WO2005105662A3 - Procede de fabrication de structures periodiques bi-dimensionnelles, en milieu polymere - Google Patents

Procede de fabrication de structures periodiques bi-dimensionnelles, en milieu polymere Download PDF

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Publication number
WO2005105662A3
WO2005105662A3 PCT/FR2005/001001 FR2005001001W WO2005105662A3 WO 2005105662 A3 WO2005105662 A3 WO 2005105662A3 FR 2005001001 W FR2005001001 W FR 2005001001W WO 2005105662 A3 WO2005105662 A3 WO 2005105662A3
Authority
WO
WIPO (PCT)
Prior art keywords
periodic structures
producing
dimensional periodic
polymeric medium
laser beam
Prior art date
Application number
PCT/FR2005/001001
Other languages
English (en)
Other versions
WO2005105662A2 (fr
Inventor
Christophe Hubert
Celine Fiorini-Debuisschert
Jean-Michel Nunzi
Original Assignee
Commissariat Energie Atomique
Christophe Hubert
Celine Fiorini-Debuisschert
Jean-Michel Nunzi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat Energie Atomique, Christophe Hubert, Celine Fiorini-Debuisschert, Jean-Michel Nunzi filed Critical Commissariat Energie Atomique
Priority to EP05762341A priority Critical patent/EP1738227A2/fr
Priority to US11/587,443 priority patent/US20080257873A1/en
Priority to JP2007508942A priority patent/JP2007535397A/ja
Publication of WO2005105662A2 publication Critical patent/WO2005105662A2/fr
Publication of WO2005105662A3 publication Critical patent/WO2005105662A3/fr

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biophysics (AREA)
  • Optics & Photonics (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

La présente invention concerne un procédé de fabrication de structures périodiques en surface d'un matériau organique ou hybride organique-inorganique de type sol-gel, caractérisé en ce qu'il comprend l'étape qui consiste à illuminer directement le matériau, par un faisceau laser ayant un profil d'intensité uniforme en incidence quasi-normale, tout en opérant un déplacement relatif entre ledit matériau et le faisceau laser.
PCT/FR2005/001001 2004-04-23 2005-04-22 Procede de fabrication de structures periodiques bi-dimensionnelles, en milieu polymere WO2005105662A2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP05762341A EP1738227A2 (fr) 2004-04-23 2005-04-22 Procede de fabrication de structures periodiques bi-dimensionnelles, en milieu polymere
US11/587,443 US20080257873A1 (en) 2004-04-23 2005-04-22 Method for Producing Two-Dimensional Periodic Structures in a Polymeric Medium
JP2007508942A JP2007535397A (ja) 2004-04-23 2005-04-22 重合体媒体における二次元周期構造の形成方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0404332A FR2869306B1 (fr) 2004-04-23 2004-04-23 Procede de fabrication de structures periodiques bi-dimensionnelles, en milieu polymere
FR0404332 2004-04-23

Publications (2)

Publication Number Publication Date
WO2005105662A2 WO2005105662A2 (fr) 2005-11-10
WO2005105662A3 true WO2005105662A3 (fr) 2006-09-14

Family

ID=34945108

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/FR2005/001001 WO2005105662A2 (fr) 2004-04-23 2005-04-22 Procede de fabrication de structures periodiques bi-dimensionnelles, en milieu polymere

Country Status (5)

Country Link
US (1) US20080257873A1 (fr)
EP (1) EP1738227A2 (fr)
JP (1) JP2007535397A (fr)
FR (1) FR2869306B1 (fr)
WO (1) WO2005105662A2 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101394716B1 (ko) 2006-04-12 2014-05-15 도요세이칸 그룹 홀딩스 가부시키가이샤 구조체, 구조체의 형성방법, 구조체 형성장치, 구조색 및/또는 회절광 판독방법 및 진위 판정방법
DE102011101585B4 (de) * 2011-05-12 2015-11-12 Technische Universität Dresden Verfahren zur Herstellung von Leuchtdioden oder photovoltaischen Elementen

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0580393A2 (fr) * 1992-07-20 1994-01-26 Presstek, Inc. Plaque pour l'impression lithographique
EP0712047A2 (fr) * 1994-11-14 1996-05-15 Matsushita Electric Industrial Co., Ltd. Procédé pour réaliser un motif dans une photoréserve

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2375365A1 (fr) * 1999-05-27 2001-02-15 Patterning Technologies Limited Procede de formation d'un motif de masquage sur une surface
US6819402B2 (en) * 2001-10-18 2004-11-16 Asml Holding N.V. System and method for laser beam expansion
TWI238406B (en) * 2002-03-20 2005-08-21 Hitachi Maxell Optical information recording medium and method for producing the same
US6949389B2 (en) * 2002-05-02 2005-09-27 Osram Opto Semiconductors Gmbh Encapsulation for organic light emitting diodes devices

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0580393A2 (fr) * 1992-07-20 1994-01-26 Presstek, Inc. Plaque pour l'impression lithographique
EP0712047A2 (fr) * 1994-11-14 1996-05-15 Matsushita Electric Industrial Co., Ltd. Procédé pour réaliser un motif dans une photoréserve

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
CSETE M ET AL: "Development of submicrometer periodic surface structures on polyethylene terephthalate", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING SPIE-INT. SOC. OPT. ENG USA, vol. 3573, 1998, pages 120 - 123, XP002313649, ISSN: 0277-786X *
DATABASE INSPEC [online] THE INSTITUTION OF ELECTRICAL ENGINEERS, STEVENAGE, GB; April 2003 (2003-04-01), SAWADA H ET AL: "Precise periodic structuring with femtosecond-laser", XP002313650, Database accession no. 7814156 *
H. SAWADA ET AL., JOURNAL OF THE JAPAN SOCIETY OF PRECISION ENGINEERING, vol. 69, no. 4, April 2003 (2003-04-01), JAPAN, pages 554 - 558, XP008062713, ISSN: 0912-0289 *
HUBERT CHRISTOPHE ET AL: "Spontaneous patterning of hexagonal structures in an AZO-polymer using light-controlled mass transport", ADV MATER; ADVANCED MATERIALS MAY 17 2002, vol. 14, no. 10, 17 May 2002 (2002-05-17), pages 729 - 732+692, XP002313648 *
LI M ET AL: "Periodic microstructure induced by 532 nm polarized laser illumination on poly(urethane-imide) film: Orientation of the azobenzene chromophore", APPLIED SURFACE SCIENCE ELSEVIER NETHERLANDS, vol. 193, no. 1-4, 2002, pages 46 - 51, XP002313647, ISSN: 0169-4332 *

Also Published As

Publication number Publication date
JP2007535397A (ja) 2007-12-06
EP1738227A2 (fr) 2007-01-03
FR2869306B1 (fr) 2006-09-15
US20080257873A1 (en) 2008-10-23
FR2869306A1 (fr) 2005-10-28
WO2005105662A2 (fr) 2005-11-10

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