WO2004011984A3 - Retainer, exposure apparatus, and semiconductor device fabrication method - Google Patents

Retainer, exposure apparatus, and semiconductor device fabrication method Download PDF

Info

Publication number
WO2004011984A3
WO2004011984A3 PCT/JP2003/009533 JP0309533W WO2004011984A3 WO 2004011984 A3 WO2004011984 A3 WO 2004011984A3 JP 0309533 W JP0309533 W JP 0309533W WO 2004011984 A3 WO2004011984 A3 WO 2004011984A3
Authority
WO
WIPO (PCT)
Prior art keywords
retainer
semiconductor device
exposure apparatus
fabrication method
device fabrication
Prior art date
Application number
PCT/JP2003/009533
Other languages
French (fr)
Other versions
WO2004011984A2 (en
Inventor
Yukio Takabayashi
Original Assignee
Canon Kk
Yukio Takabayashi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk, Yukio Takabayashi filed Critical Canon Kk
Priority to EP03771380A priority Critical patent/EP1549984B1/en
Priority to DE60317088T priority patent/DE60317088T2/en
Publication of WO2004011984A2 publication Critical patent/WO2004011984A2/en
Publication of WO2004011984A3 publication Critical patent/WO2004011984A3/en
Priority to US11/005,598 priority patent/US7161750B2/en
Priority to US11/533,663 priority patent/US7253975B2/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/022—Mountings, adjusting means, or light-tight connections, for optical elements for lenses lens and mount having complementary engagement means, e.g. screw/thread
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/026—Mountings, adjusting means, or light-tight connections, for optical elements for lenses using retaining rings or springs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

A retainer for holding an optical element (110) having three first grooves (116) includes a first support member (120) that supports the optical element through the first grooves, and a second support member (130) that has three second grooves corresponding to the first grooves (132), and supports the first support member through the second grooves.
PCT/JP2003/009533 2002-07-31 2003-07-28 Retainer, exposure apparatus, and semiconductor device fabrication method WO2004011984A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP03771380A EP1549984B1 (en) 2002-07-31 2003-07-28 Optical apparatus, exposure apparatus, and semiconductor device fabrication method
DE60317088T DE60317088T2 (en) 2002-07-31 2003-07-28 Optical device, exposure apparatus, and manufacturing method for semiconductor devices
US11/005,598 US7161750B2 (en) 2002-07-31 2004-12-06 Retainer, exposure apparatus, and device fabrication method
US11/533,663 US7253975B2 (en) 2002-07-31 2006-09-20 Retainer, exposure apparatus, and device fabrication method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002224082 2002-07-31
JP2002-224082 2003-07-31

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US11/005,598 Continuation US7161750B2 (en) 2002-07-31 2004-12-06 Retainer, exposure apparatus, and device fabrication method
US11/533,663 Continuation US7253975B2 (en) 2002-07-31 2006-09-20 Retainer, exposure apparatus, and device fabrication method

Publications (2)

Publication Number Publication Date
WO2004011984A2 WO2004011984A2 (en) 2004-02-05
WO2004011984A3 true WO2004011984A3 (en) 2004-05-13

Family

ID=31184995

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2003/009533 WO2004011984A2 (en) 2002-07-31 2003-07-28 Retainer, exposure apparatus, and semiconductor device fabrication method

Country Status (7)

Country Link
US (2) US7161750B2 (en)
EP (1) EP1549984B1 (en)
KR (1) KR20050033621A (en)
CN (1) CN100462762C (en)
DE (1) DE60317088T2 (en)
TW (1) TWI240810B (en)
WO (1) WO2004011984A2 (en)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7760452B2 (en) * 2003-04-25 2010-07-20 Canon Kabushiki Kaisha Driving apparatus, optical system, exposure apparatus and device fabrication method
DE102004018656A1 (en) * 2004-04-13 2005-11-03 Carl Zeiss Smt Ag Optical element
KR101249598B1 (en) * 2004-10-26 2013-04-01 가부시키가이샤 니콘 Optical system, lens barrel, exposure system, and production method for device
US20090002670A1 (en) * 2005-03-04 2009-01-01 Carl Zeiss Smt Ag Apparatus for the manipulation and/or adjustment of an optical element
DE102005019716A1 (en) * 2005-04-28 2006-11-02 Carl Zeiss Smt Ag Optical system including optical element with its support useful for projection objectives in microlithography has nickel or hard material coating of optical element surface and optical element consisting of refractive crystalline material
JP4773756B2 (en) * 2005-07-07 2011-09-14 富士フイルム株式会社 Mirror frame, lens frame manufacturing method, lens frame molding die, and lens positioning method
DE102005049731A1 (en) * 2005-10-14 2007-04-19 Cube Optics Ag Optical structure with elastic suspension and method for producing such
JP2007200958A (en) 2006-01-24 2007-08-09 Canon Inc Holder and exposure apparatus using the same
JP5043468B2 (en) 2007-02-23 2012-10-10 キヤノン株式会社 Holding device
GB0703693D0 (en) * 2007-02-26 2007-04-04 Jahre Group As Support structure
DE102008044365A1 (en) 2007-12-18 2009-06-25 Carl Zeiss Smt Ag Projection exposure system for manufacturing semiconductor component i.e. computer chip, has changing unit for changing optical assembly that is exchangeably formed, and bearing unit reducing deformations of optical element caused by holder
DE102008039788B3 (en) * 2008-08-26 2010-04-01 Carl Zeiss Ag Low-stress optical mount, has V-shaped needle whose region includes recess, where optical surface runs in radial direction at angle in region between specified range of degree to plane that stays perpendicular to optical axis
JP2010062394A (en) * 2008-09-04 2010-03-18 Canon Inc Holding apparatus and exposure apparatus
JP5506473B2 (en) * 2010-03-12 2014-05-28 キヤノン株式会社 Holding device, optical device and telescope
DE102010028941B4 (en) * 2010-05-12 2012-03-22 Carl Zeiss Smt Gmbh Optical device and method for positioning an optical element of an optical device
US8651677B2 (en) * 2010-06-28 2014-02-18 Lexmark International, Inc. Mounting mechanism for a component of an imaging apparatus, and methods of making and using same
JP5535108B2 (en) 2011-02-18 2014-07-02 ギガフォトン株式会社 Extreme ultraviolet light source device
DE102011004961A1 (en) * 2011-03-02 2012-04-05 Carl Zeiss Smt Gmbh Arrangement for holding optical element of e.g. optical system in extreme UV-projection exposure system utilized in microlithography for manufacturing e.g. LCD, has adjusting element varying relative position of ball-cap-shaped components
JP2013048202A (en) * 2011-03-30 2013-03-07 Gigaphoton Inc Laser system
US8855164B2 (en) 2011-03-30 2014-10-07 Gigaphoton Inc. Laser apparatus
KR101450144B1 (en) * 2013-11-26 2014-10-16 연세대학교 산학협력단 Micro guide for MEMS structure and Manufacturing Method Thereof
JP5888822B2 (en) * 2014-06-24 2016-03-22 大学共同利用機関法人自然科学研究機構 Kinematic support mechanism
WO2017207016A1 (en) * 2016-05-30 2017-12-07 Carl Zeiss Smt Gmbh Optical imaging arrangement with a piezoelectric device
DE102016215540A1 (en) * 2016-08-18 2018-02-22 Carl Zeiss Smt Gmbh OPTICAL SYSTEM, LITHOGRAPHY SYSTEM AND METHOD
TWI712849B (en) * 2017-02-17 2020-12-11 聯華電子股份有限公司 Extreme ultraviolet mask
US10914916B2 (en) * 2017-03-07 2021-02-09 Onto Innovation Inc. Non-adhesive mounting assembly for a tall Rochon polarizer
DE102018107034A1 (en) * 2018-03-23 2019-09-26 Huber+Suhner Cube Optics Ag Elastic suspension for optical design
US20200240576A1 (en) * 2019-01-30 2020-07-30 Andrew Norman Erickson Orthogonal two axis kinematic translation stage
DE102021204261A1 (en) 2021-04-28 2022-05-12 Carl Zeiss Smt Gmbh STORAGE DEVICE, STORAGE SYSTEM,LITHOGRAPHY PLANT AND METHOD OF POSITIONING A COMPONENT ON A SUPPORT OF A LITHOGRAPHY PLANT
WO2024061736A1 (en) * 2022-09-23 2024-03-28 Asml Netherlands B.V. Positioning system for an optical element of a metrology apparatus

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4621899A (en) * 1984-04-09 1986-11-11 The Perkin-Elmer Corporation Assembly for positioning an optical element
US4763991A (en) * 1987-08-10 1988-08-16 Litton Systems, Inc. Adjustable six degree of freedom mount for optical components
JPH02304511A (en) * 1989-05-19 1990-12-18 Olympus Optical Co Ltd Lens holder
NL9402125A (en) * 1994-12-13 1996-07-01 Roell Maria Van Druten Lens-clamping fixture and clamping method
JPH10186196A (en) * 1996-12-20 1998-07-14 Canon Inc Optical element supporting device and optical equipment provided therewith and exposure device
WO2000037981A1 (en) * 1998-12-21 2000-06-29 The Secretary Of State For Defence Mount element
EP1164398A2 (en) * 2000-06-17 2001-12-19 Carl Zeiss Apparatus for mounting an optical element, e.g. a lens in an objective
US6400516B1 (en) * 2000-08-10 2002-06-04 Nikon Corporation Kinematic optical mounting

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5406405A (en) * 1991-11-27 1995-04-11 Sullivan; Mark T. Rotating kinematic optic mount
US5781351A (en) * 1995-06-02 1998-07-14 Matsushita Electric Industrial Co., Ltd. Mounting structure of objective lens for optical pick-up used for optical disk device
JP2002048962A (en) * 2000-06-17 2002-02-15 Carl-Zeiss-Stiftung Trading As Carl Zeiss Device for mounting optical element
US6674584B2 (en) * 2001-07-03 2004-01-06 Pts Corporation Optical surface-mount lens cell

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4621899A (en) * 1984-04-09 1986-11-11 The Perkin-Elmer Corporation Assembly for positioning an optical element
US4763991A (en) * 1987-08-10 1988-08-16 Litton Systems, Inc. Adjustable six degree of freedom mount for optical components
JPH02304511A (en) * 1989-05-19 1990-12-18 Olympus Optical Co Ltd Lens holder
NL9402125A (en) * 1994-12-13 1996-07-01 Roell Maria Van Druten Lens-clamping fixture and clamping method
JPH10186196A (en) * 1996-12-20 1998-07-14 Canon Inc Optical element supporting device and optical equipment provided therewith and exposure device
WO2000037981A1 (en) * 1998-12-21 2000-06-29 The Secretary Of State For Defence Mount element
EP1164398A2 (en) * 2000-06-17 2001-12-19 Carl Zeiss Apparatus for mounting an optical element, e.g. a lens in an objective
US6400516B1 (en) * 2000-08-10 2002-06-04 Nikon Corporation Kinematic optical mounting

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 015, no. 088 (P - 1174) 4 March 1991 (1991-03-04) *
PATENT ABSTRACTS OF JAPAN vol. 1998, no. 12 31 October 1998 (1998-10-31) *

Also Published As

Publication number Publication date
WO2004011984A2 (en) 2004-02-05
KR20050033621A (en) 2005-04-12
US20070014036A1 (en) 2007-01-18
DE60317088T2 (en) 2008-07-24
CN100462762C (en) 2009-02-18
US20050078386A1 (en) 2005-04-14
US7253975B2 (en) 2007-08-07
EP1549984A2 (en) 2005-07-06
US7161750B2 (en) 2007-01-09
CN1666129A (en) 2005-09-07
EP1549984B1 (en) 2007-10-24
TW200405053A (en) 2004-04-01
TWI240810B (en) 2005-10-01
DE60317088D1 (en) 2007-12-06

Similar Documents

Publication Publication Date Title
WO2004011984A3 (en) Retainer, exposure apparatus, and semiconductor device fabrication method
AU4459701A (en) Method and device for holding optical member, optical device, exposure apparatus, and device manufacturing method
EP1489654A4 (en) LnCuO(S, Se, Te) MONOCRYSTALLINE THIN FILM, ITS MANUFACTURING METHOD, AND OPTICAL DEVICE OR ELECTRONIC DEVICE USING THE MONOCRYSTALLINE THIN FILM
WO2004074167A3 (en) A device and method for stacked multi-level uncoupled electrostatic actuators
WO2002062527A8 (en) Abrasive article suitable for modifying a semiconductor wafer
AU1301601A (en) Adhesive film for semiconductor, lead frame and semiconductor device using the same, and method for manufacturing semiconductor device
AU2003252359A1 (en) Semiconductor light-emitting device, method for manufacturing same and light-emitting apparatus using same
AU2002253540A1 (en) Support for apparatus in general and, in particular, for optical or photographic apparatus and the like
NL1021853A1 (en) Method for inspecting an exposure device, an exposure method for correcting a focal point, and a method for manufacturing a semiconductor device.
EP2434522B8 (en) Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing method
DE60033017D1 (en) SEMICONDUCTOR LASER, METHOD FOR THE PRODUCTION THEREOF AND OPTICAL PLATE DEVICE
EP1318581A1 (en) Semiconductor laser device and method for manufacturing the same
GB0109564D0 (en) Method for forming p-type semiconductor film and light emitting device using the same
ITTO20010424A0 (en) LASER DEVICE BASED ON SILICON NANOSTRUCTURES.
SG104264A1 (en) Lens, manufacturing method thereof, and optical device using the same lens
AU2002354196A1 (en) Substrate holding apparatus, exposure apparatus, and device manufacturing method
AU1383501A (en) Semiconductor device for electro-optic applications, method for manufacturing said device and corresponding semiconductor laser device
AU2003201149A1 (en) Integrated semiconductor optical device, method and apparatus for manufacturing such a device
AU2002329048A1 (en) A tripod for supporting apparatus in general and, in particular, for optical or photographic apparatus and the like
AU2002357606A1 (en) Potential generating circuit, potential generating apparatus, semiconductor device using the same, and driving method thereof
AU2003283565A1 (en) Semiconductor optical device with beam focusing
AU2002359079A1 (en) Apparatus for manufacturing semiconductor device and method for manufacturing semiconductor device by using the same
DK1041800T3 (en) Telephone terminal, interchangeable data carrier provided with means for suppressing common functions, and procedure for handling the corresponding function menus
GB2408146B (en) Semiconductor laser device, semiconductor laser module, and optical fiber amplifier
AU2003236251A1 (en) Semiconductor device and method for assembling the same

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): CN KR US

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): DE IT NL

DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 11005598

Country of ref document: US

WWE Wipo information: entry into national phase

Ref document number: 20038155346

Country of ref document: CN

WWE Wipo information: entry into national phase

Ref document number: 1020057001545

Country of ref document: KR

WWE Wipo information: entry into national phase

Ref document number: 2003771380

Country of ref document: EP

WWP Wipo information: published in national office

Ref document number: 1020057001545

Country of ref document: KR

WWP Wipo information: published in national office

Ref document number: 2003771380

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 11533663

Country of ref document: US

WWP Wipo information: published in national office

Ref document number: 11533663

Country of ref document: US

WWG Wipo information: grant in national office

Ref document number: 2003771380

Country of ref document: EP