WO2005114801A1 - Multi-output harmonic laser and methods employing same - Google Patents
Multi-output harmonic laser and methods employing same Download PDFInfo
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- WO2005114801A1 WO2005114801A1 PCT/US2005/010196 US2005010196W WO2005114801A1 WO 2005114801 A1 WO2005114801 A1 WO 2005114801A1 US 2005010196 W US2005010196 W US 2005010196W WO 2005114801 A1 WO2005114801 A1 WO 2005114801A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
- H01S3/109—Frequency multiplication, e.g. harmonic generation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/07—Construction or shape of active medium consisting of a plurality of parts, e.g. segments
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/0813—Configuration of resonator
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
- H01S3/09415—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1123—Q-switching
- H01S3/117—Q-switching using intracavity acousto-optic devices
Definitions
- This invention relates to solid-state lasers and, in particular, to laser systems or methods that employ at least two harmonic beams to perform micromachining operations such as via formation.
- Background of the Invention [0002] Conventional solid-state lasers provide only a single beam of laser output at a given time, and conventional solid-state harmonic lasers provide only a single harmonic beam of laser output at a given time.
- An exemplary solid-state harmonic laser produces UV laser pulses of 8-10 W average power in a single beam at a repetition rate of about 1-100 kHz.
- skilled practitioners have used laser systems with more than one laser head or a variety of beam-splitting techniques. These techniques have several disadvantages.
- beam-splitting techniques such as those employed to increase throughput in applications such as via drilling, require a higher-power laser beam to be generated from the laser so that the generated beam can be divided into the number of desired beams.
- the highest practical available harmonic power is primarily limited by the risk of damage to the harmonic converter.
- An object of the present invention is, therefore, to provide a solid-state laser for providing multiple laser output beams.
- Another object of the invention is to provide such a solid-state laser that provides two or more harmonic laser output beams.
- a further object of the invention is to provide a method for employing such a solid-state laser to increase the processing throughput of a laser system.
- the present invention preferably employs a solid-state laser having a laser resonator with output ports on opposite sides of a laser medium to provide two separate laser machining beams.
- the output ports are resonator mirrors that are partly transmissive to the fundamental wavelength generated by one or more laser media so that the laser resonator provides two separate laser machining beams at the fundamental wavelength.
- extracavity wavelength converters are employed to convert one or both fundamental wavelength beams to a harmonic wavelength.
- intracavity wavelength converters are positioned on one or both sides of the laser medium.
- the laser cavity may also include an optional Q-switch and/or aperture.
- the output ports employed in connection with intracavity wavelength converters can be resonator mirrors that are preferably highly reflective to the fundamental wavelength generated by one or more laser media and highly transmissive to the wavelength of the desired harmonic laser output.
- Each set of wavelength converters may comprise one, two, or three nonlinear crystals suited for specific harmonic generation. Further embodiments include a wave plate within one or both sets of nonlinear crystals for adjusting the power of each harmonic beam.
- the laser contains at least one fold mirror to facilitate end-pumping the laser medium.
- an additional solid-state laser medium is positioned along an optical path between the wavelength converters. Further embodiments include adding a Q-switch and/or an aperture, preferably between the laser media, and adding a laser pulse grating device to control concurrent propagation or nonpropagation of the laser machining beams independently to respective targets.
- An advantage of these embodiments is that a single laser provides two laser machining beams of laser output, eliminating many of the components and electronics that would be needed for two separate lasers.
- the burden of generating desired harmonic wavelength power is shared by two sets of harmonic converters, so there is less risk that the harmonic converters and other optical components will sustain damage.
- the laser components may, therefore, last longer and reduce costs.
- Another advantage of these embodiments is that two laser machining beams generated by a single laser can have virtually identical characteristics, especially when the laser is symmetrically configured. Wave plates can also be used to compensate for most differences between the power levels in the two laser machining beams.
- Still another advantage of these embodiments is that two laser machining beams generated by a single laser can be manipulated to have different parameters, such as wavelength or energy per pulse.
- one laser machining beam can be employed at the fundamental laser wavelength, while the second laser machining beam can be employed at the second, third, or fourth harmonic of the first beam.
- a laser system providing such laser machining beams could process different materials on one or more targets sequentially or simultaneously.
- FIG. 1 is a schematic diagram of a preferred embodiment of a solid-state harmonic laser for providing two laser machining beams, employing an output port at each end of the laser resonator and employing extracavity wavelength converters.
- FIG. 2 is a schematic diagram of a preferred embodiment of a solid-state harmonic laser for providing two laser machining beams, employing an output port at each end of the laser resonator and employing both intracavity and extracavity wavelength converters.
- FIG. 3 is a schematic diagram of a preferred embodiment of a solid-state harmonic laser for providing two laser machining beams, employing an intracavity wavelength converter and an output port at each end of the laser resonator.
- FIG. 4 is a schematic diagram of an alternative preferred embodiment of a solid-state harmonic laser for providing two laser machining beams, employing two laser media and multiple fold mirrors between the output ports.
- FIG. 5 is a schematic diagram showing that two laser machining beams can be employed to machine separate targets.
- FIG. 6 is a schematic diagram showing that two laser machining beams can be combined to machine the same target.
- FIG. 7 is a schematic block diagram showing an embodiment of an exemplary laser system employing two laser pulse gating devices to provide on- demand, time-independent targeting for respective laser machining beams from the same resonator.
- FIG. 8 is a schematic block diagram showing a generic embodiment of an exemplary laser employing at least one prism as an output port.
- FIG. 9 is a schematic block diagram showing a specific embodiment of an exemplary laser employing two prisms as the output ports. Detailed Description of Preferred Embodiments [0024] FIG.
- FIG. 1 is a schematic diagram of an embodiment of a laser 10a including a laser resonator 20a having two output ports 22a ⁇ and 22b ⁇ (generically, output ports 22) that are output-coupling resonator mirrors and are partly reflective to a fundamental infrared (IR) wavelength generated by one or more solid-state laser media 24a ⁇ and 24b ⁇ (generically, laser media 24 or laser medium 24) that are along an optical path 28a within the laser resonator 20a.
- IR infrared
- Skilled persons will appreciate that other techniques of separating the harmonic wavelength from the fundamental wavelength can be employed to propagate the harmonic wavelength out of the resonator 20a, with or without propagating through output couplers.
- the laser media 24 preferably comprise a conventional solid-state lasant such as Nd:YAG, Nd.YLF, Nd:YVO 4 , or Yb:YAG.
- laser media 24a and 24b will comprise the same lasant, but skilled persons will appreciate that laser medium 24a could be different from laser medium 24b in composition, size, or dopant concentration, for example.
- Laser medium 24b is shown in phantom lines because it can be omitted.
- the laser media 24 are directly or indirectly pumped from the side by one or more diodes or diode arrays (not shown) that generate laser pumping light 30a and 30b (generically, pumping light 30), but skilled persons will appreciate that one or more intracavity fold mirrors or pumping input coupling mirrors 32 (FIG. 4) and/or other well-known optical components (not shown) could be added to facilitate end-pumping. Skilled persons will appreciate that one or more lamps, lasers, or other pumping means could be employed to provide pumping light 30.
- the laser resonator 20a also preferably, but not necessarily, includes a Q- switch 38. If two laser media 24 are employed, the Q-switch 38 is preferably, but not necessarily, positioned between them along the optical path 28a.
- One or more apertures 40a and 40b may also be included in the laser resonator 20a along the optical path 28a. It is preferable to include one aperture 40 for each laser medium 24, and it is preferable to position apertures 40 between respective laser media 24 and output ports 22.
- wavelength converters 26a ⁇ and 26b ⁇ can be positioned along the optical path 28a outside of the laser resonator 20a to convert the laser machining resonator outputs 27a- ⁇ and 27b ⁇ (generically, resonator outputs 27) to harmonic laser machining beams 42a ⁇ and 42b ⁇ (generically, laser machining beams 42).
- the output ports 22a- ⁇ and 22 are preferably about 5%-20% transmissive to the fundamental wavelength. If only one of the two wavelength converters 26a ⁇ and 26b ⁇ is employed, then one of the laser machining beams 42 will express the fundamental wavelength while the other laser machining beam 42 will express a harmonic wavelength.
- Each wavelength converter 26 preferably comprises one or more nonlinear crystals 34a and 34b, such as 34a- ⁇ , 34a 2 , 34b ⁇ , and 34b 2 (generically, nonlinear crystals 34) shown in FIG. 1.
- the nonlinear crystals 34 are also labeled with "NLC" in the figures.
- the nonlinear crystals 34a are preferably generally identical to the respective nonlinear crystals 34b. With respect to the embodiment shown in FIG.
- the nonlinear crystals 34a ⁇ and 34b preferably convert the resonator outputs 27 to second harmonic laser machining outputs 29a and 29b (generically, second harmonic wavelength outputs 29), and the nonlinear crystals 34a 2 and 34b 2 preferably convert second harmonic wavelength outputs 29 to the laser machining beams 42, which in this embodiment preferably comprise the third harmonic wavelength.
- the laser machining beams 42 could be adapted to comprise the fourth harmonic wavelength.
- Typical fundamental laser wavelengths include, but are not limited to,
- wavelength converters 26 can be omitted from one or both sides of laser media 24 so that the one or both of the laser machining beams 42 may comprise the fundamental wavelength.
- harmonic laser machining beams 42a and 42b are desired to have substantially identical parameters, such as energy per pulse, skilled persons will appreciate that the components inside and outside of the laser resonator 20a should be arranged substantially symmetrically.
- one or more wave plates 36a and/or 36b (generically, wave plates 36) with or without polarizers are preferably added between the nonlinear crystals 34 of one or both sets of wavelength converters 26 to fine-tune the respective harmonic laser machining beams 42a and
- the wave plate 36 could be positioned between the output port 22 and the wavelength converter 26.
- Other well-known energy control devices including, but not limited to, a polarizer, an electro-optic device, an acousto-optic modulator or attenuator, a polarizer and a wave plate, or a polarizer and an electro-optic device, can additionally or alternatively be employed to control the energy of one or both laser machining beams 42.
- the cavity components can be configured to be substantially symmetrical in order to facilitate substantially similar harmonic laser machining beams 42a and 42b, or the cavity components can be configured to be intentionally asymmetrical in order to provide purposefully different harmonic laser machining beams 42a and 42b.
- the harmonic laser machining beams 42a and 42b are desired to have intentionally different parameters, such as wavelength, spot size, or energy per pulse, skilled persons can employ a wavelength converter 26a that is different from the wavelength converter 26b.
- the nonlinear crystals 34a can have different dimensions, properties, or distinct number of crystals than the nonlinear crystals 34b, or they may be spaced or configured differently inside or outside of the laser resonator 20a.
- other resonator components may be spaced differently on each side of the laser medium 24 so as to accommodate different beam powers and divergence angles.
- the wave plates 36 or other power control devices can also be controlled to alter the parameters of either or both of the harmonic laser machining beams 42a and 42b, and the wave plate 36a may also have different dimensions or properties than the wave plate 36b in order to facilitate different respective harmonic laser machining beams 42a and 42b to suit different particular applications.
- the embodiment shown employs reflective mirrors 48a ⁇ and 48b ! (generically, mirrors 48) to direct the respective harmonic laser machining beams 42a ⁇ and 42b ⁇ to beam positioning and focusing system components (not shown).
- the mirrors 48 are highly reflective to the wavelength of the harmonic laser machining beams 42, such as the third harmonic, and are highly transmissive to the fundamental and other harmonic wavelengths, such as the second harmonic at a 45-degree angle.
- FIG. 2 shows a preferred embodiment of a solid-state laser 10b having both extracavity wavelength converters 26a 2 and 26b 2 and intracavity wavelength converters 26c 2 and 26d 2 and employing many of the same components of the solid- state laser 10a in FIG. 1.
- analogous components of the solid-state lasers 10a and 10b are generally labeled with analogous reference numerals in FIGS. 1-8, although the lettering or subscripts may differ.
- a laser resonator 20b includes intracavity wavelength converters 26c 2 and 26d 2 that respectively preferably comprise one or more nonlinear crystals 34a ⁇ and 34b ⁇ .
- output ports 22a 2 and 22b 2 are preferably highly reflective to the fundamental wavelength generated by the laser medium 24 and are highly transmissive to a desired harmonic wavelength of the resonator outputs 27 a 2 and 27b 2 .
- Skilled persons will again appreciate that other techniques of separating the harmonic wavelength from the fundamental wavelength can be employed to propagate the harmonic wavelength out of the resonator 20 with or without propagating through output couplers, such as techniques employing prisms or Brewster angle-cut NLCs 34.
- the resonator outputs 27 comprise the second harmonic
- the extracavity wavelength converters 26a 2 and 26b 2 that respectively preferably comprise one or more nonlinear crystals 34a 2 and 34b 2 preferably convert the resonator outputs 27 into the harmonic laser machining beams 42a 2 and 42b 2 , which preferably comprise the fourth harmonic wavelength.
- partly reflective mirrors 48a 2 and 48b 2 are preferably highly reflective to the wavelength of the harmonic laser machining beams 42, such as the fourth harmonic, and are highly transmissive to the second harmonic wavelengths at a 45-degree angle.
- Respective second sets of wave plates 36a 2 and 36b 2 , nonlinear crystals 34a 2 and 34b 2 , and partly reflective mirrors 48a 2 and 48b 2 can be added to take advantage of the portions of the resonator (second harmonic) outputs 27 that propagate through the first set of partly reflective mirrors 48, so that four beams of virtually identical or substantially different harmonic laser machining output can be provided.
- FIG. 3 is a schematic diagram of a preferred embodiment of a laser 10c including a laser resonator 20c having two output ports 22a 3 and 22b 3 (generically, output ports 22 3 ) that are highly reflective to a fundamental wavelength generated by the laser medium 24b 3 and are highly transmissive to a desired harmonic wavelength.
- the wavelength converters 26e and 26f are preferably positioned within the laser resonator 20c toward the respective output ports 22a 3 and 22b 3 , and each wavelength converter 26 preferably comprises two or more nonlinear crystals 34a ⁇ and 34a 2 and 34b ! and 34b 2 .
- wave plates 36a 3 and 36b 3 are added between the nonlinear crystals 34 of both wavelength converters 26.
- a Q-switch 38 and/or an aperture 40 may also be added, preferably between the wavelength converters 26 and on opposite sides of the laser medium 24b 3 .
- Skilled persons will also appreciate that the resonator components could be arranged in a variety of combinations to provide substantially similar or different harmonic laser machining beams 42a and 42b 3 .
- the Q-switch 38 and the aperture 40 can be positioned on the same side of the laser medium 24b 3 , or the wave plates 36 3 can be omitted or be positioned on either side of both nonlinear crystals 34 of a given wavelength converter 26.
- harmonic laser machining beams 42a 3 and 42b 3 are desired to have the same parameters, then the symmetrical components are preferably identical; and if the harmonic laser machining beams 42a 3 and 42b 3 are desired to have intentionally different parameters, such as different wavelengths, then the symmetrical components, such as the wavelength converters 26, may have different characteristics to provide desired differences in harmonic laser machining beams 42.
- FIG. 4 is a schematic diagram of a preferred embodiment of an alternative laser 10d that also includes two sets of intracavity wavelength converters 26e and 26f, wave plates 36a 3 and 36b 3 , and output ports 22a 3 and 22b 3 .
- the laser resonator 20d also includes fold mirrors 32a ⁇ , 32a 2 , 32b ! , and 32b 2 (generically, fold mirrors 32, or 32a, or 32b) and two distinct laser media 24a and 24b 4 separated by the Q-switch 38.
- the fold mirrors 32 may be highly reflective to a fundamental wavelength generated by the laser media 24 and highly transmissive to a wavelength of the laser pumping light 30a ⁇ , 30a 2 , 30b ⁇ , and 30b 2 (generically, laser pumping light 30, or 30a, or 30b).
- the laser media 24 are preferably substantially identical in size, composition, and orientation to the optical path 28d, and the fold mirrors 32a and 32b are preferably substantially identical in size, shape, and angle of orientation to the optical path 28d.
- the distances between these resonator components on either side of the laser media 24 are also preferably symmetrical.
- resonator components and/or wavelength converters 26 on each side of the Q-switch 38 may have different properties, different sequential or axial arrangement along the optical path 28d, and/or different distances between them.
- the wave plates 36 or other energy control devices can be controlled so that the pulse energy of pulses of the first laser machining beam 42a is different from the pulse energy of pulses of the second laser machining beam 42b.
- the harmonic laser machining beams 42 can be manipulated in a variety of well-known beam- combining, beam-splitting, or beam-multiplexing techniques to perform well-known laser operations such as micromachining applications including, but not limited to, via drilling; semiconductor wafer slicing, dicing, or rounding; or other laser etching or scribing techniques.
- FIG. 5 demonstrates embodiments of a laser system 50a wherein the laser machining beams 42a and 42b from a solid-state laser 10 are directed by mirrors 48a and 48b along respective separate beam paths 52a and 52b and are directed by scan heads 56a and 56b at separate target locations on workpieces 54a and 54b supported by the same or different platforms 58.
- Scan heads 56a and 56b are preferably part of a conventional beam positioning system (FIG. 7), such as those described in detail, along with improvements, in U.S. Pat. No. 5,751,585 of Cutler et al., U.S. Pat. No. 6,430,465 of Cutler, or U.S. Pat. No. 4,532,402 of Overbeck, which are assigned to the assignee of this application and which are herein incorporated by reference.
- Other fixed-head or fast positioner-head systems such as galvanometer-, piezoelectrically-, or voice- coil-controlled mirrors, or linear motor-driven conventional positioning systems or those employed in the 5300 model series manufactured by Electro Scientific Industries, Inc.
- the workpieces 54a and 54b are substantially identical patterns, such as cell phone boards, and are preferably formed in similar alignments on a single printed circuit board (PCB) that is supported by the platform
- Each workpiece 54a and 54b may require substantially identical processing operations at the same or different locations.
- the workpieces 54a and 54b may require several vias to be drilled at identical locations.
- a laser 10 which provides two laser machining beams 42a and 42b for performing substantially identical processing operations on substantially identical workpieces 54a and 54b, offers several advantages over conventional laser systems that employ two distinct lasers or conventional systems that split a single beam from a single output laser. Many of the components and electronics that would be needed for two separate lasers are eliminated, so complexity and cost are reduced. The laser 10 also takes up less physical space and is more power-efficient than two separate lasers.
- each of the beams generated from the laser 10 may have the same practical maximum output power as that of a single beam generated by a conventional laser, or, for example, the sum of the output powers from the first and second beams can be greater than the practical maximum output power of the traditional single-output beam.
- the two laser machining beams 42a and 42b generated by the laser 10 are more likely to have identical pulse characteristics, especially when the resonator components are identical and are symmetrically positioned.
- Employing a laser 10 to provide the two laser machining beams 42a and 42b minimizes variations in age-related deterioration that would occur between different resonators, so the laser machining beams 42a and 42b are affected by substantially the same amount of cavity loss and/or performance drifting of the optical components or aging of the single or respective pumping source(s).
- Differences in beam characteristics from different resonators could result in one laser beam performing within acceptable tolerance while the other laser beam performs defective operations. For example, some vias may be drilled to a desirable depth or quality while other vias may be drilled in a manner that unacceptably damages the via bottom layer or surrounding layers.
- the acceptable range of laser pulse energies is often referred to as a "process window.” For many laser processing applications, the process window requires that laser pulse energy vary by less than 5% from a selected pulse energy value.
- the laser machining beams 42a and 42b are, therefore, more likely to be performing substantially identical processing operations with substantially identical output parameters (varying by less than 5% of pulse energy, for example), especially at high repetition rates such as greater than 5 or 10 kHz at harmonic wavelengths, on substantially identical via patterns on the workpieces 54a and 54b, so that both of the laser machining beams 42a and 42b produce high-quality results, for example, making high-quality vias in PCBs.
- FIG. 6 demonstrates embodiments of a laser system 50b wherein the laser machining beams 42a and 42b from the laser 10 are combined through a beam combiner 60 to provide a single laser system output 42e from the scan head 56 along the beam path 52c.
- the beam combiner 60 may include a fold mirror 48c, a beam-combining mirror 62, and an additional wave plate 36c. If the beam paths 52a and 52b are substantially equal before they reach the beam combiner 60, the laser system output 42e has the combined energy per pulse of the laser machining beams
- the combined energy of the laser machining beams 42a and 42b may be as much as about twice the energy per pulse as that available from a conventional solid-state laser. Skilled persons will particularly appreciate these advantages when harmonic wavelengths are desired.
- an optional optical delay path (not shown) can be employed along one of the beam paths 52a or 52b upstream of the beam combiner 60 to temporally separate the laser machining beams 42a and 42b in order to effectively elongate the pulse width experienced by a target or to provide immediately sequential pulses along the same beam path 52c.
- the delay between the laser machining beams 42a and 42b would preferably be from zero to about one pulse width, and the preferred combined adjustable pulse width would be from one to about two pulse widths of a given laser machining beam 42.
- the delay could be used to effectively double the repetition rate over the capabilities of a conventional single-output resonator.
- a small delay between the laser machining beams 42a and 42b can also be accomplished by moving the beam combiner 60 to be at respectively smaller and larger distances from the final fold mirrors 48a and 48b in order to provide a slightly adjustable combined pulse width.
- these laser machining beams 42a and 42b can have the same parameters or have different wavelengths, pulse energies, or other beam characteristics.
- FIG. 7 shows, as an example, a via-drilling system 110 that employs laser pulse gating devices 112a and 112b, positioned along beam paths 52a and 52b between the laser 10 and the respective scan heads 56a and 56b.
- a system controller or system computer 114 controls the scan head 56a to be aligned to a target location and then the directly or indirectly sends a "gating ON" gating control signal 116a to the laser gating device 112a, thereby prompting laser gating device 112a to assume an output transmitting state.
- the output transmitting state permits laser pulses of the laser machining beam 42a to propagate through the first gating device 112a and to be directed by the scan head 56a in order to reach the target location and perform the desired laser processing operation.
- the system computer 114 After a desired number of laser pulses of laser machining beam 42a impinge the target location, the system computer 114 directly or indirectly shuts off the gating signal 116a so that the gating device 112a assumes a nontransmitting state and the laser machining beam 42a is blocked from reaching the target location such as by being diverted to an absorber 118a. Then the system computer 114 commands the first scan head 56a to move and direct its aim at another target location before the system computer 114 sends another "gating ON" gating signal
- the system computer 114 concurrently commands the second scan head 56b and second gating device 112b in the same manner, performing laser processing only when desired at the target locations swept by the second scan head 56b.
- One advantage of such embodiments is that the laser 10 can remain running at a predetermined repetition rate, so there is no thermal loading variation on the wavelength converter(s) 26, and the thermally induced harmonic pulse energy drifting is thus eliminated.
- Another advantage of such embodiments is that the laser machining beams 42a and 42b can be gated completely independently of each other. Thus, scan heads 56a and 56b can perform completely independent laser processing tasks at different locations on different materials concurrently as well as sequentially.
- Another advantage of such embodiments is that the laser pulse gating devices 112a and 112b can perform laser energy control functions as well, thereby enhancing the system's performance and reducing its cost.
- Exemplary laser pulse gating devices include high speed electro-optic (E-
- A-O acousto-optic
- Radio-frequency (RF) loading control techniques described in U.S. Pat.
- Appl. No. 10/611,798 of Sun et al. can additionally be employed to provide nearly constant thermal loading on an A-O laser pulse gating device 112 by applying an RF pulse to the A-O gating device 112 in coincidence with pulses of the laser machining beam 42 when the scan head 56 is over a target location (in other words, when a working laser machining beam 42 is demanded) and by applying an RF pulse with the same RF energy to the A-O gating device 12 but in noncoincidence with the pulses of the laser machining beam 42 when the scan head 56 is over an intermediate location (in other words, when a working laser machining beam 42 is not demanded).
- Skilled persons will appreciate that with such substantially constant thermal loading on an A-O gating device 112, there are minimal adverse effects by an A-O gating device 112 on the quality and positioning accuracy of the working laser machining beam 42.
- FIG. 8 shows an embodiment of an exemplary laser 10d with components similar to those of the other lasers 10, but specifically employing at least one prism 22a 8 as at least one of its output ports 22 and employing a nontransmissive resonator mirror 32a 8 at one end of resonator 20d.
- Prism 22b 8 is shown in phantom because it may be included to serve as an output port 22 or may be omitted, or prism 22b 8 may be employed as an output port 22 for one selected wavelength while output port 22b 7 may be transmissive to the same or different wavelength in order to produce laser machining beams 42b 8 and 42b 7 . Skilled persons are again reminded that other techniques of separating the harmonic wavelength from the fundamental wavelength can be employed to propagate the harmonic wavelength out of the resonator 20 with or without propagating through output couplers, such as techniques employing Brewster angle-cut NLCs 34.
- wavelength converters 26a and 26b are shown in phantom and in alternative positions to emphasize variations described with respect to other embodiments. Their inclusion and positions may be varied. Similarly, laser medium 24b is shown in phantom.
- FIG. 9 shows a specific embodiment of an exemplary laser 10e employing two prisms 22a 8 and 22b 8 as the output ports 22.
- Laser 10e also includes end- pumped laser media 24; resonator end mirrors 32a 8 and 32b 8 ; and NLCs 34a and 34b, which are positioned between the resonator end mirrors 32a 8 and 32b 8 and the prisms 22a 8 and 22b 8 , respectively.
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Lasers (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Abstract
Description
Claims
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007513134A JP2008504671A (en) | 2004-05-14 | 2005-03-25 | Multi-output harmonic laser and method of using the same |
| CN2005800154653A CN1977429B (en) | 2004-05-14 | 2005-03-25 | Multi-output harmonic laser and methods employing same |
| DE112005001087T DE112005001087T5 (en) | 2004-05-14 | 2005-03-25 | Multi-output harmonic lasers and methods using same |
| GB0621383A GB2429578B (en) | 2004-05-14 | 2005-03-25 | Multi-output harmonic laser and methods employing same |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US57144304P | 2004-05-14 | 2004-05-14 | |
| US60/571,443 | 2004-05-14 | ||
| US10/893,148 US7139294B2 (en) | 2004-05-14 | 2004-07-16 | Multi-output harmonic laser and methods employing same |
| US10/893,148 | 2004-07-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2005114801A1 true WO2005114801A1 (en) | 2005-12-01 |
| WO2005114801A8 WO2005114801A8 (en) | 2006-02-02 |
Family
ID=34964261
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US2005/010196 Ceased WO2005114801A1 (en) | 2004-05-14 | 2005-03-25 | Multi-output harmonic laser and methods employing same |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US7139294B2 (en) |
| JP (1) | JP2008504671A (en) |
| KR (1) | KR20070012466A (en) |
| CN (1) | CN1977429B (en) |
| DE (1) | DE112005001087T5 (en) |
| GB (1) | GB2429578B (en) |
| TW (1) | TWI374593B (en) |
| WO (1) | WO2005114801A1 (en) |
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| US20060128073A1 (en) * | 2004-12-09 | 2006-06-15 | Yunlong Sun | Multiple-wavelength laser micromachining of semiconductor devices |
| GB2434483A (en) * | 2006-01-20 | 2007-07-25 | Fianium Ltd | High-Power Short Optical Pulse Source |
| US20070286247A1 (en) * | 2006-06-12 | 2007-12-13 | Pang H Yang | Frequency-doubled laser resonator including two optically nonlinear crystals |
| US7727796B2 (en) * | 2007-04-26 | 2010-06-01 | Oxford Instruments Analytical Oy | Method for patterning detector crystal using Q-switched laser |
| US8116341B2 (en) * | 2007-05-31 | 2012-02-14 | Electro Scientific Industries, Inc. | Multiple laser wavelength and pulse width process drilling |
| US7817686B2 (en) * | 2008-03-27 | 2010-10-19 | Electro Scientific Industries, Inc. | Laser micromachining using programmable pulse shapes |
| US8374206B2 (en) | 2008-03-31 | 2013-02-12 | Electro Scientific Industries, Inc. | Combining multiple laser beams to form high repetition rate, high average power polarized laser beam |
| KR101016175B1 (en) | 2010-12-27 | 2011-02-24 | 광주과학기술원 | Parallel hybrid multiband mid-infrared fiber laser generator |
| KR101109430B1 (en) | 2011-01-19 | 2012-01-31 | 광주과학기술원 | Parallel hybrid multiband mid-infrared fiber laser generator |
| CN104701724A (en) * | 2015-03-20 | 2015-06-10 | 中国科学技术大学 | Dual optical path device for connecting pulse laser with terminal experiment cavity |
| KR101632075B1 (en) * | 2016-03-21 | 2016-06-20 | 주식회사 제이티에스인더스트리 | ND-YAG laser system For skin treatment using Stable resonator and Unstable resonator |
| CN106238905B (en) * | 2016-06-14 | 2019-06-21 | 昆山国显光电有限公司 | A kind of laser energy automatic compensating method and equipment |
| JP2017221969A (en) * | 2016-06-17 | 2017-12-21 | 株式会社ブイ・テクノロジー | Laser lift-off device |
| DE102017203655B4 (en) * | 2017-03-07 | 2019-08-22 | Robert Bosch Gmbh | Method and device for shaping radiation for laser processing |
| TWI699251B (en) * | 2018-11-22 | 2020-07-21 | 財團法人工業技術研究院 | Laser machining device |
| CN114682908A (en) * | 2020-12-31 | 2022-07-01 | 苏州创鑫激光科技有限公司 | Laser output system, processing platform and output method |
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- 2005-03-25 JP JP2007513134A patent/JP2008504671A/en active Pending
- 2005-03-25 DE DE112005001087T patent/DE112005001087T5/en not_active Withdrawn
- 2005-03-25 KR KR1020067023635A patent/KR20070012466A/en not_active Ceased
- 2005-03-25 CN CN2005800154653A patent/CN1977429B/en not_active Expired - Fee Related
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Also Published As
| Publication number | Publication date |
|---|---|
| GB2429578A (en) | 2007-02-28 |
| DE112005001087T5 (en) | 2007-04-19 |
| GB2429578B (en) | 2008-09-17 |
| JP2008504671A (en) | 2008-02-14 |
| TW200537775A (en) | 2005-11-16 |
| CN1977429A (en) | 2007-06-06 |
| GB0621383D0 (en) | 2006-12-06 |
| US20050254530A1 (en) | 2005-11-17 |
| WO2005114801A8 (en) | 2006-02-02 |
| US20070153841A1 (en) | 2007-07-05 |
| KR20070012466A (en) | 2007-01-25 |
| CN1977429B (en) | 2012-02-01 |
| US7139294B2 (en) | 2006-11-21 |
| TWI374593B (en) | 2012-10-11 |
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