WO2005091284A1 - Device and method for manufacturing recording medium - Google Patents

Device and method for manufacturing recording medium Download PDF

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Publication number
WO2005091284A1
WO2005091284A1 PCT/JP2005/004588 JP2005004588W WO2005091284A1 WO 2005091284 A1 WO2005091284 A1 WO 2005091284A1 JP 2005004588 W JP2005004588 W JP 2005004588W WO 2005091284 A1 WO2005091284 A1 WO 2005091284A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
disk
center pin
adhesive
recording medium
Prior art date
Application number
PCT/JP2005/004588
Other languages
French (fr)
Japanese (ja)
Inventor
Hideo Yamashita
Yoshitake Yanagisawa
Shigenori Aokage
Hiroyuki Sugimoto
Original Assignee
Sony Disc & Digital Solutions Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Disc & Digital Solutions Inc. filed Critical Sony Disc & Digital Solutions Inc.
Publication of WO2005091284A1 publication Critical patent/WO2005091284A1/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C65/00Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor
    • B29C65/48Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor using adhesives, i.e. using supplementary joining material; solvent bonding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C66/00General aspects of processes or apparatus for joining preformed parts
    • B29C66/001Joining in special atmospheres
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C66/00General aspects of processes or apparatus for joining preformed parts
    • B29C66/01General aspects dealing with the joint area or with the area to be joined
    • B29C66/05Particular design of joint configurations
    • B29C66/10Particular design of joint configurations particular design of the joint cross-sections
    • B29C66/11Joint cross-sections comprising a single joint-segment, i.e. one of the parts to be joined comprising a single joint-segment in the joint cross-section
    • B29C66/112Single lapped joints
    • B29C66/1122Single lap to lap joints, i.e. overlap joints
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C66/00General aspects of processes or apparatus for joining preformed parts
    • B29C66/40General aspects of joining substantially flat articles, e.g. plates, sheets or web-like materials; Making flat seams in tubular or hollow articles; Joining single elements to substantially flat surfaces
    • B29C66/41Joining substantially flat articles ; Making flat seams in tubular or hollow articles
    • B29C66/45Joining of substantially the whole surface of the articles
    • B29C66/452Joining of substantially the whole surface of the articles the article having a disc form, e.g. making CDs or DVDs
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C66/00General aspects of processes or apparatus for joining preformed parts
    • B29C66/80General aspects of machine operations or constructions and parts thereof
    • B29C66/82Pressure application arrangements, e.g. transmission or actuating mechanisms for joining tools or clamps
    • B29C66/824Actuating mechanisms
    • B29C66/8242Pneumatic or hydraulic drives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C66/00General aspects of processes or apparatus for joining preformed parts
    • B29C66/80General aspects of machine operations or constructions and parts thereof
    • B29C66/82Pressure application arrangements, e.g. transmission or actuating mechanisms for joining tools or clamps
    • B29C66/826Pressure application arrangements, e.g. transmission or actuating mechanisms for joining tools or clamps without using a separate pressure application tool, e.g. the own weight of the parts to be joined
    • B29C66/8266Pressure application arrangements, e.g. transmission or actuating mechanisms for joining tools or clamps without using a separate pressure application tool, e.g. the own weight of the parts to be joined using fluid pressure directly acting on the parts to be joined
    • B29C66/82661Pressure application arrangements, e.g. transmission or actuating mechanisms for joining tools or clamps without using a separate pressure application tool, e.g. the own weight of the parts to be joined using fluid pressure directly acting on the parts to be joined by means of vacuum
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C66/00General aspects of processes or apparatus for joining preformed parts
    • B29C66/80General aspects of machine operations or constructions and parts thereof
    • B29C66/83General aspects of machine operations or constructions and parts thereof characterised by the movement of the joining or pressing tools
    • B29C66/832Reciprocating joining or pressing tools
    • B29C66/8322Joining or pressing tools reciprocating along one axis
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26Apparatus or processes specially adapted for the manufacture of record carriers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C66/00General aspects of processes or apparatus for joining preformed parts
    • B29C66/70General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material
    • B29C66/71General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material characterised by the composition of the plastics material of the parts to be joined
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29LINDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2017/00Carriers for sound or information
    • B29L2017/001Carriers of records containing fine grooves or impressions, e.g. disc records for needle playback, cylinder records
    • B29L2017/003Records or discs
    • B29L2017/005CD''s, DVD''s

Definitions

  • the present invention relates to an apparatus and a method for manufacturing a recording medium, and is suitably applied, for example, to the manufacture of a recording medium manufactured by laminating disk-shaped substrates having openings having different hole diameters.
  • So-called optical discs such as MD (Mini Disc) and DVD (Digital Versatile Disc) are usually manufactured through the following steps.
  • a disk substrate molding process a disk substrate is molded from a synthetic resin material such as polycarbonate by an injection molding method.
  • a film forming step a reflective film serving as a recording layer is formed by a sputtering method on the main surface of the disk substrate formed in the disk substrate forming step.
  • CDs Compact Discs
  • MDs are manufactured by providing a protective layer on the main surface of a disk substrate so as to cover the formed recording layer.
  • the two-layer DVD is manufactured by bonding a dummy substrate to the substrate thus formed, and the two-layer DVD is formed by bonding two disk substrates each having a recording layer formed thereon with an adhesive layer serving as an intermediate layer.
  • Japanese Patent Laid-Open Publication No. 2002-197735 discloses that an ultraviolet-curing adhesive is uniformly applied to one surface of two disk substrates, the two disk substrates are bonded to each other, and ultraviolet light is irradiated. There is described an optical disk manufacturing apparatus that forms a bonding disk by curing an adhesive with the adhesive.
  • a space-saving bonded disk that can reduce the required area can be manufactured.
  • a production line can be configured.
  • the conventional manufacturing apparatus and manufacturing method for manufacturing a recording medium by bonding disk substrates as described above have the following problems. Bubbles are formed in the adhesive layer between the bonded disk substrates. There was a problem that it would remain. Therefore, it is preferable to reduce the pressure in the space where the disk substrates are bonded, and to bond the disk substrates together.
  • the conventional recording medium manufacturing apparatus and manufacturing method during bonding, the upper disk substrate is held by a vacuum suction head, and the entire vacuum suction head is lowered to determine the position of the lower disk substrate. Since the center pin is pressed down and bonded to the lower disk substrate, it is difficult to perform bonding by reducing the pressure between the disk substrates to a vacuum state or the like.
  • an object of the present invention is to provide an apparatus and a method for manufacturing a recording medium which can prevent bubbles from being generated in an adhesive between substrates to be bonded, shorten a cycle time, and are easy to handle. is there. Disclosure of the invention
  • a recording medium manufacturing apparatus includes a first substrate having an opening in the center of the main surface, and a first substrate having an opening in the center of the main surface.
  • An apparatus for manufacturing a recording medium comprising: bonding a second substrate having a small opening to a first substrate and Z or an adhesive applied to one main surface of the second substrate with an adhesive therebetween;
  • a center pin formed with a step at the boundary between the small diameter portion and the large diameter portion at the tip end, the center pin being capable of being vertically displaced through the opening of the mounting table;
  • a decompression unit that decompresses the sealed space where the bonding is performed
  • An apparatus for manufacturing a recording medium comprising:
  • the method of manufacturing a recording medium according to the present invention comprises: a first substrate having an opening at the center of the main surface; and a second substrate having an opening at the center of the main surface smaller than the opening of the first substrate. And the contact applied on one major surface of the first substrate and Z or the second substrate.
  • a method for manufacturing a recording medium comprising:
  • the opening of the first substrate is inserted into the large-diameter portion of the center pin, the first substrate is supported by the mounting table, and the opening of the second substrate is connected to the end of the center pin.
  • the second board is supported by the step at the boundary between the small-diameter section and the large-diameter section, and the center pin is displaced vertically to attach the first and second boards.
  • the alignment makes it possible to easily and accurately position the first substrate and the second substrate during bonding.
  • the first substrate and the second substrate are not held by vacuum suction, the first substrate and the second substrate can be bonded to each other by reducing the pressure of the sealed space where bonding is performed. Air bubbles can be prevented from remaining in the adhesive interposed between the first substrate and the second substrate. Further, the first substrate and the second substrate can be brought close to each other before bonding, so that the cycle time can be reduced.
  • FIG. 1 is a schematic diagram illustrating an example of a configuration of an optical disk manufacturing apparatus according to an embodiment of the present invention.
  • FIG. 2 is a flowchart for explaining the flow of processing in the optical disk manufacturing apparatus.
  • FIG. 3 is a schematic diagram illustrating an example of a cross-sectional structure near a vacuum bonding apparatus.
  • FIG. 4 is a schematic diagram showing an example of a cross-sectional structure of a center pin.
  • FIG. 5 is a schematic diagram showing an example of a cross-sectional structure of a disc substrate after bonding.
  • FIG. 6 is a schematic diagram showing a state before a bonding process.
  • FIG. 7 is a schematic diagram showing a state where the chamber is closed.
  • FIG. 8 is a schematic diagram showing a state where the pressure in the chamber is reduced.
  • FIG. 9 is a schematic diagram showing a state where the plate is projected.
  • FIG. 10 is a schematic diagram showing a state where the plate is protruded.
  • FIG. 11 is a schematic diagram showing a state where the ventilation valve is opened.
  • FIG. 12 is a schematic diagram showing a state where the chamber is opened and the position of the plate is returned.
  • FIG. 13 is a flowchart for explaining the flow of processing during the bonding operation.
  • FIG. 14 is a schematic diagram showing an example of a configuration of an optical disk manufacturing apparatus to which the present invention can be applied. BEST MODE FOR CARRYING OUT THE INVENTION
  • FIG. 1 shows a schematic configuration of an example of an optical disk manufacturing apparatus according to an embodiment of the present invention.
  • FIG. 2 is a flowchart for explaining the flow of processing in the optical disk manufacturing apparatus.
  • FIGS. 1 and 2 an apparatus and method for manufacturing a recording medium according to an embodiment of the present invention will be described with reference to FIGS. 1 and 2.
  • the forming apparatus 1 has a cavity for forming two substrates.
  • the cavity is composed of a mold that can be opened and closed, for example, a fixed mold and a movable mold.
  • the molding apparatus 1 is composed of two flat annular substrates having the same outer diameter and different inner diameters (substrates 0 and 2) made of a synthetic resin material such as polycarbonate by an injection molding method. Form the substrate 1).
  • a stamper for forming pits of different information is attached to one principal surface of each of the cavities for molding these two substrates, and these two planar annular substrates (hereinafter referred to as disk substrates). Are formed on one main surface by a fine dent transferred by a stamper so that a signal recording surface is provided.
  • these two disk substrates are formed by the forming apparatus 1 (step S 1).
  • the disk substrate formed by the forming device 1 is transferred to the cooling device 3 by the take-out device 2.
  • the take-out machine 2 has a take-out arm capable of holding a disk substrate.
  • the unloader 2 controls this arm so as to synchronize with, for example, the opening and closing of the mold that constitutes the cavity of the molding device 1, and forms two disk substrates (a molded substrate 0 and a substrate 1). Hereinafter, simply referred to as two disk substrates) from the cavity and transported to the cooling device 3. It should be noted that efficiency can be improved by adopting a mechanism for simultaneously removing two disk substrates from the capity.
  • the cooling device 3 has a mechanism for receiving two disk substrates from the unloader 2. The efficiency can be improved by adopting a mechanism that receives two disk substrates at the same time.
  • the cooling device 3 further includes a mechanism for cooling the disk substrate, a mechanism for storing a predetermined number of disk substrates (for example, 3 to 20), and a film forming apparatus for performing the next step (film forming step).
  • the time to pass the loaded disk substrate to the next process is the earliest time, the time for one cycle of substrate molding in the previous process (substrate molding process), and the latest time.
  • the time is obtained by multiplying the cycle time of substrate molding by the number of storages that can be performed.
  • the disk substrate formed in the substrate forming step is cooled by the cooling device 3 (Step S2).
  • the disk substrate cooled by the cooling device 3 is transferred to the film forming device by the first transfer arm 4.
  • the substrate 0 is transported to the first film forming apparatus 5, and the substrate 1 is transported to the second film forming apparatus 6.
  • the first transfer arm 4 has a mechanism for taking out two disk substrates from the cooling device 3.
  • the efficiency can be improved by adopting a mechanism for simultaneously taking out two disk substrates. Further, the first transfer arm 4 transfers the two disk substrates taken out to the film forming apparatus for performing the next process (film forming step), and returns to the position where the disk substrates are taken out from the cooling device 3. Has a mechanism. In addition, efficiency can be improved by using a mechanism that simultaneously transports two disk substrates, respectively.
  • the first transfer arm 4 has a mechanism for supplying two disk substrates to the sampling device 10.
  • efficiency can be improved by using a mechanism for simultaneously supplying two disk substrates. This mechanism is used when sampling a disk substrate before film formation.
  • the first transfer arm 4 takes out the two disk substrates from the film forming apparatus, and transports the taken-out disk substrates to an adhesive applying apparatus for performing the next step (adhesive applying step). It has a mechanism to return to the position where the disk substrate is taken out of the film device.
  • the substrate 0 taken out of the first film forming apparatus 5 is transported to the first adhesive applying apparatus 7, and the substrate 1 taken out of the second film forming apparatus 6 is supplied to the second adhesive applying apparatus 8.
  • the first transfer arm 4 has two discs, one from the cooling device 3 and the other from the film forming device.
  • a mechanism that simultaneously takes out the disk substrate a mechanism that simultaneously transports two disk substrates to the film forming device and the adhesive application device, and a two that returns to the removal position again after the disk substrate transport operation It has a mechanism to perform the return operation simultaneously.
  • the first transfer arm 4 has a mechanism for simultaneously performing the take-out, transfer, and return operations of these two, but it goes without saying that the first transfer arm 4 does not necessarily need to be at the same time.
  • the first film forming apparatus 5 has a function of adding a reflective film of silicon, aluminum, silver, or the like to the signal (pit) transfer surface side of the substrate 0 by a sputtering method.
  • the first film forming apparatus 5 has a function of receiving a transparent disk substrate before film formation from the first transfer arm 4, a function of transferring a film-formed disk substrate to the first transfer arm 4, and a sputtering method. It has the function of adjusting the pressure in the space where sputtering is performed to a pressure suitable for the sputtering conditions, and the function of moving the disk substrate to the space where sputtering is performed.
  • the second film forming apparatus 6 has a function of adding a reflective film of silicon, aluminum, silver, or the like to the signal (pit) transfer surface side of the substrate 1 by a sputtering method.
  • the second film forming apparatus 6 has a function of receiving a transparent disk substrate before film formation from the first transfer arm 4, a function of passing a formed disk substrate to the first transfer arm 4, and a function of sputtering. It has the function of adjusting the pressure in the space where sputtering is performed to a pressure suitable for the sputtering conditions, and the function of moving the disk substrate to the space where sputtering is performed.
  • a film forming process is performed on each of the two disk substrates cooled by the cooling device 3 using the film forming devices (Step S 3).
  • the substrate 0 is subjected to a film forming process by a first film forming apparatus 5, and the substrate 1 is subjected to a film forming process by a second film forming apparatus 6.
  • the substrate 0 after film formation is supplied to the first adhesive coating device 7 by the first transfer arm 4, and the substrate 1 is supplied to the second adhesive coating device 8 by the first transfer arm 4. Supplied respectively.
  • the first adhesive application device 7 is located near the center of the substrate 0 on which the film has been formed (for example, if the center hole diameter is about ⁇ 15 mm, it is around ⁇ 20 ⁇ to ⁇ 26 ⁇ ) Has a table provided with a mechanism for sucking and holding by vacuum.
  • the first adhesive application device 7 applies an adhesive to a main surface to be a bonding surface of the substrate 0 by a spin coating method, and a table for holding the substrate 0 includes, for example, 3 0 r ⁇ ⁇ ! A mechanism that rotates at a rotation speed in the range of 800 rpm, a mechanism that applies the adhesive with good position reproducibility near the center of the substrate 0, and a mechanism that returns the adhesive shaken off by rotation to the adhesive supply tank have.
  • the table of the first adhesive application device 7 is used as a temporary table of the substrate 0.
  • the second adhesive application device 8 is provided in the vicinity of the center of the substrate 1 on which the film has been formed (for example, the diameter of the hole per center is ⁇ /). (Approximately ⁇ 26 mm) by vacuum.
  • the second adhesive application device 8 applies an adhesive onto the main surface to be bonded to the substrate 0 by a spin coating method, and a table holding the substrate 1 is, for example, 3 A mechanism that rotates at a rotation speed in the range of 0 rpm to 800 rpm, a mechanism that applies adhesive with good position reproducibility near the center of the substrate 1, and an adhesive that is shaken off by rotation is supplied to the adhesive It has a return mechanism.
  • the table of the second adhesive applying device 8 is used as a temporary placing table of the substrate 1. In the example shown in Fig. 1, the substrate 1 side is used as a temporary storage table.
  • the adhesive is applied to the two disk substrates on which the film formation has been performed by the film formation apparatus using the adhesive application apparatus (step S4).
  • the substrate 0 is coated with the first adhesive on the main surface to be the bonding surface.
  • the adhesive is applied by the device 7, and the substrate 1 is placed on the temporary placing table.
  • the substrate 0 to which the adhesive has been applied is supplied to the reversing device 11 1 by the second transfer arm 9, and the substrate 1 is supplied to the bonding table by the second transfer arm 9. It is supplied to the disk substrate receiving section of the device 12 respectively.
  • the sampling disk substrate is supplied to the sampling device 10 by the second transport arm 9.
  • the second transfer arm 9 takes out the two disk substrates from the adhesive application device to perform the next process (disk substrate bonding process), and removes the removed disk substrates into a reversing device 11, It has a mechanism for supplying to the table of the disk substrate receiving section of the table device 12.
  • Substrate 0 is supplied to reversing device 11.
  • the substrate 1 is supplied to a disk substrate receiving portion of the table device 12 and is inserted into a center pin.
  • the efficiency can be improved by adopting a mechanism for simultaneously taking out two disk substrates from the adhesive application device. Further, efficiency can be improved by using a mechanism for simultaneously supplying two disk substrates to the reversing device 11 and the table device 12 respectively.
  • the second transfer arm 9 has a mechanism for supplying two disk substrates to the sampling device 10 located between the reversing device 11 and the disk temporary placing table.
  • the efficiency can be improved by providing a mechanism for simultaneously supplying two disk substrates. This mechanism is used when sampling the disk substrate after film formation.
  • the second transfer arm 9 has a mechanism for returning to a position where the disk substrate is taken out from the adhesive application device.
  • the second transfer arm 9 is controlled to synchronize with the first transfer arm 4. That is, the operation of taking out the disk substrate is performed simultaneously with the operation of taking out the first transfer arm 4, and the operation of supplying the disk substrate is performed simultaneously with the operation of supplying the first transfer arm 4. Also, The operation of returning to the take-out position of the disk substrate is performed simultaneously with the operation of returning the first transfer arm 4.
  • the second transfer arm 9 is controlled so as to be synchronized with the first transfer arm 4 in order to improve efficiency. However, it is needless to say that the second transfer arm 9 does not always need to be synchronized.
  • the sampling device 10 is a device for acquiring a disk substrate for sampling, and has a function of receiving the substrate 0 and the substrate 1 before the film formation from the first transfer arm 4 and a substrate after the film formation. It has a function of receiving the straight 0 and the substrate 1 from the second transfer arm 9, and a function of enabling the disk substrate received by these functions to be safely taken out by hand.
  • the reversing device 11 1 is a mechanism for receiving the substrate 0 from the second transfer arm 9, a mechanism for turning the adhesive applied surface of the substrate 0 facing upward, and a substrate 0 for the disk of the table device 12. And a mechanism for supplying to the receiving portion and fitting to the center pin of the mounting table.
  • the substrate 0 and the substrate 1 are fitted to the center pin by the reversing device 11 and the second transport arm 9 in a direction in which the adhesive is interposed.
  • the table device 12 has a disk-shaped rotary table.
  • a mounting table on which the substrate 1 is mounted is provided on the rotary table.
  • a center pin is provided at the center of the mounting table. In the example shown in FIG. 1, four sets of the mounting table and the center pin are provided on the rotary table.
  • the table device 12 rotates the rotary table and moves the mounting table on which the disk substrate is mounted to the disk receiving portion, the vacuum bonding device 13, the adhesive curing device 14, and the disk removing portion, respectively.
  • the set of the mounting table and the center pin is preferably set to 4 sets in consideration of the efficiency of the structure of the table device 12, but may be set to 3 sets or less or 5 sets or more. .
  • the vacuum bonding device 13 bonds the substrate 0 and the substrate 1 inserted into the center pin.
  • the second transfer arm 9 and the second transfer arm 9 due to a handling error of the transfer device such as the removal arm of the removal machine 2, the first transfer arm 4, the second transfer arm 9, and the reversing device 11 described above. Due to the reversing device 11, only one of the substrate 0 and the substrate 1 may be inserted into the center pin. In such a case, the vacuum bonding apparatus 13 does not bond the substrates 0 and 1 together. The details around the vacuum bonding apparatus 13 will be described later.
  • the disk substrate to which the adhesive has been applied by the adhesive coating device is bonded by the vacuum bonding device 13 (step S5).
  • the disk substrate bonded by the vacuum bonding device 13 is transported to the adhesive curing device 14 by a rotating table.
  • the adhesive curing device 14 has a mechanism for curing the adhesive between the disk substrates and a mechanism for blowing nitrogen gas to the outer periphery of the disk substrate.
  • the mechanism for curing the adhesive is, for example, irradiating ultraviolet light (UV light) to the surface on the substrate 0 side to cure the adhesive between the disk substrates.
  • UV light ultraviolet light
  • the adhesive curing device 14 can be used even if only one of the substrate 0 and the substrate 1 is transferred from the vacuum bonding device 13.
  • the adhesive of the disk substrate is cured.
  • the adhesive curing step the adhesive interposed between the two disk substrates bonded by the vacuum bonding apparatus 13 is cured by the adhesive curing apparatus 14 (Step S6).
  • Adhesive curing device Disk substrate with adhesive cured by 4 Is moved to the disk substrate take-out portion of the table device 12 by the rotary table, and taken out of the table device 12 by the take-out arm 15.
  • the take-out arm 15 has a mechanism for taking out the disc board from the disc board take-out portion of the table device 12, a mechanism for supplying the disc board to the reversing arm 16, and a mechanism for receiving the disc board from the reversing arm 16.
  • a mechanism for moving the disc substrate to the discarding unit 17 and a mechanism for passing the disc substrate to the ejection device 18 are provided.
  • the reversing arm 16 has a mechanism for receiving the disk substrate from the removal arm 15, a mechanism for reversing the held disk substrate, and a mechanism for passing the disk substrate to the removal arm 15. .
  • the discarding unit 17 has a mechanism for stacking, for example, about 0 to 100 disk substrates, and a mechanism for manually pulling out and removing the stacked disk substrates.
  • the discharge device 18 has a mechanism for transferring the disk substrate to an unloading device 19 for performing the processing of the next step (post-processing step).
  • the disk substrate taken out of the table device 12 by the take-out arm 15 is passed to the reversing arm 16 and is turned over by the reversing arm 16. Disk substrates that were not properly processed, such as disk substrates where the adhesive was hardened without being bonded due to the handling error of the transport device described above, are discarded by the reversing arm 16. Moved to 17 and stacked as disc disc substrate. The normally processed disk substrate is transferred from the reversing arm 16 to the take-out arm 15.
  • the ejection arm 15 supplies the disc substrate received from the reversing arm 16 to the ejection device 18, and the ejection device 18 supplies the disc substrate received from the ejection arm 15 to the ejection device 19. I do.
  • the unloading device 19 performs post-processing such as disk inspection (step S7), and unloads the manufactured optical disk (step S7). Step S8).
  • FIG. 3 shows an example of a cross-sectional structure near the vacuum bonding apparatus.
  • the table device 12 includes a rotary table 21, a mounting table 22, a center pin 23, and a seal member 24.
  • the rotary table 21 is a rotary table included in the above-described table device 12, and the mounting table 22 is a table on which the substrate 1 provided on the rotary table 21 is mounted. is there.
  • the rotary table 21 is not limited to the disk shape as shown in FIG. 1, it is preferable to make the table surface circular because it rotates around the center of the table surface.
  • the mounting table 22 is not limited to the disk shape as shown in FIGS. 1 and 3, but the disk surface may be circular because the disk substrate is mounted on the table surface. preferable.
  • the mounting table 22 may be formed integrally with the rotary table 21.
  • a center pin 23 protrudes.
  • the center pin 23 is fitted to the mounting table 22 so as to be displaceable in a direction perpendicular to the mounting surface of the disk substrate.
  • the center pin 23 is attached to a portion of the mounting table 22 that protrudes from the mounting surface of the disk substrate, to the first disk substrate 25, that is, to the tip of the large-diameter portion into which the opening of the substrate 1 is inserted.
  • the second disk substrate 26, that is, a small-diameter portion into which the opening of the substrate 0 is inserted.
  • the disk substrate 25 inserted into the large-diameter portion is supported by the mounting table 22.
  • the disk substrate 26 inserted into the small-diameter portion is formed between the small-diameter portion and the large-diameter portion. It is supported by the step.
  • the large-diameter portion and the small-diameter portion are provided on the center pin 23 so that the opening of the disk substrate 25 and the opening of the disk substrate 26 are concentric.
  • a seal such as a 0-ring is provided between the center pin 23 and the mounting table 22.
  • a material 24 is provided, and the gap between the sensor pin 23 and the mounting table 22 and the rotary table 21 is closed.
  • FIG. 4 shows an example of a cross-sectional structure of the center pin 23.
  • Center pin 2 3
  • the large-diameter portion 23a has a small-diameter portion 23b on the distal end side that is smaller in diameter than the large-diameter portion 23a.
  • the large-diameter portion 23a and the small-diameter portion 23b are separated from each other, but they may be integrated.
  • the side wall 23 c of the large diameter portion 23 a positions the disk board 25 to be inserted into the center pin 23 in the radial direction.
  • the disk board 25 inserted into the center pin 23 is received and supported by the mounting table 22.
  • the side wall 23 d of the small-diameter portion 23 b positions the disk substrate 26 inserted in the center pin 23 in the radial direction.
  • the disk substrate 26 inserted into the center pin 23 is received and supported by a step formed at the boundary between the small diameter portion 23b and the large diameter portion 23a.
  • the step portion is formed such that the distance between the bonding surfaces of the disk substrate 25 and the disk substrate 26 fitted into the center pin 23 is short. For example, this distance is set to 0.5 mm to 2.0 mm. As mentioned above, center pin 2
  • the center pin 23 can be controlled with a stop accuracy of, for example, 0.1 mm or less, and the distance between the stepped portion of the center pin 23 and the mounting surface of the disk substrate of the mounting table 22 is arbitrary. Can be controlled.
  • the disc substrate 26 may be supported by forming the small-diameter portion 23b so as to gradually become thinner toward the front end without providing a step portion on the center pin 23.
  • the tip of the small diameter portion 23b is chamfered so as to gradually become thinner. This facilitates the fitting of the disk substrate to the center pin 23.
  • the vacuum bonding apparatus 13 includes a chamber 27, an air passage 29, an intake valve 30, a ventilation valve 31, a plate shaft 32, a motor 33, a plate 34, and a sealing member. 28 and a sealing member 35.
  • the vacuum bonding device 13 controls the pressure in the sealed space where the disk substrates 25 and 26 are bonded to each other, and moves the center pin 23 to a mechanism for creating a vacuum. And a mechanism for bonding the disk substrate 26 to the disk substrate 26.
  • the chamber 27 is a member that separates a space where the disk substrates are bonded from each other from the outside, and is capable of coming into contact with and separating from the table device 12.
  • the table device 12 side may be configured to be able to contact and separate from the chamber 27 side.
  • a seal member 28 such as an O-ring is provided between the chamber 27 and the table device 12.
  • An air passage 29 is provided in the chamber 27, and the inside of the chamber 27 and an intake port of an intake device (not shown) communicate with each other through the air passage 29.
  • An intake valve 30 provided in the air passage 29 is a valve for adjusting a ventilation state between the inside of the chamber 27 and an intake port of an intake device (not shown).
  • the air passage 29 further communicates with outside air via a ventilation valve 31.
  • the ventilation valve 31 is a valve for adjusting the ventilation state between the inside of the chamber 27 and the outside air.
  • the plate shaft 32 is inserted into the chamber 27 at a portion facing the center pin 23.
  • One end of the plate shaft 32 outside the chamber 27 is connected to the motor 33.
  • the plate shaft 32 moves in the axial direction of the center pin 23 by the rotation of the motor 33.
  • a plate 34 is provided at the other end of the plate shaft 32 in the chamber 27, .
  • the plate 34 is inserted into the center pin 23. It has a pressing surface for pressing the main surfaces of the disk substrate 25 and the disk substrate 26 toward the table device 12 with a uniform pressure.
  • the plate shaft 32 and the plate 34 are separated from each other, but the plate shaft 32 and the plate 34 may be integrated.
  • the tip of the center pin 23 is pressed by the pressing of the motor 33, the plate shaft 32 and the plate 34, and the center pin 23 moves.
  • the pressing of the tip of the center pin 23 is not limited to the one using the motor 33, the plate shaft 32 and the plate 34.
  • the tip of the center pin 23 is formed by a pin-shaped member.
  • the power used for pressing is not limited to the motor, but may be a structure using other power, such as using a cylinder or performing a manual operation.
  • the pin 23 By pressing the tip of the center pin 23, the pin 23 is moved in the direction in which the disc board 26 and the disc board 25 inserted into the pin 23 are pulled out, and the disc is moved.
  • the bonding surface of the substrate 25 and the bonding surface of the disk substrate 26 are in close contact with each other, and the disk substrate 25 and the disk substrate 26 are bonded together.
  • the center pin 23 since the center pin 23 is configured so that the opening of the disk substrate 25 and the opening of the disk substrate 26 are concentric with each other, this bonding structure allows The substrate 25 and the disk substrate 26 can be accurately aligned and bonded.
  • the plate 34 presses the disk substrate 25 by moving the pin 23 to the table device 12 side.
  • the adhesiveness between the disk substrates can be increased, and the thickness of the disk substrate after bonding can be adjusted.
  • the table device 12 does not move the center pin 23, and the uncured adhesive is placed on the mounting table of the table device 12. Do not stick to 2 2 etc.
  • glue from vacuum bonding device 13 The adhesive is hardened by being conveyed to the agent hardening device 14 with the disk substrate 26 inserted into the center pin 23.
  • a seal member 35 such as an O-ring is provided between the plate shaft 32 and the chamber 27, and a gap between the chamber 27 and the plate shaft 32 is closed.
  • the chamber 27 is closed to the table device 12 side by the seal member 24, the seal member 28, the seal member 35, the intake valve 30, and the ventilation valve 31, the space in the chamber 27 is sealed. be able to.
  • the intake valve 30 is opened, and the space in the chamber 27 is depressurized and evacuated by vacuuming with an intake device (not shown). Further, by closing the intake valve 30 and opening the ventilation valve 31 from such a reduced pressure state, the pressure in the space in the chamber 27 can be returned to the normal state. That is, the vacuum bonding apparatus 13 can control the pressure in the sealed space in the chamber 27 where the disk substrate 25 and the disk substrate 26 are bonded.
  • FIG. 5 shows an example of a cross-sectional structure of the disc substrate after bonding.
  • the first disk substrate 25 and the second disk substrate 26 each have a planar annular structure.
  • the disk substrate 25 and the disk substrate 26 have the same outer diameter, but the inner diameter of the opening is smaller in the disk substrate 26 than in the disk substrate 25.
  • the opening of the disc substrate 25 has an inner wall 25 a perpendicular to the main surface, and the inner wall 25 a is attached to the large-diameter portion 2 Mated with side wall 23c of 3a.
  • the opening of the disk substrate 26 has an inner wall 26a perpendicular to the main surface, and the inner wall 26a is attached to the small diameter portion 2 of the center pin 23 at the time of bonding. Mates with side wall 23d of 3b.
  • FIG. 6 to 12 show the vacuum bonding equipment 1 3 13 shows a series of states during the bonding operation
  • FIG. 13 shows an example of the flow of processing during the bonding operation.
  • FIG. 6 is a cross-sectional configuration of the vacuum bonding apparatus 13 before the bonding processing.
  • the chamber 27 In a state before the bonding process, the chamber 27 is in an open state. Further, the plate 34 is in a state of being retracted with respect to the center pin 23 side.
  • the disk substrate 25 and the disk substrate 26 fitted to the center pin 23 are supplied by the rotary table 21, and the preparation for bonding is completed.
  • FIG. 7 shows a state where the chamber 27 is closed.
  • the intake valve 30 is opened, and the chamber is vacuumed by a suction device (not shown).
  • the pressure in the chamber 27 is reduced, and this state is maintained (step S12).
  • FIG. 8 shows a state where the pressure in the chamber 27 is reduced. Specifically, the pressure in the chamber 27 is set to 10 Pa to 300 Pa, and the state is maintained for 1 second to 2 seconds.
  • FIG. 10 shows a state where the plate 34 is protruded.
  • FIG. 11 shows a state in which the ventilation valve 31 is opened.
  • step S15 After ventilating the inside of the chamber 27, the chamber 27 is opened, and the plate 34 is returned to the original position before bonding (step S15).
  • Figure 12 shows chamber 2 7 shows a state in which the plate 34 is returned with the plate 7 opened.
  • the bonded disk substrate 25 and disk substrate 26 are supplied to the next step by rotating the turntable 21.
  • both the disk substrate 25 and the disk substrate 26 are formed with the center pin.
  • fitting portion 23 c and the fitting portion 2 c are arranged so that the opening of the disk substrate 25 and the opening of the disk substrate 26 positioned by the center pin 23 are concentric.
  • the adhesive curing device 14 even when only one of the substrate 0 and the substrate 1 is conveyed to the vacuum bonding device 13 and the bonding is not performed, the adhesive is applied. If there is a disc substrate that has been hardened, the uncured adhesive adheres to the handling part of the disc substrate to cure the adhesive on the disc substrate, and the disc substrate that is later handled becomes dirty with the adhesive and becomes defective. Can be prevented. Disk substrates that have not been properly processed, such as disk substrates that have not been bonded, are moved to the disposal unit 17 by the reversing arm 16 and are stacked as disk substrates for disposal. Therefore, a disk substrate that has not been processed normally can be processed easily and without lowering the operation rate.
  • the configuration is such that the number of times of handling the disk substrate is reduced, it is possible to reduce the occurrence of defects due to handling mistakes.
  • the present invention is also applicable to an optical disk manufacturing apparatus having the configuration shown in FIG.
  • the adhesive application device 62, the table device 64, the vacuum bonding device 65, the adhesive curing device 66, the discharging device 70, and the unloading device 71 are each a molding device 1 in the above-described embodiment.
  • Remover 2 cooling device 3, first film forming device 5, second film forming device 6, first adhesive coating device 7, second adhesive coating device 8, table device 12, vacuum bonding
  • the functional configuration is the same as that of the aligning device 13, the adhesive curing device 14, the discharging device 18, and the discharging device 19.
  • the transport table 54 is a table on which two disk substrates are placed and transported, and has a mechanism for taking out two disk substrates from the cooling device 53. It should be noted that efficiency can be improved by adopting a mechanism for simultaneously taking out two disk substrates.
  • the transport table 54 has a mechanism for supplying two disk substrates to the sputter arm 55, a function for receiving two disk substrates from the sputter arm 55, and two disks for the sampling arm 58.
  • a mechanism for supplying the substrate, a mechanism for supplying two disk substrates to the spinner arm 60, and a mechanism for rotating the disk horizontally in a state where the two disk substrates are placed on the table, for example, 90 degrees. have.
  • efficiency can be improved by using a mechanism that simultaneously supplies two disk substrates to the sputtering arm 55.
  • Efficiency can be improved by adopting a mechanism that receives two disk substrates from the sputter arms 55 at the same time. Supply two disk substrates simultaneously to sampling arm 58 By adopting such a mechanism, efficiency can be improved.
  • Efficiency can be improved by providing a mechanism for simultaneously supplying two disk substrates to the spinner arm 60.
  • the sputter arm 55 has a mechanism for receiving two transparent disk substrates before film formation from the transfer table 54 and transferring them to the film forming apparatus.
  • the substrate 0 is transferred to a first film forming apparatus 56, and the substrate 1 is transferred to a second film forming apparatus 57.
  • efficiency can be improved by using a mechanism for simultaneously transporting two disk substrates.
  • the sputter arm 55 has a mechanism for receiving two disk substrates from the film forming apparatus and supplying the disk substrates to the transfer table 54.
  • Substrate 0 is received from the first film forming apparatus 56, and substrate 1 is received from the second film forming apparatus 57.
  • the efficiency can be improved by adopting a mechanism in which two disk substrates are simultaneously received from the film forming apparatus and are simultaneously supplied to the transfer table 54.
  • the sampling arm 58 is an arm attached to the rotating shaft, and has a mechanism for receiving two disk substrates from the transfer table 54, a mechanism for holding the two received disk substrates, and a rotating shaft.
  • a mechanism for rotating horizontally 180 degrees, for example, and a mechanism for supplying two disk substrates to the sampling device 59 are provided.
  • the efficiency can be improved by using a mechanism for receiving two disk substrates simultaneously from the transfer table.
  • efficiency can be improved.
  • the sampling device 59 has a mechanism for receiving two disk substrates from the sampling arm 58, and, for example, a disk having a rod-shaped member having a diameter smaller than the opening diameter passed through the central opening of the disk substrate. And a mechanism for stacking substrates.
  • the film formation processing is not performed in the film forming apparatus, and the sample is sampled from the transfer table 54 via the sampling arm 58.
  • the two disk substrates are supplied to the pulling device 59.
  • a film formation process is performed in a film formation device, and two disk substrates are transferred from the transfer table 54 to the sampling device 59 via the sampling arm 58. Supply.
  • the spinner arm 60 is an arm attached to a rotating shaft, and has a mechanism for transporting two disk substrates to an adhesive application device. Substrate 0 is transported to first adhesive coating device 61, and substrate 1 is transported to second adhesive coating device 62. It should be noted that efficiency can be improved by using a mechanism for simultaneously transporting two disk substrates.
  • the spinner arm 60 has a mechanism for receiving two disk substrates from the adhesive application device. Substrate 0 is received from the first adhesive applicator 61, and substrate 1 is received from the second adhesive applicator 62. In addition, efficiency can be improved by adopting a mechanism that receives two disk substrates at the same time.
  • the spinner arm 60 further includes a mechanism for supplying the disk substrate to the reversing device 63, a mechanism for supplying the disk substrate to the table on which the disk of the bonding table device 64 is mounted, and a rotating shaft.
  • a reversing device 63 having a mechanism for rotating the center in the horizontal direction, for example, 90 degrees, a mechanism for receiving the substrate 0 from the spinner arm 60, an adhesive application surface of the substrate 0 facing upward. And a mechanism for supplying the substrate 0 to the disk receiving portion of the table device 64 and inserting it into the center pin of the mounting table.
  • the take-out arm 67 has a mechanism for taking out the disc substrate from the disc board take-out part of the table device 64, a mechanism for supplying the disc board to the reversing arm 68, and a mechanism for moving the disc board to the discard part 69.
  • the reversing arm 68 has a mechanism for receiving the disk substrate from the unloading arm 67, a mechanism for reversing the held disk substrate, and a mechanism for supplying the disk substrate to the ejection device 70. .
  • the discarding unit 69 has a mechanism for stacking, for example, about 0 to 100 disk substrates, and a mechanism for manually pulling out and removing the stacked disk substrates.
  • the main flow of processing in the optical disk manufacturing apparatus shown in FIG. 14 is the same as that of the optical disk manufacturing apparatus of the above-described embodiment.
  • the two disk substrates formed by the forming device 51 are conveyed to the cooling device 53 by the take-out device 52 and cooled.
  • the disk substrate cooled by the cooling device 53 is transferred to a film forming device by a transfer table 54 and a sputter arm 55 to perform a film forming process.
  • the substrate 0 is subjected to a film forming process by a first film forming device 56, and the substrate 1 is subjected to a film forming process by a second film forming device 57.
  • the two disk substrates formed by the film forming apparatus are supplied to the spinner arm 60 by the transfer table 54, transferred to the adhesive coating device, and coated with the adhesive.
  • the sampling disk substrate is transferred to the sampling device 59 by the transfer table 54 and the sampling arm 58.
  • the substrate 0 is coated with an adhesive by the first adhesive coating device 61, and the substrate 1 is placed on the temporary table.
  • the substrate 0 to which the adhesive is applied is supplied to the reversing device 63 by the spinner arm 60, and the substrate 1 is the disk of the bonding table device 64 by the spinner arm 60.
  • the substrate 0 supplied to the reversing device 63 supplied to the substrate receiving portion and the substrate 1 supplied to the table device 64 are respectively provided with an adhesive by a vacuum bonding device 65.
  • the adhesive is cured by an adhesive curing device 66.
  • the disk substrate on which the adhesive has been cured by the adhesive curing device 66 is taken out of the table device 64 by the take-out arm 67, passed to the reversing arm 68, and inverted.
  • Disk substrates that have not been properly processed such as disk substrates that have been cured due to mishandling due to handling error of the transport device, etc., are moved to the disposal section 69 by the reversing arm 68. And stacked as disc substrates for disposal.
  • the normally processed disk substrate is transferred from the reversing arm 68 to the ejection device 70.
  • the same effects as those of the optical disc manufacturing apparatus and the manufacturing method according to the embodiment can be obtained.
  • a transfer device for each processing such as a sputter arm 55, a sampling arm 58, a spinner arm 60, etc. Cycle time can be reduced.
  • the present invention is not limited to the above-described embodiment of the present invention, and various modifications and applications can be made without departing from the gist of the present invention.
  • the numerical values given in the above-described embodiment are merely examples, and different numerical values may be used as needed.
  • a read-only optical disk having pits has been described.
  • applicable recording media are not limited to this.
  • a writable optical disk having a land group instead of a pit can be used. It can be applied to the manufacture of optical recording media.
  • the present invention can be applied not only to an optical disk but also to various other recording media such as a magnetic disk and a magneto-optical disk as long as they are manufactured by bonding substrates having different openings.
  • the outer peripheral shape of the substrate and the shape of the opening are not limited to a circle, but may be a square, a triangle, or the like. Other shapes such as shapes are also applicable. Further, the present invention is applicable even if the outer peripheral shapes of the substrates to be bonded are not the same.
  • the motor 33 is provided on the vacuum bonding apparatus side, and the plate 34 is moved by the rotation of the motor 33, thereby pressing the tip of the sensor pin 23.
  • the motor 33 may be provided on the rotary table 21 side, and the center pin 23 may be driven by the motor 33 provided on the rotary table 21 side.
  • the drive of the center pin 23 is not limited to the motor, but may be a structure using other power such as a cylinder or a manual.

Abstract

A device and a method for manufacturing a recording medium, wherein the opening part of a disk substrate (25) is inserted onto the large diameter part of a center pin (23) and the disk substrate (25) is supported by a loading table (22). Also, the opening part of a disk substrate (26) is inserted onto the tip small diameter part of the center pin (23), and the disk substrate (26) is supported by a step part at a boundary between the small diameter part and the large diameter part. After the disk substrate (25) and the disk substrate (26) are supported, a sealed space is formed by a chamber (27), the inside of the chamber (27) is depressurized, and the center pin (23) is vertically moved by a plate (34) to stick the disk substrate (25) on the disk substrate (26).

Description

明 細 書 記録媒体の製造装置および製造方法 技術分野  Description Recording medium manufacturing apparatus and manufacturing method
本発明は、 記録媒体の製造装置および製造方法に関し、 例えば、 異なる孔径 の開口部を有するディスク状の基板同士を貼り合わせて製造される記録媒体の 製造に適用して好適なものである。 背景技術  The present invention relates to an apparatus and a method for manufacturing a recording medium, and is suitably applied, for example, to the manufacture of a recording medium manufactured by laminating disk-shaped substrates having openings having different hole diameters. Background art
MD (Mini Disc) や DVD (Digital Versatile Disc) などの所謂光ディ スクは、 通常、 以下の工程を経て製造される。 まず、 ディスク基板の成形工程 において、 射出成形法でポリカーボネートなどの合成樹脂材料からディスク基 板を成形する。 次に、 成膜工程において、 ディスク基板の成形工程で成形され たディスク基板の主面上に、 スパッタリング法により記録層となる反射膜を成 膜する。 例えば、 CD (Compact Disc) や MDは、 この形成された記録層を覆 うようにディスク基板の主面上に保護層を設けることで作製され、 単層 D VD は、 この記録層が形成された基板にダミー基板を貼り合わせることで作製され 、 2層 DVDは、 記録層がそれぞれ形成された 2枚のディスク基板同士を中間 層となる接着剤層により貼り合わせることで作製される。  So-called optical discs such as MD (Mini Disc) and DVD (Digital Versatile Disc) are usually manufactured through the following steps. First, in a disk substrate molding process, a disk substrate is molded from a synthetic resin material such as polycarbonate by an injection molding method. Next, in a film forming step, a reflective film serving as a recording layer is formed by a sputtering method on the main surface of the disk substrate formed in the disk substrate forming step. For example, CDs (Compact Discs) and MDs are manufactured by providing a protective layer on the main surface of a disk substrate so as to cover the formed recording layer. The two-layer DVD is manufactured by bonding a dummy substrate to the substrate thus formed, and the two-layer DVD is formed by bonding two disk substrates each having a recording layer formed thereon with an adhesive layer serving as an intermediate layer.
日本国特開 2002- 197735号公報には、 2枚のディスク基板の一方 の表面に、 紫外線硬化型の接着剤を均一に塗布し、 2枚のディスク基板を互い に貼り合わせ、 紫外線を照射して接着剤を硬化させることで貼り合わせデイス クを形成する光ディスク製造装置が記載されている。  Japanese Patent Laid-Open Publication No. 2002-197735 discloses that an ultraviolet-curing adhesive is uniformly applied to one surface of two disk substrates, the two disk substrates are bonded to each other, and ultraviolet light is irradiated. There is described an optical disk manufacturing apparatus that forms a bonding disk by curing an adhesive with the adhesive.
日本国特開 2002- 197735号公報に記載の光ディスク製造装置では 、 必要面積を小さく抑えることができる省スペースな貼り合わせディスクの製 造ラインを構成することができる。 In the optical disk manufacturing apparatus described in Japanese Patent Application Laid-Open No. 2002-197735, a space-saving bonded disk that can reduce the required area can be manufactured. A production line can be configured.
しかしながら、 上述したような、 ディスク基板同士を貼り合わせて記録媒体 を製造する従来の製造装置および製造方法には、 以下のような問題点があった 貼り合わせるディスク基板間の接着剤層に気泡が残ってしまうという問題点 があった。 そこで、 ディスク基板間を貼り合わせる空間を減圧して、 ディスク 基板同士の貼り合わせを行うことが好ましい。 ところが、 従来の記録媒体の製 造装置および製造方法は、 貼り合わせの際に、 上側のディスク基板を真空吸着 ヘッドで保持し、 真空吸着ヘッドごと下降して、 下側のディスク基板の位置決 めをしているセンターピンを押し下げ、 下側のディスク基板と貼り合わせてい るため、 ディスク基板間を真空状態等に減圧して貼り合わせを行うことが困難 であった。  However, the conventional manufacturing apparatus and manufacturing method for manufacturing a recording medium by bonding disk substrates as described above have the following problems. Bubbles are formed in the adhesive layer between the bonded disk substrates. There was a problem that it would remain. Therefore, it is preferable to reduce the pressure in the space where the disk substrates are bonded, and to bond the disk substrates together. However, in the conventional recording medium manufacturing apparatus and manufacturing method, during bonding, the upper disk substrate is held by a vacuum suction head, and the entire vacuum suction head is lowered to determine the position of the lower disk substrate. Since the center pin is pressed down and bonded to the lower disk substrate, it is difficult to perform bonding by reducing the pressure between the disk substrates to a vacuum state or the like.
また、 貼り合わせる空間を減圧してディスク基板同士の貼り合わせを行つた としても、 減圧のための排気の開始後に直ぐ (例えば 3秒以内) にディスク基 板の貼り合わせ作業を行うと、 ディスク基板間の接着剤層に許容サイズおよび /または許容個数を越える気泡が残る確率が高かった。  Even if the space to be bonded is decompressed and the disk substrates are bonded together, if the disk substrates are bonded immediately (for example, within 3 seconds) after the evacuation for decompression starts, the disk substrate The probability that bubbles exceeding the allowable size and / or the allowable number remained in the adhesive layer between them was high.
また、 従来の記録媒体の製造装置および製造方法では、 貼り合わせ時に、 上 側のディスク基板とセンタ一ピンとの嵌合を行うため、 上側のディスク基板の 精密な位置決めを行う必要があった。 また、 嵌合時にはできるだけ低速での下 降を必要とするため、 貼り合わせ動作のサイクル時間を短縮することが困難で あった。  Further, in the conventional recording medium manufacturing apparatus and manufacturing method, it is necessary to perform precise positioning of the upper disk substrate because the upper disk substrate and the center pin are fitted at the time of bonding. In addition, it is difficult to reduce the cycle time of the bonding operation because the fitting needs to descend and descend at the lowest possible speed.
また、 ディスク基板の供給装置のハンドリングミスなどにより、 貼り合わせ 動作を行うことの出来ないディスク基板があった場合に、 そのまま稼動を継続 すると、 ディスク基板のハンドリング部に未硬化接着剤が付着し、 後にハンド リングされるディスク基板が接着剤で汚れて不良品になってしまうことがあつ た。 稼動を停止すると、 人がディスク基板を手作業で取り除くまで稼動できず 、 稼働率が悪化してしまう。 未硬化の接着剤が塗布されたディスク基板を扱う には専用の手袋及び保護めがねを着用しなければならず、 取り扱いが困難であ る。 未硬化の接着剤付きディスク基板は廃棄することになるが、 他の廃棄ディ スク基板とは別に、 未硬化接着剤が漏れない容器 (袋) を準備しなければなら ない。 Also, if there is a disk substrate that cannot be bonded due to a handling error of the disk substrate supply device, if the operation is continued as it is, the uncured adhesive will adhere to the handling part of the disk substrate, The disc substrate to be handled later could be contaminated with adhesive and become defective. When the operation is stopped, the operation cannot be performed until a person manually removes the disk substrate. However, the operating rate will deteriorate. Special gloves and protective glasses must be worn to handle disk substrates coated with uncured adhesive, making handling difficult. The disc substrate with uncured adhesive will be discarded, but a container (bag) that does not leak the uncured adhesive must be prepared separately from other disc substrates.
したがって、 本発明の目的は、 貼り合わされる基板間の接着剤に気泡が発生 することを防止でき、 サイクルタイムが短縮され、 扱いが容易な記録媒体の製 造装置および製造方法を提供することにある。 発明の開示  Accordingly, an object of the present invention is to provide an apparatus and a method for manufacturing a recording medium which can prevent bubbles from being generated in an adhesive between substrates to be bonded, shorten a cycle time, and are easy to handle. is there. Disclosure of the invention
上述した目的を達成するために、 本発明による記録媒体の製造装置は、 主面 の中央部に開口部を有する第 1の基板と、 主面の中央部に第 1の基板の開口部 よりも小さい開口部を有する第 2の基板とを、 第 1の基板および Zまたは第 2 の基板の一主面上に塗布された接着剤を介在させて貼り合わせる記録媒体の製 造装置であって、  In order to achieve the above-described object, a recording medium manufacturing apparatus according to the present invention includes a first substrate having an opening in the center of the main surface, and a first substrate having an opening in the center of the main surface. An apparatus for manufacturing a recording medium, comprising: bonding a second substrate having a small opening to a first substrate and Z or an adhesive applied to one main surface of the second substrate with an adhesive therebetween;
先端部の小径部と大径部との境界位置に段差部が形成され、 載置テーブルの 開口部を貫通して垂直方向に変位可能とされたセンターピンと、  A center pin formed with a step at the boundary between the small diameter portion and the large diameter portion at the tip end, the center pin being capable of being vertically displaced through the opening of the mounting table;
貼り合わせが行われる密閉空間を減圧する減圧部とを備え、  A decompression unit that decompresses the sealed space where the bonding is performed,
センタ一ピンの大径部が開口部に挿入され、 載置テーブルによって支持され る第 1の基板と、 センターピンの先端部が開口部に挿入され、 段差部によって 支持される第 2の基板とを、 セン夕一ピンを垂直方向に変位させて貼り合わせ る  The first substrate supported by the mounting table with the large-diameter portion of the center pin inserted into the opening, and the second substrate supported by the stepped portion with the tip of the center pin inserted into the opening. With the center pin displaced vertically.
ことを特徴とする記録媒体の製造装置である。 An apparatus for manufacturing a recording medium, comprising:
本発明による記録媒体の製造方法は、 主面の中央部に開口部を有する第 1の 基板と、 主面の中央部に第 1の基板の開口部よりも小さい開口部を有する第 2 の基板とを、 第 1の基板および Zまたは第 2の基板の一主面上に塗布された接 着剤を介在させて貼り合わせる記録媒体の製造方法であって、 The method of manufacturing a recording medium according to the present invention comprises: a first substrate having an opening at the center of the main surface; and a second substrate having an opening at the center of the main surface smaller than the opening of the first substrate. And the contact applied on one major surface of the first substrate and Z or the second substrate. A method for manufacturing a recording medium to be bonded with a bonding agent interposed therebetween,
第 1の基板の開口部をセンターピンの大径部に挿入し、 載置テーブルによつ て第 1の基板を支持する工程と、  Inserting the opening of the first substrate into the large-diameter portion of the center pin, and supporting the first substrate with a mounting table;
第 2の基板の開口部をセンターピンの先端部の小径部に挿入し、 小径部と大 径部との境界位置の段差部によって第 2の基板を支持する工程と、  Inserting the opening of the second substrate into the small-diameter portion at the tip of the center pin, and supporting the second substrate by a step at the boundary between the small-diameter portion and the large-diameter portion;
貼り合わせが行われる密閉空間を減圧する工程と、  A step of decompressing the sealed space where the bonding is performed,
押圧部によってセンタ一ピンを垂直方向に変位させ、 さらに押圧部によって 第 2の基板を押圧することによって第 1の基板と第 2の基板とを貼り合わせる 工程と  A step of vertically displacing the center pin by the pressing portion and further pressing the second substrate by the pressing portion to bond the first substrate and the second substrate together;
を有することを特徴とする記録媒体の製造方法である。 A method for manufacturing a recording medium, comprising:
本発明では、 第 1の基板の開口部をセンターピンの大径部に挿入し、 載置テ —ブルによって第 1の基板を支持し、 第 2の基板の開口部をセンターピンの先 端部の小径部に挿入し、 小径部と大径部との境界位置の段差部によって第 2の 基板を支持し、 センターピンを垂直方向に変位させて第 1の基板と第 2の基板 とを貼り合わせることによって、 貼り合わせの際の第 1の基板と第 2の基板の 位置決めを容易且つ正確に行うことができる。 また、 第 1の基板および第 2の 基板を真空吸着によって保持していない為、 貼り合わせが行われる密閉空間を 減圧して第 1の基板と第 2の基板とを貼り合わせることができ、 第 1の基板と 第 2の基板とに介在する接着剤に気泡が残ることを防止できる。 さらに、 貼り 合わせ前に、 第 1の基板と第 2の基板とを近接させることができる為、 サイク ルタイムを短縮できる。  According to the present invention, the opening of the first substrate is inserted into the large-diameter portion of the center pin, the first substrate is supported by the mounting table, and the opening of the second substrate is connected to the end of the center pin. The second board is supported by the step at the boundary between the small-diameter section and the large-diameter section, and the center pin is displaced vertically to attach the first and second boards. The alignment makes it possible to easily and accurately position the first substrate and the second substrate during bonding. In addition, since the first substrate and the second substrate are not held by vacuum suction, the first substrate and the second substrate can be bonded to each other by reducing the pressure of the sealed space where bonding is performed. Air bubbles can be prevented from remaining in the adhesive interposed between the first substrate and the second substrate. Further, the first substrate and the second substrate can be brought close to each other before bonding, so that the cycle time can be reduced.
したがって、 本発明によれば、 貼り合わされるディスク基板間の接着剤に気 泡が発生することを防止でき、 サイクルタイムが短縮され、 扱いが容易な記録 媒体の製造装置および製造方法を提供することができる。 図面の簡単な説明 第 1図は、 本発明の一実施形態による光ディスクの製造装置の構成の一例を 示す略線図である。 第 2図は、 光ディスクの製造装置における処理の流れを説 明する為のフローチャートである。 第 3図は、 真空貼り合わせ装置付近の断面 構造の一例を示す略線図である。 第 4図は、 センターピンの断面構造の一例を 示す略線図である。 第 5図は、 貼り合わせ後のディスク基板の断面構造の一例 を示す略線図である。 第 6図は、 貼り合わせ処理前の状態を示す略線図である 。 第 7図は、 チャンバを閉じた状態を示す略線図である。 第 8図は、 チャンバ 内を減圧している状態を示す略線図である。 第 9図は、 プレートを突出する状 態を示す略線図である。 第 1 0図は、 プレートを突出した状態を示す略線図で ある。 第 1 1図は、 通気弁を開放した状態を示す略線図である。 第 1 2図は、 チャンバを開けてプレートの位置を戻した状態を示す略線図である。 第 1 3図 は、 貼り合わせ動作時の処理の流れを説明する為のフローチャートである。 第 1 4図は、 本発明を適用可能な光ディスクの製造装置の構成の一例を示す略線 図である。 発明を実施するための最良の形態 Therefore, according to the present invention, it is possible to provide a manufacturing apparatus and a manufacturing method of a recording medium which can prevent bubbles from being generated in an adhesive between disk substrates to be bonded, shorten a cycle time, and are easy to handle. Can be. Brief Description of Drawings FIG. 1 is a schematic diagram illustrating an example of a configuration of an optical disk manufacturing apparatus according to an embodiment of the present invention. FIG. 2 is a flowchart for explaining the flow of processing in the optical disk manufacturing apparatus. FIG. 3 is a schematic diagram illustrating an example of a cross-sectional structure near a vacuum bonding apparatus. FIG. 4 is a schematic diagram showing an example of a cross-sectional structure of a center pin. FIG. 5 is a schematic diagram showing an example of a cross-sectional structure of a disc substrate after bonding. FIG. 6 is a schematic diagram showing a state before a bonding process. FIG. 7 is a schematic diagram showing a state where the chamber is closed. FIG. 8 is a schematic diagram showing a state where the pressure in the chamber is reduced. FIG. 9 is a schematic diagram showing a state where the plate is projected. FIG. 10 is a schematic diagram showing a state where the plate is protruded. FIG. 11 is a schematic diagram showing a state where the ventilation valve is opened. FIG. 12 is a schematic diagram showing a state where the chamber is opened and the position of the plate is returned. FIG. 13 is a flowchart for explaining the flow of processing during the bonding operation. FIG. 14 is a schematic diagram showing an example of a configuration of an optical disk manufacturing apparatus to which the present invention can be applied. BEST MODE FOR CARRYING OUT THE INVENTION
以下、 本発明の一実施形態による記録媒体の製造装置および製造方法につい て、 図面を参照して説明する。 第 1図は、 本発明の一実施形態による光デイス クの製造装置の一例の概略構成を示す。 また、 第 2図は、 光ディスクの製造装 置における処理の流れを説明するためのフローチャートである。 以下、 これら 第 1図および第 2図を参照して、 本発明の一実施形態による記録媒体の製造装 置および製造方法について説明する。  Hereinafter, an apparatus and a method for manufacturing a recording medium according to an embodiment of the present invention will be described with reference to the drawings. FIG. 1 shows a schematic configuration of an example of an optical disk manufacturing apparatus according to an embodiment of the present invention. FIG. 2 is a flowchart for explaining the flow of processing in the optical disk manufacturing apparatus. Hereinafter, an apparatus and method for manufacturing a recording medium according to an embodiment of the present invention will be described with reference to FIGS. 1 and 2.
成形装置 1は、 2枚の基板を成形するキヤビティを有している。 キヤビティ は、 例えば固定金型と可動金型からなる開閉可能な金型で構成されている。 成 形装置 1は、 射出成形法により、 ポリカーボネートなどの合成樹脂材料からな る、 外径が同一で内径の異なる平面円環状の 2枚の基板 (サブス卜レート 0と サブストレート 1 ) を成形する。 なお、 これら 2枚の基板を成形する各々のキ ャビティの一主面には、 異なった情報のピットを形成するスタンパが取り付け られており、 これら 2枚の平面円環状の基板 (以下、 ディスク基板と称する) の一主面上には、 信号記録面が設けられるように、 それぞれスタンパによって 転写された微細な凹みによるピッ卜が形成される。 The forming apparatus 1 has a cavity for forming two substrates. The cavity is composed of a mold that can be opened and closed, for example, a fixed mold and a movable mold. The molding apparatus 1 is composed of two flat annular substrates having the same outer diameter and different inner diameters (substrates 0 and 2) made of a synthetic resin material such as polycarbonate by an injection molding method. Form the substrate 1). A stamper for forming pits of different information is attached to one principal surface of each of the cavities for molding these two substrates, and these two planar annular substrates (hereinafter referred to as disk substrates). Are formed on one main surface by a fine dent transferred by a stamper so that a signal recording surface is provided.
基板成形工程は、 成形装置 1によって、 これら 2枚のディスク基板を成形す る (ステップ S 1 ) 。 成形装置 1で成形されたディスク基板は、 取り出し機 2 によって、 冷却装置 3に搬送される。  In the substrate forming step, these two disk substrates are formed by the forming apparatus 1 (step S 1). The disk substrate formed by the forming device 1 is transferred to the cooling device 3 by the take-out device 2.
取り出し機 2は、 ディスク基板を保持可能な取り出し用のアームを有してい る。 取り出し機 2は、 このアームを、 例えば成形装置 1のキヤビティを構成す る金型の開閉と同期するように制御し、 成形されたサブストレート 0とサブス トレ一ト 1の 2枚のディスク基板 (以下、 単に 2枚のディスク基板と称する) を、 キヤビティから取り出し、 冷却装置 3に搬送する。 なお、 2枚のディスク 基板をキヤピティから同時に取り出す機構とすることで、 効率化を図ることが できる。  The take-out machine 2 has a take-out arm capable of holding a disk substrate. The unloader 2 controls this arm so as to synchronize with, for example, the opening and closing of the mold that constitutes the cavity of the molding device 1, and forms two disk substrates (a molded substrate 0 and a substrate 1). Hereinafter, simply referred to as two disk substrates) from the cavity and transported to the cooling device 3. It should be noted that efficiency can be improved by adopting a mechanism for simultaneously removing two disk substrates from the capity.
冷却装置 3は、 取り出し機 2から 2枚のディスク基板を受け取る機構を有し ている。 なお、 2枚のディスク基板を同時に受け取る機構とすることで、 効率 化を図ることができる。 冷却装置 3は、 さらに、 ディスク基板を冷却する機構 と、 ディスク基板を所定の枚数 (例えば 3〜2 0枚) だけ蓄える機構と、 次ェ 程 (成膜工程) の処理を行う成膜装置で、 反射膜をディスク基板に付加する機 構に適合する方向にディスク面の向きを合わせる機構と、 ディスク基板を投入 された順番に次工程 (成膜工程) に時間調整して渡す機構とを有している。 例 えば、 投入されたディスク基板を次工程 (成膜工程) に渡す時間は、 最も早い 場合で、 前工程 (基板成形工程) での基板成形の 1サイクル分の時間とし、 最 も遅い場合で、 基板成形のサイクル時間とストレージ可能数とを乗算した時間 とする。 冷却工程は、 基板成形工程で成形されたディスク基板を、 冷却装置 3によつ て冷却する (ステップ S 2 ) 。 冷却装置 3によって冷却されたディスク基板は 、 第 1の搬送用アーム 4によって、 成膜装置に搬送される。 サブストレート 0 は、 第 1の成膜装置 5に搬送され、 サブストレート 1は、 第 2の成膜装置 6に 搬送される。 The cooling device 3 has a mechanism for receiving two disk substrates from the unloader 2. The efficiency can be improved by adopting a mechanism that receives two disk substrates at the same time. The cooling device 3 further includes a mechanism for cooling the disk substrate, a mechanism for storing a predetermined number of disk substrates (for example, 3 to 20), and a film forming apparatus for performing the next step (film forming step). There is a mechanism that adjusts the direction of the disk surface in a direction that matches the mechanism for adding the reflective film to the disk substrate, and a mechanism that adjusts the time and passes the disk substrate to the next process (film formation process) in the order in which it was loaded. are doing. For example, the time to pass the loaded disk substrate to the next process (film formation process) is the earliest time, the time for one cycle of substrate molding in the previous process (substrate molding process), and the latest time. The time is obtained by multiplying the cycle time of substrate molding by the number of storages that can be performed. In the cooling step, the disk substrate formed in the substrate forming step is cooled by the cooling device 3 (Step S2). The disk substrate cooled by the cooling device 3 is transferred to the film forming device by the first transfer arm 4. The substrate 0 is transported to the first film forming apparatus 5, and the substrate 1 is transported to the second film forming apparatus 6.
第 1の搬送用アーム 4は、 冷却装置 3から、 2枚のディスク基板を取り出す 機構を有している。 なお、 2枚のディスク基板を同時に取り出す機構とするこ とで、 効率化を図ることができる。 また、 第 1の搬送用アーム 4は、 取り出し た 2枚のディスク基板を、 次工程 (成膜工程) の処理を行う成膜装置に搬送し 、 冷却装置 3からのディスク基板の取り出し位置に戻る機構を有している。 な お、 2枚のディスク基板を、 それぞれ同時に搬送する機構とすることで、 効率 化を図ることができる。  The first transfer arm 4 has a mechanism for taking out two disk substrates from the cooling device 3. The efficiency can be improved by adopting a mechanism for simultaneously taking out two disk substrates. Further, the first transfer arm 4 transfers the two disk substrates taken out to the film forming apparatus for performing the next process (film forming step), and returns to the position where the disk substrates are taken out from the cooling device 3. Has a mechanism. In addition, efficiency can be improved by using a mechanism that simultaneously transports two disk substrates, respectively.
また、 第 1の搬送用アーム 4は、 サンプリング装置 1 0に、 2枚のディスク 基板を供給する機構を有している。 なお、 2枚のディスク基板を、 それぞれ同 時に供給する機構とすることで、 効率化を図ることができる。 成膜前のディス ク基板のサンプリングを行う場合には、 この機構が用いられる。  Further, the first transfer arm 4 has a mechanism for supplying two disk substrates to the sampling device 10. In addition, efficiency can be improved by using a mechanism for simultaneously supplying two disk substrates. This mechanism is used when sampling a disk substrate before film formation.
さらに、 第 1の搬送用アーム 4は、 成膜装置から 2枚のディスク基板を取り 出し、 取り出したディスク基板を次工程 (接着剤塗布工程) の処理を行う接着 剤塗布装置に搬送し、 成膜装置からのディスク基板の取り出し位置に戻る機構 を有している。 第 1の成膜装置 5から取り出したサブストレート 0は、 第 1の 接着剤塗布装置 7に搬送され、 第 2の成膜装置 6から取り出したサブストレー ト 1は、 第 2の接着剤塗布装置 8に搬送される。 なお、 2枚のディスク基板を 、 成膜装置からそれぞれ同時に取り出す機構とすることで、 効率化を図ること ができる。 また、 2枚のディスク基板を、 接着剤塗布装置へそれぞれ同時に搬 送する機構とすることで、 効率化を図ることができる。  Further, the first transfer arm 4 takes out the two disk substrates from the film forming apparatus, and transports the taken-out disk substrates to an adhesive applying apparatus for performing the next step (adhesive applying step). It has a mechanism to return to the position where the disk substrate is taken out of the film device. The substrate 0 taken out of the first film forming apparatus 5 is transported to the first adhesive applying apparatus 7, and the substrate 1 taken out of the second film forming apparatus 6 is supplied to the second adhesive applying apparatus 8. Transported to Note that efficiency can be improved by adopting a mechanism in which two disk substrates are simultaneously taken out from the film forming apparatus. In addition, efficiency can be improved by adopting a mechanism for simultaneously transporting two disk substrates to the adhesive application device.
第 1の搬送用アーム 4は、 冷却装置 3からと、 成膜装置からとの 2つのディ スク基板の取り出し動作を同時に行う機構、 成膜装置へと、 接着剤塗布装置へ との 2つのディスク基板の搬送動作を同時に行う機構、 ディスク基板の搬送動 作後に、 再び取り出し位置に戻る 2つの戻り動作が同時に行われる機構を有し ている。 ここでは、 効率化を図る為に、 第 1の搬送用アーム 4は、 これら 2つ の取り出し、 搬送および戻り動作を同時に行う機構としているが、 必ずしも同 時でなくても良いことは言うまでもない。 The first transfer arm 4 has two discs, one from the cooling device 3 and the other from the film forming device. A mechanism that simultaneously takes out the disk substrate, a mechanism that simultaneously transports two disk substrates to the film forming device and the adhesive application device, and a two that returns to the removal position again after the disk substrate transport operation It has a mechanism to perform the return operation simultaneously. Here, in order to improve the efficiency, the first transfer arm 4 has a mechanism for simultaneously performing the take-out, transfer, and return operations of these two, but it goes without saying that the first transfer arm 4 does not necessarily need to be at the same time.
第 1の成膜装置 5は、 サブストレート 0の信号 (ピット) 転写面側にシリコ ン、 アルミニウム、 銀等の反射膜をスパッタリング法にて付加する機能を有し ている。 また、 第 1の成膜装置 5は、 第 1の搬送用アーム 4から成膜前の透明 なディスク基板を受け取る機能、 第 1の搬送用アーム 4に成膜済みのディスク 基板を渡す機能、 スパッタリングを行う空間をスパッ夕条件に適した圧力に調 整する機能、 スパッタリングを行う空間にディスク基板を移動させるための機 能を有している。  The first film forming apparatus 5 has a function of adding a reflective film of silicon, aluminum, silver, or the like to the signal (pit) transfer surface side of the substrate 0 by a sputtering method. In addition, the first film forming apparatus 5 has a function of receiving a transparent disk substrate before film formation from the first transfer arm 4, a function of transferring a film-formed disk substrate to the first transfer arm 4, and a sputtering method. It has the function of adjusting the pressure in the space where sputtering is performed to a pressure suitable for the sputtering conditions, and the function of moving the disk substrate to the space where sputtering is performed.
第 2の成膜装置 6は、 サブストレート 1の信号 (ピット) 転写面側にシリコ ン、 アルミニウム、 銀等の反射膜をスパッタリング法にて付加する機能を有し ている。 また、 第 2の成膜装置 6は、 第 1の搬送用アーム 4から成膜前の透明 なディスク基板を受け取る機能、 第 1の搬送用アーム 4に成膜済みのディスク 基板を渡す機能、 スパッタリングを行う空間をスパッ夕条件に適した圧力に調 整する機能、 スパッタリングを行う空間にディスク基板を移動させるための機 能を有している。  The second film forming apparatus 6 has a function of adding a reflective film of silicon, aluminum, silver, or the like to the signal (pit) transfer surface side of the substrate 1 by a sputtering method. In addition, the second film forming apparatus 6 has a function of receiving a transparent disk substrate before film formation from the first transfer arm 4, a function of passing a formed disk substrate to the first transfer arm 4, and a function of sputtering. It has the function of adjusting the pressure in the space where sputtering is performed to a pressure suitable for the sputtering conditions, and the function of moving the disk substrate to the space where sputtering is performed.
成膜工程は、 冷却装置 3によって冷却された 2枚のディスク基板のそれぞれ に、 これら成膜装置によって成膜処理を施す (ステップ S 3 ) 。 サブストレー ト 0は、 第 1の成膜装置 5によって成膜処理され、 サブストレート 1は、 第 2 の成膜装置 6によって成膜処理される。 上述したように、 第 1の搬送用アーム 4によって、 成膜後のサブストレート 0は、 第 1の接着剤塗布装置 7に供給さ れ、 サブストレート 1は、 第 2の接着剤塗布装置 8にそれぞれ供給される。 第 1の接着剤塗布装置 7は、 成膜済みのサブス卜レート 0の中央近傍 (例え ば、 センターホール径が Φ 1 5 mm程度であれば、 φ 2 0 πΗη〜φ 2 6 πιιη付 近) をバキュームにて吸着保持する機構を備えたテーブルを有している。 第 1 の接着剤塗布装置 7は、 スピンコート法によって、 サブストレート 0の貼り合 わせ面となる主面上に接着剤を塗布するものであり、 サブストレート 0を保持 するテーブルを、 例えば、 3 0 r ρ π!〜 8 0 0 0 r p mの範囲の回転数で回転 させる機構、 サブストレ一ト 0の中央近傍に位置再現性良く接着剤を塗布する 機構、 回転により振り切られた接着剤を接着剤供給タンクに戻す機構を有して いる。 なお、 サブストレート 1側のみに接着剤を塗布する場合には、 第 1の接 着剤塗布装置 7のテーブルは、 サブストレート 0の仮置きテ一ブルとして使用 される。 In the film forming process, a film forming process is performed on each of the two disk substrates cooled by the cooling device 3 using the film forming devices (Step S 3). The substrate 0 is subjected to a film forming process by a first film forming apparatus 5, and the substrate 1 is subjected to a film forming process by a second film forming apparatus 6. As described above, the substrate 0 after film formation is supplied to the first adhesive coating device 7 by the first transfer arm 4, and the substrate 1 is supplied to the second adhesive coating device 8 by the first transfer arm 4. Supplied respectively. The first adhesive application device 7 is located near the center of the substrate 0 on which the film has been formed (for example, if the center hole diameter is about Φ15 mm, it is around φ20πΗη to φ26ππιιη) Has a table provided with a mechanism for sucking and holding by vacuum. The first adhesive application device 7 applies an adhesive to a main surface to be a bonding surface of the substrate 0 by a spin coating method, and a table for holding the substrate 0 includes, for example, 3 0 r ρ π! A mechanism that rotates at a rotation speed in the range of 800 rpm, a mechanism that applies the adhesive with good position reproducibility near the center of the substrate 0, and a mechanism that returns the adhesive shaken off by rotation to the adhesive supply tank have. When the adhesive is applied only to the substrate 1 side, the table of the first adhesive application device 7 is used as a temporary table of the substrate 0.
第 2の接着剤塗布装置 8は、 成膜済みのサブストレート 1の中央近傍 (例え ば、 センタ一ホール径が </) 1 5 mm程度であれば、 φ 2 O mn!〜 φ 2 6 mm付 近) をバキュームにて吸着保持する機構を備えたテーブルを有している。 第 2 の接着剤塗布装置 8は、 スピンコート法によって、 サブストレート 0の貼り合 わせ面となる主面上に接着剤を塗布するものであり、 サブストレート 1を保持 するテーブルを、 例えば、 3 0 r p m〜8 0 0 0 r p mの範囲の回転数で回転 させる機構、 サブストレート 1の中央近傍に位置再現性良く接着剤を塗布する 機構、 回転により振り切られた接着剤を接着剤供給夕ンクに戻す機構を有して いる。 なお、 サブストレート 0側のみに接着剤を塗布する場合には、 第 2の接 着剤塗布装置 8のテーブルは、 サブストレート 1の仮置きテーブルとして使用 される。 第 1図に示す例では、 サブストレート 1側を仮置きテーブルとしてい る。  The second adhesive application device 8 is provided in the vicinity of the center of the substrate 1 on which the film has been formed (for example, the diameter of the hole per center is </). (Approximately φ26 mm) by vacuum. The second adhesive application device 8 applies an adhesive onto the main surface to be bonded to the substrate 0 by a spin coating method, and a table holding the substrate 1 is, for example, 3 A mechanism that rotates at a rotation speed in the range of 0 rpm to 800 rpm, a mechanism that applies adhesive with good position reproducibility near the center of the substrate 1, and an adhesive that is shaken off by rotation is supplied to the adhesive It has a return mechanism. When the adhesive is applied only to the substrate 0 side, the table of the second adhesive applying device 8 is used as a temporary placing table of the substrate 1. In the example shown in Fig. 1, the substrate 1 side is used as a temporary storage table.
接着剤塗布工程は、 成膜装置によって成膜が施された 2枚のディスク基板に 、 接着剤塗布装置によって接着剤を塗布する (ステップ S 4 ) 。 第 1図に示す 例では、 サブストレート 0は、 貼り合わせ面となる主面上に第 1の接着剤塗布 装置 7によって接着剤を塗布され、 サブストレート 1は、 仮置きテーブルに載 置される。 接着剤が塗布されたサブストレート 0は、 第 2の搬送用アーム 9に よって、 反転装置 1 1に供給され、 サブストレート 1は、 第 2の搬送用ァ一ム 9によって、 貼り合わせ用のテーブル装置 1 2のディスク基板受け取り部にそ れぞれ供給される。 なお、 サンプリング用のディスク基板は、 第 2の搬送用ァ ーム 9によって、 サンプリング装置 1 0に供給される。 In the adhesive application step, the adhesive is applied to the two disk substrates on which the film formation has been performed by the film formation apparatus using the adhesive application apparatus (step S4). In the example shown in FIG. 1, the substrate 0 is coated with the first adhesive on the main surface to be the bonding surface. The adhesive is applied by the device 7, and the substrate 1 is placed on the temporary placing table. The substrate 0 to which the adhesive has been applied is supplied to the reversing device 11 1 by the second transfer arm 9, and the substrate 1 is supplied to the bonding table by the second transfer arm 9. It is supplied to the disk substrate receiving section of the device 12 respectively. The sampling disk substrate is supplied to the sampling device 10 by the second transport arm 9.
第 2の搬送用アーム 9は、 次工程 (ディスク基板貼り合わせ工程) の処理を 行うため、 接着剤塗布装置から 2枚のディスク基板をそれぞれ取り出し、 取り 出したディスク基板を反転装置 1 1と、 テーブル装置 1 2のディスク基板受け 取り部のテーブルとに供給する機構を有している。 サブストレート 0は、 反転 装置 1 1に供給される。 サブストレート 1は、 テーブル装置 1 2のディスク基 板受け取り部に供給され、 センターピンに嵌挿される。 なお、 2枚のディスク 基板を、 接着剤塗布装置からそれぞれ同時に取り出す機構とすることで、 効率 化を図ることができる。 また、 2枚のディスク基板を、 反転装置 1 1とテ一ブ ル装置 1 2とに、 それぞれ同時に供給する機構とすることで、 効率化を図るこ とができる。  The second transfer arm 9 takes out the two disk substrates from the adhesive application device to perform the next process (disk substrate bonding process), and removes the removed disk substrates into a reversing device 11, It has a mechanism for supplying to the table of the disk substrate receiving section of the table device 12. Substrate 0 is supplied to reversing device 11. The substrate 1 is supplied to a disk substrate receiving portion of the table device 12 and is inserted into a center pin. The efficiency can be improved by adopting a mechanism for simultaneously taking out two disk substrates from the adhesive application device. Further, efficiency can be improved by using a mechanism for simultaneously supplying two disk substrates to the reversing device 11 and the table device 12 respectively.
また、 第 2の搬送用アーム 9は、 反転装置 1 1とディスク仮置きテーブルと の間にあるサンプリング装置 1 0に、 2枚のディスク基板を供給する機構を有 している。 なお、 2枚のディスク基板を、 それぞれ同時に供給する機構とする ことで、 効率化を図ることができる。 成膜後のディスク基板のサンプリングを 行う場合には、 この機構が用いられる。  Further, the second transfer arm 9 has a mechanism for supplying two disk substrates to the sampling device 10 located between the reversing device 11 and the disk temporary placing table. The efficiency can be improved by providing a mechanism for simultaneously supplying two disk substrates. This mechanism is used when sampling the disk substrate after film formation.
さらに、 第 2の搬送用アーム 9は、 接着剤塗布装置からのディスク基板の取 り出し位置に戻る機構を有している。 第 2の搬送用アーム 9は、 第 1の搬送用 アーム 4と同期するよう制御されている。 すなわち、 ディスク基板の取り出し 動作は、 第 1の搬送用アーム 4の取り出し動作と同時に行われ、 ディスク基板 の供給動作は、 第 1の搬送用アーム 4の供給動作と同時に行われる。 また、 デ イスク基板の取り出し位置に戻る動作は、 第 1の搬送用アーム 4の戻り動作と 同時に行われる。 ここでは、 効率化を図る為に、 第 2の搬送用アーム 9を第 1 の搬送用アーム 4と同期するよう制御する機構としているが、 必ずしも同期さ せなくても良いことは言うまでもない。 Further, the second transfer arm 9 has a mechanism for returning to a position where the disk substrate is taken out from the adhesive application device. The second transfer arm 9 is controlled to synchronize with the first transfer arm 4. That is, the operation of taking out the disk substrate is performed simultaneously with the operation of taking out the first transfer arm 4, and the operation of supplying the disk substrate is performed simultaneously with the operation of supplying the first transfer arm 4. Also, The operation of returning to the take-out position of the disk substrate is performed simultaneously with the operation of returning the first transfer arm 4. Here, the second transfer arm 9 is controlled so as to be synchronized with the first transfer arm 4 in order to improve efficiency. However, it is needless to say that the second transfer arm 9 does not always need to be synchronized.
サンプリング装置 1 0は、 サンプリングの為のディスク基板を取得するため の装置であり、 成膜前のサブストレート 0およびサブストレート 1を、 第 1の 搬送用アーム 4から受け取る機能、 成膜後のサブストレート 0およびサブスト レート 1を、 第 2の搬送用アーム 9から受け取る機能、 これら機能により受け 取ったディスク基板を安全に手で取り出すことを可能とする機能を有している 。  The sampling device 10 is a device for acquiring a disk substrate for sampling, and has a function of receiving the substrate 0 and the substrate 1 before the film formation from the first transfer arm 4 and a substrate after the film formation. It has a function of receiving the straight 0 and the substrate 1 from the second transfer arm 9, and a function of enabling the disk substrate received by these functions to be safely taken out by hand.
反転装置 1 1は、 サブストレート 0を第 2の搬送用アーム 9から受け取る機 構、 上向きであるサブストレート 0の接着剤塗布面を下向きにする機構、 サブ ストレート 0を、 テーブル装置 1 2のディスク受け取り部に供給し、 載置テ一 ブルのセン夕一ピンに嵌揷する機構とを有している。 反転装置 1 1と第 2の搬 送用アーム 9によって、 サブストレ一ト 0とサブストレート 1とが接着剤を介 在する向きでセンターピンに嵌挿される。  The reversing device 11 1 is a mechanism for receiving the substrate 0 from the second transfer arm 9, a mechanism for turning the adhesive applied surface of the substrate 0 facing upward, and a substrate 0 for the disk of the table device 12. And a mechanism for supplying to the receiving portion and fitting to the center pin of the mounting table. The substrate 0 and the substrate 1 are fitted to the center pin by the reversing device 11 and the second transport arm 9 in a direction in which the adhesive is interposed.
テーブル装置 1 2は、 円盤状の回転テーブルを有している。 この回転テープ ル上には、 サブストレート 1を載せる載置テーブルが設けられている。 の載 置テーブルの中央部には、 センターピンが設けられている。 第 1図に示す例で は、 この載置テーブルとセンターピンとの組が回転テーブル上に 4セット設け られている。 テーブル装置 1 2は、 回転テーブルを回転させ、 ディスク基板が 載置される載置テーブルを、 ディスク受け取り部、 真空貼り合わせ装置 1 3、 接着剤硬化装置 1 4、 ディスク取り出し部のそれぞれに移動する機能を有して いる。 載置テーブルとセンタ一ピンとの組は、 テーブル装置 1 2の構造から、 効率化を考慮して、 4セットとすることが好ましいが、 3セット以下や 5セッ ト以上とすることも可能である。 真空貼り合わせ装置 1 3は、 センターピンに嵌挿されたサブストレート 0と サブストレート 1とを貼り合わせる。 上述した取り出し機 2の取り出し用ァー ム、 第 1の搬送用アーム 4、 第 2の搬送用アーム 9、 反転装置 1 1などの搬送 装置のハンドリングミスなどによって、 第 2の搬送用アーム 9および反転装置 1 1により、 サブストレート 0またはサブストレート 1のどちらか一方だけし かセンターピンに嵌挿されない場合がある。 このような場合、 真空貼り合わせ 装置 1 3は、 サブストレート 0とサブストレート 1の貼り合わせを行わない。 なお、 真空貼り合わせ装置 1 3付近の詳細については、 後述する。 The table device 12 has a disk-shaped rotary table. A mounting table on which the substrate 1 is mounted is provided on the rotary table. A center pin is provided at the center of the mounting table. In the example shown in FIG. 1, four sets of the mounting table and the center pin are provided on the rotary table. The table device 12 rotates the rotary table and moves the mounting table on which the disk substrate is mounted to the disk receiving portion, the vacuum bonding device 13, the adhesive curing device 14, and the disk removing portion, respectively. Has functions. The set of the mounting table and the center pin is preferably set to 4 sets in consideration of the efficiency of the structure of the table device 12, but may be set to 3 sets or less or 5 sets or more. . The vacuum bonding device 13 bonds the substrate 0 and the substrate 1 inserted into the center pin. The second transfer arm 9 and the second transfer arm 9 due to a handling error of the transfer device such as the removal arm of the removal machine 2, the first transfer arm 4, the second transfer arm 9, and the reversing device 11 described above. Due to the reversing device 11, only one of the substrate 0 and the substrate 1 may be inserted into the center pin. In such a case, the vacuum bonding apparatus 13 does not bond the substrates 0 and 1 together. The details around the vacuum bonding apparatus 13 will be described later.
ディスク基板貼り合わせ工程は、 接着剤塗布装置によって接着剤が塗布され たディスク基板を、 真空貼り合わせ装置 1 3によって貼り合わせる (ステップ S 5 ) 。 真空貼り合わせ装置 1 3によって貼り合わされたディスク基板は、 回 転テーブルによって接着剤硬化装置 1 4に搬送される。  In the disk substrate bonding step, the disk substrate to which the adhesive has been applied by the adhesive coating device is bonded by the vacuum bonding device 13 (step S5). The disk substrate bonded by the vacuum bonding device 13 is transported to the adhesive curing device 14 by a rotating table.
接着剤硬化装置 1 4は、 ディスク基板間の接着剤を硬化する機構と、 デイス ク基板の外周部に窒素ガスを吹き付ける機構とを有している。 接着剤が紫外線 硬化型の接着剤である場合、 接着剤を硬化する機構は、 例えば、 紫外線光 (U V光) をサブストレート 0側の面に照射して、 ディスク基板間の接着剤を硬化 する機構、 UV光を照射必要エリアの外に出さない機構、 UV光を照射必要面 に均一に照射するための多面体又は円筒形の反射機構、 サブストレート 0を上 昇又は下降状態で UV照射を行う機構により構成する。  The adhesive curing device 14 has a mechanism for curing the adhesive between the disk substrates and a mechanism for blowing nitrogen gas to the outer periphery of the disk substrate. When the adhesive is an ultraviolet-curing adhesive, the mechanism for curing the adhesive is, for example, irradiating ultraviolet light (UV light) to the surface on the substrate 0 side to cure the adhesive between the disk substrates. Mechanism, mechanism to keep UV light out of the required area, polyhedral or cylindrical reflection mechanism to uniformly irradiate UV light to the required surface, UV irradiation with substrate 0 raised or lowered It is constituted by a mechanism.
接着剤硬化装置 1 4は、 上述した搬送装置のハンドリングミスなどによって 、 真空貼り合わせ装置 1 3から、 サブストレート 0またはサブストレート 1の どちらか一方だけしか搬送されない場合であっても、 接着剤が塗布されたディ スク基板が供給された場合には、 そのディスク基板の接着剤を硬化する。 接着剤硬化工程は、 真空貼り合わせ装置 1 3によって貼り合わされた 2枚の ディスク基板に介在する接着剤を、 接着剤硬化装置 1 4によって硬化する (ス テツプ S 6 ) 。 接着剤硬化装置 1 4によって接着剤が硬化されたディスク基板 は、 回転テーブルによってテーブル装置 1 2のディスク基板取り出し部に移動 され、 取り出し用アーム 1 5によってテーブル装置 1 2から取り出される。 取り出し用アーム 1 5は、 テーブル装置 1 2のディスク基板取り出し部から ディスク基板を取り出す機構と、 反転用アーム 1 6にディスク基板を供給する 機構と、 反転用アーム 1 6からディスク基板を受け取る機構と、 廃棄部 1 7に ディスク基板を移動させる機構と、 排出装置 1 8にディスク基板を渡す機構と を有している。 Due to the handling error of the above-described transfer device, the adhesive curing device 14 can be used even if only one of the substrate 0 and the substrate 1 is transferred from the vacuum bonding device 13. When the applied disk substrate is supplied, the adhesive of the disk substrate is cured. In the adhesive curing step, the adhesive interposed between the two disk substrates bonded by the vacuum bonding apparatus 13 is cured by the adhesive curing apparatus 14 (Step S6). Adhesive curing device Disk substrate with adhesive cured by 4 Is moved to the disk substrate take-out portion of the table device 12 by the rotary table, and taken out of the table device 12 by the take-out arm 15. The take-out arm 15 has a mechanism for taking out the disc board from the disc board take-out portion of the table device 12, a mechanism for supplying the disc board to the reversing arm 16, and a mechanism for receiving the disc board from the reversing arm 16. A mechanism for moving the disc substrate to the discarding unit 17 and a mechanism for passing the disc substrate to the ejection device 18 are provided.
反転用アーム 1 6は、 取り出し用アーム 1 5からディスク基板を受け取る機 構と、 保持しているディスク基板を反転する機構と、 取り出し用アーム 1 5に ディスク基板を渡す機構とを有している。  The reversing arm 16 has a mechanism for receiving the disk substrate from the removal arm 15, a mechanism for reversing the held disk substrate, and a mechanism for passing the disk substrate to the removal arm 15. .
廃棄部 1 7は、 ディスク基板を、 例えば 0〜1 0 0枚程積み重ねる機構と、 積み上げられたディスク基板を手動で引き出して取り出せる機構とを有してい る。  The discarding unit 17 has a mechanism for stacking, for example, about 0 to 100 disk substrates, and a mechanism for manually pulling out and removing the stacked disk substrates.
排出装置 1 8は、 次工程 (後処理工程) の処理を行う搬出装置 1 9にデイス ク基板を渡す機構を有している。  The discharge device 18 has a mechanism for transferring the disk substrate to an unloading device 19 for performing the processing of the next step (post-processing step).
取り出し用アーム 1 5によってテーブル装置 1 2から取り出されたディスク 基板は、 反転用アーム 1 6に渡され、 反転用アーム 1 6によって反転される。 上述した搬送装置のハンドリングミスなどによつて貼り合わせが行われずに接 着剤が硬化されたディスク基板など、 正常に処理が行われなかったディスク基 板は、 反転用アーム 1 6によって、 廃棄部 1 7に移動され、 廃棄用ディスク基 板として積み重ねられる。 正常に処理が行われたディスク基板は、 反転用ァー ム 1 6から取り出し用アーム 1 5に渡される。  The disk substrate taken out of the table device 12 by the take-out arm 15 is passed to the reversing arm 16 and is turned over by the reversing arm 16. Disk substrates that were not properly processed, such as disk substrates where the adhesive was hardened without being bonded due to the handling error of the transport device described above, are discarded by the reversing arm 16. Moved to 17 and stacked as disc disc substrate. The normally processed disk substrate is transferred from the reversing arm 16 to the take-out arm 15.
取り出し用アーム 1 5は、 反転用アーム 1 6から受け取ったディスク基板を 排出装置 1 8に供給し、 排出装置 1 8は、 取り出し用アーム 1 5から受け取つ たディスク基板を搬出装置 1 9に供給する。 搬出装置 1 9は、 ディスクの検査 等の後処理を行い (ステップ S 7 ) 、 製造が完了した光ディスクを搬出する ( ステップ S 8 ) 。 The ejection arm 15 supplies the disc substrate received from the reversing arm 16 to the ejection device 18, and the ejection device 18 supplies the disc substrate received from the ejection arm 15 to the ejection device 19. I do. The unloading device 19 performs post-processing such as disk inspection (step S7), and unloads the manufactured optical disk (step S7). Step S8).
ここで、 上述した真空貼り合わせ装置 1 3によるディスク基板の貼り合わせ について、 詳細に説明する。 第 3図は、 真空貼り合わせ装置付近の断面構造の 一例を示す。  Here, the bonding of the disk substrates by the above-described vacuum bonding apparatus 13 will be described in detail. FIG. 3 shows an example of a cross-sectional structure near the vacuum bonding apparatus.
テーブル装置 1 2は、 回転テーブル 2 1と、 載置テーブル 2 2と、 センター ピン 2 3とシール部材 2 4とを備えている。 回転テーブル 2 1は、 上述したテ —ブル装置 1 2が有する回転テーブルであり、 載置テーブル 2 2は、 上述した 回転テーブル 2 1上に設けられたサブストレ一ト 1が載置されるテーブルであ る。 回転テーブル 2 1は、 第 1図に示したような円盤形状に限ったものではな いが、 テーブル面の中央付近を中心に回転するため、 テーブル面を円形とする ことが好ましい。 載置テーブル 2 2は、 第 1図および第 3図に示したような円 盤形状に限ったものではないが、 テーブル面にディスク基板が載置されるため 、 テーブル面を円形とすることが好ましい。 載置テーブル 2 2は、 回転テープ ル 2 1と一体構造とすることも可能である。  The table device 12 includes a rotary table 21, a mounting table 22, a center pin 23, and a seal member 24. The rotary table 21 is a rotary table included in the above-described table device 12, and the mounting table 22 is a table on which the substrate 1 provided on the rotary table 21 is mounted. is there. Although the rotary table 21 is not limited to the disk shape as shown in FIG. 1, it is preferable to make the table surface circular because it rotates around the center of the table surface. The mounting table 22 is not limited to the disk shape as shown in FIGS. 1 and 3, but the disk surface may be circular because the disk substrate is mounted on the table surface. preferable. The mounting table 22 may be formed integrally with the rotary table 21.
載置テーブル 2 2のテーブル面の中央部には、 セン夕一ピン 2 3が突設され ている。 センターピン 2 3は、 ディスク基板の載置面に対して垂直方向に変位 可能に載置テーブル 2 2に嵌通されている。  At the center of the table surface of the mounting table 22, a center pin 23 protrudes. The center pin 23 is fitted to the mounting table 22 so as to be displaceable in a direction perpendicular to the mounting surface of the disk substrate.
センタ一ピン 2 3は、 載置テーブル 2 2のディスク基板の載置面から突出し た部分に、 第 1のディスク基板 2 5、 すなわちサブストレート 1の開口部が嵌 挿される大径部の先端に、 第 2のディスク基板 2 6、 すなわちサブストレート 0の開口部が嵌挿される小径部を有している。 大径部に嵌挿されたディスク基 板 2 5は、 載置テーブル 2 2によって支持され、 小径部に嵌挿されたディスク 基板 2 6は、 小径部と大径部との間に形成された段差部によって支持される。 なお、 大径部と小径部は、 嵌挿されたディスク基板 2 5の開口部とディスク基 板 2 6の開口部とが同心上となるようセンターピン 2 3に設けられている。 セン夕一ピン 2 3と載置テーブル 2 2との間には、 0リングなどのシール部 材 2 4が設けられており、 セン夕一ピン 2 3と載置テーブル 2 2および回転テ 一ブル 2 1との隙間が塞がれている。 The center pin 23 is attached to a portion of the mounting table 22 that protrudes from the mounting surface of the disk substrate, to the first disk substrate 25, that is, to the tip of the large-diameter portion into which the opening of the substrate 1 is inserted. The second disk substrate 26, that is, a small-diameter portion into which the opening of the substrate 0 is inserted. The disk substrate 25 inserted into the large-diameter portion is supported by the mounting table 22. The disk substrate 26 inserted into the small-diameter portion is formed between the small-diameter portion and the large-diameter portion. It is supported by the step. The large-diameter portion and the small-diameter portion are provided on the center pin 23 so that the opening of the disk substrate 25 and the opening of the disk substrate 26 are concentric. A seal such as a 0-ring is provided between the center pin 23 and the mounting table 22. A material 24 is provided, and the gap between the sensor pin 23 and the mounting table 22 and the rotary table 21 is closed.
第 4図は、 センターピン 2 3の断面構造の一例を示す。 センターピン 2 3は FIG. 4 shows an example of a cross-sectional structure of the center pin 23. Center pin 2 3
、 大径部 2 3 aの先端側に大径部 2 3 aよりも小径である小径部 2 3 bを有し ている。 なお、 第 4図では、 大径部 2 3 aと小径部 2 3 bとを別体としている が、 これらを一体構造としても良い。 The large-diameter portion 23a has a small-diameter portion 23b on the distal end side that is smaller in diameter than the large-diameter portion 23a. In FIG. 4, the large-diameter portion 23a and the small-diameter portion 23b are separated from each other, but they may be integrated.
大径部 2 3 aの側壁 2 3 cによって、 センターピン 2 3に嵌挿されるデイス ク基板 2 5の径方向の位置決めがなされる。 セン夕一ピン 2 3に嵌挿されたデ イスク基板 2 5は、 載置テーブル 2 2によって受け止められ、 支持される。 小径部 2 3 bの側壁 2 3 dによって、 センターピン 2 3に嵌挿されるデイス ク基板 2 6の径方向の位置決めがなされる。 セン夕一ピン 2 3に嵌挿されたデ イスク基板 2 6は、 小径部 2 3 bと大径部 2 3 aとの境界位置に形成されてい る段差部によって受け止められ、 支持される。  The side wall 23 c of the large diameter portion 23 a positions the disk board 25 to be inserted into the center pin 23 in the radial direction. The disk board 25 inserted into the center pin 23 is received and supported by the mounting table 22. The side wall 23 d of the small-diameter portion 23 b positions the disk substrate 26 inserted in the center pin 23 in the radial direction. The disk substrate 26 inserted into the center pin 23 is received and supported by a step formed at the boundary between the small diameter portion 23b and the large diameter portion 23a.
段差部は、 センターピン 2 3に嵌挿されたディスク基板 2 5とディスク基板 2 6との貼り合わせ面の距離が近接するように形成されている。 例えば、 この 距離は、 0 . 5 mm〜2 . 0 mmとされる。 上述したように、 センターピン 2 The step portion is formed such that the distance between the bonding surfaces of the disk substrate 25 and the disk substrate 26 fitted into the center pin 23 is short. For example, this distance is set to 0.5 mm to 2.0 mm. As mentioned above, center pin 2
3は、 載置テーブルのディスク基板の載置面に対して垂直方向に移動可能とさ れており、 この移動可能な範囲は、 段差部が載置テーブル 2 2のディスク基板 の載置面に対して、 例えば、 0 mm〜 1 0 mmとされている。 センターピン 2 3は、 例えば 0 . 1 mm以下の停止精度で制御可能とされており、 センターピ ン 2 3の段差部と載置テーブル 2 2のディスク基板の載置面との距離は、 任意 に制御可能とされている。 3 is movable in the vertical direction with respect to the mounting surface of the disk substrate of the mounting table, and the movable range is such that the step portion is located on the mounting surface of the mounting table 22 on the disk substrate. On the other hand, for example, it is 0 mm to 10 mm. The center pin 23 can be controlled with a stop accuracy of, for example, 0.1 mm or less, and the distance between the stepped portion of the center pin 23 and the mounting surface of the disk substrate of the mounting table 22 is arbitrary. Can be controlled.
なお、 センタ一ピン 2 3に段差部を設けずに、 小径部 2 3 bを先端側に向か つて徐々に細くなるように構成することで、 ディスク基板 2 6を支持してもよ い。  The disc substrate 26 may be supported by forming the small-diameter portion 23b so as to gradually become thinner toward the front end without providing a step portion on the center pin 23.
小径部 2 3 bの先端部は、 徐々に細くなるよう面取り加工が施されている。 これにより、 センタ一ピン 2 3へのディスク基板の嵌揷を容易とすることがで さる。 The tip of the small diameter portion 23b is chamfered so as to gradually become thinner. This facilitates the fitting of the disk substrate to the center pin 23.
ここで、 第 3図の説明に戻る。 真空貼り合わせ装置 1 3は、 チャンバ 2 7と 、 エア通路 2 9と、 吸気弁 3 0と、 通気弁 3 1と、 プレート軸 3 2と、 モー夕 3 3と、 プレート 3 4と、 シール部材 2 8およびシール部材 3 5とを備えてい る。 真空貼り合わせ装置 1 3は、 ディスク基板 2 5とディスク基板 2 6とが貼 り合わされる密閉空間内の圧力を制御し、 真空とするための機構と、 センター ピン 2 3を移動し、 ディスク基板 2 5とディスク基板 2 6とを貼り合わせる機 構とを有している。  Here, the description returns to FIG. The vacuum bonding apparatus 13 includes a chamber 27, an air passage 29, an intake valve 30, a ventilation valve 31, a plate shaft 32, a motor 33, a plate 34, and a sealing member. 28 and a sealing member 35. The vacuum bonding device 13 controls the pressure in the sealed space where the disk substrates 25 and 26 are bonded to each other, and moves the center pin 23 to a mechanism for creating a vacuum. And a mechanism for bonding the disk substrate 26 to the disk substrate 26.
チャンバ 2 7は、 ディスク基板を貼り合わせる空間を外部と仕切る部材であ り、 テーブル装置 1 2側に対して接離可能とされている。 なお、 テーブル装置 1 2側をチャンバ 2 7側に対して接離可能としても良い。 チャンバ 2 7とテー ブル装置 1 2との間には、 Oリングなどのシール部材 2 8が設けられており、 チャンバ 2 7をテーブル装置 1 2側に閉じた際に、 チャンバ 2 7とテーブル装 置 1 2側との隙間を塞ぐ構造とされている。  The chamber 27 is a member that separates a space where the disk substrates are bonded from each other from the outside, and is capable of coming into contact with and separating from the table device 12. In addition, the table device 12 side may be configured to be able to contact and separate from the chamber 27 side. A seal member 28 such as an O-ring is provided between the chamber 27 and the table device 12. When the chamber 27 is closed to the table device 12 side, the chamber 27 and the table device are mounted. It is designed to close the gap with the 12 side.
チャンバ 2 7には、 エア通路 2 9が設けられており、 チャンバ 2 7内と、 図 示しない吸気装置の吸気口とが、 エア通路 2 9を介して通じている。 エア通路 2 9に設けられた吸気弁 3 0は、 チャンバ 2 7内と図示しない吸気装置の吸気 口との通気状態を調節するための弁である。 エア通路 2 9は、 さらに外気と通 気弁 3 1を介して通じている。 通気弁 3 1は、 チャンバ 2 7内と外気との通気 状態を調節するための弁である。  An air passage 29 is provided in the chamber 27, and the inside of the chamber 27 and an intake port of an intake device (not shown) communicate with each other through the air passage 29. An intake valve 30 provided in the air passage 29 is a valve for adjusting a ventilation state between the inside of the chamber 27 and an intake port of an intake device (not shown). The air passage 29 further communicates with outside air via a ventilation valve 31. The ventilation valve 31 is a valve for adjusting the ventilation state between the inside of the chamber 27 and the outside air.
センターピン 2 3と対向する部分のチャンバ 2 7には、 プレート軸 3 2が嵌 通されている。 チャンバ 2 7外のプレート軸 3 2の一端は、 モータ 3 3と接続 されている。 プレート軸 3 2は、 モータ 3 3の回転により、 センターピン 2 3 の軸方向に移動する。 チャンバ 2 7内のプレート軸 3 2の他端には、 プレート 3 4が備えられている。 プレート 3 4は、 センターピン 2 3に嵌挿されるディ スク基板 2 5およびディスク基板 2 6の主面を、 均一な圧力でテーブル装置 1 2側に押圧する押圧面を有している。 ここでは、 プレート軸 3 2とプレート 3 4とを別体としているが、 プレート軸 3 2とプレート 3 4とを一体構造として も良い。 The plate shaft 32 is inserted into the chamber 27 at a portion facing the center pin 23. One end of the plate shaft 32 outside the chamber 27 is connected to the motor 33. The plate shaft 32 moves in the axial direction of the center pin 23 by the rotation of the motor 33. At the other end of the plate shaft 32 in the chamber 27, a plate 34 is provided. The plate 34 is inserted into the center pin 23. It has a pressing surface for pressing the main surfaces of the disk substrate 25 and the disk substrate 26 toward the table device 12 with a uniform pressure. Here, the plate shaft 32 and the plate 34 are separated from each other, but the plate shaft 32 and the plate 34 may be integrated.
第 3図に示す例では、 モー夕 3 3、 プレート軸 3 2およびプレート 3 4によ る押圧によって、 センターピン 2 3の先端を押圧し、 センターピン 2 3が移動 する構造とされている。 センターピン 2 3の先端の押圧は、 これらモー夕 3 3 、 プレート軸 3 2およびプレート 3 4を用いたものに限定されるものではなく 、 例えば、 ピン状の部材によってセンタ一ピン 2 3の先端のみを押圧しても良 レ^ また、 押圧に用いる動力は、 モータに限らず、 シリンダを用いたり、 手動 で行う構造とするなど、 他の動力を使用する構造としても良い。  In the example shown in FIG. 3, the tip of the center pin 23 is pressed by the pressing of the motor 33, the plate shaft 32 and the plate 34, and the center pin 23 moves. The pressing of the tip of the center pin 23 is not limited to the one using the motor 33, the plate shaft 32 and the plate 34. For example, the tip of the center pin 23 is formed by a pin-shaped member. The power used for pressing is not limited to the motor, but may be a structure using other power, such as using a cylinder or performing a manual operation.
センタ一ピン 2 3の先端を押圧することで、 セン夕一ピン 2 3をセン夕一ピ ン 2 3に嵌挿されたディスク基板 2 6およびディスク基板 2 5を引き抜く方向 に移動させて、 ディスク基板 2 5の貼り合わせ面とディスク基板 2 6の貼り合 わせ面とを密着し、 ディスク基板 2 5とディスク基板 2 6とを貼り合わせる構 造とされている。 上述したように、 センターピン 2 3は、 嵌挿されたディスク 基板 2 5の開口部とディスク基板 2 6の開口部とが同心上となるよう構成され ているため、 この貼り合わせ構造により、 ディスク基板 2 5とディスク基板 2 6とを正確に位置合わせして貼り合わせることができる。  By pressing the tip of the center pin 23, the pin 23 is moved in the direction in which the disc board 26 and the disc board 25 inserted into the pin 23 are pulled out, and the disc is moved. The bonding surface of the substrate 25 and the bonding surface of the disk substrate 26 are in close contact with each other, and the disk substrate 25 and the disk substrate 26 are bonded together. As described above, since the center pin 23 is configured so that the opening of the disk substrate 25 and the opening of the disk substrate 26 are concentric with each other, this bonding structure allows The substrate 25 and the disk substrate 26 can be accurately aligned and bonded.
また、 第 3図に示す例では、 セン夕一ピン 2 3がテーブル装置 1 2側に移動 することで、 プレート 3 4がディスク基板 2 5を押圧する構造とされている。 これにより、 ディスク基板同士の接着性を高めることができ、 さらに、 貼り合 わせ後のディスク基板の厚みを調整することができる。 なお、 ディスク基板 2 6だけがセンターピン 2 3に嵌挿された場合には、 テーブル装置 1 2は、 セン ターピン 2 3を移動せず、 未硬化の接着剤がテーブル装置 1 2の載置テーブル 2 2などに付かないようにする。 この場合、 真空貼り合わせ装置 1 3から接着 剤硬化装置 1 4へは、 センターピン 2 3にディスク基板 2 6が嵌挿された状態 で搬送され、 接着剤が硬化される。 In addition, in the example shown in FIG. 3, the plate 34 presses the disk substrate 25 by moving the pin 23 to the table device 12 side. As a result, the adhesiveness between the disk substrates can be increased, and the thickness of the disk substrate after bonding can be adjusted. When only the disk substrate 26 is inserted into the center pin 23, the table device 12 does not move the center pin 23, and the uncured adhesive is placed on the mounting table of the table device 12. Do not stick to 2 2 etc. In this case, glue from vacuum bonding device 13 The adhesive is hardened by being conveyed to the agent hardening device 14 with the disk substrate 26 inserted into the center pin 23.
プレート軸 3 2とチャンバ 2 7との間には、 Oリングなどのシール部材 3 5 が設けられており、 チャンバ 2 7とプレート軸 3 2との隙間が塞がれている。 シール部材 2 4、 シール部材 2 8、 シール部材 3 5および吸気弁 3 0、 通気弁 3 1によって、 チャンバ 2 7をテーブル装置 1 2側に閉じた際に、 チャンバ 2 7内の空間を密閉することができる。 チャンバ 2 7を閉じた状態で、 吸気弁 3 0を開放し、 図示しない吸気装置でバキュームすることで、 チャンバ 2 7内の 空間を減圧し、 真空状態とすることができる。 また、 そのような減圧状態から 吸気弁 3 0を閉じて、 通気弁 3 1を開放することで、 チャンバ 2 7内の空間の 圧力を元の正常な状態とすることができる。 すなわち、 真空貼り合わせ装置 1 3は、 ディスク基板 2 5とディスク基板 2 6との貼り合わせが行われるチャン バ 2 7内の密閉空間の圧力を制御することができる。  A seal member 35 such as an O-ring is provided between the plate shaft 32 and the chamber 27, and a gap between the chamber 27 and the plate shaft 32 is closed. When the chamber 27 is closed to the table device 12 side by the seal member 24, the seal member 28, the seal member 35, the intake valve 30, and the ventilation valve 31, the space in the chamber 27 is sealed. be able to. With the chamber 27 closed, the intake valve 30 is opened, and the space in the chamber 27 is depressurized and evacuated by vacuuming with an intake device (not shown). Further, by closing the intake valve 30 and opening the ventilation valve 31 from such a reduced pressure state, the pressure in the space in the chamber 27 can be returned to the normal state. That is, the vacuum bonding apparatus 13 can control the pressure in the sealed space in the chamber 27 where the disk substrate 25 and the disk substrate 26 are bonded.
ここで、 ディスク基板 2 5およびディスク基板 2 6の詳細な形状について説 明する。 第 5図は、 貼り合わせ後のディスク基板の断面構造の一例を示す。 第 1のディスク基板 2 5および第 2のディスク基板 2 6は、 それぞれ、 平面円環 状の構造を有している。 ディスク基板 2 5とディスク基板 2 6は、 外径は同一 であるが、 開口部の内径は、 ディスク基板 2 6の方がディスク基板 2 5よりも 小径に構成されている。  Here, the detailed shapes of the disk substrates 25 and 26 will be described. FIG. 5 shows an example of a cross-sectional structure of the disc substrate after bonding. The first disk substrate 25 and the second disk substrate 26 each have a planar annular structure. The disk substrate 25 and the disk substrate 26 have the same outer diameter, but the inner diameter of the opening is smaller in the disk substrate 26 than in the disk substrate 25.
ディスク基板 2 5の開口部は、 主面に対して垂直な内壁 2 5 aを有しており 、 貼り合わせの際、 この内壁 2 5 aが上述したセン夕一ピン 2 3の大径部 2 3 aの側壁 2 3 cと嵌合される。 また、 ディスク基板 2 6の開口部は、 主面に対 して垂直な内壁 2 6 aを有しており、 貼り合わせの際、 この内壁 2 6 aが上述 したセンターピン 2 3の小径部 2 3 bの側壁 2 3 dと嵌合される。  The opening of the disc substrate 25 has an inner wall 25 a perpendicular to the main surface, and the inner wall 25 a is attached to the large-diameter portion 2 Mated with side wall 23c of 3a. The opening of the disk substrate 26 has an inner wall 26a perpendicular to the main surface, and the inner wall 26a is attached to the small diameter portion 2 of the center pin 23 at the time of bonding. Mates with side wall 23d of 3b.
次に、 真空貼り合わせ装置 1 3によってディスク基板を貼り合わせるときの 一連の動作について説明する。 第 6図〜第 1 2図は、 真空貼り合わせ装置 1 3 の貼り合わせ動作時の一連の状態を示しており、 第 13図は、 貼り合わせ動作 時の処理の流れの一例を示す。 Next, a series of operations when the disk substrates are bonded by the vacuum bonding apparatus 13 will be described. Figures 6 to 12 show the vacuum bonding equipment 1 3 13 shows a series of states during the bonding operation, and FIG. 13 shows an example of the flow of processing during the bonding operation.
第 6図は、 貼り合わせ処理前の真空貼り合わせ装置 13の断面構成である。 貼り合わせ処理前の状態では、 チャンバ 27は、 開いた状態とされている。 ま た、 プレート 34は、 センターピン 23側に対して、 退いた状態とされている 。 センタ一ピン 23に嵌合されたディスク基板 25とディスク基板 26が回転 テーブル 21によって供給され、 貼り合わせの準備が完了する。  FIG. 6 is a cross-sectional configuration of the vacuum bonding apparatus 13 before the bonding processing. In a state before the bonding process, the chamber 27 is in an open state. Further, the plate 34 is in a state of being retracted with respect to the center pin 23 side. The disk substrate 25 and the disk substrate 26 fitted to the center pin 23 are supplied by the rotary table 21, and the preparation for bonding is completed.
貼り合わせの準備が完了したら、 チャンバ 27を閉じる (ステップ S 1 1) 。 第 7図は、 チャンバ 27を閉じた状態を示す。 チャンバ 27を閉じて、 チヤ ンバ 27内を密閉状態としたら、 吸気弁 30を開放し、 図示しない吸気装置に よってバキュームする。 これにより、 チャンバ 27内を減圧し、 この状態を保 持する (ステップ S 12) 。 第 8図は、 チャンバ 27内を減圧している状態を 示す。 具体的には、 チャンバ 27内の圧力を 10P a〜300P aとし、 その 状態を 1秒〜 2秒保持する。  When the preparation for bonding is completed, the chamber 27 is closed (step S11). FIG. 7 shows a state where the chamber 27 is closed. When the chamber 27 is closed and the inside of the chamber 27 is closed, the intake valve 30 is opened, and the chamber is vacuumed by a suction device (not shown). Thus, the pressure in the chamber 27 is reduced, and this state is maintained (step S12). FIG. 8 shows a state where the pressure in the chamber 27 is reduced. Specifically, the pressure in the chamber 27 is set to 10 Pa to 300 Pa, and the state is maintained for 1 second to 2 seconds.
チャンバ 27内を減圧した状態を保持したら、 第 9図に示すように、 プレー ト 34をテーブル装置 12側へ突出する。 これによつて、 セン夕一ピン 23を 回転テーブル 21側に退かせ、 プレート 34のプレート面でディスク基板 26 の主面を押圧し、 ディスク基板 26の貼り合わせ面とディスク基板 25の貝占り 合わせ面とを接合する (ステップ S 13) 。 第 10図は、 プレート 34を突出 した状態を示す。  After maintaining the reduced pressure in the chamber 27, the plate 34 is protruded toward the table device 12 as shown in FIG. As a result, the center pin 23 is retreated to the turntable 21 side, and the main surface of the disk substrate 26 is pressed by the plate surface of the plate 34, and the foreground of the disk substrate 26 and the disk substrate 25 are forked. Join with the mating surface (step S13). FIG. 10 shows a state where the plate 34 is protruded.
プレート 34を突出し、 ディスク基板 26とディスク基板 25とを貼り合わ せたら、 吸気弁 30を閉じ、 通気弁 31を開放する。 これにより、 チャンバ 2 7内が通気され、 チャンバ 27内の圧力が通常となる (ステップ S 14) 。 第 1 1図は、 通気弁 31を開放した状態を示す。  After projecting the plate 34 and bonding the disk substrate 26 and the disk substrate 25 together, the intake valve 30 is closed and the ventilation valve 31 is opened. As a result, the inside of the chamber 27 is ventilated, and the pressure in the chamber 27 becomes normal (step S14). FIG. 11 shows a state in which the ventilation valve 31 is opened.
チャンバ 27内を通気したら、 チャンバ 27を開けて、 プレート 34を貼り 合わせ前の元の位置に退かせる (ステップ S 15) 。 第 12図は、 チャンバ 2 7を開けて、 プレート 3 4を戻した状態を示す。 貼り合わされたディスク基板 2 5とディスク基板 2 6は、 回転テーブル 2 1の回転によって次工程に供給さ れる。 After ventilating the inside of the chamber 27, the chamber 27 is opened, and the plate 34 is returned to the original position before bonding (step S15). Figure 12 shows chamber 2 7 shows a state in which the plate 34 is returned with the plate 7 opened. The bonded disk substrate 25 and disk substrate 26 are supplied to the next step by rotating the turntable 21.
以上説明したように、 一実施形態による光ディスクの製造装置および製造方 法によれば、 ディスク基板 2 5およびディスク基板 2 6を、 共にセンターピン As described above, according to the optical disk manufacturing apparatus and the manufacturing method according to the embodiment, both the disk substrate 25 and the disk substrate 26 are formed with the center pin.
2 3に嵌挿し、 位置決めされた状態で貼り合わせを行うため、 真空吸着装置で ディスク基板を保持する必要がなく、 貼り合わせを行うチャンバ 2 7内の密閉 空間を吸気装置で減圧し、 真空状態で貼り合わせを行うことができる。 これに より、 ディスク基板間の接着剤に気泡が残ることを防止することができる。 また、 移動可能なセンターピン 2 3の停止精度が高いことで、 貼り合わせ前 のディスク基板 2 5とディスク基板 2 6との距離を接近させておくことができ る。 これにより、 チャンバ 2 7内の減圧の開始後に直ぐ (例えば 2秒以内) に ディスク基板の貼り合わせを行っても、 ディスク基板間の接着剤に気泡が残る ことを防止することができる。 Since it is inserted and fitted into 23 and bonded together, it is not necessary to hold the disk substrate with a vacuum suction device, and the closed space in the chamber 27 where bonding is performed is depressurized by the suction device and vacuumed. Can be bonded together. This can prevent bubbles from remaining in the adhesive between the disk substrates. In addition, since the stop accuracy of the movable center pin 23 is high, the distance between the disk substrate 25 and the disk substrate 26 before bonding can be kept close. This prevents bubbles from remaining in the adhesive between the disk substrates even if the disk substrates are bonded immediately (for example, within 2 seconds) immediately after the start of decompression in the chamber 27.
また、 センターピン 2 3で位置決めされるディスク基板 2 5の開口部および ディスク基板 2 6の開口部が、 同心上となるように、 嵌合部 2 3 cと嵌合部 2 Also, the fitting portion 23 c and the fitting portion 2 c are arranged so that the opening of the disk substrate 25 and the opening of the disk substrate 26 positioned by the center pin 23 are concentric.
3 dとが設けられているため、 貼り合わせるディスク基板の位置決めを容易且 つ正確に素早く行うことができる。 Since 3d is provided, the positioning of the disk substrates to be bonded can be performed easily, accurately, and quickly.
また、 接着剤硬化装置 1 4は、 サブストレート 0またはサブストレート 1の どちらか一方しか真空貼り合わせ装置 1 3に搬送されず、 貼り合わせが行われ ない場合であっても、 接着剤が塗布されたディスク基板があれば、 そのディス ク基板の接着剤を硬化するため、 ディスク基板のハンドリング部に未硬化接着 剤が付着し、 後にハンドリングされるディスク基板が接着剤で汚れて不良品に なってしまうことを防止できる。 このような貼り合わせが行われなかったディ スク基板など、 正常に処理が行われなかったディスク基板は、 反転用アーム 1 6によって、 廃棄部 1 7に移動され、 廃棄用ディスク基板として積み重ねられ るため、 正常に処理が行われなかったディスク基板を容易且つ稼働率を低下す ることなく処理することができる。 Also, in the adhesive curing device 14, even when only one of the substrate 0 and the substrate 1 is conveyed to the vacuum bonding device 13 and the bonding is not performed, the adhesive is applied. If there is a disc substrate that has been hardened, the uncured adhesive adheres to the handling part of the disc substrate to cure the adhesive on the disc substrate, and the disc substrate that is later handled becomes dirty with the adhesive and becomes defective. Can be prevented. Disk substrates that have not been properly processed, such as disk substrates that have not been bonded, are moved to the disposal unit 17 by the reversing arm 16 and are stacked as disk substrates for disposal. Therefore, a disk substrate that has not been processed normally can be processed easily and without lowering the operation rate.
また、 ディスク基板のハンドリングを行う回数が少なくなるよう構成されて いるため、 ハンドリングミスによる不良の発生を少なくすることができる。 本発明は、 第 1 4図に示す構成を有する光ディスクの製造装置についても適 用できる。  Further, since the configuration is such that the number of times of handling the disk substrate is reduced, it is possible to reduce the occurrence of defects due to handling mistakes. The present invention is also applicable to an optical disk manufacturing apparatus having the configuration shown in FIG.
第 1 4図における成形装置 5 1、 取り出し機 5 2、 冷却装置 5 3、 第 1の成 膜装置 5 6、 第 2の成膜装置 5 7、 第 1の接着剤塗布装置 6 1、 第 2の接着剤 塗布装置 6 2、 テーブル装置 6 4、 真空貼り合わせ装置 6 5、 接着剤硬化装置 6 6、 排出装置 7 0および搬出装置 7 1は、 それぞれ、 上述した一実施形態に おける成形装置 1、 取り出し機 2、 冷却装置 3、 第 1の成膜装置 5、 第 2の成 膜装置 6、 第 1の接着剤塗布装置 7、 第 2の接着剤塗布装置 8、 テーブル装置 1 2、 真空貼り合わせ装置 1 3、 接着剤硬化装置 1 4、 排出装置 1 8および搬 出装置 1 9と機能的に同様の構成である。  Molding device 51, take-out device 52, cooling device 53, first film forming device 56, second film forming device 57, first adhesive applying device 61, second device in FIG. 14 The adhesive application device 62, the table device 64, the vacuum bonding device 65, the adhesive curing device 66, the discharging device 70, and the unloading device 71 are each a molding device 1 in the above-described embodiment. , Remover 2, cooling device 3, first film forming device 5, second film forming device 6, first adhesive coating device 7, second adhesive coating device 8, table device 12, vacuum bonding The functional configuration is the same as that of the aligning device 13, the adhesive curing device 14, the discharging device 18, and the discharging device 19.
搬送用テーブル 5 4は、 2枚のディスク基板を載置して搬送するテーブルで あり、 冷却装置 5 3から、 2枚のディスク基板を取り出す機構を有している。 なお、 2枚のディスク基板を同時に取り出す機構とすることで、 効率化を図る ことができる。 また、 搬送用テーブル 5 4は、 2枚のディスク基板をスパッタ アーム 5 5に供給する機構と、 スパッ夕アーム 5 5から 2枚のディスク基板を 受け取る機能と、 サンプリングアーム 5 8に 2枚のディスク基板を供給する機 構と、 スピナ一アーム 6 0に 2枚のディスク基板を供給する機構と、 テーブル に 2枚のディスク基板が載せられた状態で水平方向に、 例えば 9 0度回転する 機構とを有している。 なお、 2枚のディスク基板をスパッ夕アーム 5 5に同時 に供給する機構とすることで、 効率化を図ることができる。 2枚のディスク基 板をスパッ夕アーム 5 5から同時に受け取る機構とすることで、 効率化を図る ことができる。 2枚のディスク基板をサンプリングアーム 5 8に同時に供給す る機構とすることで、 効率化を図ることができる。 2枚のディスク基板をスピ ナーアーム 6 0に同時に供給する機構とすることで、 効率化を図ることができ る。 The transport table 54 is a table on which two disk substrates are placed and transported, and has a mechanism for taking out two disk substrates from the cooling device 53. It should be noted that efficiency can be improved by adopting a mechanism for simultaneously taking out two disk substrates. The transport table 54 has a mechanism for supplying two disk substrates to the sputter arm 55, a function for receiving two disk substrates from the sputter arm 55, and two disks for the sampling arm 58. A mechanism for supplying the substrate, a mechanism for supplying two disk substrates to the spinner arm 60, and a mechanism for rotating the disk horizontally in a state where the two disk substrates are placed on the table, for example, 90 degrees. have. It should be noted that efficiency can be improved by using a mechanism that simultaneously supplies two disk substrates to the sputtering arm 55. Efficiency can be improved by adopting a mechanism that receives two disk substrates from the sputter arms 55 at the same time. Supply two disk substrates simultaneously to sampling arm 58 By adopting such a mechanism, efficiency can be improved. Efficiency can be improved by providing a mechanism for simultaneously supplying two disk substrates to the spinner arm 60.
スパッ夕アーム 5 5は、 搬送用テーブル 5 4から成膜前の透明な 2枚のディ スク基板を受け取り、 成膜装置に搬送する機構を有している。 サブストレート 0は、 第 1の成膜装置 5 6に搬送され、 サブストレート 1は、 第 2の成膜装置 5 7に搬送される。 なお、 2枚のディスク基板を同時に搬送する機構とするこ とで、 効率化を図ることができる。 また、 スパッ夕アーム 5 5は、 成膜装置か ら 2枚のディスク基板を受け取り、 搬送用テーブル 5 4に供給する機構を有し ている。 サブストレート 0は、 第 1の成膜装置 5 6から受け取り、 サブストレ ート 1は、 第 2の成膜装置 5 7から受け取る。 なお、 2枚のディスク基板を成 膜装置から同時に受け取り、 搬送用テーブル 5 4に同時に供給する機構とする ことで、 効率化を図ることができる。  The sputter arm 55 has a mechanism for receiving two transparent disk substrates before film formation from the transfer table 54 and transferring them to the film forming apparatus. The substrate 0 is transferred to a first film forming apparatus 56, and the substrate 1 is transferred to a second film forming apparatus 57. In addition, efficiency can be improved by using a mechanism for simultaneously transporting two disk substrates. The sputter arm 55 has a mechanism for receiving two disk substrates from the film forming apparatus and supplying the disk substrates to the transfer table 54. Substrate 0 is received from the first film forming apparatus 56, and substrate 1 is received from the second film forming apparatus 57. The efficiency can be improved by adopting a mechanism in which two disk substrates are simultaneously received from the film forming apparatus and are simultaneously supplied to the transfer table 54.
サンプリングアーム 5 8は、 回転軸に取り付けられたアームであり、 搬送用 テーブル 5 4から 2枚のディスク基板を受け取る機構と、 受け取った 2枚のデ イスク基板を保持する機構と、 回転軸を中心に水平方向に、 例えば 1 8 0度回 転する機構と、 サンプリング装置 5 9に 2枚のディスク基板を供給する機構と を有している。 なお、 2枚のディスク基板を、 搬送テーブルから同時に受け取 る機構とすることで、 効率化を図ることができる。 2枚のディスク基板をサン プリング装置 5 9に同時に供給する機構とすることで、 効率化を図ることがで さる。  The sampling arm 58 is an arm attached to the rotating shaft, and has a mechanism for receiving two disk substrates from the transfer table 54, a mechanism for holding the two received disk substrates, and a rotating shaft. A mechanism for rotating horizontally 180 degrees, for example, and a mechanism for supplying two disk substrates to the sampling device 59 are provided. The efficiency can be improved by using a mechanism for receiving two disk substrates simultaneously from the transfer table. By using a mechanism for simultaneously supplying two disk substrates to the sampling device 59, efficiency can be improved.
サンプリング装置 5 9は、 サンプリングアーム 5 8から、 2枚のディスク基 板を受け取る機構と、 例えば、 ディスク基板の中央部の開口部に開口径よりも 小さい径の棒状部材を通した状態で、 ディスク基板を重ねる機構とを有してい る。 成膜前のディスク基板のサンプリングを行う場合には、 成膜装置での成膜 処理を行わず、 搬送用テーブル 5 4からサンプリングアーム 5 8を介してサン プリング装置 5 9に 2枚のディスク基板を供給する。 成膜後のディスク基板の サンプリングを行う場合には、 成膜装置での成膜処理を行い、 搬送用テーブル 5 4からサンプリングアーム 5 8を介してサンプリング装置 5 9に 2枚のディ スク基板を供給する。 The sampling device 59 has a mechanism for receiving two disk substrates from the sampling arm 58, and, for example, a disk having a rod-shaped member having a diameter smaller than the opening diameter passed through the central opening of the disk substrate. And a mechanism for stacking substrates. When sampling the disk substrate before film formation, the film formation processing is not performed in the film forming apparatus, and the sample is sampled from the transfer table 54 via the sampling arm 58. The two disk substrates are supplied to the pulling device 59. When sampling the disk substrate after film formation, a film formation process is performed in a film formation device, and two disk substrates are transferred from the transfer table 54 to the sampling device 59 via the sampling arm 58. Supply.
スピナ一アーム 6 0は、 回転軸に取り付けられたアームであり、 接着剤塗布 装置に 2枚のディスク基板を搬送する機構を有している。 サブストレ一ト 0は 、 第 1の接着剤塗布装置 6 1に搬送され、 サブストレート 1は、 第 2の接着剤 塗布装置 6 2に搬送される。 なお、 2枚のディスク基板を同時に搬送する機構 とすることで、 効率化を図ることができる。 また、 スピナ一アーム 6 0は、 接 着剤塗布装置から 2枚のディスク基板を受け取る機構を有している。 サブスト レート 0は、 第 1の接着剤塗布装置 6 1から受け取り、 サブストレート 1は、 第 2の接着剤塗布装置 6 2から受け取る。 なお、 2枚のディスク基板を同時に 受け取る機構とすることで、 効率化を図ることができる。 スピナ一アーム 6 0 は、 さらに、 反転装置 6 3にディスク基板を供給する機構と、 貼り合わせ用の テーブル装置 6 4のディスクを載置するテーブルにディスク基板を供給する機 構と、 回転軸を中心に水平方向に、 例えば 9 0度回転する機構とを有している 反転装置 6 3は、 サブストレ一ト 0をスピナ一アーム 6 0から受け取る機構 、 上向きであるサブストレート 0の接着剤塗布面を下向きにする機構、 サブス トレー卜 0を、 テーブル装置 6 4のディスク受け取り部に供給し、 載置テープ ルのセンターピンに嵌挿する機構とを有している。 反転装置 6 3とスピナーァ ーム 6 0によって、 サブストレ一ト 0とサブストレート 1とが接着剤を介在す る向きでセン夕一ピンに嵌挿される。  The spinner arm 60 is an arm attached to a rotating shaft, and has a mechanism for transporting two disk substrates to an adhesive application device. Substrate 0 is transported to first adhesive coating device 61, and substrate 1 is transported to second adhesive coating device 62. It should be noted that efficiency can be improved by using a mechanism for simultaneously transporting two disk substrates. The spinner arm 60 has a mechanism for receiving two disk substrates from the adhesive application device. Substrate 0 is received from the first adhesive applicator 61, and substrate 1 is received from the second adhesive applicator 62. In addition, efficiency can be improved by adopting a mechanism that receives two disk substrates at the same time. The spinner arm 60 further includes a mechanism for supplying the disk substrate to the reversing device 63, a mechanism for supplying the disk substrate to the table on which the disk of the bonding table device 64 is mounted, and a rotating shaft. A reversing device 63 having a mechanism for rotating the center in the horizontal direction, for example, 90 degrees, a mechanism for receiving the substrate 0 from the spinner arm 60, an adhesive application surface of the substrate 0 facing upward. And a mechanism for supplying the substrate 0 to the disk receiving portion of the table device 64 and inserting it into the center pin of the mounting table. By the reversing device 63 and the spinner arm 60, the substrate 0 and the substrate 1 are fitted to the center pin in a direction in which an adhesive is interposed.
取り出し用アーム 6 7は、 テーブル装置 6 4のディスク基板取り出し部から ディスク基板を取り出す機構と、 反転用アーム 6 8にディスク基板を供給する 機構と、 廃棄部 6 9にディスク基板を移動させる機構とを有している。 反転用アーム 6 8は、 取り出し用アーム 6 7からディスク基板を受け取る機 構と、 保持しているディスク基板を反転する機構と、 排出装置 7 0にディスク 基板を供給する機構とを有している。 The take-out arm 67 has a mechanism for taking out the disc substrate from the disc board take-out part of the table device 64, a mechanism for supplying the disc board to the reversing arm 68, and a mechanism for moving the disc board to the discard part 69. have. The reversing arm 68 has a mechanism for receiving the disk substrate from the unloading arm 67, a mechanism for reversing the held disk substrate, and a mechanism for supplying the disk substrate to the ejection device 70. .
廃棄部 6 9は、 ディスク基板を、 例えば 0〜1 0 0枚程積み重ねる機構と、 積み上げられたディスク基板を手動で引き出して取り出せる機構とを有してい る。  The discarding unit 69 has a mechanism for stacking, for example, about 0 to 100 disk substrates, and a mechanism for manually pulling out and removing the stacked disk substrates.
第 1 4図に示す光ディスクの製造装置における処理の主要な流れは、 上述し た一実施形態の光ディスクの製造装置と同様である。  The main flow of processing in the optical disk manufacturing apparatus shown in FIG. 14 is the same as that of the optical disk manufacturing apparatus of the above-described embodiment.
すなわち、 成形装置 5 1によって成形された 2枚のディスク基板が取り出し 機 5 2によって冷却装置 5 3に搬送され、 冷却される。 冷却装置 5 3で冷却さ れたディスク基板は、 搬送用テーブル 5 4とスパッタアーム 5 5などによって 、 成膜装置に搬送され成膜処理される。 サブストレート 0は、 第 1の成膜装置 5 6によって成膜処理され、 サブストレート 1は、 第 2の成膜装置 5 7によつ て成膜処理される。  That is, the two disk substrates formed by the forming device 51 are conveyed to the cooling device 53 by the take-out device 52 and cooled. The disk substrate cooled by the cooling device 53 is transferred to a film forming device by a transfer table 54 and a sputter arm 55 to perform a film forming process. The substrate 0 is subjected to a film forming process by a first film forming device 56, and the substrate 1 is subjected to a film forming process by a second film forming device 57.
成膜装置によって成膜された 2枚のディスク基板は、 搬送用テーブル 5 4に よってスピナ一アーム 6 0に供給され、 接着剤塗布装置に搬送されて接着剤が 塗布される。 なお、 サンプリング用のディスク基板は、 搬送用テーブル 5 4お よびサンプリングアーム 5 8によって、 サンプリング装置 5 9に搬送される。 第 1 4図に示す例では、 サブス卜レート 0が第 1の接着剤塗布装置 6 1によ つて接着剤を塗布され、 サブストレート 1が仮置きテーブルに載置される。 接 着剤が塗布されたサブストレート 0は、 スピナ一アーム 6 0によって、 反転装 置 6 3に供給され、 サブストレート 1は、 スピナ一アーム 6 0によって、 貼り 合わせ用のテーブル装置 6 4のディスク基板受け取り部にそれぞれ供給される 反転装置 6 3に供給されたサブストレート 0と、 テーブル装置 6 4に供給さ れたサブストレート 1とは、 真空貼り合わせ装置 6 5によって接着剤を介在し て貼り合わせられ、 接着剤硬化装置 6 6によって接着剤が硬化される。 The two disk substrates formed by the film forming apparatus are supplied to the spinner arm 60 by the transfer table 54, transferred to the adhesive coating device, and coated with the adhesive. The sampling disk substrate is transferred to the sampling device 59 by the transfer table 54 and the sampling arm 58. In the example shown in FIG. 14, the substrate 0 is coated with an adhesive by the first adhesive coating device 61, and the substrate 1 is placed on the temporary table. The substrate 0 to which the adhesive is applied is supplied to the reversing device 63 by the spinner arm 60, and the substrate 1 is the disk of the bonding table device 64 by the spinner arm 60. The substrate 0 supplied to the reversing device 63 supplied to the substrate receiving portion and the substrate 1 supplied to the table device 64 are respectively provided with an adhesive by a vacuum bonding device 65. The adhesive is cured by an adhesive curing device 66.
接着剤硬化装置 6 6によって接着剤が硬化されたディスク基板は、 取り出し 用アーム 6 7によってテーブル装置 6 4から取り出され、 反転用アーム 6 8に 渡され、 反転される。  The disk substrate on which the adhesive has been cured by the adhesive curing device 66 is taken out of the table device 64 by the take-out arm 67, passed to the reversing arm 68, and inverted.
搬送装置のハンドリングミスなどによつて貼り合わせが行われずに接着剤が 硬化されたディスク基板など、 正常に処理が行われなかったディスク基板は、 反転用アーム 6 8によって、 廃棄部 6 9に移動され、 廃棄用ディスク基板とし て積み重ねられる。 正常に処理が行われたディスク基板は、 反転用アーム 6 8 から排出装置 7 0に渡される。  Disk substrates that have not been properly processed, such as disk substrates that have been cured due to mishandling due to handling error of the transport device, etc., are moved to the disposal section 69 by the reversing arm 68. And stacked as disc substrates for disposal. The normally processed disk substrate is transferred from the reversing arm 68 to the ejection device 70.
以上説明したように、 第 1 4図に示す光ディスクの製造装置および製造方法 によれば、 一実施形態による光ディスクの製造装置および製造方法と同様の効 果を得ることができる。 また、 一実施形態による光ディスクの製造装置よりも ハンドリングの回数は多くなるが、 各処理の流れを考慮し、 スパッタアーム 5 5、 サンプリングアーム 5 8およびスピナ一アーム 6 0等の処理毎の搬送装置 を備えていることで、 サイクルタイムを短縮することができる。  As described above, according to the optical disc manufacturing apparatus and the manufacturing method shown in FIG. 14, the same effects as those of the optical disc manufacturing apparatus and the manufacturing method according to the embodiment can be obtained. Although the number of times of handling is larger than that of the optical disk manufacturing apparatus according to one embodiment, taking into account the flow of each processing, a transfer device for each processing such as a sputter arm 55, a sampling arm 58, a spinner arm 60, etc. Cycle time can be reduced.
本発明は、 上述した本発明の一実施形態に限定されるものでは無く、 本発明 の要旨を逸脱しない範囲内で様々な変形や応用が可能である。 例えば、 上述し た一実施形態において挙げた数値はあくまでも例に過ぎず、 必要に応じてこれ と異なる数値を用いてもよい。  The present invention is not limited to the above-described embodiment of the present invention, and various modifications and applications can be made without departing from the gist of the present invention. For example, the numerical values given in the above-described embodiment are merely examples, and different numerical values may be used as needed.
また、 上述した一実施形態では、 ピットを有する読み取り専用の光ディスク の製造について説明したが、 適用可能な記録媒体はこれに限らず、 例えば、 ピ ッ卜でなく、 ランド ·グループを有する書き込み可能な光記録媒体の製造につ いて適用することができる。 また、 光ディスクだけでなく、 開口部の大きさが 異なる基板同士を貼り合わせて製造されるものであれば、 磁気ディスク、 光磁 気ディスクなど、 他の様々な記録媒体に適用することができる。 基板の外周形 状および開口部の形状も、 円形に限定されるものではなく、 四角形状、 三角形 状など、 他の形状でも適用可能である。 また、 貼り合わせる基板の外周形状は 、 同一でなくても適用可能である。 In the above-described embodiment, the manufacture of a read-only optical disk having pits has been described. However, applicable recording media are not limited to this. For example, a writable optical disk having a land group instead of a pit can be used. It can be applied to the manufacture of optical recording media. The present invention can be applied not only to an optical disk but also to various other recording media such as a magnetic disk and a magneto-optical disk as long as they are manufactured by bonding substrates having different openings. The outer peripheral shape of the substrate and the shape of the opening are not limited to a circle, but may be a square, a triangle, or the like. Other shapes such as shapes are also applicable. Further, the present invention is applicable even if the outer peripheral shapes of the substrates to be bonded are not the same.
また、 上述した一実施形態では、 モー夕 3 3を真空貼り合わせ装置側に備え 、 モータ 3 3の回転によってプレート 3 4を移動する構造により、 セン夕一ピ ン 2 3の先端を押圧し、 センターピン 2 3を移動する構造としたが、 モータ 3 3を回転テーブル 2 1側に備え、 センタ一ピン 2 3を回転テーブル 2 1側に備 えたモー夕 3 3により駆動させる構造としても良い。 なお、 センターピン 2 3 の駆動は、 モータによるものに限らず、 シリンダや手動など、 他の動力を使用 する構造としても良い。  Further, in the above-described embodiment, the motor 33 is provided on the vacuum bonding apparatus side, and the plate 34 is moved by the rotation of the motor 33, thereby pressing the tip of the sensor pin 23. Although the center pin 23 is moved, the motor 33 may be provided on the rotary table 21 side, and the center pin 23 may be driven by the motor 33 provided on the rotary table 21 side. The drive of the center pin 23 is not limited to the motor, but may be a structure using other power such as a cylinder or a manual.

Claims

請 求 の 範 囲 The scope of the claims
1 . 主面の中央部に開口部を有する第 1の基板と、 主面の中央部に上記第 1の 基板の開口部よりも小さい開口部を有する第 2の基板とを、 上記第 1の基板お よび/または上記第 2の基板の一主面上に塗布された接着剤を介在させて貼り 合わせる記録媒体の製造装置であって、 1. A first substrate having an opening at the center of the main surface, and a second substrate having an opening smaller than the opening of the first substrate at the center of the main surface, An apparatus for manufacturing a recording medium, wherein the recording medium is bonded by interposing an adhesive applied on one main surface of the substrate and / or the second substrate,
先端部の小径部と大径部との境界位置に段差部が形成され、 載置テーブルの 開口部を貫通して垂直方向に変位可能とされたセンターピンと、  A center pin formed with a step at the boundary between the small diameter portion and the large diameter portion at the tip end, the center pin being capable of being vertically displaced through the opening of the mounting table;
貼り合わせが行われる密閉空間を減圧する減圧部とを備え、  A decompression unit that decompresses the sealed space where the bonding is performed,
上記セン夕一ピンの上記大径部が開口部に挿入され、 上記載置テーブルによ つて支持される上記第 1の基板と、 上記センタ一ピンの上記先端部が開口部に 挿入され、 上記段差部によって支持される上記第 2の基板とを、 上記セン夕一 ピンを垂直方向に変位させて貼り合わせる  The first substrate supported by the mounting table, wherein the large-diameter portion of the center pin is inserted into the opening, and the tip end of the center pin is inserted into the opening; The second substrate supported by the step is bonded to the second substrate by displacing the center pin vertically.
ことを特徴とする記録媒体の製造装置。 An apparatus for manufacturing a recording medium, comprising:
2 . 請求の範囲 1に記載の記録媒体の製造装置であって、 2. An apparatus for manufacturing a recording medium according to claim 1, wherein
さらに、 押圧部を備え、 上記押圧部によって上記センターピンの先端を押圧 して上記センターピンを垂直方向に変位させ、 さらに上記押圧部によって上記 第 2の基板を押圧することによつて上記第 1の基板と上記第 2の基板とが貼り 合わされることを特徴とする記録媒体の製造装置。  Further, a pressing portion is provided, the tip of the center pin is pressed by the pressing portion to displace the center pin in a vertical direction, and the first substrate is pressed by the pressing portion to press the second substrate. An apparatus for manufacturing a recording medium, wherein the first substrate and the second substrate are bonded to each other.
3 . 請求の範囲 1に記載の記録媒体の製造装置であって、 3. The apparatus for manufacturing a recording medium according to claim 1, wherein
上記第 1の基板と上記第 2の基板の何れか一方のみが上記センターピンに挿 入された場合には、 上記第 1の基板と上記第 2の基板とを貼り合わせずに接着 剤を硬化させることを特徴とする記録媒体の製造装置。  When only one of the first substrate and the second substrate is inserted into the center pin, the adhesive is cured without bonding the first substrate and the second substrate. An apparatus for manufacturing a recording medium, comprising:
4. 請求の範囲 3に記載の記録媒体の製造装置であって、 4. An apparatus for manufacturing a recording medium according to claim 3, wherein
上記第 2の基板だけが上記センターピンに挿入された場合には、 上記センタ 一ピンの垂直方向の移動を行わないことを特徴とする記録媒体の製造装置。 An apparatus for manufacturing a recording medium, characterized in that when only the second substrate is inserted into the center pin, the center pin does not move in the vertical direction.
5 . 主面の中央部に開口部を有する第 1の基板と、 主面の中央部に上記第 1の 基板の開口部よりも小さい開口部を有する第 2の基板とを、 上記第 1の基板お よび/または上記第 2の基板の一主面上に塗布された接着剤を介在させて貼り 合わせる記録媒体の製造方法であって、 5. A first substrate having an opening at the center of the main surface, and a second substrate having an opening smaller than the opening of the first substrate at the center of the main surface, A method for producing a recording medium, wherein the recording medium is bonded to the substrate and / or an adhesive applied on one principal surface of the second substrate with an adhesive interposed therebetween.
第 1の基板の開口部をセン夕一ピンの大径部に挿入し、 載置テ一ブルによつ て上記第 1の基板を支持する工程と、  Inserting the opening of the first substrate into the large-diameter portion of the pin, and supporting the first substrate with a mounting table;
第 2の基板の開口部を上記セン夕一ピンの先端部の小径部に挿入し、 上記小 径部と上記大径部との境界位置の段差部によって上記第 2の基板を支持するェ 程と、  A step of inserting the opening of the second substrate into the small-diameter portion at the tip of the sensor pin and supporting the second substrate by a step at the boundary between the small-diameter portion and the large-diameter portion; When,
貼り合わせが行われる密閉空間を減圧する工程と、  A step of decompressing the sealed space where the bonding is performed,
押圧部によって上記センターピンを垂直方向に変位させ、 さらに上記押圧部 によつて上記第 2の基板を押圧することによつて上記第 1の基板と上記第 2の 基板とを貼り合わせる工程と  A step of vertically displacing the center pin by a pressing portion and further pressing the second substrate by the pressing portion to bond the first substrate and the second substrate together;
を有することを特徴とする記録媒体の製造方法。 A method for manufacturing a recording medium, comprising:
PCT/JP2005/004588 2004-03-19 2005-03-09 Device and method for manufacturing recording medium WO2005091284A1 (en)

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