WO2005023415A1 - Processus en deux etapes de decontamination de gaz de combustion d'entreprises industrielles, par irradiation par faisceau d'electrons et traitement par decharge gazeuse - Google Patents

Processus en deux etapes de decontamination de gaz de combustion d'entreprises industrielles, par irradiation par faisceau d'electrons et traitement par decharge gazeuse Download PDF

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Publication number
WO2005023415A1
WO2005023415A1 PCT/US2004/029057 US2004029057W WO2005023415A1 WO 2005023415 A1 WO2005023415 A1 WO 2005023415A1 US 2004029057 W US2004029057 W US 2004029057W WO 2005023415 A1 WO2005023415 A1 WO 2005023415A1
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Prior art keywords
electrodes
gas stream
gases
chamber
particle accelerator
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PCT/US2004/029057
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English (en)
Inventor
Gennadiy Ivanovitch Klenov
Vladimir Petrovich Larionov
Aziz Khasaevich Kadymov
Gary F. Bowser
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Scantech Holdings, Llc
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Publication of WO2005023415A1 publication Critical patent/WO2005023415A1/fr

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/007Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by irradiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B01D53/326Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 in electrochemical cells
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00Irradiation devices
    • G21K5/10Irradiation devices with provision for relative movement of beam source and object to be irradiated
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2259/00Type of treatment
    • B01D2259/80Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/812Electrons
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00Applications of plasma devices
    • H05H2245/10Treatment of gases
    • H05H2245/15Ambient air; Ozonisers

Definitions

  • the present invention relates, generally, to the field of apparatuses and methods for reducing emissions in stack gases and, more particularly, to the field of apparatuses and methods using charged particle accelerators and gas discharge to reduce the amount of sulfur dioxide (S0 2 ) and nitrogen oxides (NO x ) in stack gases released from industrial facilities.
  • stack gas decontamination systems have been designed, developed, and/or constructed to treat stack gases produced by processes generally found at industrial enterprises or facilities.
  • the processes often include combustion processes in which coal, oil, or natural gas is burned with by-product gases such as, but not limited to, sulfur dioxide (S0 2 ) and nitrogen oxides (NO x ) being created and directed into the atmosphere as stack gases through conduits referred to as "stacks" or "flues".
  • by-product gases travel through the stacks or flues, they are referred to, typically, as “stack gases” or "flue gases”.
  • stack gas decontamination systems attempt to reduce the consequential pollution caused by the release of stack gases into the atmosphere by processing, treating, or "decontaminating", the stack gases through the removal of harmful pollutants such as sulfur dioxide (S0 2 ) and nitrogen oxides (NO x ) therefrom.
  • harmful pollutants such as sulfur dioxide (S0 2 ) and nitrogen oxides (NO x ) therefrom.
  • NH 3 ammonia
  • water vapor H 2 0
  • the gas is then irradiated with high-power electron accelerators to initiate and maintain the chemical reactions that convert sulfur dioxide (S0 2 ) and nitrogen oxides (NO ⁇ ) into powder sulfate and ammonium nitrate, which are commonly used as fertilizers.
  • a stationary corona discharge is employed to initiate and maintain the chemical reactions in lieu of the high-power electron accelerators.
  • the stationary corona discharge consumed only 60 - 90 watts of power and the system removed 90 - 95% of the sulfur dioxide (S0 2 ) and 5 - 20 % of the nitrogen oxides (NO x ) from stack gas having a flow rate of 1 ,200 cubic meters per hour.
  • the sulfur dioxide (S0 2 ) was substantially removed from the stack gases.
  • the present invention comprises a system, including apparatuses and methods, for removing sulfur dioxide (S0 2 ) and nitrogen oxides (NO x ) from the gases of a gas stream using irradiation of the gases with a particle accelerator in combination with gas discharge. More particularly, the present invention comprises a system, including apparatuses and methods, for removing sulfur dioxide (S0 ) and nitrogen oxides (NO x ) from the gases of a gas stream by treating the gases in a first stage with gas discharge lighted by a first electron beam and in a second stage with a second electron beam.
  • the present invention is embodied in a stack gas decontamination system including a first chamber in which gases of a gas stream to be treated are mixed with ammonia and water vapor to produce a moist, ammonia-laden environment for subsequent treatment of the gases.
  • the stack gas decontamination system also includes a second chamber having a plurality of electrodes therein that receives the moist, ammonia-laden gases from the first chamber. Concurrently, during a first stage of processing or treatment of the gases at near atmospheric pressure and in the ammonia-laden environment, high-voltage power is applied to the electrodes and an electron beam of accelerated electrons from a first particle accelerator is directed into the gas between the electrodes.
  • the energy of the accelerated electrons lights the gas between the electrodes, providing preliminary ionization of the gas and producing a stable, uniform gas discharge in conjunction with the high-voltage power applied to the electrodes.
  • the gas discharge causes the removal of a majority of the sulfur dioxide (S0 2 ) and a minority of the nitrogen oxides (NO x ) from the gases as they flow through the second chamber.
  • the stack gas decontamination system additionally includes a third chamber in which the moist, ammonia-laden gases are further processed or treated during a second stage of processing that includes irradiation of the gases by a beam of accelerated electrons produced by a second particle accelerator to significantly remove nitrogen oxides (NO x ).
  • the gases exit the stack gas decontamination system with substantial reductions in the amounts, or concentrations, of the sulfur dioxide (S0 2 ) and nitrogen oxides (NOx) therein.
  • the dual-stage system and methods of the present invention significantly reduce the amounts, or concentrations, of sulfur dioxide (S0 2 ) and nitrogen oxides (NO x ) in the gases of a gas stream such that after processing, the gas stream includes 2-8% of the sulfur dioxide (S0 2 ) and 15-35% of the nitrogen oxides (NO x ) present in the gas stream prior to processing.
  • a stable, uniform gas discharge is maintainable in a large chamber (e.g., having a volume of several cubic meters to several tens of cubic meters) having an ammonia-rich environment at near atmospheric pressure, thereby enabling the treatment of a substantially larger volume of gas than with other methods and causing a significant reduction in the amount of sulfur dioxide (S0 2 ) present in the gas.
  • a large chamber e.g., having a volume of several cubic meters to several tens of cubic meters
  • Fig. 1 displays a block diagram representation of a stack gas decontamination system for removing sulfur dioxide (S0 2 ) and nitrogen oxides (NO x ) from a stack gas stream of an industrial facility in accordance with an exemplary embodiment of the present invention.
  • Fig. 2 displays a front, elevational, schematic view of a second chamber of the stack gas decontamination system of Fig. 1.
  • Fig. 3 displays a side, elevational, schematic view of a second chamber of the stack gas decontamination system of Fig. 1 , illustrating a first configuration of a plurality of electrodes therein.
  • Fig. 4 displays a side, elevational, schematic view of a second chamber of the stack gas decontamination system of Fig.1, illustrating a second configuration of a plurality of electrodes therein.
  • Fig. 1 displays a block diagram representation of a stack gas decontamination system 100 for removing sulfur dioxide (SO 2 ) and nitrogen oxides (NO x ) from a stack gas stream of an industrial enterprise, or facility, in accordance with an exemplary embodiment of the present invention.
  • the stack gas decontamination system 100 comprises a first chamber 102 that is connected by an inlet duct 104 to a stack, or other conduit, in which gases produced by another process are directed toward the environment or another device that is not a part of the stack gas decontamination system 100.
  • the other process may comprise a combustion or other similar process, such that the gases directed by the stack, or other conduit, comprise combustion by-product gases, including, but not limited to, sulfur dioxide (S0 2 ) and nitrogen oxides (NO x ).
  • the first chamber 102 is adapted and appropriately configured to receive all, or a portion, of the gases traveling through the stack, or other conduit, via the inlet duct 104 as inlet gas stream 106.
  • the first chamber 102 comprises a vessel or tank-like structure having a volume of several cubic meters to several tens of cubic meters.
  • the first chamber 102 is connected to an ammonia source 108 by a pipeline 110 for the receipt of ammonia (NH 3 ) therefrom during operation.
  • the ammonia source 108 generally, comprises a pressurized ammonia tank and the pipeline 110, generally, includes one or more regulator(s) and/or control valve(s) therein to appropriately meter the flow of ammonia into the first chamber 102.
  • a sprayer 112, adapted to produce a water spray 114, is attached to a wall of the first chamber 102 in a manner that enables the sprayer 112 to direct the water spray 114 into the first chamber 102 at an appropriate location, direction, and spray pattern.
  • the sprayer 112 is connected to a water source 116 via a pipeline 118.
  • the water source 116 comprises a water tank that may or may not be pressurized, while the pipeline 118 includes one or more regulator(s) and/or control valve(s) therein to appropriately control the flow of water to the sprayer 112.
  • the stack gas decontamination system 100 also comprises a second chamber 130 that is connected to the first chamber 102 by a connecting duct 132 for the receipt of a gas stream 134 from the first chamber 102 having a mixture of gases, including, without limitation, sulfur dioxide (S0 2 ), nitrogen oxides (NO x ), ammonia (NH3), and water vapor (H 2 0).
  • the gas stream 134 includes amounts, or concentrations, of ammonia (NH 3 ) and water vapor (H 2 0) appropriate for further processing and amounts, or concentrations, of sulfur dioxide (SO 2 ) and nitrogen oxides (NO x ) present in inlet gas stream 106.
  • NH 3 ammonia
  • H 2 0 water vapor
  • SO 2 sulfur dioxide
  • NO x nitrogen oxides
  • the second chamber 130 is configured to implement a first stage of treatment, or decontamination, of gas stream 134 (and, hence, of the gases of inlet gas stream 106) in an appropriate ammonia (NH 3 ) and water vapor environment (H 2 0) (i.e., created by the introduction of ammonia (NH 3 ) and water vapor (H 2 O) into the gases of the inlet gas stream 106 in the first chamber 102) at a pressure near atmospheric pressure by gas discharge such that a substantial portion of the sulfur dioxide (S0 2 ) and a small portion of the nitrogen oxides (NO x ) are removed from the gases of gas stream 134.
  • an appropriate ammonia NH 3
  • water vapor environment H 2 0
  • S0 2 sulfur dioxide
  • NO x nitrogen oxides
  • the second chamber 130 includes a plurality of electrodes 136 extending therewithin (i.e., described in more detail below with respect to Figs. 2, 3, and 4) that are electrically connected to a high-voltage power supply 138 by high-voltage cables 140.
  • the electrodes 136 are operable to induce gas discharge of the gases of gas stream 134 therebetween.
  • the high-voltage power supply 138 is configured to produce an appropriate amount of power for consumption by the electrodes 136 and may comprise a direct current (DC), pulse, or radio frequency (RF) power supply.
  • the second chamber 130 generally, comprises a vessel or tank-like structure through which the gases of gas stream 134 (and, hence, of the inlet gas stream 106) flow and are treated at near atmospheric pressure.
  • the second chamber 134 comprises a vessel or tank-like structure having a volume of several cubic meters to several tens of cubic meters. Also generally, the electrodes 136 may have a distance therebetween of up to tens of centimeters.
  • the stack gas decontamination system 100 comprises a first particle accelerator 150 that is connected to the second chamber 130, via waveguide 152, at an appropriate location. The first particle accelerator 150 is operable to "light" (e.g., excite and maintain) the gas discharge between the electrodes 136 that are powered by high-voltage power supply 138.
  • the first particle accelerator 150 supports the non-self-maintained gas discharge between the electrodes 136 by irradiating the gases of gas stream 134 (and, hence, of the inlet gas stream 106) to cause preliminary ionization of the gases. Due to such irradiation and preliminary ionization, the gas discharge between the electrodes 136 is not only made possible, but is made more stable and uniform.
  • the first particle accelerator 150 comprises an electron accelerator that is operable to produce a low-power electron beam and to direct the electron beam, via waveguide 152, into the gas between electrodes 136. More specifically, the first particle accelerator 150 may comprise a pulsed RF electron accelerator. It should be noted, however, that the gas discharge receives most of its energy from high-voltage power supply 138 and not from particle accelerator 150. It should be also noted that while the present invention has been described herein as being embodied with a first particle accelerator 150 comprising an electron accelerator, the scope of the present invention includes the use of a first particle accelerator 150 of a different type and more than particle accelerator in lieu of the first particle accelerator 150.
  • the stack gas decontamination system 100 as illustrated in Fig. 1, further comprises a third chamber 160 and a second particle accelerator 162.
  • the third chamber 160 is connected to the second chamber 130 by a connecting duct 164 that directs the gases treated in the second chamber 130 into the third chamber 160 as a gas stream 166 that includes ammonia (NH 3 ) and water vapor (H 2 0), and amounts, or concentrations, of sulfur dioxide (S0 2 ) and nitrogen oxides (NO x ) that are reduced in comparison to the amounts, or concentrations, of sulfur dioxide (S0 2 ) and nitrogen oxides (NO x ) present in the gases of gas stream 134 leaving the first chamber 102.
  • NH 3 ammonia
  • H 2 0 water vapor
  • NO x nitrogen oxides
  • the third chamber 160 is configured to receive the gases of gas stream 166 and to implement a second stage of processing, treatment, or decontamination, on the gases of gas stream 166 (and, hence, of the gases of inlet gas stream 106) in an appropriate ammonia (NH 3 ) and water vapor environment (H 2 0) (i.e., created by the introduction of ammonia (NH 3 ) and water vapor (H 2 0) into the gases of the inlet gas stream 106 in the first chamber 102) at a pressure near atmospheric pressure via ion-molecular reactions that are initiated and maintained by irradiation of the gases by an electron beam of accelerated electrons produced by the second particle accelerator 162 and delivered to the third chamber 160 by waveguide 168 attached thereto.
  • NH 3 ammonia
  • H 2 0 water vapor environment
  • the second particle accelerator 162 comprises a direct current (DC) electron accelerator that is operable to irradiate the gases of gas stream 166 with an electron beam.
  • DC direct current
  • the present invention has been described herein as being embodied with a single, direct current, second particle accelerator 162, the scope of the present invention includes the use of a second particle accelerator 162 of a different type and the use of multiple particle accelerators in lieu of a single, second particle accelerator 162.
  • the third chamber 160 is connected to an exit duct 170 that is configured to direct the flow of gases treated, or decontaminated, in the third chamber 160 as an exit gas stream 172 to the atmosphere or to a device that is not part of the stack gas decontamination system 100.
  • the gases present in exit gas stream 172 include an amount, or concentration, of nitrogen oxides (NO x ) that has been substantially reduced and an amount, or concentration, of sulfur dioxide (S0 2 ) that has been further reduced, by the ion-molecular reactions that occur in the third chamber 160 during operation of the stack gas decontamination system 100.
  • Fig. 2 displays a front, elevational, schematic view of the second chamber 130 of the. stack gas decontamination system 100 in accordance with the exemplary embodiment of the present invention.
  • the second chamber 130 has a first side 200 and an opposed second side 202, and has a top 204 and an opposed bottom 206.
  • the first and second sides 200, 202 define a longitudinal axis 208 extending therebetween.
  • the electrodes 136 are, generally, elongated and are positioned within the second chamber 130 such that the longest dimension of the electrodes 136 extends in a direction substantially parallel to the longitudinal axis 208 of the second chamber 130 (and, hence, in a direction substantially parallel to the direction of flow of gas stream 134 past the electrodes 136).
  • the second chamber 130 is configured so that gas stream 134 is received by the second chamber 130, via connecting duct 132, through an opening at the first side 200 thereof and exits the second chamber 130 as gas stream 166, via connecting duct 164, through an opening at the second side 202 thereof.
  • the gases of gas stream 134 flow adjacent to and between the electrodes 136 in a direction substantially parallel to the longitudinal axis 208 of the second chamber 130.
  • the gases of gas stream 134 are irradiated by electrons of an electron beam emitted from the first particle accelerator 150 and delivered to the second chamber 130 via a waveguide 152.
  • the electrons of the electron beam as illustrated in Fig.
  • FIG. 3 displays a side, elevational, schematic view of the second chamber 130 of the stack gas decontamination system 100, according to the exemplary embodiment of the present invention, illustrating a first configuration of a plurality of electrodes 136 therein.
  • each electrode 136 comprises a substantially planar plate oriented such that its shorter dimension extends, generally, between the second chamber's top and bottom 204, 206 in a direction, generally, perpendicular to the second chamber's longitudinal axis 208.
  • Electrons of the electron beam are emitted into the gases present between the electrodes 136, thereby lighting the gas discharge between the electrodes 136.
  • Such electrodes 136 are often referred to as "flat tip high-voltage electrodes”.
  • Fig. 4 displays a side, elevational, schematic view of the second chamber 130 of the stack gas decontamination system 100, according to the exemplary embodiment of the present invention, but illustrating a second configuration of a. plurality of electrodes 136 therein.
  • the plurality of electrodes 136 includes a plurality of first electrodes 136 A and a plurality of second electrodes 136 ⁇ .
  • the electrodes 136 are arranged in adjacent columns 212 of electrodes 136 with electrodes 136 in odd-numbered columns 212A comprising first electrodes 136A and with electrodes 136 in even- numbered columns 212B comprising second electrodes 136 ⁇ .
  • Each first electrode 136A comprises a substantially planar plate oriented such that its shorter dimension extends, generally, between the second chamber's top and bottom 204, 206 in a direction, generally, perpendicular to the second chamber's longitudinal axis 208.
  • first electrodes 136 A comprise flat tip high- voltage electrodes described above with respect to Fig. 3.
  • Each even-numbered column 212 B comprises multiple second electrodes 136B arranged such that each second electrode 136B extends in a direction substantially parallel to the second chamber's longitudinal axis 208 and is separated by a gap 214 from another second electrode 136B of the even-numbered column 212 B .
  • second electrodes 136B comprise core, or wire, electrodes. Electrons of the electron beam, as illustrated in Fig. 4 by arrows 210, are emitted into the gases present between the columns 212 of electrodes 136, thereby lighting the gas discharge between the electrodes 136.
  • electrodes 136 in either the first or second configuration thereof, may also include coaxial cylinders and may include various combinations of flat plate, coaxial cylinder, and rod (e.g., wire) electrodes. It should also be understood that the polarity of the voltages applied to the electrodes 136 may be alternated.
  • the first chamber 102 of the stack gas decontamination system 100 receives all, or a portion, of the gases (including, without limitation, sulfur dioxide (S0 2 ) and nitrogen oxides (NO x )), traveling through a stack, or other conduit, of an industrial enterprise or facility via inlet duct 104 as inlet gas stream 106.
  • the flow rate of inlet gas stream 106 may be up to 10 6 cubic meters/hour.
  • Inlet duct 104 directs the inlet gas stream 106 into the first chamber 102 where ammonia (NH3) from ammonia source 108 is mixed into the gases of the inlet gas stream 106.
  • NH3 ammonia
  • water (H 2 0) from water source 116 is sprayed into the gases of the inlet gas stream 106 by sprayer 112, thereby adding water vapor to the gases of the inlet gas stream 106 and cooling the gases for further processing.
  • the inlet gas stream 106 exits the first chamber 102 and flows into the second chamber 130, via connecting duct 132, as gas stream 134.
  • Gas stream 134 is then processed in a first stage of processing, treatment, or decontamination, therein by applying high- voltage power from high-voltage power supply 138 to electrodes 136 of the second chamber 130.
  • the voltage between electrodes 136 should not, however, exceed 100-200 kV.
  • the gases of gas stream 134 present between the electrodes 136 are irradiated with an electron beam of accelerated electrons emitted by the first particle accelerator 150 and delivered to the second chamber 130 by waveguide 152.
  • the energy of the accelerated electrons lights the gas discharge between the electrodes 136 such that the preliminary ionization of the gases between the electrodes 136 in conjunction with the high-voltage power provided to the electrodes 136 produces a stable, uniform gas discharge therebetween instead of an, otherwise, non-self maintained gas discharge that may occur in the absence of an electron beam of accelerated electrons.
  • the preliminary ionization and uniform gas discharge reduce the amounts, or concentrations, of sulfur dioxide (S0 2 ) and nitrogen oxides (NO x ) (and volatile organic compounds (VOCs), if any) present in the gases of gas stream 134 such that the gases of gas stream 166 exiting the second chamber 130 include 5-10% of the sulfur dioxide (S0 2 ) and 80-95% of the nitrogen oxides (NO x ) present in the gases of gas stream 134.
  • ammonia (NH3) and water (H 2 0) create a moist, ammonia-laden environment having a pressure of approximately atmospheric pressure.
  • gases of gas stream 166 once inside and while flowing through the third chamber 160, are irradiated by an electron beam of accelerated electrons produced by the second particle accelerator 162 and delivered to the third chamber 160 by waveguide 168.
  • the energy of the accelerated electrons initiates and maintains ion-molecular reactions within the third chamber 160 that further reduce the amounts, or concentrations, of sulfur dioxide (SO2) and nitrogen oxides (NO x ) (and volatile organic compounds (VOCs), if any) present in the gases of gas stream 166.
  • SO2 sulfur dioxide
  • NO x nitrogen oxides
  • VOCs volatile organic compounds
  • the gases of exit gas stream 172 include 2-8% of the sulfur dioxide (S0 2 ) and 15-35% of the nitrogen oxides (NO x ) present in the gases of gas stream 134.
  • the majority of the sulfur dioxide (SO2) in such gases is removed in the first stage prior to the removal of the nitrogen oxides (NO x ) in the second stage, thereby reducing the energy requirements for such removal of nitrogen oxides (NO x ).

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Abstract

La présente invention se rapporte à un système permettant d'éliminer du dioxyde de soufre (SO2) et des oxydes d'azote (NOx) des gaz contenus dans un flux gazeux, par l'irradiation desdits gaz au moyen d'un accélérateur de particules, en combinaison avec une décharge gazeuse. Le système selon l'invention traite les gaz, lors d'une première étape, à l'aide d'une décharge gazeuse allumée par un premier faisceau d'électrons issu d'un premier accélérateur de particules et, lors d'une seconde étape, à l'aide d'un second faisceau d'électrons issu d'un second accélérateur de particules. Un tel allumage des gaz entre des électrodes alimentées en courant et l'ionisation préliminaire des gaz permet de maintenir, au cours de la première étape, une décharge gazeuse uniforme et stable dans un environnement riche en ammoniac à une pression proche de la pression atmosphérique, ce qui permet de réduire sensiblement la quantité de dioxyde de soufre (SO2) présente dans les gaz. La réduction sensible de la quantité de dioxyde de soufre (SO2) lors de la première étape permet de réduire considérablement l'énergie nécessaire à l'élimination d'une quantité substantielle d'oxydes d'azote (NOx) au cours de la seconde étape.
PCT/US2004/029057 2003-09-04 2004-09-03 Processus en deux etapes de decontamination de gaz de combustion d'entreprises industrielles, par irradiation par faisceau d'electrons et traitement par decharge gazeuse WO2005023415A1 (fr)

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US50017803P 2003-09-04 2003-09-04
US60/500,178 2003-09-04

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4071334A (en) * 1974-08-29 1978-01-31 Maxwell Laboratories, Inc. Method and apparatus for precipitating particles from a gaseous effluent
US4752450A (en) * 1985-07-11 1988-06-21 Leybold-Heraeus Gmbh Apparatus for cleaning sulphur and nitrogen containing flue gas
US6623705B2 (en) * 2000-06-20 2003-09-23 Advanced Electron Beams, Inc. Gas conversion system

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4071334A (en) * 1974-08-29 1978-01-31 Maxwell Laboratories, Inc. Method and apparatus for precipitating particles from a gaseous effluent
US4752450A (en) * 1985-07-11 1988-06-21 Leybold-Heraeus Gmbh Apparatus for cleaning sulphur and nitrogen containing flue gas
US6623705B2 (en) * 2000-06-20 2003-09-23 Advanced Electron Beams, Inc. Gas conversion system

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Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

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Designated state(s): GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
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Free format text: NOTING OF LOSS OF RIGHTS PURSUANT TO RULE 69(1) EPC (EPO FORM 1205A DATED 01.06.06)

122 Ep: pct application non-entry in european phase