオール、ダイセル 化学工業株式会社製) 4 5重量部、 カルボン酸含有ポリ力プロラク トン ト リオール (ポリ力プロラク トント リオールとテ トラヒ ド口無水フタル 酸との 1 : 1モル比付加物) 2 0重量部、 「サイメル 3 0 3」 (メラミン 樹脂、 三井サイテック株式会社) 3 5重量部、「ダイヤナ一ル 1 3 5」(溶 媒:炭素数 1 3及び 1 5の高級アルコール混合物、 三菱化学株式会社製) 2 5重量部を配合し、 1 2 0〜 1 2 5 °Cで 6〜 7時間反応させた。更に、 上記樹脂液 (合計量) 1 0 0重量部、 「ァエロジル 3 0 0 C F」 (粘度調 整剤: 多孔質シリカ、 日本ァエロジル株式会社製) 1 2重量部、 「ダイヤ ナ一ル 1 3 5」 (前記溶媒) 2 5重量部をプレミキシングし、 ロールにて 分散し、 インク用樹脂組成物を得た。 “Placcel 4 1 0 D” (Poly-Strength Prolacton Tetraol, manufactured by Daicel Chemical Industries, Ltd.) 4 5 parts by weight, carboxylic acid-containing poly-strength triol (poly-strength prolacton triol and tetrahydrofuran phthalic anhydride) And 1: 1 molar ratio adduct) 20 parts by weight, "Cymel 300" (Melamine resin, Mitsui Cytec Co., Ltd.) 3 5 parts by weight, "Dianar 1 3 5" (dissolved) Medium: Higher alcohol mixture having 13 and 15 carbon atoms (Mitsubishi Chemical Co., Ltd.) 25 parts by weight were mixed and reacted at 120 to 125 ° C for 6 to 7 hours. Furthermore, 100 parts by weight of the above resin solution (total amount), “Aerosil 3 00 CF” (viscosity modifier: porous silica, manufactured by Nippon Aerosil Co., Ltd.) 1 2 parts by weight, “Dianar 1 3 5 ”(Solvent) 2 5 parts by weight were premixed and dispersed with a roll to obtain an ink resin composition.
凹版はガラス製凹版を用レ、、特開 2000—35582号公報の実施例記載の 方法で作製した。 凹部の形状は円柱状とし、 凹部開口径、 開口部深度は、 表 1に示すように変更した。 凹部開口径および深度は、 株式会社キーェ ンス製の超深度カラー 3 D形状測定顕微鏡 「V K— 9 5 0 0」 を使用し た。 開口部は格子状に配置した。  The intaglio was produced by the method described in Examples of JP 2000-35582 A, using a glass intaglio. The shape of the recess was a cylindrical shape, and the recess opening diameter and opening depth were changed as shown in Table 1. For the opening diameter and depth of the recess, an ultra-deep color 3D shape measurement microscope “V K- 9 5 0 0” manufactured by Keyence Corporation was used. The openings were arranged in a lattice pattern.
前述のようにして印刷を行った。 ただし、 シリコンブランケッ トを使 用した。凹版にィンクを転写印刷後、ィンクを硬化させるために 2 2 0 °C で 1時間乾燥させた。 インクを基板上に転写印刷した後、 凹部 1個から 転写印刷されたィンク内のスぺーサ粒子の個数を光学顕微鏡によって観 察した。 各例について、 2 0 0個の凹部に対応するデータを取り、 構造 物内の粒子個数の平均値と、 粒子の存在しない箇所の存在率を表 1に示 した。  Printing was performed as described above. However, a silicon blanket was used. After the ink was transferred and printed on the intaglio, it was dried at 220 ° C. for 1 hour in order to cure the ink. After the ink was transferred and printed on the substrate, the number of spacer particles in the ink transferred from one recess was observed with an optical microscope. For each example, data corresponding to 200 recesses was taken, and the average value of the number of particles in the structure and the abundance ratio of the locations where no particles exist are shown in Table 1.
また、 構造物の高さの均一性は、 粒子個数の多い構造物 2 9を任意に 1 0個選び、 構造物 2 9の高さを測定した。 この測定には、 株式会社キ 一エンス製の超深度カラ一 3 D形状測定顕微鏡 「V K— 9 5 0 0」 を使 用した。  In addition, for the uniformity of the height of the structure, 10 structures 29 having a large number of particles were arbitrarily selected, and the height of the structure 29 was measured. For this measurement, an ultra-deep color 3D shape measuring microscope “V K-9500” manufactured by Kiensence Co., Ltd. was used.
(構造物 2 9の配置効率の判定基準)  (Criteria for arrangement efficiency of structure 29)
◎ : 粒子の存在しない箇所の存在率が 1 0 %以下  ◎: The presence rate of the part where particles are not present is 10% or less
〇 : 粒子の存在しない箇所の存在率が 1 0〜 3 0 %  ○: The existence rate of the part where particles are not present is 10 to 30%
X : 粒子の存在しない箇所の存在率が 3 0 %以上 (構造物 2 9の高さの均一性の判定基準) X: The presence rate of the part where particles are not present is 30% or more (Criteria for uniformity of height of structure 29)
〇 : 高さが粒子径の 1 . 8倍以上である構造物 2 9が確認できなか つた。  ○: The structure 29 whose height is 1.8 times the particle diameter or more could not be confirmed.
X : 高さが粒子径の 1 . 8倍以上である構造物 2 9が確認できた。 X: Structure 29 having a height of 1.8 times or more of the particle diameter was confirmed.
表 1 実施例 実施例 実施例 実施例 実施例 1 2 3 4 5 使用した粒子径 4. 2 3. 1 4. 8 5. 1 4. 4Table 1 Examples Examples Examples Examples Examples 1 2 3 4 5 Particle size used 4.2 3 1. 4. 8 5. 1 4. 4
( m) 凹部開口径 2 5 2 5 2 5 2 5 1 5 ( m) 凹部深度- 5 5 5 5 5. 5 (m) Concave opening diameter 2 5 2 5 2 5 2 5 1 5 (m) Concave depth-5 5 5 5 5.5
凹部の開口径/ 5.96 8.19 5.20 4.94 3.41 使用した粒子径 凹部の開口深さ/ 1.19 1.64 1.04 0.99 1.25 使用した粒子径 粒子個数の平均値 5. 4 11.8 3. 5 3. 0 2. 0 粒子の存在しない 0. 0 0, 0 1. 5 12.0 4. 0 箇所の存在率 Concave opening diameter / 5.96 8.19 5.20 4.94 3.41 Used particle diameter Concave opening depth / 1.19 1.64 1.04 0.99 1.25 Used particle diameter Average number of particles 5.4 11.8 3. 5 3. 0 2. 0 Presence of particles No 0. 0 0, 0 1. 5 12.0 4. 0 Location rate
(%) 構造物 2 9の ◎ ◎ ◎ 〇 ◎ 配置効率 構造物 2 9の 〇 〇 〇 〇 〇 高さの均一性 表 2 (%) Structure 2 9 ◎ ◎ ◎ ○ ◎ Placement efficiency Structure 2 9 ○ ○ ○ ○ ○ Uniformity of height Table 2
Figure imgf000016_0001
実施例 2、 3、 4、 5、 6、 7においては、 凹版の凹部開口径を スぺーサ粒子の粒子径の 2. 1〜 9. 0倍とし、 凹版の凹部深度をスぺ —サ粒子の粒子径の 0. 8 5〜 1 . 7倍としているが、 スぺーサ粒子の 存在しない樹脂構造物の割合を減らし、 また各構造物の高さのばらつき を低減することができる。 比較例 1では、 凹版の凹部深度がスぺーサ粒 子の粒子径の 0 . 8 3倍であるが、 スぺ一サ粒子の存在しない樹脂構造 物の割合が高く、 比較例 2では、 各構造物の高さのばらつきが大きい。 比較例 3では、 凹版の凹部開口径をスぺーサ粒子の粒子径の 1 . 6 7倍 としているが、 構造物 2 9の配置効率が低い。
Figure imgf000016_0001
In Examples 2, 3, 4, 5, 6, and 7, the indentation opening diameter of the intaglio was set to 2.1 to 9.0 times the particle diameter of the spacer particle, and the indentation indentation depth was set to the spacer particle. The particle size of 0.85 to 1.7 times the particle size of the spacer particles The ratio of non-existing resin structures can be reduced, and the variation in height of each structure can be reduced. In Comparative Example 1, the indentation depth of the intaglio is 0.83 times the particle diameter of the spacer particles, but the proportion of the resin structure without the spacer particles is high. There are large variations in the height of structures. In Comparative Example 3, the recess opening diameter of the intaglio is set to 1.67 times the particle diameter of the spacer particles, but the arrangement efficiency of the structure 29 is low.
本発明の特定の実施形態を説明してきたけれども、 本発明はこれら特 定の実施形態に限定されるものではなく、 請求の範囲の範囲から離れる ことなく、 種々の変更や改変を行いながら実施できる。  Although specific embodiments of the present invention have been described, the present invention is not limited to these specific embodiments and can be implemented with various changes and modifications without departing from the scope of the claims. .

Claims

請求の範囲 The scope of the claims
1 . スぺーサ粒子と樹脂とを含有するィンクを凹版を用いて版式印 刷法で基板上に印刷することによって、 前記スぺーサ粒子と前記樹脂と を含む構造物を前記基板上に形成する方法であって、 1. A structure containing the spacer particles and the resin is formed on the substrate by printing the ink containing the spacer particles and the resin on the substrate using an intaglio plate by a plate-type printing method. A way to
前記凹版の凹部開口径が前記スぺーサ粒子の粒子径の 2 . 1〜 9 . 0 倍であり、 前記凹版の凹部深度が前記スぺーサ粒子の粒子径の 0 . 8 5 〜 1 . 7倍であることを特徴とする、 スぺーサ形成方法。  The concave opening diameter of the intaglio is 2.1 to 9.0 times the particle diameter of the spacer particles, and the concave depth of the intaglio is 0.85 to 1.7 of the particle diameter of the spacer particles. Spacer forming method characterized by being doubled.
2 . 前記凹版の凹部開口径が前記スぺーサ粒子の粒子径の 4 . 2倍 以上であることを特徴とする、 請求項 1記載の方法。 2. The method according to claim 1, wherein the concave opening diameter of the intaglio is at least 4.2 times the particle diameter of the spacer particles.
3 . 前記基板上において、 前記スぺ一サ粒子と前記樹脂とを含む前 記構造物および前記スぺーサ粒子を含まず、 前記樹脂からなる構造物の 合計個数に対する、 前記スぺーサ粒子を含まず、 前記樹脂からなる構造 物の個数の割合が 3 0 %以下であることを特徴とする、 請求項 1 または 2記載の方法。 3. On the substrate, the spacer particles with respect to the total number of the structure including the spacer particles and the resin and the structure including the spacer particles and not including the spacer particles. The method according to claim 1 or 2, wherein a ratio of the number of the structures made of the resin is 30% or less.
4 . 請求項 1〜3のいずれか一つの請求項に記載の方法によって前 記基板上に形成されたことを特徴とする、 スぺ一サ。 4. A spacer formed on the substrate by the method according to any one of claims 1 to 3.
5 . 前記基板上において、 前記スぺーサ粒子と前記樹脂とを含む前 記構造物および前記スぺ一サ粒子を含まず、 前記樹脂からなる構造物の 合計個数に対する、 前記スぺーサ粒子を含まず、 前記樹脂からなる構造 物の個数の割合が 3 0 %以下であることを特徴とする、 請求項 4記載の スぺーサ。 5. On the substrate, the spacer particles with respect to the total number of the structure including the spacer particles and the resin and the structure including the spacer particles and not including the spacer particles. 5. The spacer according to claim 4, wherein the proportion of the number of structures made of the resin is 30% or less.
6 . 請求項 4または 5記載のスぺ一サを有することを特徴とする、 系子。 6. A genealogy having the spacer according to claim 4 or 5.
PCT/JP2005/012877 2004-07-09 2005-07-06 Method for forming spacer, spacer and display element WO2006006612A1 (en)

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JP2007226247A (en) * 2006-02-23 2007-09-06 Samsung Electronics Co Ltd Apparatus for manufacturing liquid crystal display and method of manufacturing the same

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JPH076692A (en) * 1993-06-14 1995-01-10 Shinko Kagaku Kogyo Kk Electrode connecting method and spacer transfer sheet used in this method and manufacture of this spacer transfer sheet
JP2000035582A (en) * 1998-07-17 2000-02-02 Mitsumura Printing Co Ltd Spacer forming method

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CN1997933A (en) 2007-07-11
JPWO2006006612A1 (en) 2008-04-24

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