WO2005044777A1 - Tetra(meth)acrylate compound, curing composition containing same, and cured products of those - Google Patents

Tetra(meth)acrylate compound, curing composition containing same, and cured products of those Download PDF

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Publication number
WO2005044777A1
WO2005044777A1 PCT/JP2004/016419 JP2004016419W WO2005044777A1 WO 2005044777 A1 WO2005044777 A1 WO 2005044777A1 JP 2004016419 W JP2004016419 W JP 2004016419W WO 2005044777 A1 WO2005044777 A1 WO 2005044777A1
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Prior art keywords
meth
dicarboxylic acid
acid residue
tetra
compound
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PCT/JP2004/016419
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French (fr)
Japanese (ja)
Inventor
Noboru Kohiyama
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Taiyo Ink Manufacturing Co., Ltd.
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Priority to JP2005515314A priority Critical patent/JPWO2005044777A1/en
Publication of WO2005044777A1 publication Critical patent/WO2005044777A1/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/533Monocarboxylic acid esters having only one carbon-to-carbon double bond
    • C07C69/54Acrylic acid esters; Methacrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/76Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/76Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • C07C69/80Phthalic acid esters
    • C07C69/82Terephthalic acid esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F22/10Esters
    • C08F22/1006Esters of polyhydric alcohols or polyhydric phenols, e.g. ethylene glycol dimethacrylate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/285Permanent coating compositions
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • H05K3/4676Single layer compositions

Definitions

  • Tetra (meth) atalylate compounds Tetra (meth) atalylate compounds, curable compositions containing them, and their cured products ''
  • the present invention relates to a novel tetra (meth) atalylate compound, a curable composition containing the same, and a cured product thereof, and is used for various applications such as resist inks, paints, and molding materials. It can be used in some way.
  • the present invention relates to a curable composition used for the production of printed wiring boards and the like, and more particularly, to crack resistance due to heat cycling, excellent electrical insulation, and PCT (Brayer 'Tucker Test)
  • the present invention also relates to a curable composition that provides a cured product having excellent properties such as resistance, adhesion, solder heat resistance, chemical resistance, and electroless plating resistance, and a cured product thereof. Height
  • curable compositions containing (meth) acrylate compounds having excellent reactivity and processability have been widely used.
  • (meth) acrylate compounds, polymerization initiators, and fiber reinforcing materials such as carbon fiber, glass fiber, and aramide fiber
  • the composition must be used in a large amount.
  • the (meta) atalay toy dani is an important 'component.
  • a composite material obtained by using a curable composition containing a conventional (meta) atalylate ligated product can satisfy both the heat characteristics and flexibility under high humidity. It is not possible to meet the demand for higher performance. That is, a composite material obtained by using a curable composition containing a commercially available (meth) atalylate conjugate had poor thermal and mechanical long-term reliability due to moisture. Such long-term reliability problems are undesirable in other fields, such as the electronic materials field, which is not limited to the aerospace field.
  • electronic materials such as resist materials for printed wiring boards, particularly cured films of curable compositions used as solder resists, have excellent electrical insulation properties and a PCT (pressure "tucker” test). ) Excellent properties such as resistance, adhesion, solder heat resistance, chemical resistance, and electroless plating resistance are required.
  • a solder resist formed using a curable composition containing a conventional (meth) atalylate compound has to satisfy both the crack resistance due to a heat cycle and the above-mentioned properties.
  • the reality is that you can't.
  • di- (meth) atalylate compounds obtained by reacting terephthalic acid chloride with hydroxybutyl (meth) atalylate have been disclosed as (meth) atalylate 'compounds having low hygroscopicity (Japanese Unexamined Patent Publication (KOKAI) 2003—2919).
  • this (meth) acrylate ester has two unsaturated groups in one molecule, it has poor photocuring and / or thermosetting properties, resulting in poor heat resistance under high humidity. There is a problem.
  • a (meth) atalyl conjugate having excellent photocurability and Z or heat curability a hexa (meth) obtained by reacting terephthalic acid chloride with pentaerythritol tri (meth) atalylate is preferred. Attalay toy swords (see JP-A-65-252547).
  • this (meth) acrylate compound has six unsaturated groups in one molecule, it is excellent in photocurability and Z or thermosetting properties, but it becomes highly crosslinked by curing. Therefore, a hard and brittle cured product is formed. Therefore, the cured product lacks flexibility and may be broken during aging under high humidity.
  • an object of the present invention is to provide a hardened product having excellent photocurability and Z or thermosetting properties, and also having excellent moisture absorption resistance, heat resistance under high humidity, and flexibility. It is another object of the present invention to provide a novel tetra (meth) atalylate compound, a curable composition containing the same, and a cured product thereof.
  • Another object of the present invention is to have excellent photo-curing and / or thermo-curing properties, as well as excellent crack resistance due to heat cycles, electrical insulation, PCT (pressure 'cooking force. Test) resistance,
  • An object of the present invention is to provide a curable composition that provides a cured product that sufficiently satisfies various properties such as adhesion, solder heat resistance, chemical resistance, and electroless plating resistance, and a cured product thereof. Disclosure of the invention
  • a (meth) atare toy dagger is provided.
  • RRR 3 and R 4 represent a hydrogen atom or a methyl group, and X represents a dicarboxylic acid residue.
  • (meth) acrylate is a general term for acrylate and methacrylate.
  • acrylic acid or methacrylic acid is referred to as (meth) acrylic acid, and acryloyl or methacryloyl.
  • the group is referred to as a (meth) atalyloyl group.
  • the dicarboxylic acid residue X is an aliphatic dicarboxylic acid residue or an aromatic dicarboxylic acid residue.
  • the dicarboxylic acid residue X is an aromatic dicarboxylic acid residue, preferably, the dicarboxylic acid residue X is represented by the following formula:
  • the aromatic dicarboxylic acid residues represented by (Bl) to (B7) are more preferably the aromatic dicarboxylic acid residues represented by the following formula (B3).
  • the tetra (meth) acrylate derivatized product of the present invention has four unsaturated groups in one molecule and a pair of units each having a (meth) atalyloyl group at a forked terminal, It has a structure linked by an alkylene, a polymethylene, an aromatic ring, or the like via a thermally stable ester bond or an ester bond.
  • the material is excellent in moisture absorption resistance, heat resistance under high humidity and flexibility.
  • a curable composition comprising the tetra (meth) atalylate compound represented by the general formula (1).
  • a tetra (meth) acrylate conjugate in which the dicarboxylic acid residue X is an aliphatic dicarboxylic acid residue or an aromatic dicarboxylic acid residue in the general formula (1) is used.
  • the dicarboxylic acid residue X is an aromatic dicarboxylic acid residue
  • the dicarboxylic acid residue X is any of the aromatic dicarboxylic acid residues represented by the formulas (B1) to ( ⁇ 7).
  • the composition contains, in addition to the above-mentioned tetra (meth) phthalate compound, another radically polymerizable monomer and Z or a polymerization initiator, or Contains fiber reinforcement.
  • the cured product contains a fiber reinforcement such as glass fiber, carbon fiber, and aramide fiber.
  • the curable composition contains a tetra (meth) atalylate compound having the above-mentioned structure, so that the curable composition is excellent in photocurability and / or heat curability, and the cured product has the same moisture absorption resistance. Excellent heat resistance and flexibility under high humidity.
  • the dicarboxylic acid residue X is an aromatic dicarboxylic acid residue
  • the dicarboxylic acid residue X is any of the aromatic dicarboxylic acid residues represented by the formulas (B1) to (B7). And more preferably an aromatic dicarboxylic acid residue of the above formula (B3).
  • the curable composition of the present invention in addition to the components described above, (E) a compound having two or more cyclic ethers in a molecule, or F)
  • the curing catalyst, some resins further contain (G) other radically polymerizable monomers.
  • the curable composition comprises (B) tetra (meth) having the above-mentioned structure together with an alkali-soluble (A) compound containing a propyloxyl group, (C) a polymerization initiator, and (D) a diluting solvent. Since it contains an atalylate compound, it can be alkali-developed and has excellent photo-curing and / or thermo-curing properties, and the cured product has excellent resistance to cracks due to heat cycles, electrical insulation, PCT resistance, adhesion, solder heat resistance, chemical resistance, electroless gold plating Excellent in properties such as resistance.
  • thermosetting in addition to each of the above components, the thermosetting after exposure and development causes an electric Various properties such as insulation, PCT resistance, adhesion, solder heat resistance, chemical resistance, and electroless plating resistance can be further improved.
  • Furthermore by including (F) a curing catalyst, the curing start temperature can be reduced. It can lower the temperature and accelerate the thermosetting reaction.
  • the photocurability is further improved.
  • FIG. 1 is a graph showing an infrared absorption spectrum of a tetra (meth) atalylate compound obtained in Synthesis Example 1. '
  • FIG. 2 is a graph showing a nuclear magnetic resonance spectrum of the tetra (meth) atalylate compound obtained in Synthesis Example 1.
  • FIG. 3 is a graph showing a chromatogram of the tetra (meth) atalylate compound obtained in Synthesis Example 1 by high performance liquid chromatography. ⁇
  • FIG. 4 is a graph showing an infrared absorption spectrum of a tetra (meth) T acrylate compound obtained in Synthesis Example 2.
  • FIG. 5 is a graph showing a nuclear magnetic resonance spectrum of a tetra (meth) atalylate compound obtained in Synthesis Example 2.
  • FIG. 6 is a graph showing a chromatogram of the tetra (meth) atalylate toyori product obtained in Synthesis Example 2 by high performance liquid chromatography.
  • FIG. 7 is a graph for explaining a method for obtaining a heat resistant temperature from a TG curve.
  • FIG. 8 is a graph showing a chromatogram of the oil obtained in Synthesis Example 3 by high performance liquid chromatography.
  • FIG. 9 is a graph showing an infrared absorption spectrum of the tetra (meth) acrylate conjugate obtained in Synthesis Example 3.
  • FIG. 10 is a graph showing a nuclear magnetic resonance spectrum of a tetra (meth) atalylate toyid product obtained in Synthesis Example 3.
  • FIG. 11 High performance liquid chromatography of the tetra (meth) atalylate compound obtained in Synthesis Example 3 1 is a graph showing a chromatogram according to Example 1.
  • FIG. 12 is a graph showing a chromatogram of the oil obtained in Synthesis Example 4 by high performance liquid chromatography. ''
  • FIG. 13 is a graph showing an infrared absorption spectrum of the tetra (meth) acrylate derivative obtained in Synthesis Example 4.
  • FIG. 14 is a graph showing a nuclear magnetic resonance spectrum of the tetra (meth) atalylate compound obtained in Synthesis Example 4.
  • FIG. 15 is a graph showing a chromatogram of the obtained tetra (meth) atalylate toyori product obtained by high performance liquid chromatography. .
  • FIG. 16 is a graph showing an infrared absorption spectrum of the liquid obtained in Synthesis Example 4.
  • FIG. 17 is a graph showing a magnetic resonance spectrum of the liquid obtained in Synthesis Example 4.
  • FIG. 18 is a graph showing a chromatogram of the liquid obtained in Synthesis Example 4 by high performance liquid chromatography.
  • FIG. 19 is a graph showing a chromatogram of the oil obtained in Synthesis Example 5 by high performance liquid chromatography.
  • FIG. 20 is a graph showing an infrared absorption spectrum of the tetra (meth) atalylate ligated product obtained in Synthesis Example 5. ⁇
  • FIG. 21 is a graph showing a nuclear magnetic resonance spectrum of a tetra (meth) atalylate conjugate obtained in Synthesis Example 5. 1
  • FIG. 22 is a graph showing a chromatogram by high performance liquid chromatography of the tetra (meth) acrylate conjugate obtained in Synthesis Example 5.
  • FIG. 23 is a graph showing a nuclear magnetic resonance spectrum of a mixture of the tetra (meth) atalylate compound obtained in Synthesis Example 6 and 3-attaryloyxy-2-hydroxypropyl methacrylate.
  • FIG. 24 is a graph showing a chromatogram of a mixture of a tetra (meth) acrylate conjugate obtained in Synthesis Example 6 and 3-attaryloyxyx-2-hydroxypropyl methacrylate by high performance liquid chromatography.
  • FIG. 25 The tetra (meth) atalylate compound obtained in Synthesis Example 6 and 3-acryloylic acid 4 is a graph showing an infrared absorption spectrum of a mixture with hydroxypropyl methacrylate. ⁇ '
  • FIG. 26 is a graph showing a nuclear magnetic resonance spectrum of 3, -attaryloy xy-2-hydroxypropyl methacrylate.
  • FIG. 27 is a graph showing a chromatogram of 3-attaryloy oxy-2-hydroxypropyl methacrylate according to high performance liquid chromatography.
  • FIG. 28 shows a nuclear magnetic resonance spectrum of a monocarboxylic acid having a structure represented by the following formula (3).
  • FIG. 29 is a graph showing a nuclear magnetic resonance spectrum of a mixture of the tetra (meth) acrylate conjugate obtained in Synthesis Example 7 and 3-attaryloyoxy2 _′- hydroxypropyl methacrylate.
  • FIG. 30 is a graph showing a nuclear magnetic resonance spectrum of a mixture of the tetra (meth) atalylate compound obtained in Synthesis Example 8 and 3-attaryloy xy-12-hydroxypropyl methacrylate. ''
  • FIG. 31 Chromatography by gel permeation chromatography of a mixture of the tetra (meth) acrylate conjugate obtained in Synthesis Example 8 and 3-acryloyl oxy-1-hydroxypropyl methacrylate
  • FIG. 32 is a graph showing an infrared absorption spectrum of a mixture of the tetra (meth) acrylate conjugate obtained in Synthesis Example 8 and 3-attaryloyloxy-2-hydroxypropyl methacrylate.
  • FIG. 33 is a graph showing a chromatogram by gel permeation chromatography of 3-atalylyloxy-2-hydroxypropyl methacrylate.
  • the present inventors have conducted intensive studies in order to solve the above-mentioned problems, and as a result, the tetra (meth) atalylate represented by the general formula (1) is excellent in photocurability and / or heat curability. Further, it has been found that the cured product is excellent in moisture absorption resistance, heat resistance under high humidity and flexibility.
  • the present inventor has proposed a tetra (meth) atalylate toy compound represented by the general formula (1).
  • Curable composition containing, preferably, further curable composition containing other radically polymerizable monomer and Z or a polymerization initiator or further a fiber reinforcing material.Excellent photocurability and / or heat curability.
  • the present invention has been found to give a cured product having excellent moisture absorption resistance and excellent heat resistance and flexibility under high humidity. That is, the tetra (meth) atalylate compound represented by the general formula (1) used in the curable composition of the present invention is
  • the curable composition containing the radical polymerization polymerizable monomer, the polymerization initiator, the fiber reinforcing material, and the like, together with the tetra (meth) acrylate conjugate, has excellent photocurability and / or excellent curability.
  • the present inventors have proposed the tetra (meth) atari represented by the general formula (1) together with the carboxyl group-containing conjugate (A), the polymerization initiator (C), the diluting solvent (D) and the like.
  • the curable composition containing the rate compound (B) exhibits excellent photo-curing and / or thermo-curing properties, and the cured product has the above-mentioned electrical insulating properties and PCT in addition to excellent crack resistance. It gives a cured product with excellent properties such as resistance, adhesion, solder heat resistance, chemical resistance, and electroless plating resistance.
  • the tetra (meth) acrylate as described above is excellent in light curability and / or heat curability, excellent in water resistance, and gives a cured product excellent in toughness. It contains a tallylate compound (B), an alkali-soluble carboxyl group-containing compound (A), a polymerization initiator (C) and a diluting solvent (D), and preferably contains two or more per molecule.
  • the curable composition containing the compound (E) having a cyclic ether, the curing catalyst (F), or further another radically polymerizable monomer (G) is excellent in alkali developability and excellent in alkali development. It shows photo-curing and / or thermo-curing properties, and its cured product is necessary for obtaining the above-mentioned properties by the above-mentioned tetra (meth) acrylate compound (B). And heat resistance.
  • the tetra (meth) atalylate conjugate of the present invention can be obtained by various methods.
  • esterification of 3- (meth) acryloyl oxy-2-hydroxypropyl (meth) acrylate represented by the following general formula (2) with dicarboxylic acid chloride or dicarboxylic acid or its anhydride or dicarboxylic acid ester. is there.
  • preferred methods include a dehydrochlorination reaction of 3- (meth) atalyloic oxy-2-hydroxypropyl (meth) atalylate with lunar aliphatic dicarboxylic acid chloride or aromatic dicarboxylic acid chloride, and 3- ( This is an esterification by a dehydration condensation reaction between a (meth) ataryloy xy-2-hydroxypropyl (meth) atalylate and an aliphatic dicarbonic acid.
  • RR 2 represents a hydrogen atom or a methyl group.
  • the above-mentioned 3 (meth) ataryloy oxy-2-hydroxypropyl (meth) acrylate is a compound that can be obtained by the reaction between (meth) acrylic acid and glycidyl (meth) atalylate. It can also be obtained by the reaction of acid and / or its esters with glycerin and the reaction of (meth) acrylic acid with glycidol.
  • aliphatic dicarboxylic acid chloride examples include saturated aliphatic dicarboxylic acid halides such as succinic acid chloride, glutaric acid chloride, adipic acid chloride, suberic acid chloride, azelaic acid chloride, and sebacic acid chloride, and fumaric acid chloride. And aliphatic unsaturated dicarboxylic acid halides.
  • Examples of the aliphatic dicarboxylic acid include saturated aliphatic dicarboxylic acids such as oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, and sebacic acid;
  • Examples include aliphatic unsaturated dicarboxylic acids such as maleic acid and fumaric acid
  • examples of aliphatic dicarboxylic anhydrides include succinic anhydride and dartaric anhydride.
  • aliphatic dicarboxylic acid ester for example, aliphatic saturated dicarboxylic acid esters such as dimethyl malonate, dimethyl succinate, dimethyl gnoletate, dimethyl adipate, dimethyl suberate and dimethyl sebacate; And aliphatic unsaturated dicarboxylic acid esters such as dimethyl maleate.
  • aromatic dicarboxylic acid chloride examples include o-phthalic acid chloride, isophthalic acid chloride, terephthalic acid chloride and the like.
  • aromatic dicarboxylic acid examples include o, -phthalic acid, isophthalic acid, terephthalic acid, 1,4-naphthalenedicarboxylic acid, 2,3-naphthalenedicarboxylic acid, and 2,6-naphthalenedicarboxylic acid. Acid, 2,7-naphthalenedirubonic acid and the like; and aromatic dicarboxylic anhydrides such as phthalic anhydride.
  • aromatic dicarboxylic acid esters examples include dimethyl terephthalate and dimethyl 2,6-naphthalenedicarboxylic acid.
  • aromatic dicarboxylic acid chlorides aromatic dicarboxylic acids or anhydrides, and aromatic dicarboxylic acid esters
  • aromatic dicarboxylic acid chlorides particularly terephthalic acid
  • Chloride and naphthalenedicarboxylic acid chloride are preferred.
  • the esterification reaction of aliphatic dicarboxylic acid chloride or aromatic dicarboxylic acid chloride with 3- (meth) ataliyloxy-2-hydroxypropyl (meth) acrylate is carried out by 3- (meth) ataryloyxoxy-2-hydroxy.
  • the propyl (meth) atalylate and the aliphatic dicarboxylic acid chloride or the aromatic dicarboxylic acid chloride may be placed in a reaction vessel, and the reaction may be carried out in advance.
  • Hydroxypropyl (meth) acrylate may be placed in a reaction vessel, and aliphatic dicarboxylic acid chloride or aromatic dicarboxylic acid chloride may be added dropwise.
  • aliphatic dicarboxylic acid chloride or aromatic dicarboxylic acid chloride may be added.
  • the dicarboxylic acid chloride is placed in the reaction vessel in advance, and the 3- (meth) ataryloy Kishipuropinore (meth) may be performed by adding the Atari rate.
  • the proportion of 3_ (meth) acryloyl oxy-2-hydroxypropyl (meth) acrylate is too high, unreacted 3- (meth) atalylo xy 2 -hydroxypropinole (meth) acrylate will remain. However, it is not economically favorable. Accordingly, the molar ratio of 3- (meth) ataryloy xy-2-hydroxypropyl (meth) atarylate to aliphatic dicarboxylic acid chloride is 3- (meth) acrylic oxy-2-hydroxypropyl (meth) in molar ratio.
  • the above mixing ratio is the same even when an aliphatic dicarboxylic acid or its anhydride or an aliphatic dicarboxylic acid ester, or an aromatic dicarboxylic acid or its anhydride or an aromatic dicarboxylic acid ester is used. is there.
  • the reaction temperature in the esterification reaction of 3- (meth) ataryloy xy-2-hydroxypropyl (meth) atalylate with aliphatic dicarbonic acid chloride is from 70 to 150 ° C, preferably from 30 to 120 ° C. ° C, and the reaction can be performed under reduced pressure, normal pressure, or increased pressure.
  • the reaction temperature in the esterification reaction of 3- (meth) ataryloy xy-2-hydroxypropyl (meth) atalylate with aromatic dicarboxylic acid chloride is 0 to 150 ° C, preferably room temperature to 120 ° C. Yes, the reaction can be carried out under reduced pressure, normal pressure, or increased pressure. 1
  • the esterification reaction is preferably performed in an organic solvent.
  • organic solvent include aromatic hydrocarbons such as benzene, toluene, and xylene; ethers such as dimethyl ether, tetrahydrofuran,, and dioxane; and aliphatic hydrocarbons such as n -heptane, cyclohexane, and n- hexane. Hydrogens, nitrogen compounds such as formamide, N, N-dimethylformamide and the like are preferably used. These solvents can be used alone or in combination of two or more. The amount of the solvent to be used is not particularly limited.
  • the amount of 3- (meth) atalyloic oxy-2-hydroxypropyl (meth) atalylate and aliphatic dicarboxylic acid chloride or aromatic dicarboxylic acid For a total of 100 parts by mass, the range of 50 to: L000 parts by mass is preferable.
  • the reaction temperature and the amount of the solvent used are determined when aliphatic dicarboxylic acid or its anhydride or aliphatic dicarboxylic acid ester, or aromatic dicarboxylic acid or its anhydride or aromatic dicarboxylic acid ester is used. The same applies to
  • the esterification reaction is preferably performed in the presence of a polymerization inhibitor.
  • a polymerization inhibitor hydroquinone, methylhydroquinone, hydroquinone monomethyl ether, catechol, pyrogallol, phenothiazine, 4-methoxyphenol, 4-tert-butylcatechol, and the like are suitably used.
  • These polymerization inhibitors can be used alone or in combination of two or more.
  • the amount of the polymerization inhibitor to be used is usually within the range of 0.0015 parts by mass with respect to 100 parts by mass of 3- (meth) a.cryloyl xy-2-hydroxypropyl (meth) atalylate. .
  • the amount of the polymerization inhibitor to be used is not limited to the case where aliphatic dicarboxylic acid or its anhydride or aliphatic dicarboxylic acid ester, or aromatic dicarboxylic acid or its anhydride or aromatic dicarboxylic acid ester is used. The same is true. .
  • tertiary amines such as trimethylamine, triethylamine, 4-dimethylaminopyridine and the like are appropriately used in order to capture hydrogen chloride generated at the time of esterification. These tertiary amines can capture hydrogen chloride by forming quaternary ammonium salts with hydrogen chloride. These tertiary amines can be used alone or in combination of two or more.
  • aromatic dicarboxylic acid chloride aromatic dicarboxylic acid or its anhydride, or aromatic dicarboxylic acid ester
  • triethylamine is added.
  • an extraction solvent such as ethyl acetate or methylene chloride is added to extract a reaction mixture containing the tetra (meth) atalylate compound of the present invention.
  • an extraction solvent such as ethyl acetate or methylene chloride is added to extract a reaction mixture containing the tetra (meth) atalylate compound of the present invention.
  • an aqueous solution of sodium hydrogen carbonate in order to remove the aromatic dicarboxylic acid chloride remaining in the reaction mixture.
  • the above esterification reaction is carried out in an aromatic hydrocarbon such as benzene, toluene and xylene, an ether such as getyl ether, tetrahydrofuran and dioxane, and a fat such as n-heptane., Cyclohexane and n-xane.
  • aromatic hydrocarbon such as benzene, toluene and xylene
  • ether such as getyl ether, tetrahydrofuran and dioxane
  • a fat such as n-heptane., Cyclohexane and n-xane.
  • Condensation agents such as dicyclohexylcarbodiimide and 1-ethyl-3- (3-dimethylaminopropyl) carbodiimide hydrochloride in organic solvents such as aromatic hydrocarbons, nitrogen compounds such as formamide and N, N-dimethylformamide Tertiary amines such as trimethylamine, triethylamine, 4-dimethylaminopyridine, and the like, using hydroquinone, methyl hydroquinone, hydroquinone monomethyl ether, catechol, pyrogallol, Pheno thiazine, 4-methoxypheno Le, can also be carried out in the presence of a polymerization inhibitor such as 4-tertiary butyl catechol.
  • organic solvents such as aromatic hydrocarbons, nitrogen compounds such as formamide and N, N-dimethylformamide
  • Tertiary amines such as trimethylamine, triethylamine, 4-dimethylaminopyridine, and the like
  • the tetra (meth) atalylate compound of the present invention can be used as a reactive diluent and can impart flexibility.
  • 3- (meth) atalyloyloxy_2-hydroxypropyl (meth) atalylate represented by the general formula (2) can be mixed.
  • the mixing amount is sufficient at 70 parts by mass or less, preferably at 50 parts by mass or less, based on 100 parts by mass of the tetra (meth) acrylate ester compound. It is not preferable that the mixing amount of the di (meth) atalylate compound is more than 70 parts by mass because the heat resistance of the tetra (meth) atalylate compound may be reduced.
  • the tetra (meth) atalylate compound of the present invention can be rapidly produced by irradiation with active energy rays and / or heating in the presence of a polymerization initiator (photoradical polymerization initiator, thermal radical polymerization initiator).
  • a polymerization initiator photoradical polymerization initiator, thermal radical polymerization initiator.
  • radical polymerization it can be cured by simply heating, and can also be cured by X-ray or electron beam irradiation.
  • the tetra (meth) atalylate toy conjugate of the present invention is useful as a resin matrix of a composite material (fiber reinforced plastic). Therefore, the tiger (meta) atalylate toy compound of the present invention is excellent in photo-curability and Z or thermo-curability as described above, and the cured product has moisture absorption resistance and heat resistance under high humidity. Due to its properties of excellent flexibility and flexibility, it is extremely useful as a composite material (fiber reinforced plastic), especially in the aerospace industry, but as a curable component in various resist materials and paints for printed wiring boards. Can also be used advantageously.
  • curable composition containing the tetra (meth) atalylate compound represented by the general formula (1), in particular, other radically polymerizable monomers and Z or a polymerization initiator, or further fiber reinforced.
  • the curable composition containing materials and the like will be described.
  • radical polymerizable monomer examples include styrene derivatives such as styrene and divinylbenzene; 2-hydroxyethyl (meth) atalylate, 2-hydroxypropyl (meth) atalylate, and 3- (meth) atalyloyl.
  • hydroxyl-containing atalylates such as pentaerythritol triatalylate and dipentaerythritol pentaatalylate
  • water-soluble such as polyethylene glycol diatalylate and polypropylene glycol diatalylate
  • Polymethyl alcohol acrylates such as trimethylolpropane triatalylate, pentaerythritol tetraatalylate, dipentaerythritol hexaatalylate, etc .
  • Lopan hydrogenated Polyfunctional alcohols such as bisphenol A or polyhydric phenols such as bisphenol A and biphenol: acrylates of ethylene oxide adducts and / or propylene oxide adducts; polyisocyanates which are modified isocyanates of the hydroxyl group-containing acrylates Functional or monofunctional polyurethane acrylates; epoxy acrylates which are (meth) acrylic acid adducts
  • 62-5252 Toys ⁇ product and the like which alone or may be used two or more kinds.
  • the purpose of using these radically polymerizable monomers is to increase the photocurability and the heat or curability of the composition.
  • the radically polymerizable monomer which is liquid at room temperature serves not only to increase the photocurability and / or the thermosetting property of the composition, but also to adjust the composition to a viscosity suitable for various coating methods.
  • the amount of these radically polymerizable monomers can be arbitrarily determined according to the purpose of use and the desired physical properties. Usually, however, 100 parts by mass of the above-mentioned tetra (meth) acrylate is 200 parts by mass or less. Is preferred. '
  • the tetra (meth) atalylate compound used in the present invention can be cured by simply heating and can be cured by X-ray or electron beam irradiation. It is preferable to use such a polymerization initiator since radical polymerization is rapidly performed by irradiation with active energy rays and Z or heating in the presence of a photoradical (polymerization initiator, thermal radical polymerization initiator). . ⁇
  • the polymerization initiator a photo-radical polymerization initiator and a thermal-radical polymerization initiator as described below can be suitably used, and the compounding amount thereof is 100 parts by mass of the tetra (meth) atalylate compound. (In the case of using the radical polymerizable monomer, the total amount of these is 100 parts by mass.) The amount is preferably 30 parts by mass or less. In the case of a thermal radical polymerization initiator, the ratio is preferably 0.1 to 10 parts by mass.
  • Examples of the fiber reinforcing material include glass fiber, carbon fiber, and aramide fiber. ⁇ These fibers can be used alone or as a mixture of two or more. '' Ratio in the composition of the fiber reinforcement, preferably 10 to 80% by volume, more preferably rather 50-70 volume 0/0 turbocharger.
  • the curable composition of the present invention includes the above-mentioned 3- (meth) atalyloic oxy-2-hydroxypropyl (meth) atalylate, aliphatic dicarboxylic acid chloride or aliphatic dicarboxylic acid, or It may contain an unreacted monomer at the time of the esterification reaction with an anhydride or an aliphatic dicarboxylic acid ester, or a by-product such as a generated di (meth) atalylate compound or a polymer.
  • the curable composition of the present invention may further contain a solvent as described below, if necessary, alone or as a mixture of two or more kinds.
  • the purpose of the solvent is to dissolve the tetra '(meth) atalylate compound, the radical polymerizable monomer, the polymerization initiator and the like, and to adjust the composition to a viscosity suitable for the coating method.
  • the compounding amount of the solvent can be an arbitrary amount according to the coating method.
  • the curable composition of the present invention may be mixed with an inorganic thickener as described below to the extent that the properties of the cured product are not degraded.
  • the ratio is sufficient, and for example, the ratio is 0.2 to 20 parts by mass, preferably 0.5 to 10.0 parts by mass with respect to 100 parts by mass of the tetra (meth) atalylate conjugate.
  • Inorganic fillers and organic fillers described below can be used alone or in combination of two or more.
  • a suitable amount of the filler is 10 to 300 parts by mass, preferably 30 to 200 parts by mass, per 100 parts by mass of the tetra (meth) atalylate toy conjugate.
  • the curable composition of the present invention may further comprise a coloring agent, a thermal polymerization inhibitor, an antifoaming agent, a Z or leveling agent, a silane coupling agent, and the like as described below. Such known and commonly used additives can be blended. Furthermore, the curable composition of the present invention may optionally contain a flame retardant such as a halogen-based flame retardant, a phosphorus-based flame retardant, and an antimony-based flame retardant for the purpose of obtaining flame retardancy.
  • the compounding amount of the flame retardant is usually from! To 200 parts by mass, preferably from 5 to 50 parts by mass with respect to 100 parts by mass of the tetra (meth) acrylate compound. 1 o ratio. When the blending amount of the flame retardant is within the above range, the flame retardancy, moisture absorption resistance, heat resistance and flexibility under high humidity of the cured product are highly balanced, which is preferable.
  • the tetra (meth) atalylate compound according to the present invention is extremely useful as a resin matrix of a composite material (fiber-reinforced plastic), particularly a composite material used in the aerospace industry.
  • This type of composite material is generally obtained by impregnating a fiber-reinforced material, for example, a fiber-reinforced material composed of fibers such as carbon fiber, glass fiber, and aramid fiber (for example, Kepler fiber) with a liquid curable composition. , followeded by curing.
  • the fiber reinforcement used at this time can take various forms, for example, a multi-layer fiber, a two-dimensional sheet, or a three-dimensional or multi-dimensional woven fabric. .
  • a curable composition containing another radically polymerizable monomer, a polymerization initiator, an initiator, and a fiber reinforcing material together with the tetra (meth) atalylate ligated product is charged into a mold, or After the fiber and the reinforcing material are put in a mold in advance, the curable composition of the present invention containing no fiber reinforcing material is poured into the mold, and then the mold filled with the composition is added. By heating and curing, a fiber-reinforced plastic can be obtained. Alternatively, a fiber-reinforced plastic can be obtained by curing the composition filled in the mold by irradiation with active energy.
  • a low-pressure mercury lamp, a medium-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a xenon lamp, a metal nitride lamp, or the like is suitable as a light source for irradiating active energy rays.
  • laser beams, X-rays, and electron beams can also be used as active energy rays.
  • This composition contains, in addition to the tetramethyl (meth) acrylate compound (B), an alkali-soluble carboxyl group-containing compound (A), a polymerization initiator (C), and a diluent solvent (D). And preferably further contains, as a thermosetting component, a compound (E) having two or more cyclic ethers in one molecule or a curing catalyst (F), and if necessary, other radical polymerizable components. Contains monomer (G).
  • the carboxyl group-containing compound (A) used in the curable composition is a compound having at least one, preferably two or more carboxyl groups in one molecule.
  • a carboxyl group-containing photosensitive material having an ethylenically unsaturated double bond itself. Both resins and resin containing a carboxyl group having an ethylenically unsaturated double bond can be used, and are not limited to specific ones. Oligomers or polymers).
  • a compound having an unsaturated double bond (b) and a glycidyl (meth) acrylate copolymer have one carboxy group in one molecule in the epoxy group, and have an ethylenically unsaturated bond.
  • a carboxyl group-containing resin obtained by reacting an organic acid (i) having no carboxyl group, and reacting a generated secondary hydroxyl group with a saturated or unsaturated polybasic anhydride (d),
  • a compound having an epoxy group and an unsaturated double bond in a carboxyl group-containing resin obtained by reacting a saturated or unsaturated polybasic anhydride (d) with a hydroxyl group-containing polymer (j). carboxyl group-containing photosensitive resin obtained by further reacting (c),
  • a carboxyl group-containing photosensitive resin obtained by reacting a saturated or unsaturated polybasic acid anhydride (d),
  • a polyfunctional oxetane compound (n) having at least two oxetane rings in one molecule is reacted with an unsaturated monocarboxylic acid (h) to form a primary hydroxyl group in the resulting modified oxetane resin.
  • a carboxyl group-containing photosensitive resin obtained by reacting a saturated or unsaturated polybasic acid anhydride (d),
  • reaction product of the nopolak phenolic resin (s) and the alkylene oxide (t) is reacted with an unsaturated monocarboxylic acid (h), and the obtained reaction product is reacted with a saturated or unsaturated polybasic anhydride.
  • the carboxyl group-containing resin (1) includes an unsaturated carboxylic acid (a) such as (meth) acrylic acid and an unsaturated double bond such as styrene, ⁇ -methylstyrene, lower alkyl (meth) acrylate, and isobutylene.
  • the carboxyl group-containing photosensitive resin (2) is a compound (b) having an unsaturated carboxylic acid (a) and an unsaturated double bond (b).
  • a resin, for example, glycidyl (meth) acrylate, and the unsaturated double bond of the compound is introduced into the side chain.
  • a part of the carboxyl group of the unsaturated carboxylic acid (a) which is one of the monomer components of the copolymer, remains unreacted. It is soluble.
  • the carboxyl group-containing photosensitive resin (3) is a compound (c) having an epoxy group and an unsaturated double bond in the molecule, for example, glycidyl (meth) acrylate, a-methyldaricidyl (meth) Acrylate and the like, and the soil hydroxy group of the copolymer of the compound (b) having an unsaturated double bond are reacted with the carboxyl group of the unsaturated carboxylic acid (a) to form the unsaturated carboxylic acid.
  • glycidyl (meth) acrylate for example, glycidyl (meth) acrylate, a-methyldaricidyl (meth) Acrylate and the like
  • the soil hydroxy group of the copolymer of the compound (b) having an unsaturated double bond are reacted with the carboxyl group of the unsaturated carboxylic acid (a) to form the unsaturated carboxylic acid.
  • the secondary hydroxyl group generated by the above addition reaction is added to a polybasic anhydride (d) such as phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, or the like.
  • a polybasic anhydride such as phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, or the like.
  • the carboxyl group-containing photosensitive resin (4) has an unsaturated double bond and an acid anhydride (e) such as maleic anhydride, itaconic anhydride and the like.
  • a half-ester is obtained by reacting a monomer obtained by reacting carbolactone or a hydroxyl group such as a macromonomer obtained by reacting a polyfunctional prolactone oligomer with (meth) atalylate to form a half-ester.
  • the carboxyl group-containing photosensitive resin of the above (5) includes bisphenol A type, bisphenol F type, bisphenol S type, phenol nopolak type, cresol novolak type, biphenol type, bixylenol type, N —The epoxy group of a known 'conventional epoxidized' compound such as a glycidinole type (g) is reacted with the hydroxyl group of an unsaturated monocarboxylic acid (h) such as (meth) acrylic acid, for example, epoxy epoxide A resin in which a carboxyl group is introduced into a side chain by generating a rate and performing an esterification reaction of the polybasic acid anhydride (d) with the secondary hydroxyl group generated by the above addition reaction.
  • an unsaturated monocarboxylic acid such as (meth) acrylic acid
  • the carboxyl group-containing resin (6) has a compound having the unsaturated double bond and no hydroxyl group or acid group, such as alkyl, (meth) acrylate, substituted or unsubstituted styrene.
  • the organic acid (i) having one carboxyl group per molecule and no ethylenically unsaturated bond For example, a resin obtained by reacting an alkyl carboxylic acid having 2 to 17 carbon atoms, an alkyl carboxylic acid having an aromatic group, or the like, and adding the polybasic anhydride (d) to a secondary hydroxyl group produced. is there.
  • the carboxyl group-containing resin (7) is a hydroxyl group-containing polymer (j), for example, an olefin-type hydroxyl group-containing polymer, an acrylic polyol, a rubber-based polyol, a polybutyral, a styrenearyl alcohol-based resin, and a cellulose. It is a resin having a carboxyl group introduced by reacting the polybasic acid anhydride (d) having relatively weak acidity.
  • the carboxy group-containing photosensitive resin (8) is an epoxy resin of the compound (c) having an epoxy group and an unsaturated double bond in the carboxyl group of the carboxyl group-containing resin (7).
  • This is a resin obtained by reacting a group and introducing an unsaturated double bond of the compound (c) into a side chain.
  • an unsaturated monocarboxylic acid (h) (or a compound (k)) is reacted with a polyfunctional epoxy compound (g)
  • 'A compound having at least two or more hydroxyl groups and one other reactive group other than a hydroxyl group that reacts with an epoxy group (for example, a carboxyl group, a secondary amino group, etc.) in one molecule
  • an epoxy group for example, a carboxyl group, a secondary amino group, etc.
  • examples of include poly.hydroxy-containing monocarboxylic acids such as dimethylolpropionic acid, dimethylolacetic acid, dimethylolbutyric acid, dimethylolvaleric acid, and dimethylolcaproic acid; and dialysates such as diethanolamine and diisopropanolamine. And the like.
  • the reaction product (I) is reacted with a polybasic acid anhydride (d). It is preferable to react the unsaturated group-containing monoisocyanate (m) with the hydroxyl group in the group-containing polycarboxylic acid resin.
  • the unsaturated monoisocyanate (m) include, for example, methacryloyl isocyanate, methacryloyloxyshethyl isocyanate, and organic diisocyanates (for example, tolylene diisocyanate, xylylene diisocyanate).
  • the carboxyl group-containing photosensitive resin of the above (11) has an oxetane ring as a starting material, instead of an epoxy resin which mainly produces a secondary hydroxyl group by reaction with an unsaturated monocarboxylic acid.
  • the polyfunctional oxetane conjugate (n) is reacted with an unsaturated monocarboxylic acid (h), and a polybasic acid anhydride (d) is further added to the primary hydroxyl group of the resulting modified oxetane resin.
  • the binding site is hardly cleaved thermally, and the resin has excellent thermal stability.
  • the resin containing a propyloxyl group of the above (12) and (13) is a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, a bisphenol S type epoxy resin, a brominated bisphenol A type epoxy resin.
  • the introduction of an unsaturated double bond is generally carried out by reacting an ethylenically unsaturated group such as a vinyl group, an aryl group or a (meth) atalyloyl group with a hydroxyl group, a carboxyl group or the like remaining in the above-mentioned reaction and a generated hydroxyl group.
  • the reaction is carried out by reacting a compound having a reactive group such as an epoxy group having an acid group or an acid chloride. .
  • the hapoxyl group-containing photosensitive resin of (14) is excellent in flexibility and elongation due to chain extension by addition reaction of alkylene oxide (t) of novolak type phenol resin (s), and Unsaturated monocarboxylic acid () and polybasic anhydride (d) are added to the terminal hydroxyl group generated by the alkylene oxide addition reaction, and the unsaturated group or carboxyl group is present on the same side chain. And at the ends of the side chains, It has excellent alkali developability due to the presence of terminal carboxyl groups apart from the main chain.
  • the alkylene oxide include ethylene oxide, propylene oxide, butylene oxide, trimethylene oxide, tetrahydrofuran, tetrahydropyran and the like.
  • the acid value of the carboxyl group-containing compound (A) as described above is preferably from 20 to 200 mg KOHZg, and more preferably from 50 to 120 mg KOHZg.
  • the acid value is lower than 20 mg KOHZg, the solubility in an aqueous alkali solution becomes poor, and the development of the formed coating film becomes difficult.
  • it is higher than 200 mgKOHZg, the surface of the exposed portion is developed irrespective of the exposure conditions, which is not preferable. '
  • carboxyl group-containing compounds (carboxyl group-containing resin and hydroxyl group-containing photosensitive resin) can be used alone or in combination of two or more.
  • the mixing ratio of the tetra (meth) atalylate toy conjugate (B) is 5 to 100 parts by mass relative to 100 parts by mass of the carboxyl group-containing compound (A) (solid content, The same is appropriate, and preferably a ratio of 10 to 50 parts by mass.
  • the compounding ratio of the tetra (meth) ataryl compound (B) is less than 5 parts by mass, it is difficult to obtain sufficient photocurability and Z or thermosetting properties. In addition, the properties of the cured product are not further improved, and the excess amount is economically undesirable.
  • the curable composition of the present invention includes the above-mentioned 3_ (meth) atalyloy xy-2-hydroxypropyl (meth) atalylate, aliphatic dicarboxylic acid chloride or aliphatic dicarboxylic acid or anhydride or fat thereof. It may contain an unreacted monomer in the esterification reaction with an aromatic dicarboxylic acid ester or a by-product such as a produced di (meth) acrylate M-conjugate or a polymer.
  • the tetra (meth) atalylate toy conjugate used in the present invention can be cured by simply heating, and can also be cured by X-ray or electron beam irradiation, but the polymerization initiator (C ) In the presence of (photo-radical polymerization initiator (C1) and thermal radical polymerization initiator (C2)), radical polymerization is rapidly performed by irradiation with active energy rays and Z or heating. It is preferable to use . 117].
  • the photoradical polymerization initiator (C1) known compounds that generate radicals upon irradiation with active energy rays can be used, and specific examples thereof include benzoin, benzoin methyl ether, and benzoin ethyl.
  • Benzoin and benzoin alkyl earth ethers such as ether and benzoin isopropyl ether; acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone, 1,1-dichloro Acetophenones such as acetophenone; 2-methyl-1 _ [4- (methylthio) phenyl] 1 -2-morpholinopropane 1-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butane Aminoacetophenones such as 1-one, N, N-dimethylaminoacetophenone; 2-methyla Anthraquinones such as anthraquinone, 2-ethylanthraquinone, 2-t-butyl, anthraquinone, 1-chloroanthraquinone; 2,4-dimethylthioxanthone, 2,4-dimethylthio
  • photoradical polymerization initiators can be used alone or as a mixture of two or more kinds.
  • N, N-dimethylaminobenzoic acid ethyl ester, N, N-dimethylaminobenzoic acid isoamyl ester, pentyl-4-dimethylamino Photoinitiating aids such as tertiary amines such as benzoate, triethylamine and triethanolamine can be added.
  • CGI-784 etc. which absorbs in the visible light region (Ciba 'Specialty Chemicals Co., Ltd. )) Can also be added to promote the photoreaction.
  • photopolymerization initiators are 2,4,6-trimethylbenzoyldiphenylphosphine oxide, Methyl-11- [4- (methylthio) phenyl] _2-morpholinopropane-1-one, 2-benzyl-2-methylamino-1- ( 4-morpholinophenyl) -butane-1-one and the like, but are not particularly limited to these.
  • photopolymerization initiators and photoinitiating auxiliaries but also those that absorb light in the ultraviolet or visible light range and radically degrade unsaturated groups such as (meth) acryloy / le group Or • Can be used in combination.
  • thermal radical polymerization initiator (C2) examples include, for example, benzoyl peroxide, coumarin peroxide, di-tert-butyl peroxide, p-menthane peroxide, 2 ′, 5-dimethyl-2,5- Di (t-butylperoxy) hexine-1,3, diisopropylben; organic peroxides such as senhydride peroxide, t_butylperoxy-1,2-ethylhexanoate; 2- (carpamoylazo) isobutyl mouth-tolyl, 2-phenyl Luazo-4-methoxy 2,4-dimethylvaleronitrile, azodi-t-octane, 2,2'-azobisisobutyronitrile, 2,2'-azobis, 2-methylbutyronitrile, 2,2'-azobis-1 2 , 41 divaleronitrile, 1, diazobis (1-acetoxy-11-phenylene), diazobis-1-1-
  • the amount of the polymerization initiator (C) as described above is normally sufficient in a quantitative ratio.
  • the photo-radical polymerization initiator is added to 100 parts by mass of the carboxyl group-containing compound (A).
  • the ratio is preferably 0.5 to 25 parts by mass, and in the case of the thermal radical polymerization initiator, the ratio is preferably 0.110 parts by mass.
  • Examples of the diluting solvent (D) include ketones such as methyl ethyl ketone and cyclohexanone; aromatic hydrocarbons such as toluene, xylene, and tetramethyl benzene; ethylene daryl monoethyl ether; Ethylene glycol monomethyl ether, ethylene glycol monobutynole ether, diethylene glycol monoethyl ether, diethylene glycol monomethyl monoenoate ether, diethylene glycol monoethyl monoenoate ether, propylene glycol monomethyl ether monoethylene Glycol ethers such as propylene glycol monoethyl ether, dipropylene glycol ethyl ether, and triethylene glycol monoethyl ether; ethyl acetate, butyl acetate, and ethylene glycol monoethyl ether acetate; ⁇ Ethylene glycol / lemonobutynoleate eno
  • organic solvents can be used alone or as a mixture of two or more.
  • the purpose of using these diluting solvents is to dissolve the carboxyl group-containing compound (A) and the like, and to adjust the composition godly suitable for the coating method.
  • the compounding amount of the diluting solvent (D) can be an arbitrary amount according to the coating method.
  • Examples of the compound having two or more cyclic ethers in one molecule include oxsilane compounds, oxetane compounds, oxolani conjugates, and the like.
  • oxysilane compounds include, for example, Epikote 828, Epikote 834, Kopicoat 1001, Epikote 1004, and Epicron 840, Epicron 850, and Epicron 1050, Epicron, manufactured by Dainippon Ink and Daikaku Kogyo Co., Ltd. manufactured by Japan Epoxy Resins Co., Ltd.
  • -Novolak type epoxy resin such as 1025, EOCN-1020, EOCN-104S, RE-306, Sumitomo Chemical Co., Ltd. Sumi-Epoxy ESCN-195X, ESCN-220 (all trade names); Epiclon 830 manufactured by Ink Chemical Industry Co., Ltd., Epicoat 807 manufactured by Japan Epoxy Resin Co., Ltd., Epototo YDF-170 manufactured by Toto Kasei Co., Ltd. Bisphenol F-type epoxy resin such as YDF-175, YDF-2004 (all trade names); Epototo ST-2004, ST-2007, ST-3000 (all trade names) manufactured by Toto Kasei Co., Ltd.
  • Hydrogenated bisphenol A-type epoxy resin Epikoto 604 manufactured by Japan Epoxy Resin Co., Ltd., Epotote YH-434 manufactured by Toto Kasei Co., Ltd., and Sumiepoxy ELM manufactured by Sumitomo Iridaku Kogyo Co., Ltd. — Glycidylamine-type epoxy resin such as 120 (all trade names); Alicyclic epoxy resin such as Celloxide 2021 (trade name) manufactured by Daicel Chemical Industries, Ltd .; YL—933 manufactured by Japan Epoxy Resin Co., Ltd. Nippon Kayaku Co., Ltd. EPPN-501, EPH-502 (all trade names) and other trihydroxy fuel methane type epoxy resins; Japan Epoxy Resin Co., Ltd.
  • YL-6056, ⁇ -4000 Or YL-6121 (both ⁇ product names) Biphenol-type epoxy resin or a mixture thereof; EBPS-200 manufactured by Nippon Kayaku Co., Ltd., EPX-30 manufactured by Asahi Denshi Co., Ltd., EXA-1514 manufactured by Dainippon Ink and Chemicals, Inc. bisphenol S type epoxy resin trade name); Japanepoki Shirejin Co. Ltd. Epikoto 15 7 S (trade name) bisphenol a novolac type such Epoki shea resin; manufactured by Japan epoxy resins Co. of Co. Epikoto YL- 931 (trade name) or other tetraphenylolethane-type epoxy resin; Nissan Chemical Industries, Ltd.
  • TEPIC (trade name) or other complex cyclic epoxy resin; NOF Corporation's Bremma ⁇ DGT (trade name) ), Etc .; Tetraglycidyl xylenylethane resin such as ZX-1063 (trade name) manufactured by Toto Kasei Co., Ltd .; ESN-190, ESN-360 manufactured by Nippon Steel Chemical Co., Ltd., Dainippon Ink and Chemicals ( HP-4032, Naphthalene group-containing epoxy resin such as EXA-4750 and EXA-4700 (all trade names); dicyclopentadiene such as HP-7200, HP-7200H (all trade names) manufactured by Dainippon Ink and Chemicals, Inc.
  • Epoxy resins having a skeleton Epoxy resins having a skeleton; glycidyl methacrylate copolymer epoxy resins such as CP-50S and CP-50M (both trade names) manufactured by Nippon Oil & Fats Co., Ltd .; and hydantoin-type epoxy resins, cyclohexylmale Epoxy halohydrin is reacted with an alcoholic secondary hydroxyl group obtained by reacting 1,5-dihydroxynaphthalene with bisphenol A type epoxy resin. And functional epoxy resins (International Publication WO 01,024774).
  • oxetanei conjugates include, for example, 3,7-bis (3-oxetanyl) -1-5-oxa Nonane, 3, 3 '-(1,3- (2-methylenyl) propanedylbis (oxymethylene)) bis- ( 3- ethylethyloxetane), 1,4_bis [(3-ethylethyl-3-oxetanylmethoxy) [Methyl] benzene, 1,2-bis [(3-ethyl-13-oxetanylmethoxy) methyl] ethane, 1,3-bis [(3-ethyl-3-oxetanylmethoxy) methyl] propane, ethylene glycol 'Ethyl bis (3-ethyl-13-oxetanylmethyl) ether, dicyclopentylbis (3-ethynole-3-oxetane-methyl) ether, triethylene glycol bis (3-ethynole,
  • the compound (E) having two or more cyclic ethers in one molecule described above can be used alone or in combination of two or more. These compounds having a cyclic ether can be cured by heat to improve properties such as resist adhesion and heat resistance.
  • the amount of the compound is 10 parts by mass or more and 100 parts by mass or less based on 100 parts by mass of the carboxyl group-containing compound (A), and is preferably 15 to 60 parts by mass. If the compounding amount of the cyclic ester-containing compound (E) is less than the above range, the hygroscopicity of the cured film becomes high and the PCT resistance tends to decrease, or the solder heat resistance and electroless plating resistance Is also low. On the other hand, if it exceeds the above range, the developability of the coating film and the electroless plating resistance of the cured film become poor, and the PCT resistance also becomes poor.
  • the curing catalyst (F) for example, imidazole, 2-methylimidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2_phenylimidazole, 4-phenylimidazole, 1 -Imidazole derivatives such as cyanoethyl- 1- 2-phenyleimidazole, 11- (2-cyanoethyl) -2-ethyl-4-methyl imidazole; dicyandiamide, benzyldimethylamido, 4- (dimethylamino) -N, N-dimethyl Benzylamine, 4-methoxy-N, N-dimethylbenzinoleamine, 4-methyl-N, N-dimethylbenzamine Amine conjugates such as benzylamine; hydrazine conjugates such as adipic hydrazide and sebacic hydrazide; and phosphorus conjugates such as triphenylphosphine can be used.
  • Examples of commercially available products include 2MZ-A, 2MZ_ ⁇ K, 2PHZ, 2P4BHZ, and 2P4MHZ (all of which are trade names of imidazole compounds) manufactured by Shikoku Chemicals Co., Ltd .; —CAT3503N, U— CAT3502T (trade name of block isocyanate compound of dimethylamine), DBU, DBN, U—CATSA102, U—CAT5002 (bicyclic amidine compound and its salt) And the like.
  • the present invention is not limited to these, and any other catalyst may be used as long as it accelerates the reaction between a compound having a cyclic ether and a compound having a cyclic ether and a carboxylic acid. It does not work even if used alone or as a mixture of two or more.
  • Derivatives can be used, and these compounds are preferably used in combination with the curing catalyst.
  • the amount of the curing catalyst to be blended in a usual quantitative ratio is sufficient, for example, 0.1 to 20 parts by mass, preferably 0.5 to 15.0 parts by mass, based on 100 parts by mass of the carboxyl group-containing compound (containing). Parts.
  • radical polymerizable monomer (G) examples include 2-hydroxyethyl (meth) acrylate, '2-hydroxypropyl (meth) acrylate, pentaerythritol triatalylate, and dipentaerythritol pentaatalylate. Hydroxyl-containing atalylates; water-soluble atalylates such as polyethylene glycol diatalylate and polypropylene glycol diatalylate; trimethylolpropane triatalylate, pentaerythritol tetraacrylate, dipentaerythritol hexatalylate, etc.
  • Polyfunctional alcohol acrylates of polyhydric alcohols polyfunctional alcohols such as trimethylolpropane and hydrogenated bisphenol A or polyphenols such as bisphenol A and biphenol Atari rate such Id adduct and / or propylene oxide adducts; polyfunctional or monofunctional polyurethane ⁇ click a Isoshianeto modified products of the hydroxyl group-containing Atari rate Relates: bisphenol A diglycidyl ether, hydrogenated bisphenol A diglycidyl ether or epoxy cyanate acrylates which are (meth) acrylic acid adducts of phenol novolak epoxy resins, and methacrylates corresponding to the above acrylates However, these can be used alone or in combination of two or more.
  • multifunctional (meth) atalylate compounds having two or more (meth) atalyloyl groups in one molecule are preferred.
  • the purpose of using these radically polymerizable monomers is to increase the photoreactivity of the composition.
  • the radical polymerizable monomer that is liquid at room temperature is used not only to increase the photoreactivity of the composition, but also to adjust the viscosity of the composition to be suitable for various coating methods, and to help the solubility in aqueous alkaline solutions. Also fulfills.
  • the mixing amount of the radical polymerizable monomer (G) is preferably 100 parts by mass or less based on 100 parts by mass of the carboxyl group-containing compound (A).
  • the curable composition of the present invention may contain an inorganic thickener to such an extent that the properties of the cured product are not deteriorated.
  • the inorganic thickener include hydrophilic silica such as # 50, # 200, and # 380 manufactured by Nippon Aerosil, hydrophobic silica such as # R974 and # R972 manufactured by Nippon Aerosil, and Wilbur's Ellis.
  • Organic bentonite such as Olben and Benton 38.
  • the compounding amount of these inorganic thickeners is sufficient at a quantitative ratio, and for example, 0.1 to 20 parts by mass, preferably 0.5 to 100 parts by mass of the carboxyl group-containing compound (A). 1010.0 parts by mass.
  • the curable composition of the present invention may further contain, if necessary, barium sulfate, barium titanate, silicon oxide powder, silicon oxide fine powder, amorphous silica, crystalline silica, and fused silica.
  • inorganic fillers such as silica, talc, clay, magnesium carbonate, calcium carbonate, oxidized aluminum, aluminum hydroxide, and My power, fine rubber particles, and powdered epoxy resin (for example, Nissan Chemical Industries Resin, urethane resin, melamine resin, benzoguanamine resin (for example, M-30, S, MS, etc., manufactured by Nippon Shokubai Co., Ltd.), urea resin, cross-linked acrylic polymer (for example, MR-2G manufactured by Soken Iridakusha) And organic fillers such as MR-7G and Techpolymer manufactured by Sekisui Plastics Co., Ltd.
  • the curable composition of the present invention may further comprise a phthalocyanine, if necessary, such as phthalocyanine, green, aozin. Green, disazoyello, crystal violet, titanium oxide, carbon black, and naphthalene black.
  • thermal polymerization inhibitors such as coloring agents, hydrocyanic acid quinone, hydroquinone monomethinole ether, t-butyl catecholone, pyrogallonole, phenothiazine, defoaming agents such as silicone, fluorine and polymer, and Z or R
  • Known and commonly used additives such as a belling agent, an imidazole-based, a thiazole-based, and a triazole-based silane coupling agent can be blended.
  • the curable composition of the present invention may contain a flame retardant such as a halogen-based flame retardant, a phosphorus-based flame retardant, and an antimony-based flame retardant, if necessary, for the purpose of obtaining flame retardancy. can do .
  • the compounding amount of the flame retardant is usually from! To 200 parts by mass, preferably from 5 to 50 parts by mass, based on 100 parts by mass of the carboxyl group-containing compound (A). When the compounding amount of the flame retardant is within the above range, the flame resistance, heat resistance, water resistance and adhesion of the obtained cured product are highly balanced, which is preferable.
  • water may be added to the composition.
  • the curable composition of the present invention can be easily cured by photocuring and Z or heat curing in the same manner as conventionally known methods.
  • the above-mentioned curable composition is sufficiently mixed using a roll until uniform, and is applied to a desired base material according to the application, for example, screen printing, curtain coating, spray coating, roll coating, etc.
  • the coating is performed by a known coating method, for example, by volatilizing and drying the diluting solvent contained in the composition at a temperature of about 60 to 100 ° C., thereby producing a coating excellent in dryness to the touch without dripping.
  • a film can be formed.
  • the curable composition of the present invention can also form a dry film for resist, and in that case, it may be laminated as it is. Then, it is light-cured by exposure to active energy rays. Next, by heating and curing at about 100 ° C to 200 ° C, in addition to excellent crack resistance, electrical insulation, PCT resistance, adhesion, solder heat resistance, chemical resistance, electroless gold plating resistance, etc. A cured product excellent in the above-mentioned characteristics can be obtained. In the case of forming a solder resist on a printed wiring board, it is selectively exposed to active energy such as ultraviolet rays through a patterned photomask, or directly by a laser beam.
  • active energy such as ultraviolet rays through a patterned photomask, or directly by a laser beam.
  • a resist film having excellent characteristics as described above can be obtained.
  • the diluted alkaline aqueous solution used for the development include aqueous solutions of potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium phosphate, sodium silicate, ammonia, amines, and the like.
  • reaction mixture in the aqueous layer was extracted with 25 ml of ethyl acetate.
  • the obtained organic layer was washed with IN aqueous hydrochloric acid solution (50 ml), followed by saturated saline (50 ml).
  • the organic layer was dried over 5.
  • This was subjected to column purification using 230 g of neutral silica gel.
  • 4.5 g of a tetra (meth) atalylate toyidani compound was obtained. This was a yield of 34.5% of theory.
  • Infrared absorption spectrum (measured using Fourier transform infrared spectrophotometer FT-IR), nuclear magnetic resonance spectrum (solvent CDC1, reference substance TMS (tetramethylsilane)) of the obtained tetra (meth) atalylate compound and
  • the chromatograms (measured using high performance liquid chromatography) are shown in FIGS. 4, 5, and 6, respectively.
  • the evaluation sample was measured by thermogravimetry (TG) to evaluate heat resistance.
  • the outer perimeter determined from the tangent at the inflection portion of the TG curve is defined as the heat-resistant temperature.
  • One side of the film-shaped test piece prepared by processing the evaluation sample to a width of 10 mm and a length of 90 mm was placed on an electronic device, and the other side was bent until the distance between the films became 10 mm.
  • the maximum load acting on the balance was evaluated as the repulsive force and evaluated according to the following criteria.
  • a film-like test piece prepared by kneading the evaluation sample to a width of 10 mm and a length of 90 mm was bent at 135 ° and evaluated according to the following criteria.
  • W is the mass of the evaluation sample
  • W is the mass of the evaluation sample after PCT treatment
  • a 1-liter flask was charged with 40 g (0.185 mol) of 2,6-naphthalenedicarboxylic acid and 120 ml (1.67 mol) of thionyl ninyl, and heated and refluxed at about 80 ° C for 1 hour under a stream of argon. . Thereafter, 1 ml of dimethylformamide was added, and the mixture was further heated under reflux at about 80 ° C. for 24 hours. After completion of the reaction, unreacted thionyl chloride was distilled off under reduced pressure to obtain 31. Og of 2,6-naphthalenedicarboxylic acid chloride as yellow crystals.
  • 3-acrylic acid xyl-2-hydroxypropyl methacrylate (Shin Nakamura Chemical: KK Co., Ltd., trade name: NK ester 701A) 43.3 g (202 mmol), tetrahydrofuran, 400 milliliter furan, Phenothiazine (4.3 mg) and triethylamine (51.lg, 505 mmol) were charged and stirred at about 0 ° C. under an argon stream.
  • FIG. 8 shows the chromatogram (measured using high performance liquid chromatography) of the obtained oil.
  • the resulting oil was column purified (SiO: 200 g, development ⁇ : 4 0% hexane in acetic Echiru / n-to) to give a yellow oil 2 5 g.. 10 ml of methanol was added to the obtained oil, cooled at 130 ° C. for 5 hours, and filtered to obtain 1.5 g of & color crystal.
  • Infrared absorption spectrum (measured using Fourier transform infrared spectrophotometer FT-IR) of the obtained tetra (meth) atalylate compound, nuclear magnetic * sounding spectrum (solvent CDC1,
  • FIG. 12 shows the chromatogram (measured using high performance liquid chromatography) of the obtained oil.
  • the obtained oil was purified by column (SiO: 320 g, developing solvent: 20% ethyl acetate in Zn-hexane), and colorless and transparent
  • a liquid of 14 Og was obtained. 20 ml of ethyl ether was added to the obtained oil, and 4 mg of the white crystal obtained in Synthesis Example 3 was seeded as a seed crystal, and recrystallized at ⁇ 30 ° C. for 12 hours. As a result, a white semi-solid substance was obtained. Therefore, the ethyl ether was removed, and then n-hexane was added. After stirring, the mixed solvent of ethyl ether and n-hexane that could not be removed was removed, and 20 ml of ethyl ether was added again, followed by filtration. As a result, 2.7 g of a white crystal having a melting point of about 92 ° C was obtained.
  • FIG. 13, FIG. 14 and FIG. 15 show the measurement results using high performance liquid chromatography, respectively.
  • Table 3 shows the results of 3 ⁇ 4-NMR identification.
  • Fig. 19 shows the chromatogram (measured using high performance liquid chromatography) of the obtained oil.
  • the obtained oil was subjected to column purification (SiO: 500 g, developing solvent: 20% ethyl acetate in Zn-hexane), and
  • the matograms (measured using high performance liquid chromatography) are shown in FIGS. 20, 21 and 22, respectively. .
  • Each of the white crystalline tetra (meth) acrylate compounds obtained in Synthesis Examples 1 to 3 was melted at 100 ° C and coated on a polyimide film using a bar coater to a thickness of 50 / m. Then, the mixture was heated at 180 ° C for 30 minutes, and then at 200 ° C for 10 minutes. The obtained cured film was heated at 121 ° C and 100 ° / C using a PCT device (TABAI ESPEC HAST SYSTEM TPC-412MD). Treated at RH for 24 hours, and then cured polyimide film Peeling off gave an evaluation sample. The heat resistance of these evaluation samples was measured by the method (1) used in Test Example 1, and the flexibility and folding resistance were measured and evaluated by the methods described later.
  • a cured film was formed on a glass plate whose mass had been measured in advance in the same manner as described above except that the treatment with the PCT apparatus was not performed, and an evaluation sample was obtained.
  • the water absorption of this cured film was measured and evaluated by the method (4) used in Test Example 1 described above. The measurement results are shown in Table 4 below.
  • a film-shaped test piece prepared by kneading the evaluation sample to a width of 5 mm and a length of 40 mm is placed on the electronic device and the other side is bent until the distance between the films becomes 10 mm.
  • the maximum load applied to the electronic balance was evaluated as a repulsive force and evaluated according to the following criteria.
  • a film-like test piece prepared by processing an evaluation sample to a width of 5 mm and a length of 40 mm was bent at 135 ° and evaluated according to the following criteria.
  • 3-acryloylic xy-2-hydroxypropyl methacrylate manufactured by Shin-Nakamura Ichigaku Kogyo Co., Ltd., trade name: NK ester 701 A
  • NK ester 701 A 2.0 g (9.33 mmol), N, N
  • FIGS. 26 and 27 German nuclear magnetic resonance spectrum (solvent CDC1 3, the reference substance TMS (tetramethylsilane)) and chromatogram (measured by high performance liquid chromatography) in FIGS. 26 and 27, further represented by the following formula (3)
  • Figure 28 shows the nuclear magnetic resonance spectrum (solvent CDC1, reference material TMS (tetramethylsilane)) of the monocarboxylic acid having the structure shown.
  • R ⁇ R 2 represents a hydrogen atom or a methyl group.
  • FIG. 29 shows the nuclear magnetic resonance spectrum (solvent CDC1, reference material TMS (tetramethylsilane)) of the obtained mixture. Also, ⁇ ⁇ -
  • Refill paper (Rule 26) As a result, 2.5 g of a liquid mixture containing about 64% of a mixture of tetra (meth) acrylate conjugate and 3-acryloyl xy-2-hydroxypropyl methacrylate was obtained. A nuclear magnetic resonance spectrum (solvent CDC1, reference material TMS (tetramethylsilane) of the mixture of the obtained tetra (meth) acrylate compound and 3-acryloyloxy-2-hydroxypropyl methacrylate was used.
  • FIGS. 30, 31 and 32 show a chromatogram by gel permeation chromatography of 3-attaryloy xy-2-hydroxypropyl methacrylate alone.
  • the liquid mixture of the tetra (meth) atalylate compound of Synthesis Example 6 and Synthesis Example 8 and 3-attaryloyloxy-12-hydroxypropyl metharylate was adjusted to a thickness of 50 ⁇ using a bar coater.
  • the film was applied to a polyethylene terephthalate film and heated at 180 ° C for 30 minutes to remove the cured film from the polyethylene terephthalate film, and then the PCT device (TABAI ESPEC HAST SYSTEM TPC-412MD) was used.
  • the sample was treated under the conditions of ° C and 100% RH for 24 hours to obtain an evaluation sample.
  • Example 1 to 3 were each stirred at 90 ° C, Example 4 was stirred at room temperature, and Example 5 was stirred at 100 ° C to prepare a curable composition.
  • Comparative Examples 1 and 2 each was separately kneaded with a three-roll mill to prepare a curable composition. These were applied to a polyimide film using a bar coater to a thickness of 50 ⁇ .
  • exposure was performed under the conditions of an exposure amount of 300 mjZcm 2.
  • Example 4 after leaving at room temperature for 6 hours, gradually raise the temperature to 115 ° C over 60 minutes, and apply force at 115 ° C for 60 minutes!
  • Example 6 the composition obtained in Example 1 was melted at 100 ° C., impregnated into a glass cloth, and then exposed under the condition of an exposure amount of SOOnj / cm 2. After melting the tetra (meth) atalylate compound obtained in Synthesis Example 2 at 100 ° C and impregnating the glass cloth, the mixture was heated at 140 ° C for 30 minutes, and then a PCT device (TABAI E SPEC HAST SYSTEM TPC-412MD) was used for 24 hours at 121 ° C and 100% RH to obtain an evaluation sample.
  • a PCT device TABAI E SPEC HAST SYSTEM TPC-412MD
  • Example 10 Each component was blended according to the blending composition shown in Table 10 (the numerical values are parts by mass).
  • Example 8 the respective components were stirred to prepare curable compositions.
  • Example 9 the mixture was stirred at 90 ° C. to prepare a dangling composition. These so as to have a thickness of 50 / im with barcode one coater, was coated on a polyethylene terephthalate Fi Lum, for Example 8 and Comparative Example 3, 4, and exposed under the conditions of exposure amount 300 mJ / cm 2
  • heating was performed at 150 ° C for 60 minutes, and in Example 11, after standing at room temperature for 6 hours, the temperature was raised to 80 ° C over 60 minutes, and the temperature was increased to 80 ° C for 30 minutes.
  • Example 10 a glass cloth was impregnated with a composition similar to the composition of Example 8 and then exposed under the conditions of an exposure amount of 300 mL cm 2 , and then a PCT apparatus (TABAI ESPEC).
  • the sample was treated at 121 ° C and 100% RH for 24 hours to obtain an evaluation sample.
  • a hardened film was prepared in the same manner as in the above Examples and Comparative Examples except that the treatment with a PCT apparatus was not performed, and an evaluation sample was obtained. .
  • the water absorption of this cured film was measured and evaluated by the method (4) used in Test Example 1 above. Table 11 shows the results of the above tests.
  • reaction solution was cooled to room temperature, and the obtained reaction solution was neutralized with 35.35 g of a 15% aqueous sodium hydroxide solution, and then washed with water. Thereafter, the toluene was distilled off using an evaporator while replacing the toluene with 118.lg of diethylene glycol monoethyl ether acetate to obtain a novolak-type atarilate lug solution.
  • a reaction vessel equipped with a gas inlet pipe, a stirrer, a cooling pipe, a thermometer, and a dropping funnel for continuous dropping of an aqueous alkali metal hydroxide solution was charged with a 1.5-hydroxyl with a hydroxyl equivalent force of S80 g / eq. 224 g of roxinaphthalene and 1075 g of bisphenol phenol A type epoxy resin (Epicoat 828, manufactured by Japan Epoxy Resin Co., Ltd., epoxy equivalent 189 g / eq.) Were charged and dissolved at 110 ° C. under a nitrogen atmosphere with stirring. Thereafter, 0.65 g of triphenylphosphine was added to the mixture.
  • the temperature in the reaction vessel was raised to 150 ° C, and the reaction was carried out for about 90 minutes while maintaining the temperature at 150 ° C to obtain an epoxy equivalent of 452 gZeq.
  • An epoxy compound (3_a) was obtained.
  • the temperature in the flask was cooled to 40 ° C, and 1920 g of epichronorehydrin, 1690 g of tonolene, and 70 g of tetramethylammonium bromide were added, and the temperature was raised to 45 ° C with stirring and maintained. Thereafter, 364 g of a 48% aqueous sodium hydroxide solution was continuously added dropwise over 60 minutes, and the mixture was further reacted for 6 hours.
  • the reaction was oxidized by potentiometric titration and total oxidation was measured.
  • the end point is a response rate of 95% or more.
  • the carboxyl group-containing photosensitive resin thus obtained had a nonvolatile content of 62% and an acid value of the solid content of lOOmgKOHZg.
  • test substrate having the obtained cured film was subjected to crack resistance, PCT resistance, adhesion, solder heat resistance, acid resistance, alkali resistance, and electroless metallization according to the test methods and evaluation methods described below. A resistance test was conducted.
  • the crack resistance of the cured film was evaluated using Thermal Shock Chamber NT1020W manufactured by Kusumoto Kasei Co., Ltd., with one cycle of 65 ° C to 150 ° C and the following criteria.
  • the PCT resistance of the cured film was evaluated under the following criteria under the conditions of 121 ° C and 50 hours in saturated steam.
  • The cured film has no blistering, peeling or discoloration.
  • The cured film has slight blistering, peeling or discoloration.
  • the cured film has blisters, peeling, and discoloration
  • test board was immersed in a solder bath at 260 ° C for 10 seconds three times, and the change in appearance was evaluated. Note that a flux according to JIS C 6481 was used as the post flux (rosin-based). , '
  • test substrate was immersed in a 10% by volume aqueous sulfuric acid solution at 20 ° C for 30 minutes, taken out, and the state of the cured film was evaluated according to the following criteria.
  • test substrate was evaluated in the same manner as in the acid resistance test, except that the 10% by volume aqueous sulfuric acid solution was replaced with a 10% by weight aqueous solution of sodium hydroxide.
  • Electroless gold plating resistance Electroless gold plating was performed on a test substrate according to the process described below, and the test substrate was subjected to a change in appearance and a peeling test using a cellophane adhesive tape, and cured. The peeling state of the film was determined according to the following criteria. '
  • test substrate was immersed in a 30 ° C. acidic degreasing solution (a 20% by volume aqueous solution of Metex L-15B manufactured by McDermid Japan Co., Ltd.) for 3 minutes.
  • a 30 ° C. acidic degreasing solution a 20% by volume aqueous solution of Metex L-15B manufactured by McDermid Japan Co., Ltd.
  • test substrate was immersed in running water for 3 minutes.
  • test substrate was immersed in a 14.3% by mass aqueous solution of ammonium persulfate at room temperature for 3 minutes.
  • test substrate was immersed in running water for 3 minutes.
  • Acid immersion ':' The test substrate was immersed in a .10% by volume aqueous sulfuric acid solution for 1 minute at room temperature.
  • test substrate was immersed in running water for 30 seconds to 1 minute.
  • the test substrate was immersed in a catalyst solution (a 10% by volume aqueous solution of Melplate Activator 350, manufactured by Meltex Co., Ltd.) at 30 ° C. for 7 minutes.
  • a catalyst solution a 10% by volume aqueous solution of Melplate Activator 350, manufactured by Meltex Co., Ltd.
  • test substrate was immersed in running water for 3 minutes.
  • test substrate was immersed in a 10% by volume sulfuric acid aqueous solution at room temperature for 1 minute.
  • test substrate was immersed in running water for 3 minutes. .
  • test substrate was immersed in warm water of 60 ° C, washed thoroughly with water for 3 minutes, drained well, and dried. Through these steps, a test substrate having electroless gold plating was obtained.
  • the electrical insulation of the cured film was evaluated according to the following criteria.
  • Humidification conditions temperature 110 ° C, humidity 85% RH, applied voltage 5V, 50 hours.
  • Measurement conditions Measurement time 60 seconds, applied voltage 500V.
  • Each component was blended according to the blending composition shown in Table 14, and kneaded separately with a three-roll mill to prepare a curable composition. This is applied to the entire surface of a copper through-hole printed circuit board on which a pattern is formed by screen printing using a 100 mesh polyester screen so as to have a thickness of 20 to 30 ⁇ m.
  • a hot air dryer at 80 ° C for 30 minutes, then a negative film having a resist pattern was brought into close contact with the coating film, and an ultraviolet light exposure device (Model HMW-680GW, manufactured by Oak Manufacturing Co., Ltd.) was used.
  • test substrate having the obtained cured film was subjected to crack resistance, PCT resistance, adhesion, solder heat resistance, acid resistance, alkali resistance, electroless resistance according to the test methods and evaluation methods described above. A test for resistance to gold plating was conducted.
  • test substrate was fabricated under the same conditions as above, and an electrical insulation resistance test was performed.
  • Table 15 shows the results of the above tests.
  • the (meth) atalylate compound of the present invention and the hardening composition containing the same are excellent in photocurability and Z or heat curability, and are resistant to moisture absorption.
  • a hardened product excellent in heat resistance and flexibility under high humidity can be obtained, it can be used for various applications such as resist ink, paint, and molding material.
  • an alkali-soluble lipoxyl group-containing tie (A), a polymerization initiator (C), and a diluent A curable composition containing a solvent (D), a compound (E) having two or more cyclic ethers in one molecule, a curing catalyst (F), etc. has excellent photocurability and Z or heat curability, and Even when exposed to high and low temperatures, cracks occur in the hardened film, and it is possible to obtain a cured product with excellent properties as described above.

Abstract

A (meth)acrylate compound represented by the formula (1) below and a curing composition containing such a (meth)acrylate compound can be used in various applications such as resist inks, coating materials and molding materials. A curing composition which contains, in addition to the tetra(meth)acrylate compound (B), an alkali-soluble carboxyl group-containing compound (A), a polymerization initiator (C), a diluent solvent (D), a compound (E) having two or more cyclic ethers in a molecule, a curing catalyst (F) and the like is useful for solder resists for printed circuit boards, etching resists, plating resists, interlayer insulating layers for multilayer wiring boards, permanent masks used in production of tape carrier packages, resists for color filters and the like. (In the formula, R1, R2, R3 and R4 respectively represent a hydrogen atom or a methyl group; and X represents a dicarboxylic acid residue, preferably represents an aliphatic dicarboxylic acid residue or aromatic dicarboxylic acid residue.)

Description

明 細 書  Specification
テトラ (メタ)アタリレートィヒ合物、それを含有する硬化性組成物及ぴそれら の硬化物 '  Tetra (meth) atalylate compounds, curable compositions containing them, and their cured products ''
技術分野  Technical field
[0001], 本発明は、新規なテトラ (メタ)アタリレートィヒ合物、それを含有する硬化性組成物及 びそれらの硬化物に関するものであり、レジストインキ、塗料、成形材等の種々.の用 途に使用可能である。  TECHNICAL FIELD [0001] The present invention relates to a novel tetra (meth) atalylate compound, a curable composition containing the same, and a cured product thereof, and is used for various applications such as resist inks, paints, and molding materials. It can be used in some way.
[0002] .さらに本発明は、プリント配線板の製造等に用いられる硬化性組成物に関し、より 詳しくは、ヒートサイクルによる耐クラック性ゃ電気絶縁性に優れ、且つ PCT (ブレッ^ ヤー 'タッカー ·テスト)耐性、.密着性、はんだ耐熱性、耐薬品性、無電解金めつき耐 性などの諸特性に優れた硬化物を与える硬化性組成物及びその硬化物に関するも ' のである。 背  [0002] Further, the present invention relates to a curable composition used for the production of printed wiring boards and the like, and more particularly, to crack resistance due to heat cycling, excellent electrical insulation, and PCT (Brayer 'Tucker Test) The present invention also relates to a curable composition that provides a cured product having excellent properties such as resistance, adhesion, solder heat resistance, chemical resistance, and electroless plating resistance, and a cured product thereof. Height
[0003] 近年、航空宇宙産業分野や電子材料分野では、優れた反応性や加工性を有する こと力 、(メタ)アタリレート化合物を含有する硬化性組成物が広く用いられている。 . 特に、航空宇宙産業分野に用レ、られる複合材料の製造においては、(メタ)アタリレ ート化合物、重合開始剤、及び炭素繊維、ガラス繊維、ァラミド繊維等の繊維強化材 , カゝらなる組成物が多量に使用されている力 組成物の光硬化性及び/又は熱硬化 性のみならず、その硬化物の耐吸湿性並びに高湿下での耐熱性及び柔軟性を得る ためには、(メタ)アタリレートイ匕合物が重要な'成分である。  [0003] In recent years, in the field of aerospace industry and the field of electronic materials, curable compositions containing (meth) acrylate compounds having excellent reactivity and processability have been widely used. In particular, in the manufacture of composite materials used in the aerospace industry, (meth) acrylate compounds, polymerization initiators, and fiber reinforcing materials such as carbon fiber, glass fiber, and aramide fiber In order to obtain not only the photocurability and / or thermosetting properties of the composition, but also the moisture absorption resistance of the cured product and the heat resistance and flexibility under high humidity, the composition must be used in a large amount. The (meta) atalay toy dani is an important 'component.
[0004] しかしながら、従来市販の (メタ)アタリレートイ匕合物を含有する硬化性組成物を用 レ、て得られる複合材料では、高湿下での熱特性と柔軟性とを共に満足できず、高性 能化の要求に対応できないの 現状である。即ち、従来市販の (メタ)アタリレートイ匕 合物を含有する硬化性組成物を用いて得られる複合材料では、湿気による熱的及 び機械的長期信頼性が劣っていた。このような長期信頼性の問題は、航空宇宙産業 分野に限られるものではなぐ電子材料分野など、他の分野においても望ましくない [0005] また、一般に、プリント配線板用レジスト材などの電子材料、特に、ソルダーレジスト として用いられる硬化性組成物の硬化皮膜においては、電気絶縁性に優れ、且つ、 PCT (プレッシャー 'タッカー 'テスト)耐性、密着性、はんだ耐熱性、耐薬品性、無電 解金めつき耐性等の諸特性に優れることが要求される。 [0004] However, a composite material obtained by using a curable composition containing a conventional (meta) atalylate ligated product can satisfy both the heat characteristics and flexibility under high humidity. It is not possible to meet the demand for higher performance. That is, a composite material obtained by using a curable composition containing a commercially available (meth) atalylate conjugate had poor thermal and mechanical long-term reliability due to moisture. Such long-term reliability problems are undesirable in other fields, such as the electronic materials field, which is not limited to the aerospace field. [0005] In general, electronic materials such as resist materials for printed wiring boards, particularly cured films of curable compositions used as solder resists, have excellent electrical insulation properties and a PCT (pressure "tucker" test). ) Excellent properties such as resistance, adhesion, solder heat resistance, chemical resistance, and electroless plating resistance are required.
[0006] 特に最近では、自動車に搭載されるプリント配線板において、長期に渡って高温や 低温に曝されることから、前記した諸特性の他にヒートサイクルによる耐クラック性に 優れることが要求されるようになった。力かる特性は、プリント配線板上のソルダーレ ジストに限られるものではなく、ビルドアップ多層配線板等の層間絶縁層など、他の 用途の製品においても要求されている。 '  [0006] In particular, recently, since printed wiring boards mounted on automobiles are exposed to high and low temperatures for a long period of time, in addition to the above-mentioned various properties, excellent resistance to cracking due to heat cycles is required. It became so. Powerful properties are not limited to solder resists on printed wiring boards, but are also required for products for other uses such as interlayer insulating layers in build-up multilayer wiring boards. '
[0007] しかしながら、従籴の (メタ)アタリレートイ匕合物を含有する硬化性組成物を用いて形 成したソルダーレジストでは、ヒートサイクルによる耐クラック性と前記諸特性を共に満 足させることができないのが実情である。  [0007] However, a solder resist formed using a curable composition containing a conventional (meth) atalylate compound has to satisfy both the crack resistance due to a heat cycle and the above-mentioned properties. The reality is that you can't.
[0008] 上記のような問題の解決のために、これまで種々の (メタ)アタリレート化合物が新た に開発されてレヽるが、耐吸湿性並びに高湿下での耐熱性及び柔軟性の特性を充分 に満足させるには未だ至ってレヽないのが現状である。例えば、ビスフエノール型ェポ キシ (メタ)アタリレート樹脂の 2級のアルコール性水酸基に塩ィ匕ァクリロイルを反応さ せて得られる(メタ)アタリレートイ匕合物が挙げられる(特開平 9一 124714号参照)。し かし、このような (メタ)アタリレートイヒ合物は、優れた耐吸湿性と高湿下での耐熱性を 共に満足させるには、まだ不充分である。一方、低吸湿性を有する (メタ)アタリレート ' 化合物としては、テレフタル酸クロライドとヒドロキシブチル (メタ)アタリレートとを反応 させて得られるジ (メタ)アタリレート化合物が開 されている(特開 2003— 2919号 参照)。しかし、この (メタ)アタリレート化合物は、 1分子中に有する不飽和基が 2個で あるため、光硬化性及び/又は熱硬化性に乏しぐその結果、高湿下での耐熱性が 劣るという問題がある。他方、光硬化性及び Z又は熱硬化性に優れた (メタ)アタリレ 一トイ匕合物としては、テレフタル酸クロライドとペンタエリスリトールトリ(メタ)アタリレート とを反応させて得られるへキサ (メタ)アタリレートイ匕合物が挙げられる (特開昭 62— 5 2547号参照)。しかし、この (メタ)アタリレート化合物は、 1分子中に不飽和基を 6個 有するため、光硬化性及び Z又は熱硬化性には優れるが、硬化により高架橋となる ため、硬くて脆い硬化物を形成する。従って、硬化物が柔軟性に欠けるため、高湿下 での老化中に破壊する恐れがある。 [0008] To solve the above problems, various (meth) atalylate compounds have been newly developed so far, but they have properties of moisture absorption resistance, heat resistance under high humidity and flexibility. At present, there is still no way to fully satisfy the requirements. For example, a (meth) atalylate toy conjugate obtained by reacting a secondary alcoholic hydroxyl group of a bisphenol type epoxy (meth) acrylate resin with a salty acryloyl group (Japanese Patent Application Laid-Open No. H9-191) can be mentioned. 124714). However, such a (meth) atalyreitic compound is still insufficient to satisfy both excellent moisture absorption resistance and heat resistance under high humidity. On the other hand, di- (meth) atalylate compounds obtained by reacting terephthalic acid chloride with hydroxybutyl (meth) atalylate have been disclosed as (meth) atalylate 'compounds having low hygroscopicity (Japanese Unexamined Patent Publication (KOKAI) 2003—2919). However, since this (meth) acrylate ester has two unsaturated groups in one molecule, it has poor photocuring and / or thermosetting properties, resulting in poor heat resistance under high humidity. There is a problem. On the other hand, as a (meth) atalyl conjugate having excellent photocurability and Z or heat curability, a hexa (meth) obtained by reacting terephthalic acid chloride with pentaerythritol tri (meth) atalylate is preferred. Attalay toy swords (see JP-A-65-252547). However, because this (meth) acrylate compound has six unsaturated groups in one molecule, it is excellent in photocurability and Z or thermosetting properties, but it becomes highly crosslinked by curing. Therefore, a hard and brittle cured product is formed. Therefore, the cured product lacks flexibility and may be broken during aging under high humidity.
[0009] 従って、本発明の目的は、光硬化性及び Z又は熱硬化性に優れ、且つ、耐吸湿性 並びに高湿下での耐熱性及び柔軟性にも優れた硬ィ匕物が得られる、新規なテトラ (メ タ)アタリレート化合物、それを含有する硬化性組成物及びそれらの硬化物を提供す ることにある。  [0009] Accordingly, an object of the present invention is to provide a hardened product having excellent photocurability and Z or thermosetting properties, and also having excellent moisture absorption resistance, heat resistance under high humidity, and flexibility. It is another object of the present invention to provide a novel tetra (meth) atalylate compound, a curable composition containing the same, and a cured product thereof.
[0010] 本発明の他の目的は、光硬化性及び/又は熱硬化性に優れると共に、ヒートサイク ルによる耐クラック性に優れ、且つ電気絶縁性、 PCT (プレッシャー 'クッ力一.テスト) 耐性、密着性、はんだ耐熱性、耐薬品性、無電解金めつき耐性等の諸特性を充分に 満足させる硬化物を与える硬化性組成物及ぴその硬化物を提供することにある。 発明の開示  [0010] Another object of the present invention is to have excellent photo-curing and / or thermo-curing properties, as well as excellent crack resistance due to heat cycles, electrical insulation, PCT (pressure 'cooking force. Test) resistance, An object of the present invention is to provide a curable composition that provides a cured product that sufficiently satisfies various properties such as adhesion, solder heat resistance, chemical resistance, and electroless plating resistance, and a cured product thereof. Disclosure of the invention
[0011] 前記目的を達成するために、本発明によれば、下記一般式(1)で表わされるテトラ  [0011] In order to achieve the above object, according to the present invention, a tetracarboxylic acid represented by the following general formula (1)
(メタ)アタリレートイ匕合物が提供される。  A (meth) atare toy dagger is provided.
[化 1]  [Chemical 1]
Figure imgf000005_0001
Figure imgf000005_0001
(但し、 R R R3、 R4は水素原子又はメチル基を表わし、 Xはジカルボン酸残基を 表わす。) (However, RRR 3 and R 4 represent a hydrogen atom or a methyl group, and X represents a dicarboxylic acid residue.)
[0012] なお、本明細書において、(メタ)アタリレートは、アタリレート及びメタクリレートを総 称する用語であり、同様にアクリル酸又はメタクリル酸を (メタ)アクリル酸と表記し、ァ クリロイル棊又はメタクリロイル基を (メタ)アタリロイル基と表記する。  [0012] In this specification, (meth) acrylate is a general term for acrylate and methacrylate. Similarly, acrylic acid or methacrylic acid is referred to as (meth) acrylic acid, and acryloyl or methacryloyl. The group is referred to as a (meth) atalyloyl group.
[0013] 好適な態様によれば、前記一般式(1)において、前記ジカルボン酸残基 Xは、脂肪 族ジカルボン酸残基又は芳香族ジカルボン酸残基である。前記ジカルボン酸残基 X が芳香族ジカルボン酸残基の場合、好ましくは、前記ジカルボン酸残基 Xは、下記式  According to a preferred embodiment, in the general formula (1), the dicarboxylic acid residue X is an aliphatic dicarboxylic acid residue or an aromatic dicarboxylic acid residue. When the dicarboxylic acid residue X is an aromatic dicarboxylic acid residue, preferably, the dicarboxylic acid residue X is represented by the following formula:
差替え用紙(親則 ) (Bl)〜 (B7)で表わされるレ、ずれかの芳香族ジカルボン酸残基であり、より好ましく は下記式 (B3)の芳香族ジカルボン酸残基である。 Replacement form (parent rules) The aromatic dicarboxylic acid residues represented by (Bl) to (B7) are more preferably the aromatic dicarboxylic acid residues represented by the following formula (B3).
[化 2]  [Formula 2]
Figure imgf000006_0001
Figure imgf000006_0001
[0014] さらに本発明によれば、前記テトラ (メタ)ァクリレートイヒ合物の硬ィ匕物が提供される [0014] Further, according to the present invention, there is provided a hardened product of the above-mentioned compound of tetra (meth) acrylate.
[0015] 本発明のテトラ (メタ)ァクリレートイ匕合物は、 1分子中に 4個の不飽和基を有し、二 股状の末端にそれぞれ (メタ)アタリロイル基を有する一対のユニットが各々、熱的に 安定なエステル結合を介する、又はエステル結合を介して、アルキレンもしくはポリメ チレン又は芳香環などにより連結された構造を有するため、光硬化性及び Ζ又は熱 硬化性に優れ、且つ、その硬化物は耐吸湿性並びに高湿下での耐熱性及び柔軟性 に優れてレ、る。 [0015] The tetra (meth) acrylate derivatized product of the present invention has four unsaturated groups in one molecule and a pair of units each having a (meth) atalyloyl group at a forked terminal, It has a structure linked by an alkylene, a polymethylene, an aromatic ring, or the like via a thermally stable ester bond or an ester bond. The material is excellent in moisture absorption resistance, heat resistance under high humidity and flexibility.
[0016] 本発明の他の側面によれば、前記一般式(1)で表わされるテトラ (メタ)アタリレート 化合物を含有することを特徴とする硬化性組成物が提供される。好適な態様によれ ば、前記一般式(1)において、前記ジカルボン酸残基 Xが脂肪族ジカルボン酸残基 又は芳香族ジカルボン酸残基であるテトラ (メタ)ァクリレートイ匕合物が用レ、られる。前 記ジカルボン酸残基 Xが芳香族ジカルボン酸残基の場合、好ましくは、前記ジカルボ ン酸残基 Xは、前記式 (B1)〜(Β7)で表わされるいずれかの芳香族ジカルボン酸残  [0016] According to another aspect of the present invention, there is provided a curable composition comprising the tetra (meth) atalylate compound represented by the general formula (1). According to a preferred embodiment, a tetra (meth) acrylate conjugate in which the dicarboxylic acid residue X is an aliphatic dicarboxylic acid residue or an aromatic dicarboxylic acid residue in the general formula (1) is used. . When the dicarboxylic acid residue X is an aromatic dicarboxylic acid residue, preferably, the dicarboxylic acid residue X is any of the aromatic dicarboxylic acid residues represented by the formulas (B1) to (Β7).
萆替え用紙- (mm 基であり、より好ましくは前記式 (B3)の芳香族ジカルボン酸残基である。 Replacement paper-(mm And more preferably an aromatic dicarboxylic acid residue of the formula (B3).
[0017] 本発明の硬化性組成物のさらに好適な態様によれば、前記したようなテトラ (メタ)ァ タリレート化合物と共に、他のラジカル重合性モノマー及び Z又は重合開始剤を含有 し、あるいはさらに繊維強化材を含有する。 ' According to a further preferred embodiment of the curable composition of the present invention, the composition contains, in addition to the above-mentioned tetra (meth) phthalate compound, another radically polymerizable monomer and Z or a polymerization initiator, or Contains fiber reinforcement. '
[0018] 本発明のさらに他の側面によれば、上記硬化性組成物を用いて得られる硬化物が 提供される。好適な態様によれば、硬化物はガラス繊維、炭素繊維、ァラミド繊維等 の繊維強化材を含有する。  According to still another aspect of the present invention, there is provided a cured product obtained using the curable composition. According to a preferred embodiment, the cured product contains a fiber reinforcement such as glass fiber, carbon fiber, and aramide fiber.
[0019] 前記硬化性組成物は、前記した構造を有するテトラ (メタ)アタリレート化合物を含有 するため、光硬化性及び/又は熱硬化性に優れ、且つ、その硬化物は耐吸湿性並 ぴに高湿下での耐熱性及び柔軟性に優れている。  [0019] The curable composition contains a tetra (meth) atalylate compound having the above-mentioned structure, so that the curable composition is excellent in photocurability and / or heat curability, and the cured product has the same moisture absorption resistance. Excellent heat resistance and flexibility under high humidity.
[0020] 本発明の別の側面によれば、(A)カルボキシル基含有化合物、(B)前記一般式(1 )で表わされるテトラ (メタ)ァクリレートイ匕合物、(C)重合開始剤、及び (D)希釈溶剤 を含有することを特徴とする硬化性組成物が提供される。好適な態様によれば、前記 一般式(1)において、前記ジカルボン酸残基 Xが脂肪族ジカルボン酸残基又は芳香 族ジカルボン酸残基であるテトラ (メタ)アタリレートイ匕合物が用いられる。前記ジカル ボン酸残基 Xが芳香族ジカルボン酸残基の場合、'好ましくは、前記ジカルボン酸残 基 Xは、前記式 (B1)〜(B7)で表わされるいずれかの芳香族ジカルボン酸残基であ り、より好ましくは前記式 (B3)の芳香族ジカルボン酸残基である。 '  According to another aspect of the present invention, (A) a carboxyl group-containing compound, (B) a tetra (meth) acrylate derivative represented by the general formula (1), (C) a polymerization initiator, and (D) A curable composition characterized by containing a diluting solvent. According to a preferred embodiment, there is used a tetra (meth) atalylate compound in which the dicarboxylic acid residue X in the general formula (1) is an aliphatic dicarboxylic acid residue or an aromatic dicarboxylic acid residue. . When the dicarboxylic acid residue X is an aromatic dicarboxylic acid residue, preferably, the dicarboxylic acid residue X is any of the aromatic dicarboxylic acid residues represented by the formulas (B1) to (B7). And more preferably an aromatic dicarboxylic acid residue of the above formula (B3). '
[0021] 本発明の硬化性組成物のさらに好適な態様によれば、前記したような各成分にカロ えて、さらに (E) l分子中に 2個以上の環状エーテルを有する化合物、又はさらに (F )硬化触媒、あるレ、はさらにさらに (G)他のラジカル重合性モノマーを含有する。  According to a further preferred embodiment of the curable composition of the present invention, in addition to the components described above, (E) a compound having two or more cyclic ethers in a molecule, or F) The curing catalyst, some resins further contain (G) other radically polymerizable monomers.
[0022] 本発明のさらに別の側面によれば、上記硬化性組成物を用いて得られる硬化物が ' 提供される。  According to still another aspect of the present invention, there is provided a cured product obtained using the curable composition.
[0023] 前記硬化性組成物は、アルカリ可溶性である (A)力ルポキシル基含有化合物や、 ( C)重合開始剤、(D)希釈溶剤と共に、(B)前記した構造を有するテトラ (メタ)アタリレ ート化合物を含有するため、アルカリ現像可能であると共に、光硬化性及び/又は 熱硬化性に優れ、且つ、その硬化物は、ヒートサイクルによる耐クラック性に優れると 共に、電気絶縁性、 PCT耐性、密着性、はんだ耐熱性、耐薬品性、無電解金めつき 耐性等の特性にも優れている。また、上記各成分に加えて、熱硬化性成分として (E) 1分子中に 2個以上の環状エーテルを有する化合物を含有する硬化性組成物の場 合、露光現像後の熱硬化により、電気絶縁性、 PCT耐性、密着性、はんだ耐熱性、 耐薬品性、無電解金めつき耐性等の諸特性をさらに 上させることができ、さらに (F )硬化触媒を含有することにより硬化開始温度を低くでき、また熱硬化反応を促進す ることができる。あるレ、はさらに (G)他のラジカル重合性モノマーを含有する硬化性組 成物の場合、光硬化性がより一層向上する。 [0023] The curable composition comprises (B) tetra (meth) having the above-mentioned structure together with an alkali-soluble (A) compound containing a propyloxyl group, (C) a polymerization initiator, and (D) a diluting solvent. Since it contains an atalylate compound, it can be alkali-developed and has excellent photo-curing and / or thermo-curing properties, and the cured product has excellent resistance to cracks due to heat cycles, electrical insulation, PCT resistance, adhesion, solder heat resistance, chemical resistance, electroless gold plating Excellent in properties such as resistance. In addition, in the case of a curable composition containing (E) a compound having two or more cyclic ethers in one molecule as a thermosetting component, in addition to each of the above components, the thermosetting after exposure and development causes an electric Various properties such as insulation, PCT resistance, adhesion, solder heat resistance, chemical resistance, and electroless plating resistance can be further improved.Furthermore, by including (F) a curing catalyst, the curing start temperature can be reduced. It can lower the temperature and accelerate the thermosetting reaction. In the case of a curable composition containing (G) another radical polymerizable monomer, the photocurability is further improved.
図面の簡単な説明 Brief Description of Drawings
[図 1]合成例 1で得られたテトラ (メタ)アタリレート化合物の赤外線吸収スペクトルを示 すグラフである。 '  FIG. 1 is a graph showing an infrared absorption spectrum of a tetra (meth) atalylate compound obtained in Synthesis Example 1. '
[図 2]合成例 1.で得られたテトラ (メタ)アタリレート化合物の核磁気共鳴スペクトルを示 すグラフである。  FIG. 2 is a graph showing a nuclear magnetic resonance spectrum of the tetra (meth) atalylate compound obtained in Synthesis Example 1.
[図 3]合成例 1で得られたテトラ (メ'タ)アタリレートィヒ合物の高速液体クロマトグラフィー によるクロマトグラムを示すグラフである。 . · FIG. 3 is a graph showing a chromatogram of the tetra (meth) atalylate compound obtained in Synthesis Example 1 by high performance liquid chromatography. ·
[図 4]合成例 2で得られたテトラ (メタ) Tクリレートイ匕合物の赤外線吸収スペクトルを示 すグラフである。 FIG. 4 is a graph showing an infrared absorption spectrum of a tetra (meth) T acrylate compound obtained in Synthesis Example 2.
[図 5]合成例 2で得られたテトラ (メタ)アタリレートィヒ合物の核磁気共鳴スペクトルを示 すグラフである。  FIG. 5 is a graph showing a nuclear magnetic resonance spectrum of a tetra (meth) atalylate compound obtained in Synthesis Example 2.
[図 6]合成例 2で得られたテトラ (メタ)アタリレートイ匕合物の高速液体クロマトグラフィー によるクロマトグラムを示すグラフである。  FIG. 6 is a graph showing a chromatogram of the tetra (meth) atalylate toyori product obtained in Synthesis Example 2 by high performance liquid chromatography.
面 7]TG曲線から耐熱温度を求める方法を説明するためのグラフである。 FIG. 7 is a graph for explaining a method for obtaining a heat resistant temperature from a TG curve.
[図 8]合成例 3で得られたオイルの高速液体クロマトグラフィーによるクロマトグラムを 示すグラフである。  FIG. 8 is a graph showing a chromatogram of the oil obtained in Synthesis Example 3 by high performance liquid chromatography.
[図 9]合成例 3で得られたテトラ (メタ)ァクリレートイ匕合物の赤外線吸収スペクトルを示 すグラフである。  FIG. 9 is a graph showing an infrared absorption spectrum of the tetra (meth) acrylate conjugate obtained in Synthesis Example 3.
[図 10]合成例 3で得られたテトラ (メタ)アタリレートイ匕合物の核磁気共鳴スペクトルを 示すグラフである。  FIG. 10 is a graph showing a nuclear magnetic resonance spectrum of a tetra (meth) atalylate toyid product obtained in Synthesis Example 3.
[図 11]合成例 3で得られたテトラ (メタ)アタリレート化合物の高速液体クロマトグラフィ 一によるクロマトグラムを示すグラフである。 [FIG. 11] High performance liquid chromatography of the tetra (meth) atalylate compound obtained in Synthesis Example 3 1 is a graph showing a chromatogram according to Example 1.
[0035] [図 12]合成例 4で得られたオイルの高速液体クロマトグラフィーによるクロマトグラムを 示すグラフである。 ' ' FIG. 12 is a graph showing a chromatogram of the oil obtained in Synthesis Example 4 by high performance liquid chromatography. ''
[0036] [図 13]合成例 4で得られたテトラ (メタ)ァクリレートイ匕合物の赤外線吸収スペクトルを , 示すグラフである。  FIG. 13 is a graph showing an infrared absorption spectrum of the tetra (meth) acrylate derivative obtained in Synthesis Example 4.
[0037] [図 14]合成例 4で得られたテトラ (メタ)アタリレート化合物の核磁気共鳴スペクトルを . 示すグラフである。  FIG. 14 is a graph showing a nuclear magnetic resonance spectrum of the tetra (meth) atalylate compound obtained in Synthesis Example 4.
[0038] [図 15]合成例 4得られたテトラ (メタ)アタリレートイ匕合物の高速液体クロマトグラフィー によるクロマトグラムを示すグラフである。 .  FIG. 15 is a graph showing a chromatogram of the obtained tetra (meth) atalylate toyori product obtained by high performance liquid chromatography. .
[0039] [図 16]合成例 4で得られた液体の赤外線吸収スペクトルを示すグラフである。 FIG. 16 is a graph showing an infrared absorption spectrum of the liquid obtained in Synthesis Example 4.
[0040] [図 17]合成例 4で得られた液体の 磁気共鳴スペクトルを示すグラフである。 FIG. 17 is a graph showing a magnetic resonance spectrum of the liquid obtained in Synthesis Example 4.
[0041] [図 18]合成例 4で得られた液体の高速液体クロマトグラフィーによるクロマトグラムを 示すグラフである。 FIG. 18 is a graph showing a chromatogram of the liquid obtained in Synthesis Example 4 by high performance liquid chromatography.
[0042] [図 19]合成例 5で得られたオイルの高速液体クロマトグラフィーによるクロマトグラムを 示すグラフである。  FIG. 19 is a graph showing a chromatogram of the oil obtained in Synthesis Example 5 by high performance liquid chromatography.
[0043] [図 20]合成例 5で得られたテトラ (メタ)アタリレートイ匕合物の赤外線吸収スペクトルを■ 示すグラフである。 ·  FIG. 20 is a graph showing an infrared absorption spectrum of the tetra (meth) atalylate ligated product obtained in Synthesis Example 5. ·
[0044] , , [図 21]合成例 5で得られたテトラ (メタ)アタリレートイ匕合物の核磁気共鳴スペクトルを 示すグラフである。 1 [0044] FIG. 21 is a graph showing a nuclear magnetic resonance spectrum of a tetra (meth) atalylate conjugate obtained in Synthesis Example 5. 1
[0045] [図 22]合成例 5で得られたテトラ (メタ)ァクリレートイ匕合物の高速液体クロマトグラフィ • . 一によるクロマトグラムを示すグラフである。  FIG. 22 is a graph showing a chromatogram by high performance liquid chromatography of the tetra (meth) acrylate conjugate obtained in Synthesis Example 5.
[0046] [図 23]合成例 6で得られたテトラ (メタ)アタリレート化合物と 3—アタリロイ口キシー 2— ヒドロキシプロピルメタクリレートとの混合物の核磁気共鳴スペクトルを示すグラフであ FIG. 23 is a graph showing a nuclear magnetic resonance spectrum of a mixture of the tetra (meth) atalylate compound obtained in Synthesis Example 6 and 3-attaryloyxy-2-hydroxypropyl methacrylate.
. る。 .
[0047] [図 24]合成例 6で得られたテトラ (メタ)ァクリレートイ匕合物と 3—アタリロイ口キシー 2— ヒドロキシプロピルメタクリレートとの混合物の高速液体クロマトグラフィーによるクロマ トグラムを示すグラフである。  FIG. 24 is a graph showing a chromatogram of a mixture of a tetra (meth) acrylate conjugate obtained in Synthesis Example 6 and 3-attaryloyxyx-2-hydroxypropyl methacrylate by high performance liquid chromatography.
[0048] [図 25]合成例 6で得られたテトラ (メタ)アタリレート化合物と 3—ァクリロイ口キシ一 2— ヒドロキシプロピルメタタリレートとの混合物の赤外線吸収スペクトルを示すグラフであ る。 · ' [FIG. 25] The tetra (meth) atalylate compound obtained in Synthesis Example 6 and 3-acryloylic acid 4 is a graph showing an infrared absorption spectrum of a mixture with hydroxypropyl methacrylate. · '
[0049] [図 26]3,—アタリロイ口キシ— 2—ヒドロキシプロピルメタタリレートの核磁気共鳴スぺク トルを示すグラフである。  FIG. 26 is a graph showing a nuclear magnetic resonance spectrum of 3, -attaryloy xy-2-hydroxypropyl methacrylate.
[0050] [図 27]3—アタリロイ口キシー 2—ヒドロキシプロピルメタタリレートの高速液体クロマトグ ラフィ一によるクロマトグラムを示すグラフである。 FIG. 27 is a graph showing a chromatogram of 3-attaryloy oxy-2-hydroxypropyl methacrylate according to high performance liquid chromatography.
[0051] [図 28]後述する式 (3)で示される構造のモノカルボン酸の核磁気共鳴スペクトルを示FIG. 28 shows a nuclear magnetic resonance spectrum of a monocarboxylic acid having a structure represented by the following formula (3).
.すグラフである。 This is a graph.
[0052] [図 29]合成例 7で得られたテトラ (メタ)ァクリレートイ匕合物と 3—アタリロイ口キシー 2_ ' ヒドロキシプロピルメタクリレートとの混合物の核磁気共鳴スペクトルを示すグラフであ る。  FIG. 29 is a graph showing a nuclear magnetic resonance spectrum of a mixture of the tetra (meth) acrylate conjugate obtained in Synthesis Example 7 and 3-attaryloyoxy2 _′- hydroxypropyl methacrylate.
[0053] [図 30]合成例 8で得られたテトラ (メタ)アタリレート化合物と 3—アタリロイ口キシ一 2— ヒドロキシプロピルメタタリレートとの混合物の核磁気共鳴スペクトルを示すグラフ あ る。 ' '  FIG. 30 is a graph showing a nuclear magnetic resonance spectrum of a mixture of the tetra (meth) atalylate compound obtained in Synthesis Example 8 and 3-attaryloy xy-12-hydroxypropyl methacrylate. ''
[0054] [図 31]合成例 8で得られたテトラ (メタ)ァクリレートイ匕合物と 3—ァクリロイ口キシ一 2— ヒドロキシプロピルメタタリレートとの混合物のゲル浸透クロマトグラフィーによるクロマ [FIG. 31] Chromatography by gel permeation chromatography of a mixture of the tetra (meth) acrylate conjugate obtained in Synthesis Example 8 and 3-acryloyl oxy-1-hydroxypropyl methacrylate
1、グラムを示すグラフである。 1 is a graph showing grams.
[0055] . [図 32]合成例 8で得られたテトラ (メタ)ァクリレートイ匕合物と 3—アタリロイロキシー2— ヒドロキシプロピルメタタリレートとの混合物の赤外線吸収スペクトルを示すグラフであ る。 FIG. 32 is a graph showing an infrared absorption spectrum of a mixture of the tetra (meth) acrylate conjugate obtained in Synthesis Example 8 and 3-attaryloyloxy-2-hydroxypropyl methacrylate.
[0056] [図 33] 3—アタリロイロキシ - 2-ヒドロキシプロピルメタタリレートのゲル浸透クロマトグ ラフィーによるクロマトグラムを示すグラフである。  FIG. 33 is a graph showing a chromatogram by gel permeation chromatography of 3-atalylyloxy-2-hydroxypropyl methacrylate.
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
[0057] 本発明者は、前記の課題を解決するため鋭意検討を重ねた結果、前記一般式 (1) で表わされるテトラ (メタ)アタリレートが、光硬化性及び/又は熱硬化性に優れ、且 つ、その硬化物は耐吸湿性並びに高湿下での耐熱性及び柔軟性に優れていること を見出した。 The present inventors have conducted intensive studies in order to solve the above-mentioned problems, and as a result, the tetra (meth) atalylate represented by the general formula (1) is excellent in photocurability and / or heat curability. Further, it has been found that the cured product is excellent in moisture absorption resistance, heat resistance under high humidity and flexibility.
[0058] また、本発明者は、前記一般式(1)で表わされるテトラ (メタ)アタリレートイ匕合物を 含有する硬化性組成物、好ましくは、さらに他のラジカル重合性モノマー及ぴ Z又は 重'合開始剤あるいはさらに繊維強化材を含有する硬化性組成物力 優れた光硬化 性及び/又は熱硬化性を示し、且つ、優れた耐吸湿性並びに高湿下での優れた耐 熱性及び柔軟性を有する硬化物を与えることを見出した。すなわち、本発明の硬化 性組成物に用いられる前記一般式 (1)で表わされるテトラ (メタ)アタリレート化合物はFurther, the present inventor has proposed a tetra (meth) atalylate toy compound represented by the general formula (1). Curable composition containing, preferably, further curable composition containing other radically polymerizable monomer and Z or a polymerization initiator or further a fiber reinforcing material.Excellent photocurability and / or heat curability. The present invention has been found to give a cured product having excellent moisture absorption resistance and excellent heat resistance and flexibility under high humidity. That is, the tetra (meth) atalylate compound represented by the general formula (1) used in the curable composition of the present invention is
、熱的に安定なェズテル結合を有し、また 1分子中に 4個の不飽和基を有しているた め光硬化性及ぴ Z又は熱硬化性に優れ、且つ、耐吸湿性 も優れている。しかも、 1 分子中に 4個という適切な数の不飽和基を有するため、硬くて脆い硬化皮膜を形成 . し難ぐ靭性に優れた硬化物が得られる。従って、このテトラ (メタ)ァクリレートイ匕合物 と共に、他のラジカル重合性モノマー、,重合開始剤、繊維強化材等を含有してなる硬 , 化性組成物は、優れた光硬化性及び/又は熱硬化性を示し、且つ、優れた耐吸湿 性並びに高湿下での優れ.た耐熱性及び柔軟性を有する硬化物を与える。 , [0059] さらに本発明者は、カルボキシル基含有ィ匕合物 (A)、重合開始剤 (C)、希釈溶剤 ( D)等と共に、前記一般式(1)で表わされるテトラ (メタ)アタリレート化合物 (B)を含有 . する硬化性組成物が、優れた光硬化性及び/又は熱硬化性を示すと共に、その硬 化物が、優れた耐クラック性に加え、前記した電気絶縁性、 PCT耐性、密着性、はん だ耐熱性、耐薬品性、無電解金めつき耐性等の 特性に優れた硬化物を与えること 'を見出した。 It has a thermally stable ester bond and has four unsaturated groups in one molecule, so it is excellent in photocurability and Z or heat curability, and also excellent in moisture absorption resistance ing. Moreover, since the molecule has an appropriate number of unsaturated groups of four in one molecule, a hardened product having excellent toughness, which hardly forms a hard and brittle hardened film, can be obtained. Therefore, the curable composition containing the radical polymerization polymerizable monomer, the polymerization initiator, the fiber reinforcing material, and the like, together with the tetra (meth) acrylate conjugate, has excellent photocurability and / or excellent curability. A cured product that shows thermosetting properties and has excellent moisture absorption resistance and excellent heat resistance and flexibility under high humidity. [0059] Further, the present inventors have proposed the tetra (meth) atari represented by the general formula (1) together with the carboxyl group-containing conjugate (A), the polymerization initiator (C), the diluting solvent (D) and the like. The curable composition containing the rate compound (B) exhibits excellent photo-curing and / or thermo-curing properties, and the cured product has the above-mentioned electrical insulating properties and PCT in addition to excellent crack resistance. It gives a cured product with excellent properties such as resistance, adhesion, solder heat resistance, chemical resistance, and electroless plating resistance.
[0060] 'すなわち、硬化性成分として、前記したように光硬化性及び/又は熱硬化性に優 れ、且つ、耐水性に優れると共に、靭性に優れた硬化物を与える前記テトラ (メタ)ァ タリレート化合物(B)を含有すると共に、アルカリ可溶性のカルボキシル基含有化合 物 (A)、重合開始剤 (C)及び希釈溶剤 (D)を含有し、好ましくは、さらに 1分子中に 2 個以上の環状エーテルを有する化合物(E)、又はさらに硬化触媒 (F)、あるいはさら にさらに他のラジカル重合性モノマー(G)を含有してなる硬化性組成物は、アルカリ 現像可能であると共に、優れた光硬化性及び/又は熱硬化性を示し、且つ、その硬 化物は、前記テトラ (メタ)アタリレート化合物 (B)によって、前記諸特性を得るために 必要な.密着性、低吸湿性、柔軟性及び耐熱性が付与される。  [0060] That is, as the curable component, the tetra (meth) acrylate as described above is excellent in light curability and / or heat curability, excellent in water resistance, and gives a cured product excellent in toughness. It contains a tallylate compound (B), an alkali-soluble carboxyl group-containing compound (A), a polymerization initiator (C) and a diluting solvent (D), and preferably contains two or more per molecule. The curable composition containing the compound (E) having a cyclic ether, the curing catalyst (F), or further another radically polymerizable monomer (G) is excellent in alkali developability and excellent in alkali development. It shows photo-curing and / or thermo-curing properties, and its cured product is necessary for obtaining the above-mentioned properties by the above-mentioned tetra (meth) acrylate compound (B). And heat resistance.
[0061] 以下に、本発明のテトラ (メタ)ァクリレートイ匕合物、それを含有する硬化性組成物及 ぴそれらの硬化物について詳細に説明する。 [0061] Hereinafter, the tetra (meth) acrylate conjugate of the present invention, a curable composition containing the same, and ぴ These cured products will be described in detail.
[0062] まず、本発明のテトラ (メタ)アタリレートイ匕合物は、種々の方法によって得ることがで きる。例えば、下記一般式(2)で表わされる 3— (メタ)ァクリロイ口キシー 2—ヒドロキシ プロピル (メタ)ァクリレートと、ジカルボン酸クロライド又はジカルボン酸もしくはその無 水物又はジカルボン酸エステルとのエステルイ匕などである。これらの中でも、好ましい 方法は、 3—(メタ)アタリロイ口キシー 2—ヒドロキシプロピル (メタ)アタリレートと月旨肪 族ジカルボン酸クロライド又は芳香族ジカルボン酸クロライドとの脱塩酸反応、及ぴ 3 - (メタ)アタリロイ口キシー 2—ヒドロキシプロピル (メタ)アタリレートと脂肪族ジカルボ ン酸との脱水縮合反応によるエステルイ匕である。  [0062] First, the tetra (meth) atalylate conjugate of the present invention can be obtained by various methods. For example, esterification of 3- (meth) acryloyl oxy-2-hydroxypropyl (meth) acrylate represented by the following general formula (2) with dicarboxylic acid chloride or dicarboxylic acid or its anhydride or dicarboxylic acid ester. is there. Among them, preferred methods include a dehydrochlorination reaction of 3- (meth) atalyloic oxy-2-hydroxypropyl (meth) atalylate with lunar aliphatic dicarboxylic acid chloride or aromatic dicarboxylic acid chloride, and 3- ( This is an esterification by a dehydration condensation reaction between a (meth) ataryloy xy-2-hydroxypropyl (meth) atalylate and an aliphatic dicarbonic acid.
[化 3]  [Formula 3]
R1 0 O R2 R 1 0 OR 2
CH,= C - C -O-CH, -CH -CH,一 0— C— C = CH, ( 2 )  CH, = C-C -O-CH, -CH -CH, -1 0— C— C = CH, (2)
OH  OH
(但し、 R R2は水素原子又はメチル基を表わす。 ) (However, RR 2 represents a hydrogen atom or a methyl group.)
[0063] 前記 3 (メタ)アタリロイ口キシ一 2—ヒドロキシプロピル (メタ)アタリレートは、(メタ) アクリル酸とグリシジル (メタ)アタリレートとの反応によって得ることができる力 S、(メタ) アクリル酸及ひブ又はそのエステル類とグリセリンとの反応、(メタ)アクリル酸とグリシ ドールとの反応などによっても得ることができる。  [0063] The above-mentioned 3 (meth) ataryloy oxy-2-hydroxypropyl (meth) acrylate is a compound that can be obtained by the reaction between (meth) acrylic acid and glycidyl (meth) atalylate. It can also be obtained by the reaction of acid and / or its esters with glycerin and the reaction of (meth) acrylic acid with glycidol.
[0064] 前記脂肪族ジカルボン酸クロライドとしては、例えば、コハク酸クロライド、グルタル 酸クロライド、アジピン酸クロライド、スベリン酸クロライド、ァゼライン酸クロライド、セバ シン酸クロライドなどの脂肪族飽和ジカルボン酸ハライド、フマル酸クロライドなどの脂 肪族不飽和ジカルボン酸ハライドなどが挙げられる。  Examples of the aliphatic dicarboxylic acid chloride include saturated aliphatic dicarboxylic acid halides such as succinic acid chloride, glutaric acid chloride, adipic acid chloride, suberic acid chloride, azelaic acid chloride, and sebacic acid chloride, and fumaric acid chloride. And aliphatic unsaturated dicarboxylic acid halides.
[0065] また、前記脂肪族ジカルボン酸としては、例えば、シユウ酸、マロン酸、コハク酸、グ ルタル酸、アジピン酸、ピメリン酸、スベリン酸、ァゼライン酸、セバシン酸などの脂肪 族飽和ジカルボン酸、マレイン酸、フマル酸などの脂肪族不飽和ジカルボン酸などが 挙げられ、脂肪族ジカルボン酸無水物としては、無水コハク酸、無水ダルタル酸など  [0065] Examples of the aliphatic dicarboxylic acid include saturated aliphatic dicarboxylic acids such as oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, and sebacic acid; Examples include aliphatic unsaturated dicarboxylic acids such as maleic acid and fumaric acid, and examples of aliphatic dicarboxylic anhydrides include succinic anhydride and dartaric anhydride.
差替え用紙(規則 26) の脂肪族飽和ジカルボン酸の無水物、無水マレイン酸などの脂肪族不飽和ジカルボ ン酸の無水物などが挙げられる。 . Replacement form (Rule 26) Anhydrides of aliphatic saturated dicarboxylic acids, anhydrides of aliphatic unsaturated dicarboxylic acids such as maleic anhydride, and the like. .
[0066] さらに、前記脂肪族ジカルボン酸エステルとしては、例えば、マロン酸ジメチル、コ ハク酸ジメチル、グノレタル酸ジメチル、アジピン酸ジメチル、スベリン酸ジメチル、セバ シン酸ジメチルなどの脂肪族飽和ジカルボン酸エステル、マレイン酸ジメチルなどの 脂肪族不飽和ジカルボン酸エステルなどが挙げられる。  Further, as the aliphatic dicarboxylic acid ester, for example, aliphatic saturated dicarboxylic acid esters such as dimethyl malonate, dimethyl succinate, dimethyl gnoletate, dimethyl adipate, dimethyl suberate and dimethyl sebacate; And aliphatic unsaturated dicarboxylic acid esters such as dimethyl maleate.
[0067] 前記芳香族ジカルボン酸クロライドとしては、例えば、 o—フタル酸クロライド、イソフ タル酸クロライド、テレフタル酸クロライドなどが挙げられる。  [0067] Examples of the aromatic dicarboxylic acid chloride include o-phthalic acid chloride, isophthalic acid chloride, terephthalic acid chloride and the like.
[0068] また、前記芳香族ジカルボン酸としては、例えば、 o,—フタル酸、イソフタル酸、テレ フタル酸、 1, 4 _ナフタレンジカルボン酸、 2, 3—ナフタレンジカルボン酸、 2, 6— ナフタレンジカルボン酸、 2, 7 _ナフタレンジ ルボン酸などが挙げられ、芳香族ジ カルボン酸無水物としてまフタル酸無水物などが挙げられる。  [0068] Examples of the aromatic dicarboxylic acid include o, -phthalic acid, isophthalic acid, terephthalic acid, 1,4-naphthalenedicarboxylic acid, 2,3-naphthalenedicarboxylic acid, and 2,6-naphthalenedicarboxylic acid. Acid, 2,7-naphthalenedirubonic acid and the like; and aromatic dicarboxylic anhydrides such as phthalic anhydride.
[0069] , さらに、前記芳香族ジカルボン酸エステルとしては、例えば、テレフタル酸ジメチル 、 2, 6—ナフタレンジカルボン酸ジメチルエステルなどが挙げられる。  [0069] Examples of the aromatic dicarboxylic acid esters include dimethyl terephthalate and dimethyl 2,6-naphthalenedicarboxylic acid.
[0070] これら芳香族ジカルボン酸クロライド、芳香族ジカルボン酸もしくはその無水物、芳 香族ジカルボン酸エステルの中でも、反応収率、入手の容易性等の観点から、 香 族ジカルボン酸クロライド、特にテレフタル酸クロライド及ぴナフタレンジカルボン酸ク ' 口ライドが好ましい。 '  [0070] Among these aromatic dicarboxylic acid chlorides, aromatic dicarboxylic acids or anhydrides, and aromatic dicarboxylic acid esters, aromatic dicarboxylic acid chlorides, particularly terephthalic acid, are preferred from the viewpoints of reaction yield, availability, and the like. Chloride and naphthalenedicarboxylic acid chloride are preferred. '
[0071] 脂肪族ジカルボン酸クロライド又は芳香族ジカルボン酸クロライドと 3 - (メタ)アタリ ロイロキシ _ 2—ヒドロキシプロピレ (メタ)ァクリレートとのエステル化反応は、 3—(メタ )アタリロイ口キシー 2—ヒドロキシプロピル (メタ)アタリレートと脂肪族ジカルボン酸クロ ライド又は芳香族ジカルボン酸クロライドとを反応容器に入れてぉレ、て行なってもよレヽ し、また、予め 3— (メタ)アタリロイロキシー2—ヒドロキシプロピル (メタ)アタリレートを 反応容器に入れてぉレ、て、脂肪族ジカルボン酸クロライド又は芳香族ジカルボン酸ク 口ライドを滴下して行なってもよいし、逆に脂肪族ジカルボン酸クロライド又は芳香族 ジカルボン酸クロライドを予め反応容器に入れておいて、 3—(メタ)アタリロイ口キシー 2—ヒドロキシプロピノレ (メタ)アタリレートを加えて行なってもよい。  [0071] The esterification reaction of aliphatic dicarboxylic acid chloride or aromatic dicarboxylic acid chloride with 3- (meth) ataliyloxy-2-hydroxypropyl (meth) acrylate is carried out by 3- (meth) ataryloyxoxy-2-hydroxy. The propyl (meth) atalylate and the aliphatic dicarboxylic acid chloride or the aromatic dicarboxylic acid chloride may be placed in a reaction vessel, and the reaction may be carried out in advance. Hydroxypropyl (meth) acrylate may be placed in a reaction vessel, and aliphatic dicarboxylic acid chloride or aromatic dicarboxylic acid chloride may be added dropwise. Alternatively, aliphatic dicarboxylic acid chloride or aromatic dicarboxylic acid chloride may be added. The dicarboxylic acid chloride is placed in the reaction vessel in advance, and the 3- (meth) ataryloy Kishipuropinore (meth) may be performed by adding the Atari rate.
[0072] 3— (メタ)アタリロイ口キシ一 2—ヒドロキシプロピル (メタ)アタリレートと脂肪族ジカル ボン酸クロライドとの配合割合 (仕込み割合)は、通常、'モル比で 3一(メタ)アタリロイ ロキシ _ 2—ヒドロキシプロピル (メタ)アタリレート Z脂肪族ジカルボン酸クロライド =4 /3以上であることが好ましぐ一方、芳香族ジカルボン酸クロライドとの配合割合 (仕 込み割合)は、通常、モル比で 3— (メタ)アタリロイロキシ一 2—ヒドロキシプロピル (メ タ)アタリレートノ芳香族ジカルボン酸クロライド =4ノ 3以上、より好ましくは 2ノ 1以 上であることが望ましレ、。使用する 3—(メタ)アタリロイ口キシー 2—ヒドロキシプロピル (メタ)アタリレートの割合が少なレ、と、ジ (メタ)アタリレートなどの所望のテトラ (メタ)ァ クリレート以外の生成物が生成し易くなり、収率が低下する。逆に 3_ (メタ)アタリロイ 口キシ一 2—ヒドロキシプロピル (メタ)アタリレートの割合が多すぎると、不飽和基の重 合反応が起こり易くなり、高分子化する恐れがあるので好ましくない。また、 3_ (メタ) ァクリロイ口キシー 2—ヒドロキシプロピル (メタ)アタリレートの割合が多すぎると、未反 応の 3— (メタ)アタリロイ口キシー 2—ヒドロキシプロピノレ (メタ)アタリレートが残るので、 経済的にも好ましくない。従って、 3— (メタ)アタリロイ口キシー 2—ヒドロキシプロピル (メタ)アタリレ トと脂肪族ジカルボン酸クロライド.との割合は、モル比で 3—(メタ)ァ クリロイ口キシー 2—ヒドロキシプロピル (メタ)アタリレ ト Z脂肪族ジカルボン酸クロラ イド =4ノ 3〜3/1であることが好ましく、一方、芳香族ジカルボン酸クロライドとの割 合は、モル比で 3— (メタ)アタリロイ口キシ一 2—ヒドロキシプロピル (メタ)アタリレート /芳香族ジカルボン酸クロライド =4Z3〜3/1、より好ましくは 2/1〜3/1である . ことが望ましい。なお、上記配合割合は、脂肪族ジカルボン酸もしくはその無水物又 は脂肪族ジカルボン酸エステル、あるいは芳香族ジカルボン酸もしくはその無水物 . 又は芳香族ジカルボン酸エステルを用いる場合にっレ、ても同様である。 [0072] 3 -— (Meth) Atalilloyl Mouth 2-Hydroxypropyl (Meth) Atalylate and Aliphatic Dical It blending ratio of the carbon acid chloride (charge ratio) is usually 'in a molar ratio 3 one (meth) Atariroi proxy _ 2-hydroxypropyl (meth) Atari rate Z aliphatic dicarboxylic acid chloride = 4/3 or more On the other hand, the mixing ratio (preparation ratio) with the aromatic dicarboxylic acid chloride is usually 3-(meth) atalyloyloxy- 1-2-hydroxypropyl (meth) atalylate It is desirable that the acid chloride is 4 to 3 or more, more preferably 2 to 1 or more. The use of 3- (meth) ataryloy xylate with a small proportion of 2-hydroxypropyl (meth) acrylate and the formation of desired products other than tetra (meth) acrylate such as di (meth) acrylate And yield decreases. Conversely, if the proportion of 3_ (meth) ataryloy oxy-2-hydroxypropyl (meth) acrylate is too high, a polymerization reaction of unsaturated groups is liable to occur, which is not preferable because of the possibility of polymerization. Also, if the proportion of 3_ (meth) acryloyl oxy-2-hydroxypropyl (meth) acrylate is too high, unreacted 3- (meth) atalylo xy 2 -hydroxypropinole (meth) acrylate will remain. However, it is not economically favorable. Accordingly, the molar ratio of 3- (meth) ataryloy xy-2-hydroxypropyl (meth) atarylate to aliphatic dicarboxylic acid chloride is 3- (meth) acrylic oxy-2-hydroxypropyl (meth) in molar ratio. Atarilet Z aliphatic dicarboxylic acid chloride is preferably from 4 to 3/1, while the proportion with aromatic dicarboxylic acid chloride is 3-(meth) attaryloic acid chloride by molar ratio. It is desirable that hydroxypropyl (meth) acrylate / aromatic dicarboxylic acid chloride = 4Z3 to 3/1, more preferably 2/1 to 3/1. The above mixing ratio is the same even when an aliphatic dicarboxylic acid or its anhydride or an aliphatic dicarboxylic acid ester, or an aromatic dicarboxylic acid or its anhydride or an aromatic dicarboxylic acid ester is used. is there.
3—(メタ)アタリロイ口キシ— 2—ヒドロキシプロピル (メタ)アタリレートと脂肪族ジカル ボン酸クロライドとのエステルイ匕反応における反応温度は、一 70〜: 150°C、好ましく . は— 30〜120°Cであり、減圧下、常圧下、加圧下のいずれでも反応を行なうことがで きる。一方、 3—(メタ)アタリロイ口キシー 2—ヒドロキシプロピル (メタ)アタリレートと芳 香族ジカルボン酸クロライドとのエステル化反応における反応温度は、 0〜150°C、 好ましくは室温〜 120°Cであり、減圧下、常圧下、加圧下のいずれでも反応を行なう ことができる。 1 The reaction temperature in the esterification reaction of 3- (meth) ataryloy xy-2-hydroxypropyl (meth) atalylate with aliphatic dicarbonic acid chloride is from 70 to 150 ° C, preferably from 30 to 120 ° C. ° C, and the reaction can be performed under reduced pressure, normal pressure, or increased pressure. On the other hand, the reaction temperature in the esterification reaction of 3- (meth) ataryloy xy-2-hydroxypropyl (meth) atalylate with aromatic dicarboxylic acid chloride is 0 to 150 ° C, preferably room temperature to 120 ° C. Yes, the reaction can be carried out under reduced pressure, normal pressure, or increased pressure. 1
[0074] エステル化反応は、有機溶媒中で行なうことが好ましレヽ。有機溶媒としては、ベンゼ ン、トルエン、キシレン等の芳香族炭化水素類、ジェチルエーテル、テトラヒドロフラン . , 、ジォキサン等のエーテル類、 n—ヘプタン、シクロへキサン、 n—へキサン等の脂肪 族炭化水素類、ホルムアミド、 N, N—ジメチルホルムアミド等の窒素化合物等が好谪 に用いられる。これらの溶媒は、単独で又は 2種以上を混合して用いることができる。 溶媒の使用量は、特に限定されるものではないが、 3— (メタ)アタリロイ口キシー 2—ヒ ドロキシプロピル (メタ)アタリレートと脂肪族ジカルボン酸クロライド又は芳香族ジカル. ボン酸クロライドとの合計 100質量部に対して、 50〜: L000質量部の範囲が好ましい ' 。なお、上記反応温度及び溶媒の使用量は、脂肪族ジカルボン酸もしくはその無水 物又は脂肪族ジカルボン酸エステル、あるいは芳香族ジカルボン酸もしくはその無 . 水物又は芳香族ジカルボン酸エステルを用レ、る場合についても同様である。 [0074] The esterification reaction is preferably performed in an organic solvent. Examples of the organic solvent include aromatic hydrocarbons such as benzene, toluene, and xylene; ethers such as dimethyl ether, tetrahydrofuran,, and dioxane; and aliphatic hydrocarbons such as n -heptane, cyclohexane, and n- hexane. Hydrogens, nitrogen compounds such as formamide, N, N-dimethylformamide and the like are preferably used. These solvents can be used alone or in combination of two or more. The amount of the solvent to be used is not particularly limited. However, the amount of 3- (meth) atalyloic oxy-2-hydroxypropyl (meth) atalylate and aliphatic dicarboxylic acid chloride or aromatic dicarboxylic acid. For a total of 100 parts by mass, the range of 50 to: L000 parts by mass is preferable. The reaction temperature and the amount of the solvent used are determined when aliphatic dicarboxylic acid or its anhydride or aliphatic dicarboxylic acid ester, or aromatic dicarboxylic acid or its anhydride or aromatic dicarboxylic acid ester is used. The same applies to
[0075] また、上記エステル化反応は、重合禁止剤の存在下で行なうことが好ましレ、。重合 禁止剤としては、ハイドロキノン、メチルハイドロキノン、ハイドロキノンモノメチルエー テル、カテコール、ピロガロール、フエノチアジン、 4ーメトキシフエノール、 4一ターシ ャリープチルカテコール等が好適に用いられる。これらの重合禁止剤は、単独で又は 2種以上を混合して用いることができる。重合禁止剤の使用量は、通常、 3—(メタ)ァ . クリロイ口キシ一 2—ヒドロキシプロピル (メタ)アタリレート 100質量部に対して、 0. 00 1 5質量部の範囲であればよい。なお、上記重合禁止剤の使用量は、脂肪族ジカ ルボン酸もしくはその無水物又は脂肪族ジカルボン酸エステル、あるいは芳香族ジ カルボン酸もしくはその無水物又は芳香族ジカルボン酸エステルを用いる場合につ いても同様である。 . [0075] The esterification reaction is preferably performed in the presence of a polymerization inhibitor. As the polymerization inhibitor, hydroquinone, methylhydroquinone, hydroquinone monomethyl ether, catechol, pyrogallol, phenothiazine, 4-methoxyphenol, 4-tert-butylcatechol, and the like are suitably used. These polymerization inhibitors can be used alone or in combination of two or more. The amount of the polymerization inhibitor to be used is usually within the range of 0.0015 parts by mass with respect to 100 parts by mass of 3- (meth) a.cryloyl xy-2-hydroxypropyl (meth) atalylate. . The amount of the polymerization inhibitor to be used is not limited to the case where aliphatic dicarboxylic acid or its anhydride or aliphatic dicarboxylic acid ester, or aromatic dicarboxylic acid or its anhydride or aromatic dicarboxylic acid ester is used. The same is true. .
[0076] . さらに、エステルイ匕の際に発生する塩化水素を捕捉するため、トリメチルァミン、トリ 'ェチルァミン、 4ージメチルァミノピリジン等の 3級ァミン類が適宜用いられる。これらの 3級ァミンは、塩化水素と 4級アンモニゥム塩を形成することにより、塩化水素を捕捉 することができる。これら 3級ァミン類は、単独で又は 2種以上を混合して用レ、ることが できる。  Further, tertiary amines such as trimethylamine, triethylamine, 4-dimethylaminopyridine and the like are appropriately used in order to capture hydrogen chloride generated at the time of esterification. These tertiary amines can capture hydrogen chloride by forming quaternary ammonium salts with hydrogen chloride. These tertiary amines can be used alone or in combination of two or more.
[0077] なお、芳香族ジカルボン酸クロライド、芳香族ジカルボン酸もしくはその無水物、芳 香族ジカルボン酸エステルを用いる場合、エステル化反応終了後、トリェチルァミン W 200 When aromatic dicarboxylic acid chloride, aromatic dicarboxylic acid or its anhydride, or aromatic dicarboxylic acid ester is used, after the esterification reaction is completed, triethylamine is added. W 200
14 などのァミン類の塩基性塩を水に溶解させた後、酢酸ェチルや塩化メチレンなどの 抽出溶媒を加えて、本発明のテトラ (メタ)アタリレート化合物を含む反応混合物を抽 出する。また、反応混合物中に残存しているアミンを除去するために、反応混合物を 塩酸水溶液や硫酸水溶液などで洗浄することが好ましい。さらに、反応混合物中に 残存してレ、る芳香族ジカルボン酸クロライドを除去するために、反応混合物を炭酸水 素ナトリウム水溶液などで洗浄することが好ましレ、。  After dissolving a basic salt of an amine such as 14 in water, an extraction solvent such as ethyl acetate or methylene chloride is added to extract a reaction mixture containing the tetra (meth) atalylate compound of the present invention. Further, in order to remove the amine remaining in the reaction mixture, it is preferable to wash the reaction mixture with a hydrochloric acid aqueous solution, a sulfuric acid aqueous solution, or the like. Furthermore, in order to remove the aromatic dicarboxylic acid chloride remaining in the reaction mixture, it is preferable to wash the reaction mixture with an aqueous solution of sodium hydrogen carbonate.
[0078] 一方、脂肪族ジカルボン酸もしくはその無水物又は脂肪族ジカルボン酸エステル、 ある!/、は芳香族ジカルボン酸もしくはその無水物又は芳香族ジカルボン酸エステル . と、 3—(メタ)ァクリロイ口キシー 2—ヒドロキシプロピル (メタ)アタリレートとのエステル 化反応は、通常、ベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジェチルェ •一テル、テトラヒドロフラン、ジォキサン等のエーテル類、 n—ヘプタン、シクロへキサ On the other hand, there are aliphatic dicarboxylic acids or their anhydrides or aliphatic dicarboxylic acid esters, and! / Is an aromatic dicarboxylic acid or its anhydride or aromatic dicarboxylic acid ester. And 3- (meth) acryloylic acid ester The esterification reaction with 2-hydroxypropyl (meth) acrylate is usually carried out with aromatic hydrocarbons such as benzene, toluene and xylene, ethers such as getyl ether, tetrahydrofuran and dioxane, n-heptane and cyclohexane. Kisa
, ン、 n キサン等の脂肪族炭化水素類等の有機溶媒中、硫酸、塩酸、燐酸、フッ ィ匕ホウ素、メタンスルホン酸、ベンゼンスルホン酸、 p—トルエンスルホン酸、カチオン 交換樹脂等のエステル化触媒を用いて、ハイドロキノン、メチルノヽイドロキノン、ハイド ロキノンモノメチルエーテル、カテコール、ピロガロール、フエノチアジン、 4ーメトキシ フエノール、 4一ターシャリーブチルカテコール等の重合禁止剤の存在下で行なわれ る。 -Esterification of sulfuric acid, hydrochloric acid, phosphoric acid, fluoridated boron, methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, cation exchange resin, etc. in organic solvents such as aliphatic hydrocarbons such as The reaction is carried out using a catalyst in the presence of a polymerization inhibitor such as hydroquinone, methylhydroquinone, hydroquinone monomethyl ether, catechol, pyrogallol, phenothiazine, 4-methoxyphenol and 4-tert-butylcatechol. -
[0079] また、上記エステル化反応は、ベンゼン、トルエン、キシレン等の芳香族炭化水素 類、ジェチルエーテル、テトラヒドロフラン、ジォキサン等のエーテル類、 n—ヘプタン . 、シクロへキサン、 n キサン等の脂肪族炭化水素類、ホルムアミド、 N, N—ジメチ ルホルムアミド等の窒素化合物等の有機溶媒中、ジシクロへキシルカルポジイミド、 1 ーェチルー 3—(3—ジメチルァミノプロピル)カルボジイミド塩酸塩などの脱水縮合剤 、トリメチルァミン、トリェチルァミン、 4—ジメチルァミノピリジン等の 3級ァミン類、 1一 ヒドロキシー 1一 H—ベンゾトリアゾール水和物などを用いて、ハイドロキノン、メチル ハイドロキノン、ハイドロキノンモノメチルエーテル、カテコール、ピロガロール、フエノ チアジン、 4—メトキシフエノール、 4—ターシャリーブチルカテコール等の重合禁止 剤の存在下で行なうこともできる。 The above esterification reaction is carried out in an aromatic hydrocarbon such as benzene, toluene and xylene, an ether such as getyl ether, tetrahydrofuran and dioxane, and a fat such as n-heptane., Cyclohexane and n-xane. Condensation agents such as dicyclohexylcarbodiimide and 1-ethyl-3- (3-dimethylaminopropyl) carbodiimide hydrochloride in organic solvents such as aromatic hydrocarbons, nitrogen compounds such as formamide and N, N-dimethylformamide Tertiary amines such as trimethylamine, triethylamine, 4-dimethylaminopyridine, and the like, using hydroquinone, methyl hydroquinone, hydroquinone monomethyl ether, catechol, pyrogallol, Pheno thiazine, 4-methoxypheno Le, can also be carried out in the presence of a polymerization inhibitor such as 4-tertiary butyl catechol.
[0080] 本発明のテトラ (メタ)アタリレート化合物は、反応性稀釈剤として、また柔軟性を付 与するために前記一般式(2)で表わされる 3—(メタ)アタリロイロキシ _ 2—ヒドロキシ プロピル (メタ)アタリレートを混合することができる。その混合量は、前記テトラ (メタ) アタリレート化合物 100質量部に対して 70質量部以下の割合で充分であり、好ましく は 50質量部以下の割合である。ジ (メタ)アタリレートイ匕合物の混合量が 70質量部を 超えると、テトラ (メタ)アタリレート化合物の耐熱性を低下させる恐れがあるので、好ま しくない。 , '[0080] The tetra (meth) atalylate compound of the present invention can be used as a reactive diluent and can impart flexibility. For this purpose, 3- (meth) atalyloyloxy_2-hydroxypropyl (meth) atalylate represented by the general formula (2) can be mixed. The mixing amount is sufficient at 70 parts by mass or less, preferably at 50 parts by mass or less, based on 100 parts by mass of the tetra (meth) acrylate ester compound. It is not preferable that the mixing amount of the di (meth) atalylate compound is more than 70 parts by mass because the heat resistance of the tetra (meth) atalylate compound may be reduced. , '
[0081] 本発明のテトラ (メタ)アタリレート化合物は、重合開始剤 (光ラジカル重合開始剤、 熱ラジカル熏合開始剤)の存在下に活性エネルギー線の照射及び/又は加熱によ つて速やかにラジカル重合する他、単.に加熱することによつても硬化し、また X線又は 電子線照射によ ても硬化可能である。 [0081] The tetra (meth) atalylate compound of the present invention can be rapidly produced by irradiation with active energy rays and / or heating in the presence of a polymerization initiator (photoradical polymerization initiator, thermal radical polymerization initiator). In addition to radical polymerization, it can be cured by simply heating, and can also be cured by X-ray or electron beam irradiation.
[0082] また、本発明のテトラ (メタ)アタリレートイ匕合物は、複合材 (繊維強化プラスチック)の 樹脂マトリックスとして有用である。従って、本発明の トラ (メタ)アタリレートイ匕合物は 、前記したように光硬化性及び Z又は熱硬化性に優れ、且つ、その硬化物は耐吸湿 性並びに高湿下での耐熱性及び柔軟性にも優れるという特性のため、複合材 (繊維 強化プラスチック)、特に航空宇宙産業分野に用いられる複合材として極めて有用で あるが、プリント配線板の各種レジスト材料や塗料の硬化性成分としても有利に用レ、 ることができる。  [0082] Further, the tetra (meth) atalylate toy conjugate of the present invention is useful as a resin matrix of a composite material (fiber reinforced plastic). Therefore, the tiger (meta) atalylate toy compound of the present invention is excellent in photo-curability and Z or thermo-curability as described above, and the cured product has moisture absorption resistance and heat resistance under high humidity. Due to its properties of excellent flexibility and flexibility, it is extremely useful as a composite material (fiber reinforced plastic), especially in the aerospace industry, but as a curable component in various resist materials and paints for printed wiring boards. Can also be used advantageously.
[0083] まず、前記一般式 (1)で表わされるテトラ (メタ)アタリレート化合物を含有する硬化 性組成物、特に さらに他のラジカル重合性モノマー及ぴ Z又は重合開始剤あるい はさらに繊維強化材等を含有する硬化性組成物について説明する。  [0083] First, a curable composition containing the tetra (meth) atalylate compound represented by the general formula (1), in particular, other radically polymerizable monomers and Z or a polymerization initiator, or further fiber reinforced. The curable composition containing materials and the like will be described.
[0084] 前記ラジカル重合性モノマーとしては、例えば、スチレン、ジビニルベンゼンなどの スチレン誘導体; 2—ヒドロキシェチル (メタ)アタリレート、 2—ヒドロキシプロピル (メタ) アタリレート、 3—(メタ)アタリロイ口キシー 2—ヒドロキシプロピル (メタ)アタリレート、ぺ ンタエリスリトールトリアタリレート、ジペンタエリスリトールペンタアタリレートなどの水酸 基含有のアタリレート類;ポリエチレングリコールジアタリレート、ポリプロピレングリコー ルジアタリレートなどの水溶性のアタリレート類;トリメチロールプロパントリアタリレート 、ペンタエリスリトールテトラアタリレート、ジペンタエリスリトールへキサアタリレートなど の多価アルコールの多官能ポリエステルアタリレート類;トリメチロールプロパン、水添 ビスフエノール A等の多官能アルコールもしくはビスフエノール A、ビフエノールなどの 多価フ:ノールのエチレンオキサイド付加物及び/又はプロピレンオキサイド付加物 のアタリレート類;上記水酸基含有アタリレートのイソシァネート変成物である多官能も しくは単官能ポリウレタンアタリレート;ビスフエノール Aジグリシジルエーテル、水添ビ スフェノール Aジグリシジノレエーテル又はフエノールノポラックエポキシ樹脂の(メタ) アクリル酸付加物であるエポキシアタリレート類、及ぴ上記アタリレート類に対応するメ タクリレート類、あるいはさらに特開 2003— 2919号に記載のジ (メタ)ァクリレートイ匕 合物、特開平 9— 124714号に記載のテトラ (メタ)アタリレート化合物、特開昭 62— 5 2547号に記載のへキサ (メタ)アタリレートイ匕合物などが挙げられ、これらは単独で又 は 2種以上を使用することができる。これらラジカル重合性モノマーの使用目的は、 組成物の光硬化性及びノ又は熱硬化性を上げることにある。室温で液状のラジカル 重合性モノマーは、組成物の光硬化性及ひブ又は熱硬化性を上げる目的の他、組 成物を各種の塗布方法に適した粘度に調整する役割も果たす。これらラジカル重合 性モノマーの配合量は、使用目的や所望物性に応じて、任意の割合にすることがで きるが、通常、前記テトラ (メタ)アタリレート 100質量部【こ対して 200質量部以下が好 ましい。 . '[0084] Examples of the radical polymerizable monomer include styrene derivatives such as styrene and divinylbenzene; 2-hydroxyethyl (meth) atalylate, 2-hydroxypropyl (meth) atalylate, and 3- (meth) atalyloyl. Xy 2-hydroxypropyl (meth) acrylate, hydroxyl-containing atalylates such as pentaerythritol triatalylate and dipentaerythritol pentaatalylate; water-soluble such as polyethylene glycol diatalylate and polypropylene glycol diatalylate Polymethyl alcohol acrylates such as trimethylolpropane triatalylate, pentaerythritol tetraatalylate, dipentaerythritol hexaatalylate, etc .; Lopan, hydrogenated Polyfunctional alcohols such as bisphenol A or polyhydric phenols such as bisphenol A and biphenol: acrylates of ethylene oxide adducts and / or propylene oxide adducts; polyisocyanates which are modified isocyanates of the hydroxyl group-containing acrylates Functional or monofunctional polyurethane acrylates; epoxy acrylates which are (meth) acrylic acid adducts of bisphenol A diglycidyl ether, hydrogenated bisphenol A diglycidinole ether or phenol nopolak epoxy resin, and Methacrylates corresponding to the above acrylates, or di (meth) acrylate conjugates described in JP-A-2003-2919, tetra (meth) atalylate compounds described in JP-A-9-124714, Hexa (meta) atarile described in No. 62-5252 Toys 匕合 product and the like, which alone or may be used two or more kinds. The purpose of using these radically polymerizable monomers is to increase the photocurability and the heat or curability of the composition. The radically polymerizable monomer which is liquid at room temperature serves not only to increase the photocurability and / or the thermosetting property of the composition, but also to adjust the composition to a viscosity suitable for various coating methods. The amount of these radically polymerizable monomers can be arbitrarily determined according to the purpose of use and the desired physical properties. Usually, however, 100 parts by mass of the above-mentioned tetra (meth) acrylate is 200 parts by mass or less. Is preferred. '
[0085] 本発明で用レ、るテトラ (メタ)アタリレート化合物は、単に加熱することによつても硬化 し、また X線又は電子線照射によっても硬化可能であるが、-重合開始剤 (光ラジカル '重合開始剤、熱ラジカノレ重合開始剤)の存在下に活性エネルギー線の照射及ぴ Z 又は加熱によって速やかにラジカル重合するので、このような重合開始剤を用レ、るこ とが好ましい。 · [0085] The tetra (meth) atalylate compound used in the present invention can be cured by simply heating and can be cured by X-ray or electron beam irradiation. It is preferable to use such a polymerization initiator since radical polymerization is rapidly performed by irradiation with active energy rays and Z or heating in the presence of a photoradical (polymerization initiator, thermal radical polymerization initiator). . ·
[0086] 前記重合開始剤としては後述するような光ラジカル重合開始剤、熱ラジカル重合開 始剤を好適に用いることかでき、その配合量は、前記テトラ (メタ)アタリレート化合物 1 00質量部(前記ラジカル重合性モノマーを用レ、る場合にはこれらの合計量 100質量 部)に対して 30質量部以下が好ましいが、例えば光ラジカル重合開始剤の場合には 0. 1〜30質量部の割合、熱ラジカル重合開始剤の場合には 0. 1〜10質量部の割 合が好ましい。  [0086] As the polymerization initiator, a photo-radical polymerization initiator and a thermal-radical polymerization initiator as described below can be suitably used, and the compounding amount thereof is 100 parts by mass of the tetra (meth) atalylate compound. (In the case of using the radical polymerizable monomer, the total amount of these is 100 parts by mass.) The amount is preferably 30 parts by mass or less. In the case of a thermal radical polymerization initiator, the ratio is preferably 0.1 to 10 parts by mass.
[0087] 前記繊維強化材としては、例えば、ガラス繊維、炭素繊維、ァラミド繊維等が挙げら ^ れる。これらの繊維は、単独で又は 2種類以上の混合物として使用することができる。 ' ' この繊維強化材の組成物中に占める割合は、好ましくは 10〜80体積%、より好まし くは 50〜70体積0 /0ャある。 [0087] Examples of the fiber reinforcing material include glass fiber, carbon fiber, and aramide fiber. ^ These fibers can be used alone or as a mixture of two or more. '' Ratio in the composition of the fiber reinforcement, preferably 10 to 80% by volume, more preferably rather 50-70 volume 0/0 turbocharger.
[0088] なお、本発明の前記硬化性組成物には、前記 3—(メタ)アタリロイ口キシー 2—ヒド ロキシプロピル (メタ)アタリレートと、脂肪族ジカルボン酸クロライド又は脂肪族ジカル ボン酸もしくはその無水物又は脂肪族ジカルボン酸エステルとのエステルイ匕反応の 際の未反応のモノマーや、生成したジ (メタ)アタリレート化合物や重合物等の副生成 物を含有しても構わない。  [0088] The curable composition of the present invention includes the above-mentioned 3- (meth) atalyloic oxy-2-hydroxypropyl (meth) atalylate, aliphatic dicarboxylic acid chloride or aliphatic dicarboxylic acid, or It may contain an unreacted monomer at the time of the esterification reaction with an anhydride or an aliphatic dicarboxylic acid ester, or a by-product such as a generated di (meth) atalylate compound or a polymer.
[0089] ,本発明の前記硬化性組成物には、さらに必要に応じて、後述するような溶剤を単独 で又は 2種類以上の混合物として配合することができる。溶剤の使用目的は、前記テ トラ' (メタ)アタリレートイ匕合物、ラジカル重合性モノマー、重合開始剤等を溶解させ、 また組成物を塗布方法に適した粘度に調整することにある。溶剤の配合量は、塗布 方法に応じた任意の量とすることができる。  [0089] The curable composition of the present invention may further contain a solvent as described below, if necessary, alone or as a mixture of two or more kinds. The purpose of the solvent is to dissolve the tetra '(meth) atalylate compound, the radical polymerizable monomer, the polymerization initiator and the like, and to adjust the composition to a viscosity suitable for the coating method. The compounding amount of the solvent can be an arbitrary amount according to the coating method.
[0090] 本発明の前記硬化性組成物には、硬化物の特性を低下させない程度において、 後述するような無機增粘剤を配合することができる 無機増粘剤の配合 ¾は通常の 暈的割合で充分であり、例えば、前記テトラ (メタ)アタリレートイ匕合物 100質量部に対 ■ して 0.ト 20質量部、好ましくは 0. 5-10. 0質量部の割合である。  [0090] The curable composition of the present invention may be mixed with an inorganic thickener as described below to the extent that the properties of the cured product are not degraded. The ratio is sufficient, and for example, the ratio is 0.2 to 20 parts by mass, preferably 0.5 to 10.0 parts by mass with respect to 100 parts by mass of the tetra (meth) atalylate conjugate.
[0091] 本発明の前記硬化性組成物には、さらに必要に応じて、塗膜の硬化収縮を抑制し 、密着性、硬度、高湿下での耐熱性などの特性を向上させる目的で、後述するような 無機フィラーや有機フィラーを、単独で又は 2種以上配合することができる。フィラー の配合量は、前記テトラ (メタ)アタリレートイ匕合物 100質量部当り 10〜300質量部、 好ましくは 30〜200質量部の割合が適当である。  [0091] In the curable composition of the present invention, if necessary, furthermore, for the purpose of suppressing curing shrinkage of the coating film and improving properties such as adhesion, hardness and heat resistance under high humidity, Inorganic fillers and organic fillers described below can be used alone or in combination of two or more. A suitable amount of the filler is 10 to 300 parts by mass, preferably 30 to 200 parts by mass, per 100 parts by mass of the tetra (meth) atalylate toy conjugate.
[0092] 本発明の前記硬化性組成物は、さらに必要に応じて、後述するような着色剤、熱重 合禁止剤、消泡剤及ぴ Z又はレべリング剤、シランカップリング剤などのような公知慣 用の添加剤類を配合することができる。さらに本発明の硬化性組成物は、難燃性を 得る目的で、必要に応じて、ハロゲン系難燃剤、リン系難燃剤、及びアンチモン系難 燃剤等の難燃剤を配合することができる。難燃剤の配合量は、前記テトラ (メタ)アタリ レート化合物 100質量部に対して、通常:!〜 200質量部、好ましくは 5〜50質量部の 1 o 割合である。難燃剤の配合量が上記範囲内にあると、硬化物の難燃性、耐吸湿性、 並びに高湿下での耐熱性及び柔軟性とが、高度にバランスされて好適である。 [0092] The curable composition of the present invention may further comprise a coloring agent, a thermal polymerization inhibitor, an antifoaming agent, a Z or leveling agent, a silane coupling agent, and the like as described below. Such known and commonly used additives can be blended. Furthermore, the curable composition of the present invention may optionally contain a flame retardant such as a halogen-based flame retardant, a phosphorus-based flame retardant, and an antimony-based flame retardant for the purpose of obtaining flame retardancy. The compounding amount of the flame retardant is usually from! To 200 parts by mass, preferably from 5 to 50 parts by mass with respect to 100 parts by mass of the tetra (meth) acrylate compound. 1 o ratio. When the blending amount of the flame retardant is within the above range, the flame retardancy, moisture absorption resistance, heat resistance and flexibility under high humidity of the cured product are highly balanced, which is preferable.
[0093] 本発明に係るテトラ (メタ)アタリレート化合物は、複合材 (繊維強化プラスチック)、 特に航空宇宙産業分野に用いられる複合材の榭脂マトリックスとして極めて有用であ る。この種の複合材料は、一般に、繊維強化材、例えば炭素繊維、ガラス繊維、ァラ ミド繊維 (例えば、ケプラー繊維)等の繊維によって構成される繊維強化材に液状の 硬化性組成物を含浸させ、次いで硬化させることによって得られる。この際 用いら れる繊維強化材は、種々の形態、例えば重層繊維、二次元シート又は三次元もしく は多次元織物の形態をとることができる。 .  [0093] The tetra (meth) atalylate compound according to the present invention is extremely useful as a resin matrix of a composite material (fiber-reinforced plastic), particularly a composite material used in the aerospace industry. This type of composite material is generally obtained by impregnating a fiber-reinforced material, for example, a fiber-reinforced material composed of fibers such as carbon fiber, glass fiber, and aramid fiber (for example, Kepler fiber) with a liquid curable composition. , Followed by curing. The fiber reinforcement used at this time can take various forms, for example, a multi-layer fiber, a two-dimensional sheet, or a three-dimensional or multi-dimensional woven fabric. .
[0094] また、テトラ (メタ)アタリレートイ匕合物と共に、他のラジカル重合性モノマー、重合開, 始剤及び繊維強化材を含有してなる硬化性組成物を金型に装填し、あるいは繊維 , 強化材を予め金型に入れておいてから、該金型に繊維強化材を含まない本発明の 硬化性組成物を注入し、次レ、で、.組成物を満たした金型を加熱して硬化させることに より、繊維強化プラスチックを得ることができる。あるいは、金型内に満たされた組成 物を活性 ネルギ一線の照射により硬化させることにより、繊維強化プラスチックを得 ることができる。この場合、活性エネルギー線の照射光源としては、低圧水銀灯、中 圧水銀灯、高圧水銀灯、超高圧水銀灯、キセノンランプ又はメタルノヽライドランプなど が適当である。その他、レーザー光線、 X線、電子線なども活性エネルギー線として 利用できる。  [0094] A curable composition containing another radically polymerizable monomer, a polymerization initiator, an initiator, and a fiber reinforcing material together with the tetra (meth) atalylate ligated product is charged into a mold, or After the fiber and the reinforcing material are put in a mold in advance, the curable composition of the present invention containing no fiber reinforcing material is poured into the mold, and then the mold filled with the composition is added. By heating and curing, a fiber-reinforced plastic can be obtained. Alternatively, a fiber-reinforced plastic can be obtained by curing the composition filled in the mold by irradiation with active energy. In this case, a low-pressure mercury lamp, a medium-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a xenon lamp, a metal nitride lamp, or the like is suitable as a light source for irradiating active energy rays. In addition, laser beams, X-rays, and electron beams can also be used as active energy rays.
[0095] 次に、プリント配線板の各種レジスト材料、多層プリント配線板の層間絶縁層などと して有用な本発明の硬化性組成物について説明する。この組成物は、前記したテト . ラ (メタ)アタリレート化合物(B)の他に、アルカリ可溶性であるカルボキシル基含有化 合物 (A)や、重合開始剤 (C)、希釈溶剤 (D)を含有し、好ましくはさらに熱硬化性成 分として 1分子中に 2個以上の環状エーテルを有する化合物 (E)や硬化触媒 (F)を ' 含有し、さらに必要に応じて他のラジカル重合性モノマー(G)を含有する。  Next, the curable composition of the present invention useful as various resist materials for printed wiring boards, interlayer insulating layers of multilayer printed wiring boards, and the like will be described. This composition contains, in addition to the tetramethyl (meth) acrylate compound (B), an alkali-soluble carboxyl group-containing compound (A), a polymerization initiator (C), and a diluent solvent (D). And preferably further contains, as a thermosetting component, a compound (E) having two or more cyclic ethers in one molecule or a curing catalyst (F), and if necessary, other radical polymerizable components. Contains monomer (G).
[0096] まず、上記硬化性組成物で用レ、るカルボキシル基含有化合物 (A)は、 1分子中に 少なくとも 1個、好ましくは 2個以上のカルボキシル基を有する化合物である。具体的 には、それ自体がエチレン性不飽和二重結合を有するカルボキシル基含有感光性 樹脂及びエチレン性不飽和二重結合を有さなレヽカルボキシル基含有樹脂のいずれ も使用可能であり、特定のものに限定されるものではなレ、が、特に以下に列挙するよ. うな樹脂 (オリゴマー及びポリマーのいずれでもよい)を好適に使用できる。First, the carboxyl group-containing compound (A) used in the curable composition is a compound having at least one, preferably two or more carboxyl groups in one molecule. Specifically, a carboxyl group-containing photosensitive material having an ethylenically unsaturated double bond itself. Both resins and resin containing a carboxyl group having an ethylenically unsaturated double bond can be used, and are not limited to specific ones. Oligomers or polymers).
] (1)不飽和カルボン酸 (a)と不飽和二重結合を有する化合物 (b)を共重合させるこ とによって得られるカルボキシル基含有樹脂、 (1) a carboxyl group-containing resin obtained by copolymerizing an unsaturated carboxylic acid (a) and a compound (b) having an unsaturated double bond,
(2)不飽和カルボン酸 (a)と不飽和二重結合を有する化合物 (b)の共重合体にェ チレン性不飽和基をペンダントとして付加させることによって得られるカルボキシル基 含有感光性樹脂、 - (2) a carboxyl group-containing photosensitive resin obtained by adding an ethylenically unsaturated group as a pendant to a copolymer of an unsaturated carboxylic acid (a) and a compound having an unsaturated double bond (b),-
(3)エポキシ基と不飽和二重結合を有する化合物(c)と不飽和二重結合を有する 化合物 (b)の共重合体に、不飽和カルボン酸 (a)を反応させ、生成した二級の水酸 基に飽和又は不飽和多塩基酸無水物(d)を反応させて得られるカルボキシル基含 有感光性樹脂、 (3) Secondary compound formed by reacting a copolymer of a compound (c) having an epoxy group and an unsaturated double bond with a compound (b) having an unsaturated double bond with an unsaturated carboxylic acid (a). A carboxyl group-containing photosensitive resin obtained by reacting a saturated or unsaturated polybasic acid anhydride (d) with a hydroxyl group of
, (4)不飽和二重結合を有する酸無水物 (e)と不飽和二重转合を有する化合物 (b) の共重合体に、水酸基と不飽和二重結合を有する化合物 (f)を反応させて得られる カルボキシル基含有感光性樹脂、  (4) a copolymer of an acid anhydride having an unsaturated double bond (e) and a compound having an unsaturated double bond (b) is compounded with a compound having a hydroxyl group and an unsaturated double bond (f). Carboxyl group-containing photosensitive resin obtained by the reaction,
(5) 1分子中に少なくとも 2個のエポキシ基を有する多官能エポキシ化合物 (g)のェ ポキシ基と不飽和モノカルボン酸 (h)のカルボキシル基をエステルイ匕反応(全エステ ル化又は部分エステル化、好ましくは全エステル化)させ、生成した水酸基にさらに 飽和又は不飽和多塩基酸無水物(d)を反応させて得られるカルボキシル基含有感 光性樹脂、 ' 、 .  (5) The esterification reaction (total esterification or partial esterification) of the epoxy group of the polyfunctional epoxy compound having at least two epoxy groups in one molecule (g) and the carboxyl group of the unsaturated monocarboxylic acid (h) , Preferably all esterification), and a carboxyl group-containing photosensitive resin obtained by further reacting the generated hydroxyl group with a saturated or unsaturated polybasic anhydride (d).
(6)不飽和二重結合を有する化合物 (b)とグリシジル (メタ)アタリレートの共重合体 のエポキシ基に、 1分子中に 1つのカルボキシノレ基を有し、エチレン性不飽和結合を (6) A compound having an unsaturated double bond (b) and a glycidyl (meth) acrylate copolymer have one carboxy group in one molecule in the epoxy group, and have an ethylenically unsaturated bond.
, 持たない有機酸 (i)を 応させ、生成した二級の水酸基に飽和又は不飽和多塩基酸 無水物(d)を反応させて得られるカルボキシル基含有樹脂、' A carboxyl group-containing resin obtained by reacting an organic acid (i) having no carboxyl group, and reacting a generated secondary hydroxyl group with a saturated or unsaturated polybasic anhydride (d),
(7)水酸基含有ポリマー (j)に飽和又は不飽和多塩基酸無水物(d)を反応させて 得られるカルボキシル基含有樹脂、  (7) a carboxyl group-containing resin obtained by reacting a saturated or unsaturated polybasic anhydride (d) with a hydroxyl group-containing polymer (j),
(8)水酸基含有ポリマー (j)に飽和又は不飽和多塩基酸無水物(d)を反応させて 得られるカルボキシル基含有樹脂に、エポキシ基と不飽和二重結合を有する化合物 (c)をさらに反応させて られるカルボキシル基含有感光性樹脂、 (8) A compound having an epoxy group and an unsaturated double bond in a carboxyl group-containing resin obtained by reacting a saturated or unsaturated polybasic anhydride (d) with a hydroxyl group-containing polymer (j). carboxyl group-containing photosensitive resin obtained by further reacting (c),
(9) 1分芋中に少なくとも 2個のエポキシ基を有する多官能エポキシ化合¾) (g)と、 不飽和モノカルボン酸 (h)と、ュ分子中に少なくとも 2個の水酸基と、エポキシ基と反 応する水酸基以外の 1個の他の反応性基を有する化合物 (k)との反応生成物 (I)に (9) A polyfunctional epoxy compound having at least two epoxy groups in one potato) (g), an unsaturated monocarboxylic acid (h), at least two hydroxyl groups in a molecule, and an epoxy group. The reaction product (I) with a compound (k) having one other reactive group other than a hydroxyl group
、飽和又は不飽和多塩基酸無水物(d)を反応させて得られるカルボキシル基含有感 光性樹脂、 ' , A carboxyl group-containing photosensitive resin obtained by reacting a saturated or unsaturated polybasic acid anhydride (d),
(10)上記反応生成物 (I)と、飽和又は不飽和多塩基酸無水物 (d)と、不飽和基含 有モノイソシァネート (m)との反応生成物からなる不飽和基含有ポリカルボン酸ウレ' タン樹脂、 '  (10) An unsaturated group-containing polycondensate comprising the reaction product of the above reaction product (I), a saturated or unsaturated polybasic anhydride (d), and an unsaturated group-containing monoisocyanate (m). Urethane carboxylate resin,
( 11 ) 1分子中に少なくとも 2個のォキセタン環を有+る多官能ォキセタン化合物 (n )に不飽和モノカルボン酸 (h)を反応させ、得られた変性ォキセタン樹脂中の一級水 酸基に対して飽和又は不飽和多塩基酸無水物(d)を反応させて得られるカルボキシ ル基含有感光性樹脂、  (11) A polyfunctional oxetane compound (n) having at least two oxetane rings in one molecule is reacted with an unsaturated monocarboxylic acid (h) to form a primary hydroxyl group in the resulting modified oxetane resin. A carboxyl group-containing photosensitive resin obtained by reacting a saturated or unsaturated polybasic acid anhydride (d),
(12)ビスエポキシィ匕合物 (p)とジカルボン酸 (q)との反応生成物に、不飽和二重結 合を導入し、弓 Iき続き飽和又ほ不飽和多塩基酸無水物(d)を反応させて得られる力 ゾレポキシル基含有樹脂、  (12) An unsaturated double bond is introduced into the reaction product of the bisepoxy conjugate (p) and the dicarboxylic acid (q), followed by bow I and a saturated or slightly unsaturated polybasic acid anhydride (d) The force obtained by reacting Zolepoxyl group-containing resin,
(13)ビスエポキシ化合物 (p)とビスフエノール類 (r)との反応生成物に、不飽和二 重結合を導入し、引き続き飽和又は不飽禾口多塩基酸無水物 (d)を反応させて得られ るカルボキシル基含有樹脂、及び  (13) An unsaturated double bond is introduced into the reaction product of the bisepoxy compound (p) and the bisphenols (r), followed by the reaction with a saturated or unsaturated polybasic anhydride (d). Carboxyl group-containing resin obtained by
(14)ノポラック型フエノール樹脂(s)とアルキレンォキシド (t)との反応生成物に不 飽和モノカルボン酸 (h)を反応させ、得られた反応生成物に飽和又は不飽和多塩基 酸無水物(d)を反応させて得られるカルボキシル基含有感光性樹脂。  (14) The reaction product of the nopolak phenolic resin (s) and the alkylene oxide (t) is reacted with an unsaturated monocarboxylic acid (h), and the obtained reaction product is reacted with a saturated or unsaturated polybasic anhydride. A carboxyl group-containing photosensitive resin obtained by reacting the product (d).
前記(1)のカルボキシル基含有樹脂は、(メタ)アクリル酸等の不飽和カルボン酸 (a )と、スチレン、 α—メチルスチレン、低級アルキル (メタ)アタリレート、イソブチレン等 の不飽和二重結合を有する化合物 (b)の共重合体であり、一方、前記(2)のカルボ. . キシル基含有感光性樹脂は、不飽和カルボン酸 (a)と不飽和二重結合を有する化合 物(b)の共重合体のカルボキシル基の一部に、ビニル基、ァリル基、(メタ)アタリロイ ル基等のエチレン性不飽和基とエポキシ基、酸クロライド等の反応性基を有する化合 物、例えばグリシジル (メタ)アタリレートを反応させ、該化合物の不飽和二重結合を 側鎖に導入した樹脂である。上記共重合体の一方のモノマー成分である不飽和カル ボン酸 (a)の有するカルボキシル基の一部は未反応のまま残存するため 得られる力 ルポキシル基含有感光性樹脂は、アルカリ水溶液に対して可溶性である。 The carboxyl group-containing resin (1) includes an unsaturated carboxylic acid (a) such as (meth) acrylic acid and an unsaturated double bond such as styrene, α-methylstyrene, lower alkyl (meth) acrylate, and isobutylene. The carboxyl group-containing photosensitive resin (2) is a compound (b) having an unsaturated carboxylic acid (a) and an unsaturated double bond (b). )) A copolymer having an ethylenically unsaturated group such as a vinyl group, an aryl group or a (meth) acryloyl group and a reactive group such as an epoxy group or an acid chloride in a part of the carboxyl group of the copolymer A resin, for example, glycidyl (meth) acrylate, and the unsaturated double bond of the compound is introduced into the side chain. A part of the carboxyl group of the unsaturated carboxylic acid (a), which is one of the monomer components of the copolymer, remains unreacted. It is soluble.
[0099] 前記(3)のカルボキシル基含有感光性樹脂は、分子中にエポキシ基と不飽和二重 結合を有する化合物(c)、例えばグリシジル (メタ)アタリレート、 aーメチルダリシジル (メタ)ァクリレート等と、前記不飽和二重結合を有する化合物 (b)の共重合体の土ポ 'キシ基に、前記不飽和カルボン酸 (a)のカルボキシル基を反応させ、該不飽和カル ボン酸の不飽和二重結合を側鎖に導入すると共に、上記付加反応で生成した二級 の水酸基に、多塩基酸無水物(d)、例えば無水フタル酸、テトラヒドロ無水フタル酸、 へキサヒドロ無水フタル酸等をエステルィヒ反応させ、側鎖にカルボキシル基を導入し た樹 S旨である。 The carboxyl group-containing photosensitive resin (3) is a compound (c) having an epoxy group and an unsaturated double bond in the molecule, for example, glycidyl (meth) acrylate, a-methyldaricidyl (meth) Acrylate and the like, and the soil hydroxy group of the copolymer of the compound (b) having an unsaturated double bond are reacted with the carboxyl group of the unsaturated carboxylic acid (a) to form the unsaturated carboxylic acid. In addition to introducing an unsaturated double bond into the side chain, the secondary hydroxyl group generated by the above addition reaction is added to a polybasic anhydride (d) such as phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, or the like. This is a tree in which a carboxyl group was introduced into the side chain by subjecting the compound to an Esterich reaction.
[0100] 前記 (4)のカルボキシル基含有感光性樹脂は、不飽和二重結合を有する酸無水 • 物(e)、例えば無水マレイン酸、無水ィタコン酸等と、前記不飽和二重結合を有する [0100] The carboxyl group-containing photosensitive resin (4) has an unsaturated double bond and an acid anhydride (e) such as maleic anhydride, itaconic anhydride and the like.
' . 化合物 (b)の共重合体の酸無水物基の一部に、水酸基と不飽和二重結合を有する 化合物 (f)、例えばヒドロキシアルキル (メタ)アタリレート類、(メタ)アタリレートにカブ ロラクトンを反応させたモノマー、 (メタ)アタリレートにポリ力プロラクトンオリゴマーを反 応させたマクロモノマー等の水酸基を反応させてハーフエステルとし、該化合物(f)'. Compound (f) having a hydroxyl group and an unsaturated double bond in part of the acid anhydride group of the copolymer of compound (b), such as hydroxyalkyl (meth) acrylates and (meth) acrylate A half-ester is obtained by reacting a monomer obtained by reacting carbolactone or a hydroxyl group such as a macromonomer obtained by reacting a polyfunctional prolactone oligomer with (meth) atalylate to form a half-ester.
; の不飽和二重結合を側鎖に導入した樹脂である。 Is a resin having an unsaturated double bond introduced into the side chain.
[0101] 前記(5)のカルボキシル基含有感光性樹脂は、ビスフエノール A型、ビスフエノール F型、ビスフエノール S型、フエノールノポラック型、クレゾ一ルノボラック型、ビフエノー ル型、ビキシレノール型、 N—グリシジノレ型等の公知 '慣用のエポキシ化'合物(g)のェ ポキシ基に、(メタ)アクリル酸等の不飽和モノカルボン酸 (h)の力ルポキシル基を反 応させ、例えばエポキシアタリレートを生成させると共に、上記付加反応で生成した 二級の水酸基に前記多塩基酸無水物(d)をエステル化反応させ、側鎖にカルボキシ ル基を導入した樹脂である。  [0101] The carboxyl group-containing photosensitive resin of the above (5) includes bisphenol A type, bisphenol F type, bisphenol S type, phenol nopolak type, cresol novolak type, biphenol type, bixylenol type, N —The epoxy group of a known 'conventional epoxidized' compound such as a glycidinole type (g) is reacted with the hydroxyl group of an unsaturated monocarboxylic acid (h) such as (meth) acrylic acid, for example, epoxy epoxide A resin in which a carboxyl group is introduced into a side chain by generating a rate and performing an esterification reaction of the polybasic acid anhydride (d) with the secondary hydroxyl group generated by the above addition reaction.
[0102] 前記 (6)のカルボキシル基含有樹脂は、前記不飽和二重結合を有し、水酸基や酸 性基を持たなレ、アルキル (メタ)アタリレート、置換もしくは非置換スチレンなどの化合 物(b)と、グリシジル (メタ)アタリレートを主鎖とする共重合体のグリシジル基に、 1分 子中に 1つのカルボキシル基を有し、エチレン性不飽和結合を持たない有機酸 (i)、 例えば炭素数 2〜 17のアルキルカルボン酸、芳香族基含有アルキルカルボン酸等 を反応させ、生成した二級の水酸基に前記多塩基酸無水物 (d)を付加反応させて得 られる樹脂である。 [0102] The carboxyl group-containing resin (6) has a compound having the unsaturated double bond and no hydroxyl group or acid group, such as alkyl, (meth) acrylate, substituted or unsubstituted styrene. (B) and the glycidyl group of the copolymer having glycidyl (meth) acrylate as the main chain, the organic acid (i) having one carboxyl group per molecule and no ethylenically unsaturated bond ), For example, a resin obtained by reacting an alkyl carboxylic acid having 2 to 17 carbon atoms, an alkyl carboxylic acid having an aromatic group, or the like, and adding the polybasic anhydride (d) to a secondary hydroxyl group produced. is there.
[0103] 前記(7)のカルボキシル基含有樹脂は、水酸基含有ポリマー (j)、例えばォレフィン 系水酸基含有ポリマー、アクリル系ポリオール、ゴム系ポリオール、ポリビュルァセタ ール、スチレンァリルアルコール系樹脂.、セルロース類等に、酸性度の比較的弱い前 記多塩基酸無水物 (d)を反応させてカルボキシル基を導入した樹脂である。  [0103] The carboxyl group-containing resin (7) is a hydroxyl group-containing polymer (j), for example, an olefin-type hydroxyl group-containing polymer, an acrylic polyol, a rubber-based polyol, a polybutyral, a styrenearyl alcohol-based resin, and a cellulose. It is a resin having a carboxyl group introduced by reacting the polybasic acid anhydride (d) having relatively weak acidity.
[0104] 一方、前記(8)のカルボキシノレ基含有感光性樹脂は、前記カルボキシル基含有樹 脂(7)のカルボキシル基に、前記エポキシ基と不飽和二重結合を有する化合物(c) のエポキシ基を反応させ、該化合物 (c)の不飽和二重結合を側鎖に導入した樹脂で ある。  On the other hand, the carboxy group-containing photosensitive resin (8) is an epoxy resin of the compound (c) having an epoxy group and an unsaturated double bond in the carboxyl group of the carboxyl group-containing resin (7). This is a resin obtained by reacting a group and introducing an unsaturated double bond of the compound (c) into a side chain.
[0105] 前記(9)のカルボキシル基含有感光性樹脂の合成反応は、多官能エポキシ化合 : 物 (g)に不飽和モノカルボン酸 (h) (又は化合物 (k) )を反応させ、次レ、で化合物 (k) (又は不飽和モノカルボン酸 (h) )を反応させる第一の方法と、多官能エポキシ化合 . 物(g)と不飽和モノカルボン酸 (h)と化合物 (k)を同時に反応させる第二の方法とが ある。どちらの方法でもよいが、第二の方法が好ましい。 ■  In the synthesis reaction of the carboxyl group-containing photosensitive resin of the above (9), an unsaturated monocarboxylic acid (h) (or a compound (k)) is reacted with a polyfunctional epoxy compound (g), A first method of reacting the compound (k) (or the unsaturated monocarboxylic acid (h)) with the polyfunctional epoxy compound (g), the unsaturated monocarboxylic acid (h) and the compound (k). There is a second method of reacting at the same time. Either method may be used, but the second method is preferable. ■
[0106] '前記 1分子中に少なくとも 2個以上の水酸基と、エポキシ基と反応する水酸基以外 の 1個の他の反応性基 (例えば、カルボキシル基、二級アミノ基等)を有する化合物( k)の具体例としては、例えば、ジメチロールプロピオン酸、ジメチロール酢酸、ジメチ ロール酪酸、ジメチロール吉草酸、ジメチロールカプロン酸等のポリ.ヒドロキシ含有モ ノカルボン酸;ジエタノールァミン、ジイソプロパノールァミン等のジアル力ノールアミ ン類等が挙げられる。 ,  'A compound having at least two or more hydroxyl groups and one other reactive group other than a hydroxyl group that reacts with an epoxy group (for example, a carboxyl group, a secondary amino group, etc.) in one molecule (k Examples of) include poly.hydroxy-containing monocarboxylic acids such as dimethylolpropionic acid, dimethylolacetic acid, dimethylolbutyric acid, dimethylolvaleric acid, and dimethylolcaproic acid; and dialysates such as diethanolamine and diisopropanolamine. And the like. ,
[0107] 一方、前記(10)の不飽和基含有ポリカルボン酸ウレタン樹脂の合成反応は、前記 反応生成物 (I)と多塩基酸無水物(d)を反応させ、次いで、生成した不飽和基含有 ポリカルボン酸樹脂中の水酸基に対して不飽和基含有モノイソシァネート (m)を反応 させるのが好ましい。 [0108] 前記不飽和モノイソシァネ一ト (m)の具体例としては、例えばメタタリロイルイソシァ' ネート、メタクリロイルォキシェチルイソシァネートや、有機ジイソシァネート(例えば、 トリレンジイソシァネート、キシリレンジイソシァネート、イソホロンジイソシァネート、へ キサメチレンジイソシァネート等)と前記の 1分子中に 1個の水酸基を有する (メタ)ァク リレート類を約等モル比で反応させることにより得られる皮応生成物等が挙げられる。 On the other hand, in the synthesis reaction of the unsaturated group-containing polycarboxylic acid urethane resin of the above (10), the reaction product (I) is reacted with a polybasic acid anhydride (d). It is preferable to react the unsaturated group-containing monoisocyanate (m) with the hydroxyl group in the group-containing polycarboxylic acid resin. [0108] Specific examples of the unsaturated monoisocyanate (m) include, for example, methacryloyl isocyanate, methacryloyloxyshethyl isocyanate, and organic diisocyanates (for example, tolylene diisocyanate, xylylene diisocyanate). Isocyanate, isophorone diisocyanate, hexamethylene diisocyanate) and the above-mentioned (meth) acrylate having one hydroxyl group in one molecule in an approximately equimolar ratio. And the like.
[0109] ' 前記(11)のカルボキシル基含有感光性樹脂は、出発原料として、不飽和モノカル. ボン酸との反応によって主として二級の水酸基を生じるエポキシ樹脂に代えて、ォキ セタン環を有する化合物を用い、多官能ォキセタンィ匕合物 (n)に不飽和モノカルボン 酸 (h)を反応させ、得られた変性ォキセタン樹脂の一級の水酸基に対してさらに多塩 基酸無水物 (d)を反応させることにより、結合部位が熱的に切断され難く、熱安定性 に優れた樹脂としたものである。  The carboxyl group-containing photosensitive resin of the above (11) has an oxetane ring as a starting material, instead of an epoxy resin which mainly produces a secondary hydroxyl group by reaction with an unsaturated monocarboxylic acid. Using the compound, the polyfunctional oxetane conjugate (n) is reacted with an unsaturated monocarboxylic acid (h), and a polybasic acid anhydride (d) is further added to the primary hydroxyl group of the resulting modified oxetane resin. By the reaction, the binding site is hardly cleaved thermally, and the resin has excellent thermal stability.
[0110] 前記(12)及ぴ(13)の力ルポキシル基含有樹脂は、ビスフエノール A型エポキシ樹 .脂、ビスフエノール F型エポキシ樹脂、ビスフエノール S型エポキシ樹脂、臭素化ビス フエノール A型エポキシ樹脂、水添ビスフエノール A型エポキシ樹脂、ビフエノール型 エポキシ樹脂、ビキシレノール型エポキシ樹脂等のビスエポキシィ匕合物 (P)と、シユウ ■酸、マロン酸、コハク酸、フタル酸、イソフタル酸等のジカルボン酸(q)又はビスフエノ 一 /1/A、ビスフエノール F等のビスフエノール類 (r)との反応生成物に、不飽和二重結 合を導入し、引き続き、上記反応で生成した二級の水酸基あるいは残存する水酸基 等に対してさらに多塩基酸無水物 (d)を反応させることにより、熱安定性に優れた樹 脂としたものである。不飽和二重結合の導入は、一般に、ビニル基、ァリル基、(メタ) アタリロイル基等のエチレン性不飽和基と、上記反応で残存する水酸基、カルボキシ ル基等や生成した水酸基との反応性を有するエポキシ基、酸クロライド等の反応性 ' 基を有する化合物を反応させることによって行なわれる。 . [0110] The resin containing a propyloxyl group of the above (12) and (13) is a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, a bisphenol S type epoxy resin, a brominated bisphenol A type epoxy resin. Resin, hydrogenated bisphenol A type epoxy resin, biphenol type epoxy resin, bisepoxy conjugated product ( P ) such as bixylenol type epoxy resin, and dicarboxylic acid such as oxalic acid, malonic acid, succinic acid, phthalic acid and isophthalic acid An unsaturated double bond is introduced into the reaction product of the acid (q) or bisphenols (r) such as bisphenol 1/1 / A and bisphenol F, and then the secondary The polybasic acid anhydride (d) is further reacted with hydroxyl groups or remaining hydroxyl groups, etc. to obtain a resin having excellent thermal stability. The introduction of an unsaturated double bond is generally carried out by reacting an ethylenically unsaturated group such as a vinyl group, an aryl group or a (meth) atalyloyl group with a hydroxyl group, a carboxyl group or the like remaining in the above-mentioned reaction and a generated hydroxyl group. The reaction is carried out by reacting a compound having a reactive group such as an epoxy group having an acid group or an acid chloride. .
[0111] 前記(14)の力ルポキシル基含有感光性樹脂は、ノボラック型フヱノール樹脂(s)の アルキレンォキシド (t)の付加反応による鎖延長によりて可撓性、伸びに優れ、かつ '、アルキレンォキシドの付加反応によって生じた末端水酸基に不飽和モノカルボン酸 ( )の付加及び多塩基酸無水物(d)の付加が行なわれ、不飽和基やカルボキシル 基が同一側鎖上に存在せず、かつ、それぞれ側鎖の末端に位置するため、反応性 に優れ、また、主鎖力 離れた末端カルボキシル基の存在により優れたアルカリ現像 性を有する。アルキレンォキシドとしては、エチレンォキシド、プロピレンォキシド、ブ ' チレンォキシド、トリメチレンォキシド、テトラヒドロフラン、テトラヒドロピラン等が挙げら ' れる。 [0111] The hapoxyl group-containing photosensitive resin of (14) is excellent in flexibility and elongation due to chain extension by addition reaction of alkylene oxide (t) of novolak type phenol resin (s), and Unsaturated monocarboxylic acid () and polybasic anhydride (d) are added to the terminal hydroxyl group generated by the alkylene oxide addition reaction, and the unsaturated group or carboxyl group is present on the same side chain. And at the ends of the side chains, It has excellent alkali developability due to the presence of terminal carboxyl groups apart from the main chain. Examples of the alkylene oxide include ethylene oxide, propylene oxide, butylene oxide, trimethylene oxide, tetrahydrofuran, tetrahydropyran and the like.
[0112] 前記したようなカルボキシル基含有ィ匕合物 (A)の酸価は、 '好ましくは 20〜200mg KOHZg、より好ましくは 50〜120mgKOHZgである。酸価が 20mgKOHZgより も低い'場合には、アルカリ水溶液に対する溶解性が悪くなり、形成した塗膜の現像が 困難になる。一方、 200mgKOHZgよりも高くなると、露光の条件によらず露光部の 表面まで現像されてしまい、好ましくない。 '  [0112] The acid value of the carboxyl group-containing compound (A) as described above is preferably from 20 to 200 mg KOHZg, and more preferably from 50 to 120 mg KOHZg. When the acid value is lower than 20 mg KOHZg, the solubility in an aqueous alkali solution becomes poor, and the development of the formed coating film becomes difficult. On the other hand, if it is higher than 200 mgKOHZg, the surface of the exposed portion is developed irrespective of the exposure conditions, which is not preferable. '
[0113] また、前記したようなカルボキシル基含有化合物 (カルボキシル基含有樹脂及び力 ルポキシル基含有感光性樹脂)は、単独で又は 2種以上を組み合わせて用いること ができる。 [0113] The above-mentioned carboxyl group-containing compounds (carboxyl group-containing resin and hydroxyl group-containing photosensitive resin) can be used alone or in combination of two or more.
[0114] ' 前記テトラ (メタ)アタリレートイ匕合物 (B)の配合割合は、前記カルボキシル基含有化 合物 (A) 100質量部に対して 5〜100質量部(固形分として、以下同様)の割合が適 当であり、好ましくは 10〜50質量部の割合である。テトラ (メタ)アタリレ"ト化合物(B )の配合割合が 5質量部未満の場合、充分な光硬化性及び Z又は熱硬化性が得ら ' れ難いので好ましくなぐ一方、 100質量部を超えると、硬化物の特性がそれ以上向 上せず、過剰に入れた分だけ、経済的に好ましくない。  [0114] The mixing ratio of the tetra (meth) atalylate toy conjugate (B) is 5 to 100 parts by mass relative to 100 parts by mass of the carboxyl group-containing compound (A) (solid content, The same is appropriate, and preferably a ratio of 10 to 50 parts by mass. When the compounding ratio of the tetra (meth) ataryl compound (B) is less than 5 parts by mass, it is difficult to obtain sufficient photocurability and Z or thermosetting properties. In addition, the properties of the cured product are not further improved, and the excess amount is economically undesirable.
[0115] なお、本発明の硬化性組成物には、前記 3_ (メタ)アタリロイ口キシー 2—ヒドロキシ プロピル (メタ)アタリレートと、脂肪族ジカルボン酸クロライド又は脂肪族ジカルボン酸 もしくはその無水物又は脂肪族ジカルボン酸エステルとのエステルイ匕反応の際の未 反応のモノマーや、生成したジ (メタ)ァクリレー M匕合物や重合物等の副生成物を含 有しても構わない。  [0115] The curable composition of the present invention includes the above-mentioned 3_ (meth) atalyloy xy-2-hydroxypropyl (meth) atalylate, aliphatic dicarboxylic acid chloride or aliphatic dicarboxylic acid or anhydride or fat thereof. It may contain an unreacted monomer in the esterification reaction with an aromatic dicarboxylic acid ester or a by-product such as a produced di (meth) acrylate M-conjugate or a polymer.
[0116] 本発明で用いるテトラ (メタ)アタリレートイ匕合物は、単に加熱することによつても硬化 し、また X線又は電子線照射によっても硬化可能であるが、重合開始剤 (C) (光ラジ カル重合開始剤 (C1)、熱ラジカル重合開始剤 (C2) )の存在下に活性エネルギー線 の照射及ぴ Z又は加熱 よって速やかにラジカル重合するので、このような重合開 始剤を用レ、ることが好ましい。 . 117] . 光ラジカル重合開始剤 (C1)としては、活性エネルギー線の照射によりラジカルを 発生する公知の化合物が使用可能であり、その具体例としては、ベンゾイン、ベンゾ ' インメチルエーテル、ベンゾインェチルエーテル、ベンゾインイソプロピルエーテル等 のべンゾインとベンゾインアルキル土一テル類;ァセトフエノン、 2, 2—ジメトキシー 2 —フエニルァセトフエノン、 2, 2―ジエトキシー 2—フエニルァセトフエノン、 1, 1ージク ロロァセトフエノン等のァセトフエノン類; 2—メチルー 1 _ [4一(メチルチオ)フエニル] ■ 一 2_モルホリノプロパン一 1—オン、 2—ベンジルー 2—ジメチルアミノー 1— (4ーモ ルホリノフエニル)一ブタン一 1—オン、 N, N—ジメチルアミノアセトフエノン等のアミノ ァセトフエノン類; 2—メチルアントラキノン、 2—ェチルアントラキノン、 2— t一ブチル , アントラキノン、 1 _クロ口アントラキノン等のアントラキノン類; 2, 4一ジメチルチオキサ ントン、 2, 4 _ジェチルチオキサントン、 2—クロ口チォキサントン、 2, 4ージイソプロ ピルチオキサントン等のチォキサントン類;ァセトフヱノンジメチルケタール、ベンジル ジメチルケタール等のケタール類; 2, 4, 5—ト ァリールイミダゾールニ量体;リボフラ ビンテトラプチレート; 2—メルカプトべンゾイミダゾール、 2 _メルカプトべンゾォキサ ゾール、 2—メルカプトべンゾチアゾール等のチオール化合物; 2, 4, 6—トリス一 s— トリアジン、 2, 2, 2_トリプロモエタノール、トリブロモメチルフエニルスルホン等の有 機ハロゲン化合物;ベンゾフヱノン、 4, 4 _ビス(ジェチルァミノ)ベンゾ ヱノン等の ベンゾフエノン類又はキサントン類 ; 2, 4, 6-トリメチルベンゾィルジフエニルホスフィ ンオキサイドなどが挙げられる。これら公知慣用の光ラジカル重合開始剤は、単独で 又は 2種類以上の混合物として使用でき、さらには N, N—ジメチルァミノ安息香酸ェ チルエステル、 N, N—ジメチルァミノ安息香酸イソアミルエステル、ペンチルー 4—ジ メチルァミノべンゾエート、トリェチルァミン、トリエタノールァミン等の三級アミン類など の光開始助剤を加えることができる„また、可視光領域に吸収のあ,る CGI— 784等( チバ'スペシャルティ'ケミカルズ (株)製)のチタノセン化合物等も、光反応を促進す るために添加することもできる。特に好ましい光萆合開 剤は、 2, 4, 6—トリメチルベ ンゾィルジフエニルホスフィンオキサイド、 2—メチルー 1一 [4一(メチルチオ)フエニル ] _2—モルホリノプロパン一 1—オン、 2—べンジルー 2—ジメチルァミノ一 1— (4— モルホリノフエニル)一ブタン一 1—オン等であるが、特にこれらに限られるものではな ぐ紫外光もしくは可視光領域で光を吸収し、(メタ)ァクリロイ/レ基等の不飽和基をラ ジカル重令させるものであれば、光重合開始剤、光開始助剤に限らず、単独である • いは複数併用して使用できる。 [0116] The tetra (meth) atalylate toy conjugate used in the present invention can be cured by simply heating, and can also be cured by X-ray or electron beam irradiation, but the polymerization initiator (C ) In the presence of (photo-radical polymerization initiator (C1) and thermal radical polymerization initiator (C2)), radical polymerization is rapidly performed by irradiation with active energy rays and Z or heating. It is preferable to use . 117]. As the photoradical polymerization initiator (C1), known compounds that generate radicals upon irradiation with active energy rays can be used, and specific examples thereof include benzoin, benzoin methyl ether, and benzoin ethyl. Benzoin and benzoin alkyl earth ethers such as ether and benzoin isopropyl ether; acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone, 1,1-dichloro Acetophenones such as acetophenone; 2-methyl-1 _ [4- (methylthio) phenyl] 1 -2-morpholinopropane 1-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butane Aminoacetophenones such as 1-one, N, N-dimethylaminoacetophenone; 2-methyla Anthraquinones such as anthraquinone, 2-ethylanthraquinone, 2-t-butyl, anthraquinone, 1-chloroanthraquinone; 2,4-dimethylthioxanthone, 2,4-dimethylthioxanthone, 2-chlorothioxanthone, 2 Thioxanthones such as 4,4-diisopropylthioxanthone; ketals such as acetophenone dimethyl ketal and benzyl dimethyl ketal; 2,4,5-triallylimidazole dimer; riboflavin tetrabutylate; 2-mercaptoben Thiol compounds such as zoimidazole, 2-mercaptobenzozoxazole, and 2-mercaptobenzozothiazole; 2,4,6-tris-s-triazine, 2,2,2-triproethanol, and tribromomethylphenylsulfone Organic halogen compounds: benzophenone, 4, 4-bis ( Benzophenones such as (ethylamino) benzodinone or xanthone; and 2,4,6-trimethylbenzoyldiphenylphosphine oxide. These known and commonly used photoradical polymerization initiators can be used alone or as a mixture of two or more kinds. Further, N, N-dimethylaminobenzoic acid ethyl ester, N, N-dimethylaminobenzoic acid isoamyl ester, pentyl-4-dimethylamino Photoinitiating aids such as tertiary amines such as benzoate, triethylamine and triethanolamine can be added. Also, CGI-784 etc. which absorbs in the visible light region (Ciba 'Specialty Chemicals Co., Ltd. )) Can also be added to promote the photoreaction. Particularly preferred photopolymerization initiators are 2,4,6-trimethylbenzoyldiphenylphosphine oxide, Methyl-11- [4- (methylthio) phenyl] _2-morpholinopropane-1-one, 2-benzyl-2-methylamino-1- ( 4-morpholinophenyl) -butane-1-one and the like, but are not particularly limited to these. Not only photopolymerization initiators and photoinitiating auxiliaries, but also those that absorb light in the ultraviolet or visible light range and radically degrade unsaturated groups such as (meth) acryloy / le group Or • Can be used in combination.
[0118] 熱ラジカル重合開始剤 (C2)としては、例えば、ベンゾィルパーオキサイド、クメンバ 一オキサイド、ジー t一ブチルパーオキサイド、 p—メンタンハイド口パーオキサイド、 2' , 5—ジメチルー 2, 5—ジ(t—プチルパーォキシ)へキシン一 3、ジイソプロピルベン. ゼンハイド口パーオキサイド、 t_ブチルパーォキシ一 2—ェチルへキサノエート等の , 有機過酸化物; 2—(カルパモイルァゾ)イソプチ口-トリル、 2—フエ二ルァゾ一 4ーメ トキシー 2, 4—ジメチルバレロニトリル、ァゾジ一 t一オクタン、 2, 2'—ァゾビスイソブ チロニトリル、 2, 2'—ァゾビス, 2—メチルプチロニトリル、 2, 2'—ァゾビス一 2, 4一 ジバレロ二トリル、 1, Γーァゾビス(1ーァセトキシー 1一フエニルェタン)、 Γ—ァゾ ビス一 1—シクロへキサンカルボ二トリル、ジメチル一 2, 2^—ァゾビスイソブチレイト、 4, 4'ーァゾビス一 4ーシァノバリックアシッド、 2—メチルー 2, 2'—ァゾビスプロパン 二トリル等のァゾ系開始剤などが挙げられる。 Examples of the thermal radical polymerization initiator (C2) include, for example, benzoyl peroxide, coumarin peroxide, di-tert-butyl peroxide, p-menthane peroxide, 2 ′, 5-dimethyl-2,5- Di (t-butylperoxy) hexine-1,3, diisopropylben; organic peroxides such as senhydride peroxide, t_butylperoxy-1,2-ethylhexanoate; 2- (carpamoylazo) isobutyl mouth-tolyl, 2-phenyl Luazo-4-methoxy 2,4-dimethylvaleronitrile, azodi-t-octane, 2,2'-azobisisobutyronitrile, 2,2'-azobis, 2-methylbutyronitrile, 2,2'-azobis-1 2 , 41 divaleronitrile, 1, diazobis (1-acetoxy-11-phenylene), diazobis-1-1-cyclohexanecarbo Azo-based initiators such as nitrile, dimethyl-1,2,2-azobisisobutyrate, 4,4'-azobis-14-cyanobaric acid, 2-methyl-2,2'-azobispropane nitrile No.
[0119] 前記したような重合開始剤 (C)の配合量は、通常の量的割合で充分であるが、前 記カルボキシル基含有化合物 (A) 100質量部に対して、光ラジカル重合開始剤の 場合には 0. 5〜25質量部の割合、熱ラジカル重合開始剤の場合〖こは 0. 1 10質 量部の割合が好ましい。  [0119] The amount of the polymerization initiator (C) as described above is normally sufficient in a quantitative ratio. However, the photo-radical polymerization initiator is added to 100 parts by mass of the carboxyl group-containing compound (A). In this case, the ratio is preferably 0.5 to 25 parts by mass, and in the case of the thermal radical polymerization initiator, the ratio is preferably 0.110 parts by mass.
[0120] 前記希釈溶剤 (D)としては、例えば、メチルェチルケトン、シクロへキサノン等のケト ン類;トルエン、キシレン、テトラメチルベンゼン等の芳香族炭化水素類;エチレンダリ コールモノェチルエーテル、エチレングリコールモノメチルエーテノレ、エチレングリコ ールモノブチノレエーテノレ、ジエチレングリコールモノェチルエーテル、ジエチレングリ コ一ノレモノメチノレエーテノレ、ジエチレングリコーノレモノブチノレエーテノレ、プロピレング リコーノレモノメチノレエーテノレ、プロピレングリコールモノェチルエーテノレ、ジプロピレン グリコールジェチルェ一テル、トリエチレングリコールモノェチルエーテル等のグリコ ールエーテル類;酢酸ェチル、酢酸プチル、エチレングリコールモノェチルエーテル ァセテ ^ト、エチレングリコー/レモノブチノレエーテノレアセテート、ジェチレングリコ一ノレ モノェチルエーテルアセテート、ジエチレングリコールモノブチルエーテルアセテート 、プロピレングリコールモノメチルエーテルアセテート、ジプロピレングリコールモノメ チルエーテルアセテート等の酢酸エステル類;エタノール、プロパノール、エチレング リ ール、プロピレングリコール等のアルコール類;オクタン、デカン等の脂肪族炭化 水素類;石油エーテル、石油ナフサ、水添石油ナフサ、ソルベントナフサ等の石油系 溶剤などが挙げられる。これらの有機溶剤は、単独で又は 2種類以上の混合物として 使用することができる。これら稀釈溶剤の使用目的は、前記カルボキシル基含有ィ匕 合物 (A)等を溶解させ、また組成物を塗布方法に適した粘虔に調整することにある。 稀釈溶剤 (D)の配合量は、塗布方法に応じた任意め量とすることができる。[0120] Examples of the diluting solvent (D) include ketones such as methyl ethyl ketone and cyclohexanone; aromatic hydrocarbons such as toluene, xylene, and tetramethyl benzene; ethylene daryl monoethyl ether; Ethylene glycol monomethyl ether, ethylene glycol monobutynole ether, diethylene glycol monoethyl ether, diethylene glycol monomethyl monoenoate ether, diethylene glycol monoethyl monoenoate ether, propylene glycol monomethyl ether monoethylene Glycol ethers such as propylene glycol monoethyl ether, dipropylene glycol ethyl ether, and triethylene glycol monoethyl ether; ethyl acetate, butyl acetate, and ethylene glycol monoethyl ether acetate; ^ Ethylene glycol / lemonobutynoleate enorea acetate, dimethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate Acetates such as propylene glycol monomethyl ether acetate and dipropylene glycol monomethyl ether acetate; alcohols such as ethanol, propanol, ethylene glycol and propylene glycol; aliphatic hydrocarbons such as octane and decane; petroleum ether And petroleum-based solvents such as petroleum naphtha, hydrogenated petroleum naphtha, and solvent naphtha. These organic solvents can be used alone or as a mixture of two or more. The purpose of using these diluting solvents is to dissolve the carboxyl group-containing compound (A) and the like, and to adjust the composition godly suitable for the coating method. The compounding amount of the diluting solvent (D) can be an arbitrary amount according to the coating method.
] 前記 1分子中に 2個以上の,環状エーテルを有する化合物 )としては、ォキシラン 化合物、ォキセタン化合物、ォキソランィ匕合物などが挙げられる。 Examples of the compound having two or more cyclic ethers in one molecule) include oxsilane compounds, oxetane compounds, oxolani conjugates, and the like.
ォキシラン化合物としては、例えば、ジャパンエポキシレジン (株)製のェピコート 82 8、ェピコート 834、工ピコート 1001、ェピコート 1004、大日本インキイ匕学工業(株) 製のェピクロン 840、ェピクロン 850、ェピクロン 1050、ェピクロン 2055、東都化成( 株)製のェポトート YD_011、 YD— 013、 YD -127, YD— 128、ダウケミカル (株 )製の D. E. R. 317、 D. E. R. 331、 D. E. R. 661、 D. E. R. 664、住友ィ匕学ェ 業(株)製のスミ一エポキシ ESA— 011、 ESA— 014、 ELA—115、 ELA— 128 (何 れも商品名 )等のビスフエノール A型エポキシ樹脂;ジャパンエポキシレジン (株)製の ェピコート YL903、大日本インキ化学工業 (株)製のェピクロン 152、ェピクロン 165 、東都化成 (株)製のェポトート YDB— 400、 YDB- 500,ダウケミカル (株)製の D. ' E. R. 542、住友化学工業(株)製のスミ—エポキシ ESB— 400、 ESB— 700 (何れ も商品名)等のブロム化エポキシ樹脂;ジャパンエポキシレジン (株)製のェピコート 1 52、ェピコート 154、ダウケミカル(株)製の D. E. N. 431、 D. E. N. 438、大日本 インキ化学工業(株)製のェピクロン N— 730、ェピクロン N— 770、ェピクロン N_ 86 5、東都化成 (株)製のェポトート YDCN—701、 YDCN— 704、 日本化薬 (株)製の EPPN - 201、 EOCN - 1025、 EOCN— 1020、 EOCN—104S、 RE— 306、住 友化学工業 (株)製のスミ—エポキシ ESCN— 195X、 ESCN-220 (何れも商品名) 等のノボラック型エポキシ樹脂;大日禾インキ化学工業 (株)製のェピクロン 830、ジャ パンエポキシレジン (株)製ェピコート 807、東都化成 (株)製のェポトート YDF— 170 、 YDF— 175、 YDF- 2004 (何れも商品名)等のビスフエノール F型エポキシ樹脂; 東都化成 (株)製のェポトート ST— 2004、 ST— 2007、 ST— 3000 (何れも商品名) 等の水添ビスフエノール A型エポキシ樹脂;ジャパンエポキシレジン (株)製のェピコ . ート 604、東都化成 (株)製のェポトート YH— 434、住友ィ匕学工業 (株)製のスミ—ェ ポキシ ELM— 120 (何れも商品名)等のグリシジルァミン型エポキシ樹脂;ダイセル 化学工業 (株)製のセロキサイド 2021 (商品名 )等の脂環式エポキシ樹脂;ジャパン エポキシレジン (株)製の YL— 933、 日本化薬 (株)製の EPPN— 501、. EPPN— 50 2 (何れも商品名)等のトリヒドロキシフエエルメタン型エポキシ樹脂;ジャパンエポキシ レジン(株)製の YL— 6056、 ΎΧ— 4000、 YL— 6121 (何れも ^品名)等のビキシレ ノール型もしくはビフエノール型エポキシ樹脂又はそれらの混合物;日本化薬 (株)製 の EBPS— 200、旭電ィヒ工業 (株)製の EPX— 30、大日本インキ化学工業 (株)製の EXA- 1514 (何れも商品名)等のビスフエノール S型エポキシ樹脂;ジャパンェポキ シレジン (株)製のェピコート 157S (商品名)等のビスフエノール Aノボラック型ェポキ シ樹脂;ジャパンエポキシレジン (株)製のェピコート YL— 931 (商品名 )等のテトラフ ェエロールエタン型エポキシ樹脂;日産化学工業 (株)製の TEPIC (商品名 )等の複 素環式エポキシ樹脂;日本油脂 (株)製のブレンマ ^DGT (商品名 )等のジグリシジ ルフタレート樹脂;東都化成 (株)製の ZX— 1063 (商品名)等のテトラグリシジルキシ レノィルェタン樹脂;新日鉄化学 (株)製の ESN— 190、 ESN— 360、大日本インキ 化学工業(株)製の HP— 4032、 EXA— 4750、 EXA— 4700 (何れも商品名)等の ナフタレン基含有エポキシ樹脂;大日本インキ化学工業 (株).製の HP_ 7200、 HP — 7200H (何れも商品名)等のジシクロペンタジェン骨格を有するエポキシ樹脂;日 本油脂 (株)製の CP— 50S、 CP- 50M (何れも商品名)等のグリシジルメタアタリレ ート共重合系エポキシ樹脂;さらにヒダントイン型エポキシ樹脂、シクロへキシルマレイ ミドとグリシジルメタアタリレートの共重合エポキシ樹脂、 1, 5—ジヒドロキシナフタレン とビスフヱノール A型エポキシ樹脂とを反応させて得られるアルコール性の二級の水 酸基に、ェピハロヒドリンを反応させて得られる多官能エポキシ樹脂(国際公開 WO 01,024774号公報)等が挙げられる。 Examples of the oxysilane compounds include, for example, Epikote 828, Epikote 834, Kopicoat 1001, Epikote 1004, and Epicron 840, Epicron 850, and Epicron 1050, Epicron, manufactured by Dainippon Ink and Daikaku Kogyo Co., Ltd. manufactured by Japan Epoxy Resins Co., Ltd. 2055, YD_011, YD-013, YD-127, YD-128, manufactured by Toto Kasei Co., Ltd., DER 317, DER 331, DER 661, DER 664, manufactured by Dow Chemical Co., Ltd., Sumitomo Corporation Bisphenol A type epoxy resin such as Sumi-Epoxy ESA-011, ESA-014, ELA-115, ELA-128 (all trade names) manufactured by Epoxy Coat YL903, manufactured by Japan Epoxy Resin Co., Ltd. Epiclon 152 and Epiclon 165 manufactured by Nippon Ink Chemical Industry Co., Ltd., Epototo YDB-400 and YDB-500 manufactured by Toto Kasei Co., Ltd. D.'ER 542 manufactured by Dow Chemical Co., Ltd., Sumitomo Chemical Co., Ltd. Sumi-Epoxy ESB Brominated epoxy resins such as 400, ESB-700 (both are trade names); Epikote 1 52, Epicoat 154 manufactured by Japan Epoxy Resin Co., Ltd., DEN 431, DEN 438 manufactured by Dow Chemical Co., Ltd., Dainippon Ink & Chemicals, Inc. Epiclone N-730, Epiclone N-770, Epiclone N_865, manufactured by Industrial Co., Ltd., Epototo YDCN-701, YDCN-704 manufactured by Toto Kasei Co., Ltd., EPPN-201, EOCN manufactured by Nippon Kayaku Co., Ltd. -Novolak type epoxy resin such as 1025, EOCN-1020, EOCN-104S, RE-306, Sumitomo Chemical Co., Ltd. Sumi-Epoxy ESCN-195X, ESCN-220 (all trade names); Epiclon 830 manufactured by Ink Chemical Industry Co., Ltd., Epicoat 807 manufactured by Japan Epoxy Resin Co., Ltd., Epototo YDF-170 manufactured by Toto Kasei Co., Ltd. Bisphenol F-type epoxy resin such as YDF-175, YDF-2004 (all trade names); Epototo ST-2004, ST-2007, ST-3000 (all trade names) manufactured by Toto Kasei Co., Ltd. Hydrogenated bisphenol A-type epoxy resin; Epikoto 604 manufactured by Japan Epoxy Resin Co., Ltd., Epotote YH-434 manufactured by Toto Kasei Co., Ltd., and Sumiepoxy ELM manufactured by Sumitomo Iridaku Kogyo Co., Ltd. — Glycidylamine-type epoxy resin such as 120 (all trade names); Alicyclic epoxy resin such as Celloxide 2021 (trade name) manufactured by Daicel Chemical Industries, Ltd .; YL—933 manufactured by Japan Epoxy Resin Co., Ltd. Nippon Kayaku Co., Ltd. EPPN-501, EPH-502 (all trade names) and other trihydroxy fuel methane type epoxy resins; Japan Epoxy Resin Co., Ltd. YL-6056, ΎΧ-4000 Or YL-6121 (both ^ product names) Biphenol-type epoxy resin or a mixture thereof; EBPS-200 manufactured by Nippon Kayaku Co., Ltd., EPX-30 manufactured by Asahi Denshi Co., Ltd., EXA-1514 manufactured by Dainippon Ink and Chemicals, Inc. bisphenol S type epoxy resin trade name); Japanepoki Shirejin Co. Ltd. Epikoto 15 7 S (trade name) bisphenol a novolac type such Epoki shea resin; manufactured by Japan epoxy resins Co. of Co. Epikoto YL- 931 (trade name) or other tetraphenylolethane-type epoxy resin; Nissan Chemical Industries, Ltd. TEPIC (trade name) or other complex cyclic epoxy resin; NOF Corporation's Bremma ^ DGT (trade name) ), Etc .; Tetraglycidyl xylenylethane resin such as ZX-1063 (trade name) manufactured by Toto Kasei Co., Ltd .; ESN-190, ESN-360 manufactured by Nippon Steel Chemical Co., Ltd., Dainippon Ink and Chemicals ( HP-4032, Naphthalene group-containing epoxy resin such as EXA-4750 and EXA-4700 (all trade names); dicyclopentadiene such as HP-7200, HP-7200H (all trade names) manufactured by Dainippon Ink and Chemicals, Inc. Epoxy resins having a skeleton; glycidyl methacrylate copolymer epoxy resins such as CP-50S and CP-50M (both trade names) manufactured by Nippon Oil & Fats Co., Ltd .; and hydantoin-type epoxy resins, cyclohexylmale Epoxy halohydrin is reacted with an alcoholic secondary hydroxyl group obtained by reacting 1,5-dihydroxynaphthalene with bisphenol A type epoxy resin. And functional epoxy resins (International Publication WO 01,024774).
ォキセタンィ匕合物としては、例えば、 3, 7—ビス(3—ォキセタニル)一 5—ォキサ一 ノナン、 3, 3' - (1, 3—(2—メチレニル)プロパンジィルビス(ォキシメチレン))ビス - 一(3一ェチルォキセタン)、 1, 4_ビス〔(3—ェチルー 3—ォキセタニルメトキシ)メチ ル〕ベンゼン、 1, 2—ビス [ (3—ェチル一3—ォキセタニルメトキシ)メチル]ェタン、 1 , 3—ビス [ (3—ェチルー 3—ォキセタニルメトキシ)メチル]プロパン、エチレングリコ 'ールビス(3—ェチル一3—ォキセタニルメチル)エーテル、ジシクロペンテュルビス( 3—ェチノレ一 3—ォキセタ -ルメチル)エーテル、トリエチレングリコールビス(3—ェチ ノレ一 3—ォキセタ ルメチル)エーテル、テトラエチレンダリコールビス(3—ェチル一 3—ォキセタニルメチル)エーテル、トリシクロデカンジィルジメチレン ( 3一ェチル一 3 ーォキセタニルメチル)エーテル、トリメチロールプロパントリス(3—ェチル—3—ォキ セタニルメチル)エーテル、 1, 4—ビス(3—ェチル _3—ォキセタニルメトキシ)ブタ ン、 1, 6_ビス(3—ェチル一3—ォキセタニルメトキシ)へキサン、ペンタエリスリトー ノレトリス(3—ェチル一 3—ォキセタニルメチル)エーテル、ペンタエリスリトーノレテトラ キス(3—ェチル一3—ォキセタニルメチル)エーテルなどが挙げられる。 Examples of oxetanei conjugates include, for example, 3,7-bis (3-oxetanyl) -1-5-oxa Nonane, 3, 3 '-(1,3- (2-methylenyl) propanedylbis (oxymethylene)) bis- ( 3- ethylethyloxetane), 1,4_bis [(3-ethylethyl-3-oxetanylmethoxy) [Methyl] benzene, 1,2-bis [(3-ethyl-13-oxetanylmethoxy) methyl] ethane, 1,3-bis [(3-ethyl-3-oxetanylmethoxy) methyl] propane, ethylene glycol 'Ethyl bis (3-ethyl-13-oxetanylmethyl) ether, dicyclopentylbis (3-ethynole-3-oxetane-methyl) ether, triethylene glycol bis (3-ethynole-3-oxetanalmethyl) Ether, tetraethylene dalicol bis (3-ethyl-13-oxetanylmethyl) ether, tricyclodecanedidimethylmethylene (31-ethyl-13-oxetanylmethyl) ether, Methylolpropane tris (3-ethyl-3-oxetanylmethyl) ether, 1,4-bis (3-ethyl_3-oxetanylmethoxy) butane, 1,6_bis (3-ethyl-13-oxetanyl) Methoxy) hexane, pentaerythritol norethris (3-ethyl-13-oxetanylmethyl) ether, pentaerythritol noretetrakis (3-ethyl-13-oxetanylmethyl) ether and the like.
[0123] 前言 ¾した 1分子中に 2個以上の環状エーテルを有する化合物 (E)は、単独で又は 2 種以上を組み合わせて用レ、ることができる。これらの環状エーテルを有する化合物は '、熱硬化することにより、レジストの密着性、耐熱性等の特性を向上させる。その配合 量は、前記カルボキシル基含有化合物 (A) 100質量部に対して 10質量部以上、 10 0質量部以下の割合で充分であり、好ましくは 15〜60質量部の割合である。環状ェ '- 一テルを有する化合物 (E)の配合量が上記範囲未満の場合、硬化膜の吸湿性が高 くなつて PCT耐性が低下し易くなり、又はんだ耐熱性や無電解めつき耐性も低くなり .易い。一方、上記範囲を超えると、塗膜の現像性や硬化膜の無電解めつき耐性が悪 くなり、また PCT耐性も劣ったものとなる。  The compound (E) having two or more cyclic ethers in one molecule described above can be used alone or in combination of two or more. These compounds having a cyclic ether can be cured by heat to improve properties such as resist adhesion and heat resistance. The amount of the compound is 10 parts by mass or more and 100 parts by mass or less based on 100 parts by mass of the carboxyl group-containing compound (A), and is preferably 15 to 60 parts by mass. If the compounding amount of the cyclic ester-containing compound (E) is less than the above range, the hygroscopicity of the cured film becomes high and the PCT resistance tends to decrease, or the solder heat resistance and electroless plating resistance Is also low. On the other hand, if it exceeds the above range, the developability of the coating film and the electroless plating resistance of the cured film become poor, and the PCT resistance also becomes poor.
[0124] 前記硬化触媒 (F)としては、例えば、イミダゾール、 2—メチルイミダゾール、 2—ェ チルイミダゾール、 2—ェチルー 4—メチルイミダゾール、 2_フエ二ルイミダゾール、 4 一フエ二ルイミダゾール、 1―シァノエチル一 2—フエ レイミダゾール、 1一(2—シァ ノエチル) -2-ェチル _ 4—メチルイミダゾール等のイミダゾール誘導体;ジシアン ジアミド、ベンジルジメチルァミ 、 4— (ジメチルァミノ)— N, N—ジメチルベンジルァ ミン、 4—メトキシ一 N, N—ジメチルベンジノレアミン、 4—メチルー N, N—ジメチルべ ンジルァミン等のアミンィ匕合物;アジピン酸ヒドラジド、セバシン酸ヒドラジド等のヒドラ ジンィ匕合物;トリフヱニルホスフィン等のリンィ匕合物などを用いるととができる。市販さ れているものとしては、例えば四国化成(株)製の 2MZ— A、 2MZ_〇K、 2PHZ、 2 P4BHZ、 2P4MHZ (いずれもイミダゾール系化合物の商品名)、サンァプロ(株)製 の U—CAT3503N、 U— CAT3502T (レ、ずれもジメチルァミンのブロックイソシァネ ート化合物の商品名)、 DBU、 DBN、 U— CATSA102、 U— CAT5002 (レヽずれも 二環式アミジン化合物及ぴその塩)などが挙げられる。特に、熱硬化特性を向上させ るためであれば、これらに限られるものではなぐ瑷状エーテルを有する化合物の硬 化触媒、もしくは環状エーテルを有する化合物とカルボン酸の反応を促進するもので あればよぐ単独で又は 2種以上を混合して使用しても力まわない。また、密着性付 与剤としても機能するグアナミン、ァセトグアナミン、ベンゾグアナミン、メラミン、 2, 4 ―ジァミノ一 6—メタクリロイルォキシェチル _ S—トリァジン、 2—ビニルー 4, 6—ジァ ミノ一 S—トリアジン、 2—ビュル一 4, 6—ジァミノー S—トリァジン'イソシァヌル酸付 加物、 2, 4―ジァミノ一 6 _メタタリロイルォキシェチル一 S―トリァジン ·イソシァヌル 酸付加物等の S—トリァジン誘導体を用レ、ることもでき、好ましくはこれらの化合物を 前記硬化触媒と併用する。上記硬化触媒の配合量は通常の量的割合で充分であり 、例えば前記カルボキシル基含有化合物 (入) 100質量部に対して 0. 1〜20質量部 、好ましくは 0. 5-15. 0質量部の割合である。 As the curing catalyst (F), for example, imidazole, 2-methylimidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2_phenylimidazole, 4-phenylimidazole, 1 -Imidazole derivatives such as cyanoethyl- 1- 2-phenyleimidazole, 11- (2-cyanoethyl) -2-ethyl-4-methyl imidazole; dicyandiamide, benzyldimethylamido, 4- (dimethylamino) -N, N-dimethyl Benzylamine, 4-methoxy-N, N-dimethylbenzinoleamine, 4-methyl-N, N-dimethylbenzamine Amine conjugates such as benzylamine; hydrazine conjugates such as adipic hydrazide and sebacic hydrazide; and phosphorus conjugates such as triphenylphosphine can be used. Examples of commercially available products include 2MZ-A, 2MZ_〇K, 2PHZ, 2P4BHZ, and 2P4MHZ (all of which are trade names of imidazole compounds) manufactured by Shikoku Chemicals Co., Ltd .; —CAT3503N, U— CAT3502T (trade name of block isocyanate compound of dimethylamine), DBU, DBN, U—CATSA102, U—CAT5002 (bicyclic amidine compound and its salt) And the like. In particular, if the purpose is to improve the thermosetting properties, the present invention is not limited to these, and any other catalyst may be used as long as it accelerates the reaction between a compound having a cyclic ether and a compound having a cyclic ether and a carboxylic acid. It does not work even if used alone or as a mixture of two or more. Guanamine, acetoguanamine, benzoguanamine, melamine, 2,4-diamino-16-methacryloyloxexetil_S-triazine, 2-vinyl-4,6-diamino-1S—which also functions as an adhesion promoter S-triazines, such as triazine, 2-butyl-1,4,6-dianmino S-triazine 'isocyanuric acid adduct, 2,4-diamino-16_metararyloyloxetyl-1-S-triazine / isocyanuric acid adduct Derivatives can be used, and these compounds are preferably used in combination with the curing catalyst. The amount of the curing catalyst to be blended in a usual quantitative ratio is sufficient, for example, 0.1 to 20 parts by mass, preferably 0.5 to 15.0 parts by mass, based on 100 parts by mass of the carboxyl group-containing compound (containing). Parts.
前記ラジカル重合性モノマー(G)としては、例えば、 2—ヒドロキシェチル (メタ)ァク リレート、' 2—ヒドロキシプロピル(メタ)アタリレート、ペンタエリスリトールトリアタリレート 、ジペンタエリスリトールペンタアタリレートなどの水酸基含有のアタリレート類;ポリエ チレングリコールジアタリレート、ポリプロピレングリコールジアタリレートなどの水溶性 のアタリレート類;トリメチロールプロパントリアタリレート、ペンタエリスリトールテトラァク リレート、ジペンタエリスリトールへキサアタリレートなどの多価アルコールの多官能ポ リエステルアタリレート類;トリメチロールプロパン、水添ビスフエノール A等の多官能ァ ルコールもしくはビスフエノール A、ビフエノールなどの多価フエノールのエチレンォキ サイド付加物及び/又はプロピレンオキサイド付加物のアタリレート類;上記水酸基 含有アタリレートのイソシァネート変成物である多官能もしくは単官能ポリウレタンァク リレート;ビスフエノール Aジグリシジルエーテル、水添ビスフエノール Aジグリシジルェ 一テル又はフエノールノボラックエポキシ樹脂の(メタ)アクリル酸付加物であるェポキ シアタリレート類、及ぴ上記アタリレート類に対応するメタクリレート類などが挙げられ . 、これらは単独で又は 2種以上を併用することができる。これらの中でも、 1分子中に 2 個以上の (メタ)アタリロイル基を有する多窜能 (メタ)アタリレート化合物が好ましレ、。こ れらラジカル重合性モノマーの使用目的は、組成物の光反応性を上げることにある。 室温で液状のラジカル重合性モノマーは、組成物の光反応性を上げる目的の他、組 ' 成物を各種の塗布方法に適した粘度に調整したり、アルカリ水溶液への溶解性を助 ける役割も果たす。ラジカル重合性モノマー(G)の配合量は、前記カルボキシル基 含有化合物 (A) 100質量部に対して 100質量部以下が好まじい。 Examples of the radical polymerizable monomer (G) include 2-hydroxyethyl (meth) acrylate, '2-hydroxypropyl (meth) acrylate, pentaerythritol triatalylate, and dipentaerythritol pentaatalylate. Hydroxyl-containing atalylates; water-soluble atalylates such as polyethylene glycol diatalylate and polypropylene glycol diatalylate; trimethylolpropane triatalylate, pentaerythritol tetraacrylate, dipentaerythritol hexatalylate, etc. Polyfunctional alcohol acrylates of polyhydric alcohols; polyfunctional alcohols such as trimethylolpropane and hydrogenated bisphenol A or polyphenols such as bisphenol A and biphenol Atari rate such Id adduct and / or propylene oxide adducts; polyfunctional or monofunctional polyurethane § click a Isoshianeto modified products of the hydroxyl group-containing Atari rate Relates: bisphenol A diglycidyl ether, hydrogenated bisphenol A diglycidyl ether or epoxy cyanate acrylates which are (meth) acrylic acid adducts of phenol novolak epoxy resins, and methacrylates corresponding to the above acrylates However, these can be used alone or in combination of two or more. Among these, multifunctional (meth) atalylate compounds having two or more (meth) atalyloyl groups in one molecule are preferred. The purpose of using these radically polymerizable monomers is to increase the photoreactivity of the composition. The radical polymerizable monomer that is liquid at room temperature is used not only to increase the photoreactivity of the composition, but also to adjust the viscosity of the composition to be suitable for various coating methods, and to help the solubility in aqueous alkaline solutions. Also fulfills. The mixing amount of the radical polymerizable monomer (G) is preferably 100 parts by mass or less based on 100 parts by mass of the carboxyl group-containing compound (A).
[0126] 本発明の硬化性組成物には、硬化物の特性を低下させない程度において、無機 増粘剤を配合することができる。無機増粘剤としては、例えば、日本ァエロジル社製 の # 50、 # 200、 # 380などの親水性シリカ、日本ァエロジル社製の #R974、 #R 972などの疎水性シリカ、ウィルバー 'エリス社製のオルベン、ベントン 38などの有機 ベントナイトなどが挙げられる。これら無機増粘剤の配合量は逋常の量的割合で充 分であり、例えば、前記カルボキシル基含有化合物 (A) 100質量部に対して 0. 1〜 20質量部、好ましくは 0. 5〜10. 0質量部の割合である。  [0126] The curable composition of the present invention may contain an inorganic thickener to such an extent that the properties of the cured product are not deteriorated. Examples of the inorganic thickener include hydrophilic silica such as # 50, # 200, and # 380 manufactured by Nippon Aerosil, hydrophobic silica such as # R974 and # R972 manufactured by Nippon Aerosil, and Wilbur's Ellis. Organic bentonite such as Olben and Benton 38. The compounding amount of these inorganic thickeners is sufficient at a quantitative ratio, and for example, 0.1 to 20 parts by mass, preferably 0.5 to 100 parts by mass of the carboxyl group-containing compound (A). 1010.0 parts by mass.
[0127] ' 本発明の硬化性組成物には、さらに必要に応じて、硫酸バリウム、チタン酸バリウム 、酸ィ匕ケィ素粉、微粉状酸化ケィ素、無定形シリカ、結晶性シリカ、溶融シリカ、球状 シリカ、タルク、クレー、炭酸マグネシウム、炭酸カルシウム、酸ィ匕アルミニウム、水酸 化アルミニウム'、マイ力等の公知慣用の無機フィラーや、ゴム微粒子、粉体エポキシ ' 樹脂 (例えば、 日産化学工業社製 TEPIC等)、ウレタン樹脂、メラミン樹脂、ベンゾグ アナミン樹脂 (例えば、日本触媒社製 M— 30、 S、 MS等)、尿素樹脂、架橋アクリル ポリマー (例えば、綜研ィ匕学社製 MR— 2G、 MR— 7G等、積水化成品社製テクポリ マー)等の有機フィラーを、単独で又は 2種以上配合することができる。 れらは塗膜 の硬化収縮を抑制し、密着性、硬度、耐熱性などの特性を向上させる目的で用いら れる。フィラーの配合量は、前記カルボキシル基含有ィ匕合物 (A) 100質量部当り 10 〜300質量部、好ましくは 30〜200質量部の割合が適当である。 [0128] '本発明の硬化性組成物は、さらに必要に応じてフタロシアニン'プル一、フタロシア ニン.グリーン、アイォジン.グリーン、ジスァゾイェロー、クリスタルバイオレット、酸化 チタン、カーボンブラック、ナフタレンブラックなどの公知慣用の着色剤、ハイド口キノ ン、ハイドロキノンモノメチノレエーテル、 tーブチルカテコ ノレ、ピロガローノレ、フエノチ ァジンなどの公知慣用の熱重合禁止剤、シリコーン系、フッ素系、高分子系などの消 泡剤及び Z又はレべリング剤、イミダゾール系、チアゾール系、トリァゾール系等のシ ランカップリング剤などのような公知慣用の添加剤類を配合することができる。 [0127] The curable composition of the present invention may further contain, if necessary, barium sulfate, barium titanate, silicon oxide powder, silicon oxide fine powder, amorphous silica, crystalline silica, and fused silica. Known and commonly used inorganic fillers such as silica, talc, clay, magnesium carbonate, calcium carbonate, oxidized aluminum, aluminum hydroxide, and My power, fine rubber particles, and powdered epoxy resin (for example, Nissan Chemical Industries Resin, urethane resin, melamine resin, benzoguanamine resin (for example, M-30, S, MS, etc., manufactured by Nippon Shokubai Co., Ltd.), urea resin, cross-linked acrylic polymer (for example, MR-2G manufactured by Soken Iridakusha) And organic fillers such as MR-7G and Techpolymer manufactured by Sekisui Plastics Co., Ltd. can be used alone or in combination of two or more. They are used for the purpose of suppressing curing shrinkage of a coating film and improving properties such as adhesion, hardness and heat resistance. An appropriate amount of the filler is 10 to 300 parts by mass, preferably 30 to 200 parts by mass, per 100 parts by mass of the carboxyl group-containing compound (A). [0128] The curable composition of the present invention may further comprise a phthalocyanine, if necessary, such as phthalocyanine, green, aozin. Green, disazoyello, crystal violet, titanium oxide, carbon black, and naphthalene black. Known and commonly used thermal polymerization inhibitors such as coloring agents, hydrocyanic acid quinone, hydroquinone monomethinole ether, t-butyl catecholone, pyrogallonole, phenothiazine, defoaming agents such as silicone, fluorine and polymer, and Z or R Known and commonly used additives such as a belling agent, an imidazole-based, a thiazole-based, and a triazole-based silane coupling agent can be blended.
[0129] さら.に本発明の硬化性組成物は、難燃性を得る目的で、必要に応じて、ハロゲン系 ' 難燃剤、リン系難燃剤、及びアンチモン系難燃剤等の難燃剤を配合することができる 。難燃剤の配合量は、前記カルボキシル基含有化合物 (A) 100質量部に対して、通 常:!〜 200質量部、好ま くは 5〜50質量部の割合で る。難燃剤の配合量が上記 範囲内にあると、得られる硬化物の難燃性、耐熱性、耐水性及び密着性が高度にバ ランスされて好適である。  [0129] Furthermore, the curable composition of the present invention may contain a flame retardant such as a halogen-based flame retardant, a phosphorus-based flame retardant, and an antimony-based flame retardant, if necessary, for the purpose of obtaining flame retardancy. can do . The compounding amount of the flame retardant is usually from! To 200 parts by mass, preferably from 5 to 50 parts by mass, based on 100 parts by mass of the carboxyl group-containing compound (A). When the compounding amount of the flame retardant is within the above range, the flame resistance, heat resistance, water resistance and adhesion of the obtained cured product are highly balanced, which is preferable.
' また、本発明の組成物の引火性の低下のために、また増粘性を高めるために、水 . を添カロすることもできる。  'In order to reduce the flammability of the composition of the present invention and to increase the viscosity, water may be added to the composition.
[0130] ' 本発明の硬化性組成物は、従来知られている方法と同様の方法で光硬化及び Z 又は熱硬化させることにより、容易に硬化物を得ることができる。例えば、上記硬化性 組成物をロールを用いて均一になるまで充分に混合し、用途に応じて所望の基材に 、例えばスクリーン印刷法.、カーテンコート法、スプレーコート法、ロールコート法等の 公知の塗工方法により塗布し、例えば約 60〜100°Cの温度で組成物中に含まれる ' 希釈溶剤を揮発乾燥させることにより、ダレを生ずることもなく指触乾燥性に優れた塗 ■ 膜を形成できる。また、本発明の硬化性組成物はレジスト用ドライフィルムを形成する こともでき、その場合にはそのままラミネートすればよい。その後、活性エネルギー線 により露光して光硬化させる。次いで、約 100°C〜200°Cで加熱硬化させることにより 、優れた耐クラック性に加え、電気絶縁性、 PCT耐性、密着性、はんだ耐熱性、耐薬 品性、無電解金めつき耐性等の諸特性に優れた硬化物を得ることができる。プリント 配線板のソルダーレジスト形成の場合には、パターンを形成したフォトマスクを通して 選択的に紫外線等の活性エネノレギ一線により露光し、又はレーザー光線により直接 描画し、禾露光部を希アルカリ水溶液により現像してレジストパターンを形成し、加熱 硬化させることにより、上記のような諸特性に優れたレジスト膜が得られる。上記現像 に使用される希アルカリ水溶液としては、水酸化カリウム、水酸化ナトリウム、炭酸ナト リウム、炭酸カリウム、リン酸ナトリウム、珪酸ナトリウム、アンモニア、アミン類等の水溶 液が挙げられる。 [0130] The curable composition of the present invention can be easily cured by photocuring and Z or heat curing in the same manner as conventionally known methods. For example, the above-mentioned curable composition is sufficiently mixed using a roll until uniform, and is applied to a desired base material according to the application, for example, screen printing, curtain coating, spray coating, roll coating, etc. The coating is performed by a known coating method, for example, by volatilizing and drying the diluting solvent contained in the composition at a temperature of about 60 to 100 ° C., thereby producing a coating excellent in dryness to the touch without dripping. A film can be formed. Further, the curable composition of the present invention can also form a dry film for resist, and in that case, it may be laminated as it is. Then, it is light-cured by exposure to active energy rays. Next, by heating and curing at about 100 ° C to 200 ° C, in addition to excellent crack resistance, electrical insulation, PCT resistance, adhesion, solder heat resistance, chemical resistance, electroless gold plating resistance, etc. A cured product excellent in the above-mentioned characteristics can be obtained. In the case of forming a solder resist on a printed wiring board, it is selectively exposed to active energy such as ultraviolet rays through a patterned photomask, or directly by a laser beam. By drawing and developing the exposed portion with a dilute alkaline aqueous solution to form a resist pattern and curing by heating, a resist film having excellent characteristics as described above can be obtained. Examples of the diluted alkaline aqueous solution used for the development include aqueous solutions of potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium phosphate, sodium silicate, ammonia, amines, and the like.
実施例 ;  Example ;
[0131] 以下、本発明の実施例を示して具体的に説明するが、本発明はこれらの実施例に 限定されるものではない。なお、以下において特に断りのない限り、「部」は質量部を 意味するものとする。 Hereinafter, the present invention will be described specifically with reference to Examples, but the present invention is not limited to these Examples. In the following, “parts” means parts by mass unless otherwise specified.
[0132] 合成例 1 [0132] Synthesis example 1
'窒素導入管、温度計を り付けた 100mlのフラスコに 3—ァクリロイ口キシ— 2—ヒド ロキシプロピルメタタリレート (新中村化学工業 (株)製、商品名 NKエステル 701A) 1 0. 0g (46. 68ミリモノレ)、テトラヒドロフラン 80ml、テレフタノレ酸クロライド 4. 7g (23. 34ミリモノレ)、トリエチノレアミン 5. 9g (58. 35ミリモノレ)、 4ージメチノレアミノピリジン 0. 5 g (4. 09ミリモル)、メチノレハイドロキノン 0. 4mgを加えて窒素気流下、 65°Cで 20時 間加熱還流させた。その反応液に水 50mlを加えてトリエチルァミンの塩基性塩を水 ■ に溶解させた後、酢酸ェチルで 応混合物を抽出した。さらに、水層中の反応混合 物を酢酸ェチル 25mlで抽出した。得られた有機層を INの塩酸水溶液 50mlで洗浄 し、続いで飽和食塩水 50mlで洗浄した。有機層を硫酸ナトリウム 5. Ogで乾燥後、減 圧ろ過、濃縮を行ない、 11. 7gの化合物を得た。このものを中性シリカゲル 230gを 用いてカラム精製を行なった。その結果、 4. 5gのテトラ (メタ)アタリレートイ匕合物が得 られた。これは、理論量の 34· 5%の収率であった。得られたテトラ (メタ)アタリレート 化合物の赤外線吸収スペクトル (フーリエ変換赤外分光光度計 FT—IRを用いて測 定)、核磁気共鳴スペクトル (溶媒 CDC1、基準物質 TMS (テトラメチルシラン))及び  '' 3-Acryloyl oxy-2-hydroxypropyl methacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., trade name: NK ester 701A) in a 100 ml flask equipped with a nitrogen inlet tube and a thermometer 10.0 g ( 46. 68 millimonoles), tetrahydrofuran 80 ml, terephthalanolic acid chloride 4.7 g (23.34 millimonoles), triethynoleamine 5.9 g (58.35 millimonoles), 4-dimethinoleaminopyridine 0.5 g (4.09 Mmol) and 0.4 mg of methinolehydroquinone, and the mixture was refluxed for 20 hours at 65 ° C under a nitrogen stream. 50 ml of water was added to the reaction solution to dissolve the basic salt of triethylamine in water 1, and the reaction mixture was extracted with ethyl acetate. Further, the reaction mixture in the aqueous layer was extracted with 25 ml of ethyl acetate. The obtained organic layer was washed with IN aqueous hydrochloric acid solution (50 ml), followed by saturated saline (50 ml). The organic layer was dried over 5. Og of sodium sulfate, filtered under reduced pressure, and concentrated to obtain 11.7 g of a compound. This was subjected to column purification using 230 g of neutral silica gel. As a result, 4.5 g of a tetra (meth) atalylate toyidani compound was obtained. This was a yield of 34.5% of theory. Infrared absorption spectrum (measured using Fourier transform infrared spectrophotometer FT-IR), nuclear magnetic resonance spectrum (solvent CDC1, reference substance TMS (tetramethylsilane)) of the obtained tetra (meth) atalylate compound and
3  Three
クロマトグラム(高速液体クロマトグラフィーを用いて測定)をそれぞれ図 :L、図 2及び 図 3に示す。また、 — NMRの同定結果を表 1に示す。なお、図 3に示すクロマトグ ラムにピークが一つしか現われて!/、なレ、ことから、純粋な化合物が得られたことがわ 力る。 [0133] [表 1] The chromatograms (measured using high performance liquid chromatography) are shown in Figure L and Figures 2 and 3, respectively. Table 1 shows the results of NMR identification. It should be noted that only one peak appeared in the chromatogram shown in FIG. 3! /, Which indicates that a pure compound was obtained. [Table 1]
Figure imgf000036_0001
Figure imgf000036_0001
[0134] 合成例 2 [0134] Synthesis Example 2
窒素導入管、温度計を取り付けた 10リットルのフラスコに 3—アタリロイ口キシー 2— ヒドロキシプロピルメタクリレート (新中村化学工業 (株)製、商品名 NKエステル 701A ) 1. 0kg (4. 67モル)、テトラヒドロフラン 7. 0リットノレ、テレフタノレ酸クロライド 475. Og (2. 34モル)、トリェチルァミン 590g (5. 83モル)、メチルハイドロキノン 0. 4g、フエノ チアジン 0. 4gを加えて窒素気流下、室温で 6時間反応させた。その反応液に水 5. 0リットルを加えてトリェチルァミンの塩基性塩を水に溶解させた後、酢酸ェチル 5. 0 リットルで反応混合物を抽出した。さらに、水層中の反応混合物を酢酸ェチル 2. 5リ ットルで抽出した。得られた有機層を 1Nの塩酸水溶液 5. 0リットルで洗浄し、続いて 飽和炭酸水素ナトリウム水溶液 5. 0リットルで洗浄し、さらに飽和食塩水 5. 0リットル で洗浄した。得られた有機層を硫酸マグネシウム 500gで乾燥後、減圧ろ過して濃縮 し、反応濃縮混合物 (粘性黄色液体) 1. 5kgを得た。得られた反応濃縮混合物にメタ ノール 2. 5リットルを加えて均一にした後、— 30°Cまで冷却し、結晶を生じさせ、ろ過 (メタノールで洗浄)して、融点約 82°Cの白色のテトラ (メタ)アタリレートイ匕合物 350g を得た。これは、理論量の 27. 0%の収率であった。得られたテトラ (メタ)アタリレート 化合物の赤外線吸収スペクトル (フーリエ変換赤外分光光度計 FT— IRを用いて測 定)、核磁気共鳴スペクトル (溶媒 CDC1、基準物質 TMS (テトラメチルシラン))及び  In a 10-liter flask equipped with a nitrogen inlet tube and a thermometer, 1.0 kg (4.67 mol) of 3-Attalylox-xy-2-hydroxypropyl methacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., trade name: NK ester 701A) Add 7.0 l of tetrahydrofuran, 475. Og (2.34 mol) of terephthalanolic acid chloride, 590 g (5.83 mol) of triethylamine, 0.4 g of methylhydroquinone and 0.4 g of phenothiazine, and add 6 g of nitrogen at room temperature under a nitrogen stream. Reacted. 5.0 liters of water was added to the reaction solution to dissolve the basic salt of triethylamine in water, and the reaction mixture was extracted with 5.0 liters of ethyl acetate. Further, the reaction mixture in the aqueous layer was extracted with 2.5 liters of ethyl acetate. The obtained organic layer was washed with 5.0 L of a 1N aqueous hydrochloric acid solution, subsequently with 5.0 L of a saturated aqueous sodium hydrogen carbonate solution, and further washed with 5.0 L of a saturated saline solution. The obtained organic layer was dried over 500 g of magnesium sulfate, filtered under reduced pressure, and concentrated to obtain 1.5 kg of a reaction concentrated mixture (a viscous yellow liquid). The resulting concentrated reaction mixture was homogenized by adding 2.5 liters of methanol, cooled to -30 ° C to form crystals, filtered (washed with methanol), and filtered to give a white powder having a melting point of about 82 ° C. To obtain 350 g of a tetra (meta) atalay toy dagger. This was a yield of 27.0% of theory. Infrared absorption spectrum (measured using Fourier transform infrared spectrophotometer FT-IR), nuclear magnetic resonance spectrum (solvent CDC1, reference material TMS (tetramethylsilane)) of the obtained tetra (meth) acrylate compound
3  Three
クロマトグラム(高速液体クロマトグラフィーを用いて測定)をそれぞれ図 4、図 5及ぴ' 図 6に示す。  The chromatograms (measured using high performance liquid chromatography) are shown in FIGS. 4, 5, and 6, respectively.
[0135] 試験例 1 [0135] Test example 1
差替え用紙(規則 26) 上記白色結晶のテトラ (メタ)ァクリレートイヒ合物を ioo°cで溶融させ、バーコ一ター を用いて 50 μ ΐηの厚さになるように、ポリイミドフィルムに塗布し、(1) 120。Cで 120分 間、(2) 140°Cで 30分間、(3) 160°Cで 20分間、又は (4) 180°Cで 10分間'加熱し、 次いで、 PCT装置 (TABAI ESPEC HAST SYSTEM TPC—412MD)を用 いて 121。C、 100%RHの条件で 24時間処理し、その後、ポリイミドフィルム力 硬化 膜を剥がし、 4種類の評価サンプルを得た。これらの評価サンプルの耐熱性、柔軟性 及び耐折性を後述する方法で測定し、高湿下での熱的劣化等の度合レヽを評価した 。また、予め質量を測定したガラス板上に、 PCT装置による処理を実施しなレ、こと以 外は上記と同様にして硬ィ匕膜を作成し、評価サンプルを得た。この硬化膜の吸水率 を後述する方法で測定し、評価した。上記測定結果を下記表 2に示す。 Replacement form (Rule 26) The white crystalline tetra (meth) acrylate compound was melted at ioo ° C and applied to a polyimide film using a bar coater to a thickness of 50 μ μη, (1) 120. C for 120 minutes, (2) 140 ° C for 30 minutes, (3) 160 ° C for 20 minutes, or (4) 180 ° C for 10 minutes, and then use a PCT device (TABAI ESPEC HAST SYSTEM TPC). —412MD) using 121. C, and treated at 100% RH for 24 hours. Thereafter, the polyimide film cured film was peeled off to obtain four types of evaluation samples. The heat resistance, flexibility, and bending resistance of these evaluation samples were measured by the methods described below, and the degree of thermal degradation under high humidity was evaluated. Also, a hardened film was prepared in the same manner as described above except that the treatment with a PCT apparatus was not performed on a glass plate whose mass was measured in advance, and an evaluation sample was obtained. The water absorption of this cured film was measured and evaluated by the method described below. The measurement results are shown in Table 2 below.
[0136] [表 2] [Table 2]
Figure imgf000037_0001
上記表 2中の性能試験の評価方法は以下の通りである。
Figure imgf000037_0001
The evaluation method of the performance test in Table 2 above is as follows.
[0137] (1)耐熱性 [0137] (1) Heat resistance
評価サンプルを熱重量測定 (TG)により測定し、耐熱性を評価した。  The evaluation sample was measured by thermogravimetry (TG) to evaluate heat resistance.
なお、本明細書においては、図 7に示すように TG曲線の変曲部での接線から求め た外揷点を耐熱温度とする。  In this specification, as shown in FIG. 7, the outer perimeter determined from the tangent at the inflection portion of the TG curve is defined as the heat-resistant temperature.
[0138] (2)柔軟性 [0138] (2) Flexibility
評価サンプルを幅 10mm、長さ 90mmに加工して作製したフィルム状試験片の一 側辺部を電子抨上に載せ、他側辺部を折り曲げる方法で、フィルム間が 10mmにな るまでに電子秤に力 る最大荷重を反発力として、以下の基準で評価した。  One side of the film-shaped test piece prepared by processing the evaluation sample to a width of 10 mm and a length of 90 mm was placed on an electronic device, and the other side was bent until the distance between the films became 10 mm. The maximum load acting on the balance was evaluated as the repulsive force and evaluated according to the following criteria.
〇:10g未満  〇: less than 10g
△ : 10〜30g未満  △: less than 10-30g
え用紙 (規則 26 X: 30g以上、又は資料が折れて測定不可能 Paper (Rule 26 X: 30g or more, or the material is broken and cannot be measured
[0139] (3)耐折性 [0139] (3) Folding resistance
評価サンプルを幅 10mm、長さ 90mmにカ卩ェして作製したフィルム状試験片を 13 5°に折り曲げ、以下の基準で評価した。  A film-like test piece prepared by kneading the evaluation sample to a width of 10 mm and a length of 90 mm was bent at 135 ° and evaluated according to the following criteria.
〇:硬化膜が折れないもの .  〇: The cured film does not break.
△:硬化膜は折れなレ、が、クラックがあるもの  △: The cured film is broken, but has cracks
' X:硬化膜が折れるもの ' '  'X: Cured film breaks''
[0140] (4)吸水率  [0140] (4) Water absorption
. 評価サンプルの質量を測定し、次にこの評価サンプルを PCT装置 (TABAI ESP EC HAST SYSTEM TPC— 412MD)を用いて 121°C、 100%RHの条件で 2 4時間処理し、処理後の硬化物の質量を測定し、下記算式により硬化物の吸水率を 求めた。  Measure the mass of the evaluation sample, and then treat the evaluation sample for 24 hours at 121 ° C and 100% RH using a PCT device (TABAI ESP EC HAST SYSTEM TPC—412MD), and cure after the treatment. The mass of the cured product was measured, and the water absorption of the cured product was determined by the following formula.
吸水率(%) = { ("\^ -w )/(w -w ) } x ioo  Water absorption (%) = {("\ ^ -w) / (w -w)} x ioo
2 1 1  2 1 1
ここで、 Wは評価サンプルの質量、 Wは PCT処理後の評価サンプノレの質量、 W  Where W is the mass of the evaluation sample, W is the mass of the evaluation sample after PCT treatment, W
1 2 g はガラス板の質量である。  12 g is the mass of the glass plate.
[0141] 予備合成例 1  [0141] Preparative synthesis example 1
1リットルのフラスコに 2, 6—ナフタレンジカルボン酸 40g (0. 185モル)、寧化チォ ニル 120ミリリットル(1. 67モル)を仕込み、アルゴン気流下、約 80°Cで 1時間加熱還 流した。その後、ジメチルホルムアミド 1ミリリットルを添加し、さらに 24時間、約 80°Cで 加熱還流を行なった。反応終了後、未反応の塩化チォニルを減圧留去し、黄色結晶 の 2, 6—ナフタレンジカルボン酸クロライド 31. Ogを得た。  A 1-liter flask was charged with 40 g (0.185 mol) of 2,6-naphthalenedicarboxylic acid and 120 ml (1.67 mol) of thionyl ninyl, and heated and refluxed at about 80 ° C for 1 hour under a stream of argon. . Thereafter, 1 ml of dimethylformamide was added, and the mixture was further heated under reflux at about 80 ° C. for 24 hours. After completion of the reaction, unreacted thionyl chloride was distilled off under reduced pressure to obtain 31. Og of 2,6-naphthalenedicarboxylic acid chloride as yellow crystals.
[0142] 予備合成例 2  [0142] Preparative synthesis example 2
. 1リットルのフラスゴに 2, 6—ナフタレンジカルボン酸 80g (0. 37モル)、塩化チォニ ノレ 240ミリリットノレ(3. 3モノレ)、ピリジン 2ミリリットノレを仕込み、ァノレゴン気流下、糸勺 80 °Cで 1時間加熱還流した。その後、ジメチルホルムアミド 1ミリリットルを添加し、さらに 4時間、約 80°Cで加熱還流を行なった。続いて、塩ィ匕チォニル 100ミリリットルをカロえ 、 14. 5時間、約 80°Cで加熱還流した。反応終了後、未反応の塩化チォニルを減圧 留去し、黄色結晶の 2, 6—ナフタレンジカルボン酸クロライド 73. 8gを得た。 [0143] 予備合成 3 80 g (0.37 mol) of 2,6-naphthalenedicarboxylic acid, 240 milliliters of trichlorinated chloride and 3.3 milliliters of pyridine, and 2 milliliters of pyridine were placed in 1 liter of frasgo. Heated to reflux for hours. Thereafter, 1 ml of dimethylformamide was added, and the mixture was heated and refluxed at about 80 ° C. for further 4 hours. Subsequently, 100 ml of Shii-Dai-Thionil was calorie-heated and refluxed at about 80 ° C. for 14.5 hours. After completion of the reaction, unreacted thionyl chloride was distilled off under reduced pressure to obtain 73.8 g of 2,6-naphthalenedicarboxylic acid chloride as yellow crystals. [0143] Preliminary synthesis 3
予備合成例 2で得られた 2,' 6—ナフタレンジカルボン酸クロライド 53. 8gをトルエン に溶解させ、一 30°Cで 12時間冷却し、析出した結晶を濾過して、高純度の 2, 6—ナ フタレンジカルボン酸クロライド 22. 7gを得た。  53.8 g of 2, '6-naphthalenedicarboxylic acid chloride obtained in Preparative Synthesis Example 2 was dissolved in toluene, cooled at 130 ° C for 12 hours, and the precipitated crystals were filtered to obtain high purity 2,6. —22.7 g of naphthalenedicarboxylic acid chloride was obtained.
[0144] 合成例 3 [0144] Synthesis example 3
1リットルのフラスコに 3—ァクリロイ口キシー 2—ヒドロキシプロピルメタタリレート(新 中村化学:!業 (株)製、商品名 NKエステル 701A) 43. 3g (202ミリモル)、テトラヒド 口フラン 400ミリリットノレ、フエノチアジン 4. 3mg、トリェチルァミン 51. lg(505ミリモル )を仕込み、アルゴン気流下、約 0°Cで攪拌した。次いで、予備合成例 1で得た 2, 6 一ナフタレンジカルボン酸クロライド 19g (80ミリモル)をテトラヒドロフラン 200ミリリット ルに溶解させ、 1Q°C以下で、反応系内に滴下した。滴下終了後反応系内の温度を 約 25°Cにし、 2時間反応を行なった。反応終了後、飽和炭酸水素ナトリウム水溶液を 加え、ェチルエーテルで抽出を行なった。分液した有機層を水、次レヽで飽和塩化ナ トリウム水溶液で洗浄後、硫酸マグネシウムで乾燥し、次いで濾過し、濃縮して、茶褐 色オイル ¾7gを得た。得られたオイルのクロマトグラム(高速液体クロマトグラフィーを ' 用いて測定)を図 8に示す。次に、得られたオイルをカラム精製 (SiO : 200g、展開 獰媒: 40%酢酸ェチル /n—へキサン中)し、黄色オイル2. 5gを得た。得られたオイ ルにメタノール 10ミリリットルを加え、一 30°Cで 5時間冷却し、濾過して、 &色結晶 1. 5gを得た。得られたテトラ (メタ)アタリレート化合物の赤外線吸収スペクトル (フーリエ 変換赤外分光光度計 FT—IRを用いて測定)、核磁気 *鳴スペクトル (溶媒 CDC1 、 In a 1-liter flask, 3-acrylic acid xyl-2-hydroxypropyl methacrylate (Shin Nakamura Chemical: KK Co., Ltd., trade name: NK ester 701A) 43.3 g (202 mmol), tetrahydrofuran, 400 milliliter furan, Phenothiazine (4.3 mg) and triethylamine (51.lg, 505 mmol) were charged and stirred at about 0 ° C. under an argon stream. Next, 19 g (80 mmol) of 2,6-mononaphthalenedicarboxylic acid chloride obtained in Preparative Synthesis Example 1 was dissolved in 200 ml of tetrahydrofuran, and added dropwise to the reaction system at 1 Q ° C or lower. After completion of the dropwise addition, the temperature in the reaction system was set to about 25 ° C, and the reaction was performed for 2 hours. After completion of the reaction, a saturated aqueous solution of sodium hydrogen carbonate was added, and the mixture was extracted with ethyl ether. The separated organic layer was washed with water and a saturated aqueous sodium chloride solution in the next step, dried over magnesium sulfate, filtered and concentrated to obtain 7 g of a brown-brown oil. FIG. 8 shows the chromatogram (measured using high performance liquid chromatography) of the obtained oil. The resulting oil was column purified (SiO: 200 g, development獰媒: 4 0% hexane in acetic Echiru / n-to) to give a yellow oil 2 5 g.. 10 ml of methanol was added to the obtained oil, cooled at 130 ° C. for 5 hours, and filtered to obtain 1.5 g of & color crystal. Infrared absorption spectrum (measured using Fourier transform infrared spectrophotometer FT-IR) of the obtained tetra (meth) atalylate compound, nuclear magnetic * sounding spectrum (solvent CDC1,
' ■ 3 基準物質 TMS (テトラメチルシラン))及びクロマトグラム (高速液体クロマトグラフィー • を用いて測定)をそれぞれ図 9、図 10及び図 11に示す。  '■ 3 Reference substance TMS (tetramethylsilane)) and chromatogram (measured using high performance liquid chromatography) are shown in Fig. 9, Fig. 10 and Fig. 11, respectively.
[0145] 合成例 4 [0145] Synthesis example 4
1リットルのフラスコに 3—アタリロイ口キシ一 2—ヒドロキシプロピルメタタリレート 28. 3g (79ミリモノレ)、テトラヒドロフラン 230ミリリットノレ、フエノチアジン 2· 0mg、トリ工チノレ ァミン 24. O (237ミリモル)を仕込み、アルゴン気流下、約 0°Cで攪拌した。次いで、 予備合成例 2で得た 2, 6—ナフタレンジカルボン酸クロライド 20. 0g (79ミリモル)を テトラヒドロフラン 200ミリリットルに溶解させ、 10°C以下で、反応系内に滴下した。滴 下終了後、反応系内の温度を約 25°Cにし、 2時間反応を行なった。反応終了後、飽 和炭酸水素ナトリウム水溶液を加え、ェチルアセテートで抽出を行なった。分液した 有機層を水、次いで飽和塩ィヒナトリウム水溶液で洗浄後、硫酸マグネシウムで乾燥し 、次いで濾過し、濃縮して、茶褐色オイル 37gを得た。得られたオイルのクロマトダラ ム(高速液体クロマトグラフィーを用いて測定)を図 12に示す。得られたオイルをカラ ム精製 (SiO : 320g、展開溶媒: 20%酢酸ェチル Zn—へキサン中)し、無色透明 A 1-liter flask was charged with 28.3 g (79 millimonoles) of 3-attaryloyi-hydroxy-2-methypropyl methacrylate, 230 milliliters of tetrahydrofuran, 2.0 mg of phenothiazine, 2.0 mg of tritinolamine, 24.O (237 mmoles), and argon. The mixture was stirred at about 0 ° C under an air stream. Next, 20.0 g (79 mmol) of 2,6-naphthalenedicarboxylic acid chloride obtained in Preparative Synthesis Example 2 was dissolved in 200 ml of tetrahydrofuran and added dropwise to the reaction system at 10 ° C. or lower. drop After completion of the reaction, the temperature in the reaction system was adjusted to about 25 ° C, and the reaction was performed for 2 hours. After the completion of the reaction, an aqueous solution of saturated sodium bicarbonate was added, and the mixture was extracted with ethyl acetate. The separated organic layer was washed with water and then with a saturated aqueous solution of sodium salt, dried over magnesium sulfate, filtered and concentrated to give 37 g of a brown oil. FIG. 12 shows the chromatogram (measured using high performance liquid chromatography) of the obtained oil. The obtained oil was purified by column (SiO: 320 g, developing solvent: 20% ethyl acetate in Zn-hexane), and colorless and transparent
2  2
液体 14· Ogを得た。得られたオイルにェチルエーテル 20ミリリットルを加え、合成例 3 で得た白色結晶 4mgを種結晶としてカ卩え、― 30°Cで 12時間掛けて再結晶を行なつ た。その結果、白色半固体物質が得られた。そこで、ェチルエーテルを除去し、次い で n—へキサンを加え、攪拌した後、除去しきれなかったェチルエーテルと n—へキ サンとの混合溶媒を除去し、再びェチルエーテル 20ミリリットルを加え、濾過して、融 点約 92°Cの白色結晶 2. 7gを得た。得られたテトラ (メタ)アタリレート化合物の赤外 線吸収スペクトル (フーリエ変換赤外分光光度計 FT— IRを用いて測定)、核磁気共 嗚スペクトル (溶媒 CDC1、基準物質 TMS (テトラメチルシラン))及びクロマトグラム( A liquid of 14 Og was obtained. 20 ml of ethyl ether was added to the obtained oil, and 4 mg of the white crystal obtained in Synthesis Example 3 was seeded as a seed crystal, and recrystallized at −30 ° C. for 12 hours. As a result, a white semi-solid substance was obtained. Therefore, the ethyl ether was removed, and then n-hexane was added. After stirring, the mixed solvent of ethyl ether and n-hexane that could not be removed was removed, and 20 ml of ethyl ether was added again, followed by filtration. As a result, 2.7 g of a white crystal having a melting point of about 92 ° C was obtained. Infrared absorption spectrum (measured using Fourier transform infrared spectrophotometer FT-IR), nuclear magnetic resonance spectrum (solvent CDC1, reference material TMS (tetramethylsilane)) of the obtained tetra (meth) atalylate compound ) And chromatogram (
3  Three
高速液体クロマトグラフィーを用いて測定)をそれぞれ図 13、図 14及ぴ図 15に示す 。 ¾— NMRの同定結果を表 3に示す。 FIG. 13, FIG. 14 and FIG. 15 show the measurement results using high performance liquid chromatography, respectively. Table 3 shows the results of ¾-NMR identification.
[表 3] 反 応 生 成 物 [Table 3] Reaction products
Figure imgf000040_0001
Figure imgf000040_0001
Figure imgf000040_0002
Figure imgf000040_0002
差替え用紙 (規則 26)' [0146] また、上記濾過液を濃縮し、無色透明液体 11. 3gを得た。得られた液体の赤外線 吸収スペクトル (フーリエ変換赤外分光光度計 FT— IRを用いて測定)、核磁気共鳴 スペクトル (溶媒 CDC1、基準物質 TMS (テトヲメチルシラン))及びクロマトグラム(高 Replacement Form (Rule 26) ' [0146] The filtrate was concentrated to obtain 11.3 g of a colorless and transparent liquid. Infrared absorption spectrum (measured using Fourier transform infrared spectrophotometer FT-IR), nuclear magnetic resonance spectrum (solvent CDC1, reference material TMS (tetramethylsilane)) and chromatogram (high
3  Three
速液体クロマトグラフィーを用いて測定)をそれぞれ図 16、図 17及ぴ図 18に示す。  (Measured using high performance liquid chromatography) are shown in Fig. 16, Fig. 17 and Fig. 18, respectively.
[0147] 合成例 5 [0147] Synthesis example 5
1リットルのフラスコに 3—ァクリロイロキシ一2—ヒドロキシプロピルメタクリレート 38. 4g (179ミリモル)、テ卜ラヒドロフラン 230ミリリツ卜ノレ、フエノチアジン 2. 5mg、トリェチ ルァミン 27. 2g (269ミリモル)を仕込み、アルゴン気流下、約 0°Cで攪拌した。次い で、予備合成例 3で得た 2, 6 _ナフタレンジカルボ,ン酸クロライド 22· 7g (90ミリモル )をテトラヒドロフラン 360ミリリットルに溶解させ、 10°C以下 、反応系内に滴下した。 滴下終了後反応系内の温度を約 25°Cにし、 2時間反応を行なった。反応終了後、飽 和炭酸水素ナトリウム水溶液を加え、ェチルアセテートで抽出を行なった。分液した 有機層を水、次いで飽和塩ィ匕ナトリウム水溶液で洗浄後、硫酸マグネシウムで乾燥し 、次いで濾過し、濃縮して、茶褐色オイル 60. lgを得た。得られたオイルのクロマトグ ラム (高速液体クロマトグラフィーを用いて測定)を図 19に示す。次に、得られたオイ ルをカラム精製 (SiO : 500g、展開溶媒: 20%酢酸'ェチル Zn—へキサン中)し、無  In a 1 liter flask, 38.4 g (179 mmol) of 3-acryloyloxy-2-hydroxypropyl methacrylate, 230 ml of tetrahydrofuran, 2.5 mg of phenothiazine, 2.5 mg of triethylamine, and 27.2 g (269 mmol) of triethylamine were added, and the mixture was placed under an argon stream. And stirred at about 0 ° C. Next, 22.7 g (90 mmol) of 2,6-naphthalenedicarboic acid chloride obtained in Preparative Synthesis Example 3 was dissolved in 360 ml of tetrahydrofuran and added dropwise to the reaction system at 10 ° C. or lower. After completion of the dropwise addition, the temperature in the reaction system was adjusted to about 25 ° C, and the reaction was performed for 2 hours. After the completion of the reaction, an aqueous solution of saturated sodium bicarbonate was added, and the mixture was extracted with ethyl acetate. The separated organic layer was washed with water and then with a saturated sodium chloride aqueous solution, dried over magnesium sulfate, then filtered and concentrated to obtain 60.lg of a brown oil. Fig. 19 shows the chromatogram (measured using high performance liquid chromatography) of the obtained oil. Next, the obtained oil was subjected to column purification (SiO: 500 g, developing solvent: 20% ethyl acetate in Zn-hexane), and
2  2
色透明オイル 25. 2gを得た。得られたオイルにェチルエーテル 70ミリリットルを加え 、攪拌、次いで濾過して、白色結晶 6. 6gを得た。得られたテトラ (メタ)アタリレート化 ' 合物の赤外線吸収スペクトル (フーリエ変換赤外分光光度計 FT— IRを用いて測定) 、核磁気共鳴スペクトル (溶媒 CDC1、基準物質 TMS (テトラメチルシラン))及びクロ  25.2 g of a color-transparent oil was obtained. 70 ml of ethyl ether was added to the obtained oil, stirred, and then filtered to obtain 6.6 g of white crystals. Infrared absorption spectrum (measured using Fourier transform infrared spectrophotometer FT-IR), nuclear magnetic resonance spectrum (solvent CDC1, reference material TMS (tetramethylsilane)) of the obtained tetra (meth) aphthalate compound ) And black
3, .  3,.
マトグラム(高速液体クロマトグラフィーを用いて測定)をそれぞれ図 20、図 21及び図 22に示す。 .  The matograms (measured using high performance liquid chromatography) are shown in FIGS. 20, 21 and 22, respectively. .
[0148] 試験例 2 ' ' ' [0148] Test example 2 '' '
合成例 1〜3で得た白色結晶のテトラ (メタ)アタリレート化合物をそ ぞれ 100°Cで 溶融させ、バーコ一ターを用いて 50 / mの厚さになる うに、ポリイミドフィルムに塗 布し、 180°Cで 30分間、次いで、 200°Cで 10分間加熱した。得られた硬化フィルム を PCT装置 (TABAI ESPEC HAST SYSTEM TPC— 412MD)を用いて 1 21°C、 100°/。RHの条件で 24時間処理し、その後、ポリイミドフィルム力 硬化膜を 剥がし、評価サンプルを得た。これらの評価サンプルの耐熱性は前記試験例 1で用 レヽた方法(1)で測定し、柔軟性及ぴ耐折性は後述する方法で測定し、評価した。ま た、予め質量を測定したガラス板上に、 PCT装置による処理を実施しなレヽこと以外は 上記と同様にして硬化膜を作成し、評価サンプルを得た。この硬化膜の吸水率を前 記試験例 1で用いた方法 (4)で測定し、評価した。上記測定結果を下記表 4に示す。 Each of the white crystalline tetra (meth) acrylate compounds obtained in Synthesis Examples 1 to 3 was melted at 100 ° C and coated on a polyimide film using a bar coater to a thickness of 50 / m. Then, the mixture was heated at 180 ° C for 30 minutes, and then at 200 ° C for 10 minutes. The obtained cured film was heated at 121 ° C and 100 ° / C using a PCT device (TABAI ESPEC HAST SYSTEM TPC-412MD). Treated at RH for 24 hours, and then cured polyimide film Peeling off gave an evaluation sample. The heat resistance of these evaluation samples was measured by the method (1) used in Test Example 1, and the flexibility and folding resistance were measured and evaluated by the methods described later. In addition, a cured film was formed on a glass plate whose mass had been measured in advance in the same manner as described above except that the treatment with the PCT apparatus was not performed, and an evaluation sample was obtained. The water absorption of this cured film was measured and evaluated by the method (4) used in Test Example 1 described above. The measurement results are shown in Table 4 below.
[0149] [表 4]  [0149] [Table 4]
Figure imgf000042_0001
上記表 4中の性能試験の柔軟性及び耐折性の評価方法は以下の通りである。
Figure imgf000042_0001
The evaluation methods for flexibility and folding resistance in the performance test in Table 4 above are as follows.
[0150] (2' )柔軟性  [0150] (2 ') Flexibility
評価サンプルを幅 5mm、長さ 40mmにカ卩ェして作製したフィルム状試験片のー側 辺部を電子枰上に載せ、他側辺部を折り曲げる方法で、フィルム間が 10mmになる までに電子秤に力かる最大荷重を反発力として、以下の基準で評価した。  A film-shaped test piece prepared by kneading the evaluation sample to a width of 5 mm and a length of 40 mm is placed on the electronic device and the other side is bent until the distance between the films becomes 10 mm. The maximum load applied to the electronic balance was evaluated as a repulsive force and evaluated according to the following criteria.
〇:10g未満  〇: less than 10g
△ : 10〜30g未満  △: less than 10-30g
X : 30g以上、又は試験片が折れて測定不可能  X: 30g or more, or the test piece is broken and cannot be measured
[0151] (3,)耐折性 [0151] (3) Folding resistance
評価サンプルを幅 5mm、長さ 40mmに加工して作製したフィルム状試験片を 135° に折り曲げ、以下の基準で評価した。  A film-like test piece prepared by processing an evaluation sample to a width of 5 mm and a length of 40 mm was bent at 135 ° and evaluated according to the following criteria.
〇:硬化膜が折れなレ、もの  〇: The cured film is broken
△:硬化膜は折れないが、クラックがあるもの  Δ: The cured film does not break, but has cracks
X:硬化膜が折れるもの  X: The cured film breaks
[0152] 合成例 6 . [0152] Synthesis example 6.
50ミリリットルのフラスコに 3—ァクリロイ口キシ一 2—ヒドロキシプロピルメタクリレート (新中村ィヒ学工業 (株)製、商品名 NKエステル 701 A) 2. 0g (9. 33ミリモル)、 N, N  In a 50 ml flask, 3-acryloylic xy-2-hydroxypropyl methacrylate (manufactured by Shin-Nakamura Ichigaku Kogyo Co., Ltd., trade name: NK ester 701 A) 2.0 g (9.33 mmol), N, N
' —ジメチルホルムアミド 20ミリリットル、 4一ターシャリーブチルカテコール lmg、 1ーヒ ドロキシ一 1一 H—ベンゾトリアゾール水和物 1. 71g (ll. 2ミリモル)、トリェチルアミ ン 2. 4g (23. 34ミリモル)、 1一ェチル—3— (3—ジメチルァミノプロピル)カルポジィ ミド塩酸塩 2. 2g(ll. 2ミリギノレ)、コノヽク酸 826mg (7ミリモノレ)をカロえ、ァ /レゴン気流 下、攪拌しながら、'室温で 14時間反応させた。得られた反応溶液に酢酸ェチルと水 を加えて抽出を行なレヽ、分液した有機層を飽和食塩水で洗浄し、次いで硫酸マグネ シゥムで乾燥後、ろ過して濃縮し、 2. 3gの黄色液体を得た。このものをシリカゲル 50 gを用いてカラム精製を行なレ、、酸価 lmgKOHZg以下のテトラ (メタ)アタリレート化 合物と 3—アタリロイ口キシ一 2—ヒドロキシプロヒ。ルメタタリレートとの液状混合物 1. 5 gが得られた。 ' — 20 ml of dimethylformamide, lmg of 4-tert-butylcatechol, 1.71 g (ll. 2 mmol) of 1-hydroxy-11H-benzotriazole hydrate, 2.4 g (23.34 mmol) of triethylamine 1 Ethyl-3- (3-dimethylaminopropyl) carbodiimide hydrochloride 2.2 g (ll. 2 milliginole), 826 mg (7 millimonole) of conodic acid calorie The reaction was carried out at room temperature for 14 hours. Ethyl acetate and water were added to the obtained reaction solution to carry out extraction, and the separated organic layer was washed with saturated saline, then dried over magnesium sulfate, filtered and concentrated. A yellow liquid was obtained. This was purified with a column using 50 g of silica gel, and a tetra (meth) atalylate compound having an acid value of lmgKOHZg or less and 3-attaryloyi xy-12-hydroxyprohi were used. 1.5 g of a liquid mixture with lumetatalylate were obtained.
[0153] 得られたテトラ (メタ)アタリレート化合物と 3—ァクリロイ口キシ一 2—ヒドロキシプロピ ルメタタリレートとの混合物の核磁気共鳴スペクトル (溶媒 CDC1、基準物質 TMS (テ トラメチル、 ン))、クロマトグラム (高速液体クロマトグラフィーを用いて測定)及び赤 外線吸収スペクトル (フーリエ変換赤外分光光度計 FT— IRを用いて測定)をそれぞ れ図 23、図 24及び図 25に示す。また、ェ!!一 NMRの同定結果を表 5に示す。  [0153] The nuclear magnetic resonance spectrum (solvent CDC1, reference material TMS (tetramethyl, meth)) of the mixture of the obtained tetra (meth) atalylate compound and 3-acryloyl xy-l-hydroxypropyl metharylate, The chromatogram (measured using high performance liquid chromatography) and the infrared absorption spectrum (measured using Fourier transform infrared spectrophotometer FT-IR) are shown in FIGS. 23, 24 and 25, respectively. In addition! Table 5 shows the results of the NMR identification.
[0154] [表 5] [0154] [Table 5]
Figure imgf000043_0001
Figure imgf000043_0001
[0155] なお、参考のために、 3—ァクリロイロキシ一2—ヒドロキシプロピルメタクリレート単 [0155] For reference, only 3-acryloyloxy-1-hydroxypropyl methacrylate was used.
差-替え用紙. (親 26 : 独の核磁気共鳴スペクトル (溶媒 CDC13、基準物質 TMS (テトラメチルシラン))及び クロマトグラム(高速液体クロマトグラフィーを用いて測定)をそれぞれ図 26及び図 27 に、さらに下記式(3)で示される構造のモノカルボン酸の核磁気共鳴スペクトル (溶 媒 CDC1、基準物質 TMS (テトラメチルシラン))を図 28に示す。 Replacement paper. (Parent 26 : German nuclear magnetic resonance spectrum (solvent CDC1 3, the reference substance TMS (tetramethylsilane)) and chromatogram (measured by high performance liquid chromatography) in FIGS. 26 and 27, further represented by the following formula (3) Figure 28 shows the nuclear magnetic resonance spectrum (solvent CDC1, reference material TMS (tetramethylsilane)) of the monocarboxylic acid having the structure shown.
3  Three
[0156] [化 4]  [0156] [Formula 4]
HO- C一 X
Figure imgf000044_0001
( 3 )
HO-C-I X
Figure imgf000044_0001
(3)
\  \
CH2 -O-C -C =CH2 CH 2 -OC -C = CH 2
0 R2 0 R 2
(伹し、 R\ R2は水素原子又はメチル基を表わす。) (Where R \ R 2 represents a hydrogen atom or a methyl group.)
[0157] 図 23と図 26とを比較すると、上記テトラ (メタ)アタリレート化合物と 3—ァクリロイロキ シ一 2—ヒドロキシプロピノレメタクリレートとの混合物では、 3—ァクリロイ口キシ一 2—ヒ ドロキシプロピルメタタリレートにはな!/、コハク酸のシングルピークが 2. 6ppm付近に 出現している。また、図 23と図 28とを比較すると、上記モノカルボン酸では、上記テト ラ(メタ)ァクリレートイ匕合物と 3—ァクリロイ口キシ一 2—ヒドロキシプロピルメタクリレート との混合物にはなレ、カルボン酸のシングルピークが 10. 3ppm付近に出現してレ、る。 さらに、図 24と図 27とを比較すると、上記テトラ (メタ)ァクリレートイ匕合物と 3—アタリ口 イロキシ一 2—ヒドロキシプロピルメタタリレートとの混合物では、 3—アタリロイ口キシー 2—ヒドロキシプロピルメタクリレートにはないピークが 6分付近に出現している。以上 のデータから、図 24の 6分付近に出現しているピークは、上記テトラ (メタ)アタリレート 化合物によるものである。  [0157] Comparing FIG. 23 with FIG. 26, the mixture of the above tetra (meth) atalylate compound and 3-acryloyloxy-2-hydroxypropinole methacrylate shows that the mixture of 3-acryloyloxy-2-hydroxypropyl There is no single peak of meta! In succinic acid at around 2.6 ppm. Also, comparing FIG. 23 with FIG. 28, the above-mentioned monocarboxylic acid cannot be used as a mixture of the above tetra (meth) acrylate conjugate and 3-acryloyl oxy-1-hydroxypropyl methacrylate. A single peak appears around 10.3 ppm. Further, comparing FIG. 24 with FIG. 27, the mixture of the above-mentioned tetra (meth) acrylate conjugate and 3-attali-oxyl-2-hydroxypropyl metharylate shows that 3-atolyloy-xy-xy-2-hydroxypropyl methacrylate A peak not found appears at around 6 minutes. From the above data, the peak appearing at around 6 minutes in FIG. 24 is due to the above-mentioned tetra (meth) atalylate compound.
[0158] 合成例 7  [0158] Synthesis example 7
50mlのフラスコに 3—アタリロイ口キシ一 2—ヒドロキシプロピルメタクリレート(新中 村化学工業 (株)'製、商品名 NKエステル 701A) 1. 71g (8ミリモル)、テトラヒドロフラ ン 20ml、 4—メ卜キシフエノーノレ 0. 8mg、卜リエチノレアミン 2. 02g (20ミリモノレ)を仕込 . み、アルゴン気流下、 0°Cで攪拌しながら、アジピン酸クロライド 1. 02g(5. 6ミリモル)  In a 50 ml flask, 1.71 g (8 mmol) of 3-Attalylox xy-2-hydroxypropyl methacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., trade name), 20 ml of tetrahydrofuran, 4-ml methoxyphenol 0.8 mg and 2.02 g (20 mmole) of triethynoleamine are charged. While stirring at 0 ° C. under an argon stream, 1.02 g (5.6 mmol) of adipic acid chloride is added.
差替え用紙 (規則 26.) を滴下し、滴下終了後、室温で約 14時間反応させた。反応終了後、反応溶液を濾 過し、飽和炭酸水素ナトリウム水溶液及びジェチルエーテルを加えて抽出を行なつ た。次いで、分液した有機層を硫酸ナトリウムで乾燥後、ろ過し、濃縮した後、カラム 精製 (シリカゲル 40g、展開溶媒: 20%酢酸ェチル Zn—へキサン)を行なレ、、無色 透明のオイル状のテトラ (メタ)ァクリレート化合物と 3—ァクリロイ口キシー 2—ヒドロキ シプロピルメタクリレートとの液状混合物を得た。得られた混合物の核磁気共鳴スぺク トル (溶媒 CDC1、基準物質 TMS (テトラメチルシラン))を図 29に示す。また、 αΗ-Replacement form (Rule 26.) Was added dropwise, and after completion of the addition, the mixture was reacted at room temperature for about 14 hours. After the completion of the reaction, the reaction solution was filtered, and a saturated aqueous solution of sodium hydrogen carbonate and getyl ether were added to perform extraction. Next, the separated organic layer was dried over sodium sulfate, filtered, concentrated, and then subjected to column purification (silica gel 40 g, developing solvent: 20% ethyl acetate Zn-hexane) to give a colorless, transparent oil. A liquid mixture of the tetra (meth) acrylate compound of Example 1 and 3-acryloyl oxy-2-hydroxypropyl methacrylate was obtained. FIG. 29 shows the nuclear magnetic resonance spectrum (solvent CDC1, reference material TMS (tetramethylsilane)) of the obtained mixture. Also, α Η-
3 Three
NMRの同定結果を表 6に示す。  Table 6 shows the results of NMR identification.
[0159] [表 6] [0159] [Table 6]
Figure imgf000045_0001
Figure imgf000045_0002
Figure imgf000045_0001
Figure imgf000045_0002
[0160] 合成例 8 [0160] Synthesis Example 8
50mlのフラスコに 3—アタリロイ口キシ一 2—ヒドロキシプロピルメタクリレート(新中 村化学工業 (株)製、商品名 NKエステル 701 A) l. 71g (8ミリモル)、テトラヒドロフラ ン 20ml、 4ーメトキシフエノーノレ 0. 8mg、トリエチノレアミン 2. 02g (20ミリモノレ)を仕込 み、アルゴン気流下、 0°Cで攪拌しながら、アジピン酸クロライド 1. 02g (5. 6ミリモル) を滴下し、滴下終了後、室温で約 13時間反応させた。反応終了後、反応溶液を濾 過し、ショートカラム (シリカゲル 25g、展開溶媒:テトラヒドロフラン)処理を施し、濃縮  In a 50 ml flask, 3-attaryloy xy-2-hydroxypropyl methacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., trade name: NK ester 701 A) l. 71 g (8 mmol), tetrahydrofuran 20 ml, 4-methoxyphenol 0.8 g of Nore and 2.02 g (20 mm monotriamine) of triethynoleamine were charged, and 1.02 g (5.6 mmol) of adipic chloride was added dropwise while stirring at 0 ° C under an argon stream, and the addition was completed. Thereafter, the reaction was carried out at room temperature for about 13 hours. After completion of the reaction, the reaction solution was filtered, treated with a short column (silica gel 25 g, developing solvent: tetrahydrofuran), and concentrated.
差砮え用紙 (規則 26) して、テトラ (メタ)ァクリレートイ匕合物と 3—ァクリロイ口キシー 2—ヒドロキシプロピルメ タクリレートの混合物を約 64%含む、液状混合物 2. 5gが得られた。得られたテトラ( メタ)アタリレート化合物と 3—ァクリロイロキシー2—ヒドロキシプロピルメタクリレートと の混合物の核磁気共鳴スペクトル (溶媒 CDC1、基準物質 TMS (テトラメチルシランRefill paper (Rule 26) As a result, 2.5 g of a liquid mixture containing about 64% of a mixture of tetra (meth) acrylate conjugate and 3-acryloyl xy-2-hydroxypropyl methacrylate was obtained. A nuclear magnetic resonance spectrum (solvent CDC1, reference material TMS (tetramethylsilane) of the mixture of the obtained tetra (meth) acrylate compound and 3-acryloyloxy-2-hydroxypropyl methacrylate was used.
' . 3 '. 3
) )、ゲル浸透クロマトグラフィーによるクロマトグラム及ぴ赤外線吸収スペクトル,をそれ ぞれ図 30、図 31及ぴ図 32に示す。なお、参考のために、 3—アタリロイ口キシー 2— ヒドロキシプロピルメタクリレート単独のゲル浸透クロマトグラフィーによるクロマトグラム を図 33に示す。  )) And the chromatogram and the infrared absorption spectrum by gel permeation chromatography are shown in FIGS. 30, 31 and 32, respectively. For reference, FIG. 33 shows a chromatogram by gel permeation chromatography of 3-attaryloy xy-2-hydroxypropyl methacrylate alone.
[0161] 試験例 3 [0161] Test example 3
上記合成例 6及ぴ合成例 8のテトラ (メタ)アタリレート化合物と 3—アタリロイロキシ一 2—ヒドロキシプロピルメタタリレートとの液状の混合物を、バーコ一ターを用いて 50 πιの厚さになるように、ポリエチレンテレフタレートフィルムに塗布し、 180°Cで 30分 .間加熱し、ポリエチレンテレフタレートプイルム力も硬化塗膜を剥がし、その後、 PCT 装置(TABAI ESPEC HAST SYSTEM TPC—412MD)を用いて 121°C、 100%RHの条件で 24時間処理し、評価サンプルを得た。これらの評価サンプルめ 耐熱性は前記試験例 1で用いた方法(1)で測定し、耐折性は前記試験例 2で用いた' 方法(3' )で測定し、また、柔軟性は後述する方法で測定し、高湿下での熱的劣化等 の度合レ、を評価した。また、予め質量を測定したガラス板上に、 PCT装置による処理 を実施しなレ、こと以外は上記と同様にして硬化膜を作成し、評価サンプルを得た。こ の硬化膜の吸水率を前記試験例 1で用いた方法 (4)で測定し、評価した。上記測定 結果を下記表 7に示す。 .  The liquid mixture of the tetra (meth) atalylate compound of Synthesis Example 6 and Synthesis Example 8 and 3-attaryloyloxy-12-hydroxypropyl metharylate was adjusted to a thickness of 50 πι using a bar coater. The film was applied to a polyethylene terephthalate film and heated at 180 ° C for 30 minutes to remove the cured film from the polyethylene terephthalate film, and then the PCT device (TABAI ESPEC HAST SYSTEM TPC-412MD) was used. The sample was treated under the conditions of ° C and 100% RH for 24 hours to obtain an evaluation sample. The heat resistance of these evaluation samples was measured by the method (1) used in Test Example 1 and the bending resistance was measured by the method (3) used in Test Example 2 and the flexibility was described later. The degree of thermal degradation under high humidity was evaluated. In addition, a cured film was prepared on a glass plate whose mass had been measured in advance in the same manner as described above, except that the treatment with a PCT apparatus was not performed, and an evaluation sample was obtained. The water absorption of this cured film was measured and evaluated by the method (4) used in Test Example 1 above. The results of the above measurements are shown in Table 7 below. .
[0162] [表 7] 特 性 合成例 6 合成例 8 [0162] [Table 7] Characteristics Synthesis example 6 Synthesis example 8
0)耐熱温度 (°c) 310. 8 347. 9  0) Heat resistant temperature (° c) 310.8 347.9
(2")柔軟性 O O  (2 ") flexibility O O
(3')耐折性 O O  (3 ') Folding resistance O O
(4)吸水率(%) 0. 8 0. 8  (4) Water absorption (%) 0.8 0.8
上記表 5中の性能試験の柔軟性の評価方法は以下の通りである。 The method of evaluating the flexibility of the performance test in Table 5 above is as follows.
[0163] (2")柔軟性 [0163] (2 ") flexibility
評価サンプルを幅 5mm、長さ 40mmに加工して作製したフィルム状試験片のー側 辺部を電子秤上に载せ、他側辺部を折り曲げる方法で、フィルム間が 10mmになる までに電子秤に力かる最大荷重を反発力として、以下の基準で評価した。  Place one side of the film-shaped test piece prepared by processing the evaluation sample to 5 mm width and 40 mm length on an electronic balance, and bend the other side. The maximum load applied to the balance was evaluated as the repulsive force and evaluated according to the following criteria.
〇:20g未満  〇: less than 20g
△ : 20〜40g未満  △: less than 20-40g
X : 20g以上、又は試験片が折れて測定不可能  X: 20g or more, or the test piece is broken and cannot be measured
[0164] 実施例 1〜5及び比較例 1、 2 [0164] Examples 1 to 5 and Comparative Examples 1 and 2
表 8に示す配合組成 (数値は質量部である)に従って各成分を配合した。実施例 1 〜3についてはそれぞれ 90°Cで攪拌し、実施例 4については室温で攪拌し、また実 施例 5については 100°Cで攪拌し、硬化性組成物を調製した。比較例 1及ぴ 2につ いては、 3本ロールミルでそれぞれ別々に混練し、硬化性組成物を調製した。これら をバーコ一ターを用いて 50 μ πιの厚さになるように、ポリイミドフィルムに塗布し、実 . 施例 1〜3及び比較例 1、 2については、露光量 300mjZcm2の条件で露光し、実施 例 4については室温で 6時間放置後、 60分間かけて徐々に 115°Cまで温度を上げ、 115°Cで 60分間力!]熱し、実施例 5については 180°Cで 30分間、次い 200°Cで 10 分間加熱した。次いで、 PCT装置(TABAI ESPEC HAST SYSTEM TPC — 412MD)を用いて 121°C、 100%RHの条件で 24時間処理し、その後、各ポリイミ ドフィルム力 硬化膜を剥がし、評価サンプルを得た。 Each component was blended according to the blending composition shown in Table 8 (the numerical values are parts by mass). Examples 1 to 3 were each stirred at 90 ° C, Example 4 was stirred at room temperature, and Example 5 was stirred at 100 ° C to prepare a curable composition. For Comparative Examples 1 and 2, each was separately kneaded with a three-roll mill to prepare a curable composition. These were applied to a polyimide film using a bar coater to a thickness of 50 μπι. In Examples 1 to 3 and Comparative Examples 1 and 2, exposure was performed under the conditions of an exposure amount of 300 mjZcm 2. For Example 4, after leaving at room temperature for 6 hours, gradually raise the temperature to 115 ° C over 60 minutes, and apply force at 115 ° C for 60 minutes! ] Heated and heated at 180 ° C for 30 minutes for Example 5 followed by 200 ° C for 10 minutes. Next, treatment was performed using a PCT apparatus (TABAI ESPEC HAST SYSTEM TPC—412MD) at 121 ° C. and 100% RH for 24 hours. Thereafter, each polyimide film cured film was peeled off to obtain an evaluation sample.
差替え用紙(規則 26) [0165] [表 8] Replacement form (Rule 26) [0165] [Table 8]
Figure imgf000048_0001
Figure imgf000048_0001
[0166] 実施例 6及び 7  [0166] Examples 6 and 7
実施例 6については、実施例 1で得られた組成物を 100°Cで溶融させ、ガラスクロス に含浸させた後、露光量 SOOnj/cm2の条件で露光し、また、実施例 7については、 合成例 2で得られたテトラ (メタ)アタリレート化合物を 100°Cで溶融させ、ガラスクロス に含浸させた後、 140°Cで 30分間の条件で加熱し、次いで、 PCT装置 (TABAI E SPEC HAST SYSTEM TPC— 412MD)を用いて 121°C 100%RHの条件 で 24時間処理し、評価サンプルを得た。 For Example 6, the composition obtained in Example 1 was melted at 100 ° C., impregnated into a glass cloth, and then exposed under the condition of an exposure amount of SOOnj / cm 2. After melting the tetra (meth) atalylate compound obtained in Synthesis Example 2 at 100 ° C and impregnating the glass cloth, the mixture was heated at 140 ° C for 30 minutes, and then a PCT device (TABAI E SPEC HAST SYSTEM TPC-412MD) was used for 24 hours at 121 ° C and 100% RH to obtain an evaluation sample.
[0167] 前記各実施例及び各比較例で得られた評価サンプルの耐熱性は前記試験例 1で 用レ、た方法(1)で測定し、また、実施例 1〜4、 6、 7及び比較例 1、 2で得られた評価 サンプルの柔軟性及び耐折性は前記試験例 1で用いた方法(2)、 (3)で測定し、実 施例 5で得られた評価サンプルの柔軟性及ぴ耐折性は前記試験例 2で用いた方法(  [0167] The heat resistance of the evaluation samples obtained in each of the Examples and Comparative Examples was measured by the method (1) described in Test Example 1, and the heat resistance of Examples 1 to 4, 6, 7, and The flexibility and folding endurance of the evaluation samples obtained in Comparative Examples 1 and 2 were measured by the methods (2) and (3) used in Test Example 1, and the flexibility of the evaluation sample obtained in Example 5 was measured. Properties and bending resistance were determined by the method used in Test Example 2 above (
差替え用羝 (親則 26) 2' )、 (3')で測定し、高湿下での熱的劣化等の度合いを評価した。また、予め質量 を測定したガラス板上に、 PCT装置による処理を実施しな ヽこと以外は上記各実施 例及び各比較例における方法と同様にして硬化膜を作成し、評価サンプルを得た。 この硬化膜の吸水率を前記試験例 1で用いだ方法 (4)で測定し、評価した。上記各 試験の結果を表 9に示す。 Replacement chapel (Chief rule 26) Measurements were made in 2 ') and (3') to evaluate the degree of thermal degradation and the like under high humidity. Also, a cured film was prepared in the same manner as in each of the above Examples and Comparative Examples, except that a treatment using a PCT apparatus was not performed on a glass plate whose mass had been measured in advance, and an evaluation sample was obtained. The water absorption of the cured film was measured and evaluated by the method (4) used in Test Example 1 above. Table 9 shows the results of the above tests.
[0168] [表 9]  [0168] [Table 9]
Figure imgf000049_0001
Figure imgf000049_0001
[0169] 実施例 8、 9、 11、 12及び比較例 3、 4 Examples 8, 9, 11, 12 and Comparative Examples 3, 4
表 10に示す配合組成 (数値は質量部である)に従って各成分を配合した。実施例 8、 11、 12及び比較例 3、 4については、それぞれ配合成分を攪拌し、硬化性組成物 を調製した。実施例 9については、 90°Cで攪拌し、硬ィ匕性組成物を調製した。これら をバーコ一ターを用いて 50 /i mの厚さになるように、ポリエチレンテレフタレートフィ ルムに塗布し、実施例 8及び比較例 3、 4については、露光量 300mJ/cm2の条件で 露光し、実施例 9及ぴ 12については、 150°Cで 60分間加熱し、実施例 11について は、室温で 6時間放置後、 60分間かけて 80°Cまで温度を上げ、 80°Cで 30分間、次 レヽで 100°Cで 30分間、次レヽで 150°Cで 30分間カロ熱した。次いで、 PCT装置(TAB AI ESPEC HAST SYSTEM TPC— 412MD)を用いて 121°C、 100%RH の条件で 24時間処理し、その後、各ポリエチレンテレフタレートフィルム力 硬ィヒ膜を 剥がし、評価サンプルを得た。 Each component was blended according to the blending composition shown in Table 10 (the numerical values are parts by mass). In Examples 8, 11, and 12, and Comparative Examples 3 and 4, the respective components were stirred to prepare curable compositions. In Example 9, the mixture was stirred at 90 ° C. to prepare a dangling composition. These so as to have a thickness of 50 / im with barcode one coater, was coated on a polyethylene terephthalate Fi Lum, for Example 8 and Comparative Example 3, 4, and exposed under the conditions of exposure amount 300 mJ / cm 2 In Examples 9 and 12, heating was performed at 150 ° C for 60 minutes, and in Example 11, after standing at room temperature for 6 hours, the temperature was raised to 80 ° C over 60 minutes, and the temperature was increased to 80 ° C for 30 minutes. Then, the calories were heated at 100 ° C for 30 minutes in the next stage, and at 150 ° C for 30 minutes in the next stage. Next, treatment was performed for 24 hours at 121 ° C and 100% RH using a PCT device (TAB AI ESPEC HAST SYSTEM TPC-412MD), and then the polyethylene terephthalate film was peeled off to obtain an evaluation sample. Was.
[0170] 実施例 10  Example 10
実施例 10については、実施例 8の組成物と同様な組成物をガラスクロスに含浸させ た後、露光量 300mL cm2の条件で露光し、次いで、 PCT装置 (TABAI ESPECIn Example 10, a glass cloth was impregnated with a composition similar to the composition of Example 8 and then exposed under the conditions of an exposure amount of 300 mL cm 2 , and then a PCT apparatus (TABAI ESPEC
HAST SYSTEM TPC— 412MD)を用いて 121°C、 100%RHの条件で 24時 間処理し、評価サンプルを得た。 Using HAST SYSTEM TPC-412MD), the sample was treated at 121 ° C and 100% RH for 24 hours to obtain an evaluation sample.
差替え用紙 '(規則 26 [0171] [表 10] Replacement Form '' (Rule 26 [0171] [Table 10]
Figure imgf000050_0001
Figure imgf000050_0001
[0172] 前記各実施例及び各比較例で得られた評価サンプルの耐熱性は前記試験例 1で 用レヽた方法 (1)で、また柔軟性及び耐折性は前記試験例 2で用 Vヽた方法 (2 ' )及び( 3 ' )でそれぞれ測定し、高湿下での熱的劣化等の度合!/、を評価した。 [0172] The heat resistance of the evaluation samples obtained in each of the above Examples and Comparative Examples was determined by the method (1) described in Test Example 1, and the flexibility and the fold resistance were determined by the methods described in Test Example 2. The measurement was performed by the methods (2 ′) and (3 ′), respectively, to evaluate the degree of thermal degradation under high humidity! /.
また、予め質量を測定したガラス板上に、 PCT装置による処理を実施しないこと以 外は上記各実施例及び各比較例における方法と同様にして硬ィ匕膜を作成し、評価 サンプルを得た。この硬化膜の吸水率を前記試験例 1で用いた方法 (4)で測定し、 評価した。上記各試験の結果を表 11に示す。  Also, on a glass plate whose mass was measured in advance, a hardened film was prepared in the same manner as in the above Examples and Comparative Examples except that the treatment with a PCT apparatus was not performed, and an evaluation sample was obtained. . The water absorption of this cured film was measured and evaluated by the method (4) used in Test Example 1 above. Table 11 shows the results of the above tests.
[0173] [表 11] [0173] [Table 11]
え用紙 (規則 2 実 拖 例 No. 比較例 No. 特 性 8 9 1 0 1 1 1 2 3 4Paper (Rule 2 Example No. Comparative example No. Characteristics 8 9 1 0 1 1 1 2 3 4
( 1 ) 耐熱温度(°c ) 3 1 9 343 3 1 1 3 5 1 349 3 48 2 6 1(1) Heat resistant temperature (° c) 3 1 9 343 3 1 1 3 5 1 349 3 48 2 6 1
(2 ' ) 柔軟性 0 〇 O O O X 〇 (2 ') Flexibility 0 〇 O O O X 〇
(3 ' ) 耐折性 O O O O o X O  (3 ') Folding resistance O O O O o X O
(4) 吸水率 ) 0.8 0.7 0.8 0.7 1 .0 1 . 9 3 . 7  (4) Water absorption) 0.8 0.7 0.8 0.7 1.0 1.1.9 3.3.7
[0174] 合成例 9 [0174] Synthesis example 9
温度計、窒素導入装置兼アルキレンォキシド導入装置及び撹拌装置を備えたォー トクレーブに、ノポラック型クレゾール樹脂(商品名「ショーノール CRG951J、昭和高 分子 (株)製、 OH当量: 119. 4) 119. 4g、水酸化カリウム 1. 19g及びトルエン 119 . 4gを仕込み、撹拌しつつ系内を窒素置換し、加熱昇温した。次に、プロピレンォキ シド 63. 8gを徐々に滴下し、 125〜 32° ( 、 0〜4, 8kg/cm2で 16時間反応させた 。その後、室温まで冷却し、この反応溶液に 89%リン酸 1. 56gを添加混合して水酸 化カリウムを中和し、不揮発分 62. 1%、水酸基当量が 182. 2g/eq.であるノボラッ ク型タレゾール樹脂のプロピレンォキシド反応溶液を得た。ヒれは、フエノール性水酸 基 1当量当りテルキレンォキシドが平均 1, 08モル付加しているものであった。 In an autoclave equipped with a thermometer, a nitrogen introducing device, an alkylene oxide introducing device and a stirrer, a nopolak-type cresol resin (trade name: Shonor CRG951J, manufactured by Showa Kagaku Co., Ltd., OH equivalent: 119.4) 119.4 g, potassium hydroxide (1.19 g) and toluene (119.4 g) were charged, the system was purged with nitrogen while stirring, and the temperature was raised by heating, and 63.8 g of propylene oxide was gradually added dropwise, and (The reaction was carried out at 0 to 4.8 kg / cm 2 for 16 hours. After cooling to room temperature, 1.56 g of 89% phosphoric acid was added to the reaction solution and mixed to neutralize potassium hydroxide. A propylene oxide reaction solution of a novolak-type tarezole resin having a nonvolatile content of 62.1% and a hydroxyl equivalent of 182.2 g / eq. Was obtained, and terkylenoxide was equivalent to one equivalent of the phenolic hydroxyl group. An average of 1,08 mol was added.
[0175] 得られたノポラック型タレゾール樹脂のアルキレンォキシド反応溶液 293. 0g、ァク リノレ酸 43. 2g、メタンスノレホン酸 11. 53g、メチノレノヽイドロキノン 0. 18g及びトノレエン 252. 9gを、撹拌機、温度計及び空気吹き込み管を備えた反応器に仕込み、空気を lOmlZ分の速度で吹き込み、撹拌しながら、 110°Cで 12時間反応させた。反応によ り生成した水は、トルエンとの共沸混合物として、 12. 6gの水が留出した。'その後、室 温まで冷却し、得られた反応溶液を 15%水酸ィ匕ナトリウム水溶液 35. 35gで中和し、 次いで水洗した。その後、エバポレーターにてトル ンをジエチレングリコールモノエ チルエーテルアセテート 118. lgで置換しつつ留去し、ノボラック型アタリレート樹月旨 溶液を得た。 [0175] An alkylene oxide reaction solution of the obtained nopolak-type taresol resin (293.0 g), acrylinoleic acid (43.2 g), methanesnolephonic acid (11.53 g), methinolenodidroquinone (0.18 g), and tonoleene (252.9 g) were stirred, A reactor equipped with a thermometer and an air blowing tube was charged, air was blown at a rate of lOmlZ, and the mixture was reacted at 110 ° C for 12 hours with stirring. 12.6 g of water was distilled off as an azeotrope of water produced by the reaction. After that, the reaction solution was cooled to room temperature, and the obtained reaction solution was neutralized with 35.35 g of a 15% aqueous sodium hydroxide solution, and then washed with water. Thereafter, the toluene was distilled off using an evaporator while replacing the toluene with 118.lg of diethylene glycol monoethyl ether acetate to obtain a novolak-type atarilate lug solution.
[0176] 次に、得られたノボラック型アタリレート樹月旨溶液 332· 5g及ぴトリフエニルホスブイ ン 1. 22gを、撹拌器、温度計及び空気吹き込み管を備えた反応器に仕込み、空気  [0176] Next, 332.5 g of the obtained novolak-type atarilate lunar solution and 1.22 g of triphenylphosphine were charged into a reactor equipped with a stirrer, a thermometer and an air blowing tube, and air
差替え甩 を lOmlZ分の速度で吹き込み、撹拌しながら、テトラヒドロフタル酸無水物 60. 8gを 徐々に加え、 95〜101°Cで 6時間反応させ、冷却後、取り出した。このようにして得ら れたカルボキシル基含有感光性樹脂は、不揮発分 70. 6%、固形分の酸価 87. 7m gKOHZgであった。 ' Replacement 甩 Was blown in at a rate of lOmlZ, and while stirring, 60.8 g of tetrahydrophthalic anhydride was gradually added, and the mixture was reacted at 95 to 101 ° C for 6 hours. After cooling, it was taken out. The thus obtained carboxyl group-containing photosensitive resin had a nonvolatile content of 70.6% and an acid value of the solid content of 87.7 mg KOHZg. '
[0177] 合成例 10 '  [0177] Synthesis example 10 '
ガス導入管、撹拌装置、冷却管、温度計、及びアルカリ金属水酸化物水溶液の連 '続滴下用の滴下ロートを備えた反応容器に、水酸基当量力 S80g/eq.の 1, 5— ヒ ドロキシナフタレン 224gとビスフエノ ノレ A型エポキシ樹旨(ジャパンエポキシレジン( 株)製、ェピコート 828、エポキシ当量 189g/eq. ) 1075gを仕込み、窒素雰囲気下 にて、撹拌下 110°Cで溶解させた。その後、トリフエニルホスフィン 0. 65gを添カロし、 • 反応容器内の温度を 150°Cまで昇温し、温度を 150°Cに保持しながら、約 90分間反 応させ、エポキシ当量 452gZeq.のエポキシ化合物(3 _a)を得た。次に、フラスコ 内の温度を 40°Cまで冷却し、ェピクロノレヒドリン 1920g、トノレェン 1690g、テトラメチ ルアンモニゥムブロマイド 70gをカ卩え、撹拌下 45°Cまで昇温し保持した。その後、 48 %水酸化ナトリウム水溶液 364gを 60分間かけて連続滴下し、その後、さらに 6時間 反応させた。反応終了後、過剰のェピクロルヒドリン及びトルエンの大半を減圧蒸留 して回収し、副生塩とトルエンを含む反応生成物をメチルイソプチルケトンに溶解ざ せ水洗した。有機溶媒層と水層を分離後、有機溶媒層よりメチルイソプチルケトンを 減圧蒸留して留去し、エポキシ当量277 g/eq.の多 エポキシ樹脂(3 _b)を得た 。得られた多核エポキシ樹脂(3 _b)は、エポキシ当量から計算すると、エポキシ化 合物(3— a)におけるアルコール性水酸基 1. 98個のうち約 1. 59個がエポキシィ匕さ ' れてレ、る。従って、アルコール性水酸基のエポキシィ匕率は約 80%である。 A reaction vessel equipped with a gas inlet pipe, a stirrer, a cooling pipe, a thermometer, and a dropping funnel for continuous dropping of an aqueous alkali metal hydroxide solution was charged with a 1.5-hydroxyl with a hydroxyl equivalent force of S80 g / eq. 224 g of roxinaphthalene and 1075 g of bisphenol phenol A type epoxy resin (Epicoat 828, manufactured by Japan Epoxy Resin Co., Ltd., epoxy equivalent 189 g / eq.) Were charged and dissolved at 110 ° C. under a nitrogen atmosphere with stirring. Thereafter, 0.65 g of triphenylphosphine was added to the mixture. • The temperature in the reaction vessel was raised to 150 ° C, and the reaction was carried out for about 90 minutes while maintaining the temperature at 150 ° C to obtain an epoxy equivalent of 452 gZeq. An epoxy compound (3_a) was obtained. Next, the temperature in the flask was cooled to 40 ° C, and 1920 g of epichronorehydrin, 1690 g of tonolene, and 70 g of tetramethylammonium bromide were added, and the temperature was raised to 45 ° C with stirring and maintained. Thereafter, 364 g of a 48% aqueous sodium hydroxide solution was continuously added dropwise over 60 minutes, and the mixture was further reacted for 6 hours. After completion of the reaction, most of the excess epichlorohydrin and toluene were recovered by distillation under reduced pressure, and the reaction product containing by-product salts and toluene was dissolved in methyl isobutyl ketone and washed with water. After separating the organic solvent layer and the aqueous layer, methylisobutyl ketone was distilled off from the organic solvent layer by distillation under reduced pressure to obtain a polyepoxy resin (3_b) having an epoxy equivalent of 277 g / eq. When the obtained polynuclear epoxy resin (3_b) was calculated from the epoxy equivalent, about 1.59 out of 1.98 alcoholic hydroxyl groups in the epoxy compound (3-a) were epoxidized. RU Therefore, the epoxidation ratio of alcoholic hydroxyl groups is about 80%.
[0178] 次に、得られた多核エポキシ樹脂 (3-b) 277gを、撹拌装置、冷却管及び温度計 を備えたフラス に入れ、カルビトールアセテート 290gをカ卩え、加熱溶解し、メチルノヽ イドロキノン 0. 46gと、トリフエ二ノレホスフィン 1. 38gをカロ免、 95〜: L05。Cにカロ熱し、了 クリル酸 72gを徐々に滴下し、 16時間反応させた。この反応生成物を、 80〜90°Cま で冷却し、テトラヒドロフタル酸無水物 129gを加え、 8時間反応させた。反応は、電位 差滴定による反応液の酸化、全酸化測定を行ない、得られる付加率にて追跡し、反 応率 95%以上を終点とする。このようにして得られたカルボキシル基含有感光性樹 脂は、不揮発分 62%、固形分の酸価 lOOmgKOHZgであった。 [0178] Next, 277 g of the obtained polynuclear epoxy resin (3-b) was put into a flask equipped with a stirrer, a cooling pipe and a thermometer, and 290 g of carbitol acetate was added thereto.ヽ 0.46g of idroquinone and 1.38g of trifeninolephosphine are calo-free, 95 ~: L05. C was heated by calo, 72 g of acrylic acid was gradually added dropwise, and the mixture was reacted for 16 hours. The reaction product was cooled to 80 to 90 ° C., and 129 g of tetrahydrophthalic anhydride was added and reacted for 8 hours. The reaction was oxidized by potentiometric titration and total oxidation was measured. The end point is a response rate of 95% or more. The carboxyl group-containing photosensitive resin thus obtained had a nonvolatile content of 62% and an acid value of the solid content of lOOmgKOHZg.
[0179] 実施例 13〜 15及び比較例 5、 6  [0179] Examples 13 to 15 and Comparative Examples 5 and 6
表 12に示す配合組成に従って各成分を配合し、 3本ロールミルでそれぞれ別々に 混練し、硬化性組成物を調製した。これをスクリーン印刷法により、 100メッシュのポリ ステルスクリーンを用レ、て 20〜30 μ mの厚さになるように、パターン形成されてレ、 る銅スルホールプリント配線基板に全面塗布し、塗膜を 80°Cの熱風乾燥器を用レ、て 30分間乾燥し、次いで、レジストパターンを有するネガフィルムを塗膜に密着させ、 紫外線露光装置((株)オーク製作所製、型式 HMW—680GW)を用いて、紫外線 を照射 (露光量 700mjZcm2)し、 1寳量%炭酸ナトリウム水溶液で 60秒間、 2. Okg /cm2のスプレー圧で現像し、その後、 150°Cの熱風乾燥器で 60分加熱硬化を行 .ない、試験基板を作製した。' · Each component was blended according to the blending composition shown in Table 12 and kneaded separately with a three-roll mill to prepare a curable composition. Using a 100-mesh polyester screen with a screen printing method, apply the entire surface to a copper through-hole printed wiring board that has been patterned to a thickness of 20 to 30 μm. Was dried using a hot air dryer at 80 ° C for 30 minutes, and then a negative film having a resist pattern was brought into close contact with the coating film, and an ultraviolet exposure apparatus (Model HMW-680GW, manufactured by Oak Manufacturing Co., Ltd.) was used. Irradiate with UV light (exposure 700 mjZcm 2 ), develop with 1% aqueous solution of sodium carbonate for 60 seconds, 2. Spray pressure of Okg / cm 2 , then use hot air dryer at 150 ° C for 60 minutes Heat curing was performed to produce a test substrate. '·
[0180] 得'られた硬化皮膜を有する試験基板について、後述の試験方法及ぴ評価方法に て、耐クラック性、 PCT耐性、密着性、はんだ耐熱性、耐酸性、耐アルカリ性、無電解 金めつき耐性の試験を行なった。  [0180] The test substrate having the obtained cured film was subjected to crack resistance, PCT resistance, adhesion, solder heat resistance, acid resistance, alkali resistance, and electroless metallization according to the test methods and evaluation methods described below. A resistance test was conducted.
[0181] また、銅スルホールプリント配線基板の代わりに IPCで定められたプリント回路基板 ' (厚さ 1. 6mm)の Bパターンを用レ、、上記と同じ条件で試験基板を作製し、電気絶縁 抵抗の試験を行なった。上記各試験の結果を表 13に示す。  [0181] Also, instead of the copper through-hole printed wiring board, use a B pattern of a printed circuit board ((thickness 1.6 mm) specified by IPC. A resistance test was performed. Table 13 shows the results of the above tests.
[0182] [表 12] - ' [0182] [Table 12]-'
P T/JP2004/016419 P T / JP2004 / 016419
Figure imgf000054_0001
Figure imgf000054_0001
用紙(愈則 26) 実施例 N o. 比較例 No. Paper (Yu rule 26) Example No. Comparative Example No.
特 性  Characteristic
1 3 1 4 1 5 5 6  1 3 1 4 1 5 5 6
クラック性 O o o X X  Cracking O o o X X
P CT耐性 O o o o o  PCT resistance O o o o o
密着性 ◎ ◎ ◎ ◎ ©  Adhesion ◎ ◎ ◎ ◎ ©
はんだ耐熱性 0 o o o o  Solder heat resistance 0 o o o o
耐酸性 o o o 0 o  Acid resistance o o o 0 o
耐アルカリ性 o o o o o  Alkali resistance o o o o o
無電解金めつき耐性 0 o o o o  Electroless gold plating resistance 0 o o o o
電気絶緣抵抗 o o o o o  Electrical insulation resistance o o o o o
表 13に示される結果から明らカゝなように、感光性成分としてカルボキシル基含有感 光性樹脂を用いた比較例 5、 6ではヒートサイクル時の耐クラック性に劣っていたが、 本発明に従ってさらにテトラ (メタ)アタリレート化合物を含有する実施例 13〜15では 耐クラック性に優れていた。上記表 13中の性能試験の評価方法は以下の通りである As is clear from the results shown in Table 13, in Comparative Examples 5 and 6 in which a carboxyl group-containing photosensitive resin was used as the photosensitive component, the crack resistance during a heat cycle was inferior. In Examples 13 to 15 further containing a tetra (meth) atalylate compound, the crack resistance was excellent. The evaluation method of the performance test in Table 13 above is as follows
[0184] (5)耐クラック性: [0184] (5) Crack resistance:
硬化皮膜の耐クラック性を楠本化成社製の Thermal Shock Chamber NT 1020W を用い、一 65°C〜150°Cを 1サイクルとし、以下の基準で評価した。  The crack resistance of the cured film was evaluated using Thermal Shock Chamber NT1020W manufactured by Kusumoto Kasei Co., Ltd., with one cycle of 65 ° C to 150 ° C and the following criteria.
〇:クラックが 500サイクル以上で発生したもの  〇: Cracks occurred in 500 cycles or more
△:クラックが 300〜499サイクルで発生したもの  △: Cracks occurred in 300 to 499 cycles
X:クラックが 299サイクル以下で発生したもの  X: Cracks occurred in 299 cycles or less
[0185〕 (6) PCT耐性: [0185] (6) PCT resistance:
硬化皮膜の PCT耐性を、 121°C、飽和水蒸気中 50時間の条件にて以下の基準で 評価した。  The PCT resistance of the cured film was evaluated under the following criteria under the conditions of 121 ° C and 50 hours in saturated steam.
〇:硬化皮膜にふくれ、剥がれ、変色がないもの . △:硬化皮膜に若干のふくれ、剥がれ、変色があるもの  〇: The cured film has no blistering, peeling or discoloration. Δ: The cured film has slight blistering, peeling or discoloration.
X:硬化皮膜にふくれ、剥がれ、変色があるもの  X: The cured film has blisters, peeling, and discoloration
差'眷'- ¾周弒(親前 ) [0186] (7)密着性: Difference 'Kin'-¾ 周 弒 (Parent) [0186] (7) Adhesion:
JIS D 0202の試験方法に従って硬化皮膜に碁盤目状にクロスカットを入れ、次 いでセロハン粘着テープによるピーリングテスト後の剥れの状能を目視判定した。  According to the test method of JIS D 0202, a cross cut was made in a cross-cut pattern on the cured film, and then the peeling performance after a peeling test with a cellophane adhesive tape was visually determined.
◎: 100/100で全く剥れのなレ、もの  ◎: 100/100 with no peeling
〇: 100Z 100でクロスカット部が少し剥れたもの  〇: 100Z100 with cross-cut part slightly peeled off
Δ : 50/100~90/100  Δ: 50/100 ~ 90/100
X : 0/100〜50/100 ' ■ .  X: 0 / 100〜50 / 100 '.
[0187] (8)はんだ耐熱性:  (8) Solder heat resistance:
JIS C 6481の試験方法に従って、 260°Cのはんだ浴への試験基板の 10秒浸漬 を 3回行なレ、、外観の変化を評価した。なお、ポストフラックス(ロジン系)としては、 JIS C 6481に従ったフラックスを使用した。 , ' According to the test method of JIS C 6481, the test board was immersed in a solder bath at 260 ° C for 10 seconds three times, and the change in appearance was evaluated. Note that a flux according to JIS C 6481 was used as the post flux (rosin-based). , '
〇:外観変化なし 〇: No change in appearance
, △:硬化皮膜の変色が認められるもの  , △: Discoloration of the cured film is observed
X:硬化皮膜の浮き、剥れ、はんだ潜りあり  X: Floating, peeling, solder dipping of cured film
[0188] (9)耐酸性: . (9) Acid resistance:.
試験基板を 10容量%硫酸水溶液に 20°Cで 30分間浸漬後取り出し、硬化皮膜の 状態を以下の基準で評価した。  The test substrate was immersed in a 10% by volume aqueous sulfuric acid solution at 20 ° C for 30 minutes, taken out, and the state of the cured film was evaluated according to the following criteria.
' 〇:変化が認められないもの  '〇: No change is observed
△:ほんの僅か変化しているもの ' ' X:硬化皮膜にフクレあるいは膨潤脱落があるもの  △: Slightly changed '' X: Cured film with blisters or swelling-off
[0189] (10)耐アルカリ性: (10) Alkali resistance:
試験基板を、 10容量%硫酸水溶液を 10質量%水酸化ナトリウム水溶液に代えた 以外は耐酸性試験と同様に評価した。  The test substrate was evaluated in the same manner as in the acid resistance test, except that the 10% by volume aqueous sulfuric acid solution was replaced with a 10% by weight aqueous solution of sodium hydroxide.
[0190] (11)無電解金めつき耐性: 、 後述する工程に従って試験基板に無電解金めつきを行ない、その試験基板につい て外観の変化及びセロハン粘着テープを用いたピーリング試験を行ない、硬化皮膜 の剥離状態を以下の基準で判定した。 ' [0190] (11) Electroless gold plating resistance: Electroless gold plating was performed on a test substrate according to the process described below, and the test substrate was subjected to a change in appearance and a peeling test using a cellophane adhesive tape, and cured. The peeling state of the film was determined according to the following criteria. '
〇:外観変化もなく、硬化皮膜の剥離も全くない。 . △:外観の変化はないが、硬化皮膜にわずかに剥れがある。 〇: No change in appearance, no peeling of cured film. . Δ: No change in appearance, but slight peeling of cured film.
X:硬化皮膜の浮きが見られ、めっき潜りが認められ、ピーリング試験で硬化皮膜の 剥れが大きい。  X: Lifting of the cured film was observed, plating dive was observed, and peeling of the cured film was large in the peeling test.
無電解金めつき工程: '  Electroless plating process: ''
1.脱脂: ' 1 1. Degreasing: ' 1
試験基板を、 30°Cの酸性脱脂液((株)日本マクダーミッド製、 Metex L一 5Bの 2 0容量%水溶液)に 3分間、浸漬した。  The test substrate was immersed in a 30 ° C. acidic degreasing solution (a 20% by volume aqueous solution of Metex L-15B manufactured by McDermid Japan Co., Ltd.) for 3 minutes.
2.水^: ' .  2.Water ^: '.
試験基板を、流水中に 3分間、浸漬した。  The test substrate was immersed in running water for 3 minutes.
3.ソフトエッチ:  3. Soft etch:
試験基板を、 14. 3質量%の過硫酸アンモン水溶液に室温で 3分間、浸漬した。  The test substrate was immersed in a 14.3% by mass aqueous solution of ammonium persulfate at room temperature for 3 minutes.
4.水洗:  4.Washing:
試験基板を、流水中に 3分間、浸漬した。 , The test substrate was immersed in running water for 3 minutes. ,
5.酸浸漬: ' : ' 試験基板を、.10容量%の硫酸水溶液に室温で 1分間、浸漬した。  5. Acid immersion: ':' The test substrate was immersed in a .10% by volume aqueous sulfuric acid solution for 1 minute at room temperature.
6.水洗:  6.Washing:
試験基板を、流水中に 30秒〜 1分間、浸漬した。  The test substrate was immersed in running water for 30 seconds to 1 minute.
7.触媒付与: '  7. Catalyst application: '
試験基板を、 30°Cの触媒液((株)メルテックス製、メ ルプレートァクチべ一ター 35 0の 10容量%水溶液)に 7分間、浸漬した。  The test substrate was immersed in a catalyst solution (a 10% by volume aqueous solution of Melplate Activator 350, manufactured by Meltex Co., Ltd.) at 30 ° C. for 7 minutes.
8.水洗:  8.Washing:
試験基板を、流水中に 3分間、浸漬した。  The test substrate was immersed in running water for 3 minutes.
9.無電解ニッケノレめつき:  9. Electroless nickel plating:
試験基板を、 85°C、 ρΗ=4· 6のニッケルめっき液((株)メルテックス製、メルプレー ト Ni— 865Μ、 20容量%水溶液)に 20分間、浸漬した。 ,  The test substrate was immersed in a nickel plating solution (Melplates Co., Ltd., Melplate Ni-865Μ, 20% by volume aqueous solution) at 85 ° C and ρΗ = 4.6 for 20 minutes. ,
10.酸浸漬:  10. Acid immersion:
試験基板を、 10容量%の硫酸水溶液に室温で 1分間、浸漬した。  The test substrate was immersed in a 10% by volume sulfuric acid aqueous solution at room temperature for 1 minute.
11.水洗: 試験基板を、流水中に 30秒〜 1分間、浸漬した。 11.Washing: The test substrate was immersed in running water for 30 seconds to 1 minute.
12.無電解金めつき:  12. Electroless gold plating:
試験基板を、 95° (、 pH=6の金めつき液((株)メルテックス製、ォゥロレクト口レス UP 15容量%、シアンィ匕金カリウム 3質量%の水溶液)に 10分間、浸漬した。  The test substrate was immersed for 10 minutes in 95 ° (a plating solution of pH = 6 (aqueous solution of UP 15 volume%, olelect mouthless UP, manufactured by Meltex Co., Ltd., aqueous solution of 3% by mass of potassium cyanide)).
13.水洗: '  13. Rinse: '
試験基板を、流水中に 3分間、浸漬した。 .  The test substrate was immersed in running water for 3 minutes. .
14.湯洗:  14. Hot water washing:
試験基板を、 60°Cの温水に浸漬し、 3分間充分に水洗後、水をよくきり、乾燥した。 このような工程を経て無電解金めつきした試験基板を得た。  The test substrate was immersed in warm water of 60 ° C, washed thoroughly with water for 3 minutes, drained well, and dried. Through these steps, a test substrate having electroless gold plating was obtained.
[0192] (12)電気絶縁性: [12] (12) Electrical insulation:
硬化皮膜の電気絶縁性を以下の基準にて評価した。  The electrical insulation of the cured film was evaluated according to the following criteria.
加湿条件:温度 110°C、湿度 85%R. H.、印加電圧 5V、 50時間。  Humidification conditions: temperature 110 ° C, humidity 85% RH, applied voltage 5V, 50 hours.
.測定条件:測定時間 60秒、印加電圧 500V。  . Measurement conditions: Measurement time 60 seconds, applied voltage 500V.
: Q :加湿後の絶縁抵抗値 10 Ω以上、銅のマイグレーションなし  : Q: Insulation resistance after humidification 10 Ω or more, no copper migration
△:加湿後の絶縁抵抗値 101QQ以上、銅のマイグレーションあり △: Insulation resistance after humidification 10 1Q Q or more, copper migration
X:加湿後の絶縁抵抗値 109Ω以下、銅のマイグレーションあり X: Insulation resistance after humidification 10 9 Ω or less, copper migration
[0193] 実施例 16〜20及び比較例 7、 8 Examples 16 to 20 and Comparative Examples 7 and 8
表 14に示す配合組成に従って各成分を配合し、 3本ロールミルでそれぞれ別々に 混練し、硬化性組成物を調製した。これをスクリーン印刷法により、 100メッシュのポリ エスデルスクリーンを用レ、て 20〜30 μ mの厚さになるように、パターン形成されてレヽ る銅スルホールプリント配線基板に全面塗布し、塗膜を 80°Cの熱風乾燥器を用いて 30分間乾燥し、次いで、レジストパターンを有するネガフィルムを塗膜に密着させ、 紫外線露光装置((株)オーク製作所製、型式 HMW— 680GW)を用いて、紫外線 を照射(露光量 eOOmjZcm2)し、 1質量%炭酸ナトリウム水溶液で 60秒間、 2. Okg Zcm2のスプレー圧で現像し、その後、 150°Cの熱風乾燥器で 60分加熱硬化を行 ない、試験基板を作製した。 Each component was blended according to the blending composition shown in Table 14, and kneaded separately with a three-roll mill to prepare a curable composition. This is applied to the entire surface of a copper through-hole printed circuit board on which a pattern is formed by screen printing using a 100 mesh polyester screen so as to have a thickness of 20 to 30 μm. Was dried using a hot air dryer at 80 ° C for 30 minutes, then a negative film having a resist pattern was brought into close contact with the coating film, and an ultraviolet light exposure device (Model HMW-680GW, manufactured by Oak Manufacturing Co., Ltd.) was used. Then, irradiate with ultraviolet rays (exposure amount eOOmjZcm 2 ), develop with a 1% by mass aqueous solution of sodium carbonate for 60 seconds, and spray pressure of Okg Zcm 2 , and then heat cure with a hot air dryer at 150 ° C for 60 minutes. No, a test substrate was made.
[0194] 得られた硬化皮膜を有する試験基板にっレ、て、前述の試験方法及び評価方法に て、耐クラック性、 PCT耐性、密着性、はんだ耐熱性、耐酸性、耐アルカリ性、無電解 金めつき耐 '性の試験を行なった。 [0194] The test substrate having the obtained cured film was subjected to crack resistance, PCT resistance, adhesion, solder heat resistance, acid resistance, alkali resistance, electroless resistance according to the test methods and evaluation methods described above. A test for resistance to gold plating was conducted.
[0195] また、銅スルホールプリント配線基板の代わりに IPCで定められたプリント回路基板  [0195] Also, a printed circuit board specified by the IPC instead of a copper through-hole printed wiring board
(厚さ 1. 6mm)の Bパターンを用い、上記と同じ条件で試験基板を作製し、電気絶縁 抵抗の試験を行なった。  Using a B pattern (thickness 1.6 mm), a test substrate was fabricated under the same conditions as above, and an electrical insulation resistance test was performed.
[0196] [表 14]  [0196] [Table 14]
Figure imgf000059_0001
Figure imgf000059_0001
[0197] 上記各試験の結果を表 15に示す。  Table 15 shows the results of the above tests.
[表 15]  [Table 15]
差替え用紙(規則 26) 実 ί沲 例 N o . 比較伊 N o . Replacement form (Rule 26) Practical example No.
1 6 1 7 1 8 1 9 20 フ 8  1 6 1 7 1 8 1 9 20 F 8
fllj ノフジノ 1土' Ο ο o o o  fllj Nofujino 1 earth 'Ο ο o o o
P CT耐性 〇 ο o o o 0 o 密着性 © © ◎ ◎ ◎ ◎ ◎ はんだ耐熱  PCT resistance 〇 ο o o o 0 o Adhesion © © ◎ ◎ ◎ ◎ ◎
〇 0 0 o 〇 o o  〇 0 0 o 〇 o o
耐酸性 〇 ο o 〇 o o o 耐ァルカリ  Acid resistant 〇 ο o 〇 o o o Alkali resistant
性 ο ο o o o 〇 o 無1!解金 Sex ο ο ooo 〇 o no 1 !
めっき耐性 ο 0 o o o o o 電 気 絶 縁  Plating resistance ο 0 o o o o o Electrical insulation
抵抗 ο ο ° o o o o  Resistance ο ο ° o o o o
[0198] 表 15に示される結果から明らかなように、感光性成分としてカルボキシル基含有感 光性樹脂を用いた比較例 7、 8ではヒートサイクル時の耐クラック性に劣っていたが、 本発明に従ってさらにテトラ (メタ)ァクリレートイ匕合物を含有する実施例 16〜20では 耐クラック '性に優れていた。 [0198] As is clear from the results shown in Table 15, in Comparative Examples 7 and 8 in which a carboxyl group-containing photosensitive resin was used as the photosensitive component, the crack resistance during a heat cycle was inferior. In Examples 16 to 20 further containing the tetra (meth) acrylate conjugate according to the above, the cracking resistance was excellent.
産業上の利用可能性  Industrial applicability
[0199] 以上説明したように、本発明の (メタ)アタリレート化合物及ぴそれを含有する硬ィ匕 性組成物は、光硬化性及ぴ Z又は熱硬化性に優れ、且つ、耐吸湿性並びに高湿下 での耐熱性及び柔軟性に優れた硬ィ匕物が得られるため、レジストインキ、塗料、成形 材等の種々の用途に使用可能である。  As described above, the (meth) atalylate compound of the present invention and the hardening composition containing the same are excellent in photocurability and Z or heat curability, and are resistant to moisture absorption. In addition, since a hardened product excellent in heat resistance and flexibility under high humidity can be obtained, it can be used for various applications such as resist ink, paint, and molding material.
[0200] また、本発明のテトラ (メタ)アタリレートイ匕合物(B)の他に、アルカリ可溶性である力 ルポキシル基含有ィ匕合物 (A)や、重合開始剤 (C)、希釈溶剤 (D)、 1分子中に 2個 以上の環状エーテルを有する化合物 (E)、硬化触媒 (F)等を含有する硬化性組成 物は、光硬化性及び Z又は熱硬化性に優れ、且つ、高温及び低温に曝されても、硬 化皮膜にクラックが発生するといつたようなことはなぐしかも前記したような諸特性に 優れた硬化物が得られるため、プリント配線板のソルダーレジスト、エッチングレジスト 、メツキレジスト、多層配線板の層間絶縁層、テープキャリアパッケージの製造に用い られる永久マスク、フレキシブル配線基板用レジスト、カラーフィルター用レジスト、上  [0200] In addition to the tetra (meth) atalylate toy conjugate (B) of the present invention, an alkali-soluble lipoxyl group-containing tie (A), a polymerization initiator (C), and a diluent A curable composition containing a solvent (D), a compound (E) having two or more cyclic ethers in one molecule, a curing catalyst (F), etc. has excellent photocurability and Z or heat curability, and Even when exposed to high and low temperatures, cracks occur in the hardened film, and it is possible to obtain a cured product with excellent properties as described above. Resist, plating resist, interlayer insulating layer of multilayer wiring board, permanent mask used for manufacturing tape carrier package, resist for flexible wiring board, resist for color filter,
差替え用紙 (規則 26)' 記レジストのドライフィルム、上記レジストのインキジェット方式の印刷などの用途に有 用である。 · . Replacement Form (Rule 26) ' It is useful for applications such as dry film of the above resist and ink jet printing of the above resist. ·.

Claims

請求の範囲 The scope of the claims
[1] 下記一般式(1)で表わされるテトラ (メタ)ァクリレートイ匕合物。  [1] A tetra (meth) acrylate conjugate represented by the following general formula (1).
Figure imgf000062_0001
Figure imgf000062_0001
(但し、
Figure imgf000062_0002
R2 R3 R4は水素原子又はメチル基を表わし、 Xはジカルボン酸残基を 表わす。 )
(However,
Figure imgf000062_0002
R 2 R 3 R 4 represents a hydrogen atom or a methyl group, and X represents a dicarboxylic acid residue. )
[2] 前記ジカルボン酸残基 Xが、脂肪族ジカルボン酸残基又は芳香族ジカルボン酸残 基である請求項 1に記載のテトラ (メタ)アタリレート化合物。  [2] The tetra (meth) atalylate compound according to claim 1, wherein the dicarboxylic acid residue X is an aliphatic dicarboxylic acid residue or an aromatic dicarboxylic acid residue.
[3] 前記ジカルボン酸残基 Xが、下記式 (B1) (B7)のレヽずれかで表わされる芳香族 ジカルボン酸残基であることを特徴とする請求項 1に記載のテトラ (メタ)ァクリレートイ匕 合物。 [3] The tetra (meth) acrylate according to claim 1, wherein the dicarboxylic acid residue X is an aromatic dicarboxylic acid residue represented by the following formulas (B1) and (B7). Dagger.
[化 2]  [Formula 2]
Figure imgf000062_0003
Figure imgf000062_0003
(伹し、 R\ R2 R3 R4は水素原子又はメチル基を表わす。 ) (Where R \ R 2 R 3 R 4 represents a hydrogen atom or a methyl group.)
差替え用紙(規則 26) Replacement form (Rule 26)
[4] 前記請求項 1乃至 3のいずれか一項に記載のテトラ (メタ)ァクリレートイ匕合物の硬 化物。 [4] A cured product of the tetra (meth) acrylate conjugate according to any one of claims 1 to 3.
[5] 下記一般式 (1)で表わされるテトラ (メタ)アタリレート化合物を含有することを特徴と する硬化性組成物。  [5] A curable composition comprising a tetra (meth) atalylate compound represented by the following general formula (1).
[化 3]  [Formula 3]
Figure imgf000063_0001
Figure imgf000063_0001
(但し、 R\ R2、 R R4は水素原子又はメチル基を表わし、 Xはジカルボン酸残基を 表わす。) (However, R \ R 2 and RR 4 represent a hydrogen atom or a methyl group, and X represents a dicarboxylic acid residue.)
[6] 前記ジカルボン酸残基 Xが、脂肪族ジカルボン酸残基又は芳香族ジカルボン酸残 基であることを特徴とする請求項 5に記載の硬化性組成物。  6. The curable composition according to claim 5, wherein the dicarboxylic acid residue X is an aliphatic dicarboxylic acid residue or an aromatic dicarboxylic acid residue.
[7] 前記ジカルボン酸残基 Xが、下記式 (B1)〜(B7)のいずれかで表わされる芳香族 ジカルボン酸残基であることを特徴とする請求項 5に記載の硬化性組成物。 [7] The curable composition according to claim 5, wherein the dicarboxylic acid residue X is an aromatic dicarboxylic acid residue represented by any of the following formulas (B1) to (B7).
[化 4]  [Formula 4]
Figure imgf000063_0002
Figure imgf000063_0002
差眷ぇ用紙 (親則 26) (但し、 R\ R2、 R3、 R4は水素原子又はメチル基を表わす。 ) Difference form (parent regulation 26) (However, R \ R 2 , R 3 and R 4 represent a hydrogen atom or a methyl group.)
[8] さらに他のラジカル重合性モノマー及び Z又は重合開始剤を含有することを特徴と する請求項 5乃至 7のいずれか一項に記載の硬ィヒ'性糸且成物。  [8] The hard fibrous yarn composition according to any one of claims 5 to 7, further comprising another radical polymerizable monomer and Z or a polymerization initiator.
[9] 前記請求項 5乃至 8の 、ずれか一項に記載の硬化性組成物の硬化物。  [9] A cured product of the curable composition according to any one of claims 5 to 8.
[10] 繊維強化材を含有することを特徴とする請求項 9に記載の硬化物。 [10] The cured product according to claim 9, which contains a fiber reinforcing material.
[11] (A)カルボキシル基含有化合物、(B)下記一般式 (1)で表わされるテトラ (メタ)ァク リレート化合物、(C)重合開始剤、及び (D)希釈溶剤を含有することを特徴とする硬 化性組成物。 . [11] It is necessary to contain (A) a carboxyl group-containing compound, (B) a tetra (meth) acrylate compound represented by the following general formula (1), (C) a polymerization initiator, and (D) a diluting solvent. Characteristic curable composition. .
[化 5]  [Formula 5]
CH2 = C— C— 0— CH2 \ o 0 7CH2 -0-C -C = CH2 CH 2 = C— C— 0— CH 2 \ o 0 7 CH 2 -0-C -C = CH 2
CH - O-C-X-C-O-CH ( 1 )  CH-O-C-X-C-O-CH (1)
CH2 = C -C-O-CHj 7 XCH2 -0-C -C =CH, CH 2 = C -CO-CHj 7 X CH 2 -0-C -C = CH,
R2 0 0 R 2 0 0
(但し、 R\ R2、 R3、 R4は水素原子又はメチル基を表わし、 Xはジカルボン酸残基を 表わす。) (However, R \ R 2 , R 3 and R 4 represent a hydrogen atom or a methyl group, and X represents a dicarboxylic acid residue.)
[12] 前記ジカルボン酸残基 Xが、脂肪族ジカルボン酸残基又は芳香族ジカルボン酸残 基であることを特徴とする請求項 11に記載の硬化性,袓成物。  12. The curable composition according to claim 11, wherein the dicarboxylic acid residue X is an aliphatic dicarboxylic acid residue or an aromatic dicarboxylic acid residue.
[13] 前記ジカルボン酸残基 X力 下記式 (B1)〜 (B7)のいずれかで表わされる芳香族 ジカルボン酸残基であることを特徴とする請求項 11に記載の硬ィヒ性組成物。 [13] The composition according to claim 11, wherein the dicarboxylic acid residue X is an aromatic dicarboxylic acid residue represented by any of the following formulas (B1) to (B7). .
[化 6]  [Formula 6]
差替え用紙(親則 26)
Figure imgf000065_0001
Replacement form (Chief rule 26)
Figure imgf000065_0001
. (但し、 R R R R4は水素原子又はメチル基を表わす。) (However, RRRR 4 represents a hydrogen atom or a methyl group.)
[14] さらに (E) 1分子中に 2個以上の環状エーテルを有する化合物を含有することを特 徴とする請求項 11乃至 13のレヽずれか一項に記載の硬化性組成物。 14. The curable composition according to any one of claims 11 to 13, further comprising (E) a compound having two or more cyclic ethers in one molecule.
[15] さらに (F)硬ィ匕触媒を含有することを特徴とする請求項 11乃至 14のいずれか一項 に記載の硬化性組成物。 [15] The curable composition according to any one of claims 11 to 14, further comprising (F) a hardening catalyst.
[16] さらに (G)他のラジカル重合性モノマーを含有することを特徴とする請求項 11乃至[16] The method according to claims 11 to, further comprising (G) another radical polymerizable monomer.
15のレ、ずれか一項に記載の硬化性組成物。 15. The curable composition according to any one of item 15 to item 15.
[17] 前記請求項 11乃至 16のいずれか一項に記載の硬化性組成物の硬ィ匕物。 [17] A cured product of the curable composition according to any one of claims 11 to 16.
差替え用紙(規則 26) Replacement form (Rule 26)
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JP2016155997A (en) * 2015-02-24 2016-09-01 株式会社リコー Active energy ray-curable composition, active energy ray-curable ink, composition storage container, apparatus for forming two-dimensional or three-dimensional image, method for forming two-dimensional or three-dimensional image, cured product, decorative body, and active energy ray-polymerizable compound
CN115703901A (en) * 2021-08-10 2023-02-17 中国石油天然气股份有限公司 ABS (acrylonitrile butadiene styrene) resin processing aid, preparation method thereof and ABS resin composite processing aid

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CN115703901A (en) * 2021-08-10 2023-02-17 中国石油天然气股份有限公司 ABS (acrylonitrile butadiene styrene) resin processing aid, preparation method thereof and ABS resin composite processing aid
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