WO2005064996A1 - 有機半導体発光素子 - Google Patents
有機半導体発光素子 Download PDFInfo
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- WO2005064996A1 WO2005064996A1 PCT/JP2004/019674 JP2004019674W WO2005064996A1 WO 2005064996 A1 WO2005064996 A1 WO 2005064996A1 JP 2004019674 W JP2004019674 W JP 2004019674W WO 2005064996 A1 WO2005064996 A1 WO 2005064996A1
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- WIPO (PCT)
- Prior art keywords
- organic semiconductor
- layer
- light emitting
- electrode
- light
- Prior art date
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 66
- 238000010521 absorption reaction Methods 0.000 claims abstract description 5
- 230000031700 light absorption Effects 0.000 claims description 7
- 239000002019 doping agent Substances 0.000 claims description 5
- 230000005525 hole transport Effects 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 3
- 238000010791 quenching Methods 0.000 claims description 2
- 230000000171 quenching effect Effects 0.000 claims description 2
- 238000000295 emission spectrum Methods 0.000 description 7
- -1 magnesium Chemical class 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 7
- 230000007423 decrease Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 238000000862 absorption spectrum Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical group [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- QENGPZGAWFQWCZ-UHFFFAOYSA-N 3-Methylthiophene Chemical compound CC=1C=CSC=1 QENGPZGAWFQWCZ-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 2
- VBVAVBCYMYWNOU-UHFFFAOYSA-N coumarin 6 Chemical compound C1=CC=C2SC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 VBVAVBCYMYWNOU-UHFFFAOYSA-N 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- VOFUROIFQGPCGE-UHFFFAOYSA-N nile red Chemical compound C1=CC=C2C3=NC4=CC=C(N(CC)CC)C=C4OC3=CC(=O)C2=C1 VOFUROIFQGPCGE-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920000767 polyaniline Polymers 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229920003026 Acene Polymers 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001339 alkali metal compounds Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001341 alkaline earth metal compounds Chemical class 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 125000000609 carbazolyl group Chemical class C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- DCZNSJVFOQPSRV-UHFFFAOYSA-N n,n-diphenyl-4-[4-(n-phenylanilino)phenyl]aniline Chemical class C1=CC=CC=C1N(C=1C=CC(=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 DCZNSJVFOQPSRV-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229940042055 systemic antimycotics triazole derivative Drugs 0.000 description 1
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/805—Electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
Definitions
- the present invention relates to an organic semiconductor light emitting device, particularly to an organic semiconductor light emitting device having a switching function.
- Organic electroluminescent devices (hereinafter, also referred to as organic EL devices) are self-luminous devices, which have various advantages such as a very fast response speed and high brightness. . Further, an organic EL device having a switching function has been proposed (for example, see Japanese Patent Application Laid-Open No. 2003-187983).
- a light emitting display formed by arranging such organic EL elements in a matrix has attracted attention as a display device having a wide viewing angle, a thin shape and low power consumption, and has been widely developed.
- the present invention has been made in view of the above points, and an object of the present invention is to provide a high-luminance, high-performance organic semiconductor light-emitting device having a switching function.
- the problem to be solved by the present invention includes the above-mentioned problem as an example.
- An organic semiconductor light-emitting device is an organic EL light-emitting device having a first electrode, a second electrode, and a light-emitting layer provided between the first and second electrodes, wherein the light-emitting layer is provided between the first electrode and the light-emitting layer. And an organic semiconductor layer having an absorption band within a light emission wavelength band of the light emitting layer, and a control electrode electrically connected to the organic semiconductor layer.
- FIG. 1 is a cross-sectional view schematically illustrating a configuration of an optical thyristor-type organic EL device that is Embodiment 1 of the present invention.
- FIG. 2 is a diagram showing an example of the gate electrode, and is a partial plan view of the gate electrode in a plane perpendicular to the laminating direction.
- FIG. 3 is a diagram showing an example of a gate electrode, and is a cross-sectional view of an organic EL device in a case where the gate electrode is formed so as to be embedded in an organic semiconductor layer.
- FIG. 4 is a view showing an EL emission spectrum of the light-emitting layer 25 (dashed line) and an absorption spectrum of the first and second organic semiconductor layers (solid line).
- FIG. 2 is a cross-sectional view illustrating a configuration of an IT element.
- FIG. 6 is a diagram showing drain-source current (IDS) versus drain-source voltage (VDS) when the photosensitive SIT device shown in FIG. 5 is not irradiated with external light.
- Fig. 7 shows the drain when the light-sensitive SIT element shown in Fig. 5 was irradiated with external light.
- FIG. 5 is a diagram showing drain-source current (IDS) with respect to source voltage (VDS).
- FIG. 8 is a diagram showing the EL emission spectrum (dot-dash line) of the light-emitting layer and the absorption spectra (solid lines) of the first and second organic semiconductor layers in the organic EL device of Example 2.
- FIG. FIG. 5 is a cross-sectional view schematically illustrating a configuration of an optical thyristor-type organic EL device that is Embodiment 3 of the present invention.
- FIG. 10 is a cross-sectional view schematically illustrating a configuration of an optical thyristor-type organic EL device that is Embodiment 4 of the present invention.
- FIG. 1 is a cross-sectional view schematically illustrating a configuration of an optical thyristor-type organic EL device 10 according to a first embodiment of the present invention.
- the organic EL element 10 has a source electrode (S) 11 as a first electrode, a drain electrode (D) 12 as a second electrode, and the source electrode (S) 11 and a drain electrode ( A gate electrode (G) 13 is provided between D) and 12 as a control electrode. Furthermore, a first organic semiconductor is provided between the source electrode (S) 11 and the gate electrode (G) 13. A body layer (ORG 1) 21 is formed, and a second organic semiconductor layer (ORG2) 22 and a light emitting layer (EMI) 25 are formed between the gate electrode (G) 13 and the drain electrode (D) 12.
- the source electrode (S) 11, the drain electrode (D) 12, and the gate electrode (G) 13 have gold, platinum, palladium, silver, lead, tin, aluminum, calcium, indium, chromium, lithium, etc.
- Alkali metals, alkaline earth metals such as magnesium, or alloys thereof can be used.
- an alkali metal compound, an alkaline earth metal compound, indium tin oxide (ITO), tin oxide, indium zinc oxide, zinc oxide, or an alloy thereof can be used.
- ITO indium tin oxide
- selenium, copper iodide, nickel, or the like can be used.
- conductive polymers such as poly (3-methylthiophene), polyphenylene sulfide, and polyaniline. These can be used alone or in the form of a laminate of a plurality of films, such as a film of polyaniline formed on ITO (indium tin oxide).
- the first organic semiconductor layer (ORG 1) 21 and the second organic semiconductor layer (ORG2) 22 include organic dye molecules such as cyanine, porphyrin, and phthalocyanine and derivatives thereof, triacenylamine derivatives, and polyacene-based molecules such as pursecene. Derivatives thereof, carbazole derivatives, triphenyldiamine derivatives, triazole derivatives and the like can be used, but are not limited thereto. These may be used alone or as a mixed layer of two or more materials.
- EMI light-emitting layer
- aluminum quinolinol, sorbazole derivative, or the like can be used. The added one is more preferable.
- source electrode 11 is formed by sputtering ITO to a thickness of about 100 nm (nanometers).
- the layer 22 is formed by evaporating copper phthalocyanine (CuPc).
- the first organic semiconductor layer 21 and the second organic semiconductor layer 22 are formed so as to have a thickness of about 50 nm.
- the gate electrode 13 is deposited on the first organic semiconductor layer 21 so that the thickness of the aluminum layer is about 30 nm, but the entire surface of the first organic semiconductor layer 21 is not covered.
- the gate electrode 13 is formed under film forming conditions such that the holes 13A are formed in the plane. In this case, the holes are formed randomly. That is, by forming the second organic semiconductor layer 22 on the gate electrode 13, the second organic semiconductor (copper phthalocyanine) is also formed in the hole, and the first organic semiconductor layer 21 and the second organic semiconductor layer 22 are formed. 22 is in contact with the hole (ie, the penetrating portion) 13A.
- the gate electrode 13 only needs to be formed in such a shape that the first organic semiconductor layer 21 and the second organic semiconductor layer 22 are in contact with each other. That is, the gate electrode 13 may be formed in various shapes such as a mesh shape and a stripe shape using a process mask. For example, in the case where the gate electrode 13 is formed so that the gate electrode 13 has a mesh shape, a partial plan view of the gate electrode 13 in a plane perpendicular to the lamination direction (that is, one view from the W direction in FIG. 1) Figure 2 shows a partial cross-sectional view. Or The gate electrode 13 may be formed in a comb shape.
- the gate electrode 13 may be formed by being buried in one organic semiconductor layer (ORG) 23.
- the gate electrode 13 may be formed in the one organic semiconductor layer 23, and may be formed at any position.
- a light emitting layer (EMI) 25 is formed by co-evaporating aluminum quinolinol (A1q3) and Nile Red at a ratio of 100: 5.
- the drain electrode 12 is formed by co-evaporating magnesium and silver at a ratio of 100: 5.
- FIG. 4 shows the EL emission spectrum of the light-emitting layer 25 (indicated by a dashed line) and the absorption spectrum of copper phthalocyanine (CuPc) used in the first and second organic semiconductor layers 21 and 22 (indicated by the solid line).
- the fluorescent material Nile Red is added to the aluminum quinolinol of the light emitting layer 25.
- the actual emission spectrum of the light emitting layer 25 is shifted to a longer wavelength side than the emission spectrum of aluminum quinolinol (A1q3).
- the luminous efficiency is increased by adding a suitable amount of the fluorescent material, but the luminous efficiency is reduced by adding too much. Accordingly, the light emitted from the light-emitting layer 25 is partially absorbed in the wavelength band by the first and second organic semiconductor layers 21 and 22.
- FIG. 3 is a cross-sectional view illustrating a configuration of a child 1 OA.
- the photosensitive SIT element 10A has the same configuration as that of the organic EL element 10 except that the light emitting layer 25 of the organic EL element 10 is not formed.
- the photosensitive SIT has a gate electrode between the source electrode and the drain electrode, and its current-voltage characteristics are the same as those of an electrostatic induction transistor (SIT).
- SIT electrostatic induction transistor
- Figure 6 shows the drain-source current ( IDS ) versus the drain-source voltage ( VDS ) when the photosensitive SIT1OA is not irradiated with external light.
- IDS drain-source current
- VDS drain-source voltage
- FIG. 7 shows the drain-source current (IDS) versus the drain-source voltage (VDS) when the light-sensitive SIT10A is irradiated with external light.
- V G gate voltage
- V G gate voltage
- the light-sensitive SIT 10 A was in the conductive (ON) state
- the conductive (ON) state was maintained even when the gate voltage was increased to IV.
- the gate voltage was increased to 1.5 V
- the state changed to the non-conductive (OF F) state.
- the operation of the organic EL device 10 is understood as follows. That is, when the light emitted from the light emitting layer 25 is not absorbed by the first and second organic semiconductor layers 21 and 22 (non-light emitting state), the voltage applied to the gate electrode 13 is However, the gate potential increases, the current flowing through the light emitting layer 25 also decreases, and the light emission intensity decreases. However, in the present invention, the gate potential is lowered by holes generated by the light emitted from the light emitting layer 25 being absorbed by the first and second organic semiconductor layers 21 and 22. Due to such a mechanism, the light emission from the light emitting layer 25 is such that when the light emitted from the light emitting layer 25 is not absorbed by the first and second organic semiconductor layers 21 and 22, the current is supplied.
- the applied voltage to the gate electrode 13 decreases, the current supply does not decrease and light emission is maintained, but if the applied voltage to the gate electrode 13 is further increased, the current supply is reduced and The emission intensity decreases to a sufficiently small intensity compared to the emission intensity when the gate voltage is not applied in a time of less than the order of microseconds (/ sec).
- the first and second organic semiconductor layers 21 and 22 correspond to the light emitting layer 25
- a dopant may be added to the light absorbing layer. That is, the configuration may be such that the light absorption by the light absorbing layer is adjusted to a predetermined value or within a predetermined range by adding a dopant to the light emitting layer and adding Z or the dopant to the light absorbing layer.
- the layer structure of the present embodiment is the same as that of the first embodiment, but the first and second organic semiconductor layers 2 1 and 2 are formed by vapor deposition of merocyanine (MC).
- the gate electrode (G) 13 is made of magnesium.
- the light-emitting layer 25 is formed by co-evaporating aluminum quinolinol (A 1 Q 3) and coumarin 6 at a ratio of 100: 3. Further, the drain electrode 12 is formed by co-evaporating aluminum and lithium.
- FIG. 8 shows the EL emission spectrum of the light-emitting layer 25 (dashed-dotted line) and the absorption spectrum of merocyanine (MC) used in the first and second organic semiconductor layers 21 and 22 (solid line).
- MC merocyanine
- FIG. 9 is a cross-sectional view schematically illustrating a configuration of an optical thyristor-type organic EL device 10 according to a third embodiment of the present invention. '
- the difference from the first embodiment is that a hole transport layer (HT) 31 is provided between the second organic semiconductor layer 22 and the light emitting layer 25, and a hole blocking layer (HB) 32 is provided on the light emitting layer 25. That is, an electron transport layer (ET) 33 is provided on the hole block layer 32.
- the first and second organic semiconductor layers 21 and 22 are p-type organic semiconductor layers. Therefore, the organic EL element 10 has not only a function as a light emitting element but also a function as a P-type SIT which can be controlled according to the application of a voltage to the gate electrode 13.
- the second organic semiconductor layer 22, the hole transport layer 31, the hole block layer 32, and the electron transport layer 33 may be appropriately provided as necessary.
- a hole injection layer may be provided between the source electrode 11 and the first organic semiconductor layer 21.
- a voltage of 10 V is applied between the source electrode (anode) 11 and the drain electrode (cathode) 12, and the light emission control is performed according to the application of the gate voltage (V G ). It was confirmed that it could be done.
- FIG. 10 is a cross-sectional view schematically illustrating a configuration of an optical thyristor-type organic EL element 10 that is Embodiment 4 of the present invention.
- the organic EL element 10 has a function as a light emitting element.
- the configuration is such that it has a function as an n-type SIT that can be controlled according to the application of a voltage to the gate electrode 13.
- this organic EL element 10 has not only a function as a light emitting element but also a function as an n-type SIT that can be controlled according to the application of a voltage to the gate electrode 13.
- an active organic EL device having a thyristor characteristic. Therefore, for example, by configuring a display device using the organic EL element, the configuration of an electronic circuit provided in each pixel is simplified. Therefore, a low-cost, high-brightness, low-cost active drive display can be realized, and as a result, a display with a long life, high reliability, and high performance can be realized.
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- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/583,738 US20070278477A1 (en) | 2004-12-21 | 2004-12-21 | Organic Semiconductor Light-Emitting Device |
JP2005516711A JPWO2005064996A1 (ja) | 2003-12-26 | 2004-12-21 | 有機半導体発光素子 |
EP04808025A EP1699269A1 (en) | 2003-12-26 | 2004-12-21 | Organic semiconductor light-emitting device |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003433425 | 2003-12-26 | ||
JP2003-433425 | 2003-12-26 |
Publications (1)
Publication Number | Publication Date |
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WO2005064996A1 true WO2005064996A1 (ja) | 2005-07-14 |
Family
ID=34736518
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2004/019674 WO2005064996A1 (ja) | 2003-12-26 | 2004-12-21 | 有機半導体発光素子 |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP1699269A1 (ja) |
JP (1) | JPWO2005064996A1 (ja) |
KR (1) | KR100806842B1 (ja) |
CN (1) | CN1902985A (ja) |
TW (1) | TWI276030B (ja) |
WO (1) | WO2005064996A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017167477A (ja) * | 2016-03-18 | 2017-09-21 | 株式会社ジャパンディスプレイ | 表示装置 |
TWI634681B (zh) * | 2013-06-11 | 2018-09-01 | 南韓商三星顯示器有限公司 | 包含輔助電極之有機發光裝置 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2308094A1 (en) * | 2008-07-09 | 2011-04-13 | Polymer Vision Limited | Electronic device comprising static induction transistor and thin film transistor, method of manufacturing an electronic device and display panel |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002299046A (ja) * | 2001-03-30 | 2002-10-11 | Pioneer Electronic Corp | 有機エレクトロルミネセンスユニット |
JP2003187983A (ja) * | 2001-12-17 | 2003-07-04 | Ricoh Co Ltd | 有機elトランジスタ |
Family Cites Families (1)
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KR20020025918A (ko) * | 2002-02-15 | 2002-04-04 | 박병주 | 습식 공정으로 제작된 유기 반도체 디바이스 및 유기전계발광 소자 |
-
2004
- 2004-12-20 TW TW093139622A patent/TWI276030B/zh not_active IP Right Cessation
- 2004-12-21 WO PCT/JP2004/019674 patent/WO2005064996A1/ja active Application Filing
- 2004-12-21 EP EP04808025A patent/EP1699269A1/en not_active Withdrawn
- 2004-12-21 KR KR1020067012611A patent/KR100806842B1/ko not_active IP Right Cessation
- 2004-12-21 CN CNA2004800391457A patent/CN1902985A/zh active Pending
- 2004-12-21 JP JP2005516711A patent/JPWO2005064996A1/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2002299046A (ja) * | 2001-03-30 | 2002-10-11 | Pioneer Electronic Corp | 有機エレクトロルミネセンスユニット |
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Cited By (2)
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TWI634681B (zh) * | 2013-06-11 | 2018-09-01 | 南韓商三星顯示器有限公司 | 包含輔助電極之有機發光裝置 |
JP2017167477A (ja) * | 2016-03-18 | 2017-09-21 | 株式会社ジャパンディスプレイ | 表示装置 |
Also Published As
Publication number | Publication date |
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EP1699269A1 (en) | 2006-09-06 |
TW200527356A (en) | 2005-08-16 |
TWI276030B (en) | 2007-03-11 |
KR100806842B1 (ko) | 2008-02-22 |
CN1902985A (zh) | 2007-01-24 |
KR20060113742A (ko) | 2006-11-02 |
JPWO2005064996A1 (ja) | 2007-12-20 |
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