WO2005019918A1

WO2005019918A1 - A color filter sheet structure and method thereof

Info

Publication number: WO2005019918A1
Application number: PCT/CN2003/000704
Authority: WO
Inventors: Po-Chieh Chen; Jui-Lung Hung; Chi-Hsien Sung; Nai-Yi Jan; Ming-Pang Lia
Original assignee: Quanta Display Inc.; Quanta Display Japan Inc.
Priority date: 2003-08-21
Filing date: 2003-08-21
Publication date: 2005-03-03
Also published as: AU2003255129A1

Abstract

A color filter sheet structure mainly comprises of a substrate, a black matrix and a plurality layers of color films. In the structure, the black matrix is provided on the substrate, and defines many spaces from which the substrate surface is discovered. The color films are respectively provided into the spaces of the black matrix, and have an overlapping area with the black matrix. The overlapping width is a 0.6.0µm, the overlap thick b is 0.1.0µm. Moreover, thick c of said color films, for example, is larger than or equal to the thick d of the black matrix. During fabrication of color filter according to the present invention, a flat layer for required flatness becomes not necessary.

Description

Color filter and manufacturing method thereof

The present invention relates to a color filter (C / F) and a manufacturing method thereof, and in particular, to a color filter capable of improving edge edge color unevenness (Edge Mura) and its Production Method.

Background technique

In response to the rapid progress of the multimedia society, most of them have benefited from the rapid progress of semiconductor components or human-machine display devices. As far as displays are concerned, cathode ray tubes (CRT) have been dominating the display market in recent years due to their excellent display quality and economy. However, for the environment where individuals operate most terminals / display devices on the table, or cut in from the perspective of environmental protection, if the trend of energy saving is predicted, there are still many problems in cathode ray tubes due to space utilization and energy consumption, and The demand for light, thin, short, small, and low power consumption does not provide effective solutions. Therefore, Thin Film Transistor Liquid Crystal Display (TFT LCD) with superior characteristics such as high picture quality, increased space utilization efficiency, low power consumption, and no radiation has gradually become the mainstream of the market.

At present, all liquid crystal displays are developing in the direction of full color, large size, high resolution, and low cost. Therefore, liquid crystal displays must use color filters to obtain the effect of color display. The color filter is usually structured on a transparent glass substrate. The transparent glass substrate is configured with a black matrix (Black Matrix, BM) for transmitting light, and a red film layer, a green film layer, and a blue film corresponding to each pixel arrangement. The color film layer will be described in detail below with respect to the structure of the color filter.

FIG. 1 is a schematic structural diagram of a known color filter. Referring to FIG. 1, a known color filter 100 is mainly composed of a substrate 102, a black matrix 104, a plurality of color film layers 108, a flat layer 110 and a common electrode 112. The black matrix 104 is disposed on the surface 102a of the substrate 102, and the black matrix 104 has a plurality of grid points 106 to The surface 102a of the substrate 102 is exposed. The color film layer 108 (red, green, blue) is arranged in the grid points 106 of the black matrix 104. It is worth noting that the flat layer 110 is disposed on the color film layer 108 and the black matrix 104, and the common electrode 112 is disposed on the flat surface provided by the flat layer 110.

FIG. 2 is a block diagram illustrating a manufacturing process of a known color light sheet. Please refer to FIG. 1 and FIG. 2 at the same time. The known color filter 100 includes the following steps in manufacturing: First, a substrate 102 is provided. The substrate 102 is usually a glass substrate, a plastic substrate, an acrylic substrate, or other transparent substrates. (S120). Next, the color film layer 108 and the black matrix 104 are formed on the substrate 102, and the width a of the color film layer 108 and the black matrix 104 overlapping is controlled to be greater than 10 micrometers, and the color film layer 108 and the black matrix 104 are overlapped. The thickness b is controlled between 1.2 microns and 1.6 microns (S130)

Please refer to FIG. 1 and FIG. 2 as well. As the above design rule often causes the thickness of the color film layer 108 and the black matrix 104 to be too thick, a spacer is placed in the liquid crystal cell to maintain the cell spacing. The color film layer 108 and the black matrix 104 overlap each other, so that the cell gaps of the liquid crystal cells (LC cells) are inconsistent, and the color of the frame edges of the liquid crystal display is uneven. Therefore, the known technology usually first forms a flat layer 110 on the color film layer 108 and the black matrix 104 (S140), and then forms a common electrode 112 on the flat layer 110 (S150) to avoid the above-mentioned uneven color of the frame edges. problem.

In the known color filter structure, a flat layer must be used to solve the problem of uneven color of the frame edges, but the production of the flat layer will make it impossible to further reduce the process cost.

Summary of the invention

Therefore, an object of the present invention is to provide a color filter structure capable of improving edge color unevenness (Edge Mura).

Yet another object of the present invention is to provide a color filter manufacturing process capable of improving edge color unevenness (Edge Mura).

To achieve the above object, the present invention provides a color filter structure, which is mainly composed of a substrate, a black matrix, and a plurality of color film layers. The black matrix is arranged on the substrate. In the above, the black matrix has a plurality of grid points exposing the surface of the substrate, and the color film layers are respectively arranged in the grid points of the black matrix. The width a of the color film layer overlapping the black matrix is between 0 and 6.0 microns, and the thickness b of the color film layer overlapping the black matrix is between 0 and 1.0 microns. In addition, the thickness c of the color film layer is, for example, greater than or equal to the thickness of the black matrix. In a preferred embodiment of the present invention, the substrate is a transparent substrate such as a glass substrate, a plastic substrate, or an acrylic substrate.

In a preferred embodiment of the present invention, the material of the black matrix is, for example, a light-shielding resin such as a light-shielding resin or a chrome metal.

In a preferred embodiment of the present invention, the color film layer includes, for example, a red film layer, a green film layer, and a blue film layer, and the arrangement of the red film layer, the green film layer, and the blue film layer is, for example, a mosaic arrangement ( Mosaic type), stripe type, four pixels type, and triangle type.

The color filter structure of the present invention further includes a common electrode directly fabricated on the black matrix and the color film layer, and the material of the common electrode is, for example, indium tin oxide (ΠΌ), indium zinc oxide.物（ΙΖΟ) and other transparent conductive materials.

To achieve the above object, the present invention provides a color filter manufacturing process, which includes the following steps: (a) providing a substrate; (b) forming a black matrix and a plurality of color film layers on the substrate, and controlling the color film layers and The width of the black matrix overlap is a, and the thickness of the color film layer and the black matrix overlap is b, so that it satisfies the conditions of a = 0 ~ 6.0 microns and b = 0 ~ 1.0 microns; and (c) directly forming a common electrode On the black matrix and color film.

To achieve the above object, the present invention provides a color filter manufacturing process, which includes the following steps: (a) providing a substrate; (b) forming a black matrix and a plurality of color film layers on the substrate, and controlling the color film layers and The width of the black matrix overlap is a, the thickness of the color film layer and the black matrix overlap is b, the thickness of the color film layer is c, and the thickness of the black matrix is d. ~ 1.0 micron, cd condition; and (c) forming a common electrode on the black matrix and the color film layer. Since the present invention controls the width and thickness of the overlapping portion between the color film layer and the black matrix within an appropriate range (the width is between 0 and 6.0 microns, and the thickness is between 0 and 1.0 microns), the present invention can be effective Avoid edge mura caused by excessive coating thickness differences.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic structural diagram of a known color filter;

2 is a block diagram of a manufacturing process of a known color filter;

3 is a schematic structural diagram of a color filter according to a preferred embodiment of the present invention; FIG. 4 is a block diagram of a manufacturing process of the color filter according to a preferred embodiment of the present invention; and

FIG. 5 is a block diagram illustrating a manufacturing process of a color filter according to another preferred embodiment of the present invention.

Schematic description

100, 200: color filter

102, 202: Substrate

102a> 202a: Surface

104, 204: Black matrix

106, 206: grid points

108, 208: Color film layer

110: Flat layer

112, 210: common electrode

In order to make the above and other objects, features, and advantages of the present invention more comprehensible, a preferred embodiment is given below, and in conjunction with the accompanying drawings, the detailed description is as follows:

detailed description

FIG. 3 is a schematic structural diagram of a color filter according to a preferred embodiment of the present invention. Referring to FIG. 3, the color filter 200 of this embodiment is mainly composed of a substrate 202, a black matrix 204, a plurality of color film layers 208, and a common electrode 210. Of which black The matrix 204 is disposed on the surface 202 a of the substrate 202, and the black matrix 204 has a plurality of lattice points 206 to expose the surface 202 a of the substrate 202. The color film layer 208 (red, green, and blue) is arranged in the grid points 206 of the black matrix 204. It is worth noting that the color filter of this embodiment does not require a flat layer for planarization, and the common electrode 210 is directly disposed on the black matrix 204 and the color film layer 208.

Similarly, referring to FIG. 3, the substrate 202 is a transparent substrate such as a glass substrate, a plastic substrate, or an acrylic substrate. The material of the black matrix 204 is, for example, a light-shielding resin made of acrylic acid, or a light-shielding metal such as a metal. The color film layer 208 includes, for example, a red film layer, a green film layer, and a blue film layer, and the arrangement of the red film layer, the green film layer, and the blue film layer is, for example, a mosaic arrangement, a stripe arrangement. (Stripe type), four pixels type, and triangle type. In addition, the material of the common electrode in this embodiment is, for example, a transparent conductive material such as indium tin oxide (ατο), indium zinc oxide (ιζο).

FIG. 4 is a block diagram illustrating a manufacturing process of a color filter according to a preferred embodiment of the present invention. First, please refer to FIG. 3 and FIG. 4 at the same time. The color filter 200 of this embodiment includes the following steps in manufacturing: First, a substrate 202 (S300) is provided. O Then, a color film layer 208 and a black matrix 204 are formed on the substrate 202. At the same time, the width a of the color film layer 208 and the black matrix 204 overlapping is controlled between 6.0 micrometers of 0 micrometers, and the thickness b of the color film layer 108 and the black matrix 104 overlapping is controlled between 0 micrometers and 1.0 micrometers. (S310).

Please refer to FIG. 3 and FIG. 4 as well. Since this embodiment limits the overlap width a to 6.0 μm from 0 μm and limits the overlap thickness to 1.0 μm from 0 μm, the color film layer 208 and black The thickness at the overlap of the matrix 204 will not be too thick, and therefore there will be no problem of uneven color of the frame edges caused by the inconsistent cell gap. From the above, it can be known that the thickness of each coating layer (color film layer 208 and black matrix 204) of the present invention will not be too thick, so the common electrode 210 can be directly formed on the color film layer 208 and black matrix 204 ( S320), the production of the color filter 200 is completed. FIG. 5 is a block diagram illustrating a manufacturing process of a color filter according to another preferred embodiment of the present invention. Please refer to FIG. 3 to FIG. 5 at the same time. The manufacturing process of this embodiment is similar to that of FIG. 4 except that the difference is that the width a of the color film layer 208 and the black matrix 204 overlaps and In addition to limiting the overlapping thickness b, this embodiment further defines whether the thickness c of the color film layer 208 is greater than or equal to the thickness d of the black matrix 204.

Next, please refer to Table 1. This table lists the comparison of various parameters between the known thin film transistor liquid crystal display (TFT-LCD) and the thin film transistor liquid crystal display of the present invention after sampling at 140 sampling points. Among them, the known thin film transistor liquid crystal display uses the color filter shown in FIG. 1, and the thin film transistor liquid crystal display of the present invention uses the color filter shown in FIG.

Known technology

Cavity spacing difference (R = dmax— dmin) 0.593 micron 0.241 micron standard deviation (Std. Dev) 0.126 0.050

Sampling points (n) 140 140

CV value (standard deviation / mean) 2.61 1.165

Table I

As can be seen from Table 1, the degree of flattening of the pitch of the color filter of the present invention is very good, regardless of the difference in cell spacing between each sampling point (R = dmax-dmin), standard deviation (Std. Dev) and CV values Both are smaller than the data of the known technology, and the data of various aspects show that the uniformity of the color filter of the present invention in film thickness is better than that of the known technology.

In summary, the color filter structure and the process of the present invention have at least the following advantages:

1. The present invention controls the width and thickness of the overlapping portion between the color film layer and the black matrix within an appropriate range (the width is between 0 and 6.0 microns, and the thickness is between 0 and 1.0 microns). Uneven color of the frame edges caused by excessive layer thickness differences.

2. The present invention controls the width and thickness of the overlapping portion between the color film layer and the black matrix within an appropriate range (the width is between 0 and 6.0 microns, and the thickness is between 0 and 1.0 microns Time), and control the thickness of the color film layer to be greater than or equal to the thickness of the black matrix, which can avoid the uneven color of the frame edges caused by the large difference in coating thickness.

3. The present invention does not need to manufacture a flat layer above the color film layer and the black matrix to achieve the required flatness, which simplifies the manufacturing method of the color filter.

Although the present invention has been disclosed as above with a preferred embodiment, it is not intended to limit the present invention. Any person skilled in the art can make some modifications and decorations without departing from the spirit and scope of the present invention. The scope of protection of the present invention shall be determined by the scope of the attached patent application.

Claims

1. A color filter, including:

A substrate

A black matrix disposed on the substrate, wherein the black matrix has a plurality of grid points exposing the surface of the substrate; and

A plurality of color film layers are arranged in the grid point, wherein the width of the color film layer overlapping the black matrix is a, the thickness of the color film layer overlapping the black matrix is b, and a = 0 to 6.0 Microns, b = 0 to 1.0 microns.

2. The color filter according to claim 1, wherein the thickness of the color film layer is c, and the thickness of the black matrix is d, and the condition of c ^ d is satisfied.

3. The color filter according to claim 1, wherein the substrate is a transparent substrate.

4. The color filter according to claim 1, wherein a material of the black matrix comprises a light-shielding resin.

5. The color filter according to claim 1, wherein a material of the black matrix comprises chrome metal.

6. The color filter according to claim 1, wherein the color film layer comprises:

Several red film layers;

Several green coatings; and

Several blue films.

7. The color filter according to claim 6, wherein the arrangement of the red film layer, the green film layer, and the blue film layer comprises a mosaic arrangement, a stripe arrangement, and a four-pixel arrangement. One of a permutation and a triangular permutation.

8. The color filter according to claim 1, further comprising a common electrode, wherein the common electrode is disposed on the black matrix and the color film layer.

9. The color filter according to claim 1, wherein a material of the common electrode comprises one of indium tin oxide and indium zinc oxide.

10. A method for manufacturing a color filter, comprising the following steps-providing a substrate;

A black matrix and a plurality of color film layers are formed on the substrate, and the width of the color film layer and the black matrix overlapping is controlled to be a, and the thickness of the color film layer and the black matrix overlapping is b, and it is satisfied that a = 0 to 6.0 microns, b to 0 to 1.0 microns; and

A common electrode is formed on the black matrix and the color film layer.

11. A method for manufacturing a color filter, including the following steps:

Providing a substrate;

Forming a black matrix and a plurality of color film layers on the substrate, and controlling the width of the color film layer overlapping the black matrix to be a, the thickness of the color film layer overlapping the black matrix to be b, and the color film The thickness of the layer is c, and the thickness of the black matrix is d, so that it satisfies the conditions of a = 0 to 6.0 microns, b = 0 to 1.0 microns, and c ^ d; and

A common electrode is formed on the black matrix and the color film layer.