WO2004092439A3 - Verfahren zur herstellung von metall-polymer-nanokompositen - Google Patents

Verfahren zur herstellung von metall-polymer-nanokompositen Download PDF

Info

Publication number
WO2004092439A3
WO2004092439A3 PCT/DE2004/000729 DE2004000729W WO2004092439A3 WO 2004092439 A3 WO2004092439 A3 WO 2004092439A3 DE 2004000729 W DE2004000729 W DE 2004000729W WO 2004092439 A3 WO2004092439 A3 WO 2004092439A3
Authority
WO
WIPO (PCT)
Prior art keywords
metal
polymer
production
polymer nanocomposites
substrate
Prior art date
Application number
PCT/DE2004/000729
Other languages
English (en)
French (fr)
Other versions
WO2004092439A2 (de
Inventor
Abhjit Biswas
Franz Faupel
Vladimir Zaporojtchenko
Original Assignee
Christian Albrechts Univer Sit
Abhjit Biswas
Franz Faupel
Vladimir Zaporojtchenko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Christian Albrechts Univer Sit, Abhjit Biswas, Franz Faupel, Vladimir Zaporojtchenko filed Critical Christian Albrechts Univer Sit
Publication of WO2004092439A2 publication Critical patent/WO2004092439A2/de
Publication of WO2004092439A3 publication Critical patent/WO2004092439A3/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material

Abstract

Verfahren zur Herstellung von Metall-Polymer-Nanokompositen mit den Schritten: Verfampfen wenigstens eine s Metall und wenigstens eines Polymers im Vakuum (Gasdruck < 10-4 hPa) und simultane Kondensation des Metall- und Polymerdampfs auf einem Substrat; wobei das Substrat während der Dauer der Kondensation auf Temperaturen im wesentlichen oberhalb 100°C gehalten wird.
PCT/DE2004/000729 2003-04-10 2004-04-07 Verfahren zur herstellung von metall-polymer-nanokompositen WO2004092439A2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10316379.4 2003-04-10
DE2003116379 DE10316379B4 (de) 2003-04-10 2003-04-10 Verfahren zur Herstellung von Metall-Polymer-Nanokompositen

Publications (2)

Publication Number Publication Date
WO2004092439A2 WO2004092439A2 (de) 2004-10-28
WO2004092439A3 true WO2004092439A3 (de) 2005-02-24

Family

ID=33103298

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2004/000729 WO2004092439A2 (de) 2003-04-10 2004-04-07 Verfahren zur herstellung von metall-polymer-nanokompositen

Country Status (2)

Country Link
DE (1) DE10316379B4 (de)
WO (1) WO2004092439A2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004029595B4 (de) * 2004-06-18 2006-07-27 Christian-Albrechts-Universität Zu Kiel Verfahren zur Herstellung eines Nanosäulen-Arrays in einer Polymer-Matrix
US7274458B2 (en) 2005-03-07 2007-09-25 3M Innovative Properties Company Thermoplastic film having metallic nanoparticle coating
US20100000607A1 (en) * 2006-09-12 2010-01-07 Luke Hanley All-gaseous deposition of nanocomposite films
DE102010050110B3 (de) 2010-10-29 2012-01-19 Christian-Albrechts-Universität Zu Kiel Metall-Komposit-Beschichtung mit hoher optischer Transmissivität im visuellen Spektrum

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030219605A1 (en) * 2002-02-14 2003-11-27 Iowa State University Research Foundation Inc. Novel friction and wear-resistant coatings for tools, dies and microelectromechanical systems

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3326376A1 (de) * 1983-07-22 1985-01-31 Siemens AG, 1000 Berlin und 8000 München Verfahren zum erzeugen von glimmpolymerisat-schichten
JPH0684447B2 (ja) * 1985-09-12 1994-10-26 鐘紡株式会社 金属・フエナンスロリン錯体重合薄膜及びその製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030219605A1 (en) * 2002-02-14 2003-11-27 Iowa State University Research Foundation Inc. Novel friction and wear-resistant coatings for tools, dies and microelectromechanical systems

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
BISWAS A ET AL: "Controlled generation of Ni nanoparticles in the capping layers of Teflon AF by vapor-phase tandem evaporation", NANO LETTERS AMERICAN CHEM. SOC USA, vol. 3, no. 1, 22 November 2002 (2002-11-22), pages 69 - 73, XP002301937, ISSN: 1530-6984 *
CIOFFI N ET AL: "Analysis of the surface chemical composition and morphological structure of vapor-sensing gold-fluoropolymer nanocomposites", CHEMISTRY OF MATERIALS AMERICAN CHEM. SOC USA, vol. 14, no. 2, 26 January 2002 (2002-01-26), pages 804 - 811, XP002301939, ISSN: 0897-4756 *
QUARANTA F ET AL: "Dual-ion-beam sputter deposition of ZnO films", JOURNAL OF APPLIED PHYSICS USA, vol. 74, no. 1, 1 July 1993 (1993-07-01), pages 244 - 248, XP002301938, ISSN: 0021-8979 *

Also Published As

Publication number Publication date
WO2004092439A2 (de) 2004-10-28
DE10316379A1 (de) 2004-11-04
DE10316379B4 (de) 2006-06-01

Similar Documents

Publication Publication Date Title
WO2009085974A3 (en) Low wet etch rate silicon nitride film
WO2003060184A8 (en) Method and apparatus for forming silicon containing films
WO2004079031A3 (en) Chemical vapor deposition of silicon on to substrates
EP1081380A4 (de) Vorrichtung und verfahren zum pumpen
TW200643996A (en) Method of film formation, film formation apparatus, permanent magnet, and process for producing permanent magnet
WO2003095702A3 (en) Method for curing low dielectric constant film by electron beam
WO2003068868A3 (en) Method of producing plane-parallel structures of silicon suboxide, silicon dioxide and/or silicon carbide, plane-parallel structures obtainable by such methods, and the use thereof
WO2001061071A3 (de) Kondensationsbeschichtungsverfahren
AU2003269580A1 (en) Method and device for recovering energy
EP1433873A3 (de) Heiztiegel und seine Verwendung in einer Abscheidungsvorrichtung
EP1316626A3 (de) Verfahren zur Herstellung einer transparenten leitfähigen Schicht, eine durch dieses Verfahren hergestellte transparente und leitfähige Schicht und Material, das diese Schicht enthält
WO2005033357A3 (en) Low-pressure deposition of metal layers from metal-carbonyl precursors
WO2005057630A3 (en) Manufacturable low-temperature silicon carbide deposition technology
TW367602B (en) Manufacturing method for semiconductor apparatus
WO2006036865A3 (en) Deposition of ruthenium metal layers in a thermal chemical vapor deposition process
TW200722544A (en) Method for depositing a vapour deposition material
EP1296365A3 (de) Filmherstellungsmethode, isolierende Schicht, und Halbleitersubstrat
WO1999066545A8 (en) Process for removing oxide using hydrogen fluoride vapor
WO2004109772A3 (en) Method and system for etching a high-k dielectric material
CA2365902A1 (en) Method for increasing the yield in processes of deposition of thin layers onto a substrate
WO2003030238A1 (fr) Procede de traitement
WO2003033761A3 (de) Mehrkammervakuumanlage, verfahren und vorrichtung zu ihrer evakuierung
WO2005033358A3 (de) Verfahren zur abscheidung eines leitfähigen materials auf einem substrat und halbleiterkontaktvorrichtung
WO2004092439A3 (de) Verfahren zur herstellung von metall-polymer-nanokompositen
WO2005099320A3 (de) Verfahren und vorrichtung zum erzeugen eines niederdruckplasmas und anwendungen des niederdruckplasmas

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): BW GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
122 Ep: pct application non-entry in european phase