WO2005005682A1 - Rotating tubular sputter target assembly - Google Patents
Rotating tubular sputter target assembly Download PDFInfo
- Publication number
- WO2005005682A1 WO2005005682A1 PCT/EP2004/051247 EP2004051247W WO2005005682A1 WO 2005005682 A1 WO2005005682 A1 WO 2005005682A1 EP 2004051247 W EP2004051247 W EP 2004051247W WO 2005005682 A1 WO2005005682 A1 WO 2005005682A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- tube
- target
- coolant
- target assembly
- gas
- Prior art date
Links
- 239000002826 coolant Substances 0.000 claims abstract description 66
- 230000008878 coupling Effects 0.000 claims description 46
- 238000010168 coupling process Methods 0.000 claims description 46
- 238000005859 coupling reaction Methods 0.000 claims description 46
- 238000004544 sputter deposition Methods 0.000 claims description 9
- 238000009434 installation Methods 0.000 abstract description 11
- 230000008021 deposition Effects 0.000 abstract description 10
- 238000000429 assembly Methods 0.000 abstract description 3
- 230000000712 assembly Effects 0.000 abstract description 3
- 238000007789 sealing Methods 0.000 abstract 2
- 239000007789 gas Substances 0.000 description 12
- 238000000151 deposition Methods 0.000 description 9
- 230000033001 locomotion Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 239000013077 target material Substances 0.000 description 7
- 239000012212 insulator Substances 0.000 description 6
- 230000005611 electricity Effects 0.000 description 5
- 239000004020 conductor Substances 0.000 description 4
- 238000000605 extraction Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910000737 Duralumin Inorganic materials 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229920006247 high-performance elastomer Polymers 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000006249 magnetic particle Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000003380 propellant Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D17/00—Radial-flow pumps, e.g. centrifugal pumps; Helico-centrifugal pumps
- F04D17/08—Centrifugal pumps
- F04D17/16—Centrifugal pumps for displacing without appreciable compression
- F04D17/168—Pumps specially adapted to produce a vacuum
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F7/00—Magnets
- H01F7/02—Permanent magnets [PM]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
- H01J37/3497—Temperature of target
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
Definitions
- the invention relates to a target assembly comprising a central body in a rotatable target tube.
- the target surface must be rotated in front of the magnetic field source so that each segment of the tube can be exposed to the plasma thus eroding in a uniform way all the target material at the outside of the tube.
- the target surface must be kept at a negative potential with respect to the chamber. This potential accelerates the positive ions in the plasma towards the target surface thus ejecting the atoms from the target into the chamber. As this leads to neutralisation of the target a negative electrical current must be maintained towards the target in order to maintain this potential.
- the target assembly has to be cooled because the dense bombardment of the surface leads to an intense heating that would quickly lead to damage of the target assembly and/or melting of the target material.
- the target assembly must be vacuum tight in order to prevent the contamination of the deposition chamber and maintain gas composition. While each of these functionalities are relatively simple to attain individually, the combination of all of them in a single assembly is a technological problem in its own right.
- a first end-block was so designed that it allowed for the transmission of rotary movement and the supply and withdrawal of coolant by means of a rotary coolant seal to the target.
- a second end-block at the other end of the target tube contained the rotary connection of electrical current
- the cantilever bearing housing must be mounted on a wall perpendicular to the axis of the target.
- the voluminous end-blocks or the bearing housing inhibit the use of rotatable target tubes in smaller size installations.
- a planar target is used which has the drawback that it needs to be replaced more frequently (once every 4 to 5 days) compared to rotatable targets (replacement every 3 to 4 weeks).
- a target assembly comprising a central body in a rotatable target tube is claimed.
- the central body In the central body, at least one of the functionalities, which in the prior art are incorporated into the end-block, is now implemented inside the target tube.
- These functionalities are at least one of the following: (1 ) a bearing system for rotatably supporting the tube by the central body
- At least one rotatable gas-to-coolant seal for supplying and extracting coolant to the tube
- at least one rotatable gas-to-vacuum seal for enabling a vacuum outside said tube
- a magnet array is obviously understood to be incorporated into the tube as well.
- a rotatable gas-to-coolant seal is meant a seal that physically separates a gas containing space from a coolant containing space while enabling a rotary movement between both spaces.
- a rotatable gas-to-vacuum seal is a seal that physically separates a gas containing space from a vacuum containing space while enabling a rotary movement between both spaces.
- the gas will be air at ambient or somewhat lower pressure (1 kPa at the lowest).
- the gas can be nitrogen or argon at ambient or low pressure (1 kPa at the lowest).
- the target tube' or 'interior of the target tube' is meant: the 10 space enclosed by the rotatable target material carrying tube of the apparatus.
- the drive means is inside the tube.
- Another favored arrangement of the invention is when besides the gas- to-coolant seal and the gas-to-vacuum seal the electrical contact between supply and target tube is incorporated inside the tube.
- Another favored arrangement of the invention is when besides the gas- to-coolant seal and the gas-to-vacuum seal and the electrical contact the bearing system is incorporated inside the tube.
- Least preferred is the combination where all the functionalities i.e. the gas-to-coolant seal and the gas-to-vacuum seal and the electrical contact and the bearing system and the drive means is incorporated inside the tube as this is the most complex implementation (although not impossible as will be illustrated lateron).
- the bearing system can be any suitable bearing system that is appropriate to carry the load associated with the total assembly.
- the bearing system could be mounted between the central body and the target tube, but preferably it will be incorporated into the central body. In this way the central body comprises a stationary part connected to the chamber and a rotatable part turning with the target tube.
- targets that are operated in a horizontal position. There, ball bearings or roller bearings will be more appropriate for larger spans. For smaller spans a plain bearing will do.
- an a ⁇ ial bearing will be preferred for the lower or upper bearing, while a radial bearing may suffice to support respectively the topside or downside of the tube.
- 'drive means' is meant that device which transforms any form of non-mechanical energy into mechanical rotation.
- the drive means must allow for a rotational speed of at the most 60 rotations per minute.
- An adjustable speed is preferred although not necessary.
- the maximum current to be transferred by this connection is dependent on the magnitude of the installation. Typically - without being delimited - is a value of at the most 400 A.
- the case of AC operation - in which the target is alternatively positively and negatively charged - or pulsed DC operation - in which the DC operation is interrupted according a pattern - is also included.
- Use of the target assembly as a positively charged anode, for example to coat the bare tube with material or as a collector of electrons on a periodic or continuous base, is explicitly included in the invention.
- Coolant is supplied and extracted continuously to the inner surface of the tube in order to keep the assembly at an acceptable temperature level (typically below 45X). Coolant supply and extraction can be situated at the same side of the target tube or the supply can be at one side and the extraction at the other. The former is preferred since then only one rotatable gas-to-coolant seal can suffice provided the coolant supply and extraction are done through e.g. concentric tubes. In case a leak would occur in the gas-to-coolant seal, the coolant will leak to a gas pressure section and not to the vacuum section of the apparatus.
- Coolant is preferably water, although other coolants could be envisaged as well as long as they fulfil the requirements of heat capacity, electrical conductivity and viscosity.
- the coolant is supplied at a pressure of typically 5 bar and at a rate which is dependant on the power rating of the deposition installation which is itself a function of the magnitude of the installation.
- lip seals are used as gas-to-coolant seal as they are well known in the art.
- other types of seals like mechanical face seals or labyrinth seals - without being exhaustive - are not excluded.
- the fluid - which contains finely dispersed magnetic particles - is held between shaft and pole shoe by means of the magnetic field.
- one gas-to-vacuum seal would suffice.
- two vacuum gas-to-vacuum seals are preferred.
- an electrical motor can be used (claim 2).
- This motor is preferably of the fixed axis, rotating drum type (claim 3), since this simplifies the mounting of the motor.
- a hydraulic rotary motor is also possible (claim 4). More preferred is the use of the circulating coolant as the propellant for this hydraulic motor, thus further simplifying the concept (claim 5).
- the assembly has also to be fixed to the walls of the sputtering apparatus (independent claims 6 and 7). It is not excluded that the whole sputtering apparatus is mounted for example to an access door or lid of the vacuum chamber.
- the fixation to the apparatus is done by coupling means.
- These coupling means distinguish themselves from the prior art end-blocks in their simplicity and relative smallness. Indeed the coupling between the central body and ihe coupling means contains no moving parts: the coupling means have only to keep the stationary part of the central body fixed with respect to the chamber and to provide a stationary feedthrough of electricity for charging the target surface, of coolant and of electricity for the drive means (if needed). In which one of the two coupling means these feedthroughs are organised is of course dictated by how the functionalities inside the central body are organised.
- the electricity to charge the surface can be supplied at the same side where the coolant is supplied while the electricity to energise the drive means (if needed) is supplied on the other side.
- the central body is so organised that all supply feedthroughs are e.g. available at a first coupling means to the central body, the task of the second coupling means limits itself to holding the central body itself. In 5 the limit (claim 7) this second coupling can be completely eliminated in case the mechanical strength of the first coupling is sufficient to hold the target assembly in place.
- the central body can also be separated into a first and a second central 10 body that are mechanically detachable from one another (claim 8). In this way both bodies can be inserted separately from one another at both ends of the target tube.
- the functionalities can be divided between both bodies in the most convenient way, as long as at least one of them is incorporated inside the target tube.
- the first and the second central 15 body can be mechanically coupled to one another (claim 9). This can for example be realised by using the magnet array as the coupling means.
- coupling means for coupling the first and second central body have to be provided in the magnetron apparatus (claim 10). The case where one 20 side of the target assembly holds the tube is also included (claim 11).
- FIGURE 1 is an overview of a first preferred embodiment of the target assembly including the coupling means, in a front view and a side view.
- FIGURE 2 is a cross section of the first preferred embodiment according plane AA' of FIGURE 1
- FIGURE 3 is a cross section according line BB' of FIGURE 1 - FIGURE 4: is a cross section according line CC of FIGURE 1 ;
- FIGURE 5 is cross section of a second preferred embodiment where the drive means is hydraulic rotary motor driven by the coolant.
- - FIGURE 6 shows a preferred embodiment with the bearing system and the gas-to-vacuum seal and the gas-to-coolant seal inside the target tube while the other functionalities are implemented outside the tube 5
- FIGURE 7 shows a preferred embodiment with the bearing system and the gas-to-vacuum seal and the gas-to-coolant and the electrical contact inside the target tube while the other functionalities are implemented outside the tube.
- identical reference numbers will be used for the same 10 parts occurring in different cross sections.
- FIGURE 15 invention of which a first preferred embodiment is represented in FIGURE ! In this embodiment all the functionalities as enumerated in claim 1 are incorporated inside the target tube.
- the drive means is an electrical motor. The supply and extraction of the coolant and the charging of the
- FIGURE 2 shows the carrier tube 100 and the rotating tube 200.
- the rotating tube 200 can be made of the target material itself e.g. aluminium tube. Or the target material can be disposed at the outside of the rotating
- 25 tube It can be applied onto the tube 200 by means of thermal plasma torch spraying, or by electrolytic deposition, or by any other technique known in the art.
- the total length of the tube can be chosen at will by increasing or decreasing the length between the wavy lines 002.
- an insert 210 and 220 can be slid into the tube 200
- the carrier tube 100 (FIGURE 3) comprises an extruded Duraluminum double walled tube where the inner tube 114 is connected to the outer tube 110 through six ribs 112. This is the main carrier structure to which the other parts are connected.
- the magnet holder 120 is mounted to the 5 outer side of the carrier structure 110. Permanent magnets 122 are arranged onto this holder 120. Suitable magnetic arrangements have been described in WO 99/54911.
- the target assembly is rotatable supported by 4 bearings 130,132,134 and 136 (FIGURE 2) which are incorporated inside the central tube 114 of the double walled tube.
- a rotary shaft electrical motor 140 is mounted inside a cylindrical housing 142 which is capped with a circular lid 144 at the outer side of the target assembly.
- a feedthrough piece 146 acting also as the axis for rotatably supporting the tube is used to supply power leads 148 to the motor.
- the shaft At the other side of the motor housing the shaft
- 25 electrical insulation is obtained by introducing an insulator plate 022 between the chamber wall 999 and the second coupling piece 020.
- the electrical contact for electrically connecting the target tube to the target power supply is incorporated into the first insert 210.
- the insert piece 211 rotates around the axial tubular piece 160. Power is
- first coupling means 010 is at the higher potential of the target tube.
- An insulator 012 has therefore been introduced between the first coupling means 010 and the vacuum chamber wall 999. Electrical contact is ensured through the stationary brush 164 that is spring loaded against the rotating bushing 166. It is evident that the materials used for the different parts should be conductive such that an electrical path of sufficient current capacity can be formed between the first coupling 010 and the surface of the target 5 tube 200.
- the target tube 200 acts as a cathode, e.g. for accelerating positive ions towards its surface.
- the target tube 200 acts as an anode, e.g. for collecting electrons.
- the coolant is supplied through the first coupling means 010.
- FIGURE 4 gives a cross section of the first coupling piece 010 to the first insert 210.
- the coolant is fed through a bore hole 014 in the middle of the first coupling means to a tube 168 which is coaxially mounted to the axial tubular piece 160.
- the cold coolant going into the target assembly is separated
- the vacuum seal is necessary in order to guarantee the vacuum or the low-pressure gas composition. In this preferred embodiment this is achieved by introducing vacuum seals 135 and 131 between the two pairs of bearings 134, 136 and 130, 132. In fact the vacuum seal and the
- FIGURE 5 depicts a second preferred embodiment in which the drive means is replaced by a hydraulic motor.
- This particular embodiment is identical for the other functionalities (bearing system, electrical contact, rotatable coolant seal and rotatable vacuum seal) to that of the first embodiment the clarification of FIGURE 5 will be focused on the hydraulic motor only.
- This motor is driven by means of the coolant itself. The flow of the coolant is therefore guided through the feed hole 312 into the hydraulic motor 310. In the motor, the kinetic energy of the flow is transformed into rotary movement. Upon exiting through the exit holes
- the coolant is guided to the inside of the target tube 200 to further cool the tube.
- the rotating outer housing of the motor is affixed to the insert piece 221, while the axis of the motor 318 is fixed through a mechanical connector 316 that allows easy fixing of the motor axis to the central axis 320 as well as absorbs start and stop shocks.
- the central axis 320 is immovably mounted to the second coupling means 020.
- the functioning of the motor can be based on guide vanes under angle as in a turbine or on the principle of an orbital motor or an inverted screw pump principle or any other principle known in the art. The principle of operation is however non-delimiting to the invention.
- FIGURE 6 Another embodiment is depicted in FIGURE 6.
- the bearing system, the gas-to-vacuum seal and the gas-to-coolant seal are incorporated in the target tube, while the other functionalities are implemented outside the target tube.
- the target tube 602 is carried by two coupling means
- the magnet array 606 is attached to a stationary carrier tube 662 that is firmly attached to coupling means 668.
- the coolant is fed through channel 664 and tube 660 coaxial to the carrier tube 662.
- the used coolant is evacuated through channel 666 after being collected in the space between outer tube 662 and inner tube 660.
- Motion is supplied to the target tube 602 by a shaft 620 foreseen of a worm 622 and gear 624 transmission.
- the gear 624 makes the insert 674 and the target tube 602 connected to it, turn.
- the coupling means 668 is electrically isolated by means of the insulator ring 672.
- the following functionalities have been incorporated inside the target tube 602: • one bearing ring 611 for rotatably carrying the target tube 602 o a gas-to-vacuum seal 653 followed by another gas-to-vacuum seal 15 652 in order to improve the quality of the seal No gas-to-coolant seal is needed at this side.
- the coupling means 670 is electrically isolated from the target tube by means of the insulator ring 671.
- FIGURE 7 Another preferred embodiment is described in FIGURE 7.
- the functionality of applying movement to the target tube 702 is situated outside the target tube. All other functionalities are integrated inside the target tube 702.
- the target tube 702 - with the target material 703 applied to it - is carried by a coupling means 707 perpendicular to which
- a carrier tube 705 is fixed.
- the assembly further consists of the magnet array 706 that is mounted on the carrier tube 705.
- the rotational motion is transferred from a motor (not shown) outside the sputtering apparatus to the tube by means of a flexible shaft 722.
- a flexible shaft rotates inside a protective sleeve 720.
- the sleeve 720 is connected to a fixture
- the shaft 722 itself is mechanically connected to the insert 770 through the electrically isolating piece 773. Cooling is provided through the coolant feeding tube 704 that feeds coolant in the space between the target tube 702 and the carrier tube 705. The coolant is evacuated through the exit tube 708. Electrical contact is ensured inside the target tube 702 through a series of parallelly connected ring-shaped graphite brushes 730, 730' and 730" placed between the rotating electrically conducting insert 770 and the stationary, cylindrical conductor 732. The cylindrical conductor 732 is connected to the power supply (not shown) through the conductor
- the cylindrical conductor 732 is isolated from the carrier tube 705 by the isolator 734.
- the target tube 702 is rotatably born by the bearings 712 and 710 situated at the ends of the target tube 702.
- the bearing 710 is situated inbetween the gas-to-vacuum seals 754, 756 and the gas-to- coolant seal 742.
- At the bearing 712 only a gas-to-coolant seal 740 is needed: there is no need of a gas-to-vacuum seal.
- the insert 770 and the carrier tube 705 are insulated from one another through the insulator 772. At the opposite end the target tube 702 is insulated from the carrier tube 705 by the insulator 750.
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- Plasma & Fusion (AREA)
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- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
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Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/562,855 US20060157346A1 (en) | 2003-07-04 | 2004-06-25 | Rotating tubular sputter target assembly |
EP04741896A EP1641956B1 (en) | 2003-07-04 | 2004-06-25 | Rotating tubular sputter target assembly |
DE602004020227T DE602004020227D1 (en) | 2003-07-04 | 2004-06-25 | ROTATING TUBULAR SPUTTER TARGET ASSEMBLY |
JP2006518200A JP2009513818A (en) | 2003-07-04 | 2004-06-25 | Rotating tubular sputter target assembly |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03077091 | 2003-07-04 | ||
EP03077091.1 | 2003-07-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2005005682A1 true WO2005005682A1 (en) | 2005-01-20 |
Family
ID=34042902
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2004/051247 WO2005005682A1 (en) | 2003-07-04 | 2004-06-25 | Rotating tubular sputter target assembly |
Country Status (7)
Country | Link |
---|---|
US (1) | US20060157346A1 (en) |
EP (1) | EP1641956B1 (en) |
JP (1) | JP2009513818A (en) |
KR (1) | KR20060111896A (en) |
AT (1) | ATE426690T1 (en) |
DE (1) | DE602004020227D1 (en) |
WO (1) | WO2005005682A1 (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006097152A1 (en) * | 2004-10-18 | 2006-09-21 | Bekaert Advanced Coatings | Flat end-block for carrying a rotatable sputtering target |
US20080202925A1 (en) * | 2005-03-11 | 2008-08-28 | Bekaert Advanced Coatings | Single, Right-Angled End-Block |
WO2009138348A1 (en) * | 2008-05-16 | 2009-11-19 | Bekaert Advanced Coatings | A rotatable sputtering magnetron with high stiffness |
JP2009541583A (en) * | 2006-06-19 | 2009-11-26 | ベーカート・アドヴァンスト・コーティングス | Insert parts for end blocks of sputtering equipment |
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- 2004-06-25 AT AT04741896T patent/ATE426690T1/en not_active IP Right Cessation
- 2004-06-25 KR KR1020067000235A patent/KR20060111896A/en not_active Application Discontinuation
- 2004-06-25 JP JP2006518200A patent/JP2009513818A/en active Pending
- 2004-06-25 EP EP04741896A patent/EP1641956B1/en not_active Not-in-force
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WO2006097152A1 (en) * | 2004-10-18 | 2006-09-21 | Bekaert Advanced Coatings | Flat end-block for carrying a rotatable sputtering target |
JP2014194086A (en) * | 2004-10-18 | 2014-10-09 | Soleras Advanced Coatings Bvba | Flat end-block for carrying rotatable sputtering target |
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CN102027565B (en) * | 2008-05-16 | 2013-03-06 | 梭莱先进镀膜股份有限公司 | A rotatable sputtering magnetron with high stiffness |
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WO2009138348A1 (en) * | 2008-05-16 | 2009-11-19 | Bekaert Advanced Coatings | A rotatable sputtering magnetron with high stiffness |
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US9279160B2 (en) | 2009-06-22 | 2016-03-08 | Statens Serum Institut | DNA-based methods for clone-specific identification of staphylococcus aureus |
US10138544B2 (en) | 2011-06-27 | 2018-11-27 | Soleras, LTd. | Sputtering target |
CN104619107A (en) * | 2015-01-12 | 2015-05-13 | 广东韦达尔科技有限公司 | Electromagnetic plasma rotary processing device |
CN115691853A (en) * | 2022-09-26 | 2023-02-03 | 中国核动力研究设计院 | Irradiation target for researching reactor isotope irradiation production and assembling method |
CN115691853B (en) * | 2022-09-26 | 2024-01-23 | 中国核动力研究设计院 | Irradiation target for research stack isotope irradiation production and assembly method |
Also Published As
Publication number | Publication date |
---|---|
JP2009513818A (en) | 2009-04-02 |
EP1641956A1 (en) | 2006-04-05 |
US20060157346A1 (en) | 2006-07-20 |
ATE426690T1 (en) | 2009-04-15 |
KR20060111896A (en) | 2006-10-30 |
EP1641956B1 (en) | 2009-03-25 |
DE602004020227D1 (en) | 2009-05-07 |
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