WO2004062899A2 - Method for manufacturing of polymer micro needle array with liga process - Google Patents
Method for manufacturing of polymer micro needle array with liga process Download PDFInfo
- Publication number
- WO2004062899A2 WO2004062899A2 PCT/KR2004/000074 KR2004000074W WO2004062899A2 WO 2004062899 A2 WO2004062899 A2 WO 2004062899A2 KR 2004000074 W KR2004000074 W KR 2004000074W WO 2004062899 A2 WO2004062899 A2 WO 2004062899A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- needle array
- micro needle
- polymer
- substrate
- pmma
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D99/00—Subject matter not provided for in other groups of this subclass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C99/00—Subject matter not provided for in other groups of this subclass
- B81C99/0075—Manufacture of substrate-free structures
- B81C99/0085—Manufacture of substrate-free structures using moulds and master templates, e.g. for hot-embossing
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B5/00—Measuring for diagnostic purposes; Identification of persons
- A61B5/145—Measuring characteristics of blood in vivo, e.g. gas concentration, pH value; Measuring characteristics of body fluids or tissues, e.g. interstitial fluid, cerebral tissue
- A61B5/14507—Measuring characteristics of blood in vivo, e.g. gas concentration, pH value; Measuring characteristics of body fluids or tissues, e.g. interstitial fluid, cerebral tissue specially adapted for measuring characteristics of body fluids other than blood
- A61B5/1451—Measuring characteristics of blood in vivo, e.g. gas concentration, pH value; Measuring characteristics of body fluids or tissues, e.g. interstitial fluid, cerebral tissue specially adapted for measuring characteristics of body fluids other than blood for interstitial fluid
- A61B5/14514—Measuring characteristics of blood in vivo, e.g. gas concentration, pH value; Measuring characteristics of body fluids or tissues, e.g. interstitial fluid, cerebral tissue specially adapted for measuring characteristics of body fluids other than blood for interstitial fluid using means for aiding extraction of interstitial fluid, e.g. microneedles or suction
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61M—DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
- A61M37/00—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin
- A61M37/0015—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin by using microneedles
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
- G03F7/2039—X-ray radiation
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61M—DEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
- A61M37/00—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin
- A61M37/0015—Other apparatus for introducing media into the body; Percutany, i.e. introducing medicines into the body by diffusion through the skin by using microneedles
- A61M2037/0053—Methods for producing microneedles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/05—Microfluidics
- B81B2201/055—Microneedles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/03—Processes for manufacturing substrate-free structures
- B81C2201/032—LIGA process
Definitions
- the present invention relates to the manufacturing of a micro needle array with a LIGA process, and more particularly, to a method for manufacturing a micro needle array made of a polymer harmless to the human body, wherein manufacturing efficiency is improved by using inclined exposure to X-rays.
- Processes for manufacturing micro needles disclosed in the treaties are performed through semiconductor processes using silicon or glass.
- An object of the present invention is to provide a polymer micro needle array manufactured with a LIGA process, i.e. by preparing a poly methyl metacrylate (PMMA) cast and a poly dimethyl siloxane (PDMS) mold and manufacturing the needle array using the PDMS mold, thereby improving the manufacturing efficiency and eliminating harmfulness to the human body.
- PMMA poly methyl metacrylate
- PDMS poly dimethyl siloxane
- a method for manufacturing a micro needle array comprising the steps of preparing an X-ray mask by forming an absorber having a configuration of the micro needle array on a substrate; preparing a PMMA cast for the micro needle array by exposing PMMA to vertical and inclined X- rays using the X-ray mask; preparing a flexible PDMS mold having a configuration opposite to that of the PMMA cast by pouring PDMS on the PMMA cast; filling an upper surface of the PDMS mold with a gel type of polymer to obtain a desired thickness of the polymer; patterning a desired configuration of a hole by irradiating UV rays on the polymer; and separating the PDMS mold to complete the polymer micro needle array.
- the step of preparing the X-ray mask having the configuration of the micro needle array comprises the steps of forming an insulating layer by forming an oxide layer (Si0 2 ) on the substrate; forming a base substrate for electroforming by depositing a Cr/Au metal layer on the insulating layer; patterning the configuration of the micro needle array using a photosensitive polymer, a developer and an etchant; and forming the X-ray absorber by electroforming an Au layer using the patterned photosensitive polymer and removing the patterned photosensitive polymer.
- Fig. 1 is a sectional view showing a micro needle array according to the present invention.
- Figs. 2 A to 2G are views illustrating the process of preparing an X-ray mask according to the present invention.
- Figs. 3 A to 3D are views illustrating the process of preparing a PMMA cast according to the present invention.
- Figs. 4 A to 4D are views illustrating the process of manufacturing the polymer micro needle array according to the present invention.
- a LIGA process means a micro-processing technique for manufacturing a micro structure through lithography using X-rays, electroforming and molding processes.
- the LIGA process has the following features.
- the heights of structures that can be manufactured through a single process are within the range of several dozen micrometers to several centimeters.
- Vertical configurations of the manufactured structures can be implemented and the roughness of vertical wall surfaces is about several hundred angstroms.
- the tolerance of the structures can be implemented as 1/10,000 cm or less.
- an X-ray exposure step and a development step are important in performing such a LIGA process.
- an X-ray mask for controlling selective transmissivity of an X-ray light source is important. That is, the X-ray mask is a mechanism that is disposed between a photoresist and the X-ray light source during the X-ray lithography process to selectively transmit X-rays.
- the X-ray mask should easily transmit X-rays without loss at portions on which the X-rays are required to be irradiated while thoroughly shielding X-rays below a predetermined level of energy at portions on which the X-rays are not required to be irradiated.
- a thin membrane made of silicon nitride is formed on a substrate and an X-ray absorber made of gold (Au) is formed on the membrane.
- Au gold
- an exposed portion is completely removed through the development process so that an electroforming base layer or metallic surface can be revealed. Then, electroforming is performed.
- the PMMA or photoresist is removed. Accordingly, it is possible to control the surface roughness of the structure manufactured through the single process up to about several hundred angstroms.
- Fig. 1 is a (side) sectional view of a micro needle array according to the present invention.
- the micro needle array 15 of the present invention comprises a sharp tip 13 capable of penetrating the skin, and a channel 14 through which blood can be collected.
- the sharp tip 13 is formed to be sharpened enough to minimize damage to skin structure and pain.
- Figs. 2 A to 4d are views illustrating the process of manufacturing the micro needle array with the LIGA process in accordance with the present invention.
- Figs. 2 A to 2g are views illustrating the process of manufacturing the
- X-ray mask by forming an absorber with the structure of the micro needle array on a silicon substrate.
- a silicon substrate 1 (lOOjzm in thickness, ⁇ 100> orientation, N type) or a boron nitride substrate is cleaned using a diluted solution of sulfuric acid (H 2 S0 4 ) and hydrogen peroxide (H 2 0 2 ) at a ratio of 1:2 for 40 minutes at 120 ° C to remove metal or organic residues that are contaminants.
- H 2 S0 4 sulfuric acid
- H 2 0 2 hydrogen peroxide
- the silicon substrate 1 is put within an oxidation furnace and then oxidized with deionized (DI) water for 6 hours at 100°C to form an oxide layer (silicon oxide; Si0 2 ) with a thickness of about 1.2j--m.
- a low stress nitride layer with a thickness of 4,000 angstroms may be additionally formed through a low pressure chemical vapor deposition (LPCVD) process after the oxide layer is formed.
- LPCVD low pressure chemical vapor deposition
- the thin film is formed by bulk etching the silicon substrate 1. Referring to Fig.
- a Cr/Au metal layer 3 is deposited thereon using a thermal evaporator.
- Cr is deposited in a total thickness of 200 angstroms at a deposition rate of 1 A/sec for about 2 minutes with an electric current of 55 to 60A in order to improve adhesiveness of Au to the substrate 1.
- Au is deposited with a total thickness of 2,000 angstroms at a deposition rate of 1 to 1.5 A/sec for about 10 to 15 minutes with an electric current of 50 to 55A.
- an AZ 9260 photosensitive polymer (photoresist) 4 is applied in a thickness of about 23jczm by a rotary dispenser (for 40 seconds at 200rpm and 5 seconds at l,000rpm) and then soft-baked for 120 seconds at 110 °C .
- a rotary dispenser for 40 seconds at 200rpm and 5 seconds at l,000rpm
- the polymer is exposed to ultraviolet rays having an intensity of 8mW/cm 2 for 4 minutes using a UV mask. Then, it is subjected to a development process for 15 minutes using an AZ 400K developer, cleaned with DI water and dried using N 2 gas.
- an Au layer 5 is electroformed with a current density of 1.5mA for about 6 hours using the patterned polymer 4.
- the patterned photosensitive polymer 4 is removed using acetone and methanol.
- the oxide layer 2 and the silicon substrate 1 correspond to regions through which X-rays penetrate, and the electroformed Au layer 5 becomes an absorber that absorbs the X-rays, there is provided an X-ray mask capable of allowing the X-rays to selectively penetrate therethrough.
- the silicon substrate 1 is etched with a KOH solution to form a nitride thin film.
- the X-ray mask for use in the LIGA process is prepared through the processes illustrated in Figs. 2A to 2g.
- Figs. 3A to 3d are views illustrating the manufacturing processes of preparing a PMMA cast of a micro needle array by causing PMMA to be subjected to vertical and inclined exposure to X-rays using the X-ray mask covered with the low stress nitride layer.
- the X-ray mask 20 is registered on the PMMA 6 that is in turn exposed to vertical X-rays 7 and inclined X-rays 8. Then, portions of the PMMA 6 which have been exposed to the X-rays are developed and removed. The other portions of the PMMA 6 remaining after the development become the
- the PMMA cast 9 prepared as such is a cast for a poly dimethy siloxane (PDMS) mold 10 that will be prepared through subsequent processes, and thus, has a configuration opposite to that of the PDMS mold.
- PDMS poly dimethy siloxane
- Figs. 4 A to 4D are views illustrating the processes of manufacturing a polymer micro needle array using the PMMA cast.
- surfaces of the PMMA cast 9 and the substrate 1 are silanized so that the PDMS mold 10 can be easily separated therefrom after it is cured.
- chemicals for the silanization chemicals obtained through silanization by putting about lOjtt ⁇ of trichloro(3,3,3 trifluoro propyl)silane within a vacuum vessel for 8 hours are used.
- PDMS prepared by mixing a monomer with a curing agent at a ratio of 10:1 and removing bubbles is poured on the previously prepared PMMS cast 9 to manufacture the PDMS mold 10.
- Bubbles created during the pouring process are removed from the PDMS that in turn is heat treated for about 1 hour at 100 ° C and then cured.
- the completed flexible mold 10 is obtained to be used for manufacturing a polymer micro needle array.
- the PDMS mold 10 is separated cleanly, it is possible to easily obtain a lot of flexible molds by directly repeating the processes of pouring PDMS comprising a curing agent and performing heat treatment without an additional process.
- the cured PDMS mold 10 is separated from the PMMA cast 9.
- a polymer 11, SU-8 (70 wt% EPON, 30 wt% GBL), is applied to the PDMS mold 10 by a rotary dispenser (for 5 minutes at 200rpm and 35 minutes at l,000rpm) or through direct injection to form a container with a thickness of about 500 ⁇ m and then pre-baked at 95 ° C .
- SU-8 is a negative photoresist, it is exposed to light around 365nm with an intensity of 3,000 to 4,000mJ/cm 2 using a UV mask. Then, the polymer is post-baked at 95 ° C , and subsequently developed and cleaned with propyleneglycol monomethylether acetate (PGMEA) for 15 minutes. After cleaning, it is hard baked at 200 ° C . If a method such as UV embossing or injection molding is used, a polymer suitable for the molding method is used.
- a polymer 12 is applied to the PDMS mold 10 and then baked. UV rays are irradiated on the polymer to be exposed thereto according to a desired configuration of a hole 16. Thereafter, the hole 16 of the micro needle array is patterned with a developer and an etchant. Then, the polymer (SU-8) 12 is completely cured to improve mechanical properties thereof.
- the micro needle array made of the cured polymer 12 manufactured as such is separated from the flexible PDMS mold 10. Therefore, the polymer micro needle array 15 shown in Fig. 1 can be manufactured through the manufacturing processes described above.
- the polymer micro needle array of the present invention is manufactured using a mold that has been prepared using the
- the micro needle array can be used with an apparatus for drawing blood from the skin or delivering a medicine through the skin.
- the micro needle array of the present invention is made of a polymer harmless to the human body, and can be easily used for injecting a medicine or drawing blood while penetrating into the skin without pain.
- the method of manufacturing the micro needle array using a mold allows reduction in production costs and facilitates mass production of the micro needle array.
Landscapes
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Heart & Thoracic Surgery (AREA)
- Veterinary Medicine (AREA)
- Public Health (AREA)
- General Health & Medical Sciences (AREA)
- Animal Behavior & Ethology (AREA)
- Medical Informatics (AREA)
- Biomedical Technology (AREA)
- Molecular Biology (AREA)
- Hematology (AREA)
- Biophysics (AREA)
- Surgery (AREA)
- Optics & Photonics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Pathology (AREA)
- Dermatology (AREA)
- Anesthesiology (AREA)
- Toxicology (AREA)
- Mechanical Engineering (AREA)
- Micromachines (AREA)
- Infusion, Injection, And Reservoir Apparatuses (AREA)
- Media Introduction/Drainage Providing Device (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04702870A EP1594683A4 (en) | 2003-01-16 | 2004-01-16 | Method for manufacturing of polymer micro needle array with liga process |
US10/542,613 US20060055090A1 (en) | 2003-01-16 | 2004-01-16 | Method for manufacturing of polymer micro needle array with liga process |
JP2005518550A JP2006516226A (en) | 2003-01-16 | 2004-01-16 | Manufacturing method of polymer needle array using LIGA process |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2003-0003041 | 2003-01-16 | ||
KR1020030003041A KR100563330B1 (en) | 2003-01-16 | 2003-01-16 | Method for manufacturing of polymer micro needle array with liga process |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004062899A2 true WO2004062899A2 (en) | 2004-07-29 |
WO2004062899A3 WO2004062899A3 (en) | 2004-10-07 |
Family
ID=36081170
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2004/000074 WO2004062899A2 (en) | 2003-01-16 | 2004-01-16 | Method for manufacturing of polymer micro needle array with liga process |
Country Status (6)
Country | Link |
---|---|
US (1) | US20060055090A1 (en) |
EP (1) | EP1594683A4 (en) |
JP (1) | JP2006516226A (en) |
KR (1) | KR100563330B1 (en) |
CN (1) | CN100513145C (en) |
WO (1) | WO2004062899A2 (en) |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007080427A2 (en) * | 2006-01-16 | 2007-07-19 | Functional Microstructures Limited | Method of making microneedles |
WO2008020631A1 (en) * | 2006-08-18 | 2008-02-21 | Toppan Printing Co., Ltd. | Method for producing original plate, method for producing microneedle patch, microneedle patch, and exposure apparatus |
JP2008046508A (en) * | 2006-08-18 | 2008-02-28 | Toppan Printing Co Ltd | Exposure apparatus and method |
JP2008046507A (en) * | 2006-08-18 | 2008-02-28 | Toppan Printing Co Ltd | Original plate, microneedle patch, and method of manufacturing the same |
WO2008027011A1 (en) * | 2006-08-28 | 2008-03-06 | Agency For Science, Technology And Research | Microneedles and methods for fabricating microneedles |
CN100420622C (en) * | 2005-12-28 | 2008-09-24 | 哈尔滨工业大学 | Secondary template duplicating process method based on dimethyl silicone polymer mini component |
EP2053146A1 (en) * | 2006-08-07 | 2009-04-29 | Seiko Instruments Inc. | Method for manufacturing electroformed mold, electroformed mold, and method for manufacturing electroformed parts |
EP2272430A1 (en) | 2004-08-16 | 2011-01-12 | Functional Microstructures Limited | Method of producing a microneedle or microimplant |
CN102526870A (en) * | 2012-01-09 | 2012-07-04 | 上海交通大学 | Anomalous plane hollow microneedle based on surface micro processing process and preparation method thereof |
JP5053645B2 (en) * | 2005-01-14 | 2012-10-17 | 久光製薬株式会社 | Medicinal product carrying device and method for producing the same |
EP2851749A1 (en) * | 2013-09-23 | 2015-03-25 | National Synchrotron Radiation Research Center | X-ray mask structure and method for preparing the same |
US9320878B2 (en) | 2008-10-07 | 2016-04-26 | Tuo Jin | Phase-transition polymeric microneedles |
US12070307B2 (en) | 2018-05-16 | 2024-08-27 | International Business Machines Corporation | Electrically functional polymer microneedle array |
Families Citing this family (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100756530B1 (en) * | 2004-08-18 | 2007-09-10 | 한국과학기술원 | Fabrication apparatus of micro-structure formed of plate-shaped photosensitive polymer by exposing x-ray and fabrication method thereof |
KR100701344B1 (en) * | 2004-09-03 | 2007-03-29 | 한국과학기술원 | Micro-needle array kit and manufacture method of micro-needle array kit using ultraviolet exposure |
EP2067599B1 (en) * | 2004-12-07 | 2016-10-26 | 3M Innovative Properties Company | Method of molding a microneedle |
US8034719B1 (en) * | 2005-12-08 | 2011-10-11 | The United States Of America As Represented By The Secretary Of The Navy | Method of fabricating high aspect ratio metal structures |
KR100691732B1 (en) * | 2006-02-22 | 2007-03-12 | 재단법인서울대학교산학협력재단 | Method for manufacturing three dimensional pdms structure |
US20070202186A1 (en) | 2006-02-22 | 2007-08-30 | Iscience Interventional Corporation | Apparatus and formulations for suprachoroidal drug delivery |
TWI300055B (en) * | 2006-05-26 | 2008-08-21 | Nat Univ Tsing Hua | Method of manufacturing hollow micro-needle structures |
US8865288B2 (en) * | 2006-07-17 | 2014-10-21 | University Of Utah Research Foundation | Micro-needle arrays having non-planar tips and methods of manufacture thereof |
US20080138581A1 (en) * | 2006-07-17 | 2008-06-12 | Rajmohan Bhandari | Masking high-aspect aspect ratio structures |
JP4888018B2 (en) * | 2006-09-29 | 2012-02-29 | 凸版印刷株式会社 | Needle-like body manufacturing method and needle-like body |
JP4810486B2 (en) * | 2007-03-30 | 2011-11-09 | 富士フイルム株式会社 | Method and apparatus for producing functional film having high aspect ratio structure |
CN101200550B (en) * | 2007-11-14 | 2010-08-11 | 大连水产学院 | Method for preparing template imitating micro-nano structure surface |
US20090301994A1 (en) * | 2008-05-12 | 2009-12-10 | Rajmohan Bhandari | Methods for Wafer Scale Processing of Needle Array Devices |
US8886279B2 (en) | 2008-06-03 | 2014-11-11 | University Of Utah Research Foundation | High aspect ratio microelectrode arrays enabled to have customizable lengths and methods of making the same |
CN101607432A (en) * | 2008-06-19 | 2009-12-23 | 鸿富锦精密工业(深圳)有限公司 | The manufacture method of optical element |
NL2001718C2 (en) * | 2008-06-24 | 2009-12-28 | Needle Holding B V U | Micro needle, micro needle array and manufacturing method therefor. |
US8639312B2 (en) * | 2008-12-10 | 2014-01-28 | University Of Utah Research Foundation | System and method for electrically shielding a microelectrode array in a physiological pathway from electrical noise |
KR101103612B1 (en) * | 2009-06-03 | 2012-01-09 | 명지대학교 산학협력단 | Microneedle for trans dermal injection, preparation method of the microneedle, mold for preparing microneedle and preparation method of the mold |
JP5996544B2 (en) | 2010-10-15 | 2016-09-21 | クリアサイド・バイオメディカル・インコーポレーテッドClearside Biomedical Incorporated | Eye access device |
CN102000020B (en) * | 2010-11-17 | 2012-10-10 | 河南羚锐制药股份有限公司北京药物研究院 | Novel micro-needle patch containing degradable polymer and preparation method thereof |
TWI498538B (en) * | 2011-04-22 | 2015-09-01 | Univ Nat Cheng Kung | Blood component detection device |
CN103301092B (en) | 2012-03-06 | 2014-12-03 | 中国科学院理化技术研究所 | Polymer micro-needle array chip and preparation method and application thereof |
WO2013137831A1 (en) * | 2012-03-16 | 2013-09-19 | National University Of Singapore | A novel method to fabricate polymeric microneedles |
US20150209180A1 (en) * | 2012-08-27 | 2015-07-30 | Clearside Biomedical, Inc. | Apparatus and Methods for Drug Delivery Using Microneedles |
CN105073102B (en) | 2012-10-01 | 2018-06-19 | 香港科技大学 | Transdermal label apparatus |
US9455188B2 (en) * | 2013-01-18 | 2016-09-27 | Globalfoundries Inc. | Through silicon via device having low stress, thin film gaps and methods for forming the same |
EP4378444A3 (en) | 2013-05-03 | 2024-07-03 | Clearside Biomedical, Inc. | Apparatus and methods for ocular injection |
CN103908739B (en) * | 2014-03-05 | 2016-01-20 | 中山大学 | A kind of manufacture method of metal micro-needle array |
KR101959184B1 (en) * | 2015-12-04 | 2019-03-15 | 아스실리온 에이비 | Micro needle and chip |
EP3452165A1 (en) | 2016-05-02 | 2019-03-13 | Clearside Biomedical, Inc. | Systems and methods for ocular drug delivery |
IL305537A (en) | 2016-08-12 | 2023-10-01 | Clearside Biomedical Inc | Devices and methods for adjusting the insertion depth of a needle for medicament delivery |
CN106422044B (en) * | 2016-08-26 | 2019-07-05 | 华东师范大学 | A kind of hafnium oxide empty micropin and preparation method based on silicon substrate |
KR101926958B1 (en) | 2017-01-13 | 2018-12-07 | 현대자동차주식회사 | Manufacturing method of non-paint injection molding products having excellent scratch-resistance and fouling resistance, and crash pad prepared thereby |
CN110193137A (en) * | 2018-02-27 | 2019-09-03 | 辽宁成大生物股份有限公司 | A kind of preparation method of rabies vaccine solubility microneedle patch |
CN108939280B (en) * | 2018-04-13 | 2021-05-18 | 杭州电子科技大学 | Preparation method of SU8 microneedle array patch |
KR102250038B1 (en) * | 2019-05-07 | 2021-05-11 | 인하대학교 산학협력단 | Manufacturing method and system of microneedle array |
CN110429158A (en) * | 2019-07-04 | 2019-11-08 | 云南师范大学 | The wet etching method of non-refrigerated infrared focal plane probe optical window |
CN111408036A (en) * | 2020-04-24 | 2020-07-14 | 优微(珠海)生物科技有限公司 | Composite microneedle patch and preparation method thereof |
CN113209466A (en) * | 2021-05-11 | 2021-08-06 | 苏州揽芯微纳科技有限公司 | Monocrystalline silicon hollow microneedle structure and manufacturing method thereof |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002517300A (en) * | 1998-06-10 | 2002-06-18 | ジョージア テック リサーチ コーポレイション | Microneedle devices and methods of manufacture and uses thereof |
US6312612B1 (en) * | 1999-06-09 | 2001-11-06 | The Procter & Gamble Company | Apparatus and method for manufacturing an intracutaneous microneedle array |
US6551849B1 (en) * | 1999-11-02 | 2003-04-22 | Christopher J. Kenney | Method for fabricating arrays of micro-needles |
US6511463B1 (en) * | 1999-11-18 | 2003-01-28 | Jds Uniphase Corporation | Methods of fabricating microneedle arrays using sacrificial molds |
US6663820B2 (en) * | 2001-03-14 | 2003-12-16 | The Procter & Gamble Company | Method of manufacturing microneedle structures using soft lithography and photolithography |
-
2003
- 2003-01-16 KR KR1020030003041A patent/KR100563330B1/en not_active IP Right Cessation
-
2004
- 2004-01-16 JP JP2005518550A patent/JP2006516226A/en active Pending
- 2004-01-16 US US10/542,613 patent/US20060055090A1/en not_active Abandoned
- 2004-01-16 CN CNB200480002378XA patent/CN100513145C/en not_active Expired - Fee Related
- 2004-01-16 EP EP04702870A patent/EP1594683A4/en not_active Withdrawn
- 2004-01-16 WO PCT/KR2004/000074 patent/WO2004062899A2/en active Application Filing
Non-Patent Citations (1)
Title |
---|
See references of EP1594683A4 * |
Cited By (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8192787B2 (en) | 2004-08-16 | 2012-06-05 | Innoture Limited | Method of producing a microneedle or microimplant |
EP2272430A1 (en) | 2004-08-16 | 2011-01-12 | Functional Microstructures Limited | Method of producing a microneedle or microimplant |
EP2289646A1 (en) | 2004-08-16 | 2011-03-02 | Functional Microstructures Limited | Microneedle or microimplant and method for making same |
JP5053645B2 (en) * | 2005-01-14 | 2012-10-17 | 久光製薬株式会社 | Medicinal product carrying device and method for producing the same |
CN100420622C (en) * | 2005-12-28 | 2008-09-24 | 哈尔滨工业大学 | Secondary template duplicating process method based on dimethyl silicone polymer mini component |
WO2007080427A2 (en) * | 2006-01-16 | 2007-07-19 | Functional Microstructures Limited | Method of making microneedles |
WO2007080427A3 (en) * | 2006-01-16 | 2007-09-07 | Functional Microstructures Ltd | Method of making microneedles |
US8852491B2 (en) | 2006-08-07 | 2014-10-07 | Seiko Instruments Inc. | Method manufacturing electroforming mold |
EP2053146A4 (en) * | 2006-08-07 | 2014-03-12 | Seiko Instr Inc | Method for manufacturing electroformed mold, electroformed mold, and method for manufacturing electroformed parts |
EP2053146A1 (en) * | 2006-08-07 | 2009-04-29 | Seiko Instruments Inc. | Method for manufacturing electroformed mold, electroformed mold, and method for manufacturing electroformed parts |
US8062835B2 (en) | 2006-08-18 | 2011-11-22 | Toppan Printing Co., Ltd. | Method of manufacturing master plate, method of manufacturing microneedle patch and apparatus exposure apparatus |
JP2008046507A (en) * | 2006-08-18 | 2008-02-28 | Toppan Printing Co Ltd | Original plate, microneedle patch, and method of manufacturing the same |
JP2008046508A (en) * | 2006-08-18 | 2008-02-28 | Toppan Printing Co Ltd | Exposure apparatus and method |
WO2008020631A1 (en) * | 2006-08-18 | 2008-02-21 | Toppan Printing Co., Ltd. | Method for producing original plate, method for producing microneedle patch, microneedle patch, and exposure apparatus |
WO2008027011A1 (en) * | 2006-08-28 | 2008-03-06 | Agency For Science, Technology And Research | Microneedles and methods for fabricating microneedles |
US9320878B2 (en) | 2008-10-07 | 2016-04-26 | Tuo Jin | Phase-transition polymeric microneedles |
CN102526870A (en) * | 2012-01-09 | 2012-07-04 | 上海交通大学 | Anomalous plane hollow microneedle based on surface micro processing process and preparation method thereof |
EP2851749A1 (en) * | 2013-09-23 | 2015-03-25 | National Synchrotron Radiation Research Center | X-ray mask structure and method for preparing the same |
US9152036B2 (en) | 2013-09-23 | 2015-10-06 | National Synchrotron Radiation Research Center | X-ray mask structure and method for preparing the same |
US12070307B2 (en) | 2018-05-16 | 2024-08-27 | International Business Machines Corporation | Electrically functional polymer microneedle array |
Also Published As
Publication number | Publication date |
---|---|
KR20040065848A (en) | 2004-07-23 |
EP1594683A2 (en) | 2005-11-16 |
CN1738710A (en) | 2006-02-22 |
CN100513145C (en) | 2009-07-15 |
US20060055090A1 (en) | 2006-03-16 |
KR100563330B1 (en) | 2006-03-22 |
EP1594683A4 (en) | 2009-11-11 |
JP2006516226A (en) | 2006-06-29 |
WO2004062899A3 (en) | 2004-10-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20060055090A1 (en) | Method for manufacturing of polymer micro needle array with liga process | |
JP4778669B2 (en) | Method for manufacturing microneedles structures using soft lithography and photolithography | |
US8250729B2 (en) | 3D fabrication of needle tip geometry and knife blade | |
KR101261466B1 (en) | The method for manufacturing hallow micro needle structures | |
US7132054B1 (en) | Method to fabricate hollow microneedle arrays | |
US8603384B2 (en) | Integrated microneedle array and a method for manufacturing thereof | |
US6924087B2 (en) | Polymer microneedles | |
US7344499B1 (en) | Microneedle device for extraction and sensing of bodily fluids | |
TWI389840B (en) | Decal transfer lithography | |
JP2004529726A (en) | Minimal surgical instruments | |
JP5020080B2 (en) | Manufacturing method of medical equipment | |
KR100528960B1 (en) | Method for preparing polymer micro needle array | |
WO2004035105A2 (en) | Polymer microneedles | |
CN112618946A (en) | Pyramid-shaped flexible microneedle array and preparation method thereof | |
KR101787945B1 (en) | Method of manufacturing mold for preparing microniddle using lithography | |
Shewale et al. | 3D polymer microneedle array: Fabrication and analysis | |
JP4797138B2 (en) | Silicon mold manufacturing method | |
CN113226432A (en) | Hollow microneedle for transdermal delivery of active molecules and/or for sampling biological fluids, and method for producing such a hollow microneedle | |
JP5223278B2 (en) | Microneedle manufacturing method | |
KR101837680B1 (en) | Method for producing hollow-type micro niddle and hollow-type micro niddle produced thereby | |
Kravitz et al. | Method to fabricate hollow microneedle arrays | |
JP5303256B2 (en) | Needle-like body provided with a projection having a constriction in the body portion, and method for manufacturing the same | |
Rajan et al. | An electrically controlled micromachined drug delivery device employing two silicon wafers | |
Zhu | Dry-etch benzocyclobutene (BCB) based neural-electronic interface | |
KR20090039009A (en) | Method for fabricating micro pattern on a plastic substrate |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): BW GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2004702870 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2005518550 Country of ref document: JP |
|
ENP | Entry into the national phase |
Ref document number: 2006055090 Country of ref document: US Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 10542613 Country of ref document: US Ref document number: 2004802378X Country of ref document: CN |
|
WWP | Wipo information: published in national office |
Ref document number: 2004702870 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 10542613 Country of ref document: US |