WO2005005832A1 - Cryopump - Google Patents

Cryopump Download PDF

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Publication number
WO2005005832A1
WO2005005832A1 PCT/EP2004/006774 EP2004006774W WO2005005832A1 WO 2005005832 A1 WO2005005832 A1 WO 2005005832A1 EP 2004006774 W EP2004006774 W EP 2004006774W WO 2005005832 A1 WO2005005832 A1 WO 2005005832A1
Authority
WO
WIPO (PCT)
Prior art keywords
screen
gas inlet
pump
inlet opening
cryopump
Prior art date
Application number
PCT/EP2004/006774
Other languages
German (de)
French (fr)
Inventor
Gerhard Wilhelm Walter
Dirk Schiller
Karl Ossege
Hans Wischott
Original Assignee
Leybold Vakuum Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Vakuum Gmbh filed Critical Leybold Vakuum Gmbh
Publication of WO2005005832A1 publication Critical patent/WO2005005832A1/en

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/06—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means
    • F04B37/08—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means by condensing or freezing, e.g. cryogenic pumps
    • F04B37/085—Regeneration of cryo-pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/06—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means
    • F04B37/08—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means by condensing or freezing, e.g. cryogenic pumps

Definitions

  • the invention relates to a cryopump with a pump chamber with a gas inlet opening and a pump surface in the pump chamber that is cooled by a cold source.
  • Such a cryopump is known from DE-U-91 11 236.
  • the cryopump has three functional areas, namely a baffle, one or more pump surfaces and an adsorption device. All three areas are cooled by a cold source.
  • the baffle is located in the area of the gas inlet opening and is cooled to a temperature between 40 and 100 K.
  • the baffle is used to shield the pump room against incident heat radiation and for condensing easily condensable gases such as ' H 2 0 or C0 2 .
  • the pump surface in the pump room is cooled to a temperature of 5 to 20 K by the cold source.
  • the pump surface is used for the accumulation of non-light gases that can only be condensed at low temperatures, such as nitrogen, oxygen and argon, by cryocondensation.
  • the adsorption device is also arranged in the pump chamber and is also cooled to a temperature of 5 to 20 K by the cold source.
  • the adsorption device is used for the deposition of light gases by cryoadsorption, such as hydrogen, helium and neon.
  • An activated carbon coating on a carrier plate is used as the adsorption device, the carrier plate forming the pump surface on its other side, namely on the side closer to the gas inlet opening.
  • no non-light gases must reach the adsorption device, since non-light gases seal the adsorbent material coating on the carrier plate and thereby the. Prevent adsorption of light gases.
  • Known pumping surfaces are, for example, pot-shaped, the bottom of the pot facing the gas inlet opening.
  • the disadvantage here is that the pump surface at the edge of the pot base grows relatively quickly with condensate, so that the condensate hinders the gas flow past the pump surface to the adsorption device.
  • the object of the invention is therefore to improve the condensation for non-light gases and the adsorption for light gases in a cryopump. This object is achieved according to the invention with the features of claim 1.
  • the cryopump according to the invention has a pump surface screen which is convexly curved toward the gas inlet opening and is designed free of kinks and edges on its surface facing the gas inlet opening.
  • the screen can be designed in the shape of a half-barrel or a hood and preferably has no curvature of less than 5 mm radius of curvature on its surface facing the gas inlet opening.
  • the screen no longer has a larger area which is parallel to the plane of the gas inlet opening. Rather, the pump surface screen is curved, so that only the center of the screen is relatively close to the gas inlet opening and parallel to its plane of opening.
  • Condensate accumulates disproportionately quickly at the kinks and edges of a pump surface, so that the condensate grows faster in these areas and hinders the gas flow passing through the pump surface, which in turn hinders the adsorption of light gases, such as hydrogen, helium, etc., on the adsorption device.
  • light gases such as hydrogen, helium, etc.
  • the pump surface is heated and the accumulated condensate can slide down from the pump surface screen due to its own weight, since only a relatively small area of the screen lies in a horizontal plane. This ensures fast and reliable regeneration.
  • the pumping area screen preferably fills more than 20% of the area of the gas inlet opening, in particular more than 50%. This ensures that the largest possible proportion of the gas flow hits the pump surface, so that the largest possible proportion of non-light gases condenses on the adsorption surface screen and does not pass through it uncondensed.
  • the pump surface screen is preferably designed as a flattened half-barrel or hood. The edges of the semi-barrel-shaped or hood-shaped pump surface screen are preferably approximately parallel to the approximately vertical side wall of the pump chamber.
  • An adsorption device is preferably provided, which is formed by a carrier plate coated with adsorption material in the adsorption space enclosed by the screen.
  • the adsorption device is largely shielded from the pump surface shield from the gas inlet opening.
  • the adsorption device is therefore formed by a separate coated carrier plate and not by a rear coating of the pump surface screen. Due to the separate design of the adsorption device in the form of the carrier plate coated with adsorption material, the manufacture and assembly of the Adsorption device facilitated. Furthermore, the capacity for light gases such as hydrogen, helium and neon can be increased or adapted to the respective requirements.
  • the carrier plate is preferably arranged approximately perpendicular to the plane of the screen and lies with its side edge in a heat-conducting manner approximately perpendicular to the screen.
  • the carrier plate can rest on the pump surface shield with a portion of its side edge or with its entire side edge corresponding to the pump surface shield. This creates good heat conduction between the adsorption device carrier plate and the pump surface screen.
  • the adsorption device carrier plate essentially fills the cross section of the adsorption space encompassed by the pump surface screen. As a result, the largest possible adsorption area of the adsorption device is realized.
  • the adsorption device is formed by a plurality of parallel carrier plates coated with adsorption material.
  • the adsorption capacity can be increased to a multiple of the adsorption capacity of a single coated carrier plate and adapted to the requirements of the application in question.
  • the coated carrier plates are preferably held by a cross member, the cross member being attached to the screen and connected to the cold source.
  • the cold source is attached directly to the crossbar, so that a relatively low-resistance connection of the cold source to the carrier plates as well as with the pump surface screen.
  • the traverse is preferably approximately at right angles to the base plane of the carrier plates.
  • FIG. 1 is a cross section of a cryopump with a curved pump surface screen and coated adsorption device carrier plates
  • Fig. 2 shows the cryopump of Figure 1 in longitudinal section
  • FIG. 3 is an enlarged perspective view of the pumping surface screen and the adsorption device of the cryopump of FIG. 1.
  • a cryopump 10 is shown in FIGS. 1 to 3, which is used to generate high vacuum by gas condensation and adsorption.
  • the cryopump 10 essentially consists of an outer housing 12, a pump chamber radiation shield 14 arranged therein, a pump surface 16, an adsorption device 18 and a cold source 20.
  • the cold source 20 is a two-stage refrigerator, for example a Gifford-McMahon cooler.
  • the cold source 20 has a first stage 22 and a second stage 24.
  • the first cold source stage 22 is connected to the cup-shaped radiation shield Pumpraum- 14, 'which is upwardly open.
  • the opening of the pump chamber radiation shield 14 forms a gas inlet opening 26.
  • a baffle 28 is arranged in the gas inlet opening 26 and, together with the pump chamber radiation shield 14, delimits a pump chamber 30.
  • the second cold source stage 24 is connected mechanically and with good thermal conductivity to the adsorption device 18 and to the pump surface 16.
  • the cryopump 10 has three functional areas:
  • the first functional area serves to shield heat radiation from the outside.
  • the heat radiation shield is formed by the pump chamber radiation shield 14 and the baffle 28, which are cooled to approximately 25-100 K by the first cold source stage 22.
  • the second functional area is formed by the pump surface 16, which is essentially formed by a semi-barrel-shaped screen 17.
  • the pump surface screen 17 is convexly curved toward the gas inlet opening 26 and is approximately semi-cylindrical.
  • the pump surface screen 17 is formed on its entire surface facing the gas inlet opening 26 without kinks and edges.
  • the pump surface screen 17 can also be hood-shaped, wherein the hood shape can be spherical or non-spherical.
  • the pump surface 16 is cooled to approximately 10 K and is used for the condensation of non-light gases, such as nitrogen, oxygen and argon, which can only be condensed at lower temperatures.
  • the third functional area is formed by the adsorption device 18, which is also cooled to a temperature of approximately 10 K by the second cold source stage 24.
  • the adsorption device 18 serves to adsorb light gases such as hydrogen, helium and neon.
  • the adsorption device 18 is essentially formed by a plurality of carrier plates 34, each of which is coated on both sides with an adsorption material 36.
  • the adsorbent material 36 is activated carbon, which is glued to the carrier plate or is otherwise fastened to the carrier plate 34.
  • the carrier plates 34 are each connected to one another by an upper cross member 38 and by a lower cross member 40.
  • the carrier plates -34 are each held on the cross members 38, 40 by appropriate fastening means, for example by nuts on the cross member, so that the distance between the carrier plates is fixed to one another.
  • appropriate fastening means for example by nuts on the cross member, so that the distance between the carrier plates is fixed to one another.
  • the thermal connection from the second cold source stage 24 to the upper cross member 38 is established by two cold conducting pieces 42, 43, which are connected to one another with the second cold source stage 24, as well as to the upper cross member 38 by screws 44, 45.
  • the heat-conducting connection to the carrier plates 34 is established via the upper cross member 38.
  • the side plates of the support plates 34 each abut partially on the pump surface shield 17, so that a thermal bridge from the second cold source stage 24 to the pump surface shield 17 is hereby established.
  • Heaters which are not shown, are provided for the regeneration of the pump surface 16 or adsorption device 18 covered with gas condensate.
  • the growth of the gas condensate on the pump surface screen 17 takes place over the entire area without major jumps in the layer thickness of the gas condensate.
  • the areas of the gas inlet opening 26 which face more strongly.
  • Pump surface shield 17 accumulates faster and therefore a thicker gas condensate layer than the areas of the pump surface shield 17 facing the pump chamber radiation shield 14.
  • the protected arrangement of the adsorption device 18 within the pumping surface screen 17 prevents the condensation of non-light gases on the adsorption device, so that the adsorption capacity of the adsorption device 18 for light gases is not impaired.
  • the pump surface shield 17 has side edges at its longitudinal ends, these are only present on two sides of the pump surface shield and do not protrude from the pump surface shield in the direction of the gas inlet opening 26.
  • the pump surface screen 17 is designed free of kinks and edges. To avoid crystallization points, the two side edges of the pump surface screen 17 can also be directed downwards, i.e. be bent away from the gas inlet opening 26.
  • the condensate attached to the pump surface screen 17 can run downward, since approximately the entire outside of the pump surface screen 17 does not lie in a horizontal plane, but is more or less inclined downward.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Structures Of Non-Positive Displacement Pumps (AREA)

Abstract

The invention relates to a cryopump comprising a pumping chamber that is provided with a gas inlet port and a pumping area which is located in the pumping chamber and is chilled by means of a source of cold. The design of the pumping area is critical as said pumping area should be large while the condensate accumulating thereupon should restrict the gas flow that passes the pumping area as little as possible. According to the invention, the pumping area is embodied as a screen (17) that is convexly arched relative to the gas inlet port (26) and is configured without cracks and edges on the surface facing the gas inlet port (26). Crystallization points are avoided by preventing edges and cracks from forming. Curving the pumping area away from the gas inlet port prevents the cross section of the inlet from being clogged quickly by the accumulating gas condensate.

Description

Kryopumpe cryopump
Die Erfindung bezieht sich auf eine Kryopumpe mit einem Pumpraum mit einer Gaseinlassoffnung und einer durch eine Kältequelle gekühlten Pumpfläche in dem Pumpraum.The invention relates to a cryopump with a pump chamber with a gas inlet opening and a pump surface in the pump chamber that is cooled by a cold source.
Eine derartige Kryopumpe ist aus DE-U-91 11 236 bekannt. Die Kryopumpe weist drei Funktionsbereiche auf,, nämlich ein Baffle, eine oder mehrere Pumpflächen sowie eine Adsorptionsvorrichtung. Alle drei Bereiche werden durch eine Kältequelle gekühlt. Das Baffle liegt im Bereich der Gaseinlassoffnung und wird auf eine Temperatur zwischen 40 und 100 K gekühlt. Das Baffle dient der Abschirmung des Pumpraumes gegenüber einfallender Wärmestrahlung und zum Kondensieren von leicht kondensierbaren Gasen wie' z.B. H20 oder C02.Such a cryopump is known from DE-U-91 11 236. The cryopump has three functional areas, namely a baffle, one or more pump surfaces and an adsorption device. All three areas are cooled by a cold source. The baffle is located in the area of the gas inlet opening and is cooled to a temperature between 40 and 100 K. The baffle is used to shield the pump room against incident heat radiation and for condensing easily condensable gases such as ' H 2 0 or C0 2 .
Die Pumpfläche in dem Pumpraum wird durch die Kältequelle auf eine Temperatur von 5 bis 20 K gekühlt. Die Pumpfläche dient der Anlagerung von erst bei tiefen Temperaturen kondensierbaren nichtleichten Gasen durch Kryokondensation, wie beispielsweise von Stickstoff, Sauerstoff und Argon.The pump surface in the pump room is cooled to a temperature of 5 to 20 K by the cold source. The pump surface is used for the accumulation of non-light gases that can only be condensed at low temperatures, such as nitrogen, oxygen and argon, by cryocondensation.
Die Adsorptionsvorrichtung ist ebenfalls in dem Pumpraum angeordnet und wird durch die Kältequelle ebenfalls auf eine Temperatur von 5 bis 20 K gekühlt. Die Adsorptionsvorrichtung dient der Anlagerung von leichten Gasen durch Kryoadsorption, wie beispielsweise von Wasserstoff, Helium und Neon. Als Adsorptionsvorrichtung wird eine Aktivkohle-Beschichtung auf einer Trägerplatte verwendet, wobei die Trägerplatte auf ihrer anderen Seite, nämlich auf der der Gaseinlassoffnung näheren Seite, die Pumpfläche bildet. Um die Adsorptionsfähigkeit der Adsorptionsvorrichtung sicherzustellen, dürfen keine nichtleichten Gase an die Adsorptionsvorrichtung gelangen, da nichtleichte Gase die Adsorptionsmaterial-Beschichtung auf der Trägerplatte versiegeln und dort dadurch die. Adsorption leichter Gase verhindern. Bekannte Pumpflächen sind beispielsweise topfartig ausgebildet, wobei der Topfboden der Gaseinlassoffnung zugewandt ist. Nachteilig ist hierbei, dass die Pumpfläche an der Randkante des Topfbodens relativ schnell mit Kondensat zuwächst, so dass das Kondensat den Gasfluss an der Pumpfläche vorbei zu der Adsorptionsvorrichtung behindert.The adsorption device is also arranged in the pump chamber and is also cooled to a temperature of 5 to 20 K by the cold source. The adsorption device is used for the deposition of light gases by cryoadsorption, such as hydrogen, helium and neon. An activated carbon coating on a carrier plate is used as the adsorption device, the carrier plate forming the pump surface on its other side, namely on the side closer to the gas inlet opening. In order to ensure the adsorbability of the adsorption device, no non-light gases must reach the adsorption device, since non-light gases seal the adsorbent material coating on the carrier plate and thereby the. Prevent adsorption of light gases. Known pumping surfaces are, for example, pot-shaped, the bottom of the pot facing the gas inlet opening. The disadvantage here is that the pump surface at the edge of the pot base grows relatively quickly with condensate, so that the condensate hinders the gas flow past the pump surface to the adsorption device.
Aufgabe der Erfindung ist es daher, die Kondensation für nichtleichte Gase sowie die Adsorption für leichte Gase bei einer Kryopumpe zu verbessern. Diese Aufgabe wird erfindungsgemäß gelöst mit den Merkmalen des Anspruches 1.The object of the invention is therefore to improve the condensation for non-light gases and the adsorption for light gases in a cryopump. This object is achieved according to the invention with the features of claim 1.
Die erfindungsgemäße Kryopumpe weist einen zur Gaseinlassoffnung hin konvex gewölbten Pumpflächen-Schirm auf, der an seiner der Gaseinlassoffnung zugewandten Fläche knick- und kantenfrei ausgebildet ist. Der Schirm kann halbtonnenförmig oder haubenförmig gestaltet sein und weist vorzugsweise an seiner der Gaseinlassoffnung zugewandten Fläche keine Krümmung von weniger als 5 mm Krümmungsradius auf. Der Schirm weist keine größere Fläche mehr auf, die zur Ebene der Gaseinlassoffnung parallel ist. Vielmehr ist der Pumpflächen- Schirm gewölbt, so dass nur die Schirmmitte relativ nahe der Gaseinlassoffnung und parallel zu ihrer Öffnungsebene ist.The cryopump according to the invention has a pump surface screen which is convexly curved toward the gas inlet opening and is designed free of kinks and edges on its surface facing the gas inlet opening. The screen can be designed in the shape of a half-barrel or a hood and preferably has no curvature of less than 5 mm radius of curvature on its surface facing the gas inlet opening. The screen no longer has a larger area which is parallel to the plane of the gas inlet opening. Rather, the pump surface screen is curved, so that only the center of the screen is relatively close to the gas inlet opening and parallel to its plane of opening.
An Knicken und Kanten einer Pumpfläche lagert überproportional schnell Kondensat an, so dass in diesen Bereichen das Kondensat schneller wächst und den die Pumpfläche passierenden Gasstrom behindert, was wiederum die Adsorption leichter Gase, wie Wasserstoff, Helium, u.a. an der Adsorptionsvorrichtung behindert. Durch den Wegfall von Knicken oder Kanten an der Pumpfläche wird erreicht, dass auf dem Pumpflächen-Schirm eine relativ gleichmäßige Kondensatschicht wächst, die weitgehend frei von Kondensat-Wällen, -Inseln oder -Peaks ist. Da das Kondensat in den von der Gaseinlassoffnung entfernteren seitlichen Bereichen des Pumpflächen-Schirmes langsamer wächst als in den zentraleren Bereichen des Pumpflächen-Schirmes, die der Gaseinlassoffnung mehr zugewandt und näher sind, wird der Kondensataufbau auf die Bereiche des Pumpflächenschirmes konzentriert, die auch bei großen Kondensatdicken den Gasstrom an dem Pumpflächen-Schirm vorbei zur Adsorptionsvorrichtung nur relativ wenig behindern.Condensate accumulates disproportionately quickly at the kinks and edges of a pump surface, so that the condensate grows faster in these areas and hinders the gas flow passing through the pump surface, which in turn hinders the adsorption of light gases, such as hydrogen, helium, etc., on the adsorption device. By eliminating kinks or edges on the pump surface, it is achieved that a relatively uniform condensate layer grows on the pump surface screen, which is largely free of condensate walls, islands or peaks. Since the condensate grows more slowly in the side areas of the pumping area shield, which are more distant from the gas inlet opening, than in the more central areas of the pumping area screen, which face the gas inlet opening more closely and closer, the condensate build-up is concentrated on the areas of the pumping area screen, even in large areas Condensate thicknesses the gas flow hinder the pumping area screen to the adsorption device relatively little.
Bei der Regeneration wird die Pumpfläche erwärmt und das angesammelte Kondensat kann von dem Pumpflächen-Schirm durch sein Eigengewicht herabgleiten, da nur ein relativ kleiner Bereich des Schirmes in einer Horizontalebene liegt. Hierdurch wird eine schnelle und zuverlässige Regeneration sichergestellt.During the regeneration, the pump surface is heated and the accumulated condensate can slide down from the pump surface screen due to its own weight, since only a relatively small area of the screen lies in a horizontal plane. This ensures fast and reliable regeneration.
Vorzugsweise füllt der Pumpflächen-Schirm mehr als 20 % der Fläche der Gaseinlassoffnung aus, insbesondere mehr als 50 % . Hierdurch ist sichergestellt, dass ein größtmöglicher Anteil des Gasstromes auf die Pumpfläche stößt, so dass ein größtmöglicher Anteil nichtleichter Gase an dem Adsorptionsflächen- Schirm kondensiert und diesen nicht unkondensiert passiert. Der Pumpflächenschirm ist vorzugsweise als abgeflachte Halbtonne oder Haube ausgeformt. Die Ränder des halbtonnen- oder haubenförmigen Pumpflächen-Schirmes sind vorzugsweise annähernd parallel zur ungefähr senkrechten Seitenwand des Pumpraumes .The pumping area screen preferably fills more than 20% of the area of the gas inlet opening, in particular more than 50%. This ensures that the largest possible proportion of the gas flow hits the pump surface, so that the largest possible proportion of non-light gases condenses on the adsorption surface screen and does not pass through it uncondensed. The pump surface screen is preferably designed as a flattened half-barrel or hood. The edges of the semi-barrel-shaped or hood-shaped pump surface screen are preferably approximately parallel to the approximately vertical side wall of the pump chamber.
Vorzugsweise ist eine Adsorptionsvorrichtung vorgesehen, die von einer mit Adsorptionsmaterial beschichteten Trägerplatte in dem von dem Schirm umschlossenen Adsorptionsraum gebildet wird. Die Adsorptionsvorrichtung wird von dem Pumpflächen- Schirm gegenüber der Gaseinlassoffnung zum großen Teil abgeschirmt. Die Adsorptionsvorrichtung wird also von einer separaten beschichteten Trägerplatte gebildet und nicht von einer rückseitigen Beschichtung des Pumpflächen-Schirmes. Durch die separate Ausbildung der Adsorptionsvorrichtung in Form der mit Adsorptionsmaterial beschichteten Trägerplatte werden die Herstellung und die Montage der Adsorptionsvorrichtung erleichtert. Ferner kann die Kapazität für leichte Gase, wie Wasserstoff, Helium und Neon, vergrößert bzw. an den jeweiligen Bedarf konstruktiv angepasst werden.An adsorption device is preferably provided, which is formed by a carrier plate coated with adsorption material in the adsorption space enclosed by the screen. The adsorption device is largely shielded from the pump surface shield from the gas inlet opening. The adsorption device is therefore formed by a separate coated carrier plate and not by a rear coating of the pump surface screen. Due to the separate design of the adsorption device in the form of the carrier plate coated with adsorption material, the manufacture and assembly of the Adsorption device facilitated. Furthermore, the capacity for light gases such as hydrogen, helium and neon can be increased or adapted to the respective requirements.
Vorzugsweise ist die Trägerplatte annähernd senkrecht zur Schirmebene angeordnet und liegt mit ihrem Seitenrand wärmeleitend ungefähr senkrecht an dem Schirm an. Die Trägerplatte kann mit einem Abschnitt ihres Seitenrandes oder mit ihrem gesamten mit dem Pumpflächen-Schirm korrespondierenden Seitenrand an dem Pumpflächen-Schirm anliegen. Hierdurch wird eine gute Wärmeleitung zwischen der Adsorptionsvorrichtungs-Trägerplatte und dem Pumpflächen- Schirm geschaffen.The carrier plate is preferably arranged approximately perpendicular to the plane of the screen and lies with its side edge in a heat-conducting manner approximately perpendicular to the screen. The carrier plate can rest on the pump surface shield with a portion of its side edge or with its entire side edge corresponding to the pump surface shield. This creates good heat conduction between the adsorption device carrier plate and the pump surface screen.
Vorzugsweise füllt die Adsorptionsvorrichtungs-Trägerplatte den Querschnitt des von dem Pumpflächen-Schirm umfassten Adsorptionsraumes im Wesentlichen aus. Hierdurch wird eine größtmögliche Adsorptionsfläche der Adsorptionsvorrichtung realisiert.Preferably, the adsorption device carrier plate essentially fills the cross section of the adsorption space encompassed by the pump surface screen. As a result, the largest possible adsorption area of the adsorption device is realized.
Gemäß einer bevorzugten Ausgestaltung wird die Adsorptionsvorrichtung von mehreren parallelen mit Adsorptionsmaterial beschichteten Trägerplatten gebildet. Hierdurch kann das Adsorptionsvermögen auf ein vielfaches des Ädsorptionsvermögens einer einzigen beschichteten Trägerplatte erhöht und an den Bedarf der betreffenden Anwendung angepasst werden.According to a preferred embodiment, the adsorption device is formed by a plurality of parallel carrier plates coated with adsorption material. As a result, the adsorption capacity can be increased to a multiple of the adsorption capacity of a single coated carrier plate and adapted to the requirements of the application in question.
Vorzugsweise werden die beschichteten Trägerplatten von einer Traverse gehalten, wobei die Traverse an dem Schirm befestigt und mit der Kältequelle verbunden ist. Die Kältequelle ist unmittelbar an der Traverse befestigt, so dass eine relativ widerstandsarme Verbindung der Kältequelle mit den Trägerplatten sowie mit dem Pumpflächen-Schirm realisiert ist. Die Traverse steht vorzugsweise ungefähr rechtwinklig zur Grundebene der Trägerplatten.The coated carrier plates are preferably held by a cross member, the cross member being attached to the screen and connected to the cold source. The cold source is attached directly to the crossbar, so that a relatively low-resistance connection of the cold source to the carrier plates as well as with the pump surface screen. The traverse is preferably approximately at right angles to the base plane of the carrier plates.
Im Folgenden wird unter Bezugnahme auf die Zeichnungen ein Ausführungsbeispiel der Erfindung näher erläutert.An exemplary embodiment of the invention is explained in more detail below with reference to the drawings.
Es zeigen:Show it:
Fig. 1 eine Kryopumpe mit gewölbtem Pumpflächen-Schirm und beschichteten Adsorptionsvorrichtungs-Trägerplatten im Querschnitt,1 is a cross section of a cryopump with a curved pump surface screen and coated adsorption device carrier plates,
Fig. 2 die Kryopumpe der Figur 1 im Längsschnitt, undFig. 2 shows the cryopump of Figure 1 in longitudinal section, and
Fig. 3 eine vergrößerte perspektivische Darstellung des Pumpflächen-Schirmes sowie der Adsorptionsvorrichtung der Kryopumpe der Figur 1.3 is an enlarged perspective view of the pumping surface screen and the adsorption device of the cryopump of FIG. 1.
In den Figuren 1 bis 3 ist eine Kryopumpe 10 dargestellt, die der Erzeugung von Hochvakuum durch Gaskondensation und -adsorption dient. Die Kryopumpe 10 besteht im Wesentlichen aus einem äußeren Gehäuse 12, einem darin angeordneten Pumpraum-Strahlungsschirm 14, einer Pumpfläche 16, einer Adsorptionsvorrichtung 18 sowie einer Kältequelle 20.A cryopump 10 is shown in FIGS. 1 to 3, which is used to generate high vacuum by gas condensation and adsorption. The cryopump 10 essentially consists of an outer housing 12, a pump chamber radiation shield 14 arranged therein, a pump surface 16, an adsorption device 18 and a cold source 20.
Die Kältequelle 20 ist ein zweistufiger Refrigerator, beispielsweise ein Gifford-McMahon-Kühler. Die Kältequelle 20 weist eine erste Stufe 22 und eine zweite Stufe 24 auf. Die erste Kältequellen-Stufe 22 ist mit dem topfförmigen Pumpraum- Strahlungsschirm 14 verbunden,' der nach oben offen ausgebildet ist. Die Öffnung des Pumpraum-Strahlungsschirmes 14 bildet eine Gaseinlassoffnung 26. In der Gaseinlass-Öffnung 26 ist ein Baffle 28 angeordnet, das zusammen mit dem Pumpraum-Strahlungsschirm 14 einen Pumpraum 30 begrenzt. Die zweite Kältequellen-Stufe 24 ist mechanisch und gut wärmeleitend mit der Adsorptionsvorrichtung 18 sowie mit der Pumpfläche 16 verbunden.The cold source 20 is a two-stage refrigerator, for example a Gifford-McMahon cooler. The cold source 20 has a first stage 22 and a second stage 24. The first cold source stage 22 is connected to the cup-shaped radiation shield Pumpraum- 14, 'which is upwardly open. The opening of the pump chamber radiation shield 14 forms a gas inlet opening 26. A baffle 28 is arranged in the gas inlet opening 26 and, together with the pump chamber radiation shield 14, delimits a pump chamber 30. The second cold source stage 24 is connected mechanically and with good thermal conductivity to the adsorption device 18 and to the pump surface 16.
Die Kryopumpe 10 weist drei Funktionsbereiche auf:The cryopump 10 has three functional areas:
Der erste Funktionsbereich dient der Abschirmung der Wärmestrahlung von außen. Die Wärmestrahlungs-Abschirmung wird durch den Pumpraum-Strahlungsschirm 14 und das Baffle 28 gebildet, die durch die erste Kältequellen-Stufe 22 auf ca. 25 - 100 K gekühlt werden.The first functional area serves to shield heat radiation from the outside. The heat radiation shield is formed by the pump chamber radiation shield 14 and the baffle 28, which are cooled to approximately 25-100 K by the first cold source stage 22.
Der zweite Funktionsbereich wird von der Pumpfläche 16 gebildet, die im Wesentlichen von einem halbtonnenförmigen Schirm 17 gebildet wird. Der Pumpflächen-Schirm 17 ist zur Gaseinlassoffnung 26 hin konvex und annähernd halbzy- linderförmig gewölbt ausgebildet. Der Pumpflächen-Schirm 17 ist an seiner gesamten der- Gaseinlassoffnung 26 zugewandten Fläche knick- und kantenfrei ausgebildet. Grundsätzlich kann der Pumpflächen-Schirm 17 auch haubenförmig ausgebildet sein, wobei die Haubenform sphärisch oder auch nicht-sphärisch geformt sein kann. Die Pumpfläche 16 wird auf ungefähr 10 K gekühlt und dient der Kondensation von erst bei tieferen Temperaturen kondensierbaren nichtleichten Gasen, wie beispielsweise Stickstoff, Sauerstoff und Argon.The second functional area is formed by the pump surface 16, which is essentially formed by a semi-barrel-shaped screen 17. The pump surface screen 17 is convexly curved toward the gas inlet opening 26 and is approximately semi-cylindrical. The pump surface screen 17 is formed on its entire surface facing the gas inlet opening 26 without kinks and edges. In principle, the pump surface screen 17 can also be hood-shaped, wherein the hood shape can be spherical or non-spherical. The pump surface 16 is cooled to approximately 10 K and is used for the condensation of non-light gases, such as nitrogen, oxygen and argon, which can only be condensed at lower temperatures.
Der dritte Funktionsbereich wird durch die Adsorptionsvorrichtung 18 gebildet, die ebenfalls von der zweiten Kältequellen- Stufe 24 auf eine Temperatur von ungefähr 10 K gekühlt wird. Die Adsorptionsvorrichtung 18 dient der Adsorption leichter Gase, wie beispielsweise Wasserstoff, Helium und Neon. Die Adsorptionsvorrichtung 18 wird im Wesentlichen gebildet von mehreren Trägerplatten 34, die jeweils beidseitig mit einem Adsorptionsmaterial 36 beschichtet sind. Das Adsorptionsmaterial 36 ist Aktivkohle, die auf die Trägerplatte aufgeklebt ist oder auf andere Weise an der Trägerplatte 34 befestigt ist. Die Trägerplatten 34 sind durch eine obere Traverse 38 und durch eine untere Traverse 40 jeweils miteinander verbunden. Die Trägerplatten -34 werden an den Traversen 38,40 jeweils durch entsprechende Befestigungsmittel, beispielsweise durch Muttern an der Traverse gehalten, so dass der Abstand der Trägerplatten zueinander fest eingestellt ist. Durch die Abschirmung der Adsorptionsvorrichtung 18 durch den Schirm 17 wird diese vor Wärmestrahlung abgeschirmt.The third functional area is formed by the adsorption device 18, which is also cooled to a temperature of approximately 10 K by the second cold source stage 24. The adsorption device 18 serves to adsorb light gases such as hydrogen, helium and neon. The adsorption device 18 is essentially formed by a plurality of carrier plates 34, each of which is coated on both sides with an adsorption material 36. The adsorbent material 36 is activated carbon, which is glued to the carrier plate or is otherwise fastened to the carrier plate 34. The carrier plates 34 are each connected to one another by an upper cross member 38 and by a lower cross member 40. The carrier plates -34 are each held on the cross members 38, 40 by appropriate fastening means, for example by nuts on the cross member, so that the distance between the carrier plates is fixed to one another. By shielding the adsorption device 18 by the screen 17, the latter is shielded from heat radiation.
Die thermische Verbindung von der zweiten Kältequellen-Stufe 24 zu der oberen Traverse 38 wird durch zwei Kälteleitstücke 42,43 hergestellt, die mit der zweiten Kältequellen-Stufe 24, miteinander sowie mit der oberen Traverse 38 durch Schrauben 44,45 wärmeschlüssig miteinander verbunden sind. Über die obere Traverse 38 wird die wärmeleitende Verbindung zu den Trägerplatten 34 hergestellt. Die Trägerplatten 34 liegen mit ihren Seitenrändern jeweils teilweise an dem Pumpflächen- Schirm 17 an, so dass hierdurch eine Wärmebrücke von der zweiten Kältequellen-Stufe 24 zu dem Pumpflächen-Schirm 17 hergestellt ist.The thermal connection from the second cold source stage 24 to the upper cross member 38 is established by two cold conducting pieces 42, 43, which are connected to one another with the second cold source stage 24, as well as to the upper cross member 38 by screws 44, 45. The heat-conducting connection to the carrier plates 34 is established via the upper cross member 38. The side plates of the support plates 34 each abut partially on the pump surface shield 17, so that a thermal bridge from the second cold source stage 24 to the pump surface shield 17 is hereby established.
Zur Regeneration der mit Gaskondensat belegten Pumpfläche 16 bzw. Adsorptionsvorrichtung 18 sind Heizungen vorgesehen, die nicht dargestellt sind. Das Wachstum des Gaskondensates auf dem Pumpflächen-Schirm 17 erfolgt über die gesamte Fläche ohne größere Sprünge in der Schichtdicke des Gaskondensates. Die der Gaseinlassoffnung 26 stärker zugewandten Bereiche des . Pumpflächen-Schirmes 17 lagern schneller und dadurch eine dickere Gaskondensatschicht an, als die mehr dem Pumpraum-Strahlungsschirm 14 zugewandten Bereiche des Pumpflächen-Schirmes 17. Hierdurch wird ein zu schnelles Zuwachsen der Passage zwischen dem Pumpflächen- Schirm 17 und dem Pumpraum-Strahlungsschirm 14 vermieden. Durch die geschützte Anordnung der Adsorptionsvorrichtung 18 innerhalb des Pumpflächen-Schirmes 17 wird die Kondensation nichtleichter Gase an der Adsorptionsvorrichtung vermieden, so dass die Adsorptionsfähigkeit der Adsorptionsvorrichtung 18 für leichte Gase nicht verschlechtert wird.Heaters, which are not shown, are provided for the regeneration of the pump surface 16 or adsorption device 18 covered with gas condensate. The growth of the gas condensate on the pump surface screen 17 takes place over the entire area without major jumps in the layer thickness of the gas condensate. The areas of the gas inlet opening 26 which face more strongly. Pump surface shield 17 accumulates faster and therefore a thicker gas condensate layer than the areas of the pump surface shield 17 facing the pump chamber radiation shield 14. This prevents the passage between the pump surface shield 17 and the pump chamber radiation shield 14 from growing too quickly , The protected arrangement of the adsorption device 18 within the pumping surface screen 17 prevents the condensation of non-light gases on the adsorption device, so that the adsorption capacity of the adsorption device 18 for light gases is not impaired.
Zwar weist der Pumpflächen-Schirm 17 an seinen Längsenden jeweils Seitenkanten auf, jedoch sind diese nur an zwei Seiten des Pumpflächen-Schirmes vorhanden und ragen nicht aus dem Pumpflächen-Schirm in Richtung Gaseinlassoffnung 26 empor. Der Pumpflächen-Schirm 17 ist knick- und kantenfrei ausgebildet. Die beiden Seitenkanten des Pumpflächen-Schirmes 17 können zur Vermeidung von Kristallisationspunkten auch nach unten, d.h. von der Gaseinlassoffnung 26 weg abgebogen ausgebildet sein.Although the pump surface shield 17 has side edges at its longitudinal ends, these are only present on two sides of the pump surface shield and do not protrude from the pump surface shield in the direction of the gas inlet opening 26. The pump surface screen 17 is designed free of kinks and edges. To avoid crystallization points, the two side edges of the pump surface screen 17 can also be directed downwards, i.e. be bent away from the gas inlet opening 26.
Bei der Regeneration kann das an den Pumpflächen-Schirm 17 angelagerte Kondensat nach unten ablaufen, da annähernd die gesamte Außenseite des Pumpflächen-Schirmes 17 nicht in einer Horizontalebene liegt, sondern mehr oder weniger nach unten geneigt ist.During the regeneration, the condensate attached to the pump surface screen 17 can run downward, since approximately the entire outside of the pump surface screen 17 does not lie in a horizontal plane, but is more or less inclined downward.
Mit dem zur Gaseinlassöffnung ' 26 konvex gewölbten Pumpflächen- Schirm 17 und dem annähernd rechtwinklig hierzu in dem von dem Pumpflächenschirm 17 abgeschirmten Raum angeordneten Trägerplatten 34 der Adsorptionsvorrichtung wird auf kleinem Raum eine Kryopumpe mit einer hohen Pumpleistung realisiert. With the convexly curved to the gas inlet opening '26 Pumpflächen- screen 17 and approximately at right angles thereto in the that of Pump surface screen 17 shielded space arranged support plates 34 of the adsorption device, a cryopump with a high pumping capacity is realized in a small space.

Claims

PATENTANSPRÜCHE
1. Kryopumpe mit einem Pumpraum (30) mit einer Gaseinlassoffnung (26), und einer durch eine Kältequelle (20) gekühlten Pumpfläche (16) in dem Pumpraum (30) , d a d u r c h g e k e n n z e i c h n e t , dass die Pumpfläche (16) ein zur Gaseinlassoffnung (26) hin konvex gewölbter Schirm (17) ist, der an seiner der Gaseinlassoffnung (26) zugewandten Fläche knick- und kantenfrei ausgebildet ist.1. cryopump with a pump chamber (30) with a gas inlet opening (26), and a pump surface (16) cooled by a cold source (20) in the pump chamber (30), characterized in that the pump surface (16) is a gas inlet opening (26) is convexly curved screen (17), which is formed on its surface facing the gas inlet opening (26) without kinks and edges.
2. Kryopumpe nach Anspruch 1, dadurch gekennzeichnet, dass der Pumpflächen-Schirm (17) auf seiner der Gaseinlassoffnung (26) zugewandten Fläche keine Krümmung von weniger als 5 mm Krümmungsradius aufweist.2. Cryopump according to claim 1, characterized in that the pumping surface screen (17) on its surface facing the gas inlet opening (26) has no curvature of less than 5 mm radius of curvature.
3. Kryopumpe nach Anspruch 1 oder 2, dadurch gekennzeichnet, dass der Pumpflächen-Schirm (17) annähernd halbtonnenför- mig ausgebildet ist.3. Cryopump according to claim 1 or 2, characterized in that the pumping surface screen (17) is approximately half-barrel-shaped.
4. Kryopumpe nach Anspruch 1 oder 2, dadurch gekennzeichnet, dass der Pumpflächen-Schirm (17) annähernd haubenförmig ausgebildet ist.4. Cryopump according to claim 1 or 2, characterized in that the pump surface screen (17) is approximately hood-shaped.
5. Kryopumpe nach einem der Ansprüche 1-4, dadurch gekennzeichnet, dass der Pumpflächen-Schirm (17) mehr als 20 % der Fläche der Gaseinlassoffnung (26) ausfüllt.5. Cryopump according to one of claims 1-4, characterized in that the pump surface screen (17) fills more than 20% of the area of the gas inlet opening (26).
6. Kryopumpe nach einem der Ansprüche 1-5, dadurch gekennzeichnet, dass eine Adsorptionsvorrichtung (18) vorgesehen ist, die von einer mit Adsorptionsmaterial (36) beschichteten Trägerplatte (34) in' dem von dem Pumpflächen-Schirm (17) umschlossenen Adsorptionsraum gebildet wird.6. Cryopump according to one of claims 1-5, characterized in that an adsorption device (18) is provided which is formed by a carrier plate (34) coated with adsorbent material (36) in the adsorption space enclosed by the pumping surface screen (17).
7. Kryopumpe nach Anspruch 6, dadurch gekennzeichnet, dass die Trägerplatte (34) senkrecht zu einer Schirmebene angeordnet ist und mit einem Trägerplattenrand wärmeleitend an dem Pumpflächen-Schirm (17) anliegt.7. Cryopump according to claim 6, characterized in that the carrier plate (34) is arranged perpendicular to a plane of the screen and with a carrier plate edge rests in a heat-conducting manner on the pump surface screen (17).
8. Kryopumpe nach Anspruch 6 oder 7, dadurch gekennzeichnet, dass die Trägerplatte (34) den Querschnitt des von dem Pumpflächen-Schirm (17) umschlossenen Adsorptionsraumes im Wesentlichen ausfüllt.8. Cryopump according to claim 6 or 7, characterized in that the carrier plate (34) essentially fills the cross section of the adsorption space enclosed by the pump surface screen (17).
9. Kryopumpe nach einem der Ansprüche 6-8, dadurch gekennzeichnet, dass die Adsorptionsvorrichtung (18) von mehreren parallelen Trägerplatten (34) gebildet wird.9. Cryopump according to one of claims 6-8, characterized in that the adsorption device (18) is formed by a plurality of parallel carrier plates (34).
10. Kryopumpe nach Anspruch 9, dadurch gekennzeichnet, dass die Trägerplatten (34) von einer Traverse (38) gehalten werden, 'wobei die Traverse (38) an dem Pumpflächen-Schirm (17) befestigt und mit der Kältequelle (20) verbunden ist. 10. Cryopump according to claim 9, characterized in that the carrier plates (34) are held by a cross member (38), 'wherein the cross member (38) is attached to the pumping surface screen (17) and is connected to the cold source (20) ,
PCT/EP2004/006774 2003-07-10 2004-06-23 Cryopump WO2005005832A1 (en)

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JP6762672B2 (en) * 2017-03-10 2020-09-30 住友重機械工業株式会社 Cryopump
JP6913049B2 (en) * 2018-03-02 2021-08-04 住友重機械工業株式会社 Cryopump
CN112523993A (en) * 2020-12-03 2021-03-19 安徽万瑞冷电科技有限公司 Adsorption array and cryogenic pump with same

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GB2588826A (en) * 2019-11-11 2021-05-12 Edwards Vacuum Llc Cryopump

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